Method and structure for interconnecting different polysilicon zones on semiconductor substrates for integrated circuits

Abstract: A method of forming interconnections of devices of integrated circuits, especially interconnecting spaced source/drain regions and/or gate regions, and the resulting structures are provided. An etch-stop material (24) such as silicon dioxide is deposited over the entire substrate (10) on which the devices are formed. A layer of silicon (26) is deposited over etch-stop material, and the silicon is selectively etched to reveal the etch-stop material at the regions (12, 20) to be connected. The etch-stop material (24) at those regions is then removed. Following this a high-conductivity material (34), which is either a refractory metal or a silicide formed from layers of silicon and a refractory metal, is formed on the substrate connecting the spaced regions (12, 20).

Description: In the production of integrated circuits on semiconductor substrates, it is often necessary to selectively interconnect various doped zones or other different regions, connections or electrodes of the devices which are formed on the semiconductor substrate. For example, in FET Technology, it is often necessary to connect selectively gate electrodes to source/ drain diffusions or to connect different gate electrodes together, or to connect different source/drain regions together. In forming the devices, it is necessary to provide interconnections which connect selectively only those regions which are desired to be interconnected and to prevent connections of those regions which must be electrically isolated, and which during processing require steps or techniques which assure that they will not be interconnected. The interconnection between the various zones or regions is desirably done by material which has a very high conductivity (i.e. a very low resistance). Thus, the interconnection should be done with materials that have very low resistivity so that minimal amounts of material can be used to provide the desired interconnection, and yet with these materials, the interconnections must be reliably made without shorting to undesired regions or without resulting opens or regions of high resistance within the interconnect lines or at the connections of the interconnect lines to the various regions. There have been several prior art proposals for such type of interconnections, and included in these proposals is the use of various silicides such as has been shown in an article entitled HPSAC-A Silicided Amorphous-Silicon Contact and Interconnect Technology for VLSI by Wong, et al. in the IEEE transactions on electron devices in Vol. ED-34, No. 3, March 1987, 587 - 592. Also, a related technology using tungsten is disclosed in an article entitled A Selective CVD Tungsten Local Interconnect Technology by V.V. Lee, et al. in the International Electron Devices Meeting, Nichol Digest, 1988, Pages 450 - 453. Additionally, U.S. Patent Application 135,953 filed December 21, 1987 entitled Method for Providing Bridge Contact Between Silicon Regions Separated By a Thin Dielectric, (IBM Docket No. BU9-87-034), and IBM Technical Disclosure Bulletin, Vol. 32, No. 9A, Pages 433-434 entitled Multi-Purpose Trench For a Complimentary Metal Oxide Silicon (CMOS), Six Device Static Random Access Memory (SRAM) Cell show the use of silicides as a strap for interconnection between spaced doped regions or connecting of polysilicon regions to doped regions. U.S. Patents 4,714,951; 4,374,700; 4,873,204; 4,462,149; 4,463,491; and European Patent Publication No. 0046371 show the use of silicides in various configurations. Further, U.S. Patent 4,745,081 shows a type of interconnect technology substrate contact with trench isolation areas. The article Titanium Nitride Local Interconnect Technology for VLSI by T.E. Tang et al. in IEEE Transactions on Electron Devices, Vol. Ed. 34, No. 3, March 1987 pp.682-687, and report of 44th Annual Device Research Conference, June 23-25, 1986; both show TiN technology for device interconnection. EP-A-97 918 discloses a semiconductor device and the method of making the same. The semiconductor device comprises one or two polycrystalline layers as wirings on a semiconductor substrate with one or two insulation films inbetween. Openings are made utilizing a single photoresist mask by etching the polycrystalline silicon layer and the underlying insulation film in one sequence, and the polycrystalline silicon layers and a diffused region of the substrate exposed in the openings are connected with a self-aligned tungsten film formed by low-pressure CVD. In EP-A-68897 a method of forming an electrode of a semiconcutor device is shown. To form an electrode in a semiconductor device, after a silicon layer is selectively grown on that part of a silicon substrate surface on which the electrode is to be formed, the silicon layer is reacted with a refractory metal so as to form the electrode as a metal silicide layer. In this way, the problem of a metal layer ruining a pn-junction in the substrate is avoided, and a device of high packaging density can be formed. EP-A- 85 777 describes the fabrication of devices including selective formation of titanium disilicide by direct reaction. Titanium is deposited on a silicon substrate and on a patterned layer of silicon dioxide or polysilicon, and the structure is heated so that the titanium in contact with silicon or polysilicon reacts to form titanium disilicide (TiSi 2 ), while the titanium in contact with silicon dioxide does not interact. The TiSi 2 exhibits a much lower resistivity than silicon or polysilicon. This lower resistivity makes possible further advances in the performance of VLSI devices. WO 89/11732 shows TiSi 2 local interconnects. Low resistivity interconnects and silicided N+/P+ active area are formed by sputtering a blanket layer of titanium onto a wafer surface which has the interconnection pattern defined by a thin polysilicon layer. A thin oxide layer underneath the polysilicon interconnection pattern serves as an etch stop in the local interconnect photo/etch step. This unprotected oxide layer remaining on top of the N+/P+ active area will be removed by a wet etch prior to the sputtering step. Titanium is then sintered, resulting in conversion of titanium to TiSi 2 and TiN. Unreacted titanium and TiN are removed and the remaining TiSi 2 provides silicides N+/P+ junctions and a low resistance interconnect level. Advantages of the invention include a low resistance self-aligned contact procedure for the bitline formation, and elimination of the minimal spacing requirement between access transistors imposed by the traditional non self-aligned contact approach. According to the present invention, a method of forming an interconnection between spaced regions in an integrated circuit and the resulting interconnection structure are provided. The method includes depositing or growing a layer of etch-stop material over the doped silicon regions to be interconnected. A layer of silicon is deposited over the etch-stop material, and the silicon is selectively etched to reveal the etch-stop material at the regions of the doped silicon to be interconnected. The etch-stop material is then removed at the locations to be interconnected. Following this, a high-conductivity material or a material that can be made to have high-conductivity by conversion to silicide is grown over the revealed doped silicon locations and the remaining deposited silicon. This process results in the selective interconnection of desired spaced doped silicon regions while preventing unwanted or unintended interconnections to doped regions which are to be isolated from the interconnected regions. The high-conductivity material is a silicide which is formed in situ. Fig.1A through 1E depict somewhat diagrammatically the various steps of the present invention which are common to all of the embodiments; Figs. 2A through 2D show the steps for practicing an embodiment of this invention following the step used to form Fig. 1E; and Fig. 2E shows the resulting structure of an embodiment similar to Figs. 2A through 2D in which the resulting structure connects two diffusion regions rather than a diffusion and a gate region of the devices. Referring now to the drawing and, for the present, to Figs. 1A through 1E, the various initial steps utilized in practicing the present invention for forming integrated circuits, which are common to all of the embodiments, are shown. In depicting these steps, a portion of a single crystal silicon wafer is shown, but this depiction is very schematic and diagrammatic and is simplified to depict the inventive aspects of the present invention. Referring now to Fig. 1A, a single crystal silicon substrate 10 is shown having a conventional doped region 12 formed therein which can be either a "P" or "N" type doping depending upon the particular technology being used. Indeed "P" and "N" dopings can both be used in the same substrate and the particular dopant is not critical for the present invention. A region of recessed oxide (ROX) 14 is shown which is a silicon dioxide material grown on the silicon substrate 10. A gate electrode 16 of doped polysilicon is shown which is supported on a pad 17 of dielectric material such as silicon dioxide. Conventionally, the gate electrode 16 will have isolation side walls 18 therearound formed of silicon dioxide or some other dielectric material. A second pad 20 of doped polysilicon material is shown on the recessed oxide 14. Conventionally, this pad 20 is an extension of another gate and at the location shown is used as its own interconnection line supported on top of the recessed oxide 14. The pad 20 of doped polysilicon is also surrounded by dielectric side walls 22 again preferably formed of grown silicon dioxide. The processing of a wafer from a silicon substrate to this point to form an integrated circuit is conventional, and is well know to those skilled in the art. A layer of etch-stop material 24 is provided over all of the exposed doped silicon regions. In the preferred embodiment, this is a silicon dioxide which is formed on the exposed surfaces of the various regions of doped silicon. However, other etch-stop materials could be used, silicon dioxide being a conventional and convenient material for this purpose. The silicon dioxide etch-stop layer 24 can be formed by either low pressure chemical vapor deposition (LPVCD) or by conventional oxidation processes in an oxygen ambient atmosphere at temperatures above about 750°C. As indicated above, however, other etch-stop materials, such as silicon nitride could be used and applied in a conventional manner. A layer of polysilicon 26 is deposited over the entire surface of the wafer structure as shown in Fig. 1C. This is referred to as intrinsic polysilicon and a preferred technique is by LPCVD Si deposition using silane (SiH 4 ) to form an approximately 100 nm (1000 angstroms) thick layer. Following the deposition of the polysilicon layer 26 as shown in Fig. 1C, the polysilicon 26 is patterned and etched according to standard photoresist photolithographic technology to reveal the regions of the etch-stop material 24 overlying the underlying doped silicon regions which are to be connected; i.e. the portion of the diffusion zone 12 which may be a source/drain region and a portion of the pad 20 which, as indicated above is an extension of a gate to provide the structure in Fig. 1D. Photoresist and etching techniques are common and well known in the art. The photoresist may be either positive or negative and is imagewise exposed and developed to transfer a pattern to the underlying polysilicon. The polysilicon can be etched in either a dry or wet chemical environment. A typical dry etch gas, having adequate selectivity of silicon to oxide, is NF 3 . At this point, it should be noted that one of the important features of the present invention is the provision of the etch-stop layer 24 so that in patterning and etching the poly-silicon layer 26, the underlying doped region 12 of the substrate 10 is protected and unaffected by the etching process used to pattern the polysilicon 26. Following the etching of the polysilicon 26, the revealed portions of the etch-stop layer 24 are removed as shown in Fig. 1E to provide an opening 30 to a portion of the doped silicon region 12 and an opening 32 to a portion of the underlying doped polysilion pad 20. Buffered hydrofluoric acid (BHF) is used to isotropically remove the oxide etch stop. As indicated above, the steps leading up to and the resulting structure in Fig. 1E are common to all of the embodiments of the present invention for connecting gate electrodes to source/drain regions. The various embodiments utilize the structure shown in Fig. 1E as the basis for the further steps for the different embodiments, providing the different resulting structures. An embodiment of the invention is shown in Figs. 2A through 2D. For this embodiment also the starting structure is that shown in Fig. 1E. On top of this structure a layer of intrinsic silicon 40 is selectively deposited. This layer of intrinsic silicon 40 is deposited or grown on all exposed silicon surfaces, i.e. on the surface of the silicon 26, on the surface of the doped source/drain region 12 that is exposed, and on the surface of the gate electrode 16 and on the surface of the pad 20 which is exposed as shown in Fig. 2A. This can be accomplished by selective epitaxial growth (SEG) of Si on precleaned Si surfaces which may be performed in a LPCVD reactor at temperatures between about 800°C and 950°C using dichlorosilane (SiCl 2 H 2 ), or other chlorosilane gasses and HCl gasses. Following this, a layer of titanium 42 is applied. Titanium is sputtered (or deposited by some other means) over the entire substrate. The deposition of titanium is conventional and can be accomplished according to the following process: Titanium is sputter deposited using a titanium target and an argon ion beam at a pressure of 0,266-1,6 Pa (2- 12 mTorr). The entire substrate is then heated to react the titanium 42 with the underlying silicon 40 to form a titanium silicide 44 as shown in Fig. 2C. This heating to perform the silicidation can be accomplished by annealing in a nitrogen ambient atmosphere at temperatures between about 650°C and 700°C. Following the forming of the titanium silicide 44, the titanium which was not formed into a silicide is removed. This is the titanium which was not in contact with the silicon, e.g. that which is on the side wall spacers 18 and on the recessed oxide layer 14 and which remained as titanium metal or was converted to titanium nitride during silicidation. This titanium and/or titanium nitride can be removed in a conventional way such as by a wet etch in Huang A reagent (H 2 O 2 : NH 4 OH: H 2 O) at about 65°C for about 5-10 minutes with the resulting structure as shown in Fig. 2D. The titanium silicide formed in this process has a very high conductivity (i.e. low resistance) and provides a good interconnection between the source/drain layer 12 and the pad 20 as shown in Fig. 2D. The advantage of this particular process is that there is an additional layer of silicon to afford reactive material for the "step" bridging the etch-stop material 24 and thus better insure a good connection over this step. Fig. 2E shows the resulting structure using the technique shown in Figs. 2A through 2D for connecting source/drain regions separated by recessed oxide.

Claims: A method of forming interconnections between spaced silicon regions (12, 20) to be interconnected on a semiconductor substrate (10) at least one of which silicon regions to be interconnected is doped, and wherein said semiconductor has conductive polysilicon gate electrodes (16) insulated from the silicon regions (12, 20) to be interconnected, said method comprising, forming a layer of dielectric etch-stop material (24) over the substrate (10) including the silicon regions to be interconnected and the gate electrodes, providing a layer of intrinsic polysilicon (26) on said etch-stop material (24) including the silicon regions (12, 20) to be interconnected and the gate electrodes (16), said layer of intrinsic polysilicon (26) being electrically isolated from said gate electrodes and said silicon regions to be interconnected, selectively etching said intrinsic polysilicon (26) to reveal the etch-stop material (24) at least at portions of the silicon regions (12, 20) to be interconnected, removing the revealed etch-stop material (24) to reveal the portions of the silicon regions (12, 20) to be interconnected; and forming an electrically conducting material (44) interconnecting at least one of said silicon regions (12, 20) at the revealed portion thereof and the remaining intrinsic polysilicon (26), said remaining intrinsic polysilicon being physically spaced from portions of the silicon regions to be interconnected, wherein the electrically conducting material interconnecting the revealed silicon regions (12, 20) and the remaining polysilicon (26) is formed by depositing a refractory metal (42) over the revealed silicon regions (12, 20) and the layer of polysilicon and forming a silicide from said refractory metal, characterized in that before depositing said refractory metal (42), intrinsic silicon (40) is formed first on the revealed silicon regions (12, 20) and the polysilicon (26) by selectively growing or depositing, and wherein the selectively grown or deposited intrinsic silicon is subsequently converted to a refractory metal silicide (44). The method as defined in claim 1 wherein said refractory metal (42) is titanium. The method as defined in claim 2 wherein the intrinsic selectively grown or deposited silicon (40) is formed into a titanium silicide. The method as defined in anyone of the claims 1 to 3, wherein the etch-stop material (24) is silicon dioxide. The method as defined in anyone of the claims 1 to 4 wherein said gate electrodes (16) have side wall insulators (18) of silicon dioxide.

Inventors: ABERNATHEY JOHN R, MANN RANDY W, PARRIES PAUL C, SPRINGER JULIE A, ABERNATHEY, JOHN R., MANN, RANDY W., PARRIES, PAUL C., SPRINGER, JULIE A.
Applicants: IBM, INTERNATIONAL BUSINESS MACHINES CORPORATION
Application year: 1991
Main classification: H01L21
IPC codes: H01L21, H01L23