Objective lens system for use within microscope

Abstract: An objective lens system for use within a microscope includes a first to a fourth lenses which are spaced apart from an object side. the first lens is made of either quartz or fluorite, the second and the third lenses are made of quartz, while the fourth lens is made of fluorite. The system transmits ultraviolet and/or far ultraviolet light and correct chromatic aberration. The system is uncomplicated.

Description: The present invention relates to an objective lens system for use within a microscope which is employable in ultraviolet range, in particular, in far ultraviolet range, in which light has a wavelength of shorter than 300 nm, wherein a said lenses are made of quartz and fluoride. And objective lens system for use within a microscope comprises lenses made of quartz and fluoride is disclosed in EP-A-347-838. It is commonly known in the art that a microscope has a property that, assuming numerical aperture (NA) of an objective lens system used within microscope remains constant, the shorter a wavelength of light used therein, the better its resolution limit. Thus, it is possible to observe a sample in greater detail by shortening the wavelength of illumination light. In addition, illuminating a sample with ultraviolet light would often result in fluorecence of stronger intensity discharged from a sample than fluorecence obtained by illuminating with visible light. Against this backdrop, a microscope employable in ultraviolet range is preferred in the art, because of obtaining more information by observing a sample through.such a microscope. Thus, an objective lens system for use within a microscope must be employable in ultraviolet and/or far ultraviolet range. Among known conventional objective lens systems which is employable in ultraviolet and/or far ultraviolet range is, for example, an objective lens system for use within a microscope described in "Hikari Gijyutsu Contact," Volume 25, Number 2, Page 137 (Feb 1987). The objective lens system is illustrated in Fig. 1. In Fig. 1, an objective lens system 170 includes a first lens 171 made of fluorite, a second lens group 172 and a third lens group 173 disposed in that order from an object side (left-hand side of the figure) to an image formation side (right-hand side of the figure). The second lens group 172 includes two convex lenses 172b and 172c both made of fluorite and a concave lens 172a made of quartz. The second lens group 172 is formed by holding the concave lens 172a between the convex lenses 172b and 172c and joining the same to each other. The third lens group 173 is formed, in a similar manner to the second lens group 172, by holding a concave lens 173a made of quartz between two convex lenses 173b and 173c both made of fluorite and joining the same to each other. Since the lenses 171, 172a to 172c and 173a to 173c are made of either quartz or fluorite, the objective lens system 170 is capable of transmitting ultraviolet and/or far ultraviolet light, and hence, employable in ultraviolet and/or far ultraviolet range. In addition to this, chromatic aberration can be corrected in the objective lens system 170, since the second lens group 172 is composed of the concave lens 172a made of quartz and the convex lenses 172b and 172c made of fluorite while the third lens group 173 is composed of the concave lens 173a made of quartz and the convex lenses 173b and 173c made of fluorite. The convex lens 172b, the concave lens 172a and the convex lens 172c of the second lens group 172 are brought into optical contact and joined to each other. Similarly in the third lens group 173, the convex lens 173b, the concave lens 173a and the convex lens 173c are brought into optical contact thereby to be joined to each other. This is attributable to the current technical level that adhesive which transmits far ultraviolet light is not available yet. Further, when a junction surface between lenses has to completely eliminate reflection thereat, there is no option other than cementing by optical contact. Thus, in the process of manufacturing the objective lens system 170, junction surfaces must be finished with extremely high accuracy, which would result in largely increased cost. The inventor of the present invention has already suggested an objective lens system for use within a microscope in which such a problem is solved. See Japanese Patent Laid-Open Gazette Nos. 1-319719 and 1-319720. These literature references will be hereinafter referred to as the "precedent applications." Fig. 2 shows an objective lens system for use within a microscope, namely, objective lens system 160, according to an embodiment of the precedent applications. The suggested objective 160 includes lenses 161 to 163, which are made of either quartz or fluorite. The lenses 161 to 163, i.e., a first to a third lenses, are displaced in that order from an object side (left-hand side in the figure) to an image formation side (right-hand side in the figure) with preselected air spaces therebetween. This enables the objective lens system 160 to be employable in both ultraviolet and far ultraviolet range. The lenses 161 to 163, as just has been mentioned, are separated from each other; that is, the objective lens system 160 includes no junction surfaces. Thus, including no optical contact, the objective lens system 160 is free from the problem relating to manufacture cost. The objective lens system 160 cooperates with an image formation lens system (detailed structure thereof will be given later) in order to form an image of an object to be observed on the focal plane of the image formation lens system at a predetermined imaging magnification M. The imaging magnification M is a ratio of the focal length f₂ of the image formation lens system to the focal length f₁ of the objective lens system 160, and is given as: M = -f₂/f₁ In general, an objective lens system is replaced with other one while an image formation lens system is fixed, whereby the imaging magnification M is changed. Objective lens systems for replacement are necessary for this end, each of the lens systems having a focal length different from the focal length f₁. The equation (1) gives that an objective lens system for replacement which has a focal length of 2·f₁ is necessary to halve the imaging magnification M. If being required here is nothing more than to form the other objective lens system for replacement such that its focal length becomes 2·f₁, the demanded objective lens system for replacement merely has to have a size of a proportionally enlarged objective lens system 160. However, if the objective lens system 160 is replaced with the demanded objective lens system for replacement mentioned above (which is equal to the objective lens system 160 doubled in terms of size), a distance between the demanded objective lens system for replacement and the object to be observed would have to be also doubled as long as a pupil of a microscope fixed. This is extremely time-consuming as well as labor-consuming in that the microscope must be brought into focus once again all from the beginning after the replacement, and therefore, would enormously deteriorate operation of the microscope. In addition, such replacement causes doubling of the pupil size, which in turn causes remarkable change in quantity of illumination light onto the object. On the other hand, if the position of the object is fixed, the position of the pupil would be moved. This should also be avoided in an illumination system for illuminating the object, since positional changes of the pupil exerts unfavorable affect upon illumination condition. Thus, when imaging magnification is to be halved by replacing objective lens systems, an objective lens system for replacement must have: (a) a focal length double that of the objective lens system 160; (b) parfocality; that is, a property of eliminating the necessity of bringing a microscope into focus once again after replacement; and (c) a pupil which is roughly the same in size with that of the objective lens system 160. The equation (1) also gives that an objective lens system for replacement which has a focal length of 5·f₁ is necessary to observe an object at an imaging magnification of M/5. Thus, in the case of obtaining an image of the object under a microscope at M/5 power, an objective lens system for replacement must have: (a) a focal length being five times larger than that of the objective lens system 160; (b) parfocality; that is, a property of eliminating the necessity of bringing a microscope into focus once again after replacement; and (c) a pupil which is roughly the same in size with that of the objective lens system 160. SUMMARY OF THE INVENTION The present invention is directed to an objective lens system for use within a microscope. The system includes: a first lens made of either quartz or fluorite, the first lens having a positive power; a second and a third lenses made of quartz, both of the second and third lenses having a negative power; and a fourth lens made of fluorite, the fourth lens having a positive power, wherein the first to the fourth lenses are disposed in that order from an object side to an image formation side with predetermined air spacings therebetween, wherein the inequalities of claim 1 are satisfied. The present invention also relates to an apparatus for measuring the thickness of a film on a sample, the apparatus including: means for illuminating a sample, and a microscopic optical system for imaging ultraviolet and/or far ultraviolet light from the sample, the microscopic optical system including an objective lens system for converging the light in an image formation direction with the features of claim 1 or 2. An object of the present invention is to provide an inexpensive objective lens system for use within a microscope which is employable in ultraviolet and/or far ultraviolet range and which is different in structure from the objective lens system according to the precedent applications. Another object of the present invention is to provide an objective lens system for use within a microscope which has a focal length approximately half, parfocality, and a pupil roughly the same as those of the objective lens system of the precedent applications which forms an image on an image plane of an image formation lens system at a predetermined imaging magnification when cooperates with the image formation lens system. Another object of the present invention is to provide an apparatus which uses ultraviolet and/or far ultraviolet light to accurately measure the thickness of a film which is formed on a sample. These and other objects, features, aspects and advantages of the present invention will become more apparent from the following detailed description of the present invention when taken in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS Figs. 1 and 2 are a block diagram of a conventional objective lens system for use within a microscope; Figs. 3, 6, 8 and 10 are a block diagrams of an objective lens system according to the present invention; Fig. 4 is a block diagram of an image formation lens system; Figs. 5A, 5B, 5C and 5D illustrate spherical aberration, sine condition, astigmatism and distortion of an optical system utilizing the image formation lens system of Fig. 4 and the objective lens system of Fig. 3, respectively; Figs. 7A, 7B, 7C and 7D illustrate spherical aberration, sine condition, astigmatism and distortion of an optical system utilizing the image formation lens system of Fig. 4 and the objective lens system of Fig. 6, respectively; Figs. 9A, 9B, 9C and 9D illustrate spherical aberration, sine condition, astigmatism and distortion of an optical system utilizing the image formation lens system of Fig. 4 and the objective lens system of Fig. 8, respectively; Figs. 11A, 11B, 11C and 11D illustrate spherical aberration, sine condition, astigmatism and distortion of an optical system utilizing the image formation lens system of Fig. 4 and the objective lens system of Fig. 10, respectively; Fig. 12 is a schematic block diagram cf a system for measuring film thickness; and Fig. 13 is a flow chart showing a method of measuring film thickness by the system of Fig. 12. DESCRIPTION OF THE PREFERRED EMBODIMENTS An objective lens system according to the present invention includes a first to a fourth lenses disposed in that order from an object side to an image formation side with predetermined air spacings therebetween. The first lens is made of either quartz or fluorite, and has a positive power. The second and the third lenses are made of quartz, and have a negative power. The fourth lens is made of fluorite, and has a positive power. This enables the objective lens system to transmit ultraviolet and/or far ultraviolet light, and hence to be employed in ultraviolet and/or far ultraviolet range. In addition to this, the first to the fourth lenses are separated from each other by a predetermined air space; that is, the objective lens system needs no optical contact. This enables large reduction in cost for the objective lens system. Further, the first and the fourth lenses have a positive power, whereas the second and the third lenses have a negative power. This enables corrections of aberrations such as spherical and chromatic aberrations. Aberrations can be further moderated especially when the objective lens system satisfies the following inequities: 0.54 < |₁/₂| < 0.75 0.90 < |₄/₃| < 0.95 where ₁, ₂, ₃ and ₄ are the powers of the first to the fourth lenses, respectively. This is firstly because aberrations are excessively corrected (i.e., overcorrected) when an absolute value |₁/₂| is not more than 0.54, whereas aberrations can not be corrected inadequately (i.e., undercorrected) when the value not less than 0.75. Further, when an absolute value |₄/₃| is not more than 0.9, aberrations are excessively corrected (i.e., overcorrected), whereas aberrations are inadequately corrected (undercorrected) when the value not less 0.95. The objective lens system according to the first embodiment is interchangeable with other objective lens system, according to the precedent applications, for forming an image by cooperating with an image formation lens system. In the objective lens system of the first embodiment, the third lens having the negative power and the fourth lens having the positive power are provided, resulting of correction for chromatic aberration. The second lens has the large negative power, so that the objective lens system is a so-called telephoto type lens system. Thus, the focal length of the objective lens system grows larger compared to the total length thereof. The first lens has the positive power, allowing the objective lens system to have a telecentric characteristic on the object side. The composite lens system consisting of the second to the fourth lenses has a large focal length and functions as a teleconverter for the first lens. That is, the composite lens system magnifies the focal length of the first lens so as to adjust the focal length of the objective lens system to a desired value. For satisfying this condition accurately, the following equation must be satisfied: |₁/| = |₂/₃₄| where  is a power of the entire system. In practice, however, the composite lens system need not be a complete afocal system, but is only required to satisfy the following inequalities (5A) and (5B): 0.92(₁/) < |₂/₃₄| 1.07(₁/) > |₂/₃₄| As above-mentioned, the correction of the chromatic aberration is carried out by the combination of the third and fourth lenses. In the case of forming the image of the object through the third and the fourth lenses, the value |₄/₃| is preferably set within the range of 1.3 to 1.4 in consideration of the dispersion of fluorite and quartz. When the objective lens system includes the first to the fourth lenses, however, it is rather preferable to design the objective lens system so that a composite lens system consisting of the third and the fourth lenses excessively corrects the aberration, the reason being for the correction of the aberration caused by the first and second lenses. Hence, it is preferable to set the value |₄/₃| within the range of 0.90 to 0.95; that is, to set the objective lens system to satisfy the inequality (3). Furthermore, in order to give parfocality to the objective lens system of the first embodiment, the following inequality must be satisfied: 0.60·|(4/3₁-1)/₁| < |1/₂| 1.1·|(4/3₁-1)/₁| > |1/₂| In the present invention, supposed is the case where the focal point of the objective lens system on the image side is located substantially in the composite lens system consisting of the third and the fourth lenses, and where the parfocal length of the objective lens system is 3/4 times larger than the focal length thereof. Assuming that the interval between the principal points of a composite lens system, consisting of the second to the fourth lenses, is indicated by e , the condition represented by the following expression can be obtained: e+1/₁ ≒ 3/4(1/) For providing the objective lens system with the telecentric characteristic on the object side, the pupil of the composite lens system consisting of the second to the fourth lenses must be provided at the focal point of the first lens. Accordingly, the condition represented by the following expression can be obtained: e(1+1/(1+₂·e)) ≒ 3/4(1/)-2/₁ When the conditions (7) and (8) are taken into consideration, the objective lens system is required to satisfy the inequalities (6A) and (6B). A-1. First Example Fig. 3 is a block diagram of an objective lens system according to a preferred example of the first embodiment. In Fig. 3, an objective lens system 10 includes a first to a fourth lenses 11 to 14. The lenses 11 to 14 are serially arranged in that order from an object side (left-hand side of the figure) to an image side (right-hand side of the figure) with predetermined air spaces therebetween. The first and the fourth lenses 11 and 14 have a positive power, whereas the second and the third lenses 12 and 13 have a negative power. The following table 1 shows lens data of the objective lens system 10: In Table 1, the symbol r i represents radius of curvature of an i-th lens surface from the object side (left-hand side in the figure), and the symbol d i represents a distance between an i-th lens surface and an (i + 1)-th lens surface along an optical axis Z, where the subscript i is an integer from one to eight. These symbols adhere to Tables 3 to 5 given later as well. As will be understood from the Table 1, the first to the third lenses 11 to 13 are all made of quartz, while the fourth lens is made of fluorite. The focal length f of the objective lens system 10 is 60, the numerical aperture (NA) thereof is 1/24, and the image size thereof is 10.6. With respect to the wavelength of 298.06 (nm), the powers ₁, ₂, ₃ and ₄ of the first to the fourth lenses 11 to 14, the power ₃₄ of the composite lens system consisting of the third lens 13 and the fourth lens 14, and the power  of the entire system (the objective lens system 10) are as follows: ₁ = 0.0798 ₂ = -0.1099 ₃ = -0.1016 ₄ = 0.1179 ₃₄ = 0.0241  = 0.0167 Thus, |₁/₂| = 0.726 |₄/₃| = 0.925 It is obvious that the objective lens system 10 satisfies the inequalities (2) and (3). Further, 0.92(₁/) = 4.406 1.07(₁/) = 5.125 |₂/₃₄| = 4.561 It is also obvious that the objective lens system 10 satisfies the inequalities (5A) and (5B). In addition, |1/₂| = 9.099 0.60·|(4/3₁-1)/₁| = 5.424 1.1·|(4/3₁-1)/₁| = 9.944 It is also obvious that the objective lens system 10 satisfies the inequalities (6A) and (6B). The objective lens system 10 is designed as a so-called infinity corrected objective system so as to be in use within a reflecting type microscope. That is, the objective lens system 10, when used in combination with an image formation lens system, forms an image of an object on the focal plane of the image formation lens system. The image formation lens system is described in the following: Fig. 4 is a block diagram of the image formation lens system, the image formation lens system being identical to the one disclosed in the precedent applications, namely, Japanese Patent Laid-Open Gazette Nos. 1-319719 and 1-319720. In Fig. 4, an image formation lens system 150 includes a first to a third lenses 151 to 153. The first, the second and the third lenses 151, 152 and 153 are displaced in that order from an object side (left-hand side of the figure) to an image formation side (right-hand side of the figure) with predetermined air spaces therebetween. Table 2 below shows data of the image formation lens system 150. In Table 2, the symbol R i represents radius of curvature of an i-th lens surface from the object side (left-hand side in the figure), and the symbol D i represents a distance between the i-th lens surface and an (i + 1)-th lens surface along an optical axis Z. As will be understood from the Table 2, the first lens 151 is made of fluorite, the second and the third lenses 152 and 153 are both made of quartz. The focal length f′ of the image formation lens system 150 is 300. Hence, the equation below gives the imaging magnification M of a microscope utilizing the image formation lens system 150 and the objective lens system 10. M = -f′/f = -300/60 = -5.00 Figs. 5A and 5B illustrate spherical aberration and sine condition, respectively, caused in the optical system formed by the image formation lens system 150 and the objective lens system 10. In Figs. 5A and 5B (and also in Figs. 7A, 7B, 9A, 9B, 11A, 11B, 13A, 13B, 15A, 15B, 17A, 17B, 19A, 19B, 21A and 21B: provided later), alphabetic characters A, B, C and D show a value with respect to light of wavelengths of 298.06 nm, 202.54 nm, 398.84 nm and 253.70 nm, respectively. Figs. 5C and 5D illustrate astigmatism and distortion at light of a wavelength of 298.06 nm, respectively. In Fig. 5C (and in Figs. 7C, 9C, 11C, 13C, 15C, 17C, 19C and 21C), a solid line S relates to the sagittal image field while the broken line M to the meridional image field. Figs. 5A and 5B clearly show that the objective lens system 10 successfully restrains aberrations at ultraviolet and far ultraviolet light. Thus, the objective lens system 10 is employable in ultraviolet and far ultraviolet range. In addition, Figs. 5C and 5D show that serious astigmatism and distortion do not occur in the optical system utilizing the objective lens system 10. A-2. Second Example Fig. 6 is a block diagram of an objective lens system according to another example of the first embodiment. An objective lens system 20 is basically identical to the objective lens system 10 in structure. That is, the objective lens system 20 includes a first to a fourth lenses 21 to 24, the first to the fourth lenses being serially disposed in that order from an object side (left-hand side of the figure) to an image formation side (right-hand side of the figure) with predetermined air spaces therebetween. Data of the objective lens system 20 are available from Table 3. As will be understood from Table 3, the first to the third lenses 21 to 23 are all made of quartz, while the fourth lens 24 is made of fluorite. The focal length f of the objective lens system 20 is 60, the numerical aperture (NA) thereof is 1/24, and the image size thereof is 10.6. With respect to the wavelength of 298.06 (nm), the powers ₁, ₂, ₃ and ₄ of the first to fourth lenses 21 to 24, the power ₃₄ of the composite lens system consisting of the third lens 23 and the fourth lens 24, and the power  of the entire system (the objective lens system 20) are respectively as follows: ₁ = 0.2302 ₂ = -0.3155 ₃ = -0.1208 ₄ = 0.1117 ₃₄ = 0.0220  = 0.0167 Thus, |₁/₂| = 0.730 |₄/₃| = 0.925 It is obvious that the objective lens system 20 satisfies the inequalities (2) and (3). Further, 0.92(₁/) = 12.706 1.07(₁/) = 14.777 |₂/₃₄| = 14.336 It is also obvious that the objective lens system 20 satisfies the inequalities (5A) and (5B). In addition, |1/₂| = 3.169 0.60·|(4/3₁-1)/₁| = 2.355 1.1·|(4/3₁-1)/₁| = 4.318 It is also obvious that the objective lens system 20 satisfies the inequalities (6A) and (6B). The objective lens system 20 is an infinity corrected objective system, similarly to the objective lens system 10, and acts in combination with the image formation lens system 150. Hence, the equation below gives the imaging magnification M of a microscope utilizing the image formation lens system 150 and the objective lens system 20. M = -f′/f = -300/60 = -5.00 Figs. 7A and 7B illustrate spherical aberration and sine condition, respectively, in the optical system utilizing the objective lens system 20 and the image formation lens system 150, while Figs. 7C and 7D showing astigmatism and distortion at light of a wavelength of 298.06 nm, respectively. According to Figs. 7A and 7B, serious aberrations at ultraviolet and far ultraviolet light do not occur in the objective lens system 20. Thus, the objective lens system 20 is obviously employable in ultraviolet and far ultraviolet range. In addition, astigmatism and distortion are restrained in the optical system in which the objective lens system 20 is used (according to Figs. 7C and 7D). A-3. Third Example Fig. 8 is a block diagram of an objective lens system according to further example of the first embodiment. An objective lens system 30 is basically identical to the objective lens system 10 in structure. That is, the objective lens system 30 includes a first to a fourth lenses 31 to 34, the first to the fourth lenses being serially disposed in that order from an object side (left-hand side of the figure) to an image formation side (right-hand side of the figure) with predetermined air spaces therebetween. Data of the objective lens system 30 are available from Table 4. As will be understood from Table 4, the first to the third lenses 31 to 33 are made of quartz, whereas the fourth lens 34 is made of fluorite. The focal length f of the objective lens system 30 is 60, the numerical aperture (NA) thereof is 1/24, and the image size thereof is 10.6. With respect to the wavelength of 298.06 (nm), the powers ₁, ₂, ₃ and ₄ of the first to the fourth lenses 31 to 34, the power ₃₄ of the composite lens system consisting of the third lens 33 and the fourth lens 34, and the power  of the entire system (the objective lens system 30) are respectively as follows: ₁ = 0.0771 ₂ = -0.1182 ₃ = -0.1268 ₄ = 0.1202 ₃₄ = 0.0265  = 0.0167 Thus, |₁/₂| = 0.652 |₄/₃| = 0.948 It is obvious that the objective lens system 30 satisfies the inequalities (2) and (3). Further, 0.92(₁/) = 4.257 1.07(₁/) = 4.951 |₂/₃₄| = 4.458 It is also obvious that the objective lens system 30 satisfies the inequalities (5A) and (5B). In addition, |1/₂| = 8.458 0.60·|(4/3₁-1)/₁| = 5.538 1.1·|(4/3₁-1)/₁| = 10.153 It is also obvious that the objective lens system 30 satisfies the inequalities (6A) and (6B). The objective lens system 30 is an infinity corrected objective system, similarly to the objective lens system 10, and acts in combination with the image formation lens system 150. Hence, the equation below gives the imaging magnification M of a microscope utilizing the image formation lens system 150 and the objective lens system 30. M = -f′/f = -300/60 = -5.00 Figs. 9A and 9B illustrate spherical aberration and sine condition, respectively, in the optical system utilizing the objective lens system 30 and the image formation lens system 150, while Figs. 9C and 9D showing astigmatism and distortion at light of a wavelength of 298.06 nm, respectively. According to Figs. 9A and 9B, serious aberrations at ultraviolet and far ultraviolet light do not occur in the objective lens system 30. Thus, the objective lens system 30 is obviously employable in ultraviolet and far ultraviolet range. In addition, astigmatism and distortion are restrained in the optical system in which the objective lens system 30 is used (according to Figs. 9C and 9D). A-4. Fourth Example Fig. 10 is a block diagram of an objective lens system according to further example of the first embodiment. An objective lens system 40 is identical to the objective lens system 10 in structure. That is, the objective lens system 40 includes a first to a fourth lenses 41 to 44, the first to the fourth lenses being serially disposed in that order from an object side (left-hand side of the figure) to an image formation side (right-hand side of the figure) with predetermined air spaces therebetween. Data of the objective lens system 40 are available from Table 5. As will be understood from Table 5, the first and the fourth lenses 41 and 44 are made of fluorite, whereas the second and the third lenses 42 and 43 are made of quartz. The focal length f of the objective lens system 40 is 60, the numerical aperture (NA) thereof is 1/24, and the image size thereof is 10.6. With respect to the wavelength of 298.06 (nm), the powers ₁, ₂, ₃ and ₄ of the first to the fourth lenses 41 to 44, the power ₃₄ of the composite lens system consisting of the third lens 43 and the fourth lens 44, and the power  of the entire system (the objective lens system 40) are respectively as follows: ₁ = 0.1095 ₂ = -0.1990 ₃ = -0.1436 ₄ = 0.1311 ₃₄ = 0.0285  = 0.0167 Thus, |₁/₂| = 0.550 |₄/₃| = 0.913 It is obvious that the objective lens system 40 satisfies the inequalities (2) and (3). Further, 0.92(₁/) = 6.043 1.07(₁/) = 7.028 |₂/₃₄| = 6.989 It is also obvious that the objective lens system 40 satisfies the inequalities (5A) and (5B). In addition, |1/₂| = 5.026 0.60·|(4/3₁-1)/₁| = 4.369 1.1·|(4/3₁-1)/₁| = 8.009 It is also obvious that the objective lens system 40 satisfies the inequalities (6A) and (6B). The objective lens system 40 is an infinity corrected objective system, similarly to the objective lens system 10, and acts in combination with the image formation lens system 150. Hence, the equation below gives the imaging magnification M of a microscope utilizing the image formation lens system 150 and the objective lens system 40. M = -f′/f = -300/60 = -5.00 Figs. 11A and 11B illustrate spherical aberration and sine condition, respectively, in the optical system utilizing the objective lens system 40 and the image formation lens system 150, while Figs. 11C and 11D showing astigmatism and distortion at light of a wavelength of 298.06 nm, respectively. According to Figs. 11A and 11B, serious aberrations at ultraviolet and far ultraviolet light do not occur in the objective lens system 40. Thus, the objective lens system 40 is obviously employable in ultraviolet and far ultraviolet range. In addition, astigmatism and distortion are restrained in the optical system in which the objective lens system 40 is used (according to Figs. 11C and 11D). A-5. Effect of First Embodiment The objective lens systems 10, 20, 30 and 40 according to the first embodiment are all employable in ultraviolet and/or far ultraviolet range and display excellent properties at light of these ranges. Moreover, in the objective lens systems of the first embodiment, the first to the fourth lenses are separated from each other. This eliminates optical contact between the lenses, and hence would successfully lead to cost reduction. Though not having especially described in the specification, it is confirmed that aberrations at visible and infrared light are also effectively restrained according to the present invention. Thus, the objective lens systems 10, 20, 30 and 40 are employable in a very wide range, i.e., from infrared to far ultraviolet. Now referring again to the precedent applications, the objective lens system 160 (Fig. 2) is combined with the image formation lens system 150, thereby to obtain the imaging magnification M of -10. More precisely, the focal length of the objective lens system 160 is 30, whereas the focal length of any of the objective lens systems 10, 20, 30 and 40 is 60. Hence, the imaging magnification M can be varied from -10 to -5 by replacing, for instance, the objective lens system 160 with the objective lens system 10 of the first embodiment while fixing the image formation lens system 150 in the same position. Each of the objective lens systems 10, 20, 30 and 40 has a parfocal relation with respect to the objective lens system 160 as set forth. This eliminates time consuming process of bringing the microscope into focus after replacement (for example, after the objective lens system 10 has replaced the objective lens system 160), whereby operation of the microscope would be greately improved. The objective lens systems 10, 20, 30 and 40 have a pupil diameter of which roughly coincides with the pupil of the objective lens system 160. In consequence, the replacement accompanies only negligible changes in quantity of illumination light onto an object, promising fairy good observation. Fig. 12 is a schematic block diagram of a system 102 for measuring film thickness. The system 102 includes a microspectroscope 101 for detecting spectrum of a sample to be measured and an arithmetic unit 103 for calculating the film thickness of the measured sample S on the basis of spectral data obtained by the microspectroscope 101. The microspectroscope 101 includes an illuminating optical system 110, a microscopic optical system 120, a reflecting mirror 130, a spectroscopic unit 140, and a monitoring optical system 145. The illuminating optical system 110 includes a light source 111 for projecting light which includes ultraviolet and far ultraviolet rays, a condenser lens 112, an aperture stop 113, a field stop 114 and another condenser lens 115. Thus, illuminating light from the light source 111 is guided to the microscopic optical system 120 through the condenser lens 112, the aperture stop 113, the field stop 114 and the condenser lens 115. The microscopic optical system 120 includes an objective lens system 121 which is identical to that shown in Fig. 3, an image formation lens system 124 which is identical to that shown in Fig. 4 and a beam splitter 123 provided between the objective lens system 121 and the image formation lens system 124. Symbol 122 denotes a pupil position of the objective lens system 121. The illuminating light from the light source 111 passes through the condenser lens 112, the aperture stop 113, the field stop 114 and the condenser lens 115, and is guided to the objective lens system 121 by the beam splitter 123. The illuminating light is through the objective lens system 121 and is applied onto the surface of a measured sample S. The sample S is supported by a sample holder (not shown). Reflected light from the surface of the measured sample S is enlarged by the lens 121 and imaged at a position close to the reflecting mirror 130, the beam splitter 123 and the image formation lens system 124. The reflecting mirror 130 is provided with a pinhole 131. Reflected light L S passing through the pinhole 131 enters the spectroscopic unit 140. The spectroscopic unit 140 is formed by a diffraction grating 141 for separating the reflected light L S into spectral components and a photo detector 142 for detecting the spectrum of the spectrally diffracted light. The diffraction grating 141 may be prepared by a flat field type diffraction grating which images a spectrum on a flat plane. Alternatively, the diffraction grating may have a sweeper. The photo detector 142, which is formed by a photodiode array or a CCD, for example, is conjugate with the pinhole 131. Alternatively, the photo detector 142 may include a photomultiplier. Since the spectroscopic unit 140 has the aforementioned structure, the reflected light L S is separated into its spectral components by the diffraction grating 141, and the respective spectral components are received by the photo detector 142, which in turn outputs a signal corresponding to the spectrum of the light L S . The light reflected by the reflecting mirror 130 enters the monitoring optical system 145, and is imaged at an image-formation position 147 through a relay lens 146. Thus, an enlarged image of the surface of the sample S is imaged on an image-formation plane, so that the measuring position of the sample S can be confirmed and focusing can be performed on the basis of the enlarged image. Fig. 13 is a flow chart of a method of measuring film thickness. Prior to using the measuring system 102, an operator inputs spectrum data B(λ) of a sample (hereinafter referred to as "standard sample"), whose spectrum data is known, in the arithmetic unit 103 through a keyboard (not shown), to store the data in a memory (not shown) provided in the arithmetic unit 103. The standard sample may be prepared by a silicon substrate, a substrate which is deposited with aluminum on its surface, or the like. Then the operator sets the standard sample on the sample holder of the microspectroscope 101 (step S1), and supplies a command for detecting calibration data to the arithmetic unit 103. In response to a command from the arithmetic unit 103, the microspectroscope 101 detects the spectrum of the standard sample, to store data B′(λ) relating to the spectrum in the memory of the arithmetic nit 103 (step S2). Then, the operator removes the standard sample from the microspectroscope 101 and sets the measured sample S on the sample holder (step S3). Thereafter, the operator supplies a command to the arithmetic unit 103 to start measurement, so that the microspectroscope 101 detects the spectrum of the measured sample S in response to a command from the arithmetic unit 103, to store data S′(λ) relating to the spectrum thereof in the memory of the arithmetic unit 103 (step S4). The data S′(λ), B(λ) and B′(λ) stored in the memory are read (step S5) into the arithmetic unit 103, to obtain data S(λ) in accordance with the following expression: S(λ) = B(λ) B′(λ) · S′(λ) The data S(λ) corresponds to a signal from the microspectroscope 101 on the assumption that absolutely no influence is caused by the factors such as spectral transmittance characteristics of the illuminating optical system 110 and the microscopic optical system 120. In other words, the data S(λ) shows the true spectrum of the measured sample S. On the basis of the data S(λ) obtained during step S5, the arithmetic unit 103 calculates the thickness of the thin film (step S6). The principle of calculates film thickness is well known in the art, and hence description thereof is omitted. As understood from the expression (21), the data S′(λ) relating to the actually measured spectrum is calibrated in the aforementioned manner to obtain the data S(λ) relating to the true spectrum, whereby the film thickness can be accurately measured. The present invention can be employed within the restricted to use within a system for measuring film thickness. The invention has general applications as an objective lens optical system.

Claims: An objective lens system for use within a microscope, comprising : a first lens (11, 21, 31, 41) made of quartz or fluoride, said first lens having a positive power; a second lens (12, 22, 32, 42) made of quartz, said second lens having a negative power; characterized by a third lens (13, 23, 33, 43) made of quartz, said third lens having a negative power; a fourth lens (14, 24, 34, 44) made of fluorite, said fourth lens having a positive power; wherein said first to said fourth lenses (11 - 16, 21 - 26) are disposed in that order from an object side to an image formation side with predetermined air spacings therebetween, wherein the following inequalities are satisfied: 0.54 < | ₁ / ₂ | < 0.75 0.90 < | ₄ / ₃ | < 0.95 where ₁, ₂, ₃ and ₄ are the powers of said first to said fourth lenses, respectively. A microscope comprising an objective lens system according to claim 1, which is interchangeably mounted in said microscope, and another objective lens system for forming an image at a predetermined imaging magnification. An apparatus for measuring the thickness of a film on a sample, said apparatus comprising: means for illuminating a sample; and a microscopic optical system for imaging ultraviolet and/or far ultraviolet light from said sample, said microscopic optical system including an objective lens system for converging said light in an image formation direction, characterized by an objective lens system in accordance with claim 1.

Inventors: HAYASHI TAKAHISA DAINIPPON SCR, HAYASHI, TAKAHISA, DAINIPPON SCREEN MFG. CO., LTD
Applicants: DAINIPPON SCREEN MFG, DAINIPPON SCREEN MFG. CO., LTD.
Application year: 1991
Main classification: G02B21
IPC codes: G02B1, G02B13, G02B21