Position detecting method

Abstract: A position detecting method is disclosed wherein a radiation beam is projected to a grating pattern on a substrate, wherein a diffraction beam from the pattern and a reflectively scattered beam (13′) from an edge of a peripheral portion of the pattern are received by a sensor array (1) and wherein the position of the substrate is determined on the basis of a signal from the sensor array. On the sensor array, the diffraction beam and the reflectively scattered beam are substantially separated from each other. From a signal produced by the sensor array, a signal corresponding to the diffraction beam is extracted. The position of the substrate is determined on the basis of the extracted signal.

Description: This invention relates generally to a position detecting method suitably usable, for example, in a semiconductor microcircuit device manufacturing exposure apparatus for lithographically transferring a fine electronic circuit pattern formed on the surface of a first object (original) such as a mask or reticle (hereinafter simply "mask") onto the surface of a second object (workpiece) such as a wafer, for relatively positioning or aligning the mask and the wafer. In exposure apparatuses for use in the manufacture of semiconductor devices, the precision of relative alignment of a mask and a wafer is one important factor in respect to ensuring improved performance. Particularly, as for alignment systems employed in recent exposure apparatuses, submicron alignment accuracies or more strict accuracies are required in consideration of the demand for higher degree of integration of semiconductor devices. In many types of alignment systems, features called "alignment patterns" are provided on a mask and a wafer and, by utilizing positional information obtainable from these patterns, the mask and wafer are aligned. As for the manner of executing the alignment, as an example there is a method wherein the amount of relative deviation of these alignment patterns is detected on the basis of image processing. Another method is proposed in U.S. Patent No. 4,704,033 wherein so-called zone plates are used as alignment patterns upon which light is projected and wherein the quantity of light on a predetermined plane from the illuminated zone plates is detected. Generally, an alignment method utilizing a zone plate is relatively insensitive to any defect of an alignment pattern and therefore assures relatively high alignment accuracies, as compared with an alignment method simply using a traditional alignment pattern. Figure 1 is a schematic view of a known type alignment system utilizing zone plates. Figure 2 illustrates alignment marks of a mask and a wafer. The mask 18 is provided with four alignment marks 21 each being formed by a linear zone plate, and the wafer 19 is provided with four alignment marks 22 each being formed by a grating pattern having square dots (grating elements) arrayed in a line with regular pitch. In each linear zone plate 21, the direction in which the linear zone plate has a light converging or diverging function (i.e., power) is the direction with respect to which any positional error is to be detected. Hereinafter, such direction will be referred to also as "positional deviation detecting direction" or "alignment detecting direction". Light beam B1 projected from a light source S is inputted by way of a mirror 17 to a zone plate 21 along a plane, which contains a normal Z to the center of the zone plate and which is perpendicular to the positional deviation detecting direction, obliquely at a certain angle Φ with respect to the normal (z axis). By this zone plate 21, the light is converged rectilinearly on the wafer surface. Then, the light is diffracted by a corresponding grating pattern 22, such that it emanates from the wafer along a plane (plane of incidence), containing a normal and the path of the beam B1, at an angle as determined by the pitch of the grating pattern 22. Thus, the light emanates from the wafer as a signal light B2 which, after being reflected by the mirror 17, impinges on a photodetector D. The spacing between the mask 18 and the wafer 19 is illustrated in the drawing in an enlarged scale. Actually, the mask 18 and the wafer 19 are very close to each other with a gap of an order of 100 microns or less. If the mask 18 and the wafer 19 have relative positional deviation, the quantity of signal light B2 produced by the diffraction through the grating pattern 22 changes. This causes a change in the quantity of light as received by the photodetector D. Once such a change is detected, it is possible to correct the positional deviation between the mask 18 and the wafer 19 by using a control means, not shown. If, as an example, the zone plate 21 and the grating pattern 22 are designed so that the center of the linearly focused light spot as formed on the wafer 19 surface by the zone plate 21 of the mask is aligned with the center of the grating pattern 22 of the wafer 19 with respect to the positional deviation detecting direction when the mask 18 and the wafer 19 are placed in correct alignment with each other, then the correct alignment of the mask and the wafer can be discriminated as the quantity of light received by the photodetector D becomes maximum. Namely, for alignment, the wafer 19 is displaced in the positional deviation detecting direction until the quantity of light received by the photodetector becomes maximum. In this illustrated example, however, each zone plate 21 or each grating pattern is set so that the edge of its outer peripheral part extends substantially perpendicularly to the light incident thereon. Additionally, detection of the signal light B2 uses the light path near the plane of incidence. This results in a problem of high possibility that regularly-reflected scattered light produced by such edge and having high intensity enters the light receiving surface of the photodetector as strong noise light. Here, the regularly-reflected scattered light means such a scattered light as produced by an edge of a pattern and having a distribution of rays, distributed about a reflected ray produced by the reflection, according to the law of reflection, of a chief ray of a beam inputted to the reflection surface of the edge. The edge of a pattern can be considered as a cylindrical reflection surface having an infinitely small radius and having a generating line extending in parallel to the elongating direction of the edge. Particularly, in a mask to be used in an X-ray exposure apparatus, the mask pattern has a large thickness and such a regularly-reflected scattered light is strong. Figures 3A - 3C illustrate an edge 12 of an alignment pattern and a part around the light receiving surface 14 of the photodetector D, wherein Figure 3A is a front elevational view, Figure 3B is a top plan view and Figure 3C is a side sectional view. In Figures 3A - 3C, when a light beam B1 impinges on the edge portion 12 of the pattern, scattered light 13 is produced at this edge portion 12. Here, almost all the scattered light 13 is produced within a certain range about and close to the direction of advancement of a regularly reflected light 13' which is produced by the regular reflection of the chief ray of the inputted light B1 by the edge 12, as seen in Figure 3B. In Figures 3B and 3C, a broken line depicts the intensity distribution of the rays of the scattered light 13 having different angles. Figure 3A illustrates the distribution of the regularly-reflected scattered light 13' in the plane of incidence. It is seen that strong scattered light is incident at the central part of the light receiving surface 14 of the photodetector. The incidence of such regularly-reflected scattered light prevents enhancement of precision for the detection of the position of an article such as a mask or wafer. It is accordingly a primary object of the present invention to provide a position detecting method by which the position of an article to be examined can be detected with enhanced correctness and precision. According to one aspect the present invention provides a position detecting method, comprising the steps of projecting a radiation beam to a grating pattern on a substrate, wherein a diffraction beam is generated from the grating pattern and a reflectively scattered beam is generated from an edge of a peripheral portion of the grating pattern or an edge of a peripheral portion of another pattern adjacent to the grating pattern, receiving said diffraction beam using a sensor array, and determining the position of the substrate on the basis of a signal from the sensor array, characterized in that: the diffraction beam and the reflectively scattered beam are generated at an angle to one another and impinge upon the sensor array substantially separated from each other; a signal produced by the sensor array is processed to determine a particular picture element, within a region where the reflectively scattered beam is incident, which element provides a largest output, and to exclude outputs of those picture elements which are within a predetermined range about the particular picture element; and the position of the substrate is determined on the basis of the signal produced by picture elements outside the predetermined range. According to a second aspect the present invention provides position detecting apparatus comprising: projection means for projecting a radiation beam to a grating pattern on a substrate, whereby a diffraction beam is generated from the grating pattern and a reflectively scattered beam is generated from an edge of a peripheral portion of the grating pattern or an edge of a peripheral portion of another pattern adjacent to the grating pattern; a sensor array for receiving said diffraction beam; and processing means for determining the position of the substrate on the basis of a signal from the sensor array (1); characterised in that the diffraction beam and the reflectively scattered beam are generated at an angle to one another and impinge upon the sensor array substantially separated from each other; and said processing means is operative to determine a particular picture element of said sensor array within a region where the reflectively scattered beam is incident, which element provides a largest output, to exclude outputs of those picture elements which are within a predetermined range about the particular picture element, and to determine the position of the substrate on the basis of the signal produced by picture elements outside the predetermined range. Embodiments of the present invention will now be described with reference to the accompanying drawings, in which: Figure 1 is a perspective view, schematically showing a position detecting system of known type. Figure 2 is a schematic view, showing a mask alignment mark and a wafer alignment mark used in the Figure 1 system. Figures 3A - 3C are schematic representations, respectively, for explaining the production of regularly-reflected scattered light. Figures 4A - 4C show a first embodiment of the present invention, wherein Figure 4A is a perspective view of a position detecting system according to this embodiment, Figure 4B is an enlarged top plan view of a mask mark and Figure 4C is an enlarged top plan view of a wafer mark. Figures 5A - 5C illustrate regularly-scattered light in the first embodiment of the present invention, wherein Figure 5A is a front view of the detector, Figure 5B is a top view showing the detector and an edge of a mask mark, and Figure 5C is a side sectional view of the mask mark. Figure 6 is a schematic view for explaining the range setting of a sensor array, for detection of signal light and regularly-reflected light. Figure 7 is a flow chart showing the alignment procedure in the embodiment of Figure 4A. Figure 8 is a perspective view schematically showing a position detecting system according to another embodiment of the present invention. Figures 9A - 9E show a position detecting system according to a further embodiment of the present invention, wherein Figure 9A is a top view showing a mask and a detector, Figure 9B is a top view showing a mask mark, Figure 9C is a side sectional view showing a mask mark and diffraction light, Figure 9D is a top view showing a wafer mark and reflective diffraction light, Figure 9E is a side sectional view showing a wafer mark and reflective diffraction light. Figure 10 is a schematic view for explaining the relationship of diffraction light and reflectively scattered light to a detection zone on a sensor array in the embodiment of Figure 9A. Figure 11 is a flow chart showing the gravity center position determining procedure in the embodiment shown in Figure 8 or 9A. Figures 4A - 4C illustrate a first embodiment of the present invention, wherein Figure 4A is a perspective view of a major part of this embodiment and Figures 4B and 4C are enlarged top plan views of marks (121 and 22) provided on a mask (first object) 18 and a wafer (second object) 19, respectively, for the position detection. Each mark 121 comprises a linear zone plate, while each mark 22 comprises a linear grating pattern provided by an array of rectangular patterns. This embodiment differs from the position detecting system of the Figure 1 example in the point of the shape of each mark on the mask 18 surface and the arrangement of the detector as well as the signal processing manner. The structure of the remaining portion is essentially the same as the Figure 1 example. More specifically, in the present embodiment, light B 1 projected from a light source S is reflected by a mirror 17 and then is incident on a zone plate 121 within a plane (incidence plane) (y-z plane), containing a normal (z axis) to the center of the mark 121 and being perpendicular to the positional deviation detecting direction (x axis), with a certain angle  with respect to the normal (z axis) to the center of the zone plate. Under the influence of the optical power of the zone plate 121, the received light is converged linearly on the wafer 19 surface to provide a linear beam. This linear beam is diffracted by a linear grating pattern 22 on the wafer 19 surface and it emanates in the incidence plane (y-z plane) as a signal light B 2 with a predetermined angle different from the angle  and determined by the pitch of the pattern 22. Then, it is reflected by the mirror 17 and is received by a detector 1 comprising a sensor array. If the wafer 19 is deviated in the alignment direction (x direction) with respect to the mask 18, from a predetermined position, the light quantity of the beam B 1 diffracted by the pattern 22 on the wafer 19 surface changes in accordance with the amount of the deviation. As a result, the light quantity of the signal light B 2 as received by the detector 1 changes accordingly. Thus, by detecting this light quantity, the positional deviation of the wafer 19 to the mask 18 can be detected and then corrected under the control of a control means 100, including a processing circuit 101 and a driving system 102. Here, the marks 121 and 22 are so designed that, when the mask 18 and the wafer 19 are in correct alignment with each other, the center line of the linear beam upon the wafer 19 surface coincides with the center line of the pattern 22, such that "zero (0) positional deviation", i.e., "correct alignment" can be discriminated through the processing circuit as the light quantity received by the detector 1 is maximum. Namely, the wafer 19 is so displaced by the driving system 102 in the positional deviation detecting direction that the light quantity of the signal light B 2 changes to its highest level and, by doing so, the alignment of the mask 18 and the wafer 19 can be achieved. In this embodiment, as best seen in Figure 4B, each pattern of the zone plate 121 has it ends 12 cut obliquely and symmetrically with respect to the center line 21a of the zone plate 121. As described, the input beam B 1 impinging on the zone plate 121 is incident thereon with an angle  with respect to a normal to the mask 18 surface, within a plane (incidence plane ) (y-z plane) containing the normal to the mask surface and being perpendicular to the positional deviation detecting direction (x direction). The detector 1 receives the diffraction light B 2 coming. thereto along the incidence plane (y-z plane) of the input beam B 1 , to the input beam B 1 side of the normal. Since the ends 121 are cut obliquely as shown in Figure 4B (with an angle 3.5 deg. to the positional deviation detecting direction, in this example), the regularly-reflected scattered light from each end (edge) 12 does not advance along the incidence plane (in which the paths of the input beam B 1 and the signal light B 2 are included), except for the direction of the normal. Consequently, around the center of the detector 1 which is so disposed as to receive the diffraction light (signal light) B 2 coming along the incidence plane (not in the direction of the normal), the regularly-reflected scattered light does not impinge thereon. Rather, it impinges on a peripheral portion of the detector 1. Thus, the signal light B 2 and the regularly-reflected scattered light are surely separated from each other, upon the detector 1 surface. Figures 5A - 5C illustrate regularly-reflected scattered light 13' from an edge 12 (Figure 4B) of a mark 121, wherein Figure 5A is a front view of the detector 1, Figure 5B is a top view showing a portion the mark 121 adjacent to the detector 1, and Figure 5C is a side sectional view of the edge of the mark 121. In Figures 5B and 5C, the edge 12 of the mark 121 is shown in an enlarged scale. If the projection to the x-y plane of the mark 121 is such as shown in Figure 5B, the light B 1 obliquely incident on the edge 12 of the mark 121 with an angle  (3.5 deg. in this example) with respect to a normal 15 to the x-y plane of the edge 12, is reflected in the direction of regular reflection, denoted at 13b, having the same or symmetrical angle  with respect to the normal, to thereby provide a regularly-reflected scattered light 13 which has a substantial intensity. Viewing such regularly-reflected scattered light 13 in terms of the projection to the incidence plane (y-z plane), as shown in Figure 5C, it is seen that the scattered light 13 consists of light rays scatted by the edge 12 in unlimited directions. Also, upon the detection surface (light receiving surface) of the detector 1, the regularly-reflected scattered light 13' impinges in the form of a linear beam, as shown in Figure 5A. The detector 1 may comprise a one-dimensional sensor of charge coupling type (such as a CCD linear sensor), for example, with picture elements of a number 2048 of a picture element size of 13 (transverse) x 130 (longitudinal) (microns), adapted to execute photoelectric conversion. The electric charges accumulated through photoelectric conversion by the picture elements are transferred from the picture elements to a shift register and then through a charge detecting means. After passed through an output amplifier, comprising a source follower, they are outputted from the sensor, and the light intensities corresponding to the picture elements of the detector 1 are memorized into a waveform memory of the processing circuit 101. After analog-to-digital conversion, the data is transferred to a microcomputer of the processing circuit 101. In the microcomputer, the transferred data of "256 gradations" corresponding to the light quantities received by the picture elements of the detector 1 is processed in the manner to be described below. First, the detection surface (light receiving surface) of the detector 1 is divided into plural regions, that is, a first region (signal light detecting region) for detecting the signal light B 2 which bears positional information related to the relative position of the wafer 19 relative to the mask 18, and a second region (regularly-reflected scattered light detecting region) for detecting noise light consisting of the regularly-reflected scattered light. This is illustrated in Figure 6 which is a schematic view of the detection surface of the detector 1 of the present embodiment. In the drawing, denoted at 1a is the signal light detecting region, and denoted at 1b is the regularly-reflected scattered light detecting region. Since in this embodiment each end (edge) 12 of the mark 121 patterns has been cut obliquely and symmetrically with respect to the center line 21a, there is a possibility that a pair of regularly-reflected scattered lights 13' produced by the edges 12 of upper and lower patters, at upper and lower sides of the center line 1a, impinge on the detection surface of the detector 1. However, for simplicity, only one regularly-reflected scattered light 13' is illustrated in the drawing. In Figure 6, the range setting is based on prediction of such a picture element area of the detection surface of the detector 1 on which regularly-reflected scattered light 13' of large intensity is to be incident. The prediction may be done on the basis of the arrangement of the mark 121 as well as the disposition of the components of the system. However, the range setting to the detection surface of the detector 1 may be done on the basis of an intensity distribution of detected light itself. For example, first the regularly-reflected light detecting region may be determined roughly and, then, such a picture element showing a maximal level, of the picture elements in that region showing a certain level not lower than a predetermined, may be determined. Then, about the determined position (picture element), a certain picture element range ± m (m may be determined appropriately in accordance with the design) may be defined as the detecting region 1b for the detection of the regularly-reflected scattered light. The remaining area may be determined as the signal light detecting region 1a. Next, without using the picture element data corresponding to the region 1b, the microcomputer of the processing circuit 101 executes integration of the picture element data corresponding to the signal light detecting region 1a. In this integration, weighting based on the position of each picture element may be done. After this, like the Figure 1 example, the wafer 19 or the mask 18 is moved by the driving system 102 along the positional deviation detecting direction (x direction) until the quantity of the signal light becomes maximum. By this, the mask-to-wafer alignment is completed. Thereafter, the mask and the wafer are exposed with light, for example, whereby the circuit pattern of the mask is printed on the wafer, for production of semiconductor chips. Figure 7 is a flow chart showing the alignment procedure according to this embodiment of the present invention. Figure 8 is a schematic view showing a major part of a second embodiment of the present invention. In this embodiment, light emanating from a light source 23 is collected by a light projecting lens system 24 and, after being reflected by a reflection mirror 25, it is projected obliquely onto a first physical opticelement (such as a grating lens) 221 comprising an amplitude type or phase type zone plate, for example, provided on a mask (first object) 18 and having a rectangular peripheral shape. The first physical opticelement 221 has an optical power and has a light converging function, and the emitted diffraction light is converged at a point spaced from the first physical opticelement by a predetermined distance. Then, this diffraction light is incident on a second physical opticelement (such as a grating lens) 222 comprising a phase type or amplitude type zone plate, for example, provided on a wafer (second object) 19 disposed at a predetermined distance from the mask 18. The second physical opticelement 222 has a light converging function like that of the first physical opticelement 221 or a light diverging function. The light emitted by the second physical opticelement 222 (i.e. the diffraction light diffracted again by the element 222) passes through the first physical opticelement 221 and it is converged by a condensing lens 26 upon the detection surface of a detector 1 which comprises a sensor array. Namely, in this embodiment, the diffraction image of the first physical opticelement 221 is imaged in an enlarged scale by the second physical optic element 222. Here, in accordance with any relative positional deviation Δσ of the mask (first object) 18 and the wafer (second object) 19 in the x direction, there is produced a displacement Δδ of the gravity center position of the light incident on the detection surface of the detector 1, in the direction of the array of its sensors. This is because, since the point of convergence of the light by the first physical optic element (which point is an object point) displaces relatively to the second physical opticelement 222, the point of convergence of the emitted light on the detection surface of the detector 1 (which is the image of the first-mentioned point of convergence) displaces, too. The quantity Δδ of displacement of the gravity center position of the light on the detection surface is substantially proportional to the relative positional deviation Δσ between the first and second objects. Such proportional relationship can be detected beforehand. Also, on the basis of trial printing, for example, as the mask 18 is set, such gravity center position of the incident light upon the detection surface as assumed when the mask 18 and the wafer 19 have no relative positional deviation, may be determined as a reference position. Then, during an actual positional deviation detection operation, a displacement Δδ of the gravity center position of the received light from the reference position, in the direction of the array of the sensors, can be detected by the processing circuit 101. Thus, from the above proportional relationship, the positional deviation Δσ of the wafer 19 with respect to the mask 18 can be determined. Driving means 102 then moves the wafer 19 so as to correct the detected positional deviation, whereby the mask-to-wafer alignment is accomplished. After this, the mask and the wafer are exposed with light or the like, whereby a circuit pattern of the mask is printed on the wafer, for manufacture of semiconductor chips. Here, the term "center of gravity of light" means such a point that, when on the light detection surface the position vector of each point on that surface is multiplied by the light intensity of that point and the thus obtained products are integrated over the entire section, the integrated value has a "zero vector". In this embodiment, as illustrated, the displacement Δδ of the gravity center position on the detection surface, of the light (diffraction light) provided by the light 27, is detected and, on the basis of this, the relative positional deviation Δσ of the mask (first object) 18 and the wafer (second object) 19 is detected. Also in this embodiment, each edge of the patters constituting the marks 221 and 222 is cut obliquely, like the preceding embodiment, and it is assured that upon the detector 1 surface the diffraction light 27 is separated from the regularly-reflected scattered light from these edges of the mark patterns. Thus, the displacement Δδ can be detected with selection of the diffraction light 27, in the same manner as the preceding embodiment. Referring next to Figures 9A - 9E and 10, another embodiment of the present invention will be explained. The basic alignment structure of this embodiment is essentially the same as that of the embodiment shown in Figure 8. In this embodiment, a particular note is given to such occasion that, in the neighborhood of a position detecting mark 221 on a mask 18 or a wafer 19, there is a pattern (such as a circuit pattern) separate from the mark 221 and that regularly-reflected scattered light from an edge of this pattern has an adverse effect. In this embodiment, a projected light beam 11a has a substantial expansion on the mask 18 surface and is incident on a region 30 around the mark 221. Here, of the edge scattered lights 13a' - 13c' produced from the circuit pattern 29, the light 13c' is received by the detector 1. The output signal of the detector 1 corresponding to the light 13c' is processed appropriately by a signal processing circuit such at at 101 shown in Figure 8. In this embodiment, as illustrated in Figure 9A showing the path in the projection to the mask 18 surface (x-y plane), the path for the light 11a to be projected from a light projecting system (Figure 8) is set to be perpendicular to the direction of a scribe line 20M of the circuit pattern 29 on the mask 18. Also, the optical components are so set that, while the regularly-reflected scattered lights 13a' - 13c' from straight edges of the circuit pattern 29, parallel to the scribe line 20M direction, go back along the direction of light projection as depicted by broken lines, the axis of light reception of the detector 1 is inclined by an angle  with respect to the direction of incidence of the light, and that the flux of the regularly-reflected scattered lights 13a' - 13c' from the edges advances in a direction different from that of emission of the diffraction light 27 from the marks 221 and 222. This assures that the diffraction light 27 is separated from the regularly-reflected scattered light 13c', upon the detector 1 surface. In this case, the regularly-reflected lights 13a' - 13c' produced by the circuit pattern 29 are scattered into 360 deg. directions about each straight portion of the edges. Thus, they are scattered into a range of about the width of the region 30 as defined by the projected light beam 11a, and they expand to the entire region sandwiched between the lights 13b' and 13c'. In this embodiment, the path of light projection and light reception is so set as illustrated in Figures 9B - 9E. Figures 9B and 9D each corresponds to the x-y plane, and Figures 9C and 9E each corresponds to the y-z plane. Figure 9B shows an alignment mark 221 of the mask 18, and it is so designed as to deflect the projected light beam 11a right down, as shown in Figures 9B and 9C, with convergence. Figure 9D shows an alignment mark 222 of the wafer 19, and it is so designed as to deflect the diffraction light 27 with divergence, as shown in Figures 9D and 9E. Figure 10 is a schematic view for explaining the signal light 27 and the edge scattered light 13c' upon the detector 1 surface of the present embodiment. Like the first embodiment, the detector 1 comprises a charge coupling type one-dimensional sensor (such as a CCD linear sensor) with a photoelectrically converting function, having picture elements of a number 2048 with a picture element size of 13 (transverse) x 130 (longitudinal) (microns). In this embodiment, the gravity center position upon the detector 1 surface of the signal light 27, emanating from the mark (physical optic element) 221 and bearing positional information, displaces from a position 27a to a position 27b, in accordance with the relative positional deviation between the mask 18 and the wafer 19. The reference position corresponding to the attainment of correct alignment of the mask and the wafer, is at an intermediate position between the positions 27a and 27b. On the other hand, the regularly-reflected scattered light 13c' from an edge of the circuit pattern 29 is incident on a left-hand side end portion of the detector 1. The processing circuit 101 processes the signal in the manner to be described below. From the arrangement of the light projecting system, the elongating direction of each edge and the arrangement of the detecting system, an appropriate region for detecting the regularly-reflected scattered light is determined beforehand to the detector 1. Then, such a picture element, of those picture elements within this region showing intensity levels not lower than a predetermined, which picture element shows a maximal level, is detected. Thereafter, a range of + n picture elements about the detected element, is set as the regularly-reflected light detecting region (noise detecting region) 1b, and the remaining area is set as the signal light detecting region 1a. If there is no picture element that shows an intensity level not lower than the predetermined, the whole area of the detector 1 is set as the signal light detecting region. Next, without using the data corresponding to the signals from those picture elements having received the regularly-reflected scattered light, the gravity center position of the signal light within the signal light detecting region 1a is determined on the basis of the data corresponding to the signals from those picture elements in that region 1a. The alignment and exposure process to be made subsequently is the same as that having been described with reference to the embodiment of Figure 8. Figure 11 is a flow chart showing the process of gravity center position determination to be made in the present embodiment or the embodiment of Figure 8.

Claims: A position detecting method, comprising the steps of projecting a radiation beam to a grating pattern (121,221) on a substrate (18), wherein a diffraction beam is generated from the grating pattern (121,221) and a reflectively scattered beam is generated from an edge of a peripheral portion of the grating pattern (121,221) or an edge of a peripheral portion of another pattern (29) adjacent to the grating pattern (121,221), receiving said diffraction beam using a sensor array (1), and determining the position of the substrate (18) on the basis of a signal from the sensor array (1), characterized in that: the diffraction beam and the reflectively scattered beam are generated at an angle to one another and impinge upon the sensor array (1) substantially separated from each other; a signal produced by the sensor array (1) is processed to determine a particular picture element, within a region where the reflectively scattered beam is incident, which element provides a largest output, and to exclude outputs of those picture elements which are within a predetermined range about the particular picture element; and the position of the substrate (18) is determined on the basis of the signal produced by picture elements outside the predetermined range. A method according to claim 1, wherein the grating pattern (121,221) has an optical power, such that the position of incidence of the diffraction beam upon the sensor array (1) changes with the position of the substrate (18). A method according to claim 2, wherein the grating pattern (121,221) comprises a zone plate. An alignment method comprising: the position detecting method of any one of claims 1 to 3 for aligning the substrate (18) with another substrate (19) having a grating pattern (222), wherein the radiation beam is projected through the grating pattern (221) of the substrate (18) onto the grating pattern (222) of the other substrate (19), the diffraction beam is generated from the grating patterns (221,221), and the relative alignment of the substrate (18,19) is determined on the basis of the signal produced by the picture elements outside the predetermined range; and the step of relatively moving the substrates (18,19) to bring them into alignment. An exposure method comprising the alignment method of claim 4, wherein the substrate (18) comprises a mask and the other substrate (19) comprises a wafer; and the step of exposing the wafer to a pattern of the mask. A method of manufacturing a semiconductor device comprising the exposure method of claim 5; and the step of forming a semiconductor device from the exposed wafer. Position detecting apparatus comprising: projection means (5,17,23,24,25) for projecting a radiation beam to a grating pattern (121,221) on a substrate (18), whereby a diffraction beam is generated from the grating pattern (121,221) and a reflectively scattered beam is generated from an edge of a peripheral portion of the grating pattern (121,221) or an edge of a peripheral portion of another pattern (29) adjacent to the grating pattern (121,221); a sensor array (1) for receiving said diffraction beam; and processing means (101) for determining the position of the substrate on the basis of a signal from the sensor array (1); characterised in that the diffraction beam and the reflectively scattered beam are generated at an angle to one another and impinge upon the sensor array (1) substantially separated from each other; and said processing means (101) is operative to determine a particular picture element of said sensor array (1) within a region where the reflectively scattered beam is incident, which element provides a largest output, to exclude outputs of those picture elements which are within a predetermined range about the particular picture element, and to determine the position of the substrate (18) on the basis of the signal produced by picture elements outside the predetermined range. Alignment apparatus for aligning a first substrate (18) having a grating pattern (221) with a second substrate (19) having a grating pattern (222), the apparatus comprising the position detecting apparatus of claim 7 wherein said projection beam (5,17,23,24,25) is arranged to project the radiation beam through the grating pattern (221) of the first substrate (18) onto the grating pattern (222) of the second substrate (19), the diffraction beam is generated from the grating patterns (221,222), and the relative alignment of the substrates (18,19) is determined on the basis of the signal produced by the picture elements outside the predetermined range; and alignment means (102) for relatively moving the substrates (18,19) to bring them into alignment.

Inventors: SAITOH KENJI, SAITOH, KENJI, SAITOH, KENJI, C/O CANON K.K.
Applicants: CANON KK, CANON KABUSHIKI KAISHA
Application year: 1991
Main classification: G03F9
IPC codes: G03F9, H01L21