Photodetector

Abstract: Disclosed is a photodetector adapted to detect light having a predetermined level of photon energy, comprising: a first semiconductor layer, a second semiconductor layer having a quantum well or a quantum line structure, a barrier layer provided between the first and second semiconductor layers, a device for applying voltage to the barrier layer and the first and second semiconductor layers in order to generate a tunnel current flowing through the barrier layer, and a device for detecting the tunnel current. The second semiconductor layer exhibits a plurality of electron levels, the energy difference between which is slightly smaller or slightly larger than the photon energy of the detected light. Further, incidence of the detected light upon the second semiconductor layer causes the electron levels to shift by the photo Stark effect, resulting in variation of the tunnel current.

Description: This invention relates to a photodetector adapted to detect the intensity of light, outputting an electric-current amount, and a photodetection method using the same and, in particular, to a photodetector which scarcely absorbs the detected light. Conventionally, p-i-n photodiodes, avalanche photodiodes, etc., have been known as photodetectors to detect the intensity of light by converting it to an electric signal. These photodiodes, however, absorb the detected light, generating carriers from the energy of the light absorbed. Accordingly, the incident light is hardly allowed to pass through the photodetector. If such photodiodes are applied, for example, to a bus-type optical communication system in which signal light is received serially by a plurality of receivers, that photodiode of the receiver situated at the forefront position in the communication path will substantially absorb the signal light, resulting in virtually no light reaching the second and subsequent receivers onwards. Accordingly, it is necessary for each receiver to generate, by means of a semiconductor laser or the like, a signal light that is identical to the one it has received, transmitting the signal light this generated to the next receiver. Document US-A-4 873 555 discloses an intraband quantum well photodetector suitable for converting high frequency electromagnetic radiation signals, particularly long wavelength infrared signals, with minimal errors into electrical signals using a quantum well at high pulse rates. In this photodetector stored electrons ejected by photons from a quantum well bounded by asymmetrical barriers flow over a lower barrier and are replaced by electrons which tunnel through a higher barrier, preferably at a rate at least as great as the rate at which they are depleted by photoemission. The structure of the device is as follows: a quantum well layer is provided between an emitter layer and a collector layer, with a first barrier layer between the quantum well layer and the emitter layer and a second barrier layer between the quantum well layer and the collector layer. The conduction band edge height of the first energy barrier is higher than the conduction band edge height of the second energy barrier which is higher than the Fermi level of the quantum well. The thickness and height of the first energy barrier is selected such that electrons that are depleted from the quantum well by photoemission are replaced by electrons which tunnel from the emitter through the first barrier layer. In operation the photodetector is exposed to electromagnetic radiation having a polarization vector which forms an angle with the normal to the plane of the quantum well layer and the photodetector is biased by a dc source with an electric field causing the emitter layer to be connected to a more negative electric potential than the collector layer. Furthermore, from document US-B-7/271 546 a heterostructure device usable as a far infrared photodetector is known. The device is designed to extend the frequency range such that infrared light can be detected as well. Furthermore, detection of light of a variable frequency is possible. In a steady state the energy level of electrons is a small amount under the conduction band, thereby making possible the detection of light of lower energy (longer wavelength). Electric/magnetic fields are imposed across this heterostructure. Moreover, document US-A-4 761 620 discloses the optical reading of a quantum well device. A quantum well layer serves as the current channel of a FET which also is the surface of a semiconductor structure. Narrow line width light is irradiated on the semiconductor-structure substrate and is reflected by the gate electrode of the FET. High mobility carriers are stored in the quantum well. Due to a potential modification between the gate and the source of the FET changes in the absorption characteristic presented by the quantum well layer take place. The photodetector detects light which has passed through the quantum well twice and thereby detects a change in the electrical state of the FET. A change in optical characteristics is effected by applying different potentials across the multiple quantum well layers. This invention has been made with a view to eliminating the above-mentioned problem in the prior art. It is accordingly an object of this invention to provide a photodetector which is capable of detecting the intensity of light while scarcely attenuating the detected light as well as an optical communication system using this photodetector. According to the invention this object is accomplished by a photodetector for detecting light having a predetermined level of photon energy, including a photodetection layer comprising: a first semiconductor layer; a second semiconductor layer having a quantum well or a quantum line or a quantum dot structure and exhibiting a plurality of electron levels in the quantum well or the quantum line or the quantum dot structure, the energy difference between said electron levels being slightly smaller or slightly larger than the photon energy of the light to be detected; a third semiconductor layer; a first barrier layer provided on one side of said second semiconductor layer between said first and second semiconductor layers and having a higher potential than said first semiconductor layer; and a second barrier layer provided on the other side of said second semiconductor layer between said second and third semiconductor layers and having a higher potential than said third semiconductor layer; and means for applying voltage to said first, second and third semiconductor layer and said first and second barrier layers in order to generate a tunnel current flowing through said first barrier layer, said means for applying voltage being provided on opposing sides of said photodetection layer; and means for detecting said tunnel current; wherein incidence of the light to be detected upon said second semiconductor layer causes the electron levels to shift by the optical Stark effect due to an imaginary intersubband transition, resulting in variation of said tunnel current. Further objects, features and advantages of the present invention will become apparent from the following description when taken in combination with the accompanying drawings, of which: Fig. 1 is a schematic perspective view showing an embodiment of the photodetector of this invention. Fig. 2 is a schematic sectional view showing the layer structure of the above embodiment; Fig. 3 is a schematic diagram showing the potentials in the above embodiment; Fig. 4 is a diagram showing the photoabsorption spectrum of the photodetector in the above embodiment; Fig. 5 is a diagram showing the relationship between the intensity of the detected light and the detection current in the above embodiment; Fig. 6 is a diagram showing the relationship between the intensity of the detected light and the detection current in a second embodiment of this invention; and Fig. 7 is a block diagram showing a configuration example of an optical communication system using the photodetector of this invention. Fig. 1 is a schematic perspective view showing an embodiment of the photodetector of this invention, and Fig. 2 is a schematic sectional view showing the layer structure of this embodiment. Referring to Figs. 1 and 2, the embodiment shown includes an n-type GaAs substrate 1, a superlattice buffer layer 2, a first n-GaAs layer 3, a photodetection layer 4 having a multiple quantum well structure, and a second n-GaAs layer 5. The photodetection layer 4 is composed of an undoped (i-) AlAs layer 14, a first i-GaAs well layer 15, a first i-AlAs barrier layer 16, a second i-GaAs well layer 17, a second i-AlAs barrier layer 18, a third i-GaAs well layer 19, and a i-AlAs layer 20. The second n-GaAs layer 5 is composed of an n-GaAs layer 21 and an n-GaAs cap layer 22 whose impurity concentration is higher than that of the n-GaAs layer 21. As shown in Fig. 1, formed on the second n-GaAs layer 5 is a stripe-like projection 30 extending in the incidence direction of the detected light 11. That section of the photodetection layer 4 which is under this stripe-like projection 30 exhibits an effective refractive index that is higher than that of the other sections thereof, thereby forming a channel-type waveguide. The detected light 11 strikes one end surface of the photodetection layer 4 and is propagated through this waveguide exiting from the other end surface of the photodetection layer 4 as the transmitted light 12. Formed over the entire bottom surface of the substrate 1 is a first electrode 6 consisting of Au/Cr. To effect ohmic contact with this first electrode 6, a portion of the substrate 1, the buffer layer 2 and the first n-GaAs layer 3 each are formed as a region 10 in which Au and Cr are diffused. Formed on the second n-GaAs layer 5 is a second electrode 7. To protect, as far as possible, the section through which the detected light 11 is transmitted from encroachment impurities, the second electrode 7 is formed on a part of the surface area of the second n-GaAs layer 5 excluding the stripe-like projection 30. Voltage is applied between the first and second electrodes 6 and 7 from a voltage source 8 connected to them from outside. Further, an ammeter 9 measures the current flowing through the first and second electrodes 6 and 7. It will be apparent that any suitable means for measuring the flow of electrons through the structure (tunnel current) may be employed. For example, there are known d'Arsonval ammeters, digital (integrating) ammeters, current to voltage converters, current to frequency converters, photooptical converters, thermoelectric converters, quantum effect devices, etc. Since the present photodetector is constructed of a monolithic semiconductor, it is also apparent that the change in current produced by the detected light 11 could be processed on the same substrate. Further, semiconductors such as gallium arsenide and indium phosphide are suitable for use in quantum well lasers and electrooptic modulators. Thus, the present photodetector may allow for efficient optical computers to be constructed. Because the current flowing through the photodetector is related to the light incident on the quantum well or quantum line structure, variations in light intensity may be used to convey information. However, the structure may also be used to detect digital signals through the presence or absence of light. A semiconductor device used in the above-described photodetector was prepared as shown in Figs. 1 and 2 (not drawn to scale), for example, as follows: First, GaAs and AlAs layers each having a thickness of several 0,1 nm (Å) to several nm (tens of Å) were alternately laminated on the surface (100) of the n-GaAs substrate 1, thereby forming a superlattice buffer layer 2 having a total thickness of 0.5µm. Next, successively grown on this buffer layer 2 were a 0.5µm thick n-GaAs layer 3, a 2 nm (20Å) thick i-AlAs layer 14, a 4 nm (40Å) thick i-GaAs well layer 15, a 2,2 nm (22Å) thick i-AlAs barrier layer 16, a 4,3 nm (43Å) thick i-GaAs well layer 17, a 2,2 nm (22Å) thick i-AlAs barrier layer 18, a 4 nm (40Å) thick i-GaAs well layer 19, and and a 2 nm (20Å) thick i-AlAs layer 20. Subsequently, grown on the i-AlAs layer 20 were a 0.5µm thick n-GaAs layer 21, and a 0.3µm thick n-GaAs cap layer 22. The formation of these semiconductor layers was effected by the molecular beam epitaxy (MBE) method. Further, the concentration of the Si with which the n-type semiconductor layers were doped was controlled such that it is 1 x 10 18 cm -3 in the n-GaAs layer 3 and 1 x 10 19 cm -3 in the n-GaAs cap layer 22. Next, mesa etching was performed on part of the semiconductor layer 5, leaving a stripe-like region, thereby forming the stripe-like projection 30. Then, an Au and a Cr film were deposited by evaporation on the bottom surface of the substrate 1, thereby forming the first electrode 6. Afterwards, the substrate 1 was placed in a hydrogen atmosphere at 400°C so as to diffuse the Au and Cr, thereby forming the region 10. Further, an Au and a Cr film were deposited by evaporation on a part of the semiconductor layer 5, thereby forming the second electrode 7. Fig. 3 is a diagram schematically representing the potentials in the photodetection layer 4 in the above-described embodiment. The respective potentials of the layers are indicated by the same reference numerals as those used in Fig. 2. Since the well layers 15, 17 and 19 are formed sufficiently thin, sub-bands are generated by the quantum size effect. That is, each of the well layers has a plurality of discrete electron energy levels. Here, the thickness, etc. of the well layer 17 is so adjusted that the energy difference between the electron levels of this well layer 17 is slightly larger than the photon energy of the detected light 11. Further, the thickness, etc. of the well layers 15 and 19 is so adjusted that the energy difference between the electron levels of these well layers is slightly smaller than the photon energy of the detected light 11. Thus, assuming that the respective intrinsic energies of the sub-bands of the well layer 17, starting from the smallest one, are E Na , E Nb , ......, that the respective intrinsic energies of the sub-bands of the well layers 15 and 19, starting from the smallest one, are E Wa , E Wb , ......, and that the photon energy of the detected light is ℎω, the following expressions are satisfied: E Wb - E Wa < ℎω < E Nb - E Na ℎω = E Wb - E Wa - δ W ℎω = E Nb - E Na - δ N δ W << ℎω δ N << ℎω where δ W < 0 and δ N > 0. In the embodiment described above, adjustment is effected such that E wb - E wa = -422meV and that E Nb - E Na = 465meV, assuming that the wavelength of the detected light 11 is 2.8µm. The above δ W and δ N are very small, so that, when the detected light 11 strikes upon the well layers, the optical Stark effect is obtained. In this invention, light is detected by utilizing this optical Stark effect. In the following, the optical Stark effect will be explained. Generally, if, in an electron cloud of an atom, the electrons have separate energy levels, application of light having a photon energy whose level is near, if not identical, to that electron energy level, causes the allowable energy levels of the electrons to be shifted. This phenomenon is called the optical Stark effect. In this invention, the "separate energy levels" means the energy levels of the sub-bands of a quantum well structure. Accordingly, in this invention, what is obtained is an optical Stark effect due to an imaginary inter-sub-band transition. Assuming that the width of the first energy level in the well layer 17 is Γ Na and that the width of the first energy level in the well layers 15 and 19 is Γ Wa , the following expressions are satisfied: E Wa - E Na ≥ Γ Wa + Γ Na In the embodiment described above, the energy difference between E wa and E Na is specified as 13.8meV. Semiconductor devices which satisfy the following conditional expressions will scarcely absorb the detected light: δ W ≥ Γ Wa + Γ Wb δ N ≥ Γ Na + Γ Nb ℎω >> ℎω LO where hω LO represents a longitudinal optical (LO) phonon energy. Among the various types of phonons, including transverse-wave and longitudinal-wave phonons of acoustic mode, the LO phonon has the maximum vibrational energy. Therefore, if the photon energy of a detected light 11 is larger than this LO phonon energy, the phonon absorption of the detected light 11 will be reduced to a negligible degree. This condition is satisfied, for example, in a quantum well structure (QWS) which has a well layer having a relatively small thickness of several nm (tens of Å), and which is composed of alternate GaAs/AlAs layers. Thus, the above-described structure detects light while absorbing only a small amount. Graphically, the above condition may be expressed as an absorption spectrum as shown in Fig. 4, in which the horizontal axis represents photon energy and the vertical axis absorption. Ea represents the first level intrinsic energy of a QWS well layer having conductive carriers, and E b the second level intrinsic energy of the same. Γ a is the width of the first level energy of this well layer, and Γ b the width of the second level energy of the same. Here, the photon energy of the detected light 11 is set at E 1 or E 2 . The difference δ between E 1 or E 2 and E b - E a satisfies the expression: | δ | ≥ Γ a + Γ b . In the following, the operation of this embodiment will be described. First, the case will be considered where no light is incident upon the QWS shown in Fig. 3. Electrons supplied to the well layer 15 from the electrodes fall down to the first sub-band level E a . Here, voltage V is applied between the well layers 15 and 19 from the voltage source 8, so that the electrons are inclined to tunnel from the well layer 15 to the well layer 19. In this embodiment, however, the first sub-band energy level ENa of the well layer 17 is sufficiently higher than the first sub-band energy level E wa of the well layers 15 and 19, i.e., the relationship represented by expression (6) is satisfied, so that the probability of tunneling is low. Thus, when no light is incident upon the QWS, scarcely any current flows, with the ammeter 9 measuring a small amount of current. Next, the case will be considered where light is incident upon the QWS. To avoid multi-phonon absorption, free-carrier absorption, etc., this detected light is polarized in such a manner that its field vector is in the Z-axis direction, i.e., perpendicular to the surfaces of the semiconductor layers. At the same time, the sub-band spacing in the well layers is, as stated above, set at several times the LO phonon energy or more. Here, incidence of light upon the QWS causes the electron levels to shift in the following manner by the above-mentioned optical Stark effect: E Na → E Na - (eµ N ε) 2 /δ N E Wa → E Wa - (eµ W ε) 2 /δ W where e represents the unit charge, ε the field intensity, µ N the length of the transition dipole from the first to the second level of the well layer 17, and µ W the length of the transition dipole from the first to the second level of the well layers 15 and 19. Since δ W < 0 and δ N > 0, the first level ENa of the well layer 17 and the first level Ewa of the well layers 15 and 19 are, from the above expressions (10) and (11), respectively shifted to the lower and the higher side, as indicated by the arrows in Fig. 3. As a result, |E Na - E Wa | becomes smaller (i.e., |E Na - E Wa | < Γ Wa + Γ Na ), so that the probability of the electrons tunneling from the well layer 15 to the well layer 19 through the well layer 17 becomes higher, with the ammeter 9 measuring a current. The Stark shift amount of the above electron levels is proportional to the light intensity ε 2 , so that the amount of this current reflects the light intensity, which means the light intensity can be calculated backward from the current amount. Fig. 5 schematically shows the light-intensity/electric-current characteristic in this embodiment. In Fig. 5, the horizontal axis represents the intensity of light incident upon the photodetector, and the vertical axis represents the current detected. Generally, in a composition of matter, the length of the dipole moment of the above inter-level shift is several 0,1 nm (Å) at the most. In a QWS like the one of this embodiment, however, the length of the dipole moment is such that the well-layer size is several times larger than it, and it is as large as 1 nm (10Å) or more. That is, the optical Stark effect due to the imaginary transition between sub-bands in the QWS is more intense than usual, which, combined with the above-described arrangement for making the field vector of light perpendicular to the surfaces of the semiconductor layers and the reduction of |δ| to a sufficient degree, greatly contributes to enhancement of the sensitivity of the photodetector of this invention. While in the above-described embodiment E wa < E Na , the condition in which E wa > E Na , i.e., the condition in which the first level E wa of the well layers 15 and 19 is sufficiently higher than the first level E Na of the well layer 17, is also acceptable. In that case, the inequality sign in expression (1) is reversed, with the Stark shift direction being made reverse to that indicated by the arrows of Fig. 3. Thus, incidence of light causes the first level of well layers 15 and 19 to be lowered and that of the well layer 17 to be raised, resulting in the tunnel current being increased. Further, in this invention, it may also be so arranged that, contrary to the case of expression (6), the following expression is satisfied: E Na - E Wa < Γ Wa + Γ Na In that case, the characteristic the photodetector exhibits is such that a large current flows when no light is incident upon it, as shown in Fig. 6, with the current amount decreasing as the light intensity is increased. Further, in that case, the Stark shift direction may be the same as that in the case of Fig. 3 or reverse to it. In the former case, incidence of light causes the first level of the well layer 17 to become relatively low, resulting in reduction in the current amount. In the latter case, incidence of light causes the first level of the well layer 17 to become relatively high, resulting in reduction in the current amount. Fig. 7 is a block diagram showing an example of an optical communication system using the photodetector of this invention. In Fig. 7, a light signal emitted from a light signal transmitter 23 is transmitted to a plurality of light signal receivers 24 1 , 24 2 , connected in series to each other through an optical fiber 29. The light signal receivers are respectively equipped with photodetectors 25 1 , 25 2 ,...... each having a structure as shown in Fig. 1, the above-mentioned light signal being detected by these photodetectors. In this process, the photodetector 25 1 scarcely absorbs light, so that it allows the light signal to be transmitted to the photodetector 25 2 without attenuating it. The photodetector 25 2 also allows the light signal to be transmitted to the next photodetector without attenuating it. Thus, in an optical communication system using the photodetector of this invention, a plurality of receivers can be connected without providing a light signal amplifier in the transmission line or a light source in each receiver. The signal detected by the photodetectors 25 1 and 25 2 is demodulated by signal demodulator circuits 26 1 and 26 2 , and is displayed through display devices 27 1 and 27 2 consisting of cathode ray tubes (CRT), etc. Further, these signal demodulator circuits and display devices are controlled by control circuits 28 1 and 28 2 . Apart from the embodiment described above, this invention can be applied in a variety of ways. For example, while in the above embodiment the photodetector is formed by semiconductor layers having a quantum well structure (QWS), it is also possible to form the photodetector such that it has a quantum line structure (QLS) in which the semiconductor layers are formed as stripe-like portions having a minute width. It would be obvious that the present photodetector structure could be adapted to be formed as a quantum dot structure (QDS), which serves to confine the electrons in three dimesions. Further, while In the above embodiment three well layers are formed, the number of well layers may be more than three, or, alternatively, one or two. When only one well layer is formed, it may be so arranged that the difference between the electron level of this well layer and the potential of the semiconductor layer adjacent thereto through the intermediation of a barrier layer varies by the photo Stark effect. In the case where two well layers are formed, an improvement in sensitivity can be attained by forming them such that their respective Stark shift directions are different from each other. The present invention can be used to provide a differential output, by allowing the detected light to pass through a first structure that increases the tunnel current upon illumination with a light of a certain photon energy, and through a second structure that decreases the tunneling current upon illumination with a light of a certain photon energy. It will be obvious that, since light is hardly absorbed while passing through each structure, the present invention provides superior capabilities to photodetectors based on photodiodes. It will also be obvious that logical circuits may be constructed from the photodetector of the present invention, and that numerous photodetectors may be placed on a "bus" structure in order to facilitate optical computing. Further, the materials from which the semiconductor layers are fabricated are not limited to GaAs and AlAs. Various other materials may be adopted, including InGaAsP, ZnS, ZnTe, CdS, and CuCl. This invention embraces all such application examples insofar as they do not depart from the scope of the appending claims.

Claims: A photodetector for detecting light having a predetermined level of photon energy, including a photodetection layer (4) comprising: a first semiconductor layer (15); a second semiconductor layer (17) having a quantum well or a quantum line or a quantum dot structure and exhibiting a plurality of electron levels (E Na , E Nb ) in the quantum well or the quantum line or the quantum dot structure, the energy difference between said electron levels being slightly smaller or slightly larger than the photon energy of the light (11) to be detected; a third semiconductor layer (19); a first barrier layer (16) provided on one side of said second semiconductor layer (17) between said first and second semiconductor layers (15, 17) and having a higher potential than said first semiconductor layer (15); and a second barrier layer (18) provided on the other side of said second semiconductor layer (17) between said second and third semiconductor layers (17, 19) and having a higher potential than said third semiconductor layer (19); and means (6, 7) for applying voltage to said first, second and third semiconductor layer (15, 17, 19) and said first and second barrier layers (16, 18) in order to generate a tunnel current flowing through said first barrier layer (16), said means (6, 7) for applying voltage being provided on opposing sides of said photodetection layer (4); and means (9) for detecting said tunnel current; wherein incidence of the light (11) to be detected upon said second semiconductor layer (17) causes the electron levels (E Na , E Nb ) to shift by the optical Stark effect due to an imaginary intersubband transition, resulting in variation of said tunnel current. A photodetector according to claim 1, further comprising a substrate (1) on which said first semiconductor layer (15) is provided. A photodetector according to claim 1 or 2, wherein said first semiconductor layer (15) has a quantum well or a quantum line or a quantum dot structure and exhibits a first electron level (E Wa ) and a second electron level (E Wb ) higher than said first electron level (E Wa ), the energy difference (E Wb -E Wa ) between said first and second electron levels (E Wa , E Wb ) being slightly smaller than the photon energy (ℎω) of the light (11) to be detected; said plurality of electron levels (E Na , E Nb ) of said second semiconductor layer (17) comprises a third electron level (E Na ) and a fourth electron level (E Nb ) higher than said third electron level (E Na ), the energy difference (E Nb -E Na ) being slightly larger than the photon energy (ℎω) of the light (11) to be detected; and incidence of the light (11) to be detected upon said first and second semiconductor layers (15, 17) causes the electron levels to shift by the optical Stark effect due to an imaginary intersubband transition, resulting in variation of said tunnel current, wherein the following conditional expressions are satisfied: E 2 - E 1 < ℎω < E 4 - E 3 ℎω = E 2 - E 1 - δ 1 ℎω = E 4 - E 3 - δ 2 δ 1 < 0 δ 2 > 0 δ 1 << ℎω δ 2 << ℎω wherein E 1 represents the sub-band energy of the first electron level, E 2 the sub-band energy of the second electron level, E 3 the sub-band energy of the third electron level, E 4 the sub-band energy of the fourth electron level, and hω the photon energy of the light (11) to be detected. A photodetector according to claim 3, wherein said third semiconductor layer (19) has a quantum well or a quantum line or a quantum dot structure and exhibits a fifth electron level (E Wa ) and a sixth electron level (E Wb ) higher than said fifth electron level (E Wa ), the energy difference between said fifth and sixth electron levels (E Wa , E Wb ) being slightly smaller than the photon energy (ℎω) of the light (11) to be detected; said second barrier layer (18) is provided between said second and third semiconductor layers (17, 19); and incidence of light (11) to be detected upon said first, second and third semiconductor layers (15, 17, 19) causes the electron levels to shift by the optical Stark effect due to an imaginary intersubband transition, resulting in variation of said tunnel current, wherein the following additional conditional expressions are satisfied: E 6 - E 5 < ℎω ℎω = E 6 - E 5 - δ 3 δ 3 < 0 δ 3 << ℎω wherein E 5 represents the sub-band energy of the fifth electron level and E 6 the sub-band energy of the sixth electron level. A photodetector according to claim 4, wherein said means (6, 7) for applying a voltage comprises a first electrode (6) provided on said first semiconductor layer (15) and a second electrode (7) provided on the bottom surface of said third semiconductor layer (19). A photodetector according to claim 1, 3 or 4, wherein the thickness of said first, second and third semiconductor layers is made sufficiently small to allow the generation of at least two electron levels by the quantum size effect. A photodetector according to claim 3, wherein the following conditional expressions are satisfied: δ 1 ≥ Γ 1 + Γ 2 δ 2 ≥ Γ 3 + Γ 4 ℎω >> ℎω LO where Γ 1 represents the first level energy width, Γ 2 the second level energy width, Γ 3 the third level energy width, Γ 4 the fourth level energy width, and ℎω LO the longitudinal optical phonon energy. A photodetector according to claim 3 or claim 7, wherein the amount of said tunnel current is increased as the intensity of the light (11) to be detected is increased, satisfying the following conditional expression: E 1 - E 3 ≥ Γ 1 + Γ 3 where E 1 represents the first level sub-band energy, E 3 the third level sub-band energy, Γ 1 the first level energy width, and Γ 3 the third level energy width. A photodetector according to claim 3 or claim 7, wherein the amount of said tunnel current is decreased as the intensity of the light (11) to be detected is increased, satisfying the following conditional expression: E 1 - E 3 < Γ 1 + Γ 3 where E 1 represents the first level sub-band energy, E 3 the third level sub-band energy, Γ 1 the first level energy width, and Γ 3 the third level energy width. A photodetector according to claim 7, wherein the following additional conditional expression is satisfied: δ 3 ≥ Γ 5 + Γ 6 where Γ 5 represents the fifth level energy width and Γ 6 the sixth level energy width. A photodetector according to claims 4, 5 or 10, wherein the amount of said tunnel current is increased as the intensity of the light (11) to be detected is increased, satisfying the following conditional expressions: E 1 - E 3 ≥ Γ 1 + Γ 3 E 3 - E 5 ≥ Γ 3 + Γ 5 where E 1 represents the first level sub-band energy, E 3 the third level sub-band energy, E 5 the fifth level sub-band energy, Γ 1 the first level energy width, Γ 3 the third level energy width, and Γ 5 the fifth level energy width. A photodetector according to claims 4, 5 or 10, wherein the amount of said tunnel current is decreased as the intensity of the light to be detected is increased, satisfying the following conditional expressions: E 1 - E 3 ≥ Γ 1 + Γ 3 E 3 - E 5 ≥ Γ 3 + Γ 5 where E 1 represents the first level sub-band energy, E 3 the third level sub-band energy, E 5 the fifth level sub-band energy, Γ 1 the first level energy width, Γ 3 the third level energy width, and Γ 5 the fifth level energy width. A photodetector according to claim 4 or 5, further comprising a first clad layer (3) provided between said substrate (1) and said first semiconductor layer (15), and a second clad layer (5) provided on said third semiconductor layer (19). A photodetector according to claim 13, further comprising a superlattice buffer layer (2) provided between said substrate (1) and said first clad layer (3). A photodetector according to claim 13, wherein said second clad layer (5) has a stripe-like projection (30) extending in the incidence direction of the light (11) to be detected. A photodetector according to any of the preceding claims 1 to 15, wherein the photon energy (ℎω) of said light (11) to be detected is larger than the longitudinal optical phonon energy (ℎω LO ). A photodetector according to any of the preceding claims 1 to 16, wherein the direction of the field vector of said light (11) to be detected is perpendicular to the plane of said second semiconductor layer (17). A photodetector according to any of the preceding claims 1 to 17, wherein the light (11) to be detected is parallel to the photodetection layer (4) and is propagated therethrough. An optical communication system using a photodetector, comprising: a light signal transmitter (23) adapted to emit light modulated in accordance with a communication signal and having a predetermined level of photon energy; and a light signal receiver (24 1 , 24 2 ) adapted to receive the light emitted from said transmitter (23), said light signal receiver having a photodetector (25 1 , 25 2 ) according to any of the preceding claims 1 to 18 adapted to allow signal light to be further transmitted and to detect this signal light. An optical communication system according to claim 19, further comprising: a photoconductive waveguide (29) for transmitting a light signal from said transmitter (23) to said receiver (24 1 , 24 2 ). An optical communication system according to claim 19 or 10, wherein said receiver (24 1 , 24 2 ) has a signal demodulator circuit (26 1 , 26 2 ) adapted to demodulate said communication signal from the current detected by said photodetector (25 1 , 25 2 ).

Inventors: FUJII KAZUHITO, SHIMIZU AKIRA, FUJII, KAZUHITO, SHIMIZU, AKIRA, FUJII, KAZUHITO, C/O CANON KABUSHIKI KAISHA, SHIMIZU, AKIRA, C/O CANON KABUSHIKI KAISHA
Applicants: CANON KK, CANON KABUSHIKI KAISHA
Application year: 1991
Main classification: H01L31
IPC codes: H01L31