MAGNETORESISTANCE EFFECT ELEMENT

Abstract: A magnetoresistance effect element which comprises a substrate and at least two layers of magnetic thin films formed on the substrate via non-magnetic thin film layers. The element is characterized in that the coercive forces of the magnetic thin films adjoining each other via the non-magnetic thin film layer are different and the thicknesses of the magnetic and non-magnetic thin film layers are 200 angstroms or less respectively. The element exhibits a large rate of resistance change of several to several tens % in a small external magnetic field of about several to several tens Oe. Therefore, a highly sensitive magnetic sensor of magnetoresistance type and a magnetic head of magnetoresistance type capable of high-density magnetic recording can be provided.

Description: The present invention relates to a magnetoresistance effect element for reading a magnetic field intensity as a signal in a magnetic recording medium and the like. A highly practical magnetoresistance effect element is required to have a large resistance change in a small external magnetic field. The magnetoresistance effect element of the present invention has a large resistance change in a small external magnetic field and can be practically used. In these years, a sensitivity of a magnetic sensor and a density of magnetic recording have been increased. With such increase, a magnetoresistance effect magnetic sensor (hereinafter referred to as "MR sensor") and a magnetoresistance effect magnetic head (hereinafter referred to as "MR head") have been vigorously developed. The MR sensor and head read an external magnetic signal through the resistance change in a reading sensor part comprising a magnetic material. A high sensitivity is achieved by the MR sensor and a high output is obtained by the MR head even in case of a high density magnetic recording. However, with a MR sensor which comprises a conventional magnetic substance utilizing anisotropic magnetoresistance effect such as Ni 0.8 Fe 0.2 , the resistance change rate ΔR/R (which will be defined below) is only about 2 to 5 %. Then, a MR element having a larger resistance change rate is desired. Recently, it was found that an artificial superlattice film in which directions of magnetization in adjacent magnetic layers are opposite such as [Fe/Cr] N induces a large magnetoresistance effect (Phys. Rev. Lett., 61 , 2472 (1988)). However, with this artificial superlattice film, an external magnetic field at which the maximum resistance change is achieved is very large, namely from ten KOe to several ten KOe (1 Oe = 10 / 4π A/cm). Therefore, this artificial lattice film as such cannot be practically used. That is, the conventional MR sensor and head have a small resistance change, and the conventional artificial superlattices such as Fe/Cr require too large external magnetic field to induce the resistance change. EP-A-0 406 060 discloses a magnetoresistence effect element comprising a substrate on which magnetic thin layers and non-magnetic thin layers are alternately deposited. A single crystal layer is formed on a single crystal substrate such as GaAs by a molecular beam epitaxy (MBE) apparatus and the like. JP-A-01 152 677 relates to a magnetoresistance effect element, wherein an amorphous soft magnetic material layer, an amorphous conductor layer and an MR material layer are laminated in this order on a substrate. Then, the MR material is biased by a bias magnetic field generated by the amorphous magnetic material. On the substrate, the amorphous soft magnetic material is first laminated on the substrate and, immediately after the formation of the amorphous soft magnetic material layer, it should be heat treated in a magnetic field. In the magnetoresistance effect element of JP-A-02 023 681, ferromagnetic thin films and metal conductive films are alternately laminated. DE 38 20 475 C1 discloses a magnetoresistance effect element comprising two magnetic thin layers which are laminated with an interposing non-magnetic thin layer between the layers. The two magnetic layers have different coercive forces. The magnetic thin layer has a thickness between 10 and 14 nm and the non-magnetic layer has a thickness between 1 and 4 nm. As a result of extensive study to solve the above problems, the present inventors have succeeded in producing a highly practical magnetoresistance effect element comprising the features of claim 1. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a partly omitted cross section of a magnetoresistance effect element according to the present invention, Fig. 2 is a schematic B-H curve which illustrates a function of the present invention, Fig. 3 is a B-H curve of [NiFe(25)/Cu(55)/Co(25)/ Cu(55)] 5 , and Fig. 4 is a graph showing a relationship between the external magnetic field H and the resistance R of [NiFe(25]/Cu(55)/Co(25)/Cu(55)] 5 . DETAILED DESCRIPTION OF THE INVENTION In the magnetoresistance effect element of the present invention, it is essential that the adjacent magnetic thin layers through the non-magnetic thin layer have different coercive forces, because the principle of the present invention is based on the fact that, when the directions of the magnetization in the adjacent magnetic layers are different, conduction electrons are scattered depending on spins so that the resistance increases, and when the directions of the magnetization are opposite, the element has the largest resistance. That is, in the present invention, as shown in Fig. 2, when an external field is between a coercive force Hc 2 of one magnetic thin layer and a coercive force Hc 3 of another magnetic thin layer (Hc 2 < H < Hc 3 ), the directions of the magnetization in the adjacent magnetic layers are opposite so that the resistance increases. The relationship among the external magnetic field, the coercive force and the directions of the magnetization will be explained in detail later. A kind of the magnetic substance to be used as the magnetic thin layer according to the present invention is not limited. Preferred examples are Fe, Ni, Co, Mn, Cr, Dy, Er, Nd, Tb, Tm, Ce and Gd. As alloys or compounds comprising such element, Fe-Si, Fe-Ni, Fe-Co, Fe-Gd, Fe-Al-Si (Sendust, etc.), Fe-Y, Fe-Mn, Cr-Sb, Co base amorphous alloys, Co-Pt, Fe-Al, Fe-C, Mn-Sb, Ni-Mn, Co-O, Ni-O, Fe-O, Ni-F, ferrites and the like are preferred. In the present invention, two or more magnetic substances having different coercive forces are selected from the above substances to form the magnetic thin layers. The upper limit of each magnetic thin layer is 200 Å, while the lower limit of the layer thickness is not specifically limited. However, when the layer thickness is less than 4 Å, a Curie temperature is lower than room temperature so that the element cannot be practically used. When the layer thickness is 4 Å or larger, the layer thickness can be easily made uniform, a layer quality is improved and saturation magnetization is not excessively decreased. Though the effect is not deteriorated when the layer thickness is larger than 20 nm (200 Å), it is not increased as the layer thickness increases, and the production of such thick layer is wasteful and uneconomical. The coercive force of each magnetic layer varies with the strength of the external magnetic field applied to the element or the required resistance change rate and is selected from the range between about 0.001 Oe and about 10 kOe. A ratio of the coercive forces of the adjacent magnetic layers is from 1.2:1 to 100:1, preferably from 5:1 to 50:1, more preferably from 8:1 to 20:1. Since the magnetic characteristics of each magnetic thin layer present in the magnetoresistance effect element cannot be directly measured, in general, they are measured as follows: The magnetic thin layers to be measured are vapor deposited alternately with the non-magnetic thin layers till the total thickness reaches about 20 to 40 nm (200 to 400 Å) to produce a sample for measurement, and its magnetic characteristics are measured. In this case, the thickness of each magnetic thin layer, the thickness of each non-magnetic layer and the composition of the non-magnetic layer are the same as those in the magnetoresistance effect element. The magnetic characteristics of the magnetic thin layer other than the coercive force are not critical. A squareness ratio of the magnetic thin layer having a small coercive force is preferably from 0.9 to 1.0. The non-magnetic layer acts as a material for decreasing a magnetic interaction between the magnetic thin layers having the different coercive forces and its kind is not limited. The non-magnetic material can be selected from various metallic or semimetallic non-magnetic materials or non-metallic non-magnetic materials. Preferred examples of the metallic non-magnetic material are Au, Ag, Cu, Pt, Al, Mg, Mo, Zn, Nb, Ta, V, Hf, Sb, Zr, Ga, Ti, Sn, Pb or their alloys. Preferred examples of the semimetallic non-magnetic material are Si, Ge, C, B and a composite material of at least one of these element and other element. Preferred examples of the non-metallic non-magnetic material are SiO 2 , SiO, SiN, Al 2 O 3 , ZnO, MgO, TiN or a composite material of at least one of these materials and other element. A thickness of the non-magnetic thin layer is not larger than 20 nm (200 Å). When this thickness exceeds 20 nm (200 Å), the strength of the resistance is determined by the non-magnetic layer(s), so that the scattering effect depending on the spins is relatively reduced and then the magnetoresistance change rate is decreased. When this thickness is smaller than 0.4 nm (4 Å), the magnetic interaction between the magnetic thin layers becomes too large so that it is difficult to differentiate the directions of the magnetization of the magnetic thin layers. The thickness of each of the magnetic and non-magnetic thin layers can be measured by a transmittance electron microscope, a scanning electron microscope, Auger electron spectroscopy and the like. A crystal structure of the thin layer can be identified by X-ray diffraction, reflection high-energy electron diffraction (RHEED) and the like. In the magnetoresistance effect element according to the present invention, the number of the laminated artificial superlattice layers N is not critical, and is determined according to the desired magnetoresistance change and the like. To obtain a sufficient magnetoresistance change, N is preferably at least 3. As the number of the laminated layers increases, the resistance change rate increases though the productivity decreases. When N is too large, the resistance of the whole element excessively decreases so that the practical use of the element may be difficult. In general, N is 50 or less. In the above explanation, two magnetic thin layers having different coercive forces are used. It is possible to use three or more magnetic thin layers having different coercive forces, whereby two or more external magnetic fields at which the directions of the magnetization are inverted can be set, so that a range of acting magnetic field strength can be increased. On the surface of the uppermost magnetic thin layer, an oxidation-inhibiting film made of, for example, silicon nitride or silicon oxide may be provided, or a metallic conductive film for the formation of an electrode may be provided. The thin layer may be formed by vapor deposition, sputtering, molecular beam epitaxy (MBE) and the like. As the substrate, glass, silicon, MgO, GaAs, ferrite, CaTiO and the like can be used. Now, the relationship among the external magnetic field, the coercive force and the directions of the magnetization is explained. For simplicity, the explanation will be made by making reference to an element containing two magnetic thin layers (2) and (3) having different coercive forces. As shown in Fig. 2, the coercive forces Hc of two magnetic layers are Hc 2 and Hc 3 (0 < Hc 2 < Hc 3 ). First, the external magnetic field H is applied so that H is smaller than -Hm (Hm being an external magnetic field at which the magnetization of the magnetic thin layer (3) is saturated). The directions of the magnetization of the magnetic thin layers (2) and (3) are in the same negative (-) direction as that of H. As the external magnetic field is increased, in the region I wherein H < Hc 2 , the directions of the magnetizations of both magnetic thin layers are still in the negative direction. The external magnetic field is increased to the region II wherein Hc 2 < H < Hc 3 , the direction of the magnetization of the magnetic thin layer (2) is inverted so that the directions of the magnetization of the magnetic thin layers (2) and (3) are opposite. When the external magnetic field is further increased to the region III wherein Hm < H, the directions of the magnetization of the magnetic thin layers (2) and (3) are both in the positive (+) direction. Thereafter, when the external magnetic field H is decreased, in the region IV wherein -Hc 2 < H, the directions of the magnetization of the both magnetic thin layers (2) and (3) are still in the positive direction, but in the region V wherein -Hc 3 < H < -Hc 2 , the direction of the magnetization of the magnetic thin layer (2) is inverted to the negative direction so that the directions of the magnetization of the magnetic thin layers (2) and (3) are opposite. Further, in the region VI wherein H < -Hm, the directions of the magnetization of the magnetic thin layers (2) and (3) are both in the negative direction. In the regions II and V wherein the directions of the magnetization of the magnetic thin layers (2) and (3) are opposite, the conduction electrons are scattered depending on the spins so that the resistance increases. For example, when Ni 0.8 Fe 0.2 having a small Hc (Hc 2 of about several Oe) is selected as a material for the magnetic thin layer (2) and Co having a slightly larger Hc (Hc 3 of several ten Oe) is selected as a material for the magnetic thin layer (3), it is possible to provide a MR element which has the large resistance change at a small external magnetic field around the external magnetic field Hc 2 . EXAMPLES The magnetoresistance effect element of the present invention will be illustrated by making reference to the accompanying drawing. Fig. 1 is a cross section of an example of the artificial superlattice film 1 of the present invention. In Fig. 1, the artificial lattice film 1 has magnetic thin layers M 1 , M 2 , ---, M n-1 and M n on a substrate 4 and, between adjacent two magnetic layers, non-magnetic thin layers N 1 , N 2 , ---, N n-2 and N n-1 . The present invention will be explained by the experimental results. Example 1 A glass plate 4 as a substrate was placed in a high vacuum deposition apparatus and the apparatus was evacuated to 1.33 x 10 -7 - 1.33 x 10 -8 Pa (10 -9 - 10 -10 Torr). While rotating the substrate which was kept at room temperature, an artificial lattice film 1 having the following composition was formed. While applying a magnetic field in an area of the substrate, the film was grown at a rate of about 0.03 nm/sec (0.3 Å/sec). The compositions and the magnetoresistance change rates of the multilayer films consisting of the magnetic thin layers and the non-magnetic thin layers are shown in Table 1. In Table 1, when the composition is expressed, for example, as [Ni 0.8 Fe 0.2 (30)/Cu(20)/Co(30)/Cu(20)] 5 , it means that a thin layer of an alloy of 80 % Ni and 20 % Fe having a thickness of 3 nm (30 Å), a Cu thin layer having a thickness of 2 nm (20 Å), a Co thin layer having a thickness of 3 nm (30 Å) and a Cu thin layer having a thickness of 2 nm (20 Å) were successively deposited and the deposition of these layers was repeated five times. The magnetization was measured by a vibrating sample magnetometer. The dimension of the sample for MR measurement, which had the composition shown in Table 1, was 0.3 x 10 mm. While applying the external magnetic field in an in-plane direction perpendicular to a direction of an electric current, the resistance was measured by a four probe method by changing the external field from -50 Oe to +5000 Oe, and the magnetoresistance ratio ΔR/R was calculated from the measured resistances. The magnetoresistance ratio ΔR/R was calculated according to the following equation: ΔR R = Rmax - Rmin Rmin x 100 (%) wherein Rmax is the maximum resistance and Rmin is the minimum resistance. Composition of artificial superlattice film ΔR/R [Ni 0.8 Fe 0.2 (25)/Cu(55)/Co(25)/Cu(55)] 1 1.2 [Ni 0.8 Fe 0.2 (25)/Cu(55)/Co(25)/Cu(55)] 2 2.9 [Ni 0.8 Fe 0.2 (25)/Cu(55)/Co(25)/Cu(55)] 3 4.1 [Ni 0.8 Fe 0.2 (25)/Cu(55)/Co(25)/Cu(55)] 5 5.5 [Ni 0.8 Fe 0.2 (25)/Cu(55)/Co(25)/Cu(55)] 7 6.1 [Ni 0.8 Fe 0.2 (25)/Cu(55)/Co(25)/Cu(55)] 10 7.5 [Ni 0.8 Fe 0.2 (25)/Cu(55)/Co(25)/Cu(55)] 15 8.8 [Ni 0.8 Fe 0.15 Mo 0.05 (25)/Cu(55)/Co(25)/Cu(55)] 5 5.0 [Ni 0.8 Fe 0.2 (25)/Pt(50)/Co(25)/Pt(50)] 5 3.0 [Ni 0.8 Fe 0.2 (25)/Al(4)/Co(25)/Al(4)] 15 3.0 [Ni 0.8 Fe 0.2 (25)/Ti(4)/Co(25)/Ti(4)] 15 4.0 Figs. 3 and 4 show the B-H curve and the external magnetic field-resistance curve of [Ni 0.8 Fe 0.2 (25)/Cu(55)/ Co(25)/Cu(55)] 5 , respectively. Example 2 In the same manner as in Example 1, six magnetoresistance effect elements having the compositions shown in Table 2 were produced. The resistance change was measured by changing the external magnetic filed from -3000 Oe to +3000 Oe in a direction of an easy axis of magnetization (E.A.) or a hard axis of magnetization (H.A.). The results are shown in Table 2. Composition of artificial superlattice film ΔR/R H//H.A. H//E.A. [Ni 0.8 Fe 0.2 (30)/Cu(20)/Co(30)/Cu(20)] 15 1.4 --- [Ni 0.8 Fe 0.2 (30)/Cu(35)/Co(30)/Cu(35)] 15 4.4 --- [Ni 0.8 Fe 0.2 (30)/Cu(50)/Co(30)/Cu(50)] 15 9.9 8.8 [Ni 0.8 Fe 0.2 (30)/Au(20)/Co(30)/Au(20)] 15 2.9 0.7 [Ni 0.8 Fe 0.2 (30)/Au(35)/Co(30)/Au(35)] 15 4.0 2.9 [Ni 0.8 Fe 0.2 (30)/Au(50)/Co(30)/Au(50)] 15 4.7 --- With the compositions of (Fe(30)/Cu(35)/Co(30)/ Cu(35)] 15 and [Ni(30)/Cu(35)/Co(30)/Cu(35)] 15 , substantially the same results as above were obtained. In addition to above Examples, when experiments were carried out by changing the kinds of the non-magnetic thin layer and layer thicknesses, the shape of the B-H curve of the artificial superlattice films changed gradually and then the magnetoresistance ratio ΔR/R, the shape of the external magnetic field-resistance curve and the external magnetic field H R at the maximum resistance Rmax varied. In the magnetoresistance effect element of the present invention, the extremely high resistance change is achieved by selecting the magnetic characteristics of the magnetic thin layers and the thickness and kind of the non-magnetic thin layer(s). Further, the magnetic field strength at which the resistance is maximum can be relatively freely selected. EFFECTS OF THE INVENTION The magnetoresistance effect element of the present invention has a large magnetoresistance change in the order of several percentages at a small external magnetic field of several Oe. Therefore, the MR sensor having a high sensitivity and the MR head which achieves the high density magnetic recording can be provided.

Claims: A magnetoresistance effect element comprising a substrate and N laminated artificial superlattice layers, each comprising two magnetic thin layers which are laminated with interposing a non-magnetic thin layer between adjacent magnetic thin layers on said substrate, wherein adjacent magnetic thin layers through the non-magnetic thin layer have different coercive forces and each of the magnetic thin layers and the non-magnetic layers has a thickness of not larger than 20 nm characterized in that N is in the range from 3 to 50. The magnetoresistance effect element according to claim 1, wherein said magnetic thin layer is formed from at least one magnetic substance selected from the group consisting of Fe, Ni, Co, Mn, Cr, Dy, Er, Nd, Tb, Tm, Ce, Gd and their alleys and compounds. The magnetoresistance effect element according to claim 2, wherein said alloy or compound is selected from the group consisting of Fe-Si, Fe-Ni, Fe-Co, Fe-Gd, Fe-Al-Si, Fe-Y, Fe-Mn, Cr-Sb, Co base amorphous alloys, Co-Pt, Fe-Al, Fe-C, Mn-Sb, Ni-Mn, Co-O, Ni-O, Fe-O, Ni-F and ferrites. The magnetoresistance effect element according to any of claims 1 to 3, wherein a thickness of each of said magnetic thin layers is at least 0,4 nm. The magnetoresistance effect element according to any of claims 1 to 4, wherein said non-magnetic thin layer is formed from at least one metallic non-magnetic material selected from the group consisting of Au, Ag, Cu, Pt, Al, Mg, Mo, Zn, Nb, Ta, V, Hf, Sb, Zr, Ga, Ti, Sn, Pb and their alloys.. The magnetoresistance effect element according to any of claims 1 to 5, wherein said non-magnetic thin layer is formed from at least one semimetallic non-magnetic material selected from the group consisting of Si, Ge, C, B and a composite material of at least one of these element and other element. The magnetoresistance effect element according to any of claims 1 to 6, wherein said non-magnetic thin layer is formed from at least one non-metallic non-magnetic material selected from the group consisting of SiO 2 , SiO, SiN, Al 2 O 3 , ZnO, MgO, TiN and a composite material of at least one of these materials and other element. The magnetoresistance effect element according to any of claims 1 to 7, wherein a thickness of said non-magnetic thin layer is at least 0,4 nm.

Inventors: SHINJO TERUYA, TAKADA TOSHIO, YAMAMOTO HIDEFUMI, SHINJO, TERUYA, TAKADA, TOSHIO, YAMAMOTO, HIDEFUMI
Applicants: JAPAN ENERGY CORP, KANEGAFUCHI CHEMICAL IND, MATSUSHITA ELECTRIC IND CO LTD, NIPPON ELECTRIC CO, NIPPON STEEL CORP, SEISAN KAIHATSU KAGAKU KENKYUS, TDK CORP, TOSOH CORP, TOYO BOSEKI, UBE INDUSTRIES, JAPAN ENERGY CORPORATION, KANEGAFUCHI CHEMICAL INDUSTRY CO., LTD., MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., NEC CORPORATION, NIPPON STEEL CORPORATION, SEISAN KAIHATSU KAGAKU KENKYUSHO, TDK CORPORATION, TOSOH CORPORATION, TOYO BOSEKI KABUSHIKI KAISHA, UBE INDUSTRIES, LTD.
Application year: 1991
Main classification: H01L43
IPC codes: H01L43, G11B5