A process for the synthesis of hard boron nitride

Abstract: The present invention provides a novel and useful process for the synthesis of hard boron nitride by a gaseous phase synthesis technique, which comprises adding a F atom-containing gas to the gaseous phase or adding a F atom-containing gas and H atom-containing gas to the gaseous phase, whereby the codeposited hexagonal boron nitride can selectively be etched and hard boron nitride of substantially single phase can finally be synthesized.

Description: This invention relates to a process for the synthesis of hard boron nitride having a very large hardness as well as high heat resistance. The hard boron nitride of the present invention can effectively be applied to the field needing excellent properties such as hardness, heat resistance, oxidation resistance, chemical stability, etc., e.g. cutting tools, wear resistance tools and the like. The so-called hard boron nitrides such as cubic boron nitride and wurtzite boron nitride can be said to be ideal materials as a tool material such as of cutting tool, wear resistance tool, etc. because of having a hardness next to diamond and being excellent in heat resistance, oxidation resistance and chemical stability in comparison with diamond. However, since a superhigh pressure and high temperature are required for the synthesis of hard boron nitride, than in the case of diamond, the shape of the prodcut is largely restricted and a very expensive superhigh pressure generating apparatus should be used, resulting in a high synthesis cost and a limitation on the range of use thereof. As in the case of diamond, processes for the synthesis of hard boron nitride have lately been developed comprising depositing on the surface of a substrate from gaseous phase without using a superhigh pressure and high temperature. According to this gaseous phase synthesis technique, it is considered that the shape of the product is hardly limited and the synthesis cost is largely decreased because of using no superhigh pressure generating apparatus. As the gaseous phase synthesis of hard boron nitride, there are proposed a number of methods, for example, 1 ○ an ion beam method comprising melting and vaporizing metallic boron by an HCD electron gun, reacting with nitrogen plasma in the ambient atmosphere and thus depositing and synthesizing boron nitride on the surface of a substrate, 2 ○ a reactive sputtering method comprising sputtering metallic boron with hydrogen or nitrogen, reacting with nitrogen plasma in the ambient atmosphere and thus depositing and synthesizing on the surface of a substrate and 3 ○ a plasma CVD method comprising reacting diborane with nitrogen or ammonia in an atmosphere of high frequency such as microwave and depositing and synthesizing boron nitride on the surface of a substrate. JP-A-62-228481 discloses a process for depositing BN by thermal CVD onto a substrate using NH₃, B₂H₆ and F₂. JP-A-62007863 discloses a process for depositing boron nitride films by high frequency plasma CVD onto a substrate using B₂H₆, NH₃ and F₂. The reference "Thin Solid Films", vol.126, no. 314 (1985), pages 307-312 discloses the synthesis of cubic boron nitride by activated reactive evaporation of H₃BO₃ in the presence of an NH₃ plasma. It is further disclosed that thermal CVD of NH₃ and BF₃ has been used to deposit BN films. However, all the above described prior art methods have not succeeded in depositing and synthesizing cubic boron nitride or wurtzite boron nitride of single phase on a substrate from gaseous phase, but have obtained only a mixture of hard boron nitride of cubic or wurtzite type and hexagonal boron nitride of a thermodynamically low pressure phase. The hexagonal boron nitride is not suitable for a tool material because of its low hardness and accordingly, the gaseous phase synthesis boron nitride according to the prior art method has not been put to practical use as a tool material. Under the condition, the present invention has been made for the purpose of providing a novel gaseous phase synthesis process for obtaining hard boron nitride on the surface of a substrate as a substantially single phase, which can practically be used as a tool material. It is an object of the present invention to provide a process for the gaseous phase synthesis of hard boron nitride excellent in heat resistance, whereby the disadvantages of the prior art can be overcome. It is another object of the present invention to provide a process for the gaseous synthesis of hard boron nitride on a substrate as a single phase, which can be put to practical use as a tool material. These objects can be attained by a process for the synthesis of hard boron nitride, which comprises depositing hard boron nitride on the surface of a substrate from a gaseous phase containing F atom or F atom and H atom. The accompanying drawings are to illustrate the principle and merits of the present invention in detail. Fig. 1 is a schematic view of an RF plasma CVD apparatus comprising parallel plates, used in Examples 1 and 2. Fig. 2 is a schematic view of an RF ion plating apparatus used in Examples 3 and 4. Fig. 3 is a schematic view of a sputtering apparatus used in Examples 5 and 6. Fig. 4 is a schematic view of a thermal CVD apparatus used in Example 7. A number of studies or proposals have been made for the purpose of synthesizing hard boron nitride of single phase by the gaseous phase synthesis technique as described above. All the studies or proposals have been directed to how to synthesize high pressure phase hard boron nitride, which is a non-equilibrium phase in view of thermodynamics, with a good yield at a low pressure. However, it is not known that satisfactory results are obtained thereby. The inventors have considered from a completely different standpoint from the prior art that only a hard boron nitride can substantially be obtained on the surface of a substrate by not increasing the yield of hard boron nitride during gaseous phase synthesis, but selectively removing hexagonal boron nitride codeposited, and have made various efforts to realize this consideration. Consequently, it is found that the hexagonal boron nitride can selectively be etched by the use of NF₃ as a gas containing F (fluorine) atoms and optionally a gas containing H (hydrogen) atoms comprising B₂H₆, NH₃, H₂, HF or two or more thereof. The present invention is based on this finding. That is to say, the first present invention provides a process for the synthesis of hard boron nitride by depositing hard boron nitride on the surface of a substrate from gaseous phase, characterized in that NF₃ as a gas containing F atoms is added to the gaseous phase. The present invention also provides a process for the synthesis of hard boron nitride by depositing hard boron nitride on the surface of a substrate from gaseous phase, characterized in that NF₃ as gas containing F atoms and optionally a gas containing H atoms comprising B₂H₆, NH₃, H₂, HF or two or more thereof is added to the gaseous phase. Herein, the gaseous synthesis of hard boron nitride in the present invention can be carried out by any known means. According to the present invention as described above, gaseous synthesis of hard boron nitride can be carried out by not increasing the yield of hard boron nitride during gaseous phase synthesis, but selectively etching and removing hexagonal boron nitride of low pressure phase which is thermodynamically an equilibrium phase and which is necessarily codeposited with the hard boron nitride during gaseous synthesis, and consequently, obtaining on the surface of a substrate hard boron nitride of single phase or with hexagonal boron nitride in such a small amount that practical use is not hindered. According to the present invention, it is found that the selective etching of hexagonal boron nitride is difficult in the atmosphere of the gaseous phase synthesis of the prior art since there is no significant difference in chemcal properties between the hexagonal boron nitride and hard boron nitride, but the selective etching of boron nitride is rendered possible by using NF₃ as gas containing F atoms to form an atmosphere of atomic F. In the present invention, the etching with atomic F is generally carried out by a method comprising subjecting the NF₃ gas containing F atoms introduced into a gaseous phase to excitation and decomposition during gaseous phase synthesis by discharge phenomenon or radiation of electron ray, thus forming atomic F and chemically etching B and N in the boron nitride. Specifically, this is a method utilizing the energy difference between the F-B bond energy and F-N bond energy, and the B-N bond energy in the boron nitride. In the present invention, furthermore, it is effective to use a gas containing H atoms comprising B₂H₆, NH₃H₂, HF or two or more thereof as a raw material gas or additive gas simultaneously with the NF₃ gas. That is, it is further found that hexagonal boron nitride can selectively be etched even by the use of NF₃ as a gas containing F atoms and a gas containing H atoms comprising B₂H₆, NH₃, H₂, HF or two or more thereof. In the present invention, the etching by the use of NF₃ gas and a gas containing H atoms means generally a method comprising reacting NF₃ and the gas containing H atom introduced in a gaseous phase during gaseous phase synthesis of hard boron nitride to form atomic H and atomic F and further form HF and chemically etching B and N in boron nitride with these atomic H, atomic F and HF. Specifically, this method utilizes an energy difference between the F-B and F-N bond energies and H-B and H-N bond energies, and the B-N bond energy in the boron nitride film. Furthermore, an etching effect can be given to some extent by merely reacting the gas containing H atom and the NF₃ gas, but a higher etching effect can be obtained by exciting and decomposing them by discharge phenomenon or by radiation of electron beam. In the present invention the selective etching is carried out simultaneously with the gaseous synthesis, and the gaseous synthesis and selective etching can alternately be carried out with the similar benefits. In the present invention, hexagonal boron nitride can be etched at a rate of about 10 to 100 times as high as the hard boron nitride (cubic boron nitride, wurtzite boron nitride) by the use of NF₃ gas or Nf₃ and a gas containing H atoms(which will hereinafter be referred to as "F atom- and H atom-containing gas" and accordingly, hard boron nitride of single phase or with hexagonal boron nitride in such a small amount that practical use is not hindered can be synthesized on the surface of a substrate at a sufficient rate on a commercial scale. The gaseous phase synthesis of the present invention can be carried out by any of known means as described above, for example, various CVD methods such as thermal CVD methods, DC plasma CVD methods, RF plasma CVD methods, etc., various PVD methods such as ion plating methods, ion beam methods, reactive sputtering methods, magnetron sputtering methods, IVD (ion vapor deposition) methods, etc. The methods comprising adding the NF₃ gas or NF₃ and H atom-containing gas to a raw material gas during gaseous synthesis of the hard boron nitride by the plasma CVD method or ion beam method can be effected by a simple apparatus. The plasma CVD method is generally carried out using a B-containing gas and N-containing gas as a raw material, but in some cases, the raw material can be supplied by vaporizing a solid material such as metallic B, amorphous B, h-BN, etc. or a liquid material containing B or N by high frequency heating and feeding to a film making chamber. The substrate temperatrue is preferably in the range of room temperature to about 1000 °C and the film making pressure is preferably adjusted to an order of 13.3 Pa to 13.3 kPa (10⁻¹ to 10² Torr). In particular, the use of NF₃ gas or NF₃ and H atom-containing gas when the hard boron nitride is synthesized in gaseous phase by the thermal CVD method can be effected in a simple apparatus, enlargement of the area can readily be accomplished. The synthesis of the hard boron nitride by the thermal CVD method is carried out by feeding a gas containing B as a boron source, a gas containing N as a nitrogen source and NF₃ gas or NF₃ and H atom-containing gas according to the present invention to a reaction furnace, reacting them in the reaction furnace and forming the hard boron nitride on a substrate. The boron source or nitrogen source can contain H atom or F atom. The substrate temperature is generally in the range of room temperature to 1000 °C and the film making pressure is generally in the range of 1.33Pa to 133.3 kPa (10⁻² to 10⁺³ Torr) order, but can be lowered to 1.33 x 10⁻² Pa (10⁻⁴ Torr) or lower. On the other hand, the synthesis of the hard boron nitride by the ion beam method, ion plating method or sputtering method is generally carried out by using a solid material such as metallic B, amorphous B or h-BN and an N atom-containing gas such as nitrogen gas, as a raw material, at a substrate temperature of room temperatrue to about 1000 °C and a film making pressure of 1.33 x 10⁻³ Pa to 1.33 Pa (10⁻⁵ to 10⁻² Torr). In the high frequency plasma CVD method such as using RF, microwave or ECR, a B-containing gas and N atom-containing gas are generally used as a raw material, but the raw material can be supplied to a film-making chamber by vaporizing a solid material such as metallic B, amorphous B, h-BN, etc. by high frequency or by bubbling a liquid raw material containing B atom or N atom using a carrier gas. The substrate temperature is generally room temperature to about 1000°C and the film-making pressure is an order of 13.3 Pa to 13.3 kPa (10⁻¹ to 10²Torr). In the present invention, the amount of NF₃ gas to be used or to be added or the amount of NF₃ gas and H atom-containing gas to be used or to be added can suitably be determined depending upon the gaseous phase synthesis method to be employed. The specific hard boron nitride synthesis conditions depend on the method employed and according to each of the film-making conditions, to a film-making chamber are fed F atoms in an amount of about one to 100 times as many as B fed onto a substrate, or H atoms and F atoms in an amount of about one to 100 times as many as B fed onto the substrate. If the number of F atoms fed or the number of H atoms fed are too large, the film-making rate of the hard boron nitride is lowered, which is not commercially preferable, while if they are too small, etching of hexagonal boron nitride is not sufficient to retain it in a large amount, which is not preferable. As illustrated above, according to the present invention, there can be provided a novel and useful process for the synthesis of hard boron nitride by a gaseous phase synthesis technique, which comprises adding NF₃ gas to the gaseous phase or adding NF₃ and H atom-containing gas comprising B₂H₆,NH₃, H₂HF or two or more thereof to the gaseous phase, whereby the codeposited hexagonal boron nitride can selectively be etched and hard boron nitride of substantially single phase can finally be synthesized. The following examples are given in order to illustrate the present invention in detail. Example 1 and Comparative Example 1 - Not Examples of The Present Invention Using an RF plasma CVD apparatus with parallel plates, as shown in Fig. 1, a Si substrate 3 was fitted to a substrate holder 4, a reaction chamber 2 was exhausted to at most 4 x 10⁻⁵kPa (3 x 10⁻⁴ Torr) by the action of an evacuation means (not shown) connected with an exhaust port 10 and the Si substrate 3 was heated to 650°C by a heater 7. Into the reaction chamber 2 were then introduced diborane gas of 0.1 sccm, ammonia gas of 4 sccm, H₂ of 100 sccm and F₂ of 2 sccm from a gas feed inlet 9 and the pressure of the reaction chamber 2 was maintained at 4kPa (30 Torr) by controlling a conductance valve (not shown) provided to the exhaust port 10. Thereafter, an RF power source oscillator 8 of 13.56 MHz, connected to a lower electrode 5, was operated to supply an RF power of 300 W and to form a plasma between the substrate holder 4 and lower electrode 5. Further, a DC power source 6 connected to the substrate holder 4 was operated to apply a DC bias voltage of -400 V to the substrate holder 4. Under this state, boron nitride was deposited on the substrate for 1 hour. When the resulting coating was subjected to measurement of infrared absorption spectrum, no absorption was found by hexagonal boron nitride, but only absorption by cubic boron nitride was found. When it was subjected to transmission electron beam diffraction, only the diffraction line of cubic boron nitride was found (Example 1). For comparison, the substrate was coated with boron nitride for 1 hour under the same conditions as described above except not introducing F₂ gas in the above described procedure and the product was subjected to the similar analysis. In the infrared absorption spectrum absorption by cubic boron nitride was predominant, but absorption by hexagonal boron nitride was also found and in the transmission electron beam diffraction, the diffraction line of hexagonal boron nitride was observed (Comparative Example 1). Example 2 and Comparative Example 2 - Not Examples of The Present Invention Using an RF plasma CVD apparatus with parallel plates, as shown in Fig. 1, a Si substrate 3 was fitted to a substrate holder 4, a reaction chamber 2 was exhausted to at most 4 x 10⁻⁵kPa (3 x 10⁻⁴ Torr) by the action of an evacuation means (not shown) connected with an exhaust port 10 and the Si substrate 3 was heated to 700°C by a a heater 7. Into the reaction chamber 2 were then introduced diborane gas of 0.2 sccm, ammonia gas of 1 sccm, H₂ of 100 sccm and F₂ of 4 sccm from a gas feed inlet 9 and the pressure of the reaction chamber 2 was maintained at 5,3kPa (40 Torr) by controlling a conductance valve (not shown) provided to the exhaust port 10. Thereafter, the similar procedure to Example 1 was conducted to deposit boron nitride on the substrate. When the resulting coating was subjected to measurement of infrared absorption spectrum, no absorption was found by hexagonal boron nitride, but only absorption by cubic boron nitride was found. When it was subjected to transmission electron beam diffraction, only the diffraction line of cubic boron nitride was found (Example 2). For comparison, the substrate was coated with boron nitride for 1 hour under the same conditions as described above except not introducing F₂ gas in the above described procedure and the product was subjected to the similar analysis. In the infrared absorption spectrum, absorption by cubic boron nitride was predominant, but absorption by hexagonal boron nitride was also found and in the transmission electron beam diffraction, the diffraction line of hexagonal boron nitride was observed (Comparative Example 2). Example 3 and Comparative Example 3 Using an RF ion plating apparatus shown in Fig. 2, metallic boron 13 held by a water cooled crucible 12 was melted and vaporized by an electron gun 11. A vacuum vessel 19 was evacuated to 4 x 10⁻⁵kPa (3 x 10⁻⁴ Torr) by an evacuating means (not shown) connected to an exhaust port 10. Thereafter, a shutter 20 was opened and nitrogen gas of 4 x 10⁻⁴kPa (3 x 10⁻³ Torr) and NF₃ gas of 1.3 x 10⁻⁴kPa (1 x 10⁻³ Torr) were respectively introduced from a gas feed inlet 9, during which an ionization electrode 14 was connected with a first RF oscillator 15 of 13.56 MHz to convert the nitrogen gas and NF₃ gas into plasma state. An Si substrate 16 was heated at 650°C by a heater 17 and an RF of 13.56 MHz and 100 W was applied to the substrate 16. 18 designates a second RF oscillator. Under this state, boron nitride was deposited on the substrate for 2 hours. When the resulting coating was subjected to measurement of infrared absorption spectrum, no absorption was found by hexagonal boron nitride, but only absorption by cubic boron nitride was found. When it was subjected to transmission electron beam diffraction, only the diffraction line of cubic boron nitride was found (Example 3). For comparison, the substrate was coated with boron nitride for 1 hour under the same conditions as described above except not introducing NF₃ gas in the above described procedure and the product was subjected to the similar analysis. In the infrared absorption spectrum, absorption by cubic boron nitride was predominant, but absorption by hexagonal boron nitride was also found more and in the transmission electron beam diffraction, the diffraction line of hexagonal boron nitride was observed (Comparative Example 3). Example 4 and Comparative Example 4 Using an RF ion plating apparatus shown in Fig. 2, metallic boron 13 held by a water-cooled crucible 12 was melted and vaporized by an electron X` gun 11. A vacuum vessel 19 was evacuated to 4 x 10⁻⁵kPa (3 x 10⁻⁴ Torr) by an evacuatting means (not shown) connected to an exhaust port 10. Thereafter, a shutter 20 was opened and NF₃ gas of 2.6 x 10⁻⁴kPa (2 x 10⁻³ Torr) and H₂ gas of 5.3 x 10⁻⁴kPa (4 x 10⁻³ Torr) were respectively introduced from a gas feed inlet 9, during which an ionization electrode 14 was connected with a first RF oscillator 15 of 13.56 MHz to convert the NF₃ gas and H₂ gas into plasma state. An Si substrate 16 was heated at 600 °C by a heater 17 and an RF of 13.56 MHz and 100 W was applied to the substrate 16. 18 designates a second RF oscillator. Under this state, boron nitride was deposited on the substrate for 2 hours. When the resulting coating was subjected to measurement of infrared absorption spectrum, no absorption was found by hexagonal boron nitride, but only absorption by cubic boron nitride was found. When it was subjected to transmission electron beam diffraction, only the diffraction line of cubic boron nitride was found (Example 4). For comparison, the substrate was coated with boron nitride for 2 hour under the same conditions as described above except introducing N₂ gas instead of the NF₃ gas in the above described procedure and the product was subjected to the similar analysis. In the infrared absorption spectrum, absorption by cubic boron nitride was predominant, but absorption by hexagonal boron nitride was also found more and in the transmission electron beam diffraction, the diffraction line of hexagonal boron nitride was observed (Comparative Example 4). Example 5 and Comparative Example 5- Not Examples of The Present Invention Using a sputtering apparatus, as shown in Fig. 3, a stainless steel substrate 22 was fitted to a substrate holder 21, metallic boron 24 as a target was fitted to a lower electrode 23, a reaction chamber 26 was evacuated to at most 4 x 10⁻⁵kPa (3 x 10⁻⁴ Torr) by the action of an evacuation means (not shown) connected with an exhaust port 10 and the stainless steel substrate 22 was heated to 700 °C by a heater 27. Into the reaction chamber 26 were then introduced nitrogen gas of 5 sccm and F₂ gas of 2 sccm from a gas feed inlet 9 and the pressure of the reaction chamber 26 was main $ tained at 6.6 x 10⁻³kPa (5 x 10⁻² Torr) by controlling a conductance valve 28 provided at the exhaust port 10. Thereafter, an RF power source oscillator 29 of 13.56 MHz, connected to the lower electrode 23, was operated to supply an RF power of 500 W and to form a plasma between the substrate holder 21 and lower electrode 23. Further, a DC power source 30 connected to the substrate holder 21 was operated to apply a DC bias voltage of -200 V to the substrate holder 21. Under this state, boron nitride was deposited on the stainless steel substrate for 1 hour. A magnet 25 was provided under the metallic boron target 24 to increase the sputtering efficiency. When the resulting thin film was subjected to measurement of infrared absorption spectrum, no absorption was found by hexagonal boron nitride, but only absorption by cubic boron nitride was found. When it was subjected to transmission electron beam diffraction, only the diffraction line of cubic boron nitride was found (Example 5). For comparison, the substrate was coated with boron nitride for 1 hour under the same conditions as described above except not introducing F₂ gas in the above described procedure and the product was subjected to the similar analysis. In the infrared absorption spectrum, absorption by cubic boron nitride was predominant, but absorption by hexagonal boron nitride was also found and in the transmission electron beam diffraction, the diffraction line of hexagonal boron nitride was observed (Comparative Example 5). Example 6 and Comparative Example 6 - Not Examples of The Present Invention Using a sputtering apparatus, as shown in Fig. 3, a stainless steel substrate 22 was fitted to a substrate holder 21, metallic boron 24 as a target was fitted to a lower electrode 23, a reaction chamber 26 was evacuated to at most 4 x 10⁻⁵kPa (3 x 10⁻⁴ Torr) by the action of an evacuation means (not shown) connected with an exhaust port 10 and the stainless steel substrate 22 was heated to 650 °C by a heater 27. Into the reaction chamber 26 were then introduced nitrogen gas of 2 sccm, H₂ gas of 4 4 sccm and F₂ gas of 4 sccm from a gas feed inlet 9 and the pressure of the reaction chamber 26 was maintained at 5.32 x 10⁻³kPa (4x10⁻² Torr) by controlling a conductance valve 28 provided at the exhaust port 10. Thereafter, an RF power source oscillator 29 of 13.56 MHz, connected to the lower electrode 23, was operated to supply an RF power of 500 W and to form a plasma between the substrate holder 21 and lower electrode 23. Further, a DC power source 30 connected to the substrate holder 21 was operated to apply a DC bias voltage of -200 V to the substrate holder 21. Under this state, boron nitride was deposited on the stainless steel substrate for 1 hour. A magnet 25 was provided under the metallic boron target 24 to increase the sputtering efficiency. When the resulting thin film was subjected to measurement of infrared absorption spectrum, no absorption was found by hexagonal boron nitride, but only absorption by cubic boron nitride was found. When it was subjected to transmission electron beam diffraction, only the diffraction line of cubic boron nitride was found (Example 6). For comparison, the substrate was coated with boron nitride for 1 hour under the same conditions as described above except not introducing H₂ gas and F₂ gas in the above described procedure and the product was subjected to the similar analysis. In the infrared absorption spectrum, absorption by cubic boron nitride was predominant, but absorption by hexagonal boron nitride was also found and in the transmission electron beam diffraction, the diffraction line of hexagonal boron nitride was observed (Comparative Example 6). Example 7 and Comparative Example 7 - Not Examples of The Present Invention Using a thermal CVD apparatus, as shown in Fig. 4, a Si substrate 33 was fitted to a substrate holder 34 and a reaction chamber 32 was evacuated to at most 4 x 10⁻⁵kPa (3 x 10⁻⁴ Torr) by the action of an evacuation means (not shown) connected with an exhaust port 35. The substrate holder 34 was heated by supplying an induction heating coil 36 with high frequency from a high frequency power source 37 to maintain the Si substrate 33 at 800 °C. Into the reaction chamber 32 were then introduced B₂H₆ gas of 0.1 sccm, NH₃ gas of 2 sccm, H₂ gas Of 100 sccm and F₂ gas of 20 sccm from a gas feed inlet 9 and the pressure of the reaction chamber 32 was maintained at 0.0133kPa (0.1 Torr) by controlling a conductance valve (not shown) provided in the exhaust port 35 and boron nitride was deposited on the substrate for 4 hours. When the resulting coating was subjected to measurement of infrared absorption spectrum, no absorption was found by hexagonal boron nitride, but only absorption by cubic boron nitride was found. When it was subjected to transmission electron beam diffraction, only the diffraction line of cubic boron nitride was found (Example 7). For comparison, the substrate was coated with boron nitride for 4 hours under the same conditions as described above except not introducing F₂ gas in the above described procedure and the product was subjected to the similar analysis. In the infrared absorption spectrum, only absorption by hexagonal boron nitride was observed and formation of cubic boron nitride was not found and in the transmission electron beam diffraction, only the diffraction line of hexagonal boron nitride was observed and formation of cubic boron nitride was not found (Comparative Example 7). It will clearly be understood from the above described Examples and Comparative Examples that gaseous phase synthesis of hard boron nitride of substantially single phase can be carried out on a substrate by a simple apparatus according to the present invention.

Claims: A process for the synthesis of hard boron nitride by depositing hard boron nitride on the surface of a substrate from gaseous phase, characterized in that NF₃ as a gas containing F atoms is added to the gaseous phase. A process as claimed in claim 1 wherein the NF₃ gas is added to a raw material gas during the gaseous synthesis of hard boron nitride. A process as claimed in claim 1 or claim 2 wherein the F atoms are present in an amount of one to 100 times as many as the B atoms. A process as claimed in claim 1, characterized in that in addition to NF₃ as a gas containing F atoms a gas containing H atoms comprising B₂H₆, NH₃, H₂, HF or two or more thereof is added to the gaseous phase. A process as claimed in claim 4, wherein the NF₃ gas and the gas containing H atoms are added to a raw material gas during the gaseous synthesis of hard boron nitride. A process as claimed in claim 4 or claim 5, wherein the F atoms and H atoms are present in an amount of one to 100 times as many as the B atoms. A process as claimed in any one of the preceding claims, wherein the depositing of hard boron nitride is carried out by a thermal CVD method, DC plasma CVD method, RF plasma CVD method, ion plating method, ion beam method, reactive sputtering method, magnetron sputtering method or IVD method. A process as claimed in claim 7, wherein the plasma CVD method is carried out by the use of a B-containing gas and N-containing gas. A process as claimed in claim 7, wherein the plasma CVD method is carried out by evaporating a solid material selected from metallic B, amorphous B and h-BN. A process as claimed in claim 7, wherein the plasma CVD method is carried out by evaporating a liquid material containing B and N. A process as claimed in claim 7, wherein the thermal CVD method is carried out by the use of a B-containing gas and an N-containing gas. A process as claimed in claim 7, wherein the ion beam method, ion plating method or sputtering method is carried out by the use of a solid material selected from metallic B, amorphous B or h-BN and an N-containing gas.

Inventors: FUJITA NOBUHIKO C O ITAMI WORK, NAKAGAMA SHYOJI C O ITAMI WORK, NAKAYAMA AKIRA C O ITAMI WORKS, TOMIKAWA TADASHI C O ITAMI WOR, FUJITA, NOBUHIKO, C/O ITAMI WORKS OF SUMITOMO, NAKAGAMA, SHYOJI, C/O ITAMI WORKS OF SUMITOMO, NAKAYAMA, AKIRA, C/O ITAMI WORKS OF SUMITOMO, TOMIKAWA, TADASHI, C/O ITAMI WORKS OF SUMITOMO
Applicants: SUMITOMO ELECTRIC INDUSTRIES, SUMITOMO ELECTRIC INDUSTRIES, LIMITED
Application year: 1991
Main classification: C23C16
IPC codes: C01B21, C23C14, C23C16, C30B29