Multilayer printed circuit board and production thereof

Abstract: A multilayer printed circuit board comprising a plurality of alternately laminated layers of insulating layers and circuit conductor layers having a signal transmission delay time of 6.0 ns/m or less, excellent in heat resistance, adhesive, fire retardance, etc. can be produced by forming insulating layers using a fluorine-containing thermosetting resin composition.

Description: This invention relates to a thermosetting resin composition usuable as insulating material for multilayer printed circuit boards, electronic and semiconductor devices, corresponding multilayer printed circuit boards, and a process for producing the same. More particularly, the present invention relates to multilayer printed circuit boards having a high density, a high signal transmission speed and flame retardance, a process for producing the same and to electronic devices comprising such boards. Recently, large-sized electronic computers are required to have a higher density, and high speed operation. Thus, multilayer printed circuit boards used therefor are also required to show such properties with severe demands. Generally speaking, the operation speed of an electronic computer is greatly influenced by the signal transmission speed of circuits in multilayer printed circuit boards. In order to improve the signal transmission speed of circuits, it is necessary to develop flame retardant resin materials excellent in adhesiveness to conductor circuit layers (mainly made of copper). Fluorine-containing materials heretofore used such as polytetrafluoroethylene (PTFE) are thermoplastic resins, so that there were problems in poor dimensional stability and poor through-hole reliability when used in multilayer printed circuit boards. Further, since there were no suitable solvents, adhesion of laminated layers had to be achieved by a melt pressure bonding method. But since the melting temperature was so high (e.g. 250 to 350°C) there were problems in that the workability was poor and the handling was difficult compared with epoxy resins and the like. On the other hand, there has been developed a resin material comprising 1,2-polybutadiene having double bonds at side chains and a cross-linking type fire retardant of a bifunctional monomer (JP-55-1264751). But when a low molecular weight polymer is used, considering the impregnation properties into fibrous substrates, the resulting prepreg is poor in cutting processing and storage due to the high adhesiveness of the prepreg, and also influences the workability at the time of bonding of laminated layers. A material for producing multilayer printed circuit boards containing a cyanate compound is disclosed in US 4 559 394. EP 153 603 discloses a thermosetting resin composition comprising an aromatic biscyanamide compound, e.g. 2,2'-bis-(3-methyl-4-(4-cyanamidophenoxy)phenyl)propane, which may be used, inter alia, for the manufacture of printed circuit boards. These biscyanamide compounds do not comprise fluorine-containing groups. It is an object of the present invention to provide a thermosetting resin composition with good moldability for forming insulating layers low in dielectric constant and excellent in heat resistance, adhesiveness, fire retardance and moisture resistance, curable sheets and cured products, particularly multilayer printed circuit boards, obtained by using this thermosetting resin composition. It is another object of the present invention to provide a process for producing such multilayer printed circuit boards, semiconductor devices and electronic devices using such multilayer printed circuit boards. The above objects are achieved according to the independent claims. The dependent claims relate to preferred embodiments. The thermosetting resin composition of the present invention on the basis of biscyanamide compounds is characterized in that it comprises a fluorine-containing biscyanamide compound of the following formula I wherein X is -O-, -S-, -SO-, -SO 2 -, -CO-, or R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are independently a hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, a lower fluoroalkyl group having 1 to 4 carbon atoms, or an allylene group, n is 0 or 1, Rf ist a perfluoroalkyl group having 1 to 10 carbon atoms, and the cyanamide groups are positioned at the m- or p-position with respect to the ether linkage. In accordance with a prefered embodiment, the thermosetting resin composition of the present invention comprises (A) 100 parts by weight of the compound of formula I, and (B) 10 to 900 parts by weight of one or several secondary thermosetting resin components, preferably selected from compounds having one or more ethylenically unsaturated double bonds, epoxy compounds, phenolic compounds, melamine compounds, compounds having an N-substituted unsaturated imido group, cyanate compounds, isocyanate compounds and cyanamide compounds, the resin components (B) being different from the compound (A). The curable sheets of the present invention comprise a sheet-like material impregnated with a resin composition as defined above, and dried. The multilayer printed circuit boards of the present invention comprise a plurality of circuit conductor layers and a plurality of insulating layers, which are obtained by curing a thermosetting resin composition according to the invention, wherein the insulating layers and the circuit layers are laminated alternately. The method of the present invention producing multilayer printed circuit boards comprises the following steps: (a) preparing a prepolymer by heating and/or exposing to light a thermosetting resin composition of the invention, (b) forming a curable sheet by impregnating a fibrous material with a solution obtained by dissolving the prepolymer in a solvent, (c) forming a metal foil-clad laminate by laminating at least one curable sheet obtained above and a metal foil for the circuit conductors and bonding under pressure with heating, (d) forming an inner layer circuit substrate having circuits with a circuit conductor width (w) of 10 to 50 µm, a circuit conductor thickness (t) of 50 to 200 µm, and an aspect ratio (t/w) of 1.0 to 20 on at least one side of the metal foil-clad laminate, and (e) laminating alternately a plurality of the curable sheets and a plurality of inner layer circuit substrates and heating under pressure for bonding so as to make at least one surface of the laminated layers a circuit conductor layer. The present invention further provides electronic devices using such a multilayer printed circuit board or semiconductor devices. Such electronic devices comprise a multilayer printed circuit board as defined above, and one or several semiconductor elements, preferably memory LSI's having an integration density of 1 Mbit or more, wherein the circuit conductor layers of the multilayer printed circuit boards are electrically connected to leads of the semiconductor elements. A semiconductor device according to the invention comprises a semiconductor element, a lead portion and an adhesive layer provided between the semiconductor element and the lead portion, the adhesive layer being a cured thermosetting resin composition according to the present invention. In the following, the invention will be further described with reference to prefered embodiments and the drawings. Fig. 1A is a schematic view explaining a process for producing a double-sided copper-clad laminate. Fig. 1B is a schematic cross-sectional view of the interlayer substrate before and after formation of inner layer circuits. Fig. 1C is a perspective view with cross-section of a multilayer printed circuit board and a step of production thereof. Fig. 2 is a cross-sectional view of a multilayer printed circuit board. Fig. 3 is an NMR spectrum of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-cyanoamino-2-trifluoromethylphenoxy)-phenyl]propane (p-HFCTP-2). Fig. 4 is an IR spectrum of p-HFCTP-2. The multilayer printed circuit board comprising a plurality of alternately laminated layers of insulating layers and circuit conductor layers, and a circuit conductor layer formed on at least one outer surface of the laminated layers of the present invention is characterized in that the insulating layers are formed by curing curable sheets obtained by impregnating a fibrous material with a fluorine-containing thermosetting resin composition comprising a biscyanamide compound of the above formula I. The resulting cured insulating layers have a relative dielectric constant (ε) of 3.0 or less at 1 MHz, a fire retardance of the grade of V-O by the UL-94 standards, a 5% weight loss temperature of 400°C or higher, and a peel strength of 1.0 kg/cm or more. By using such insulating layers, it is possible to provide a low thermal expansion coefficient, good thermal dimensional stability due to a low shrinkage, improved adhesiveness to the metal of the circuit conductor layers and improved moisture resistance. The thermosetting resin composition comprising a fluorine-containing biscyanamide compound of the formula I gives a three-dimensionally crosslinked cured product with heating. At the time of heating, the biscyanamide groups in the compounds of formula I form in the chemical structure a hetero ring such as a melamine ring and/or isomelamine ring which are excellent in heat resistance and fire retardance. The present invention is characterized by forming a cured product containing melamine rings and/or isomelamine rings with suitable amounts of fluorine-containing groups. That is, when the substitution degree with fluorine-containing groups is too high , the hetero ring forming ability is reduced which leads to a lower heat resistance. On the other hand, when the substitution degree with fluorine-containing groups is too small, it is difficult to attain a low relative dielectric constant. Further, it is still more surprising that the cured products of the compounds of formula I are excellent in adhesive strength (peel strength) to copper which forms the circuit conductor layers. This is quite different from ordinary fluorine-containing resins such as PTFE which possess a remarkably low adhesive strength (peel strength) to metals such as copper. These are very important properties for making multilayer printed circuit boards with more layers and a higher density and for preventing troubles such as peeling of individual layers. Further, according to the present invention, a good fire retardance can be obtained without adding a fire retardant due to interactions caused by the combined presence of suitable proportions of hetero ring linkages and fluorine atoms. The multilayer printed circuit board comprising a plurality of alternately laminated layers of insulating layers obtained by curing the curable sheets with heating and circuit conductor layers wherein the insulating layers have a thickness (h) of 200 to 500 µm and a relative dielectric constant (ε) at 1 MHz of 3.0 or less and the circuit conductor layers have a circuit conductor width (w) of 10 to 50 µm, a circuit conductor thickness (t) of 50 to 200 µm, and an aspect ratio (t/w) of 1.0 to 20, permit to attain a higher mounting density of 1.2 to 2.0 times larger than that of known multilayer printed circuit boards. Further, the signal transmission delay time of the circuit conductor layer becomes 6.0 ns/m or less, resulting in attaining higher speed operation comparing with known multilayer printed circuit boards. In order to make the above-mentioned effects more effective, it is preferable to design so as to make the thickness (h) of the insulating layer 260 to 460 µm, the relative dielectric constant (ε) 2.2 to 3.0, the circuit conductor width (w) 20 to 50 µm, the circuit conductor thickness (t) 60 to 150 µm, and the aspect ratio (t/w) 1.5 to 6.0. When the aspect ratio becomes more than 6.0, the wiring pattern thickness (t) becomes as thick as 150 µm or more, resulting in often making it difficult to obtain a thinner multilayer printed circuit board. As fluorine-containing biscyanamide compounds of the formula I, the following compounds can be used: 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)-phenyl]propane, 1,1,1,2,2,4,4,5,5,5-decafluoro-3,3-bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)-phenyl]pentane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2-pentafluoroethyl-4-cyanaminophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2-heptafluoropropyl-4-cyanaminophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(3-trifluoromethyl-4-cyanaminophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(3-trifluoromethyl-5-cyanaminophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2-trifluoromethyl-5-cyanaminophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2-trifluoromethyl-3-cyanaminophenoxy)-phenyl]propane, 4,4'-bis(2-trifluoromethyl-4-cyanaminophenoxy)-biphenyl, bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)-phenyl]ether, bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)-phenyl]sulfide, bis[4-(2-trifluoromethyl-4,cyanaminophenoxy)-phenyl]sulfoxide, bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)-phenyl]sulfone, bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)-phenyl]ketone, bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)-phenyl]methane, 2,2-bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)-phenyl]propane, etc. The fluorine-containing thermosetting resin composition is particularly effective when the composition comprises 100 parts by weight cf the biscyanamide compound of the formula I and 10 to 200 parts by weight of a secondary thermosetting component. As the secondary thermosetting component, there can be used at least one compound selected from compounds having one or more ethylenically unsaturated double bonds, epoxy compounds, phenolic compounds, melamine compounds, compounds having an N-substituted unsaturated imido group, cyanate compounds, isocyanate compounds and cyanamide compounds except for those of the formula I. Among them, the use of epoxy compounds, phenolic compounds, melamine compounds, compounds having an N-substituted unsaturated imido group, and mixtures thereof, is preferable. As the epoxy compounds, there can be used 2,2-bis[4-(2,3-epoxypropoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2,3-epoxypropoxy)-phenyl]propane, bis(2,3-epoxypropyl)-terephthalate, bis(2,3-epoxypropyl)-isophthalate, bis(2,3-epoxypropyl)phthalate, 1,3,5-tris-(2,3-epoxypropyl)phloroglucinol, 4,4-bis(2,3-epoxypropylphenyl)ether, 2-(2,3-epoxypropyl)-phenyl-2,3-epoxypropylether, 2,2-bis[4-(2,3-epoxypropoxy)-3,5-dibromophenyl]propane, 1,1,2,2-tetrakis[4-(2,3-epoxypropoxy)-phenyl]ethane, polyphenol-formaldehyde-poly(2,3-epoxypropyl)-ether, poly-o-cresol-formaldehyde-poly(2,3-epoxypropyl)-ether, 1,4-bis(2,3-epoxypropoxy)butane, 1,2-bis(2,3-epoxy-2-methylpropoxy)ethane, 1,3-bis[3-(2,3-epoxypropoxy)-propyl]tetramethyldisiloxane, epoxidized polybutadiene, polypropyleneglycol-bis(2,3-epoxypropyl)ether, 1,2,3-tris(2,3-epoxypropoxy)propane, 2,3-epoxypropylallylether telomer, 2,6-bis-(2,3-epoxypropoxy)norbornene, 2,2-bis[4-(2,3-epoxypropoxy)-cyclohexyl]propane, 4-(1,2-epoxyethyl)-1,2-epoxycyclohexane, etc. When an epoxy compound is used, it is possible to use together a conventional curing agent for the epoxy resin and a curing accelerator (e.g. disclosed in H. Kakiuchi: Epoxy Resins, pp. 109-149, published by Shokodo (1965)). As the phenolic compounds, there can be used novolak type or resol type phenol-formaldehyde condensates obtained from a phenol such as phenol, cresol, xylenol, trimethylphenol, trifluoromethylphenol, p-hydroxystyrene, etc. As the melamine compounds, there can be used melamine, benzoguanine, dicyanediamide, vinyltriazine, hydroxytriazine, o-tolylbiguanide, 1,3-di-o-triguanidine, 1,3-diphenylguanidine, propyltriazine, or reaction condensates of melamine and an aldehyde. As the compounds having an N-substituted unsaturated imido group, there can be used o-phenyl-maleimide, m-phenylmaleimide, p-phenylmaleimide, phenylcitraconimide, phenylitaconimide, phenylnadicimide, phenylmethylendomethylenetetrahydrophthalimide, N,N'-p-phenylenebismaleimide, N,N'-p-phenylenebismethylendomethylenetetrahydrophthalimide, N,N'-p-phenylenebiscitraconimide, N,N'-p-phenylenebisitaconimide, N,N'-m-xylenebismaleimide, N,N'-m-phenylenebismaleimide, N,N'-(methylenedi-p-phenylene)-bismaleimide, N,N'-4,4'-di(phenylthioether)-bismaleimide, N,N'-4,4'-di(diphenyl ether)-bismaleimide, N,N'-methylenebis(3-chlorophenylene)maleimide, N,N'-(sulfonyldi-p-phenylene)-bismaleimide, N,N'-4,4'-di(phenylcyclohexane)-bismaleimide, 2,2-bis[4-(4-maleimidophenoxy)-phenyl]propane,2,2-bis[4-(4-maleimidophenoxy)-phenyl]-1,1,1,3,3,3-hexafluoropropane, 2,2-bis[4-(4-maleimido-2-trifluoromethylphenoxy)-phenyl]-1,1,1,3,3,3-hexafluoropropane, and the like bismaleimides. It is also possible to use a polyvalent maleimide obtained by reacting a condensate of aniline and an aldehyde with maleic anhydride and represented by the formula II, wherein p is an integer of 1 to 10. Other suitable maleimide compounds are 2,2-bis[4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-methyl-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[chloro-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-bromo-4-(4-maleimidophenoxy)-phenyl)propane, 2,2-bis[3-ethyl-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-propyl-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-isopropyl-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-butyl-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-sec-butyl-4-(4-maleimidophenoxy)-phenyl]propane, 2-2-bis[3-methoxy-4-(4-maleimidophenoxy)-phenyl]propane, 1,1-bis[4-(4-maleimidophenoxy)-phenyl]ethane, 1,1-bis[3-methyl-4-(4-maleimidophenoxy)-phenyl]ethane, 1,1-bis[3-chloro-4-(4-maleimidophenoxy)-phenyl]ethane, 1,1-bis[3-bromo-4-(4-maleimidophenoxy)-phenyl]ethane, bis[4-(4-maleimidophenoxy)-phenyl]methane, bis[3-methyl-4-(4-maleimidophenoxy)-phenyl]methane, bis[3-chloro-4-(4-maleimidophenoxy)-phenyl]methane, bis[3-bromo-4-(4-maleimidophenoxy)-phenyl]methane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-maleimidophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexachloro-2,2-bis[4-(4-maleimidophenoxy)-phenyl]propane, 3,3-bis[4-(4-maleimidophenoxy)-phenyl]pentane, 1,1-bis[4-(4-maleimidophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoroimidophenoxy)-phenyl], 1,1,1,3,3,3-hexafluoro-2,2-bis[3,5-dibromo-4-(4-maleimidophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[3-methyl-4-(4-maleimidophenoxy)-phenyl]propane, etc. The compounds of the formula: are effective for improving heat resistance and fire retardancy imparting effect. Thus, these compounds are particularly effective for obtaining balanced effects. The composition containing a biscyanamide compound of the formula I is subjected to polymerization reaction using a radical polymerization reaction. As the radical polymerization initiators, there can be used benzoyl peroxide, para-chlorobenzoyl peroxide, 2,4-dichlorobenzoyl peroxide, lauroyl peroxide, dicumyl peroxide, acetyl peroxide, methyl ethyl ketone peroxide, cyclohexanone peroxide, bis (1-hydroxycyclohexylperoxide), 2,5-bimethylhexane-2,5-dihydroperoxide, t-butyl-perbenzoate, 2,5-dimethyl-2,5-(t-butyl peroxy)-hexane, 2,5-dimethyl-2,5-(t-butyl peroxy)-hexyl-3,2,5-dimethylhexyl-2,5-di(peroxybenzoate), cumene hydroperoxide, t-butylhydroperoxide, t-butylperoxybenzoate, t-butylperoxyacetate, t-butylperoxyoctate, t-butylperoxyisobutylate, dibenzylperoxide, di-t-butylperoxyphthalate, etc. These radical polymerization initiators can be used alone or in the form of mixtures thereof. The radical polymerization initiator is used in an amount of preferably 0.01 to 5 parts by weight, and more preferably 0.05 to 3 parts by weight, per 100 parts by weight of the resin composition. As catalysts for forming melamine rings and/or isomelamine rings by trimerization of the cyanamido groups, there can be used metal salts such as cobalt naphthenate, cobalt octanoate, zinc octanoate, potassium acetate, sodium acetate, sodium cyanide, sodium cyanate, isocyanic acid, sodium borohydride, etc.; sodium methoxide, sodium hydroxide; salts of pyridine; tertiary amines such as triethylamine, etc.; Lewis acids such as aluminum chloride, bromine trifluoride, ferric chloride, titanium chloride, zinc chloride, etc. The thermosetting resin composition comprising a biscyanamide compound of the formula I can be used in the form of a curable sheet such as a prepreg, an impregnated mat, etc. to form printed circuit boards, multilayer wiring substrates, etc. The method for producing multilayer printed circuit boards as defined above is explained hereinafter referring to Figs. 1A to 1C. As shown in Fig. 1A, a resin composition (uncured) 1 containing a biscyanamide compound of the formula I is dissolved in a solvent to prepare a varnish with a predetermined concentration. In order to accelerate the dissolution or in order to allow the reaction to proceed slightly, heating can be employed. As the solvent, there can preferably be used water, toluene, xylene, acetone, methanol, ethanol, methyl ethyl ketone, methyl isobutyl ketone, 3-methoxypropanol, 2-methoxyethanol, N,N-dimethylformamide, N-methylpyrrolidone, dimethylsulfoxide, trichloroethylene, 1,1,2-trichloroethane, tetrahydrofuran, dichloromethane, diisobuytyl ether, trichlorotrifluoroethane, etc., alone or as a mixture thereof. The curable sheet (or coated cloth or prepreg) 3 can be obtained by impregnating (or coating) a sheet-like material such as glass cloth 2 with the varnish for impregnation thus obtained, followed by removal of the solvent and drying. The impregnation or coating temperature depends on the solvent and the polymerization initiator used. In the curable sheet, the resin composition has a viscosity of 10 2 to 10 4 P when melted with heating at 100 to 170°C and capacity of forming melamine rings and/or isomelamine rings when heated at 180°C or higher. A copper-clad laminate 6 can be obtained by laminating a predetermined number of the coated cloth 3 (one sheet being possible) with a metal foil 4 (e.g. copper foil) on one side or both sides of the coated cloth, and heating at 100 to 250°C under a pressure of 1 to 100 kg/cm 2 using a hot plate 5. Numeral 7 denotes the cured resin. As the sheet-like material 2, there can be used woven fabrics, non-woven fabrics, films, and the like conventionally used as laminating materials. More concretely, there can be used woven fabrics and non-woven fabrics made from various glass fibers such as E glass, C glass, A glass, T glass, D glass, Q glass, etc. having silica, alumina, etc. as components; woven fabrics, non-woven fabrics, and films made from aramide, fluorine polymers such as polytetrafluoroethylene, polyamides, polyimides, polyethers, polyesters, etc. As shown in Fig. 1B, at least one side of the copper-clad laminate 6 is etched to form an inner layer circuit, and inner layer circuit substrates 8, 8' and 8" are formed. Numeral 10 denotes a printed circuit, and numeral 12 denotes a through hole. As shown in Fig. 1C, the inner layer circuit substrates (conductor circuit layers) 8, 8' and 8" and curable sheets 3 are laminated alternately and heated using a pair of hot plates 5 at 100 to 250°C under a pressure of 1 to 100 kg/cm 2 to form a multilayer printed circuit substrate (or board) 9. Numeral 11 denotes inner layer circuits. One feature of the present invention resides in the sizes of the insulating layers and the signal wiring layers of the thus obtained multilayer printed circuit board. Fig. 2 is a cross-sectional view of a multilayer printed circuit board. In order to make the density of multilayer printed circuit boards higher and the signal transmission faster, it is necessary to reduce the circuit size (the circuit layer thickness "t" and the circuit layer width "w") and to make the number of wiring circuit layers larger. However, when the thickness of circuit layer (t) (or signal wiring pattern thickness) is 200 µm or more, there arise problems in that the potential drop becomes large, misregister of individual layers takes place, disconnection takes place due to a difference in size precision of the circuit layers and the insulating layers, peeling of individual layers, and there arises a limitation in the circuit design. In the multilayer printed circuit board of Fig. 2, when the impedance has a predetermined value, the circuit layer width (w) (signal wiring pattern width) becomes smaller and the circuit layer thickness (t) becomes larger with smaller dielectric constant (ε) of the insulating layers 15 and 30. In contrast thereto, when the value ε becomes larger, the circuit layer width (w) becomes larger and the circuit layer thickness (t) becomes smaller. In Fig. 2, numeral 15 denotes an insulating layer (an adhesive layer), numeral 20 a signal wiring layer, numeral 30 an insulating layer (a material layer), numeral 40 is a power source supplying layer, mark "a" denotes the adhesive layer thickness, mark "b" denotes the material thickness, and mark "h" denotes the insulating layer thickness. According to the present invention, by using a cured product of the resin composition containing a biscyanamide compound of the formula I as the insulating layers 15 and 30, the value "ε" of the insulating layers can be made 3.0 or less, the thickness of the insulating layers (h) can be made 200 to 500 µm, the wiring pattern width (w) (the width of circuit conductor layer 20) can be made 10 to 50 µm, the wiring pattern thickness (t) (the thickness of circuit conductor layer 20) can be made 50 to 200 µm, and the aspect ratio (t/w) can be made 1.0 to 20. Further, by this, the signal transmission delay time at the circuit conductor layer can be made 6.0 ns/m or less. In addition, by imparting adhesiveness to the circuit conductor layer to a metal such as copper, it is possible to obtain a multilayer printed circuit board with more layers and with larger density. The thermosetting resin composition containing a biscyanamide compound of the formula I can be used as a laminating material for various printed circuit boards, a material for encapsulating semiconductors, an insulating material (film) between semiconductor layers, a coating material for cables, a structural material for connectors, a material for aerospace technology, a material for cars, etc. Further, according to the present invention, there can be provided electronic devices wherein circuit conductor layers of a multilayer printed circuit board obtained by alternately laminating and bonding insulating layers and circuit conductor layers, are electrically connected via bumps to leads of semiconductor elements such as memory LSI having an integration of 1 megabit or more, each insulating layer having a thickness (h) of 200 to 500 µm and a relative dielectric constant (ε) at 1 MHz of 3.0 or less, and each circuit conductor layer having a circuit conductor width (w) of 10 to 50 µm, a circuit conductor thickness (t) of 50 to 200 µm, and an aspect ratio (t/w) of 1.0 to 20. The present invention still further provides electronic devices wherein at least one semiconductor element and a part of the lead wires are coated or/and encapsulated with the thermosetting resin composition containing a biscyanamide compound having the formula I; the IR spectrum of a cured product of the resin composition obtained with heating have absorptions in the IR spectrum due to -NH-, -O-, F, and melamine rings or isomelamine rings. The present invention also provides semiconductor devices wherein an adhesive layer is present between a semiconductor element and a lead portion, said adhesive layer being made from a thermosetting resin composition containing a biscyanamide compound having the formula I with heating at a temperature of 150°C or higher, said adhesive layer having a glass transition temperature of 200°C or higher, a resistivity of 1.10 -5 to 1.10 -3 Ω·cm, and a relative dielectric constant of 5.0 or less. This invention is illustrated by way of Production Examples for synthesizing fluorine-containing biscyanamide compounds of the formula I and Examples for producing multilayer printed circuit boards. Production Example 1 Synthesis of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]propane (p-HFCTP-2) Bromocyanogen in an amount of 63.5 g, and 25.2 g of sodium bicarbonate were dissolved in a mixed solvent of 75 ml of water and 50 ml of dimethylacetamide with sufficient stirring (in a cooled state). To the resulting solution, a solution obtained by dissolving 98.1 g of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-amino-2-trifluoromethylphenoxy)-phenyl]propane in 300 ml of dimethylacetamide was added dropwise in about 4 hours while maintaining the cooled state at 0 to 10°C. After dropwise addition, aging was conducted for 12 hours. The resulting reaction solution was dropped in 1000 ml of water with stirring to deposit a pale yellow precipitate. The precipitate was separated by suction filtration. The resulting precipitate was charged into 1000 ml of water again, washed with water, filtered again and washed with water. The resulting filtered solid was subjected to filtration under reduced pressure (drying conditions; temperature 30°C, pressure 10 mmHg, period 12 h) to yield 104.8 g of crystals of the objective compound, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]propane (yield 98.2%). The resulting compound (p-HFCTP-2) had a melting point of 55 to 60°C. The IR spectrum of this compound is shown in Fig. 4, the NMR spectrum in Fig. 3. p-HFCTP-2 is represented by the formula: Production Example 2 Synthesis of 1,1,1,3,3,3-hexafluoro-2,2-bis[4(4-cyanamino-3-trifluoromethylphenoxy)-phenyl]-propane (p-HFCTP-3) The process of Production Example 1 was repeated except for using 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-amino-3-trifluoromethylphenoxy)-phenyl]propane in place of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-amino-2-trifluoromethylphenoxy)-phenyl]propane to yield 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-cyanamino-3-trifluoromethylphenoxy)-phenyl]propane (p-HFCTP-3) in a yield of 98.0%. Production Example 3 Synthesis of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(3-cyanamino-5-trifluoromethylphenoxy)-phenyl]propane (p-HFCTP-5) The process of Production Example 1 was repeated except for using 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(3-amino-5-trifluoromethylphenoxy)-phenyl]propane in place of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-amino-2-trifluoromethylphenoxy)-phenyl]propane to yield 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(3-cyano-5-trifluoromethylphenoxy)phenyl]propane in a yield of 98.0%. Production Example 4 Synthesis of bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]ether The process of Production Example 1 was repeated except for using 98.1 g of bis[(4-amino-2-trifluoromethylphenoxy)-phenyl]ether in place of 98.1 g of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-amino-2-trifluoromethylphenoxy)-phenyl]propane to yield bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]ether in a yield of 96.9%. Production Example 5 The process of Production Example 1 was repeated except for using 90.5 g of bis[(4-amino-2-trifluoromethylphenoxy)-phenyl]sulfone in place of 98.1 g of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-amino-2-trifluoromethylphenoxy)-phenyl]propane to yield bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]sulfone in a yield of 97.7%. Production Example 6 Synthesis of bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl] sulfide The process of Production Example 1 was repeated except for using 89.2 g of bis[(4-amino-2-trifluoromethylphenoxy)-phenyl]sulfide in place of 98.1 g of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-amino-2-trifluoromethylphenoxy)-phenyl]propane to yield bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]sulfide in a yield of 95.9%. Production Example 7 Synthesis of bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]ketone The process of Production Example 1 was repeated except for using 88.8 g of bis[(4-amino-2-trifluoromethylphenoxy)-phenyl]sulfide in place of 98.1 g of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-amino-2-trifluoromethylphenoxy)-phenyl]propane to yield bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]ketone in a yield of 98.1%. Production Example 8 Synthesis of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-cyanamino-2-pentafluoroethylphenoxy)-phenyl]propane The process of Production Example 1 was repeated except for using 98.9 g of 1,1,1,3,3,3-hexafluoro-2,2-bis [4-(4-amino-2-pentafluoroethylphenoxy)-phenyl]propane in place of 98.1 g of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-amino-2-trifluoromethylphenoxy)-phenyl]propane to yield 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-cyanamino-2-pentafluoroethylphenoxy)-phenyl]propane in a yield of 98.4%. Example 1 A varnish for impregnation was prepared by dissolving 100 g of p-HFCTP-2 obtained in Production Example 1 in 200 g of methyl isobutyl ketone and adding thereto 1.0 g of 2,5-dimethyl-2,5-(t-butylperoxy)hexyne-3 (mfd. by Nippon Oil & Fats Co., Ltd.). D-glass cloth (50 µm in thickness, mfd. by Nitto Boseki Co., Ltd.) was impregnated with the resulting varnish and dried at 110°C for 10 min in a constant temperature bath (in an air atmosphere) to give a coated cloth. Copper foils were laminated on both sides of the resulting coated cloth and bonded for lamination in a press (conditions: 130°C, 30 kg/cm 2 , 1 h for pressing with heating, followed by heating at 250°C for 1 h under pressure) to obtain a copper-clad laminate (as shown in Fig. 1A). The resulting copper-clad laminate was subjected to measurement of the relative dielectric constant, the thermal expansion coefficient, the thermal decomposition temperature, the copper foil peel strength and the fire retardance as mentioned below. The results are shown in Table 1. (1) Relative dielectric constant According tO JIS-C-6481, the relative dielectric constant was measured at 1 MHz using an LP Impedance Analyzer 4192 A (mfd. by Hewlett Packard Co.) (2) Flexural strength Using an Autograph DDS-5000 (mfd. by Shimadzu Corp.), a sample of 50 mm in width, 45 mm in length and 2 mm in thickness was subjected to measurement at room temperature and 180°C with a distance between the supports of 30 mm and a flexing speed of 2 mm/min. (3) Thermal decomposition temperature Using a High Speed Differential Thermobalance TGD-7000RH (mfd. by Nihon Shinku Riko K.K.), the weight loss by heating was measured in air at a temperature rise rate of 5°C/min. The thermal decomposition temperature was obtained from the temperature at which the weight loss began. (4) Moisture absorption rate According to JIS-C-6481, moisture absorption was carried out at 65°C and 95% RH. The moisture absorption ratio (%) was determined from the moisture absorption saturation amount. (5) Thermal expansion coefficient Using a thermophysical Testing Apparatus TMA-1500 (mfd. by Nihon Shinku Riko K.K.), a sample of 6 mm x 6 mm was subjected to a temperature rise at a rate of 2°C/min. The thermal expansion coefficient was obtained from a thermal expansion curve in the range of 50 to 220°C. (6) Fire retardance A sample of 12.7 cm long, 1.27 cm long and 0.16 cm thick was evaluated by the vertical method according to UL-94 standards. (7) Peeling strength A sample of predetermined size was cut from a copper-clad laminate and measured according to JIS-C-6481 (peeling speed 5 cm/min.). (8) Glass transition point Using a thermomechanical analyzer, the thermal expansion behavior in the thickness direction of a laminate was measured in a compression mold under a pressure of 10 g/cm 2 . The glass transition point was determined from the inflection point of the thermal expansion coefficient. Example 2 A varnish for impregnation was prepared by dissolving 100 g of p-HFCTP-2 obtained in Production Example 1 and 100 g of 1,1,1,3,3,3-hexafluoro-2,2-bis-[4-(4-maleimido-2-trifluoromethylphenoxy)-phenyl]propane (p-HFBP) (mfd. by Central Glass Co., Ltd.) in 200 g of methyl ethyl ketone. A copper-clad laminate was produced in the same manner as described in Example 1. The properties of the copper-clad laminate were measured in the same manner as described in Example 1. The results are shown in Table 1. Example 3 A varnish for impregnation was prepared by dissolving 100 g of p-HFCTP-2 obtained in Production Example 1 and 100 g of 1,1,1,3,3,3-hexafluoro-2,2-bis-[4-(3-maleimido-5-trifluoromethylphenoxy)-phenyl]propane (m-HFBP) (mfd. by Central Glass Co., Ltd.) in a mixed solvent of 150 g of acetone and 150 g of Ethylcellosolve acetate, followed by addition thereto of 0.4 g of dicumyl peroxide (mfd. by Nippon Oil & Fats Co., Ltd.) as a radical polymerization initiator. Q-glass cloth (50 µm in thickness, mfd. by Nitto Boseki Co., Ltd.) was impregnated with the resulting varnish and dried at 110°C for 10 min in a constant temperature bath (in an air atmosphere) to give a coated cloth. A copper-clad laminate was produced in the same manner as described in Example 1 using the resulting coated cloth. The properties of the copper-clad laminate were measured in the same manner as described in Example 1. The results are shown in Table 1. Example 4 A varnish for impregnation was prepared by dissolving 100 g of p-HFCTP-2 obtained in Production Example 1 and 100 g of 1,1,1,3,3,3-hexafluoro-2,2-bis(4-cyanatophenyl)propane (mfd. by Manac Co., Ltd.) in 200 g of N,N-dimethylformamide, heating at 120°C for 1 h, cooling to room temperature, and adding 0.4 g of dicumyl peroxide (mfd. by Nippon Oil & Fats Co., Ltd.) as a radical polymerization initiator. E-glass cloth (50 µm in thickness, mfd. by Nitto Boseki Co., Ltd.) was impregnated with the resulting varnish and dried at 110°C for 10 min in a constant temperature bath (in an air atmosphere) to give a coated cloth. A copper-clad laminate was produced in the same manner as described in Example 1 using the resulting coated cloth. The properties of the copper-clad laminate were measured in the same manner as described in Example 1. The results are shown in Table 1. Example 5 A varnish for impregnation was prepared by dissolving 100 g of m-HFCTP obtained in Production Example 2 and 50 g of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-cyanaminophenoxy)-phenyl]propane (HFCP) (mfd. by Manac Co., Ltd.) in 200 g of methyl isobutyl ketone. T-glass cloth (50 µm in thickness, mfd. by Nitto Boseki Co., Ltd.) was impregnated with the resulting varnish and dried at 120°C for 10 min in a constant temperature bath (in an air atmosphere) to give a coated cloth. A copper-clad laminate was produced by piling copper foils on both sides of the resulting coated cloth and bonding for lamination in a press (conditions: 150°C, 20 kg/cm 2 , 1 h for reaction, followed by heating at 250°C for 1 h and at 280°C for 1 h under pressure). The properties of the copper-clad laminate were measured in the same manner as described in Example 1. The results are shown in Table 1. Example 6 A varnish for impregnation was prepared by dissolving 100 g of p-HFCTP-2 obtained in Production Example 1 and 100 g of 2,2-bis[4-(4-maleimidophenoxy)-phenyl]propane (BMPP) (mfd. by Hitachi Chemical Co., Ltd.) in 200 g of methyl isobutyl ketone, and reacting with heating at 100°C for 1 h. An aramide cloth (50 µm in thickness, mfd. by Asahi Schwebel Co.) was impregnated with the resulting varnish and dried at 110°C for 10 min in a constant temperature bath (in an air atmosphere) to give a coated cloth. A copper-clad laminate was produced by piling copper foils on both sides of the resulting coated cloth and bonding for lamination in a press (conditions: 130°C, 40 kg/cm 2 , 1 h for reaction, followed by heating at 250°C for 2 h under pressure). The properties of the copper-clad laminate were measured in the same manner as described in Example 1. The results are shown in Table 1. Comparative Example 1 A varnish for impregnation was prepared by dissolving 100 g of bis[(4-cyanamido-3-methyl)-phenyl]methane (mfd. by Manac Co., Ltd.) and 100 g of bis(4-maleimidophenyl)methane in 200 g of N,N-dimethylformamide. Q-glass cloth (50 µm in thickness, mfd. by Nitto Boseki Co., Ltd.) was impregnated with the resulting varnish and dried at 150°C for 10 min in constant temperature air to give a coated cloth. A copper-clad laminate was produced by piling copper foils on both sides of the resulting coated cloth and bonding for lamination in a press (conditions: 170°C, 1 h for reaction, followed by heating at 250°C for 1 h under a pressure of 20 kg/cm 2 ). The properties of the copper-clad laminate were measured in the same manner as described in Example 1. The results are shown in Table 1. Example 7 A varnish was prepared by dissolving 100 g of p-HFCTP-5 obtained in Production Example 3 in 200 g of methyl isobutyl ketone, and adding thereto 0.5 g of dicumyl peroxide (mfd. by Nippon Oil & Fats Co., Ltd.) as a radical polymerization initiator. The varnish was coated on a Myler sheet made from polyester, followed by drying at 110°C for 10 min in a constant temperature bath (in an air atmosphere) to give a resin powder. The resulting resin powder in an amount of 50 g was cured in a press using a spacer of 12 cm long, 14 cm wide and 2 mm thick (conditions: 130°C, 30 kg/cm 2 , 1 h with heating under pressure, followed by heating at 250°C for 1 h under pressure) to give a resin plate. The resulting resin plate was subjected to measurement of the relative dielectric constant, the thermal decomposition temperature, the peel strength and the fire retardance in the same manner as described in Example 1. The results are shown in Table 2. Example 8 A resin plate was prepared in the same manner as described in Example 7 except for using 100 g of bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]ether obtained in Production Example 4 and evaluated in the same manner as described in Example 7. Example 9 A resin plate was prepared in the same manner as described in Example 7 except for using 100 g of bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]sulfone obtained in Production Example 5 and evaluated in the same manner as described in Example 7. Example 10 A resin plate was prepared in the same manner as described in Example 7 except for using 100 g of bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]sulfide obtained in Production Example 6 and evaluated in the same manner as described in Example 7. Example 11 A resin plate was prepared in the same manner as described in Example 7 except for using 100 g of bis[(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]ketone obtained in Production Example 7 and evaluated in the same manner as described in Example 7. Example 12 0 A resin plate was prepared in the same manner as described in Example 7 except for using 100 g of 1,1,1,3,3,3-hexafluoro-2,2-bis[(4-cyanamino-2-pentafluoroethylphenoxy)-phenyl]propane obtained in Production Example 8 and evaluated in the same manner as described in Example 7. Example 13 A varnish was prepared by dissolving 50 g of p-HFCTP-2 obtained in Production Example 1 and 50 g of p-HFCTP-5 obtained in Production Example 3 in 100 g of dimethylformamide, and adding thereto 0.8 g of 2,5-dimethyl-2,5-(t-butylperoxy)-hexyne-3 (mfd. by Nippon Oil & Fats Co., Ltd.) as a radical polymerization initiator. The varnish was coated on a Myler sheet made from polyester, followed by drying at 140°C for 10 min in a constant temperature bath (in an air atmosphere) to give a resin powder. A resin plate was prepared in the same manner as described in Example 7 except for using 50 g of the resulting resin powder and evaluated in the same manner as described in Example 7. The results of Examples 7 to 14 are listed in Table 2. Example No. Relative dielectric constant (ε) Thermal decomposition temperature (°C) Peel strength (kg/cm) Fire retardance UL-94 Example 7 2.6 410 1.1 V-O " 8 2.5 400 1.1 V-O " 9 2.5 420 1.4 V-O " 10 2.5 420 1.5 V-O " 11 2.6 420 1.2 V-O " 12 2.5 410 1.0 V-O " 13 2.6 400 1.5 V-O Example 14, Comparative Example 2 An adhesive varnish was prepared by dissolving 100 g of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-cyanamino-2-trifluoromethylphenoxy)-phenyl]propane (p-HFCTP) and 50 g of 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-maleimido-2-trifluoromethylphenoxy)-phenyl]propane (mfd. by Central Glass Co., Ltd.) in 200 g of methyl ethyl ketone, reacting at 100°C for 120 min to form a prepolymer, cooling and adding thereto 1 g of dicumyl peroxide (mfd. by Nippon Oil & Fats Co., Ltd.) as a curing accelerator. On the surface of a support member (a copper support member), the resulting adhesive varnish was coated, followed by mounting of a silicon semiconductor element. The adhesive varnish was cured with heating at 220°C for 10 s. The shear adhesive strength was measured by using a push pull gauge. Further, the water absorption rate was measured according to JIS-K 6911 in order to examine the moisture resistance of a cured product of adhesive. The water absorption rate was evaluated by using a cured resin plate of 50 mm in diameter and 3 mm in thickness, immersing the resin plate in water at 23°C for 24 h and measuring the weight change after the immersion. The adhesive retention rate was evaluated by allowing the above-mentioned specimen to stand in a supersaturated steam cooker at 121 °C under a pressure of 2 atmospheres (pressure cooker test), and measuring the time required for making the initial value of shear adhesive strength 90%. For comparison, a test specimen was prepared by using an epoxy adhesive EN-4050 (mfd. by Hitachi Chemical Co., Ltd.) and the properties were evaluated in the same manner as mentioned above (Comparative Example 2). The results are shown in Table 3. Example No. Example 14 Comparative Example 2 Curing properties 220°C/10 s 250°C/20 s Initial shear adhesive strength (kg/cm 2 ) 70 60 Shear adhesive strength retention rate (In steam of 121°C, 2 atm.) >100 h 50 h Water absorption rate (%) <0.01 0.15 Thermal decomposition temperature (°C) 410 310 Example 15 A resin composition for encapsulating semiconductors was prepared by mixing 20 g of p-HFCTP-2 obtained in Production Example 1, 30 g of 2,2-bis[4-(4-maleimidophenoxy)-phenyl]propane, 50 g of a novolak type epoxy resin(ECN 1273, mfd. by Ciba-Geigy Ltd., epoxy equivalent 225), 3 g of imidazole (2E4MZ-CN, mfd. by Shikoku Chemicals Corp.), 2 g of epoxysilane (KBM 303, mfd. by Shin-Etsu Chemical Co., Ltd.), as fillers 200 g of crystalline silica powder and 250 g of molten quartz glass, as a colorant 2 g of carbon black, kneading for 7-8 min using a two-roll mill, cooling and grinding. A resin-encapsulated semiconductor device was produced by transfer molding the resulting resin composition on a 4M bit memory LSI (D-RAM) at 180°C under a pressure of 70 kg/cm 2 for 1.5 min. Then, 50 resin-encapsulated semiconductor devices obtained as mentioned above were allowed to stand in a constant temperature bath at 150°C for 1000 h, followed by testing the electric conductivity. As a result, no disconnection (breaking of wires) was found. When the resin-encapsulated semiconductor devices were allowed to stand in supersaturated steam heated at 121°C under 2 atmospheres for 1500 h, no disconnection was found.

Claims: Thermosetting resin composition on the basis of biscyanamide compounds, characterized in that it comprises a fluorine-containing biscyanamide compound of the following formula wherein X is -O-, -S-, -SO-, -SO 2 -, -CO-, or R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are independently a hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, a lower fluoroalkyl group having 1 to 4 carbon atoms, or an allylene group, n is 0 or 1, Rf ist a perfluoroalkyl group having 1 to 10 carbon atoms, and the cyanamide groups are positioned at the m- or p-position with respect to the ether linkage. Resin composition according to claim 1, comprising (A) 100 parts by weight of the compound of formula I, and (B) 10 to 900 parts by weight of one or several thermosetting resin components selected from compounds having one or more ethylenically unsaturated double bonds, epoxy compounds, phenolic compounds, melamine compounds, compounds having an N-substituted unsaturated imido group, cyanate compounds, isocyanate compounds and cyanamide compounds, the resin components (B) being different from the compound (A). Resin composition according to claim 2, characterized in that it contains 10 to 200 parts by weight of component (B). Resin compositions according to one or several of claims 1 to 3, wherein the compounds of formula I are selected from 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)-phenyl]propane, 1,1,1,2,2,4,4,5,5,5-decafluoro-3,3-bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)-phenyl]pentane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2-pentafluoroethyl-4-cyanaminophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro--2,2-bis[4-(2-heptafluoropropyl-4-cyanaminophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(3-trifluoromethyl-4-cyanaminophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(3-trifluoromethyl-5-cyanaminophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2-trifluoromethyl-5-cyanaminophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2-trifluoromethyl-3-cyanaminophenoxy)-phenyl]propane, 4,4'-bis(2-trifluoromethyl-4-cyanaminophenoxy)-biphenyl, bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)phenyl]ether, bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)phenyl]sulfide, bis[4-(2-trifluoromethyl-4,cyanaminophenoxy)phenyl]sulfoxide, bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)phenyl]sulfone, bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)phenyl]ketone, bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)phenyl]methane, 2,2-bis[4-(2-trifluoromethyl-4-cyanaminophenoxy)phenyl]propane. Resin composition according to one or several of claims 2 to 4, wherein the resin components (B) are selected from (i) the epoxy compounds : 2,2-bis[4-(2,3-epoxypropoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(2,3-epoxypropoxy)-phenyl]propane, bis(2,3-epoxypropyl)terephthalate, bis(2,3-epoxypropyl)isophthalate, bis(2,3-epoxypropyl)phthalate, 1,3,5-tris-(2,3-epoxypropyl)phloroglucinol, 4,4-bis(2,3-epoxypropylphenyl)ether, 2-(2,3-epoxypropyl)-phenyl-2,3-epoxypropylether, 2,2-bis[4-(2,3-epoxypropoxy)-3,5-dibromophenyl]propane, 1,1,2,2-tetrakis[4-(2,3-epoxypropoxy)-phenyl]ethane, polyphenol-formaldehyde-poly(2,3-epoxypropyl)ether, goly-o-cresol-formaldehyde-poly(2,3-epoxypropyl)ether, 1,4-bis(2,3-epoxypropoxy)butane, 1,2-bis(2,3-epoxy-2-methylpropoxy)ethane, 1,3-bis[3-(2,3-epoxypropoxy)-propyl]tetramethyldisiloxane, epoxidized polybutadiene, polypropyleneglycol-bis(2,3-epoxypropyl)ether, 1,2,3-tris(2,3-epoxypropoxy)-propane, 2,3-epoxypropylallylether telomer, 2,6-bis(2,3-epoxypropoxy)norbornene, 2,2-bis[4-(2,3-epoxypropoxy)-cyclohexyl]propane, and 4-(1,2-epoxyethyl)-1,2-epoxycyclohexane, (ii) the phenolic compounds of novolak type and resol type phenol-formaldehyde condensates, obtained from a phenol, particularly phenol, cresol, xylenol, trimethylphenol, trifluoromethylphenol, p-hydroxystyrene, (iii) the melamine compounds: melamine, benzoguanidine, dicyanediamide, vinyltriazine, hydroxytriazine, o-tolylbiguanide, 1,3-di-o-triguanidine, 1,3-diphenylguanidine, propyltriazine, and condensates of melamine with an aldehyde, (iv) the compounds having an N-substituted unsaturated imido group: o-phenyl-maleimide, m-phenylmaleimide, p-phenylmaleimide, phenylcitraconimide, phenylitaconimide, phenylnadicimide, phenylmethylendomethylenetetrahydrophthalimide, N,N'-p-phenylenebismaleimide, N,N'-p-phenylenebis-methylendomethylenetetrahydrophthalimide, N,N'-p-phenylenebiscitraconimide, N,N'-p-phenylenebisitaconimide, N,N'-m-xylenebismaleimide, N,N'-m-phenylenebismaleimide, N,N'-(methylenedi-p-phenylene)-bismaleimide, N,N'-4,4'-di(phenylthioether)-bismaleimide, N,N'-4,4'-di(diphenyl ether)-bismaleimide, N,N'-methylenebis(3-chlorophenylene) maleimide, N,N'-(sulfonyldi-p-phenylene)-bismaleimide, N,N'-4,4'-di(phenylcyclohexane)-bismaleimide, 2,2-bis[4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[4-(4-maleimidophenoxy)-phenyl]-1,1,1,3,3,3-hexafluoropropane, and 2,2-bis[4-(4-maleimido-2-trifluoromethylphenoxy)-phenyl]1,1,1,3,3,3-hexafluoropropane, (v) the polyvalent maleimides obtained by reacting a condensate of aniline and an aldehyde with maleic anhydride and represented by the formula II: wherein p is an integer of 1 to 10, (vi) 2,2-bis[4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-methyl-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[chloro-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-bromo-4-(4-maleimidophenoxy)-phenyl)propane, 2,2-bis[3-ethyl-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-propyl-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-isopropyl-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-butyl-4-(4-maleimidophenoxy)-phenyl]propane, 2,2-bis[3-sec-butyl-4-(4-maleimidophenoxy)-phenyl]propane, 2-2-bis[3-methoxy-4-(4-maleimidophenoxy)-phenyl]propane, 1,1-bis[4-(4-maleimidophenoxy)-phenyl]ethane, 1,1-bis[3-methyl-4-(4-maleimidophenoxy)-phenyl]ethane, 1,1-bis[3-chloro-4-(4-maleimidophenoxy)-phenyl]ethane, 1,1-bis[3-bromo-4-(4-maleimidophenoxy)-phenyl]ethane, bis[4-(4-maleimidophenoxy)-phenyl]methane, bis[3-methyl-4-(4-maleimidophenoxy)-phenyl]methane, bis[3-chloro-4-(4-maleimidophenoxy)-phenyl]methane, bis[3-bromo-4-(4-maleimidophenoxy)-phenyl]methane, 1,1,1,3,3,3-hexafluoro-2,2-bis[4-(4-maleimidophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexachloro-2,2-bis[4-(4-maleimidophenoxy)-phenyl]propane, 3,3-bis[4-(4-maleimidophenoxy)-phenyl]pentane, 1,1-bis[4-(4-maleimidophenoxy)-phenyl]propane, 1,1,1,3,3,3-hexafluoro-2,2-bis[3,5-dibromo-4-(4-maleimidophenoxy)-phenyl]propane, and 1,1,1,3,3,3-hexafluoro-2,2-bis[3-methyl-4-(4-maleimidophenoxy)-phenyl]propane, and (vii) the compounds of the formulae and Use of the thermosetting resin compositions according to claims 1 to 5 for manufacturing curable sheets, printed circuit boards, particularly multilayer printed circuit boards, electronic devices comprising these printed circuit boards, and semiconductor devices. Insulating cured products obtained by heating a thermosetting resin composition according to one of claims 1 to 5 at 100 to 250 °C. Curable sheets, comprising a sheet-like material impregnated with a resin composition according to one of claims 1 to 5, and dried. Multilayer printed circuit boards comprising a plurality of circuit conductor layers and a plurality of insulating layers, which are obtained by curing a thermosetting resin composition according to one of claims 1 to 5, wherein the insulating layers and the circuit layers are laminated alternately. A method for producing multilayer printed circuit boards, comprising the steps of (a) preparing a prepolymer by heating and/or exposing to light a thermosetting resin composition according to one of claims 1 to 5, (b) forming a curable sheet by impregnating a fibrous material with a solution obtained by dissolving the prepolymer in a solvent, (c) forming a metal foil-clad laminate by laminating at least one curable sheet obtained above and a metal foil for the circuit conductors and bonding the sheet and the foil under pressure with heating, (d) forming an inner layer circuit substrate on at least one side of the metal foil-clad laminate, and (e) laminating alternately a plurality of curable sheets and a plurality of inner layer circuit substrates, the laminated layers being bonded to each other by heating under pressure and being arranged such that at least one surface of the laminated layers is a circuit conductor layer. Electronic device comprising a multilayer printed circuit board according to claim 9, and one or several semiconductor elements, preferably memory LSI's having an integration density of 1 Mbit or more, wherein the circuit conductor layers of the multilayer printed circuit boards are electrically connected to leads of the semiconductor elements. Electronic device comprising a semiconductor element and lead wires, wherein the semiconductor element and a part of the lead wires are coated with and/or encapsulated by a cured thermosetting resin composition according to one of claims 1 to 5. A semiconductor device, comprising a semiconductor element, a lead portion and an adhesive layer provided between the semiconductor element and the lead portion, the adhesive layer being a cured thermosetting resin composition according to one of claims 1 to 5.

Inventors: KATAGIRI JUNICHI, MUKOH AKIO, NAGAI AKIRA, NISHIMURA SHIN, SUZUKI MASAHIRO, SUZUKI MASAO, TAKAHASHI AKIO, KATAGIRI, JUNICHI, MUKOH, AKIO, NAGAI, AKIRA, NISHIMURA, SHIN, SUZUKI, MASAHIRO, SUZUKI, MASAO, TAKAHASHI, AKIO
Applicants: HITACHI LTD, HITACHI, LTD.
Application year: 1991
Main classification: C08G73
IPC codes: H01B3, C08G12, C08G73, C08G18, H05K1, H01L23, C08G59, H05K3