Crystal growth method

Abstract: A crystal growth method comprises: applying a crystallization treatment on an amorphous film, injecting ions of the constituent material of the film into the film applied with the crystallization treatment provided with a mask to form a first region and a second region made amorphous by the ion injection, and growing a crystal from the first region to the second region by solid phase growth.

Description: This invention relates to a method for growth of crystal, particularly to a method for growth of crystal which forms a crystalline film by crystallization of an amorphous film by solid phase growth. As one method in the field of crystal formation technique for growing a crystalline thin film on a substrate such as an amorphous substrate, etc., there has been proposed a method in which an amorphous thin film previously formed on a substrate is subjected to solid phase growth by annealing at a low temperature not higher than the melting point of the amorphous thin film. For example, there has been reported a crystal formation method in which an amorphous Si thin film with a film thickness of about 100 nm formed on an amorphous SiO₂ surface is annealed at 600 o C in N₂ atmosphere to crystallize the above-mentioned amorphous Si thin film, whereby a polycrystalline thin film with a large grain size of about 5 µm is formed (T. Noguchi, H. Hayashi and H. Ohshima, Mat. Res. Sos. Symp. Proc., 106, Polysilicon and Interfaces, 293, (Elsevier Science Publishing, New York, 1988)). The surface of the polycrystalline thin film obtained by this method remains flat and therefore can be formed as such into an electronic device such as an MOS transistor or diode. Also, since those devices are by far larger in average grain sizes of polycrystals than polycrystalline Si, etc. to be used by conventional Si IC process deposited by the LPCVD method, those having relatively higher performance can be obtained. However, in the crystal formation method, although crystal grain sizes are large, their distribution and the position of the crystal grain boundary are not controlled. For, in this case, since crystallization of the amorphous Si thin film is based on solid phase growth of crystal nuclei generated randomly within the amorphous film by annealing, the positions of the grain boundaries are also formed randomly. As a result, the grain size will be distributed over a wide range. Therefore, the following problems as described below will arise merely with large average grain sizes of crystals. For example, in MOS transistors, since the size of the gate becomes equal to or smaller than the average crystal grain size, portions containing no grain boundary and portions containing several boundaries will be formed at each gate portion. Electrical characteristics will differ considerably between each portion containing no grain boundary and each portion containing several boundaries. Accordingly, a great variance will occur in the characteristics among a plurality of devices, and the variance in crystal grain size has been a remarkable obstacle in integrated circuit production. To obviate the problems of large grain size polycrystalline thin film produced by solid phase crystallization as described above, a method of inhibiting variance in grain size has been proposed in Japanese Laid-open Patent Application No. 58-56406. This method is described with reference to Fig. 1. First, as shown in Fig. 1A, on the surface of an amorphous Si thin film 42 formed on an amorphous substrate 41, a small thin film strip 43 is provided, and the whole substrate is subjected to annealing in a conventional heating furnace. Then, nucleus formation of crystal nuclei 44 occurs preferentially at sites in the amorphous Si thin film 42 where it contacts the perimeter of the thin film strip 43. Accordingly, when each crystal nucleus is permitted to grow further, the amorphous Si thin film 42 is crystallized over the entire region to give a polycrystalline thin film comprising a group of crystal grains 45 with large grains sizes as shown in Fig. 1B. According to the above-mentioned Japanese Laid-open Patent Application No. 58-56406, it is stated that the variance in grain size can be reduced in this method to about 1/3 as compared with the method of the prior art as described above. However, even such result is still insufficient. For example, when thin film strips 43 are arranged in lattice shape with intervals of 10 µm, the variance in grain size can be controlled only within the range of 3 to 8 µm. Further, concerning control of the crystal grain boundary position, substantially no control has been attained under the present situation. The reason is that, because preferential nucleus formation occurs around the thin film strip 43 due to the localized effect of elastic energy at the portion where the amorphous Si thin film 42 contacts the perimeter of the thin film strip 43, a plurality of nuclei are generated along the perimeter and it is difficult to control the numbers of such nuclei. Concerning the control method of the nucleation position in the solid phase growth of amorphous Si thin film, otherwise there is also a proposal in Japanese Laid-open Patent Application No. 63-253616. As shown in Fig. 2(53 represents ions other than Si and 54 is a region injected with ions), these are methods in which the region 54 injected with ions 53 other than Si are provided locally at the amorphous Si thin film 52 on the amorphous substrate 51, and crystal nuclei are generated preferentially there. As ions 53, ions other than Si, N and B ions have been proposed, but in that case, actual selectivity in nucleation is deficient between regions 54 injected with ions and other regions, and there has been no report which has practically realised this. Mention is now made of other publications: Japanese Laid-open Patent Application JP-A 58-169905 is directed to the preparation of single crystal thin film and not polycrystalline film having large size crystal grains. In the method described a part of the surface of a silicon single crystal substrate is provided with an oxide film. Material is then deposited under conditions in which epitaxial growth occurs at the exposed substrate surface but differs from epitaxial layer overgrowth in that material nucleates upon the surface of the oxide film formed over this surface is polycrystalline. A patterned mask is formed, the remnant part of this mask covering only the epitaxially grown single crystal grain. Ions are then injected to convert the exposed polycrystalline film into an amorphous form. After removal of the mask the film is heat treated by a scanned laser beam, this scan starting from the position of the single crystal grain and in time passing across the polycrystalline film. During this scan solid phase grain growth proceeds outwards from the single crystal grain. It is a particular requisite of the disclosed method that the substrate provided is single crystal. European Patent Application EP-A-0308166 is directed to a method for producing large grain polycrystalline film. In the method disclosed material is deposited on the surface of a substrate to produce an amorphous film. This amorphous film is subsequently treated by ion injection to create damage at the interface between the film and substrate. This ion injection is performed without the use of a mask. Subsequently the film is annealed. During annealing nucleation occurs and growth proceeds in the solid phase. A polycrystalline film of grain size 2 to 3 microns is produced. It is disclosed that nucleation is inhibited and retarded by the preceding ion injection damage. Japanese Laid-open Patent Application JP-A-60-143624 is directed to the provision of single grain areas of material within a matrix of polycrystalline film. In the disclosed method material is deposited on the insulated surface of a substrate to produce a polycrystalline film. This polycrystalline film is then masked leaving areas of the polycrystalline film exposed, which areas are of a defined size and spaced apart by regular intervals. The exposed polycrystalline material is converted to an amorphous form by ion injection and subsequently this amorphous material is converted into single grain form by irradiation with a directed laser beam. The present invention is intended as a solution to the problems aforesaid. In accordance with the present invention there is provided a method for producing film having large size crystal grains with a narrow grain size distribution, which method comprises the following steps: providing an amorphous film of crystallizable material on the surface of a substrate; converting said amorphous film to a polycrystalline film by applying heat at an elevated temperature not higher than its melting point; applying a patterned mask on the surface of said polycrystalline film, said mask covering first regions but leaving second regions of said polycrystalline film exposed; irradiating said polycrystalline film with ions of said crystallisable material to inject said ions into said second regions and to a penetration depth not substantially less than the thickness of said polycrystalline film, to convert said second regions thereof to an amorphous state having a disordered structure at each interface between each second region and said substrate; removing said mask; and growing a crystal grain from each first region by applying heat continuously at an elevated temperature not higher than its melting point in an atmosphere of either hydrogen or nitrogen until each second region in amorphous state is converted to a polycrystalline state consisting of crystal grains grown from said first regions. In the method just specified the position of grain boundaries can be predetermined. When this method is followed by IC processing it is possible therefore to produce IC devices having little variance in their characteristics over a large area. In the accompanying drawings: Figs. 1A, 1B and Fig. 2 are schematic longitudinal sectional views showing crystal growth methods of the prior art; Fig. 3 is a graph showing a relationship between injection energy and crystallization temperature; Fig. 4 is a graph showing a relationship between the projected flying distance and latent time; Figs. 5A-5C are step diagrams for illustration of an embodiment of the crystal growth method of the present invention; and Fig. 6 is a field effect transistor formed in a crystal obtained by the present invention. To facilitate better understanding of the present invention, preferred embodiments thereof will be described in detail hereinbelow. The following description is by way of example only. The point of the present invention resides in how to control the position where crystal grows in solid phase. That is, it resides in how to arrange a crystal growth base point in an amorphous thin film and permit a crystal to elongate preferentially therefrom and inhibit nucleus generation in other regions. The present inventors have found a phenomenon that, in depositing a polycrystalline layer on a substrate material of, for example, SiO₂, then making the polycrystalline Si layer amorphous by injection of Si ions and then at the time of heat treatment, the crystal nucleus generation temperature (crystallization temperature) depends strongly on the ion injection energy. Accordingly, the reason why the crystal nucleus generation temperature depends on ion injection energy has been clarified. When the injection energy is varied, the distribution of Si ions injected changes in the Si layer after it is made amorphous (amorphous Si layer), and as a result, the distribution of voids, namely the distribution in each region where injected damage exists, will change by the injected energy in the film thickness direction. Also, within the amorphous substance, nuclei which overcome the surface energy disadvantage are formed and thereafter phase transfer from the amorphous phase of Si atoms to the crystal phase will occur. Whereas, nucleus formation includes uniform nucleation and nonuniform nucleation, with the former being nucleation in a uniform substance (e.g. internally of amorphous Si film), and whether such nucleation occurs or not depends on whether it can be enlarged by overcoming the surface energy disadvantage or not. On the other hand, in the latter nonuniform nucleation, nucleus generation is urged by contact with foreign matter, and the activation energy in the latter is lower than in the former. Thus, nonuniform nucleation will more readily occur rather than uniform nucleation. Practically, nucleation in amorphous Si thin film is controlled primarily by nonuniform nucleation at the vicinity of the substrate interface. The present inventors have found that the injection depth of ion injection (projected flying distance) has a serious influence on nonuniform nucleation at the interface as described above even under the conditions of constant injection amount. Fig. 3 is a graph showing the relationship between the injection energy and the crystallization temperature. The conditions at this time are as described below. The injection layer is a polycrystalline Si layer with a thickness of 100 nm deposited on an SiO₂ substrate by low pressure CVD decomposition of SiH₄ at 620 o C , and the injected ion is Si⁺. The amount injected was constant (in this case 5 x 10¹⁵cm⁻²) beyond the critical injection amount (about 10¹⁵cm⁻²). The injection energy is varied from 40 keV to 80 keV, and the injection layer is subject to ion collision to have Si atoms knocked on from the lattice position, whereby the damaged region becomes continuous by injection at a level of the critical injection amount or more, and become amorphous. The amorphous Si layer is subjected to heat treatment at the respective temperatures in N₂ atmosphere for 20 hours, and the recrystallization process in solid phase was observed primarily by use of a transmission electron microscope for examination of the crystallization temperature under the above conditions. For example, to call attention to the injection energies of 40 keV, 70 keV, the injection depths (projected flying distances) of 40 keV and 70 keV are respectively 55.2 nm and 99.7 nm, and these are within the layer of 100 nm, corresponding to the vicinity of the film thickness centre and the vicinity of the interface with the substrate material. There is a difference of 50 o C or higher between those crystallization temperatures, and the one injected into the vicinity of the substrate interface has higher crystallization temperature, indicating that it can be hardly crystallized. This may be considered to be due to the greater damage region up to the interface, whereby nonuniform nucleation has been inhibited. Further additionally, when, at a temperature at which a layer made amorphous by injection at 40 keV so that the projected flying distance became to the vicinity of the film thickness centre and the amorphous layer deposited by CVD are crystallized within 1 hour (namely 600 o C), a layer which has been made amorphous so that the injection depth came to the the interface vicinity at 70 keV was subjected to heat treatment, it was confirmed by a transmission electron microscope that this layer was not crystallized after elapse of 100 hours or longer. Its manner, namely the relationship between the time from the heat treatment commencement to the crystallization commencement (latent time) and the injection depth is shown in Fig. 4. As shown in Fig. 4, as the injection depth becomes deeper toward the interface, the latent time is elongated to make crystallization more difficult. The position where (injection depth)/(film thickness) is approximately equal to 1, is namely the place where the interface vicinity is damaged most, having the maximum point that the latent time becomes the maximum. From the above facts, by varying the injection energy, it has been clarified that the crystallization temperature and the latent time become different, and the causes therefor may be judged to be due to inhibition of nonuniform nucleation at the vicinity of the interface. The present invention is intended to control the nucleation position by utilizing the phenomenon as described above, and by injecting ions of the constituent substance of an amorphous thin film so that residual crystal fine region free from injection damage may be formed at a desired position within the amorphous thin film, and subsequently performing heat treatment at a temperature of the melting point of the amorphous thin film or lower, the crystal region is preferentially enlarged from the fine region. First, prior to description of Examples of the present invention, embodiments of the present invention are described. Figs. 5A - 5C are step diagrams for illustration of an embodiment of the crystal growth method of the present invention. As shown in Fig. 5A, an amorphous film is subjected to solid phase growth, and by applying a mask 1 such as one of resist, etc. on the surface of the polycrystalline Si film with relatively large grain size, a region smaller than grain size which becomes the first region smaller than grain size is covered, and Si ions are injected only into other regions by selecting the injection energy so that the amorphous Si layer and the substrate interface vicinity may be damaged. Damages are given primarily to the interface vicinity at the portion not covered with the resist, and nucleus generation will be inhibited during the subsequent heat treatment. The region 3 (hereinafter called injected amorphous region; this becomes the second region) on the region where the extent of injection damage is higher (hereinafter called interface damage region) 4 is not crystallized, and the region subjected to no injection damage is not made amorphous and the crystal region (hereinafter called residual crystal region; this becomes the first region) 2 remains, and is stored. Here, for obtaining a polycrystalline film with relatively larger grain size, the film thickness of the amorphous film to be applied with the crystallization treatment may be preferably 0.05 µm to 0.3 µm, more preferably 0.05 µm to 0.2 µm, optimally 0.05 µm to 0.15 µm. The crystallization treatment for obtaining a polycrystalline film with relatively larger grain size is practiced as described below. It is desirable to apply heat treatment to an amorphous film under the temperature condition preferably of 550 o C to 650 o C, more preferably of 575 o C to 625 o C, optimally of 580 o C to 620 o C. On the other hand, when an amorphous film is formed by making a polycrystalline film amorphous, it is desirable to inject Si⁺ ions at the interface vicinity of the thin film and substrate, thereby making the nucleation speed lower. As a specific example, into a Si thin film with a thickness of 0.1 µm, Si⁺ ions of about 1 x 10¹⁵cm⁻² may be injected by acceleration at 70 keV and heat treatment may be applied at 600 o C in N₂ for about 50 hours, whereby a large grain size polycrystalline layer with a maximum grain size of several µm can be obtained. The size of each mask portion 1 which becomes the first region may be preferably 0.03 µm or more and 5 µm or less, more preferably 0.05 µm or more and 2 µm or less, optimally 0.05 µm or more and 1 µm or less, for controlling the grain size and the position of the grain boundary. Next, the temperature and the time at which the region which has been made amorphous by injection so as not to crystallize after removal of the resist are determined from Fig. 3 and Fig. 4, and the amorphous Si layer in which Si ions are injected at the interface is subjected to heat treatment in N₂ or H₂. By such heat treatment, the crystal is elongated from the residual crystal region 2 to the injected amorphous region 3, and in the injected amorphous region 3, random nucleus generation is inhibited. For amorphous Si layer, typically a heat treatment at around 630 o C for about 100 hours is suitable. This is nothing but because the active energy at which the atoms in the amorphous regions are incorporated into the existing crystal phase is lower than the energy for random nucleus generation beyond the surface energy disadvantage in the amorphous regions. The temperature and time conditions for the heat treatment for growing the crystal from the above-mentioned first region to the above-mentioned second region may be preferably 550 o C to 650 o C for 30 hours to 100 hours, more preferably 575 o C to 625 o C for 40 hours to 80 hours, optimally 580 o C to 620 o C for 50 hours to 70 hours, for obtaining a polycrystalline film which is flat and has large and controlled grain sizes. If the region on the non-interface damage region, namely the residual crystal region 2 is left to have a fine area (5 µm in diameter or less, desirably 2 µm in diameter or less, optimally 1 µm in diameter or less), enlargement of the crystal region occurs from the fine residual crystal region when heat treatment is commenced, whereby a crystal of enlarged single domain grows when the residual crystal region 2 is a single domain (Fig. 5B; 3a is an amorphous region.). The crystal phase having the single domain, when the heat treatment is continued, will move around with the interface between the crystalline phase and the amorphous region being directed toward the outside. That is, the Si atoms within the amorphous region will be incorporated into the crystalline phase by jumping the interface. Thus, the size of the crystal continues to be increased, but the phase transfer from the amorphous phase into the crystalline phase occurs with lower energy than the energy for nucleation of the surface energy disadvantage, and therefore in the interface damage region 4 is incorporated into the single crystalline phase generated from the residual crystal region 2 before nucleation, until the adjoining crystal regions 2a contact each other to form a crystal grain boundary 5 there (Fig. 5C). At this time, the crystal grain size becomes equal to the interval of the non-injected residual crystal region 3, can be freely determined, and also its grain boundary position can be determined. The amorphous thin film in the present invention is not limited to those which are formed by making polycrystalline thin films amorphous by performing ion injection into polycrystalline thin films, but may be also those having amorphous structure during deposition. When the starting material is a polycrystalline layer, first without provision of a mask, the first ion injection is effected so that the projected flying distance may come to the vicinity of the centre of the polycrystalline thin film. By such ion injection, the polycrystalline thin film can be made amorphous without giving injection damage to the vicinity of the interface between the polycrystalline thin film and the substrate. Subsequently, after the whole film is made a polycrystalline film with relatively larger grain size of about 1 to 5 µm by solid phase growth, under the state provided with a mask of a resist corresponding to the fine region, the second ion injection is effected so that the projected flying distance (injection depth) may come to the vicinity of the interface between the amorphous thin film and the subbing substrate. By such ion injection, injection damage occurs at the interface vicinity between the amorphous thin film other than portions provided with the mask and the subbing substrate, while no injection damage occurs at the portions where the mask is provided, whereby the crystal phase remains. Having described above embodiments in which silicon is employed as the polycrystalline film, it is mentioned that the present invention is not limited to silicon films. The present invention is described below by referring to Examples. Example 1 On a substrate comprising a glass, SiH₄ was pyrolyzed during low pressure chemical vapor deposition to deposit a polycrystalline Si thin film of 100 nm thickness. The formation temperature was 620 o C. the pressure 40Pa (0.3 Torr) and its grain size was fine, namely about 50 nm. Si injection was effected twice. First, without a resist mask, Si ions were injected into the polycrystalline Si layer in an amount of 3 x 10¹⁵ cm⁻² at an injection energy of 40 keV over the whole surface, whereby as described above, the damage became continuous to make it amorphous. However, the projected flying path was positioned at the vicinity of the centre of film thickness of 100 nm, and consequently there is substantially no damage at the vicinity of the Si/SiO₂ substrate interface. When the amorphous Si film is subjected to heat treatment at 600 o C in N₂ for 50 hours, it grows in solid phase to a polycrystalline Si film with grain sizes of 1 to 5 µm. Then, a resist mask is applied with 1 µm diameter at intervals of 5 µm and 10 µm, followed by a second Si⁺ ion injection at 70 keV to introduce damage at the vicinity of the interface. The amount injected was made the same as in the first injection. After the resist was peeled off, heat treatment was conducted in N₂ at 620 o C for 100 hours. As a result, the grain sizes became 5 µm ± 1 µm, 10 µm ± 1 µm, and moreover the grain boundaries were found to be aligned in a lattice. On the Si layer of 100 nm obtained in Example 1, a number of field effect transistors shown in Fig. 6 with a channel length of 3 µm were prepared by conventional IC processing. The transistor, as shown in Fig. 6, has a gate electrode 105, a source-drain region 106, a gate insulating film 107, a contact hole 109, and a wiring 110. The electron mobility of the transistor was 20 ± 5 cm²/V·sec, and the variance of threshold value ± 0.2 V. Since it is possible to arrange the transistors so that no grain boundary may exist at the channel portion of the transistors, it has become possible to make the device characteristics higher in performance, and the distribution of the device characteristics narrower. Example 2 An amorphous Ge thin film with a thickness of 50 nm was deposited on SiO₂ in vacuum by an electron beam. The deposition was carried out at a vacuum degree of 10⁻⁴Pa (1x10⁻⁶ Torr), and at a substrate temperature of room temperature. During deposition, the temperature was elevated from room temperature to 100 o C. The amorphous Ge film was permitted to grow in solid phase at 350 o C in N₂ for 50 hours to form a polycrystalline film having grain sizes of 1 to 3 µm, followed by masking of the region of 1.5 µm in diameter and intervals of 10 µm with a resist, and Ge⁺ ions are injected at 130 keV into the whole region. The injection amount was 2 x 10¹⁵cm⁻². The injection depth of Ge⁺ ions was about 50 nm from the surface, and the ions were injected concentratedly at the vicinity of the interface with the substrate to give a damage at the interface portion. After removal of the mask, heat treatment was conducted in a N₂ or H₂ atmosphere at 380 o C for 50 hours. As a result, crystals were elongated to the amorphous Ge region in which damages are introduced at the interface by Ge ions from only the residual crystal fine regions free from damage without injection of Ge⁺ ions covered with a mask, whereby both crystals contacted each other at the middle of the adjoining crystal nuclei generation points to form a crystal grain boundary there. It was found by examination of the crystal structure, using a transmission electron microscope, that the size of the crystal of each single domain had become 10 µm ± 1 µm. Example 3 A polycrystalline Ge thin film was formed on SiO₂ to a thickness of 50 nm by GeH₄ pyrolysis during low pressure CVD at a deposition temperature of 400 o C. The polycrystalline Ge deposited as such was found to have a grain size of about 100 nm by transmission electron microscope examination. Next, Ge⁺ ions were injected at an injection energy of 60 keV in an amount of 2 x 10¹⁵cm⁻² to make the whole film amorphous. The injection depth at the injection energy of 60 keV was about 25 nm from the surface, and at this time substantially no damage was introduced into the Ge film/SiO₂ substrate interface. The amorphous Ge film was permitted to grow in solid phase in N₂ at 360 o C for 50 hours to form a polycrystalline film having grain sizes of 1 to 4 µm, followed further by masking with a resist at the portion of 1.2 µm in diameter at the intervals of 15 µm, and Ge⁺ ions were injected at 130 keV in an amount of 2 x 10¹⁵cm⁻². At this time, damage was introduced primarily at the interface (Ge/SiO₂) of the injected region. After removal of the resist mask, heat treatment was applied in N₂ at 390 o C for 60 hours. From the fine residual crystal region subjected to no damage at the interface of the Ge film, the crystal is elongated to the region where damages are introduced at the interface while the crystal maintains its structure, until finally it contacts the adjoining crystal to form a grain boundary at the middle of the adjoining fine interface non-damaged regions. As a result of examination by transmission electron microscope, the grain size was found to be 15 µm ± 2 µm. Example 4 On a quartz substrate, amorphous Si was deposited with a film thickness of 100 nm by electron beam vapour deposition in ultra-high vacuum under the following conditions: vacuum degree reached: 1.3x10⁻⁸Pa (1x10⁻¹⁰Torr) vacuum degree during vapour deposition: 6.6x10⁻⁸ Pa (5 x 10⁻¹⁰ Torr) substrate temperature: 300 o C deposition speed: ca. 100 nm/hr. The amorphous Si thin film was subjected to solid phase growth in N₂ at 600 o C for 50 hours to form a polycrystalline film having grain sizes of 1 to 4 µm, a resist was patterned on the polycrystalline Si thin film by conventional photolithographic steps so that regions of 1 µm square remained in lattice spots with intervals of 10 µm. Further, into the whole substrate were injected Si⁺ ions accelerated to an energy of 70 keV in an amount of 1 x 10¹⁵cm⁻². In this case, the projected flying distance of Si ions in Si is 99.7 nm and therefore the region not covered with resist becomes amorphous Si, whereby most Si ions are distributed at the vicinity of the interface with the quartz substrate to introduce much damage at the interface. After removal of the resist, heat treatment was conducted by maintaining the substrate temperature at 590 o C in N₂ atmosphere. After 15 hours from initiation of the heat treatment, no nucleation occurred in the region without coverage with the resist where Si ions were injected from the residuel crystal region of 1 µm square without injection of Si ions, and therefore annealing was further continued, whereby the crystals already formed in the region began to be grown in the lateral direction beyond that region. And when annealing was continued for about 120 hours, the crystal came into contact at the growth end face with the crystal grain from the adjoining region apart by about 10 µm therefrom to form a grain boundary, whereby the amorphous Si thin film was crystallized over substantially the whole region. As a result, while arranging crystal boundaries substantially in a lattice with 10 µm intervals, a thin film crystal comprising a groups of crystals with an average grain size of 10 µm was obtained.

Claims: A method for producing film having large size crystal grains (2a) with a narrow grain size distribution, which method comprises the following steps: providing an amorphous film (42) of crystallizable material on the surface of a substrate (41); converting said amorphous film (42) to a polycrystalline film (45) by applying heat at an elevated temperature not higher than its melting point; applying a patterned mask (1) on the surface of said polycrystalline film (45), said mask (1) covering first regions (2) but leaving second regions (3) of said polycrystalline film (45) exposed; irradiating said polycrystalline film (45) with ions of said crystallisable material to inject said ions into said second regions (3) and to a penetration depth not substantially less than the thickness of said polycrystalline film (45), to convert said second regions (3) thereof to an amorphous state having a disordered structure (4) at each interface between each second region (3) and said substrate (41); removing said mask (1); and growing a crystal grain (2a) from each first region (2) by applying heat continuously at an elevated temperature not higher than its melting point in an atmosphere of either hydrogen or nitrogen until each second region (3) in amorphous state is converted to a polycrystalline state consisting of crystal grains (2a) grown from said first regions (2). A method as claimed in claim 1 wherein said amorphous film (42) is of a thickness 0.05 to 0.3 µm. A method as claimed in either one of the preceding claims wherein said step of providing said amorphous film (42) is performed by depositing said crystallisable material on said surface of said substrate (41) to produce a first polycrystalline film, and then converting said first polycrystalline film to said amorphous film (42) by irradiating said first polycrystalline film with ions of said crystallisable material to inject said ions to a penetration depth substantially less than the thickness of said first polycrystalline film, thus avoiding damage in the vicinity of the film-substrate interface. A method as claimed in any preceding claim wherein said patterned mask (1) is formed to cover first regions (2) of said polycrystalline film (45) of diameter 5 µm or less. A method as claimed in any preceding claim wherein said patterned mask (1) defines covered first regions (2) of said polycrystalline film (45) at intervals of 5 to 15 µm pitch. A method as claimed in any preceding claim wherein said crystallizable material is either silicon or germanium. A method as claimed in claim 6, wherein said crystallizable material is silicon and said substrate (41) is of either glass or quartz. A method as claimed in claim 6, wherein said crystallizable material is germanium and said substrate (41) is of silicon dioxide.

Inventors: YONEHARA TAKAO, YONEHARA, TAKAO
Applicants: CANON KK, CANON KABUSHIKI KAISHA
Application year: 1990
Main classification: C30B1
IPC codes: C30B1, H01L21