Electron-optical system for making a pseudoparallel micro electron-beam

Abstract: An electron-optical system devised so as to generate a pseudoeparallel micro electron-beam coverging at a converging angle of 1 x 10⁻³ radian. The system comprises a condenser lens assembly (3, 4) and an asymmetric objective lens (6) whose smaller field gradient side is directed to the condenser lens assembly (3, 4). In another electron-optical system achieved by modifying the above system, the converging angle of the electron beam is made variable with an additional objective lens (8) inserted between the condenser lens assembly (3, 4) and the asymmetric objective lens (6). Theconversion angle can be varied by varying the conversion powers of both the objective lenses (6, 8).

Description: Background of the Invention The present invention relates to an electron-optical system for making a substantially parallel micro electron beam. The electron beam used in a scanning electron microscope (SEM) is made converged to an extremely small point causing the microscope to have a very high resolving power. Converging a beam to so small a point is accompanied, as a matter of course, by a very large beam-converging angle. Therefore, when an object of observation is an uneven-surfaced sample having on its surfacce many microscopic concaves and convexes, there are some cases where the coned flank of the beam touches the inner side wall or upper edge of some of the concaves, causing it to be impossible to observe stereoscopic micro surface structures of the sample. To overcome such a disadvantage it is desired to obtain a pseudo-parallel micro electron-beam having a convergence angle of the order of 10⁻³ radian and a beam diameter not larger than 1 µm. However, it is very difficult to obtain such a pseudoparallel micro electron-beam with a conventional electron-optical system: though such a beam is, in principle, obtained by using electron lenses with a very long focal length, the astigmatism and spherical aberration of a symmetrical electron lens become larger as the lens has its focal length made longer. Under the circumstances it is an urgent matter to create an electron-optical system capable of producing a sharp-focused pseudo-parallel micro electron-beam. Further, such a system is desired also in some field of electron diffractometry. In analyzing the surface structure of a sample, the conventional electron diffractometer, which uses an electron beam with a diameter of the order of a millimeter, can give only the data averaged over an area of the order of a millimeter, and does not give information about fine structures contained in a region of the order of a micrometer. Such fine structures become capable of being analyzed for the first time with a substantially parallel electron beam having a diameter not larger than the order of a micrometer. A conventional electron-optical system consisting of a thermal-electron emitting source, a condenser electron-lens assembly, and an objective electron-lens is described in German published patent application document DE-A- 2849403. The present invention aims at overcoming the previously mentioned difficulties in making a pseudo-parallel micro electron-beam, and has as object to provide an electron-optical system improved so as to be able to make a micro electron-beam with a converging angle small enough to regard the beam as substantially parallel. This object is achieved by an electron-optical system according to claim 1. A first embodiment of the present invention consists essentially of an electron beam source, a condenser lens assembly and an asymmetric objective lens with its smaller field gradient side directed to the condenser lens assembly. In a second embodiment of the present invention an additional objective lens is inserted between the condenser lens assembly and the asymmetric objective lens. Incidentally, all of the above mentioned "lenses" are of course "electron lenses", as is the same in the description given hereinafter. With such constitution of the present invention, the asymmetric objective lens, whose spherical aberration is made small, makes the first embodiment produce an electron beam having a converging angle of about 1 x 10⁻³ radian and a converging spot diameter of 0.1 µm. In the second embodiment, the converging angle and, therefore, also the converging spot diameter can be changed by adjusting the focal length of the additional objective lens as occasion demands. The present invention has its merits evaluated from the following consideration. Consider a 0.1-nm wavelengh electron beam passing through a slit or a pin hole with a diameter of 0.1 µm. The beam coming out from the pin hole has its diverging angle estimated to be 1 x 10⁻³ radian. Therefore, the converging spot diameter of 0.1 µm obtained by the first embodiment, which makes a beam having as small a converging angle as 1 x 10⁻³ radian, shows the the smallest limit of spot diameter obtainable from a beam with such a small converging angle. However, it is unpractical or impossible to obtain such a small beam spot by means of a pin hole, not only because it is impossibly difficult to make a pin hole having as small a diameter as 0.1 µm, but also because the beam thus obtained is very weak. Such a beam is obtained effectively by the present invention, particularly by the above first embodiment. Further, according to the second embodiment, a spot smaller than 0.1 µm can be obtained by enlarging the beam converging angle through adjusting the focal length of the additional objective lens. Brief Description of the Drawings The present invention is described in further detail in the following on reference to the drawings, in which: Fig. 1 schematically shows the constitution of a first embodiment of the present invention; and Fig. 2 schematically shows the constitution of a second embodiment of the present invention. Detailed Description of the Invention Referring to Fig. 1, which shows the basic constitution of a first embodiment of the present invention, the embodiment consists essentially of a thermal electron source filament 1, a first aperture 2, a first and a second condenser lenses 3 and 4, a second aperture 5 and an asymmetric objective lens 6. A diverging electron beam emitted from the filament 1 passes through the first aperture 2 and then is converged to a point P above the second aperture 5 by a condenser lens assembly made up of the first and the second condenser lenses 3 and 4. The electron beam once converged at the point P again diverges and proceeds into the asymmetric objective lens 6, with the diverging angle limited by the second aperture 5. The asymmetric objective lens 6, with it smaller field gradient side directed to the second condenser lense 4, focuses the beam at a focal point Q on a sample S. The points P and Q are thus conjugate with each other. Because the smaller field gradient side of the asymmetric objective lense 6 is directed to the second condenser lense 4, or toward the beam diverging point P, the beam converging angle spanned at the focal point Q is made smaller than the beam diverging angle spanned at the point P, resulting in a converging angle of 1 x 10⁻³ radian in this embodiment. A coil 7 is to make the resultant beam scan on the sample S. According to Fig. 2, which shows the basic constitution of a second embodiment of the present invention, the second embodiment is constituted with the first embodiment additionally provided with an additional objective lens 8, which is inserted between the asymmetric objective lens 6 and the second aperture 5. The beam diverging at the point P is made converged at a point R by the additional objective lens 8 before proceeding into the the asymmetric objective lens 6. In this second embodiment both the asymmetric and the additional objective lenses 6 and 8 have their respective beam-converging power made variable independently. With the beam converging power increased on the additional objective lense 8 and decreased on the asymmetric objective lens 6, the resulting beam has its converging angle made increased. With the above converging power relation reversed, the final beam-converging angle is made small.

Claims: An electron-optical system, for making a pseudo-parallel micro electron beam, consisting essentially of a thermal-electron emitting source (1), a condenser electron-lens assembly (3, 4) and an objective electron-lens (6), characterized in that said objective electron-lens (6) is an asymmetric electron-lens (6) whose smaller field gradient side is directed towards said condenser electron-lens assembly (3, 4). A system as claimed in claim 1 characterized by a second objective electron lens (8) interposed between the asymmetric objective electron lens (6) and the condenser assembly (3, 4).

Inventors: HAYASHI SHIGEKI, HAYASHI, SHIGEKI
Applicants: SHIMADZU CORP, SHIMADZU CORPORATION
Application year: 1990
Main classification: H01J37
IPC codes: H01J37