Substance vaporizing apparatus

Abstract: A substance vaporizing apparatus which uses a vapor (5) of a substance (4) generated by heating the substance in a gas-filled tube (2) as an exciting medium or an ionizing medium. The apparatus employs an improved container for containing the substance within the gas-filled tube (2). The improved container suppresses the rate of emission of the vapor of the substance into a discharge space (3) defined by the gas-filled tube (2) to hold the vapor density of the substance (4) at an optimum low value for laser oscillation relative to the buffer gas density in the discharge space (3). Thus, the mean free path of the atoms of the substance (4), namely the average distance traveled by the atoms between elastic collisions with the electrons, ions and neutral atoms of the buffer gas, is increased to increase the number of atoms of the substance (4) excited to a higher energy level, which, consequently, increases laser power and enhances laser beam or ion beam accelerating energy. The employment of segmental discharge electrodes (43,44) each consisting of a plurality of partial electrodes (43a,43b,43c,44a,44b,44c) diametrically distributed in the discharge space (3) of the gas-filled tube (2) enables heating the buffer gas in a substantially uniform diametrical temperature distribution, which enables to increase the length and diameter of the laser medium. The employment of two pulse generating circuits (200,300) promotes the relaxation of the atoms of the substance (4) from a lower energy level to the ground energy level to enable the next application of a pulse voltage to establish a complete population inversion, which enables the substance vaporizing apparatus to operate at a high efficiency at a high discharge frequency.

Description: The present invention relates to a substance vaporizing apparatus for generating a vapor of a substance for use as an excited, ionized medium in a vapor ion laser and wherein the vapor is generated by heating the substance in a gas-filled discharge tube defining a discharge space, and a pair of electrode means disposed axially opposite to each other within the discharge space to vaporize the substance by discharge. Metal vapor laser and vapor ion laser incorporate such a substance vaporizing apparatus. Fig. 1 shows a conventional metal vapor laser as, for example, published in 6th Nenji Taikai Koen Yoko-shu, 21aIIB3, pp. 60-63 (1986). As shown in Fig. 1, the metal vapor laser comprises discharge electrodes 1a and 1b, a cylindrical discharge tube 2 defining a discharge space 3 in which a metal vapor 5 produced by vaporizing metal pieces 4, such as copper pieces, is excited, a heat shield 6 formed of a heat-insulating material, such as wool, resonant mirrors 7a and 7b for laser oscillation, flanges 8a and 8b defining a sealed space including a vacuum chamber 9, an insulating tube 10, a sealing tube 11, a gas inlet port 12a, and a gas outlet port 12b. In operation, a pulse voltage is applied across the electrodes la and 1b to form a discharge within the discharge space 3, and then a buffer gas filling the discharge space 3 is heated by the energy of accelerated ions and electrons to vaporize the metal pieces 4. The ions and electrons accelerated by a pulse discharge and having high energy and high-temperature atoms of the heated buffer gas collide with the atoms of the vaporized metal and transfer their energy , so that the atoms of the vaporized metal are excited to a higher energy level. The heat shield 6 serves for maintaining the gas at a desired temperature to maintain a predetermined vapor density in the discharge space 3. The function of the vacuum chamber 9 is similar to that of the heat shield; the vacuum chamber 9 suppresses particularly convection heat loss. Light is emitted when the energy level of the atoms of the vaporized metal drops to a lower energy level or the ground energy level. The light thus emitted is amplified optically by the resonant mirrors 7a and 7b to emit a laser beam outside for industrial uses, such as laser machining. Fig. 2 shows the buffer gas temperature distribution and the vapor density distribution with respect to the diametrical and axial directions of the discharge space 3 in the metal vapor laser thus constructed. In Fig. 2, X-axis and Y-axis coincide respectively with the diametrical direction and the axial direction of the discharge space 3; temperature is measured upward on T-axis; indicated at 3a is the center axis of the discharge space 3 and at 3b are diametrically opposite ends of the discharge space. A curve ℓ represented by a dotted line indicates temperature distribution with respect to the axial direction, curves n 1 , n 2 and n 3 represented by alternate long and short dash line indicate vapor distribution with respect to the diametrical direction, and curves m 1 , m 2 and m 3 represented by continuous lines indicated temperature distribution with respect to the diametrical direction. As seen in Fig. 2, the temperature of the buffer gas decreases from the central portion of the discharge space 3 around the center axis 3a toward the periphery of the discharge space 3 represented by the diametrically opposite ends 3b. The temperature of the buffer gas in the vicinity of the axial ends of the discharge space 3 is lower than that in the central portion of the same. Since the vapor density distribution within the discharge tube 2 can be approximated by saturation vapor density n 0 , which is a function of buffer gas temperature, the relation between the vapor density distribution curves n 1 , n 2 and n 3 is expressed by: n 1 > n 2 = n 3 . On the other hand, when the vapor density increases relative to the buffer gas density (buffer gas pressure), the mean free path of electrons, and the ions and neutral atoms of the buffer gas decreases, and hence the kinetic energy acquired by the electrons and ions from the electric field created by a pulse discharge before colliding against the atoms of the vapor decreases and when the temperature of the atoms of the vapor increase too much, the atoms of the vapor of lower energy level increase, therefore, the population invertion between the number of atoms of the vapor of a higher energy level and that of atoms of the vapor of a lower one is not created, consequently, the electrons and the ions are unable to excite the atoms of the vapor to an energy level high enough to a give a sufficient laser gain. This conventional metal vapor laser has a disadvantage that the vapor density is high in the central portion of the discharge space 3 and hence the laser power density is low in the central portion of the discharge space 3. Fig. 3 shows a copper vapor laser described in "Manufacture of Copper Vapor Laser" published in "Reza Kenkyu", pp. 60-66, March, 1981. Referring to Fig. 3, a vapor laser unit 100 comprises opposite electrodes 1 for forming a discharge in a gas, a discharge tube 2 containing copper particles 4, a sealing tube 11, a heat shield 6 for preventing the loss of heat generated by a discharge formed between the electrodes 1, windows 13 disposed respectively near the electrodes 1 to emit a laser beam, and an insulating piece 21 provided on the sealing tube 11 for high-voltage insulation. A pulse circuit 200 comprises a charging capacitor 14 connected to the sealing tube 11 of the vapor laser unit 100 by a connecting line a, a charging reactor 15 connected in series to the charging capacitor 14, a high-voltage power source 17, a diode 16 having a positive electrode connected to the high-voltage power source 17 and a negative electrode connected to the charging reactor 15, a thyratron 18 connected to the charging reactor 15 and the high-voltage power source 17, and a peaking capacitor 20 connected to the charging capacitor 14 and the thyratron 18. The high-voltage power source 17 is connected to the sealing tube 11 by a connecting line b. The charging capacitor 14 is charged at a high voltage through the diode 16, the charging reactor 15 and the peaking capacitor 20 by the high-voltage power source 17. When the thyratron 18 is turned on by a pulse control circuit 19, the charging capacitor 14 is charged to apply a high voltage through the sealing tube 11 across the electrodes 1 to form a discharge in the discharge tube 2. Since the heat shield 6 prevents the dissipation of the thermal energy generated by the discharge within the discharge tube, the temperature within the discharge tube 2 is raised to a high temperature on the order of 1500°C, whereby the copper particles 4 are vaporized and the discharge tube 2 is filled with copper vapor. Electrons of a plasma accelerated by the discharge formed between the opposite electrodes 1 collide against copper atoms filling the discharge tube 2 to excite the copper atoms to a higher energy level corresponding to a first resonance level. Since less atoms are excited to a lower energy level corresponding to a metastable energy level, a population inversion is created. The energy level of the copper atoms drops from the higher energy level to a lower energy level with laser oscillation, and then drops gradually from the lower energy level to the ground energy level. This cycle is repeated at a frequency of several kilohertz. The laser beam is emitted through the windows 13. The drop of the energy level from the lower energy level to the ground energy level is caused by the collision of the excited atoms against the wall of the discharge tube 2 when the discharge tube has a relatively small diameter, and is caused by the superelastic collision of the atoms of the lower energy level and the slow electrons when the discharge tube 2 has a relatively large diameter, and the lifetime of the atoms on the lower energy level is as long as several hundreds microseconds. When the high-voltage pulse is applied across the electrodes 1 at a long interval corresponding to the long time of several hundreds microseconds required for the lower energy level to drop to the ground energy level, the frequency of high-voltage pulse application is reduced. On the other hand, atoms of the lower energy level increases when the high-voltage pulse is applied at a high frequency, so that an incomplete population inversion is created and hence the copper vapor laser is unable to operate at a high efficiency. From EP-A-291 295 a laser apparatus is known including an outer envelope which contains a plurality of laser discharge tubes. Each of the laser discharge tubes includes copper powder which, when vaporized, acts as a laser amplifying medium. For each of the plurality of laser discharge tubes, a pair of electrodes is provided. A similar laser apparatus is known from FR-A-2 092 912, also comprising a plurality of laser discharge tubes each having a discharge electrode which work together with a common second electrode. It is an object of the present invention to provide a substance vaporizing apparatus having a substantially uniform temperature distribution of a buffer gas in a discharge space with respect to the diametrical direction so that the region of vapor density and buffer gas temperature meeting optimum conditions for laser oscillation is increased in the discharge space and capable of increasing time period for laser oscillation. It is also an object of the present invention to provide a substance vaporizing apparatus capable of operating at a high efficiency at a high voltage pulse application frequency by promoting the drop of the energy level of atoms of a substance from a lower energy level to the ground energy level in a time interval between successive voltage pulses to create a complete population inversion for the subsequent voltage pulse application. According to the invention, a substance vaporizing apparatus of the kind as defined in the precharacterizing clause of claim 1 is characterized in that at least one of the electrode means is a segmental electrode consisting of a plurality of partial electrodes (or a main electrode and an auxiliary electrode) diametrically spaced within one common discharge space of the discharge tube. Preferable embodiments are defined in the dependent claims. In other words, a substance vaporizing apparatus comprises a gas-filled tube defining a discharge space and provided with a pair of electrodes axially opposite to each other within the discharge space, wherein at least one of the electrodes is a segmental electrode consisting of a plurality of partial electrodes diametrically arranged at intervals within the discharge space. A pulse voltage is applied to the plurality of partial electrodes to form discharges at diametrically different positions to heat the buffer gas substantially uniformly in a plurality of diametrically divided regions, so that the buffer gas can be heated in a substantially uniform temperature distribution with respect to the diameter of the discharge space, and hence the length and diameter of the laser medium can be increased. Furthermore, the pulse discharges in a plurality of diametrically divided regions in the discharge space increase the duration of laser oscillation in a unit time interval. Further, a substance vaporizing apparatus comprises a discharge tube, a first pulse generating circuit for applying a first pulse voltage for laser oscillation, a second pulse generating circuit for applying a second pulse voltage delayed by a predetermined time interval from the first pulse voltage to the discharge tube, and auxiliary electrodes having a relatively small surface area and disposed opposite to the discharge tube. The second pulse voltage is applied across the auxiliary electrodes. The second pulse voltage is applied across the auxiliary electrodes having a relatively small surface area in a time interval between the successive first pulse voltages generated by the first pulse generating circuit to stabilize discharges by fixing a discharge forming position, so that atoms of lower energy level and slow electrons are brought forcibly into superelastic collision. Consequently, relaxation of the atoms of the lower energy level is promoted so that a population inversion is improved by the application of the next first pulse voltage, and the reduction of the laser efficiency can be prevented even if the first pulse voltage is applied at a high frequency. The above and other objects, features and advantages of the present invention will become more apparent from the reading of the following description with reference to the accompanying drawings, which, however, are intended only to illustrate the invention and are not to be construed to limit the scope of the present invention. Figure 1 is a schematic sectional view of a conventional metal vapor laser; Figure 2 is a graph showing the diametrical temperature distribution and the diametrical vapor density distribution in the discharge tube of a conventional substance vaporizing apparatus; Figure 3 is a diagrammatic illustration of a conventional copper vapor laser; Figure 4 is a sectional view of an essential portion of a substance vaporizing apparatus in a first embodiment according to the present invention; Figure 5 is a sectional view of an essential portion of a modification of the substance vaporizing apparatus in the first embodiment according to the present invention; Figure 6 is a block diagram of an essential portion of a substance vaporizing apparatus in a second embodiment according to the present invention; Figure 7 is a waveform chart showing the waveforms of pulse signals generated by a pulse phase controller incorporated into a substance vaporizing apparatus; Figure 8 is a block diagram of a substance vaporizing apparatus in a third embodiment according to the present invention, as a metal vapor laser; Figures 9(a), 9(b) and 9(c) are perspective views of auxiliary electrodes; Figure 10 is a circuit diagram of a second pulse generating circuit shown in Fig. 8; and Figure 11 is a time chart showing the timing of application of voltage to a discharge tube. Preferred embodiments of the present invention will be described hereinafter with reference to the accompanying drawings. Fig. 4 shows a substance vaporizing apparatus in a first embodiment according to the present invention as applied to a metal vapor laser, in which parts like or corresponding to those previously described with reference to Fig. 1 are denoted by the same reference characters and the description thereof will be omitted to avoid duplication. Referring to Fig. 4, a pair of discharge electrodes 43 and 44 are disposed axially opposite to each other with respect to the axial direction indicated by arrows Y in a discharge space 3. The electrode 43 consists of a plurality of partial electrodes 43a, 43b and 43c electrically insulated from each other and arranged diametrically of the discharge space 3 (along a direction indicated by arrows X) at intervals, and the electrode 44 consists of a plurality of partial electrodes 44a, 44b and 44c electrically insulated from each other and arranged diametrically of the discharge space 3 at intervals. A plurality of power sources 45a, 45b and 45c apply voltages across the partial electrodes 43a and 44a, across the partial electrodes 43b and 44b and across the partial electrodes 43c and 44c, respectively. In operation, pulse voltages are applied across the partial electrodes 43a and 44a, across the partial electrodes 43b and 44b and across the partial electrodes 43c and 44c, respectively, to form a plurality of diametrically separate pulse discharges in the discharge space 3 to melt and vaporize metal pieces 4 provided in the discharge space 3 to generate a metal vapor. Laser light is produced by exciting the metal vapor to a higher energy level by the plurality of pulse discharges. Since the pulse discharges are formed in the diametrically divided regions of the discharge space 3, the buffer gas prevailing in the discharge space 3 is heated uniformly with respect to the diametrical direction, so that the diametrical temperature distribution of the buffer gas is substantially uniform. Thus, the length and diameter of the laser medium can be increased and the laser output can be enhanced. Increase in the time interval of laser oscillation in unit time interval by the plurality of pulse discharges formed in the discharge space 3 enhances the laser output. Fig. 5 shows a modification of the substance vaporizing apparatus in the first embodiment. The substance vaporizing apparatus shown in Fig. 5 comprises a pair of electrodes 43 and 44, and only the electrode 43 consists of a plurality of partial electrodes 43a, 43b and 43c. The effect of the substance vaporizing apparatus shown in Fig. 5 is substantially the same as that of the substance vaporizing apparatus shown in Fig. 4. Fig. 6 shows a substance vaporizing apparatus in a second embodiment according to the present invention. This substance vaporizing apparatus comprises an electrode 43 consisting of a plurality of partial electrodes 43a, 43b and 43c, an electrode 44 consisting of a plurality of partial electrodes 44a, 44b and 44c, a first power source 45a, a second power source 45b and a third power source 45c for applying voltages across the partial electrodes 43a and 44a, across the partial electrodes 43b and 44b and across the partial electrodes 43c and 44c, respectively, and a pulse phase controller 48 connected to the power sources 45a, 45b and 45c. The pulse phase controller 48 applies pulse signals S 1 , S 2 and S 3 to the power sources 45a, 45b and 45c to make the power sources 45a, 45b and 45c apply pulse voltages respectively to the corresponding pairs of the partial electrodes 43a and 44a, 43b and 44b, and 43c and 44c. As shown in Fig. 7, the pulse signal S 2 applied to the second power source 45b lags the pulse signal S 1 applied to the first power source 45a by a time T 1 , and the pulse signal S 3 applied to the third power source 45c lags the pulse signal S 1 applied to the first power source 45a by a time T 2 . Consequently, the phase of the pulse voltage applied across the pair of partial electrodes 43b and 44b lags the phase of the pulse voltage applied across the pairs of partial electrodes 43a and 44a by the time T 1 , and the phase of the pulse voltage applied across the partial electrodes 43c and 44c lags the phase of the voltage pulse applied across the pair of partial electrodes 43a and 44a by the time T 2 . Thus, the substance vaporizing apparatus in the second embodiment has the following effect in addition to that of the substance vaporizing apparatus in the first embodiment. That is, the pulse voltages of different phases are applied sequentially across the pairs of partial electrodes 43a and 44a, 43b and 44b, and 43c and 44c to form pulse discharges of different phases sequentially in diametrically divided regions in the discharge space, respectively, so that the energy level of the atoms of the vapor excited to a higher energy level by a pulse discharge drops from the higher energy level to a lower energy level to increase the number of atoms on the lower energy level. The energy level of the atoms on the lower energy level is allowed to drop to the ground energy level during the interruption of pulse discharge and hence the number of atoms on the lower energy level can be reduced, so that the laser output is enhanced. Fig. 8 shows a substance vaporizing apparatus in a third embodiment according to the present invention, in which parts like or corresponding to those previously described with reference to Fig. 3 are denoted by the same reference characters and the description thereof is omitted to avoid duplication. Referring to Fig. 8, a delay circuit 51 has the input connected to a pulse control circuit 19, and the output connected to a second pulse generating circuit 300. The delay circuit 51 delays the output signal by a specified time interval with respect to an input signal from the pulse control circuit 19. The output of the second pulse generating circuit 300 is connected through insulated rings 102 to auxiliary electrodes 101 disposed opposite to electrodes 1 provided at the opposite ends of a discharge tube 2, respectively. The auxiliary electrodes 101 have each a small surface area to form a stable discharge at a fixed discharge position. The auxiliary electrodes 101 may be, for example, a solid rod 101-1 of a small diameter as shown in Fig. 9(a), a tube 101-2 having a small outside diameter as shown in Fig. 9(b) or a cylindrical comb 101-3 as shown in Fig. 9(c). Referring to Fig. 10 showing the configuration of the second pulse generating circuit 300 shown in Fig. 8 in detail, a connecting line a is connected through a filter reactor 54 to one end of the secondary coil of a pulse transformer 52 of a turns ratio n. A connecting line b is connected to the other end of the secondary coil of the pulse transformer 52. A filter capacitor 53 is connected in parallel to the secondary coil of the pulse transformer 52. The filter capacitor 53 and the filter reactor 54 constitute a protective circuit 56. One end of the primary coil of the pulse transformer 52 is connected to the positive electrode of a dc power source 58 through a diode 60 of reversed polarity and a pulse charging reactor 49, and to a first terminal of a self-arc-suppressing switch 55 through a pulse capacitor 57. The other end of the primary coil of the pulse transformer 52 is connected through a pulse reactor 61 to a second terminal of the self-arc-suppressing switch 55. The negative electrode of the dc power source 58 is connected to the first terminal of the self-arc-suppressing switch 55. A connecting line c is connected to the self-arc-suppressing switch 55. Timing of applying a pulse voltage to the discharge tube 2 of the substance vaporizing apparatus in the tenth embodiment is shown in Fig. 11. Upon the reception of a control signal from the pulse control circuit 19, the first pulse circuit 200 applies a first pulse voltage through a sealed tube 11 across the electrodes 1 to form a discharge in the discharge tube 2. The delay circuit 51 transfers the control signal provided by the pulse control circuit 19 to the second pulse generating circuit 300 with a predetermined delay. When the self-arc-suppressing switch 55 of the second pulse generating circuit 300 is closed by a signal provided by the delay circuit 51, the electrical energy of a voltage stored in the pulse capacitor 57 is applied across the primary coil of the pulse transformer 52. Then, a voltage n times greater than the voltage applied across the primary coil of the pulse transformer 52 appears across the secondary coil of the pulse transformer 52 and a second pulse voltage is applied across the auxiliary electrodes 101 of the discharge tube 2 through the filter capacitor 53 and the filter reactor 54. Pulse voltages V ab are applied between the connecting lines a and b in a mode as shown in Fig. 11. The first pulse generating circuit 200 applies a first pulse voltage between the electrodes of the discharge tube 2 at time t 0 to form a discharge. The second pulse generating circuit 300 applies a second pulse voltage between the auxiliary electrodes 101 with a predetermined delay time τ with respect to the application of the first pulse voltage. The sequential application of the first pulse voltage between the electrodes 1, and the second pulse voltage between the auxiliary electrodes 101 is repeated periodically. Since the surface area of the auxiliary electrodes 101 is small, discharges are formed at a fixed position, discharges are formed uniformly in the discharge space defined by the discharge tube 2, and hence the atoms are relaxed stably from the lower energy level to the ground energy level. The filter reactor 54 and the filter capacitor 53 function as a low-pass filter which is reactive to the first pulse voltage generated by the first pulse generating circuit 200 and are inductive to the second pulse voltage generated by the second pulse generating circuit 300. The pulse width Tx of the second pulse voltage generated by the second pulse generating circuit 300 is a function of the inductance Lx of the pulse reactor 61 and the capacitance Cx of the pulse capacitor 57 and is expressed by: Tx ≃ π(Lx·Cx) ½ The pulse width Tx is greater than that of the first pulse voltage generated by the first pulse generating circuit 200. The relaxation of the atoms from the lower energy level to the ground energy level is caused by the superelastic collision of the atoms on the low energy level and slow electrons when the discharge tube 2 has a comparatively large diameter, which is expressed by: Cu* + e (slow) → Cu + e (fast) where Cu* is copper atoms on the lower energy level, Cu is copper atoms on the ground energy level, e (slow) is slow electrons and e (fast) is fast electrons. The second pulse voltage generated by the second pulse generating circuit 300 is a low voltage unable to excite the atoms to a higher energy level, but the second pulse voltage is able to accelerate the electrons, and hence frequent collision of the atoms and the electrons occurs. Consequently, the relaxation of the atoms from the lower energy level to the ground energy level is promoted by the active superelastic collision of the atoms on the lower energy level and the electrons. A voltage obtained by chopping the dc power source 58 may be applied across the discharge tube 2 instead of the voltage of the pulse capacitor 57. Any suitable on-off switch may be used instead of the self-arc-suppressing switch 55. The substance vaporizing apparatus in the first embodiment according to the present invention forms discharges at diametrically different positions to heat the buffer gas substantially uniformly in a plurality of diametrically divided regions in the discharge space, so that the buffer gas can be heated in a substantially uniform temperature distribution with respect to the diameter of the discharge space, and hence the length and diameter of the laser medium can be increased and the duration of laser oscillation in a unit time interval can be increased. Thus, the substance vaporizing apparatus is capable of providing a high laser output. The substance vaporizing apparatus in the second embodiment according to the present invention has an effect, in addition to the foregoing effects, of promoting the relaxation of atoms from a lower energy level to the ground energy level by the tubes B provided in the discharge space to cause the frequent collision of the atoms of the vapor against the walls of the tubes during the interruption of pulse discharge. Thus, the substance vaporizing apparatus has a comparatively long laser output period and a high laser output. The substance vaporizing apparatus in the third embodiment according to the present invention comprises a first pulse generating circuit, and a second pulse generating circuit which generates a second pulse voltage with a predetermined delay time with respect to a first pulse voltage generated by the first pulse generating circuit. Therefore, the time required for the relaxation of the atoms from a lower energy level to the ground energy level is reduced, whereby a population inversion is improved by the application of the next first pulse voltage. The auxiliary electrodes having a small surface area stabilizes discharges and the position for discharge, so that the relaxation of the atoms occurs uniformly in the discharge space. Thus, the substance vaporizing apparatus operates stably at a high laser producing efficiency at a high discharge frequency.

Claims: A substance vaporizing apparatus for generating a vapor (5) of a substance for use as an excited, ionized medium in a vapor ion laser and wherein the vapor (5) is generated by heating the substance (4) in a gas-filled discharge tube (2) defining a discharge space (3); and a pair of electrode means (43, 44; 1, 101) disposed axially opposite to each other within the discharge space (3) to vaporize the substance (4) by discharge; characterized in that at least one of the electrode means (43, 44; 1, 101) is a segmental electrode consisting of a plurality of partial electrodes (43a, 43b, 43c; 44a, 44b, 44c; 1, 101) diametrically spaced within one common discharge space (3) of the discharge tube (2). A substance vaporizing apparatus according to claim 1, further comprising a pulse phase controller (48) for sequentially applying pulse voltages (V1, V2, V3) of different phases to pairs of partial electrodes (43a, 44a; 43b, 44b; 43c, 44c), respectively. A substance vaporizing apparatus according to claim 1, comprising a first pulse generating circuit (200) for generating a first pulse voltage between main electrodes (1) to produce laser oscillation in the discharge tube (2); a second pulse generating circuit (300) for applying a second pulse voltage across the discharge tube with a predetermined time delay (τ) with respect to the first pulse voltage; and auxiliary electrodes (101) provided at the opposite ends of the discharge tube (2) electrically connected to receive the second pulse voltage; the surface area of the auxiliary electrodes (101) being small such that the discharges are formed at fixed positions and uniformly in the discharge space; the first pulse voltage generating population inversion of the vapor atoms between the ground energy level and a higher energy level; and the second pulse voltage being a low voltage unable to excite the vapor atoms to the higher energy level but being able to accelerate electrons, in order that vapor atoms of a lower energy level and electrons are brought into superelastic collisions so that relaxation of the vapor atoms from the lower energy level to the ground energy level is promoted.

Inventors: HARA KAZUHIKO, TABATA YOICHIRO, UEDA YOSHIHIRO, UEGURI SHIGEO, HARA, KAZUHIKO, TABATA, YOICHIRO, UEDA, YOSHIHIRO, UEGURI, SHIGEO, HARA, KAZUHIKO, C/O MITSUBISHI DENKI K.K., TABATA, YOICHIRO, C/O MITSUBISHI DENKI K.K., UEDA, YOSHIHIRO, C/O MITSUBISHI DENKI K.K., UEGURI, SHIGEO, C/O MITSUBISHI DENKI K.K.
Applicants: MITSUBISHI ELECTRIC CORP, MITSUBISHI DENKI KABUSHIKI KAISHA
Application year: 1990
Main classification: H01S3
IPC codes: H01S3