X-ray exposure apparatus

Abstract: An X-ray exposure apparatus, for transferring a pattern of the mask (13) to a wafer (15), includes an X-ray source accommodating chamber (50); a mask chuck (14) for supporting the mask; a wafer chuck (16) for supporting the wafer; a stage (18) for moving the wafer chuck; a stage accommodating chamber (19) for accommodating therein the mask chuck, the wafer chuck and the stage; a barrel (5) for coupling the X-ray source accommodating chamber with the stage accommodating chamber, to define an X-ray projection passageway (30); a blocking window (6) provided in the X-ray projection passageway, for isolating the ambience in the X-ray accommodating chamber and the ambience in the stage accommodating chamber from each other; and a gas supply port (3) contributable to fill the stage accommodating chamber with a gas ambience of low X-ray absorption. The gas supply port opens to the X-­ ray projection passageway at a position between the blocking window and the mask supported by the mask chuck.

Description: This invention generally relates to an X-ray exposure apparatus for exposing a substrate to X-rays. As a light source of such an X-ray exposure apparatus, there are a bulb type one which produces X-rays by electron beam excitation, one which uses X-rays produced from plasma, one that uses synchrotron orbit radiation, and the like. All of these X-ray sources produce X-rays in vacuum. Accordingly, usually an X-ray source is disposed in a vacuum and gas-tight X-ray source accommodating chamber, and produced X-rays is projected to a mask or wafer through a blocking window made of a material (usually, beryllium (Be)) having high X-ray transmission factor. If in this case atmosphere is present in the path of X-ray transmission from the blocking window to a wafer, X-rays are absorbed by the atmosphere, resulting in an increase in exposure time and thus in a decrease of the throughput. Considering an X-ray exposure apparatus as an industrial productive machine, the decrease in throughput is a critical problem. In an attempt to solving this, a proposal has been made in JP-A- 1 225 118, in accordance with which an alignment mechanism for a mask and a wafer is disposed in a vacuum and gas-tight container chamber (hereinafter "stage accommodating chamber") and such stage accommodating chamber is filled with a particular gaseous fluid (usually, helium (He) gas) of reduced pressure, lower than the atmospheric pressure, having small X-ray absorbency. In this type of X-ray exposure apparatus, however, the amount of X-ray transmission through the path from the blocking window to the wafer is greatly affected by the helium gas ambience within the stage accommodating chamber. If the purity or pressure of helium introduced into the stage accommodating chamber changes largely, the amount of X-ray exposure changes, which results in reduction in precision of an exposure apparatus. Additionally, it is necessary to retain the purity of helium at a high level and also to keep the variation thereof small. If it is desired to control the purity by using some purity detecting means, use of a very high precision detection and control means is necessary. In the respect, an X-ray exposure apparatus has been proposed in our earlier European published application number 363163, which apparatus is arranged so that, even after the inside gas of a stage accommodating chamber is replaced by helium, a constant amount of helium is continuously supplied into the chamber to compensate reduction in the purity due to introduction of an impurity gas into the stage accommodating chamber. Figure 6 shows this X-ray exposure apparatus. In Figure 6, a barrel 5 is coupled to an X-ray source (not shown) and, to this barrel 5, a stage accommodating chamber 19 is coupled. The barrel 5 is equipped with a beryllium blocking window 6 and the X-rays passing therethrough are used. The stage accommodating chamber 19 accommodates therein a mask 13, a mask chuck 14, a wafer 15, a wafer chuck 16 and a wafer stage 18. To the stage accommodating chamber 19, a low vacuum pump 11 such as an oil rotation pump, for example, is coupled by way of a variable valve 10. The valve 10 is adapted to change the opening (conductance) thereof automatically in response to a signal from a controller 9. By means of a pressure sensor 8 and a pressure detecting port 7, the pressure within the stage accommodating chamber 19 can be detected and, on the basis of this detection, the controller 9 controls the opening of the variable valve 10. By this, the inside pressure of the stage accommodating chamber 19 is controlled and maintained constant. Denoted at 1 is a helium tank and denoted at 2 is a valve the opening of which can be adjusted manually. The He gas can be supplied through a He supply port 3. In this type of X-ray exposure apparatus, first the inside of the stage accommodating chamber 19 is vacuum evacuated to a predetermined pressure by using the low vacuum pump 11 and, thereafter, a helium gas is supplied to fill the stage accommodating chamber 19 with a reduced pressure helium ambience, and the exposure process is executed in this ambience. In this example, the control of the helium ambience (purity and pressure) is conducted to the whole helium gas in the stage accommodating chamber 19. However, since in the stage accommodating chamber 19, many elements such as the mask 13, the wafer 15, the mask chuck 14, the wafer chuck 16, the wafer stage 18 and the like are accommodated, it is not easy to correctly predict the flow of helium within the stage accommodating chamber 19. Also, when the wafer stage 18 moves, there is a possibility of production of a regional flow. If this occurs, it is not possible to maintain the whole helium ambience in the stage accommodating chamber 19 uniform and, in the X-ray projection path from the beryllium blocking window 6 to the wafer 15 (to which the control is actually required), the purity of helium is liable to be degraded or the pressure thereof tends to change. The present invention seeks to provide an apparatus and method which overcome at least some of the deficiencies of the prior art. The present invention provides, in a first aspect, an X-ray exposure apparatus for exposing a semiconductor wafer to soft X-rays for lithographically transferring a fine semiconductor integrated circuit pattern of a mask onto a semiconductor wafer by using soft X-rays, comprising: a sealable exposure chamber in which is accommodated: a mask chuck for supporting the mask; a movable mount for accommodating the wafer within the sealable exposure chamber; a beam passageway providing an X-ray path within the sealable exposure chamber to the wafer; a blocking window in the beam passageway for isolating a helium ambiance within the exposure chamber; a gas supply port for supplying helium to the exposure chamber and opening into the beam passageway at a position between said blocking window and said mask chuck for supporting the mask; a discharge opening of the beam passageway provided adjacent the beam passageway for discharging helium from the beam passageway; and a pressure detecting port, which opens into said beam passageway at a position between said blocking window and said mask chuck for supporting said mask, for detecting the pressure of helium in the exposure chamber; the apparatus further comprising: a discharge opening of the exposure chamber for discharging helium from the exposure chamber; and control means for controlling the rate of discharge of helium from the exposure chamber on the basis of the detected pressure to maintain a predetermined helium pressure in said X-ray path, so that gas conditions in the beam passageway are substantially unaffected by movement of the movable mount whereby high-precision X-ray exposure is ensured. In a second aspect, the present invention provides a method of exposing a semiconductor wafer to soft X-rays in an X-ray exposure apparatus for lithographically transferring onto a semiconductor wafer a fine semiconductor integrated circuit pattern of a mask by using soft X-rays, wherein: a mask chuck for supporting the mask is accommodated in a sealable exposure chamber; the wafer is accommodated on a movable mount within the sealable exposure chamber; and a beam passageway provides an X-ray path within the exposure chamber from a blocking window to the wafer and the blocking window isolates a helium ambiance within the exposure chamber; the method comprising the steps of: supplying helium to the exposure chamber through a gas supply port opening into the beam passageway at a position between said blocking window and the mask supported by said mask chuck; discharging helium from the beam passageway through a discharge opening of the beam passageway provided adjacent the beam passageway; detecting the pressure of helium in the exposure chamber at a pressure detecting port which opens into said beam passageway at a position between said blocking window and the mask supported by said mask chuck; discharging helium from the exposure chamber through a discharge opening of the exposure chamber; and controlling the rate of discharge of helium from the exposure chamber on the basis of the detected pressure to maintain a predetermined helium pressure in said X-ray path, so that gas conditions in the beam passageway are substantially unaffected by movement of the movable mount whereby high-precision X-ray exposure is ensured. Embodiments of the present invention will now be described with reference to the accompanying drawings, in which:- Figure 1 is a schematic and diagrammatic view of an X-ray exposure apparatus according to a first embodiment of the present invention. Figure 2 is a sectional view showing a portion about a helium supplying port. Figure 3 is a sectional view showing a portion about helium discharging ports. Figure 4 is a schematic and diagrammatic view of an X-ray exposure apparatus according to a second embodiment of the present invention. Figure 5 is a schematic and diagrammatic view of an X-ray exposure apparatus according to a third embodiment of the present invention. Figure 6 is a schematic and diagrammatic view of an X-ray exposure apparatus of the type disclosed in EP 363163. Referring to Figure 1, denoted at 50 is an X-ray source accommodating chamber for accommodating an X-ray source therein. Barrel 5 is coupled to the X-ray source accommodating chamber and, to this barrel 5, a stage accommodating chamber 19 is coupled. The barrel 5 is equipped with a beryllium blocking window 6 through which the X-rays produced by the X-ray source are introduced into the stage accommodating chamber 19 along the z-axis direction. The stage accommodating chamber 19 accommodates therein a mask 13, a mask chuck 14 for holding the mask 13, a semiconductor wafer 15, a wafer chuck 16 for holding the wafer 15, a wafer stage 18 which is movable along the x-axis, y-axis and z-axis directions as well as in rotational directions about these axes, respectively, and an optical system 17 for the alignment of the mask and the wafer with respect to each of the x-axis, y-axis and z-axis directions. More particularly, the optical system 17 is operable to detect any positional deviation between alignment marks provided on the mask and the wafer. The wafer stage 18 can be moved stepwise in each of the x-axis and y-axis directions, for printing a circuit pattern formed on the mask 13 upon different shot areas on the wafer 15. By exposing the wafer 15 with the x-rays through the mask 13, the pattern of the mask 13 can be printed on a particular shot area of the wafer 15. Thus, the above-described structure constitutes what can be called an "X-ray stepper". To the barrel 5, a high vacuum pump 51 such as a turbo molecular pump, for example, is coupled, for vacuum-evacuation thereof. To the stage accommodating chamber 19, a low vacuum pump 11 such as an oil rotation pump, for example, is coupled by way of a discharging port 12 and a variable valve 10. The discharging port 12 is coupled to the same side of the stage accommodating chamber 19, to which the barrel 5 is coupled. However, the discharging port may be coupled to the wall of the stage accommodating chamber 19 on the opposite side remote from the barrel 5, as in the Figure 6 example. The variable valve 10 is adapted to change the opening thereof automatically in response to a signal from a controller 9. The stage accommodating chamber 19 is equipped with an opening 31 for passage of X-rays, on the side of which opening a pressure detecting port 7 is provided to detect the pressure in an X-ray projection path 30 between the beryllium blocking window 6 and the mask 13. On the basis of the pressure detected by the pressure sensor 8, the controller 9 controls the opening of the variable valve 10. By this, the pressure in the stage accommodating chamber 19, more particularly, the pressure in the X-ray projection path (passageway) 30, can be controlled and maintained constant. The flow of helium gas from a tank 1 is adjusted by a manual adjusting valve 2 to a predetermined flow rate and, through a helium supply port 3 disposed just after (wafer 15 side) the beryllium blocking window 6 of the barrel 5, the helium gas is supplied into the stage accommodating chamber 19 through the X-ray projection path 30. The mask chuck 14 is provided with a helium discharging port 4 for discharging the supplied helium from the X-ray projection path 30 into the stage accommodating chamber 19. The helium discharging port 4 is arranged to avoid vibration or flexure of the mask 13 due to the gas flow of helium. Figure 2 is a sectional view of the helium supply port 3, taken on line A-A in Figure 1. Figure 3 is a sectional view of the helium discharging port 4, taken on line B-B in Figure 1. As seen in these drawings, in the neighborhood of the portion of the barrel 5 to which the helium supply port 3 is coupled, an inner cylinder 40 is provided in a concentric relationship with the barrel 5. The inner cylinder 40 has twelve (12) bores 41 formed equidistantly along the circumference of the cylinder 40. The helium introduced into the barrel 5 from the helium supply port 3, is then introduced into the X-ray projection path 30 through these bores 41 of the inner cylinder 40. Also, as best seen in Figure 3, the mask chuck 14 has eight (8) helium discharging ports 4 which are formed equidistantly around the X-ray projection path 30, as passageways extending radially outwardly from the center of the X-ray projection path 30. The helium introduced into the X-ray projection path 30, is then introduced into the stage accommodating chamber 19 through these discharging ports 4. By introducing and discharging the helium gas radially inwardly and outwardly in the manner described above, it is possible to obtain a uniform or homogeneous helium ambience. For the exposure process in the X-ray exposure apparatus of the structure described above, first the inside atmosphere in the stage accommodating chamber 19 is replaced by a helium gas of a predetermined pressure. Then, in accordance with the quantity of impurity gas introduction (leakage) into the stage accommodating chamber 19 (for example, the introduction of an air through seal means), a constant amount of helium necessary for retaining the purity of helium in the stage accommodating chamber 19 is supplied continuously from the helium supply port 3. Additionally, the opening of the variable valve 10 coupled to the vacuum pump 11 is controlled continuously on the basis of the output of the pressure sensor 8. By this, the pressure in the X-ray projection path 30 can be controlled and maintained constant. Referring to Figure 4 showing a second embodiment of the present invention, helium is supplied through a helium supply port 3 which is provided just before (light source side) the mask 13 held on the mask chuck 14. Additionally, a communication port 20 is formed to provide communication between the stagé accommodating chamber 19 and the barrel 5, more particularly, a part of the barrel 5 just after (mask 13 sides of the blocking window 6. The helium gas from the tank 1 flowing through the manual valve 2 flows through the X-ray projection path 30 in a direction from the mask 13 to the blocking window 6 and, thereafter, through the communication port 20 the helium gas introduced into the stage accommodating chamber 19. As in the first embodiment, the pressure detecting port 7 is provided on the side of the opening 31 of the stage accommodating chamber 19, for passage of X-rays, and it is operable to detect the pressure in the X-ray projection path 30. The remaining structure and operation of this embodiment are substantially the same as those of the first embodiment. Referring to Figure 5 showing a third embodiment of the present invention, in this embodiment, the first embodiment is modified such that a thin film 21 is added between the mask 13 and the helium discharging port 4 to intercept them. Also, a port 22 is added to provide communication between the stage accommodating chamber 19 and the space which is defined between the thin film 21 and the mask 13. With this arrangement, it is possible to effectively suppress or minimize the vibration or flexure of the mask 13 due to the flow of helium, substantially without decreasing the amount of exposure of the wafer 16 with the X-rays. In Figure 5, the helium from the tank 1 flowing through the valve 2, is supplied into the stage accommodating chamber 19 from the helium supply port 3 provided just after the blocking window 6 of the barrel 5. More particularly, the helium gas introduced from the helium supply port 3 into the X-ray projection path 30 flow to the discharging ports 4 which are provided just before (blocking window 6 side) the thin film 21, into the stage accommodating chamber. Into the space between the thin film 21 and the mask 13, helium is introduced from the stage accommodating chamber 19 side, through the port 22. The thin film 21 is disposed adjacent the helium discharging ports 4 which are formed in the mask chuck 14 for introduction of the helium gas supplied to the X-ray projection path 30, into the stage accommodating chamber 19. More particularly, it is disposed at one side of the ports 4 facing to the mask 13. The communication port 22 provided between the thin film 21 and the mask 13 functions also to prevent the possible flexure or vibration of the thin film 21, due to the gas flow of helium, from adversely affecting the mask 13. Since substantially no differential pressure is produced on the opposite sides of the thin film 21, the thickness thereof may be very small of an order of a few microns. Examples of the material thereof are: an organic material such as polypropylene, polyethylene, polyamide, polycarbonate, vinyl chloride, fluorine plastic or the like; or an inorganic material such as Si 3 N 4 , SiC, Be, SiO 2 or the like. As in the first embodiment, the pressure detecting port 7 is provided on the side of the opening 31 of the stage accommodating chamber 19, for passage of X-rays and it is operable to detect the pressure in the X-ray projection path 30. The remaining structure and operation are similar to those of the first embodiment. Also, in the third embodiment, like the second embodiment, the supply port 3 may be provided on the mask chuck side, at a position between the blocking window 6 and the thin film 21, and the communication port 20 (see Figure 4) may be provided on the barrel 5 side. Whether the structure without a thin film 21 as in the first and second embodiments or the structure with a thin film as in the third embodiment should be selected, may be determined on the basis of various conditions such as, for example, the mechanical structure of the components (such as the barrel 5, the optical system 17, the mask 14, etc.) disposed around the X-ray projection path 30, the flow rate of helium gas as supplied from the helium supply port 3, the material and thickness of the thin film 21, while taking into account the quantity of X-ray attenuation, the effect of vibration or flexure of the mask, and the like. In the preceding three embodiments, the supply and discharging of helium is executed through the ports 3 and 4 provided in the barrel 5 and the mask chuck 14, and the pressure detection is executed through the port 7 provided in the stage accommodating chamber 19. However, the present invention is not limited to such a form. By way of example, the supply port 3 may be provided in the stage accommodating chamber 19 so as to supply helium into the X-ray projection path 30, or the pressure detecting port 7 may be provided in the barrel 5 or the mask chuck 14 so as to detect the pressure in the X-ray projection path 30. Further, the position for the provision of the thin film 21 is not limited to the mask chuck 14. According to the present invention, as described hereinbefore, it is possible to control the helium ambience in the X-ray projection path mainly, to which the control of purity, pressure and the like of the helium has should actually be executed.

Claims: An X-ray exposure apparatus for exposing a semiconductor wafer (15) to soft X-rays for lithographically transferring a fine semiconductor integrated circuit pattern of a mask (13) onto a semiconductor wafer (15) by using soft X-rays, comprising: a sealable exposure chamber (19) in which is accommodated: a mask chuck (14) for supporting the mask (13); a movable mount (16) for accommodating the wafer (15) within the sealable exposure chamber; a beam passageway (30) providing an X-ray path within the sealable exposure chamber (19) to the wafer (15); a blocking window (6) in the beam passageway (30) for isolating a helium ambiance within the exposure chamber (19); a discharge opening (4) of the beam passageway provided adjacent the beam passageway for discharging helium from the beam passageway (30); and a discharge opening (12) of the exposure chamber (19) for discharging helium from the exposure chamber; the apparatus being characterized by further comprising: a pressure detecting port (31), which opens into said beam passageway (30) at a position between said blocking window (6) and said mask chuck (14) for supporting said mask (13), for detecting the pressure of helium in the exposure chamber (19); a gas supply port (3) for supplying helium to the exposure chamber and opening into the beam passageway (30) at a position between said blocking window (6) and said mask chuck (14) for supporting the mask (13); control means (8, 9) for controlling the rate of discharge of helium from the exposure chamber (19) on the basis of the detected pressure to maintain a predetermined helium pressure in said X-ray path, so that gas conditions in the beam passageway (30) are substantially unaffected by movement of the movable mount (16) whereby high-precision X-ray exposure is ensured. An apparatus according to claim 1, further comprising vacuum evacuating means (11) actable on said exposure chamber (19) to maintain constant the pressure of the gas ambience detected by said pressure detecting port (31). An apparatus according to claim 1 or claim 2, wherein said gas supplying port (3) includes a plurality of supplying openings (41) disposed substantially uniformly around said beam passageway (30). An apparatus according to any preceding claim, further comprising a gas introducing port (4) for introducing into said exposure chamber (19) gas supplied by the gas supplying port (3) into said beam passageway (30). An apparatus according to claim 4, wherein, along said beam passageway, said gas supplying port (3) is disposed adjacent the blocking window (6) side while said gas introducing port (4) is disposed adjacent the mask (13). An apparatus according to claim 4, wherein, along said beam passageway (30), said gas supplying port (3) is disposed adjacent the mask (13), while said gas introducing port (20) is disposed adjacent the blocking window (6). An apparatus according to claim 4, 5 or 6, wherein said gas introducing port (4,20) has a plurality of discharging openings disposed substantially uniformly around said beam passageway (30). An apparatus according to claim 4, 5, 6 or 7, further comprising a blocking film (21) disposed in said passageway (30) at a position between the mask (13), and said gas supplying and introducing ports (3) and (4). An apparatus according to claim 8, further comprising a communication port (22) for providing communication between said exposure chamber (19) and a portion of the beam passageway (30) between said blocking film (21) and the mask (13). An apparatus according to any one of the preceding claims, wherein said wafer (15) is held on a movable stage device (18). A method of exposing a semiconductor wafer (15) to soft X-rays in an X-ray exposure apparatus for lithographically transferring onto a semiconductor wafer (15) a fine semiconductor integrated circuit pattern of a mask (13) by using soft X-rays, wherein: a mask chuck (14) for supporting the mask (13) is accommodated in a sealable exposure chamber (19); the wafer (15) is accommodated on a movable mount (16) within the sealable exposure chamber; and a beam passageway (30) provides an X-ray path within the exposure chamber from a blocking window (6) to the wafer (15), and the blocking window isolates a helium ambience within the exposure chamber (19); the method comprising the steps of: discharging helium from the beam passageway (30) through a discharge opening (4) of the beam passageway provided adjacent the beam passageway; and discharging helium from the exposure chamber through a discharge opening (12) of the exposure chamber (19); the method being characterized by: supplying helium to the exposure chamber through a gas supply port (3) opening into the beam passageway (30) at a position between said blocking window (6) and the mask (13) supported by said mask chuck (14); detecting the pressure of helium in the exposure chamber at a pressure detecting port (31) which opens into said beam passageway (30) at a position between said blocking window (6) and the mask (13) supported by said mask chuck (14); and controlling the rate of discharge of helium from the exposure chamber on the basis of the detected pressure to maintain a predetermined helium pressure in said X-ray path, so that gas conditions in the beam passageway (30) are substantially unaffected by movement of the movable mount (16) whereby high-precision X-ray exposure is ensured.

Inventors: AMEMIYA MITSUAKI, KARIYA TAKAO, MIZUSAWA NOBUTOSHI, TANAKA YUTAKA, UZAWA SHUNICHI, AMEMIYA, MITSUAKI, KARIYA, TAKAO, MIZUSAWA, NOBUTOSHI, TANAKA, YUTAKA, UZAWA, SHUNICHI
Applicants: CANON KK, CANON KABUSHIKI KAISHA
Application year: 1990
Main classification: G03F7
IPC codes: H01L21, G21K5, G03F7