Sputtering target

Abstract: A sputtering target divided into respective target elements of two or more types arranged as a composite on a substrate, is disclosed. A thin sheet whose constituent material comprises one or more of the constituent materials of the target elements, and whose constituent material includes at least one metal material, is interposed between said substrate and target elements.

Description: This invention relates to a sputtering target, and in particular relates to an improvement in a composite sputtering target divided into target elements of a plurality of types arranged on a substrate. Conventionally, the sputtering technique has been widely used as a technique for forming thin films on specific substrates. Apart from thin films consisting of a single constituent, various attempts have been made to form thin films of composite constituents, such as alloys. In such sputtering techniques, use is made of a composite sputtering target, which is divided into a plurality of respective constituents (see for example, early Japanese patent publication No. SHO.59-179783, of the present applicants). Such composite sputtering targets are used for example when it is difficult to produce a target having a composition ratio that departs beforehand from the stoichiometric amounts and yet which has a uniform composition, as for example with molybdenum and silicon, or in the case where there is a large difference between the melting points or vapor pressures, making it difficult to produce an alloy target body of the prescribed composition ratio. Known forms of such composite target include disc-shaped targets formed by assembling a plurality of wedge-shaped target elements arranged alternately, or targets in the form of a rectangular plate, consisting of an alternate arrangement of strip-shaped target elements. Examples of commonly used sputtering targets that are composite targets are shown in Figures 3 to 7. As shown in Figure 3, a composite target 11 consists of two types of target elements 12 and 13 assembled alternately in mosaic form to produce an integral disc-shaped composite target. In this case, target elements 12 and 13 are respectively fan-shaped as shown in Figure 4. The composite target 11 is mechanically fixed (Figure 6) onto a copper backing plate 16 constituting the substrate by an inner retaining ring 14 and outer retaining ring 15 shown in Figure 5. The usual fixing method is clamping by means of screws. In more detail, an axial cross-section of Figure 6 is shown in Figure 7. Film deposition using a composite sputtering target as described above has the advantage that the composition ratio of the film which is formed can be altered at will altering the types of target elements and/or their combination. However, with continuing use of a conventional composite target as described above, occasionally gaps are produced between the respective target elements 12 and 13. These gaps are formed by differences in the thermal expansion that results from heating of the target during use, and the repeated thermal distortion which this causes. In particular, such gaps are mostly produced towards the end of the life of the target. This results in the problem that, when sputtering is performed, the copper backing plate, which is the substrate, is sputtered from the gaps which are thus formed, at the same time as the sputtering of the target element metal. When this occurs, it is difficult to form a thin film of stable composition ratio, and there is a bad effect on the quality of VLSI products. It is therefore an object of the present invention to provide a composite sputtering target whereby film of stable quality can be deposited over a long period. In accordance with these and other objects there is provided according to the invention a sputtering target as set out in claim 1. Figure 1 is a cross-sectional view of a sputtering target according to an embodiment of this invention. Figure 2 is a perspective view of a sputtering target according to an embodiment of this invention. Figure 3 to Figure 6 are perspective views showing the construction of prior art sputtering targets. Figure 7 is a cross-sectional view of a prior art sputtering target. The sputtering target of this invention is characterized by the interposition of a thin sheet comprising high purity Mo and of thickness 0.05 mm to 0.6 mm between the substrate and the target elements. The composite target also comprises Mo. The Mo thin sheet in this invention consists of a high-melting-point metal. For example, when a high-melting-point metal silicide film is formed, it is very advantageous if this thin sheet consists of a high-melting-point metal, since contamination due to metals such as Na, K, Cu, Fe, Ni, or Cr, which have an extremely adverse effect on the performance of VLSI gate electrodes and wiring electrodes when mixed in the high-melting-point metal silicide, can then be effectively prevented. For example, purity is preferably higher than 99.99%. Examples of other metals which may be comprised within the sputtering target of this invention as target elements include W, Nb, Ti, Ni, V, Cr, and Al, and examples of the alloys include various suitable combinations of these metals. The thickness of the thin sheet will depend on the type of composite target. A range of about 0.05 to 0.6 mm is used and about 0.1 to 0.5 mm is preferable. If the thickness of the thin sheet is less than about 0.05 mm, handling is difficult when the thin sheet is fixed between the composite target and the substrate. On the other hand, it is undesirable for the thickness to be greater than about 0.6 mm, since there is then likely to be poor adhesion between the composite target and the substrate, due to slight warping of the thin sheet, and cooling is insufficient. The relationship between the thickness of the thin sheet and the results of sputtering is shown in the following Table. Figure 1 is a cross-sectional view of sputtering target 1 according to an embodiment of this invention. In this instance, ring-shaped high purity Mo thin sheet 7 (thickness 0.4 mm) of the same area as composite target 11 shown in Figure 3 is mounted on, for example, a copper backing plate 6. Next, composite target elements 2, 3 consisting of a combination of Mo and Ta, or Mo and Si, with or without other materials, are mounted thereon. The combination of composite target elements 2 and 3 in this case should match the desired composition ratio. Sputtering target 1 according to this invention is obtained by fixing composite target elements 2 and 3 and Mo thin sheet 7 onto copper backing plate 6 using an inner retaining ring 4 and an outer retaining ring 5 in the same way as in Figure 6. In the above example, sputtering can be carried out in a stable manner over a long period without lowering of heat transmission between the composite target and substrate, or, in other words, without producing a rise in temperature of the composite target during sputtering, and an excellent deposited film is obtained, with no contamination. Figure 2 shows sputtering target 1 constituting another embodiment of this invention. In this example, the planar shape of sputtering target 1 as shown in the Figure is rectangular. This rectangular construction consists of an alternate arrangement of Mo target elements 2 and Ta target elements 3. Mo thin sheet 7 of thickness 0.2 mm is interposed between these target elements and cooling backing plate (Cu) 6 constituting the substrate. The whole assembly is fixed together by fixing jigs 8 and fixing bolts 9. In this example also, there is no risk of contamination during sputtering, since exposure of the substrate from the joints between Mo target elements 2 and Ta target elements 3 cannot occur. Also, with the target of this invention, sputtering can be carried out up to the limit of the thickness of the target, so the efficiency of utilization of the target itself is increased, and costs can be reduced. Furthermore, in this invention, by restricting the thickness of the thin sheet to a fixed range, the cooling efficiency during sputtering is increased, so abnormal sputtering can be prevented in a safe and reliable manner. In this invention, thanks to the introduction of a thin sheet comprising constituent material of the target element between the composite target element and the substrate, the deposited film that is obtained using this sputtering target is of excellent quality with no contamination. Also, sputtering can be performed in a stable manner over a long period, resulting in the benefits of improved efficiency of utilization of the target and reliability. The foregoing description and examples have been set forth merely to illustrate the invention and are not intended to be limiting and the scope of the invention is to be regarded as limited only by reference to the appended claims.

Claims: A sputtering target (1) divided into respective target elements (2,3) comprising two or more materials arranged as a composite on a substrate (6) and a thin sheet of thickness 0.05mm to 0.6mm interposed between the substrate (6) and the target elements (2,3), the thin sheet (7) comprising high purity Mo, at least one target element comprising Mo, and other target elements comprising Si or Ta. A target as claimed in claim 1 wherein the target elements constitute a composite target consisting of Mo and Ta. A target as claimed in claim 1 wherein the target elements constitute a composite target consisting of Mo and Si. A target according to claim 1 wherein the thickness of the thin Mo sheet is 0.1 to 0.55mm. A target according to claim 1 wherein the thin Mo sheet has a purity greater than 99.99%.

Inventors: FUKASAWA YOSHIHARU, ISHIHARA HIDEO, YAMAGUCHI SATOSHI, FUKASAWA, YOSHIHARU, ISHIHARA, HIDEO, YAMAGUCHI, SATOSHI, FUKASAWA, YOSHIHARU INTELLECTUAL PROPERTY DIVISION, ISHIHARA, HIDEO INTELLECTUAL PROPERTY DIVISION, YAMAGUCHI, SATOSHI INTELLECTUAL PROPERTY DIVISION
Applicants: TOSHIBA KK, KABUSHIKI KAISHA TOSHIBA
Application year: 1989
Main classification: C23C14
IPC codes: C23C14