Process for forming bipolar sinker structure

Abstract: A sinker is P which is self-aligned with the oxide isolating trench which is used to define the tub in which the complete bipolar device is located. In a preferred approach to the process for forming the sinker of this invention, an initial definition of the isolating trench only cuts the trench down to the top surface of the buried layer. The walls of the trench are doped, and the sinker diffused laterally through the sidewalls of the trench so that a sinker that is self-aligned with the isolating trench is created from the surface of the epitaxial layer in which the remainder of the bipolar device has yet to be defined down and into the buried layer. The trench is then defined for the remainder of the desired depth down through the buried layer and into the substrate layer below the buried layer. Thereafter, the device is formed in the tub preferably with the collector adjacent the trench and thereby aligned with the sinker. By following this sequence, little additional diffusion of the sinker occurs during subsequent processing, whereby an effective sinker, aligned with the collector of the bipolar device, is achieved without additional masking steps. In an alternative approach, a hole may be cut in the surface oxide to define the area where the trench will be cut, but cutting of the trench is preceded by a diffusion of the sinker through the same hole. The sinker diffuses downward through the epitaxial layer to the buried layer, and also diffuses laterally to extend somewhat beneath the oxide immediately adjacent the trench and beyond the region where the trench will be defined. The trench is then cut in a single step through the epitaxial layer and the buried layer and into the underlying substrate, cutting directly through the region in which the sinker has been previously diffused. However, because of the lateral diffusion of the sinker, a portion of the heavily doped region which shall function as the sinker remains, now self-aligned with the edges of the tub defining trench.

Description: FIELD OF THE INVENTION The present invention is related to high performance bipolar devices and more particularly a low resistance connection from the wafer surface to the buried layer, often referred to as a "sinker" in a bipolar device structure and a process for forming that sinker. CROSS-REFERENCE TO RELATED APPLICATIONS The sinker and the process for forming it disclosed in this application are especially useful in the formation of devices of the type disclosed in EP-A-0 324 580 assigned to the assignee of this invention. Details of a complete bipolar process in which this sinker and related process may be efficiently incorporated may be found in EP-A-0 337 720, also assigned to the assignee of this invention. BACKGROUND OF THE INVENTION The present trend in semiconductor technology is toward large scale of integration of devices with very high speed and low power consumption performance. The parameters that are essential to such high performance bipolar transistors include the presence of low parasitic capacitances as realized by shallow vertical junctions and small horizontal geometries. In other words it is necessary to make the devices in the integrated circuit as small as possible in both the horizontal and vertical directions. Most such high performance bipolar devices incorporate a sinker, that is a heavily doped region extending from the surface of the substrate through the top epitaxial layer down to the buried layer to provide a low resistivity connection from the N- collector of the epi-region to the low resistance N+ buried layer. The buried layer will thereafter provide the low resistance lateral contact which extends under the bipolar device. The purpose in any bipolar device is to minimize the collector resistance. In the above application, a cell design was disclosed which helped solve this problem by reducing the distance from emitter to collector to lower the lateral spacing and thereby the collector resistance. However, it is still essential to minimize the vertical resistance from the surface of the substrate where the collector is diffused to the buried layer. If it were necessary to establish a path through the epitaxial layer to the buried layer, the overall resistance would be higher. Sinkers have been used in the past for this purpose but formed in a different way and forming a different structure, and having a different doping profile than in this invention. The standard approach in the prior art is as shown in FIG 1 wherein the collector and sinker are located in a region 2 separated by an oxide isolation 4 from the emitter and base generally indicated at 6 of the bipolar device. The sinker in such a structure is formed by cutting a hole in the oxide, doing a masking step and diffusing the N+ sinker 7 from the surface. The result is a sidewise diffusion as well as a deep diffusion, resulting in the devotion of considerable area (as illustrated in FIG 1) to the collector and associated sinker. As also shown in FIG 1, the complete bipolar device is typically defined in a tub 8 edged by trenches 10, 12 which tub extends down through the epitaxial layer 14 and buried layer 16 to the substrate region 18. In the above applications, it was illustrated how to modify such a prior art approach to define the collector in the same tub as the emitter and base without the use of separating oxide regions. However, it is also desirable to efficiently incorporate a sinker in this structure to have an optimized bipolar device with minimum collector resistance. EP-A-0112489 discloses providing a substrate comprising a base layer of P-type material, a buried layer of N + -type material extending over the base layer, and an epitaxial layer of N-type material extending over the buried layer. A mask is provided on the substrate having an opening to define the location of a trench. Reactive ion etching is then performed through the opening to form the trench through the epitaxial layer and reaching the buried layer. An impurity diffusion is then performed to form an N + -type layer in the side walls and bottom surface of the trench. Then the bottom surface of the trench is further etched to extend through the buried layer to expose the P-type base layer. The N + -type layer diffused in the side walls of the trench connect the buried layer with an n + type contact region on the top surface of the substrate, while the trench forms an isolation trench. US-A-4140558 discloses a similar process. SUMMARY OF THE INVENTION It is an objective of examples of this invention to provide a self-aligned sinker which can be easily and efficiently aligned with the isolating trenches 10 and 12 which define the region wherein the bipolar device is located. It is a further objective of examples herein to provide a sinker region which has the necessary depth to extend through the epitaxial layer to the buried layer without using significant lateral space in the device, so that a very dense sinker which functions effectively to connect the collector to the buried layer is provided without significantly increasing the horizontal space which must be devoted to the bipolar device. Examples of the invention incorporate a sinker in a bipolar device without a significant increase in process complexity. The invention provides a method of forming a sinker self-aligned with an isolating trench used to define a tub in a substrate of at least one bipolar device, said substrate comprising a base layer of P-type material, a buried layer of N-type material extending over the surface of said base layer, and an epitaxial layer of N-type material extending over the surface of said buried layer, said method comprising the steps of: (a) defining on said substrate a mask having an opening at least partially overlying a region whereunder said sinker and said isolating trench are to be formed; (b) defining, through said mask opening, an N-type doped region extending from said substrate surface through said epitaxial layer and into but not through said buried layer, wherein said doped region extends further laterally in said epitaxial layer than in said underlying buried layer; and (c) etching said substrate, through said mask opening, to form said isolating trench extending through said epitaxial layer, through said buried layer, and extending into but not through said base layer; wherein said N-type doped region defined at step (b) forms a sinker that is self-aligned with said isolating trench, and wherein said isolating trench defines an isolating perimeter edge of said tub. Thereafter, the device is formed in the tub preferably with the collector adjacent the trench and thereby aligned with the sinker. By following this sequence, little additional diffusion of the sinker occurs during subsequent processing, whereby an effective sinker, aligned with the collector of the bipolar device, is achieved without additional masking steps. As shown in the previously mentioned applications, the collector or dual collectors of the bipolar device are preferably placed immediately adjacent the isolating trench. Therefore, the collector may be only a shallow junction, but is inherently immediately self-aligned with the sinker, providing a low-resistance contact, aligned with the collector, from the collector through the sinker to the buried layer to minimize the collector resistance of the device. An example of this invention is described below with reference to the following figures. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 illustrates a prior art process for sinker formation in a bipolar device process; FIGs 2A-2C illustrate the formation of a sinker aligned with the isolating trench; and FIGs 3A-3B illustrate a completed bipolar device showing the sinker aligned with the collector structure of the bipolar transistor. DESCRIPTION OF A PREFERRED EMBODIMENT The following description of preferred embodiment of the sinker and the processes for forming it is given with respect to FIGs 2 and 3. In these figures, like regions will be identified by like reference numbers. Referring first to FIG 2A, the process begins with a substrate 18 on which a uniform, unmasked buried layer of an opposite polarity type to the substrate is formed. In devices of the preferred form of the process, the substrate will be P-type material, and the buried layer an N+ type material. A uniform N- epitaxial layer 14 is then formed over the buried layer. Next, as the first step (Step A) in defining the isolating trenches which will establish the region 8 where a bipolar transistor will be formed, an oxide layer 20 is grown over the surface of the epitaxial layer. As is well known in this technology, a layer of nitride (not shown in FIG 2A) may be placed under the oxide to form the necessary stack so that selective etching of the nitride layers below this oxide to define the active device areas. A masking step is then used to define an opening or hole 22 where the trench 10, 12 will be established. Following completion of the step shown in FIG 2A, the hole 22 is first used as a masked opening for a diffusion to create a diffused region 30 which extends at least through the epitaxial layer 14 into the buried layer 16. Since the diffusion will be both vertical and lateral, although the dopant is introduced through the opening which will be used to define the trench, a portion of the dopant will extend and diffuse sideways beneath the oxide, extending laterally beyond the region where the trench or its slot 10 will be cut. Thereafter, in a single step, the trench 10 is cut through the layers 14 and 16 into the substrate 18. Because of the sideways diffusion discussed above, a sinker 26 inherently self-aligned with the isolating trench 10 has been created without additional masking. It is immediately apparent from a review of FIG 3 the formation of the sinker 26 fits in with the formation of the bipolar device as formed in accordance with the referenced application without additional masking steps, and with the collectors of the finished bipolar device being inherently and directly aligned with the sinker to provide a low resistance contact from collector to buried layer. To briefly review the steps of the device formation process, already discussed in detail in the referenced application, the next masking step is to define the field oxide 46 which will surround the bipolar device and isolate it from adjoining devices, as well as providing a support layer for connections to be formed. After this step, the active base region 50 is formed and the N+ polysilicon layer (which will form, contacts 52, 54, 56) is deposited. A thin silicide layer 57 is formed and topped with an oxide 61. The polysilicon emitter and collector contacts 50, 52, 54, 56 are then aligned and masked relative to the base 50. After this step, the spacers 60 are defined adjacent the emitter and collector. The subsequent heating steps will define the active collector 63 and emitter 64 by diffusion of the dopant from the poly 52, 54, 56 into the epitaxial layer 18. As can be seen, this diffusion step immediately brings the collector 63 into contact with the sinker 26 to provide the desired low resistance contact for the collector to the buried layer 16. The upper layer of P-doped poly 68 is then laid down and heating will define the extrinsic base regions 69 and 70, creating contact between the upper poly material and active intrinsic base 50 to complete formation of the device. In summary, the above processes provide a self-aligned, horizontally limited, heavily doped sinker which provides an effective collector to buried layer low resistance contact. Because of the sequence of processing steps used herein, the sinker can be very accurately defined, and either placed or excluded as is necessary with additional masking to meet the requirements of different device structures, or if one wishes to limit sinker only to collector contact areas. For example, as shown in FIG 3B, the sinker region 26 as seen in a top plan view is typically an annulus along the wall of the isolation slot 10 which surrounds the bipolar device shown in FIG 3A. However, the region 26 can be masked to contact only a portion of the collector contact 63. This sinker can be placed around the entire perimeter of all N- epi tubs without the use of additional masking steps (maskless sinker process). If the maskless sinker process is chosen, proper care must be taken in layout rule definition to allow sufficient space 103 for field oxide 46 to overlap the active area adjacent to base contacts 69 and 70, and emitters 64. Alternative approaches to this invention may occur to a person of skill in the art who studies this disclosure.

Claims: A method of toning a sinker (26) self-aligned with an isolating trench (10) used to define a tub in a substrate of at least one bipolar device, said substrate comprising a base layer (18) of P-type material, a buried layer (16) of N-type material extending over the surface of said base layer, and an epitaxial layer (14) of N-type material extending over the surface of said buried layer, said method comprising the steps of: (a) defining on said substrate a mask having an opening at least partially overlying a region whereunder said sinker (26) and said isolating trench (10) are to be formed; (b) defining, through said mask opening, an N-type doped region (26, 30) extending from said substrate surface through said epitaxial layer (14) and into but not through said buried layer (16), wherein said doped region extends further laterally in said epitaxial layer (14) than in said underlying buried layer (16); and (c) etching said substrate, through said mask opening, to form said isolating trench (10) extending through said epitaxial layer (14), through said buried layer (16), and extending into but not through said base layer (18); wherein said N-type doped region defined at step (b) forms a sinker (26) that is self-aligned with said isolating trench, and wherein said isolating trench defines an isolating perimeter edge of said tub. A method as claimed in claim 1, wherein said step (b) includes introducing, through said mask opening, a dopant penetrating at least into an underlying region of said buried layer. A method as claimed in any of claims 1 and 2 wherein said step (b) includes the step of causing said dopant to penetrate laterally beyond a region subsequently traversed by said isolating trench formed in said step (c). A method as claimed in any of claims 1 to 3 including the step of defining in said tub a bipolar device having a collector contact region (54, 56) that is formed adjacent said trench and at least partially overlying said sinker; wherein said sinker electrically couples said collector contact region to said buried layer. A method as claimed in claim 4, wherein said bipolar device includes first and second collector contact regions (54, 56) each formed adjacent said trench and at least partially overlying said sinker. A method as claimed in any of claims 1 to 5 wherein said step (c) includes etching said substrate to form at least one isolating trench extending through said epitaxial layer, through said buried layer, and extending into but not through said base layer, wherein said at least one isolating trench is formed other than through a said mask opening.

Inventors: BAYMAN ATIYE, POLLOCK LARRY JOSEPH, BAYMAN, ATIYE, POLLOCK, LARRY JOSEPH
Applicants: SYNERGY SEMICONDUCTOR CORP, SYNERGY SEMICONDUCTOR CORPORATION
Application year: 1989
Main classification: H01L21
IPC codes: H01L29, H01L21