SUPPLY OF CARBON DIOXIDE

Abstract: Liquid carbon dioxide is vaporised (in 2) and a stream of the resulting CO₂ gas is filtered (in 3) to remove particles therefrom. The filtered stream is reliquefied (in 4) and the thus formed liquid stream is then used, for example, to clean a 'wafer' of semi-conducting material.

Description: The present invention relates to a method of supplying liquefied CO₂ containing a reduced number of particles and also pertains to a method of removing particles or oil or the like from the surface of an object or substrate to be cleaned by the said liquefied CO₂. Liquefied CO₂ has excellent properties as a solvent and is known to be capable of readily removing particles, oil and other contaminants from an article or substrate to be cleaned. In the semiconductor industry, there is a particular need to remove substantially completely particles adhering in trace amounts to the surface of a wafer of semi-conducting material. The present inventors have found that a large number of particles are contained in commercially available 5 nine (N) high-purity liquefied CO₂ (ie liquid carbon dioxide of 99.999% purity), as shown in Table 1 below. If a wafer or the like is cleaned with dry ice snow obtained from such CO₂, particles are removed from the surface of the object of cleaning but, at the same time, particles contained in the dry ice snow are attached thereto instead. For this reason, use commercially available high purity liquefied CO₂ has been generally unsuccessful in cleaning such wafers. It has been the general practice to remove particles from liquefied CO₂ by means of a filter. Table 2 below shows the results of an experiment in which liquefied CO₂ was passed through a filter in the liquid state. As will be clear from Table 2, substantially no particles can be removed from liquefied CO₂ by means of a filter. According to the invention there is provided a method of supplying liquefied CO₂ comprising the steps of: (a) vaporising liquefied CO₂; (b) passing a stream of the resulting CO₂ gas through a filter to remove particles therefrom; (c) reliquefying the said stream of CO₂ gas by cooling; and (d) passing the reliquefied stream to a location where it is to be used. The reliquefied stream may be used to clean a substrate such as a 'wafer' for use in electronics. Using the method according to the invention, the results set out in Table 3 below have been achieved. The invention will now be described by way of example with reference to the accompanying drawing which shows a preferred form of an apparatus for carrying out the method according to the present invention. A stream of liquefied CO₂ (containing 99.999% by volume of CO₂) is supplied from a storage tank 1. The stream is passed through an evaporator 2 where it is changed into a stream of CO₂ gas which is then passed through a filter 3 where particles are removed therefrom. Thereafter, the CO₂ gas is reliquefied in a liquefier 4 and this reliquefied CO₂ gas is passed successively through a needle valve 5 and a filter 6 and then jetted out from a nozzle 7 in the form of fine dry ice snow. This dry ice snow may be blown over an object or substrate for cleaning, such as a wafer, to remove particles from the surface of the object or substrate. The piping, valve and nozzle which are installed on the downstream side of the filter 3 comprise electro or chemically polished pipe having a smooth and clean inner surface with a view to suppressing contamination of the gas with particles trapped in or between surfaces that are not suitably smooth. A commercially available CO₂ container (for either CO₂ gas or liquefied CO₂) may be used in place of the CO₂ tank 1. Examples of objects which may be effectively cleaned by the method according to the present invention include wafers, compact disks, laser disks, lenses, and so on. Generally speaking, when liquefied CO₂ is blown over the surface of an object of cleaning, such as a wafer, it is rapidly cooled by the object and thus condensed on the surface thereof, resulting in the object being wet with dew. It will take some time to dry such a wet object and there is also a possibility that the surface of the object will be contaminated by the water attached thereto. In order to avoid these problems, the substrate to be cleaned may be in position in a room or chamber filled with a N₂ atmosphere when liquefied CO₂ is blown over it. The object or substrate to be cleaned may be heated with an electric heater when liquefied CO₂ is blown over it. Both of two means may be adopted simultaneously. It is to be appreciated that conventional CO₂ storage tanks tend to be sources of particulate contamination. It is not practical to clean the inner surfaces of the CO₂ storage tank by a electropolishing method, which would be necessarily complicated, and then to wash them with ultrapure water since such a procedure adds substantially to the production cost of the container. Instead, as shown in Figure 1, the liquefier 4 may be set up on the wafer (or other substrate) cleaning site and liquefied CO₂ is directly supplied from the liquefier, and this approach is inexpensive and hence practical. The liquefier 4 can be readily fabricated of an electropolished tube. The present invention thus provides an inexpensive method for on-site supply of liquefied CO₂ whose particle content is sufficiently low to justify its use in the cleaning of chip wafers and other products that require utmost cleanliness.

Claims: A method of supplying liquefied CO₂ comprising the steps of: (a) vaporising liquefied CO₂; (b) passing a stream of the resulting CO₂ gas through a filter to remove particles therefrom; (c) reliquefying the said stream of CO₂ gas by cooling; and (d) passing the reliquefied stream to a location where it is to be used. A method according to claim 1, in which the reliquefied stream issued to clean a substrate. A method according to claim 2, wherein the stream of reliquefied CO₂ is passed out of a nozzle in the form of a jet so as to blow CO₂ gas and/or liquefied CO₂ containing dry ice snow over the surface of the substrate. A method according to claim 3, wherein the substrate is held in a nitrogen atmosphere. A method according to claim 3 or claim 4, wherein the substrate is heated. A method of supplying liquefied CO₂, inlcuding filtering a stream of gaseous carbon dioxide to remove particles therefrom, liquefying the filtered stream, and passing the resulting liquefied stream to a location where is to be used. A method according to claim 6, in which the liquefied stream is used to clean a surface of a substrate.

Inventors: KOZO, MORIYA, OHKATSU, TADASHI
Applicants: OSAKA SANSO KOGYO LIMITED
Application year: 1989
Main classification: F17C7
IPC codes: H01L21, B08B7, B08B5, F17C7