ELECTROPLATING BATH AND PROCESS FOR DEPOSITING FUNCTIONAL CHROMIUM

Abstract: Bright and smooth functional chromium is deposited using a plating bath containing chromic acid, 40-150 g/l sulfoacetic acid, an iodine-releasing agent e.g. - iodate, and a nitrogen organic compound e.g. glycine as a depolariser. The bath is otherwise free of carboxylic acids, fluoride, bromide and selenium ions. The process can be operated at conventional plating current densities e.g. 1-10 asi:.

Description: This invention relates to electrodeposited layers, and, more particularly, to functional, electrodeposited chromium layers having good performance properties, and to chromium plating baths and methods for forming such useful chromium electrodeposits. Hexavalent chromium plating baths are described in U.S. Patents 2,750,337; 3,310,480; 3,311,548; 3,745,097; 3,654,101; 4,234,396; 4,406,756; 4,450,050; 4,472,249; and 4,588,481. These baths generally are intended for "decorative" chromium plating or for "functional" (hard) chromium electrodeposition. Decorative chromium plating baths are concerned with deposition over a wide plating range so that articles of irregular shape can be completely covered. Functional chromium plating, on the other hand, is designed for regularly shaped articles, where plating at a high current efficiency and at high current densities is of particular importance. Functional hexavalent chromium plating baths containing chromic acid and sulfate as a catalyst generally permit the deposition of chromium onto a basis metal substrate at cathode efficienties of about 12% to 16% at current densities of about 15.5 to 93 A/dm² (1 to 6 asi). Mixed catalyst chromic acid plating baths containing both sulfate and fluoride ions generally allow for chromium plating at higher cathode efficiencies, e.g. at 22% to 26%, and at higher rates. However, the presence of fluoride ion in such baths causes etching of ferrous based metal substrates. Other chromium plating baths which use iodide, bromide or chloride ions as additives can operate at even high current efficiencies, but these baths produce chromium deposits which do not adhere well to the substrate, and which are dull in appearance, or at best only semi-bright. For example, Chessin, in U.S. 4,472,249, describes a high energy efficient functional chromium electroplating bath which operates at very high current efficiencies, e.g. about 50%. This bath generally consists of chromic acid, sulfate, iodide, and a carboxylate; it is used a conventional current densities, e.g. between about 15.5 and 93 A/dm² (1 and 6 asi) Unfortunately, this bath has adherence problems, and provides only a semi-bright deposit. Chessin and Newby, in U.S. 4,588,481, describes a method for producing non-iridescent, adherent, bright chromium deposits at high efficiencies without low current density etching. This method involves plating at a temperature of 45°-70°C from a functional chromium plating bath consisting essentially of chromic acid and sulfate, and a non-substituted alkyl sulfonic acid having a ratio of S/C of >1/3, in the absence of a carboxylic or dicarboxylic acid. The problem addressed herein is to provide a novel plating bath and process enabling chromium electrodeposits which are adherent, bright, smooth, hard, and which can be formed at high efficiencies and operate within useful current densities. In accordance with the above objects of the invention, there is provided herein a chromium plating bath for deposition of bright, smooth, functional chromium at conventional plating current densities, consisting essentially of chromic acid, sulfoacetic acid in a concentration range of 40g/l to 150g/l, an iodine-releasing agent e.g. iodate, and a nitrogen organic compound as a depolarizer. In another aspect, the invention provides a hard chromium plating process comprising electrodepositing onto a basis metal from a bath as defined. Bright, smooth electrodeposits can be obtained. The operating current density is generally within the range 15.5-155 A/dm² (1-10asi). The plating bath is preferably substantially free of deleterious carboxylic acids, fluoride ion, bromide ion, and selenium ion. A typical functional chromium electroplating bath embodying the invention has the following constituents present. The current efficiencies obtained using the plating bath compositions described herein may be at least 20%, e.g. about 21%. A typical chromium electrodeposit formed on a basis metal, e.g. steel, from an electroplating bath as described, under the conditions described above, had the following physical properties, chemical composition and performance characteristics. Typical nitrogen organic compounds for use in the chromium electroplating bath include: glycine nicotinic acid isonicotinic acid pyridine 2-aminopyridine 3-chloropyridine picolinic acid guanine guanidine acetic acid adenine The nitrogen organic compound in the chromium electroplating bath functions as a depolarizer in the electroplating process. Embodiments of the invention are described in the following Examples. Example 1 A chromium electroplating bath was prepared having the following composition. Chromium was plated from this bath onto a nickel-plated steel mandrel at 46 A/dm² (3 asi), at 55° for 10 min., to produce a bright, smooth, adherent chromium layer thereon having a thickness of 13 µm (0.5 mils). The current efficiency was 20%. The chromium electrodeposit had the physical and performance properties given in Table II above. The hardness value KN₁₀₀ was 1350. Example 2 A chromium electroplating bath was prepared having the following composition. Chromic Acid 250 g/l Sulfoacetic acid 80 g/l Iodate 3 g/l Sulfate 2 g/l Glycine 5 g/l Chromium was plated from this bath onto a stainless steel mandrel 31 A/dm² (2 asi), at 60°C for 30 min. to produce a chromium layer thereon having a thickness of 25 µm (1.0 mils). The current efficiency was 22%. The chromium electrodeposit had the physical and performance properties given in Table II above. The hardness value KN₁₀₀ was 1300. Example 3 The chromium plating bath had the following composition: Chromic acid 225 g/l Sulfoacetic acid 60 g/l Iodate 2 g/l Sulfate 2.0 g/l Picolinic acid 10 g/l Chromium was plated onto a steel mandrel at 77.5 A/dm² (5 asi) at 60°C. for 60 minutes to produce a chromium layer having a thickness of 51µm (2.0 mils). The current efficiency was 20%. The physical properties and chemical composition of the chromium electrodeposit were similar to those given in Table II above. The hardness value KN₁₀₀ was 1325.

Claims: A functional chromium plating bath consisting essentially of chromic acid, 40-150 g/l of sulfoacetic acid, an iodine releasing-agent, and a nitrogen organic compound as a depolariser. A bath according to claim 1 wherein the iodine-releasing agent is iodate. A bath according to claim 1 or claim 2 substantially free of other carboxylic acids, fluoride ion, bromide ion, and selenium ion. A bath according to claim 1, 2 or 3 wherein chromic acid is present in an amount of 150 g/l to 450 g/l. A bath acording to any one of claims 1 to 4 wherein sulfoacetic acid is present in an amount of 80-120 g/l. A bath according to any one of claims 1 to 4 wherein sulfoacetic acid is provided by the presence of sulfoacetate, isethionic acid or isethionate. A bath according to any one of the preceding claims wherein said bath also includes sulfate in an amount up to 4.5 g/l. A bath according to any one of the preceding claims wherein said nitrogen organic compound is present in an amount of 1-40 g/l. A bath according to any one of the preceding claims wherein said nitrogen organic compound is glycine, nicotinic acid, isonicotinic acid, pyridine, 2-aminopyridine, picolinic acid, 3-chloropyridine, guanine, guanidine acetic acid, or adenine. A bath according to claim 9 wherein said nitrogen organic compound is glycine. A hard chromium plating process electroplating a functional chromium layer onto a basis metal, which comprises electrodepositing from an electroplating bath according to any one of claims 1 to 10. A process according to claim 11 wherein said electrodepositing is carried out at a temperature of 50°-70°C. A process according to claim 11 or claim 12 wherein the thickness of said electrodeposited chromium layer is at least 2.5µm (0.1 mil). A process according to claim 13 wherein the thickness of said electrodeposited chromium layer is 2.5 to 51µm (0.1 - 2 mils). A process according to any one of claims 11 to 14 wherein electrodeposition is carried out at a plating density of 15.5-155 A/dm² (1-10 asi). A process according to any one of claims 11 to 15 wherein the current efficiency is at least 20%.

Inventors: MARTYAK, NICHOLAS M.
Applicants: ATOCHEM NORTH AMERICA, INC.
Application year: 1989
Main classification: C25D3
IPC codes: C25D3