Apparatus for processing light-sensitive material

Abstract: A photosensitive material developer for developing a photosensitive material, comprising; a processor for developing the photosensitive material with a developer in a developer tank which is filled with the developer so that the developer is insulated from air.

Description: Background of the Invention The present invention relates to an apparatus for developing light-sensitive materials comprising the features of the preamble of claim 1; particularly to the technology for providing a compact developing apparatus in which the developing solution in a small sized developing tank is substantially kept hermetically from outside air, in order to prevent oxidation and evaporation of the developing solution. Processing apparatuses of a conventional type have processing tanks in the form of an open top bucket. It has been impossible to overcome the problem that when there are small cracks or gaps on the side or the bottom of the processing tank, processing solution spills out through them. And, it has been impossible to tightly close the opening in the upper portion of the processing tank where light-sensitive materials pass. Therefore, the floating cover was placed on the surface of the processing tank, or a certain kind of gas which is inert on the processing solution was filled in the upper portion of the processing tank, or a certain kind of floating materials which is endurable against the processing solution floated thereon for the purpose of reducing the area of the surface of the processing solution. But, the oxidation by air or the evaporation of the processing solution could not be prevented. So, the level of processing characteristics for light-sensitive materials is very difficult to be kept stable. Especially, in the photo-finishing laboratory (shop) where color photographic processing is small in quantity, the control of the processing solution stability seems to be almost impossible to conduct. The solving method to decrease the area where processing solutions, in the processing tank, contact to the air is only effective for the decrease of the rate of the deterioration by oxidation or evaporation of the developer. It cannot prevent the deterioration or evaporation of the developer effectively or completely. Especially in case that the operation rate of the light-sensitive material processing apparatus is extremely low, it is supremely important to prevent the deterioration or evaporation of the processing solution so as to maintain the level of color photographic developing quality stable or to decrease the operation cost of the processing apparatus. Moreover, in case of conventional type of the open top processing tank, at the contact point between the wall of the tank and the processing solution, the processing solution is warped up. So, as the area of the liquid contacting air in this portion is increased and therefore the oxidation begins to contaminate the processing tank, the oxidized solid portion falls into the processing solution. This becomes one of the causes of trouble in processing. Therefore, we studied various methods of solving this problem. If a photosensitive material can be fed directly into the processing solution under the condition that, the processing tank is hermetically kept and fully filled with the processing solution, expelling the air inside the processing tank completely, contact between air and the processing solution in the tank cannot happen, resulting in effective prevention of deterioration by oxidation or evaporation. In the above-mentioned method, however, the important technical theme is how to feed the photosensitive material directly into the processing solution without leakage of the processing solution from the processing tank having thereon an inlet for a light-sensitive material. The present invention was devised from the above-mentioned viewpoint. A film processing apparatus as a self contained unit comprising the features of the preamble of claim 1 is known from US-A-4 342 479. In this apparatus oxidizable chemicals (the developer) contained in the processing chambers are insulated from air by an inert atmosphere or a layer of nitrogen above the chemicals in the reservoir to prevent oxidation. The object of the present invention is to provide a light-sensitive material processing apparatus in which deterioration by oxidation and evaporation of the processing solution in the processing tank are prevented and a light-sensitive material can be fed directly into the processing solution without leakage. Summary of the Invention The light-sensitive material processing apparatus in the present invention has a superiority, for solving the above-mentioned problem, to have at least one processing tank kept hermetically and to feed light-sensitive materials into the processing tank where the processing solution in the tank is intercepted and isolated from air outside, for processing. The processing tank has a valve device, gap and so on by which light-sensitive materials can be fed, and through which the processing solution does not leak substantially. The processing tank, where the procesing solution is intercepted and isolated from the air outside of it substantially, has at least one pair of valve devices, by which light-sensitive materials can be passed through in and out. It is so arranged that the light-sensitive materials are passed and conveyed through the valve device into the processing tank. By this device, the inside of the processing tank can be in contact with the air outside of it through the valve device. It is also allowed to use a flexible material for the valve device so that the gap is generated when the light-sensitive materials pass and that the processing tank may be kept hermetically for no leakage of the processing solution when no light-sensitive material passes. In the latter case, it may be good to provide rollers and so on in order to convey light-sensitive materials inside of the processing tank and/or in the intermediate room provided according to the necessity between the processing tanks. To the processing tank which is kept hermetically as mentioned above, a valve device which enables light-sensitive materials to be inserted into and ejected from the processing tank can be provided. Besides, a water tank which gives to the valve device hydraulic pressure which is equal to fluid pressure of the processing solution can be provided to keep the processing tank substantially hermetically. Besides, the transport mechanism that transports a light-sensitive material can be provided in the processing tank. Further, it is possible to provide a means to eject compulsorily the processing solution in the processing tank kept substantially hermetically by replenishing the replenisher through the replenisher supplying inlet on the processing tank. By washing successively or intermittently the outside of at least one of the light-sensitive material feeding or ejecting devices provided on the processing tank, it is possible to prevent the oxidation by air or the hardening by evaporation on the device. In case that the processing tanks are arranged successively, water, fluid paraffin and inert gas may be filled in the midway room which is formed by the entering and exiting devices between each processing tank, for the purpose of preventing the oxidation by air or the hardening by evaporation on aforesaid devices. By providing the mechanism for releasing the hermetical condition of the processing tank which is substantially hermetical against the air outside of it, it is possible to realize smooth exhaustion of processing solution when supplying of the processing solution to the processing tank at the start of the operation or on occasion of maintenance. Moreover, it is possible to provide a guide in the processing tank for the smooth feeding of light-sensitive materials or to provide the circulation system of the processing solution for enhancing the agitating effect by jetting processing solution to light-sensitive material in the processing tank, for enhancing the temperature control effect, and for eliminating impurities in the processing solution by the method of filtrating and so on. In this light-sensitive processing apparatus, the processing tank is isolated from the air ouside of it, and the processing solution has no contact face with air. Therefore, the processing solution cannot contact the air, which results in that the deterioration by oxidation and evaporation of the processing solution can be prevented in the processing tank. The stability of the processing solution in the processing tank can be enhanced extremely. So, the processing apparatus can be made small and, at the same time, the maintenance of the processing apparatus can be simplified. Moreover, even when the processing solution becomes decreased after the processing of light-sensitive material, the solution can be kept uncontacted with air by the replenishment of the processing solution or by using flexible materials for the processing tank to decrease the volume of the processing tank. The side wall of the processing tank has at least one valve device to seal the wall of the processing tank. Moreover, the light-sensitive material can be fed into and ejected directly from the processing solution from the side wall of the processing tank through this device, at the same time the processing tank is kept hermetically from the air outside of it. Thus, the sealing capacity can be kept well, so the leakage of liquid which takes place when a light-sensitive material is conveyed into the processing tank or ejected out from it can be reduced. Thus, in case that not only at least one valve device forms a part of the wall of the processing tank but also the roller structure forms feeding-in and ejecting-out mechanism, they have a light-sensitive material feeding function. So, it is not necessary to provide complicated roller mechanism or guide mechanism for the feeding of light-sensitive material into the processing tank as conventionally. When the valve device is provided to the processing tank which is kept hermetically so that the light-sensitive materials can be fed-in and ejected-out, the isolation can become easy. Moreover, it is possible to provide the water tank that has hydraulic pressure which is equal to fluid pressure of the solution. Due to this, leakage of solution when the light-sensitive material passes through the valve device can be prevented. And, by the conveying mechanism provided in the processing tank, the light-sensitive material in the processing tank can be fed without leakage. Besides, by supplying a replenisher compulsorily with a use of pump and so on from the replenisher supplying inlet provided in the processing tank which is being isolated from the air outside of it substantially, the processing solution in the processing tank can be exhausted out of the processing tank through a narrow gap surrounding the valve device. In this case, washing effect occurs. The processing solution exhausted out of the processing tank stays in the exhausted solution tank as waste liquid. Moreover, to this isolated developing tank, the circulation system can be provided, for agitating and controlling temperature of the processing solution in the processing tank, to achieve stable processing. It is desirable, from the standpoint of preventing the damage of the surface of the light-sensitive material, to provide a filtrating device which is kept hermetically to the air outside of it in the route of the circulation system so as to exhaust unsolvable impurities which accumulated in the processing solution. In the temperature conditioning of the processing solution, it is not preferable to use a heater of relatively high capacity when the quantity of circulated solution is small because the hunting of the temperature becomes critical. On the contrary, when small capacity of heater is used for the circulating solution quantity to be big, the hunting is too small to realize a good control. But, in this case, the circulating solution quantity is so big that the fluctuation of power for pump and of the pressure in the processing tank is generated, which is not be considered a good method from the viewpoint of stable processing. We tested the relation between the heat load quantity (=heater output/the quantity of circulating solution) and the range of controlled temperature. The result is shown in Figure-35. The guide parts which convey light-sensitive materials are provided in the processing tank. It realizes smooth conveyance of light-sensitive material. Besides, by providing open-holes to it from where the developer blows out to light-sensitive material, uneavenness becomes decreased during the processing of the light-sensitive material. At the same time, as the light-sensitive material is fed in floating from the guide material, it is prevented that light-sensitive material receive a scratch on the face or it generates a jamming during the guide part. We did various tests to know the relation between the hole opening ratio of the guide material and developing uneavenness, and between the speed of the solution to be splashed and the developing uneavenness. The results are shown in Table-1 and Table-2. According to the results, the hole opening ratio of the guide material is necessary to be not less than 15%, more preferably not less than 20%, and the speed of the solution to be splashed to the light-sensitive material is necessary to be not less than 1.0 cm/sec., more preferably not less than 1.5 cm/sec. The processing tank is provided with a mechanism for releasing hermetic condition and opening the tank to air outside of it for filling or discharging processing solution. The processing solution in the processing tank is in contact with air ouside of it through the valve device, and, by feeding light-sensitive material, a part of the processing solution is leaked. For the prevention of the air oxidizing of the processing solution in this point, the surface of the valve device is washed with water successively or intermittently. Besides, it is possible to have a structure to fill water, fluid paraffin, inert gas and so on, that have no influence on the processing into the midway room between processing tanks so that air oxidation, evaporation and so on cannot happen. Figure-1 shows the general form of the light-sensitive material processing apparatus which uses principal roller structure. Also, Figure-2 shows the installation of the roller structure to the processing tank and the conveying of the light-sensitive material. Further, Figure-3 shows the arrangement in the processing tank, though they are not limited only to this arrangement. In case of color film processing, what is important is the stability of temperature for processing. For this method, normally, a heater is inserted into the processing tank, and the processing solution is agitated or circulated with the circulation pump in the processing tank of the present invention, the processing solution may be circulated with the pump, but the heater can be built in the guide in the processing tank as shown in Figure-28. Also. the heater can be built in the processing tank as shown in Figure-29 and Figure-30. Agitating of the solution in the processing tank can be done in the processing tank as shown in Figure-31 and Figure-33. Besides, as shown in Figure-32, light-sensitive material itself can vibrates fin-type agitating plate which is set in the guide so as to make the agitation of the processing solution at the time of the feeding of light-sensitive material. For the decreasing of the variation range of temperature, it is possible to take the following measure: a heater of the big capacity is set outside of the processing tank, a heater of small capacity is set inside the processing tank, with which temperature is increased by the outer heater, and the adjustment of the temperature is done by the inner heater. Brief Description of the Drawings Figure-1 shows a general drawing of a light-sensitive material processing apparatus to which the present invention is applied. Figure-2 shows a schematic diagram of the development processing part, Figure-3 shows the front view of the developing tank. Figure-4 shows a cross sectional view taken on line IV-IV of Figure-3, Figure-5 is a right side view of Figure-4, Figure-6 is a plan view of the sealing member, Figure-7 is a cross sectional view taken on line VII-VII of Figure-6, Figure-8 - Figure-11 are front views of the other examples of the roller seal, Figure-12 and Figure-13 are cross sectional views of the roller, Figure-14 is an enlarged cross sectional view of the roller seal section, Figure-15 is a right side view of Figure-14, Figure-16 is an enlarged cross sectional view of another example of the roller seal section, Figure-17 is a plan view of the guide, Figure-18 is a front view of the guide, Figure-19 is a cross sectional view taken on line drawing of XIX - XIX of Figure-17, Figure-20 and Figure-21 represent a top view of another example of the guide, Figure 22 and Figure-23 show the supplying part and the draining part of the circulating system of the developing tank in which Figure-22 is their side view and Figure-23 is their bottom view, Figure-24 is a cross sectional view of another example of the developing tank, from (a) to (e) of Figure-25 shows a structure of a basic roller composition, from (a) to (h) of Figure-26 shows the installation of valve mechanism to the processing tank and the feeding of light-sensitive materials, Figure-27, from (a) to (g) show the arrangement of the processing tanks and the feeding of light-sensitive material, from Figs-28 - 30 are other examples of the temperature adjustment of the processing solution, From Figs-31 - 33 show agitation in the processing tank, Figure-34 shows a plan view of the guide used in the examination, Figure-35 shows the relationship between the range of controlled temperature and the heat load, Figure-36 is a sectional view showing another example of light-sensitive material processing apparatus, Figure-37 shows an installation condition of the replenisher tank on the processing tank, Figure-38 and Figure-39 show cross sectional views of valve device, Figure-40, from (a) to (d) show preparation of valve device, Figure-41 is a plan view of the guide and Figure-42 is a right side view of Figure-41. Detailed Description of the Invention Examples of the invention will be explained in detail, referring to the drawings attached. Fig. 1 is a schematic diagram showing an apparatus for processing light-sensitive materials to which the present invention is applied. In Fig. 1, the numeral 1 represents an apparatus main body provided with a light-shielding device that intercepts external light so that it may not enter the apparatus. Apparatus main body 1 is provided with inlet 2 on one side of the apparatus and outlet 3 on the other side thereof, both for light-sensitive materials. Between inlet 2 and outlet 3, there are provided in sequence from the side of inlet 2, washing section 4, developing tank 5, washing section 6, fixing tank 7, washing section 8, washing tank 9 and washing section 10. Developing tank 5, fixing tank 7 and washing tank 9 hermetically contain developer, fixer and washing water, respectively. These processing tanks are provided with replenisher containers 11, 12 and 13 which are connected to the tops of processing tanks through pipes 14, 15 and 16, respectively and a liquid-level of each processing tank is formed in each of replenisher containers 11, 12 and 13, pipes 14, 15 and 16 are connected to air pipe 17 that leads to outside air, and a hermetical condition in each tank is released when air is taken therein through valve 18 when it is opened. On each partitioning wall separating washing section 4, developing tank 5, washing section 6, fixing tank 7, washing section 8, washing tank 9 and washing section 10 respectively, there are provided a pair of rollers, upper roller 19 and lower roller 20, arranged with a clearance between them which substantially prevents a leakage of liquid therethrough and still allows a light-sensitive material to pass therethrough. Though there are slight gaps between rollers or between the wall of an apparatus main body and the rollers, it may be taken that liquid leakage is substantially prevented because the processing tanks are under hermetical conditions. Due to the rotation of rollers 19 and 20, a light-sensitive material fed into inlet 2 is transported through washing section 4, developing tank 5, washing section 6, fixing tank 7, washing section 8, washing tank 9 and washing section 10 in succession, and taken out from outlet 3 in a processed state. Developing tank 5, fixing tank 7 and washing tank 9 are kept hermetically. Therefore, processing solutions neither leak nor contact air in processing tanks, resulting in the prevention of deterioration of processing solutions caused by oxidation and evaporization thereof. Therefore, contamination in the shape of tar caused by oxidation does not take place in a processing tank. Further, the roller device composed of rollers 19 and 20 which are arranged close enough to each other to form a seal but are able to rotate, allows a light-sensitive material to be fed into a processing tank through the rollers by their rotation. In addition, each processing tank is kept hermetically, and thereby liquid leakage from rollers 19 and 20 which is most likely on the occasion of insertion and ejection of a light-sensitive material is substantially prevented. For the replacement of processing solutions, when valve 18 is opened for connection to outside air, each processing tank is released from its hermetic condition and waste solutions are discharged from the clearance between rollers 19 and 20 into washing sections 4, 6, 8 and 10, and are finally discharged from pipe 22 when valve 21 is opened. It is not necessary to provide a special device for transporting a light-sensitive material because rollers 19 and 20 are kept hermetically and thereby can keep processing solutions as a part of a wall of a processing tank, and further transport a light-sensitive material when they rotate. On each of developing tank 5, fixing tank 7 and washing tank 9, there are provided guides 23 which face each other at a predetermined distance, and these guides form a transport path that smoothly transports the light-sensitive material into the processing tanks, with its emulsion side facing downward. Though there are no restrictions as to whether the emulsion side faces downward or upward, it is desirable that jets of processing solutions may be directed onto the emulsion side. Further, when processing solutions in a processing tank are stirred sufficiently due to the circulation of processing solutions, the emulsion side may face upward where no inlet for the circulation of processing solutions is provided. Guide 23 is provided with apertures which will be described later, and a light-sensitive material is splashed with processing solutions coming from these apertures when circulation system 24 is driven, and thereby is transported. It is desirable that guide 23 is provided with apertures that are not less than 15%, more preferably not less than 20% of the guide in terms of area, and through these apertures, processing solutions are directed onto a light-sensitive material at a speed of 1.0 cm/sec or more, or more preferably of 1.5 cm/sec or more. Owing to the jets of processing solution, contact resistance between a light-sensitive material and guide 23 forming a transport path is lightened and the stirring of processing solutions is improved, resulting in the prevention of streaks caused by uneven processing. The width of a transport path formed by guide 23 is set to the value equivalent to the width of a light-sensitive material plus about 5 mm, and thereby the light-sensitive material is prevented from being jammed. Further, when jets of processing solutions are directed with an angle in the transport direction, the light-sensitive material is transported smoothly by the flow of processing solutions. Further, it is possible to reduce the resistance caused by friction between the light-sensitive material and guide 23 by providing a streak pattern forward the conveyance direction on the surface of guide 23 facing the light-sensitive material. Circulation system 24 provided on each of developing tank 5, fixing tank 7 and washing tank 9 is composed of circulation pump 25, heater 26 and filter 31, and it circulates processing solutions in each of the processing tanks which are kept hermetically, homogenizes the composition of processing solutions in developing tank 5 and fixing tank 7, and it may remove sediment and foreign materials in each of the processing solutions while keeping the temperature thereof constant. For washing tank 9, it may further adjust temperature for washing and may stir washing water for efficient washing. As far as the time required for processing is concerned, each of developing processing, fixing processing and washing processing requires, for example, 30 seconds and less. Injection nozzle 27 is provided on each of washing sections 4, 6, 8 and 10 which are connected, through pipe 28, to washing water tank 29, which supplies water to each of washing sections 4, 6, 8 and 10 by means of washing water pump 30. There is no particular restriction for supplying washing water, and it is possible to wash by means of a jet from injection nozzle 27 toward rollers 19 and 20 when processing is finished or during the stand-by period before processing. It is further possible to cause washing sections 4, 6, 8 and 10 to be jetted constantly by washing water so that rollers 19 and 20 may be washed constantly during the processing period. Further, it is possible to keep the intermediate chamber portion of each of washing sections 4, 6, 8 and 10 to be filled with washing water so that rollers may be washed continuously. Figs. 2 - 23 show an apparatus for processing light-sensitive materials which is more concrete, Fig. 2 is a schematic diagram of a developing section, Fig. 3 is a front view of a developing tank, Fig. 4 shows a sectional view taken on line IV - IV in Fig. 3, Fig. 5 is a right side view of Fig. 4, Fig. 6 is a top view of a sealing member, Fig. 7 is a sectional view taken on line VII - VII in Fig. 6, Figs. 8 - 11 show sectional views of other examples for a sealing member, Figs. 12 and 13 show a sectional view of a roller, Fig. 14 is an enlarged sectional view of a roller sealing portion, Fig. 15 is a right side view of Fig. 14, Fig. 16 is an enlarged sectional view of another example of a roller sealing portion, Fig. 17 is a top view of a guide, Fig. 18 is a front view of a guide, Fig. 19 is a sectional view taken on line XIX - XIX in Fig. 17, Figs. 20 and 21 show other top views of a guide, and Figs. 22 and 23 show a supplying portion and an ejecting portion for a circulation system of a developing tank in which Fig. 22 shows a side view thereof and Fig. 23 shows a bottom view thereof. The developing section will be explained in the present example. The fixing section and the washing section are the same as the developing section in terms of constitution. For the connection between replenisher tank 11 of developing tank 5 and pipe 14, stopper portion 11a of replenisher tank 11 is arranged, as shown in Fig. 2, so that it may be pierced by holding portion 41 which is connected to pipe 14 provided on rest 40 and has a sharp tip, which prevents liquid leakage. Further, it is possible to locate replenisher tank 11 under the processing tank for the forced supply of replenisher by means of a pump, without connecting in the aforesaid way. The developer in replenisher tank 11 is supplied to developing tank 5 from supplier section 14a through pipe 14. Replenisher tank 11 can easily be attached to or detached from holding portion 41, resulting in simple replacement work. Developing solution is supplied to developing tank 5 from pipe 14 through supply section 14a, and detection sensor 42 that detects the remaining amount of processing solution in replenisher tank 11 is provided on mounting section 41 for pipe 14 and, the detection sensor 42, when it operates, indicates when replenisher tank 11 should be replaced. Further, air pipe 17 that leads to outside air is connected to the mounting section 41 for pipe 14 and the air pipe 17 is provided with valve 18 which keeps, when it is closed, developing tank 5 hermetically. On the occasion of the replacement of developer in developing tank 5, when valve 18 is opened, the atmospheric pressure causes the developer to be discharged from the portion on developing tank 5 where rollers 19 and 20 are provided. The replacement of solution is completed when the valve 18 is closed for keeping developing tank 5 hermetically, fresh developer is supplied therein and replenisher tank 11 is set. In the replenisher tank 11, only the top portion of the solution therein is oxidized, which causes no oxidized developer to flow into developing tank 5. Further, when it is arranged that the replenisher tank is filled with inert gas, without contacting outside air, it is possible to prevent the oxidation of developer in replenisher tank 11. When a flexible material is used for the replenisher tank, such as a polyethylene container, it is possible to feed developer into developing tank 5 simply through a valve, instead of causing the replenisher tank to contact outside air. Upper wall 51 and lower wall 52 of developing tank 5 are arranged in parallel to be adjacent each other, and between upper wall 51 and lower wall 52, there are provided rear wall 53 and middle wall 54 as shown in Figs. 4 and 5 and front wall 55 is further provided in the vicinity of middle wall 54. On the front side where the driving mechanism for rollers is provided, there is allocated a further space which forms a double structure for the prevention of liquid leakage. Each of the partition walls separating developing tank 5 and washing sections 4 and 6 provided at the front and the rear of developing tank 5 respectively are formed with rollers 19 and 20. Namely, each inside of upper wall 51 and lower wall 52 is provided with sealing member 56 as shown in Fig. 2 so that both sealing members face each other. The sealing member 56 is provided with a spherical concave 56a and the spherical concave and rollers 19 and 20 are installed in a condition whereby liquid leakage is prevented and yet rollers 19 and 20 can rotate. Sealing member 56 may be formed so that it may have convex stripe 56b whose sectional view is of a semicircle shape as shown in Figs. 3 - 7. In this case, sealing member 6 is fixed on the inside surface of each of upper wall 51 and lower wall 52 by means of screws 57 and screw holes 56c, and a pair of rollers 19 and 20 are arranged between convex stripes 56b so that they may contact convex stripes with pressure. Shown in Fig. 8 is a sealing member, thin plate 80, made of an elastic material which is held against rollers 19 and 20 through protrusions 51a and 52a formed inside of upper wall 51 and lower wall 52, thus preventing liquid leakage between rollers and the apparatus main body. The thin plate 80 is kept in contact with a roller by pressure, preventing liquid leakage between the apparatus main body and rollers. Thin plate 80 may be made of any material if the material is sufficiently elastic and resistant against processing solutions. In the example, a pair of rollers are sealed with one plate, but one roller may naturally be sealed with one plate. Further, in addition to the above, various sealing methods are available including one wherein a pair of rollers 19 and 20 are supported with supporting members 81 - 83 as shown in Figs. 9 - 11. Each of rollers 19 and 20 is composed, as shown in Figs. 12 and 13, of shaft portion 19a or 20a and roller portion 19b or 20b provided round the shaft portion, as well as end roller portion 19c or 20c, which has a slightly smaller diameter and is provided at the end of the roller portion, to form a double-step structure. Each of end roller portions 19c and 20c of rollers 19 and 20 is set to be higher than each of roller portions 19b and 20b in terms of hardness, exemplifying that each of roller portions 19b and 20b is made of a soft material and each of end roller portions 19c and 20c is made of a harder material than that of the material of roller portions 19b and 20b. Owing to this arrangement, roller portions 19b and 20b are deformed elastically to press end roller portions 19c and 20c with pressure, causing rollers 19 and 20 to be aligned and positioned in parallel with each other. A side wall sealed with upper and lower sealing members 56 and a pair of rollers 19 and 20 is thus formed. A sealing arrangement is made so that no liquid leakage may take place between both end portions of end roller portions 19c and 20c of pair of rollers 19 and 20 and rear wall 53 as well as middle wall 54 and yet both rollers 19 and 20 may rotate. Even if the hardness of material for both roller portions 19b and 20b is the same as that of material for both end roller portions 19c and 20C, there naturally is no problem regarding the sealing function. The material for roller portions 19b and 20b of rollers 19 and 20 is not limited to rubber, but any material may be used if the material has its sealing properties, flexibility so as not to damage the surface of a light-sensitive material when it passes through the rollers and is not corroded by the developer. Besides rubber, polyester, organic high polymer material, felt material, textile and others, for example, may be used. It is preferable that roller portions 19b and 20b are made of material which is slightly water-repellent, so that a light-sensitive material can pass through the roller portions smoothly without being scratched on its surface. The material of end roller portions 19c and 20c of rollers 19 and 20 is not limited to rubber but it is possible to use material which is identical to that for roller portions 19b and 20b. Lower roller 19 of each pair of rollers 19 and 20 located between washing section 4 and developing tank 5 and between developing tank 5 and washing section 6 is positioned rotatably with its end 19d supported in bearing 58 buried in rear wall 53 without protruding therefrom as shown in Fig. 4. The other end 19e of the roller 19 is supported by bearing 59 mounted in front wall 55, across middle wall 54 and front wall 55. Between shaft portion 19a of roller 19 and middle wall 54, two O-rings 60 are positioned in recessed portion 54a in middle wall 54. These two O-rings 60 are compressed, for sealing, by holder 61 which is screwed in shaft portion 19a when the holder 61 is turned and moved. On the flange portion 61a of holder 61, there are formed four cutouts 61b at four locations which are used for turning holder 61 by means of a tool. As shown in Fig. 16, holder 84 may also be fixed to middle wall 54 for sealing by means of set screws 85. Gear 62 is provided at the tip of roller 19 and this gear 62 is engaged with gear 64 attached to driving shaft 63, and roller 19 is rotated by the rotation of driving shaft 63 that is driven by a motor which is not shown. The rotation of the lower roller 19 causes the roller 20, arranged in opposition, over the lower roller 19 to rotate, thus a light-sensitive material is transported through both rollers. Shaft portion 20a of upper roller 20 is held rotatably with its both ends 20d and 20e supported in bearings 65 and 66 installed in rear wall 53 and middle wall 54, respectively and it is sealed so that no liquid leakage may take place. In developing tank 5, guides 23 arranged vertically form a transport path for a light-sensitive material which causes a light-sensitive material to be transported smoothly in developing tank 5 kept hermetically. As shown in Figs. 17 - 19, guide 23 is provided with screw holes 23a formed on the side of the guide, and is fixed on both rear wall 53 and middle wall 54 of developing tank 5 by means of unillustrated screws. On guide 23, there are formed slits 23b in the direction of transport of a light-sensitive material at regular intervals, and owing to slits 23b, the area of contact between the guide and a light-sensitive material is reduced, which results in the reduction of contact resistance between the guide and the light-sensitive material for smooth transport thereof. Guide 23 may be made either of a porous plate as shown in Fig. 20 or of a mesh as shown in Fig. 23. A light-sensitive material may be transported with its emulsion side facing either upward or downward. When the jet nozzle for circulation of the processing solution is provided at the lower portion of a processing tank, jets of processing solution are directed at the bottom of guide 23, to the emulsion side of the light-sensitive material so that it may be developed evenly and transported smoothly with less transport resistance for the light-sensitive material. The width of the transport path formed by guide 23 is one which is the sum of the width of a light-sensitive material and about 5 mm, for example, for the purposes of preventing zigzagging and jamming of the light-sensitive material. Further, it is possible to reduce the resistance caused by friction between the light-sensitive material and guide 23 by providing irregularity or streak pattern on the surface of guide 23 facing the light-sensitive material. Further, slit 23b with which guide 23 is formed can be arranged so that developers may be jetted in the direction of transport for a light-sensitive material, thus it is possible to transport the light-sensitive material more efficiently with the flow of developer. The developer running through piping 68 connected to ejecting portion 67 located at the central part of developing tank 5 is heated by heater 26 and is jetted into developing tank 5 from a pair of supplying portions 70 led from piping 69 and arranged at both sides of ejecting portion 67. Through the operation of this circulation system 24, the developer is splashed from the supplying part 70, providing a function to blow developer to the light-sensitive material and a function to agitate the developing solution in the developing tank 5 so as to keep the temperature constant. Besides, to the developing tank 5, the temperature sensor 71 is provided so as to get temperature information for driving the heater 26. The temperature of developer is adjusted by the heater 26 provided in the circulating system 24. Especially, as the temperature adjusting method for small developing tank, it is preferred to be done in the circulating system 24 which is out of the developing tank 5, not inside of the developing tank. Definitely, as the developing tank 5 is so small, the extremely narrow range of temperature control as in the developing tank becomes very difficult in case the heater is located in the developing tank 5 and the temperature is adjusted by ON-OFF operation of big capacity heater. The temperature dispersion is generated in developing tank 5 and the fluid movement on the heating surface of the heater is small. Therefore, the deterioration of the developer tends to happen. So, it is possible to set the heater 26 outside of the developing tank 5 to make abundant circulation of the developing solution in the developing tank so as to keep the temperature variation to a low level. Besides, the deterioration of the developer can be prevented. The fixing tank and the washing tank are constituted in the same manner as in the developing tank, but it is possible to provide a heater in the system 24 of the washing tank 9. At the above-mentioned washing tank 4 and 6, the jet nozzles 27 are set. Through the operation of washing pump 72, washing water is supplied to the supplying part 75 from the washing water tank 73 through the duct 74. From the supplying part 75, washing water is jetted to the rollers 19 and 20 by the jet nozzle 27. In the water washing tank 73, the liquid level sensor 76 is provided to detect the remained quantity of washing water. Waste liquid after washing and liquid leaked when light-sensitive material is inserted through the rollers 19 and 20 are exausted to the waste liquid tank 77 through the duct 22. Moreover, to this waste liquid tank 77, leaked solution from the receiving stand 40 having processing solution is drained through the duct 78. Besides, it is possible to keep washing water constantly in this washing part (midway room) 4 and 6 to wash the rollers 19 and 20 constantly. Moreover, it is also possible to fill with materials having no influence on processing such as fluid paraffin, inert gas and so on. Figure-24 shows another example of the processing tank in which the bottom wall 90 and the upper wall 91 face parallel to each other. Each pair of rollers 92 and 93 are arranged in each pair of concaves 90a and 91a provided at both ends of bottom wall 90 and upper wall 91, so that no leakage may take place substantially and yet the rollers may rotate. By rotation of these rollers 92 and 93, light-sensitive material passes between them, and it is fed into the transport path which is made by the guide 94 formed solidly with the bottom wall 90 and the guide 95 formed solidly with the upper wall 91. To the guide 94, slit 94a( directing in the direction of transport ) is formed. It introduces the processing solution supplied from the supplying part 90b located at the bottom through the operation of the circulating system, transporting light-sensitive material. The processing solution goes out of the transport path from slit 95a which is formed at the guide 95, then it is exhausted from the ejecting portion 91b for circulation. Figure-25, from (a) to (e), shows a basic roller structure forms. (a) of Figure-25, just the same as the above-mentioned example, has a structure that the processing tank 100 and the air 101 are substantially sealed by a couple of the rollers 102 having the same diameter so that light-sensitive material 103 is conveyed by rotation of the roller 102. In (b) of Figure-25, a couple of the rollers having a different size of diameter. In (c) and (e) of Figure-25, only one piece of roller 102 is used. (d) of Figure-25 has three rollers 102. Figure-26, from (a) to (f), shows the installation of feeding-in and draining mechanism to the processing tank and the feeding of light-sensitive material. It is enough for the above-mentioned mechanism to have a single structure, i.e., one piece of valve, one roller and so on, but also it is good to have multi-structure, i.e., plural same mechanisms or plural different mechanisms in order to enhance the seal level of one wall surface. From (a) to (e) of Figure-26 use the roller 102. In (a) of Figure-26, three sets of processing tanks 100 are arranged successively side by side, light-sensitive material 103 is fed from the side direction. In (b) of Figure-26, three sets of the developing tank 100 are arranged independently side by side. In (c) of Figure-26, the processing tanks 100 are arranged vertically. Light-sensitive material 103 is fed from the upper side to the bottom side. In (d) of Figure-26, light-sensitive material 103 is conveyed from the bottom side to the upper side. In (e) of Figure-26, two sets of the processing tank are located in the upper side and one set of the processing tank in located in the bottom side. In (f) of Figure-26, a valve seal 107 is used and a roller 102 is used for the feeding of light-sensitive material. In (g) and (h) of Figure-26, roller 102 and valve seal 107 are jointly used. Figure-27, from (a) to (g) shows other examples where the arrangement of the processing tanks 100 and the feeding direction of light-sensitive material 103 are different. Figs. 28-30 show other examples of the temperature adjustment of processing solutions. Figure-28 shows that the heater 105 is built in the guide 104 of the processing tank 100. This heater 105 may be of either a plate-type or a bar-type. Figure-29 includes heater 106 in the processing tank 100. This heater 106 may also be of either a plate-type or a bar type. Figure-30 shows that the processing tank 100 has heater 107 of a big capacity outside of it and heater 108 of a small capacity inside of it. The enhancement of temperature is mainly done by the external heater and temperature control is made by the inner heater so that the range of temperature variation can be smaller. Figs.31-33 show examples of agitation in the processing tank. In Figure-31, near the guide member 200, an agitation blade 200 is set which is driven by the outer motive power to agitate the processing solution. In Figure-32, curtain-type or yarn-type material 203 is provided from the guide face of the guide member 202 to the transport path for light-sensitive material. When a light-sensitive material passes through this member 203, it is shaken to agitate the processing solution. In Figure-33, the processing solution is jetted from the supplying inlet 204 to rotate the agitation fan 200 to agitate. Then, we will discuss about the relation between hole-opening ratio of the slit of the guide member in this example and the developing unevenness, and the relation between the linear speed of jetted processing solution and the developing unevenness. At first, we examined the relation between the hole-opening ratio of the open-portion 300 to the guide member 301 and the processing unevenness shown in Fig. 34. The result is shown in Table-1. Therefore, the hole-opening ratio of the guide member must be set to 20%, or more. Then, we examined the relation between the linear jetting speed against light-sensitive material and the developing unevenness by use of the above-mentioned guide member 301. The result is shown in Table-2. In this examination, we set the hole-opening ratio of the guide member to be 50%. Therefore, the linear jetting speed of the processing solution to the light-sensitive material by use of the guide member (301) must be set to 1.5 cm/sec, or more. Moreover, we examined the relation between the controlled temperature range and the heat load amount (=heater output / circulation liquid amount), whose result is shown in Figure-35. Figure-36 is a sectional view of another example of an apparatus for processing a light-sensitive material. A symbol 500 in the drawing represents an apparatus main body which is light-proof against external light and light-sensitive material inlet portion 502 is provided on one side of the apparatus main body 500, while on the other side thereof, light-sensitive material outlet 503 is provided. Between light-sensitive material inlet portion 502 and light-sensitive material outlet 503, developing tank 504, water tank 505, air tank (midway room) 506 and 507, water tank 508, fixing tank 509, water tank 510 and washing tank 511 are provided, in the sequence thereof from the side of light-sensitive material inlet portion 502. In these processing tanks, developer, fixer and washing water respectively are stored, and replenisher containers 512 are connected to the upper portion of processing tanks. As shown in Figure-37, between developing tank 504 and replenisher container 512, a tube 513 is provided having a sharp tip in connecting portion 504a located on the upper portion of developing tank 504, thus, developing tank 504 and replenisher container 512 are connected so that a liquid therein may flow through the connection. Further, on replenisher container 512, an air tube 514 is provided through which air may flow through. And a bottom portion of replenisher container 512 is mounted on the connecting portion of developing tank 504 through seal member 515, therefore, a liquid-level of processing solution is formed in replenisher container 512 located outside developing tank 504, so substantially, the developer is kept hermetically. On the air tube 514, a valve 516 is provided, through which the developer tank 504 is kept hermetically. When the valve 516 is operated for replenishment of developer, air is introduced into replenisher container 512 and thereby the developer is supplied to developer tank 504 and the liquid-level in replenisher container 512 is lowered. Replenisher containers 512 which have same structure as replenisher container 512 for developer' tank 504 are also provided above fixing tank 509 and washing tank 511 respectively. A valve seal 519 is provided on the wall portion 517 that separates developer from air and also it is provided on the wall portion 518 that separates developer from water, thus developing tank 504 is kept hermetically, and light-sensitive material can be fed-in and ejected through them. Developing tank 504 is substantially kept hermetically, and by making the clearance of valve seal 519 small, leakage of solution caused when light-sensitive material is fed-into from valve seal 519 is reduced. A light-sensitive material is fed in through valve seal 519 on the side of light-sensitive material inlet portion 502 and ejected through valve seal 519 on the opposite side. thus, the light-sensitive material can be fed into processing solutions and ejected therefrom directly and thereby the deterioration of the developer in developing tank 504 caused by oxidation can be prevented. Between developing tank 504 and light-sensitive material inlet portion 502, there is provided solution-returning tube 520 which sends back the solution slightly leaked out to developing tank 504 when light-sensitive material is inserted through valve seal 519 by driving pump 521. It is preferable for the material of the valve seal 519 to be flexible enough not to scratch the surface of a light-sensitive material and yet is not eroded by developing solution, so organic high polymer materials such as, for example, polyester sheet, vinyl-chloride resin sheet and nylon sheet are preferably used. Further, it is preferable for the material of a sheet for valve seal 519 to be somewhat water-repellent because a light-sensitive material can pass through the sheet smoothly without being scratched on its surface. The valve seal 519 is formed as shown in Figure-38 and Figure-39, and that shown in Figure-38 curves toward the transportation direction of light-sensitive material (P), thus the pressure caused by the developer in developing tank 504 is applied on the insertion-inlet portion 519a so that it may close thereby leakage from the insertion-inlet portion 519a is prevented. As shown in Figure-40, (a) and (b), a square sheet member is given a H-shaped cut 519b and mating portions of the flaps caused by the H-shaped cut are formed like a V-shaped notch 519c on valve seal 519. As shown in Figure-40 (c), the portion of the V-shaped notch 519c on the flap is protruded in the direction perpendicular to the V-shaped notch and thereby the insertion-inlet portion 519a shown in Figure-40 (d) is formed. The water level in water tank 505 provided on the outlet side of developer tank 504 is made to be almost the same as that of processing solution and thereby the liquid pressure caused by the developer applied on the valve seal 519 is balanced with the water pressure, thus it is prevented that the developer leaks or it is mixed with water. Wall portion 522 which separates water tank thus and air tank 506, wall portion 523 which separates air tank 506 and air tank 507, wall portion 524 which separates air tank 507 and water tank 508, wall portion 525 which separates water tank 508 and fixing tank 509, wall portion 526 which separates fixing tank 509 and water tank 510, wall portion 527 which separates water tank 510 and washing tank 511 and wall portion 528 which separates washing tank 511 and light-sensitive material ejecting portion 503 are all provided with the aforesaid valve seal 519 through which a light-sensitive material passes and transported. Water tank 508 is provided at the inlet side of fixing tank 509 and water tank 510 is also provided between fixing tank 509 and washing tank 511, and water level in the water tank 508 and that in the water tank 510 are mostly the same as those of fixing solution and washing liquid respectively and thereby the liquid pressure applied on the valve seal 519 is balanced, preventing that each of fixing solution and washing liquid is not mixed with water. Returning tubes 529, 530 and 531 are provided between water tank 505 and air tank 506 in the next stage, between air tank 507 and water tank 508, and between washing tank 511 and light-sensitive material ejecting portion 503, respectively, and each of them returns through the operation of each pumps 532, 533, and 534, the leaked liquid to its original tank. Further, developing tank 504, fixing tank 509 and washing tank 511 are respectively provided with tubes 535, 536 and 537 through which the processing solutions are circulated by the works of pumps 521, 538 and 534, respectively. Besides, developing tank 504, fixing tank 509 and washing tank 511 are respectively provided therein with transport guide 539 and transport rollers 540, and each transport rollers 540 is given a driving force for its rotation, through a power transmission mechanism such as bevel gears or the like, by the driving shaft 542 which passes through the valve mechanism 541 located on each wall portion, and the driving shaft 542 is rotated by motor 543. Valve seal 541 through which the driving shaft 542 is held supports so that the rotation of the driving shaft 542 can be made. At the same time, it seals the gap between the driving shaft 541 and the wall portion to prevent liquid leakage. As shown in Figure-41 and Figure-42, on transport guide member 539 which consists of a plurality of sheet materials 539a arranged in the tranport direction at a certain interval and of a connecting material 539b, the sheet materials 539a realizes the reduction of the contact area between a light-sensitive material and the transport guide for the smooth transportation and of enabling processing solution to circulate through the clearance between sheet materials. Further, all of developing tank 504, fixing tank 509 and washing tank 511 are connected to a drain pipe 544, through which a liquid is discharged when valve 545 is operated. Besides, it is possible for this example to be provided with a means to control the temperature of processing solution and a means to agitate processing tank, just like the previous example. Besides, in the previous examples, processing tank is kept hermetically, and when the content of processing solution becomes decreased by the processing of light-sensitive materials, the processing solution is replenished from the replenisher container located on the upper side of the processing tank through its contact with outer air. Therefore, the entering of air to the developer is prevented. Replenisher container can also be positioned on the lower level when the replenisher is replenished compulsorily by means of pumps and others. As stated above, in the light-sensitive material developing apparatus, the processing tank is substantially kept hermetically from outer air. So, the processing solution does not contact with air in the processing tank, and thereby it is possible to prevent the deterioration caused by oxidation or evaporation of processing solution observed in the conventional processor, and the inside of each processing tank is not contaminated. Besides, it is possible to combine the processing tank wall portion with a valve mechanism through which a light-sensitive material can be fed into the processing tank. Besides, as the processing tank is substantially kept hermetically, the leakage of solution in time of feeding-in and ejection of light-sensitive material can mostly be prevented. Besides, when this feeding-in and ejecting mechanism is prepared with a roller structure, this valve mechanism may come to have a function to stock processing solution as a wall portion of a processing tank. Moreover, the rotation of the roller can feed light-sensitive material into the developing tank. Thus, it is not necessary to provide another special feeding mechanism. And, by supplying replenisher into the processing tank, the deteriorated processing solution is compulsorily ejected, from the processing tank kept substantially hermetically, through the clearance such as the sealing portion of a valve type, so the problem such as the clogging with a chloride and so on deteriorated through the opening of the seal part and so on cannot happen. Besides, by providing the mechanism to release the hermetical condition of the processing tank and by releasing the hermetical condition of processing, the supply or draining of processing solution can be done easily. Moreover, a water tank which has same water pressure as that of processing solution can be provided in the midway room between the feeding-in and ejecting mechanisms of the processing tank connecting to these feeding-in and ejecting mechanisms, thereby the solution leakage which happens when a light-sensitive material passes can be prevented. Also, it is possible to fill the midway room with those materials which do not react on processing solution such as fluid paraffin, inert gas and so on to prevent oxidation of processing solution. Moreover, if a transport mechanism is provided in the processing tank, a light-sensitive material can be fed without the leakage of solution and without transport trouble like jamming and so on. Further, it is possible to prevent processing unevenness on light-sensitive materials by jetting the processing solution against a light-sensitive material for agitation in the processing tank and by heating processing solution with a circulation system for maintaining processing solution at a predetermined processing temperature.

Claims: A photosensitive material processing apparatus for developing a photosensitive material, comprising a processing means (5,7,9,504,509,511), said processing means comprising a developer enclosure means (5,100,504) for developing said photosensitive material with a developer in said developer enclosure means (5,100,504), whereby said developer enclosure means (5,100,504) for being filled with said developer is so that said developer is insulated from air and comprises further a photosensitive material intake means (2,502) for taking said photosensitive material into said developer enclosure means (5,100,504) without allowing said developer in said developer enclosure means (5,100,504) to contact with air, and a photosensitive material discharge means (3,503) for discharging said photosensitive material from said developer enclosure means (5,100,504) without allowing said developer in said developer enclosure means (5,100,504) to contact with air, characterized by cleaning means (27,4,6,505) for cleaning the outer surfaces of said photosensitive material intake means (2,502) and said photosensitive material discharge means (3,503) with water. The apparatus claimed in claim 1, further comprising a first conveyance means (19, 20, 102, 540) for conveying said photosensitive material into said processing means, and a second conveyance means (19, 20, 102, 540) for conveying said photosensitive material out of said processing means. The apparatus claimed in claim 1 or 2, wherein at least one of said photosensitive material intake means (2, 502) and said photosensitive material discharge means (3, 503) comprises a roller means (19, 20, 102). The apparatus claimed in claim 1 or 2, wherein at least one of said photosensitive material intake means (2, 502) and said photosensitive material discharge means (3, 503) comprises a valve means (107, 519). The apparatus claimed in claim 1, wherein said developer enclosure means (5, 100, 504) is connected to a further enclosure means (4, 6, 505). The apparatus claimed in claim 5, wherein said further enclosure means (4, 6, 505) is prevented from contact with outside air. The apparatus claimed in claim 5, wherein said further enclosure means (4, 6, 505) is filled with an inert material. The apparatus claimed in claim 5, further comprising a third conveyance means (19, 20, 102) for conveying said photosensitive material into said further enclosure means (4, 6, 505). The apparatus claimed in claim 1, wherein said processing means further comprises a developer supply means (11, 14, 512) for supplying an additional developer to said developer enclosure means (5, 100, 504) through a developer intake means (14a, 504a) so that an equal amount of said developer in said developer enclosure means (5, 100, 504) is discharged without allowing the remnant of said developer in said developer enclosure means (5, 100, 504) contact with air. The apparatus claimed in claim 1, wherein said developer enclosure means (5, 100, 504) further comprises a first developer circulation means (70, 200, 203) for circulating said developer inside said developer enclosure means (5, 100, 504). The apparatus claimed in claim 1, wherein said developer enclosure means (5, 100, 504) further comprises a second developer circulation means (24) for discharging said developer from said developer enclosure means (5, 100, 504) and returning said developer back into said developer enclosure (5, 100, 504) through a developer filtration means (31).

Inventors: GOTO NOBUTAKA, KAWAMURA TOMONORI, KOBOSHI SHIGEHARU, KUREMATSU MASAYUKI, GOTO, NOBUTAKA, KAWAMURA, TOMONORI, KOBOSHI, SHIGEHARU, KUREMATSU, MASAYUKI
Applicants: KONISHIROKU PHOTO IND, KONICA CORPORATION
Application year: 1989
Main classification: G03D3
IPC codes: G03D5