Photosensitive member for electrophotography

Abstract: A photosensitive member for electrophotographic photoreceptor, composed of an amorphous silicon containing carbon, nitrogen or oxygen and a specific amount of hydrogen and/or halogen, prepared by electron cyclotron resonance method, which is useful for xerographic systems.

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The invention relates to an electrophotographic photosensitive member used in electrophotographic imaging processes, and more particularly to a electrophotographic photoreceptor for xerographic systems. 2. Description of the Prior Art Recently, an amorphous silicon nitride containing H, amorphous silicon carbide containing H or amorphous silicon oxide containing H, each hereinafter called as a-SiN, a-SiC or a-SiO photoconductive film, was disclosed which is expected to be usable for a photoconductive layer of an electrophotographic photoreceptor as a photoreceptor composed of such photosensitive members shows (1) long life, (2) harmlessness to men and (3) high photosensitivity. Such a a-SiN, a-SiC or a-SiO photoconductive film has been prepared by plasma CVD method or sputtering method, where in a H content in these films has been limited to be in the range of 10 - 40 atomic % (see US-A- 4,471,042). Each of the a-SiN, a-SiC and a-SiO photoconductive films can do, only by prescribing the specific amount of N, C or O in the film and by doping with B, reach dark conductivity of about 10⁻¹³ Ω⁻¹cm⁻¹ to be usable for photosensitive member. The a-SiC and a-SiO photoconductive films surely have a lower dark conductivity but simultaneously lower photosensitivity, so that practical use has been hindered in this regard. Also, the a-SiN photoconductive film has been revealed through the inventor's experiments that in its repeat operation on next charging process after exposure or photo-discharge, the surface potential lowers 20% or more of an initial value. In other words, the conventional type photoreceptor using a-SiN film as a photoconductive layer is quite poor in dark decay characterisics and is thereby not suitable for practical use. It is considered that gap states such as dangling bond density of Si and the like increase due to the incorporation of N, so that carriers excited by exposure and photo-discharge will be trapped into the gap states and then will be released from them by the electric field applied on a next charging process thereby removing the surface charges. In addition, the plasma CVD method or sputtering method has been adopted to prepare the conventional a-SiC, a-SiN and a-SiO photoconductive films, which inevitably caused to yield a polymeric powder of (SiH₂) n which adsorbs on a film surface during deposition to thereby hinder a normal growth of film, and also needed a long time for the film formation due to low deposition rate thereof to thereby remain a drawback for cost saving. a-SiC, a-SiO and a-SiN photoconductive films possessing sufficient photosensitivity to be used for an electrophotographic photosensitive member and containing H content of more than 40 atomic % cannot be obtained by the state of the art. A preparation method for amorphous silicon films utilizing the electron cyclotron resonance (ECR) method has been proposed (see US-A- 4,532,199, which corresponds to DE-A-3407643). US-A-4,698,288 discloses a photosensitive member for electrophotography comprising a substrate which may be conductive, and a photoconductive layer of hydrogenated amorphous silicon containing from 5 to about 70 atom-% of hydrogen. The photosensitive member is made by a glow discharge method. All examples of US-A-4,698,288 describe a photoconductive layer with 40 atomic percent of hydrogen; more than 40 atom-% of hydrogen are not used. DE-OS-3407643 discloses amorphous Si layers fabricated by an ECR method. Referring to the examples, the film forming conditions can be summarized as follows: the substrate temperature is 300°C, the microwave output is 300W and the vacuum degree is ranging between 26.66 to 66.66 Pa (0.2 to 0.5 Torr). On the other hand, the present invention shows that the amount of hydrogen contained therein increases along with the increase in the vacuum degree. Besides it shows that the conductive layer contains more than 40 atomic percent of hydrogen when the vacuum degree ranges between 266.64 to 466.62 Pa (2 to 3.5 Torr). It can be easily presumed that the vacuum degree in DE-OS-3407643 is considerably larger than the above mentioned range and the amount of hydrogen is, therefore, less than 40 atomic percent. In other words, a photosensitive member with more than 40 atomic percent hydrogen is neither described nor suggested. In Patent Abstracts of Japan, Vol. 11, No. 273 (C-445) (2720), September 4, 1987, a similar ECR-technique is used to grow hydrogenated silicon layers. As stated on page 2, lines 8 to 13 of the original reference, "the amorphous silicon layer was obtained with the same quality as the layer formed with the PCVD method". Hence, it is noteworthy that the specification of the present invention clearly describes as a problem in the prior art that the PCVD-method cannot provide an amorphous silicon layer containing more than 40 atomic percent of hydrogen (page 1, 3rd para. of the specification). Consequently, this document provides an amorphous silicon with less than 40 atomic percent of hydrogen. US-A-4,471,042 discloses that an image-forming member for electrophotography has a photoconductive layer comprising a hydrogenated amorphous semiconductor composed of silicon and/or germanium as a matrix and at least one chemical modifier such as carbon, nitrogen and oxygen contained in the matrix. This document discloses in column 7, lines 8 to 16, that the atomic percentage in the photoconductive layer must be between 1 and 40%, as a content of a hydrogen outside this range will lead to an eletrophotographic image-forming member with very low or substantially no sensitivity to electromagnetic wave, to a markedly low dark-resistivity and a little increase in carrier when irradiated by electromagnetic wave. Summarizing, more than 40 atomic percent of hydrogen will according to this document adversely influence the property of the photosensitive member. It is a problem of the present invention to provide a photosensitive member with a sufficient photosensitivity to be used for electrophotographic photosensitive members. SUMMARY OF THE INVENTION According to the present invention an electrophotographic photosensitive member is provided which comprises a conductive substrate and a photoconductive layer consisting of amorphous silicon containing from 40 to 60 atomic % of hydrogen and/or halogen and at least one element selected from carbon, nitrogen and oxygen, said photoconductive layer being obtainable by the electron cyclotron resonance method with the proviso that a photoconductive layer of amorphous silicon containing 40 atomic % of hydrogen is excluded. The electrophotographic photosensitive members of the present invention show very low dark conductivity and sufficient photosensitivity to be put into practical use, and also are superior in dark decay characteristics upon repeated operation. Furthermore, according to the manufacturing method of the present invention it can economically provide the photosensitive members because of high deposition rate and high productivity. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 shows the relationship between H content (atomic %) in a-SiN films fabricated by ECR method and gas pressure during deposition, Fig. 2 shows the relationship between photo conductivity at 565 nm and gas pressure during deposition with respect to the a-SiN films of Fig. 1, Fig. 3 shows the relationship between dark conductivity and gas pressure during deposition with respect to a-SiN films, Figs. 4 - 6 show the relationships between gas pressure during the deposition of a-SiC film by ECR method, and hydrogen content, photo conductivity at 565 nm or dark conductivity, respectively, Figs. 7 - 9 show the relationships between gas pressure during the deposition of a-SiO films and hydrogen content, photo conductivity at 565 nm or dark conductivity, respectively, Fig. 10 shows the relationships between the film composition, i.e., the atomic ratio of Si atom to C atom and photo conductivity and dark conductivity, with respect to a-SiC films by ECR method, Fig. 11 shows the relationships between the film composition, i.e., the atomic ratio of Si atom to O atom and photo conductivity and dark conductivity, with respect to a SiO films by ECR method. PREFERRED EMBODIMENT OF THE INVENTION The electrophotographic photosensitive member of the present invention comprises basically a conductive substrate and a photoconductive layer but may provide an intermediate layer therebetween and a surface protecting layer on a free surface of the photoconductive layer. As the conductive substrate, it may be used a conventional one available in the field, for example, a plate made from metals such as Al, Cr, Mo, Au, Ir, Nb, Ta, Pa, Pd and the like, or alloys from these metals. Also it may be a film or a sheet made of synthetic resins such as polyesters, polyethylenes, cellulose acetate, polypropylenes and the like, and a sheet made of glass, ceramics, those being given a conductive layer on its surface. Any shapes of the substrate may be used suitably for the purpose and is not limited to any particular configuration. The photoconductive layer of the invention contains at least one chemical modifier among C, N and O in amorphous silicon. N content with respect to Si atom is usually 0.01 - 28 atomic %, preferably 0.2 - 28 atomic %. C content with respect to Si atom is usually 5 - 30 atomic %, preferably 10 - 30 atomic %. And, O content with respect to Si atom is usually 5 - 20 atomic %, preferably 10 - 20 atomic %. Also, the content of hydrogen and/or halogen in the photoconductive layer is at least more than 40 atomic %, and 60 atomic % at maximum. Such films with high content of hydrogen and/or halogen may be prepared by ECR method. The films with derived content may be obtained mainly by adjusting gas pressure during deposition under the condition of the high microwave power of 2.5 kW and without the substrate heating. Usually, it is preferable that only hydrogen is contained in the photoconductive layer, but only halogen, or hydrogen with halogen may be contained. The thickness of the photoconductive layer is usually 5 - 80 µm, preferably 10 - 50 µm. To be noted is that the photoconductive layer may contain impurities such as P or B. Such impurities may control the dark conductivity and the carrier transport property, so that they may be added when necessary. The intermediate layer serves to prevent the injection of carriers from the conductive substrate to the photoconductive layer, so that it may be provided when necessary. The intermediate layer is preferably formed by amorphous silicon and has usually a thickness of 2.0 - 20 µm. The surface protecting layer may be preferably provided for protecting the photosensitive member from physical or chemical damages such as corona discharge. The surface protecting layer may be of amorphous silicon added with the same chemical modifier as that for the photoconductive layer and may preferably use a-SiC whose film thickness is usually 0.2 - 10 µm. ECR method is used for fabricating the photoconductive layer of the present invention. Next, a film preparation method will be described with exemplifying the case of a-SiN film. The ECR plasma CVD equipment is composed of a plasma formation chamber and a specimen chamber. The plasma formation chamber comprises a cavity resonator which is connected with the microwave source (a frequency of 2.45 GHz) through a rectangular waveguide, via microwave introducing window made from quartz. Around the plasma chamber are provided magnetic coils, and they give the electron cyclotron resonance condition and form the divergent magnetic field, which extract the plasma stream to a substrate. The specimen chamber includes a conductive substrate. When the substrate is a cylindrical type, it is supported by a support member to thereby be rotatable. Into the specimen chamber is introduced a material gas of silicon compounds containing H or halogen, such as SiH₄, Si₂H₆, SiF₄, SiCl₄, SiHCl₃, SiH₂Cl₂ and the like or mixture of these gases. Also, gas for supplying N effectively may include NH₃ or N₂ gas. First, the plasma formation chamber and specimen chamber are evacuated to vacuum so as to allow material gases to be introduced thereinto. In this instance, gas pressure is usually set at 133.32 x 10⁻³ - 133.32 x 10⁻⁴ Pa (10⁻³ Torr - 10⁻⁴ Torr). Then, into the plasma formation chamber is applied a magnetic field and then supplied a microwave power so as to excite plasma, which is directed to the substrate through divergent magnetic field to cause hydrogenated or halogenated a-SiN to be deposited. Since the support member is rotated, the film is uniformly deposited. The film uniformity can be improved by adjusting the position and the shape of plasma extracting orifice, which is arranged at the end opposite to the microwave introducing window. By the deposition apparatus mentioned above, experiments have been made at some gas pressures with the material gases of SiH₄ and NH₃. In this case, the material gas flow rate is (SiH₄ + NH₃ = 120 sccm), gases ratio is (SiH₄/(SiH₄ + NH₃) = 0.96), microwave power is 2.5 kW, and substrate is not heated. Figs. 1, 2 and 3 show H content in the film, photo conductivity (η µ τ) at 565 nm, and dark conductivity (σ d ) dependent on gas pressure with respect to the obtained a-SiN films. As shown in Fig. 1 - 3, when the gas pressure is selected to provide a-SiN film with H content of more than 40 atomic %, the dark conductivity becomes less than 10⁻¹⁵Ω⁻¹cm⁻¹ without having boron doped and the photo conductivity is high (photosensitivity is high). In the range where photo conductivity (η µ τ) becomes larger, the dark conductivity (σ d ) becomes smaller. The dark conductivity is proportional to drift mobility µ, so that in this region, it can be understood that lifetime τ becomes larger. It is well known that the τ and dangling bond density have a good correlation (i.e., when dangling bond density decreases, τ becomes larger). Hence, it was found that dangling bond density due to Si atom can be mainly reduced in the a-SiN film with H content of more than 40 atomic %, fabricated by ECR method. It is pointed out that the a-SiN film having less than 10⁻¹⁴ - 10⁻¹⁵Ω⁻¹cm⁻¹ of dark conductivity and in addition high photo conductivity (high photosensitivity) without doping of boron could not be obtained in prior art, that is, the a-SiN films prepared by a conventional method could not reach the said characteristics. In the method for fabricating the a-SiN films mentioned above, no formation of (SiH₂) n powder is recognized. In this instance, the deposition rate and gas usage efficiency largely depend on gas pressure, so that gas pressure is selected to be obtained a considerable higher (6 - 10 times higher) deposition rate and gas usage efficiency in comparison with the conventional art. Furthermore, it has been observed that at a specific gas pressure where H content becomes more than 40 atomic%, i.e., at gas pressure 266.64 - 466.62 m Pa (2 - 3.5 m Torr) where it is possible to provide a-SiN film having dark conductivity more than 10⁻¹⁴- 10⁻¹⁵Ω⁻¹cm⁻¹ and a high photo conductivity (high photosensitivity), the deposition rate and gas usage efficiency preferably show a higher value. On the contrary, a-SiN films deposited by a conventional method generally have such tendency that photosensitivity is deteriorated in the range of higher deposition rate. Also in this respect, the present invention has a superior feature to those in the conventional art. It is natural that when a silicon compound containing halogen is introduced as material gas, it requires that the total amount of H and halogen in the film is more than 40 atomic %. From additional experiments, it has been observed that when the amount of H and/or halogen in the film is set to be more than 60 atomic %, optical band gap of the film becomes too large, so that this feature is not suitable for photoconductive layer for electrophotographic photosensitive member requiring photosensitivity with respect to visible light. In detail. a relevant content of H and/or halogen in the film is 40 - 60 atom %, preferably 43 - 55 atomic % wherein a content of 40 atomic % of H is excluded. Next, it has been observed that when the H content in the film is fixed in a range of 43 - 46 atomic % and a gaseous ratio of SiH₄ and NH₃ is changed to vary N content in the film. In the case of N content less than 0.01 atomic %, there is no effect of decrease in the dark conductivity. It is considered that nitrogen acts as a donor and it causes the dark conductivity to be larger. Therefore, in this region, a-SiN films are not proper for photoconductive layer for electrophotographic photosensitive member. Also, in the case of N content more than 28 atomic %, the photosensitivity to visible light is drastically lowered, which feature is also not suitable for photoconductive layer for electrophotographic photosensitive member. In other words, a usual value of N content with respect to Si atom is to be 0.01 - 28 atomic %, preferably 0.2 - 28 atomic %. Next, the details of a-SiC film and a-SiO film will be described. The preparation apparatus to be used is the same as that for the a-SiN films. Material gases to be introduced are silicon compounds containing H or halogen such as SiH₄, Si₂H₆, SiF₄, SiCl₄, SiHCl₃, SiH₂Cl₂ and the like or mixtures of these material gases. Also, gases for C source may be such as CH₄, C₂H₆ or C₂H₄, and gases for O source may be CO₂, N₂O or O₂. Figs. 4 - 9 show H content in the film, photo conductivity (η µ τ) at 565 nm, dark conductivity (σ d ) dependent on gas pressure during deposition for a-SiC films and a-SiO films. The preparation conditions for these films are as follows. For a-SiC films, SiH₄ + CH₄ = 145 sccm, SiH₄/ (SiH₄ + CH₄) = 0.83, microwave power = 2.5 kW, and the substrate is not heated. In the case of a-SiO films, SiH₄ + O₂ = 145 sccm, SiH₄/(SiH₄ + O₂) = 0.83, microwave power = 2.5 kW, and the substrate is not heated. As seen from Figs. 4 - 9, similarly with the a-SiN films, only when gas pressure is selected to set H content to be more than 40 atomic %, it is possible to provide a sufficient photo conductivity (η µ τ) and dark conductivity (σ d ) for electrophotographic photosensitive member. Figs. 10 and 11 show the relationships between photo conductivity (η µ τ), and dark conductivity (σ d ), and the film composition of a-SiC films or a-SiO films which were prepared by varying the flow rates of SiH₄ and CH₄, or SiH₄ and O₂, respectively. The other preparation conditions are the same as those of the films shown in Figs. 4 - 9 except for gas pressure fixed at 399.96m Pa (3.0 m Torr). As seen in Figs. 4 - 9, in the a-SiC films and a-SiO films with low dark conductivity and high photo conductivity, the content of H and/or halogen is to be 40 - 60 atomic % wherein a content of H of 40 atomic % is excluded. To be noted is that when H content is more than 60 atomic %, H is bonded with Si in polymeric configuration of (SiH₂) n to thereby deteriorate photo conductivity. The H and/or halogen content in these films is preferably 43 - 55 atomic %. From Fig. 10, in the SiC films with C content more than 30 atomic %, photo conductivity (η µ τ) shows less than 10-⁷ cm²/v, and less than 5 atomic %, dark conductivity (σ d ) is not drastically changed compared with that of the film with no C content. The films with said characteristic is the object of the present invention. In other words, the C content in the a-SiC films is to be 5 - 30 atomic %, preferably 10 - 30 atomic %. Also, from Fig. 11, the O content in the a-SiO films is to be 5 - 20 atomic %, preferably 10 - 20 atomic % on the same reason mentioned above for said C content. The photoconductive films according to the present invention are most suitably usable for a photosensitive device adapted to convert optical informations to electrical signals, such as those provided in electrophotography, image sensor or display in a coupled configuration with a liquid crystal. The invention is also applicable to such a device as solar battery or a thin film transistor. The following examples are given as embodiments of the preparation of a-SiN film, a-SiC film, a-SiO film having H and/or halogen content of more than 40 atomic % in the film and their use in photoconductive layer of electrophotographic photosensitive member. Example 1 A cylindrical conductive substrate made of Al is mounted in the specimen chamber. SiH₄ gas of 120 sccm and B₂H₆ gas of 20 sccm (diluted by H₂ to 3000 ppm) are fed into the specimen chamber, so that an intermediate layer comprised of a-Si of 2.5 µm thickness is fabricated on the conductive substrate by ECR method under the condition of gas pressure of 399.96 m Pa (3.0 m Torr)and microwave power of 2.5 kW. Then, into the specimen chamber is introduced SiH₄ gas of 115 sccm, NH₃ gas of 5 sccm, B₂H₆ gas of 12.5 sccm (diluted by H₂ to 30 ppm), so that a photoconductive layer comprised of a-SiN of 28 µm thickness is fabricated by ECR method under the condition of gas pressure of 426.62 m Pa (3.2 m Torr) and microwave power of 2.5 kW. Furthermore, into the specimen chamber is introduced SiH₄ gas of 30 sccm and CH₄ gas of 1000 sccm, so that a surface protecting layer comprised of a-SiC of 0.3 µm thickness is prepared by ECR method under the condition of gas pressure of 399.96 m Pa (3.0 m Torr)and microwave power of 2.5 kW. The N content (N/Si) and the hydrogen content in the a-SiN photoconductive layer is 11 atomic % and 48 atomic %, respectively. In the preparation process of the electrophotographic photoreceptor, there is no formation of polymeric powder of (SiH₂) n , and deposition rate and gas usage efficiency have a considerable higher (6 - 10 times higher) value in comparison with those in the conventional art. Additionally, the obtained electrophotographic photoreceptor showed a superiority in dark decay characteristics, particularly upon repeat operation. Furthermore, the electrophotographic photoreceptor was evaluated in a commercially available duplicator and provided a favourable image quality. Example 2 Under the same preparation conditions as that used in the example 1 (except that gas pressure is changed to 359.96, 439.96, 479.95, 559.94 and 639.94 m Pa (2.7, 3.3, 3.6, 4.2 and 4.8 m Torr) upon fabrication of a-SiN photoconductive layer) five electrophotographic photoreceptors were made. The Table 1 shows the results of the image quality and the dark decay characteristics upon repeat operation for the obtained five electrophotographic photoreceptors. Also, the hydrogen content, photo conductivity and dark resistivity of the photoconductive layers dependent on gas pressure are as shown in Figs. 3, 4 and 5. As shown in these figures, at gas pressure of 359.96 m Pa (2.7 m Torr) and 439.96 m Pa (3.3 m Torr), an excellent electrophotographic photosensitive members can be obtained, wherein hydrogen content in the photoconductive layers is more than 40 atomic %. In this instance, N content (N/Si) was 9 - 12 atomic %. Gas pressure (m Torr) mPa (2.7) 359.96 (3.3) 439.96 (3.6) 479.95 (4.2) 559.94 (4.8) 639.94 Dark decay characteristics o ○ o ○ Δ × × Image quality o ○ o ○ × × × Example 3 Under the same preparation conditions as that in the example 1 except that phosphorus in place of boron is doped into photoconductive layer and intermediate layer, a negative charge electrophotographic photoreceptor was made. The flow rates of PH₃ upon the fabrication of the intermediate layer and photoconductive layer are 1.5 sccm (diluted by H₂ to 3000 ppm) and 1.2 sccm (diluted by H₂ to 30 ppm), respectively. Measurement of the obtained electrophotographic photoreceptor showed a superiority in dark decay characteristics particularly upon repeat operation. Also, the photoreceptor was evaluated in a commercially available duplicator for negative charge and could provide a favourable image quality. Example 5 An intermediate layer comprised of a-Si with 2.5 µm thickness was fabricated on the cylindrical conductive support member made of Al by ECR method under such conditions as microwave power of 2.5 kW, gas pressure of 359.96 m Pa (2.7 m Torr) and SiH₄ gas of 120 sccm, B₂H₆ gas of 22 sccm (diluted by H₂ to 3000 ppm), and NO gas of 12 sccm. Then, a photoconductive layer comprised of a-SiC with 28 µm thickness was made on the intermediate layer by ECR method under such conditions as microwave power of 2.5 kW, gas pressure of 359.96 m Pa (2.7 m Torr) and SiH₄ gas of 120 sccm, CH₄ gas of 25 sccm and B₂H₆ gas of 40 sccm (diluted by H₂ to 30 ppm). Furthermore, a surface layer comprised of a-SiC with 0.3 µm thickness was fabricated on the photoconductive layer under such conditions as microwave power of 1.5 kW, gas pressure of 106.66 m Pa (0.8 m Torr) and SiH₄ gas of 10 sccm and CH₄ gas of 18 sccm, whereby an electrophotographic photoreceptor could be obtained. In the case, the carbon content in the photoconductive layer was 20 atomic %, and the hydrogen content was 43 atomic %. Also, it was found that the deposition rate for the photoconductive layer was about 23 µm/hour which notably improved in comparison with the case of that (about 10 µm/hour) of the conventional plasma CVD method. Upon the preparation process, the conductive support member was not heated and there observed no formation of polymeric powder of (SiH₂) n . Measurement of the obtained electrophotographic photoreceptor for positive charge showed a favourable photosensitivity, less amount of residual potential, and is superior particularly in dark decay characteristics. Also, the electrophotographic photoreceptor was evaluated in a commercially available duplicator for positive charge and could provide a favourable image quality without having fogging. Example 6 Under the same preparation conditions as that in the Example 5 except that O₂ gas of 25 sccm in place of CH₄ gas was introduced upon the fabrication of a-SiO photoconductive layer by ECR method, an electrophotographic photoreceptor was made. In the a-SiO photoconductive layer, the oxygen content was 12 atomic %, and the hydrogen content was 47 atomic %. In this case, the deposition rate was 23 µm/hour. Measurement of the obtained electrophotographic photoreceptor for positive charge showed the same results as in the Example 5, that is, it has a favourable photosensitivity, less residual potential and is superior in dark decay characteristics. Furthermore, the electrophotographic photoreceptor was evaluated in a commercially available duplicator for positive charge and could provide a favourable image quality without having fogging. Example 7 Under the same preparation conditions as that in the Example 5 except that PH₃ gas of 12 sccm (diluted by H₂ to 2000 ppm) in place of B₂H₆ gas was introduced upon the fabrication of the intermediate layer and B₂H₆ gas was not introduced upon the fabrication of the photoconductive layer, an electrophotographic photoreceptor was made. Measurement of the obtained electrophotographic photoreceptor for negative charge showed that it has a favourable photosensitivity, less residual potential and is superior particularly in dark decay characteristics, as the same results in the Example 5 except for polarity. Furthermore, the electrophotographic photoreceptor was evaluated in a commercially available duplicator for negative charge and could provide a favourable image quality without having fogging. Example 8 Under the same preparation conditions as that in the Example 6 except that PH₃ gas of 12 sccm (diluted by H₂ to 2000 ppm) in plade of B₂H₆ gas was introduced upon the fabrication of the intermediate layer and B₂H₆ gas was not introduced upon the fabrication of the photoconductive layer, an electrophotographic photoreceptor was made. Measurement of the obtained electrophotographic photoreceptor showed that it has a favourable photosensitivity, less residual potential and is superior particularly in dark decay characteristics, as the same results in the Example 5 except for polarity. Furthermore, the electrophotographic photoreceptor was evaluated in a commercially available duplicator for negative charge and could provide a favourable image quality without having fogging.

Claims: An electrophotographic photosensitive member which comprises a conductive substrate and a photoconductive layer consisting of amorphous silicon containing from 40 to 60 atomic % of hydrogen and/or halogen and at least one element selected from carbon, nitrogen and oxygen said photoconductive layer being obtainable by the electron cyclotron resonance method with the proviso that a photoconductive layer of amorphous silicon containing 40 atomic % of hydrogen is excluded. The photosensitive member of claim 1 in which the amorphous silicon contains 43 - 55 atomic % of hydrogen. The photosensitive member of claim 1 in which the amorphous silicon contains 0.01 - 28 atomic % of nitrogen based on silicon. The photosensitive member of claim 1 in which the amorphous silicon contains 5 - 30 atomic % of carbon based on silicon. The photosensitive member of claim 1 in which the amorphous silicon contains 5 - 20 atomic % of oxygen based on silicon. The photosensitive member of claim 1 which further comprises an intermediate layer between the conductive substrate and the photoconductive layer and a surface protecting layer over the free surface of the photoconductive layer. The photosensitive member of claim 1 in which the conductive substrate is an aluminum plate.

Inventors: HAYAKAWA TAKASHI, NARIKAWA SHIRO, OHASHI KUNIO, TSUJIMOTO YOSHIHARU, HAYAKAWA, TAKASHI, NARIKAWA, SHIRO, OHASHI, KUNIO, TSUJIMOTO, YOSHIHARU
Applicants: SHARP KK, SHARP KABUSHIKI KAISHA
Application year: 1989
Main classification: G03G5
IPC codes: G03G5