Coating composition and a process for manufacturing the same

Abstract: A coating composition for forming an inorganic film on a glass, ceramic, metal or plastic surface is obtained by hydrolyzing and condensing a metal alkoxide of the general formula: M(OR) n wherein M represents a metal atom, R represents an alkyl group having 1 to 5 carbon atoms, and n represents the valence number of M in an organic solvent in the presence of an aluminum salt; and adding a deposition inhibitor which prevents the separation of the aluminum salt when a film is formed. A process for preparing the composition is also disclosed.

Description: The present invention relates to a coating composition which is used to form an inorganic film on a substrate made of a material such as glass, ceramics, metals or plastics, and a process for manufacturing the same. Inorganic films are formed for a variety of purposes on the surfaces of substrates made of materials such as glass, ceramics metals and plastics. The film imparts specific electrical, optical, chemical or mechanical properties to the substrate material. Specific purposes of the films include electrical conduction or insulation, the selective transmission or absorption of light, the prevention of elution of an alkaline substance, and the formation of a film having chemical resistance, or a hard coating film. These films are formed by a gas-phase process, such as CVD, PVD or sputtering process, or by a liquid-phase process employing an alkoxide compound, etc. The gas-phase process usally requires an expensive apparatus, such as one for vacuum deposition. The size and shape of the substrate on which a film can be formed are limited by the size of the apparatus which is employed. The sol-gel process employing an alkoxide compound, etc. has the advantage of being capable of forming a film on a surface having a large area. When this process is employed, however, it is often difficult to maintain a coating solution of good quality and achieve a satisfactory control of the atmosphere, including the control of humidity, as all the alkoxide compounds, except silicon alkoxide, are rapidly hydrolyzed (Japanese Patent Laid-open Publication No. Sho 52-138512 (138512/1977)). An attempt has been made to prepare a coating solution by adding a chelating agent, such as acetylacetone, to control the rate at which an alkoxide compound is hydrolyzed (Japanese Patent Laid-open Publication No. Sho 63-258959 (258959/1988)). However, the chelated compound usually has a higher thermal decomposition temperature and need be heated to a temperature of at least 450 °C. An attempt has also been made to prepare a transparent coating solution by adding a mineral acid to the hydrolyzed product of silicon alkoxide and titanium alkoxide, while not relying upon any stabilizing method, such as chelating (Japanese Patent Laid-open Publication No. Sho 55-25487 (25487/1980)). This is known as a silica-titania coating solution. This solution is, however, low in storage stability, particularly to water. There is known a coating solution using silicon alkoxide, which is hydrolzyable only slowly (Japanese Patent Publication No. Sho 63-58867 (58867/1988)). This solution is used to form, for example, a film for preventing the elution of an alkali. This solution, however, can only form a film of low mechanical strength then baked at a lower temperature. There is also known a silica alumina coating solution. There has been reported an ethanol solution of tetraethoxysilane and aluminum nitrate as a mullite coating solution (Speech #2G39 at the Annual Meeting of the Ceramic Society of Japan in 1987). This solution is, however, low in film-forming stability. The mullite coating solution can form a uniform film if used immediately after its preparation, but if used after several days of storage, the separation of its aluminum component occurs during its application or drying. SUMMARY OF THE INVENTION From Journal of Material Science, vo. 23, no. 6, June 1988, pages 2259-2266, London, GB; Y. Takahashi dt al.: "Dip-coating of TiO₂-films using a sol derived from Ti(O-i-Pr)₄ - diethanolamine - H₂O-i-PrOH system" it is known that diethanol amine can supress the precipitation of oxides from the alcoholic titanium isopropoxid solution in its hydrolysis. Moreover, diethanolamine has some positive effect on the densification of the TiO₂ crystals. It is an object of the present invention to provide a coating composition which has a high degree of storage and film forming stability and which can form a film of high mechanical strength without requiring any backing of the film at a high temperature. It is also an object of the present invention to provide a process for the manufacturing of such a coating composition. The present invention is directed to a coating composition comprising a product obtained by hydrolyzing and condensing a metal alkoxide of the general formula: M(OR) n (I) wherein M represents a a metal, R represents an alkyl group having 1 to 5 carbon atoms, and n represents the valence number of M in an organic solvent with not less than 2 moles or water for the total moles of alkoxide in the presence of an aluminum salt selected from aluminum nitrate, aluminum chloride, aluminum oxalate and basic salts thereof; and adding a deposition inhibitor in a weight ratio of at least 1 aluminium as Al₂O₃. According to a preferred aspect of the present invention, the alkoxide consists of, or contains titanium alkoxide, and the solvent contains alkylene glycol or a monether thereof in organic solvent. The composition has a high degree of storage and film-forming stability and can form a film having a high degree of mechanical strength and a refractive index of 1.4 to 2.1 without requiring any baking a a high temperature. The coating composition of the present invention may be obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of an aluminum salt, and a deposition inhibitor. The deposition inhibitor prevents the deposition or separation of the aluminum salt from occurring when a film is formed. The metal alkoxide may be metal alkoxide of silicon, titanium, tantalum, zirconium, boron, aluminum, magnesium, or zinc. It is, however, preferable from an economical standpoint and also in view of the storage stability of the coating composition to use silicon alkoxide or a product of its partial condensation, or titanium alkoxide, or a mixture thereof. To obtain the present invention, these alkoxide are hydrolyzed and condensed in an organic solvent in the presence of aluminum salt and are further added with a deposition inhibitor which has an effect to prevent the aluminum salt from being deposited into the film at forming coated film on the coating composition. If the composition contains titanium alkoxide, the organic solvent contains alkylene glycol or a monoether thereof. The akylene glycol or a monoether thereof stabilizes the titanium alkoxide and thereby makes it possible to improve the storage stability of the ocmposition. The composition containing titanium alkoxide is manufactured by adding alkylene glycol or a monoether thereof to titanium alkoxide to stabilize it, and hydrolyzing and condensing the titanium alkoxide (or a mixture thereof with silicon alkoxide) in the presence of an aluminum salt. The composition containing both titanium alkoxide and silicon alkoxide is manufactured by hydrolyzing silicon alkoxide in the presence of an aluminum salt, and mixing it with the titanium alkoxide which has been stabilized by alkylene glycol or a monoether thereof. The metal alkoxide which is employed for the ocmposition of the present invention has the general formula I: M(OR) n (I) wherein M represents a metal, R represents an alkyl group having 1 to 5 carbon atoms, and n represents the valence number of M. The silicon alkoxide may be a compound of the general formula II: Si(OR′)₄ (II) wherein R′ represents an alkyl group having 1 to 5 carbon atoms, or a mixture of two or more of such compounds, or a product of its partial condensation of which each molecule comprises not more than five monomer molecules. The titanium alkoxide may be a compound of the general formula III: Ti(OR″)₄ (III) wherein R″ represents an alkyl group having 1 to 5 carbon atoms, or a mixture of two or more of such compounds. The aluminum salt which is employed for the purpose of the present invention may be selected from ones which are soluble in water or an organic solvent. It is, therefore, possible to use aluminum nitrate, aluminum sulfate, aluminum acetate, aluminum chloride, aluminum oxalate, aluminum sulfamate, etc., or a basic salt thereof. The use of aluminum nitrate, aluminum chloride or aluminum oxalate, or a basic salt thereof, is particularly preferred. The organic solvent may be selected from among alcohols such as methanol, ethanol, n- or i-propanol and n-, i-or t-butanol, esters such as ethyl acetate, glycols such as ethylene glycol, ester derivatives thereof, ethers such as diethyl ether, ketones such as acetone, methyl ethyl ketone and cyclohexanone, and aromatic hydrocarbons such as benzene and toluene. A mixture of two or more of such solvents can be also used. If the coating composition contains titanium alkoxide, the organic solvent contains alkylene glycol or a monoether thereof, as hereinabove stated. In this connection, it may contain, for example, ethylene glycol, diethylene glycol, propylene glycol or hexylene glycol, or a monomethyl, monoethyl, monopropyl, monobutyl or monophenyl ether thereof. If the glycol or monoether thereof which the solvent contains has only a molar ratio of less than 1 to the titanium alkoxide, the alkoxide is not stabilized satisfactorily to give a coating composition having high storage stability. No problem results from the use of a large amount of glycol or monoether thereof. The whole amount of the organic solvent which is employed may consist of any such glycol or monoether thereof. When the coating composition is of the type not containing any titanium alkoxide, however, the organic solvent is not required to contain any such glycol or monoether thereof. The deposition inhibitor may comprise at least one compound selected from among N-methylpyrrolidone, dimethylformamide, dimethylacetamide, ethylene glycol, diethylene glycol and the derivatives thereof. The deposition inhibitor is employed in a weight ratio of at least 1 to aluminum as Al₂O₃. If it has a weight ratio of less than 1 to Al₂O₃, it is not expected to prevent satisfactorily the deposition of the aluminum salt when a film is formed and dried. The use of a large amount of deposition inhibitor does not have any adverse effect on the coating composition. The deposition inhibitor may be added when the metal alkoxide is hydrolyzed and condensed in the presence of the aluminum salt, or thereafter. The metal atoms M in the metal alkoxide have the following relation by molar ratio to the aluminum atoms: If the ratio is smaller than 0.01, the composition fails to form a film having a satisfactorily high degree of mechanical strength. If it is greater than 0.7, the composition tends to form a film not adhering satisfactorily to the substrate, and moreover, a film having low chemical resistance when baked at a temperature not exceeding 450 °C. The coating solution preferably has a solid content of 0.5 to 20 % by weight consisting of a total amount of metal alkoxide as MO n/2 and aluminum salt as Al₂O₃. If its solid content exceeds 20 % by weight, the solution has a lower degree of storage stability and also makes it difficult to control the thickness of a film which is thereby formed. If its solid content is lower than 0.5 % by weight, it can form only a film having an undesirably small thickness when applied only once, and need be applied repeatedly to achieve a desired film thickness. The composition of the present invention is prepared by hydrolyzing and condensing a metal alkoxide of the formula M(OR) n in an organic solvent in the presence of an aluminum salt. If the amount of water used for the hydrolysis of e.g., silicon alkoxide and/or titanium alkoxide is smaller than 2 mols for the total mols of the alkoxide, it fails to hydrolyze the alkoxide satisfactorily, resulting in a composition having low film formability and failing to form a film having satisfactory strength. The same is true when any other metal alkoxide is used, too. If the aluminum salt which is employed is of the type containing water, its water content need be taken into consideration when the amount of water used for hydrolysis is determined, insofar as the water which the salt contains also participate in the hydrolysis. The molar ratio of silicon and titanium alkoxides which are employed to prepare the coating composition depends on the refractive index required of the film which is thereby formed. A coating solution obtained by the hydrolysis of silicon alkoxide alone forms a film having a refractive index of 1.45, while one obtained by the hydrolysis of only titanium alkoxide forms a film having a refractive index of 2.1. An appropriate ratio of silicon and titanium alkoxides is, therefore, selected to prepare a coating solution which can form a film having a desired refractive index. Any other metal alkoxide can also be employed to achieve such refractive index control. However, the composition containing titanium alkoxide which is prepared as hereinabove described tends to increase its viscosity gradually during storage at room temperature and make it difficult to achieve the accurate control of film thickness. This tendency becomes higher with an increase in the proportion of titanium alkoxide which the composition contains. This is apparently due to the fact that titanium alkoxide undergoes hydrolysis and condensation more rapidly than silicon alkoxide. Under these circumstances, the inventors of the present invention has found out that the following two processes are useful for preparing a coating composition which is less likely to change its viscosity, even if it may contain titanium alkoxide: (1) Titanium alkoxide is well mixed with glycols before it is hydrolyzed in the presence of an aluminum salt, and after it has been mixed with silicon alkoxide, if any, the mixture is hydrolyzed in an organic solvent. Heat is generated when titanium alkoxide is mixed with glycols. This is apparently due to the fact that an ester interchange reaction occurs between the alkoxide groups of titanium alkoxide and the glycols, and thereby stabilizes the alkoxide during hydrolysis and condensation. (2) Silicon alkoxide is hydrolyzed in the presence of an aluminum salt, and is mixed with the titanium alkoxide which has been mixed with glycols, so that the mixture may undergo a condensation reaction. Although silicon alkoxide is rapidly hydrolyzed, it is condensed more slowly than titanium alkoxide. If titanium alkoxide is added promptly to the hydrolyzed silicon alkoxide, the silanol groups of the hydrolyzed silicon alkoxide react uniformly with the titanium alkoxide, and the hydrolyzed silicon alkoxide thereby stabilizes the condensation reaction of the titanium alkoxide. Although the process in which hydrolyzed silicon alkoxide is mixed with titanium alkoxide has alreadly been tried, it is impossible to obtain a coating composition of high storage stability if the organic solvent which is employed does not contain any glycol. The process as described at (2) above is also useful for preparing a coating composition from another rapidly hydrolyzable metal alkoxide and silicon alkoxide. The coating composition of the present invention can be applied by a customary method, such as dip coating, spin coating, spray coating, brush coating, roll transfer, or screen printing. EXAMPLE 1 (Basic Example) A coating solution containing 20 mol % of aluminum was obtained by mixing uniformly 20.8 g of tetraalkoxysilane as silicon alkoxide, 72.3 g of ethanol as an organic solvent, 12.5 g of aluminum nitrate [Al(NO₃)₃·9H₂O] as an aluminum salt, 17 g of ethylene glycol as a deposition inhibitor, and 5.4 g of water. The composition of the solution is shown in Table 1. EXAMPLES 2 and 3 (Different deposition inhibitors were used.) EXAMPLE 1 was repeated, except that N-methylpyrrolidone was used as the deposition inhibitor in EXAMPLE 2, and dimethylformamide in EXAMPLE 3. See Table 1. EXAMPLE 4 (A larger amount of deposition inhibitor was employed.) EXAMPLE 1 was repeated, except that the amount of ethylene glycol gas increased to 51 g. See Table 1. EXAMPLES 5 and 6 (Different aluminum salts were used.) EXAMPLE 1 was repeated, except that hydrated aluminum chloride (AlCl₃·6H₂O) was used as the aluminum salt in EXAMPLE 5, and basic aluminum oxalate having an aluminum content of 12.8 % in EXAMPLE 6. See Table 1. EXAMPLES 7 and 8 (Compositions having different mol % of aluminum) EXAMPLE 1 was repeated, except that the amounts of silicon alkoxide and aluminum salt were changed so as to yield a coating solution containing 10 mol % of aluminum in EXAMPLE 7, or 50 mol % in EXAMPLE 8. See Table 1. EXAMPLE 9 (A condensate of silicon alkoxide was used) EXAMPLE 1 was repeated, except that the tetraethoxysilane was replaced by a partial condensation product thereof known as Ethyl Silicate 40, product of Colcoat K.K. and having an SiO₂ content of 40 %. See Table 1. COMPARATIVE EXAMPLE 1 (No deposition inhibitor was employed.) EXAMPLE 1 was repeated, except that no ethylene glycol was employed. See Talbe 1. COMPARATIVE EXAMPLE 2 (No aluminum salt was used.) A coating solution was prepared by mixing uniformly 20.8 g of tetraethoxysilane, 73.7 g of ethanol, 5.4 g of water and 0.1 g of concentrated hydrochloric acid as a catalyst. See Table 1. EXAMPLE 10 Each of the solutions which had been prepared in EXAMPLES 1 to 9 and COMPARATIVE EXAMPLES 1 and 2 was applied onto a glass plate by spin coating at a spinning speed of 3000 rpm. The solution was dried on a hot plate having a temperature of 80 °C for 10 minutes and the resulting film was baked at 200 °C for 20 minutes. The film (hereinafter referred to as the "initial film") was examined for pencil hardness and transparency. The same coating and baking procedures were followed after each solution had been stored for a month in a vessel having a constant temperature of 50 °C, whereby its film-forming stability was examined. The results are shown in Table 2. Example Film thickness (Å) Film formed by coating solution as prepared Film formed by solution after storage Transparency Pencil hardness Transparency Pencil hardness 1 1200 0 >9H 0 >9H 2 1200 0 >9H 0 >9H 3 1200 0 >9H 0 >9H 4 1000 0 >9H 0 >9H 5 1000 0 >9H 0 >9H 6 1100 0 >9H 0 >9H 7 900 0 >9H 0 >9H 8 1500 0 >9H 0 >9H 9 1250 0 >9H 0 >9H Comparative Example 1 1100 0 >9H X(Whitened) - Comparative Example 2 900 0 6H 0 6H EXAMPLES 11 to 20 (Method I of Synethesis) A coating composition was prepared in each of EXAMPLES 11 to 20 by hydrolyzing and condensing tetraethoxysilane as silicon alkoxide, tetraisopropoxysilane as titanium alkoxide, hydrated aluminum nitrate (9H₂O) as aluminum salt, ethylene glycol as deposition inhibitor, and hexyl glycol as alkylene glycol, in ethanol as a solvent. The amount of the substances used in each EXAMPLE are shown in Talbe 3. Referring in further detail to the process, tetraethoxysilane and tetraisopropoxysilane were fully admixed with a mixed organic solvent composed of ethanol and hexylene glycol, and a solution of hydrated aluminum nitrate (9H₂O) in water and ethylene glycol was added to the alkoxide mixture, and the mixture was stirred at room temperature for 30 minutes. The process will hereinafter referred to as "Method I of Synthesis": The viscosity of each coating solution was determined by an E type viscosimeter at 25 °C both immediately after its preparation, and after the lapse of one month. The results are shown in Table 3. EXAMPLE 21 (Method I of Synthesis) A coating composition was prepared by repeating EXAMPLE 16, except that 13.7 g (0.06 mol) of tetraethoxytitanium was employed instead of tetraisopropoxysilane, and that the amount of ethanol was increased to 71.6 g. The results are shown in Talbe 3. EXAMPLE 22 (Method I of Synthesis) A coating composition was prepared by repeating EXAMPLE 16, except that ethylene glycol was used instead of hexylene glycol. See Talbe 3. EXAMPLE 23 (Method I of Synthesis) A coating composition was prepared by repeating EXAMPLE 16, except that butyl cellosolve was used intead of hexylene glycol. See Table 3. EXAMPLE 24 A coating composition was prepared by repeating EXAMPLE 16, except that N-methylpyrrolidone was used instead of ethylene glycol as the deposition inhibitor. See Table 3. EXAMPLES 25 to 27 (Method II of Synthesis) Coating compositions were prepared by repeating EXAMPLES 16 to 18, respectively, but employing one or more of the following three solutions: Solution A: Obtained by mixing tetraisopropoxytitanium at room temperature instead of hexylene glycol; Solution B: Obtained by mixing tetraethoxysilane with ethanol under stirring; and Solution C: A uniform transparent solution obtained by mixing aluminum nitrate (9H₂O), water and ethylene glycol under stirring. The coating composition of EXAMPLE 25 was prepared from Solutions A and C, the composition of EXAMPLE 26 was prepared by mixing Solutions A and B and adding Solution C at room temperature, and the composition of EXAMPLE 27 by adding the predetermined amount of ethanol to Solution A and mixing Solution C at room temperature. See Table 3. The process will hereinafter be referred to as "Method II of Synthesis". EXAMPLE 28 (Method III of Synthesis) A coating composition was prepared by following EXAMPLE 16, but employing the following solutions: Solution D: Obtained by adding tetraisopropoxytitanium to hexylene glycol under stirring at room temperature; and Solution E: Obtained by adding a solution of aluminum nitrate in water and ethylene glycol to an ethanol solution of tetraethoxysilane at room temperature and stirring the mixture for 30 minutes. Solutions D and E were mixed under stirring at room temperature. See Table 3. The process will hereinafter be referred to as "Method III of Synthesis". EXAMPLE 29 A coating composition was prepared by mixing a solution obtained by dissolving 14 g of tantalum pentabutoxide in 48.6 g of ethanol with a solution obtained by dissolving 5 g of ethylene glycol as deposition inhibitor and 2.4 g of aluminum nitrate in 30 g of ethanol. The coating solution was applied onto a glass plate by spin coating at a spinning speed of 2000 rpm, and after it had been dried at 80 °C, the resulting film was baked at 300 °C for 20 minutes. There was obtained a transparent film having a pencil hardness of at least 9H. EXAMPLE 30 A uniform solution was prepared by mixing 11. g of magnesium ethoxide and 40.8 g of aluminum isopropoxide in 200 g of isopropanol, refluxing the mixture for an hour, and cooling it to room temperature. A solution which had been prepared by mixing 83.2 g of tetraethoxysilane, 37.5 g of aluminum nitrate and 50 g of ethylene glycol in 281 g of ethanol was partially hydrolyzed, and admixed with the above solution to yield a uniform and transparent coating composition. The coating solution was applied onto a glass plate by spin coating at a spinning speed of 2000 rpm, and after it had been dried at 80 °C, the resulting film was baked at 300 °C for 20 minutes. There was obtained a transparent film having a pencil hardness of at least 9H. EXAMPLE 31 A uniform solution was prepared by dissolving 6.7 g of triethoxyborane in 100 g of ethanol. A solution which had been prepared by mixing 41.6 g of tetraethoxysilane, 23.4 g of aluminum nitrate and 15 g of ethylene glycol uniformly in 93.3 g of ethanol was added to the triethoxyborane solution to yield a coating composition. The coating solution was applied onto a glass plate by spin coating at a spinning speed of 2000 rpm, and after it had been dried at 80 °C, the resulting film was baked at 300 °C far 20 minutes. There was obtained a transparent film having a pencil hardness of at least 9H. COMPARATIVE EXAMPLE 3 A casting composition was prepared by repeating EXAMPLE 16, except that N-methylpyrrolidone was used as the deposition inhibitor, with no hexylene glycol. It formed a gel after one month. See Table 3. COMPARATIVE EXAMPLE 4 A coating composition was prepared by repeating EXAMPLE 27, except that ethanol was used instead of hexylene glycol, and N-methylpyrrolidone as the deposition inhibitor. After one month, it formed a gel. See Table 3. COMPARATIVE EXAMPLE 5 A coating composition was prepared by repeating EXAMPLE 16, except that no aluminum nitrate was used, and that 0.1 g of concentrated nitric acid (1 mol % of the alkoxide) was used as a catalyst. See Table 3. In Table 3, HG means hexylene glycol, EG means ethylene glycol, BC means butyl cellosolve, "*" means that N-methylpyrrolidone was used as the deposition inhibitor, Et means ethyl and iPr means isopropyl. TEST EXAMPLES Each of the coating compositions which had been obtained in EXAMPLES 1 and 11 to 28 and COMPARATIVE EXAMPLES 1 to 3 was applied onto a glass base, and after it had been dried at 80 °C for 10 minutes, the resulting film was baked at 300 °C for 20 minutes. The film formed by each composition was examined for thickness and pencil hardness. The refractive index was determined of each of the films which had been formed by the compositions of EXAMPLES 1 and 11 to 18. The film-forming procedure was repeated after one month of storage and the thickness of each film was determined. The results are shown in Talbe 4. Example Film thickness (Å) Pencil hardness Refractive index Film thickness after one month 1 1200 >9H 1.45 1200 11 1300 >9H 1.48 1350 12 1350 >9H 1.50 1400 13 1450 >9H 1.55 1500 14 1300 >9H 1.60 1600 15 1400 >9H 1.65 1650 16 1400 >9H 1.71 1700 17 1500 >9H 1.85 1800 18 1500 >9H 2.10 1800 19 1750 >9H 2300 20 1800 >9H 2300 21 1350 >9H 1700 22 1300 >9H 1700 23 1250 >9H 1650 24 1100 >9H 1300 25 1300 >9H 1350 26 1300 >9H 1350 27 1300 >9H 1400 28 1300 >9H 1300 Comparative Example 3 1200 >9H Geled Comparative Example 4 1200 >9H Geled Comparative Example 5 1100 7H 1300

Claims: A coating composition comprising a product obtained by hydrolyzing and condensing a metal alkoxide of the general formula: M(OR) n (I) wherein M represents a metal, R represents an alkyl group having 1 to 5 carbon atoms, and n represents the valence number of M in an organic solvent with not less than 2 moles of water for the total moles of alkoxide in the presence of an aluminum salt selected from aluminum nitrate, aluminum chloride, aluminum oxalate and basic salts thereof and adding a deposition inhibitor in a weight ratio of at least 1 to aluminium as Al₂O₃, said deposition inhibitor preventing the deposition or separation of the aluminum salt when a film is formed. A coating composition as claimed in claim 1, wherein said alkoxide is a compound selected from silicon alkoxides and partial condensation products thereof A coating composition as claimed in claim 1, wherein said alkoxide is a mixture of a compound selected from silicon alkoxides and partial condensation products thereof, and a titanium alkoxide. A coating composition as claimed in claim 1, wherein said alkoxide is a titanium alkoxide. A coating composition as claimed in claim 1, wherein said inhibitor is a compound selected from N-methylpyrrolidone, ethylene glycol, dimethyl formamide, dimethylacetamide, diethylene glycol and the derivatives thereof. A coating composition as claimed in claim 1, wherein aluminum atoms have the following relation by molar ratio to the metal atoms M in said alkoxide: A coating composition as claimed in claims 3 and 4, wherein said solvent contains a compound selected from alkylene glycols and the monoether derivatives thereof. A process for manufacturing a coating composition comprising the steps of: hydrolyzing and condensing a metal alkoxide of the general formula: M(OR) n (I) wherein M represents a metal atom, R represents an alkyl group having 1 to 5 carbon atoms, and n represents the valence number of said M, in an organic solvent with not less than 2 moles of water for the total moles of alkoxide in the presence of an aluminum salt selected from aluminum nitrate, aluminum chloride, aluminum oxalate and basic salts thereof and adding a deposition inhibitor in a weight ratio of at least 1 to aluminium as Al₂O₃, said deposition inhibitor preventing the deposition or separation of the aluminum salt when a film is formed. A process for manufacturing a coating composition as claimed in claim 8, wherein said alkoxide is a mixture of a compound selected from silicon alkoxides and partial condensation products thereof, and a titanium alkoxide, and said titanium alkoxide is mixed before said mixture is hydrolyzed with a compound selected from alkylene glycols and the monoethers thereof. A process for manfuacturing a coating composition as claimed in claim 8, wherein said alkoxide is a titanium alkoxide, and said alkoxide is mixed before it is hydrolyzed with a compound selected from alkylene glycols and the monoethers thereof. A process for manufacturing a coating composition as claimed in claim 8, wherein said alkoxide is a mixture of a silicon alkoxide and a titanium alkoxide, wherein said silicon alkoxide is hydrolyzed in the presence of said aluminum salt, and mixed with a solution of said titanium alkoxide in a compound selected from alkylene glycols and the monoethers thereof, and the mixture is condensed.

Inventors: NOGAMI TATSUYA C O NISSAN CHEM, OKUBI KENICHI C O NISSAN CHEMI, WATANABE YOSHITANE C O NISSAN, NOGAMI, TATSUYA C/O NISSAN CHEMICAL IND., LTD., OKUBI, KENICHI C/O NISSAN CHEMICAL IND., LTD., WATANABE, YOSHITANE C/O NISSAN CHEMICAL IND., LTD.
Applicants: NISSAN CHEMICAL IND LTD, NISSAN CHEMICAL INDUSTRIES LTD.
Application year: 1989
Main classification: C03C17
IPC codes: C04B41, C23D5, C01G23, C03B19, C03C17, C01B33, C03C8, C23C18