A method for the production of semiconductor devices

Abstract: A method for the production of semiconductor devices is disclosed which comprises the steps of growing a multi-layered structure comprising a plurality of epitaxial layers on a semiconductor substrate, resulting in a semiconductor wafer in which the semiconductor devices are formed on the substrate; forming striped grooves on the back face of the substrate, each of the striped grooves being positioned between the adjacent semiconductor devices; and dividing the semiconductor wafer along the striped grooves to separate the semiconductor devices.

Description: BACKGROUND OF THE INVENTION 1. Field of the invention: This invention relates to a method for the production of semiconductor devices, and more particularly, it relates to a method for the production of semiconductor devices by dividing a semiconductor wafer in which the semiconductor devices are formed on a semiconductor substrate, the growth plane of which is substantially the (111) plane. 2. Description of the prior art: In general, various semiconductor laser devices, which are included in semiconductor devices, have a resonator structure that is formed with the use of cleavage planes of the semiconductor crystal used as a substrate. Such semiconductor laser devices are usually produced according to the process as shown in Figures 2a to 2c. First, a multi-layered structure comprising a plurality of epitaxial layers is grown on the (100) plane of a substrate that is made of a zinc blende-type semiconductor crystal. The resulting semiconductor wafer, in which the semiconductor laser devices are formed on the substrate, is cleaved in several small bars 31 . Then, as shown in Figure 2a, the small bar 31 is provided with partition patterns 33 on the upper surface thereof and parallel scratches 34 are formed between the adjacent partition patterns 33 by means of a diamond scriber 35 . The direction of these scratches 34 is normal to the cleavage plane 32 of the small bar 31 . Next, as shown in Figure 2b, a plurality of the small bars 31 are attached to the upper surface of an adhesive sheet 36 parallel to each other. Then, as shown in Figure 2c, the adhesive sheet 36 is stretched in longitudinal and transverse directions with the application of even force. The strength against the stretch of the portions containing the scratch 34 formed on the upper face of the small bar 31 is lower than of other portions and the direction of the scratch 34 corresponds to that of easy cleavage of the semiconductor substrate. Therefore, when the adhesive sheet 36 is stretched in longitudinal and transverse directions, each small bar 31 is readily divided at each portion containing the scratch 34 to separate semiconductor laser devices 37 . By this process, conventional semiconductor laser devices are produced from a semiconductor wafer in which a multi-layered structure comprising a plurality of epitaxial layers are grown on a substrate made of a zinc blende-type semiconductor crystal, the growth plane of said substrate being substantially the (100) plane. Thus, the 〈011〉 direction of easy cleavage of the semiconductor substrate is always normal to the cleavage plane 32 of the small bar 31 , so that if scratches 34 are formed in the direction of easy cleavage that is normal to the cleavage plane 32 , the small bar 31 can readily be divided in the same way as mentioned above, resulting in the semiconductor laser devices 37 separated in a rectangular shape. On the other hand, it is disclosed that semiconductor laser devices formed on the (111) plane of a semiconductor substrate have excellent device characteristics which are significantly improved as compared with conventional semiconductor laser devices (see, for example, T. Hayakawa et al., Japanese Journal of Applied Physics, vol. 26, L302 (1987); U.S. Patent Application Serial Nos. 159,797 and 031,678). However, the 〈011〉 directions of easy cleavage of the semiconductor substrate, the growth plane of which is the (111) plane, intersect each other at the angle of 60 degrees as shown in Figure 3a. When the semiconductor wafer produced using such a semiconductor substrate is divided into chips, if the facets 21 for the emission of laser light correspond to the (011) cleavage planes, the direction of scratches formed by means of a diamond scriber does not correspond to that of easy cleavage of the semiconductor substrate. That is, the direction of the scratches intersects the direction of easy cleavage. As a result, small bars are divided into semiconductor laser devices 25 with extremely irregular shapes as shown in Figure 3b. In such a case, there may be incurred structural damage 23 in the optical waveguide 22 of the semiconductor laser device 25 . Moreover, there is the danger of wafer dust, which is produced in dividing the semiconductor wafer, adhering to the facets for the emission of laser light, which may degrade the device characteristics. For example, the radiation characteristics of the resulting semiconductor laser device may be distorted. When the direction of the scratches formed on the small bars corresponds to that of easy cleavage, the semiconductor laser devices 25 are produced in the form of parallelograms, as shown in Figure 3c, or trapezoids. In such a case, unnecessary portions 25a having large areas may be formed in the semiconductor laser device 25, which decreases the number of devices that can be made from any given wafer. FR-A-2 438 914, on which the preamble of claim 1 is based, discloses a method for the production of semiconductor devices, said method comprising the steps of:- growing a multi-layered structure comprising a plurality of epitaxial layers on a front face of a semiconductor substrate, resulting in a semiconductor wafer in which semiconductor devices are formed on the substrate; forming striped grooves on a back face of said substrate, each of said striped grooves being positioned between adjacent semiconductor devices; and dividing said semiconductor wafer along said striped grooves to separate the semiconductor devices. In the method disclosed in FR-A-2 438 914, the semiconductor devices are grown on the (100) surface of the substrate, and the striped grooves extend parallel to the (110) direction - that is, parallel to cleavage planes of the substrate. Journal of Applied Physics Vol. 56(5) (1984), pp 1298-1300 discloses a Be implanted GaAlAs stripe geometry laser grown by MOCVD on the (100) surface of a substrate. Individual lasers are separated from the bulk wafer by an undisclosed process of "chemical etching". Patent Abstract of Japan, Vol 9, No. 106 (E-313) (1829) 10 May 1985 discloses a method for separating semiconductor lasers from a bulk wafer. Grooves are formed along a back surface of the substrate. A force is applied to one end of the wafer to cleave the substrate along the grooves, and separate the wafer into strips SUMMARY OF THE INVENTION According to the present invention there is provided a method for the production of semiconductor devices, said method comprising the steps of:- growing a multi-layered structure comprising a plurality of epitaxial layers on a front face of a semiconductor substrate, resulting in a semiconductor wafer in which semiconductor devices are formed on the substrate; forming striped grooves on a back face of said substrate, each of said striped grooves being positioned between adjacent semiconductor devices; and dividing said semiconductor wafer along said striped grooves to separate the semiconductor devices; said method being characterised in that said semiconductor substrate is made of a zinc blende-type semiconductor crystal, the growth plane of which is substantially the (111) plane; and in that said striped grooves are formed in a direction which is not parallel to a plane of easy cleavage of said substrate. In a preferred embodiment, the striped grooves are formed by an etching technique. In a preferred embodiment, the multi-layered structure comprises an optical waveguide to form a semiconductor laser device. In a preferred embodiment, the striped grooves are formed parallel to the optical waveguide. Thus, the invention described herein makes possible the objective of providing a method for the production of semiconductor devices, in which even when the direction of easy cleavage of the semiconductor substrate used intersects the direction of division of the resulting semiconductor wafer (e.g., even when a semiconductor substrate, the growth plane of which is substantially the (111) plane, is used to form the semiconductor wafer), high-quality semiconductor devices can be produced in a uniform rectangular shape without incurring structural damage and without degrading the device characteristics with wafer dust, thereby attaining high productivity. BRIEF DESCRIPTION OF THE DRAWINGS This invention may be better understood and its numerous objects and advantages will become apparent to those skilled in the art by reference to the accompanying drawings as follows: Figure 1a is a perspective view showing a fragment of a semiconductor wafer in which semiconductor laser devices are formed on a semiconductor wafer according to this invention. Figure 1b is a plane view showing a fragment of the back face of the semiconductor wafer of Figure 1a. Figure 1c is a schematic perspective view showing a small bar with striped grooves which is obtained by cleaving the semiconductor wafer of Figure 1b along its cleavage planes. Figure 2a is a schematic perspective view showing a conventional small bar without striped grooves. Figure 2b is a top plane view showing the small bars as shown in Figure 2a, which are attached to the upper surface of an adhesive sheet. Figure 2c is a top plane view showing semiconductor laser devices separated from each other by stretching the adhesive sheet of Figure 2b. Figure 3a shows the relationship between the substrate, the growth plane of which is the (111) plane, and the 〈011〉 directions of easy cleavage of the substrate. Figures 3b and 3c are enlarged top plan views showing semiconductor laser devices obtained by a conventional method. DESCRIPTION OF THE PREFERRED EMBODIMENTS This invention provides a method for the production of semiconductor devices by dividing a semiconductor wafer in which the semiconductor devices are formed on a semiconductor substrate as outlined in the claims. With the use of the striped grooves, the semiconductor wafer can readily be cleaved in a straight form at the portions other than the cleavage planes of a semiconductor crystal that is used for the substrate, resulting in semiconductor devices with a uniform rectangular shape. Examples Figures 1a to 1c show the process for the production of semiconductor laser devices with the use of a semiconductor substrate, the growth plane of which is the (111)B plane, according to this invention. First, as shown in Figure 1a, on the (111)B plane of an n-GaAs substrate 11 , a multi-layered structure 12 constituting a GRIN-SCH (graded-index separate confinement heterostructure) semiconductor laser with a single quantum well structure is grown by molecular beam epitaxy (MBE). Then, on the entire surface of the multi-layered structure 12 , a SiNx current blocking layer 13 is formed by plasma chemical vapor deposition (plasma CVD). In the current blocking layer 13 , striped channels 15 having a width of 50 µm are formed by photolithography and etching techniques, resulting in a striped structure within which current is confined. The striped channels 15 are parallel to each other and normal to the cleavage plane 14 of a GaAs crystal used for the substrate 11 . Then, the upper face of the current blocking layer 13 including the striped channels 15 is subjected to a vapor deposition treatment with a material of AuZn to form a p-sided electrode. Thereafter, the back face of the n-GaAs substrate is rubbed down, resulting in a semiconductor laser wafer having a thickness of 100 µm. Next, as shown in Figure 1b, by photolithography and wet etching techniques, striped grooves 16 for dividing the wafer are formed in the back face of the n-GaAs substrate 11 of the semiconductor laser wafer obtained. The position of each of the striped grooves 16 is set to be parallel to and approximately in the middle of the two adjacent striped channels 15 . The etchant used for wet etching is a mixture of H₂SO₄, H₂O₂, and H₂O in the proportions of 1:2:50. The width and depth of the striped grooves 16 were 10 µm and 5 µm, respectively. Then, on the back face of the n-GaAs substrate 11 , an n-sided electrode of AuGe is disposed by the vapor deposition method, followed by forming aluminum patterns 18 on the surface of the n-sided electrode. The aluminum patterns 18 serve as markers in dividing the wafer. The semiconductor laser wafer is then cleaved with the use of a set of cleavage planes 14 to form a laser resonator, resulting in small bars 17 . The cleavage planes 14 are normal to the 〈011〉 direction of the n-GaAs substrate 11 . For each small bar 17 , as shown in Figure 1c, slight scratches 19 are formed on the bottom of the striped grooves 16 by means of a diamond scriber 20 . The direction of these scratches 19 is parallel to the striped grooves 16 and normal to the cleavage plane 14 of the small bar 17 . Thereafter, in the same manner as described above with reference to Figures 2b and 2c, a plurality of the small bars 17 are attached to the upper surface of an adhesive sheet, which is then stretched in longitudinal and transverse directions, resulting in separated semiconductor laser devices with a uniform rectangular shape. By this process, high-quality semiconductor laser devices can be produced without incurring structural damage in their optical waveguides and without wafer dust adhering to the facets used for the emission of laser light. Although in the above-mentioned example, the striped grooves 16 are formed on the back face of the substrate 11 by a wet etching technique using a sulfuric acid-containing etchant, a dry etching technique such as reactive ion beam etching (RIBE) and the like can also be used to form the striped grooves 16 . Moreover, the striped grooves 16 for dividing the small bar into the semiconductor devices may also be in the discrete form. The size of the striped grooves 16 , such as their depth, width, and length, can be conveniently determined depending upon the size of the semiconductor wafers, such as its thickness. The sequence of the steps of forming the striped grooves 16 on the back face of the substrate 11 ; growing a multi-layered structure 12 on the substrate 11 ; and providing the striped channels 15 on the upper face of the semiconductor wafer can be altered. If the back face of the substrate 11 is not rubbed down, after the striped grooves 16 are formed on this face, the multi-layered structure 12 may be grown on the upper face of the substrate 11 , followed by providing the striped channels 15 to complete the semiconductor wafer.

Claims: A method for the production of semiconductor devices, said method comprising the steps of: - growing a multi-layered structure (12) comprising a plurality of epitaxial layers on a front face of a semiconductor substrate (11) made of zinc-blende-type semiconductor crystal, resulting in a semiconductor wafer in which semiconductor devices are formed on the substrate; forming striped grooves (16) on a back face of said substrate (11), each of said striped grooves being positioned between adjacent semiconductor devices; and dividing said substrate (11) along said striped grooves (16) to separate the semiconductor devices; said method being characterised in that, the growth plane of said substrate (11) is substantially the (111) plane; and in that said striped grooves (16) are formed in a direction which is not parallel to a plane of easy cleavage of said substrate. A method for the production of semiconductor devices according to claim 1, wherein said striped grooves are formed by an etching technique. A method for the production of semiconductor devices according to claim 1 or 2, wherein said multi-layered structure (12) comprises an optical waveguide to form a semiconductor laser device. A method for the production of semiconductor devices according to claim 3, wherein said striped grooves (16) are formed parallel to said optical waveguide.

Inventors: HAYAKAWA TOSHIRO, HOSODA MASAHIRO, KONDO MASAFUMI, SASAKI KAZUAKI, SUYAMA TAKAHIRO, TAKAHASHI KOSEI, HAYAKAWA, TOSHIRO, HOSODA, MASAHIRO, KONDO, MASAFUMI, SASAKI, KAZUAKI, SUYAMA, TAKAHIRO, TAKAHASHI, KOSEI
Applicants: SHARP KK, SHARP KABUSHIKI KAISHA
Application year: 1989
Main classification: H01L33
IPC codes: H01S5, H01L21, H01L33