PROCESSES FOR PRODUCING A SILICON-CONTAINING POLYIMIDE AND A PRECURSOR THEREFOR

Abstract: A process for producing a silicon-containing polyamic acid percusion for a silicon-containing polyamide comprises reacting a silicon-containing Polyamic acid having an inherent viscosity of 0.05 to 5 dl/g (as measured in N-methyl-2-pyrrolliidene in a concentration of 0.5 g/do at 30°+ 0.0°C), Which process comprises reacting A¹ mols of pyromeltic dianhydride (PMDA) and A² mols of 3,3′,4,4′-biphenyl­ tetracarboxylic anhydride (BPDA). the values A¹ and A² salifying the relationship with B mols of a diamine of the formula: (in which R¹ is a halogen atom or a methyl, ethyl, methoxy or ethoxy group; m is 0, 1 or 2; and n is 1 or 2); and C mols of an aminosilicon compound of the formula: (in which R² is a C₁-C₆ alkyl group, a phenyl group or a phenyl group substituted with a C₁-C₆ alkyl group; X is a hydrolysable alkoxy or acetoxy groups or a halogen atom; and k is 1, 2 or 3); the values B and C satisfying the relationship; A solution of the silicon-containing polyamic acid precursion is baked at 50°C to 500°C to afford a silicon-coating polyimide.

Description: This invention relates to a process for producing a precursor for a silicon-containing polyimide and a process for curing a solution containing the same to produce a silicon-containing polyimide. Polyimide resins have frequently been used for heat-resistant films, coating agents, adhesives for making the resin composites with inorganic materials or metallic materials, etc. If the inorganic materials are silicon-containing compounds such as glass, the use of copolymers containing silicon compounds as the precursors for the polyimides has been proposed to improve the adhesion of the polyimides. For example, Japanese laid-open patent pending Nos. Sho 57-143328/1982, Sho 58-7473/1983 and Sho 58-13631/1983 disclose a process wherein a polyimide-siloxane copolymer is prepared from a polyimide precursor obtained by replacing a portion of a starting diamine by a polysiloxane terminated at both ends with a diamine. In this case, some improvement in adhesion has been observed, but instead there is the problem that polymerization degreee of the copolymer reduces with increasing siloxane content of the copolymer. Japanese patent publications Nos. Sho 58-18372/1983, Sho 58-32162/1983 and Sho 58-32163/1983 disclose a process wherein a suitable carboxylic acid derivative (such as a tetracarboxylic acid dianhydride) is reacted with a diamine to form a polyimide carboxylic acid having a terminal group such as an acid anhydride group; and one mol of this polyamide carboxylic acid is then reacted with at least two mols of an aminosilicon compound at a temperature of -20°C to +50°C to give a silicon-containing polyamide carboxylic acid polymer. The prepolymer may be used as it is, ie. without any imidization, to obtain an organosilicon-modified polyimide precursor, or the prepolymer may be imidized by chemically cyclizing (imidizing) the prepolymer in the presence of a dehydrating agent under mild conditions (at a low temperature, preferably at 50°C or lower, particularly at -20°C to +25°C), to obtain an organosilicon-modified polyimide precursor. These precursors are then heated in solution in the presence or absence of a silanediol or siloxanediol complete imidization and also effect cross-linking and thereby obtain the desired polymimidesiloxane. This process leads to some improvement in adhesion to silicon compounds, but when the polyimide obtained according to the process is subjected to heat history over a broad temperature range, the resulting adhesion is inferior. In order to improve the adhesion, the coefficient of thermal expansion of the polyimide should be reduced. Japanese laid-open patent applications Nos. Sho 60-32827/1985, Sho 60-250031/1985, Sho 61-60725/1986 and Sho 61-241325/1986 propose biphenyltetracarboxylic acid or pyromellitic acid-based polyimides having a low coefficient of thermal expansion. However, the measurement of the coefficient of thermal expansion of these polyimides are carried out at temperatures of 300°C or lower, and the values rapidly increase at 400°C to 500°C. Further, the adhesion of the polyimide to inorganic materials is inferior. In general, the coefficients of thermal expansion of polyimides in the range of room temperature to 450°C, are at least about 3 x 10⁻⁵ deg⁻¹, whereas those of metals or inorganic materials are around 10⁻⁵ to 10⁻⁶ deg⁻¹. For example, stainless steel of type 410 (annealed) has a coefficient of thermal expansion of 11 x 10⁻⁶ deg⁻¹; cast iron one of 12.1 x 10⁻⁶ deg⁻¹; industrial purified copper one of 17 x 10⁻⁶ deg⁻¹; polycrystalline glass one of 5.8 x 10⁻⁶ deg⁻¹; silica glass one in the range of 0.5 to 0.8 x 10⁻⁶ deg⁻¹; borosilicate glass one in the range of 3.0 to 6.0 x 10⁻⁶ deg⁻¹; and porcelain 4.5 x 10⁻⁶ deg⁻¹ [see Handbook of Chemical Engineering (edited by Japan Chemical Engineering Association, issued by Marusen Company)]. Accordingly, when polyimides are used with these inorganic materials to prepare composite materials or used as adhesives for the materials, it is necessary to improve their adhesion and at the same time reduce their coefficients of thermal expansion and thereby approach those of the organic materials. According to one embodiment of the invention there is provided a process for producing a silicon-containing polyamic acid having an inherent viscosity of 0.05 to 5 dl/g (as measured in N-methyl-2-pyrrolidone in a concentration of 0.5 g/dℓ at 30°± 0.01°C), which process comprises reacting A¹ mols of pyromellitic dianhydride (PMDA) and A² mols of 3,3', 4,4' -biphenyltetracarboxylic anhydride (BPDA), the values A¹ and A² satisfying the relationship with B mols of a diamine of the formula: (in which R¹ is a halogen atom or a methyl, ethyl, methoxy or ethoxy group; m is 0, 1 or 2; and n is 1 or 2); and C mols of an aminosilicon compound of the formula: (in which R² is a C₁-C₆ alkyl group, a phenyl group or a phenyl group substituted with a C₁-C₆ alkyl group; X is a hydrolysable alkoxy or acetoxy groups or halogen atom; and k is 1, 2 or 3): the values B and C satisfying the relationship: The invention also provides a process for producing a silicon-containing polyimide which comprises baking a solution of a polyamic acid produced as described above in a solvent, at 50°C to 500°C, to vaporize off the solvent and at the same time subject the resulting compound to crosslinking. The average molecular weight of the polyamic acid obtained according to the invention is suitably from 0.05 to 5 dℓ/g in terms of the inherent viscosity value measured under the above-mentioned specified conditions, and the polyamic acid is soluble in suitable solvents. The inherent viscosity value (η inh) referrred to herein is, in more detail, expressed by the formula wherein η refers to the value obtained by using an Ubbelhode viscometer and measuring a solution of the acid in N-methyl-2-pyrrolidone at a concentration of 0.5 g/dℓ at 300°C ± 0.01°C, η₀ refers to a value obtained by using the Ubbelhode viscometer and measuring the same solvent at the same temperature; and C refers to a concentration of 0.5 g/dℓ. The starting materials for the polyamic precursor comprise two tetracarboxylic acid dianhydrides, namely pyromellitic acid dianhydride (PMDA) and 3,3′,4,4′ -biphyenyl-tetracarboxylic acid dianhydride (BPDA). Specific examples of diamines of formula (I) are p-phenylenediamine, 2-methyl-1,4-diaminobenzene, 2,5-dimethyl-1,4-diaminobenzene, benzidine, 3,3′-dimethyl-4,4′-diaminobiphenyl, 3,3′-dimethoxy-4,4′-diaminobiphenyl, 2-chloro-1,4-diaminobenzene, 2,5-dichloro-1,4-diaminobenzene. Examples of aminosilicon compounds of formula (II) are as follows: Of the compounds of formula (II), compounds of the formula (in which R³ is a methyl of ethyl group) are preferred. When these compounds are used, the coating obtained from the coating solution containing the polyamic acid has a superior heat resistance and a far superior hardness. Examples of preferred solvents in which the above-mentioned starting materials may be reacted (reaction solvent) include N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, N-acetyl-2-pyrrolidone, toluene, xylene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol dimethyl ether, cyclopentanone, cyclohexanone. These solvents may be used alone or in admixture, and also may be used as mixed solvents with other solvents in 30% by weight or more. In the process of the invention A¹ mols of PMDA and A² mols of BPDA are reacted with B mols of a diamine of formula (I) and C mols of an aminosilicon compound of formula (II) in a reaction solvent. If the value of in the expression (III) is less than 0.1, the resulting reaction solution is non-uniform and sometimes contains a partly insoluble component and the coating obtained from the reaction solution has an uneven surface which reduces its practical value. On the other hand, if the value of exceeds 0.95, there is not sufficient reduction in the coefficient of thermal expansion moulded products formed from the resulting polymer. If the value of in the expression (IV) is less than 0.05, the total of Si atoms may be sometimes reduced to reduce the adhesion of the coating formed from the polyamic acid onto silicon or silicon compounds. If the values of A¹, A², B and C are such as to satisfy the relationship a silicon-containing polymide having a particular high adhesion may be obtained. The reaction solvent preferably forms 40% by weight or more of the total of solvent and the starting materials. If the amount is less than 40% by weight, stirring is sometimes difficult. The reaction is preferably carried out at a temperature of from 0°C to 80°C; the reaction time preferably being from 0.2 to 40 hours. As to the addition order of the starting materials to the reaction system, all the tetracarboxylic dianhydrides, diamine and aminosilicon compound may be added at the same time to the reaction solvent and reacted together. Alternatively, the respective total quantities of the former two dianhydrides and the diamine may be reacted together in advance. followed by the addition of the aminosilicon compound to the resulting reaction product and reacting of the mixture, or the respective portions of the dianhydride and diamine may be reacted together in advance, followed by reacting the remainder of these in admixture with the aminosilicon compound. When the aminosilicon compound is added last, a polymer having a higher molecular weight is liable to be obtained. As to the two tetracarboxylic acid dianhydrides, it is preferred to add BPDA first or to add a mixture of BPDA with PMDA at the same time, followed by reaction. It is possible thereby to obtain a uniform and transparent reaction solution. According to the most preferred reaction process. all the diamine is reacted with nearly equal mols thereto of a mixture of PMDA with BPDA containing at least 30 mol% of BPDA based on the total acid anhydrides. (The terms "nearly equal mols" used herein means that the quantities of the acid anhydrides relative to the quantity of the diamine fall within the range of 0.9 to 1.1 mol). Additional quantities of the acid anhydrides and the aminosilicon compound of formula (II) are then added and the mixture is reacted. It is possible thereby to obtain a reaction solution which is uniform and transparent and has a higher viscosity. Thus, it is possible to obtain a silicon-containing polyamic acid which has an adequate inherent viscosity value of 0.05 to 5 dℓ/g and hence an adequate molecular Weight and Which is soluble in solvents. If the inherent viscosity value is less than 0.05 dℓ/g, the coated state of the coating solution is inferior and hence formation of the coating is insufficient, while if it exceeds 5 dℓ/g, the polyamic acid is difficultly soluble or insoluble and hence difficult to use practically. when the resulting solution containing the silicon-containing polyamic acid is baked at 50°C to 500°C, it is possible to vaporize the solvent and at the same time subject the resulting compound to crosslinking and curing. Thus, a silicon-containing polyimide having an improved adhesion to inorganic materials is formed. In the reaction according to the process of the present invention compounds of the formulae (VII), (VIII) and (IX) are obtained as main products (unreacted aminosilicon compound expressed by the formula (II) may sometimes be co-existant therewith): (in which R represents R' represents R¹, R², X, m and k are as defined above; and m₁, m₂ and m₃ each represent 0 or a positive integer). When these compounds are coated onto an object to be coated and then baked, the polyamic acids are dehydrated and cyclized to form imide bonds, and at the same time, through condensation reaction after hydrolysis of X as a hydrolyzable group present at the end of the molecular, the polyamic acids are converted into higher molecular weight substances to form a tough coating. If the aminosilicon compound of formula (II) is present in excess, this compound causes a condensation reaction with the aminosilicon group present at the end of the polymer at the time of the baking, whereby it is incorporated in the polymer. When acid anhydride groups are present at the end of the polyamic acids, it is believed that the groups react with formed water or moisture in the atmosphere to form carboxylic acids. When Si and in some cases, the carboxylic acids in the resulting polymer are present within the range defined by the expression (IV). Preferably within the ranges defined by the expression (IV) and (V), the polymer affords a polyimide exhibiting a superior adhesion onto substrates such as silicon compounds, metals, inorganic compounds, etc. Further, since the polymide obtained from the polyamic acid of the present invention has, in most cases, a thermal expansion coefficient less than 2 x 10 ⁻⁵, that is, close to those of metals or inorganic compounds, it has a sufficient adhesion durability relative to heat history at temperatures in the range of room temperature to 500°C. (In the present invention the coefficient of thermal expansion is tha: obtained using a thermomechanical analyzer (TM-7000, trade name of an instrument manufactured by Shinku Riko Company). the average value at 30°C to 450°C being determined). Since the polyamic acid produced according to the present invention is. in most cases. used as a solution in a solvent, eg. as a varnish, it may be used as it is, or the solution obtained according to the process of the invention may be concentrated or diluted as appropriate. Suitable diluting solvents are the same as the reaction solvents. As to the process for forming moulded products from the solution of the polyamic acid obtained according to the present invention any known processes may be employed. For example, the solution of the polyamic acid is cast on glass plate, copper plate, aluminium plate or the like, and then the resulting material is heated, whereby the solvent is removed and at the same time the amic acid bond is converted into an imide bond by dehydration and crosslinking proceeds due to siloxane bonds to form a tough coating. In order to form a laminated composite material, although it is possible to successively carry out such operations, a varnish containing the polyamic acid produced according to the present invention is applied as an adhesive between a plurality of heterogeneous materials, followed by baking, to make it possible to obtain a laminated composite material. As to the varnish containing the polyamic acid produced according to the present invention, the varnish may be further coated on a once baked and cured coating made from the varnish and then baked, whereby it is also possible to laminate a coating onto a coating. When fillers, glass fibers, etc. are impregnated with the varnish, followed by baking and curing, it is also possible to form a laminated material using a reinforced coating. Although the baking conditions vary depending on the solvent used, the thickness of coating, etc., those of 50° to 500°C, preferably 250° to 350°C and about 0.5 to 1.5 hour may be sufficient. As to the application fields of the polyamic acid obtained according to the process of the present invention, composite materials thereof with metallic materials such as iron, stainless steels, copper or aluminum or inorganic materials such as silicon compounds, or an adhesive for these metallic or inorganic materials may be illustrated, and besides, when the polyamic acid is used as a high molecular material in a technical field directed to a liquid crystal-aligning agent or the like, good results are exhibited. Since the silicon-containing polyamic acid produced according to the present invention has an adequate inherent viscosity value, its solution has an adequate viscosity and coating may be well carried out. Further, by baking, imidization is carried out and at the same time siloxane bonding proceeds through condensation, whereby a hard and tough coating is formed by intermolecular bonding. At the same time, by adequately balancing the quantity of the carboxyl group formed from the acid anhydride group present at the end of the polymer, with the quantity of silicon, that is, by choosing the composition of the raw materials, the resulting material exhibits a superior adhesion not only onto silicon compounds such as glass, metallic materials such as copper plate or aluminum plate, but also surprisingly enough onto the polyimide coating itself made according to the present invention. Moreover, the adhesion has a sufficient durability over a broad temperature range of room temperature to 500°C. Such a superior adhesion thereof with many kinds of substrates exhibits superior specific features. When the polyamic acid is used as a material for multi-layer composite materials or as an adhesive superior specific features are exhibited. The present invention will be described in more detail by way of Examples and Comparative examples. Example 1 A 1 ℓ capacity flask equipped with an agitator, a dropping funnel, a thermometer, a condensor and a nitrogen gas-purging means was fixed in cold water. After purging the inside of the flask with nitrogen gas, dehydrated and purified N-methyl-2-pyrrolidone (hereinafter abbreviated to NMP) (500 mℓ), p-phenylenediamine (hereinafter abbreviated to PDA) (20.11 g, 0.186 mol), BPDA (32.84 g, 0.112 mol) and PMDA (24.35 g, 0.112 mol) were fed in the flask, followed by reacting the mixture with stirring for 6 hours, during which the reaction temperature was 15° to 30°C. 4-Aminophenyltrimethoxysilane (12.70 g, 0.0595 mol) was then fed, followed by reacting the mixture at 20° to 30°C for 3 hours to obtain a polyamic acid composition of the present invention as a pale yellow transparent solution. The polyamic acid contained in the solution had an inherent viscosity of 1.2 dℓ/g as measured in NMP as a solvent. Example 2 Employing the same apparatus and manner as in Example 1, NMP (500 mℓ), PDA (25.41 g, 0.235 mol), BPDA (20.75 g, 0.0705 mol) and PMDA (35.89 g, 0.165 mol) were fed in the flask, followed by reacting the mixture at 20° to 35°C for 10 hours, thereafter adding PMDA (51.27 g, 0.235 mol) and 4-aminophenyltrimethoxysilane (85.24 g, 0.400 mol) and reacting the mixture at 20° to 30°C for 3 hours to obtain a polyamic acid composition of the present invention as a pale yellow transparent solution. The polyamic acid contained in the solution had an inherent viscosity of 0.81 dℓ/g as measured in NMP as a solvent. Example 3 Employing the same apparatus and manner as in Example 1, NMP (500 mℓ), a mixture of 4-aminophenyltrimethoxysilane with 3-aminophenyltrimethoxysilane (3.39 g, 0.0159 mol) (the content of 3-aminophenyltrimethoxysilane: 63%), PDA (17.17 g, 0.159 mol), BPDA (42.06 g, 0.143 mol) and PMDA (6.93 g, 0.0318 mol) were fed in the flask, followed by reacting the mixture at 20° to 40°C for 10 hours to obtain a polyamic acid composition of the present invention as a pale yellow transparent solution. The polyamic acid contained in the solution had an inherent viscosity of 1.4 dℓ/g as measured in NMP as a solvent. Example 4 Employing the same apparatus and manner as in Example 1, NMP (500 mℓ), PDA (20.31 g, 0.188 mol) and BPDA (55.27 g, 0.188 mol) were fed in the flask, followed by reacting the mixture at 10° to 20°C for 22 hours, thereafter adding 4-aminophenyltrimethoxysilane (22.71 g, 0.106 mol) and PMDA (13.66 g, 0.0626 mol) and reacting the mixture at 20° to 30°C for 3 hours to obtain a polyamic acid composition of the present invention as a pale yellow transparent solution. The polyamic acid contained in the solution had an inherent viscosity of 1.1 dℓ/g as measured in NMP as a solvent. Example 5 Employing the same apparatus and manner as in Example 1, NMP (500 mℓ), PDA (13.23 g, 0.122 mol), BPDA (24.00 g, 0.0816 mol) and PMDA (8.90 g, 0.0408 mol) were fed in the flask, followed by reacting the mixture at 10° to 25°C for 8 hours, thereafter adding PMDA (4.45 g, 0.0204 mol) and 4-aminophenyltrimethoxysilane (6.10 g, 0.0286 mol) and reacting the mixture at 20° to 30°C for 5 hours to obtain a polyamic acid composition of the present invention as a pale yellow transparent solution. The polyamic acid contained in the solution had an inherent viscosity of 2.1 dℓ/g as measured in NMP as a solvent. Example 6 Employing the same apparatus and manner as in Example 1, NMP (500 mℓ), 3,3′-dimethyl-4,4′-diaminobiphenyl (17.75 g, 0.0836 mol), BPDA (16.40 g, 0.0557 mol) and PMDA (3.04 g, 0.0139 mol) were fed in the flask, followed by reacting the mixture at 20° to 30°C for 15 hours, thereafter adding 4-aminophenyltrimethoxysilane (5.05 g, 0.0237 mol) and BPDA (8.20 g, 0.0279 mol) and reacting the mixture at 20° to 30°C for 7 hours to obtain a polyamic acid composition of the present invention as a pale yellow transparent solution. The polyamic acid contained in the solution had an inherent viscosity of 1.5 dℓ/g as measured in NMP as a solvent. Example 7 Employing the same apparatus and manner as in Example 1, NMP (500 mℓ), PDA (13.82 g, 0.128 mol), 4-aminophenyltrimethoxysilane (5.45 g, 0.0256 mol), BPDA (18.81 g, 0.0639 mol) and PMDA (18.59 g, 0.0852 mol) were fed in the flask, followed by reacting the mixture at 15° to 30°C for 24 hours to obtain a polyamic acid composition of the present invention as a pale yellow transparent solution. The polyamic acid contained in the solution had an inherent viscosity of 1.1 dℓ/g as measured in NMP as a solvent. Comparative example 1 Employing the same apparatus and manner as in Example 1, NMP (500 mℓ), PDA (16.82 g, 0.156 mol), BPDA (22.89 g, 0.0778 mol) and PMDA (16.97 g, 0.0778 mol) were fed in the flask, followed by reacting the mixture at 20° to 30°C for 15 hours to obtain a polyamic acid composition as a pale yellow transparent solution. The polyamic acid contained in the solution has an inherent viscosity of 2.5 dℓ/g as measured in NMP as a solvent. Comparative example 2 Employing the same apparatus and manner as in Example 1, NMP (500 mℓ), PDA (16.92 g, 0.157 mol), PMDA (40.95 g, 0.188 mol) and 4-aminophenyltrimethoxysilane (11.68 g, 0.0548 mol) were fed in the flask, followed by reacting the mixture at 20° to 35°C for 20 hours, but no transparent solution was obtained and the resulting product remained a turbid liquid. This fact of the turbid state evidences that the liquid was heterogeneous and means that a film prepared therefrom has projections and depressions and hence the product has no practical value. Comparative example 3 Employing the same apparatus and manner as in Example 1, NMP (500 mℓ), 4,4′-diaminopdiphenyl ether (21.05 g, 0.105 mol), 3,3′,4,4′-benzophenonetetracarboxylic acid dianhydride (40.65g, 0.126 mol) and 4-aminophenyltrimethoxysilane (7.85 g, 0.0368 mol) were fed in the flask, followed by reacting the mixture at 15° to 30°C for 12 hours to obtain a polyamic acid composition as a pale yellow transparent solution. The polyamic acid contained in the solution had an inherent viscosity of 1.9 dℓ/g as measured in NMP as a solvent. Comparative example 4 Employing the same apparatus and manner as in Example 1, NMP (500 mℓ), 4,4′-diaminodiphenyl ether (21.05 g, 0.105 mol), 3,3′,4,4′-benzophenonetetracarboxylic acid dianhydride (40.65 g, 0.126 mol) and 4-aminophenyltrimethoxysilane (8.97 g, 0.0421 mol) were fed in the flask, followed by reacting the mixture at 15° to 30°C, for 12 hours to obtain a polyamic acid composition as a pale yellow transparent solution. The polyamic acid contained in the solution had an inherent viscosity of 1.9 dℓ/g as measured in NMP as a solvent. For reference, the quantities of the raw materials A¹, A², B and C used in Examples 1 to 7 and Comparative examples 1 to 4 and the values of and are shown in Table 1. Example 8 The following adhesion tests were carried out: Various kinds of coating solutions obtained in Examples and Comparative examples shown in Table 1 were respectively coated onto the respective surfaces of a slide glass, an aluminum sheet and a copper sheet, by means of a spinner, followed by preliminarily drying the resulting materials at 100°C for one hour and then baking them at 300°C for one hour to form coatings of 1 to 2 um thick. The respective three kinds of coatings prepared from 10 kinds of the coating solutions were each notched to finely divide each coating into small square pieces of 2 mm side, followed by applying a cellophane tape onto the coating and just thereafter stripping off it. The respective numbers of the small pieces of the coating stripped off along with the cellophane tape per 100 small pieces thereof at that time are shown in the column of adhesion in Table 2. As apparent from the results shown in the Table, the polyimide of the present invention has a superior adhesion onto various substates. Example 9 Various kinds of coating solutions obtained in Examples and Comparative examples shown in Table 1 were each uniformly coated onto a polyester film by means of a coater, followed by drying the resulting films in a dryer at 100°C for one hour to remove most part of the solvent and thereby form a film thereon. This film was stripped off from the polyester film, followed by fixing the film at its periphery by means of two iron plates and then baking it in an electric furnace in nitrogen atmosphere at 200°C for one hour and successively at 350°C for one hour to obtain a polyimide film of about 40 µm thickness. This film was heated from room temperature up to 450°C in nitrogen atmosphere by means of a thermo-mechanical analyzer (TM-700, trademark of an instrument manufactured by Shinku Riko Company) to observe the quantity of its length changed and thereby seek its thermal expansion coefficient (linear expansion coefficient). As to the thermal expansion coefficient, its average value at 30° to 450°C was sought. The results are shown in Table 2. As apparent from the results, the polyimide of the present invention has a small thermal expansion coefficient over a broad temperature range. Nos. of Example and Comp. ex. Thermal expansion coefficient (x10⁻⁵deg⁻¹) Adhesion onto slide glass onto Aℓ plate onto Cu plate Example 1 0.9 0 0 0 Example 2 0.8 0 0 0 Example 3 1.8 0 0 0 Example 4 1.1 0 0 0 Example 5 1.3 0 0 0 Example 6 1.6 0 0 0 Example 7 1.5 0 0 0 Comp. ex. 1 3.1 100 0 100 Comp. ex. 3 8.2 0 0 0 Comp. ex. 4 8.2 0 30 30

Claims: A process for producing a silicon-containing polyamic acid having an inherent viscosity of 0.05 to 5 dl/g (as measured in N-methyl-2-pyrrolidone in a concentration of 0.5 g/dl at 30°± 0.01°C), which process comprises reacting A¹ mols of pyromellitic dianhydride (PMDA) and A² mols of 3,3', 4,4'-biphenyltetracarboxylic anhydride (BPDA), the values A¹ and A² satisfying the relationship with B mols of a diamine of the formula: (in which R¹ is a halogen atom or a methyl, ethyl, methoxy or ethoxy group; m is 0, 1 or 2; and n is 1 or 2); and C mols of an aminosilicon compound of the formula: (in which R² is a C₁-C₆ alkyl group, a phenyl group or a phenyl group substituted with a C₁-C₆ alkyl group; X is a hydrolysable alkoxy or acetoxy groups or a halogen atom; and k is 1, 2 or 3); the values B and C satisfying the relationship: A process according to claim 1 wherein the diamine is reacted with from 0.9 to 1.1 mols, per mol of diamine, of a mixture of PMDA with BPDA containing at least 30 ml % of BPDA, followed by adding additional quantities of PMDA and/or BPDA and the aminosilicon compound, and then reacting the resulting mixture. A process according to claim 1 or claim 2 wherein the reaction is carried out so that the amounts of the starting material satisfy the expression: A process according to any one of claims 1 - 3 in which the aminosilicon compound has the formula: (in which R³ is a methyl or ethyl group). A process for producing a silicon-containing polyimide, which process comprises baking a solution of a silicon-containing polyamic acid produced according to any of the preceding claims, at 50° to 500°C.

Inventors: KONOTSUNE, SHIRO, KUNINUNE, KOUICHI, KUTSUZAWA, YOSHIYA
Applicants: CHISSO CORPORATION
Application year: 1988
Main classification: C08G73
IPC codes: C08G73, G02F1, C09J179