Liquid crystal display device

Abstract: A liquid crystal display device comprising an insulating substrate, a plurality of transparent electrodes disposed on the insulating substrate in a matrix fashion to form a plurality of pixels, at least two thin film transistors (2, 3) disposed in the vicinity of each of the transparent electrodes (1) on the insulating substrate, each the thin film transistor having a drain electrode (4, 5), a source electrode (6, 7) and a gate electrode (8, 9), in which the drain electrode is connected to the transparent electrode, a gate electrode line (G1, Gm) for each line or column of the transparent electrodes disposed on the insulating substrate in the vicinity thereof, each the gate electrode of the thin film transistors connected to each of the transparent electrodes of the line or column being connected in common thereto, and source electrode lines (S1, Snt1) for each column or line of the transparent electrodes disposed on the insulating substrate in the vicinity thereof and at a right angle to the gate electrode line, the number of the source electrode lines being equal to the number of the thin film transistors connected to one transparent electrode, in each the source electrode of the thin film transistors connected to each the transparent electrode of the column or line being connected respectively thereto in a manner capable of connection to an exterior circuit.

Description: The present invention relates to a liquid crystal display device, specifically to an active-matrix liquid crystal display device in which a plurality of thin film transistors for driving the pixels thereof are connected to transparent electrodes which form the pixels. In a conventional active-matrix liquid crystal display device, as shown in Fig. 4, one thin film transistor b for driving each pixel is respectively connected to each of the transparent electrodes a (indium tin oxide) arranged in a matrix fashion to form each pixel. The drain electrode c of the thin film transistor b is connected to the transparent electrode a , the source electrode d of the transistor b is connected to a common source electrode line e on each column of the matrix, and the gate electrode f of the transistor b is connected to a common gate electrode line g on each row of the matrix. The above-described transparent electrodes a , thin film transistors b , source electrode lines e on each column, and gate electrode lines g on each row are formed on an insulating substrate h . In the liquid crystal display device having the above-mentioned structure, the characteristic inspection of the thin film transistor b is conducted by bringing a needle-shaped probe into contact (pressure contact) with the transparent electrode a of the pixel which is connected to the drain electrode c of the thin film transistor b , and a voltage is applied to the source electrode d , which is not less than a threshold voltage applied to the gate electrode f , and the resulting current flow into the transparent electrode a is measured. However, with the inspection method described above, it is difficult to test all of the thin film transistors because of the presence of narrow pitches of the transparent electrodes a and because of the large number of pixels. In addition, the contact of the needle-shaped probe and the transparent electrode of the pixel is prone to damage the thin film transistor b , and in the case of a colour liquid crystal display device, in inspecting the characteristics of the thin film transistor b , a defect in the pixel has been judged to have occurred by performing black-and-white display, and therefore the manufacturing cost has been high. Also, in JP-A-61-249078, a matrix-type display device is described wherein two thin film transistors are provided for one pixel electrode, and a bypass is disposed in the source electrode line. Either of the thin film transistors is utilized for a method of correcting a defect caused by a short-circuit between the gate electrode line and the source electrode line, a short-circuit between the source electrode and the drain electrode, a short-circuit between the gate electrode and the drain electrode, or a break between the drain electrode and the pixel electrode; thereby the reliability of the display device can be secured. However, in the matrix-type display device as shown in JP-A-61-249078, when a defective thin film transistor is separated from the pixel electrode by etching or laser cutting, this results in greater time lost and higher costs required for inspection and correction, especially in mass-production. The present invention has been achieved in the light of the above-mentioned circumstances, and has as its purpose to provide a liquid crystal display device which will allow characteristic inspection of the thin film transistor for driving a pixel without damaging the thin film transistor. From EP-A-0 031 143, it is known to provide two or more transistors for driving a pixel element and to connect these transistors to bus lines extending on both sides of a picture electrode thereof. This arrangement is disadvantageous because bus lines driving different pixel elements come to be adjacent one another, which gives rise to cross-talk problems. Furthermore, a short-circuit may develop between the adjacent bus lines. In one aspect, the invention provides a liquid crystal display device comprising: a plurality of pixel elements arranged in a matrix of rows and columns, each pixel element comprising a transparent pixel electrode and at least two thin film transistors whose drain terminals are commonly connected to the pixel electrode; a plurality of gate lines, each one line being arranged for each row or column of the matrix; and a plurality of groups of source lines, each group being arranged for each column or row of the matrix, each group comprising a number of source lines equal to the number of said thin film transistors of the pixel element, wherein: each pixel element is connected to a respective combination of one of said gate lines and one of said groups of source lines by the gate terminals of its said thin film transistors which are commonly connected to said one gate line and by the source terminals of its said thin film transistors which are separately connected to the source lines of said one group; and each group of source lines lies to one side of the column or row of pixel elements to which it is connected. The transparent electrode is preferably an indium tin oxide film which is formed by a physical method such as electron beam evaporation, resistance heat evaporation or sputtering, or by a chemical method such as spraying or the CVD method. Also, for the thin film transistor, a semiconductor material such as polycrystalline silicon, amorphous silicon, Te or CdSe is used, and may be fabricated by a conventional method in this field. Furthermore, the gate lines and the source lines are preferably formed with metals such as Ta, Mo, Ti or Al. The gate lines are preferably disposed in the vicinity of the transparent pixel electrodes in parallel to the row direction of the matrix and the source lines are preferably disposed in the vicinity of the transparent pixel electrodes in parallel to the column direction. Here, the word vicinity as is commonly understood in the field refers to the necessary spacing between the transparent electrodes and the gate and source lines. In another aspect, the invention provides a method of testing a liquid crystal display device, said device comprising a plurality of pixel elements, each including a transparent electrode and at least first and second thin film transistors, the sources of each of the first and second thin film transistors being separately connected to first and second source lines, their drains being commonly connected to the transparent electrode, and their gates being commonly connected to a gate line so that the first and second transistors provide a path interconnecting the first and second source lines when the transistors are in their conductive state, the method comprising the steps of: energizing said gate line to render the transistors conductive; applying a voltage across said first and second source lines; measuring a current passing through said first and second source lines under the condition that at least one of said source lines is connected to ground through an amperemeter; and comparing the measured current with a predetermined value corresponding to said transistors in the conductive state. Fig. 1 is a fragmental structural schematic view showing a wiring structure of an embodiment in accordance with the present invention. Fig. 2 is an electric wiring diagram for explaining a method of inspecting the characteristics of a thin film transistor of the embodiment. Fig. 3 is a fragmental structural schematic view showing the final connection structure of the source electrode lines of the embodiment. Fig. 4 is a partial structural schematic view of prior art. In Fig. 1, numeral 1 designates transparent electrodes, which are disposed on an insulating substrate (not illustrated), for example, a glass substrate, in a matrix fashion to form a plurality of pixels. For the transparent electrode 1, an ITO (indium tin oxide) film is preferable. Connected to each transparent electrode 1, are each of the drain electrodes 4 and 5 and a plurality of, for example, two thin film transistors 2 and 3 for the driving pixel made and disposed on the insulating substrate by a conventional method in this field. Also, the source electrodes 6 of the thin film transistors 2 in the direction of the same column are connected to one common source electrode line S1, and the source electrodes 7 of the thin film transistors 3 are connected to a source electrode line S2. Similarly, the respective thin film transistors 2 and 3 in the column direction of the n-th column are connected to source electrode lines Sn and Sn+1, respectively. This means that the number of source electrode lines per column of pixels is equal to the number of thin film transistors connected to one transparent electrode. The source electrode lines are formed on the insulating substrate in a manner capable of connecting the respective source electrodes 6 and 7 to an exterior circuit which will be described later. Each of the source electrode lines S1, S2, ..., Sn, Sn+1 is disposed in the vicinity of a column constituted by the respective transparent electrodes 1 which run parallel to the direction of that column, with the width separation preferably about 10 - about 15 µm. Furthermore, the gate electrodes 8 and 9 of the respective transistors 2 and 3 arrayed in the direction of the same row are connected to one of the gate electrode lines G1, G2, ..., Gm which are disposed on each row in the vicinity of the respective transparent electrodes 1 which run parallel to the gate electrode lines. Accordingly, the respective source electrode lines S1, S2, ..., Sn, Sn+1 are orthogonal to the respective gate electrode lines G1, G2, ..., Gm. The respective thin film transistors 2 and 3 are formed between the transparent electrodes 1 of the respective rows and the gate electrode lines G1, G2, ..., Gm of the respective rows. Next, a method of inspecting characteristics of the thin film transistors 2 and 3 in this embodiment is described with reference to Fig. 2. As shown in Fig. 2, a voltage for driving thin film transistors is applied from an exterior circuit to the gate electrode line G1 which is connected to the gate electrodes 8 and 9 of the thin film transistors 2 and 3 to be tested. At this location on the first column, a power source 11 of a voltage of +V is connected to the source electrode line S1 through an external switch 10. Then, an amperemeter 12 is connected to the source electrode line S2. In the above-mentioned state, if the thin film transistors 2 and 3 are normal, a current flows from the source electrode 6 to the drain electrode 4 of the thin film transistor 2, and further flows from the drain electrode 5 to the source electrode 7 of the thin film transistor 3. Accordingly, the amperemeter 12 connected to the source electrode line S2 should indicate a predetermined current value. In contrast to the above-mentioned situation, if either or both of the thin film transistors 2 and 3 are defective, the amperemeter 12 does not indicate the predetermined current value, and therefore the abnormal (defective) thin film transistors 2 and/or 3 are detected. Similarly, testing the thin film transistors 2 and 3 of the first column can be conducted by applying the voltage for driving thin film transistors applied to the gate electrode line G1 sequentially to the gate electrode lines G2, ..., Gm from the above-mentioned state of connection in a switching-over fashion. Furthermore, the power source 11 and the amperemeter 12 are connected to the respective source electrode lines S3, S4, ..., Sn, Sn+1 in a sequential switching-over fashion, and as mentioned above, the voltage for driving thin film transistors is applied to the gate electrode lines G1, G2, ..., Gm in a sequential switching-over fashion. Thereby the characteristic inspection of all the thin film transistors 2 and 3 can be conducted. As shown in Fig. 3, after completing the characteristic inspection, two of the source electrode lines S1, S2, S3, S4, ..., Sn, Sn+1, which form a pair on each column, are short-circuited, and thereby two thin film transistors 2 and 3 for the driving pixel are connected to one transparent electrode. In addition, in the above-mentioned embodiment, the case with two thin film transistors is described, but the number of the thin film transistors may be three or more, and in this case, the drain electrodes of the respective transistors are connected commonly to the transparent electrode, and the source electrodes are connected separately to the source electrode lines. Then, in conducting the characteristic inspection of the thin film transistor, the voltage is applied to one source electrode line, and the amperemeters are connected to the rest of the source electrode lines, and thereby characteristics of a plurality of thin film transistors connected to one transparent electrode can be inspected by the same method. Therefore, in accordance with the present invention, the testing of the thin film transistor for the driving pixel can be easily conducted without damaging the thin film transistor. If the characteristics of even one or more of the thin film transistors connected to one transparent electrode is at a certain level or greater, a liquid crystal display device can be made which does not produce a point defect and does not diminish the quality of its display. The invention being thus described, it will be obvious that the same may be varied in many ways. Such variations are not to be regarded as a departure from the scope of the invention.

Claims: A liquid crystal display device comprising: a plurality of pixel elements arranged in a matrix of rows and columns, each pixel element comprising a transparent pixel electrode (1) and at least two thin film transistors (2,3) whose drain terminals (4,5) are commonly connected to the pixel electrode; a plurality of gate lines (G1 - Gm), each one line being arranged for each row or column of the matrix; and a plurality of groups of source lines (S1,S2; S3,S4;Sn,Sn+1), each group being arranged for each column or row of the matrix, each group comprising a number of source lines equal to the number of said thin film transistors of the pixel element, wherein: each pixel element is connected to a respective combination of one of said gate lines (G1) and one of said groups of source lines (S1,S2) by the gate terminals (8,9) of its said thin film transistors which are commonly connected to said one gate line (G1) and by the source terminals (6;7) of its said thin film transistors which are separately connected to the source lines (S1;S2) of said one group; and each group of source lines (S1,S2;S3,S4;Sn,Sn+1) lies to one side of the column or row of pixel elements to which it is connected. A liquid crystal display device in accordance with claim 1, wherein the transparent pixel electrode (1) comprises an indium tin oxide film. A liquid crystal display device in accordance with claim 1 or claim 2, wherein the gate lines (G1 - Gm) extend parallel to the row direction of the matrix and the source lines (S1 - Sn+1) extend parallel to the column direction of the matrix. A method of testing a liquid crystal display device, said device comprising a plurality of pixel elements, each including a transparent electrode (1) and at least first and second thin film transistors (2,3), the sources (6,7) of each of the first and second thin film transistors being separately connected to first and second source lines (S1,S2), their drains (4,5) being commonly connected to the transparent electrode, and their gates (8,9) being commonly connected to a gate line (G1) so that the first and second transistors provide a path interconnecting the first and second source lines when the transistors are in their conductive state, the method comprising the steps of: energizing said gate line (G1) to render the transistors (2,3) conductive; applying a voltage across said first and second source lines (S1,S2); measuring a current passing through said first and second source lines under the condition that at least one of said source lines is connected to ground through an amperemeter; and comparing the measured current with a predetermined value corresponding to said transistors in the conductive state.

Inventors: MITSUMUNE TOSHIFUMI, NAKAZAWA KIYOSHI, TAKE HIROSHI, MITSUMUNE, TOSHIFUMI, NAKAZAWA, KIYOSHI, TAKE, HIROSHI
Applicants: SHARP KK, SHARP KABUSHIKI KAISHA
Application year: 1988
Main classification: G02F1
IPC codes: G09G3, G02F1, G09F9, G01R31, H01L27