COATING FLUID FOR FORMING ELECTROCONDUCTIVE COAT

Abstract: A coating fluid for the production of electroconductive coatings (e.g. on glass or plastics) contains (a) an oxyacid salt of zirconium; (b) a conductive material; (c) water; (d) an organic solvent; (e) a stabiliser and pref. also (f) a non-precipitating silica soln. or silicon alkoxide. Pref. (a) is Zr oxychloride, oxynitrate or oxyacetate; (b) is tin oxide, indium oxide, tin oxide doped with Sb and with F or P, or indium oxide doped with Sn and F; (d) is an alcohol, ester, ether or ketone; (e) is ethylene glycol, N-methyl-2-pyrrolidone, ethylcellosolve, methlcellosolve or DMF. The silicon alkoxide is pref. SiHa(OR)b where R is alkyl, a is 0-3, b is 1-4, (a+b) is 4; or is (R'O)aSi(OR)b or (R')aSi(OR)b (R' is alkyl, others as above). Pref. the composition contains 33.3-83.3% conductive material, 0.8-65.9% Zr oxide and 0.8-65.9% Si oxide (by wt.).

Description: This invention relates to coating liquids for forming conductive coatings, to glass or plastic substrates provided on the surface thereof with transparent conductive coatings, to display devices having front panels provided on the surface thereof with said transparent conductive coatings and to a method of processing said display devices. Since glass or plastics which are used as transparent substrates for, for example, front panels for Cathode ray tubes (CRT) and liquid crystal display (LCD) are insulating materials, the surface thereof is liable to static electrification and hence the substrate surface tends to attract dust, for example. Furthermore, in electrodisplay devices such as a LCD mis performance is sometimes caused by the presence of static electricity. For solving such problems, attempts have often been made to prevent such substrates as for example glass and plastics from being electrostatically charged by virtue of imparting electrical conductivity to the surface thereof. In order to impart electrical conductivity to substrates, metallic thin films or conductive inorganic oxide coatings were deposited on the surface of substrate by the vapor phase method such as CVD method or PVD vapor deposition methods. In an attempt to impart electrical conductivity to the substrate surface by the vapor phase method, however, there are such problems that vacuum deposition apparatus is required, and that the surface area or shape of the substrate on which a desired coating is formed is restricted by the size of said apparatus to be employed. In light of the above problems, a process for imparting electrical conductivity to a substrate has been proposed, which process comprises coating the substrate surface with a conductive coating material obtained by dispersing conductive substances in binder resins. However, where an attempt was made to form a conductive coating on a substrate by using conductive coating materials obtained by dispersing conductive substances in binder resins such as acrylic resins, butyral resins and vinyl chloride/vinyl acetate copolymer resins, there were serious problems because the conductive coatings formed thereby were found to be poor in transparency, scratch resistance, solvent resistance or in adhesion to the substrates, though said conductive coatings are excellent with respect to electrical conductivity. Under such circumstances, coating liquids for forming conductive coatings which are excellent in scratch resistance, solvent resistance and in adhesion to substrates as well as transparency have been required. EP-A-114282 describes a process for the production of transparent, electrically conducting infra-red reflecting indium oxide-tin oxide layers. The process requires the formation of a barrier layer from a solution containing a hydrolysable silicon compound and a hydrolysable compound of titanium, zirconium, aluminium, tin or tantalum, or a mixture thereof, drying of the barrier layer followed by formation on the barrier layer of an indium oxide-tin oxide layer formed from a solution of hydrolysable compounds of indium and tin. Apart from the purpose of forming conductive coatings on substrates, however, JP-A-100943/1982 discloses silicon oxide coatings containing 1-30 mol% of zirconium oxide with a view to protecting the substrate surface and inhibiting reflection therefrom. In this publication, it is stated that in the zirconium oxide-silicon oxide coatings zirconium chlorides such as ZrCl 2 , ZrCl 3 or Zrcl 4 ; zirconium nitrate such as Zr(NO 3 ) 4 ⊙5H 2 O; and zirconium alkoxides and zirconium diketonates are used as zirconium compounds. However, when an attempt is made to form the zirconium oxide-silicon oxide coatings by using coating liquids containing zirconium chloride, zirconium nitrate, zirconium alkoxide or zirconium diketonate and silicon alkoxide, it has been found by the present inventors that there is a serious problem that, because of the instability of zirconium chloride and zirconium nitrate in water, the coating liquids containing the same cannot be preserved over a long period of time and have a short pot-life. Moreover, even if zirconium oxide-silicon oxide coatings were formed by the use of the above-mentioned coating liquids containing zirconium chloride and the like, it was still necessary to fire the resultant coatings at a temperature of at least 450°C. Moreover, the coating liquids as described above present the problem that they must be adjusted to pH 2-6 by a fresh addition thereto of a mineral acid such as hydrochloric acid at the time when the silicon alkoxide contained therein is hydrolyzed. On one hand, front panels of display devices are required in some cases to have a specular reflection reducing effect (hereinafter called non-glare) in order to inhibit glare of said front panels, in addition to their antistatic effect. In order to impart non-glare and antistatic effect to front panels of display devices, a process designed for the purpose intended is disclosed, for example, in JP-A-16452/1986, wherein the front panel composed of glass or plastics is a heated, and a colloidal solution of a silicon compound such as partially hydrolyzed silicic acid ester, a solution of reactive silicon compound such as silicon tetrachloride, or a solution prepared by mixing the above-mentioned solution with a water-soluble compound of inorganic metal such as platinum, gold, palladium, tin or the like is sprayed over said front panel to form thereon a finely irregular coating, followed by drying and firing. A process for forming a coating layer on the front panel of a Braun tube is also disclosed, for example, in JP-A-168951/1984, wherein tin oxide or indium oxide and silicon oxide are mixed or laminated by the vacuum deposition or dip method to form a coating layer on the front panel. However, in front panels of display devices processed by the above-mentioned processes the non-glare attained was found to be insufficient, the expected antistatic effect varied depending on ambient temperature and humidity, and under certain circumstances the resolving power of the display devices was reduced by the presence of the coating formed on the front panel. Further, the finely irregular coatings as formed showed poor adhesion to the front panel and easily peeled off, were liable to scratching due to their low mechanical strength, and tended to peel off or elute due to their lack of permanence properties such as acid resistance, alkali resistance, resistance to saline solutions and to water. Thus, no nonglare and antistatic effect as expected could be maintained over a long period of time. The present invention is intended to solve such problems associated with the prior art as mentioned above. The present invention seeks to provide coating liquids for forming conductive coatings, which liquids are capable of being formed on substrates, for example, glass and plastics substrates, the conductive coatings having excellent scratch resistance, permanence properties, adhesion to the substrates and transparency and, at the same time, which are capable of being preserved with excellent stability over a long period of time. The present invention intends to provides glass or plastics substrates provided with transparent conductive coatings formed by the use of such coating liquids as mentioned above, said conductive coatings having excellent antistatic and non-glare effect in addition to the above-mentioned properties. The present invention further seeks to provide display devices having front panels provided with transparent conductive coatings having the above-mentioned properties. The first coating liquid of the present invention for a forming conductive coating is characterized in that a zirconium oxy salt and a conductive substance are dissolved or dispersed homogeneously in a mixed solvent comprising water, an organic solvent and a stabilizer. The second coating liquid of the present invention for a forming conductive coating is characterized in that a zirconium oxy salt, non-sedimentary silica and a conductive substance are dissolved or dispersed homogeneously in a mixed solvent comprising water, an organic solvent and a stabilizer. The third coating liquid of the present invention for a forming conductive coating is characterized in that a zirconium oxy salt, a silicon alkoxide or a silicon alkoxide derivative and a conductive substance are dissolved or dispersed homogeneously in a mixed solvent comprising water and an organic solvent. The fourth coating liquid of the present invention for forming a conductive coating is characterized in that a zirconium oxy salt, a silicon alkoxide or a silicon alkoxide derivative, non-sedimentary silica and a conductive substance are homogeneously dissolved or dispersed in a mixed solvent comprising water, an organic solvent and a stabilizer. The fifth coating liquid of the present invention for a forming conductive coating is characterized in that diacetylacetonato-dialkoxide zirconium, a partial hydrolysate of silicon alkoxide or a derivative thereof and a conductive substance are dissolved or dispersed homogeneously in a mixed solvent comprising water and an organic solvent. The substrates which may be used in the present invention, on which transparent conductive coatings have been formed, are typically characterized by having a total light transmission of at least 80%, a haze of less than 10%, 10 3 ≦ surface resistivity ≦ 10 11 , Ω/□, and a glossiness of less than 190% as measured at an angle of 60° in accordance with the glossiness measuring method stipulated in JIS K 7105-81. The display device of the present invention, in which a transparent conductive coating has been formed on the surface of a front panel, is characterized in that the transparent conductive coating is composed of zirconium oxy salt, a silicon compound and a conductive substance, and the front panel, on the surface of which said transparent conductive coating has been formed, typically has a glossiness of 30-100% as measured at an angle of 60° in accordance with the glossiness measuring method stipulated in JIS K 7105-81, a resolving power of at least 50 bars/cm, and a surface resistivity of 10 3 -10 11 Ω/□. The first process for manufacturing the display device of the present invention is characterized in that any one of the above-mentioned second to fifth coating liquids for forming conductive coatings of the present invention is coated by spraying on a front panel of said display device previously heated to and maintained at 40-90°C, followed by drying and/or firing. The second process for manufacturing the display device of the present invention is characterized in that any one of the above-mentioned coating liquids for forming conductive coatings is coated likewise on a front panel of said display device, dried and/or fired, and a coating liquid containing a transparent protective component is coated by the spray method on the front panel heated to and maintained at 40-90°C, followed by drying and/or firing. The first coating liquid for forming conductive coating of the present invention comprises a homogeneous solution or dispersion of a zirconium oxy salt and a conductive substance in a mixed solvent comprising water, an organic solvent and a stabilizer. The components homogeneously dissolved or dispersed in the mixed solvent are illustrated hereinafter. Examples of zirconium oxy salts which may be use include zirconium oxychloride, zirconium oxynitrate, zirconium oxyacetate and zirconium oxyoxalate. Of those exemplified above, zirconium oxychloride and zirconium oxynitrate are particularly preferred. Such zirconium oxy salts dissolve in water and organic solvents such as alcohols and the resulting solution is made acidic when water is present therein. The conductive substances which may be used in the present invention include those which are known hitherto such as tin oxide, doped tin oxide, for example, tin oxide doped with antimony, fluorine or phosphorus, indium oxide or doped indium oxide, for example, indium oxide doped with tin or fluoride. These conductive substances are preferably in the form of fine particles having an average particle diameter of less than 0.4 µm. In the application of the present first coating liquid of the present invention to the front glass of a display device such as a CRT or LCD or to the glass of a copying machine where a high transparency with a low haze is required, it is preferable to use in said coating liquid conductive substances having an average particle diameter of 0.01-0.1 µm. Even though the average particle diameter of the conductive substance contained in the coating liquid is typically less than 0.1 µm, the transparency of the substrate to which said coating liquid has been applied will decrease if the major proportion of the conductive substance particles has a particle diameter exceeding 0.1 µm. It is preferable that at least 60% of the particles have an average particle diameter of less than 0.1 µm. In the present invention, it is particularly preferable to use as the conductive substances the products which are obtained on the basis of the process disclosed in Japanese Patent Appln. No. 51008/1987 or Japanese Patent Appln. No. 75283/1986, both filed by the present applicant. That is, preferably useful as the conductive substances of the above-mentioned products are conductive metallic oxide fine particles which are obtained by the above-cited process, wherein an aqueous solution of a tin or indium compound is maintained at pH 8-12, the compound in the solution is gradually hydrolyzed to form a sol containing colloidal particles, and the resulting sol is dried and fired followed by pulverization. The starting materials used in the above process are tin or indium compounds which are water soluble and capable of hydrolysis in the pH range of 8-12. Examples of such tin compounds include potassium stannate and sodium stannate and examples of such indium compounds include indium nitrate and indium sulfate. When a metallic seed present in an aqueous solution of a tin or indium compound (hereinafter referred to as the starting solution) is either one of tin or indium, the resulting fine particles are composed of tin oxide or indium oxide. In that case, however, conductive fine particles doped with a foreign element can be obtained by dissolving small amounts of a compound containing said foreign element in the starting solution. For instance, conductive fine particles composed of tin oxide doped with antimony or fluorine can be obtained by dissolving small amounts of tartar emetic (antimonyl potassium tartrate) or ammonium fluoride in the starting solution containing the tin compound, and conductive fine particles composed of indium oxide doped with tin can be obtained by dissolving small amounts of a tin compound in the starting solution containing the indium compound. Conductive particles doped with foreign metallic elements may also be prepared by the following processes. That is, conductive fine particles composed of a tin compound doped with, for example, antimony, phosphorus and/or fluorine can be prepared by a process which comprises using an aqueous solution of a tin compound as the starting solution, gradually hydrolyzing the tin compound in the solution under the aforementioned pH condition to form a sol, recovering colloidal particles from the resulting sol, impregnating the recovered colloidal particles with an aqueous solution of at least one of an antimony compound, phosphorus compound and fluorine compound, and thereafter drying the thus impregnated colloidal particles, followed by firing. Furthermore, conductive fine particles composed of an indium compound doped with tin and/or fluorine can be prepared by a process which comprises using an aqueous solution of an indium compound as the starting solution, forming a sol in the same manner as above, recovering colloidal particles from the thus formed sol, impregnating the recovered colloidal particles with an aqueous solution of a tin compound and/or a fluorine compound, and then drying the thus pregnated particles, followed by firing. In cases where the starting solution, even of an aqueous solution of a tin compound or an indium compound, is used, when by-product salts are formed during the step of forming the sol, not only colloidal particles formed in the sol tend to agglomerate but also the specific resistivity of the conductive fine particles obtained becomes higher by virtue of admixture with the by-product salts formed. It is therefore recommended that where formation of by-product salts is expected, the by-products salts as formed are washed to remove then from colloidal particles recovered from the sol formed by hydrolysis, prior to impregnation of the colloidal particles with an aqueous solution of the metallic compound. Generally speaking, the concentration of the tin or indium compound contained in the starting solution is preferably in the range of 5-30% by weight. Usually, the reaction temperature of the hydrolysis may be selected in the range of from 30° to 90°C. After preparation of the sol liquid, colloidal particles formed therein are recovered by filtration, and the colloidal particles recovered are rinsed to remove by-product salts and the like attached to said particles, dried, fired and then pulverized to obtain conductive fine particles. The fine particles thus obtained are sintered to a certain extent during the firing step and an average particle diameter of about 20-50 µm is achieved. The particles are easily released from their sintered state when subjected to the subsequent pulverizing step, and the fine particles are then processed by an ordinary pulverization means to give fine conductive particles having the properties required in the present invention. The conductive particles have an average particle diameter of less than about 0.4 µm when they are incorporated into coating materials. The fine particles obtained in the manner described are found to contain only small amounts of coarse particles, for example, those having a particle diameter larger than 0.8 µm. Pulverization of the conductive substances may be carried out before or after mixing thereof with other components for example, with zirconium oxy salts . The conductive substances can be pulverized by conventionally known methods, for example, those utilizing an attritor, sand mill, ball mill, triple roll or similar devices. The conductive substances thus obtained may be used as they are when they are particles, or they can also be used after dispersing them in water or organic solvents. The conductive substance preferably used in the present invention is a conductive tin oxide sol obtained by heat treatment of fine particles of tin oxide or tin oxide doped with foreign elements in aqueous acid or alkali solutions. The fine particles of tin oxide or tin oxide doped with foreign elements used herein may be those obtained by the first process mentioned previously, or those obtained by conventionally known methods. This conductive tin oxide sol may be obtained by heat treatment of the above-mentioned fine particles of tin oxides in aqueous solutions of acids such as mineral acids or organic acids or aqueous solutions of alkalis such as alkali metal hydroxides or quaternary ammonium salts. The heating temperature employed in this case is preferably less than about 200°C. Suitable amounts of the acid or alkali used in the aqueous solutions is at least 5% by weight based on the fine particles to be treated. An average particle diameter of particles dispersed in the conductive tin oxide sol thus obtained is less than 0.1 µm, and more than 60% of the particles have an average particle diameter of less than 0.1 µm. The above-mentioned conductive tin oxide sol is usually an aqueous sol, but it may also be used as an organic sol, if necessary, in which a part or all of the water has been replaced by an organic solvent such as an alcohol. Examples of organic solvents which may be used in the coating liquids of the present invention include alcohols such as methanol, ethanol, n-propanol, i-propanol, n-butanol, i-butanol and t-butanol, esters such as methyl acetate and ethyl acetate, ethers such as diethyl ether, and ketones such as methyl ethyl ketone, and ethylene glycol monomethyl ether, which are used either singly or in combination. Examples of stabilizers which may be used in the present coating liquids include, either singly or in combination, ethylene glycol, N-methyl-2-pyrrolidone, morpholine, ethyl cellosolve, methyl cellosolve and N,N-dimethylformamide. In the first coating liquid for forming conductive coating of the present invention which contains the above-mentioned components, the molar ratio of the stabilizer to, the zirconium oxy salt in terms of ZrO 2 (stabilizer / ZrO 2 ) is typically 1-25, preferably 2-25. If the value of this ratio is less than 1, undesirable gellation of the coating liquid tends to occur. When the value exceeds 25, the coating liquid cures inhomogeneously cures when coated on the substrate. This leads to the permanence properties of the conductive coating being poor. The weight of water present in the coating liquid is preferably less than 40% of the total weight of said coating liquid with the condition that the weight ratio of the water to the zirconium oxy salt in terms of ZrO 2 (water/ZrO 2 ) satisfactorily falls within the range of 0.1-40. Typically, if the above-mentioned ratio of water/ZrO 2 is less than 0.1, undesirable gellation of the zirconium oxy salt occurs. When said ratio exceeds 40, the addition effect of the stabilizer disappears, with the result that substrate adhesion is poor. Furthermore, when the weight of the water exceeds 40% of the total weight of the coating liquid, the addition effect of the stabilizer disappears likewise, with the result that adhesion of the coating liquid to the substrate is poor. The sum total of the conductive substance and the zirconium oxy salt in terms of ZrO 2 is preferably 0.1-10% by weight based on the total weight of the coating liquid. It is not economical to use these two components in an amount of less than 0.1% by weight and, on the other hand, if said amount exceeds 10% by weight, undesirable gellation of the coating liquid tends to occur and the possibility of long-term preservation of said coating liquid can not be expected. Still further, the weight ratio of the conductive substance to zirconium oxy salt in terms of ZrO 2 (conductive substance/ZrO 2 ) is preferably 1-5. If this value is less than 1, the electrical conductivity of the resulting conductive coating is poor and, on the other hand, when the value exceeds 5, adhesion between the substrate and the conductive coating formed thereon decreases. The coating liquids for forming the conductive coatings as described above may be prepared by mixing an aqueous solution of a zirconium oxy salt with a conductive substance and a stabilizer and, if necessary, removing part of the water present in the mixture by distillation or ultrafiltration, and thereafter adding an organic solvent to the mixture, followed by homogeneous mixing. The second coating liquid comprises a homogeneous solution or dispersion of a zirconium oxy salt, non-sedimentary silica and a conductive substance in a mixed solvent comprising water, organic solvent and stabilizer. The zirconium oxy salt, conductive substance, water, organic solvent and stabilizer used in the coating liquid are the same as those used in the first coating liquid as described above. The non-sedimentary silica used in the present invention is preferably a liquid of non-sedimentary silica such that when an aqueous solution containing 2.0% by weight in terms of SiO 2 of non-sedimentary silica is subjected to centrifugal sedimentation at 250,000G for 1 now, the sediment left thereby is less than 30% by weight of the total amount of SiO 2 . Such non-sedimentary silica liquid is an aqueous alkali solution of silicic acid, from which the greater part of the alkali has been removed, said non-sedimentary silica liquid being obtained by replacement of alkali with hydrogen in the aqueous alkali solution of silicic acid by means of, for example, an ion exchange or dialysis method. The stabilizer is typically used in the non-sedimentary silica liquid in an amount of at least 0.5 mole based on 1 mole of the non-sedimentary silica. Such a growth inhibitor as the stabilizer mentioned above plays a role in the stabilization of non-sedimentary silica in the liquid by inhibiting gellation of said silica. In this specification the terms growth inhibitor and stabilizer are used interchangeably. In this non-sedimentary silica, it is desirable that the amount of residual alkali represented by the SiO 2 /M 2 O ratio (in which M represents an alkali metal) is at least 200, preferably at least 1000. Such non-sedimentary silica as referred to above is illustrated in detail in Japanese Patent Appln. No. 187835/1986 filed previously by the present applicant. In the second coating liquid of the present invention which contains the components as mentioned above, the molar ratio (stabilizer/ZrO 2 + SiO 2 ) of the number of moles of the stabilizer to the number of the sum total of moles of the zirconium oxy salt in terms of ZrO 2 and of SiO 2 present in the non-sedimentary silica is generally 1-25, preferably 2-25. If this value is less than 1, gellation of the coating liquid tends to occur and the pot life (useful life) of the coating liquid is short and, the other hand, when said value exceeds 25, the coating liquid does not cure homogeneously when it is coated on a substrate, with the result that the conductive coating formed becomes poor with respect to permanence properties. In this second coating liquid, the amount of water present is preferably less than 50% by weight based on the weight of the coating liquid with the condition that the weight ratio (water/ZrO 2 ) of the water to zirconium oxy salt in terms of ZrO 2 is usually 0.1-40. If the water/ZrO 2 weight ratio mentioned above is less than 0.1, the zirconium oxy salt undesirably tends to gel and, on the other hand, if said weight ratio exceeds 40, the addition effect of the growth inhibitor disappears and, undesirably the coating liquid becomes poor with respect to substrate adhesion. Furthermore, if the amount of water used exceeds 50% by weight of the coating liquid, the addition effect of the growth inhibitor also disappears and again, the coating liquid undesirably becomes poor with respect to substrate adhesion. The sum total of the conductive substance, SiO 2 present in the non-sedimentary silica and the zirconium oxy salt in terms of ZrO 2 is usually 0.1-20%, preferably 0.1-10% by weight of the coating liquid. If the value of the said sum total is less than 0.1% by weight, the use of such coating liquid is not economical and, on the other hand, if said value exceeds 20% by weight, undesirably the coating liquid tends to gel and cannot be preserved for a long period of time. The weight ratio (conductive substance/ZrO 2 + SiO 2 ) of the conductive substance to the sum total of the zirconium oxy salt in terms of ZrO 2 and SiO 2 contained in the non-sedimentary silica is preferably 1-5. If the value of this ratio is less than 1, the electrical conductivity of the resulting coating is poor or the coating is not porous and, if this exceeds 5, the resulting coating becomes poor with respect to substrate adhesion. The weight ratio (SiO 2 /ZrO 2 ) of SiO 2 contained in the non-sedimentary silica to the zirconium oxy Salt (in terms of ZrO 2 ) is preferably 0.05 to 1. If the value of this ratio is less than 0.05 adhesion of the conductive coating to the substrate tends to be poor. If the value exceeds 1, the conductive coating tends to be less durable. The second coating liquid as described above may be prepared by mixing together an aqueous solution of the zirconium oxy salt, the conductive substance, stabilizer and a dispersion of the non-sedimentary silica and, if necessary, removing a part of water therefrom by distillation or ultrafiltration, followed by homogeneously mixing the resulting mixture with an organic solvent. The third coating liquid of the present invention contains a homogeneous solution or dispersion of a zirconium oxy salt, a silicon alkoxide or a silicon alkoxide derivative and a conductive substance in a mixed solvent comprising water and an organic solvent. The zirconium oxy salt, conductive substance, water and organic solvent used in the third coating liquid are the same as those used in the first coating liquid for forming conductive coating of the present invention. The silicon alkoxide or silicon alkoxide derivative used in the present invention is generally a compound or condensate (up to pentamers) having 1-4 alkoxy groups of 1 to 8 carbon atoms, said compounds or condensates being represented by the formula SiH a (OR) b (a=0-3, b=1-4, a+b=4, and R is alkyl), (R'O) a si(OR) b or R' a si(OR) b (a=0-3, b=1-4, a+b=4, and R and R' are each alkyl), or derivatives of the compounds or condensates represented by the above-mentioned formulae in which a part of H has been substituted with, for examples, Cl or vinyl. Of those mentioned above, preferred is a mixture of one or two or more compounds represented by the formula Si(OR) 4 (wherein R is CH 3 , C 2 H 5 , n- and iso-C 3 H 7 , or n-, iso-, sec- and tert-C 4 H 8 ). In the third coating liquid of the present invention, which contains the components as mentioned above, the zirconium oxy salt and silicon alkoxide or derivative are typically used in such an amount so that ZrO 2 /SiO 2 (molar ratio) of the zirconium oxy salt in terms of oxide to silicon alkoxide or its derivative in terms of oxide is in the range of 0.05-2.0, preferably 0.2-1.0. If the value of this ZrO 2 /SiO 2 (molar ratio) is less than 0.05, the permanence properties of the resulting coating are poor and, on the other hand, if the value exceeds 2.0, the resulting coating undesirably decreases with respect to substrate adhesion and optical characteristics (haze, total light transmittance). The presence of water in the coating liquid is necessary for the hydrolysis reaction of silicon alkoxide. It is preferable to decide the amount of water in the coating liquid according to the amount of the silicon alkoxide or derivative in the mixture, and desirably the water is contained in the coating liquid in such an amount so that the H 2 O/SiO 2 molar ratio in the mixture of the water to silicon alkoxide or derivative in terms of SiO 2 is at least 2. If the value of this ratio is less than 2, no coating is obtained since undecomposed silicon alkoxide or derivative remains, as it is, even after formation of the coating. The content of the conductive substance, when expressed as MOx in terms of oxide, is preferably in such an amount so that MO x /(SiO 2 + ZrO 2 ) (weight ratio) is 0.5-5.0. If the value of this weight ratio is less than 0.5, undesirably the resulting conductive coating becomes excessively low with respect to its electrical conductivity and, on the other hand, if this value exceeds 5.0, undesirably the resulting conductive coating becomes poor with respect to substrate adhesion. Usually, when the solids content (conductive substance + ZrO 2 + SiO 2 ) in the conductive coating liquid is less than about 20% by weight, a coating having the properties required by the present invention is obtained. However, if this solids concentration exceeds 20% by weight, the stability of the coating liquid is poor and long-term preservation of the coating liquid is not possible. If this solids concentration is excessively low, inconveniently the coating operation of the conductive coating liquid must be repeated several times to obtain a desired coating and hence a practically useful solids concentration is at least about 0.1% by weight. Since water and an organic solvent such as an alcohol are present in this conductive coating liquid as mentioned above, the zirconium oxy salt dissolves in the water and organic solvent, whereby the coating liquid exhibits acidic properties with a pH of less than 2. On this understanding, there is no need to incorporate into the coating liquid an acid catalyst such as hydrochloric acid or nitric acid to hydrolyze the silicon alkoxide or silicon alkoxide derivative. The fourth coating liquid of the present invention contains non-sedimentary silica and a stabilizer in addition to such components as used in the above-mentioned third coating liquid. The non-sedimentary silica and stabilizer used in this coating liquid are the same as those used in the second coating liquid for forming conductive coating of the present invention. When this non-sedimentary silica is used together with the silicon alkoxide or silicon alkoxide derivative in the coating liquid, the total light transmittance of the resulting conductive coating is increased and the transparency of said coating is improved and, moreover, influenced the permanence properties of the coating are not adversely. The non-sedimentary silica is preferably used in such an amount so that the weight ratio (SiO 2 in non-sedimentary silica/SiO 2 in silicon alkoxide or silicon alkoxide derivative) of SiO 2 in the non-sedimentary silica to the silicon alkoxide or derivative in terms of SiO 2 is less than 9. If the value of this weight ratio exceeds 9, the firing temperature of the resulting coating must be increased to about 300°C or higher in order to improve the permanence properties of the coating arises, though transparency of the coating is further improved. Even in the case where the non-sedimentary silica is used, the operation conditions to be employed therein, a such as the ratio of ZrO 2 to total SiO 2 in the coating liquid and the like, are the same as those employed in the aforementioned case where only the silicon alkoxide or silicon alkoxide derivative is used. The third and fourth coating liquids of the present invention may be prepared as follows. The zirconium oxy salt, silicon alkoxide or silicon alkoxide derivative and conductive substance, and if necessary, the non-sedimentary silica and stabilizer, may be homogeneously mixed together in a mixture of water and an organic solvent. In that case, the order of dissolving or dispersing these components is not particularly limited, for instance, an aqueous solution of the zirconium oxy salt may be mixed with the organic solvent such as an alcohol, and the resulting mixture may be incorporated, with an alcoholic solution of the silicon alkoxide or silicon alkoxide derivative, or these solutions mentioned above may be mixed together at a stroke. It is also possible to increase stability of the dispersed particles of the components by incorporating the coating liquid with a surfactant at the time when the above-mentioned solutions are mixed together. The fifth coating liquid for forming conductive coating of the present invention contains a homogeneous solution or dispersion of diacetylacetonato-dialkoxy zirconium, a partial hydrolysate of a silicon alkoxide or silicon alkoxide derivative and a conductive substance in a mixed solvent comprising water and an organic solvent. The conductive substance, water and organic solvent used in this coating liquid are the same as those used in the aforementioned first coating liquid. The diacetylacetonato-dialkoxy zirconium may be sufficiently useful if its alkoxy group has 1 to 8 carbon atoms and is preferably a butoxy group. This diacetylacetonatodialkoxy zirconium improves the dispersibility and heat stability of the conductive substance, and this is considered ascribable to the fact that the diacetylacetonato-dialkoxy zirconium acts as a protective colloid on the conductive substance. The partial hydrolysate of silicon alkoxide or its derivative used in this coating liquid may be obtained by partial hydrolysis of the silicon alkoxide or its derivative used in the third coating liquid for forming conductive coating of the present invention. As the conditions under which the partial hydrolysis is carried out, there may be adopted a procedure generally employed for partial hydrolysis of silicon alkoxide or its derivative. For instance, silicon alkoxide or derivative may be mixed with methanol or ethanol, and this mixture mixed with water and an acid to effect the partial hydrolysis of the silicon alkoxide or derivative. However, the partial hydrolysis conditions particularly preferred are such that the acid used is hydrochloric acid, nitric acid, phosphoric acid or acetic acid, and the mixing ratio of the acid to silicon alkoxide or derivative (acid/SiO 2 ) is preferably 0.01-0.5 (the weight ratio of the acid to silicon alkoxide or derivative in terms of SiO 2 ). If the value of this ratio is less than 0.01, large amounts of unreacted silicon alkoxide remain in the mixture, which undesirably mars the electrical conductivity of the resulting coating and, on the other hand, if this value exceeds 0.5, the rate of partial hydrolysis is excessively rapid and undesirably, the continuous productivity and preservability of the resulting coating liquid decreases. The mixing ratio of water to silicon alkoxide (molar ratio) is preferably at least 2. If the value of this ratio is less than 2, unreacted silicon alkoxide remains in the resulting coating which will decrease substrate adhesion, scratch resistance and alkali resistance. The partial hydrolysis temperature employed is preferably 30-60°C. The fifth coating liquid of the present invention described above may be prepared by adding the diacetylacetonato-dialkoxy zirconium to a mixture of water and the organic solvent in which the conductive substance has been dispersed, thereby improving dispersibility and heat stability of the conductive substance, and then incorporating the resulting mixture with the partial hydrolysate of the silicon alkoxide or silicon alkoxide derivative. The incorporation of the partial hydrolysate of silicon alkoxide or derivative into the above-mentioned mixture, prior to the addition of the diacetylacetonato-dialkoxy zirconium to said mixture, is not desirable since the conductive substance dispersed in the mixture agglomerates. The coating liquid for forming the transparent conductive coating thus prepared has the advantages described below. First, the conductive coating formed therefrom has excellent transparency and electrical conductivity since the conductive substance dispered in the coating liquid is left in a monodispersed state by the protective colloidal action of the diacetylacetonato-dialkoxy zirconium added to said coating liquid. Second, the coating liquid has improved stability and hence no gellation thereof occurs so that stabilized coating liquid can be preserved for a long period of time even at room temperature (about 30°C). Furthermore, the diacetylacetonato-dialkoxy zirconium together with the partial hydrolysate of silicon alkoxide or silicon alkoxide derivative forms a matrix of the resulting conductive coating, where by the scratch resistance and alkali resistance of the said coating is increased. The presence of said diacetylacetonato-dialkoxy zirconium and said partial hydrolysate of silicon alkoxide or derivative thereof in the coating liquid also means that a desired conductive coating can be formed when said coating liquid as applied is fired at a temperature of about 150°C, and a conductive coating further improved in electrical conductivity may be obtained when the coating liquid is fired at above 200°C. In the fifth coating liquid of the present invention which contains the components as illustrated above, the diacetylacetonato-dialkoxy zirconium and the conductive substance are preferably used in such an amount so that the ZrO 2 /MO x weight ratio of these two components in terms of oxide is 0.01-1 (MO x represents the conductive substance as an oxide). If the value of this ratio is less than 0.01, undesirably the dispersibility and heat stability of the conductive substance decreases, the transparency and substrate adhesion of the resulting conductive coating is poor and the preservability and continuous productivity of the coating liquid is poor. If this value exceeds 1, on the other hand, undesirably the resulting conductive coating is poor with respect to transparency and substrate adhesion and the electrical conductivity decreases. The diacetylacetonato-dialkoxy zirconium and silicon alkoxide are preferably used in such an amount so that the ZrO 2 /SiO 2 weight ratio of these two components in terms of oxide is 0.05-1. If a value of this ratio is less than 0.05, the alkali resistance of the resulting conductive coating is insufficient and, on the other hand, if this value exceeds 1, undesirably the substrate adhesion and transparency, of the resulting conductive coating decreases. The conductive substance and the other two components are preferably used in such an amount so that the MO x /(SiO 2 + ZrO 2 ) weight ratio of the components in terms of oxide is 0.5-5. If the value of this ratio is less than 0.5, undesirably the electrical conductivity of the resulting conductive coating is insufficient and, on the other hand, if this value exceeds 5, the adhesion to a substrate, transparency and scratch resistance of the resulting conductive coating decreases. Furthermore, if the solids concentration (Mo x + SiO 2 + ZrO 2 ) in the coating solution is less than 15% by weight, the conductive coating having the properties required by the present invention may be obtained. If the above-mentioned solids concentration exceeds 15% by weight, undesirably the preservability of the coating liquid is poor. If this solids concentration is excessively low, it becomes necessary to repeat the coating operation several times in order to the desired conductive coating, and hence a practically useful solids concentration is at least 0.1% by weight. The thus obtained first to fifth coating liquids for forming conductive coatings of the present invention are coated on substrates such as glass or plastics according to the conventionally known methods, for examples spinner, spray, bar coater and roll coater methods. Subsequently, a film of the coating formed on the substrate is dried to cure at a temperature of from ordinary temperature to, say, 120°C, whereby the desired conductive coating with excellent adhesion to the substrate, scratch resistance and transparency is obtained. When the conductive coating thus obtained is further fired, the resulting coating is further improved in permanence properties such as alkali resistance. Accordingly, the present invention provides a glass or plastics substrate coated with a coating liquid as described above. The substrate on which a transparent conductive coating has been formed, said conductive coating comprising zirconium oxide, conductive substance and silicon oxide, generally has a glossiness of less than 190% as measured at an angle of measurement of 60° according to the method of measurement of glossiness stipulated in JIS K 7105-81, an excellent electrical conductivity as evidenced by a surface resistivity Of 10 3 -10 11 Ω/□, an excellent transparency as evidenced by a total light transmittance of at least 80% and a haze of less than 10%. Moreover, the substrate has excellent permanence properties including adhesion to the conductive coating, scratch resistances and alkali resistance. The display device of the present invention comprises a front panel as a substrate, on the surface of which a transparent conductive coating has been formed, said transparent conductive coating comprising zirconium oxide, silicon oxide and a conductive substance, said front panel typically having a glossiness of 30-100% as measured at an angle of measurement of 60° according to the method of measurement of glossiness stipulated in JIS K 7105-81, a resolving power of at least 50 bars/cm, and a surface resistivity of 10 3 -10 11 Ω/□. If the glossiness value is less than 30%, undesirably the transparency of the front panel decreases and, on the other hand, if the value exceeds 90%, regular reflection of the coating is not decreased and the front panel glares; therefore the glossiness is preferably less than 90%, though the upper limit of this value is not particularly defined. If value of the resolving power is less than 50 bars/cm, undesirably the transparency of the front panel is poor. In the present specification, the resolving power of the front panel is expressed by way of the number of bars per cm in a bar chart, said number of bars being capable of being counted distinctly by visual observation of the chart. That is, the resolving power is determined by using a box of 50 by 30 centimeters wherein a front panel having a bar chart attached as shown in Fig.1 to the side on which no coating is coated is arranged at one wall of the box in the manner as shown in Fig. 2 so that the coated side of the panel faces outward, and the front panel thus arranged is visually observed at a distance of 30 cm from the coated side to count the number of bars per cm in the bar chart that can be distinctly confirmed. In that case, the box is provided with 20 W fluorescent lamps at both ends of the other wall of the box provided with no front panel, and the surface of the wall of the box provided with no front panel is colored white. The bar chart used included those in which the number of bars is increased every 5 bars/cm, for example, 10 bars/cm, 15 bars/cm, 20 bars/cm and 25 bars/cm. In the bar chart thus used, 1 represents a printed bar, 2 represents the space between the printed bars, and the width a of the printed bar is equal to the width b of the space. In the display device of the present invention, an average surface roughness Rz (a ten-point average roughness as measured in accordance with JIS B0601-82) of the front panel is usually 0.2-5 µm, preferably 0.2-3 µm. If this average surface roughness is less than 0.2 µm, undesirably the non-glare of the front panel decreases and no sufficient antistatic effect is obtained, though the panel is excellent with respect to resolving power and transparency and, on the other hand, if the average surface roughness exceeds 5 µm, undesirably the resolving power and transparency of the front panel decreases. The present display device may be prepared by using the second to fifth coating liquids of the present invention mentioned previously. That is, the front panel of the present display device may be prepared by coating a front panel previously heated to and kept at 40-90°C, preferably 50-70°C, with any of the second to fifth coating liquids of the present invention by spraying , followed by drying and/or firing. If the heating temperature of the front panel is less than 40°C, undesirably the liquid components of the coating liquid as coated do not dry sufficiently and undergo leveling, whereby no non-glare coating is obtained and, on the other hand, if this temperature exceeds 90°C, undesirably the liquid components will dry rapidly, whereby the resulting coating is poor with respect to panel adhesion, transparency and permanence properties. When the coating liquid is coated on the front panel by the spray method, the coating amount, coating speed and air pressure supplied to the spray should be controlled so that the heating temperature of the front panel does not deviate from the above-mentioned temperature range. Subsequently, the display device of the present invention is obtained by drying the front panel thus coated by the spray method with the coating liquid. When a coating having higher permanence properties and mechanical strength is needed, it may be obtained by firing the front panel as coated in the manner now described at a temperature of above 200°C but below the glass transition point of the front panel. In that case, the firing operation may be repeated many times so long as the firing temperature employed is below the glass transition point of the front panel. In cases where non-glare is not needed according to the purpose for which the display device is used, a desired coating having lesser non-glare or substantially no non-glare may be obtained by varying the spray conditions to be employed. Furthermore, the front panel of the display device of the present invention may be prepared by coating the coating liquid for forming conductive coating on a front panel by the spray method in the manner now described, drying and/or firing the thus coated front panel, coating by the spray method a coating liquid comprising transparent protective components on the thus dried and/or fired front panel at 40-90°C, and then drying and/or firing the thus coated front panel. Usable as the coating liquid comprising transparent protective components are the second to fifth coating liquids for forming conductive coatings, from which the conductive substance has been excluded. The present invention also provides a glass or plastics substrate so-coated with a transparent protective coating. As the coating liquid comprising transparent protective components, moreover, there may also be used a liquid prepared by homogeneously dissolving or dispersing a binder resin in an organic solvent. Useful binder resins include silicon resins, melamine resins and urethane resins. The present invention is illustrated below with reference to the following Examples. Example 1 (Preparation of conductive tin oxide sol) A starting solution was prepared by dissolving 316 g of potassium stannate and 38.4 g of tartar emetic in 686 g of water. The starting solution together with nitric acid was added over 12 hours to 1000 g of water warmed at 50°C with stirring and subjected to hydrolysis while maintaining a pH of the system at 8.5, whereby a sol liquid was obtained. Colloidal particles were separated by filtration from the sol, washed to remove by-product salts therefrom, dried, fined at 350°C for 3 hours in air, and then further fined at 650°C for 2 hours in air to obtain fine powder (I). To 1600 g of an aqueous potassium hydroxide solution (containing 40 g of KOH) was added 400 g of the fine powder (I), and the mixture kept at 30°C was stirred for 3 hours with a sand mill to obtain conductive tin oxide colloid. Subsequently, this conductive tin oxide colloid was treated with an ion exchange resin to obtain dealkalized conductive tin oxide colloid (a conductive sol liquid). This dealkalized conductive sol liquid contained no precipitate, had a solids concentration of 20% by weight and colloidal particles having an average particle diameter of 0.07 µm. The amount of colloidal particles having a particle diameter of less than 0.1 µm was 87% of the total amount of colloidal particles. In this connection, the measurement of average particle diameter of the colloidal particles was conducted with an ultracentrifugal granulometer (CAPA-5000 manufactured and sold by Horiba Seisakdsho K.K.), wherein a test specimen was adjusted to a solids concentration of 0.5% by weight and subjected to centrifugal sedimentation at 5000 rpm. (The same shall apply hereinafter) A mixture comprising 250 g of the conductive sol liquid obtained above, 225 g of N-methyl-2-pyrrolidone (hereinafter called NMP) and 100 g of an aqueous solution of 25% by weight of zirconium oxychloride in terms of ZrO 2 (hereinafter called ZOC)was heated at 80°C with a rotary evaporator under reduced pressure, thereby distilling off 75 g of water. The liquid obtained was cooled and then thoroughly mixed with 1000 g of a mixture of MeOH/BuOH (1/1 weight ratio) to obtain a coating liquid for forming conductive coating. Example 2 A mixture comprising 100 g of the conductive sol liquid obtained in Example 1, 45 g of NMP and 20 g of ZOC was heated at 80°C with a rotary evaporator under reduced pressure to distill off 15 g of water. The liquid obtained was cooled and thoroughly mixed with 350 g of a mixture of MeOH/EtOH (1/1 weight ratio) to obtain a coating liquid for forming conductive coating. Example 3 Following substantially the same procedure as described in Example 1, a coating liquid for forming conductive coating was obtained, except that in place of the ZOC used in Example 1, there was used an aqueous solution containing 25% by weight zirconium oxynitrate (hereinafter called ZON) Example 4 A homogeneous mixture comprising 100 g of the conductive sol liquid obtained in Example 1, 90 g of NMP and 40 g of ZOC was heated at 80°C with a rotary evaporator under reduced pressure to distill off 15 g of water. The liquid obtained was cooled and thoroughly mixed with 2800 g of a mixture of MeOH/EtOH (1/1 weight ratio) to obtain a coating liquid for forming conductive coating. Example 5 A homogeneous mixture comprising 250 g of the conductive sol liquid obtained in Example 1, 150 g of NMP and 100 g of ZOC was heated at 80°C with a rotary evaporator under reduced pressure and thoroughly mixed with 425 g of a mixture of MeOH/EtOH (1/1 weight ratio) to obtain a coating liquid for forming conductive coating. Example 6 Following substantially the same procedure as described in Example 1, a coating liquid for forming conductive coating was obtained, except that in place of the NMP used in Example 1, there was used 225 g of methyl cellosolve. Example 7 Following substantially the same procedure as described in Example 1, a coating liquid for forming conductive coating was obtained, except that in place of the NMP used in Example 1, there was used 225 g of ethylene glycol. Example 8 Following substantially the same procedure as described in Example 1, a coating liquid for forming conductive coating was obtained, except that in place of the NMP used in Example 1, there was used 225 g of N,N-dimethylformamide. Example 9 A mixture comprising 83.3 g of a liquid prepared by diluting the conductive sol liquid obtained in Example 1 with water to 12% by weight, 60 g of NMP, 100 g of 5% by weight of ZOC in terms of ZrO 2 , and 256.7 g of a mixture of MeOH/EtOH (1/1 weight ratio) was thoroughly blended to obtain a coating liquid for forming coating. Example 10 A mixture of 50 g of the fine powder (I) obtained in Example 1 and 200 g of water was fed to a sand mill, and the mixture was subjected for 3 hours to pulverization with media of 1-2 mm  media. After the pulverization, an average particle diameter of particles in the liquid was 0.25 µm. Following substantially the same procedure as described in Example 1, a coating liquid for forming conductive coating was obtained except that there was used the conductive sol dispersion obtained in the manner now described was used. Example 11 To a sand mill was fed a mixture comprising 50 g of the fine powder (I) obtained in Example 1, which had been classified into the powder having a particle diameter of less than 1 µm, and 200 g of water, and the mixture was subjected to pulverization for 3 hours with 0.3-1 mm  media to obtain a conductive sol dispersion. Following substantially the same procedure as described in Example 1, a coating liquid for forming conductive coating was obtained except that there was used the conductive sol dispersion obtained above was used. In this connection, an average particle diameter of particles in the dispersion after the pulverization was 0.08µm, and the amount of particles having a particle diameter of less than 0.1µm was 65% of the amount of total particles. Example 12 There were prepared a solution of 79.9 g of indium nitrate in 686 g of water and a solution of 12.7 g of potassium stannate in an aqueous solution of 10% by weight of potassium stannate. Both indium nitrate and potassium stannate solutions obtained above were added to 1000 g of water warmed at 50°C with stirring and subjected to hydrolysis while maintaining a pH of the system at 11, whereby a sol liquid was obtained. Colloidal particles present in the sol liquid were separated therefrom by filtration, washed to remove by-product salts therefrom, dried, fired at 350°C for 3 hours in air, and then further fired at 600°C for 2 hours in air to obtain a fine powder (II). Following substantially the same procedure as prescribed in Example 9 a coating liquid for forming conductive coating was obtained except that 50 g of the fine powder (II) obtained above was used. In this connection, an average particle diameter of particles in the liquid after pulverization was 0.29 µm. Comparative Example 1 A homogeneous mixture comprising 25 g of the conductive sol liquid obtained in Example 1, 90 g of NMP and 40 g of ZOC was heated at 80°C under reduced pressure with a rotary evaporator to distill off 25 g of water. The liquid obtained was cooled and thoroughly mixed with 170 g of a mixture of MeOH/EtOH (1/1 weight ratio) to obtain a coating liquid for forming conductive coating. Comparative Example 2 A homogeneous mixture comprising 175 g of the conductive sol liquid obtained in Example 1, 45 g of NMP and 20 g of ZOC was heated at 80°C under reduced pressure with a rotary evaporator to distill off 14 g of water. The liquid obtained was cooled and thoroughly mixed with 574 g of a mixture of MeOH/EtOH (1/1 weight ratio) to obtain a coating liquid for forming conductive coating. Comparative Example 3 A homogeneous mixture comprising 250 g of the conductive sol liquid obtained in Example 1, 4 g of NMP and 100 g of ZOC was heated at 80°C under reduced pressure, and 200 g of water was distilled off therefrom, whereupon gellation occurred. Comparative Example 4 A mixture comprising 100 g of the conductive sol liquid obtained in Example 1, which had been diluted with water to 10% by weight, 60 g of NMP, 100 g of 3% by weight of ZOC in terms of ZrO 2 , and 256.7 g of a mixture of MeOH/EtOH (1/1 weight ratio) was thoroughly blended to obtain a coating liquid for forming conductive coating. In Table 1, the composition of liquid and ratio of components used in each of the foregoing examples and comparative examples were shown. Using a spinner operated at a rate of 2000 rpm, coated individually on a glass plate were the coating liquids for forming conductive coatings obtained respectively in Examples 1-7, 9, 11 and 12, and Comparative Examples 1, 2 and 4, and on an acrylic resin plate was the coating liquid for forming conductive coating obtained in Example 8. Respective coatings were obtained on the glass plates thus coated by drying them at 110°C for 10 minutes, followed by firing at 300°C for 30 minutes, and on the acrylic resin plate thus coated by drying at 110°C for 30 minutes. Evaluation of the coatings thus obtained was conducted with respect to the test items mentioned below. The results obtained are shown in Tables 2 and 3. (1) Transparency: Total light transmittance (Tt) and haze (H) were measured with a haze computer (manufactured and sold by Suga Shikenki K.K.). (2) Glossiness: Glossiness (G) was measured at an angle of measurement of 60°C in accordance with the method of measurement of glossiness stipulated in JIS K7105-81. This glossiness is represented by a relative value of the test specimen to the reflactance of the standard plate, and stands in such relationships that the higher is the reflactance, the higher is the glossiness, and the lower is the reflectance, the lower is the glossiness. (3) Adhesion: A part of piece of commercially available cellophane tape of 12 mm in width was allowed to stick on the coating while holding the remaining part of the tape perpendicular to the coating, and then the tape is instantaneously peeled off therefrom to visually observe whether the coating remained undetached or not. (4) Hardness: Hardness of the coating was measured by subjecting to the pencil hardness test stipulated in JIS D0202-71. (5) Surface resistance (surface resistivity): Surface resistance of the coating was measured with an electrode cell (manufactured and sold by YHP). (6) Permanence properties: The coated plate was immersed in the following four kinds of liquids to evaluate adhesion of the coating to the plate, and the glossiness and surface resistance of the coating as determined before the test with those as measured after the test. 1) Immersion of the plate in 15% by weight ammonia water at room temperature for 120 hours. 2) Immersion of the plate in 10% by weight aqueous NaCl solution at room temperature for 120 hours. 3) Immersion of the plate in boiling water for 30 minutes. 4) Immersion of the plate is 50% by weight aqueous acetic acid solution at room temperature for 120 hours. Item Transparency Glossiness Surface resistivity Adhesion Hardness No. Example Tt (%) H (%) G (%) (Ω/□) 1 91.5 2.0 136 3 x 10 6 o >9H 2 91.0 2.0 131 8 x 10 5 o >9H 3 92.0 2.0 140 1 x 10 6 o >9H 4 92.5 1.5 131 8 x 10 6 o >9H 5 90.0 3.0 126 5 x 10 5 o >9H 6 91.0 2.0 134 5 x 10 6 o >9H 7 91.3 2.0 130 2 x 10 6 o >9H 8 91.0 2.0 133 1 x 10 6 o 8H 9 92.2 2.5 125 5 x 10 6 o >9H 10 89.0 6.5 89 2 x 10 7 o 9H 11 91.8 1.8 138 2 x 10 6 o >9H 12 84.0 8.8 78 2 x 10 4 o 9H Compar. Ex. 1 92.0 2.0 145 1 x 10 11 o >9H 2 90.0 3.0 125 2 x 10 8 x 7H Adhesion: The specimen was rated o when its coating did not peel off, and rated x when the coating peeled off. Example 13 Into a hydrogen type ion exchange resin column was passed through at a space velocity of SV=5, 2000 g of 5% by weight in terms of SiO 2 of sodium silicylate (SiO 2 /Na 2 O = 3 moles/mole) while keeping at 15°C, whereby a non-sedimentary silica liquid was obtained. This non-sedimentary silica solution as obtained was diluted with water to 2% by weight and subjected for 1 hour to centrifugal sedimentation at 250,000 G, whereupon the precipitates formed were 8% by weight based on the total amount of SiO 2 . A mixture comprising 50 g of the non-sedimentary silica liquid obtained above, 50g of the conductive sol liquid obtained in Example 1, 20 g of NMP, 10 g of ZOC and 170 g of MeOH/BtOH (1/1 weight ratio) was thoroughly blended to obtain a coating liquid for forming conductive coating. Example 14 A mixture comprising 50 g of the non-sedimentary silica liquid obtained in Example 13, 200 g of the conductive sol liquid obtained in Example 1, 10 g of NMP, 40 g of ZOC and 1400 g of MeOH/EtOH (1/1 weight ratio) was thoroughly blended to obtain a coating liquid for forming conductive coating. Example 15 Following substantially the same procedure as described in Example 13, a coating liquid for forming conductive coating was obtained except that 10 g of the NMP and 380 g of MeOH/BuOH (1/1 weight ratio) were used. Example 16 A mixture comprising 50 g of the non-sedimentary silica liquid obtained in Example 13, 220 g of the conductive sol liquid obtained in Example 1, 110 g of NMP, 100 g of ZOC and 345 g of MeOH/EtOH (1/1 weight ratio) was thoroughly blended to obtain a coating liquid for forming conductive coating. Example 17 A homogeneous mixture comprising 50 g of the non-sedimentary silica liquid obtained in Example 13, 100 g of the conductive sol liquid obtained in Example 1, 150 g of N,N-dimethylformamide and 30 g of ZOC was heated at 80°C under reduced pressure with a rotary evaporator to distill off 135 g of water. The liquid obtained was cooled and thoroughly mixed with 405 g of MeOH/BuOH (1/1 weight ratio) to obtain a coating liquid for forming conductive coating. Example 18 Following substantially the same procedure as described in Example 13, a coating liquid for forming conductive coating was obtained except that in place of the NMP used in Example 13, there was used 20 g of methyl cellosolve. Example 19 Following substantially the same procedure as described in Example 13, a coating liquid for forming conductive coating was obtained except that in place of the NMP used in Example 13, there was used 20 g of morpholine. Comparative Example 5 A homogeneous mixture comprising 200 g of the non-sedimentary silica liquid obtained in Example 13, 125 g of the conductive sol liquid obtained in Example 1, 50 g of NMP and 10 g of ZOC was heated at 80°C under reduced pressure with a rotary evaporator to distill off 210 g of water. The liquid obtained was cooled and thoroughly mixed with MeOH/BuOH (1/1 weight ratio) to obtain a coating liquid for forming conductive coating. Comparative Example 6 A mixture comprising 100 g of the non-sedimentary silica liquid obtained in Example 13, 25 g of the conductive sol liquid obtained in Example 1, 40 g of NMP, 20 g of ZOC and 115 g of MeOH/BuOH (1/1 weight ratio) was thoroughly blended to obtain a coating liquid for forming conductive coating. Comparative Example 7 A homogeneous mixture comprising 100 g of the non-sedimentary silica liquid obtained in Example 13, 350 g of the conductive sol liquid obtained in Example 1, 40 g of NMP and 20 g of ZOC was heated at 80°C under reduced pressure with a rotary evaporator to distill off 250 g of water. The liquid obtained was cooled and thoroughly mixed with 1340 g of MeOH/BuOH (1/1 weight ratio) to obtain a coating liquid for forming conductive coating. Comparative Example 8 A homogeneous mixture comprising 500 g of the non-sedimentary silica liquid obtained in Example 13, 500 g of the conductive sol liquid obtained in Example 1, 6 g of NMP and 100 g of ZOC was heated at 80°C under reduced pressure with a rotary evaporator to distill off 900 g of water, whereupon gellation occurred. Comparative Example 9 A mixture comprising 100 g of the non-sedimentary silica liquid obtained in Example 13, 100 g of the conductive sol liquid obtained in Example 1, 25 g of NMP, 100 g of 5% by weight of ZOC in terms of ZrO 2 and 75 g of MeOH/BuOH (1/1 weight ratio) was thoroughly blended to obtain a coating liquid for forming conductive coating. In Table 4, the composition of liquid and ratio of components used in each of the foregoing examples and comparative examples were shown. Using a spinner operated at a rate of 2000 rpm, coated individually on a glass plate were the coating liquids for forming conductive coatings obtained respectively in Examples 13-17 and Comparative Examples 5-7, and 9, and on an acrylic resin plate were the coating liquids for forming conductive coatings obtained in Examples 18 and 19. Respective coatings were obtained on the glass plates thus coated by drying at 110°C for 10 minutes, followed by firing at 300°C for 30 minutes, and on the acrylic resin plates thus coated by drying them at 100°C for 30 minutes. The coatings thus formed were evaluated in the same manner as in Example 1. The results obtained are shown in Tables 5 and 6, respectively. Item Transparency Glossiness Surface resistivity Adhesion Hardness Coating process No. Tt (%) H (%) G (%) (Ω/□) Example 13 93.2 2.0 135 5 x 10 5 o >9H Spinner 14 92.0 2.5 138 7 x 10 6 o >9H Spinner 15 93.0 2.0 133 8 x 10 6 o >9H Spinner 16 90.0 3.0 128 4 x 10 5 o >9H Spinner 17 91.5 2.0 138 5 x 10 6 o >9H Spinner 18 92.5 2.0 133 3 x 10 7 o 8H Spinner 19 92.0 2.5 136 4 x 10 7 o 8H Spinner Compr. Ex. 5 93.0 1.5 130 5 x 10 6 o >9H Spinner 6 92.0 1.5 138 5 x 10 11 o >9H Spinner 7 89.0 3.5 123 8 x 10 7 x 7H Spinner Adhesion: The specimen rated o when its coating did not peel peel off, and rated x when the coating peeled off. Example 20 (Preparation of coating liquid for forming conductive coating) A coating liquid (liquid A), which is a base liquid, was prepared by mixing 100 g of ethyl silicate 28 112 g of ZON, 84 g of pure water and 824 g of ethanol together with stirring. A tin oxide dispersion (liquid B) was prepared by mixing with stirring 560 g of the conductive sol liquid obtained in Example 1 with 1,680 g of ethanol. The liquids A and B thus obtained were mixed together to obtain a coating liquid for forming conductive coating. Example 21 Following substantially the same procedure as described in Example 20, a coating liquid for forming conductive coating was obtained except that the liquids A and B used in Example 20 were replaced by those which contained 50 g of ethyl silicate 40, 10 g of ZOC, 688.5 g of a methanol-butanol mixture (weight ratio = 1:1) and 1.5 g of pure water, and which contained 562.5 g of the conductive sol liquid obtained in Example 1 and 3,187.5 g of a methanol-butanol mixture, respectively. Example 22 Following substantially the same procedure as described in Example 20, a coating liquid for forming conductive coating was obtained except that the liquids A and B used in Example 20 were replaced by those which contained 30 g of ethyl silicate 28, 55 g of ZON, and 137 g of a methyl cellosolve-ethyl acetate mixture (weight ratio = 1:1), and which contained 66.6 g of the conductive sol liquid and 66.4 g of a methyl cellosolve-ethyl acetate mixture, respectively. Example 23 (Preparation of dispersion of conductive tin oxide fine powder) The powder (I) obtained in Example 1 was dispersed in pure water, and the dispersion was treated for 3 hours to obtain a water dispersion of conductive tin oxide having an average particle diameter of 0.2µm, said dispersion having a solids concentration of 20% by weight. (Preparation of coating liquid for forming conductive coating) A mixture (liquid C) comprising 50 g of ethyl silicate 28, 137.8 g of ZOC, 16.8 g of pure water and 763.4 g of ethanol was prepared. A mixture (liquid D) comprising 484 g of the conductive tin oxide dispersion obtained above and 1936 g of ethanol was prepared. The liquid A and liquid B were mixed together with stirring to obtain a coating liquid for forming conductive coating. Example 24 (Preparation of conductive indium oxide dispersion) The fine powder (II) obtained in Example 12 was dispersed in methyl cellosolve, and the dispersion was treated for 3 hours with a sand mill to obtain a methyl cellosolve dispersion of conductive indium oxide having an average particle diameter of 0.3µm, said dispersion having a solids concentration of 30% by weight. (Preparation of coating liquid for forming conductive coating) A mixture comprising 50 g of ethyl silicate 40, 295 g of ZON, 48 g of pure water and 2733.5 g of methyl cellosolve was prepared. The above-mentioned conductive indium oxide dispersion was further mixed thoroughly with 8842 g of methyl cellosolye, and then the mixture was mixed with stirring with the above-mentioned mixture to obtain a coating liquid for forming conductive coating. Example 25 (Preparation of non-sedimentary silica liquid) To the non-sedimentary silica liquid obtained in Example 13 was added and mixed therewith 44.5 g, based on 100 g of the non-sedimentary silica liquid, of NMP as a growth inhibitor, and the mixture was then heated at 80°C with a rotary evaporator to distill off the greater part of water, whereby a stabilized non-sedimentary silica liquid (liquid E) was obtained. This liquid had the SiO 2 concentration of 10% by weight and the water content of 1.0% by weight. (Preparation of coating liquid for forming conductive coating) A mixture (liquid F) comprising 100 g of ethyl silicate 28, 112 g of ZON, 939 g of ethanol, 84 g of pure water and 31 g of the above-mentioned liquid E. Separately, a mixture (liquid G) comprising 591 g of the conductive sol liquid obtained in Example 1 and 1773 g of ethanol was prepared. The liquids F and G were mixed together with stirring to obtain a coating liquid for forming conductive coating. Example 26 Following substantially the same procedure as described in Example 25, a coating liquid for forming conductive coating was obtained except that of the components of the liquid F, the ethanol used was 1104 g and the liquid E used was 280 g, and of the components of the liquid G, the conductive sol liquid used was 840 g and the ethanol used was 3192 g. Example 27 Following substantially the same procedure as described in Example 25, a coating liquid for forming conductive coating was obtained except that of the components of the liquid F, the ethanol used was 3344 g and the liquid E used was 2520 g, and of the components of the liquid G, the conductive sol liquid used was 3080 g and the ethanol used was 9240 g. Properties of the coating liquids for forming conductive coatings obtained in the foregoing examples are shown in Table 7. The conductive coating liquids obtained respectively in Examples 20-27 were individually coated on glass plates using a spinner at a rate of 2000 rpm, and the glass plates thus coated were dried at 110°C and then dried at 250°C to form their respective conductive coatings thereon. The coatings thus obtained were evaluated in the same manner as in Example 1. The results obtained are shown in Table 8. Example 28 (Preparation of partial hydrolysate of silicon alkoxide) Liquid H To 100 g of ethyl silicate-28 was added with stirring 110 g of ethanol and then added 70 g of an aqueous solution of 5% by weight of nitric acid. The mixture was then heated at 60°C and kept at that temperature for 1 hour. Liquid I To 100 g of ethyl silicate-40 was added with stirring 200 g of ethanol and then added 100 g of an aqueous solution of 1.0% by weight of acetic acid. The mixture was then heated at 40°C and kept at that temperature for 30 minutes. (Preparation of conductive substance) Liquid J In 100 g of water was dispersed 20 g of the fine powder (I) obtained in Example 1 and pulverized for 3 hours with a sand mill to obtain a dispersion of the fine powder having an average particle diameter of 0.3µm. Liquid K The conductive sol liquid obtained in Example 1 was used as liquid K. Liquid L In 100 g of water was dispersed 20 g of the fine powder (II) obtained in Example 12 and pulverized for 3 hours with a sand mill to obtain a dispersion of the fine powder having an average particle diameter of 0.3µm. Subsequently, to 100 g of the liquid K obtained above was added 11.9 g of ethanol and further added with stirring 3.1 g of 13% by weight of diacetylacetonatodibutoxy zirconium (ABZ). To the mixture was added 70 g of the liquid H and thoroughly dispersed to obtain a coating liquid for forming conductive coating. Examples 29-33 and Comparative Example 10 Substantially the same procedure as described in Example 28 was followed except for a change in composition of the coating liquid used in each example as shown in Table 9. Comparative Example 11 To a mixture comprising 100 g of the liquid K and 11.9 g of ethanol was added with stirring 70 g of the liquid H. In the mixture was then dispersed 3.1 g of 13% by weight of ABZ, whereupon aggregation of colloidal particles took place several minutes after dispersing and the aggregated particles precipitated. Comparative Example 12 To 35.7 g of ethyl silicate 28 was added with stirring 447.3 g of ethanol followed by further addition of 4 g of ZON and 22 g of water. In the mixture was thoroughly dispersed 100 g of the liquid K. The coating liquids thus obtained were individually coated on substrates as shown in Table 10 by the spinner or roll coater method to form their respective coatings thereon. Evaluation of the coatings thus formed was conducted in the same manner as in Example 1. In this connection, scratch resistance was measured in the following manner. That is, an eraser for office use (equivalent to No. 50-50, a product of LION K.K.) was placed on the coating formed on PC (a polycarbonate plate) or glass plate fixed onto a platform scale, and said coating was rubbed 300 times with the eraser under a load of 2 kg to measure the total light transmittance and surface resistivity. The results obtained are shown in Table 10. Example 34 A panel for 14-inch Braun tube kept at 60°C was spray coated under a spray pressure of 3.0 kg/cm 2 with 20 ml of the coating liquid for forming conductive coating obtained in Example 13. Thereafter, the panel thus coated was dried at 110°C and then fired at 450°C for 30 minutes. Example 35 Example 34 was repeated except that the panel for 14-inch Braun tube was kept at 70°C. Example 36 Example 34 was repeated except that in place of the panel for 14-inch Braun tube, an acrylic resin plate was used, and the plate was dried at l10°C for 30 minutes without subjecting it to subsequent firing. Example 37 A panel spray coated with the coating liquid for forming conductive coating of Example 34 and dried at 110°C for 30 minutes was kept at 60°C, and the panel was then spray coated under a spray pressure of 3.0 kg/cm 2 with 20 ml of a coating liquid containing transparent protective components, which coating liquid had been obtained by homogeneously mixing together 100 g of ethyl silicate 28 (a product of Tama Kagaku K.K.), 749 g of isopropanol, 84 g of water and 0.5 g of 35% by weight of hydrochloric acid. Thereafter, the panel thus coated was dried at llo°c for 10 minutes and then fired at 450°C for 30 minutes. Example 38 A homogeneous mixture comprising 50 g of the non-sedimentary silica dispersion obtained in Example 13 and 43 g of NMP was heated at 80°C to distill off 93 g of water. The liquid obtained was cooled and mixed with 120 g of ethanol to obtain a coating liquid containing transparent protective components. The panel obtained in Example 34 was kept at 60°C and spray coated under a spray pressure of 3.0 kg/cm 2 with 20 ml of the coating liquid containing transparent protective components obtained above. Thereafter, the panel thus coated was dried at 110°C for 10 minutes and then fired at 250°C for 30 minutes. Example 39 A coating liquid containing transparent protective components was obtained by mixing 10 g of 50% by weight of silicone resin (a xylene-diluted product of Kanegafuchi Kagaku Industry Co., Ltd. under a trade name of Cemlack) with 157 g of methyl ethyl ketone. The panel obtained in Example 34 was kept at 60°C and spray coated under a spray pressure of 3.0 kg/cm 2 with 20 ml of the coating liquid containing transparent protective components obtained above. Thereafter, the panel thus coated was dried at 110°C for 10 minutes. Comparative Example 13 Example 34 was repeated except that the panel for 14-inch Braun tube was kept at 110°C. Comparative Example 14 Example 34 was repeated except that the coating liquid for forming conductive coating obtained by thoroughly mixing together 100 g of the non-sedimentary silica liquid obtained in Example 13, 50 g of the conductive sol liquid obtained in Example 1, 25 g of NMP and 125 g of ethanol was used. That is no oxy salt of zirconium was used. Comparative Example 15 With the purpose of preparing a coating liquid for forming conductive coating, 100 g of the non-sedimentary silica liquid obtained in Example 13, 100 g of the conductive sol liquid obtained in Example 1, 20 g of ZON and 380 g of MeOH/EtOH (1/1 weight ratio) were thoroughly mixed together, whereupon gellation occurred 30 minutes thereafter. (No growth inhibitor was used.) Comparative Example 16 In the coating liquid for forming conductive coating obtained in Example 13 was immersed a glass plate (200 x 200 x 3 mm), and the plate was then pulled up therefrom at a rate of 5 cm/min. Thereafter, the plate thus treated was dried at 110°C for 30 minutes and then fired at 450°C for 30 minutes. Evaluation of the foregoing examples and comparative examples was conducted in the same manner as in Example 1. The resolving power was measured by the method as described in the present specification. Rz was measured in accordance with the method of measurement of Rz stipulated in JIS B0601-82 using a feeler type membrane pressure gauge (manufactured and sold by Rank Tayler Hobson Co., under a trade name of Talystep). Evaluation of the coating film strength was conducted in the following manner. That is, an eraser for office use (equivalent to No. 50-50, a product of LION K.K.) was placed on the coating of the panel or acrylic resin plate fixed onto a platform scale was allowed to move under a load of 2 kg back and forth between two points on said coating separated by a definite distance until the surface of said panel or acrylic resin plate is exposed, and the number of times of reciprocating movements of the eraser required for was sought, on the basis of which the coating film strength was determined. In addition to the Example 1 of the test for permanence properties described previously in the present specification, the test for permanence properties conducted herein included 5) immersion of the plate in acetone at room temperature for 1 week, 6) immersion of the plate in ethanol at room temperature for 1 week, and 7) immersion of the plate in n-propanol at room temperature for 1 week. The results obtained are shown in Tables 11 and 12, respectively. Item No. Resolving power (Bar/cm) Glossiness G (%) Surface resistance (Ω/□) Adhesion Film strength (No. of times) Average Rz (µm) Example 34 65 62 8 x 10 6 o 100 0.95 35 65 63 7 x 10 6 o 100 0.98 36 65 60 8 x 10 7 o 50 1.10 37 70 54 9 x 10 6 o 300 1.55 38 70 53 8 x 10 6 o 200 1.63 39 65 57 2 x 10 7 o 150 1.48 Compar. Ex. 13 20 20 5 x 10 6 x <25 6.20 14 65 60 5 x 10 6 o 150 1.20 15 - - - - - - 16 75 142 2 x 10 6 o 250 0.10 Notes: In Comparative Example 15, the coating liquid for forming conductive coating gelled and no coating was formed. Glass or plastic substrates provided with transparent conductive coatings formed by the use of the coating liquid for forming conductive coatings of the present invention are utilizable in the field of the articles of manufacture where antistatic function and non-glare are required, such as front panels for display devices such as CRT or LCD, glass plates for duplicators, panels for instruments, glass for clean rooms, transparent digitizers and telewriting terminals.

Claims: A coating liquid for forming a conductive coating, characterised by containing a zirconium oxy salt and a conductive substance dissolved or dispersed homogeneously in a mixed solvent comprising water, an organic solvent and a stabilizer. A coating liquid for forming a conductive coating, characterized by containing a zirconium oxy salt, non-sedimentary silica and a conductive substance dissolved or dispersed homogeneously in a mixed solvent comprising water, an organic solvent and a stabilizer. A coating liquid for forming a conductive coating, characterized by containing a zirconium oxy salt, a silicon alkoxide or a silicon alkoxide derivative and a conductive substance dissolved or dispersed homogeneously in a mixed solvent comprising water and an organic solvent. A coating liquid for forming a conductive coating, characterized by containing a zirconium oxy salt, a silicon alkoxide or a silicon alkoxide derivative, non-sedimentary silica and a conductive substance dissolved or dispersed homogeneously in a mixed solvent comprising water, an organic solvent and a stabilizer. A coating liquid for forming a conductive coating, characterized by containing diacetylacetonato-dialkoxy zirconium, a partial hydrolysate of a silicon alkoxide or a derivative thereof, and a conductive substance dissolved or dispersed homogeneously in a mixed solvent comprising water and an organic solvent. A coating liquid according to any one of claims 1 to 4, wherein the zirconium salt is zirconium oxychloride, zirconium oxynitrate, zirconium oxyacetate or zirconium oxyoxalate. A coating liquid according to claim 1, 2, 4 or 6, wherein the stabilizer is ethylene glycol, N-methyl-2-pyrrolidone, ethyl cellosolve, methyl cellosolve or N-N-dimethylformamide. A coating liquid according to claim 2 or 4, wherein the non-sedimentary silica is such as to give a sediment of less than 30% by weight of the total amount of SiO 2 when an aqueous solution of 2.0% by weight in terms of SiO 2 of the non-sedimentary silica is subjected to centrifugal sedimentation at 250,000G for 1 hour. A coating liquid according to claim 3, 4 or 5, wherein the silicon alkoxide or derivative thereof is a compound or condensate thereof having 1 to 4 alkoxy groups of 1 to 8 carbon atoms represented by the formula SiH a Si(OR) b , (R'O) a Si(OR) b or R' a Si(OR) b in which a is 0, 1, 2 or 3, b is 1, 2, 3 or 4 such that a+b=4, and R and R' are each alkyl, or a derivative of the compound or condensate in which a part of H has been substituted by Cl or vinyl. A coating liquid according to any one of the preceding claims, wherein the conductive substance is tin oxide, tin oxide doped with antimony, fluorine or phosphorus, indium oxide, or indium oxide doped with tin or fluorine. A coating liquid according to any one of the preceding claims, wherein the organic solvent is an alcohol, ester, ether or ketone. A glass or plastic substrate coated with a conductive coating liquid as defined in any one of claims 1 to 11. A substrate according to claim 12, wherein the conductive coating is coated with a transparent protective coating formed of a coating liquid as defined in any one of claims 2 to 11 from which the conductive substance has been excluded. A display device comprising a front panel having formed on the surface thereof a transparent conductive coating formed of a coating liquid as defined in any one of the claims 2 to 11. A display device according to claim 14, wherein the conductive coating is coated with a transparent protective coating formed of a coating liquid as defined in any one of claims 2 to 11 from which the conductive substance has been excluded. A method of producing a front panel for a display device, characterised in that the front panel is heated to and kept at 40-90°C and then coated by spraying with a coating liquid as defined in any one of claims 2 to 11, followed by drying and/or firing to form a coated front panel. A method according to claim 16, wherein the resulting coated front panel is heated to and kept at 40-90°C and coated by spraying with a coating liquid as defined in any one of claims 2 to 11 from which the conductive substance has been excluded.

Inventors: ABE YONEJI, HIRAI TOSHIHARU, KOMATSU MICHIO, MIHARA KEI-ICHI, SATO GORO, ABE, YONEJI, HIRAI, TOSHIHARU, KOMATSU, MICHIO, MIHARA, KEI-ICHI, SATO, GORO
Applicants: ASAHI GLASS CO LTD, CATALYSTS & CHEM IND CO, ASAHI GLASS COMPANY LTD., CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.
Application year: 1988
Main classification: G09F9
IPC codes: C03C17