METHOD FOR THE SELECTIVE DECARBORIZATION OF FERROUS ALLOYS

Abstract: A method for selectively decarborization of a iron based substrate, preferrably, a silicon iron substrate, wherein the carbon present in the substrate is extracted by selective deposition of a titanium nitride onto the substrte.

Description: The invention described and claimed herein relates to a method for selectively decarborizing iron based material, in particular, decarborizing a silicon iron substrate. Background of the Invention. It is known in the prior art methods for selective carborization and heat treatment of iron based materal in hardening processes. Such a method is, for example, described in the Swedish Patent 8400781 to D B Larsen, issued February 17, 1986. In accordance with the method of this patent selective carborization is obtained by selectively covering the substrate with an electro deposited copper layer. If the copper layer is sufficiently deep no carborization will occur beneath the layer. However, the carbon content present in the substrate before the application of the copper layer will still be there. It is also known from prior art (e.g. EP-A-0166 216) to use CVD processes for the selective decarborization by deposition of nitride layers at temperatures above 700°C. Summary of the Invention. The invention as claimed in claim 1 is intended to remedy this drawback. It solves the problem by the use of a physical vapour deposition process at which a thin film of titanium nitride is selectively deposited on the surface of the iron based material, whereby the carbon present in the material is extracted. The mechanism of this extraction is not fully known. However, there are some indications that the the carbon has reacted with the titanium nitride. Brief Desription of the Drawings. The invention, which is defined in the attached claims, is described in detail below with reference to the drawings in which:- Figure 1 shows a cross-section of a carborized silicon iron substrate, and Figure 2 shows a cross-section of the same substrate after that the titanium film has been deposited on the substrate. Detailed Desription of the Invention The method according to the invention will be described below with reference to the drawings. Although the method is applicable in several processes where selective decarborization of iron based materials is desired, the description below will concentrate on a process for decarborization of a silicon iron substrate. Silicon iron is extensively used within the electrical and electronical fields, for example, in different kinds of transducers, cores and transformers. The carbon content in some applications negatively affects the magnetic characteristic of the silicon iron. The process according to this invention remedies this drawback. By the subject process the carbon in the silicon iron substrate is extracted by depositing a titanium nitride layer on its surface. Figure 1 shows a cross-section of a carborized silicon iron substrate scanned by electron microscope. The carborization is performed in order to better show the decarborization effect. Figure 1 shows the penetration of carbon into a silicon iron substrate 1 at a carborization process. After that, the substrate 1 has been subject to heat treatment so that a layer 2 of martensitic structure has been created. Figure 2 shows a cross-section of the same substrate after that a titanium nitride layer 3 has been deposited on it. Metalurgical inspection of the cross-section has shown that the martensitic structure has completely dissolved and the substrate structure is completely ferritic, that means, the carbon has been extracted from the layer 2. Martensitic silicon iron has low permeability and ferritic, in particular, the completely carbon free silicon iron has a very high permeability. One embodiment of the invention will be described below. A thin substrate of silicon iron are carborized and heat treated in a conventional way in order to give the substrate a martensitic structure. After that the surface of the sheet is masked by a copper layer electro plated in a conventional way onto the surface so that a predetermined, desired pattern of the silicon iron sheet is left uncovered. The substrate is than put into a vacuum chamber containing a nitrogen-argon gas at about 666,6 mPa (5 mtorr) and the masked surface is exposed to plasma sputtering from a titanium source at about 420 V and with a current of about 4A for about 60 minutes. The process is performed at a temperature of 20 to 600 degrees C, preferrably at a temperature of 20 to 100 degrees C. The copper layer is then removed by a conventional etching process. By the described method a thin silicon substrate has been obtained, which has a desired pattern of regions with high permeability.

Claims: A method for selective decarborization of an iron based substrate, preferably a silicon iron substrate, characterized in that the carbon present in the iron based substrate (11) is extracted by selective desposition by means of a physical vapour deposition (PVD) process at a temperature of 20 to 600 degrees C of a titanium nitride film (3) onto the substrate. A method according to claim 1, characterized in that the titanium nitride film is deposited by plasma sputtering. A method according to claim 1, characterized in that the PVD is performed in a vacuum chamber containing a titanium source and into which an argon-nitrogen gas is introduced. A method according to claim 3, characterized in that the PVD is performed at a potential of 420 V and a current of 4 A during a time of 60 min. A method according to claim 4, characterized in that the argon-nitrogen is introduced at a pressure of 666,6 mPa (5 mtorr). A method according to any of the claims 1 to 5, characterized in that the titanium nitride film is deposited at a temperature of 20 to 100 degrees C.

Inventors: AL-JAROUDI, MOHAMMED YOUSSEF
Applicants: INTERNATIONAL BUSINESS MACHINES CORPORATION
Application year: 1988
Main classification: C21D3
IPC codes: C21D3, C21D1