THICKNESS/DENSITY MEASURING APPARATUS

Abstract: A low-voltage, compact thickness/density measuring apparatus (7) is disclosed which uses a PIN diode (21) in conjunction with a low noise processing circuit (23, 25, 27, 29, 31, 35) to detect particle radiation emitted from a source (15), which source (15) has its detection intensity affected by a material to be measured (17). A light blocking, particle radiation permeable material (19) protects the PIN diode (21) from detecting light radiation. A system for controlling the extrusion (413) of a film (411) using the measuring apparatus (7) is also disclosed.

Description: THICKNESS/DENSITY MEASURING APPARATUS 1 Background of the Invention 1. Field of the Invention The present invention relates to a thickness or density measuring apparatus which is particularly 5 adapted to measure the thickness or density of a film. The invention has particular, though not exclusive, utility in the plastics processing industry where thick¬ ness and/or density of an extruded plastic film must be controlled to production tolerances. 102. Description of the Prior Art Thickness and/or density measuring systems are known in the art which rely on various types of sensors for a measurement. For thickness measurements, mechan¬ ical gauge-type devices are known which contact with the 5 material or object to be measured and which provide a thickness readout which can be used to control apparatus for manufacturing the material and/or object to insure that a desire thickness is obtained. Likewise, density measuring devices are known in which the density of an 0 object is measured usually by passing radiation through the object. Changes in density are seen by changes in the transmi ttance of the radiation through the object. In many production environments particularly where plastic films and sheets are being manufactured, 5 the control over material usage and αual ity of the pro¬ duct is trreatlv enhanced when the thickness of the - 2 - material can be accurately measured. This is especially true when the measurement can be made in an on-line manner where the measurement instrument can be installed on or quite close to the producing machinery and the thickness information can be used in a feedback control system for the process so that optimum parameters can be determined for the machinery to produce a desired film product. In such an environment the output of the mea¬ suring instrument must respond quickly to thickness variations, and the output is fed back electronically or mechanically to control machinery without any human intervention. In order to do this, the instrument must be inherently rugged to withstand the harshness of the production environment, be small enough in size to be able to fit where the measurement is most needed, and have minimal input and output connections so that inte¬ gration with computing and control equipment can be facilitated. At present, many thickness measurements are made using the principles of detection of nuclear and atomic particle radiation emitted from a source. U.S. Patent No. 4,047,029 is representative and discusses various radiation sources including those producing beta particles, X-rays and gamma rays. These rays are atten- uated or scattered whe ' n they pass through a material as a consequence of their interaction with the atoms and nuclei in the material. The amount of interaction is dependent on the number of atoms and nuclei in the path of the radiation and- the tendency of the material to interact with the type of radiation striking it. For a given material and type of radiation the amount of in¬ teraction will depend on the material's density and thickness since density determines the number of atoms and nuclei i n the path of the radiation per unit volume and thickness determines the length of the travel when the radiation is made to pass through the material, usually at ri ht an l s to Present generation thickness measuring devices based on the principles of particle detection will de¬ tect and count indivi-dually particles that pass through a sample of a material and compare the count rate ob- served for an unknown sample with a count rate observed with a sample of known thickness. The material thick¬ ness is then inferred by assuming similar density be¬ tween the known and unknown samples and applying, typ¬ ically, a linear relationship between the count rate and material thickness. The relationship is typically not linear over a very large range but can usually be assumed to be linear over the range of thicknesses en¬ countered in a production environment, without signifi¬ cant loss of accuracy. The method currently employed for detecting such radiation works through the use of a scintilla ion detector or a gas filled ionization counter. The ioni- zation counter consists of a chamber of gas which can be made to ionize by the radiation and the resulting elec- trie charge is collected through the use of a high volt¬ age between the chamber wall and a thin wire in the center of the chamber. Ionized pairs of electrons and atoms are drawn to the opposite polarity, which will be the wall or the wire, depending how the voltage is applied, under the influence of the resulting electric field. This charge is then collected and amplified as a signal in a charge sensitive amplifier and then may be compared to a voltage threshold to determine whether a valid detection has been made. A disadvantage of an ionization chamber in a production environment is that the gas may leak out of the chamber or may break down and degrade through use and the chamber is usually quite large to achieve efficiency, making it difficult to apply to many environmen s. Moreover, the ionization chamber requires a very high voltage, typically in the range of 1,000 to 3,000 volts, and is also costly which further inhibits its widespread use as a thickness mea¬ suring device. The scintillation detector, which is also known in the art to measure thickness, uses a material called a scinti 1lator , which when it absorbs a unit of radiation becomes activated and will deactivate by giv¬ ing off light In the ultraviolet range through the pro¬ cess of scintillation. This ultraviolet light is then detected by a quite sensitive light detector known as a photomultiplier tube. The photomul tipl ier tube is closely coupled to the scintillator material so that ultraviolet light will pass into it. A detection signal from a first photocathode within the photomult iplier tube is typically multiplied by a series of dynode stages which are successively more positive in charge than the preceding dynode stage. The multiplied signal is then taken as an output signal. ■ A disadvantage of the scintillation detector is that it also uses lethal high voltages in the 1,000 to 3,000 volt range and in addition the photomultipl ier tube characteristics change and drift with use and age and with fluctuations in the high voltage level. This type of a detector is also prone to breakage since it is an evacuated glass tube and because of its size, weight and cost this type of detector also cannot be used in many types of environ¬ ments . Semiconductor diode pasrtiele detectors are also known. They consist of a p-type layer, an n-type layer and an optional intrinsic layer in the middle. This diode is sensitive to light and nuclear and atomic radiation when the same strikes the diode. Detectors of this type have been used for high resolution nuclear spectroscopy . The signal generated by this type of detector consists of the collection of charge released when the radiation loses energv in the sensitive region of the detector. This charge is collected across the p- type and n-type materials and is amplified with a high performance charge sensitive amplifier. Typically these types of detection devices have a very small output signal. The output signal is so small that noise generated by thermal effects or impurities and imperfections in the silicon material will overcome the charge signal. For this reason, such detectors are typically operated at quite low tempera¬ tures, usually through the use of a liquid nitrogen coolant to arrive at adequate performance. While this type of detector could be used in laboratory research, it cannot be practically used in a production environ¬ ment . Summary of the Invention One object of the invention is the provision of a small compact, rugged and low cost particle radia¬ tion detecting thickness/densi y measuring system. Another object of the invention is the provi¬ sion of a particle radiation detecting thickness/density measuring system which operates on low voltages. Another object of the invention is the provi¬ sion of a particle radiation detecting thickness/density measuring device which can have separable parts, one including a detection head containing those elements necessary for detecting and registering particle counts and another processing and display section located else¬ where for monitoring the thickness measurement with a simple low voltage cable passing between the two. An additional object of the invention is the provision of a portable low-cost particle radiation detecting t ickness/density measuring apparatus which provides a fixed gap between a radiation source and detection head in which a material of unknown thickness can be placed for measurement. Another object of the invention is the provi¬ sion of a control system for monitoring and controlling the thickness of an extruded film during its production using a plurality of simple, low cost particle radiation detecting thickness measuring devices. The present invention makes particular use of a new type of silicon diode detector which contains a p- layer, an n-layer and an intrinsic layer between them and which is operable at room temperature to detect radiation. The device, termed a PIN diode, is primarily intended for detection of laser and ultraviolet light, but it has also been discovered that this detector is also sensitive to nuclear and atomic radiation such as beta particles, X-rays and ganrna rays. The invention employs the PIN diode in a par¬ ticular mechanical and circuit con iguration to enhance its ability to detect particle radiation only. A light blocking window is used to screen the PIN diode from the effects of light radiation while the output signal therefrom is connected to a charge sensitive preampli¬ fier. A high quality amplifier is then connected to the output of the preamplifier to develop a suitable signal which can be provided to a threshold detector, the out- ut of which is sent to a pulse rate counter. The out- put of the pulse rate counter can be used together with pulse rate information ' derived during previous calibra¬ tion use of the invention for a material of known thick¬ ness to determine a thickness measurement from a de¬ tected pulse rate when a material of unknown thickness is provided in the path of the radiation from a source to the PIN diode detector. Similar calibration and detection steps can be used to employ the invention as a density measuring device. By using a PIN diode and associated small scale electronics package, a small compact detector can be provided which will allow it to he used in many applications that present generation thickness measuring devices based on the principle of particle radiation cannot approach. Typically, such a detector could be used in profile extrusion, blown film and blow molding, as well as the typical areas such as sheet and film extrusion. Moreover, since the measurement instrument of the invention requires only low voltage circuits, there is no safety hazard and associated heavily insu¬ lated power cables and connections are avoided thereby opening up new installation possibilites over present day equipment. Still further, the small size and com¬ pact solid state construction can provide high reliabil¬ ity and stability, while minimizing the possibility of damage of breakage of glass tubes or gas chambers typ- ically associated with prior art devices. Fewer cali¬ bration operations and fewer repairs are also attendant the construction. Finally, because of its compact size, solid stage construction and use of relatively low cost components, the detector can be manufactured at lower cost than present generation thickness measurement sys¬ tems . Because of its low cost and compact construc¬ tion, a plurality of measuring devices can be arrayed across an extruded film to measure the material thick- ness simultaneously across its width at discrete points. Because of the complexity and size of present generation equipment, this approach cannot now be achieved, and instead mechanical scanning of a thickness measuring device across the width of a sheet must be employed which has undesired complexity due to the mechanical scanning mechanism. Each of the plurality of thickness measuring devices provided in the array can then be used to control a respective section of processing machinery such as respective lip sections of an extrusion die to control the extruded product to desired specifications. - 8 - The above and other objects, advantages and features of the invention will be more readily under¬ stood from the following detailed description of the invention which is provided in connection with the accompanying drawings. Brief Description of the Drawings Fig. 1 illustrates in electrical block and schematic form a first embodiment of the present inven¬ tion; Fig. 2 illustrates in flow chart form a micro¬ processor program for a method of calibrating and mea¬ suring an unknown thickness using the embodiment shown in Fig. 1 ; Fig. 3 illustrates in flow chart form a micro- processor program for another method of calibrating and measuring an unknown thickness; Fig. 4 illustrates a modification of the Fig. 1 embodiment showing a different way of mounting a part¬ icle radiation detector; Fig. 5 illustrates another modification of the Fig. 1 embodiment; Fig. 6 illustrates a modification of the Fig. 4 embodiment; Fig. 7 illustrates another modification of the Fig. 1 embodiment using a back-scatter radiation tech¬ nique; Fig. 8 illustrates a control system for an extrusion die utilizing the present invention; Fig. 9 illustrates an array of thickness raea- suring detectors for use in a control system for con¬ trolling the thickness of an extruded film; Fig. 10 illustrates in flow chart form a microprocessor program for a method of calibrating and measuring an unknown density using the embodiment shown in Fig. 1 ; and Fig- H illustrates in flow chart form a microprocessor program for another method of calibrating and measuring an unknown density. Detailed Description of the Invention Fig. 1 illustrates the thickness/density mea¬ suri g system of the invention in partly schematic, partly block diagram form. The thickness/density mea¬ suring system 7 is constructed in two component parts identified in Fig. 1 as detector head section 11 and processor and display section 13. These sections are interconnected by a low-voltage cable 37 and are de¬ scribed more fully below. Detection head section 11 includes the detect¬ ing electronics for a t ickness/density measurement, w ile processor and display section 13 contains the processing and display components for providing a dig¬ ital display of a thickness/density measurement and/or an output signal representative of the thickness/density measurement which can be used for control purposes. Turning now to the detector head section 11, it includes a window 19 in the housing which blocks entry of light radiation into the housing, but which permits particle radiation to pass therethrough. Suit¬ able materials which can be used for window 19 include aluminized mylar. Disposed behind window 19 and within housing 11 is a PIN diode 21 which is sensitive to radi¬ ation, both light radiation and particle radiation. As noted, window 19 is impervious to light radiation so that PIN detector 21 can only detect particle radiation such as X-rays, beta rays and gamma rays. This particle radiation is emitted by a radiation source 15 which is spaced from window 19. The material 17 to be measured is placed between the radiation source 15 and window 19. The output of PIN diode 21 is connected to a charge sensitive prearnplifier 23 the output of w ich is - 10 - connected to a first high pass filter 25. The output of the high pass filter 25 is in turn passed to the input of a low noise operational amplifier 27, the output of which then passes through a second high pass filter 29. The output of the high pass filter 29 represents voltage pulses which correspond to charges which are detected by the PIN diode 21. The output of the high pass filter 29 is connected to the input of a comparator 31 which has a threshold set by resistive network 33 applied to another input thereof. The high pass filters block low frequency noise components while the threshold of comparator 31 is set so that miscellaneous noise which does not constitute a valid detection pulse will not affect the readings of the instrument. When the output of the high pass filter 29 exceeds the set thres¬ hold the comparator 31 provides an output pulse which is then fed to an opto-isolation and line driver circuit 35. The output of the isolation circuit 35 is then connected to a terminal strip on the detector head sec- tion 11 for connection with additional processing elec¬ tronics in the digital processing and display section 13. Before describing the digital processing and display section 13, the remainder of the circuitry pro- vided in the detector head section 11 will be described. In order to provide operative power to the various elec¬ tronic components within the detector head section 11, a power supply is built therein. Because the PIN diode requires different voltages than other electronic com- ponents within the detector head assembly, a multivolt- age power supply is provided in the form of a trans¬ former 39 having a plurality of primary windings 41 and 43 and a plurality of secondary windings 45, 47 and 49. The secondary windings are connected to respective diode/capacitor networks and provide the operating D.C. voltages required for the various circuit components 1 within the detector head section 11. One side of pri¬ mary winding 41 is connected to receive an unregulated input voltage applied to an input terminal strip 36 at the detector head section 11 and received from the dig- 5 ital processing and display section 13. This unregu¬ lated voltage supply is switched by a transistor switch¬ ing device 42 under control of a pulse width modulator 53. Pulse width modulator 53 also receives a D.C. volt¬ age input from a primary reference winding 43 through a lOdiode capacitor network such that the pulse width modu¬ lator 53, network 51 and switching device 42 as well as the primary winding connections function to provide a regulated voltage output at the secondary terminals 46, 48 and 50. 15 An important aspect of the present invention is that the detector head section 11 can be made of very small size and the power supply for the detector head operates on low D.C. voltages which makes the detector head suitable for placement in many environments wherein 20 high voltages and/or bulky and complex equipment cannot be provided. The digital processing and display section 13 provides a low voltage power supply input to the detec¬ tor head 11 and supplies this via a power supply circuit 2557 which receives an A.C. power input 67. Alternative¬ ly, a D.C. power source can be provided. The digital processing and display section 13 further includes a timer 59 which defines time windows during which a dig¬ ital pulse counter 61 is enabled to count pulses which 30 are received from the output of the opto- i solat ion cir¬ cuit 35 in the detector head section 11. The pulse counter 61 is gated by the timer 59 to establish a pulse rate counting circuit which provides a count pulse for a given period of time. The output of the digital pulse 35Counter 61 is in turn gated into a microprocessor 63 which includes the usual ROM and RAVI memory circuits for - 12 storing programs and data. A manually operable panel input service 71, containing a plurality of input switches or keys and input setting devices, is also provided for providing input information to the micro- processor 63. The microprocessor also provides as out¬ put signals a digital signal on terminals 69 represent¬ ing a thickness or density measurement and an output signal to a digital display 65 provided within the dig¬ ital processing and display section 13 also representing a thickness or density measurement. At this point it should be noted that the first embodiment of the invention can be used for either a thickness or a density measurement, depending on the programming of microprocessor 63 as will be more fully described below. Microprocessor 63 contains an algorithm for calculating a thickness or density measurement based on the count rate it receives from the digital pulse counter 61. It is first necessary to calibrate micro- processor 63 with reference data corresponding to refer¬ ence data which indicates a known thickness or density and a measured count rate for that known thickness or density so that later measurements can be related to this calibration standard. The calibration for and measurement of an unknown thickness of a film will first be described. Fig. 2 illustrates in flow chart form the programming of microprocessor 63 which enables it both to be calibrated in the first instance and then to take thickness measurements thereafter. The operation de¬ picted in Fig. 2 is based on a two sample calibration technique. In a first step 101 of the processing, a switch on the front panel input device 71 of Fig. 1 is read to determine whether a calibration or a measuring operation is desired. In step 103 the microprocessor determines which type of processing is required. If a calibration procedure is selected by the front panel input devices 71, the microprocessor proceeds to step 105 where it displays on the digital display 65 a prompt to an operator instructing him to insert a reference sample into the measuring path between source 15 and window 19. In addition, the microprocessor further reads a thickness setting input device, e.g., digital value switches, on the front panel input device 71 to obtain a signal representing an actual thickness T j of this sample. Following step 107 the microprocessor proceeds to step 109 where it measures the count rate C j , for the sample of known thickness in step 109. Following this the microprocessor activates the digital display 65 to prompt an operator to place a second sam- pie of known thickness between the radiation source 15 and window 19. In addition, the microprocessor receives as an input on front panel input device 71 an entered thickness T 2 corresponding to the second sample. There¬ after, the microprocessor proceeds to step 115 and mea- sures the count rate C 2 for the second sample and after this proceeds to step 117 where it computes a slope M value using the equation: M = (T 2 -T 1 )/(C 2 -C 1 ) * (1) Following this, the microprocessor proceeds to step 119 where it calculates an intercept value B as B = T χ -(M x C, ) (2) The slope value M and intercept value B are then stored in step 121 for later use by the instrument in calculat¬ ing thickness of a sample of unknown thickness. Returning to step 103, if an actual measure¬ ment is desired, the microprocessor proceeds from step 103 to 123 where it measures a count Cu rate for a sam¬ ple of unknown thickness. Thereafter it computes an actual thickness T using the equation u = (M x Cu) + 3 (3) where M and B are the values previously obtained in the calibration step. This yields a thickness measurement which is then displayed on digital display 65 in step 127 or alternatively output to control equipment on lines 69 of the digital processing and display unit 13. Fig. 3 shows an alternate thickness calibra¬ tion and measurement program which can be used with the microprocessor 63. In this processing sequence, a single calibration sample is used to calibrate the in- strument. In a first step 201 the front panel input device 71 is read to determine whether a calibration, a measurement, or a material type entry routine is to be executed. If the front panel switch at input device 71 indicates a calibration routine is desired, step 203 causes retrieval and execution of the calibration sub¬ routine. The microprocessor thus proceeds to" step 205 where it prompts an operator on the digital display 65 to insert a calibration sample between the radiation source 15 and window 19. In addition, a thickness T g of the material sample is input at step 207 on the front panel input device 71 and following this step the micro¬ processor proceeds to step 209 where it measures a count rate C„s . It then records the measured count rate Cs„ and the inserted sample thickness T g in step 211 and pro- ceeds back to step 201. With the Fig. 3 calibration technique, a material type entry, e.g., polyester, nylon, acrylic, etc. must also be made at input device 71. When the material type entry is indicated on the front panel input device 71, the microprocessor 63 senses this in step 203 and then branches to step 223 where it displays a prompt on the digital display 65 for an operator to enter, via the front panel input device 71, a material type which is used in the calibration. Material type as set in the front panel input device 71 Is then read by the microprocessor 63 in step 225 re¬ corded and stored in step 227. All the data required for the microprocessor now to calibrate itself for mak¬ ing an actual measurement of the material thickness is present. Thus, when the front panel input device 71 is now set for a measurement, step 203 executed by the microprocessor will cause a measurement routine to be started at step 213 where the count rate Cu of an un¬ known sample placed between the source 15 and window 19 is taken. After this, in step 215, the values C and T g obtained during the calibration routine are retrieved following which, in step 217, an M value is obtained based on a table stored in the microprocessor interre¬ lating the count values C g , the set thickness T g and the inserted material type. This table is a stored lookup table and contains various values of M based on various combinat ions of values of C g , T g and material type. Following step 217, where the value M is obtained from the lookup, a thickness computation is made in step 219 based on the formula T u = (M x (C u -C 3 )) + T s (4) The thickness value is then displayed in step 221 on display 65 or output on lines 69 to further processing or control apparatus, following which the microprocessor proceeds back to the beginning of the program. The calibration techniques described in Figs. 2 and 3 have their respective advantages and disadvant¬ ages. The calibration technique of Fig. 2 is straight¬ forward and requires only operator entry of known thick¬ ness values, but requires two samples of different known thicknesses for calibration. While it provides a very good calibration of the instrument, the requirement of having two samples of close, but measurably different thickness, may be difficult at times and sometimes even impossible to achieve. Consequently, the Fig. 3 cali¬ bration technique, which is somewhat more cumbersome to execute, requires only one sample, has that as one bene¬ fit. The theory on which the calibration of Fig. 3 is based is that a particular count rate observed under any given circumstances will be effected by a number of factors including source strength, source to detector separation and geometry, losses in the detector window, dirt accumulation on the detector window, electronic sensitivity and threshold setting, and, of course, material composition and thickness. A single calibra¬ tion sample observation will establish the net result of the combination of these parameters at a particular point in time. In production use, the only variable of practical concern is the unknown material thickness for a reasonable period of time. A reasonable period of time is established by such factors as a half life of a radioactive source which typically would be quite long compared to a production period, the drift rate of the electronics, and the rate of accumulation of dirt on the window. The Fig. 3 calibration technique is based on the fact that once a count rate has been established for a given thickness of a type of material under a certain condition of source strength, source to detector separa¬ tion etc., the variation and count rate with material thickness represented by M in Equation 4 above, can be predetermined and stored permanently in the device for use during production measurements. Since M will be somewhat dependent on the nominal count rate and type of material being measured, a number of values of M can be predetermined and stored in the microprocessor 63 and an M can be selected by microprocessor 63 which most close¬ ly matches the operating conditions. The material type is thus operator selectable through the front panel input device 71 and the nominal count rate can be taken during a calibration sample count so that the micropro¬ cessor 63 can then make appropriate selection of the value M. To determine the initial values of M which can be permanently stored in the microprocessor 63 repeated application of Equation 1 above can be used over a range of material types and thicknesses. These results can be arranged in a tabular form so that when a particular calibration sample thickness and material type are entered and the count rate observed, the value of M which most closely matches these conditions can be se¬ lected for use. In sunrnary, the calibration technique illus¬ trated in Fig. 3 has the advantage that a single sample of production material^ manually measured for thickness, can be used as the calibration sample and to establish the nominal count rate of production for the algorithm to select a proper value of M for later thickness mea¬ surements. A single step calibration procedure is thus provided which is more readily used by unskilled ope- rators . Fig. 4 illustrates a modification of the de¬ tector head 11 illustrated in Fig. 1. In this embodi¬ ment, an easily removable detector head assembly is provided which can be readily fixed to production machinery. The PIN diode 21 is shown bonded by an Epoxy 305 or similar adhesive to the inner periphery of an exteriorly threaded sleeve 303. An aluminized mylar en¬ trance window in the form of a film 309 is provided at one end of the threaded sleeve 303 with an O-ring seal 313 being provided between the mylar window and an end of threaded sleeve 303. A locking cap 301 is threaded onto the outer periphery of threaded sleeve 303 which serves to hold the mylar film 309 in place and which also serves to provide a backstop which limits the a- mount of travel of the threaded sleeve into an opening in the section 11. Cap 301 includes an opening 302 at a front side thereof at a position co responding to the location of the mylar window 309. A backing nut 311 is screwed onto the threaded shaft 303 behind a wall of the detector head housing 11 to hold the entire detector head in place. The lead? of the PIN diode 21 are then - 18 affixed to an electronic circuit board containing the remainder of the electronics of the detector head assembly shown in Fig. 1. The design of the housing illustrated in Fig. 4 is particularly advantageous as it allows ready replacement of the actual detector head itself, including the PIN diode, without requiring a complete disassembly of the components within housing 13. The aluminiz'ed mylar window 19 and 309 illus- trated in Figs. 1 and 4 can be formed of a mylar film having a thickness of 0.5 to 5.0 mils. The window can also be made of a thin aluminum or stainless steel foil. In addition, the PIN diode illustrated in Figs. 1 and 4 is a windowless construction wherein protective layers covering " the active PIN areas are not provided by the manufacturer to maximize radiation sensitivity. Thus, the mylar window 19 or 309 provides the principal form of protection for PIN diode 21. Mylar window 309 of Fig. 4 contains the same aluminized construction as Fig. 1 which blocks light radiation from striking the PIN diode 21, thereby improving reliability of detection of particle radiation. In the embodiments of the invention thus de¬ scribed, the radiation source, which may emit gamma rays, X-rays, or beta rays, is fixedly spaced from the detector head section 11 by being mounted on a separate support. It is also possible to provide an integral support on the detector head section 11 for the detector source which would then provide a fixed gap between the source and PIN detector within which a material whose th . ickness is to be measured can be placed. This embodi¬ ment is illustrated in greater detail in Figs. 5 and 6 which respectively correspond to the embodiments of Figs. 1 and 4, but with an extension arm 315 integrally connected to section 11 and extending therefrom in a L- shape fashion to provide a gap between the radiation source and radiation detector. With this integral con¬ struction, it is possible to construct the entire detec¬ tor unit as a simple portable assembly. Moreover, since the detector unit operates on low voltages, it is fur- ther possible to incorporate all of the electronics including those of the digital processing and unit pro¬ vided in section 13 of Fig. 1 into a single housing which is readily portable to different environments of use. Fig. 7 illustrates a modification of the in¬ vention wherein the detector head section 11' is used in a backscatter radiation detection technique. In this embodiment, the PIN diode 21 is mounted within a rela¬ tively thick material portion of one end of the section 11. In addition, the radiation source 15' is also mounted in the same end of the housing but the housing is configured so that most, if not all, of the radiation from source 15 projects outwardly of the housing and not directly toward the PIN diode 21. As a consequence, a material can be stretched across the one end of the section 11 in front of the radiation source 15 and PIN diode 21, and backscatter radiation can be detected from the source by the PIN diode. The amount of backscatter- ing which occurs will be dependent on material thickness and thus the instrument can be caliabrated for radiation count based on backscatter using either of the calibra¬ tion techniques described above with respect to Figs. 2 and 3. In the Fig. 7 embodiment, the PIN diode is mounted in a PIN diode holder 26 which has external screw threads which screw with a threaded bore 28 pro¬ vided in one end of the detector head section 11. The only difference between the microprocessor 63 programming for calculating a thickness value when the backscatter approach is used is that the numerical sign of the slope constant M will evaluate to be posi¬ tive when the calibration procedure is followed. This is due to the fact that the count rate increases for increasing material thickness in the backscatter mode while it decreases for increasing material thickness in a transmission mode. Figs. 8 and 9 illustrate a control system with which the thickness measuring device 7 of the invention can be particularly suitably employed. The control system is used to control sections of die lips of a film extrusion system. Fig. 8 is a side view of the system which includes an extruder barrel 401 supplying a plas- ticized material to a die 403 for extruding a thin sheet of plastic material. Die 403 includes die lips 405 at the outlet end thereof which are adjustable with respect to the gap defined by the lips to thereby adjust the thickness of the material leaving the die. Typically, a bolt 407 is used to adjust the die lips with manual operation of the bolt being used to effect a coarse adjustment and with a system providing a fine adjustment of the gap between the die lips. In many instances, the fine adjustment is provided by actually heating the bolt 407 to provide fine adjustment of the die gap. This heating is controlled by a control system 413 which includes a typical PID (proportional, integral, deriva¬ tive) controller which in turn is connected to the out- put of the thickness measuring device 7 illustrated in Fig. 1, particularly to the output provided at terminals 69. Film 411 which passes from the die lips is taken over a haul-off roller 409. In order to measure thick¬ ness, a radiation source 15 is provided on one side of the film and the detector, including housing sections 11 and 13 are provided on the other side of the film. Alternatively, a backscatter technique may be employed as illustrated in Fig. 7. In either event, the output signal of the thickness measuring device is applied to the PID controller 413 to in turn control the heating of bolt 407 which finely controls the gap of die lips 405. 1 As illustrated in Fig. 9, for a sheet of substantial width, the die lips 405 are divided into a plurality of die lip sections 405a...405f, with each being controlled by respective die bolts 407a...407f and with the heating 5 of each die bolt being in turn controlled by a respec¬ tive PID controller 413a...413f. The inputs to each of these controllers are respectively derived from indivi¬ dual thickness measuring devices 7a...7f constructed as described above. With this arrangement, each measuring lOdevice 7 measures a portion of the width-wise extent of the film 411 and in turn controls individually its own heater bolt 407 so that the thickness of each section of the width-wise dimension of the film is individually and separately controlled. 5 Thus far, the invention has ' principally been described with reference to thickness measurements. However, it is also possible to use the same apparatus for measuring density. To allow density measurement, three conditions must occur, the thickness of a material 0 placed between the source and detector must remain con¬ stant, or the material completely fills the volume be¬ tween the source and detector as in a fluid medium, or the thickness is known and fed into an algorithm by an external thickness measuring device which can then cal- 5culate a density from the measured thickness and known material characteristics. Fig. 10 shows a modification of the Fig. 2 flow chart to permit use of the Fig. 1 apparatus for a density measurement. As shown therein, step 107 is modi- 0 fied as new step 107' , step 113 is modified as new step 113' , and steps 117, 119 and 125 are all modified as new steps 117' , 119' and 125' . Without describing again all of the steps illustrated in Fig. 2 which are common in Fig. 10, those 5 steps which are common have the same reference numbers. Those steps which are changed are designated by a prime - 22 - (') symbol. In step 107' of Fig. 10, a density O-^ is entered for a first material sample while in step 113' a density D, is entered for a second material sample. In step 117', the slope M is computed using the formula M = (D 2 -D 1 )/(C 2 -C 1 ) (5) In step 119', the intercept is computed as B = D 1 -(M x C j _) (6) With the now stored calibration values of M and B, a density measurement can then be carried out, with the density computation made in step 125' as D u = (M x C u ) + B (7) Fig. 11 illustrates the modifications needed for the Fig. 3 flow chart to attain a density ' measure¬ ment. In the calibration technique for density mea¬ surement illustrated in Fig. 11, an input sample density is input to the system in step 207' and this together with a detected count rate C for the sample is recorded at step 211'. A sample material type is also entered and stored at step 227. Finally, to calculate a density measurement, a measured count rate Cu at step 213 is first taken following' which values C s and D g entered during the calibration sequence are used to obtain a slope value M from a table based on C s , D g and material type. From this, a density measurement can then be calculated using subroutine represented by steps 213, 215, 217', 219' and 221' as follows. A count rate is measured at step 213 following which the value C s and D s are retrieved in step 215'. From this the value of M is obtained from a stored table based on the values of C g , D g and material type. In step 219' the density D u is computed from the formula D u = (M x (C u -C 3 )) ÷D g (3) The density value is then displayed on digital display 65 or sent to output terminals 69 in step 221' . It is also possible to calculate a density when a thickness of a sample is known or measured from the equation D u = T s T u x ((M(C U -C S )) + D s ) (9) where Ds„ is a density of a calibration sample, M is the slope factor calculated in the manner described in steps 213...221' of Fig. 11, T u is a thickness of a sample in front of the detector and T g is a thickness of a density standard. It is also ' noted that the apparatus of the invention can also be used as a material flaw or void detection apparatus since flaws and voids can be recog- nized by a change in a density value. As is apparent from the foregoing description, the present invention provides a compact thickness/- density measuring apparatus which can be used in a wide range of environments, particularly environments where high voltages and/or complex and bulky structures cannot be used. The measurement instrument is compact and easily transportable and can be configured as a portable uni t . While various embodiments of the present in- vention have been described and illustrated in connec¬ tion with the drawings, it should be apparent that many modifications can be made to the invention as described, without departing from the spirit and scope of the in¬ vention. Accordingly, the invention is not limited by the foregoing description but is only limited by the scope of the claims appended hereto.

Claims: Cl a ims 1. A thickness/density measuring apparatus compr is ing: a particle radiation source; a particle radiation detector spaced from said source and comprising a PIN diode; means for preventing light from impinging on said diode, but permitting particle radiation from said source to strike said diode; a charge sensitive preamplifier connected to an output of said diode; a first high pass filter connected to the output of said preamplifier; an operational amplifier connected to the output of said first high pass filter; a second high pass filter connected to the output of said amplifier; a comparator receiving the output of said second high pass filter and providing an output signal when the level of said second high pass filter output exceeds a set threshold; and means responsive to the output of saiδ comparator for providing a signal representative of at least one of the thickness and density of a material placed between said particle radiation source and part- icle radiation detector. 2. A thickness/density measuring apparatus as in Claim 1, wherein said providing means comprises a pulse rate counter coupled to the output of said com¬ parator means and means responsive to the output of said pulse rate counter for producing said signal. 3. A thickness/density measuring apparatus as in Claim 2, wherein said producing means comprises a microprocessor for converting a pulse count rate into said s ignal . 4. A thickness/dens i ty measuring apparatus as in Claim 1, futher comprising an opto- i solator for coupling the output of said comparator to said providing means . 5. A thickness/density measuring device as in Claim 1, further comprising a power supply for supplying operating power to said diode, preamplifier, amplifier and comparator, said power supply comprising means for providing a first unregulated D.C. voltage of a first value and means for producing from said unregulated D.C. voltage a plurality of regulated D.C. voltages. 6. A thickness/density measuring apparatus as in Claim 5, wherein said means for producing a plurality of regulated D.C. voltage comprises a transformer for receiving said unregulated D.C. voltage at a first pri¬ mary winding thereof and for supplying said regulated D.C. voltages at a plurality of secondary windings, means for switching the current through said first pri¬ mary winding, a pulse width modulator for operating said switching means, and means for coupling said pulse width modulator to a second primary winding of said trans¬ former . 7. A thickness/density measuring apparatus compr is ing: a detector unit, a processing unit spaced from said detector unit and a communication link coupl¬ ing said detector and processing units, said detector unit comprising: a housing having a light blocking, part- icle radiation permeable, window therein; a flat area PIN diode mounted within said housing and adjacent said window for receiving particle rad iat ion ; a charge sensitive preamplifier connected to the output of said PIN diode; - 26 - an operational amplifier coupled to the output of said preamplifier; a high pass filter coupled to the output of said amplifier; a comparator coupled to the output of said filter for comparing said filter output with a set threshold; and means for coupling the output of said comparator to an output terminal of said detector unit; said processing unit comprising: means for receiving the output of said comparator and for converting said comparator output to a measurement signal representing at least one of thick¬ ness and density of an object. 8. A thickness/density measuring apparatus as in Claim 7, wherein said communica ions link is a wired connection between said detector unit and said process¬ ing unit. 9. A thickness/density measuring apparatus as in Claim 7, wherein said processing unit further com¬ prises means for displaying a representation of said measurement signal. 10. A thickness/density measuring apparatus as in Claim 7, wherein said means for receiving and con- verting comprises a pulse rate counter coupled to the output of said comparator means and means responsive to the output of said pulse rate counter for producing said measurement signal. 11. A thickness/density measuring apparatus as in Claim 10, wherein said producing means comprises a microprocessor for converting a pulse count rate into said measurement signal. 12. A thickness/density measuring apparatus as in Claim 10, futher comprising an opto- i solator for coupling the output of said comparator to said process¬ ing uni t . 13. A thickness/density measuring device as in Claim 7, further comprising a power supply for supplying operating power to said diode, preamplifier, amplifier and comparator, said power supply comprising means lo¬ cated in said processing unit for providing a first ° unregulated D.C. voltage of a first value; means located in said detector unit for producing from said unregu¬ lated D.C. voltage a plurality of regulated D.C. volt¬ ages, said coπmun i cat i ons link connecting said means for providing said first unregulated D.C. voltage with said 5means for producing a plurality of regulated D.C. volt¬ ages . 14. A thickness/density measuring apparatus as in Claim 13, wherein said means for producing a plural¬ ity of regulated D.C. voltage comprises a transformer 0for receiving said unregulated D.C. voltage at a first primary winding thereof and for supplying said regulated D.C. voltages at ,a plurality of secondary windings, means for switching the current through said first pri¬ mary winding, a pulse width modulator for operating said 5switching means, and means for coupling said pulse width modulator to a second primary winding of said trans¬ former . 15. A thickness/density measuring apparatus compr i s ing: a particle radiation detector for receiv¬ ing particle radiation, said detector comprising a PIN diode; means for preventing light radiation from striking said diode, but permitting particle radiation to strike said diode; - 28 a charge sensitive preamplifier coupled to the output of said PIN diode; an amplifier coupled to the output of said reampl i fi er; a comparator coupled to the output of said amplifier for providing an output signal when the level of the output of said amplifier exceeds a set threshold; means responsive to the output of said comparator for providing a pulse rate signal; and means for converting said pulse rate sig¬ nal to one of a thickness or density measurement of a material which is positioned to affect the amount of radiation which reaches said detector from a particle radiation source. 16. A thickness/density measuring apparatus as in Claim 15, further comprising a radiation source spaced from said detector. 17. A thickness/density measuring apparatus as in Claim 16, wherein said detector is mounted in a hous- ing and said source is mounted on an arm extending from said housing at a position to oppose said detector whereby a gap is formed between said source and detector for accommodating a material to be measured. 18. A thickness/density measuring apparatus as in Claim 16, further "comprising means for mounting said radiation source relative to said detector such that particle radiation detected by said detector is back- scattered by said material to be measured. 19. A thickness/density measuring apparatus as in Claim 16, wherein said detector is mounted within a housing behind a particle radiation permeable, light radiation-blocking window of said housing. 20. A thickness/density measuring apparatus as in Claim 19, wherein said window is a thin film window. 1 21. A thickness/density measuring apparatus as in Claim 20, wherein said window is formed of an alumin- ized my1ar . 22. A thickness/density measuring apparatus as 5 in Claim 16, further comprising a first high pass filter connected between said preamplifier and amplifier. 23. A thickness/density measuring apparatus as in Claim 22, further comprising a second high pass fil¬ ter connected between said amplifier and comparator. 10 24. A thickness/density measuring apparatus as in Claim 15, further comprising an opto- isolator con¬ nected between said comparator and said means providing a pulse rate signal. 25. A t ickness/density measuring apparatus as 15. in Claim 15, wherein said apparatus is usable for a thickness measurement and further comprises means for calibrating said apparatus for a thickness measurement, said calibrating means comprising means for entering an actual thickness value (T g ) for a calibration material 20 sample, means for determining a sample pulse count rate (C g ) for said material sample, means for storing the values (Cs ) and (Ts ) , means for entering an indication of material type for a measured material, means for storing said entered material type, and means for stor- 5 ing a pluality of slope values (M) for various combina¬ tions of a sample pulse count rate ( c s ) > an entered actual thickness value (T g ) and an entered material type. 26. A thickness/density measuring apparatus as 0 in Claim 25, wherein said converting means comprises means for computing a thickness value in accordance with the following: T u = (M x (C u -C 3 )) f T s where T is the unknown thickness value, C is the pulse rate signal, T is the actual thickness of a material sample used for calibration, C is the pulse count rate for said material sample, and M is a slope value se- lected from said plurality of slope values which corre¬ spond to an entered T value, a determined C value, and an entered material type. 27. A thickness/density measuring apparatus as in Claim 15, wherein said PIN diode contains no protec- tive layers between said preventing means and particle radiation sensitive areas thereof. 28. An extrusion film thickness control system comprising means for extruding a film thickness through a gap defined by pairs of die lips divided into a plur- ality of die lip sections along their length: a thickness measuring device for each die lip section, each measuring device comprising a particle radiation source; a particle radiation detector spaced from said source and comprising a PIN diode; means for preventing light radiation from striking said PIN diode, but permitting particle radiation to strike said diode, a charge sensitive preamplifier connected to an output of said diode; an amplifier coupled to the output of said preamplifier; a comparator coupled to the output of said amplifier and providing an output signal when the level of the output of said amplifier exceeds a set threshold; means responsive to the output of said com¬ parator for providing a signal representative of at least one of the thickness of a material placed between said particle radiation source and particle radiation detector; means for separately controlling the gaps of each of said lip sections; and means for respectively associating an output of a measuring device with the control means for a respective die lip section which produces a section of 29. A control system as in Claim 28, wherein said control means comprises, for each die lip section, a heated bolt driven by an output signal from a respec¬ tive thickness measuring device.

Inventors: PETTIT JOHN W, PETTIT, JOHN, W.
Applicants: PETTIT JOHN W, PETTIT, JOHN, W.
Application year: 1988
Main classification: G01N23
IPC codes: G01B15, G01N9, G01N23, G01N33