Method for producing apertures on a lenslet array

Abstract: An aperture pattern between the lenslets (9, 10, 11) of a lenslet array (12), having at least partially opaque barriers between the lenslets (9, 10, 11), is formed by depositing a photoresist (26) over the entire surface of the lenslets (9, 10, 11) and the spaces therebetween and shining ultraviolet light (30, 32) from the back of the array (12) so that light exposes the photoresist (26) in the lenslet (9, 10, 11) portions but not in the areas therebetween.

Description: The invention relates to a method for producing an aperture for a lenslet array used, for example, in an autofocus camera. In US-A 4,185,191 a range finding system for primary use in auto focus cameras is described utilizing a lenslet array with pairs of detectors behind each lenslet to receive radiation from a remote object and to produce, on the detector pairs, an image of the exit pupil of the camera taking lens. The detectors produce electrical signals for use by the system to determine the proper focus position for the remote object. In such a system, there is a need for a light blocking aperture between the lenslets to prevent radiation from reaching the detectors except by way of the lenslets. One aperture is shown in US-A 4,425,501 where an opaque sheet or card with small holes therein is placed over the array so that the lenslets protrude through the holes. Another technique for forming the aperture is described in Japanese patent 55-106420 where the areas around the lenslets are painted or filled to block radiation. In US-A 4 695 719 an aperture is created by solid state deposition techniques. All of these procedures require rather extensive labor to create the aperture and, in the case of the deposition technique, involve the making of a very accurate mask to expose a photoresist on the lenslet array to ultraviolet light. One solution to this latter problem is proposed in co-pending application EP-A-0 309 948 having the same priority and publication dates as the present application. In EP-A 0 285 796, published October 12, 1988 and having a priority date of March 2, 1987 (cited under Article 54(3)EPC), a distributed aperture autofocus sensor is disclosed which, utilizing a procedure described in US-A 4,572,611, produces a lenslet array in which the individual lenslets are separated by columns of opaque partitions or barriers. These barriers extend between the lenslets throughout the material, usually glass, in which the lenslets are formed. As a result, cross over radiation from adjacent lenslets is reduced. Although in many cases, these barriers may take the place of an aperture, some radiation still penetrates the barriers making it desirable to have an aperture in addition to the barriers. Any of the above described methods could be used to provide the desired aperture between the lenslets but each such method would continue to have the difficulties associated therewith. It is the object of the invention to provide an improved method of forming an apertured pattern on a lenslet array, which facilitates the application of opaque surfaces surrounding the individual lenslets of the array. These objects are achieved by the invention as defined in Claim 1. The invention discovered that an aperture can be created on the kind of lenslet array which has the rather opaque barriers described above, in a way which is self aligning, simple and does not require the high accuracy mask that was involved in the solid state deposition procedure mentioned above. This is accomplished by using a deposition procedure, but instead of creating a very accurate mask, the invention uses the rather opaque barriers themselves as the mask and exposes the photoresist material to the ultraviolet light from the backside of the lenslet array. Preferred details of the invention are described in the dependent claims. The new method according to the invention will now be explained with reference to the drawings, in which: FIGURE 1 shows three members of a lenslet array; FIGURE 2 shows the lenslet array of FIGURE 1 with a layer of photoresist thereover and being exposed to ultraviolet light from the backside of the array; and FIGURE 3 shows the lens let array of FIGURE 2 after exposure to the ultraviolet light and with the removable photoresist having been washed away. In FIGURE 1, three lenslets 9, 10, and 11 of a lenslet array 12 are shown substantially as they appear in the above-mentioned co-pending application EP-A 0 285 796. The lenslets are preferably created by a process such as is described in the above-mentioned US-A 4,572,611 so as to leave vertical relatively opaque barriers 19, 20, 21, and 22 between adjacent lenslets. While not shown in FIGURE 1, on the back side of the array underneath each of the lenslets 9, 10, and 11, a pair of detectors will be positioned to receive light that is transmitted through the lenslets. In an autofocus system such as is described in the above-mentioned US-A 4,185,191, the detectors will receive radiation from a remote object through the lenslets so as to produce output signals which are usable by the autofocus system to determine the range to the remote object. Although the substantially opaque barriers 19, 20, 21, and 22 produce, themselves, a kind of aperture between the lenslet 9, 10, and 11 and do prevent much of the undesirable light from entering between the lenslets, it has been found desirable to have an additional aperture on top of these barriers and between the lenslets. FIGURE 2 shows the array 12 of FIGURE 1 with a photoresist 26 distributed across the entire surface of the lenslets and the spaces therebetween. In one preferred embodiment, the photoresist 26 is mixed with a light blocking dye or is darkened by a photographic process so as to prevent light passing therethrough. A source or ultraviolet radiation 30 is shown underneath the lenslet array which shines ultraviolet light such as is shown by arrows 32 from the backside up through the material of the lenslets. It is seen that light will travel readily through the material to the lenslets 9, 10, and 11 so as to expose the photoresist material 26 thereupon but, because of the barriers 19, 20, 21, and 22, very little light will pass to the flat portions between the lenslets and thus these areas will remain unexposed. Accordingly, if a positive photoresist is employed, the photoresist above the lenslets will remain soft while the photoresist above the flat portions between the lenslets will harden. Since the photoresist material has been mixed with a light blocking stain or has been darkened by utilizing photographic techniques, then, when the lenslet array 12 is properly cleaned, the soft photoresist above the lenslets will be washed away while the photoresist on the flat portions above the barriers 19, 20, 21 and 22 will remain. This leaves an opaque aperture between the lenslets which will block the undesired light as will be seen in FIGURE 3. In FIGURE 3, the array 12 is again shown, but now the photoresist material 26 has been washed away from the lenslets 9, 10, and 11 and remains only on the flat portions between the lenslets. It is seen that the desired aperture has been automatically aligned between the lenslets in a very simple and straightforward manner without the use of an accurately produced mask. The process also eliminates a number of steps in the prior art procedure of making apertures. Of course, other ways of utilizing positive or negative photoresist and laying down masking material on the flat portions between the lenslets utilizing the above technique can be applied. For example, in the above mentioned co-pending application, a procedure involving the use of a negative photoresist is described. With such a negative photoresist, the areas between the lenslets would remain soft while the areas above the lenslets would harden during the exposure to ultraviolet light from behind the lenslet array material. Then in the following cleansing step, the photoresist between lenslets would be removed but not that above the lenslets. At this time, an aperture material such as a layer of metal can be deposited on the whole surface including the lenslets and the areas therebetween. Finally, the photoresist and metal over the lenslets can be removed by an ultrasonic cleaning process leaving the deposited aperture material only on the areas between the lenslets.

Claims: A method of applying an opaque material between the lenslets of a lenslet array (12) wherein the array is formed in a body of substantially transparent material having a) first and opposite second surfaces with a first area on the first surface comprising a plurality of lenslets (9, 10, 11) and a second area on the first surface comprising the portion of said first surface surrounding the lenslets, and b) having at least partly opaque portions (19, 20, 21, 22) within the body extending between the first and second surfaces under only said second area, characterized by the steps of: A) applying a layer of photoresist (26) over the first surface; B) shining an ultraviolet light (30, 32) through the body of material from the second surface to the first surface, whereat the at least partly opaque portions (19, 20, 21, 22) of the body prevent a portion of the light from reaching said second area so that it is affected differently by the light than said first area; and C) removing the photoresist (26) from one of the first or second areas. The method of claim 1, characterized in that the photoresist (26) comprises a light blocking material (26) and in step (C) said photoresist is removed from said first area. The method of claim 2, characterized in that the photoresist (26) is positive and the ultraviolet light (30, 32) of step (B) hardens the photoresist (26) on said first area only and step (C) removes only the photoresist (26) from said first area maintaining the light blocking material (26) on said second area only. The method of claim 2 or 3, characterized in that the light blocking material (26) is a dye mixed with the photoresist (26). The method of claim 2 or 3, characterized in that the light blocking material (26) in the photoresist (26) is darkened by a photographic process.

Inventors: WILWERDING DENNIS J, WILWERDING, DENNIS J.
Applicants: HONEYWELL INC, HONEYWELL INC.
Application year: 1988
Main classification: G02B3
IPC codes: G02B1, G03F7, G02B3