A semiconductor laser device

Abstract: A device in which an active layer (211) is divided into a number of laterally spaced longitudinally extending stripes each of the same resonator length and each defining a quantum well. Current is injected via a corresponding number of electrodes respectively overlying each stripe. These electrodes (208A, 208B, 208C) are of different lengths. The stripes are close-spaced so that quantum well energy levels are split into a plurality of non-degenerate energy levels.

Description: The present invention relates to a multiple quantum well type semiconductor laser device. Laser elements which emit laser light at a plurality of different wavelengths are useful in optical communications, and there are conventionally developed a variety of types. Figure 1 is a cross-sectional view showing a prior art quantum well type semiconductor laser recited in such as Appl. Phys. Lett. vol. 45, pp. 1 to 3 (1984). In Figure 1, the reference numeral 8 designates a p type electrode, the reference numeral 9 designates a p type GaAs substrate, the reference numeral 10 designates a p type Ga 0.65 Al 0.35 As cladding layer, the reference numeral 11 designates a p type Ga 0.7 Al 0.3 As light guide layer, the reference numeral 12 designates a multiple quantum well layer (MQW layer). The reference numeral 13 designates an n type Ga 0.65 Al 0.35 As cladding layer, the reference numeral 14 designates an n type GaAs contact layer, the reference numeral 15 designates a Zn diffusion region, the reference numeral 16 designates a disordered region, the reference numeral 17 designates a silicon dioxide film, and the reference numeral 18 designates an n type electrode. A semiconductor laser in which the active layer of the usual double heterostructure laser is replaced by a quantum well structure or a superlattice structure is called as a quantum well type semiconductor laser. A laser which includes a potential well layer in the active layer is called as a single quantum well laser, and a laser which includes a plurality of potential well layers in the active layer is called a multi-quantum well laser. The operation of the semiconductor laser element having such a quantum well structure active layer will be described below. Figure 2 is a diagram showing the energy level in the quantum well structure. The longitudinal axis designates energy, and the transverse axis designates position perpendicular to the layers. As shown in Figure 2, when a quantum well is constituted by putting a thin semiconductor layer between semiconductor barrier layers having a large energy band gap, then this thin semiconductor layer constitutes a potential well layer, and the intrinsic energy En measured from the bottom (top) of the conduction (valence) band of the electrons (holes) confined in this well is represented by the following Schrodinger equation (1), and forms discrete energy levels. Herein, m e * is an effective mass of electron, is a Planck's constant divided by 2π, and Lz is thickness of the quantum well layer. Herein, the thickness and height of the barrier layer are presumed to be infinity so as to enable one dimensional treating. In this way an electron has quantized energies En, and the electron state density ρ(E) becomes to have a step like distribution as shown by the real line in the quantum well, which electron state density usually has a parabola type distribution as shown in broken lines in the bulk crystal. Accordingly, when the both of above and below layers of the active layer comprisings quantum well layer are made p type semiconductor cladding layer and n type semiconductor cladding layer having large energy band gaps, respectively, it is possible to confine the carriers (electrons or holes) and the light in the thickness direction, which enables of producing a quantum well type semiconductor laser. A semiconductor laser constructed in this manner has an n = 1 level (the lowest quantum level) higher than the bottom of the conduction band (real lines in Figure 3) when the active layer is producted by the material which has the same energy band gap as that of the material constituting the active layer the usual double heterostructure semiconductor laser, and therefore it oscillates at a shorter wavelength because the energy difference is larger than that of a usual double heterostructure semiconductor laser which oscillates by the energy difference between the bottom of the conduction band and the top of the valence band. Furthermore, the quantum well type semiconductor laser has characteristics that the energy levels are discrete and characteristics having a narrow spectrum line width and a good monochromaticity. Next the operation of the prior art example of Figure 1 will be described. Figure 4 shows a diagram for exemplifying the energy band structure of the cladding layer and the multi-quantum well active layer of the prior art device of Figure 1. In this prior art device having a MQW active layer, if the barrier layer is made quite thin, there arises overlapping of energy levels of the potential wells in the active layer, and it is possible to make almost all the electrons positioned at the lowest energy levels of a few quantum wells. From this, in a MQW laser, the half value width of the optical gain spectrum becomes short with relative to the usual DH laser caused by the stepwise state density function ρ(E) as shown in Figure 3, and the threshold value is expected to be lowered because of the higher density of states. When a current is injected into this MQW laser which is biased in a forward direction, the electrons injected from the upper portion n electrode 18 and the positive holes injected from the lower portion p electrode 8 are confined in the GaAs well layer having a small band gap, and electrons and holes are combined to occur a light emission. A light confinement in the thickness direction is conducted by that as larger the aluminum components in the AlGaAs layer becomes as smaller the refractive index becomes, and the confinement in the transverse direction is conducted by that Zn is diffused. Accordingly, if a resonator structure is produced in addition thereto a laser oscillation will arise. Figure 5 shows a laser structure of a transverse junction stripe laser which emits four kinds of different wavelength lights which is recited in such as Appl. Phys. Lett. vol. 36, p. 441 (1980). In Figure 5, the reference numeral 28 designates an upper portion electrode, the reference numeral 29 designates a silicon nitride current blocking layer, the reference numeral 30 designates an n type Al y Ga 1-y As cladding layer, the reference numeral 31 designates an n type Al x1 Ga 1-x1 As first active layer, the reference numeral 32 designates an n type Al x2 Ga 1-x2 As second active layer, the reference numeral 33 designates an n type Al x3 Ga 1-x3 As third active layer, the reference numeral 34 designates an n type Alx₄Ga 1-x4 As fourth active layer, the reference numeral 35 designates an n type GaAs substrate, the reference numeral 36 designates a lower portion electrode, the reference numeral 37 designates a Zn diffusion region which is shown by diagonal lines, and the reference numeral 38 designate a Zn driven region which is shown by broken lines. Herein, the aluminum composition proportions of the cladding layer and active layer are in a relation that x₁ < x₂ < x₃ < x₄< y. Figure 6 shows an array in which three lasers are integrated on a substrate which is recited in such as Appl. Phys. Lett. vol. 48, p. 7 (1986). In Figure 6, the same reference numerals designate the same elements as those shown in Figure 5. The reference numeral 30 designates a p type GaAs contact layer, the reference numeral 40 designates a p type AlGaAs cladding layer, the reference numeral 41 designates an AlGaAs/GaAs multi-layer quantum well active layer, the reference numeral 42 designates an n type AlGaAs cladding layer, the reference numeral 43 designates a Si diffusion layer (shown by diagonal lines), and the reference numeral 44 designates a proton irradiated region (shown by dotted lines). The device will be operated as follows. In Figure 5 the holes which flow into from the p side upper electrode 28 and the electrons which flow into from the n side lower electrode 36 proceeds along the path designated by the arrows in the figure, and they generate light emissions at the four active layers 31, 32, 33, and 34. Herein, wavelengths of the generated light are such that λ₁<λ₂<λ₃<λ₄ because x₁<x₂<x₃<x₄ (λ n designates the wavelength of light which is emitted from the n-th active layer). In Figure 6, holes which flow into from the upper electrode 28 and electrons which flow into from the lower electrode 36 are recombined at the three active layers 41 which are not diffused by silicon, thereby to cause oscillation. The prior art multi-wavelength oscillation laser can be produced only in a transverse junction stripe type which is shown in Figure 5. This method has a problem in cost because the process thereof is a complicated one. Furthermore, such a prior art multi-wavelength oscillation laser is one which emits a plurality of wavelengths at the same time, and it is impossible to cause oscillation by switching one by one. Furthermore, in the laser array shown in Figure 6 the three active layers emit the same wavelength light, and it is impossible to conduct multiplexing of different wavelengths. The present invention is intended as a solution to the problems aforesaid. In accordance with the present invention there is provided a semiconductor laser comprising: an active layer which is subdivided into a plurality of transversely spaced longitudinally extending active stripes each of multiple quantum well structure having narrow width barrier layers such that the electrons of the adjacent quantum wells overlap with each other so the quantum well energy levels are split into a plurality of non-degenerate energy levels for each coupled energy level thereof; which semiconductor laser is characterised by a current injection electrode structure overlying said active layer for injecting current therein, which electrode structure is comprised of a plurality of transversely spaced electrodes each over a respective one of said plurality of longitudinally extending active stripes and each of a different respective length, whereby the laser is operable such that radiation is emitted of a different respective wavelength, corresponding to a respective one of the non-degenerate energy levels split from a single one of the one or more coupled energy levels, when injection current is supplied via each respective one of said electrodes. The semiconductor laser aforesaid allows switching laser oscillation amongst a plurality of different wavelengths. The semiconductor laser can be produced by crystal growth and the processing can be simple. In the accompanying drawings: Figure 1 is a diagram showing a structure of a prior art quantum well laser; Figure 2 is a diagram showing the energy band gap structure of the quantum well active layer; Figure 3 is a diagram showing the state density and energy levels of the quantum well; Figure 4 is a diagram showing the energy band gap structure of a multiple quantum well active layer; Figure 5 is a diagram showing a structure of a prior art multi-wavelength oscillation laser; Figure 6 is a diagram showing a structure of a prior art laser array; Figure 7 is a diagram showing the structure of the semiconductor laser of an embodiment of the present invention; and Figure 8 is a diagram showing the absorption spectrum of the three quantum wells of the embodiment combined with each other. A preferred embodiment will be described below and reference will be made to figures 7 and 8 of the drawings. The following description is given by way of example only. In Figure 7 the reference numeral 205 designates a negative side current terminal, the reference numerals 206A, 206B, and 206C designate positive side current terminals, the reference numeral 207 designates an n electrode, the reference numerals 208A, 208B and 208C designates p electrodes, the reference numeral 209 designates an n type GaAs substrate, the reference numeral 210 designates an n type AlGaAs cladding layer, the reference numeral 211 designates a multi-quantum well active layer, the reference numeral 212 designates a p type AlGaAs cladding layer, the reference numerals 213A, 213B and 213C designate a p type GaAs contact layer, the reference numeral 214 designates an insulating film, the reference numeral 215 designates a diffusion front of p type impurities, and the reference numerals 216 and 217 designate cleavage planes. The cleavage planes 216 and 217 constitute a Fabry Perot resonator. The diffused p type dopants produce a stripe type waveguide in parallel with the axis of the resonator at the quantum well layer. The stripe width thereof is made narrow in order to increase the light absorption at the diffusion region at the neighbourhood of the waveguide by free carriers. The lengths L A , L B , L C of the electrodes 208A, 208B, and 208C in the length direction of the resonator become shorter in that order, and the length L A is the same as that of the resonator. The device will be operated as follows. The multi-quantum well of this embodiment has narrow width barrier layers and the combination of electron states occur over the three quantum wells, and as a result the lowest quantum level of the multi-quantum well is divided into three as shown in Figure 8. When the level which is concerned with the heavy holes (hh) is noted three absorption peaks are observed (To note the light emission concerning only the heavy holes corresponds to think only the TE mode). It is well known that as the energy increases as higher the state density of the quantum levels become stepwisely, and thus as higher the energy quantum levels become as higher the amplification gain becomes when a band filling is occured by increasing the injection carrier density. Next, it is thought that a current is injected only to the region of the length L B (L B < L A ) of the semiconductor laser of the resonator length L A . In the region to which a current injection is conducted, an amplification gain g B is obtained. When the waveguide loss caused by such as absorption and scattering is made d there arises a laser oscillation when the following condition is satisfied. g B > αL a + ℓ n 1 R L B Herein, the reference character R designates reflectivity of the cleavage planes 216 and 217. As apparent from the formula (7) when the L B is decreased the right side of the inequality increases and there arises an oscillation only when g B is high. From this fact when the L B is gradually made smaller, oscillations according to the above-described three levels are obtained in the order from the longer wavelength. Accordingly, when the lengths L A , L B , and L C of the respective electrodes of the above-described embodiment shown in Figure are established at length in which oscillations corresponding to the respective levels are obtained, there arise laser oscillations of different wavelengths from the respective integrated semiconductor lasers which are integrated with together. As described above, in the embodiment, a plurality of semiconductor lasers of the same resonator length having a multiple quantum well layer having a barrier layer of such a thickness that the electron states are combined with each other as an active layer are provided on the same substrate and the lengths of the respective electrodes are varied to differentiate the resonator internal loss thereby to occur oscillations at the different quantum levels, whereby a semiconductor laser which is capable of oscillating at different wavelengths to be used for a wavelength multiplexed communication is obtained. Furthermore, this semiconductor laser can be produced by onetime epitaxial growth with no necessity of producing a grating, thereby resulting in a low cost. In the description of the embodiment, the layer thickness of the quantum well active layer and the stripe width of the light waveguide of the semiconductor laser have not been described in detail. However, these layer thicknesses are desirable to be less than 30 nm (300Å) and the stipe width less than 10µm (micron) so as to increase the loss of the light transmission and to enhance the occupation proportion of the higher quantum levels by making the injected carriers difficult to be subjected to energy relaxation. Furthermore, as a method of producing narrow stripes, a method recited in the Journal of Applied Physics, vol.58, p. 4515 (1985) can be used in order to accomplish a lowering of the threshold value. However, the method of producing each narrow stripe is not limited to this method, and any method capable of obtaining a narrow stripe width active layer can be used. That is, as the transverse direction confinement, a ridge waveguide, a burried heterostructure, a channelled substrate planar, or a general superlattice disordering by impurity diffusion can be used. In the illustrated embodiment a laser using GaAs/AlGaAs is described, but InP/InGaAsP can be also used with the same effects as described above.

Claims: A semiconductor laser comprising: an active layer (211) which is subdivided into a plurality of transversely spaced longitudinally extending active stripes (211) each of multiple quantum well structure having narrow width barrier layers such that the electrons of the adjacent quantum wells overlap with each other so the quantum well energy levels are split into a plurality of non-degenerate energy levels for each coupled energy level thereof; which semiconductor laser is characterised by a current injection electrode structure (208A, 208B, 208C) overlying said active layer (211) for injecting current therein, which electrode structure is comprised of a plurality of transversely spaced electrodes (208A, 208B, 208C) each over a respective one of said plurality of longitudinally extending active stripes (211) and each of a different respective length, whereby the laser is operable such that radiation is emitted of a different respective wavelength, corresponding to a respective one of the non-degenerate energy levels split from a single one of the one or more coupled energy levels, when injection current is supplied via each respective one of said electrodes (208A, 208B, 208C).

Inventors: FUJIWARA KENZO C O MITSUBISHI, KOJIMA KEISUKE C O MITSUBISHI, MATSUI TERUHITO C O MITSUBISHI, NOMURA YOSHINORI C O MITSUBISH, TOKUDA YASUNORI C O MITSUBISHI, TSUKADA NORIAKI C O MITSUBISHI, FUJIWARA, KENZO, C/O MITSUBISHI DENKI K.K., KOJIMA, KEISUKE, C/O MITSUBISHI DENKI K.K., MATSUI, TERUHITO, C/O MITSUBISHI DENKI K.K., NOMURA, YOSHINORI, C/O MITSUBISHI DENKI K.K., TOKUDA, YASUNORI, C/O MITSUBISHI DENKI K.K., TSUKADA, NORIAKI, C/O MITSUBISHI DENKI K.K.
Applicants: MITSUBISHI ELECTRIC CORP, MITSUBISHI DENKI KABUSHIKI KAISHA
Application year: 1987
Main classification: H01S3
IPC codes: H01S5