PROCESS FOR MAKING METAL-SEMICONDUCTOR OHMIC CONTACTS

Abstract: An improved process for making metal-semiconductor ohmic contacts comprises a de-hydrogenation heat treatment of the wafer for releasing the hydrogen "implanted" in the crystal lattice during the preceding step of "opening of the contacts" by R.I.E. plasma etch. A heat treatment at about 600°C in nitrogen for few hours permits to eliminate a great part of the hydrogen from the silicon before proceeding to sputtering of a metallurgical barrier and/or of a metallization layer.

Description: BACKGROUND OF THE INVENTION The present invention relates to an improved process for making ohmic-type contacts between a metal and a semi­ conductor, particularly p or n doped silicon. In fabricating monolithically integrated circuits as well as in fabricating discrete semiconductor devices according to the most differentiated technologies used for making such devices, it is necessary to form ohmic contacts between the semiconductor material, for example p or n doped silicon and a metallic material, i.e. a material exhibiting a metallic conduction utilized for forming the necessary electrical interconnections on the front side of the integrated circuit. This type of contact being formed between a metallic conduction material and a monocrystalline semiconductor material must exhibit an essentially linear current-­ voltage characteristic, symmetric about the origin (ohmic contact), i.e. it must not give raise to "rectification" of the current, neither to noticeable non-linearities, at least within a certain region about the origin of the V-I axes (compatible with the maximum current levels contemplated) under the foreseeable operating conditions (temperature, irradiation, etc.). Moreover, the contact resistance must be as low as possible for obvious reasons of containing power dissipation, for fast switching times especially in EPROM type devices, for a good threshold level discrimination in GATE ARRAY type logic devices, etc.. The material having a metallic conduction presently utilized according to state-of-the-art technologies may be of various nature: aluminum, alloyed aluminum (containing silicon or copper-silicon or titanium-silicon in amounts not greater than 3% by weigth), tungsten, tantalum, titanium, alloys thereof, silicides and doped polycrystal­ line silicon are all examples of suitable materials used commercially. More recently, especially in relation to high integration degree technologies (VLSI), wherein, for miniaturization reasons, the diffused regions have extremely small thicknesses, the contacts are made by means of the so-called "barrier metallurgy" techniques, which contemplate the deposition over the exposed surface of the silicon of a first thin layer of a material having a metallic conductivity and a negligeable ability to diffuse into the silicon together with a substantial imperviousness to the diffusion of dopants present in the silicon in order not to "deplete" the junction region made so thin for the reasons mentioned before. A suitable barrier material is for example titanium. Over such a first barrier layer a second barrier layer is usually deposited (e.g. titanium nitride). The material making this second barrier layer is choosen among materials showing a substantial imperviousness to the diffusion of aluminum; and over such a second barrier layer a metallization layer having a sufficient thickness for obtaining the desired electrical conductivity of the conducting paths, defined on the front side of the device, customarily of aluminum or of an aluminum alloy, may be deposited. In the majority of the fabrication processes of such semiconductor devices, one of the crucial technical problems in forming the ohmic contacts is inherent to the techniques used for "opening" the contacts; i.e. to the wet or dry (in plasma) etching techniques used for attacking the dielectric material layer present on the surface of the monocrystalline silicon until exposing the latter in correspondence to relative windows defined by means of a photoresist mask. Substantially, the contact resistance is strongly influenced by the state of the monocrystalline silicon surface over which the material or the materials having a metallic conductivity are deposited for forming the ohmic contact. The presence of residues of dielectric material, a possible re-oxidation of the exposed surface of the semi conductor in contact with the room atmosphere, the presence on the exposed surface of the semiconductor of residues of polymeric material being generated during the plasma etch treatments, the "implantation" of hydrogen atoms into the crystal lattice of the semiconductor are some of the factors to which relatively high contact resistances are often attributed. Such consequences of the treatments used for preparing the silicon surface of the contacts are hardly controlled and cause a remarkable depression of the production yields. A number of proposals for improving the techniques for preparing the contact areas have addressed different aspects of the technical problem. More recently, the wide­ spread adoption of metallurgical barrier techniques of the type mentioned above, appears to have increased and extended the technical problem to ohmic contacts formed over p⁺ doped silicon, which notably had less problems when they used to be formed by directly depositing aluminum or polycrystalline silicon over the contact area. Such events appear to have, indirectly, given credit to the contention which points to the hydrogen atoms, involuntarily introduced in the silicon of the junction region through an implantation phenomenon due to the DC self-bias generated by the plasma itself and coming from the plasma components commonly used for the dry etching of the dielectric layer for "opening" the contacts, as the main responsible for high contact resistances. Normally in fact, the dry attack is protracted until surely exposing the silicon over the entire area of the contact and this necessarily implies a certain "over­ etch", i.e. a certain final period during which also the silicon is exposed to plasma etching. Commonly, such a dry etching treatment is carried out in a plasma of CHF₃ + O₂, in R.I.E. configuration (acronym of Reactive Ion Etching), and the ionized hydrogen of the CHF₃ groups is captured by the silicon during such a final period of "overetch". The following deposition of a metallurgical barrier such as the one represented by titanium/titanium nitride over the silicon surface would allegedly prevent the hydrogen atoms introduced into the crystal lattice of the silicon to re­ diffuse outside of the silicon during the subsequent heat treatment for "alloying" the different layers deposited, which usually follows the process step of definition of the metal "strips". Instead, this subsequent heat treatment would be responsible for the diffusion of the H atoms through the diffused region of the junction and, according to recent studies, these hydrogen atoms, in p doped silicon, would disactivate the acceptors and thus would lead to a depletion of the junction with consequent problems of a high contact resistance. Prior proposals for overcoming this problem contemplate arresting the R.I.E. plasma etch of the dielectric layer before exposing the underlying mono­ crystalline silicon surface and to proceed to remove this residual thickness and to expose the silicon by means of a dry etching using a non-polymerizing, hydrogen-free plasma. These solutions present problems in controlling the large number of parameters influencing the preparation of the contacts, such as for example thickness uniformity of the dielectric layer (which is often a composite multilayered material), disuniformities of the etch rates, difficulties in controlling the etch rates for the various layered materials and yet other processing problems make these proposals commercially unactractive. DESCRIPTION OF THE INVENTION It is, therefore, a main objective of the present invention to provide an improved process for making metal-­ semiconductor ohmic contacts free of the drawbacks of the known processes. The process of the present invention for making ohmic type contacts between a metal and a semiconductor on as many areas of the surface of a monocrystalline semiconduc­ tor wafer defined by means of a photoresist mask and exposed by etching a layer of dielectric material through the openings of said mask, essentially comprises the following steps: 1) R.I.E. plasma attack of the dielectric material through the openings of said photoresist mask with a certain "overetch"; 2) removal of the residual masking photoresist; 3) de-hydrogenation heat treatment under inert atmosphere at a temperature comprised between 450 and 700°C for a period of time comprised between 1 and 4 hours; 4) sputter deposition of a layer of material having a metallic conductivity. After the heat treatment under inert atmosphere of the wafers and before proceeding to the sputter deposition of the metallic material, the wafers may be subjected to one or more of the known cleaning treatments for removing eventual contaminants from the exposed surfaces of the contacts which may have deposited over the exposed areas during handling of the wafers, as well as for removing the eventual re-oxidation film over the exposed surfaces of the semiconductor material, which may have formed because of prolonged exposure to ambient atmosphere. Such a prolonged heat treatment in inert atmosphere at a relatively high temperature of the wafers appears to have a decisively positive effect on the quality of the ohmic contacts. It appears suitable to overcome effectively the problem represented by the absorption of hydrogen atoms by the monocrystalline semiconductor material during the terminal phase of the R.I.E. plasma attack of the dielectric material layer through the openings of the photoresist mask. A nonequivocal confirmation of the efficaciousness of the new process, object of the present invention, is represented by the fact that by utilizing the new process of the invention for making ohmic type contacts between p⁺ doped silicon and a metallurgical barrier multilayer, formed by a first layer of titanium, a second layer of titanium nitride (total thickness of about 1000 Å) and an aluminum layer (about 9000 Å thick), contacts thus formed where found to be totally exempt from problems of a relatively high contact resistance and substantially comparable with ohmic contacts formed over the same semi­ conductor, by means of the same procedure for opening the contacts, but without utilizing any metallurgical barrier, i.e. depositing the aluminum layer directly over the exposed p⁺ doped silicon. Although a suitable method of qualitative/quantitative analysis is still missing, it is reasonably believed that the mechanism through which the heat treatment under inert atmosphere of the wafers, after the R.I.E. plasma etch treatment for opening the contacts with a plasma containing polymerizing halogenated compounds (i.e. hydrocarbon fluorides), is instrumental in ensuring a low contact resistance, be as follows. The hydrogen ions of the plasma impinging on the surface of the silicon during the terminal stage of attack (overetch) and absorbed into the superficial layers of the monocrystalline silicon, during the subsequent heat treatment under inert atmosphere, diffuse along all directions and a considerable portion of them "re-diffuses out" of the crystal; i.e. the hydrogen atoms reaching the surface of the crystal lattice combine to form molecular hydrogen (H₂) "vaporizing" in the atmosphere of the treatment chamber. Thus the heat treatment under inert atmosphere would have the function of a decontamination treatment for the hydrogen "implanted" into the silicon during the etching process for opening the contacts (de-hydrogenation) and such a reduction of the quantity of hydrogen which, probably inevitably, remains into the silicon is anyway such as to prevent manifestations of anormally high contact resistance imputable to hydrogen contamination of the semi­ conductor. The de-hydrogenation heat treatment is conducted at a temperature comprised between 450 and 700°C. Below 450°C the processes leading to the release of hydrogen by the silicon crystal appear to have an insufficient rate and it is possible that the mechanism of diffusion through the crystal lattice of the silicon prevail in respect of the mechanism of superficial combination to molecular hydrogen. The upper limit of the treatment temperature, about 700°C, is imposed by the opportunity of preventing an eccessive diffusion of the dopants within the silicon. A treatment temperature of about 600°C is preferred together with a treatment time of about an hour or more and more prefera­ bly of about 3 hours. Naturally to higher treatment temperatures will correspond shorter treatment times and viceversa. The process of the invention besides being particularly simple notwithstanding its surprising efficaciuosness, has the advantage of not requiring wet etching treatments which are evermore incompatible with fabrication processes of large integration scale devices. Even in respect of the most recent proposals which substantially contemplate special final etch treatments of the silicon surface under hydrogen free conditions for removing the contaminated superficial portion of the silicon, the process of the present invention offers the advantage of not requiring any further etch of the silicon, which may often lead to an untolerable thinning out of the junction region within the silicon. These aspects make the new process, object of the present invention, particularly suitable to be used in modern fabrication processes for devices of a high degree of integration (VLSI and ULSI), wherein the so-called "metallurgical barrier" technique is utilized for forming metal-semiconductor ohmic contacts, and which technique, as already said, has dramatized the problem due to hydrogen contamination of the semiconductor during the etch process for opening the contacts, extending the problem also to contacts formed over p⁺ doped silicon which used to be less susceptible than those formed over n⁺ doped silicon. According to a particularly preferred embodiment of the invention, the improved process for making metal-semicon­ ductor ohmic contacts over distinct p⁺ and n⁺ diffused regions on a monocrystalline silicon wafer, covered with a layer of dielectric material (e.g. constituted by a first layer of thermally grown silicon oxide having a thickness of about 1500 Å, a second layer of silicon oxide chemically deposited from vapor phase, having a thickness of about 500 Å and a third layer of silicon oxide, doped with boron and phosphorus (PBSG), deposited from vapor phase and having a thickness of about 5000 Å) comprises the following operations. Firstly a layer of photoresist resin having a thickness of about 15000 Å is disposed over the surface of the wafer. By means of known photolithographic techniques utilizing an appropriate mask, the areas over which the ohmic contact between a material having a metallic conductivity which will be deposited successively over the surface of the wafer and the silicon are defined by opening suitable windows through the photoresist layer. After eventual cleaning steps, a number of wafers are placed in mounting frames of an electrode of a R.I.E. plasma etch reactor and etching of the multilayered film of dielectric is effected through the openings of said photoresist mask. Etching is conducted preferably at the following operations conditions: - pressure : about 50 millitorr - plasma composition and relative flows: CHF₃ at 60 SCCM (standard cm³ per minute) O₂ at 40 SCCM - temperature : maintained constant and comprised between 20 and 25°C - power transferred to the plasma : about 1350 W - bias : comprised between 500 and 600 V. Under these attack conditions a selectivity ratio between the rate of attack of the silicon oxide and of the photoresist of about 1:1 is obtained, i.e. the etching rates if the two materials are substantially similar. Generally, the volumetric ratio between CHF₃ and O₂ is under all conditions preferably comprised between 2.5 and 3.5:2 during this process step. As it is well known to the skilled technician, the attack conditions may also be suitably adjusted in order to obtain a tapered or vertical attack. The etch rate of the silicon oxide is of about 500 Å/min.. The etch is conducted until completely exposing the silicon over the entire area of the contact and, typically, an "overetch" of about 30-35% is adopeted, i.e. the attack is protracted after the silicon begins to be exposed to the etch for a further 30-35% of the total time of the etch treatment, which usually has a total duration of about 20 minutes. Having "opened the contacts", the process proceeds in a customary way with a "barrel" treatment step for removing the residual masking photoresist. The wafers are then introduced in an oven or heat treatment chamber where, under an inert atmosphere, preferably in nitrogen, are kept for about three hours at a temperature of 600°C. At this point the wafers may be subjected to a cleaning treatment, preferably by means of a dry etch treatment of few seconds in a plasma of C₂F₆ + He in a volumetric ratio of 2:1. Furthermore, the wafers may be subjected further to an acid wash in FPN (a commercial solution of ammonium phosphate, ammonium fluoride and phosphoric acid in de­ ionized water) immediately before being introduced into the sputtering chamber for depositing the metallization layer or the different metallizing layers in accordance with a metallurgical barrier technique. Naturally other cleaning procedures may be employed before the sputtering deposition of the metals, which is carried out according to standard procedures. The fabrication process of the devices will proceed, normally, with the step of definition of the metal strips, with an eventual alloying heat treatment and so forth.

Claims: 1. A process for making ohmic type contacts between a metal and a semiconductor, over as many areas of the surface of a monocrystalline semiconductor wafer as defined by means of a photoresist mask and exposed by etching a layer of dielectric material through openings of said mask, comprising the following steps: 1) R.I.E. plasma etching the layer of dielectric material through the openings of said mask with a certain overetch; 2) removing the residual masking photoresist; 3) heat treating the wafer at a temperature comprised between 450 and 700°C under inert atmosphere and for a period of time comprised between 1 and 4 hours; 4) depositing by sputter deposition a layer of at least a material having a metallic conductivity. 2. The process according to claim 1, wherein said semi­ conductor material is silicon. 3. The process according to claim 1, wherein said material having a metallic conductivity is multilayered and comprises a first barrier layer of titanium, a second layer of titanium nitride and a third layer of aluminum. 4. The process according to claim 1, wherein said over­ etch is comprised between 30 and 35%. 5. The process according to claim 1, wherein after said heat treatment under inert atmosphere and before the sputter deposition, said wafer is subjected to a plasma etch in a plasma of C₂F₆ + He for few seconds. 6. The process according to claim 5, wherein after said plasma etch treatment the wafer is subjected to an acid wash in a diluted solution of phosphoric acid, ammonium fluoride and ammonium phosphate.

Inventors: GUALANDRIS, FABIO
Applicants: SGS-THOMSON MICROELECTRONICS S.R.L.
Application year: 1987
Main classification: H01L21
IPC codes: H01L21