A METHOD FOR CLEANSING GASES AND APPARATUS HEREFOR

Abstract: A gas cleansing arrangement comprising a vessel (1) partially filled with liquid (32) and a gas distribution means (14) beneath the liquid surface (34). The gas distribution means (14) comprises obliquely and downwardly extending distribution pipes (26) with upwardly facing inlet openings (64) for contaminated gas and a lower opening (22). The inlet openings are each connected to a venturi device (28) having an outlet opening (31) and suction openings (29) facing the liquid (32). In use, pressurized gas urges an inner liquid surface (46) downwards in the distributor means (14), until the liquid surface (46) reaches and exposes the uppermost inlet opening or openings (64). The gas is then forced through respective venturi device (28) at a pressure drop corresponding to the height difference (h) between the inner liquid surface (46) and respective outlet opening (31). Full working pressure is always obtained and the number of operating venturi devices is automatically adapted to the incoming gas flow by rising and lowering the inner liquid surface (46).

Description: 90:. A method for cleansing gases and apparatus herefor. The present invention relates to a method for cleansing gases from solid, liquid and/or gaseous impurities of the kind more clearly shown in the preamble of claim 1. The invention also relates to an arrangement of apparatus for carrying out the method, in accordance with the preamble of the main apparatus claim. The invention is particularly intended for use as a pas¬ sive emergency system capable of being activated in the event of an accident or in the event of interruptions in operations in, for example, nuclear power plants, chemical industries or other industries where such circumstances may result in the release of airborne contaminants dangerous to the health. The invention., however, can also be applied under normal operating conditions, for instance, in a plant or manufacturing process. The invention is based on the concept of passing the con¬ taminated gas beneath the surface of a liquid bath and cleansing the gas during its passage through the bath. Such an arrangement is particularly suited as a passive emergency system, since it can be permanently held in readiness for automatic and immediate functioning without needing to take special activating measures. Gas cleansing apparatus in which gas is passed beneath the surface of the liquid bath and allowed to perculate . through a multiple of openings or nozzles are known to the art. These known cleansing apparatus or arrangements, however, have a poor cleansing effect. For example, in some cases the bubbles passing through the liquid bath are so large as to impair the contact between liquid and gas . On the other hand, in those cases where small bubbles are ejected into the liquid, the bubbles remain in the liquid for a very long period of time, which means that the cleansing apparatus must be given extremely wide surfaces 8/01902 2 in or d er to be able to deal with the prevailing gas flow. S uch cleansing apparatus become very expensive and have unreasona b ly large dimensions, particularly in the case of large gas flows. There is proposed in DE-PS- 228 733 a cleansing system in which the incoming gas flow is divided into a plurality of part flows which are directed in fine jets against impinge¬ ment or striking surfaces. This system, however, has the aforesaid drawback of having low efficiency at small rates of flow, since in this latter case the gas bubbles through the liquid in relatively large bubbles and is relatively unaffected. ϋS-A-3 216 181 (c.f.Fig. 4), US-A 3 520 113 (c.f. Fig. 7) 5 and US-A 4 182 617 (c.f. Fig. 2) teach wet cleansing systems in which the gas is introduced beneath the surface of a liquid bath through a plurality of apertures located at progressively deeper depths. In use, the incoming gas forces down the level of liquid in the inlet conduit with increasing gas flow rates 0 and inlet pressures, until the first outlet aperture is exposed and the gas is able to flow up through the liquid. As the gas flow rate and inlet pressure increase, the liquid surface is pressed down progressively still further, so as to expose more and more of the outlet apertures, s.uch that gas 5 is able to flow therefrom in the form of part gas-flows. In this way at least substantially all flow will pass through the outlet apertures utilized, irrespective of the inlet pressure and the total flow through the gas cleansing system. ° One drawback with such known gas cleansing systems is that when the surface of the liquid in the inlet conduit is pressed down beneath an inlet aperture, the gas will be for¬ ced out into the cleansing bath at a low energy level and in the absence of pressure drop. The gas will therefore stream ~ ~ out and up through the liquid in the form of relatively large bubbles, resulting in relatively poor separation of fine particles and gaseous contaminants. Such known cleansing systems are therefore not totally satisfactory as passive • emergency systems intended for separating highly toxic partic ¬ les from contaminated gas flows in, e.g., the event of an accident in a nuclear power plant. - The objective of the present invention is to provide an im¬ proved gas cleansing method of the aforesaid kind which affords intimate contact between gas and cleansing liquid and a high cleansing efficiency both at partial load and at full capacity, and with which a high capacity can be achieved within a small apparatus volume. A further object of the invention is to provide a gas cleansing arrangement for carrying out the method. These objectives are realized by means of a method according to the invention having primarily the characteristic fea¬ tures set forth in the characterizing clause of claim 1, and with an arrangement of apparatus for carrying out the inventive method and having primarily the characterizing features set forth in the main apparatus claim. According to one particularly advantageous embodiment of the invention the outlet nozzles are in the form of venturi nozzles having walls which present suction openings to the surrounding liquid bath. This obviates the need of providing separate cleansing liquid inlet pipes and guarantees a constant and positive supply of liquid to the venturi nozzles. When practising the method according to the invention and using the inventive apparatus, high cleansing efficiency is constantly achieved irrespective of the magnitude of the total gas flow. Because the contaminated gas is caused to pass through first inlet orifices located at progressively increas¬ ing depths beneath the surface of the liquid and then through outlet orifices located at considerable heights above corres- ponding inlet orifices, it is guaranteed that the contaminated gas will constantly pass through the outlet nozzle at a considerable drop in pressure corresponding to the difference 4 in the height between inlet orifice and outlet orifice. In this way the gas passing through the last of the outlet orifices utilized will also be subjected to a considerable drop in pressure and will therewith be cleansed effectively, The invention will now be described in more detail with the aid of non-limiting exemplifying embodiments and with reference to the accompanying drawings. In the partially schematic drawings: Figure 1 illustrates schematically and in vertical section a gas cleansing arrangement according to the invention. Figure 2 is a plan view of a distributer segment provided with venturi nozzles and forming part of the gas cleansing arrangement in Figure 1 , Figure 3 is a side view of the distributor segment shown in Figure 2, Figure 4 illustrates a component part of an alternative embodiment of the distributor segment illustrated in Figures 2 and 3, Figure 5 is a cut-away detailed view of two mutually ad- jacent venturi nozzles intended for mutually different inlet depths, Figure 6 illustrates in larger scale a component part of a venturi nozzle according to the invention, Figure 7 is a diagram showing the pressure ratios in a venturi nozzle surrounded by liquid, and Figure 8 illustrates an alternative embodiment which com- prises diffusion means located forwardly of, or upstream of the venturi nozzle. The drawings illustrate highly schematically a gas cleans¬ ing arrangement according to the invention. As illustrated in Figure 1 , the gas cleansing arrangement comprises a vessel, preferably a pressure vessel 1, having an outer wall 10, a bottom wall 11 and a cover 13 provided with an inlet 12, and further comprises a distributor 14 for dis¬ tributing contaminated gas entering the vessel, and an outlet 16 for cleansed gas. The distributor is divided into a multiple of sections, the illustrated embodiment having six such sections incorporating primary distributor pipes 18 extending radially and horizontally from the inlet. The pipes 18 have connected thereto downwardly extending connector pipes 23 each having two obliquely and downwardly extending, approximately transversal distribution pipes or side pipes 26. The side pipes 26 present at their free ends a downwardly and vertically extending pipe sec¬ tion 20 having a free opening 22. Any condensation that forms is able to pass out through the openings 22 and washing or cleansing liquid is able to pass up through the openings into the distributor 14 with decreasing gas flow. Arranged in approximate uniform spaced relationship on the distribution pipes 26 is a multiple of vertically upstand¬ ing venturi nozzles 28 which have inlet opening 64 facing the distribution pipes. Each of the venturi nozzles 28 ' presents at its lower part cleansing-liquid suction open- ings 29 and at its other part outlet openings 31 for pro¬ cessed gas. The construction of the venturi nozzles will be described in more detail hereinafter. As illustrated in Figure 1 , the distributor 14 is intended to be lowered into a liquid bath 32 to a given depth be¬ neath the surface 34 of the bath. The majority of the outlet openings 31 of the venturi nozzles 28 are all pre¬ ferably located at the same level and preferably at a dis¬ tance from the bath surface of at least approximately 0-5 m, particularly approximately 2 m. In other embodiments, however, it may be convenient to locate the outlet openings above the surface of the liquid bath. It may, on occasion, be beneficial to place the outlet openings close to the cover 13 of the vessel 1 and to locate the outlet 16 closer to the surface 34. The inlet openings 64 for passing con¬ taminated gas to respective venturi nozzles 28 are located approximately 1 meter or more beneath the outlet openings 31 or under the surface 34, if the nozzles ends over said surface. Because of this difference in height there is always obtained a satisfactory cleansing effect with each venturi nozzle, immediately contaminated gas enters the down- wardly located inlet opening 64 of the nozzle. The contaminants or impurities are extracted during passage through the venturi pipe with the aid of liquid sucked through the " suction openings 29, this liquid being entrained in droplet form by the gas. The liquid droplets laden with contami- nants are, in turn, extracted from the gas, partly as a liquid film on the inner surface of the outlet pipes 49 of the venturi nozzles 28 and partly during passage between the out¬ let openings 31 and the bath surface 34. When extracting droplets during passage through liquid, a given smallest height difference is required in order to achieve satis¬ factory separation. Further extraction or separation can take place above the surface 34 and/or in a downstream separator (not shown) described hereinafter. For the purpose of ensuring smooth start conditions at the initial stage of release through the gas cleansing arrange¬ ment without any shock loads, each section comprises two highly located, short side pipes 26 τ with venturi nozzles 28' which are located at a higher level and which discharge above the remaining nozzles. The downwardly extending pipe sections 20' of the side pipes 26', however, extend to the same level as remaining pipe sections 20. The distributor is also constructed such that the openings 64 to the venturi arrangement 28 lie at progressively increasing depths, thus the number of active separators increases continuously with increasing gas flows. Located above the surface 34 of the bath is a gas space 35 which communicates with the outlet 16. The space 35 is dimensioned to take up the increase in bath volume result¬ ing from the generation of bubbles in the bath as gas flows therethrough, and also from the condensate that forms when the contaminated gas is warm and moist. The outlet 16 communicates with atmosphere via a separator means for separating liquid or mist droplets remaining in the gas. This separator means may be of any suitable kind, e.g. cyclones or chambers filled with gravel and stone. The separator means may also comprise a combination of known separator devices. The gas cleansing arrangement operates in the following manner. When no load is applied, washing liquid enters through the openings 29, 31 of the venturi nozzles 28 and the bottom openings 22, such that an inner liquid surface 46 in the distributor 14 and the inlet pipe 12 takes the same level as the outer liquid surface 34. The gas cleanser now has a water-seal function. In the event of a disturbance in plant operation in which gas is released, the pressure increases and the inner liquid surface 46 is forced down until it lies beneath a thresh- hold 65 adjacent the highest inlet opening or openings 64 of the venturi nozzles 28. The gas then passes out through these venturi nozzles, and finely atomized liquid droplets are sucked in during passage past the inlet openings 29. Solid, liquid and gaseous contaminants are absorbed by the liquid droplets drawn by suction into the gas stream. In a second separation stage effected upon passage of. the gas between the openings 31 of the venturi nozzles and the bath surface 34, the gas is further cleansed through a scrubber-bottle effect, at which the liquid droplets laden with contaminants, dust particles and gaseous impurities are taken-up by the washing liquid. Droplets are already extracted to a certain extent in the pipe 49, in the form of a film on the inner surface of the pipe. A third cleansing stage is provided in the aforesaid downstream separator means, not shown. The extraction of gaseous contaminants can be greatly en¬ hanced by using a washing liquid that has a composition such as to ensure that chemical reactions will rapidly consume, i.e. react with, ions dissolved in the liquid (so- called chemical amplification) . For example, the extrac¬ tion of gaseous acid components can be enhanced with a washing liquid that has alkaline components dissolved therein. The absorption of gaseous iodine can be facili¬ tated by mixing sodiumthiosulphate in the washing liquid. The various sections may have arranged therebetween radial partition walls. These may have the form of radial parti¬ tion walls 61, to which the ends of the side pipes 26 are attached. This affords additional stability to the. cons- truction. Optionally, such a radial partition wall 61 may be hollow and open downwardly and towards the distri¬ butor pipes 26. This then serves as a lower inlet opening 22 for washing liquid. Figure 4 illustrates a modified embodiment of the invention in which the distribution or side pipes 26 extend directly from the main pipes 18 in the absence of intermediate ver¬ tical connecting pipes 23. Figure 8 illustrates a further embodiment of the invention, in which the main pipes- 18 extend obliquely downwards and present a multiple of upwardly directed riser pipes 24 having extending therefrom substantially horizontal dis¬ tribution pipes 26. The venturi nozzles 28 are arranged on the distribution pipes 26. Located above the outlet openings 31 of the venturi nozzles 28 are diffuscr means or spreader means 30. When the exiting gas strikes against the diffusαr means, the gas is broken up into small gas bubbles, therewith providing better separation of contami- ~ nants from the gas during its passage through the liquid bath. In this embodiment it is necessary for the inner liquid surface 46 in the main pipes 18 to lie beneath a threshold edge 65 in the lower opening 64 of the riser pipes 24, so that the contaminated gas is able to flow out through the venturi nozzles 28. In this way all nozzles o the same riser pipe will begin to operate essentially at the same time. The riser pipes 24 of different main pipes 18 may conveniently be located at mutually displaced levels, so that not all riser pipes in one and the same pipe ring will begin to operate at the same time. A preferred embodiment of a venturi nozzle for a gas cleansing arrangement according to the invention is illus¬ trated in Figure 6. The venturi nozzle comprises an inlet part 41, a tapering constriction 43, a cylindrical throat 45, a conically flared part 47 and a cover 51, and later- ally directed outlet openings 31 arranged beneath the cover The venturi nozzle has at its lower end a screw thread connection 53, for fitting the nozzle to an upstanding connection pipe 55 on respective side pipes 26. Located between the constriction 43 and the throat 45 is an annular groove 57 which has a sharp edge 59 facing the throat 45. The suction openings 29 discharge into said groove 57, wherewith the liquid entering the groove is able to dis¬ tribute circumferentially therearound. The groove 57 suitably has an axial extension of 2-4 mm, and the groove edge 63 facing the constriction 43 has a radius which is 0,5-1 mm greater than the radius of the groove edge 59. The tangent to the wall of the constric¬ tion adjacent the groove edge 63 therewith passes external- ly of the groove edge 59. When gas passes through the venturi nozzle, liquid is drawn by suction into the groove 57 and is torn loose upstream of or adjacent the sharp edge 59, in the form of fine liquid droplets. The con¬ taminants in the gas are taken-up by these liquid drop- lets, during passage through the throat 45, the conically flared section 47 and the upper part 49. The device is thus a self-suction venturi separator. According to the invention, at least 0,5 kg, preferably 2-3 kg liquid, e.g. water, per cubic meter of gas processed shall be drawn by suction through the suction openings 29 and into the venturi nozzles 30. Consequently, the suction openings 29 and the grooves 57 are dimensioned such that the desired quantity of liquid will be sucked in at the given pressure drop. The minimum pressure drop in each venturi nozzle respec¬ tively is determined by the level differential between the corresponding lower opening 64 and the outlet opening 31 or the liquid surface 34, whichever is the lowest. A pressure drop of 1 m water-column or more is required in the majority of cases in order to obtain satisfactory cleansing of the gas. A pressure drop of about 1,5 m is preferred. In the illustrated embodiment, the throat has a diameter of 10 mm and the upper part 49 a diameter of 26 mm. It has been found that in order to achieve a high degree of cleansing, he throat diameter should not exceed about 30 mm. Figure 7 is a schematic diagram illustrating the dependency of pressure on the depth in the liquid and within the venturi nozzle. In this regard the straight curve A rep¬ resents the hydrostatic pressure in the liquid and the irregular curve B represents the pressure in different parts of the gas channel. The pressure drop in the con¬ vergent part 43 of the venturi arrangement determines essentially the magnitude of the gas flow through the ven¬ turi. The amount of liquid sucked in depends, inter alia, on the pressure drop in the venturi downstream of the suc- tion openings 29. It will be seen from the Figure that the pressure drop in the gas channel between the distributor opening 64 and the suction openings 29 must exceed slightly the hydrostatic pressure drop in the liquid (the height h_ j ) if liquid is to be sucked in, and that the pressure drop downstream of the suction openings 29 in the gas channel must be smaller than the corresponding hydrostatic pressure drop in the liquid bath (the height h 2 ) . It will be seen herefrom that pipes 49 of increased length will provide more liquid per gas volume if the venturi is not changed, whereas shorter pipes will provide less li¬ quid. Experience has shown that the pipes 49 should pre- ferably have a length which exceeds the height at which the suction openings 29 are located above the distributor opening 64. The invention is not- restricted to the illustrated exempli- fying embodiments, and the features described with ref¬ erence to and/or illustrated in the drawings can be com¬ bined in any suitable manner within the scope of the in¬ vention as defined in the following claims. It is empha¬ sized here that the term venturi arrangement or device or venturi nozzle (referenced 28) shall be interpreted in its widest meaning, namely to include means provided upstream of and downstream of the actual venturi part, to form flow passages or gas channels between the inlet openings 64 and the outlets openings 31.

Claims: CLAIMS 1. A method for cleansing a gas or gaseous mixture from solid, liquid and/or gaseous contaminants, by passing the gas beneath the surface (34) of a bath (32) comprising a washing or cleansing liquid, and causing the gas to pass 5 up through the bath in one or more, preferably more, part flows, characterized by passing the contaminated gas through venturi devices (28) located in the liquid bath (32), and by causing liquid to be drawn by suction from the liquid bath into the flowing gas as a result of the de- 10 crease in pressure taking place as the speed of the gas through the venturi devices increases. 2. A method according to claim 1, characterized by causing the liquid sucked into the venturi device to fully embrace, •^5 preferably encircle, the gas part flow, and/or by causing the contaminated gas, subsequent to its division " into part flows, to flow vertically or substantially vertically up¬ wards. 3. A method according to claim 1 or 2, characterized in 20 that at least one, preferably from two to three kg of liquid per cubic meter of contaminated gas is, or are, drawn into the venturi device and mixed with the gas. 4. A method according to claim 1, 2 or 3, characterized 25 in that the gas is caused to rise through the liquid in bubble form, the last, preferably less than half, part of the distance between the surface (34) and the location (suction opening 29) at which the liquid is mixed with the gas, and/or that the gas is caused to pass through inlet orifices 30 (64), said inlet orifices being able to be closed off by the liquid bath (32) and being situated at different depths beneath the surface (34) of the liquid and at a given depth, preferably 1 m or more, beneath the outlet orifice (31) of the corre¬ sponding venturi device (28) or the surface (34) of the liquid bath, 35 uch that at increased inlet pressure an increased amount of enturi devices (28) will be operative. . A n arrangement for carrying out the method according to 5 .n of claims 1-4, comprising a vessel (1) which is partially : illed with a bath (32) of washing or cleansing liquid, in inlet (12) for contaminated gas and an outlet (16) for .leansed gas, the inlet (12) being connected to a distri- _ >uting means (14) having a plurality of orifices (64) /hich co-act with outlet nozzles (28), characterized in /enturi devices (28) which are located beneath the surface (34) of the liquid bath (32) and are provided with suction openings (29) which open towards said liquid bath (32). 5 6. An arrangement according to claim 5, characterized in that the suction openings (29) are located in the throat (45) of the venturi devices (28) and/or in a convergent part (43) of said devices, preferably immediately upstream of Q the throa (45) of said devices (28) , and/or that each ven¬ turi device (28) has a plurality of suction openings (29) , preferably arranged symmetrically in a plane extending perpendicularly to the axis of symmetry of the venturi device, said suction openings discharging into an annular 5 groove (57) provided in the inner wall of the venturi de¬ vice (28) , the annular groove (57) preferably being de¬ limited downstream by a sharp edge (59) , the diameter of which is smaller than the upstream edge (63) . Q 7. An arrangement according to claim 5 or 6, characterized in that the venturi devices (28) include pipes (49) which are located at the downstream end and which present outlet openings (31) , and in that the vertical distance from said outlet openings (31) to the suction openings (29) is greater 5 than the vertical distance from the suction openings (29) to corresponding inlet orifice (64) in the distributing means(14), and/or that the venturi devices (28) are connected to inlet orifices 64), being able to be closed off by the liquid bath, said inlet orifice being situated at least about 1 m, preferably about 1,5 m, beneath the surface of the corresponding outlet orifices (31) or the surface of the liquid bath (32). 8. An arrangement according to claim 7, characterized in that the pipes (49) located at said downstream end are terminated axially with a cover (51) ; and in that the out¬ let orifices (31) are arranged in the cylindrical surfaces of the pipes (49) and in that the pipes (49) are arranged vertically or substantially vertically. 9. An arrangement according to any of claims 5-8, charac¬ terized in that the throat (45) of respective venturi devices (28) has a diameter smaller than 30 mm, preferably smaller than 15 mm, and a length which is from 1 to 7 times its diameter. L0. A n arrangement according to at least one of claims 1-9, characterized in that the outlet orifices ( 31 ) are lo- - ted beneath and/or above the surface (34) of the bath ( 32 )

Inventors: GUSTAVSSON LENNART, JOHANSSON LARS-ERIK, LINDAU LEIF, GUSTAVSSON, LENNART, JOHANSSON, LARS-ERIK, LINDAU, LEIF
Applicants: FLAEKT AB
Application year: 1987
Main classification: B01D47
IPC codes: B01D47, B01D53, G21C9, G21F9