METHOD FOR MAKING TRANSPARENT CONDUCTIVE FILMS

Abstract: The present invention relates to a method for making a transparent conductive film, wherein a material for the film containing an organic indium compound and an organic tin compound is applied on a substrate, and made to thermally decompose, and thereafter, a heat treatment of the material is carried out in an atmosphere containing water vapor, thereby obtaining the transparent conductive film which shows low and stable electric resistance and is excellent in water resistance and chemical resistance, and is without undesirable cloudiness.

Description: 1. FIELD OF THE INVENTION The present invention generally relates to a method for making a transparent conductive film on a substrate to be used for transparent electrodes which are used in various electronic devices such as liquid crystal display devices and transparent membrane switches or the like. 2. DESCRIPTION OF THE RELATED ART Heretofore, transparent conductive films have been widely used for liquid crystal display devices, transparent electro-magnetic shields, an infrared reflection film, transparent membrane switches or the like. As the transparent conductive film, tin doped indium oxide films, antimony doped tin oxide films and metal films such as gold film are known. These conventional transparent conductive films have been formed by a vacuum evaporation method, a Sputtering method, a thermal decomposition method or the like. However, a vacuum evaporation and a sputtering must be carried out in a vacuum chamber, and therefore the vacuum evaporation method and the sputtering method are iniefficient in productivity and further are not suitable for making films having a large area. On the other hand, in the thermal decomposition method, a film material is applied on the substrate by a printing method or a dipping method and is thermally decomposed and sintered in the air without using the vacuum chamber to become a transparent conductive film. Therefore, the thermal decomposition method is superior in the productivity and is suitable for making films having a large area, but it involves the problem that the electric resistance of the resultant transparent conductive film is high. Japanese unexamined published patent application Sho 60-243280 discloses an invention intended to solve the above-mentioned problem, wherein the thermal decomposition is carried out in an oxygen rich atmosphere and a sintering process is carried out in an oxygen poor atmosphere. However even in this prior art, there are problems in that when the sintering is carried out in a dry atmosphere, the electric resistance of the resultant transparent conductive film is not stable, and easily changes in contact with moisture or chemicals. Moreover, Japanese unexamined published patent application Sho 59-213623 discloses a thermal decomposition method, wherein a film is heated in a reductive atmosphere containing water vapor and below 3% by weight of oxygen . However, there arises another problem in that when the thermal decomposition is carried out in a water vapor rich atmosphere, the film is liable to be cloudy, and furthermore, in case that after the heat decomposition the film is treated in an oxidative atmosphere, the electric resistance thereof becomes high. In EP-A1-0 114 282 there is disclosed a multistage process according to which first a barrier film is applied onto a substrate in 3 steps, which comprises a hydrolized compound of Si in combination with Ti, Zr, Al, Sn and/or Ta. Hydrolization of the respective metal compounds is carried out in an atmosphere containing water vapour. After drying this barrier film at temperatures of up to 450°c a further film comprising an organic compound of each In and Sn is applied. This film again is hydrolized in an atmosphere containing water vapour. Then the film comprising the hydrolized compounds of In and Sn is dried and finally heat treated in a reducing atmosphere up to 500°C. Only traces of water can be tolerated in this last step. OBJECT AND SUMMARY OF THE INVENTION The present invention aims to obtain a transparent conductive film which is splendid in water resistance and chemical resistance without inducing high electric resistance. The other object of the present invention is to provide a method for making the transparent conductive film on a substrate wherein transparent conductive films having large areas can be easily made in high productivity. These objects are accomplished by a method for making the transparent conductive film on a substrate comprising a coating step with a solution of an organic indium compound and an organic tin compound and a thermal decomposition step, which is characterized in that the transparent conductive film is made directly on a glass substrate and in that the thermal decomposition step is followed by a heat treatment step carried out in an oxidative , a reductive or an inert atmosphere containing above 0.6 % by volume of water vapour. In the method of the present invention, the organic indium compound and the organic tin compound are dissolved in a solvent and as occasion demands, a binder is added there to, thereby preparing the material for the transparent conductive film. The material is applied on the substrate to form a film, and the film is then thermally decomposed. Thereafter, a heat treatment is carried out in an atmosphere such as oxidative atmosphere containing water vapor, an inert atmosphere containing water vapor or a reductive atmosphere containing water vapor, the water vapor content being above 0.6 percent by volume, thereby to obtain the transparent conductive film The organic indium compounds which can be used for the present invention are indium alkoxides, organic salts of indium, organic complexes containing indium, or the like. Examples are various kinds of crown ether complexes, indium diethylacetoacetate-monoacetylacetonate, indium monoethylscetoacetate-diacetylacetonate, indium triacetylacetonate, indium trifluoroacetlacetonate, indium alcoholateaceylacetonate, indium 2-ethylhexanoate, indium octanoate, indium laurate and indium isopropionate. As the organic tin compounds, tin alkoxides, organic salts of tin, organic complexes containing tin or the like can be used Suitable examples are crown ether complexes, tin butyrate, tin 2-ethylhexanoate, tin naphthenate, tin p-toluylate and dibutyltlnbisacetyl acetonate. As the solvent for dissolving the organic indium compound and the organic tin compound, any solvent can be used, as far as they are capable of dissolving both compounds. As the binder, for example, cellulose compounds such as nitrocellulose, ethylcellulose, hydroxypropylcellulose, acrylic copolymers, vinyl polymers or copolymers such as polystyrene or the like, phenolic resins are usable. The binders are preferably those which decompose or vaporize at lower temperature than thermal decomposition temperature of the organic indium compound and the organic tin compound. As the substrate, any substances which can withstand the thermal decomposition temperature and the heat treatment temperature of the organic indium compound and the organic tin compound are usable. Usually, the thermal decomposition and the heat treatment can be carried out below 550°C, cheap soda-lime glass can be used. Furthermore, when the thermal decomposition and the heat treatment are carried out at higher temperature than 550°C, electric resistance of the resultant transparent conductive film is lower, and humidity resistance and chemical resistance are improved. Water vapor amount in the heat treatment atmosphere is above 0.6% by volume. When the amount is below 0.6% by volume, the electric resistance or the resultant transparent conductive film is high, and mechanical strength and chemical resistance thereof are insufficient. As the oxidative atmosphere, air may be used. The atmosphere containing smaller amount of oxygen than that of the air is preferable, since, the transparent conductive film having lower electric resistance is obtainable. As the inert atmosphere, nitrogen, carbon dioxide, argon or the like can be optionally selected. As the reductive atmosphere, mixed gas of hydrogen and inert gas, and hydrogen sulfide or the like can be optionally selected. Among the above-mentioned three atmospheres, the reductive atmosphere is most preferable, because when the heat treatment is carried out in the reductive atmosphere the resultant transparent conductive film shows lowest electric resistance. Additionally, the inert atmosphere is more preferable than the oxidative atmosphere, since the former realizes the lower electric resistance than that of the latter. As described above, features of the present invention are as follows: The transparent conductive film having large area can be made without using a vacuum chamber. The thermal decomposition and the heat treatment are independently carried out and the water vapor is intentionally added to the heat treatment atm osphere in a process of the heat treatment, thereby enabling to produce the transparent conductive film showing low electric resistance without generating undesirable cloudiness thereof, such cloudiness has been the problem of the conventinal thermal decomposition method wherein the organic compounds are thermally decomposed. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 and FIG. 2 are characteristic diagrams showing characteristics of transparent conductive films embodying the present invention. DESCRIPTION OF THE PREFFERED EMBODIMENTS <Example 1> A solution prepared by adding 4% by weight of tin p-toluylate to indium 2-ethylhexanoate and dissolving them in kerosine is applied by printing method on a soda-lime glass substrate to form a film. Then, it is dried and thereafter it is thermally decomposed by heating it up to 530°C in the air. Thereafter, the thermally decomposed film is heat treated at 530°C for 90 minutes. The heat treatments of samples are carried out in three kinds of atmospheres containing water vapor on an oxidative atmosphere, an inert atmosphere and a reductive atmosphere. Characteristics of the resultant transparent conductive films are shown in Table 1 and FIG. 1. As shown in Table 1 and FIG. 1, in each atmosphere, transmittance of the film is above 90 percent regardless of the kind of the heat treatment atmosphere and amount of water vapor contained therein. However, when the water vapor amount is below 0.6 vol %, acid resistance of the film is considerably lost. Electrical resistance of each film becomes lower in the following order: air (oxidative atmosphere), nitrogen (inert atmosphere) and hydrogen (reductive atmosphere). The above-mentioned characteristics have been confirmed from intensive experiments in plurality of samples, and especially, in a range of 0--20 vol % of water vapor amount in the atmosphere of the heat treatment, many times experiments have been made. <Example 2> A solution prepared with indium triacethylacetonate, dibutyltinbisacethylacetonate (12.5 wt % to indium compound), mitrocellulose and benzyl alcohol is applied by printing method on a soda-lime glass substrate and to form a film. The film is dried and thereafter it is thermally decomposed by heating it up to 530°C in the air. Thereafter, the thermally decomposed film is heat-treated at 530°C for 90 minutes. The heat treatments of samples are carried out in three kinds of atmospheres containing water vapor of an oxidative atmosphere, an inert atmosphere and a reductive atmosphere. Characteristics of resultant transparent conductive films are shown in Table 2 and FIG. 2. As shown in table 2 and FIG. 2, similar result to that of the Example 1 is obtained. The above-mentioned characteristics are confirmed in a plurality of samples.

Claims: A method for making a transparent conductive film on a substrate, comprising a coating step with a solution of an organic indium compound and an organic tin compound and a thermal decomposition step, characterized in that the transparent conductive film is made directly on a glass substrate and in that the thermal decomposition step is followed by a heat treatment step carried out in an oxidative, a reductive or an inert atmosphere containing above 0.6 % by volume of water vapour. A method according to claim 1, characterized in that the solution used in the coating step additionally contains a binder. A method in accordance with claims 1 and 2, wherein said organic indium compound is at least one member selected from the group consisting of crown ether complexes, indium diethylacetoacetatemonoacetylacetonate, indium monoethylacetoacetatedicetylacetonate, indium triacetylacetonate, indium trifluoroacetylacetonate, indium alcoholateacetylacetonates, indium 2-ethylhexanoate, indium octanoate, indium laurate and indium isopropionate. A method in accordance with claims 1 to 3, wherein said organic tin compound is at least one member selected from the group consisting of crown ether complexes, tin butyrate, tin 2-ethyl-hexanoate, tin naphthenate, tin p-toluylate and dibutyltinbisacetylacetonate.

Inventors: HASEGAWA, YOU, ISOZAKI, YASUHITO, OKANO, KAZUYUKI
Applicants: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Application year: 1987
Main classification: C23C16
IPC codes: C03C17, H01B13, H01B5, H01B1, G02F1, H01L31, C23C18