Device for emitting multislit lights

Abstract: Multislit lights are emitted by a device comprising : means (LD) for generating a single wavelength parallel light (206) defining an optical axis (208); two diffraction gratings (A, B) arranged on the optical axis with the direction of diffraction of one grating being perpendicular to that of the other one; and a cylindrical lens (209) arranged on the optical axis such that the longitudinal axis of the lens is parallel to the direction of diffraction of one (B) of the gratings; whereby the light passing through the gratings and lens form a plurality of slit lights (l₁, l₂, ...).

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a device for emitting multislit lights. Such a device can be used in particular in carrying out a method for measuring a three-dimensional position of an object by irradiating multislit lights onto the object to obtain the images thereof, such as for controlling an industrial robot. 2. Description of the Related Art A conventional system for measuring a three-dimensional position of an object comprises two cameras near to the object and a multislit light source for irradiating light onto the object. A plurality of slit light projected images formed on the object are photographed by the two cameras, and a plurality of slit light photo images on the respective two cameras corresponding to the above-mentioned slit light projected images, respectively, are determined. Accordingly, a three-dimensional position of the object can be measured on the basis of these images on the two cameras through the principle of triangulation. According to the related art as mentioned above, it is difficult to obtain a correspondence between the plurality of slit light photo images received by the first camera, and those received by the second camera, and the implementation of such a process requires an undesirable amount of time. A device for producing a two-dimensional array of light points is shown in US-A-3 912 395. SUMMARY OF THE INVENTION An object of the present invention is to provide a device for emitting multislit lights. According to one aspect of the present invention, a device for emitting multislit lights comprises : means for generating a single wave length parallel light defining an optical axis; two diffraction gratings arranged on the optical axis such that the direction of diffraction of one of said gratings is perpendicular to that of the other of said gratings; and a cylindrical lens arranged on the optical axis such that the longitudinal axis of this lens is parallel to the direction of diffraction of one of said gratings; said one of said gratings, having a direction of diffraction in parallel to the longitudinal axis of cylindrical lens, having a diffraction grating portion and non-grating portion, so that a part of optical spots incident to this grating is irradiated to said diffraction grating portion and the other part of said incident optical spots is irradiated to said non-grating portion and is directly transmitted therethrough. According to another aspect of the present invention, a device for emitting multislit lights comprises : means for generating a single wave length parallel light defining an optical axis; two diffraction gratings arranged on the optical axis such that the direction of diffraction of one of said gratings is perpendicular to that of the other said grating; a cylindrical lens arranged on the optical axis such that the longitudinal axis of this lens is in parallel to the direction of diffraction of one of said gratings and the parallel light passes through these gratings and lens to form a plurality of slit lights; and a shutter means arranged in front of said one of the gratings having a direction of diffraction in parallel to the longitudinal axis of the cylindrical lens, said shutter means being able to shelter a plurality of slit lights or spot lights distributed in the direction parallel to the axis of the cylindrical lens except one of said slit lights or spot lights, so that either multi slit lights or a single standard slit light can be obtained in time division by controlling said shutter means. BRIEF DESCRIPTION OF THE DRAWINGS Figures 1 and 2 are schematic views illustrating a principle of three-dimensional measurement; figure 3 is a block diagram illustrating an apparatus for measuring a three-dimensional position according to the principle illustrated by figures 1 and 2; figure 4 is a flow-diagram illustrating a process for measuring a three-dimensional position according to the principle illustrated by figures 1 and 2; figure 5 is a flow diagram illustrating a process for extracting the image of the object; figure 6 is a flow diagram illustrating a process for extracting the linear images by a standard slit light and multislit lights; figure 7 is a flow diagram illustrating a process for extracting the photo images of the standard slit light and multislit lights; figure 8 is a flow diagram illustrating a computing process for obtaining a correspondence; figures 9 and 10 are schematic perspective views illustrating a movable light source assembly; figures 11 and 12 are similar views to figures 1 and 2, respectively, but illustrating another principle of three-dimensional measurement; figure 13A is an exploded perspective view illustrating a device for emitting multi slit lights according to the invention; figures 13B and 13C are plan views of diffraction gratings A and B, respectively, used in the device shown in figure 13A; figure 14 is a view similar to figure 13A, but illustrating another device according to the invention for emitting multislit lights; figure 15 is a view similar to figure 3, but illustrating an apparatus for measuring a three-dimensional position in the second embodiment; figure 16 is a view similar to figure 4, but illustrating a process for measuring a three-dimensional position according to the principle illustrated by figures 11 and 12; figures 17A and 17B are exploded perspective views illustrating still another device according to the invention for emitting multislit lights; figure 18 is a view similar to figure 13A, but illustrating still another device according to the present invention for emitting multislit lights; figures 19A and 19B are perspective views of shutter elements used in the multislit light emitting device shown in figure 18; figure 20 is a view similar to figure 3, but illustrating an apparatus for measuring a three-dimensional position according to the principle illustrated by figures 11 and 12; and figure 21 is a view similar to figure 4, but illustrating a process for measuring a three-dimensional position according to the principle illustrated by figures 11 and 12. DESCRIPTION OF THE PREFERRED EMBODIMENTS Principle of Measurement Referring now to figures 1, 2A and 2B, it is assumed that a predetermined orthotomic coordinate of a camera, O C -X C Y C Z C , has a starting point at the focus of a video camera 1 and a Z-axis along an optical axis of the camera 1. It is also assumed that an orthotomic coordinate of a multislit, O M -X M Y M Z M , has a starting point at a multislit light source 5. This coordinate of a multislit is parallely moved along Y M , then an orthotomic coordinate of a standard multislit, O S -X S Y S Z S , having a starting point at a standard multislit light source 6, is presumed. The relationship between the camera orthotomic coordinate and the multi slit orthotomic coordinate is generally given as follows : where h ij (i, j = 1, 2, 3) represents a cosine of the angle between the coordinate axis i and j, and h i4 (i = 1, 2, 3) represents a parallelly moved distance. It is now assumed that each slit optical face M of the slit light 3 is obtained by rotating the plane, X M = 0, represented by the multislit orthotomic coordinate, by a predetermined angle, about the axis of Y M . A slit optical face M j , which is obtained by rotating the plane, X M = 0, by an angle of j (j = 1 to m) about the axis of Y M is given as follows. x M cos j - z M sin j = 0 This is represented by using the camera orthotomic coordinate as follows. Using the representation (1), M j : (h 11 x C + h 12 y C + h 13 z C + h 14 )cos j - (h 31 x C + h 32 y C + h 33 z C + h 34 )sin j = 0 (j = l to m) On the other hand, it is assumed that a slit optical face S of the standard slit light 8 is obtained by rotating the plane, X S = 0, represented by the standard slit orthotomic coordinate, by a predetermined angle  S , about the axis of Y S (which coincides with Y M ).  S is is adjusted to conform to the number K slit optical face M K of the multislit light 3 as follows.  s =  k Here, a standard slit optical face S of the standard slit light 8 may be represented as follows. x s cos s - z s sin s = 0 This is represented by using the camera orthotomic coordinate as follows. Using the representation (1), S : (h 11 x C + h 12 y C + h 13 z C + h 14 )cos s - (h 31 x C + h 32 y C + h 33 z C + h 34 )sin s = 0 Now, it is assumed that by irradiating m multislit light(s) 3, a plurality of slit light projection images 9 are created on the surface of the object 4, and by taking these images by the camera 1, ℓ slit light photo images corresponding to the slit light projection images 9 are obtained on an image face, such as a photo element, in the camera 1. Here, for the simplicity, it is presumed that the object 4 is linear, the coordinate of the slit light projected image on the object 4 is Pi (X C Pi, Y C Pi, Z C Pi), (i = 1 to ℓ), and the coordinate of the slit light photo image corresponding to the respective slit light projected image 9 is Ii (X C Ii, Y C Ii, z C Ii), (i = 1 to ℓ). Here, for convenience, it is also presumed that the image plane C is the plane Z C = f (a constant focal distance) parallel to the plane X C Y C . In this case, if the eye line 10 is presumed to be a line L (= O C Ii), L is given as follows. L i : x C x C Ii = y C y C Ii = z C f The three dimensional coordinate of one Pi of spot-like slit light projected images 9 is determined as in an intersection of the eye line 10, i.e., the straight line Li and a slit light face Mi corresponding to Pi. However, in this stage, the correspondence of each slit light photo image Ii (i = 1 to ℓ) to a slit light face Mj of the multi slit light 3 is unknown; it has not been determined which image Ii to I corresponds to which slit light face among M₁ to M irradiating onto the object 4. A standard slit light 8 having the same slit optical face S as a slit optical face M K formed by one of the multislit light(s) 3 is irradiated at a time division with multislit light(s) 3. Here, the coordinate of a slit light projected image 9 on the object 4 by the standard slit light 8 is presumed to be P S (X C PS, Y C PS,Z C PS), and the coordinate of the standard slit light photo image corresponding to the slit light projected image 9 is presumed to be Is (X C IS, Y C IS, Z C IS), Z C IS = f. In this case, the eye line L S (= O C Is) is represented as follows. L s : x C x C Is = y C y C Is = z C f P S ( a spot of slit light projected image 9) can be determined as an intersection of the line L S and the slit optical face S corresponding to P S . Therefore, from the representation (8), x C = x C Is f z C , y C = y C Is f z C is obtained. If this is inserted into the representation (6), Z C is given as follows. {(h 11 x C Is f + h 12 y C Is f + h 13 )cos s - (h 31 x C Is f + h 32 y C Is f + h 33 )sin s } z C = h 14 cos s + h 34 sin s Therefore, z C = (h 14 cos s + h 34 sin s )/g If this is inserted into the representation (9), x C = (h 14 cos s + h 34 sin s ) x C Is/fg y C = (h 14 cos s + h 34 sin s ) yIs C /fg are obtained. Here, g = (h 11 x C Is f + h 12 y C Is f + h 13 ) cos s - (h 31 x C Is f + h 32 y C Is f + h 33 ) sin s The above 11a through 11c, hereinafter referred to simply as (11), and the above (12) is a representation of Ps indicated by the camera orthentic coordinate. Since the slit light face S formed by the standard slit light 8 corresponds to one Mk of the slit light faces M produced by the multislit lights 3, one which corresponds to the standard slit light photo image Is necessarily can be found in the slit light photo images Ii (i = 1 to ℓ) of the multislit lights 3. Thus, if a slit light photo image specified by Is is presumed to be Ir, the latter is made to correspond to the slit light face S formed by the standard slit light 8 and, therefore, to the slit face Mk of the multislit light(s) 3. Then, in view of the arrangements of the multislit lights 3 and the slit light photo images, presuming no interchange between the two factors, I r-1 is made to correspond to M k-1 , I r-2 to M k-2 , ..., I₁ to M k-r+1 , I i+r to M k+1 ,I r+1 to M k+1 , I r+2 to M k+2 , ..., and I ℓ to M K+ℓ-r , respectively. Therefore, in these relationships, in the representations (11) and (12), in place of (X C Is , y C Is ,  s ), inserting (x C Is , y C Is ,  k-r+1 ) in P₁ (x C Is , y C Is ,  k-r-2 ), in P₂... (x C Iℓ ,y C Iℓ , k-ℓ-r ) in P ℓ , a three dimensional position in the camera orthentic coordinate of the slit light projected image 9 of the object 4 can be determined and, therefore, a three dimensional position of the object 4 can be determined. Measuring System A device for carrying a three dimensional measuring process may be constructed as shown in Fig. 3, in which reference numeral 1 denotes a video camera; 11, an analog-digital converter; 12, an ordinary illumination for irradiating the object 4; and 13 and 14, light sources each comprising a multislit light source 5 and a standard slit light source 6, which can be selectively used in accordance with the arrangement of the object 4. Reference numeral 15 denotes an image processor, which comprises a light and shade image (evenness) processor 16 for plotting the configuration of the object 4, a ridge processor 17 for plotting the center line of the linear object 4 within one picture element width, a pole processor 18 for plotting local peak points, a binary processor 19 for the digital signal, and an AND operator having a function of AND operation between the images. Reference numerals 21 and 22 denote image memories for storing the images taken on the image face C of the camera 1; 23, a linear image computer for computing, on the basis of the position of the object 4, whether to select either of two light sources 13 and 14 arranged differently to each other; 24, a computer for specifying one of the slit light images of the multislit lights 3 which corresponds to the standard slit light image of the standard slit light 8 and for computing the obtaining of the correspondence between the slit light image and slit light face M; 25, a computer for computing the three dimensional coordinate using the representations (11) and (12); 26 and 27, buffers; and 29, a CPU (central processing unit) for conducting various controls and computations. Measuring Process It is presumed that an object to be measured is linear. First, as seen in Fig. 1, the multislit light source 5 and the standard slit light source 6 are fixedly arranged near to the linear object 4. The multi slit light source 5 and the standard slit light source 6 irradiate the multislit lights 3 and the standard slit light 8, respectively, as described above, and are one set selected from the two sets of light sources 13 and 14. In a flowchart shown in Fig. 4, the ordinary illumination 12 arranged near to the object 4 is first turned ON to illuminate the object 4 (41). However, if the object 4 can be clearly distinguished from the background, such illumination is not necessary. Next, the object 4 illuminated by the ordinary illumination 12 is pictured by the video camera 1 and the configuration of the object 4 is taken on the image face C, such as a picture element. Then, the pictured image is converted to a digital signal having light and shade levels (80) and input to the image processor 15. The signals input to the image processor 15 are, at the evenness processor 16, subjected to an evenness or Laplacean's process 81, or both the evenness and Laplacean's process 82, as shown in Fig. 5. Then, the signals are subjected to a ridge point process 83 at the ridge point processor 17 and a binary process 84 at the binary processor 19. If there is a lot of whisker-like noise, the signal may be subjected to a noise removing process 85, after the binary process 84. The center line of the object 4 can be plotted as a line of one picture element width and stored 86 in the image memory 21 as an image 30 (42). Then, the direction of arrangement of the linear object 4 is computed at the computer 23 on the basis of the data obtained, as follows. First, an initial point Ls (X s C , Y s C ) and a final point Le (X e C , Y e C ) of the object 4 on the image face C are specified by the camera orthentic coordinate. Here, since the object 4 is a simple elongated linear member, an angle  indicating the arrangement direction of the object 4 can be determined from L s and L e . Namely,  = arc tan y e C - y s C x e C - x s C Thus, a vector of direction indicating the arrangement of the object 4 is as follows. ℓ = (cos, sin) Using this vector ℓ , either of the light sources A and B arranged in opposite directions with respect to each other is selected as follows. If it is presumed that the vectors of the light sources 13 and 14 normal to the slit face are S A and S B , respectively, the absolute values of products ℓ ˙ S A and ℓ ˙ S B are computed and both values are compared to select the light source having an absolute value smaller than the other light source (43). The is because more slit light projection images 9 should be collected with respect to the multislit lights (3) in order to improve the resolution of the measurement. However, both the light sources 13 and 14 may be used, to enable two measurements from different directions, respectively. Then, the ordinary illumination 12 is turned OFF, but the standard slitlight source of the selected light source set 13 or 14 is turned ON to irradiate the standard slit light 8 onto the surface of the object 4 (44). Here, the slit light face S formed by the standard slit light 8 should be previously made to correspond to one of the multislit light(s) 3. A luminance line 7 is provided to cross the object 4 by the standard slit light 8 and a slit projection image 9 is formed on the object 4. The luminance line 7 including the slit projection image 9 is pictured by the camera 1, so that a line image 37 including the standard slit light photo image 38 corresponding to the slit projection image 9 of the standard slit light 8 is obtained on the picture element C of the camera 1. The line image 37 is converted by the analog digital converter 11 shown in Fig. 3 to a digital signal having an evenness level (90) and input to the image processor 15. The signal input to the image processor 15 is, at the evenness processor 16, subjected to an evenness or Laplacean's process 91, or both the evenness and Laplacean's processes 92, as seen in Fig. 6. Then, the signals are subjected to ridge point process 83 at the ridge point processor 17 and a binary process 84 at the binary processor 19. The signals are then subjected to a ridge point process 93 at the ridge point processor 17 and a binary process 95 at the binary processor 19, so that the center line of the line image 37 can be plotted and stored as a picture image 31 to the image memory 22 (45). Here, a local point process 94 may be carried at the local point processor 18 in place of the ridge point process 93 at the ridge point processor 17. In this case, a local peak is plotted rather than the centerline of the line image 37 by the standard slit light 8. Especially, where the standard slit light picture image 38 is taken as one picture element, the process shown in Fig. 8 is unnecessary. Then, image data are simultaneously read out from the image memories 21 and 22 and AND operations of the picture images 30 and 31 are carried out at the AND operation processor 20 to obtain the standard slit photo image 38. The standard slit photo image 38 may generally have a number of gathered spots, even if the object is linear. Thus, each coordinate thereof is represented by the camera orthentic coordinate, as Bj (x C , y C ), j = I to n and stored in the buffer 26 (46). The flow of the process as mentioned above is shown in Fig. 7, from 100 to 102. Then, the standard slit light source 6 is turned OFF, and the multislit source 5 is turned ON (47). Taking the slit light photo image 39 by the multislit light(s) 3 is carried out in the same manner as the taking process of the standard slit light photo image 38 by the standard slit light 8. A flow of this process is illustrated in Fig. 4, from 47 to 50, which substantially corresponds to 44 to 47 in the case of a standard slit light 8. That is to say, a plurality of luminance lines 7 are provided to cross the object 4 by the multislit light(s) 3 and a plurality of slit projected images 9 are formed on the object 4. The luminance lines 7 including the slit projected images 9 are pictured by the camera 1, so that a plurality of line images 37 including a plurality of slit light photo images 39 corresponding to the projected image 9 of the multislit light(s) 3 are obtained on the picture element C of the camera 1. The line images 37 are processed in the same manner as the standard slit light 8 so as to plot the center lines of the line images 37 of the multislit light(s) 3 and store them 96 on the image memory 22 as images 33 (48). Then, image data are simultaneously read out from the image memories 21 and 22 and AND operations of the picture images 30 and 33 are carried out at the AND operation processor 20 to plot a plurality of slit light photo images 39. Each slit photo image 39 may generally have a number of gathered spots, even if the object 4 is linear. Thus, each coordinate of the slit photo images 39 is represented by the camera orthentic coordinate, as C k (x C , y C ), k = 1 to k and stored in the buffer 27 (49). The other processes which have been carried out in the case of the standard slit light 8 are also carried out in these processes for multi slit light(s) 3. Then, the multislit light source 5 is turned OFF (50). Then, assuming that there is no interchange between the slit light photo images 39, a slit light photo image 39 which corresponds to the standard slit light photo image 38 by the standard slit light 8 is selected from among the plurality of slit light photo images 39 by the multislit light(s) 3. To do this, in the computer 24, a process for making a correspondence is carried out, as shown in Fig. 8. First, an average value B (x,y) of the data Bj (x C , y C ), j = 1 to n, for indicating coordinate positions of the standard slit light photo image 38 is determined to represent the coordinate of the standard slit light photo images 38 (61). That is to say, Then, the distance and direction of the standard slit light photo image 38 to each slit light photo image 39 by the multislit light(s) 3 are determined (62). Namely, the distance d k and angle η k on the image face C are represented, respectively, as follows. d k = C k (x C , y C ) - B (x C , y C ) η k = arc tan C k (x C ) - B (x C ) C k (y C ) - B (y C ) k = 1 to k Then, C k (x C , y C ) is rearranged in order from a smaller d k (63). In d k (x C , y C ), if d k is smaller than a distance r, it should be classified into class 0 (65). Then, η k are classified in order of the value near to B (x C , y C ) into classes 1, 2, 3, (68). Similarly, η k of negative value are classified in order of the value near to B (x C , y C ) into classes -1, -2, -3, ... . If the ridge point process has been carried out, the average values in the respective classes should be represented, since the slit light photo images 39 might be extracted in a unit of several picture elements (69). These are represented as follows. E p (x C , y C ), p = 1 to e If the pole point process is carried out to extract each slit light photo image within one picture element, the average value is no longer necessary. E p (x C , y C ) are rearranged in order from smaller class (70). If p = r falls in class O, E r (x C , y C ) corresponds to the standard slit light photo image 38, and as a result, an image which corresponds to the standard slit photo image 38 is specified among the slit light photo images 39. Therefore, the angle  S of irradiation of the slit light face S by the standard slit light 8 corresponds to number K slit light face M k , so that E r (x C , y C ) is made to correspond to  k . Therefore, assuming that there are no interchanges for the other slit light photo images 39, E r+1 (x C , y C ) is made to correspond to  k+1 , E r+2 (x C ,y C ) to  k+2 , ... and, E1 (x C , y C ) to  k+1-r , and also E r-1 (x C , y C ) to  k-1 , E r-2 (x C , y C ) to  k-2 , ... and E₁(x C ,Y C ) to  k-r+1 , respectively (71). In the above description, although the coordinate of picture image face C is represented by the camera orthotomic coordinate for the sake of simplicity, a picture image coordinate generally can be set on the picture image face C to present it in this coordinate. In this case, however, a process is necessary for changing the picture image coordinate to the camera orthotomic coordinate (72). Thus, each slit light photo image 39 and each slit light face M j of the multi slit light(s) 3 are made to correspond to each other, on the basis of the relative positions between the specified slit light photo image 39 and the other slit light photo images 39 (51). The coordinate and angle of the slit light photo image 39 on the picture image face C thus obtained are inserted in the above-mentioned representations (11) and (12), (x C IS , y C IS ,  s ), and the relationship between the camera orthotomic coordinate and the coordinate of multislit and standard slit, (hij (i, j = 1 to 4)) is then determined. Therefore, the distance from the coordinate of the slit light photo image 9 to the coordinate (73, 52), is obtained, and therefore, a three dimensional measurement of the object 4 can be conducted. In this embodiment, although the object 4 is presumed to be linear, it is not limited to such configurations, but can be applied to a general three dimensional object. In this case, the slit projected image on the object is processed as linear (in this embodiment, processed as spots). Figures 9 and 10 illustrate a light source assembly comprising a base 111 for carrying a single slit light source 5 and a multislit light source 6, which are arranged such that the optical face 8 of the single slit light source 5 corresponds to one of the optical faces 7 of the multislit light source 6. In Fig. 9, the light source assembly (base 111) can be rotated by a motor M about an axis A passing both the emitting points of the single slit light and multislit light sources 5 and 6 so as to enable a three dimensional measurement for an object located at any position within the visual field of the camera 1 (Fig. 1). In addition, in Fig. 10, the whole light source assembly comprising a base 111 for carrying a single slit light source 5 and a multislit light source 6, as well as a motor M1, similar to the assembly shown in Fig. 9, is connected to a bracket means 112 connected to another motor M2, such that the base 111 can, of course, be rotated about the axis A, and the above mentioned whole light source assembly also can be rotated about an axis B which intersects perpendicularly to the axis A. Therefore, a three dimensional measurement will be made more widely possible by irradiating from any desired position to an object located at any position within the visual field of the camera. Other Embodiments In the above embodiment, although correspondence between the multislit light face and its slit light photo image is carried out by using the standard slit light source independent from the multislit light source, it is also possible to provide a shutter in front of the multislit light source so as to perform time division for irradiation of a single standard slit light and whole multislit light(s) by the shutter. Alternatively, it is also possible to provide a multislit light source wherein one of the slit light faces has a luminance level higher than the otherfaces, and thus can be used as a single standard slit light. Figures 11 and 12 are similar to Figs. 1 and 2, except that the standard slit light source 5 is omitted. According to these embodiments, an assembly of a light source (multislit light source) 5 only is necessary, as seen in Figs. 11 and 12. Second Embodiment Figure 13A is a perspective view of a device for emitting multislit light. A parallel light 206 of a single wave length is generated, for instance, by collimating a light beam emitted from a semiconductor laser LD by a collimator lens 207. On an optical axis 208 of the parallel light beam 206, two diffraction gratings A and B having directions of diffraction perpendicular to each other, and a cylindrical lens 209 are arranged. The axis of this cylindrical lens 209 corresponds to the direction of diffraction of grating B of these diffraction gratings. This diffraction grating B has a diffraction grating portion 210, one end of which is positioned on the optical axis 208, as seen in Fig. 13C. Therefore, a part of the incident light is irradiated to the grating portion 210, but the other part thereof is irradiated to the non-grating portion 211. On the other hand, the light is irradiated to the center of the grating portion of the diffraction grating A, and the direction of diffraction thereof is perpendicular to the axis of the cylindrical lens 209, as seen in Fig. 13B. Since the above two diffraction gratings A and B and the cylindrical lens 209 are arranged as mentioned above, the positions of these elements on the optical axis 208 are not limited. In this particular embodiment, along the parallel incident light beam 206, a diffraction grating A has a direction of diffraction perpendicular to the axis of the cylindrical lens 209. The parallel light 206 irradiated to the diffraction grating A is a circular optical spot in cross-section, as indicated by S. However, after it has passed through the diffraction grating A and is diffracted, a plurality of optical spots S₁ , S₂, ... are formed along the diffraction direction, i.e., the axis y. Then when these spots S₁ , S₂, pass through the diffraction grating B, a row of optical spots S₁ , S₂, ... are diffracted in the axis x direction. Therefore, on each of X₁ , X₂ , X₃ , ..., a plurality of optical spots S₁ , S₂, ...are formed to make a matrix of optical spots. However, when passed through the diffraction grating B, a part of incident optical spots S₁ , S₂, ... pass the diffraction grating portion 210, but the other portion thereof passes directly through the non-grating portion 210. Therefore, the luminance of the row of optical spots S₁ , S₂ ... along the axis y at the center position x₃ is intensified in comparison to the other rows of spots, due to the sum of the diffracted light and directly passed light. Then, when passed through the cylindrical lens 209, each optical spot is enlarged in the direction perpendicular to the axis of this cylindrical lens 209, i.e., in the direction of axis y, and becomes ellipsoidal in cross-section. A part of each ellipse overlaps the adjacent one, so that slit lights ℓ₁ , ℓ₂ , ℓ₃, ... are formed. Since the luminance of the slit light ℓ₃ on the optical axis 208 is stronger than those of the other slit lights, the slit light ℓ₃ can be used as a standard slit light. Figure 14 illustrates an embodiment similar to Fig. 13A. In this embodiment, on an optical axis 208, there are arranged, in turn, a semiconductor laser LD for emitting a laser beam having a single wave length, a collimator lens 207, a cylindrical lens 209, a diffraction grating A having a diffraction direction perpendicular to the axis of the cylindrical lens 209, and a diffraction grating B having a diffraction direction perpendicular to that of the diffraction grating A. Therefore, the light emitted from the semiconductor laser LD is collimated to a parallel light by the collimator lens 207 and passed through the cylindrical lens 209, so that it is enlarged in the y-direction to become an elliposoidal optical spot Sa. When passed through the diffraction grating A and diffracted in the y-direction, a plurality of ellipsoidal optical spots Sa1, Sa2,...are formed in the y-direction. Each of these optical spots overlaps the adjacent one to form a single slit light ℓ. The diffraction grating B having a diffraction direction parallel to the axis of the cylindrical lens 209 has a diffracting grating portion 210, one end of which is positioned on the optical axis 208. Therefore, only about a half of the incident slit light passes through the diffracting grating portion 210, and the other half thereof passes directly therethrough without diffraction. Therefore, after having passed the diffraction grating B, the slit light ℓ₃ on the optical axis 208 is formed of the sum of the diffracted slit light and non-diffracted slit light, and the other slit light is formed only of the diffracted slit light. The luminance of the slit light ℓ₃ is, therefore, much higher than that of the others. In the embodiment of Fig. 14, from the side of the collimator lens 207, there are arranged, in turn, the cylindrical lens 209, the diffraction grating A having a diffraction direction perpendicular to the axis of the cylindrical lens 209, and the diffraction grating B having a diffraction direction parallel to the axis of the cylindrical lens 209. These elements may be, however, arranged as desired. It is sufficient to arrange the diffraction grating A having a diffraction direction perpendicular to the axis of the cylindrical lens 209, such that the end of the diffracting portion 210 is positioned on optical axis 208.. For instance, as seen in Fig. 13A, the cylindrical lens 209 may be arranged behind the gratings A and E. However, these two gratings should be arranged near to each other, because, if the distance between the two is too long, the upper and lower ends of the slit light might be cut off, depending on the size of the cylindrical lens 209. A multislit slit light source as mentioned above can be used as a light source 5 in Figs. 11 and 12. In this case, if an exposure aperture of the video camera 1 is stopped or narrowed (high level threshold), only one ℓ₃ of the slit light(s) which is particularly brighter than all the others can be received by the camera. Therefore, this slit light ℓ₃ can be used as a standard slit light. On the other hand, if an exposure aperture of the video camera 1 is enlarged (low level the threshold), all the slit light(s) can be received by the camera. Therefore, these slit light(s) can be used as multislit light(s). Figures 15 and 16 are similar to Figs. 3 and 4, respectively, but illustrate a three dimensional measuring device and a process thereof for measuring in the second embodiment employing a multislit light source as shown in Figs. 13A and 14. Therefore, in Fig. 15, each set of light sources 13 or 14 includes only a multislit light source. In Fig. 16, at step 44, the ordinary light is turned OFF and simultaneously, the multislit light source 5 (Fig. 11) is turned ON. In this case, the multislit light projected images 9 (Fig. 11) comprise one particularly bright slit light ℓ₃ and the other slit light(s). Therefore, at step 45, the level of threshold in the binary process 95 (Fig. 6) must be high enough to extract only the particularly bright or high intensive slit light (standard slit light) to obtain a standard slit light photo image 38. On the other hand, at step 47, the level of threshold in the binary process 95 (Fig. 6) must be reduced to a low level so as to extract multislit light photo images 39. This process is the same as the previous process for obtaining the standard slit light photo image 38, except that the level of threshold is low. In the second embodiment, the multislit light source 5 (Fig. 11) may be moveable, in the same manner as mentioned in Figs. 9 and 10, to enable a three dimensional measurement for an object located at any position within the visual field of the camera 1 (Fig. 11). For this purpose, the multislit light source 5 may be mounted, for example, on an X-Y stage or an industrial robot. Third Embodiment Figures 17A and 17B illustrate another embodiment of a device for emitting multislit light, in which Fig. 17A shows the state where the shutter is OFF and Fig. 17B shows the state where the shutter is ON. On an optical axis 208 of the parallel light 106, two diffraction gratings A and B having directions of diffraction perpendicular to each other, and a cylindrical lens 209, the axis of which is parallel to the direction of diffraction of one B of the gratings, are arranged, such that a plurality of slit light(s) ℓ₁ , ℓ₂ ... are generated after passing through these elements. On the optical axis 208, there are also arranged a semiconductor laser LD for generating a single wave length laser beam and a collimator lens 207. The light emitted from the semiconductor laser LD passes through the collimator lens 207 to become a parallel light, and then passes through the cylindrical lens 209 to be enlarged in the direction y to become a light of an ellipse section spot. Then, it passes through the diffraction grating A and is diffracted to become a vertically elongated optical spot, i.e., a slit light, formed along the direction of diffraction, axis y. Then, when it passes through the grating B, the slit light is diffracted in the axis x direction. Therefore, a plurality of slit lights ℓ₁ , ℓ₂, ..., that are multislit light(s) are formed. In this embodiment, a shutter means 220 is arranged so as to shelter the slit lights other than a particular light. According to this embodiment, since the shutter 220 is arranged so as to shelter the slit lights other than a particular slit light, when the shutter 220 is turned ON and closed, only the particular single slit light (standard slit light) ℓ₃ is obtained, since the other slit lights are sheltered, as illustrated in Fig. 17B. When the shutter 220 is turned OFF and opened, all of the slit lights, namely multislit lights, ℓ₁ , ℓ₂ , ℓ₃ , ... are obtained, since the shutter 220 allows all of the slit lights to pass therethrough, as illustrated in Fig. 17A. In Fig. 18, the diffraction gratings A and B are reversed with respect to each other. After passing through the cylindrical lens 209, the light having a cross-section of a vertically elongated ellipse spot passes through the grating B and is diffracted in the axis x direction. Therefore, a plurality of lights sx1, sx2, ... are formed. Since the shutter 10 is arranged between the two gratings A and B, all the lights sx1, sx2, ..., other than a particular light sx3, are sheltered when the shutter 220 is turned ON and closed. Then, the light sx3 passes through the diffraction grating A and is diffracted to become a vertically elongated single slit light (a standard slit light) ℓ₃. When the shutter 220 is turned OFF and opened, all the spot lights sx1, sx2, ... diffracted in the x direction at the grating B pass the grating A and diffracted in the y direction to become multislit lights ℓ₁ , ℓ₂, .... Figures 19A and 19B illustrate electronical and mechanical shutter elements, respectively. As an electronical shutter, which has no mechanically moveable members, one using liquid crystal utilizing polarization effects, or one comprising a so-called PLZT disposed between two polarization plates can be used. The PLZT consists of four components, titan, zircon, lead, and lanthanum and has an effect of changing polarization face depending on whether the electrical power is made ON or OFF. The electronics shutter 220 may be one which has two shutter elements spaced from each other, as seen in Figs. 17A, 17B and 18, or one 220 which has one shutter element provided with an optical aperture 221 at a position corresponding to the standard slit light, as seen in Fig. 19A. On the other hand, a mechanical shutter may be one which has an optical aperture 222 which allows only the standard slit light to pass therethrough, as seen in Fig. 19B. In order to obtain multislit light(s) ℓ₁ , ℓ₂ , ..., the shutter element 223 should be retracted from the optical path. Conversely, in order to obtain a single standard slit light ℓ₃ , the shutter element 223 should be moved onto the optical path 208 so that only the single standard slit light ℓ₃ passes the aperture 222. Figures 20 and 21 are similar to Figs. 3 and 4, respectively, but illustrate a three dimensional measuring device and the process thereof for measuring in the third embodiment employing a multislit light source as shown in Figs. 17 (A, B) and 18. Therefore, in Fig. 20, each set of light source 13 or 14 includes a multislit light source and a shutter 53 or 54. In Fig. 21, at step 44, the ordinary light is turned OFF and simultaneously, the multislit light source 5 (Fig. 11) is turned ON. In this case, the shutter is closed to obtain a single standard slit light, as mentioned above. On the other hand, at step 47, the shutter is opened to obtain multislit lights, as also mentioned above. The ON and OFF operation of the shutter may be controlled either by a host computer, for instance, or manually. In the third embodiment, the multislit light source 5 (Fig. 11) may be moveable, or the shutter may be movable, although the light source is fixed, so as to enable three dimensional measurement of an object located at any position within the visual field of the camera 1 (Fig. 11). In addition, the shutter may have a plurality of segments which correspond to the respective slit light(s) of the multislit lights, so that a position of the desired slit light may be changed by controlling the respective shutter segments.

Claims: A device for emitting multislit lights comprising : means (LD) for generating a single wave length parallel light (206) defining an optical axis (208); two diffraction gratings (A and B) arranged on the optical axis such that the direction of diffraction of one of said gratings is perpendicular to that of the other of said gratings; and a cylindrical lens (209) arranged on the optical axis such that the longitudinal axis of this lens is parallel to the direction of diffraction of one (B) of said gratings; said one (B) of said gratings, having a direction of diffraction in parallel to the longitudinal axis of cylindrical lens, having a diffraction grating portion (210) and non-grating portion (211), so that a part of optical spots incident to this grating is irradiated to said diffraction grating portion and the other part of said incident optical spots is irradiated to said non-grating portion and is directly transmitted therethrough. A device as set forth in claim 1, wherein an end of said diffraction grating portion (210) of said grating (B) is located on said optical axis (208). A device for emitting multislit lights comprising : means (LD) for generating a single wave length parallel light (206) defining an optical axis (208); two diffraction gratings (A and B) arranged on the optical axis such that the direction of diffraction of one of said gratings is perpendicular to that of the other said grating; a cylindrical lens (209) arranged on the optical axis such that the longitudinal axis of this lens is in parallel to the direction of diffraction of one (B) of said gratings and the parallel light passes through these gratings and lens to form a plurality of slit lights (l₁, l₂ ,...); and a shutter means (220) arranged in front of said one (B) of the gratings having a direction of diffraction in parallel to the longitudinal axis of the cylindrical lens, said shutter means being able to shelter a plurality of slit lights (l₁, l₂ ...) or spot lights (SX₁, SX₂, ...) distributed in the direction parallel to the axis of the cylindrical lens except one of said slit lights or spot lights, so that either multislit lights or a single standard slit light can be obtained in time division by controlling said shutter means.

Inventors: HANAHARA KEISHI, KANDA SHINJI, MARUYAMA TSUGITO MEZON-TSUKUSH, HANAHARA, KEISHI, KANDA,SHINJI, MARUYAMA, TSUGITO, MEZON-TSUKUSHINO B-303 8-3
Applicants: FUJITSU LTD, FUJITSU LIMITED
Application year: 1986
Main classification: G01B11
IPC codes: G01S17, G01B11, G01S7