MANUFACTURING METHOD OF CARBON FILM AND USE THEREOF

Abstract: This invention relates to a manufacturing method of a carbon film on a member which slidably contacts with another member, and more particularly it relates to a method for forming a thin carbon layer by sputtering glass-like carbon which has a high durability and less friction resistance against another member with which the filmed member contacts.

Description: MANUFACTURING METHOD OF CARBON FILM This invention relates to a method for manufacturing a thin carbon film on the surface of a sliding member which slidingly contacts with another member. This invention is applicable to a magnetic recording medium of an information processing system, artificial joints, sliding members of solenoid controller valves, etc. In recent years recording/reproducing devices which use a recording medium with magnetic layers provided on a sheet of film or paper recording medium are widely available in market. These recording/reproducing devices incorporate various members which either constantly or temporarily slide over or contact with the recording medium. They are exemplified by a head slider in a flexible disc, a flying slider in a hard disc, a magnetic head, etc. They are required to have an excellent durability and not to damage the recording medium with which they contact slidingly. The members which are often subjected to sliding contacts such as the mechanical seal, electromagnetic valve sliding members, or artificial joints are required to impart slidability on the surface of members having the structural strength. More particularly, they should have such properties as small frictional coefficient and high durability and they give no damages to the opposing members with which they slidingly contact. Much efforts have been made in the field of surface chemistry in order to obtain such desirable slidability. Attempts were made to prevent damages on the recording media by providing a protective film on a recording medium or coating lubricant either on the recording medium or on the surface of a member which slidingly contacts with the medium in the devices for driving flexible discs or hard discs. The use of lubricant, however, is not desirable in that the effect thereof deteriorates chronologically. In order to make the effect last, it is necessary to coat the members with lubricant periodically. Examples of protective film have been disclosed in Japanese Patent Application Disclosures No.83829 of 1981 and No.83869 of 1981 in which film of alumina, silica or barium titanate is formed on the magnetic head, but the durability of the recording medium was not yet sufficient. A protective film is sometimes formed on the surface of a recording medium wherein silica or carbon is used as the material. They, however, tend to deteriorate the characteristics of the recording medium under- neath the protective film and yet fail to produce satisfactory slidability. An object of this invention is to provide a carbon film which has less friction resistance against the members with which the film slidingly contacts, and more particularly to form a carbon film on the surface of a magnetic recording medium without damaging the magnetic layers and the characteristics thereof. The manufacturing method for thin carbon film according to the present invention is characterized in that glass-like carbon is used as the carbon source and the thin carbon film is formed by sputtering in forming a thin carbon film on the surface of a member which slidingly contacts with another member. The obtained thin carbon film which has a high durability and yet does not damage the substrates thereof and another member whith which the coated member slidably contacts. "Sputtering" as used herein means a method of cau sing ions to strike on a target substance, vaporizing atoms or molecules from the target surface, and depositing thus vaporized atoms or molecules on the surface of the subject material. This invention does not place restrictions on the types of ions, the reaction atmosphere and/or the production method of ions, but it is desirable to use the low pressure sputtering method in view of the purity of the formed film and the speed of forming. The low pressure sputtering method conducts the process using the gas pressure during reaction which is lower than 1 10 l > 10 Torr in the region where cold- cathode glow discharge is maintained. As such a method, there have been known the Triode Direct Current Glowdischarge Sputtering, Diode Radio frequency Glow-dicharge Sputtering or Magnetron Sputtering. As a carbon source, this invention uses glass-like carbon obtained by carbonizing a thermosetting resin, glass-like carbon obtained by carbonizing modified resins for thermo-setting by copolymerization and copolyconden by sation, glass-like carbon obtaine chemically preventing crystallization in the process of setting or carbonizing, or glass-like carbon obtained by thermo-decomposing in vapor phase low molecule hydrocarbons such as methane, ethylene, benzene, etc. They may specifically be glasslike carbons of polyacrylonitrile group, of rayon type, of pitch type, of lignin group, of phenol group, of furan group, of alkyd resin group, of unsaturated polyester group, or ot xylene resin group. It is more desirable to use the glass-like carbon obtained by carbonizing hardened resin mainly containing the mixture of three groups, i.e. phenol, fulfuryl alcohol and formalin. Either hydrocarbon in gaseous phase or a carbon material in bulk form may be used as the carbon source when this method is used for forming a thin carbon film on the surface of substrates or members which slidingly contact with others. As a method using hydrocarbons in gaseous phase, there has been known the chemical vapor deposition method (CVD) which produces carbons by thermo-decomposition under the thermal equilibrium or the method to separate carbons by disturbing the thermal equilibrium in some way or by forcibly making thermally unbalanced state. The latter method is exemplified by the plasma CVD method or the ionization deposition method which uses hydrocarbons such as methane. However, as the temperature range to effect thermal decomposition is 600"C - 8000C or higher in the above method, it may present a problem in the thermal resistance of substrates or in the thermal influence on the magnetic materials when forming a thin film on a magnetic recording medium. The method is rX further defective in that it cannot form a uniformly thin film over a large area. Although the plasma CVD method or ionization deposition method can produce hard carbon films, the film is not sufficiently uniform. If they are to be made uniform, the process needs expensive devices. As the method for using carbon materials in bulk form as the carbon source, there has been known such method as the vacuum deposition method or sputtering method. However, if a thin film is formed by the vacuum deposition, the comparatively low kinetic energy of particles to be deposited causes the formed film to be easily peeled and renders durability inferior. The thin film formed by the vacuum deposition method is generally non-uniform and the film pressure is not uniform, either. Besides above methods, the ion plating method is also known, but it requires expensive devices. In contrast to the above methods, the sputtering method can form a film of a uniform thickness. The study conducted by the inventors of this invention revealed that when a thin carbon film is formed by the sputtering method, the formed film has cXtelation with the structure of the target material. More particularly, when glasslike carbon is used as a target in sputtering, the thin carbon film formed is substantially amorphous, uniform and highly durable. It was found that if glass-like carbon having an extremely small number of surface voids is used, the time required to reach the background pressure for sputtering of 1 x lO Torr can be shortened, and moreover, impurity gas and carbon powder can be prevented during or before/after the sputtering step. The thin film carbon obtained by the present invention method is effective in improving the durability of the sliding members as well as in reducing the friction coefficient of the members which slidingly contact with the sliding member. Therefore, if such a thin carbon film is applied for the surface protective film on a hard disc, electromagnetic valve sliding surface, artificial joint sliding surface, etc., it can achieve remarkable effects. 'This invention will now be described in more detail by referring to preferred and comparative examples. The examples shown below are mere examples and are not intended to restrict the technical scope of this invention in any way. Although the case wherein a thin carbon film is formed on a hard disc for a magnetic recording device is illustrated in the following examples and comparisons, this invention can well be practiced with other materials and other members. All the "parts" mentioned in the following description means parts by weight. Example 1: Phenol modified furan resin containing furfuryl alcohol, paraformaldehyde and phenol adjusted to be 30:40:30 in mole ratio is prepared by the usual method to obtain 800 cps liquid resin. To the resin obtained is added 2.5 parts of 60% p-toluensulfonate aqueous solution, and the resultant mixture is sufficiently agitated and a disc type hardened resin is molded in the thickness of 3.5 mm. The hardened resin is heated to 1,1000C in nitrogen atmosphere at the rate of 2"C/hr., retained for two hours, and then cooled to obtain glasslike carbon. Thus obtained glass-like carbon is mounted on a backing plate and used as a target for sputtering. A disc substrate manufactured by Sumitomo Light Metal Industries Ltd. which is formed by sputtering a Co-Cr alloy film of 0.5 Nm thickness on an aluminum substrate of 5.25 inch diameter is used as the substrate to be deposited with film. The sputtering device used was NICHIDEN ANELVA SPF 530. As is generally conducted in sputtering, vacuum of 1 x 10 7 Torr was created as the background pressure, argon gas was filled up to 2 x lO 3 Torr, the backing plate was cooled with water, and high frequency power of 400W was applied for sputtering. The thickness of the film being formed was monitored by a film thickness meter of Quartz resonator while forming a thin carbon film of 400 . When observed with X-ray diffraction for thin film, Raman spectroscope and transmission electron microscope image, the formed carbon film was disclosed to be substantially amorphous. Example 2 A glass-like carbon (Glahard S manufactured by Kao Corporation) was used as a target and sputtering was conducted as in Example 1 except that the background pressure was 1 x lO 7 Torr, argon gas pressure 3 x 10 Torr and high frequency power 300 W. As a result, a thin carbon film having the thickness of 350A was formed on the surface of a disc substrate. Measurement identical to the Example 1 revealed that the formed carbon film was substantially amorphous. Example 3 A glass-like carbon (Glahard R manufactured by Kao Corporation) was used as a target and sputtering was conducted as in Example 1 except that the background pressure was 1 x low 7 Torr, argon gas pressure 3 x 10 Torr and high frequency power 500 W. As a result, a carbon film having thickness of 400 was formed on the surface of a disc substrate. Comparative Example 1 Graphite ("Metaphite MF-301 "manufactured by Tohoku Kyowa Carbon) was used as a target and sputtering was conducted as in Example 1 except that the background pressure was 1 x 10 7 Torr, argon gas pressure 3 x lO Torr and high frequency power 500 W. A carbon film having the thickness of 4O0A was formed on.the surface of a disc substrate. In this example, the thickness of the film was measured by surface roughness meter. Example 4 Hardened resin containing furfuryl alcohol, paraformaldehyde and phenol at the molar ratio of 35:40:35 was used as the material, and carbonizing and sputtering as in Example 1 were condurcted . A carbon thin film having the thickness of 400 was obtained. Example 5 Hardened resin containing furfuryl alcohol, paraformaldehyde and phenol at the molar ratio of 5:55:40 was used as the material, and carbonizing and sputtering as in Example l were conducted. A carbon film having-the thickness of 400A was formed. Example 6 Hardened resin containing furfuryl alcohol, paraformaldehydeand phenol at the molar rapid of 50:30:20 was used as the material, and carbonizing and sputtering as in Example 1 were conducted. A carbon film having the thickness of 400 was formed. Example 7 The hard resin obtained in Example 2 was heated to 6000C at the heating rate of 20C/hr in the nitrogen gas current, and was retained for two hours. The carbonized product was measured quantitatively with an element analyser to reveal 92.5 weight % of carbon. Using thus obtained carbonized product, sputtering was conducted as in Example 1 to form a carbon film having the thickness of 400A. Comparative Example 2 Using SiO2, sputtering target material which is commercially available, oxygen gas current was introduced to the atmosphere with the background pressure of 1 x lO Torr and argon gas pressure of 3 x 1 l0 Torr, and bias sputtering was conducted under the high frequency power of 500 W. As a result, an SiO2 film was formed on the surface of a disc substrate. Test Example The friction coefficients of the carbon films obtained in Examples 1 through 7 and Comparative Examples were measured by a pin-on-disc type friction coefficient measuring apparatus. Mn-Zn ferrite chips which are usually used as the material for magnetic heads are used as pins. The contact-start-stop (CSS) test was repeated for 20,000 times by mounting disc substrates on which carbon films were formed in Examples 1 through 7 and Comparative Examples 1 and 2 on a driving device of a cartridge type hard disc, and repeating the rising and landing of the magnetic head on a predetermined track. The damages made on the substrate surfaces and head surface which are slidingly contacting with each other were obserbed by a scanning electron microscope. The result is listed in the table. The table also shows changes on the magnetic characteristics of the magnetic film underneath substrate (the magnetic retention Hc and the strength of anisotropic magnetic field Hk) caused by the formation of the protective film. From the table, it is clear that the thin films obtained-by sputtering with a glass-like.carbon as a target did not show deteriorated characteristics of the magnetic film of the substrate, had excellent durability and had a low friction coefficient. Dynamic CSS test Magnetic characteristics friction disc Head coefficient surface surface Hc [Oe] Hk [Oe] Example 1 0.11 Excellent Excellent 400 2100 Example 2 0.12 Excellent Excellent 405 2100 Example 3 0.13 Excallent Excellent 401 2100 Example 4 0.12 Excellent Excellent 402 2100 Example 5 0.14 Good Excellent 400 2100 Example 6 0.14 Good Excellent 401 2100 Example 7 0.20 Film is partially Slightly 406 2100 peeled off. stained. Comparative 0.14 Film is partially Good 440 1900 example 1 peeled off. Comparative 0.27 Film surface is Cracked. 450 1950 example 2 damaged. without Magnetic surface Cracked 400 - 410 2100 protective - is damaged. film

Claims: CLAIMS 1. A method for manufacturing thin carbon film by forming the carbon film on the surface of a sliding member which slidingly contacts with another member, characterized in that glass-like carbon is used as the source of carbon and the carbon thin film Is formed by sputtering. 2. The method according to claim 1, characterized in that substantially amorphous thin carbon film is formed. 3. The method according to claim 1 or 2, characterized in that the sliding member is a hard disc of a magnetic recording device. 4. The method according to one of the claims 1 to 3, characterized in that as glass-like carbon a carbonized product of hard resin containing phenol, furfuryl-alcohol and formaline as principal constituents is used. 5. The method according to one of the claims 1 to 4, characterized in that a glass-like carbon is used which has an extremely small number of surface voids. 6. The method according to one of the claims 1 to 5, characterized in that the sputtering is conducted within an atmosphere lower than the gas pressure which can maintain cold-cathode glow discharge.

Inventors: KISHINE, NOBUYUKI, YAMAUCHI, MICHIHIDE
Applicants: KAO CORPORATION
Application year: 1986
Main classification: C23C14
IPC codes: C23C14, G11B5