A PROCESS FOR FORMING VIA HOLES HAVING SLOPING SIDE WALLS IN A POLYMER FILM

Abstract: Via holes with sloping sidewalls are formed in a polymer film by oxygen reactive ion etching through a perforated mask spaced from the film.

Description: The present invention relates to a process for forming via holes having sloping sidewalls in a polymer film. In most lithographic etching processes it is desired to have vertical walls resulting. An exception to this is in the case of via holes, where it is now recognized that it is advantageous to have sloping sidewalls. The article by Bondur and Clark in Solid State Technology, page 122, April 1980, describes a process for obtaining via holes with sloping sidewalls in SiO₂ layers; EP-A-0 010 657 discloses oxygen plasma etching of via holes in a polymer film using a deposited and patterned silicon film as a mask. The invention seeks to provide a process for forming via holes having sloping sidewalls in a polymer film, which is more convenient than conventional processes involving wet development with alkaline solutions. A process for forming via holes having sloping sidewalls in a polymer film comprises, according to the invention, the successive steps of coating a substrate with a polymer film, positioning a perforated mask at a distance of from 20 to 200 micrometers above the polymer film, the mask being formed of a material which is impervious to oxygen reactive ion etching; and exposing the polymer film to oxygen reactive ion etching through the mask until holes are etched through the polymer film in registration with the perforations in the mask. Any suitable organic polymer may be used to form the film used in the present process. Many such materials are known, for example, those used as resist materials. Particularly good results have been obtained when the organic film is a polyimide. The mask may be of any material impervious to oxygen reactive ion etching. One such preferred material is silicon, particularly silicon (100) such as is found in stencil masks. The mask thickness is not critical, but good results have been obtained with masks of from about 2 to 5 micrometers in thickness. Control of the gap between the polymer film and the mask is a critical feature of the present invention. As this gap is increased, the slope of the wall becomes greater. Conversely, as it is decreased, the slope becomes less. As is shown in the control experiment below, when there is no gap at all, that is, when the mask is in contact with the polymer film, sloping sidewalls are not obtained at all. Under these circumstances the sidewalls are vertical. The most preferred distance between the mask and the polymer film is from 50 to 100 micrometers. The following experiments demonstrate the process for carrying out the present invention. In the first experiment, the mask is in contact with the polymer film, i.e., the gap is zero and under these circumstances a vertical sidewall results. Examples 1, 2 and 3 below show the operation of the present invention to obtain the desired sloping sidewalls. The experiments were all conducted using silicon (100) stencil masks. Control Zero gap with an oxygen etch barrier: RIE conditions O₂ at a pressure of 2 Pascals (0.15 Torr) 10 sccm - 300 Volt bias potential Substrate temperature 65°C Result: vertical sidewalls for polylmide patterns. Example I 200µm gap between a stencil mask and polyimide film O₂ at a pressure of 2 Pascals (0.15 Torr) 10 sccm - 300 Volt bias potential Substrate temperature 65°C Result: 35° sidewall angle for polyimide patterns. Example II 40µm gap between a stencil mask and polyimide film O₂ at a pressure of 8 Pascals (0.06 Torr) 4.2 sccm - 500 Volt bias potential Substrate temperature 65°C Result: 60° sidewall angle for polyimide patterns. EXAMPLE III 200µm gap between a stencil mask and polyimide film O₂ at a pressure of 8 Pascals (0.06 Torr) 4.2 sccm - 475 Volt bias potential Substrate temperature 65°C Result: 40° sidewall angle for polyimide patterns.

Claims: A process for forming via holes having sloping sidewalls in a polymer film, comprising the successive steps of: coating a substrate with a polymer film, positioning a perforated mask at a distance of from 20 to 200 micrometers above the polymer film, the mask being formed of a material which is impervious to oxygen reactive ion etching; and exposing the polymer film to oxygen reactive ion etching through the mask until holes are etched through the polymer film in registration with the perforations in the mask. A process as claimed in claim 1, wherein the distance between the polymer film and the mask is from 50 to 100 micrometers. A process as claimed in claim 1 or claim 2, wherein the polymer film is a polyimide film. A process as claimed in any preceding claim, wherein the mask is made of silicon. A process as claimed in any preceding claim, wherein the mask is from 2 to 5 micrometers thick. A process as claimed in any preceding claim, wherein the perforations in the mask are from 1 to 15 micrometers in diameter.

Inventors: HIRAOKA, HIROYUKI
Applicants: INTERNATIONAL BUSINESS MACHINES CORPORATION
Application year: 1985
Main classification: H01L21
IPC codes: H01L21, H05K3