HETEROJUNCTION SEMICONDUCTOR DEVICE

Abstract: A semiconductor device includes a heterojunction be­ tween InP and Al x In 1-x As where x is approximately equal to 0.48. This structure solves problems in the GaAs/AlGaAS heterojunctions used previously as a high speed devices since intervalley transition and accompanying negative differential mobility in electrical fields higher than approximately 3 KV/cm is prevented and a semiconductor device is provided in which the operating voltage can be increased.

Description: Heterojunction Semiconductor Device The present invention relates to a heterojunction semiconductor device and, more particularly, to a semiconductor device using InP/InAlAs heterojunction. The junction of two semiconductors of different kinds, a heterojunction, is widely used in producing high speed devices and semiconductor lasers because it serves to form an electron storage layer or to capture carriers on the side of the low conductivity band of the hetero-interface by a discontinuity in the bottom of the conductive band. The characteristics of a heterojunction vary considerably depending upon the energy band structures (energy band gap and electron affinity) of the two semiconductors to be joined. A typical heterojunction used previously in high speed devices is a GaAs/AlGaAs heterojunction which provides operations higher in speed than a GaAs MESFET (Schottky gate field effect transistor) but, on the other hand, has difficulty in achieving ballistic devices and high mobility active devices because carriers are easy to transit from r valley (main band) to L valley (sub band) in the GaAs of the active layer, thereby to cause an intervalley scattering accompanied by negative differential mobility in an electric field strength of approximately 3 KV/cm or higher. According to the present invention these problems with conventional heterojunction devices are overcome by using an InP and Alx In As heterojunction where x is approximately equal to 0.48. According to one practical aspect of the present invention a field effect transistor comprising a substrate, two ohmic electrodes for a source and drain, and a Schottby electrode for a gate arranged between the two ohmic electrodes is characterised in that the substrate comprises semi-insulating InP, in that an undoped InP layer is present on the semi-insulating InP substrate, in that an N type In1#xAlxAs layer is present on the InP layer where x is approximately equal to 0.48; and in that the two ohmic electrodes are arranged in two + spaced regions on the n type Inl¯xAlxAs layer. According to another practical aspect of the present invention a semiconductor device comprising a substrate and ohmic electrodes on opposite sides of the substrate, is characterised in that the substrate comprises semi-insulating InP, in that single or multiple stacked layers of each of Al In, As where x is approximately equal to 0.48 and InP are present on the semi-insulating InP substrate, and in that the ohmic electrodes are located on opposite sides of the layers. According to a third practical aspect of the present invention a bipolar heterojunction transistor comprising: a substrate of n type; an an n type collector layer on the n type substrate; a p type base layer on the collector layer; and an n type emitter layer disposed on the base layer, is characterised in that the substrate, the collector layer and the base layer comprise InP, and in that the emitter layer comprises Al In As where x is approximately equal to 0.48. In the present invention, InP is used in place of GaAs. As shown in Figure 1, while GaAs and InP are similar to each other in energy band structure, the energy difference AErL of InP is 0.53 eV which is considerably higher than that of GaAs which is 0.31 eV. Therefore, the threshold field of InP at which a negative resistance appears is approximately three times as large as that of GaAs. Further, in the field strength dependency of electron velocity, as shown in Figure 2, the peak electron velocity is higher in InP than in GaAs. Now, to use InP as the active layer, that is the layer through which carriers actually move, the semiconductor which is to be joined with the InP must have a smaller electron affinity than that of InP and a larger forbidden gap than that of InP, and must be lattice-matched to InP. The ternary mixed crystal Awl in As where x is substantially equal to 0.48 is a material satisfying these requirements. That is, the energy band gap of Al In As where x is substantially equal to 0.48, is x l-x 1.49 eV (InP's is 1.35 eV) and its lattice constant is 5.87 (0.587 nm) which is identical to that of InP. Further, in view of the facts that the heights of the Schottky barriers of Au/InP and Au/In0.52A10.48As are 0.49 eV and 0.8 eV, respectively, and that the energy discontinuities at bottoms of the conductive bands of the heterojunctions of In0.53Ga0.47As/InP and In0.52A1 0¯48As/In0¯53Ga0¯47As are 200 meV and 300 - 600 meV, respectively, the energy discontinuity at the bottom of the conductive band of Inl xAlxAs/InP where x is substantially equal to 0.48 is considered to be aproximately 300 meV. Particular embodiments of the present invention will now be described with reference to the accompanying drawings; in which: Figure 1A is an energy band structure diagram for GaAs; Figure 1B is an energy band structure diagram for InP; Figure 2 is a diagram showing field strength dependecy of the electron velocity of GaAs and InP; Figure 3 is a sectional view of a modulation doped field effect transistor using the heterojunction in accordance with the present invention; Figure 4 is an energy band structure diagram on the heterointerface of Inp/AlxInl-xAs where x is substantially equal to 0.48; Figure 5 is a sectional view showing the structure of a real space transfer type semiconductor device using the heterjunction in accordance with the present invention; and, Figure 6 is a sectional view showing the structure of a bipolar heterojunction transistor including a heterojunction in accordance with the present invention. Figure 3 shows the sectional structure of an embodiment of a modulation-doped Schottky gate field effect transistor according to the present invention. In the structure shown in Figure 3, an undoped InP layer 12, an undoped AlxInl¯xAs (x=0.48) layer 13 of 0 - 200 l-x 18 + thickness, and an Si doped 1 x 10 1/cm3 n type AlxIn1xAs (x=0.48) layer 14 of 500 - 1000 thickness are formed sequentially by, for example, molecular beam epitaxial growth on a semi-insulating InP substrate 11, a Schottky gate electrode 15 of aluminum is disposed on said n+ type AlxInl#xAs layer 14, and ohmic electrodes 16 and 17 of AuGeNi are disposed on opposite sides, respectively, of said gate electrode 15. As shown in Fig. 4, electrons are stored on the InP side of the hetero-interface by the discontinuity at the bottom of the conductive band of InP and AlxInlxAs (x.0.48). That is, since InP has large electron affinity, the electrons supplied by donors in the n+ type AlxInl¯xAs (x0,48) layer are attracted toward InP side to form an electron storage layer there. This electron storage layer contributes to electric conduction between the source and the drain. However, since the InP layer is not doped with impurities, ionized impurity diffusion is reduced. This effect is large enough particularly at low temperatures where ionized impurity scattering becomes dominant to obtain high electron mobility. Known as a conventional FET using the similar principle in which the doped region in which carriers are generated and the undoped region in which the carriers actually move are separated in space is one using GaAs/AlGaAs heterojunction. In the undoped GaAs active layer, however, negative differential mobility appears because the carriers transit from the r valley where the effective mass of the carriers is small to the L valley where the effective mass of the carriers is large. Recently, a FET using In0.52Al0.48As/In0.53Ga0.47As hetero-interface has been proposed. In this FET, however, the characteristics of low electric field mobility are not utilized effectively in high electric field because the threshold field in which negative resistance appears is as low as 3 - 4 KV/cm in InGaAs as in GaAs. Further, the influence of alloy scattering in In0.53Ga0.47AS alloy crystal presents a problem in application in devices. In the FET according to the present invention using InP as the active layer, there is no problem of alloy scattering, and further, since InP has higher threshold electric field and higher peak electron velocity than GaAs, it applies a high voltage to thereby make high output and high speed operation possible. Fig. 5 shows the sectional structure of an embodiment of a real space transfer type semiconductor device according to the present invention. In the structure shown in Fig. 5, an AlxInl#xAs (x'.0.48) layer 22 and an InP layer 23 are alternately stacked in multiple of layers by growth on a semiinsulating InP substrate 21. While this embodiment is shown to be of a multiple of stacked layers structure of repeated heterojunction, it may be of a single stacked layers structure of a single heterojunction. Ohmic electrodes 24 and 25 are disposed substantially vertically on the hetero-interfaces, respectively. In the same manner as in the embodiment described with reference to Figs. 3 and 4, an electron storage layer is formed on the InP side of each hetero-interface. When an electric field is applied between the ohmic electrodes 24 and 25, the electrons in InP are accelerated into hot electrons and scattered in the AlxInl-x# As layer before transited to the upper valley (L valley) in InP. In AlxIn1#xAs, negative differential resistance is caused because the electron mobility is smaller in AlxInl-x- As than in InP. Since the electron transition time is dependent upon the lateral length, operation in the higher frequencies than Gunn diode can be expected. Known as a conventional semiconductor device of this type is a device using GaAs-AlGaAs heterojunction. In this device, however, since the energy difference AEFL between r valley and L valley is 0.31 eV which is relatively small, hot electrons are apt to transit to L valley before they are scattered in A1,Gal,,As. In this conventional transistor device, accordingly, a negative differential resistance was, if obtained, caused mostly by Gunn effect and the negative differential resistance purely by real space transfer was difficult to achieve. In contrast to this, in the device using InP/ AlxInl#xAs (x=.0.48) heterojunction according to the present invention, having a large (0.53 eV) energy difference hErL of InP, there is less possibility of occurrence of the phenomenon that hot electrons of InP transit to L valley before scattering in AlxInl#xAs, and, therefore, the negative differential resistance by pure real space transfer in high electric field is obtained. Further, the undoped InP layer 23 and the n+ type AlxInl¯xAs (x=.0.48) layer 22 may be formed by modulation doping process to increase the electron mobility in InP. Fig. 6 shows an embodiment of a bipolar heterojunction transistor according to the present invention. In the structure shown in Fig. 6, on an n+ type InP substrate (n=2xlO18 l/cm3) 31, there are disposed an n type InP collector layer (lx1016 l/cm3) 32 of 0.5 pm thickness, a type (lilo19 l/cm3) InP base layer 33 of 500 thickness, an n type (2x1017 1/cm3) AlxInl¯xAs (x.0.48) emitter layer 34 of 0.2 pm thickness, and an n+ type °(lox1019 l/cm3) InP cap layer 35 of 0.2 pm thickness. The transistor of this structure has various advantages such, for example, that a large current density is obtained in the active layer of the collector, mutual conductance gm is large, fan out dependency is small, and operating amplitude is small. Further, other effects such as ballistic operation or overshoot effect of electron velocity are made possible by reducing the thickness of the base layer to sub-micron level. In the conventional GaAs/AlxGa1#xAs bipolar heterojunction transistor using GaAs as the base layer, the energy difference AEFL between r valley and L valley is, as described hereinabove, relatively small and phonon scattering is easy to occur between the valleys. In contrast to this, in the transistor according to the present invention using InP as the base layer, since the energy differnece AFFL between r valley and L valley is large, phonon scattering between the valleys is suppressed in the base region and ballistic operation or overshoot of electron velocity is easy to occur. For this reason an ultra-high speed transistor is accomplished. As explained hereinabove, various devices using InP/ AlxInl#xAs (x.0.48) heterojunction according to the present invention have higher operation speed than conventional devices and are applicable to all the technical fields where FET, IC and Gunn diode are presently used. Therefore, the present invention provides a veky high industrial applicability particularly in technical fields requiring high speed processing, such as CPU, memory and image processor of a computer. Further, when InP is used the operating voltage can be increased because the threshold electric field is high, therefore, the heterojunction according to the present invention is made applicable as a high output micro device.

Claims: CLAIMS 1. A semiconductor device characterised by a heterojunction between a layer of InP and a layer of Al Inl, As where x is approximately equal to 0.48. 2. A field effect transistor comprising a substrate (11), two ohmic electrodes (16, 17) for a source and drain, and a Schottby electrode (15) for a gate arranged between the two ohmic electrodes (16, 17) characterised in that the substrate (11) comprises semi-insulating InP, in that an undoped InP layer is present on the semi-insulating InP substrate, in that an N+ type In, Al As layer is present on the InP layer where x is approximately equal to 0.48; and in that the two ohmic electrodes (16, 17) are arranged in two spaced regions on the n type Inl Al As layer. 3. A semiconductor device comprising a substrate (21) and ohmic electrodes (24, 25) on opposite sides of the substrate, characterised in that the substrate (21) comprises semi-insulating InP, in that single or multiple stacked layers of each of Al In As (22) where x is approximately equal to 0.48 and InP (23) are present on the semi-insulating InP substrate (21), and in that the ohmic electrodes (24, 25) are located on opposite sides of the layers (22, 23). 4. A bipolar heterojunction transistor comprising: a substrate (31) of n type; an n type collector layer (32) on the n type substrate (31); a p type base layer (33) on the collector layer (32); and, an n type emitter layer (34) disposed on the base layer (33), characterised in that the substrate (31), the collector layer (32) and the base layer (33) comprise InP, and in that the emitter layer (34) comprises A1xIn1-xAs where x is approximately equal to 0.48.

Inventors: INOUE, MASATAKA
Applicants: INOUE, MASATAKA
Application year: 1984
Main classification: H01L29
IPC codes: H01L21, H01L29