SILICA BASE FOR DENTIFRICE AND PROCESS FOR ITS PREPARATION

Abstract: Silica base for dentifrice having excellent transparency and prolonged stability, desired abrasive ability, specific surface area of 270 to 500 m²/g (according to the BET method) or 5 to 60 m²/g (according to the CTAB method), and a refractive index of 1.455 to 1.470 and showing, after baking at 1100 C, a substantially amorphous X ray diffraction pattern which can be prepared by reacting an alkali metal silicate solution with hydrochloric of sulfuric acid in the presence of an electrolyte, controlling the ratio of the rate of adding chloride or sulfate ion in a silica-precipitating step in which the pH of the reaction system is up to 10.0 to that in an acidifying step in which the pH is adjusted to 3.5 or less at the completion of the reaction to at least 3:2, and completing the acidifying step within 30 minutes.

Description: TECHNICAL FIELD This invention relates to a silica base material for dentifrice formulation, particularly to one for transparent dentifrice formulation, which gives an outstanding, stable transparency yet with a desired abrasiveness. BACKGROUND ART Of late years transparent dentrifice formulations of various types have been developed and put on the market, giving a favorable impression with their freshness and cleanliness associated with the transparency. The status quo, however, is either a silica base material with substantially no abrasiveness, which essentially disqualifis it, is used to give transparency to the dentrifice formulation, or it is hard to produce a commercially stable transparent dentrifice formulation due to the fluctuation and the poor time-stability in refrative index of silica, base material which, when made into a paste with a transparent dentifrice vehicle, should approximate in refractive index to the other to give transparency to the formulation. Meanwhile, several methods have been proposed to produce silica base materials having appropriate abrasiveness for transparent formulation. For example, Japanese Patent Publication No. '74-11159 describes a method wherin a commercial superfine amorphous silica devoid of abrasiveness and therefore unsuitable for dentifrice base material is wetted with water or a dilute aqueous solution of inorganic alkali metal salt, fired at 500-1000°C, and then ground. It is true that this method provides abrasiveness needed by a dentifrice base material. But the abrasiveness thus provided is often so much in excess as to damage enamel of teeth and the material itself does not give good transparency and consistent stability. Finally, it would be hard to industrialize the method economically. Another method is described in Japanese Patent Kokai Nos. '76-12869 and '76-136841 to provide abrasiveness to silica. The material obtained by this method, however, does not give good paste stability when combined with transparent dentifrice vehicle. The invention described in Japanese Patent Publication No. '73-14935 discloses a transparent dentifrice formulation containing silica specified as follows: The silica prepared by the method disclosed in the invention gives a BET surface area of 150 m²/g, and a CTAB surface area of 82 m²/g. When this silica is mixed with humectant and left to stand, the turbidity of the mixture, or paste, grows markedly from day to day and the paste stability is gradually worsened. In addition, one of the present inventors disclosed in Japanese Patent Publication Nos. '74-8640 and '77-15078 a method to control the refractive index of silica by allowing fluoride ion to intervene in the proposed process. The product of this invention as a base material for transparent dentifrice formulation was still not without problem in transparency and was not so good in time-stability as expected. Thus the silicas publicly known heretofore have defects either in abrasiveness, time-stability or transparency which are the essential characteristics of the base material for transparent dentifrice formulation, and therefore none of them are satisfactory for such formulation. Years of intensive study on these essential character-istics of silica base material has now revealed to the present inventors that combinations of a tooth paste vehicle with the silica base material of the present invention, as described in delail below, can bring forth a transparent dentifrice formulation with proper abrasiveness, water-like transparency and good long-term stability under storage. Transparency as referred to in this invention is defined and measured as follows: two solutions of different refractive indices like glycerine and water are mixed in various proportions to give dispersion media of different refractive indices; a fixed amount of silica base material is then mixed with a fixed amount of each medium into a dispersion, which, in needed, is deaerated and subjected to measurement of refractive index and turbidity; and with these as parameters a curve is plotted to determine the minimum turbidity point which represents the transparency here. The present inventors studied very much in detail on the factors influencing the transparency and, finding out that the porosity of silica base material is greatly involved, came to accomplish the invention. DISCLOSURE OF THE INVENTION Namely, the invention relates to a silica base material for dentifrice formulation characterized by having a specific surface area by the BET method of 270-500m²/g-anhydride, and also, one by the CTAB method of 5-60 m²/g-anhydride; giving virtually amorphous X-ray diffraction patterns after firing at 1100°C; and having a refractive index of 1.455-1.470. Now before proceeding to the further details of the present invention, explanations will be given here on the terminology covering specific surface area by the BET method, specific surface area by the CTAB method, refractive index, X-ray diffraction after firing at 1100°C, and loss by abrasion, or abrasiveness. 1) Measurement of specific surface area by the BET method. With Liquid nitrogen as coolant, the adsorption in quantity of nitrogen gas by sample is measured at -196°C; the surface area per one gram of sample in anhydride form is then calculated, based on the molecular cross-section of nitrogen, 0.162nm² (16.2Å²).Deaeration of sample is conducted at 140°C under vacuum of 133 x 10⁻⁵Pa (1 x 10⁻⁵mmHg) for 60 minutes. 2) Measurement of specific surface area by the CTAB method. Cetyl methyl ammonium bromide is allowed to be adsorbed onto the sample until saturation from its aqueous solution; the surface area per gram of sample in anhydride form then calculated, based on the molecular cross-section of the bromide, 0.35nm² (35Å²). Procedure: - Take 1 g of sample of known moisture content in a 300ml conical flask having a common stopper. Add 100ml of 0.55% solution of CTAB and bring the pH of the mixture to 9.0 with 0.1N NaOH solution. Keep agitating for 2 hours with a magnetic stirrer. Settle the suspension centrifugally and transfer 10ml of the supernatant into a 300ml conical flask. Add 50ml of demineralized water, 25ml of chloroform, drops of bromophenol blue indicator and titrate it with sodium dioctyl sulfo succinate (Aerosol OT) solution previously calibrated by a standard CTAB solution. End the titration when the chloroform layer is decolorized while the aqueous layer is slightly tinged purple. Mark the consumption in ml of Aerosol OT as V₂. Then conduct a blank titration in a similary manner on 10ml of the first CTAB solution only and mark the Aerosol OT consumption in ml as V₁. Calculate the surface area per gram of anhydrate (Sm²/g) by the following equation. Wherein X = sample weight as anhydrate (g); a = CTAB in weight (mg) equivalent to 1 ml of the Aerosol OT solution 3) Refractive index Mix glycerine and water in various proportions to obtain dispersing media of different refractive indices. Disperse 15g of sample in 35g of each medium, using a vacuum mortar-mixer for 10 minutes. Measure the refractive index and turbidity of the mixture at 25°C and plot the data to obtain a refractive index-turbidity curbe. Represent the sample by the refractive index of the mixture at the lowest turbidity point. In these measurement use an Abbe's refractometer and an integration sphere turbidimeter; and determine turbidity from the transmittancy at sample thickness of 1mm. 4) X-Ray diffraction after firing at 1100°C. Take about 5 g of sample on a platinum plate and fire it at 1100°C for an hour in an electric furnace. Then examine it on a X-ray diffractometer. 5) Abrasiveness Use an abraision tester of horizontal brushing movement; of a suspension of 25% silica fine powder in 60% glycerine/water solution, take some and put it on the flat face of the bronze plate; with the testing boad, or weight of 500g on it, conduct the brushing 18000 times; then measure the weight loss of the bronze plate for abrasiveness. The word "anhydride" as used in this invention shall refer to a form or state of finely ground silica dried up to nearly constant weight at 105°C for two hours. Now the method for making the silica base material for dentifrice formulation of this invention will be described in detail. The alkali metal silicate used in the invention includes sodium, potassium and lithium silicate, but more general of these is sodium silicate because it is less costly. Silicates having a molar ratio, SiO₂/X₂0, (wherein X denotes alkali metal,) of 2-4 can be used. The acidifying agent used in this invention is hydrochloric or sulfuric acid. The preferable SiO₂ concentration of the alkali metal silicate solution at the stage of acidification with such acid is 5-15% by weight and the preferable acid concentration is also 5-15% by weight; and in proper combination with other reaction parameters the acid and silicate concentrations within such ranges can bring forth the desired properties of silica base material. The electrolytes preferred in this invention are alkali metal salts of mineral acid such as sodium chloride, potassium chloride, sodium sulfate, potassium sulfate, sodium carbonate, potassium carbonate, sodium nitrate and potassium nitrate, to name only sodium and potassium salts as typical examples. The electrolyte is used in the range of 10-60% by weight of SiO₂, as required, considering the abrasiveness of silica base material. In the present invention the alkali metal silicate solution is first made to react with hydrochloric or sulfuric acid under the presence of such electrolyte. The preferred manner of performing the reaction is to mix the electrolyte previously with the alkali metal silicate solution, in view of giving the abrasiveness to silica base material. That, however, will not disapprove the manner in which the electrolyte, in consideration of its quantity, reaction temperatur, reaction time, etc., is added to hydrochloric or sulfuric acid in advance. In said preferred manner also it is well to charge the reactor with alkali metal silicate solution and electrolyte solution simultaneously or separately, or it is as well to mix these two solutions prior to their introduction into the reactor. It is preferable to conduct the reaction under good agitation in a temperature range of 60-100°C. The essence of the production method of silica base material according to the invention disclosed herein lies in the fact that the reaction is conducted in two stages: a silica crystallisation stage during which the temperature is maintained comprised between 60 and 100°C for a time from 40 minutes to 4 hours and the pH of reaction mixture is brought to 10.0; and the acidification stage for which the pH is finally brought down to 3.5 or less; the ratio of the rate of addition of chloride or sulfate ion between said two stages is at least 3:2; and the acidification is carried out within 30 minutes. The silica crystallization stage herein means the stage of reaction where more than 95% of silica content (as SiO2) in the alkali metal silicate solution is crystallized out. It is preferable to conduct this part of reaction to take 40 minutes to 4 hours. Meanwhile, the acidification stage is the stage of reaction ranging from the point where most of the silica has crystallized out at the reaction pH of 10.0 to the point where the pH has been brought down to 3.5 or less by adding hydrochloric or sulfuric acid. Taking too long in the acidification somehow makes it difficult to obtain silica base material of excellent transparency and pretty good abrasiveness. The present inventors, therefore, studied further for a method devoid of such a defact, which would give a variety of silica base material of low to high abrasiveness for transparent formulation, and found out that it is necessary to perform the acidification stage within 30 minutes and that the ratio of the rate of addition of hydrochloric or sulfuric ion between the acidification and silica crystallization stages should be at least 3:2. Namely, shortening the acidification stage led to remarkable improvements in the characteristics of silica base material and its productivity. When the pH of reaction mixture in the acidification stage is made 3.5 or less, or more specifically, 1.5-3.0, the refractive index of the resulting silica base material can be brought within a narrow range of 1.455-1.470. When the reaction pH exceeds 3.5, silica base material good for transparent formulation can no be obtained because of the scattering of refractive indices. After the acidification stage, ageing may be performed for 10 minutes or longer but is not a requisite. The rest of the operation is to filter, wash, dewater, dry and grind the silica base material in the usualy manner. The silica base material thus obtained has a specific surface area by the BET method of 270-500 m²/g-anhydride and also one by the CTAB method of 5-60 m²/g-anhydride; it gives amorphous X-ray diffraction patters after firing at 1100°C; and it has a refractive index of 1.455-1.470. The product shows good transparency indicated by the lowest turbidity of 0.05 or less and a long-term stability. The abrasiveness of the product can be changed freely within the range of 2-90 mg. Thus the product is a useful base material particularly for transparent dentifrice formulations. Described above is one of the processes for producing silica base material for transparent dentrifrice formulations, and it is also possible to obtain by different processes silica base material having a specific surface area by the BET method of 270-500 m²/g-anhydride and also one by the CTAB method of 5-60 m²/g-anhydride, giving amorphous X-ray diffraction patterns after firing at 1100°C. It is clear that the thus obtained base material has excellent transparency and stability over time. Furthermore, in the production of the silica herein, it is, of course, possible to use and add, for the purpose of adjusting abrasiveness or as refractive index controlling agent, to alkali metal silicate solution, hydrochloric acid or sulfuric acid and other or while being in reaction stage, aluminum sulfate, aluminum chloride, calcium chloride, magnesium chloride, basic salts of these compunds, sodium fluoride, potassium fluoride, ammonium fluoride and others. Now, the features of silica basic material for dentrifrice formulations of this invention will be better clarified through the examples shown below: Reference 1 Into a 20 ℓ reactor equipped with a bafle plate and an agitator with 150 mm D turbine blades was introduced 10 kg of an aqueous solution of sodium silicate (Na₂O·3.2 SiO₂) containing 90 g/kg of SiO₂ and then, under the reaction temperature kept at 50°C, 9.0 % sulfuric acid at the flow rate of 85 g/min for 42 minutes to bring the pH of reaction mixture to 10.0. Then the addition of 9.0% sulfuric acid was continued at the flow rate of 135 g/min until 10 minutes later when the pH reaced 5.8. The acid was stopped and the reaction mixture was allowed to stand for ageing for 15 minutes. After repeated filtration and washing, the obtained solid was dried in a hot air oven at 110°C and finely ground. The silica fine powder thus obtained had a specific surface area by the BET method of 295 m²/g and another by the CTAB method of 218 m²/g; it gave α-Cristobalite X-ray diffraction patterns after fired at 1100°C. The silica fine powder thus obtained had a poor abrasiveness and, when it was used for toothpaste, increased the viscosity. Thus, silica of this kind was found not to be usable for toothpaste in its preparation. Reference 2 Into a reactor used in reference 1 was introduced 10 kg of an aqueous solution of sodium silicate (Na₂O·2.8 SiO₂) containing 110 g/kg of SiO₂ and 4 g/kg of NaCl and then, under the reaction temperature kept at 65°C, 10% sulfuric acid at the flow rate of 107 g/min for 63 minutes to bring the pH of the reaction mixture to 2.1, and stopped addition then allowed to stand for ageing for 30 minutes. After repeated filteration and washing, the wet cake was dried in a hot air oven at 110°C and finely ground. The silica fine powder thus obtained had a specific surface area by the BET method of 380 m²/g and another by the CTAB method of 152 m²/g; it gave an amorphous X-ray diffraction pattern after fired at 1100°C. This silica had good transparency as base material for transparent dentifrice formulation but gave poor abrasiveness to the toothpaste product. Reference 3 Into a reactor used in reference 1 was introduced 10 kg of an aqueous solution of sodium silicate (Na₂O·3.1 SiO₂) containing 100 g/kg of SiO₂ and 15 g/kg of NaCl and then, under the reaction temperature kept at 75°C, 10% sulfuric acid at the flow rate of 44 g/min for 84 minutes to bring the pH of reaction mixture to 10.0. Then the addition of 10 % sulfuric acid was continued at the flow rate of 148 g/min until 10 minutes later when the pH reached 4.5. The acid was stopped and the reaction mixture was allowed to stand for ageing for 20 minutes. After repeated filtration and washing, the obtained solid was dried in a hot air oven at 110°C and finely ground. The silica fine powder thus obtained had a specific surface area by the BET method of 196 m²/g and another by the CTAB method of 42 m²/g; it gave α-cristobalite X-ray diffraction pattern after fired at 1100°C. This silica had comparatinely high abrasiveness as base material for dentifrice formulations, but the product made from this silica showed high turbidity and poor long-lasting tranceparency, thus, this silica is not of such quality as can be used for transparent toothpaste as base material. Reference 4 Into a reactor used in reference 1 was introduced 10 kg of sodium silicate solution (Na₂O·3.1 SiO₂) containing 100 g/kg of SiO₂ and 15 g/kg of NaCl and then under the reaction temperature kept at 75°C, 10 % sulfuric acid at the flow rate of 148 g/min for 25 minutes to bring the pH of the reaction mixture to 10.0. Then the addition of 10% sulfuric acid was continued at the flow rate of 44 g/min until 35 minutes later when the pH reached 4.6. The acid was stopped and the reaction mixture was allowed to stand for ageing for 20 minutes. After repeated filtration and washing, part of the wet cake was dried in a hot air oven at 110°C and finely ground. The silica fine powder thus obtained had a specific surface area by the BET method of 224 m²/g and another by the CTAB method of 103 m²/g; it gave an α-cristobalite X-ray diffraction pattern after fired at 1100°C. It had less abrasiveness as compared with silica produced in reference 3, also has poor long-lasting transparency, thus not being suitable for transparent dentifrice formulation as base material. Reference 5 Into a reactor used in reference 1 was introduced 10 kg of an aqueous solution of sodium silicate (Na₂O·3.2 SiO₂) containing 95 g/kg of SiO2 and 25 g/kg NaCl and then, under the reaction temperature kept at 87°C, 10 % sulfuric acid at the flow rate of 34 g/min for 100 minutes to bring the pH of reaction miture to 10.0. Then the addition of 10 % sulfuric acid was continued at the flow rate of 78 g/min until 18 minutes later when the pH reached 3.9. The acid was stopped and the reaction mixture was allowed to stand for ageing for 15 minutes. After repeated filtration and washing, the obtained solid was dried in a hot air oven at 110°C and finely ground. The silica fine powder thus obtained had a specific surface area by the BET method of 207 m²/g and another by the CTAB method of 26 m²/g; it gave α-cristobalite X-ray diffraction pattern after fired at 1100°C. This silica base material prove to be a product of sufficient abrasiveness to meet requirements of base material for toothpaste but of high turbidity and giving poor transparency over time, and is not suited for silica base material for transparent dentrifrice formulation. Reference 6 Into a reactor used in reference 1 was introduced 10 kg of sodium silicate solution (Na₂O·3.1 SiO₂) containing 110 g/kg of SiO₂ and 40 g/kg of NaCl and then under the reaction temperature kept at 80°C, 10 % sulfuric acid at the flow rate of 47 g/min for 120 minutes to bring the pH of the reaction mixture to 5.6, then allowed to stand for ageing for 30 minutes. After repeated filtration and washing, the wet cake was dried in a hot air oven at 110°C and finely ground. The silica fine powder thus obtained had a specific surface area by the BET method of 82 m²/g and another by the CTAB method of 17 m²/g; it vage an α -cristobalite X-ray diffraction pattern after fired at 1100°C. This silica had high abrasiveness, but was not suited for tranparent dentifrice formulation as base material due to lack of transparency. Reference 7 Inventors obtained commercially abailable silica base material for toothpaste made in USA for evaluation of the physical property. As a result, it was found that it had a specific surface area by the BET method of 80 m²/g and another by the CTAB method of 40 m²/g, giving α-cristobalite X-ray diffraction pattern after being fired at 1100°C. It proved to be a product of moderate abrasiveness but of high turbidity of 0.21 and presenting poor transparency over time. Example of this invention Into a reactor used in reference 1 was introduced 10 kg of sodium silica solution (Na₂O·3.1 SiO₂) containing 95 g/kg of SiO₂ and 20 g/kg of NaCl and then under the reaction temperature kept at 87°C, 10 % sulfuric acid at the flow rate of 37 g/min for 95 minutes to bring the pH of the reaction mixture to 10.0. Then the addition of 10 % sulfuric acid was continued at the flow rate of 82 g/min until 19 minutes later when the pH reached 3.1. The acid was stopped and the reaction mixture was allowed to stand for ageing for 30 minutes. After repeated filteration and washing, the wet cake was dried in a hot air oven at 110°C and finely ground. The silica fine powder thus obtained had a specific surface area by the BET method of 342 m²/g and another by the CTAB method of 39 m2/g; it gave an amorphous X-ray diffraction pattern after fired at 1100°C. It proved to be a product of moderate abrasiveness, good transparency and long-lasting transparency. Table 1 shows the physical properties of the products produced in these references. The turbidity indicates the index of long-lasting trumsparency shown on refractive index of the silica fine powder. Remark ) Refractive index shows refractive index value immediately after mixing; turbidity shows turbidity value on refractive index immediately after mixing. As described in above references Nos.1 to 7 and example of the present invention, three parameters of the BET specific surface area, the CTAB specific surface area and X-ray diffraction pattern after firing at 1100°C are important factors for determing such physical properties of silica base material for transparent dentifrice formulations as transparency, abrasiveness and long-lasting transparency of the toothpaste product, silica failing to satisfy said three parameters is not desirable as silica base material for toothpaste, particularly for transparent dentrifrice formulations. When the silica base material of the present invention is used in a transparent toothpaste formulation, the base material is mixed and kneaded with a transparent paste vehicle. In order to give proper fluidity to such toothpaste formulation, the paste vehicle is chosen from humectants and binders. Among humectants there are, for example, glycerine, sorbitol, polyethylene glycol, dextrine, propylene glycol, etc., and for binders there are carboxymethyl cellulose, sodium alginate, etc. Toothpaste formulations containing such humectants or binders and other ingredients such as cleaning agent, perfume, sweetening, enzyme and various medicinal adjuvants are widely known to those experienced in the art. As is understood from the explanation given, the silica base material of the present invention is most effectively used in the production of transparent toothpaste of desired abrasiveness. The invention will be further explained by way of examples, which in no way shall be construed to limit the scope of the invention. In the following examples, percentages shall denote percentages by weight unless otherwise specified. Example 1. Into a 5 m³ reactor equipped with a baffle plate and an agitator with 850 mm D turbine blades was introduced 2775 kg of an aqueous solution of sodium silicate (Na2O·3.1 SiO₂) containing 95 g/kg of SiO₂ and 25 g/kg of NaCl and then, under the reaction temperature kept at 87°C, 10 % sulfuric acid at the flow rate of 10:1 kg/min for 96 minutes to bring the pH of the reaction mixture to 10.0. Then the addition of 10 % sulfuric acid was continued at the flow rate of 17.9 kg/min until 28 minutes later when the pH reached 1.8. The acid was stopped and the reaction mixture was allowed to stand for ageing for 15 minutes. After repeated filtration and washing part of the wet cake was dried in a hot air oven at 110°C and finely ground. The silica fine powder thus obtained had a specific surface area by the BET method of 293 m²/g and another by the CTAB method of 16 m²/g; it gave an amorphous X-ray diffraction pattern after fired at 1100°C; it had an abrasiveness value of 26.1 mg, a refractive index of 1.462 and a lowest turbidity of 0.020; and it proved to be a product of high abrasiveness and long-lasting transparency. Example 2. Into a 20 ℓ reactor equipped with a baffle plate and an agitator with 150 mm D turbin blades was introduced 10 kg of sodium silicate solution (Na₂O·2.8 SiO₂) containing 100 g/kg of SiO₂ and 35 g/kg of NaCl and then, under the reaction temperature kept at 80°C, 10 % sulfuric acid at the flow rate of 97 g/min for 42 minutes to bring the pH of the reaction mixture to 10.0. Then the addition of 10 % sulfuric acid was continued at 148 g/min until 14 minutes later when the pH reached 2.2. The acid was stop and the reaction mixture was allowed to stand for ageing for 15 minutes. After repeated filtration and washing, the obtained solid was dried in a hot air oven at 110°C and finely gournd. The silica fine powder thus obtained had a specifc surface area by the BET method of 315 m²/g and another by CTAB method of 28 m²/g; it gave an amorphous X-ray diffraction pattern after fired at 1100°C; it had an abrasiveness value of 19.5 mg, a refractive index of 1.462 and a lowest turbidity of 0.028; and it proved to be a product of moderate abrasiveness and log-lasting transparency. Example 3. Into a 10 ℓ reactor equipped with a baffle plate and an agitator with 100 mm D turbine blades was introduced 4.5 kg of an aqueous solution of potassium silicate (K₂O·3.0 SiO₂) containing 100 g/kg of SiO₂ and 20 g/kg of K₂SO₄ and then, under the reaction temperature kept at 75°C, 8 % hydrochloric acid at the flow rate of 12.7 g/min for 126 minutes to bring the pH of the reaction mixture to 10.0. Then the addition of 8 % hydrochloric acid was continued at 31.8 g/min until 25 minutes later when the pH reached 2.3. The acid was stopped and the reaction mixture was allowed to stand forageing for 20 minutes. After repated filtration and washing, the obtained solid was dried in a hot air oven at 110°C and finely ground. The silica fine powder thus ablained had a specific surface area by the BET method of 286 m²/g and another by the CTAB method of 23 m²/g; it gave an amorphous X-ray diffraction pattern after fired at 1100°C; it had an abrasiveness value of 12.3 mg, a refractive index of 1.461 and a lowdest turbidity of 0.018; and it proved to be a product of moderate abrasiveness and longlasting transparency. The examples given above clearly show that the product of the present invention has excellent characteristics as a base material for transparent dentifrice formulations. But in order to show more concretely the longevity of transparency it gives to such formulations, turbidity change was traced for three paste formulations each containing 25 % the silica powder mentioned in the corresponding example and having a refractive index adjusted to 1.463. The results were as shown in Table 2. Comparision 1. Table 3 shows the levels of refractive index and turbidity of two brands of commercially available toothpaste for the sake of reference. Comparison of Table 3 and other data cited hereinbefore reveals clearly that the transparent toothpaste formulations now commercially available are substantially less transparent than the corresponding formulations using the silica base material of the present invention.

Claims: A silica base material for dentifrice formulation, characterized by having a specific surface area by the BET method of 270-500 m²/g-anhydride, and also, one by the CTAB method of 5-60 m²/g-anhydride; giving amorphous X-ray diffraction patterns after firing at 1100°C; and having a refractive index of 1.455-1.470. The method for the production of a silica base material for dentifrice formulation, characterized by the fact that the reaction between alkali metal silicate solution and hydrochloric or sulfuric acid under the presence of electrolyte is conducted in two stages: i. e., a silica crystallisation stage during which the temperatures is maintained between 60 and 100°C for a time from 40 minutes to 4 hours and the pH of reaction mixture is brought to 10.0, and the acidification stage for which the pH is finally brought down to 3.5 or less; the ratio of the rate of addition of chloride or sulfate ions in the acidification stage to the rate of addition of chloride or sulfate ions in the silica crystallisation stage is at least 3:2; and the acidification is carried out within 30 minutes. The method described in claim 2, where the electrolyte is previously added to the alkali metal silicate solution. The method described in claim 2, where the alkali metal silicate solution has a molar ratio, SiO₂/X₂O (X denotes alkali metal), of 2-4. The method described in claim 2, where the SiO₂ concentration of the alkalimetal silicate solution before the addition of hydrochloric or sulfuric acid is 5-15% by weight. The method described in claim 2, where the electrolyte is alkali metal salt of mineral acid. The method described in claim 2, where the amount of the electrolyte is 10-60% by weight of SiO₂. The method described in claim 2, where the concentration of hydrochloric or sulfuric acid is 5-15% by weight.

Inventors: FUSHINO, TETSUO, HACHIJO, AKIHIRO, OHTSU, SHOZO, SHINPO, SHOZO
Applicants: TAKI CHEMICAL CO., LTD.
Application year: 1984
Main classification: A61K7
IPC codes: C01B33, A61K8, A61Q11