FLUXLESS BONDING OF MICROELECTRONIC CHIPS

Abstract: Indium is used to bond semiconductor lasers to their heat-sinks without the presence of a corrosive liquid flux. Fluxless bonding is achieved in a vacuum chamber (18) in reducing ambients of CO or H₂. Low strain bonds are achieved at bonding temperatures of approximately 180-­ 240°C in CO and 220-230°C in H₂. Void-free bonds are achieved in CO at temperatures as low as about 205°C. The technique is applicable to other microelectronic chips such as LEDs, for example.

Description: FLUXLESS BONDING OF MICROELECTRONIC CHIPS This invention relates to the bonding of microelectronic chips to an electrically conducting bonding surface. A semiconductor laser is a tiny device typically measuring only about 250 pm in width across the mirror facets and about 400 ;im in length along the optical resonator. The active region of the laser, where recombination of holes and electrons generates stimulated emission, is even smaller. In a typical stripe geometry, double heterostructure (DH) laser the active region xty be only 3-5 zm wide, 0.1 - 0.2 jim thick and 400 pr long. As a consequence, when a typical pumping current of, say, 100 mA, is applied to the laser, the current density in the active region may be of the order of 5000 A/cmê. Since the lasers are commonly operated continuous wave at or near room temperature, appreciable heating occurs. Excessive heating, of course, would damage the laser. In order to prevent such damage, the removal of heat from the laser chip is facilitated by bonding the chip to a suitable heat sink, whi¯t-nszzommonly made of a high thermal conductivity materi (e.g,, copper or dianond). However, the bonding operati6nmust be performed carefully so as to avoid inducing in the laser chip excessive strain which, it has been found, is deleterious to laser reliability and lifetime. That is, the common laser substrate materials, Gaks and InP, are brittle and may crack under undue stress te.g., 10 dyn/cm2). Moreover, stress may generate defects in the active region or cause defects to migrate to the active region. Thus, thermo-compression and ultrasonic chip bonding, widely used techniques in the other semiconductor fields, have been largely rejected in the semiconductor laser art in favor of soldering in the presence of w corrosive flux. In this method, a thick gold bonding pad is deposited on the ohmic contact on one side of the laser chip, and a thin gold layer is formed on a Cu stud (heat sink). A thick layer of a soft, ductile, low melting point metal (commonly indium) is evaporated onto the gold layer on the stud and is then placed in contact with the gold bonding pad. A small weight (e.g., 5 gm) is lowered onto the chip, and the stud temperature is raised to about 230 C in on atmosphere of forking gas in order to melt the indium and to bond the chip to the stud. However, the indium layer tends to oxidize before the bond is completed, and oxides in the bond area increase heat generation because of their high electrical resistivity and poor thermal conductivity. Also, because the melting point of the oxide is higher than that of the solder, the presence of a solid surface oxide prevents the-solder from wetting at the bonding temperature. In order to insure ease and reproducibility in realizing these bonds, and to keep electrical conductance high, a liquid flux (e.g., ZnCl2 NH4rl-H20) is used to dissolve the indium oxide and allow the liquid indium to flow and wet the gold on the laser chip. This flux - soldering procedure has several drawbacks, however. First, the danger exists of chlorinecontaining residues becoming trapped within the bond. ZnCl2, for instance, transforms into ZnO, Z(OH)Cl and HCl in the presence of small amounts of water and thus is a potential corrosive agent in devices operated in humid ambients. Second, the flux boils at the required bonding temperature of-260-280 C and becomes a carrier for liquid indium droplets which, if they hit the sides of the chip, can produce a shcrt-circuit or cause interference with the light beam exiting the laser facet. Third, voids 20-1QO p in size are created during bonding by bubbles of boiling flux entrapped inside the indium. These voids can drastically affect heat removal in the bond area because they represent barriers of practically infinite thermal resistance. if located directly under the active region, voids can raise the junction temperature considerably: theoretical calculations show that a 30 Sm void raises the junction temperature by 7.8 C and a lOO pin void by 47.5 C. Fourth, the bonds are frequently incompletely wetted; i.e., the actual bond area is smaller than the gold bonding pad. This shortcoming may be due to improper application of the flux which is applied manually and hence is very operator dependent. Fifth, the bonds frequently contain large amounts of Au-In intermetallic compounds (e.g., Akin, Au9In, Anin, and AuIn2) which can result in hard bonds. The absence of a pure indium layer after bonding or the presence of the harder intermetallic compounds allows thermal stresses (due to the difference in thermal expansion coefficients between the heat Bink and the laser) as well as intrinsic stresses (induced by the presence of the intermetallics) to be transmitted to the active region of the laser. Forming low-8tres8, void-free bonds is also of interest with other microelectronic chips, for example, LEDs which are bonded to a metallic header. According to the present invention there is provided a method of bonding a metal layer on a microelectronic chip to a metalized support member, comprising (a) providing a bonding layer of soft, ductile bonding material on at least one of the metal layers and the support xeabert the bonding layer having a tendency to oxidize, (but) placing the assembly of the bonding layer, chip and support member in an evacuable chamber, (c) reducing the pressure in the chamber to a subatmospheric pressure (d) introducing a reducing gas into the chamber, (e) at a time between steps (a) and (f), bringing the bonding layer into contact with the other of the metal layer and the support member, and (i) heating the bonding layer to a temperature which is above its melting point and which is effective for the gas to reduce oxides thereon. We have found that reproducible, low-strain, void-free, completely wetted, bonds between semiconductor laser chips and their heat sinks can be realized by a fluxiess technique. An embodiment method, carried out in a vacuum chamber, entails the use of a soft, ductile metal, in the presence of a reducing gas such as CO or substantially pure H2, to solder a metalized heat sink to a metal layer on the chip. Preferably, the soft, ductile metal is indium and the heat-8ink is heated to a temperature in the range of about 180-240 0C when Co is used and in the range of about 220-230 C when 112 is used. LEDs and other microelectric chips can be bonded to a bonding surface, for example a header, in similar fashicn. The invention can be readily understood fro the. following, more detailed description taken in conjunction with the accompanyinY drawing, in which: FIG. 1 is a schematic drawing showing a semiconductor laser chip and a heat sink positioDeo dn a vacuum chamber for bonding in accordance with one embodiment of our invention; FIG. 2 is a graph showing the temperature-time profile during an illustrative bonding operation; and FIG.#3 shows a representative distribution of stress in chips bonded at various temperatures in embodiments of- the invention. 1. Thermodynamics Before discussing the step-by-step procedures employed in practicing our invention, it will be instructive to consider first the thermodynamics of the reduction of the oxide which forms on the soft, ductile metal used to effect the bond: indium sesqujoxide in the case where indium is the metal, and tin dioxide in the case where tin (usually a Sn-Au alloy) is the metal. Based on the thermodynamics of indium sesquioxide (the stable fora at room temperature), hydrogen and carbon monoxide were chosen as the reducing gases. The reaction with hydrogen at the bonding temperature is: In2 93 + 3H2(s) < ¯ > 2In(l) + 3H20(g) (1) The free energy AFT of the reduction reaction is expressed as: EMI6.1 where K = (PHO/PH) (3) 2 2 Equation (3) shows that the equilibrium constant K is the cube of the ratio of the partial pressures of water vapor and hydrogen, #FT is the free energy at 25 C and R is the ideal gas constant. In order for the reduction reaction to proceed at temperature T, a necessary condition is: #FT < 0; that is, EMI6.2 For analytic purposes, a nominal bonding temperature of 200 C was chosen as a compromise between two opposing tendencies: the reduction reaction becomes faster with increasing temperature, but the bonded devices become more strained. It has been established that the threshold for the occurrence of high strains in flux-bonded devices is 200 C, as evidenced by the photoelastic effect. Literature values of #FT0 at 200 C average to 26.5 (+3%) kcal/mole. The value of PH2O/PH2 calculated from Eq. (4) is 9 x 10-5 (+25%). A value of this partial pressure ratio < 9 x 10-5 is therefore suitable. The reaction with carbon monoxide.is similar to the one with hydrogen, In2O3(s) + 3 CO(g)--)(-- 2 In(l) + 3 CO2(g) (5) A free energy of 11 kcal/mole was calculated from the free-energies of formation of In2O3, CO and CO2 at 200 C. The calculated value of PCo /Pco is 2 x 10-ê . As before, a 2 value of this partial pressure ratio < 2 x 10 is therefore suitable. The partial pressure ratios indicate that the reduction of In 203 is possible provided a high enough vacuum is created in the bonding chamber and that pure enough gases are used. More specifically, if a base vacuum of 10- 5 Torr is used, then PCO2/PCO = 2 x 10-ê translates into a minimum PCO of about 0.5 m and FH2O/PH2 translates into a minimum P of about 100 m. However, {he H2 thermodynimics favor reduction with CO more than with H2. Similar considerations apply to the reduction of SnO2 where PCO2/PCO = 1.08 and PH2O/PH2 = 1 x 10-ê at 232 C (the melting point of Sn). 2. Experimental Procedure In accordance with one embodiment of our invention, and as shown in FIG. -1, an AlGaAs DH semiconductor laser chip 10 was bonded to Au-plated Cu heat sink (or stud) 12. A gold bonding pad 14 was electroplated on the p-side electrical contact (Ti-Pt) of the laser chip, and a layer 16 of in solder was evaporated onto the top of the stud 12. However, it is possible (although not preferable) to form the In layer 16 on the bonding pad 14 instead of on stud 12. This procedure would entail forming the In layer prior to chip separation and would require care to keep In off of the laser mirrors. The bonding was done in a vacuum chamber 18 consisting of a bell-jar (not shown) evacuated by a mechanical pump 19 and diffusion pump 20. The stud was held between two spring-loaded, graphite electrodes (not shown). An electrical current#applied to these electrodes provided resistive heating of the stud 12 and In layer 16. The surface temperature of the stud was measured with a ?t-PtRh thermocouple 22 in physical contact with the stud surface. To eliminate systematic errors, the thermocouple was calibrated in place in both CO and H2 using the melting points of In on a Au-plated stud and of Sn and Pb on bare Cu studs. After the gold pad 14 of the laser chip 10 had been positioned on the indium layer 16 on stud 12, the pressure of the vacuum chamber was reduced to about 10 2 Torr using the mechanical pump 19 and was then backfilled three times with the reducing gas through entry port 21. The chamber pressure was then reduced to about 10 -5 Torr using the diffusion pump 20 and backfilled again. After a final pumpdown to about 1.0 x 10 Torr using the diffusion pump 20, the reducing gas was admitted to the chamber through port 21 up to a pressure of 150-200 m Hg. The bond was then made by applying power to the graphite electrodes. The time-temperature cycle (FIG. 2) was composed of five parts: a first ramp (duration #RI# from room temperature to the melting point of T5 of indium (157 C); a first plateau (duration tS) at the melting point; a second ramp (duration t ) to the bonding R2 temperature TB; a second plateau duration tB) at the bonding temperature; and a fast cool-down to room temperature. In some cases the cycle had only three parts; that is, t = 0 and the temperature was raised from room s temperature to the bonding temperature directly. All of the devices used in the initial studies were AlGaAs DH lasers, although this fluxless bonding technique has been used equally well with InGaAsP/InP lasers. If a manipulator is available inside the chamber, it is possible to keep the chip and In layer separate from one another until time # R + tS + tp when contact is effected between the chip and the melted solder. 3. Results With Carbon @onoxide Our initial set of experiments utilized a 5 m thick In layer, a 12 jim thick gold pad, and a 3-part time temperature cycle with ts = 0,tR1 + tR2 = 20-25 sec. and tB = 5-25 sec. The bonding temperature tB ranged from 158 C-276 C. The strains generated in the laser chip during bonding were imaged in an infrared (IR) microscope using the photoelastic effect. The results indicated that it is possible to bond chips without liquid flux in a CO ambient in the range of temperatures 180-275 C with bonding times as low as 5 seconds. Below 1800C the bonds were nonreproducible. However, bonds with low strain (less than about 108 dyn/cmê) were achieved in the range of about 180-240 C. In comparison, stress of the order of 1Q9 dyn/cm2 has been shown to induce ductile fracture in the epitaxial layers of a laser chip. In another set of experiments we studied the influence of the bonding temperature and time and of the presence or absence of a weight resting on the chip on the following parameters: wetting, void content, bond nature (soft vs. hard) and induced stress (measured using single crystal x-ray diffractometry in the Automatic Bragg Angle Control (ABAC) mode, rather than usIng an IR microscope and the photoelastic effect. The bonding temperature TB varied between 167 and 230 C and the bonding time TB between 25 and 150 sec. Different temperature profiles were examined: ramp (tS = 0; tR1 = 25-60 sec.); ramp and soak at the bonding temperature (tR1 = 20-35 sec., ts = 30 sec., t = 25 sex.); ramp and soak at temperature Ts; and slow R2 cooling. The devices had a 2000 thick gold bonding pads 14, and studs 12 were covered with a 1 jia thick electroplated gold layer followed by a 9 pm thick layer 16 of evaporated indium. Bonding was achieved, as before, by bringing the stud to temperature under a flow of CO at a pressure of 1 Torr (1000 m Hg) after several pumpdown- backfill cycles including a final pumpdown to about 2 x 10-5 Torr. A ratio of the partial pressures PCO 2/PCO < 2 X 10-5 ensured the reduction of indiun oxide In O at temperatures around 200 C. 2 3 The use of a 5 gram weight resting on the laser during bonding was found to be detrizental. In most instances, molten indium was squeezed out from under the hip resulting in a partly or wholly intermetallic bond. Such bonds induced nonuniform stresses in the device. In contrast, an AB#C scan taken of a chip bonded under the same conditions of temperature and time, but without weight, exhibited a low and very uniform level of stress ê along the device (stress < 0.2 x 108 dyn/cm). Practically no influence on the bonding temperature-time profile was observed within the range studieÅa. The only exception was a 60 sec. slow cool from 0 230 to 100 C which induced nonuniform and high stresses in the device. In contrast, a single bonding ramp (t + t ) R1 R2 as short as 25 sec. yielded a satisfactory bond. A marked influence of the temperature was observed upon the wetting characteristics. Chips bonded at 2040C and below showed, upon debonding, that incomplete wetting of the gold pad had occurred tJsland-like wetting), irrespective of the bonding time. Chips bonded at 208 C and above exhibited complete wettinq of the gold pad by the indium. Bonding temperatures between 208 and 2230C reproducibly kept the stress in the chips to values lower 8 ê than 0.6 x 10 dyn/cm ; i.e., such temperatures did-not significantly affect the stress level, as compared with that present in the chips prior to bonding. Bondinginduced stresses started to reach significant-values at ê about 230 C where values as high as 1.2 x 108 dyn/cm were reached. The values of the stresses in wçightless- and fluxiess-bonded chips are plotted versus bonding temperature in FIG. 3. Our fluxless bonding technique results in entirely void-xree bonds in every instance when complete wetting is-achieved (i.e., above 204 C). in addition, the#technique is very clean in that no creeping of indium on he sav-cut faces of the chips nor any spattering-of indium on the mirror facets was ever observed. This result is again in contrast with the flux bonding technique in which the liquid flux acts as a carrier for indium droplets. In summary, our fluxless bonding technique is capable of reproducibly yielding good quality, void-free and adequately wetted bonds with a bonding temperature 75 C below that ordinarily used for flux bonding (205 vs, 280 C). The stresses induced in the device by this technique can resroducibly be kept below 0.6 x 108 dyn/cmê. 4. Results with Hydrogen These experiments were performed using chits and procedures (i.e., IP microscopy) of the type employed in the initial experiment with CO. The bonding strains induced in the device were high above 250 C and oderate to low below this temperature. Low-stress bonds occurred in the range of about 220-230 C. Three differences can be noted as compared with the results obtained in CO. First, the lowest temperature leading to a bond was higher (220 C in H2, 180 C in CO), which is consistent with the difference between the freeenergies of the reduction of In 203 by CO and M2. Second, all the shear tests left the bonds unaffected by x force of 150 grams indicating that the conversion of india to Au-In intermetallics was more complete in the presence of H. That is, the interdiffusion between Au and In was faster. This conclusion is in agreement with the observation that diffusion rates in solids are strongly dependent on the annealing ambient. Third, the range of temperatures ovor which low-strain bonds achieved was narrower: 220-230 C in H2 but 180-240 C in CO. As with CO, the meniscus formed by liquid indium between the gold pad and the stud was much smaller for H2-bonded lasers than for lasers bonded using a liquid flux. It is to be understood that the above-desctibed arrangements ate merely illustrative of the nanny possible specific embodiments which can be devised to represent anplication of the principles of the invention. Numerous and varied other arrangements can be devised, In particular, we expect similar results with Sn-alloy solders, In-alloy solders, and with InP/InGaAsP laser chips. Moreover, other microelectronic chips can be bonded to a metalized support ember (e.g., header or heat sink) using our technique. Finally, besides resistance heutlnqs other techniques, such as RF beating or radiation (laser) heating, can be employed to effect the fluxless bond.

Claims: CLAIMS 1. A method of bonding a metal layer (14) on a microelectronic chip (10) to a metalized support member (12) comprising (a) providing a bonding layer of soft, ductile bonding material (16) on at least one of the metal layers and the support member, the bonding layer having a tendency to oxidize, characterised by (b) placing the assembly of the bonding layer, chip and support member in an evacuable chamber (18), (c) reducing the pressure (via l9) in the chamber to a subatmospheric pressure, (d) introducing a reducing gas (via 21) into the chamber, (e) at a time between steps (a) and (i), bringing the bonding layer into contact with the other of the metal layer and the support member, and (f) heating the bonding layer to a temperature which is above its melting point and which is effective for the gas to reduce oxides thereon. 2. The method of claim l, characterised in that said bonding material comprises a tin alloy, or india. 3. The method of claim 2, characterised in that said gas comprises H2 or CO. 4. The method of claim 3, characterised in that in step (d) the partial pressure of water vapor Pfl O and the partial pressure of hydrogen PH are related as PH2O/PH2 < 1 x 10-ê when using the tin alloy, and < 9 x 10- 5 when using indium; or the partial pressure of carbon dioxide PCO 2 and the partial pressure of carbon monoxide PCO are related as PCo2/PCO < 1.08 when using tin alloy, and < 2 x 10-ê when using indium. 5. The method of claim 4, characterised in that when using indium, in step (c) the pressure of the chamber is reduced to at least about 10-5 Torr and either PH is at 2 least about 100 m Hg, or PCO is at least about 0.5 m Hg. 6. The method of claim 10 for making a low strain bond, characterised in that in step (i) the indium bonding layer is heated in hydrogen to a temperature of about 220-250 C, or in Co to 8 temperature of about 180-240 C and preferably 205-230 C. 7. The method of any one preceding-claim, characterised in that the metal layer on the chip and metalization on the support member both comprise gold. 8. The method of any one preceding claim, characterised in that the chip comprises a semiconductor laser and the support member comprises a copper heat sink. 9. The method of any one preceding claim, characterised in that the bonding layer is heated by applying electrical current to the heat sink. 10. The method of any one preceding claim, characterised in that the chip is a double heterostructure comprising layers of material selected from the GaAs AlGaAs and the InP-InGaAsP materials systems.

Inventors: HENEIN, GERARD EDMOND, HEPPLEWHITE, RALPH THOMAS, SCHWARTZ, BERTRAM
Applicants: WESTERN ELECTRIC COMPANY, INCORPORATED
Application year: 1983
Main classification: H01L21
IPC codes: H01S5, B23K1, H01L21