SEMICONDUCTOR MASTER-SLICE DEVICE

Abstract: A large scale integrated semiconductor device manufactured by using master-slice technology comprising a plurality of unit cells (11, 12, 13, 14, ...) external connections made between the unit cells, interconnections within each unit cell which connect the circuit elements of that cell to each other, and bypass connections within unused areas of the unit cells for connecting other neighbouring unit cells together. The bypass connections are arranged in accordance with an imaginary grid which is of a different type and is displaced from another imaginary grid which defines the position of the unit cells and their external connections. (External- and interconnections are shown right-hatched, bypass connections cross-hatched). Less space is required for external connections by using space within unit cells which would otherwise be wasted for the bypass connections between neighbouring unit cells. Several unit cells can be joined together to share external terminals.

Description: SEMICONDUCTOR MASTER-SLICE DEVICE The present invention relates generally to a semiconductor device and, more particularly, to a semiconductor integrated circuit manufactured by using master slice technology. In general, in a large-scale integrated semiconductor device (hereinafter referred to as an LSI) of complex logic, customers may request the requirements of a preferred design. Therefore, there are a large number of kinds of logic LSI's which are dependent upon the requirements of the customers. Accordingly, when the designer designs logic LSI layout patterns, in accordance with each of the requirements of the customers, the LSIs' design time is long and, in addition, the LSIs' manufacturing cost is high. Therefore, for logic LSIs, it is essential to use a standard layout pattern in order to obtain a fast design time and a low manufacturing cost. Several approaches have been taken to meet this requirement for logic 13515. One approach is a master-slice technology in which a plurality of unit cells each of which comprises common circuit elements, such as transistors, diodes or resistors and interconnections within the unit cells for connecting the circuit elements to each other are manufactured by using a standard layout pattern and, after that, external connections between the unit cells are manufactured by using a custom-made layout pattern. Usually, the standard layout pattern includes masks for diffusion processes and masks for fixed metal connection, while the custom-made layout pattern includes masks for metal connection processes. Therefore, a large number of kinds of logic LSIs can be produced by selecting a standerd layout pattern and changing a custom-made layout pattern, i.e., masks for metal connection processes. However, in the logic LSIs manufactured by a master-slice technology it is common that all the unit cells are not always used and, in addition, all the circuit elements within a used unit cell are not always used. -In this case, no external connections are connected to unused unit cells and no interconnections are connected to unused circuit elements. Therefore, in such LSIs, wasted areas within unit cells are, more or less, generated. On the other hand, logic LSIs are usually designed with the aid of a computer, which is a so-called computer -aided design (CAD),' by predetermining an imaginary grid which is a network of equally spaced lines forming rectangles. Therefore, external connections between the unit cells are arranged in accordance with the predetermined grid. However, in such 1SIs, mutual connections between the unit cells are carried out by only external connections and, accordingly, the external connection area is very large which results in a low integration density. SUMMARY OF THE INVENTION It is a principal object of the present invention to provide a semiconductor device (LSI) manufactured by using master-slice technology with a high integration density. According to the present invention, there is provided a semiconductor device manufactured by using master-slice technology comprising: a plurality of unit cells each of which includes circuit-elements; interconnections within some at least of the unit cells, which connect the circuit elements of a unit cell to each other; and external#c',onnec- tions outside the unit cells, which connect the unit' cells to each other, the external connections being arranged in accordance with a first predetermined grid which is a network of equally spaced lines forming rectangles; characterized in that the device further comprises bypass connections within some at least of the unit cells for connecting others of The unit cells to each other, the bypass connections in each unit cell being arranged ill accordance with a further predetermined grid which is of a different type from the said first predetermined grid. In this device, wasted areas within each of the unit cells are effectively made use of, since bypass connections are arranged in the wasted area. The bypass connections serve as the portions of the external connections. Therefore, the external connection areas outside the unit cells are smaller than those of the prior art, which provides a high integration density of the device. The present invention will be more clearly understood from the description set forth below with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a layout diagram illustrating an example of a basic unit cell without interconnections; Fig. 2 is a layout diagram of the basic unit cell of Fig. l includi-ng bypass connections¯, according to the present invention; Figs. 3A, 3B and 3C are circuit diagrams illustrating logic circuits which are formed in the basic unit cell of Fig. 1; Figs. 4A, 43 and 4C are layout diagrams illustrating the logic circuits of Figs. 3A, 3B and 3C, respectively; Figs. 5A, 5B and 5C are layout diagrams of the logic circuits of Figs. 3A, 3B and 3C, respectively, including bypass connection areas, according to the present invention; ; Figs. 6A, 6B and 6C are layout diagrams illustrating the logic circuits of Figs 3A, 3B and 3C, respectively, including external connections, inter-connections and bypass connections. Fig. 7 is a layout diagram illustrating a unit cell combination according to the present invention; Figs. 8, 9 and 10 are layout diagrams illustrating three examples of Fig. 7, including interconnections and bypass connections, according to the present invention, and; Fig. 11 is a flow diagram illustrating steps of a computer-aided design according to the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT Referring to Fig. 1, which illustrates an example of a basic unit cell, a unit cell 1 comprising resistor elements 2, transistor elements 3 and 4, and a diode element 5 which are arranged not in accordance with a predetermined grid G which is a network of equally spaced lines forming rectangles is shown. The contact areas as illustrated in Fig. 2 are defined as follows. "R" : resistor contact "C" : collector contact "B" : base contact : n : emitter contact "A" : anode -contact "K" : cathode contact "COM" : common electrode pad of power supply line (Vcc) electrode pad of ground line (GND) An LSI including a plurality of such unit cells can be manufactured by using conventional semiconductor technology and master-slice technology. In other words, circuit elements, such as transistors including collector regions, base regions and emitter regions, diodes including anode regions and cathode regions, and resistors are manufactured by selectively introducing impurities into a silicon semiconductor substrate. After that, an insulating layer is deposited on the substrate. Further, two or more metal wiring layers which connect one of the circuit elements to another, and/or connect one of the unit cells to another are deposited. In an embodiment of the present invention, one part of the external connections, one part of the interconnections, one part of the bypass connections and the power supply lines (Vcc) are formed by a first (lower) wiring layer, while the other part of the external connections, the other part of the interconnections and the other part of the bypass connections and the ground lines (GND) are formed by a second (upper) wiring layer. The external connections formed by the first wiring layer are arranged in row and column directions in accordance with a predetermined grid between the unit cells. In addition, the external connections formed by the second layer can be also arranged in row and column directions in accordance with the predetermined grid between the unit cells. Of course, in this case, accidental shorts between the external connections and the supply lines (or the ground lines) are avoided. In addition, the interconnections formed by the second wiring layer are arranged in accordance with the designers technique. Further, the bypass connections are arranged in accordance with a further grid which is of a different type from the predetermined grid. A preferable arrangement of the circuit elements can be determined by the designer. In Fig. 1, the resistor elements 2 are arranged next to the lines Ly¯Ly is arranged. In addition, a common electrode pad COM is arranged on the lines Lp'Ly- Since the resistor elements 2 are connected to the power supply line, it is preferable that the elements 2 are arranged in the proximity of the power supply line. It should be noted that the common electrode pad COM serves also as a common electrode pad of an adjacent unit cell (not shown) symmetrical to the unit cell 1 with regard to the lines Ly-Ly. The transistor element 4 and the diode element 5, which serve as output stages, are arranged next to the lines LX-Lx along which a ground line is arranged. In addition, two electrode pads for the elements 4 and 5, respectively, are arranged. It is also preferable that the elements 4 and 5 are arranged in the proximity of the ground line, since the elements 4 and 5 are often grounded. It should be noted that the electrode pads G also serve as electrode pads of an adjacent unit cell (not shown) symmetrical to the unit cell 1 with regard to the lines The transistor element 3, which serves as an input stage, is arranged next to a connection area S in which external connections can be arranged. It-is preferable that the element 3 is arranged in the proximity of the area S, since the element 3 receives input signals from external connections which are arranged in the area S. The diode element 5 is also arranged in the proximity of the area S, since in a circuit arrangement, the diode element 5 is arranged closer to an output terminal than the transistor element 4. In addition, the arrangement of the collector contact, the base contact and the emitter contact of the transistor elements 3 and 4, and the anode contact and the cathode contact of the diode6 is determined in order to obtain the shortest external connections. Figs. 1, 2, and 4 through 10 are depicted by a plotter which is connected to a computer controlled by using a graphic display. The arrangement of external connections, interconnections and bypass connections is designed by the computer#othat the paths of-these connections are as shorts as possible which serves to increase the operation speed of the LSI and, in addition, the number of bent portions of these connections are as small as possible which serves to improve the manufacturing yield of the LSI. Further, the LSI can be designed economically and efficiently with the aid of a computer. In Figs. 7 through 10, which illustrate combinations of a plurality of unit cells, for-a-logic circuit, the preferable mutual arrangement of the unit cells is also designed with the aid of a computer, so that the paths of connections are as short as possible and the number of bent portions -thereof is as small as possible-. In Fig. 1, if the unit cell 1 is unused, no interconnections are arranged between the circuit elements 2, 3, 4 and 5, so that the wasted area of the unit cell 1 is large. Contrary to this, if the unit cell 1 is used, interconnections are arranged between the circuit elements 2, 3, 4 and 5, so that the wasted area is small. In both cases, it is almost impossible to arranged bypass connections, which pass through the unit cell 1, in accordance with the grid G, since the paths of the bypass connections are hindered by the circuit elements. In the present invention, such bypass connections are arranged in accordance with a further grid which is a different type from the grid G. For example, the 'further grid is determined by the arrangement of circuit elements of each of the unit cells. In addition, the further grid can be determined with the aid of a computer, which is not difficult. The further grid is composed of only the lines necessary for connecting a start point and an end point of a given bypass connection. - Fig. 2 is a layout diagram of the basic unit cell of Fig. 1 including paths of bypass connections, according to the present invention. In Fig. 2, the unit cell 1 is supposed to be unused and, accordingly, no interconnection is arranged. In Fig. 2, cross-hatched portions indicate paths of bypass connections which pass through the unit cell 1 and are not connected to any of the circuit elements 2, 3, 4 and 5. Examples of logic circuits formed in the basic unit cell of Fig. 1 will now be explained. Fig. 3A is a circuit diagram of a two-input NAND gate circuit, which is formed in the basic unit cell of Fig. 1, and Fig. 4A is a layout diagram illustrating the circuit of Fig. 3A. As illustrated in# Fig. 3A, the two-input NAND gate circuit comprises three resistors Ral f R and R which are formed in the element 2 of Fig. 1, a two-emitter transistor gal which is formed in the element 3 of Fig. 1, a transistor 0#a2 wh#ich is formed in the element 4 of Fig. 1, and a diode Da which is formed in the element 5 of Fig. 1. In other words, all the circuit elements of Fig. 1 are used. In this case, interconnections between the circuit elements are illustrated as right-hatched portions in Fig. 4A. It should be noted that the interconnections are arranged independent from any grid. Fig. 3B is a circuit diagram of an inverter circuit, which is also formed in the basic unit cell of Fig. 1, and Fig. 4B is a layout diagram illustrating the circuit of Fig. 3B. As illustrated in Fig. 3B, the inverter circuit comprises two resistors Rbl and Rb2 which are formed in the element 2 of Fig. 1, a transistor Qb which is formed in the element 4 of Fig. 1, and a diode Db which is formed in the element 5 of Fig. 1. Therefore, the element 3 of Fig. 1 is unused; In this case, interconnections between the circuit elements are illustrated as right-hatched portions in Fig. 4B. Fig 3C is a circuit diagram of a two-input AND expander circuit, which is also formed in the basic unit cell of Fig. 1, and Fig. 4C is a layout diagram illustrating the circuit of Fig. 3C. As illustrated in Fig. 3C, the two-input AND expander circuit comprises a resistor Ec which is formed in the element 2 of Fig. 1 and a two-emitter transistor Q which is formed in the element 3 of Fig. 1. c Therefore, the elem#ents#'4 and 5 of Fig. 1 are -unused. In this case, interconnections between the circuit elements are illustrated as right-hatched portions in Fig. 4C. Thus, the wasted areas of the unit cells of Figs. 4A, 4B and 4C are smaller than that of the unit cell of Fig. 1 which is unused. However, in the present invention, even when the wasted areas are small, bypass connections can be arranged. In Figs. 4A, 4B and 4C, Vcc indicates a power supply line which is formed by a first wiring layer. Figs. 5A, 5B and 5C are layout diagrams of the logic circuits of Figs. 3A, 3B and 3C, respectively, including bypass connections, according to the present invention. In Figs. 5A, 5B and SC, cross-ha±ched portions, which indicate bypass connections, are added to Figs. 4A, 4B and 4C, respectively. As illustrated in Figs. 5A, 5B and 5C, the right-hatched portions indicate interconnections, and the larger cross-hatched portions indicate bypass connections. In Figs. 6A, 6B and 6C, actual external connections, interconnections, bypass connections, a power supply line (Vcc) and a ground line are present in the layout diagrams of Figs. 4A, 4B and 4C (Figs. SA, 5B and SC), respectively. In these figures, a right-hatched portion indicates a first wiring layer, while a left-hatched portion indicates a second wiring layer. Square cross-hatched portions indicate pads which are positioned in windows or through holes for connecting the first wiring layer and the second wiring layer. There are cross-hatched portions in which the first wiring layer is superposed on the second layer; however, the two layers are actually electrically isolated by an insulating layer (not shown) therebetween. In Figs. 6A, 6B and 6C, GND indicates a ground line which is formed by the second'wiring layer. In Fig. 6A, a bypass connection BC which is formed by the first wiring layer passes through the unit cell. In Fig. 6B, a bypass connection BC, which is also formed by the first wiring layer, passes through the unit cell and is connected to the second wiring layer in the external connection area. In Fig. 6C, a bypass connection BC, which is formed by the first wiring layer, passes through the unit cell and is connected to the second wiring layer at the edge portion of the unit cell. Fig. 7 is a layout diagram illustrating a unit cell combination according to the present invention. In Fig. 7, four unit cells 11, 12, 13 and 14, which are similar to the basic unit cell 1, are shown. All the circuit elements within the unit cells are symmetrical with regard to the lines I-I and the lines II-II. In addition, there are no spaces between the unit cells 11, 12, 13 and 14, which provides a high integration density of an LSI. In such unit cell combinations, bypass connections which serve as external connections of the prior art are important. Figs. 8, 9 and 10 illustrate three examples of Fig. 7, including interconnections and bypass connections according to the present invention. In Fig. 8, the unit cells 11 and 12 are the same as that of Fig. 2 and the unit cells 13 and 14 are the same as that of Fig. 5A. Similarly, in Fig. 9, the unit cells 11 and 12 are the same as that of Fig. 5C and the unit cells 13 and 14 are the same as that of Fig. 5B. In addition, in Fig. 10, the unit cells 11, 12, 13 and 14 are the same as those of Figs. 5A, 5C, 5B and 2, respectively. In all the figures, some bypass connections of one of the unit cells are connected to bypass connections of another unit cell, due to the symmetrical arrangement of the unit cells. Therefore, such bypass connections save external connections which connect unit cells to each other and, accordingly, the semiconductor device including such unit cells with a high integration density can be obtained. In Figs. 7 through 10, a four-unit cell combination is shown. However, it should be noted that any other combination, such as an eight unit cell combination or a sixteen unit cell combination, can be easily obtained. Fig. 11 is a flow diagram illustrating steps of a computer aided design according to the present invention. In the step of "Hand depiction" a basic unit cell including common circuit elements and interconnections is determined by the designer. As a result, information "1" with regard to the interconnections which correspond to Fig. 4A, 4B or 4C is stored in a pattern library, while -information "2" with regard to bypass areas for bypass connections which correspond to Fig. SA, 5B or 5C is stored in a grid library. On the other hand, a connection file is used for storing a custom-made logic circuit. In the step of "Placement", actual external connections between the unit cells and actual bypass connections within the unit cells are determined in accordance with the bypass informations "-2'"Lf#rom#-the grid library, information "3"- from the connection file, information "4" for indicating an arrangement of unit cells from a chip file. Next, in the step of "Routing", a layout pattern including unit cells, interconnections, external connections, bypass connections and other connections is determined in accordance with the bypass information "2'" from the grid library, the arrangement information "5" from the chip file, information "7" from a layout file which stores the result of the step "Placement", which correspond to Fig. 6A, 6B or 6C. Next, in the step of "Mask generation", a mask for manufacturing an LSI is formed in accordance with information "1"' with regard to unit cells and actual interconnections and information "9" with regard to external connections and bypass connections. After that, the data with regard to the mask is stored in a mask pattern file (not shown). As explained hereinbefore, the semiconductor device (LSI) manufactured by using a master-slice technology according to the present invention has such advantage that a high integration density thereof can be obtained, because bypass connections are arranged within wasted areas of each of the unit cells and, accordingly, external connections, which are arranged outside the unit cells, are reduced compared with those of the prior art. In particular, in a symmetrical arrangement of unit cells without space therebetween, such bypass connections are important,- since the area for external connections is small.

Claims: CLAIMS 1. A semiconductor device (figs.5A-5C) manufactured by master-slice technology comprising: a plurality of unit cells (1) each of which includes circuit elements (2, 3, 4, 5); interconnections within some at least of the unit cells (1), which connect the circuit elements of a unit cell to each other; and external connections outside the unit cells, which connect the unit cells to each other, the external connections being arranged in accordance with a first predetermined grid (G) which is a network of equally spaced lines forming rectangles; characterized in that the device further comprises bypass connections (cross-hatched) within some at least of the: unit cells for connecting others. of the unit cells to each other, the bypass connections in each unit cell being arranged in accordance with a further predetermined grid which is of a different type from the said first predetermined grid. 2. A device according to claim 1, wherein the said further predetermined grid of-each of the unit cells is determined by the. arrangement of circuit elements thereof. 3. A device according to-claim 1 or 2, wherein two or more of the unit cells are arranged without space therebetween (11, 12, 13, 14, Figures 7 to 10). ? -. 4. A device according to claim 3, wherein two more of the unit cells are arranged symmetrically kith each other (11, 12, 13, 14, Figures 7 to 10). 5. A device according to any-of claims 1 to 4, wherein the said further predetermined grid is determined with the aid-of a computer. 6. A device according to any preceding claim, wherein the interconnections between circuit elements, the bypass connections and the external connections are made by at least two layers of metal wiring, each layer separated and insulated from its neighbouring layer by a non-conducting layer, electrical connections between the said wiring layers being made only at predetermined points. 7. A device according to any preceding claim, wherein the said bypass connections lying predominantly on a further predetermined grid within a unit cell are arranged to pass through gaps between connecting pads of the circuit elements within the-unit cell. 8. A semiconductor master-slice device (Figs. 5A-5C) comprising: a plurality of unit cells (1) -each of which includes Circuit elements (2, 3,4, 5)some at least of which are interconnected within some at least of the unit cells (1), some at least of the unit cells being interconnected by means of external connections,characteri- zed in that some at least of the unit cells are interconnected by connections passing through another unit cell or cells by way of bypass connections within the other unit cell or cells which avoid electrical contact with any circuit element or other connection within the other unit cell or cells. 9. -A semiconductor master-slice device (Figs 5A-5C) comprising: a plurality of unit cells (1) each of which includes circuit elements (2, 3, 4, 5) some at least of which are interconnected within some at least of the unit cells (1), some at least of the unit cells being interconnected by means of external connections, characterized in that some at least of the unit cells are interconnected by connections passing through another unit cell or cells by way of bypass connections within the other unit cell or cells which avoid electrical contact with any circuit element or other connection within the other unit cell or cells, in which each bypass connection is not aligned in a plan view of the matter-sSice with the exterhal tonnections connected there, to at the unit cell boundary. 10. A device according to claim 8 or 9, in which voltage supply connections are arranged in a first layer and ground connections are arranged in a second layer, and in which a unit cell containing one or more bypass connections also includes interconnections between the circuit elements, each bypass connection and circuit interconnection being arranged in one of the said two layers.

Inventors: AIHARA, SATOSHI, OHBA, OSAM, SATO, SHOJI
Applicants: FUJITSU LIMITED
Application year: 1980
Main classification: H01L27
IPC codes: H01L23, H01L27, H01L21