INTEGRATED CIRCUIT WITH ALPHA RADIATION SHIELDING MEANS

Abstract: An integrated circuit is provided with shielding means to protect it from bombardment by alpha particles and other ionizing radiation, so as to avoid errors in the functioning of the integrated circuit by the sudden introduction of electrical charge attendant upon the incidence of such radiation. The shielding means is in the form of a semiconducting layer, of the type of material which itself might be used for the fabrication of an integrated circuit, said layer being located in a close, overlapping manner relative to the fabricated area of the semiconducting lamina on which the integrated circuit, (116) to be protected, is situated, so sandwiching the integrated circuit between two layers of material which are thick enough to prevent the through-passage of high energy alpha particles, and which, by their purity, are substantially free from any radioactive inclusions.

Description: BACKGROUND TO THE INVENTION 1. FIELD OF THE INVENTION The present invention relates to integrated circuits and to methods and apparatus for the shielding of integrated circuits from bombardment by ionising radiation. 2. ¯ THE PRIOR ART The trend in the design and manufacture of integrated circuits, especially those intended for memory storage of informational data, for use in conjunction with data processing equipment, is.towards the creation of larger area circuits having on them an increased number of yet smaller components An error causing mechanism exists not encountered in the operation of small area integrated circuit memories, having physically large component members, whereby the passage of an alpha particle into the substance of the integrated circuit causes, by the dissipation of its kinetic energy, the generation of sufficient hole-electron pairs to disrupt the integrity of stored date. A large area circuit, presenting a larger target, has a higher probability of being struck by an alpha particle than does a small one. Likewise, a small memory storage cell, requiring only a small number of electrons to be retained for the storage of a binary digit, is more easily disrupted by the sudden injection of alpha generated charge than is a larger cell which requires a large number of electrons for data digit storage. As cell size decreases, there exists a critical limit, below which an intruding alpha particle is able to disrupt the stored cata in several physically adjacent data storage cells. The process of inbuilt error correction, an old art in the design and operation of semiconductor memories, then becomes difficult to achieve and hardware consuming, as it is necessary to correct a plurality of erroneous adjacent bits, requiring long, redundant codes to be added to the stored data. Memory efficiency must suffer if this course is chosen. The alpha particle problem has proved particularly troublesome in the development of high capacity, charge storage memories. It has become apparent the a soft error rate must be accepted as integral with the operation such integrated circuits. In order to anccessfully exploit the capacity of such devices, the usual design process of simply scaling and combining earlier, lower capacity memory device designs has largely been abandoned, memory cells in the high capacity devices having higher charge storage per unit area than their earlier counterparts. This has increased the number of stored electrons per memory cell, and so decreased the likelyhood of a charge induced error. Other improvements have been incorporated, such as the employment of more efficient electron collectors for each memory cell, so that a smaller number of residual electrons may be interpretted as the presence of a stored binary digit. Threshold levels have also been changed, so that a higher noise immunity is present. The alpha particle problem promises to become increasingly severe as further attempts are made to increase data storage capacity per device. In particular, as new wafer scale circuits are introduced, where the entire surface of a silicon wafer, several inches in diameter, is used for the fabrication of a single circuit, the error rates of a few per hour, presently encountered in the 64k bit memories, will be increased to one every few seconds, thanks to the enormous relative increase in area. It has been shown that the alpha particles, responsible for charge induced errors, originate from radioactive decay of foreign inclusions in the material used to fabricate the integrated circuit case. The few parts per million of radioactive impurities, present in the materials of the case, emit a sufficiency of alpha particles, as nuclear decay products, to cause an unacceptably high probability of the collision of an alpha particle with signal bearing or storage elements in the integrated circuit. While the integrated circuit case does indeed protect the integrated circuit from terrestrial and other sOurces of background radiation, it itself contributes to the problem, setting a lower limit on the number of particles colliding with the integrated circuit every hour. Accordingly, it is desirable to find means whereby integrated circuits may be protested from the incidence thereon of alpha particles and which is free from radioactive inclusions. It is a particular object of the present invention to provide an integrated circuit which is protected against bombardment by ionising radiation by a radiation screen comprising a layer of semiconducting material, at least ten microns thick, of such a purity that it might itself be employed for the fabrication of an integrated circuit, attached either within a normal integrated circuit or affixed to the integrated circuit itself It is a further object of the present invention :to provide an enclosure whereby two or more functional integrated circuits may provide mutual protection against bombardment by ionising radiation. BRIEF DESCRIPTION OF THE INVENTION In a first preferred embodiment of the present invention, a piece of silicon wafer, which may be pure, or Ilave on it an integrated circuit which is non functional, is affixed within the lid of an integrated circuit case, so that when the case is assembled around a functional integrated circuit, the piece of silicon wafer is brought into close, overlapping proximity with the functional integrated circuit. In a second preferred embodiment of the present invention, a piece of silicon slice, which may be pure, or have on it an integrated circuit which is non functional, is attached to a functional integrated circuit by low melting point glass bonds, so as to overlap in close proximity, the integrated circuit. In a third preferred embodiment of the present invention, a layer of polycrystaline silicon is deposited, as a continuation of the fabrication process, over an In a fourth preferred embodiment of the present invention, a first active integrated circuit is affixed within a first part of a specially adapted integrated circuit enclosure, and a second, active integrated circuit is affixed within a second part of the specially adapted enclosure, such that, when the enclosure is assembled, both integrated circuits are brought together in close, overlapping proximity, fabricated side to fabricated side, such that the bulk material of their substrates Provides a radiation protective sandwich. BRIEF DESCRIPTION OF THE DRAWINGS Figure one shows, in cross section, the integrated circuit case which comprises the first preferred embodiment of the present invention. Figure two shows, in cross section, an integrated circuit bearing a semiconducting radiation screen, constituting the second preferred embodiment of the present invention. Figure three shows an integrated circuit having deposited thereover, a continuous layer of semiconducting material, constitutirg the third preferred embodiment of the present invent' on. Figure four shows, in exploded, cross sectional view, the two part i#tegrated circuit case constituting the fourth preferred embodiment of the present invention. Figure five shows, in assembled, cross sectional view, the integrated circuit case of figure four. DESCRIPTION OF THE FIRST PREFERRED EMBODIMENT Attention is drawn to figure one, showing, in cross section, an integrated circuit enclosure provided as the first preferred embodiment of the present invention. An integrated circuit enclosure (10) is provided with a lower part (12) onto which a first silicon slice (14), bearing an integrated circuit (16) is affixed. The integrated circuit enclosure (10) is also provided with an upper part (18) onto which a second silicon slice (20) s affixed. The integrated circuit (16) in the lower part (12) is connected to the outside world via pins (22) which pass through the wall of the enclosure (10) and are joined by bonds (24) to the integrated circuit (16). The first and second silicon slices (14 & 20) are so affixed to the upper and lower parts (12 & 18) respectively that when the upper and lower parts (12 & 18) are brought together, in final assembly, their respective centroids lie approximately above one another. Both silicon slices (14 & 20) are more than ten microns thick, being the normal slice material used for integrated circuit fabrication, typically several hundreds of microns thick. The vertical separation between the two silicon slices (14 & 20) and the degree of overlap of the second silicon slice (2) over the integrated circuit (16) is such that the angle ABC is greater than seventy degrees. The integrated circuit (16) is thus protected from radiation from below by the material of the first silicon slice (14) and from above by the second silicon slice (20). The first and second silicon slices (14 & 20) need not be of the same thickness, provided both are adequately thick enough for the prevention of throughpassage of alpha particles with energies up to 10MeV, neither need they be of the same physical dimensions, provided that for all cross sections through the integrated circuit enclosure (10), the angle ABC is everywhere greater than seventy degrees. A particularly attractive embodiment results if the second silicon slice (20) is a circuit which has failed fabrication, and finds a secondary use as a radiation screen, at no extra cost. DESCRIPTION OF THE SECOND PREFERRED EMBODIMENT Attention is xt drawn to figure two which shows, in cross section, the apparatus of the second preferred embodiment of the present invention. A first silicon slice (30) has, fabricated on it, an integrated circuit (32). A second silicon slice (34) is supported by low melting point, fused glass bonds (36) with its plane approximately parallel to the plane of the first silicon slice. In fabrication, the glass bonds (36) in the form of glass beads, are placed at several sites on the first silicon slice (30), external to the area of the integrated circuit (32). The second silicon slice (34) is then placed over the glass beads, being supported by them. The whole assembly is then subjected to sufficiently high temperatures for a sufficiently long time to cause the glass beads to soften, and form the glass bonds (36). The entire assembly is assembled, after fabrication, into an integrated circuit enclosure, in the normal manner. It is to be appreciated that the same possibilities exist, as to the form and nature of the second silicon slice (34) as exist for the second silicon slice (20) of the first preferred embodiment. The same vertical clearance and overlap criteria also apply. It is also to be appreciated that the glass bonds (36) may comprise a small plurality of such bonds, or a continuous wall, surrounding the integrated circuit (32) The glass employed must be substantially free of radioactive inclusions if it is to be placed within the twenty degree projection window of the integrated circuit. The glass may be replaced by any suitable adhesive. DESCRIPTION OF THE THIRD PREFERRED EMBODIMENT Attention is drawn to figure three showing, in cross section, an integrated circuit fabricated accordion to the third preferred embodiment of the present invention. A silicon slice (40) has an integrated circuit (42) fabricated thereon. As a final stage of fabrication, a layer of polycrystaline silicon (44) is deposited over -We entire surface of the integrated circuit. The polycrystaline silicon layer is at least ten microns thick. It is the same style of layer as is used in the normal course of fabrication of charge storage semiconductor memory integrated circuits. The silicon slice (40) is mounted into an integrated circuit enclosure in a completely normal manner, as a last stage of integrated circuit manufacture. It is to be appreciated that a layer of any other material may be similarly deposited as a radiation shield provided it meets the electrical insulation criterion for such deposition over an integrated circuit, and also meets the material purity criterion required of such a radiation shield, the layer being thick enough to prevent the throughpassage of alpha particles with energies up to 10MeV. The intergrated circuit (42) is thus protected by a complete shielding, being surrounded by silicon above and below. DESCRIPTION OF THE FOURTH PREFERRED EMBODIMENT Attenticn is drawn to figure four showing, - exploded, cross sectional view, the integrated circuit enclosure, associated integrated circuits, and mounting hardware or the fourth preferred embodiment of the present invention. An integrated circuit enclosure comprises a lower casing (50), within which is affixed a first silicon slice (52). A first integrated circuit (54) is fabricated on the first silicon slice (52). Electrical connection to the outside world, for the first integrated circuit (54) is achieved by a plurality of a first style of pin (56), passing outside of the enclosed area of the lower casing (50), bent, on the exterior of the enclosure towards the area where it is intended that electrical connection will be made to the completed enclosure, and coupled to the first integrated circuit (54) by a plurality of first electrical bonds (58). The intergrated circuit enclosure also comprises an upper casing (60), within which is affixed a second silicon slice (62). A second integrated circuit (64) is fabricated on the second silicon slice (62). Electrical connection to the outside world, for the second integrated circuit (64), is achieved by a plurality of a second style of pin (66), passing outside of the enclosed area of the upper casing (60), bent, on the exterior of the enclosure, in the opposite manner to the bending of the first style of pin (56), also towards the area where it is intended that electrical contact will be made with the completed enclosure, and coupled to the second integrated circuit (64) by second electrical bonds (68). Attention is next drawn to figure five, showing, again in cross sectional form, the integrated circuit enclosure of figure four, this time in assembled form. The first and second style of pins (55 & 56) exit from the enclosed volume in a spatially staggered manner, so that, been the assembled enclosure is viewed on either side, which, in the drawing, would be normal to the plane of the drawing, the pins of each type are arranged alternately, along the sides. Because of the spatial staggering of the pins (56 & 66), it does not matter if a degree of vertical overlap exists between the first and second electrical bonds (58 & 68) in the assembled enclosure, since no electrical short circuits will result. The first and second integrated circuits (54 & 64) find themselves enclosed, above and below,by the first and second silicon slices (52 & 62) which act as radiation shields, forming a sandwich of pure silicon in which the integrated circuits (54 & 64) act as the filling. The degree of overlap of unfabricated silicon over each integrated circuit (54 or 64), and the vertical distance between the two silicon slices (60 & 50) is everywhere such that the angle DEF, and any other equivalent angle between the edge of the first silicon slice (52) and the boundary of the second integrated circuit (64), and between the edge of the second silicon slice (62) and the boundary of the first integrated circuit (54), is more than 1600. It is to be appreciated that the pins may be made to exit from such an enclosure in any cont ient, non-shorting manner, and spatial arrangement. It is also to be appreciated that two integrated circuits need not be of the same type or function. It is also to be appreciated that this method of housing integrated circuits also provides a means for multiplying the circuit functions available from one integrated circuit enclosure, without the need for fabrication of a new set of masks for integrated circuit manufacture. It is further to be appreciated that there may be more than two integrated circuits so housed and protected, a stack of silicon slices, each bearing an integrated circuit, being provided where the outermost members of the stack have their fabricated faces turned inwards towards the stack, electrical connection being provided for every member of the stack, each integrated circuit in the stack thus being protected by the silicon substrates of the others from radioactive bombardment. It is yet further to be appreciated that, in any of the four preferred embodiments, described above, any other semiconducting material, pure enough for integrated circuit fabrication, may be used in place of silicon. It is penultimately to be appreciated that, in any of the four preferred embodiments described above, the semiconducting material, acting as a shield, need not be of the same type as that used in the fabrication of the protected integrated circuit. It is lastly to be appreciated that tre semiconduct=r slices on which the integrated circuits are fabricated, may be of any size. It will be apparant,to those skilled in the art, that the radiation protection measures, laid down in the above descriptions of the preferred embodiments, as single measzes, may equally well be applied, within the spirit of the present invention, in a plural manner to any integrated circuit, by multiple use of one method, by use of a plurality of different methods, or both.

Claims: 1. An integrated circuit fabricated on a semi-conducting substrate and protected from the effects of ionising radiation by a shield which is free from radioactive inclusions, said shield consisting of, or including, such material, and being of such thickness, that it will prevent the passage therethrough of at least 90 per cent of alpha particles with energies up to 10 MeV, and being so dimensioned and located in relation to said integrated circuit that it will protect it from any alpha particle having a trajectory such that in the absence of the shield it would strike the surface of the integrated circuit remote from said substrate at an angle of incidence of less than 700. 2. An apparatus comprising an integratea circuit and a radiation shield, said shied preventing ionisina radiation fro impinging onto said circuit, said shied being constructed from material which is free of radloactive inclusions, and of sufficient thickness to prevent the tbroughpassage of ninety percent of alpha, particles with an energy of lONev, said shield being disposed in overlapping proximity to said circuit, such that, from any point on said circuit, no straight line path exists, with an angle of more than twenty degrees to the surface of said circuit, which does not pass either thromgh#sai##shie1d-#or through the substrate on which said circuit is fabricated. 3. An apparatus, as claimed . in Claim 2, wherein said substrate is a first semi-concucting layer, said shield is a second semi conducting layer, and said shield is disposed in parallel planar proximity to said first semiconucting layer. 4. An apparatus, as claimed in Claim 3, wherein said second semiconC ng layer is affixed internally to a member of a package, providing electrical connection and environmental isolation for said circuit, and within which said circuit is encapsulated, such that, on the bringing together of the various members of said package, said second semiconducting layer is brought into said parallel planar proximity with said first semiconducting layer. 5 An apparatus, as claimed in Claim 4, wherein said second semiconducting layer has, fabricated thereon, a non-functional integrated circuit. 6. An apparatus, as claimed in Claim 5,. wherein said first semiconducting layer is silicon, said second semiconducting layer is silicon, and, both said first and said second semiconducting layers are more than ten microns thick. 7 An apparatus, as claimed in Claim 3, 'wherein said second serniconducting layer is affixed in said parallel planar proximity to said first semiconducting layer by one or more bonds, external to the area on said first semiconducting occupied by said first integrated circuit. 8. An apparatus, as claimed in Claim 7, wherein, said first semiconducting layer is silicon, said second semiconducting layer is silicon, said bonds are glass bonds, set between said firs and said second semiconducting layers, and said First and second semiconducting layers are each more than ten microns thick. 9. An apparatus as claimed in Claim 7, wherein, said second semiconducting layer has, fabricated thereon, a non-functional integrated circuit. 10. An integrated circuit, fabricated on a semiconducting surface, and provided with a layer of material, continuously deposited thereover so as to sandwich said circuit between itself and said surface, where said material is substantially free from radioactive inclusions, and said layer is thick enough to prevent the throughpassage of ninety percent of alpha particles with an energy of 10 MeV. 11. An integrated circuit, asc1airn# in Claim 10, wherein said seniconducting surface is a silicon surface, said material is polycrystaline silicon, and said layers at least ten microns thick. 12. An integrated circuit, as claims in claim 10, wherein said layer and said semiconducting surface are composed of the same material. 13. An integrated circuit enclosure for mounting and providing external electrical connection for two or more active, integrated circuits, each fabricated on part of the area of one fade of a corresponding number of semiconductor slices, wherein, each of said slices is thick enough to prevent the throughpassage of 90% of alpha particles with an energy of 10MeV. and said slices are disposed, substantially parallel planarly, with said circuits substant ially in alignment, in a stack, the two outer members of which have said fabricated face towards said stack, said disposition being such that, no straight line path exists, from any point external to said stack, intersecting any point on any particular integrated circuit with an angle more than twenty degrees to the'plane of said particular integrated circuit, which does not pass through the substance of at least one of said slices. 14. An integrated circuit enclosure as claimed in Claim 13, wherein said slices are silicon slices, each more than ten microns thick. 15. Shielding eans for preventing ionising radiation from impinging onto a first integrated circuit, ,fabricated on at least part of the area ofpne of the plane faces of a first semiconducting lamina, said shielding means comprising a laminar, shielding member,constructed from material which is free of radioactive inclusions, and is of sufficient thickness for the prevention of passage therethrough of alpha articles with energies up to 10MeV, said laminar, shielding member being disposed in coplanar proximity to said first integrated circuit, so as to overlap entirely the area of said first integrated circuit, the amount of overlap being such that, the angle, measured normally from the surface of said semiconducting lamina, with apex at any point on the boundary edge of said first integrated circuit, to the point on the boundary edge of said overlapping, shielding member which is in closest proximity to said apex, is less than twenty degrees.

Inventors: WILKINSON, JOHN MALCOLM
Applicants: BURROUGHS CORPORATION
Application year: 1980
Main classification: H01L21
IPC codes: H01L21, H01L23