# Patent

## Title
Glass plate for substrate

## Abstract

Provided is a glass plate for a substrate, which comprises, as a glass matrix composition as represented by mass % based on oxide: SiO2: 70 to 80, Al2O3: 0.1 to 5, B2O3: 0 to 3, MgO: 9.5 to 12, where the amount of CaO+SrO+BaO is 0 to 2, and the amount of Na2O+K2O is 12.5 to 15.5, which has a density of at most 2.5 g/cm3, has an average coefficient of thermal expansion from 50 to 350° C. of more than 75×10−7/° C. and at most 87×10−7/° C., has a glass transition point of at least 560° C., has a brittleness of at most 6.5 μm−1/2, and has a heat shrinkage (C)of at most 20 ppm.

## Background
This application is a continuation of PCT Application No. PCT/JP2010/057290, filed on Apr. 23, 2010, which is based upon and claims the benefit of priority from Japanese Patent Application No. 2009-109699 filed on Apr. 28, 2009. The contents of those applications are incorporated herein by reference in its entirety.


TECHNICAL FIELD
The present invention relates to a glass plate for a substrate to be used for display panels such as a liquid crystal display (LCD) panel and a plasma display panel (PDP) and a substrate for a solar battery. The glass plate for a substrate of the present invention is particularly suitable as a glass plate for an LCD panel.
BACKGROUND ART
Heretofore, as a glass substrate for an LCD panel, an alkali-free glass containing no alkali metal oxide has been used. The reason is that if an alkali metal oxide is contained in a glass substrate, alkali ions in the glass plate will be diffused into a semiconductor film of a thin film transistor (TFT) to be used for driving an LCD panel during heat treatment carried out in a process for producing an LCD panel, thus leading to deterioration of the TFT characteristics.
Further, since an alkali-free glass has a low coefficient of thermal expansion and a high glass transition point (Tg), its change in dimensions in a process for producing an LCD panel is small, and the influence over the display quality by thermal stress at the time of use of the LCD panel is small, and accordingly it is preferred as a glass substrate for an LCD panel.
However, an alkali-free glass has the following drawbacks in view of production.
An alkali-free glass has very high viscosity and is hardly molten, and its production involves technical difficulty.
Further, in general, only a poor effect of a refining agent can be produced for an alkali-free glass. For example, in a case where SO3 is used as the refining agent, since the temperature at which SO3 is decomposed and released as bubbles is lower than the glass melting temperature, the most part of SO3 added is decomposed and volatilized from the molten glass before refining is carried out, and no sufficient refining effect will be achieved.
In recent development of technology, use of an alkali glass substrate containing an alkali metal oxide as the glass substrate for an LCD panel begins to be studied (Patent Documents 1 and 2). Since glass containing an alkali metal oxide generally has a high coefficient of thermal expansion, in order to obtain a coefficient of thermal expansion preferred as a glass substrate for an LCD panel, B2O3 having an effect to lower the coefficient of thermal expansion is usually contained (Patent Documents 1 and 2).
However, in the case of a glass composition containing B2O3, B2O3 is volatilized when the glass is melted particularly in a melting step and in a refining step, whereby the glass composition tends to be inhomogeneous. If the glass composition is inhomogeneous, flatness when the glass is formed into a plate shape tends to be influenced. A glass substrate for an LCD panel is required to have high flatness so as to keep a constant distance between two sheets of glass sandwiching a liquid crystal i.e. cell gap, so as to secure the display quality. Accordingly, in order to secure a predetermined flatness, after glass is formed into plate glass by float process, the surface of the plate glass is polished. If no desired flatness of the plate glass after forming is achieved, the time required for the polishing step will be long, thus lowering the productivity. Further, considering the environmental burden by volatilization of B2O3, the content of B2O3 in the molten glass is preferably lower, and it is more preferred that substantially no B2O3 is contained.
However, in a case where the B2O3 content is low, and further, in a case where substantially no B2O3 is contained, it has been difficult to lower the coefficient of thermal expansion to a level preferred as a glass substrate for an LCD panel. Further, it has also been difficult to obtain a predetermined Tg, etc. while the increase in the viscosity is suppressed. Further, an alkali glass substrate having a low B2O3 content, or further, containing substantially no B2O3, has a problem that it is easily damaged.
Patent Document 1: JP-A-2006-137631
Patent Document 2: JP-A-2006-169028


DISCLOSURE OF THE INVENTION
Objects to be Accomplished by the Invention
In order to solve the above problems of prior art, the object of the present invention is to provide a glass plate for a substrate which contains a very small amount of an alkali metal oxide and has a low B2O3 content, preferably contains substantially no B2O3, and which can be used as a glass substrate for an LCD panel or the like.
Means to Accomplish the Object
The present inventors have conducted extensive studies to achieve the above objects and as a result, accomplished the present invention.
That is, the present invention provides a glass plate for a substrate, which comprises, as a glass matrix composition as represented by mass % based on oxide:















SiO2
68 to 80,



Al2O3
0.1 to 5,  



B2O3
0 to 3,



MgO
9.5 to 12, 



CaO + SrO + BaO
    0 to 2, and



Na2O + K2O
12.5 to 15.5 









has a density of at most 2.5 g/cm3, has an average coefficient of thermal expansion from 50 to 350° C. of more than 75×10−7/° C. and 87×10−7/° C., has a glass transition point (Tg) of at least 560° C., and has a brittleness of at most 6.5 μm−1/2.

Effects of the Invention

The glass plate for a substrate of the present invention has an average coefficient of thermal expansion from 50 to 350° C. of more than 75×10−7/° C. and 87×10−7/° C. and a Tg of at least 560° C., and accordingly the change in dimensions in a process for producing a panel is small, and the influence over the display quality by thermal stress at the time of use of the panel is small. Thus, the glass plate is suitable particularly as a glass substrate for an LCD panel.
Further, the glass plate for a substrate of the present invention has a low B2O3 content, preferably contains substantially no B2O3, whereby volatilization of B2O3 is small, preferably there is no volatilization of B2O3 at the time of production of glass. Accordingly, the glass plate is excellent in homogeneity and flatness, and after a glass plate is formed, only a low degree of polishing of the glass plate surface is required, thus leading to excellent productivity.
Further, the glass plate for a substrate of the present invention is hardly damaged and has a brittleness as described hereinafter of at most 6.5 μm−1/2 and is thereby suitable as a glass plate for a display panel and as a glass plate for a solar battery.
The glass plate for a substrate of the present invention has a low density of at most 2.5 g/cm3, and is thereby preferred in view of handling efficiency, since its weight can be further saved when used as a display panel, particularly a large-sized display panel.
Further, the glass plate of the present invention has a heat shrinkage (C) (compaction (C)) of preferably at most 20 ppm, and accordingly the heat shrinkage is low in heat treatment at low temperature (150 to 300° C.) in a process for producing a TFT panel, and slippage of the film formation pattern on a glass substrate hardly occurs.
Further, according to the preferred embodiment of the glass plate for a substrate of the present invention, the viscosity is low particularly at the glass melting temperature, and accordingly starting materials are easily melted, and the production is easily carried out.
Further, when SO3 is used as a refining agent, the viscosity is low, and accordingly an excellent refining effect is achieved, and excellent bubble quality is achieved.
The glass plate for a substrate of the present invention is suitable as a glass substrate for an LCD panel, and can be used as a substrate for other displays, such as a plasma display panel (PDP) and an inorganic electroluminescence display. For example, when it is used as a glass plate for PDP, since it has a low coefficient of thermal expansion as compared with a conventional glass plate for PDP, breakage of glass in the heat treatment step can be suppressed.
Further, the glass plate for a substrate of the present invention can be used for application other than display panels. It can be used, for example, as a glass plate for a solar battery substrate.
BEST MODE FOR CARRYING OUT THE INVENTION
Now, the glass plate for a substrate of the present invention will be described.
In the following, % means “mass %” unless otherwise specified.
In the present specification, “to” means including numerical values described before and after “to” as the lower limit and the upper limit.
The glass plate for a substrate of the present invention comprises, as a glass matrix composition as represented by mass % based on oxide:















SiO2
68 to 80,



Al2O3
0.1 to 5,  



B2O3
0 to 3,



MgO
9.5 to 12, 



CaO + SrO + BaO
    0 to 2, and



Na2O + K2O
12.5 to 15.5 









has a density of at most 2.5 g/cm3, has an average coefficient of thermal expansion from 50 to 350° C. of more than 75×10−7/° C. and at most 87×10−7/° C., has a Tg of at least 600° C., and has a brittleness of at most 6.5 μm−1/2.

Preferably, the glass plate of the present invention contains substantially no B2O3.
The reason why the composition of the glass plate for a substrate of the present invention is limited to the above is as follows.
The glass plate for a substrate of the present invention has a B2O3 content of so low as at most 3%, preferably contains substantially no B2O3. Accordingly, in a melting step, a refining step and a forming step when glass is melted in production of a glass plate, particularly in a melting step and a refining step, volatilization of B2O3 is small, preferably there is no volatilization, and a glass plate to be produced is excellent in homogeneity and flatness. As a result, when the glass plate is used as a glass plate for an LCD panel which requires a high degree of flatness, the amount of polishing the glass plate is small as compared with a conventional glass plate for a display panel.
Further, considering the environmental burden by volatilization of B2O3, the B2O3 content is preferably lower. Accordingly, the B2O3 content is preferably at most 2.0%, and it is more preferred that substantially no B2O3 is contained. When reduction of bubbles in glass is considered, B2O3 is preferably contained in an amount of at most 2.0%, more preferably at most 1.5%, particularly preferably at most 1.0%.
In the present invention, “substantially no certain component is contained” means that the certain component is not contained except for inevitable impurities included from a starting material or the like, that is, it is not contained on purpose.
SiO2 is a component to form a skeleton of glass, and if its content is less than 68%, Tg will be lowered, and problems will arise such that the heat resistance and the chemical durability of the glass are lowered, the coefficient of thermal expansion is increased, the brittleness is increased, whereby the glass tends to be damaged, and the density is increased. However, if it exceeds 80%, problems will arise such that the devitrification temperature is increased, and the high temperature viscosity of the glass is increased, thus impairing the melting property.
The SiO2 content is preferably from 69 to 80%, more preferably from 70 to 80%, furthermore preferably from 71 to 79.5%.
Al2O3 is contained since it has effects to increase Tg, to improve the heat resistance and the chemical durability, and to lower the coefficient of thermal expansion. If its content is less than 0.1%, Tg will be lowered, and the coefficient of thermal expansion will be increased. Further, the heat shrinkage (C) will be high. However, if it exceeds 5%, problems will arise such that the high temperature viscosity of the glass is increased, thus impairing the melting property, the density is increased, and the devitrification temperature is increased, thus impairing forming properties.
The Al2O3 content is preferably from 0.5 to 4.5%, more preferably from 1 to 4%.
MgO is contained since it has an effect to lower the viscosity of the glass at the melting temperature thereby to accelerate melting, and an effect to suppress an increase in the brittleness. If its content is less than 9.5%, the effect to suppress an increase in the brittleness will be insufficient, and further, the high temperature viscosity of the glass will be increased, thus impairing the melting property. However, if it exceeds 12%, problems will arise such as the phase separation of the glass, an increase in the devitrification temperature, an increase in the density, an increase in Tg and an increase in the coefficient of thermal expansion.
The MgO content is preferably from 10 to 11.8%.
CaO, SrO and BaO have an effect to lower the viscosity of the glass at the melting temperature thereby to accelerate melting. However, if their content is high, the effect to suppress an increase in the brittleness by incorporation of MgO is inhibited, the heat shrinkage (c) becomes high, and accordingly their total content is at most 2%.
The total content of CaO, SrO and BaO is preferably at most 1%, more preferably at most 0.5%. Considering the environmental burden, it is preferred that substantially no BaO is contained.
Na2O and K2O are contained in a total content of at least 12.5% since they have an effect to lower the viscosity of the glass at the melting temperature thereby to accelerate melting, an effect to lower the brittleness and an effect to lower the denitrification temperature. However, if their total content exceeds 15.5%, problems will arise such that the coefficient of thermal expansion is increased, Tg is lowered, the heat shrinkage (c) becomes high, and the density is increased.
Further, Li2O may be contained so as to obtain the same effect as Na2O and K2O. However, incorporation of Li2O brings about a decrease in Tg, and accordingly the Li2O content is preferably at most 5%.
Further, in a case where Li2O is contained, the total content of Na2O, K2O and Li2O is preferably from 12.5 to 15.5%. However, considering to maintain a high Tg and to maintain a high refining effect by SO3, it is preferred that substantially no Li2O is contained.
In a case where the glass plate for a substrate of the present invention is used for an application for which insulating properties are required, it is preferred that logp=10.5 or more, more preferably logp=11 or more. Here, p is a resistance [Ωcm] at 150° C.
As described above, the glass plate for a substrate of the present invention preferably comprises, as a glass matrix composition, SiO2, Al2O3, MgO, CaO, SrO, Na2O and K2O.
For the glass plate for a substrate of the present invention, SO3 can be used as a refining agent. In the case of an alkali-containing glass such as the glass plate for a substrate of the present invention, SO3 can achieve a sufficient effect as a refining agent, since the temperature at which SO3 is decomposed and released as bubbles is higher than the temperature at which the starting materials become molten glass.
As a SO3 source, a sulfate such as potassium sulfate (K2SO4), sodium sulfate (Na2SO4) or calcium sulfate (CaSO4) is charged into the glass matrix composition material, and the amount of the sulfate is preferably from 0.05 to 1%, more preferably from 0.05 to 0.3% as calculated as SO3 to 100% of the matrix composition starting materials.
The remaining amount in the glass plate for a substrate is from 100 to 500 ppm, preferably from 100 to 400 ppm as calculated as SO3.
The glass plate for a substrate of the present invention may contain other components in addition to the above components within a range not to impair the glass plate. Specifically, it may contain F, CI, SnO2 and the like in a total content of at most 2%, preferably at most 1.5% to 100% of the matrix composition starting materials so as to improve the melting property of glass and the refining property.
Further, it may contain ZrO2, Y2O3, La2O3, TiO2, SnO2 and the like in a total content of at most 5%, preferably at most 2% to 100% of the matrix composition starting materials so as to improve the chemical durability of the substrate glass. Among them, Y2O3, La2O3 and TiO2 contribute also to an improvement in the Young's modulus of glass. In a case where a reduction of bubbles in glass is considered, ZrO2 is preferably contained in an amount of at most 2.0%, more preferably at most 1.5%, particularly preferably at most 1%.
Further, it may contain a colorant such as Fe2O3 or CeO2 so as to adjust the color tone of the substrate glass. The content of such a colorant is preferably at most 1 mass %, more preferably at most 0.3% in total to 100% of the matrix composition starting materials.
The glass plate for a substrate of the present invention preferably contains substantially no As2O3 nor Sb2O3 considering the environmental burden. Further, it preferably contains substantially no ZnO considering to carry out float process stably.
The glass plate for a substrate of the present invention has a density of at most 2.5 g/cm3.
The glass plate having a low density leads to prevention of breakage and an improvement in handling efficiency and is effective particularly when used as a glass substrate for a large-sized display. The density is preferably at most 2.47 g/cm3, more preferably at most 2.45 g/cm3.
The glass plate for a substrate of the present invention has an average coefficient of thermal expansion from 50 to 350° C. of more than 75×10−7/° C. and at most 87×10−7/° C., and accordingly when the glass plate for a substrate of the present invention is used as a glass plate for an LCD panel, the change in dimensions of a substrate in a heat treatment step carried out in production of an LCD panel is suppressed to a nonproblematic level.
In the present invention, the average coefficient of thermal expansion from 50 to 350° C. is a value measured by using a differential thermal dilatometer (TMA) and is a value determined in accordance with JIS R3102.
The average coefficient of thermal expansion from 50 to 350° C. is preferably more than 75×107/° C. and at most 85×10−7, more preferably more than 75×10−7/° C. and at most 80×107/° C.
The glass plate for a substrate of the present invention has a Tg of at least 560° C. When Tg is at least 560° C., the change in dimensions of a substrate in a heat treatment step carried out in production of an LCD panel can be suppressed to a substantially nonproblematic level. Tg is preferably at least 580° C., more preferably at least 600° C.
The glass plate for a substrate of the present invention is less likely to be damaged and is suitable for a display panel as compared with a conventional alkali glass plate merely containing substantially no B2O3. As an index of the damage resistance, the brittleness (B) can be employed. The brittleness (B) is a value calculated from the following calculation. When a Vickers indenter is pressed under a pressing load P to obtain the average “a” of two diagonal lengths of indentation and the average “c” of lengths of two crackings formed from four corners of the indentation (the total length of two symmetric crackings including the indentation).

B=2.39×(c/a)3/2×P−1/4 

In the above formula, the unit is μm regarding “c” and “a”, N regarding P, and μm−1/2 regarding B.
The glass plate for a substrate of the present invention has a brittleness of at most 6.5 μm−1/2, preferably at most 6.0 μm−1/2, more preferably at most 5.5 μm−1/2.
Now, a preferred embodiment of the glass plate for a substrate of the present invention will be described.
In the following, among the components of the glass plate for a substrate, further restricted points or specific points of the above-described glass plate for a substrate of the present invention (broader concept) alone are described, and description of points the same as the broader concept glass plate for a substrate is omitted.
The glass plate for a substrate of the present invention preferably has a heat shrinkage (C) of preferably at most 20 ppm. It is preferably at most 15 ppm, more preferably at most 10 ppm. Here, the heat shrinkage (C) means the glass heat shrinkage caused by relaxation of the glass structure at the time of heat treatment.
In the present invention, the heat shrinkage (C) means a shrinkage (ppm) in a distance between indentations obtained in such a manner that a glass plate is heated to the transition temperature Tg+50° C., held for one minute and then cooled to room temperature at 50° C./min, indentations are impressed on two portions with a predetermined distance on the surface of the glass plate, and then the glass plate is heated to 300° C., held for one hour and then cooled to room temperature at 100° C./hour.
The heat shrinkage (C) will be described more specifically.
In the present invention, the heat shrinkage (C) means a value measured by a method described below.
First, a glass plate to be measured is melted at 1,600° C., and the molten glass is cast, formed into a plate shape and then cooled. The obtained glass plate is subjected to polishing to obtain a sample of 100 mm×20 mm×2 mm.
Then, the obtained glass plate is heated to the transition temperature Tg+50° C., held at this temperature for one minute and then cooled to room temperature at a temperature-lowering rate of 50° C./min. Then, indentations are impressed at two portions in the long side direction with a distance A (A=90 mm) on the surface of the glass plate.
Then, the glass plate is heated to 300° C. at a temperature-increasing rate of 100° C./hour (=1.6° C./min), held at 300° C. for one hour, and then cooled to room temperature at a temperature-lowering rate of 100° C./hour. Then, the distance between the indentations are measured again, which is regarded as B. From A and B thus obtained, the heat shrinkage (C) is calculated by means of the following formula. Further, A and B are measured by an optical microscope.

C [ppm]=(A−B)/A×106 

According to the preferred embodiment of the glass plate for a substrate of the present invention, it comprises, as represented by mass % base on oxide:















Na2O
3 to 15.5, and



K2O
0 to 9.5









and where the viscosity is η [dPa·s], has a temperature which satisfies logη=2.5 of at most 1,450° C.

The glass plate for a substrate according to the preferred embodiment contains at least 3% of Na2O.
As described above, Na2O and K2O have an effect to lower the viscosity of the glass at the melting temperature thereby to accelerate melting, and further have an effect to lower the brittleness and an effect to lower the devitrification temperature. Further, Na2O has a high effect to lower the viscosity of the glass at the melting temperature thereby to accelerate melting as compared with K2O. Accordingly, the glass plate containing at least 3% of Na2O for a substrate according to the preferred embodiment has a feature such that where the viscosity is η [dPa·s], the temperature which satisfies logη=2.5 is at most 1,450° C., the viscosity is particularly low at the glass melting temperature, its starting materials are easily melted, and its production is easy. Further, since the glass plate has a low viscosity, an excellent refining effect by SO3 is achieved, and excellent bubble quality is achieved.
However, if the Na2O content exceeds 15.5%, problems will arise such that the coefficient of thermal expansion is high, Tg is lowered, and the density is increased, and further, the brittleness will rather be increased. Further, the heat shrinkage (C) becomes high.
The glass-plate for a substrate according to the preferred embodiment may contain at most 9.5% of K2O in order to lower the viscosity at the glass melting temperature, accelerate the melt and lower the brittleness. However, if the glass plate contains more than 9.5% of K2O, the expansion becomes excess. The glass plate for a substrate according to the preferred embodiment may contain at most 2% of Li2O in order to lower the viscosity at the glass melting temperature, accelerate the melt and lower the brittleness. If the glass plate contains more than 2% of Li2O, Tg becomes too low. From the viewpoint of cost for starting materials, the content of Li2O is preferably at most 1%, and it is more preferred that substantially no Li2O is contained.
To produce the glass plate for a substrate of the present invention, a melting/refining step and a forming step are preferably carried out in the same manner as in production of a conventional glass plate for a display panel. Here, the glass plate for a substrate of the present invention is an alkali glass substrate containing an alkali metal oxide (such as Na2O or K2O), and accordingly SO3 can effectively be used as a refining agent, and float process is suitable as a forming method.
In a process for producing a glass plate for a display panel, as a method of forming glass into a plate shape, preferred is to employ float process capable of easily and stably forming a glass plate having a large area, along with the production of a large-sized liquid crystal Tv, etc., in recent years.
In a melting step, starting materials of the respective components for the glass plate are prepared to achieve an aimed composition, and they are continuously charged to a melting furnace and heated to from 1,400 to 1,600° C. and melted. The resulting molten glass is formed to have a predetermined thickness by e.g. float process, annealed and cut to produce the glass plate for a substrate of the present invention.
EXAMPLES
Now, the present invention will be described in further detail with reference to Examples and Comparative Examples. However, it should be understood that the present invention is by no means restricted to such specific Examples.
Starting materials of the respective components were blended to achieve a desired composition (SiO2 to K2O) as identified by mass % in Tables, heated by using a platinum crucible at a temperature of from 1,500 to 1,600° C. for 3 hours and melted. For melting, a platinum stirrer was inserted and stirring was carried out for one hour to homogenize glass. Then, the resulting molten glass was cast, formed into a plate shape and then annealed.
Examples 1 to 7 are Examples of the present invention, and Examples 8 and 9 are Comparative Examples.
Of the glass thus obtained, the density (unit: g/cm3), the average coefficient of thermal expansion (unit: ×10−7/° C.), Tq (unit: ° C.), the brittleness (unit: μm−1/2), the resistivity ρ[Ωcm] at 150° C., the temperature T2.5 (unit: ° C.) at which the viscosity of the molten glass becomes 102.5 dPa·s and the temperature T4 (unit: ° C.) at which it becomes 104 dPa·s as the high temperature viscosity, and the heat shrinkage (C) (unit: ppm) were measured and shown in Table 1. Here, values in brackets in Tables are ones determined by calculation. Further, in Tables, “−” means that no measurement was carried out.
Methods for measuring the respective physical properties are shown below.
Density: About 20 g of a glass block containing no bubbles was subjected to measurement using a simple densitometer by Archimedes' Principle.
Average coefficient of thermal expansion: Measurement was carried out by using a TMA (differential thermal dilatometer), and the average coefficient of thermal expansion from 50 to 350° C. was calculated by a method in accordance with JIS R3102 (1995).
Tg: Tg is a value measured by using a TMA (differential thermal dilatometer), and was obtained by a method in accordance with JIS R3103-3 (2001).
Brittleness (B): It was calculated from the following calculation, when a Vickers indenter was pressed under a load P (23.52 N) to obtain the average “a” of two diagonal lengths of indentation and the average “c” of the lengths of two crackings formed from four corners of the indentation (the total length of two symmetric crackings including the indentation):

B=2.39×(c/a)3/2×P−1/4 

The unit is μm regarding “c” and “a”, N regarding P and μm−1/2 regarding B.
High temperature viscosity: Viscosities were measured by using a rotation viscometer, and the temperature T2.5 at which the viscosity became 102.5 dPa·s and the temperature T4 at which the viscosity became 104 dPa·s were measured.
In the present invention, the viscosity of 102.5 dPa·s was employed as an index to indicate that the viscosity of the glass melt is sufficiently low in the step of melting glass. The temperature T2.5 at which the viscosity becomes 102.5 dPa·s is preferably at most 1,450° C.
The viscosity of 104 dPa·s is a standard viscosity at the time of float process of glass. The temperature T4 at which the viscosity becomes 104 dPa·s is preferably at most 1,200° C.
Heat shrinkage (C): Measured by the above-described method for measuring the heat shrinkage (C).
















TABLE 1





Ex.
1
2
3
4
5
6
7
8
9
























SiO2
74.0
72.0
73.0
72.0
74.0
74.0
71.0
77.2
73.3


Al2O3
2.0
 3.0
 2.0
 2.0
 2.0
 2.0
 2.0
 0.0
 0.0


B2O3


 1.0
 2.0


MgO
11.0
11.0
11.0
11.0
10.0
10.0
11.5
 6.9
10.5


CaO




 1.0
 0.5


SrO





 0.5


BaO


Na2O
11.5
11.0
11.5
11.5
11.5
11.5
15.5
15.9
16.2


K2O
1.5
 3.0
 1.5
 1.5
 1.5
 1.5


CaO + SrO + BaO




 1.0
 1.0


Na2O + K2O
13.0
14.0
13.0
13.0
13.0
13.0
15.5
15.9
16.2


Density (g/cm3)
2.42
 (2.47)
 (2.42)
 (2.41)
 (2.42)
 (2.43)
 (2.49)
 (2.43)
 2.48


Average coefficient of
77
80  
(77)  
(76)  
(78)  
(78)  
86  
(83)  
(86)  


thermal expansion


[10−7/° C.]


Tg [° C.]
605
(610)  
(605)  
(600)  
(605)  
(605)  
(570)  
(530)  
(540)  


Brittleness [μm−1/2]
5.1
 (6.4)
 (5.4)
 (5.3)
 (5.4)
 (5.5)
 (6.5)
 (5.5)
 (6.4)


logρ
10.6
(11)  
—
—
(11)  
(11)  
(9) 
(8) 
(8) 


T2.5 [° C.]
1,440
(1,390)  
(1,440)  
(1,430)  
(1,440)  
(1,440)  
(1,300)  
(1,420)  
(1,300)  


T4 [° C.]
1,150
(1,180)  
(1,150)  
(1,140)  
(1,150)  
(1,150)  
(1,090)  
(1,140)  
(1,080)  


Heat shrinkage (C)
4
11  
—
—
—
—
15  
21  
22  


[ppm]









As evident from Table 1, glass in each of Examples of the present invention (Examples 1 to 7) has an average coefficient of thermal expansion of more than 75×10−7/° C. and at most 87×10−7/° C. and a Tg of at least 560° C., and accordingly when it is used as a glass plate for an LCD panel, the change in dimensions in a process for producing an LCD panel can be suppressed. Further, excellent flatness of glass is achieved since the B2O3 content is low, and in addition, it has a brittleness of at most 6.5 μm−1/2 and is hardly damaged although it has a low B2O3 content. Further, since it contains a very small amount of an alkali metal oxide, and is thereby excellent in the refining effect.
Further, as evident from Table 1, glass in each of Examples of the present invention (Examples 1 and 2) has a heat shrinkage (C) of at most 20 ppm, and accordingly when it is used as a glass plate for a TFT panel, heat shrinkage of the glass plate can be suppressed in heat shrinkage at low temperature in a process for producing a TFT panel.
Glass in each of Examples (Examples 1 to 7) has T2.5 of at most 1,450° C. and has a low viscosity particularly in a glass melting step, and accordingly particularly high productivity is achieved, and an excellent refining effect is achieved.
On the other hand, glass in each Examples 8 and 9 has a Tg of less than 560° C., and accordingly the change in dimensions when heat load is applied as in a process for producing a panel and at the time of use of a panel, is large.
Further, glass in each of Examples 8 and 9 has a heat shrinkage (C) of higher than 20 ppm, and accordingly when such a glass is used as a glass plate for a TFT panel, heat shrinkage after a low temperature heat treatment is large in a process for producing a TFT panel, the change in pattern size such as wirings results, and problems may arise in the production of TFT devices, etc.
Industrial Applicability
The glass plate for a substrate of the present invention is industrially useful as a glass substrate for an LCD panel, a glass plate for a solar battery substrate, etc., since the change in dimensions in a process for producing a panel is small, the influence over the display quality by thermal stress at the time of use of a panel is small, and further, the B2O3 content is low, and substantially no B2O3 is contained, whereby volatilization of B2O3 is small at the time of production of glass, and the environmental burden can be reduced.

## Claims

1. A glass plate for a substrate, which comprises, as a glass matrix composition as represented by mass % based on oxide:















SiO2
70 to 80,



Al2O3
0.1 to 5,  



B2O3
0 to 3,



MgO
9.5 to 12, 



CaO + SrO + BaO
    0 to 2, and



Na2O + K2O
12.5 to 15.5,









has a density of at most 2.5 g/cm3, has an average coefficient of thermal expansion from 50 to 350° C. of more than 75×10−7/° C. and at most 87×10−7/° C., has a glass transition point of at least 560° C., has a brittleness of at most 6.5 μm−1/2, and has a heat shrinkage (C) of at most 20 ppm.

2. The glass plate for a substrate according to claim 1, which contains substantially no B2O3.

3. The glass plate for a substrate according to claim 1, which has a heat shrinkage (C) of at most 15 ppm.

4. The glass plate for a substrate according to claim 1, which contains, as represented by mass % based on oxide:















Na2O
3 to 15.5, and



K2O
0 to 9.5









and, where the viscosity is η [dPa·s], has a temperature which satisfies logη=2.5 of at most 1,450° C.

5. The glass plate for a substrate according to claim 1, which comprises from 71 to 80 mass % based on oxide of the SiO2.

6. The glass plate for a substrate according to claim 1, wherein the heat shrinkage (C) is at most 10 ppm.

7. The glass plate for a substrate according to claim 1, which has a density of at most 2.47 g/cm3.

8. The glass plate for a substrate according to claim 1, which has a density of at most 2.45 g/cm3.

9. The glass plate for a substrate according to claim 1, which has an average coefficient of thermal expansion from 50 to 350° C. of more than 75×10−7/° C. and at most 85×10−7/° C.

10. The glass plate for a substrate according to claim 1, which has an average coefficient of thermal expansion from 50 to 350° C. of more than 75×10−7/° C. and at most 80×10−7/° C.

11. The glass plate for a substrate according to claim 1, which has a glass transition point of at least 580° C.

12. The glass plate for a substrate according to claim 1, which has a glass transition point of at least 600° C.

13. The glass plate for a substrate according to claim 1, which has a brittleness of at most 6.0 μm−1/2.

14. The glass plate for a substrate according to claim 1, which has a brittleness of at most 5.5 μm−1/2.