# Patent

## Title
Termination layer-compensated tunneling magnetoresistance in ferrimagnetic Heusler compounds with high perpendicular magnetic anisotropy

## Abstract

A layered stack includes a first layer having a first spin polarization and a first magnetic moment, as well as a second layer (in contact with the first layer) having a second spin polarization a second magnetic moment. The first and second spin polarizations have the same orientation, but the first and second magnetic moments have orientations that partially cancel each other, thereby recommending the layered stack for applications in magnetic tunnel junctions, for example.

## Background
TECHNICAL FIELD
The invention relates to magnetic tunnel junction magnetoresistive devices, and more particularly, to a magnetic random access memory that employs such devices.
BACKGROUND
Heusler compounds have significant potential for magnetic electrodes in magnetic tunnel junction (MTJ) memory elements that require perpendicularly oriented moments. Although high tunneling spin polarization has been observed in soft, ferro-magnetic Heusler compounds, and predicted for hard, ferri-magnetic Heusler materials, such as Mn3-xGa and Mn3Ge, there has been no experimental observation to date of high tunneling magnetoresistance (TMR) in the latter.
SUMMARY
A preferred embodiment of the invention is a layered stack that includes a first layer having a first tunneling spin polarization and a first magnetic moment, and a second layer having a second tunneling spin polarization and a second magnetic moment; the first and second layers are in contact with each other. The first and second tunneling spin polarizations have the same orientation, whereas the first and second magnetic moments have orientations that partially cancel each other.
One preferred aspect of the invention is a method, in which current is passed through the layered stack, with the stack acting as a reference layer in a storage device. Another preferred aspect of the invention is a method, in which current is passed through the layered stack, with the stack acting as a free layer in a storage device. That is, the layered stack can be incorporated into a magnetic tunnel junction device (a storage device).



BRIEF DESCRIPTION OF THE DRAWINGS
FIGS. 1A, 1B, 1C, and 1D. Mn3Ge Hensler Films with Giant Perpendicular Magnetic Anisotropy
FIG. 1A Magnetization (M) vs. field (H) hysteresis loops of Mn3Ge films grown on a Si(001)/SiO2 substrate with “TI” (TaN/IrMn3; bottom left panel) and “TIT” (TaN/IrMn3/TaN; top four panels) underlayers, as well as a MgO(001) substrate with “MC” (MgO/Cr; bottom right panel) underlayers. TI (TIT) have the following structure: Si(001)/SiO2/200 Å TaN/200 Å IrMn3 (/10 Å TaN), while MC has the following structure: MgO(001)/20 Å MgO/400 Å Cr. For the TIT films, the thickness of the Mn3Ge layer, deposited using the 3-step process, was varied. Out-of-plane (in-plane) M vs. H loops are shown as solid lines (open squares).
FIGS. 1B and 1D are schematics of the MTJ structures grown on Si(001)/SiO2 and MgO(001) substrates, respectively. In some cases a TaN diffusion barrier layer was used. For characterization of structural, topographical and magnetic properties of the Mn3Ge films, a 30 Å Ta film was used as a capping layer instead of the uppermost layers Ru, Ta, CoFeB, and MgO.
FIG. 1C Top panel—magnetic moment m extrapolated from FIG. 1A versus Mn3Ge thickness. The solid straight line shows the calculated moment of bulk D022-Mn3Ge10. Bottom panel—coercive field HC (solid triangles) and uniaxial magnetic anisotropy constant KU (empty squares). As shown in FIG. 1A, the Mn3Ge magnetization cannot be saturated in-plane using the available magnetic field (7 T); thus, Heff is a lower bound.
FIGS. 2A, 2B, 2C, and 2D. Characteristics of Mn3Ge-Based Magnetic Tunnel Junctions
FIG. 2A TMR vs. H (perpendicular to the device) measured at 300 K (smaller squares) and 3 K (larger squares) for MTJ devices grown using TI (open squares) and TIT (solid squares) underlayers. For the TIT junction, two sets of data were measured at 3 K (larger squares) after cooling down the device from 300 K in a magnetic field of +9 T and −9 T, respectively. These data are mirror images of each other, as can be seen in the figure. All the other measurements were performed without field-cooling.
FIG. 2B Temperature dependence of TMR (top panel), and RPA and RAPA (bottom panel).
FIG. 2C MgO thickness dependence of TMR (open symbols) and RAPA product (solid symbols), averaged over more than 20 devices. Solid and dashed lines are guides to the eye for RAPA and TMR, respectively. RAPA scales exponentially with barrier thickness.
FIG. 2D HRTEM image of an MTJ device  ̃27 nm in size, with the structure: Si/250 Å SiO2/200 Å TaN/200 Å IrMn3/300 Å Mn3Ge/15 Å MgO/15 Å CoFeB/50 Å Ta/50 Å Ru.
FIGS. 3A, 3B, 3C, and 3D. Magnetics and TMR Properties of Mn2CuSb Hensler Alloy.
FIG. 3A Out-of-plane M vs. H hysteresis loops, at 300 K, of 300 Å thick Mn2CuSb films grown on a MC MgO(001) substrate at room temperature and post-annealed at 300° C. (squares) and 400° C. (circles) for 30 min. The anneal treatments were carried out in a high-vacuum anneal furnace, in an applied magnetic field of 1 T (out-of-plane direction) for 30 min.
FIG. 3B Out-of-plane m vs. H hysteresis loop of an MTJ film measured before lithography patterning.
FIG. 3C Two-terminal junction R vs. H loop of a patterned MTJ device (1×2 μm2 size).
FIG. 3D Schematic of a Mn2CuSb based MTJ, with the structure: MgO(001)/20 Å A 400 Å Cr/300 Å Mn2CuSb/25 Å MgO/14 Å CoFeB/4 Å Ta/7 Å CoFeB/50 Å Ta/100 Å Ru. The Mn2CuSb electrode was deposited at 300 K and in-situ annealed at 300° C. before the MgO barrier deposition. The entire stack was then post-annealed at 325° C. for 30 min.
FIGS. 4A, 4B, 4C, and 4D. TMR Theoretical Calculations for Mn3Ge/MgO/Fe, Fe/MgO/Fe, and Mn2CuSb/MgO/Fe Tunnel Junctions.
FIG. 4A TMR for Mn3Ge/MgO/Fe and Fe/MgO/Fe MTJs versus NMgO. TMR for Mn3Ge/MgO/Fe MTJ with Mn—Mn termination is shown by solid squares, and with Mn—Ge termination by solid circles; the TMR for the device with “steps” (half of the device area having Mn—Mn termination and half of the area having Mn—Ge termination) is shown by diamonds. The TMR for Fe/MgO/Fe MTJ calculated by the TB-LMTO method is shown by triangles, whereas the TMR calculated by the layer KKR method (ref. 16) is shown by the open circles.
FIG. 4B Schematic of atomic step between two distinct terminations with opposite magnetic moments for Mn3Ge. Note that the Mn—Mn layer is periodically penetrated by the MgO layer, so that the Mn—Mn layer has a crenellated structure. Arrows on each of the Mn atoms indicate the direction of local magnetic moment. Tunneling spin polarization (TSP) of each layer for intermediate MgO thickness (4<NMgO<10) is shown on the right. Note that although the spin polarization of both native termination layers is negative; the tunneling spin polarization (spin polarization of tunneling electrons across the MgO barrier) has the opposite sign due to the BZ filtering effect.
FIG. 4C The TMR for Mn2CuSb/MgO/Fe MTJ with Mn—Sb termination is shown by solid squares and with Mn—Cu termination by circles; the TMR for the device with “steps” (half of the device area having Mn—Cu termination and half of the area having Mn—Sb termination) is shown by diamonds.
FIG. 4D Schematic of atomic step between two distinct terminations with opposite magnetic moments for Mn2CuSb. Note that the Mn—Cu layer is periodically penetrated by the MgO layer, so that the Mn—Cu layer has a crenellated structure. Arrows on each of the Mn atoms indicate the direction of the local magnetic moment. The tunneling spin polarization of each layer is shown on the right.



Note that in FIG. 4A and FIG. 4C, the TMR for the termination with the larger magnetic moment is shown by solid squares for both Mn3Ge and Mn2CuSb. In FIG. 4B and FIG. 4D, the direction of the magnetic moments shown for the different termination layers for the different steps corresponds to the sign of the TMR for the corresponding solid circles and solid squares, where pointing up (down) direction of the arrow is assumed to indicate positive (negative) sign. Arrows on each of the Mn atoms indicate the direction of the local magnetic moment. The tunneling spin polarization of each layer is shown on the right.
FIG. 5 Schematic of atomic step between two distinct terminations with opposite magnetic moments for a typical Heusler alloy of the type Mn2YZ. Depending on the choices of element Y and Z, the sign of tunneling spin polarization for the Mn—Y and the Mn—Z layer could be the same. The tunneling spin polarization of each layer is shown on the right.
DETAILED DESCRIPTION
We report the preparation of highly textured, polycrystalline Mn3Ge films on amorphous substrates, with very high magnetic anisotropy fields exceeding 7 T, making them technologically relevant. However, the TMR is negative and much smaller than theoretical predictions for tunnel junction devices formed with MgO tunnel barriers. This is attributed to dominant tunneling from the lower moment Mn—Ge termination layers, which have a magnetization opposite to that of the higher moment Mn—Mn layers. The net spin polarization of the current reflects the different proportions of the two distinct termination layers and their associated tunneling matrix elements at the tunnel barrier interface. A second perpendicularly magnetized Heusler compound, Mn2CuSb, identified by computational materials discovery methods, likewise displays small TMR, but in that case the sign of the tunneling spin polarization of each of the termination layers is opposite to that of their magnetization, in contrast to Mn3Ge. Therefore, the low TMR found in Mn3Ge and Mn2CuSb, attributed herein to termination layer compensation, is not an inherent property of ferrimagnetic Heuslers. The tunneling spin polarization of the two termination layers can be engineered to be of the same sign even though these layers are oppositely magnetized, therefore providing a path to low magnetization electrodes with high TMR for high density spin transfer torque MRAM (magnetic random access memory) applications.
Key to the successful development of magnetic random access memory (MRAM), one of the most promising emerging non-volatile memory technologies, are magnetic materials (for the magnetic tunnel junction memory elements) that have sufficient stability against thermal fluctuations to sustain deeply scaled devices. The most promising magnetic materials to date are magnetic alloys formed from Co, Fe and B, in conjunction with MgO(001) tunnel barriers1-3.
The magnetic electrodes must possess sufficiently high perpendicular magnetic anisotropy (PMA) that their magnetizations lie perpendicular to the plane of the MTJ device, since this allows for reduced currents to switch the magnetization of the electrode that forms the memory layer of the device using spin torque3,4. The PMA of a Co—Fe—B layer arises from the interface between this layer and the tunnel barrier and/or the underlayer on which the Co—Fe—B layer is deposited. Thus, a Co—Fe—B layer must be made sufficiently thin that the interface PMA overcomes the demagnetization energy that arises from the magnetic volume and increases in proportion with the magnetic volume of the Co—Fe—B layer. In practice, this means that the PMA is too weak to overcome thermal fluctuations when the device has a critical dimension less than  ̃20 nm in size, since the thickness of the magnetic layer has to be (i) below that required to maintain its moment perpendicular and (ii) below that needed to switch the magnetic layer with reasonable current densities. Magnetic materials in which the PMA is derived from volume magnetocrystalline anisotropy are then needed.
One of the most promising class of such materials are the Heusler alloys—compounds having the chemical formula X2YZ or X′X′′YZ, wherein X, X′, X′′ and Y are transition metals or lanthanides (rare-earth metals) and Z is from a main group metal5. Some of these compounds are ferromagnetic or ferrimagnetic, depending on the exchange interaction between the magnetic moments on the X and/or Y sites. Moreover, while the parent Heusler compounds are cubic and exhibit weak or no significant magnetic anisotropy, the structure of some of these compounds is found to be tetragonally distorted: Due to this distortion the magnetization exhibited by these compounds may be aligned along the tetragonal axis. Thus, thin films formed from such materials may exhibit PMA due to a magnetocrystalline anisotropy associated with the tetragonally distorted structure. Some examples of such tetragonal Heusler compounds are Mn3-xGa6 and Mn3Ge7.
Thin films of these materials have been shown to exhibit large PMA but, to date, all work on these materials has involved films that are grown epitaxially on single crystalline substrates such as SrTiO3(001) or MgO(001) using seed layers formed from a variety of materials but preferably Cr or Pt7,8. Such single crystalline substrates are not useful for MRAM applications in which the MTJs must be deposited on wires formed from polycrystalline copper, which may be covered with other layers that are also polycrystalline or amorphous. Here it is shown that thin films of ferrimagnetic Mn3Ge with giant PMA can be grown on amorphous substrates (Si(001)/SiO2) using underlayers formed from TaN/IrMn3 (TI). The magnetic properties of these films are comparable or superior to films grown under similar conditions on single crystal MgO(001) substrates using epitaxial Cr(001) underlayers.
Highly textured, polycrystalline and tetragonal Mn3Ge films were grown by either ion-beam deposition (IBD) or dc-magnetron sputtering in an ultra-high vacuum (UHV) chamber with a base pressure of  ̃4×10−10 Torr on Si(001) substrates covered with 250 Å of amorphous SiO2. Seed layers formed from bilayers of TaN/IrMn3 that are first deposited on the SiO2 induce (001) textured Mn3Ge films that are tetragonally distorted. IrMn3 is known to have a L12 structure, which is cubic and matches one of the sub-lattices of the structure that Mn3Ge is known to form. Moreover, the lattice mismatch between IrMn3 and Mn3Ge is less than 1%. The TaN layer, which is grown by reactive sputtering, promotes the growth of (001) textured IrMn3, since fcc-IrMn3 favors the (111) out-of-plane orientation when grown directly on the amorphous SiO2 surface. However, in contrast to theoretical predictions of giant values of TMR6,9 for MTJs using Mn3Ge electrodes, much smaller values are found experimentally, which are attributed to compensation in the tunneling spin current polarization from atomic layer variations of the electrode surface termination at the tunnel barrier interface. It is suggested herein that this is a consequence of ferrimagnets with layer-by-layer alternation of magnetization, when the tunneling spin polarization of these layers compensates each other. This hypothesis was confirmed by preparing MTJs using another ferri-magnetic Heusler compound, Mn2CuSb, which also shows high PMA but yet very small TMR.
The structural and magnetic properties of a Mn3Ge film depend sensitively on its composition and atomic order. The latter is strongly influenced by the deposition temperature and subsequent anneal conditions, which also affect the smoothness of the Mn3Ge film. In order to achieve optimal MTJ performance the electrode must be atomically smooth. The root mean square (rms) roughness of the Mn3Ge film, rrms, measured using atomic force microscopy (AFM), is found to increase significantly when the growth temperature (TG) exceeds modest temperatures of just  ̃200° C., but higher growth temperatures are needed to sustain the Heusler structure, as measured from x-ray diffraction. Thus, an optimal growth method includes a 3-step process for the Mn3Ge electrode, in which an initial 20 Å Mn3Ge layer is grown at 450° C., followed by a thicker Mn3Ge layer deposited at TG=150° C., with a final in-situ anneal at 450° C. for 1-2 h in vacuum, thereby giving smooth films (rrms ̃3 Å) with high PMA. During the annealing step of Mn3Ge films, there is substantial inter-diffusion between the IrMn3 and Mn3Ge layers, which causes deterioration of the magnetic properties of Mn3Ge. This inter-diffusion was prevented by using a thin 10-20 Å TaN barrier between IrMn3 and Mn3Ge layers, as revealed by electron energy loss spectroscopy (EELS) measurements. Thus, the preferred underlayer is formed from TaN/IrMn3/TaN (TIT). On the other hand, a single TaN underlayer was found to give much poorer quality Mn3Ge layers.
FIG. 1 compares the magnetic properties of Mn3Ge films of varying thicknesses grown on amorphous substrates using the aforementioned 3-step process and on a crystalline MgO(001) substrate with a Cr seed layer (MC). Excellent PMA is observed in all cases but the highest coercive and anisotropy fields are found for structures grown on the TIT underlayer. Coercive fields of 6 T and anisotropy fields exceeding 7 T are found. FIG. 1C summarizes the magnetic moment m, coercivity HC, and uniaxial magnetic anisotropy KU for these films. Values of m for Mn3Ge films grown on TIT underlayers are close to those theoretically predicted for bulk Mn3Ge10, but m is significantly lower by  ̃15-35% for Mn3Ge films grown using TI underlayers or a MC single crystal substrate. For the latter film, the magnetic anisotropy KU is substantially lower, which is attributed to the large lattice mismatch ( ̃7%) between Cr and Mn3Ge.
MTJ devices were fabricated using standard lithographic techniques from film stacks whose structures are illustrated in FIG. 1B. The reference electrode was formed from the Mn3Ge Heusler compound, and the free electrode from an ultrathin layer of CoFeB having a composition of 20:60:20. Before patterning, these films were post-annealed at 350° C. for 60 minutes in a high-vacuum chamber using an applied magnetic field of 1 T directed out of the plane of the sample. Devices with sizes of 1×2 μm2 and  ̃30 nm in diameter were fabricated by optical lithography and e-beam lithography, respectively. Only the free layer was patterned to define the junction size, while the reference layer was not patterned.
FIG. 2A compares TMR versus perpendicular magnetic field measured at 300 K and 3 K for patterned MTJ devices (1×2 μm2) using TI and TIT underlayers. In each case high applied magnetic fields (±9 T) are needed to align the magnetic moments of the Mn3Ge and CoFeB layers parallel to each other (P state) because of the giant uniaxial anisotropy of Mn3Ge. The junction resistance is higher in the P state compared to the antiparallel (AP) state, obtained when the CoFeB moment switches close to zero field. Thus, the TMR ([(RAP−RP)/RAP]×100) is negative with values of  ̃−35% at 300 K and  ̃−74% at 3 K, where RP and RAP are the junction resistances in the P and AP states, respectively. These are the highest values of TMR reported to date in perpendicularly-magnetized MTJ devices using a tetragonally distorted Heusler compound as a magnetic electrode. Nonetheless, these values are much smaller than those predicted by density functional theory (DFT) calculations, as discussed below.
For a given MTJ device RAP barely changes, while RP increases monotonically as T decreases, resulting in higher TMR at low temperatures (FIG. 2B). These properties as well as the dependence of the resistance-area product RAPA and TMR on the barrier thickness (FIG. 2C) are characteristic of a high quality tunnel barrier. A cross-sectional high-resolution transmission electron microscopy (HRTEM) image of a typical MTJ device with a width of 27 nm, shown in FIG. 2D, illustrates the high quality of the structure and the device patterning.
Notwithstanding the exceptionally high PMA values exhibited by polycrystalline Mn3Ge films, the surprisingly low TMR values lessen their potential importance for MTJ devices. As discussed below, this is attributed to their ferrimagnetic structure. This limitation could be overcome by identifying Heusler compounds which display high PMA and which are ferromagnetic.
To identify potential candidate tetragonal materials, computational materials discovery methods were used to calculate the structure and electronic properties of several hundred Heusler compounds (with X=Mn, Fe, Co, Ni, Cu, Ru, Rh, Pd; Y=Sc, Mn, Fe, Co, Ni, Cu, Ru, Rh, Pd, Os, Ir, Pt; and Z=Al, Si, Ga, Ge, In, Sn, Sb) for both the regular and inverse structures and for ferri- and ferro-magnetic configurations. Surprisingly, approximately 40% of these compounds are calculated to be tetragonal in their ground state. By rank ordering these tetragonal compounds according to the combination of the energy difference between the tetragonal and cubic structures and that between the inverse and regular structures, about 30 possible candidate tetragonal materials were identified, in which the average energy difference exceeded  ̃0.3 eV per formula unit. For each of these, a 8 in thin film form was prepared using the same buffer layers and deposition conditions discussed above. Half of these compounds showed a tetragonal structure and two showed excellent PMA properties, namely, Mn2CuSb and Rh2CoSb. In the other cases, we speculate that the theoretical predictions were not borne out due to atomic disorder on the X and Y sites. This is especially true when X and Y have similar chemical properties or atomic size.
Similar magnetic properties were found for Mn2CuSb and Rh2CoSb films grown using either TI underlayers or an MC crystalline substrate, but the latter films were typically smoother and better suited for MTJ studies. Results are shown in FIG. 3 for Mn2CuSb. Square magnetic hysteresis loops consistent with PMA are found. The calculated lowest energy configuration of Mn2CuSb is a tetragonal ferromagnetic regular Heusler with a moment of 5.4 μB per formula unit (see Table 1). Although the deposited films are tetragonal, in agreement with the calculations, the measured c/a ratio is much smaller in the films (ct/√{square root over (2)}at ̃1.1) than that predicted for a fully ordered Mn2CuSb bulk compound (ct/√{square root over (2)}at ̃1.4), and thus only slightly distorted from the cubic phase. Moreover, the magnetization of the films is much too low ( ̃0.4 μB per formula unit) to be consistent with the predicted ferromagnetic state, as is the TMR, as discussed below. These findings can be explained by the likelihood of chemical disorder within the deposited films. Note that the calculations predict that, for the cubic phase, the structure will be the inverse structure with a ferrimagnetic ordering, with a low moment (see Table 1).
MTJ devices were prepared from Mn2CuSb films with the layer stack shown in FIG. 3D and the magnetic hysteresis loop shown in FIG. 3B. The latter shows clear independent switching of the free layer (CoFeB) and the reference layer (Mn2CuSb), but TMR curves measured on 1×2 μm2 size devices show only very small TMR values of  ̃−1% (FIG. 3C).
Ab initio calculations of the electronic structure and transport properties of Mn3Ge/MgO/Fe and Mn2CuSb/MgO/Fe MTJs were performed (see below for details of the calculations). Note that bcc Fe was used rather than CoFeB as in the experiments, in order to simplify the calculations. The TMR for Mn3Ge/MgO/Fe MTJs is shown in FIG. 4A as a function of the number of MgO layers, NMgO. Two definitions of TMR are shown: (TP−TAP)/min(TP,TAP), which can vary from −∞ to ∞ (this is used for the experimental data) and (TP−TAP)/(TP+TAP), which can vary from −1 to 1. Here TP and TP are the transmission functions (calculated at zero bias voltage) corresponding to the P and AP states, respectively. The most important result is that the TMR depends sensitively on the atomic configuration of the termination layer in the Mn3Ge adjacent to the MgO tunnel barrier. The TMR has opposite signs for the two termination layers, Mn—Mn and Mn—Ge, increasing in magnitude with NMgO for Mn—Mn but decreasing in magnitude for Mn—Ge. These results can be understood from the layer dependent spin-dependent density of states calculated for the bulk electronic structure of Mn3Ge, and the well understood symmetry spin-filtering properties of the MgO/Fe interface. The spin polarization of the native termination layers is negative in both cases but much higher for Mn—Ge. A Brillouin zone (BZ) filtering effect11 arising from the Mn3Ge/MgO interface tends to make the TMR positive for both terminations as the MgO layer thickness is increased. Thus, resultant tunneling spin polarization (TSP), the spin polarization of electrons which tunnel through the barrier, and the TMR is negative for Mn—Ge, but positive for Mn—Mn for intermediate MgO thicknesses of experimental interest. The balance between the native spin polarization and the BZ filtering accounts for the dependence of the TMR on NMgO and the termination layer.
These calculations give a natural explanation for the low TMR values found experimentally using Mn3Ge electrodes. Even though the Mn3Ge/MgO interface is very smooth (FIG. 2D), inevitably there will be atomic scale fluctuations in the morphology of the Mn3Ge layer that gives rise to regions with Mn—Mn and Mn—Ge terminations, due to the fundamental underlying structure of the Heusler compound (see illustration in FIG. 4B). The simplest way to model such fluctuations is to average the transmission functions over the different terminations (separately for P and AP states), assuming that the MgO thickness is the same across the device. The TMR calculated from this simple model with an assumption of equal areas occupied by Mn—Ge and Mn—Mn terminations is shown in FIG. 4A. The calculations give a negative TMR since both TP and TAP for the Mn—Ge termination are larger than those for the Mn—Mn termination (for all NMgO considered—ranging from 2 to 12). The negative TMR is consistent with the experimental measurements. Note that due to the large 10.5% lattice mismatch between MgO and Mn3Ge, the BZ filtering effect, which critically depends on the existence of the well-defined 2D Brillouin zone of the Mn3Ge/MgO interface, is likely more suppressed in actual devices as compared to the large negative spin polarization effect, which is less sensitive to the existence of the 2D BZ. Thus, both ‘ideal crystal’ theoretical simulations (FIG. 4A) and non-ideal crystal arguments predict negative TMR for the Mn3Ge/MgO/Fe system, in agreement with experimental results. Moreover, the low temperature TMR value of −75% found experimentally ( ̃27 Å thick MgO: FIG. 2B) is in surprisingly good agreement with that calculated for the Mn—Ge termination with NMgO=12, assuming no contribution to the TMR from the regions with Mn—Mn termination.







TABLE I







Calculated by DFT-based VASP12 program total energy, Etot, lattice parameters and


magnetic moments for different configurations of Mn2CuSb Heusler alloy (T = 0 K).
















Coupling

Lattice


Lattice





of the

constant

Etot in
constant
Lattice




magnetic
Etot in
ac in
Magnetic
tetra-
at in
constant
Magnetic



moments
cubic
cubic
moment in
gonal
tetragonal
ct in
moment in


Heusler
of two Mn
phase
phase
cubic
phase
phase
tetragonal
tetragonal


structure
atoms
(eV)
(Å)
phase (μB)
(eV)
(Å)
phase (Å)
phase (μB)





Regular
ferro
−25.111
6.23
6.4
−25.569
3.86
7.80
5.4


Regular
ferri
−25.107
6.28
0






Inverse
ferro
−24.840
6.12
4.3
−25.292
3.83
8.19
6.1


Inverse
ferri
−25.176
6.22
1.0
−25.272
3.95
7.82
0.4









The calculated TMR versus NMgO for Mn2CuSb/MgO/Fe MTJs with Mn—Sb and Mn—Cu terminations at the MgO interface are compared in FIG. 4C. The calculated magnetic moment of the Mn—Sb layer (3.2μB) is larger than that for the Mn—Cu layer (−2.8μB). Interestingly, the native spin polarization of the termination layers is of the opposite sign of the magnetic moment direction of these layers, whereas for Mn3Ge the native spin polarization is negative for both terminations. Moreover, there is no significant BZ filtering effect for Mn2CuSb/MgO. In this case the dependence of the TMR on NMgO is due to the symmetry spin filtering effect from MgO/Fe, as can be seen from FIG. 4C by comparing the calculated TMR for Mn2CuSb/MgO/Fe, for both terminations. For the Mn2CuSb/MgO/Fe MTJ, a negative TMR is predicted for the termination layer with the largest magnetic moment (Mn—Sb), whereas for Mn3Ge/MgO/Fe the opposite is the case. The TMR calculated for an MTJ with equal areas of Mn—Cu and Mn—Sb terminations is shown in FIG. 4C. The resulting TMR is significantly reduced due to the cancellation of contributions from the different terminations and has an overall negative sign (for NMgO>2). The negative sign of TMR and its small value agrees with the experimental findings.

In summary, highly textured ferrimagnetic Heusler films with large perpendicular anisotropy have been grown on amorphous substrates, thereby opening a path to their potential use for many applications such as magnetic recording media and rare-earth free hard magnets. However, the TMR is strongly influenced by unavoidable atomic steps at the tunnel barrier interface. When the two termination layers have opposite tunneling spin polarizations they compensate one another leading to low TMR, as is the case for both Mn3Ge and Mn2CuSb. However, the tunneling spin polarization can be aligned either parallel, as in the case of Mn3Ge, or anti-parallel, as in the case of Mn2CuSb, to the magnetization of the termination layers. In conclusion, the most interesting and technologically useful ferrimagnetic Heusler material will have termination layers with the same sign of the tunneling spin polarization, i.e., for one termination layer the tunneling spin polarization is parallel to the magnetization, and for the other it is the opposite. Such technologically promising materials have been identified by the use of computational techniques and are listed below in Table II.







TABLE II







List of tetragonal ferrimagnetic Heusler alloys predicted 


to have same sign of native spin polarization for each 


termination layer and same sign of BZ filtering effect 


and total native spin polarization. Total spin polarization 


and spin polarization of the two distinct termination layers 


(Mn-Y and Mn-Z layer) are also included. Mn3Ge and 


Mn2CuSb are also included here for comparison. Some of 


them, marked as bold, show high spin polarization (>0.7)


and/or BZ filtering effect. FIG. 5 illustrates the Mn-Y and 


Mn-Z terminations for Heuslers of the type Mn2YZ.












Heusler
BZ filtering
BZ filtering
spin pol.
spin pol.
spin pol.





Mn2YZ
Is there any 
Is sign of 
total
Mn-Y 
Mn-Z 



BZ filtering 
BZ filtenng 

layer
layer



with MgO?
AND spin 







pol. the 







same?





Mn3Ge
yes
No
−0.72
−0.76
−0.63


Mn2CuSb
no
N/A
0.10
0.43
−0.36


Mn2CoGe
no
N/A
0.77
0.85
0.50


Mn2CoSn
yes
Yes
0.89
0.93
0.69


Mn2NiGa
yes
Yes
0.67
0.71
0.55


Mn2WSb
yes
Yes
0.48
0.43
0.59


Mn2OsSn
no
N/A
−0.91
−0.95
−0.77


Mn2IrIn
no
N/A
0.80
0.91
0.47


Mn2MoSb
yes
Yes
0.47
0.43
0.59


Mn2RuSn
no
N/A
−0.92
−0.96
−0.78


Mn3Sb
yes
Yes
0.22
0.08
0.57


Mn3In
no
N/A
0.73
0.82
0.54


Mn3Al
no
N/A
0.43
0.52
0.30


Mn2FeGa
no
N/A
−0.58
−0.71
−0.33


Mn2OsSb
no
N/A
−0.46
−0.26
−0.78


Mn2IrGe
no
N/A
−0.64
−0.46
−0.87


Mn2IrGa
no
N/A
0.57
0.72
0.22


Mn2IrSn
no
N/A
−0.67
−0.48
−0.90


Mn2RuSb
no
N/A
−0.38
−0.19
−0.74


Mn2RhGa
no
N/A
0.66
0.82
0.27


Mn2RhSb
no
N/A
0.46
0.53
0.14


Mn2RhSn
no
N/A
−0.48
−0.24
−0.85


Mn2RhIn
no
N/A
0.61
0.81
0.21


Mn2PdGa
no
N/A
0.48
0.65
0.02









Mn3Ge and Mn2CuSb Film Deposition and Characterization

Mn3Ge and Mn2CuSb films were deposited by dc-magnetron sputtering or IBD. Film compositions were measured by Rutherford back scattering measurements. X-ray diffraction measurements were carried out using a Bruker GADDS or a Bruker D8 Discover system. AFM film characterization was made with a Bruker Icon Dimension with ScanAsyst system. HRTEM and EELS studies were made using a JEOL ARM 200F with a Cold-FEG source operated at 200 keV. Magnetic properties were measured at 300 K using a Quantum Design superconducting quantum interference device vibrating sample magnetometer (SQUID-VSM) in magnetic fields of up to ±7 T in both in-plane and out-of-plane directions. Uniaxial magnetic anisotropy KU values were calculated from KU=Heff·MS/2+2πMS2 (with Heff being the effective magnetic field and MS the saturation magnetization).
Magnetic Tunnel Junction Fabrication and Characterization
MTJ devices were encapsulated in Al2O3. Electrical contacts were formed from 50 Å Ru/650 Å Au. TMR of the patterned devices was measured using a Quantum Design DynaCool physical property measurement system and a custom-built probe station with Keithley source meters 2602 and 2400. For fast evaluation of TMR, the RAP and RR values in FIG. 2C were measured at +0.3 T and −0.3 T, respectively, instead of sweeping the magnetic field from ±9 T.
Calculation Details
The electronic structure and transmission functions of Mn3Ge/MgO/Fe, Mn2CuSb/MgO/Fe, and Fe/MgO/Fe MTJs were calculated using a tight-binding linear muffin-tin orbital method in the atomic sphere approximation (TB-LMTO-ASA) with the local density approximation of density functional theory (LDA/DFT) for the exchange-correlation energy13,14. For the Mn3Ge/MgO/Fe MTJ, the in-plane lattice constant was fixed to the experimental lattice constant a of bulk tetragonal Mn3Ge (a=3.816 Å and c=7.261 Å). For Mn2CuSb/MgO/Fe, the in-plane lattice constant was fixed to the calculated lattice constant a of the Mn2CuSb tetragonal inverse ferrimagnetic phase a=3.95 Å (see Table I).
Relaxed positions of atoms at the Mn3Ge/MgO and Mn2CuSb/MgO interfaces (for all possible terminations) were determined using the VASP molecular dynamic program12. The O-top configuration was found to be the most stable configuration (as compared to Mg-top and Mg-hollow) for both terminations at the Mn3Ge/MgO interface (in agreement with ref. 9), and for both terminations at the Mn2CuSb/MgO interface. For Fe/MgO interface the atomic positions from ref. 15 were used.
Magnetic Random Access Memory (MRAM) Application
A magnetic tunnel junction (MTJ) forms the basic memory element of a non-volatile magnetic random access memory (MRAM). A MTJ is a sandwich of two magnetic layers separated by an ultra-thin insulating layer referred to as a tunnel barrier. One of the magnetic layers forms the memory or storage layer, and the other layer forms a reference layer whose magnetic structure remains unchanged during operation of the MRAM. The magnetic state of the MTJ is changed by passing an electrical current through it. This current that tunnels between the reference and memory magnetic layers is spin-polarized: The magnitude of the tunneling spin-polarization is determined by a combination of the electronic properties of the magnetic electrodes and “spin-filtering” properties of the tunnel barrier. The magnitude of the current to switch a MTJ device is less when the magnetization of the magnetic layers is perpendicular to the layer. The materials claimed in this patent are expected to have large perpendicular magnetic anisotropy needed to build deeply scaled MRAM. Furthermore, these materials are expected to yield MTJs with high TMR.
The invention may be embodied in other specific forms without departing from its spirit or essential characteristics. The described embodiments are to be considered in all respects only as illustrative and not restrictive. The scope of the invention is therefore indicated by the appended claims rather than the foregoing description. All changes within the meaning and range of equivalency of the claims are to be embraced within that scope.
REFERENCES


    1 Parkin, S. S. P. MgO Tunnel barriers and method of formation. U.S. Pat. No. 8,008,097 (2011 (filed Aug. 22, 2003)).
    2 Parkin, S. S. P. et al. Giant Tunneling Magnetoresistance at Room Temperature with MgO (100) Tunnel Barriers. Nat. Mater. 3, 862-867, (2004).
    3 Ikeda, S. et al. A perpendicular-anisotropy CoFeB—MgO magnetic tunnel junction. Nat. Mater. 9, 721-724, (2010).
    4 Sato, H. et al. Properties of magnetic tunnel junctions with a MgO/CoFeB/Ta/CoFeB/MgO recording structure down to junction diameter of 11 nm. Appl. Phys. Lett. 105, 062403, (2014).
    5 Graf, T., Felser, C. & Parkin, S. S. P. Simple rules for the understanding of Heusler compounds. Prog. Solid State Chem. 39, 1-50, (2011).
    6 Balke, B., Fecher, G. H., Winterlik, J. & Felser, C. Mn3Ga, a compensated ferrimagnet with high Curie temperature and low magnetic moment for spin torque transfer applications. Appl. Phys. Lett. 90, 152504, (2007).
    7 Kurt, H. et al. Magnetic and electronic properties of D022-Mn3Ge (001) films. Appl. Phys. Lett. 101, 132410, (2012).
    8 Li, M., Jiang, X., Samant, M. G., Felser, C. & Parkin, S. S. P. Strong dependence of the tetragonal Mn2.1Ga thin film crystallization temperature window on seed layer. Appl. Phys. Lett. 103, 032410, (2013).
    9 Miura, Y. & Shirai, M. Theoretical Study on Tunneling Magnetoresistance of Magnetic Tunnel Junctions with D022-Mn3Z (Z=Ga, Ge). IEEE Trans. Magn. 50, 1400504, (2014).
    10 Zhang, D. et al. First-principles study of the structural stability of cubic, tetragonal and hexagonal phases in Mn 3 Z (Z=Ga, Sn and Ge) Heusler compounds. J. Phys: Cond. Matt. 25, 206006, (2013).
    11 Faleev, S. V., Parkin, S. S. P. & Mryasov, O. N. Brillouin zone spin filtering mechanism of enhanced TMR and correlation effects in Co(0001)/h-BN/Co(0001) magnetic tunnel junction. arXiv: 1504.01017, (2015).
    12 Kresse, G. & Furthmüller, J. Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set. Phys Rev. B 54, 11169-11186, (1996).
    13 Turek, I., Drchal, V., Kudrnovsky, J., Sob, M. & Weinberger, P. Electronic structure of disordered alloys, surfaces and interfaces. (Kluwer, 1997).
    14 Schilfgaarde, M. v. & Lambrecht, W. R. L. in Tight-binding approach to computational materials science MRS Symposia Proceedings (eds L. Colombo, A. Gonis, & P. Turchi) (MRS, 1998).
    15 Wortmann, D., Bihlmayer, G. & Bliigel, S. Ab initio calculations of interface effects in tunnelling through MgO barriers on Fe(100). J. Phys.: Condens. Matter 16 S5819-S5822 (2004).
    16 Butler, W. H., Zhang, X.-G., Schulthess, T. C. & MacLaren, J. M. Spin-dependent tunneling conductance of Fe|MgO|Fe sandwiches. Phys. Rev. B 63, 054416, (2001).

## Claims

1. A layered stack, comprising:
a first layer having a first tunneling spin polarization and a first magnetic moment of a first magnitude; and
a second layer having a second tunneling spin polarization and a second magnetic moment of a second magnitude different from the first magnitude,

wherein:
(i) the first and second layers are in physical contact with each other;
(ii) the first and second tunneling spin polarizations have the same orientation; and
(iii) the first and second magnetic moments have opposite orientations.

2. The layered stack of claim 1, wherein:
the first layer includes Mn and Co; and
the second layer includes Mn and Sn.

3. The layered stack of claim 1, wherein each of the first and second layers includes Mn.

4. The layered stack of claim 1, wherein:
the first layer includes Mn and Os; and
the second layer includes Mn and Sn.

5. The layered stack of claim 1, wherein:
the first layer includes Mn and W; and
the second layer includes Mn and Sb.

6. The layered stack of claim 1, wherein:
the first layer includes Mn and Ru; and
the second layer includes Mn and Sn.

7. The layered stack of claim 1, wherein:
the first layer includes Mn; and
the second layer includes Mn and Sb.

8. The layered stack of claim 1, wherein:
the first layer includes Mn; and
the second layer includes Mn and Al.

9. The layered stack of claim 1, wherein:
the first layer includes Mn; and
the second layer includes Mn and In.

10. The layered stack of claim 1, comprising a tunnel barrier that is contact with both the first layer and the second layer.

11. The layered stack of claim 10, wherein the tunnel barrier includes MgO.

12. The layered stack of claim 10, comprising a first electrode in contact with the tunnel barrier, wherein the first layer and the second layer form a second electrode.

13. The layered stack of claim 1, wherein the first and second magnetic moments are oriented perpendicular to the first and second layers.

14. A method, comprising:
passing current through the layered stack of claim 1, the stack acting as a reference layer in a storage device.

15. A method, comprising:
passing current through the layered stack of claim 1, the stack acting as a free layer in a storage device.