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 TOOLS & INSTRUMENTS

NanoFab Tool:  FEI Helios NanoLab 660 Dual Beam Scanning Electron Microscope (SEM) and Focused Ion Beam (FIB) 2
    
  fei_fib_2
  
      The FEI Helios 660 dual-beam microscope combines a monochromated field emission scanning electron microscope (FE-SEM) with an advanced focused ion beam (FIB) column for fast, precise nanomachining and nanoscale structural characterization. Enhanced capabilities include simultaneous chemical characterization using energy dispersive x-ray spectroscopy and material crystallographic characterization using electron backscatter diffraction. The tool supports a variety of substrates ranging from 150 mm diameter wafers down to small pieces.

Specifications/Capabilities
      
                          FE-SEM
	Resolution: sub-nanometer from 1 kV to 30 kV.
		High resolution triple in-lens electron detectors with Through Lens (TLD, secondary and backscatter mode), In Column (ICD, low-loss backscatter), and Mirror (MD, no-loss backscatter) detectors.
		Scanning transmission electron microscopy (STEM) detector with bright-field (BF), dark-field (DF), and high-angle annular dark-field (HAADF) segments.
		Electron beam deceleration for 50 V effective landing voltage.
		5-axis stage with 150 mm X-Y range and full rotation.
		Integrated plasma cleaner to minimize contamination.
	FIB (Gallium ion source)
	Resolution: 2.5 nm at 30 kV.
		High current for fast milling of large areas.
		High efficiency secondary ion detector.
		Electron flood gun for ion charge compensation.
		Integrated beam current measurement to allow faster ion beam calibrations while samples are already in the chamber.
		Real time monitoring of milling and deposition processes.
		End point monitoring for cross sectioning and circuit editing applications.
		Oxford/Omniprobe 300 manipulator for removing transmission electron microscopy (TEM) samples.
	Enhanced capabilities for simultaneous chemical characterization using energy dispersive x-ray spectroscopy on an Oxford Instruments X-Max 80 mm2 SDD-EDS detector and material crystallographic characterization using electron backscatter diffraction on an Oxford Instruments NordlysMax2 EBSD detector.
	Gas injection system chemistries
	Platinum deposition.
		Carbon deposition.
		Insulator deposition using tetraethyl orthosilicate (TEOS).
		Selective carbon etch.
		Insulator enhanced etching using xenon difluoride (XeF2).
	Software packages
	Auto TEM – Automated TEM sample preparation before liftout.
		NanoBuilder – Advanced computer aided design (CAD) based patterning using GDSII files.
		Auto Slice and View – Automated sequential milling and image capturing generates datasets for 3D reconstruction.
		EBS3 – captures EBSD data during sequential milling.
		Aztec – User-friendly EDS/EBSD data collection and analysis software.
		Avizo Fire – 3D reconstruction software with additional tools for materials science applications.
              Usage Information
        
Supported Sample Sizes
                                Maximum wafer diameter: 150 mm (6 in).
	Holders for 100 mm, 125 mm, and 150 mm diameter wafers.
	Small pieces supported: Yes.
              Typical Applications
      
                          Nanometer scale patterning.
	3D tomography.
	Materials characterization.
	Prototyping of nanoscale devices.
	*In situ* electrical measurements.
	Preparation of TEM lamellae.
	Sample preparation for atom probe tomography.
	Failure analysis.
	Circuit editing.
	Analysis and mapping of material and chemical sample composition.
	Mapping of crystal orientation.
	Phase identification.
	Collection of grain boundary and localized strain data.Back to the NanoFab Equipment List
  Nanotechnology and Nanofabrication / manufacturing
  
            Organizations
      
      NIST HeadquartersLaboratory ProgramsPhysical Measurement LaboratoryPhysical Measurement Laboratory OfficeCenter for Nanoscale Science and Technology
              Details
        
NEMO Name
                                FEI FIB 2

Location
                                Building 216 Rm. G113
  Campus
                    Gaithersburg
              Hours of Operation
      
                          24/7 access

Tool Reservation Rules
      
                          Minimum Reservation Time: 30 minutes.
	Maximum Reservation Time: 8 hours.
	Adjacent Reservations Permitted: Yes.
	Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.
Contact
      
        

Primary Engineer
        Joshua Schumacher
    
      
  joshua.schumacher@nist.gov
  (301) 975-8065

  

Backup Engineer
        Kerry Siebein
    
      
  kerry.siebein@nist.gov
  (301) 975-8458

  

General Contact
        NanoFab Microscopy
  nanofab_microscopy@nist.gov
  (301) 975-8672
  100 Bureau Drive, Stop 6201 
  Gaithersburg,
  MD 20899-6201

    
    Created May 19, 2014, Updated February 24, 2023
 HEADQUARTERS
            100 Bureau Drive
              Gaithersburg, MD 20899301-975-2000
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