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 TOOLS & INSTRUMENTS

NanoFab Tool: SSEC Single Wafer Cleaning System 1
    
  SSEC model 3300ML single wafer spray acid cleaning system
  
      The SSEC model 3300ML single wafer spray acid cleaning system supports general SC1 and Piranha processes in the NanoFab cleanroom. This system mixes, heats and delivers chemicals on demand and provides better wafer cleaning capability by eliminating cross contamination between wafers. In addition, the automated single wafer cleaning process prevent users from exposure to chemicals. This system can accommodate substrates ranging from 75 mm diameter to 200 mm diameter and irregular wafer pieces.

Specifications/Capabilities
      
                          High velocity spray with atomized nitrogen
	Single wafer process to eliminate cross contamination
	Fresh chemicals mixed, heated and delivered on demand
              Usage Information
        
Supported Sample Sizes
                                Wafer diameter supported: 75 mm (3 inch), 100 mm (4 inch), 150 mm (6 inch), 200 mm (8 inch), 125 mm (5 inch) photomask, 150 mm (6 inch) photomask.
	Small pieces supported: Yes (25 mm or larger)**Recommended Substrates/Restricted Materials**

Most substrates accepted
              Typical Applications
      
                          Pre-processing clean
	Post lift-off clean
	Post etch clean
	Photomask cleanBack to the NanoFab Equipment List
  Nanofabrication / manufacturing
  
            Organizations
      
      NIST HeadquartersLaboratory ProgramsPhysical Measurement LaboratoryPhysical Measurement Laboratory OfficeCenter for Nanoscale Science and Technology
              Details
        
NEMO Name
                                General Piranha

Location
                                Building 215 Room A102 (Cleanroom)
  Campus
                    Gaithersburg
              Hours of Operation
      
                          Cleanroom hours

Tool Reservation Rules
      
                          Minimum Reservation Time: 0.5 hours.
	Maximum Reservation Time: 2 hours.
	Adjacent Reservations Permitted: Yes.
	Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.
Contact
      
        

Primary Engineer
        Matthew Robinson
    
      
  matthew.robinson@nist.gov
  (301) 975-2421

  

Backup Engineer
        Liya Yu
    
      
  liya.yu@nist.gov
  (301) 975-4590

  

General Contact
        NanoFab Wetchem
  nanofab_wetchem@nist.gov
  (301) 975-8672
  100 Bureau Drive, Stop 6201 
  Gaithersburg,
  MD 20899-6201

    
    Created January 26, 2017, Updated February 24, 2023
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              Gaithersburg, MD 20899301-975-2000
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