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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-sandvik-lpcvd-amorphous-and-polycrystalline-silicon

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TOOLS & INSTRUMENTS

# NanoFab Tool: Sandvik LPCVD Amorphous and Polycrystalline Silicon

Photo of the Sandvik anneal furnaces

Credit:

The Sandvik low pressure chemical vapor deposition (LPCVD) polysilicon furnaces supports amorphous and polycrystalline silicon deposition in the NanoFab. The furnace stack allows the deposition of n typed doped (phosphine) and undoped polysilicon films on substrates ranging from small chips to wafer diameters up to 150 mm. All samples require SC1 and SC2 cleans prior to processing.

## Specifications/Capabilities

                    - Automatic recipe controller using Variable Parameter Table (VPT)
                    - Maximum Temperature: 650 °C.  
                    - Maximum Deposition Thickness: 2 μm.
                    - Standard processes:	                       - Undoped polysilicon
                      - Doped (phosphine) polysilicon
                    - Wafer diameters: 75 mm (3 in), 100 mm (4 in), and 150 mm (6 in)
                    - Small pieces supported: Yes

## Typical Applications

                    - Conducting layer (doped)
                    - Piezo resistive gauges and thermocouples
                    - Gate Transistor
                    - Insulating layer (undoped)
                    - High purity mask
                    - Fabry-Perot interferometer

## Back to the NanoFab Equipment List

Nanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Facility

## Tool Reservation Rules

                    - Minimum Reservation Time: 4 hours 
                    - Maximum Reservation Time: 24 hours 
                    - Adjacent Reservations Permitted: Yes 
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.

## Contact

### Primary Engineer

                    -  Richard Kasica  richard.kasica@nist.gov      (301) 975-2693   

### Backup Engineers

                    -  Robert Ilic  robert.ilic@nist.gov      (301) 975-3712   

### General Contact

                    -      NanoFab Furnaces    nanofab_furnaces@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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