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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-bachur-associates-ls-200fsx-photoresist-stabilization

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TOOLS & INSTRUMENTS

# NanoFab Tool:  Bachur & Associates LS-200FSX Photoresist Stabilization System

The Bachur & Associates LS-200FSX Photoresist Stabilization System provides deep-ultraviolet (DUV) flood exposure and resist curing. The system strengthens photoresist to prevent damage from processes such as ion implantation and aggressive etching that might otherwise damage the photoresist. The tool has a DUV light source, an auto-timer, and a high precision hotplate which allows automatic processing on substrates ranging from 200 mm diameter wafers down to small pieces.

## Specifications/Capabilities

                    - Adjustable light intensity levels: > 10 mW / cm 2  at 254 nm wavelength.
                    - Beam uniformity over 200 mm diameter: ± 5%.
                    - Vacuum hot plate: 50 °C to 200 °C with temperature uniformity ± 2 °C across 200 mm diameter working area.
                    - Timed and test mode exposure.
                    - Built-in and external intensity meters.
                    - Nitrogen purging.

## Usage Information

### Supported Sample Sizes

                      - Maximum wafer diameter: 200 mm (8 in).
                      - Small pieces supported: Yes.
                      - Maximum substrate thickness: 4 mm.

## Typical Applications

                    - Flood exposure of photoresist.
                    - Resist hardening for better endurance during etching, implantation, and ion milling.

## Back to the NanoFab Equipment List

EnergyNanotechnologyNanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Tool Reservation Rules

                    - Minimum Reservation Time: 30 minutes.
                    - Maximum Reservation Time: 4 hours.
                    - Adjacent Reservations Permitted: No.
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.

## Contact

### Primary Engineer

                    -  Liya Yu  liya.yu@nist.gov      (301) 975-4590   

### Backup Engineer

                    -  Richard Kasica  richard.kasica@nist.gov      (301) 975-2693   

### First Backup Engineer

                    -  Marc J. Cangemi  marc.cangemi@nist.gov      (301) 975-5993   

### Second Backup Engineer

                    -  Robert Ilic  robert.ilic@nist.gov      (301) 975-3712   

### General Contact

                    -      NanoFab Litho    nanofab_litho@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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