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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-heidelberg-instruments-dwl-2000-laser-pattern-generator

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TOOLS & INSTRUMENTS

# NanoFab Tool:  Heidelberg Instruments DWL 2000 Laser Pattern Generator

The Heidelberg Instruments DWL 2000 Laser Pattern Generator uses a high resolution laser to expose photoresist for substrate patterning of features as small as 700 nm. The system can be used both for patterning chrome on glass photomasks and for maskless direct substrate writing. The laser writer can process substrates up to 200 mm in diameter and 7 mm thick. Standard processes include photomask patterning for use in both contact and stepper lithography.

## Specifications/Capabilities

                    - Laser wavelength: 405 nm.
                    - Minimum feature size: 700 nm.
                    - Write speed: 110 mm 2  / min.
                    - Address grid: 20 nm.
                    - Patterning to substrate edge with optical autofocus.
                    - Allowed data formats: DXF, GDS-II, CIF, and Gerber.
                    - Alignment system for exposing patterns on existing structures.
                    - Closed loop environment system.

## Usage Information

### Supported Sample Sizes

                      - Maximum wafer diameter: 200 mm (8 in).
                      - Maximum substrate thickness: 7 mm.
                      - Small pieces supported: Yes.
                      - Photomask blank sizes provided: 125 mm (5 inch) and 150 mm (6 inch).

## Typical Applications

                    - Micrometer and sub-micrometer lithography.
                    - Photomask patterning for:	                       - Contact lithography.
                      - Stepper lithography.
                    - Direct substrate patterning (maskless lithography).

## Back to the NanoFab Equipment List

NanotechnologyNanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Tool Reservation Rules

                    - Minimum Reservation Time: 30 minutes.
                    - Maximum Reservation Time: 6 hours.
                    - Adjacent Reservations Permitted: No.
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.

## Contact

### Primary Engineer

                    -  Robert Ilic  robert.ilic@nist.gov      (301) 975-3712   

### Backup Engineer

                    -  Liya Yu  liya.yu@nist.gov      (301) 975-4590   

### First Backup Engineer

                    -  Richard Kasica  richard.kasica@nist.gov      (301) 975-2693   

### Second Backup Engineer

                    -  Marc J. Cangemi  marc.cangemi@nist.gov      (301) 975-5993   

### General Contact

                    -      NanoFab Litho    nanofab_litho@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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