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TOOLS & INSTRUMENTS

# NanoFab Tool: Microwave Asher

The microwave plasma system is used for photoresist descum/removal and wafer cleaning. The system is equipped with a hand free door opening system for easy substrate loading/unloading.

## Specifications/Capabilities

                    - Process gases: O2, N2 and CF4
                    - Frequency: 2.45 GHz
                    - Maximum Power: 1000 W
                    - Wafer diameters: up to 150 mm 
                    - Small pieces supported: Yes
                    - Easy optical and e-beam resists removal

## Usage Information

### Operating Instructions

## Typical Applications

                    - Photoresist removal/descum and wafer cleaning.

## Back to the NanoFab Equipment List

NanotechnologyNanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Tool Reservation Rules

                    - Minimum Reservation Time: 15 minutes
                    - Maximum Reservation Time: 4 hours
                    - Adjacent Reservations Permitted: yes
                    - Restrictions:  Metals are not allowed in the chamber
                    - Cancelation Policy: 24-hour notice required

## Contact

### Primary Engineer

                    -  Lei Chen  lei.chen@nist.gov      (301) 975-2908   

### Backup Engineer

                    -  Robert Ilic  robert.ilic@nist.gov      (301) 975-3712   

### General Contact

                    -      NanoFab Dryetch    nogtech@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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