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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-suss-microtec-delta12aq-automated-resist-developer

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TOOLS & INSTRUMENTS

# NanoFab Tool:  Suss MicroTec Delta12AQ Automated Resist Developer

The Suss MicroTec Delta12AQ is an automated photoresist developer station which supports temperature controlled spray photoresist development. The cassette-to-cassette substrate operation provides a "dry in – dry out" process on a variety of substrates using standard developer chemistries.

## Specifications/Capabilities

                    - Recipe controlled automated operation.
                    - Precise control of developer temperature.
                    - Supported developer chemistries:	                       - AZ400K.
                      - AZ300MIF.
                      - CD26.

## Usage Information

### Supported Sample Sizes

                      - Maximum wafer diameter: 200 mm (8 in).
                      - Small pieces supported: No.
                      - Maximum substrate thickness: 5 mm.
                      - Wafer diameters supported:	                         - 50 mm (2 in).
                        - 75 mm (3 in).
                        - 100 mm (4 in).
                        - 150 mm (6 in).
                        - 200 mm (8 in).
                      - Photomask sizes supported:	                         - 125 mm x 125 mm.
                        - 150 mm x 150 mm.

## Typical Applications

                    - Photoresist development after optical exposure.

## Back to the NanoFab Equipment List

NanotechnologyNanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Tool Reservation Rules

                    - Minimum Reservation Time: 30 minutes.
                    - Maximum Reservation Time: 4 hours.
                    - Adjacent Reservations Permitted: No.
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.

## Contact

### Primary Engineer

                    -  Richard Kasica  richard.kasica@nist.gov      (301) 975-2693   

### Backup Engineer

                    -  Liya Yu  liya.yu@nist.gov      (301) 975-4590   

### General Contact

                    -      NanoFab Litho    nanofab_litho@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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