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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-4wave-ibe-20b-ion-milling-system

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TOOLS & INSTRUMENTS

# NanoFab Tool:  4Wave IBE-20B Ion Milling System

The 4Wave IBE-20B ion milling system uses a broad argon ion beam to controllably and uniformly remove material from a user's substrate. A secondary ion mass spectrometry (SIMS) endpoint detector can stop etching within 0.2 nm of the interface between two dissimilar materials. The substrate stage rotates for improved uniformity and can accommodate substrates ranging from 150 mm diameter wafers down to small pieces.

## Specifications/Capabilities

                    - Gridded ion source: 20 cm in diameter; provides collimated, high energy ion flux.
                    - Endpoint control using SIMS endpoint detector.
                    - Plasma bridge neutralizer prevents charging at sample surface.
                    - Maximum substrate rotation rate: up to 20 rpm.
                    - Substrate tilt: 0° to 135°.
                    - Substrate cooling keeps samples below 80 °C.
                    - Base vacuum: 6.66 x 10 -6  Pa (5 x 10 -8  Torr).

## Usage Information

### Supported Sample Sizes

                      - Maximum wafer diameter: 150 mm (6 in).
                      - Small pieces supported: Yes.

## Typical Applications

                    - Fabrication of spin valves.
                    - Spintronics.
                    - Magnetic storage.
                    - Grating fabrication.
                    - Communications components.
                    - Microwave components.
                    - Biomedical sensors.
                    - Fiber optics components.

## Back to the NanoFab Equipment List

NanotechnologyNanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Tool Reservation Rules

                    - Minimum Reservation Time: 30 minutes.
                    - Maximum Reservation Time: 4 hours.
                    - Adjacent Reservations Permitted: Yes.
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.

## Contact

### Primary Engineer

                    -  Gerard Henein  gerard.henein@nist.gov      (301) 975-5645   

### Backup Engineer

                    -  Lei Chen  lei.chen@nist.gov      (301) 975-2908   

### General Contact

                    -      NanoFab Dryetch    nogtech@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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