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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-suss-microtec-ma6ba6-contact-aligner

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TOOLS & INSTRUMENTS

# NanoFab Tool: Suss MicroTec MA6/BA6 Contact Aligner

The Suss MicroTec MA6 contact aligner allows users to align patterns on the front or back of a substrate and to print feature sizes down to 1 μm. The tool offers a variety of exposure methods with overlay accuracy better than 500 nm. It can accommodate substrates ranging from 150 mm diameter wafers down to small pieces.

## Specifications/Capabilities

                    - Exposure methods: flood, proximity, soft, hard, low vacuum and vacuum contacts.
                    - Exposure wavelengths:	                       - UV broadband (350 nm to 450 nm).
                      - I-line (365 nm band-pass filter).
                      - G-line (436 nm band-pass filter).
                    - Illumination area: 150 mm diameter.
                    - Resolution: 1 μm.
                    - Overlay accuracy: = 500 nm.
                    - Front and back side pattern alignment.

## Usage Information

### Supported Sample Sizes

                      - Maximum wafer diameter: 150 mm (6 in).
                      - Small pieces supported: Yes.
                      - Maximum substrate thickness: 6 mm.
                      - Mask sizes supported:	                         - 63 mm x 63 mm.
                        - 102 mm x 102 mm.
                        - 127 mm x 127 mm.
                        - 178 mm x 178 mm.

## Typical Applications

                    - Medical devices.
                    - Biofluidic devices.
                    - Microelectromechanical systems.
                    - Thermal sensors.
                    - Printing micrometer size and larger features.

## Back to the NanoFab Equipment List

NanotechnologyNanofabrication / manufacturingLithography

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Tool Reservation Rules

                    - Minimum Reservation Time: 30 minutes.
                    - Maximum Reservation Time: 4 hours.
                    - Adjacent Reservations Permitted: No.
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.
                    - Restrictions: 12 hours advance notice required for filter installation.

## Contact

### Primary Engineer

                    -  Marc J. Cangemi  marc.cangemi@nist.gov      (301) 975-5993   

### Backup Engineer

                    -  Richard Kasica  richard.kasica@nist.gov      (301) 975-2693   

### First Backup Engineer

                    -  Liya Yu  liya.yu@nist.gov      (301) 975-4590   

### Second Backup Engineer

                    -  Robert Ilic  robert.ilic@nist.gov      (301) 975-3712   

### General Contact

                    -      NanoFab Litho    nanofab_litho@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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