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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-ipec-472-chemical-mechanical-polisher-cmp

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TOOLS & INSTRUMENTS

# NanoFab Tool: IPEC 472, Chemical Mechanical Polisher (CMP)

Photo of the Chemical Mechanical Polisher

Credit:

The CMP removes material both chemically, by use of a corrosive colloidal slurry, and mechanically, by way of a wafer carrier under controlled pressure rotating against a rotating polishing pad, with carrier and pad having nonconcentric axes of rotation. It is equipped with a primary platen to remove the material and a secondary platen to do the final polish and minimize the surface roughness. The system removes irregular topography and leaves wafers planar with sub-nanometer roughness.

## Specifications/Capabilities

                    - Sample sizes: 100 mm, 150 mm and 200 mm in diameter wafers (pieces are not allowed)
                    - Cassette-to-cassette capability for 100 mm wafers
                    - Manual loading, one wafer at a time, for 150 mm and 200 mm wafers
                    - Laterally oscillating wafer carrier 
                    - In-situ pad conditioning on primary platen
                    - Within wafer non-uniformity: typically, less than 3 % sigma/mean
                    - Wafer-to-wafer non-uniformity: typically, less than 5 %
                    - The removal rate is dependent on material, rotation speeds, pressure, type of slurry, concentration and slurry flow rate and can vary from a few nm/min to several hundred nm/min.

## Usage Information

### Operating Instructions

## Typical Applications

                    - Planarization of metal interconnects and vias
                    - Planarization of inter-layer dielectrics: typically, SiO 2
                    - General sample polishing to minimize surface roughness
                    - Available Recipes: Silicon dioxide, Silicon, Silicon nitride, Gold

## Back to the NanoFab Equipment List

Nanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

24/7 access

## Facility

## Tool Reservation Rules

                    - Minimum Reservation Time: 2 hours
                    - Maximum Reservation Time: 8 hours
                    - Adjacent Reservations Permitted: yes
                    - Restrictions:  users must discuss their applications with the tool owner every time they plan to use the tool
                    - Cancelation Policy: 24-hour notice required

## Contact

### Primary Engineer

                    -  Gerard Henein  gerard.henein@nist.gov      (301) 975-5645   

### Backup Engineer

                    -  Robert Ilic  robert.ilic@nist.gov      (301) 975-3712   

### General Contact

                    -      NanoFab Postprocess    nanofab_postprocess@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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