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 TOOLS & INSTRUMENTS

NanoFab Tool: Four Dimensions 280DI Sheet Resistance Mapping System
    
  Four Dimensions 280DI Sheet Resistance Mapping SystemFour Dimensions 280DI Sheet Resistance Mapping System
  
      The Four Dimensions 280DI sheet resistance mapping system uses the 4-point probe technique to measure the sheet resistance of substrates and films. The automated stage is capable of mapping up to 5,000 points per wafer and can handle substrates ranging from 200 mm down to small pieces. The wide resistance range and the choice of probe tips enable the mapping of a large variety of materials.

Specifications/Capabilities
      
                          Resistance range: 1 mohm to 800 Gohm.
	Capacity: 1 wafer.
	Speed: 45 points per minute up to 800 kohm. Slower at higher ranges.
	Probe spacing: 1 mm.
	Probe force: 80 grams to 200 grams.
	Probe tip radius: 40 μm, 100 μm, and 200 μm.
	Front panel control for quick 1-point or 5-point measurements.
	Mapping capability
	Cartesian maps, up to 5,000 sites.
		Polar maps, up to 625 points.
		Diagonal maps.
	Software platform: Windows 7.
              Usage Information
        
Supported Sample Sizes
                                Maximum wafer diameter: 200 mm (8 in).
	Small pieces supported: Yes.
              Typical Applications
      
                          Thin film sheet resistance measurement.
	Bulk resistivity measurement.
	Thin film and resistivity uniformity.Back to the NanoFab Equipment List
  Nanotechnology and Nanofabrication / manufacturing
  
            Organizations
      
      NIST HeadquartersLaboratory ProgramsPhysical Measurement LaboratoryPhysical Measurement Laboratory OfficeCenter for Nanoscale Science and Technology
              Details
        
NEMO Name
                                Four Dimensions 4pt Probe

Location
                                Building 215 Rm. A106 (Cleanroom)
  Campus
                    Gaithersburg
              Hours of Operation
      
                          Cleanroom hours

Tool Reservation Rules
      
                          Minimum Reservation Time: 30 minutes.
	Maximum Reservation Time: 4 hours.
	Adjacent Reservations Permitted: Yes.
	Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.
Contact
      
        

Primary Engineer
        Gerard Henein
    
      
  gerard.henein@nist.gov
  (301) 975-5645

  

Backup Engineer
        Lei Chen
    
      
  lei.chen@nist.gov
  (301) 975-2908

  

General Contact
        NanoFab Metrology
  nanofab_metrology@nist.gov
  (301) 975-8672
  100 Bureau Drive, Stop 6201 
  Gaithersburg,
  MD 20899-6201

    
    Created January 30, 2015, Updated June 15, 2023
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              Gaithersburg, MD 20899301-975-2000
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