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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-spts-microetch-hydrofluoric-acid-vapor-etcher

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TOOLS & INSTRUMENTS

# NanoFab Tool:  SPTS microEtch Hydrofluoric Acid Vapor Etcher

The SPTS μEtch is a single wafer hydrofluoric acid vapor etcher used to release silicon microstructures in microelectromechanical systems (MEMS) devices. It uses a combination of liquid hydrofluoric acid and alcohol to create a vapor that isotropically etches silicon dioxide without etching silicon and without damaging fragile suspended structures. The tool is capable of creating microscale and nanoscale silicon structures that are freely suspended by etching a sacrificial layer of silicon dioxide underneath the silicon device layer on substrates from small pieces up to 200 mm wafers.

## Specifications/Capabilities

                    - Programmable logic controller (PLC) recipe system for precise control of etch parameters.
                    - Isotropic etching of silicon dioxide without etching silicon.

## Usage Information

### Supported Sample Sizes

                      - Maximum wafer diameter: 200 mm (8 in).
                      - Small pieces supported: Yes.

## Typical Applications

                    - Microelectromechanical systems (MEMS).
                    - Nanoelectromechanical systems (NEMS).
                    - Accelerometers.
                    - Inkjet heads.
                    - Pressure sensors.
                    - Releasing fragile structures such as membranes and cantilevers.

## Back to the NanoFab Equipment List

NanotechnologyNanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Tool Reservation Rules

                    - Minimum Reservation Time: 30 minutes.
                    - Maximum Reservation Time: 4 hours.
                    - Adjacent Reservations Permitted: Yes.
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.

## Contact

### Primary Engineer

                    -  Richard Kasica  richard.kasica@nist.gov      (301) 975-2693   

### Backup Engineer

                    -  Liya Yu  liya.yu@nist.gov      (301) 975-4590   

### General Contact

                    -      NanoFab Dryetch    nogtech@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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