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 TOOLS & INSTRUMENTS

NanoFab Tool: 4Wave IBD/BTD Cluster Sputter Deposition System
    
  Photograph of the 4Wave IBD/BTD cluster sputtering system
  
      The 4Wave IBD/BTD cluster sputter deposition system can automatically load and unload two six target chambers to provide users a largely unattended 24/7 deposition capability along with the densest available thin films via room temperature physical vapor deposition. An ion beam deposition chamber yields high density films that are pinhole-free and very smooth. A biased target deposition chamber allows adatom energy changes during film growth and minimizes interface mixing, while still depositing dense and very smooth films. The dual cassette load station supports substrates ranging from 200 mm diameter wafers down to small pieces.

Specifications/Capabilities
      
                          Transfer robot and cassette elevators reduce contamination and allow fast cycle times.
	24/7 unattended operation.
	Cryo-pumped process modules have a base vacuum of 2.6 x 10-6 Pa (2 x 10-8 Torr).
	Rotating stage for high uniformity deposition of thin films.
	Uniformity: 2 % (1 sigma).
	Stage temperature range: 20 °C.
	Quartz crystal thickness monitor.
	Residual gas analyzer.
	Ion guns for wafer pre-clean.
	Oxygen and nitrogen available for reactive sputtering.
	12 fixed sputtering targets.
	List of available targets:
	Ag
		Al
		Au
		Cr
		Co
		Co/Fe/B (72/18/10 wt %)
		Fe
		ITO
		Ni
		Ni/Fe (81/19 wt %)
		Pt
		SiO2
		Si3N4
		Ta
		Ta2O5
		Ti
		TiO
		VO2
              Usage Information
        
Supported Sample Sizes
                                Maximum wafer diameter: 200 mm (8 in).
	Small pieces supported: Yes.
	Load capacity: 50 wafers
              Typical Applications
      
                          Electrical contacts.
	Dry etch masks.
	Magnetic materials.
	Electrical isolation.Back to the NanoFab Equipment List
  Nanotechnology and Nanofabrication / manufacturing
  
            Organizations
      
      NIST HeadquartersLaboratory ProgramsPhysical Measurement LaboratoryPhysical Measurement Laboratory OfficeCenter for Nanoscale Science and Technology
              Details
        
NEMO Name
                                4Wave Cluster Sputter

Location
                                Building 215 Rm. A104 (Cleanroom)
  Campus
                    Gaithersburg
              Hours of Operation
      
                          Cleanroom hours

Tool Reservation Rules
      
                          Minimum Reservation Time: 1 hour.
	Maximum Reservation Time: 6 hours.
	Adjacent Reservations Permitted: No.
	Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.
	Restrictions: Some materials are prohibited; contact our engineers for more information.
Contact
      
        

Primary Engineer
        Gerard Henein
    
      
  gerard.henein@nist.gov
  (301) 975-5645

  

Backup Engineer
        Robert Ilic
    
      
  robert.ilic@nist.gov
  (301) 975-3712

  

General Contact
        NanoFab Deposition
  nanofab_deposition@nist.gov
  (301) 975-8672
  100 Bureau Drive, Stop 6201 
  Gaithersburg,
  MD 20899-6201

    
    Created January 15, 2015, Updated February 24, 2023
 HEADQUARTERS
            100 Bureau Drive
              Gaithersburg, MD 20899301-975-2000
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