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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-abm-mask-contact-aligner

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TOOLS & INSTRUMENTS

# NanoFab Tool: ABM Mask Contact Aligner

Credit:

The ABM contact aligner allows users to align patterns on the front or back of a substrate and to print feature sizes down to 800 nm. The tool offers vacuum, soft, hard and flood exposure methods with frontside overlay accuracy better than 500 nm. It can accommodate substrates ranging from 150 mm diameter wafers down to small pieces.

## Specifications/Capabilities

                    - Exposure methods: flood, soft, hard, and vacuum contact.
                    - Auto-Z Planarization, Wedge Compensation, and Leveling of Chuck
                    - Exposure wavelengths:	                       - 365 nm to 400 nm.
                      - 220 nm Wavelength Filter.
                      - 254 nm Wavelength Filter.
                    - Illumination area: 150 mm diameter.
                    - Resolution: 800 nm.
                    - Frontside and Backside Alignment.	                       - Frontside alignment accuracy: =  500 nm.
                      - Backside alignment accuracy: = 5 micrometer.
                    - Overlay accuracy: = 500 nm.

## Usage Information

### Supported Sample Sizes

                      - Maximum wafer diameter: 150 mm (6 in).
                      - Maximum substrate thickness: 6 mm.
                      - Small pieces supported: Yes.
                      - Mask sizes supported:	                         - 127 mm x 127 mm (5 inch).
                        - 178 mm x 178 mm (7 inch).

## Typical Applications

                    - Medical devices.
                    - Biofluidic devices.
                    - Microelectromechanical systems.
                    - Thermal sensors.
                    - Printing micrometer size and larger features. 

## Back to the NanoFab Equipment List

NanotechnologyNanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Tool Reservation Rules

                    - Minimum Reservation Time: 30 minutes.
                    - Maximum Reservation Time: 4 hours.
                    - Adjacent Reservations Permitted: No.
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.
                    - Restrictions: 12 hours advance notice required for filter installation.

## Contact

### Primary Engineer

                    -  Marc J. Cangemi  marc.cangemi@nist.gov      (301) 975-5993   

### Backup Engineer

                    -  Liya Yu  liya.yu@nist.gov      (301) 975-4590   

### First Backup Engineer

                    -  Richard Kasica  richard.kasica@nist.gov      (301) 975-2693   

### Second Backup Engineer

                    -  Robert Ilic  robert.ilic@nist.gov      (301) 975-3712   

### General Contact

                    -      NanoFab Litho    nanofab_litho@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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