Skip to main content    

An official website of the United States government

Here’s how you know

**Official websites use .gov**              A **.gov** website belongs to an official government organization in the United States.            

**Secure .gov websites use HTTPS**              A **lock** (  LockA locked padlock) or **https://** means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.            

https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-asml-pas5500275d-stepper

            -  Topics  -  All Topics 
-  Advanced communications 
-  Artificial intelligence 
-  Bioscience 
-  Buildings and construction 
-  Chemistry 
-  Climate 
-  Cybersecurity 
-  Electronics 
-  Energy 
-  Environment 
-  Fire 
-  Forensic science 
-  Health 
-  Information technology 
-  Infrastructure 
-  Manufacturing 
-  Materials 
-  Mathematics and statistics 
-  Metrology 
-  Nanotechnology 
-  Neutron research 
-  Performance excellence 
-  Physics 
-  Public safety 
-  Resilience 
-  Standards 
-  Transportation 
 
            -  Publications 
            -  Labs & Major Programs  -  Laboratories    -  Communications Technology Laboratory 
  -  Engineering Laboratory 
  -  Information Technology Laboratory 
  -  Material Measurement Laboratory 
  -  Physical Measurement Laboratory 
-  User Facilities    -  NIST Center for Neutron Research 
  -  CNST NanoFab 
-  Research Test Beds 
-  Research Projects 
-  Tools & Instruments 
-  Major Programs    -  Baldrige Performance Excellence Program 
  -  CHIPS for America Initiative 
  -  Manufacturing Extension Partnership (MEP) 
  -  Office of Advanced Manufacturing 
  -  Special Programs Office 
  -  Technology Partnerships Office 
 
            -  Services & Resources  -  Standards and Measurements    -  Calibration Services 
  -  Laboratory Accreditation (NVLAP) 
  -  Quality System 
  -  Standard Reference Materials (SRMs) 
  -  Standards.gov 
  -  Time Services 
  -  Office of Weights and Measures 
-  Software 
-  Data    -  Chemistry WebBook 
  -  National Vulnerability Database 
  -  Physical Reference Data 
  -  Standard Reference Data (SRD) 
-  Storefront 
-  License & Patents 
-  Computer Security Resource Center (CSRC) 
-  NIST Research Library 
 
            -  News & Events  -  News 
-  Events 
-  Blogs 
-  Feature Stories 
-  Awards 
-  Video Gallery 
-  Image Gallery 
-  Media Contacts 
 
            -  About NIST  -  About Us    -  Leadership 
  -  Organization Structure 
  -  Budget & Planning 
-  Contact Us 
-  Visit 
-  Careers    -  Student programs 
-  Work with NIST 
-  History    -  NIST Digital Archives 
  -  NIST Museum 
  -  NIST and the Nobel 
-  Educational Resources 
 

TOOLS & INSTRUMENTS

# NanoFab Tool:  ASML PAS5500/275D Stepper

The ASML PAS 5500/275D is a high throughput i-line stepper. It utilizes 5X reduction and projection capability with step and repeat to transfer photomask patterns onto user substrates using 365 nm wavelength light and is capable of 280 nm resolution. The fully automated wafer handling system can accommodate substrates ranging from 200 mm diameter wafers down to small pieces.

## Specifications/Capabilities

                    - Reticle size: 152.40 mm x 152.40 mm.
                    - Reticle thicknesses supported:	                       - 3.05 mm (0.12 in).
                      - 3.81 mm (0.15 in).
                      - 6.35 mm (0.25 in).
                    - Maximum field sizes: 22 mm x 22 mm or 27.4 mm x 14.7 mm.
                    - Resolution: = 280 nm.
                    - Overlay accuracy: = 40 nm.
                    - Numerical aperture: 0.48 to 0.60.
                    - 3D backside alignment.
                    - Transparent substrate processing.
                    - Computer programmed image distribution and die size optimization.
                    - Fully automated material handling and step and repeat exposure.
                    - Throughput: = 84 wafers per hour.

## Usage Information

### Supported Sample Sizes

                      - Wafer diameters: 75 mm (3 in), 100 mm (4 in) - default, 150 mm (6 in), and 200 mm (8 in).
                      - Maximum thickness: 1 mm.
                      - Small pieces can be processed on carrier wafers.

## Typical Applications

                    - Measurement calibration patterns.
                    - Gratings and waveguides.
                    - Microelectromechanical systems.
                    - Thermal sensors.

## Back to the NanoFab Equipment List

NanotechnologyNanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Tool Reservation Rules

                    - Minimum Reservation Time: 30 minutes.
                    - Maximum Reservation Time: 6 hours.
                    - Adjacent Reservations Permitted: No.
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.
                    - Restrictions: 4 days advance notice required for substrate size change.

## Contact

### Primary Engineer

                    -  Marc J. Cangemi  marc.cangemi@nist.gov      (301) 975-5993   

### Backup Engineer

                    -  Liya Yu  liya.yu@nist.gov      (301) 975-4590   

### First Backup Engineer

                    -  Richard Kasica  richard.kasica@nist.gov      (301) 975-2693   

### Second Backup Engineer

                    -  Robert Ilic  robert.ilic@nist.gov      (301) 975-3712   

### General Contact

                    -      NanoFab Litho    nanofab_litho@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

Webmaster | Contact Us | Our Other Offices

TwitterFacebookLinkedInInstagramYouTubeGiphyRSS FeedMailing List

Feedback

            -  Site Privacy 
            -  Accessibility 
            -  Privacy Program 
            -  Copyrights 
            -  Vulnerability Disclosure 
            -  No Fear Act Policy 
            -  FOIA 
            -  Environmental Policy 
            -  Scientific Integrity 
            -  Information Quality Standards 
            -  Commerce.gov 
            -  Science.gov 
            -  USA.gov 
            -  Vote.gov