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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-rca-wet-bench-b102

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TOOLS & INSTRUMENTS

# NanoFab Tool:  RCA Wet Bench B102

The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to high temperature furnace processing. The bench contains temperature controlled processing baths and a quick dump rinser. In addition, the bench has a dedicated buffered oxide etch bath for patterning silicon oxide. All baths can accommodate substrates ranging from 150 mm diameter wafers down to small pieces

## Specifications/Capabilities

                    - Tank 1: Buffered oxide etch (BOE) dip tank (5:1 BOE).
                    - Tank 2: Reflux heated bath for RCA Standard Clean 1-SC1.
                    - Tank 3: Hydrofluoric acid (HF) dip tank with lid (2 % HF).
                    - Tank 4: Automatic quick dump rinse with lid.
                    - Tank 5: Reflux heated bath for RCA Standard Clean 2-SC2.

## Usage Information

### Supported Sample Sizes

                      - Maximum wafer diameter: 150 mm (6 in).
                      - Small pieces supported: Yes.

## Typical Applications

                    - Pre-furnace clean.
                    - Silicon oxide patterning.

## Back to the NanoFab Equipment List

NanotechnologyNanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom Hours

## Tool Reservation Rules

                    - Minimum Reservation Time: 30 minutes.
                    - Maximum Reservation Time: 4 hours.
                    - Adjacent Reservations Permitted: Yes.
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.

## Contact

### Primary Engineer

                    -  Richard Kasica  richard.kasica@nist.gov      (301) 975-2693   

### Backup Engineer

                    -  Robert Ilic  robert.ilic@nist.gov      (301) 975-3712   

### General Contact

                    -      NanoFab Wetchem    nanofab_wetchem@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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