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Photolithography Process
    
  Schematic of the photolithography process shows the formation of a gradient extending from the photoresist material to be removed (center) into the unexposed portions of the resist on the sides. NIST measurements document the residual swelling fraction caused by the developer that can contribute to roughness in the final developed image.
*NCNR

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December 11, 2007

Reference Number
                                07NCNR002

Credit
                                Credit: NIST

Image Type
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