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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-heidelberg-mla150-maskless-aligner

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TOOLS & INSTRUMENTS

# NanoFab Tool:  Heidelberg MLA150 Maskless Aligner

The MLA150 has been specifically designed for direct-wafer writing and easy operation. It offers all the capabilities that are required for single layer and multi-layer photolithography and even overcomes some of the limitations of photomask based exposure technologies because MLA150 exposure is non-contact approach. What set MLA150 apart from mask writer are the fast exposure speed, dual laser wavelengths and convenient alignment system. Alignment in multi-layer applications can be achieved automatically by using three integrated cameras with varying resolution while manual alignment is still available as needed.

## Specifications/Capabilities

                    - Minimum feature size: 1 μm.
                    - Overlay accuracy (front): 500 nm
                    - Overlay accuracy (back): 1000 nm
                    - Maximum exposure area: 150 x 150 mm 2
                    - Exposure speed: 10-15 mins for 100 x 100 mm 2
                    - Light source: diode lasers, 8W at 405 nm and 2.8 W at 375 nm.
                    - Substrate size: 6 x 6 mm 2  to 200 x 200 mm 2
                    - Size detection: automatic
                    - Alignment mode: front-size and back-size; automatic and manual

## Typical Applications

                    - Medical devices.
                    - Biofluidic devices.
                    - Microelectromechanical systems.
                    - Thermal sensors.
                    - Printing micrometer size and larger features.

## Back to the NanoFab Equipment List

Nanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

24/7 access

## Facility

## Tool Reservation Rules

                    - Minimum Reservation Time: 15 minutes.
                    - Maximum Reservation Time: 6 hours.
                    - Adjacent Reservations Permitted: No.
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.

## Contact

### Primary Engineer

                    -  Liya Yu  liya.yu@nist.gov      (301) 975-4590   

### Backup Engineer

                    -  Marc J. Cangemi  marc.cangemi@nist.gov      (301) 975-5993   

### General Contact

                    -      NanoFab Litho    nanofab_litho@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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