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 TOOLS & INSTRUMENTS

NanoFab Tool: Reactive Ion Etcher 790 Nitride Left
    
  Reactive Ion Etcher 790 Nitride Left
  
      This PlasmaTherm 790 reactive ion etcher (RIE) is a parallel plate plasma etching system which uses fluorocarbon and oxygen gases to etch silicon nitride thin films. The large chamber can accommodate substrates ranging from 200 mm diameter wafers down to small pieces.

Specifications/Capabilities
      
                          Radio frequency (RF) power source: up to 500 W at 13.56 MHz.
	Process Gases: Ar, O2, CF4, CHF3, N2 and SF6
	Reactive ion etching of silicon nitride.
              Usage Information
        
Supported Sample Sizes
                                Maximum wafer diameter: 200 mm (8 in).
	Small pieces supported: Yes.
              Typical Applications
      
                          Anisotropic silicon nitride thin film etching.Back to the NanoFab Equipment List
  Nanotechnology and Nanofabrication / manufacturing
  
            Organizations
      
      NIST HeadquartersLaboratory ProgramsPhysical Measurement LaboratoryPhysical Measurement Laboratory OfficeCenter for Nanoscale Science and Technology
              Details
        
NEMO Name
                                RIE Nitride Left

Location
                                Building 215 Rm. B105 (Cleanroom)
  Campus
                    Gaithersburg
              Hours of Operation
      
                          Cleanroom hours

Tool Reservation Rules
      
                          Minimum Reservation Time: 30 minutes.
	Maximum Reservation Time: 4 hours.
	Adjacent Reservations Permitted: Yes.
	Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.
Contact
      
        

Primary Engineer
        Lei Chen
    
      
  lei.chen@nist.gov
  (301) 975-2908

  

Backup Engineers
        Jessie Zhang
    
      
  chen.zhang@nist.gov
  (301) 975-4565

  Robert Ilic
    
      
  robert.ilic@nist.gov
  (301) 975-3712

  

General Contact
        NanoFab Dryetch
  nogtech@nist.gov
  (301) 975-8672
  100 Bureau Drive, Stop 6201 
  Gaithersburg,
  MD 20899-6201
              Hourly Rates
        
Standard Cost
                                $106

Reduced Cost
                                $57
              Training Rates
        
RIE Nitride Left

Individual Cost
                                $207

Group Cost
                                $106
              Training Time
      
                          Depends on user experience and process requirements; typically 2 hours.

    
    Created March 29, 2022, Updated October 6, 2023
 HEADQUARTERS
            100 Bureau Drive
              Gaithersburg, MD 20899301-975-2000
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