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https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-sandvik-lpcvd-silicon-nitride

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TOOLS & INSTRUMENTS

# NanoFab Tool: Sandvik LPCVD Silicon Nitride

Photo of the Sandvik anneal furnaces

Credit:

The two Sandvik low pressure chemical vapor deposition (LPCVD) silicon nitride furnaces support stoichiometric and low stress silicon nitride deposition on substrates ranging from small chips to wafer diameters up to 150 mm. All samples require SC1 and SC2 cleans prior to processing.

## Specifications/Capabilities

                    - Automatic recipe controller using Variable Parameter Table (VPT)
                    - Maximum Temperature: 825 °C  
                    - Maximum Deposition Thickness: 2 μm
                    - Process Gases: Dichlorosilane (DCS) and ammonia (NH3)
                    - Standard processes:	                       - Stoichiometric nitride deposition
                      - Low stress silicon nitride deposition
                    - Wafer diameters: 75 mm (3 in), 100 mm (4 in), and 150 mm (6 in)
                    - Small pieces supported: Yes

## Typical Applications

                    - Optical waveguides
                    - KOH etch mask
                    - Suspended membrane fabrication
                    - Insulator in microelectronics

## Back to the NanoFab Equipment List

Nanofabrication / manufacturing

## Organizations

                          - NIST Headquarters
                            - Laboratory Programs
                              - Physical Measurement Laboratory
                                - Physical Measurement Laboratory Office
                                  - Center for Nanoscale Science and Technology

## Details

## Hours of Operation

Cleanroom hours

## Facility

## Tool Reservation Rules

                    - Minimum Reservation Time: 4 hours
                    - Maximum Reservation Time: 24 hours 
                    - Adjacent Reservations Permitted: Yes 
                    - Cancelation Policy: Reservations must be canceled at least 12 hours before the scheduled start time.

## Contact

### Primary Engineer

                    -  Richard Kasica  richard.kasica@nist.gov      (301) 975-2693   

### Backup Engineers

                    -  Robert Ilic  robert.ilic@nist.gov      (301) 975-3712   

### General Contact

                    -      NanoFab Furnaces    nanofab_furnaces@nist.gov      (301) 975-8672          100 Bureau Drive, Stop 6201   Gaithersburg,  MD 20899-6201   

### HEADQUARTERS

301-975-2000

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