96830 Federal Register / Vol. 89, No. 234 / Thursday, December 5, 2024 / Rules and Regulations 

Special Conditions for STA 

STA: License Exception STA may not be 

used to ship or transmit ‘‘technology’’ 

specified in this ECCN to any of the 

destinations listed in Country Group A:5 or 

A:6 (see supplement no. 1 to part 740 of 

the EAR). 

List of Items Controlled 

Related Controls: For additional controls that 

apply to this ECCN, see also 

§ 744.11(a)(2)(v) and (a)(3) and 

§ 744.23(a)(4)(iii) of the EAR. 

Related Definitions: N/A 

Items: 

a. ‘‘Technology’’ for the ‘‘development’’ or 

‘‘production’’ of commodities specified by 

3B993. 

b. ‘‘Technology’’ designed or modified to 

increase the number of wafers processed per 

hour, averaged over any time interval, by 

greater than 1%, of equipment specified in 

3B001.f.1 or 3B993.f.1. 

* * * * * 

3E994 ‘‘Technology’’ for the 

‘‘development’’ or ‘‘production’’ of 

commodities specified in 3B994 and 

‘‘technology’’ as follows (see List of 

Items Controlled). 

License Requirements 

Reason for Control: RS, AT 

Control(s) 

Country chart 

(see Supp. No. 1 

to part 738) 

RS applies to entire 

entry.

See § 742.6(a)(11) of 

the EAR. 

AT applies to entire 

entry.

AT Column 1. 

List Based License Exceptions (See Part 740 

for a Description of All License Exceptions) 

TSR: N/A 

Special Conditions for STA 

STA: License Exception STA may not be 

used to ship or transmit ‘‘technology’’ 

specified in this ECCN to any of the 

destinations listed in Country Group A:5 or 

A:6 (see supplement no. 1 to part 740 of 

the EAR). 

List of Items Controlled 

Related Controls: For additional controls that 

apply to this ECCN, see also 

§ 744.11(a)(2)(v) and (a)(3) and 

§ 744.23(a)(4)(iii) of the EAR. 

Related Definitions: N/A 

Items: The list of items controlled is 

contained in the ECCN heading. 

* * * * * 

Matthew S. Borman, 

Principal Deputy Assistant Secretary for 

Strategic Trade and Technology Security. 

[FR Doc. 2024–28270 Filed 12–2–24; 8:45 am] 

BILLING CODE 3510–33–P 

DEPARTMENT OF COMMERCE 

Bureau of Industry and Security 

15 CFR Parts 744 and 748 

[Docket No. 241126–0303] 

RIN 0694–AJ77 

Additions and Modifications to the 

Entity List; Removals From the 

Validated End-User (VEU) Program 

AGENCY: Bureau of Industry and 

Security, Commerce. 

ACTION: Final rule. 

SUMMARY: In this final rule, the Bureau 

of Industry and Security (BIS) amends 

the Export Administration Regulations 

(EAR) by adding 140 entities to the 

Entity List. These entries are listed on 

the Entity List under the destinations of 

China, People’s Republic of (China), 

Japan, South Korea, and Singapore and 

have been determined by the U.S. 

Government to be acting contrary to the 

national security and foreign policy 

interests of the United States. This final 

rule also modifies 14 existing entries on 

the Entity List, consisting of revisions to 

14 entries under China. This final rule 

publishes concurrently with BIS’s 

interim final rule, ‘‘Foreign-Produced 

Direct Product Rule Additions, and 

Refinements to Controls for Advanced 

Computing and Semiconductor 

Manufacturing Items’’ (0694–AJ74), 

which makes additional changes to the 

EAR controls on advanced computing 

items and semiconductor manufacturing 

items. This final rule is part of this 

larger effort to ensure that appropriate 

EAR controls are in place on these 

items, including in connection with 

transactions destined to or otherwise 

involving the entities being added to the 

Entity List, as well as for existing entries 

on the Entity List that are being 

modified. All of these entities (those 

newly added and those being modified) 

are involved with the development and 

production of ‘‘advanced-node 

integrated circuits’’ (‘‘advanced-node 

ICs’’) and/or semiconductor 

manufacturing items, and/or have 

supported the Chinese government’s 

Military-Civil Fusion (MCF) 

Development Strategy. Additionally, 

this final rule designates nine of these 

entities being added and seven of the 

entries being modified as entities for 

which entity-specific restrictions 

involving foreign-produced items apply. 

This final rule also amends the EAR by 

removing three entities from the 

Validated End-User (VEU) Program. 

DATES: 

Effective date: This rule is effective 

December 2, 2024. 

Compliance date: The changes being 

made in this final rule that pertain to 

Entity List license requirements and 

other Entity List-related requirements 

linked to Footnote 5 designations have 

a compliance date of December 31, 

2024. 

FOR FURTHER INFORMATION CONTACT: For 

questions on the Entity List and VEU 

Program changes in this final rule, 

contact Chair, End-User Review 

Committee, Office of the Assistant 

Secretary for Export Administration, 

Bureau of Industry and Security, 

Department of Commerce, Phone: (202) 

482–5991, Email: ERC@bis.doc.gov. 

SUPPLEMENTARY INFORMATION: 

I. Background 

A. Entity List and End-User Review 

Committee (ERC) 

The Entity List (supplement no. 4 to 

part 744 of the EAR (15 CFR parts 730 

through 774)) identifies entities for 

which there is reasonable cause to 

believe, based on specific and 

articulable facts, that the entities have 

been involved, are involved, or pose a 

significant risk of being or becoming 

involved in activities contrary to the 

national security or foreign policy 

interests of the United States, pursuant 

to § 744.11(b). The EAR imposes 

additional license requirements on, and 

limit the availability of, most license 

exceptions for exports, reexports, and 

transfers (in-country) when an entity 

listed on the Entity List is a party to the 

transaction. The license review policy 

for each listed entity is identified in the 

‘‘License Review Policy’’ column on the 

Entity List, and the impact on the 

availability of license exceptions is 

described in the relevant Federal 

Register document that added the entity 

to the Entity List. BIS places entities on 

the Entity List pursuant to parts 744 

(Control Policy: End-User and End-Use 

Based) and 746 (Embargoes and Other 

Special Controls) of the EAR. 

The ERC, composed of representatives 

of the Departments of Commerce 

(Chair), State, Defense, Energy and, 

where appropriate, the Treasury, makes 

all decisions regarding additions to, 

removals from, or other modifications to 

the Entity List. The ERC makes all 

decisions to add an entry to the Entity 

List by majority vote and makes all 

decisions to remove or modify an entry 

by unanimous vote. 


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Federal Register / Vol. 89, No. 234 / Thursday, December 5, 2024 / Rules and Regulations 96831 

B. Addressing National Security and 

Foreign Policy Concerns Involving 

Advanced Computing and 

Semiconductor Manufacturing Items 

This final rule is published 

concurrently with the interim final rule, 

‘‘Foreign-Produced Direct Product Rule 

Additions, and Refinements to Controls 

for Advanced Computing and 

Semiconductor Manufacturing Items’’ 

(0694–AJ74) (FDP IFR), which makes 

additional changes to the EAR controls 

on advanced computing items or 

semiconductor manufacturing items, 

including new Foreign Direct Product 

(FDP) rules for certain commodities to 

impair the capability of certain 

destinations or entities of concern to 

produce ‘‘advanced-node ICs.’’ This 

final rule is part of the larger effort 

reflected in the FDP IFR to ensure 

appropriate EAR controls are in place 

on advanced computing items and 

semiconductor manufacturing items, 

including in connection with the 

entities being added to the Entity List, 

as well as for existing Entity List entries 

that are being modified. All of these 

entities, both those being added and 

those whose entries are being modified, 

are involved with the development and 

production of these ‘‘advanced-node 

ICs’’ and/or semiconductor 

manufacturing items, and/or have 

supported the Chinese government’s 

MCF Development Strategy, activities 

that have been determined to be 

contrary to U.S. national security and 

foreign policy interests. The FDP IFR 

also adds one new FDP rule to § 734.9 

(Foreign-Direct Product Rules) that will 

be set forth in paragraph (e)(3) (Entity 

List FDP rule: Footnote 5). BIS has 

designated nine of the 140 entities being 

added to the Entity List in this rule with 

a Footnote 5, which extends the Entity 

List license requirements to foreign 

direct products subject to the EAR on 

the basis of § 734.9(e)(3). Foreign-made 

items specified in certain ECCNs that 

are destined to an entity with a Footnote 

5 designation may also be subject to the 

EAR on the basis of the de minimis 

provision described in § 734.4(a)(9). 

Entities designated with a Footnote 5 

designation have been determined by 

the ERC to be involved in, or risk 

becoming involved in, the development 

or production of ‘‘advance-node ICs’’ 

that would otherwise require a license 

under § 744.23(a)(2). Section 

744.23(a)(2) imposes a license 

requirement for any item subject to the 

EAR when you know the items will be 

used in the ‘‘development’’ or 

‘‘production’’ of ICs destined to a 

‘‘facility’’ located in Macau or a 

destination specified in Country Group 

D:5 where ‘‘production’’ of ‘‘advancednode ICs’’ occurs. 

II. Entity List Decisions 

A. Additions to the Entity List 

The ERC determined to add the 

following 106 entities to the Entity List: 

ACM Research (Shanghai); Beijing ETown Semiconductor Technology Co., 

Ltd.; Beijing Guowei Integration 

Technology Co., Ltd.; Beijing Huada 

Jiutian Technology Co., Ltd.; Beijing 

Kaishitong Semiconductor Co., Ltd.; 

Beijing Naura Microelectronics 

Equipment Co., Ltd.; Beijing Naura 

Semiconductor Equipment Co., Ltd.; 

Beijing Sevenstar Flowmeter Co., Ltd.; 

Beijing Sevenstar Integrated Circuit 

Equipment Co., Ltd.; Beijing Shuoke 

Zhongkexin Electronic Equipment Co., 

Ltd.; Beijing Skyverse Technology Co., 

Ltd.; Beijing Zhongke Xin Electronic 

Equipment; Changsha Zhichun 

Application Technology Co., Ltd.; 

Chengdu Huada Jiutianke Technology 

Co., Ltd.; Chengdu Skyverse Technology 

Co., Ltd.; Guangzhou Huada Jiutian 

Technology Co., Ltd.; Guangzhou 

Skyverse Technology Co., Ltd.; Guowei 

Group (Shenzhen) Co., Ltd.; Hefei 

Kaishitong Semiconductor Co., Ltd.; 

Hefei Naura Microelectronics 

Equipment Co., Ltd.; Hefei Zhihui 

Semiconductor Application Technology 

Co., Ltd.; Hefei Zhiwei Microelectronics 

Co., Ltd.; Hefei Zhiwei Semiconductor 

Co., Ltd.; Hwa Tsing (Beijing) 

Technology Co., Ltd.; Hwa Tsing 

(Guangzhou) Semiconductor Co., Ltd.; 

Hwa Tsing (Shanghai) Semiconductor 

Co., Ltd.; Hwa Tsing Technology Co., 

Ltd.; Jiangsu Nata Optoelectronic 

Material Co., Ltd.; Jiangsu Qiwei 

Semiconductor Equipment Co., Ltd.; 

Jiangsu Zhichun System Integration Co., 

Ltd.; Kingstone Technology Hong Kong 

Limited; Nanda Optoelectronic 

Semiconductor Materials Co., Ltd.; 

Nanjing Huada Jiutianke Technology 

Co., Ltd.; Naura Technology Group Co., 

Ltd.; Ningbo Nanda Optoelectronic 

Materials Ltd.; Piotech; Piotech (Beijing) 

Co., Ltd.; Piotech (Shanghai) Co., Ltd.; 

Piotech Chuangyi (Shenyang) 

Semiconductor Equipment Co., Ltd.; 

Piotech Jianke (Haining) Semiconductor 

Equipment Co., Ltd.; Qingxin 

Technology Co., Ltd.; Quanjiao Nanda 

Optoelectronic Materials Ltd.; Raintree 

Scientific Instruments (Shanghai) 

Corporation; Ruili Microelectronics 

Equipment (Shanghai) Co., Ltd.; 

Shandong Feiyuan Gas Co., Ltd.; 

Shanghai AGM Gas Co., Ltd.; Shanghai 

Aipusi Precision Equipment Co., Ltd.; 

Shanghai Huada Jiutian Information 

Technology Co., Ltd.; Shanghai Jingce 

Semiconductor Technology Co., Ltd.; 

Shanghai Jingzhuo Information 

Technology Co., Ltd.; Shanghai 

Kaishitong Semiconductor Co., Ltd.; 

Shanghai Lingang Kaishitong 

Semiconductor Co., Ltd.; Shanghai Lizhi 

Technology Co., Ltd.; Shanghai Modern 

Advanced Ultra-Precision 

Manufacturing Center Co., Ltd.; 

Shanghai Nanpre Mechanics Co., Ltd.; 

Shanghai Naura Microelectronics 

Equipment Co., Ltd.; Shanghai Siwave 

Technology Co., Ltd.; Shanghai 

Skyverse Semiconductor Technology 

Co., Ltd.; Shanghai Xinsheng Jingrui 

Semiconductor Technology Co., Ltd.; 

Shanghai Xinsheng Jingtou 

Semiconductor Technology Co., Ltd.; 

Shanghai Xinsheng Jinko 

Semiconductor Technology Co., Ltd.; 

Shanghai Xinsheng Semiconductor 

Technology Co., Ltd.; Shanghai 

Yanquan Technology Co., Ltd.; 

Shanghai Yuwei Semiconductor 

Technology Co., Ltd; Shanghai Zhichun 

Alloy Manufacturing Co., Ltd.; Shanghai 

Zhichun Electronic Technology Co., 

Ltd.; Shanghai Zhichun Optoelectronic 

Equipment Co., Ltd.; Shanghai Zhichun 

Precision Gas Co., Ltd.; Shanghai 

Zhichun Precision Manufacturing Co., 

Ltd.; Shanghai Zhichun Purification 

System Technology Co., Ltd.; Shanghai 

Zhichun Semiconductor Equipment Co., 

Ltd; Shanghai Zhichun System 

Integration Co., Ltd.; Shanghai Zhijia 

Semiconductor Gas Co., Ltd.; Shanghai 

Zixi Optical Technology Co., Ltd.; 

Shengmei Semiconductor Equipment 

(Beijing) Co., Ltd.; Shengmei 

Semiconductor Equipment Wuxi Co., 

Ltd.; Shengwei Semiconductor 

Equipment (Shanghai) Co., Ltd.; 

Shenyang Xinyuan Micro Business 

Development Co., Ltd.; Shenyang 

Xinyuan Microelectronic Equipment 

Co., Ltd.; Shenzhen Guowei Hongbo 

Technology Co., Ltd.; Shenzhen Guowei 

Sensing Technology Co., Ltd.; Shenzhen 

Guoweichip Technology Co., Ltd.; 

Shenzhen Huada Jiutianke Technology 

Co., Ltd.; Shenzhen Naura 

Microelectronics Equipment Co., Ltd.; 

Shenzhen Qianhai Skyverse 

Semiconductor Technology Co., Ltd.; 

Skyverse; Skyverse Limited; Suzhou 

Nanda Optoelectronic Materials Co., 

Ltd.; Taiyuan Jinke Semiconductor 

Technology Co., Ltd.; Ulanqab Nanda 

Microelectronics Materials Co., Ltd.; 

Wuhan Naura Microelectronics 

Equipment Co., Ltd.; Wuhan Skyverse 

Semiconductor Technology Co., Ltd.; 

Wuhan Yiguang Technology Co., Ltd.; 

Wuxi Kaishitong Technology Co., Ltd.; 

Wuxi Naura Microelectronics 

Equipment Co., Ltd.; Xiamen Skyverse 

Technology Co., Ltd.; Xi’an Huada 

Jiutian Technology Co., Ltd.; Xi’an 


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Naura Microelectronics Equipment Co., 

Ltd.; Yusheng Micro Semiconductor 

(Shanghai) Co., Ltd.; Yuwei 

Semiconductor Technology Co., Ltd.; 

Zhejiang Shenqihang Technology Co., 

Ltd.; Zhejiang Zhichun Precision 

Manufacturing Co., Ltd.; Zhiwei 

Semiconductor (Shanghai) Co., Ltd.; 

Zhiyi High Purity Electronic Materials 

(Shanghai) Ltd.; Zhuhai Skyverse 

Technology Co., Ltd.; and Zibo 

Keyuanxin Fluorine Trading Ltd. under 

the destination of China. The ERC 

determined to add Kingsemi Japan K.K. 

under the destination of Japan. The ERC 

determined to add Skyverse Pte. Ltd. 

under the destination of Singapore. The 

ERC determined to add ACM Research 

Korea Co., Ltd. and Empyrean Korea 

under the destination of South Korea. 

These entities aid in the development or 

production of ICs for military end use, 

activity that is contrary to the national 

security and foreign policy interests of 

the United States under § 744.11 of the 

EAR. A license will be required for all 

items subject to the EAR, and a license 

application review policy of a 

presumption of denial will apply. 

The ERC also determined to add 

Shanghai Integrated Circuit Equipment 

& Materials Industry Innovation Center 

Co., Ltd. and Zhangjiang Laboratory, 

both under the destination of China, to 

the Entity List, with a Footnote 5 

designation. These entities aid in the 

development or production of ICs for 

military end use and are involved in the 

development or production of 

‘‘advanced-node ICs,’’ activity that is 

contrary to the national security and 

foreign policy interests of the United 

States under §§ 744.11 and 744.23 of the 

EAR. A license will be required for all 

items subject to the EAR, including 

those specified under § 734.9(e)(3), 

which require a license under 

§ 744.11(a)(2)(v) (Footnote 5). The 

license application review policy is a 

presumption of denial. 

The ERC determined to add Northern 

Integrated Circuit Technology 

Innovation Center (Beijing) Co., Ltd., 

and SMIC Advanced Technology R&D 

(Shanghai) Corporation, both under the 

destination of China, to the Entity List 

with a Footnote 5 designation. These 

entities have acquired or attempted to 

acquire U.S. tools or components, which 

risk supporting the production of 

‘‘advanced-node ICs’’ at facilities of 

entities that are on the Entity List. This 

activity is contrary to the national 

security and foreign policy interests of 

the United States under §§ 744.11 and 

744.23 of the EAR. A license will be 

required for all items subject to the EAR. 

Notably, this requirement applies to 

items specified under § 734.9(e)(3), 

which require a license under 

§ 744.11(a)(2)(v). A license review 

policy of presumption of denial will 

apply. 

The ERC determined to add 

Changguang Jizhi Optical Technology 

Co., Ltd.; Shanghai Feiai Technology 

Co., Ltd.; Shanghai Yuliangsheng 

Technology Co., Ltd.; Shenzhen 

Pengxinxu Technology Co., Ltd.; 

Shenzhen SiCarrier Technologies Co., 

Ltd.; Shenzhen Xinkailai Industrial 

Machinery Co., Ltd.; Shenzhen Zhangge 

Instrument Co., Ltd.; Si’En Qingdao Co. 

Ltd.; SwaySure Technology Co., Ltd.; 

and Zhuhai Cornerstone Technology 

Co., Ltd., all under the destination of 

China, to the Entity List because they 

are, or pose a significant risk of 

becoming, involved in activities 

contrary to the national security or 

foreign policy interests of the United 

States. Specifically, these entities pose a 

significant risk of contributing to the 

efforts of Huawei Technologies Co., 

Ltd., a party on the Entity List, to 

support China’s government’s goal of 

indigenous production of ‘‘advancednode ICs’’ to support its military 

modernization. This significant risk is a 

criterion for adding entities to the Entity 

List under § 744.11(b) of the EAR. For 

Shenzhen Pengxinxu Technology Co., 

Ltd., Si’En Qingdao Co. Ltd., and 

SwaySure Technology Co., Ltd., a 

license will be required for all items 

subject to the EAR, including those 

specified under § 734.9(e)(3), which 

require a license under § 744.11(a)(2)(v) 

(Footnote 5). For Shenzhen Pengxinxu 

Technology Co., Ltd. and SwaySure 

Technology Co., Ltd., the license 

application review policy is a 

presumption of denial, except case-bycase for review for applications 

involving items not described in ECCN 

3B001.a.4, .c, .d, f.1.b.2, .k to .p; 

3B002.c, 3B993, or 3B994. For Si’En 

Qingdao Co. Ltd., the license 

application review policy is a 

presumption of denial. For Changguang 

Jizhi Optical Technology Co., Ltd., 

Shanghai Feiai Technology Co., Ltd., 

Shanghai Yuliangsheng Technology Co., 

Ltd., Shenzhen SiCarrier Technologies 

Co., Ltd., Shenzhen Xinkailai Industrial 

Machinery Co., Ltd., Shenzhen Zhangge 

Instrument Co., Ltd., and Zhuhai 

Cornerstone Technology Co., Ltd., a 

license will be required for all items 

subject to the EAR. The license 

application review policy will be a 

presumption of denial. 

The ERC determined to add Wuhan 

Xinxin Semiconductor Manufacturing 

Company Limited, under the 

destination of China, to the Entity List 

with a Footnote 5 designation, for 

posing a significant risk of becoming 

involved in activities contrary to the 

national security and foreign policy 

interests of the United States under 

§§ 744.11 and 744.23 of the EAR. This 

determination is based on information 

that this company poses a significant 

risk of becoming involved in the 

development or production of 

‘‘advanced-node ICs.’’ A license will be 

required for all items subject to the EAR, 

including those specified under 

§ 734.9(e)(3), which require a license 

under § 744.11(a)(2)(v) (Footnote 5). The 

license review standards set forth in 

§§ 744.11 and 744.23(d) will apply. This 

entity will be eligible for license 

exception Restricted Fabrication Facility 

(RFF) (§ 740.26), a new license 

exception added to part 740 (License 

Exceptions) of the EAR pursuant to the 

FDP IFR published concurrently with 

this final rule. License Exception RFF 

authorizes the export, reexport, and incountry transfer of items described in 

ECCNs 3B991 (except 3B991.b.2.a 

through .b) and 3B992 that are not 

described in ECCN 3B001.a.4, .c, .d, 

f.1.b.2, .k to .p; 3B002.c, 3B993, or 

3B994, subject to the requirements of 

§ 740.26. 

The ERC determined to add JAC 

Capital, Wingtech Technology Co., Ltd., 

and Wise Road Capital under the 

destination of China to the Entity List. 

These additions are being made because 

of these entities’ involvement in aiding 

China’s government’s efforts to acquire 

entities with sensitive semiconductor 

manufacturing capability critical to the 

defense industrial bases of the United 

States and its allies with the objective of 

relocating these entities to China to help 

indigenize a semiconductor 

manufacturing ecosystem. This activity 

is contrary to the national security and 

foreign policy interests of the United 

States under § 744.11 of the EAR. A 

license will be required for all items 

subject to the EAR, and a license review 

policy of a presumption of denial will 

apply. 

The ERC determined to add Beijing 

Guangke Xintu Technology Co., Ltd.; 

Beijing Jingyuan Microelectronics 

Technology Co., Ltd.; Dongfang 

Jingyuan Electron Co., Ltd.; Oriental 

Crystal Microelectronics Technology 

(Qingdao) Co., Ltd.; Oriental Crystal 

Microelectronics Technology (Shanghai) 

Co., Ltd.; Shenzhen Jingyuan 

Information Technology Co., Ltd.; and 

Xinlian Rongchuang Integrated Circuit 

Industry Development (Beijing) Co., Ltd. 

under the destination of China to the 

Entity List for activities contrary to the 

national security and foreign policy 

interests of the United States under 

§ 744.11 of the EAR. Specifically, these 

entities are co-developing lithography 


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technology with advanced-node 

fabrication facilities that produce chips 

for military end use. A license will be 

required for all items subject to the EAR, 

and a license review policy of a 

presumption of denial will apply. 

The ERC determined to add the 

Chinese Academy of Sciences Institute 

of Microelectronics to the Entity List 

under the destination of China with a 

Footnote 5 designation for its support of 

China’s ‘‘advanced-node ICs’’ and 

military modernization efforts, 

including the development or 

production of ‘‘advanced-node ICs’’ for 

military end use and collaboration with 

parties on the Entity List. This activity 

is contrary to the national security and 

foreign policy interests of the United 

States under §§ 744.11 and 744.23 of the 

EAR. A license will be required for all 

items subject to the EAR, including 

those specified under § 734.9(e)(3), 

which require a license under 

§ 744.11(a)(2)(v) (Footnote 5). A license 

review policy of presumption of denial 

will apply. 

The ERC determined to add AccoTest 

Technology Co., Ltd. (Hong Kong), 

Beijing Huafeng Electronic Equipment 

Co., Ltd., Beijing Huafeng Test & Control 

Technology Co., Ltd., and Huafeng Test 

& Control Technology (Tianjin) Co., 

Ltd., all under the destination of China, 

to the Entity List. These additions are 

being made because these entities 

present a risk of diversion of U.S.-origin 

items to parties on the Entity List, 

including entities that play a significant 

role in China’s military modernization. 

This activity is contrary to the national 

security and foreign policy interests of 

the United States under § 744.11 of the 

EAR. A license will be required for all 

items subject to the EAR, and the 

license review policy will be a 

presumption of denial. 

BIS estimates these additions to the 

Entity List will result in an additional 

200 license applications submitted to 

BIS annually. 

For the reasons described above, this 

final rule adds the following 140 entities 

to the Entity List and includes, where 

appropriate, aliases: 

China 

• AccoTest Technology Co., Ltd. 

(Hong Kong); 

• ACM Research (Shanghai); 

• Beijing E-Town Semiconductor 

Technology Co., Ltd.; 

• Beijing Guangke Xintu Technology 

Co., Ltd.; 

• Beijing Guowei Integration 

Technology Co., Ltd.; 

• Beijing Huada Jiutian Technology 

Co., Ltd.; 

• Beijing Huafeng Electronic 

Equipment Co., Ltd.; 

• Beijing Huafeng Test & Control 

Technology Co., Ltd.; 

• Beijing Jingyuan Microelectronics 

Technology Co., Ltd.; 

• Beijing Kaishitong Semiconductor 

Co., Ltd.; 

• Beijing Naura Microelectronics 

Equipment Co., Ltd.; 

• Beijing Naura Semiconductor 

Equipment Co., Ltd.; 

• Beijing Sevenstar Flowmeter Co., 

Ltd.; 

• Beijing Sevenstar Integrated Circuit 

Equipment Co., Ltd.; 

• Beijing Shuoke Zhongkexin 

Electronic Equipment Co., Ltd.; 

• Beijing Skyverse Technology Co., 

Ltd.; 

• Beijing Zhongke Xin Electronic 

Equipment; 

• Changguang Jizhi Optical 

Technology Co., Ltd.; 

• Changsha Zhichun Application 

Technology Co., Ltd.; 

• Chengdu Huada Jiutianke 

Technology Co., Ltd.; 

• Chengdu Skyverse Technology Co., 

Ltd.; 

• Chinese Academy of Sciences 

Institute of Microelectronics; 

• Dongfang Jingyuan Electron Co., 

Ltd.; 

• Guangzhou Huada Jiutian 

Technology Co., Ltd.; 

• Guangzhou Skyverse Technology 

Co., Ltd.; 

• Guowei Group (Shenzhen) Co., Ltd.; 

• Hefei Kaishitong Semiconductor 

Co., Ltd.; 

• Hefei Naura Microelectronics 

Equipment Co., Ltd.; 

• Hefei Zhihui Semiconductor 

Application Technology Co., Ltd.; 

• Hefei Zhiwei Microelectronics Co., 

Ltd.; 

• Hefei Zhiwei Semiconductor Co., 

Ltd.; 

• Huafeng Test & Control Technology 

(Tianjin) Co., Ltd.; 

• Hwa Tsing (Beijing) Technology 

Co., Ltd.; 

• Hwa Tsing (Guangzhou) 

Semiconductor Co., Ltd.; 

• Hwa Tsing (Shanghai) 

Semiconductor Co., Ltd.; 

• Hwa Tsing Technology Co., Ltd.; 

• JAC Capital; 

• Jiangsu Nata Optoelectronic 

Material Co., Ltd.; 

• Jiangsu Qiwei Semiconductor 

Equipment Co., Ltd.; 

• Jiangsu Zhichun System Integration 

Co., Ltd.; 

• Kingstone Technology Hong Kong 

Limited; 

• Nanda Optoelectronic 

Semiconductor Materials Co., Ltd.; 

• Nanjing Huada Jiutianke 

Technology Co., Ltd.; 

• Naura Technology Group Co., Ltd.; 

• Ningbo Nanda Optoelectronic 

Materials Ltd.; 

• Northern Integrated Circuit 

Technology Innovation Center (Beijing) 

Co., Ltd.; 

• Oriental Crystal Microelectronics 

Technology (Qingdao) Co., Ltd.; 

• Oriental Crystal Microelectronics 

Technology (Shanghai) Co., Ltd.; 

• Piotech; 

• Piotech (Beijing) Co., Ltd.; 

• Piotech (Shanghai) Co., Ltd.; 

• Piotech Chuangyi (Shenyang) 

Semiconductor Equipment Co., Ltd.; 

• Piotech Jianke (Haining) 

Semiconductor Equipment Co., Ltd.; 

• Qingxin Technology Co., Ltd.; 

• Quanjiao Nanda Optoelectronic 

Materials Ltd.; 

• Raintree Scientific Instruments 

(Shanghai) Corporation; 

• Ruili Microelectronics Equipment 

(Shanghai) Co., Ltd.; 

• Shandong Feiyuan Gas Co., Ltd.; 

• Shanghai AGM Gas Co., Ltd.; 

• Shanghai Aipusi Precision 

Equipment Co., Ltd.; 

• Shanghai Feiai Technology Co., 

Ltd.; 

• Shanghai Huada Jiutian Information 

Technology Co., Ltd.; 

• Shanghai Integrated Circuit 

Equipment & Materials Industry 

Innovation Center Co., Ltd.; 

• Shanghai Jingce Semiconductor 

Technology Co., Ltd.; 

• Shanghai Jingzhuo Information 

Technology Co., Ltd.; 

• Shanghai Kaishitong 

Semiconductor Co., Ltd.; 

• Shanghai Lingang Kaishitong 

Semiconductor Co., Ltd.; 

• Shanghai Lizhi Technology Co., 

Ltd.; 

• Shanghai Modern Advanced UltraPrecision Manufacturing Center Co., 

Ltd.; 

• Shanghai Nanpre Mechanics Co., 

Ltd.; 

• Shanghai Naura Microelectronics 

Equipment Co., Ltd.; 

• Shanghai Siwave Technology Co., 

Ltd.; 

• Shanghai Skyverse Semiconductor 

Technology Co., Ltd.; 

• Shanghai Xinsheng Jingrui 

Semiconductor Technology Co., Ltd.; 

• Shanghai Xinsheng Jingtou 

Semiconductor Technology Co., Ltd.; 

• Shanghai Xinsheng Jinko 

Semiconductor Technology Co., Ltd.; 

• Shanghai Xinsheng Semiconductor 

Technology Co., Ltd.; 

• Shanghai Yanquan Technology Co., 

Ltd.; 

• Shanghai Yuliangsheng Technology 

Co., Ltd.; 


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96834 Federal Register / Vol. 89, No. 234 / Thursday, December 5, 2024 / Rules and Regulations 

• Shanghai Yuwei Semiconductor 

Technology Co., Ltd.; 

• Shanghai Zhichun Alloy 

Manufacturing Co., Ltd.; 

• Shanghai Zhichun Electronic 

Technology Co., Ltd.; 

• Shanghai Zhichun Optoelectronic 

Equipment Co., Ltd.; 

• Shanghai Zhichun Precision Gas 

Co., Ltd.; 

• Shanghai Zhichun Precision 

Manufacturing Co., Ltd.; 

• Shanghai Zhichun Purification 

System Technology Co., Ltd.; 

• Shanghai Zhichun Semiconductor 

Equipment Co., Ltd; 

• Shanghai Zhichun System 

Integration Co., Ltd.; 

• Shanghai Zhijia Semiconductor Gas 

Co., Ltd.; 

• Shanghai Zixi Optical Technology 

Co., Ltd.; 

• Shengmei Semiconductor 

Equipment (Beijing) Co., Ltd.; 

• Shengmei Semiconductor 

Equipment Wuxi Co., Ltd.; 

• Shengwei Semiconductor 

Equipment (Shanghai) Co., Ltd.; 

• Shenyang Xinyuan Micro Business 

Development Co., Ltd.; 

• Shenyang Xinyuan Microelectronic 

Equipment Co., Ltd.; 

• Shenzhen Guowei Hongbo 

Technology Co., Ltd.; 

• Shenzhen Guowei Sensing 

Technology Co., Ltd.; 

• Shenzhen Guoweichip Technology 

Co., Ltd.; 

• Shenzhen Huada Jiutianke 

Technology Co., Ltd.; 

• Shenzhen Jingyuan Information 

Technology Co., Ltd.; 

• Shenzhen Naura Microelectronics 

Equipment Co., Ltd.; 

• Shenzhen Pengxinxu Technology 

Co., Ltd.; 

• Shenzhen Qianhai Skyverse 

Semiconductor Technology Co., Ltd.; 

• Shenzhen SiCarrier Technologies 

Co., Ltd.; 

• Shenzhen Xinkailai Industrial 

Machinery Co., Ltd.; 

• Shenzhen Zhangge Instrument Co., 

Ltd.; 

• Si’En Qingdao Co. Ltd.; 

• Skyverse; 

• Skyverse Limited; 

• SMIC Advanced Technology R&D 

(Shanghai) Corporation; 

• Suzhou Nanda Optoelectronic 

Materials Co., Ltd.; 

• SwaySure Technology Co., Ltd., 

• Taiyuan Jinke Semiconductor 

Technology Co., Ltd.; 

• Ulanqab Nanda Microelectronics 

Materials Co., Ltd.; 

• Wingtech Technology Co., Ltd.; 

• Wise Road Capital; 

• Wuhan Naura Microelectronics 

Equipment Co., Ltd.; 

• Wuhan Skyverse Semiconductor 

Technology Co., Ltd.; 

• Wuhan Xinxin Semiconductor 

Manufacturing Company Limited; 

• Wuhan Yiguang Technology Co., 

Ltd.; 

• Wuxi Kaishitong Technology Co., 

Ltd.; 

• Wuxi Naura Microelectronics 

Equipment Co., Ltd.; 

• Xiamen Skyverse Technology Co., 

Ltd.; 

• Xi’an Huada Jiutian Technology 

Co., Ltd.; 

• Xi’an Naura Microelectronics 

Equipment Co., Ltd.; 

• Xinlian Rongchuang Integrated 

Circuit Industry Development (Beijing) 

Co., Ltd.; 

• Yusheng Micro Semiconductor 

(Shanghai) Co., Ltd.; 

• Yuwei Semiconductor Technology 

Co., Ltd.; 

• Zhangjiang Laboratory; 

• Zhejiang Shenqihang Technology 

Co., Ltd.; 

• Zhejiang Zhichun Precision 

Manufacturing Co., Ltd.; 

• Zhiwei Semiconductor (Shanghai) 

Co., Ltd.; 

• Zhiyi High Purity Electronic 

Materials (Shanghai) Ltd.; 

• Zhuhai Cornerstone Technology 

Co., Ltd.; 

• Zhuhai Skyverse Technology Co., 

Ltd.; and 

• Zibo Keyuanxin Fluorine Trading 

Ltd. 

Japan 

• Kingsemi Japan K.K. 

Singapore 

• Skyverse Pte. Ltd. 

South Korea 

• ACM Research Korea Co., Ltd.; and 

• Empyrean Korea. 

B. Modifications to the Entity List 

This final rule implements the 

decision of the ERC, or agency members 

of the ERC, to modify certain entries by 

adding Footnote 5 designations, 

updating addresses, and/or revising 

license application review policy. 

Footnote 5 designations are added to 

seven entities under the destination of 

China: Fujian Jinhua Integrated Circuit 

Company, Ltd.; PXW Semiconductor 

Manufactory Co., Ltd.; Semiconductor 

Manufacturing International (Beijing) 

Corporation; Semiconductor 

Manufacturing International 

Corporation (SMIC); Semiconductor 

Manufacturing South China 

Corporation; Shanghai Integrated Circuit 

Research and Development Center; and 

SMIC Northern Integrated Circuit 

Manufacturing (Beijing) Co., Ltd. The 

ERC has determined that these 

modifications for these entities are 

needed to further restrict their ability to 

obtain foreign-produced items that 

could support the production of 

‘‘advanced-node ICs’’ as defined in 

§ 772.1 and referenced in § 744.23. 

China’s indigenous ‘‘advanced-node 

ICs’’ and are associated with diversion 

or military modernization risks. 

Inclusion on the Entity List under 

§ 744.11 of the EAR is warranted, as 

these entities have been involved in 

activities that are contrary to the 

national security and foreign policy 

interests of the United States. 

This rule also modifies the addresses 

for two entities under the destination of 

China: Fujian Jinhua Integrated Circuit 

Company, Ltd. and Semiconductor 

Manufacturing South China 

Corporation, to update existing 

addresses and/or include additional 

addresses associated with these entities. 

In addition, this rule implements the 

decision of the ERC, or agency members 

of the ERC, to modify the license review 

policy for Semiconductor 

Manufacturing International (Beijing) 

Corporation; Semiconductor 

Manufacturing South China 

Corporation; and SMIC Northern 

Integrated Circuit Manufacturing 

(Beijing) Co., Ltd., to adopt a 

presumption of denial license review 

policy. Lastly, this rule implements the 

decision of the ERC to modify the 

license review policy for Semiconductor 

Manufacturing International 

Corporation (SMIC), also under the 

destination of China, to adopt a license 

review policy of a presumption of 

denial for all items subject to the EAR, 

including items described in ECCN 

3B001.a.4, .c, .d, .f.1.b.2, .k to .p; 

3B002.c, 3B993, or 3B994. Case-by-case 

will apply for items used for production 

of 200mm wafers destined to a 200mm 

production facility. 

The ERC also determined to modify 

the license review policy for seven 

SMIC entries on the Entity List under 

the destination of China: Ningbo 

Semiconductor International 

Corporation (NSI); Semiconductor 

Manufacturing International (Shenzhen) 

Corporation; Semiconductor 

Manufacturing International (Tianjin) 

Corporation; SJ Semiconductor; SMIC 

Holdings Limited; SMIC Hong Kong 

International Company Limited; and 

SMIC Semiconductor Manufacturing 

(Shanghai) Co. The license review 

policy further restricts these parties’ 

‘‘development’’ or ‘‘production’’ of 

‘‘advanced-node ICs’’ at semiconductor 

fabrication ‘‘facilities’’ in China. The 

license review standards set forth in 


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Federal Register / Vol. 89, No. 234 / Thursday, December 5, 2024 / Rules and Regulations 96835 

§§ 744.11 and 744.23(d) will apply. The 

license review policy is presumption of 

denial, except case-by-case when 

§ 744.23(d)(3) of the EAR applies. 

III. Validated End-User (VEU) Program 

Decisions 

A. Authorization Validated End-User 

(VEU) 

Validated End-Users (VEUs) are 

designated entities located in eligible 

destinations to which eligible items 

subject to the EAR may be exported, 

reexported, or transferred (in-country) 

under a general EAR authorization 

instead of a license (see § 748.15 

(Authorization Validated End-User 

(VEU)). The names of the VEUs, as well 

as the dates they were designated, and 

the associated eligible destinations (i.e., 

facilities) and items are identified in 

supplement no. 7 to part 748 of the 

EAR. Pursuant to § 748.15, VEU-eligible 

destinations may obtain eligible items 

without the need for the VEU’s supplier 

to obtain an export, reexport, or transfer 

(in-country) license from BIS. VEUeligible items vary among VEUs and 

may include commodities, software, 

and/or technology, apart from items 

controlled for missile technology or 

crime control reasons on the Commerce 

Control List (CCL) (supplement no. 1 to 

part 774 of the EAR). 

VEUs are reviewed and approved by 

the U.S. Government in accordance with 

the provisions of § 748.15 and 

supplement nos. 8 and 9 to part 748 of 

the EAR. The ERC is responsible for 

administering the VEU program. BIS 

amended the EAR in a final rule 

published on June 19, 2007 (72 FR 

33646) to create Authorization VEU. 

B. Removals From the VEU Program 

Under China 

Pursuant to § 748.15 and supplement 

no. 9 to part 748 of the EAR, the ERC 

determined to remove CSMC 

Technologies Corporation (CSMC); 

Shanghai Huahong Grace 

Semiconductor Manufacturing 

Corporation (HHGrace); and Advanced 

Micro-Fabrication Equipment, Inc., 

China, a.k.a., Advanced MicroElectronics Corporation (AMEC). AMEC 

also requested to be removed from the 

VEU Program. This final rule 

accordingly removes these three 

entities’ entries from supplement no. 7 

to part 748 (Authorization Validated 

End-User (VEU): List of Validated EndUsers, Respective Items Eligible for 

Export, Reexport and Transfer (InCountry), and Eligible Destinations). 

Savings Clause 

For the changes being made in this 

final rule, apart from the Entity List 

license requirements and other Entity 

List-related requirements linked to 

Footnote 5 designations, shipments of 

items removed from eligibility for a 

license exception or export, reexport, or 

transfer (in-country) without a license 

(NLR) as a result of this regulatory 

action that were en route aboard a 

carrier to a port of export, reexport, or 

transfer (in-country), on December 2, 

2024, pursuant to actual orders for 

export, reexport, or transfer (in-country) 

to or within a foreign destination, may 

proceed to that destination under the 

previous eligibility for a License 

Exception or export, reexport, or 

transfer (in-country) without a license 

(NLR), provided the export, reexport, or 

transfer (in-country) is completed no 

later than on January 2, 2025. 

For the changes being made in this 

final rule that pertain to Entity List 

license requirements and other Entity 

List-related requirements linked to 

Footnote 5 designations, shipments of 

items removed from eligibility for a 

license exception or export, reexport, or 

transfer (in-country) without a license 

(NLR) as a result of this regulatory 

action that were en route aboard a 

carrier to a port of export, reexport, or 

transfer (in-country), on January 2, 2025, 

pursuant to actual orders for export, 

reexport, or transfer (in-country) to or 

within a foreign destination, may 

proceed to that destination under the 

previous eligibility for a license 

exception or export, reexport, or transfer 

(in-country) without a license (NLR), 

provided the export, reexport, or 

transfer (in-country) is completed no 

later than on January 31, 2025. 

Export Control Reform Act of 2018 

On August 13, 2018, the President 

signed into law the John S. McCain 

National Defense Authorization Act for 

Fiscal Year 2019, which included the 

Export Control Reform Act of 2018 

(ECRA) (codified, as amended, at 50 

U.S.C. 4801–4852). ECRA provides the 

legal basis for BIS’s principal authorities 

and serves as the authority under which 

BIS issues this rule. In particular, 

Section 1753 of ECRA (50 U.S.C. 4812) 

authorizes the regulation of exports, 

reexports, and transfers (in-country) of 

items subject to U.S. jurisdiction. 

Further, Section 1754(a)(1)–(16) of 

ECRA (50 U.S.C. 4813(a)(1)–(16)) 

authorizes, inter alia, establishing and 

maintaining a list of foreign persons and 

end uses that are determined to be a 

threat to the national security and 

foreign policy of the United States 

pursuant to the policy set forth in 

Section 1752(2)(A), and restricting 

exports, reexports, and in-country 

transfers of any controlled items to any 

foreign person or end-use so listed; 

apprising the public of changes in 

policy, regulations, and procedures; and 

any other action necessary to carry out 

ECRA that is not otherwise prohibited 

by law. Pursuant to Section 1762(a) of 

ECRA (50 U.S.C. 4821(a)), these changes 

can be imposed in a final rule without 

prior notice and comment. 

Rulemaking Requirements 

Executive Orders 12866, 13563, and 

14094 direct agencies to assess all costs 

and benefits of available regulatory 

alternatives and, if regulation is 

necessary, to select regulatory 

approaches that maximize net benefits 

(including potential economic, 

environmental, public health and safety 

effects and distributive impacts and 

equity). Executive Order 13563 

emphasizes the importance of 

quantifying both costs and benefits and 

of reducing costs, harmonizing rules, 

and promoting flexibility. This rule has 

been determined to be not significant for 

purposes of Executive Order 12866. 

2. Notwithstanding any other 

provision of law, no person is required 

to respond to, nor shall any person be 

subject to a penalty for failure to comply 

with, a collection of information subject 

to the requirements of the Paperwork 

Reduction Act of 1995 (PRA) (44 U.S.C. 

3501 et seq.), unless that collection of 

information displays a currently valid 

Office of Management and Budget 

(OMB) Control Number. This rule 

involves the following OMB-approved 

collections of information subject to the 

PRA: 

• 0694–0088, ‘‘Simple Network 

Application Process and Multipurpose 

Application Form,’’ which carries a 

burden hour estimate of 29.4 minutes 

for a manual or electronic submission; 

• 0694–0096 ‘‘Five Year Records 

Retention Period,’’ which carries a 

burden hour estimate of less than 1 

minute; and 

• 0607–0152 ‘‘Automated Export 

System (AES) Program,’’ which carries a 

burden hour estimate of 3 minutes per 

electronic submission. 

BIS estimates that these Entity List 

additions and modifications and three 

removals of entities from the VEU 

Program under the EAR will result in an 

increase of 200 license applications 

submitted annually to BIS. However, the 

additional burden falls within the 

existing estimates currently associated 

with these control numbers. Additional 

information regarding these collections 

of information, including all 


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96836 Federal Register / Vol. 89, No. 234 / Thursday, December 5, 2024 / Rules and Regulations 

background materials, can be found at: 

https://www.reginfo.gov/public/do/ 

PRAMain by using the search function 

to enter either the title of the collection 

or the OMB Control Number. 

3. This rule does not contain policies 

with federalism implications as that 

term is defined in Executive Order 

13132. 

4. Pursuant to section 1762 of the 

Export Control Reform Act of 2018, this 

action is exempt from the 

Administrative Procedure Act (APA) (5 

U.S.C. 553) requirements for notice of 

proposed rulemaking, opportunity for 

public participation, and delay in 

effective date. While Section 1762 of 

ECRA provides sufficient authority for 

such an exemption, this action is also 

independently exempt from these APA 

requirements because it involves a 

military or foreign affairs function of the 

United States (5 U.S.C. 553(a)(1)). 

5. Because a notice of proposed 

rulemaking and an opportunity for 

public comment are not required to be 

given for this rule by 5 U.S.C. 553, or 

by any other law, the analytical 

requirements of the Regulatory 

Flexibility Act (5 U.S.C. 601, et seq.) are 

not applicable. Accordingly, no 

regulatory flexibility analysis is 

required, and none has been prepared. 

List of Subjects 

15 CFR Part 744 

Exports, Reporting and recordkeeping 

requirements, Terrorism. 

15 CFR Part 748 

Administrative practice and 

procedure, Exports, Reporting and 

recordkeeping requirements. 

Accordingly, parts 744 and 748 of the 

Export Administration Regulations (15 

CFR parts 730 through 774) are 

amended as follows: 

PART 744—CONTROL POLICY: ENDUSER AND END-USE BASED 

■ 1. The authority citation for part 744 

continues to read as follows: 

Authority: 50 U.S.C. 4801–4852; 50 U.S.C. 

4601 et seq.; 50 U.S.C. 1701 et seq.; 22 U.S.C. 

3201 et seq.; 42 U.S.C. 2139a; 22 U.S.C. 7201 

et seq.; 22 U.S.C. 7210; E.O. 12058, 43 FR 

20947, 3 CFR, 1978 Comp., p. 179; E.O. 

12851, 58 FR 33181, 3 CFR, 1993 Comp., p. 

608; E.O. 12938, 59 FR 59099, 3 CFR, 1994 

Comp., p. 950; E.O. 13026, 61 FR 58767, 3 

CFR, 1996 Comp., p. 228; E.O. 13099, 63 FR 

45167, 3 CFR, 1998 Comp., p. 208; E.O. 

13222, 66 FR 44025, 3 CFR, 2001 Comp., p. 

783; E.O. 13224, 66 FR 49079, 3 CFR, 2001 

Comp., p. 786; Notice of September 18, 2024, 

89 FR 77011 (September 20, 2024); Notice of 

November 7, 2024, 89 FR 88867 (November 

8, 2024). 

■ 2. Amend supplement no. 4 to part 

744 by: 

■ a. Under CHINA, PEOPLE’S 

REPUBLIC OF, by: 

■ i. Adding, in alphabetical order, 

entries for ‘‘AccoTest Technology Co., 

Ltd. (Hong Kong)’’; ‘‘ACM Research 

(Shanghai)’’; ‘‘Beijing E-Town 

Semiconductor Technology Co., Ltd.’’; 

‘‘Beijing Guangke Xintu Technology Co., 

Ltd.’’; ‘‘Beijing Guowei Integration 

Technology Co., Ltd.’’; ‘‘Beijing Huada 

Jiutian Technology Co., Ltd.’’; ‘‘Beijing 

Huafeng Electronic Equipment Co., 

Ltd.’’; ‘‘Beijing Huafeng Test & Control 

Technology Co., Ltd.’’; ‘‘Beijing 

Jingyuan Microelectronics Technology 

Co., Ltd.’’; ‘‘Beijing Kaishitong 

Semiconductor Co., Ltd.’’; ‘‘Beijing 

Naura Microelectronics Equipment Co., 

Ltd.’’; ‘‘Beijing Naura Semiconductor 

Equipment Co., Ltd.’’; ‘‘Beijing 

Sevenstar Flowmeter Co., Ltd.’’; 

‘‘Beijing Sevenstar Integrated Circuit 

Equipment Co., Ltd.’’; ‘‘Beijing Shuoke 

Zhongkexin Electronic Equipment Co., 

Ltd.’’; ‘‘Beijing Skyverse Technology 

Co., Ltd.’’; ‘‘Beijing Zhongke Xin 

Electronic Equipment’’; ‘‘Changguang 

Jizhi Optical Technology Co., Ltd.’’; 

‘‘Changsha Zhichun Application 

Technology Co., Ltd.’’; ‘‘Chengdu Huada 

Jiutianke Technology Co., Ltd.’’; 

‘‘Chengdu Skyverse Technology Co., 

Ltd.’’; ‘‘Chinese Academy of Sciences 

Institute of Microelectronics’’; and 

‘‘Dongfang Jingyuan Electron Co., Ltd.’’; 

■ ii. Revising the entry for ‘‘Fujian 

Jinhua Integrated Circuit Company, 

Ltd.’’; 

■ iii. Adding, in alphabetical order, 

entries for ‘‘Guangzhou Huada Jiutian 

Technology Co., Ltd.’’; ‘‘Guangzhou 

Skyverse Technology Co., Ltd.’’; 

‘‘Guowei Group (Shenzhen) Co., Ltd.’’; 

‘‘Hefei Kaishitong Semiconductor Co., 

Ltd.’’; ‘‘Hefei Naura Microelectronics 

Equipment Co., Ltd.’’; ‘‘Hefei Zhihui 

Semiconductor Application Technology 

Co., Ltd.’’; ‘‘Hefei Zhiwei 

Microelectronics Co., Ltd.’’; ‘‘Hefei 

Zhiwei Semiconductor Co., Ltd.’’; 

‘‘Huafeng Test & Control Technology 

(Tianjin) Co., Ltd.’’; ‘‘Hwa Tsing 

(Beijing) Technology Co., Ltd.’’; ‘‘Hwa 

Tsing (Guangzhou) Semiconductor Co., 

Ltd.’’; ‘‘Hwa Tsing (Shanghai) 

Semiconductor Co., Ltd.’’; ‘‘Hwa Tsing 

Technology Co., Ltd.’’; ‘‘JAC Capital’’; 

‘‘Jiangsu Nata Optoelectronic Material 

Co., Ltd.’’; ‘‘Jiangsu Qiwei 

Semiconductor Equipment Co., Ltd.’’; 

‘‘Jiangsu Zhichun System Integration 

Co., Ltd.’’; ‘‘Kingstone Technology Hong 

Kong Limited’’; ‘‘Nanda Optoelectronic 

Semiconductor Materials Co., Ltd.’’; 

‘‘Nanjing Huada Jiutianke Technology 

Co., Ltd.’’; ‘‘Naura Technology Group 

Co., Ltd.’’; and ‘‘Ningbo Nanda 

Optoelectronic Materials Ltd.’’; 

■ iv. Revising the entry for ‘‘Ningbo 

Semiconductor International 

Corporation (NSI)’’; 

■ v. Adding, in alphabetical order, 

entries for ‘‘Northern Integrated Circuit 

Technology Innovation Center (Beijing) 

Co., Ltd.’’; ‘‘Oriental Crystal 

Microelectronics Technology (Qingdao) 

Co., Ltd.’’; ‘‘Oriental Crystal 

Microelectronics Technology (Shanghai) 

Co., Ltd.’’; ‘‘Piotech’’; ‘‘Piotech (Beijing) 

Co., Ltd.’’; ‘‘Piotech (Shanghai) Co., 

Ltd.’’; ‘‘Piotech Chuangyi (Shenyang) 

Semiconductor Equipment Co., Ltd.; 

and ‘‘Piotech Jianke (Haining) 

Semiconductor Equipment Co., Ltd.’’; 

■ vi. Revising the entry for ‘‘PXW 

Semiconductor Manufactory Co., Ltd.’’; 

■ vii. Adding, in alphabetical order, 

entries for ‘‘Qingxin Technology Co., 

Ltd.’’; ‘‘Quanjiao Nanda Optoelectronic 

Materials Ltd.’’; ‘‘Raintree Scientific 

Instruments (Shanghai) Corporation’’; 

‘‘Ruili Microelectronics Equipment 

(Shanghai) Co., Ltd.’’; and ‘‘S2C 

Limited’’; 

■ viii. Revising the entries for 

‘‘Semiconductor Manufacturing 

International (Beijing) Corporation’’; 

‘‘Semiconductor Manufacturing 

International Corporation (SMIC)’’; 

‘‘Semiconductor Manufacturing 

International (Shenzhen) Corporation’’; 

‘‘Semiconductor Manufacturing 

International (Tianjin) Corporation’’; 

and ‘‘Semiconductor Manufacturing 

South China Corporation’’; 

■ ix. Adding, in alphabetical order, 

entries for ‘‘Shandong Feiyuan Gas Co., 

Ltd.’’; ‘‘Shanghai AGM Gas Co., Ltd.’’; 

‘‘Shanghai Aipusi Precision Equipment 

Co., Ltd.’’; ‘‘Shanghai Feiai Technology 

Co., Ltd.’’; ‘‘Shanghai Huada Jiutian 

Information Technology Co., Ltd.’’; and 

‘‘Shanghai Integrated Circuit Equipment 

& Materials Industry Innovation Center 

Co., Ltd.’’; 

■ x. Revising the entry for ‘‘Shanghai 

Integrated Circuit Research and 

Development Center’’; 

■ xi. Adding, in alphabetical order, 

entries for ‘‘Shanghai Jingce 

Semiconductor Technology Co., Ltd.’’; 

‘‘Shanghai Jingzhuo Information 

Technology Co., Ltd.’’; ‘‘Shanghai 

Kaishitong Semiconductor Co., Ltd.’’; 

‘‘Shanghai Lingang Kaishitong 

Semiconductor Co., Ltd.’’; ‘‘Shanghai 

Lizhi Technology Co., Ltd.’’; 

■ xii. Revising the entry for ‘‘Shanghai 

Micro Electronics Equipment (Group) 

Co., Ltd.’’; 

■ xiii. Adding, in alphabetical order, 

entries for ‘‘Shanghai Modern Advanced 

Ultra-Precision Manufacturing Center 

Co., Ltd.’’; ‘‘Shanghai Nanpre 

Mechanics Co., Ltd.’’; ‘‘Shanghai Naura 


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Microelectronics Equipment Co., Ltd.’’; 

‘‘Shanghai Siwave Technology Co., 

Ltd.’’; ‘‘Shanghai Skyverse 

Semiconductor Technology Co., Ltd.’’; 

‘‘Shanghai Xinsheng Jingrui 

Semiconductor Technology Co., Ltd.’’; 

‘‘Shanghai Xinsheng Jingtou 

Semiconductor Technology Co., Ltd.’’; 

‘‘Shanghai Xinsheng Jinko 

Semiconductor Technology Co., Ltd.’’; 

‘‘Shanghai Xinsheng Semiconductor 

Technology Co., Ltd.’’; ‘‘Shanghai 

Yanquan Technology Co., Ltd.’’; 

‘‘Shanghai Yuliangsheng Technology 

Co.’’, Ltd.’’; ‘‘Shanghai Yuwei 

Semiconductor Technology Co., Ltd’’; 

‘‘Shanghai Zhichun Alloy 

Manufacturing Co., Ltd.’’; ‘‘Shanghai 

Zhichun Electronic Technology Co., 

Ltd.’’; ‘‘Shanghai Zhichun 

Optoelectronic Equipment Co., Ltd.’’; 

‘‘Shanghai Zhichun Precision Gas Co., 

Ltd.’’; ‘‘Shanghai Zhichun Precision 

Manufacturing Co., Ltd.’’; ‘‘Shanghai 

Zhichun Purification System 

Technology Co., Ltd.’’; ‘‘Shanghai 

Zhichun Semiconductor Equipment Co., 

Ltd’’; ‘‘Shanghai Zhichun System 

Integration Co., Ltd.’’; ‘‘Shanghai Zhijia 

Semiconductor Gas Co., Ltd.’’; 

‘‘Shanghai Zixi Optical Technology Co., 

Ltd.’’; ‘‘Shengmei Semiconductor 

Equipment (Beijing) Co., Ltd.’’; 

‘‘Shengmei Semiconductor Equipment 

Wuxi Co., Ltd.’’; ‘‘Shengwei 

Semiconductor Equipment (Shanghai) 

Co., Ltd.’’; ‘‘Shenyang Xinyuan Micro 

Business Development Co., Ltd.’’, 

‘‘Shenyang Xinyuan Microelectronic 

Equipment Co., Ltd.’’; ‘‘Shenzhen 

Guowei Hongbo Technology Co., Ltd.’’; 

‘‘Shenzhen Guowei Sensing Technology 

Co., Ltd.’’; ‘‘Shenzhen Guoweichip 

Technology Co., Ltd.’’; ‘‘Shenzhen 

Huada Jiutianke Technology Co., Ltd.’’; 

‘‘Shenzhen Jingyuan Information 

Technology Co., Ltd.’’; ‘‘Shenzhen 

Naura Microelectronics Equipment Co., 

Ltd.’’; ‘‘Shenzhen Pengxinxu 

Technology Co., Ltd.’’; ‘‘Shenzhen 

Qianhai Skyverse Semiconductor 

Technology Co., Ltd.’’; ‘‘Shenzhen 

SiCarrier Technologies Co., Ltd.’’; 

‘‘Shenzhen Xinkailai Industrial 

Machinery Co., Ltd.’’; ‘‘Shenzhen 

Zhangge Instrument Co., Ltd.’’; and 

‘‘Si’En Qingdao Co. Ltd.’’; 

■ xiv. Revising the entry for ‘‘SJ 

Semiconductor’’; 

■ xv. Adding, in alphabetical order, 

entries for ‘‘Skyverse’’; ‘‘Skyverse 

Limited’’; and ‘‘SMIC Advanced 

Technology R&D (Shanghai) 

Corporation’’; 

■ xvi. Revising the entries for ‘‘SMIC 

Holdings Limited’’; ‘‘SMIC Hong Kong 

International Company Limited’’; 

‘‘SMIC Northern Integrated Circuit 

Manufacturing (Beijing) Co., Ltd.’’; and 

‘‘SMIC Semiconductor Manufacturing 

(Shanghai) Co., Ltd.’’; and 

■ xvii. Adding, in alphabetical order, 

entries for ‘‘Suzhou Nanda 

Optoelectronic Materials Co., Ltd.’’; 

‘‘SwaySure Technology Co., Ltd.’’; 

‘‘Taiyuan Jinke Semiconductor 

Technology Co., Ltd.’’; ‘‘Ulanqab Nanda 

Microelectronics Materials Co., Ltd.’’; 

‘‘Wingtech Technology Co., Ltd.’’; 

‘‘Wise Road Capital’’; ‘‘Wuhan Naura 

Microelectronics Equipment Co., Ltd.’’, 

‘‘Wuhan Skyverse Semiconductor 

Technology Co., Ltd.’’; ‘‘Wuhan Xinxin 

Semiconductor Manufacturing 

Company Limited’’; ‘‘Wuhan Yiguang 

Technology Co., Ltd.’’; ‘‘Wuxi 

Kaishitong Technology Co., Ltd.’’; 

‘‘Wuxi Naura Microelectronics 

Equipment Co., Ltd.’’; ‘‘Xiamen 

Skyverse Technology Co., Ltd.’’; ‘‘Xi’an 

Huada Jiutian Technology Co., Ltd.’’; 

and ‘‘Xi’an Naura Microelectronics 

Equipment Co., Ltd.’’; Xinlian 

Rongchuang Integrated Circuit Industry 

Development (Beijing) Co., Ltd.’’; 

‘‘Yusheng Micro Semiconductor 

(Shanghai) Co., Ltd.’’; ‘‘Yuwei 

Semiconductor Technology Co., Ltd.’’; 

‘‘Zhangjiang Laboratory’’; ‘‘Zhejiang 

Shenqihang Technology Co., Ltd.’’, 

‘‘Zhejiang Zhichun Precision 

Manufacturing Co., Ltd.’’; ‘‘Zhiwei 

Semiconductor (Shanghai) Co., Ltd.’’; 

‘‘Zhiyi High Purity Electronic Materials 

(Shanghai) Ltd.’’; ‘‘Zhuhai Cornerstone 

Technology Co., Ltd.’’; ‘‘Zhuhai 

Skyverse Technology Co., Ltd.’’; and 

‘‘Zibo Keyuanxin Fluorine Trading 

Ltd.’’; 

■ b. Under Japan, by adding, in 

alphabetical order, an entry for 

‘‘Kingsemi Japan K.K.’’; 

■ c. Under Singapore, adding, in 

alphabetical order, an entry for 

‘‘Skyverse Pte. Ltd.’’; 

■ d. Under South Korea, adding, in 

alphabetical order, entries for ‘‘ACM 

Research Korea Co., Ltd.’’; and 

‘‘Empyrean Korea’’; and 

■ e. Adding Footnote 5. 

The additions and revisions read as 

follows: 

Supplement No. 4 to Part 744—Entity 

List 

* * * * * 

Country Entity License 

requirement 

License 

review policy 

Federal Register 

citation 

*******

CHINA, PEOPLE’S 

REPUBLIC OF.

* * * * * * 

AccoTest Technology Co., Ltd. (Hong Kong), 

Rm. 211 2/F MIRROR CTR, Tsim Sha Tsui 

East, Hong Kong.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

******

ACM Research (Shanghai), a.k.a., the following 

four aliases: 

—Shengmei Shanghai; 

—ACM Shanghai; 

—Shengmei Semiconductor Equipment (Shanghai) Co., Ltd.; and 

—ACMSH. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Building 4, No. 1690 Cailun Road, Zhangjiang 

High-Tech Park, Shanghai, China; and 604–1 

IC Design Building, No. 33 Xinda Road, Wuxi, 

China; and About 170 meters northeast of the 

intersection of Luwu Highway and Xinyuan 

South Road, Pudong New District, Shanghai, 

China.

******


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Beijing E-Town Semiconductor Technology Co., 

Ltd., a.k.a., the following four aliases: 

—BEST; 

—BEST Semiconductor; 

—Beijing Yitang Semiconductor Technology; 

and 

—Yitang Semiconductor. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER ] December 5, 

2024. 

No. 9 Ruihe West 2nd Road, Beijing, China and 

Building 8, No. 28 Jinghai 2nd Road, Beijing, 

China; and Rooms 610 and 611, 6th Floor, 

Main Building, Customs Clearance Service 

Center, No. 5 Tonghai 1st Road, Xiliu Street 

Office, Xi’an, China; and No. 601 and 605, 

Building A, Huaxin Headquarters Base, No. 

426 Gaoxin Avenue, Wuhan, China; and 

Room 706, IC Design Building A 33–2, Xinda 

Road, Xinwu District, Wuxi, China; and Floor 

4–5, Building D, Import and Export Commodity Exhibition and Trading Center, at the 

intersection of Dongfang Avenue and Dayu 

Road, Xinzhan District, Hefei, China.

* * * * * * 

Beijing Guangke Xintu Technology Co., Ltd., No. 

22, Ronghua Middle Road, Room 3101, 31F, 

Building 1, Beijing Economic and Technological Development Zone, Beijing, China and 

3101 Floor 31, Building 1, No. 22 Courtyard, 

Ronghua M. Road, Beijing Economic Technology Development Zone, Beijing 100000 

China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Beijing Guowei Integration Technology Co., Ltd., 

10th Floor, Building 1, No. 24, Jiuxianqiao 

Middle Road, Chaoyang District, Beijing, 

China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Beijing Huada Jiutian Technology Co., Ltd., 

a.k.a., the following five aliases: 

—Empyrean; 

—Huada Empyrean; 

—Empyrean Technology; 

—Huada Jiutian; and 

—BGI Jiutian. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

2nd Floor, Building A, No. 2, Lizezhong 2nd 

Road, Chaoyang District, Beijing, China.

Beijing Huafeng Electronic Equipment Co., Ltd., 

10/F, 2 Bldg., 1# Haiying Rd., Fengtai Dist., 

Beijing, 100070, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Beijing Huafeng Test & Control Technology Co., 

Ltd., a.k.a. the following three aliases: 

—AccoTEST; 

—AccoTEST BU. of Huafeng Test & Control 

Co., Ltd.; and 

—HFTC. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

101, 102, 103, Floor 5, 1, Building 5, No. 9 

Courtyard, Fenghao E. Road, Haidian District, 

Beijing 100094, China; and Building 5, IC 

Park, No. 9 Fenghao East Road, Haidian District, Beijing 100094, China; and 17th Floor, 

Building 2, Qimeng Cross-border Xiangfu 

Park, No. 116 Xianghong Road, Gongshu District, Hangzhou, Zhejiang Province, China; 

and 1102, Tianan Smart City A3, No. 228 

Linghu Avenue, Xinwu District, Wuxi, Jiangsu 

Province, China; and Room 414, No. 1, 88 

Shengrong Road, Pudong New Area, Shanghai, China; and 1603–1604, Mega Plaza, No. 

1027 Changning Road, Changning District, 

Shanghai, China; and Room A1–309, Tower 

Building, Ascendas Innovation Park, No. 388 

Xinping Street, Suzhou Industrial Park, 

Jiangsu Province, China; and Room 805, 

Lianyi Center, No. 83 Mingguang Road, 

Weiyang District, Xi’an, Shaanxi Province, 

China; and Shenzhen Software Park, Keji 

Middle 2nd Road, Nanshan District, 

Shenzhen, Guangdong Province, China.

* * * * * * 

Beijing Jingyuan Microelectronics Technology 

Co., Ltd., a.k.a., the following two aliases: 

—Zhongke Jingyuan Microelectronics Technology (Beijing) Co., Ltd.; and 

—Casue. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 


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No. 156, Jinghai 4th Road, Building 12, 5th 

Floor, Beijing Economic and Technological 

Development Zone, Beijing, China.

* * * * * * 

Beijing Kaishitong Semiconductor Co., Ltd., 

a.k.a., the following one alias: 

—Beijing Kingstone Semiconductor. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Floor 1, Building 2, No. 15, Jingsheng South 4th 

Street, Beijing Economic and Technological 

Development Zone (Tongzhou), Beijing, 

China; and 3rd Floor, Block A2, Digital Manor, 

No. 1 Disheng West Road, Beijing Economic 

and Technological Development Zone, Beijing, 

China.

* * * * * * 

Beijing Naura Microelectronics Equipment Co., 

Ltd., a.k.a. the following five aliases: 

—Beijing Naura; 

—Northern Huachuang Microelectronics Equipment; 

—Beijing Naura Microele Eq Co.; 

—Beifang Huachuang Microelectronics Equipment; and 

—Beijing Naura Microelectronics. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 8, Wenchang Avenue, Beijing Economic and 

Technological Development Zone, Beijing, 

China; and No. 1 Jiuxianqiao East Road, 

Chaoyang District, Beijing, China; and Room 

101, Floor 1 to 4, Building 1, No. 20, Jinshi 

Road, Mafang Town, Pinggu District, Beijing, 

China.

Beijing Naura Semiconductor Equipment Co., 

Ltd., Room 101, Floor 1 to 4, Building 1, No. 

20, Jinshi Road, Mafang Town, Pinggu District, Beijing, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Beijing Sevenstar Flowmeter Co., Ltd., a.k.a., 

the following one alias: 

—Beijing Qixing Flowmeter Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

4S01, 4th Floor, Building 1, No. 8 Wenchang 

Avenue, Beijing, China.

Beijing Sevenstar Integrated Circuit Equipment 

Co., Ltd., a.k.a., the following one alias: 

—Beijing Qixing Integrated Circuit Equipment 

Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 6 Zhuyuan 3rd Street, Shunyi District, Beijing, China.

Beijing Shuoke Zhongkexin Electronic Equipment Co., Ltd., a.k.a., the following one alias: 

—SemiCore ZKX. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

1st Floor, Building 1, No. 6, Xingguang 2nd 

Street, Tongzhou District, Beijing, China and 

Room 2301, Luguyuyuan Entrepreneurship 

Building, No. 27 Wenxuan Road, Changsha, 

China.

* * * * * * 

Beijing Skyverse Technology Co., Ltd., a.k.a., 

the following one alias: 

—Beijing Nanolighting Technology Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 101–18, Floor 1, Building B1, No. 3 

Disheng Middle Road, Beijing, China.

* * * * * * 

Beijing Zhongke Xin Electronic Equipment, 

a.k.a., the following three aliases: 

—ZKX; 

—Zhongkexin; and 

—CETC Beijing Zhongke Xin Electronic Equipment. 

For all items subject to the EAR. 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 6, Xingguang 2nd Street, Zhongguancun 

Science and Technology Park, Tongzhou District, Beijing, China and Office Building No. 44, 

North Gate, No. 20 Fuxing Road, Haidian District, Beijing, China.

* * * * * * 

Changguang Jizhi Optical Technology Co., Ltd., 

a.k.a., the following one alias: 

—Zetop. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Building 1, No. 3033 Pudong Road, Changchun 

Economic and Technological Development 

Zone, Changchun, China.

******


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citation 

Changsha Zhichun Application Technology Co., 

Ltd., No. 204, 2nd Floor, Building 1, Peak, 

Gushan Sports Park, Jinjiachong Road, 

Wangcheng District, Changsha, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Chengdu Huada Jiutianke Technology Co., Ltd., 

a.k.a., the following two aliases: 

—Chengdu Huada; and 

—Chengdu Empyrean. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 518, Guoxin Avenue, Shuangliu District, 

Chengdu, China.

Chengdu Skyverse Technology Co., Ltd., a.k.a., 

the following one alias: 

—Chengdu Nanolighting Technology Co., Ltd., 

Room 1307, Floor 13, Unit 1, Building 1, No. 

99 Tianfu 2nd Street, Chengdu, China 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Chinese Academy of Sciences Institute of Microelectronics, a.k.a., the following 6 aliases: 

—CAS IME; 

—IME CAS; 

—IMECAS; 

—CAS Institute of Microelectronics; 

—CAS Microelectronics Institute; and 

—Institute of Microelectronics of the Chinese 

Academy of Sciences. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 734.9(e)(3), 

and 744.11 of the EAR) 5.

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

#3 Beitucheng West Road, Chaoyang District, 

Beijing, China; and No. 3, North Tucheng 

West Road, Chaoyang District, Beijing, China.

* * * * * * 

Dongfang Jingyuan Electron Co., Ltd., a.k.a., the 

following five aliases: 

—DJEL; 

—Dongfang Jingyuan Electron Limited; 

—Oriental Crystal Microelectronics Technology 

(Beijing Co., Ltd.); 

—Dongfang Jingyuan Micro-Electronic Technology (Beijing) Co., Ltd.; and 

—Oriental Crystal Source. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 156 Jinghai 4th Road, Building 12, Beijing 

Economic and Technological Development 

Zone, Beijing, China and No. 156 Jinghai 4th 

Road, Building A4, Beijing Economic and 

Technological Development Zone, Beijing, 

China and Room 301F, Block C, Yingdali 

Technology Digital Park, Futian Free Trade 

Zone, Fubao Street, Futian District, Shenzhen, 

China and Building 12, Yard 156, Jinghai 4th 

Road, Economic and Technological Development Zone Beijing, 100001, China.

* * * * * * 

Fujian Jinhua Integrated Circuit Company, Ltd., 

a.k.a., the following one alias: 

—JHICC. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 83 FR 54521, 10/30/18. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 

Sanchuang Park, Century Avenue Jinjiang City, 

Fujian Province, China; and No. 88, Lianhua 

Avenue, Jinjiang Integrated Circuit Science 

Park, Quanzhou City, Fujian Province, China.

******

Guangzhou Huada Jiutian Technology Co., Ltd., 

a.k.a., the following two aliases: 

—Guangzhou Huada; and 

—Guangzhou Empyrean. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 1006, Building A, No. 18 Keke Avenue, 

Huangpu District, Guangzhou, China.

******

Guangzhou Skyverse Technology Co., Ltd., 

a.k.a., the following one alias: 

—Guangzhou Nanolighting Technology Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 406–502, No. 1 Yichuang Street, 

Huangpu District, Guangzhou, China.

******

Guowei Group (Shenzhen) Co., Ltd., a.k.a., the 

following three aliases: 

—Guowei Group; 

—SMIT Group; and 

—SMIT Shenzhen. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 22A, Guoshi Building, No. 1801 Shahe 

West Road, High-tech Zone Community, 

Nanshan District, Shenzhen, China.

******


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Hefei Kaishitong Semiconductor Co., Ltd., a.k.a., 

the following one alias: 

—Hefei Kingstone Semiconductor. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 102–3, R&D Building, Xinqiao Integrated 

Circuit Technology Park, No. 1 Shuofang 

Road, Airport Economic Demonstration Zone, 

Hefei, China.

* * * * * * 

Hefei Naura Microelectronics Equipment Co., 

Ltd., a.k.a., the following two aliases: 

—Hefei Naura; and 

—Hefei Naura Microelectronics. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

2nd Floor, Building A, Electronic Factory, West 

of Tianzhushan Avenue and South of 

Shuofang Road, Airport Economic Demonstration Zone, Hefei, China.

Hefei Zhihui Semiconductor Application Technology Co., Ltd., Electronic Factory Building 

A, West of Tianzhushan Avenue and South of 

Shuofang Road, Hefei Airport Economic Demonstration Zone, Hefei Economic and Technological Development Zone, Hefei, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Hefei Zhiwei Microelectronics Co., Ltd., 2nd 

Floor, Building B, Hefei Zhiwei Semiconductor 

Co., Ltd., No. 3699 Dayu Road, Xinzhan District, Hefei, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Hefei Zhiwei Semiconductor Co., Ltd., No. 3699 

Dayu Road, Xinzhan District, Hefei, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Huafeng Test & Control Technology (Tianjin) 

Co., Ltd., 1201 Chuanbo Road, Zhongxin Ecological City, Binhai, Tianjin, 300480, China; 

and 1201 Chuanbo Road, Sino-Singapore 

Eco-city, Binhai New Area, Tianjin, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Hwa Tsing (Beijing) Technology Co., Ltd., a.k.a., 

the following three aliases: 

—Huahai Qingke (Beijing) Technology Co., Ltd.; 

—Beijing Huahai Qingke; and 

—Beijing Hwa Tsing. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 1107, Floor 11, Building 40, No. 1 Courtyard, Disheng North Street, Beijing, China and 

Room 505, Floor 5, Building 40, 1st Courtyard, Disheng North Road, Beijing, China.

Hwa Tsing (Guangzhou) Semiconductor Co., 

Ltd., a.k.a. the following three aliases: 

—Huahai Qingke (Guangzhou) Semiconductor 

Co., Ltd.; 

—Guangzhou Huahai Qingke; and 

—Guangzhou Hwa Tsing. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 508, Building A, No. 136 Kaiyuan Avenue, Guangzhou, China.

Hwa Tsing (Shanghai) Semiconductor Co., Ltd., 

a.k.a., the following three aliases: 

—Huahai Qingke (Shanghai) Semiconductor 

Co., Ltd.; 

—Shanghai Huahai Qingke; and 

—Shanghai Hwa Tsing. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

2nd Floor, 979 Yunhan Road, Lingang Innovation Zone, Shanghai, China.

Hwa Tsing Technology Co., Ltd., a.k.a., the following three aliases: 

—Huahai Qingke Technology Co., Ltd.; 

—Huahai Qingke; and 

—Hwa Tsing. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 11, Juxing Road, Xianshuigu Town, Jinnan 

District, Tianjin, China; and Building 8, Haihe 

Creative Center, No. 9 Juxing Road, Jinnan 

District, Tianjin, China; and Electronics Factory R&D Building, west of Zhushan Avenue 

and south of Shuofang Road, Hefei, China; 

and Room 362, Floor 18, Building B4, Wuhan 

Future Science and Technology City Overseas Talents Area, 999 Gaoxin Avenue, 

Wuhan, China.

******

JAC Capital, a.k.a., the following one alias: 

—Beijing Jianguang Asset Management Co., 

Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 


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Floor 8, Beijing International Club Office Tower 

A, No. 21 Jian Wai Avenue, Chaoyang District, Beijing, China and Room 9–46, Building 

6, Ronghui Garden, Linkong Economic Core 

Zone, Shunyi District, Beijing, China.

* * * * * * 

Jiangsu Nata Optoelectronic Material Co., Ltd., 

a.k.a., the following six aliases: 

—Nata Optoelectronic; 

—Nata; 

—Nata Chem; 

—Nanda Chem; 

—Nanda; and 

—Nanda Optoelectronic. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 67, Pingsheng Road, Shengpu, Suzhou Industrial Park, Suzhou, China.

Jiangsu Qiwei Semiconductor Equipment Co., 

Ltd., No. 2015, Linyang Road, Qidong Economic Development Zone, Qidong, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Jiangsu Zhichun System Integration Co., Ltd., 

No. 500, Linyang Road, Qidong Economic Development Zone, Qidong, Jiangsu Province, 

China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Kingstone Technology Hong Kong Limited, 

a.k.a., the following one alias: 

—Kingstone Hong Kong 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Unit 12, 11/F, Metro Centre II, Number 21 Lam 

Hing Street, Kowloon Bay, Hong Kong.

* * * * * * 

Nanda Optoelectronic Semiconductor Materials 

Co., Ltd., a.k.a., the following four aliases: 

—Nata Optoelectronic Semiconductor; 

—Nata Semiconductor; 

—Nanda Semiconductor; and 

—Nanda Optoelectronic Semiconductor. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 117, Xincheng Avenue, Shitan Industrial 

Park, Shizi Town, Quanjiao County, Chuzhou, 

Anhui Province, China; and No. 686–688, 

Xincheng Avenue, Quanjiao County, 

Chuzhou, Anhui Province, China.

* * * * * * 

Nanjing Huada Jiutianke Technology Co., Ltd., 

a.k.a., the following two aliases: 

—Nanjing Huada; and 

—Nanjing Empyrean. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Tower A, 8th floor, Chuangzhi Building, No. 17 

Xinghuo Rd., Gaoxin District Nanjing, China.

* * * * * * 

Naura Technology Group Co., Ltd., a.k.a., the 

following four aliases: 

—Northern Huachuang; 

—Beifang Huachuang; 

—Naura; and 

—Naura Science & Technology Group. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 1 Jiuxianqiao East Road, Chaoyang District, 

Beijing, China.

* * * * * * 

Ningbo Nanda Optoelectronic Materials Ltd., 

a.k.a., the following three aliases: 

—Ningbo Nata; 

—Ningbo NTU; and 

—Ningbo NTU Optoelectronics. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 233, Yangzhou’ao Road, Chaiqiao Street, 

Beilun District, Ningbo, China.

Ningbo Semiconductor International Corporation 

(NSI), No. 331–335 Anju Road, Xiaogang 

Street, Beilun District, Ningbo, Zhejiang, 

China; and 1MC07, Jiuzhou Center, No. 95, 

Lane 85, Cailun Road, Pudong New Area, 

Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

See §§ 744.11 and 

744.23(d) of the 

EAR.

85 FR 83420, 12/22/20. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 


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Northern Integrated Circuit Technology Innovation Center (Beijing) Co., Ltd., a.k.a., the following five aliases: 

—Semiconductor Technology Innovation Center 

(Beijing) Corp.; 

—STIC; 

—STIC BJ; 

—Northern Integrated Circuit Innovation Center; 

and 

—STIC Northern Integrated Circuit Technology 

Innovation Center (Beijing) Co., Ltd. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

First Floor, Building 9, No. 18 Wenchang Avenue, Beijing Economic and Technological Development Zone, China; and 34M3 plot of land 

in the core area of Beijing Economic and 

Technological Development Zone, Beijing, 

China.

******

Oriental Crystal Microelectronics Technology 

(Qingdao) Co., Ltd., a.k.a., the following one 

alias: 

—Dongfang Jingyuanwei Electronic Science & 

Technology (Qingdao) Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 9 Chengye Road, Room 306, 3rd Floor, Office Building, West Coast Comprehensive 

Bonded Zone, Qingdao, China and Room 

306, Floor 3, No. 9 Chengye Road, Xihaian 

Integrated Free Trade Zone, Qingdaopian District, China Pilot Free Trade Zone, Qingdao, 

Shandong, 266000, China.

Oriental Crystal Microelectronics Technology 

(Shanghai) Co., Ltd., a.k.a., the following one 

alias: 

—Dongfang Jingyuanwei Electronic Science and 

Technology (Shanghai) Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 888, Huanhu West 2nd Road, Building C, 

Lingang New Area, Shanghai, China and 

Floor C, No. 888 Huanhu W 2nd Road, 

Lingang Xinpian District, China Pilot Free 

Trade Zone, Shanghai, China.

******

Piotech., a.k.a., the following two aliases: 

—Tuojing Technology; and 

—Shenyang Tuojing Technology Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 900, Shuijia, Hunnan District, Shenyang, 

China; and No. 1 Xinyuan Street, Shenyang, 

China; and A072, Floor 3, Building 3, International Enterprise Center Phase 3, No. 1 

Guanggu Avenue, Wuhan, China; and Room 

217, 2nd Floor, Building 6, No. 16 Hongda 

North Road, Beijing, China; and Room 403, 

Floor 4, Building 1, No. 501 Xuri Road, 

Lingang New Area, Shanghai, China.

Piotech (Beijing) Co., Ltd., a.k.a., the following 

one alias: 

—Tuojing (Beijing) Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 217, Building 6, No. 16 Hongda North 

Road, Beijing, China.

Piotech (Shanghai) Co., Ltd., a.k.a., the following one alias: 

—Tuojing (Shanghai) Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 304, Building 10, No. 1211 Hongyin 

Road, Lingang New Area, Shanghai, China.

Piotech Chuangyi (Shenyang) Semiconductor 

Equipment Co., Ltd., a.k.a., the following one 

alias: 

—Tuojing Chuangyi (Shenyang) Semiconductor 

Equipment Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Building 2 and Building 3, No. 900, Shuijia, 

Hunnan District, Shenyang, China.

Piotech Jianke (Haining) Semiconductor Equipment Co., Ltd., a.k.a., the following three 

aliases: 

—Tuojing Jianke (Haining) Semiconductor 

Equipment Co., Ltd.; 

—Tuojing Keyscience (Haining) Semiconductor 

Equipment Co., Ltd.; and 

—Piotech Keyscience (Haining) Semiconductor 

Equipment Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Building 3, No. 8 Xinzhong Road, Haining Economic Development Zone, Jiaxing, China.

******


khammond on DSK9W7S144PROD with RULES2
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Country Entity License 

requirement 

License 

review policy 

Federal Register 

citation 

PXW Semiconductor Manufactory Co., Ltd., 

a.k.a., the following seven aliases: 

—Peng Chip; 

—Shenzhen Peng Xin Wei IC Manufacturing; 

—Shenzhen Pengxin Micro Integrated Circuit 

Manufacturing Co., Ltd.; 

—PengXinWei; 

—PXW; 

—PXWSemi; and 

—Pengxin Micro. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 87 FR 77508, 12/19/2022. 89 

FR [INSERT FR PAGE NUMBER] December 5, 2024. 

Room 727, Shanxia Building, No. 160, Xinxia 

Avenue, Shanxia Community, Pinghu Street, 

Longgang District, Shenzhen, 518111, China; 

and Building D, Zhongke Valley Industrial 

Park, Zhonghuan Avenue, Shanxia Community, Pinghu Street, Longgang District, 

Shenzhen, China.

* * * * * * 

Qingxin Technology Co., Ltd., a.k.a. the following two aliases: 

—Clean Chip; and 

—Clean Chip HK. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

15th Floor, Wan Zhaofeng Centre, 133 Hoi Bun 

Road, Kwun Tong, Kowloon, Hong Kong.

Quanjiao Nanda Optoelectronic Materials Ltd. 

a.k.a., the following one alias: 

—Quanjiao Nata. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 686–688, Xincheng Avenue, Shitan Industrial Park, Shizi Town, Quanjiao County, 

Chuzhou, China.

* * * * * * 

Raintree Scientific Instruments (Shanghai) Corporation, a.k.a., the following two aliases: 

—RSIC Scientific Instruments (Shanghai) Co., 

Ltd.; and 

—Ruili Scientific Instruments (Shanghai) Co., 

Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Building 6, Zhangjiang Pioneer Park, No. 68 

Huatuo Road, Pudong New Area, Shanghai, 

China; and First Floor, Building 2, Chenghe 

Innovation Research Center, No. 48 Gubo 

Road, Pudong New District, Shanghai, China; 

and Building A8 No. 38 Dongsheng Road, 

Shanghai Xinfa Chuangyun Industrial Park 

(Northeast Gate 2), Pudong New Area, 

Shanghai, China; and No. 777, Jianshe West 

Road, Binhu District, Jiangsu Zhuosheng 

Microelectronics Co., Ltd., Binhu District, 

Wuxi, China.

* * * * * * 

Ruili Microelectronics Equipment (Shanghai) 

Co., Ltd., a.k.a, the following two aliases: 

—Raintree Microelectronics; and 

—RSIC Microelectronics. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

B1, 2nd Floor, No. 88 Taigu Road, Shanghai, 

China; and Kailong Technology Building, Lane 

3166, Longdong Avenue, Pudong New District, Shanghai, China.

******

Semiconductor Manufacturing International (Beijing) Corporation, a.k.a., the following one 

alias: 

—SMIC Beijing. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 85 FR 83420, 12/22/20. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 

No. 18 Wen Chang Road, Beijing EconomicTechnological Development Area, Beijing 

100176.

Semiconductor Manufacturing International Corporation (SMIC), a.k.a., the following three 

aliases: 

—Semiconductor Manufacturing International 

(Shanghai) Corporation; 

—SMIC Shanghai; and 

—Semiconductor Mfg International Corp. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 

for all items to include items described in ECCN 

3B001.a.4, .c, .d, 

f.1.b.2, .k to .p; 

3B002.c, 3B993, or 

3B994. Case-bycase for items designed for production of 200mm wafers destined to a 

200mm wafer production facility.

85 FR 83420, 12/22/20. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 

No. 18 Zhang Jiang Road, Pudong New Area, 

Shanghai 201203, China.


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requirement 

License 

review policy 

Federal Register 

citation 

Semiconductor Manufacturing International 

(Shenzhen) Corporation, a.k.a., the following 

one alias: 

—SMIC Shenzhen. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

See §§ 744.11 and 

744.23(d) of the 

EAR.

85 FR 83420, 12/22/20. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 

No. 18 Gaoxin Road, Export Processing Zone, 

Pingshan New Area, Shenzhen, 518118, 

China; and 1st Lanzhu Avenue, Pingshan 

Town, Longgang District, Shenzhen, 

Guangdong, 518118, China; and Qier Road, 

Export Processing Zone, Pingshan New Area, 

Shenzhen, China.

Semiconductor Manufacturing International 

(Tianjin) Corporation, a.k.a., the following one 

alias: 

—SMIC Tianjin. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

See §§ 744.11 and 

744.23(d) of the 

EAR.

85 FR 83420, 12/22/20. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 

No. 19 Xing Hua Avenue, Xiqing Economic Development Area, Tianjin, 300385, China.

Semiconductor Manufacturing South China Corporation, a.k.a., the following four aliases: 

—SMSC; 

—SMIC Southern Integrated Circuit Manufacturing Co., Ltd.; 

—SMIC South; and 

—SMIC Southern. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 85 FR 83420, 12/22/20. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 

5th Floor, Building 3, No. 18 Zhang Jiang Road, 

China (Shanghai) Pilot Free Trade Zone, 

China; and 18 Zhangjiang Road, Pudong New 

Area, Shanghai, China.

* * * * * * 

Shandong Feiyuan Gas Co., Ltd., a.k.a., the following one alias: 

—Feiyuan Gas. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 5, Road 4, Gaoqing Chemical Industry Park, 

Gaocheng Town, Gaoqing County, Zibo, 

China.

******

Shanghai AGM Gas Co., Ltd., a.k.a., the following one alias: 

—AGM Gas. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 220, 2F, No. 1799–6, Wuzhong Road, 

Minhang District, Shanghai, China.

******

Shanghai Aipusi Precision Equipment Co., Ltd., 

Room 402, Building 1, No. 170 Zihai Road, 

Minhang District, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

******

Shanghai Feiai Technology Co., Ltd., Room 

204A, Building 5, No. 600, Ningqiao Road, 

Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

******

Shanghai Huada Jiutian Information Technology 

Co., Ltd., a.k.a., the following two aliases: 

—Shanghai Huada; and 

—Shanghai Empyrean. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Floor 10, Building C, No. 1867, Zhongke Road, 

Pudong New Area, Shanghai, China; and 

Building C, No. 888, Huanhu West 2nd Road, 

Lingang New Area, China.

* * * * * * 

Shanghai Integrated Circuit Equipment & Materials Industry Innovation Center Co., Ltd., 

a.k.a., the following five aliases: 

—CICEM; 

—ICRD Innovation Center; 

—National Integrated Circuit Equipment and Materials Industrial Innovation Center; 

—ICRD Phase II; and 

—ICRD Phase 2. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 497, Loulu Road, Jiading District, Shanghai, 

China; and No. 497, Gauss Road, Shanghai, 

China; and No. 497, Gaosi Road, Shanghai, 

China.

Shanghai Integrated Circuit Research and Development Center, a.k.a., the following two 

aliases: 

—Shanghai IC R&D Center; and 

—ICRD. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 87 FR 77508, 12/19/2022. 89 

FR [INSERT FR PAGE NUMBER] December 5, 2024. 

No. 497, Gaosi Road, Zhangjiang Hi-Tech Park, 

Pudong New Area, Shanghai, China; and No. 

3000, Longdong Avenue, Pilot Free Trade 

Zone, Shanghai, China.

* * * * * * 


khammond on DSK9W7S144PROD with RULES2
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Country Entity License 

requirement 

License 

review policy 

Federal Register 

citation 

Shanghai Jingce Semiconductor Technology 

Co., Ltd., a.k.a., the following three aliases: 

—Shanghai Precision Measurement; 

—Shanghai Jingce; and 

—PMISH. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 2875, Huqingping Highway, Qingpu District, 

Shanghai, China; and Floor 1 and 3, Building 

1, No. 269 and 299, Shuangbang Road, 

Xujing Town, Qingpu District, Shanghai, China.

Shanghai Jingzhuo Information Technology Co., 

Ltd., 12th Floor, Building B, No. 1–72, Lane 

2855, Huqingping Highway, Zhaoxiang Town, 

Qingpu District, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Kaishitong Semiconductor Co., Ltd., 

a.k.a., the following two aliases: 

—Kaishitong Semiconductor; and 

—Kingstone Semiconductor. 

Unit 1, Building 7, No. 200 Newton Road, China 

(Shanghai) Pilot Free Trade Zone, Shanghai, 

China; and Unit 1, Building 7, 200 Niudun 

Road, Shanghai, China; and 211 Qinqiao 

Road, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Lingang Kaishitong Semiconductor 

Co., Ltd., a.k.a., the following two aliases: 

—Lingang Kaishitong Semiconductor; and 

—Lingang Kingstone Semiconductor. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Area A, Building 1, No. 88 Wansong Road, 

Lingang New Area, Shanghai, China; and No. 

750, Zhubai Road, Nanhui New Town, 

Pudong New Area, Shanghai, China.

Shanghai Lizhi Technology Co., Ltd., Room 

0248, 2nd Floor, Ji Building, No. 555 

Dongchuan Road, Minhang District, Shanghai, 

China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Modern Advanced Ultra-Precision 

Manufacturing Center Co., Ltd., a.k.a., the following three aliases: 

—Ultra-Precision Manufacturing Center; 

—UPEC; and 

—SHUPEC. 

No. 396, Minfeng Road, Pudong New District, 

Shanghai, China and Building 63 East, 100 

Handan Road, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Shanghai Nanpre Mechanics Co., Ltd., a.k.a., 

the following four aliases: 

—Micro-Yuan Qimi; 

—Shanghai Weigao; 

—Shanghai Microhigh Precision Mechanical Engineering Co., Ltd.; and 

—Shanghai Micro-High Precision Machinery. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 1525, Zhangdong Road, Shanghai, China.

Shanghai Naura Microelectronics Equipment 

Co., Ltd., a.k.a. the following two aliases: 

—Shanghai Naura; and 

—Shanghai Naura Microelectronics. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Building C, No. 888, Huanhu West 2nd Road, 

Lingang New Area, Shanghai, China.

* * * * * * 

Shanghai Siwave Technology Co., Ltd., a.k.a. 

the following six aliases: 

—Shanghai Xinwu Technology Co., Ltd.; 

—Xinwu Technology; 

—SIWAVE; 

—SIWAVE Technology; 

—SIWAVE, INC.; and 

—Si-Wave. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 333 Huangqing Road, Jiading District, 

Shanghai, China.

Shanghai Skyverse Semiconductor Technology 

Co., Ltd., a.k.a., the following one alias: 

—Shanghai Nanolighting Semiconductor Technology Co., Ltd., Room 303, Building 13, No. 

1211 Hongyin Road, Lingang New Area, 

Shanghai, China. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

******

Shanghai Xinsheng Jingrui Semiconductor Technology Co., Ltd., 2nd Floor, Building 1, No. 

1000, Yunshui Road, Lingang New Area, 

Shanghai, China.

For all items subject to the EAR. 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 


khammond on DSK9W7S144PROD with RULES2
Federal Register / Vol. 89, No. 234 / Thursday, December 5, 2024 / Rules and Regulations 96847 

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License 

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Federal Register 

citation 

Shanghai Xinsheng Jingtou Semiconductor 

Technology Co., Ltd., Floor 4, Building 6, No. 

1000, Yunshui Road, Lingang New Area, 

Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Xinsheng Jinko Semiconductor Technology Co., Ltd., Area B, 4th Floor, Building 4, 

No. 1000, Yunshui Road, Lingang New Area, 

Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Xinsheng Semiconductor Technology 

Co., Ltd., a.k.a., the following two aliases: 

—Zingsemi; and 

—Zing Semiconductor Corporation. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Buildings 1–4, 6–19, No. 1000, Yunshui Road, 

Lingang New Area, Shanghai, China.

Shanghai Yanquan Technology Co., Ltd., Building C, No. 888 Huanhu West 2nd Road, 

Lingang New Area, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Yuliangsheng Technology Co., Ltd., 

a.k.a., the following one alias: 

—UEASCEND. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Building 1, No. 500 Mindong Road, Pudong New 

District, Shanghai, China.

Shanghai Yuwei Semiconductor Technology 

Co., Ltd, a.k.a., the following one alias: 

—Shanghai Yuweitek. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Building 11, No. 899 Zuchong Road, Shanghai, 

China.

Shanghai Zhichun Alloy Manufacturing Co., Ltd., 

Room 309, Building 1, No. 170 Zihai Road, 

Minhang District, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Zhichun Electronic Technology Co., 

Ltd., Room 302, Building 10, No. 1211 

Hongyin Road, Lingang New Area, China 

(Shanghai) Pilot Free Trade Zone, Shanghai, 

China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Zhichun Optoelectronic Equipment 

Co., Ltd., Room D, 2nd Floor, Building 3, No. 

880 Ziyue Road, Minhang District, Shanghai, 

China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Zhichun Precision Gas Co., Ltd., 

Room 301, Building 1, No. 170, Zihai Road, 

Minhang District, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Zhichun Precision Manufacturing Co., 

Ltd. a.k.a. the following one alias: 

—Nanolink. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 305, Building 1, No. 170 Zihai Road, 

Minhang District, Shanghai, China.

Shanghai Zhichun Purification System Technology Co., Ltd., a.k.a. the following five 

aliases: 

—Pure Technology; 

—PNC Process; 

—PNC Process Systems Co., Ltd.; 

—PNC Technology Group and 

—PNC. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 170 Zihai Road, Minhang District, Shanghai, 

China.

Shanghai Zhichun Semiconductor Equipment 

Co., Ltd., Room 304, Building 1, No. 170 Zihai 

Road, Minhang District, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Zhichun System Integration Co., Ltd., 

a.k.a., the following one alias: 

—Pure Integration. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

3rd and 4th floors, Building 2, No. 170 Zihai 

Road, Minhang District, Shanghai, China.

Shanghai Zhijia Semiconductor Gas Co., Ltd., 

No. 912 J, Yecheng Road, Jiading Industrial 

Zone, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shanghai Zixi Optical Technology Co., Ltd., 

Building C, No. 888, Huanhu West 2nd Road, 

Lingang New Area, China (Shanghai) Pilot 

Free Trade Zone, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

******

Shengmei Semiconductor Equipment (Beijing) 

Co., Ltd., Room 905, Floor 9, Building 7, No. 

15 Ronghua South Road, Beijing, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shengmei Semiconductor Equipment Wuxi Co., 

Ltd., Room 6, Lot J1, Wuxi New District Export Processing Zone, Wuxi, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 


khammond on DSK9W7S144PROD with RULES2
96848 Federal Register / Vol. 89, No. 234 / Thursday, December 5, 2024 / Rules and Regulations 

Country Entity License 

requirement 

License 

review policy 

Federal Register 

citation 

Shengwei Semiconductor Equipment (Shanghai) 

Co., Ltd., Building C, No. 888, Huanhu West 

2nd Road, Nanhui New Town, Lingang New 

Area, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shenyang Xinyuan Micro Business Development 

Co., Ltd., a.k.a., the following two aliases: 

—Kingsemi Micro Business Development Co., 

Ltd.; and 

—Core Source Business Development Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Rooms 201 and 202, Building 1, No. 501 Xuri 

Road, Lingang New Area, Shanghai, China.

Shenyang Xinyuan Microelectronic Equipment 

Co., Ltd., a.k.a., the following three aliases: 

—Kingsemi; 

—Shenyang Kingsemi Microelectronics Equipment Co., Ltd.; and 

—Shenyang Core Source. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 16 Feiyun Road, Hunnan District, 

Shenyang, China.

* * * * * * 

Shenzhen Guowei Hongbo Technology Co., 

Ltd., Room 14C, Guoshi Building, No. 1801 

Shahe West Road, High-tech Zone Community, Yuehai Street, Nanshan District, 

Shenzhen, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shenzhen Guowei Sensing Technology Co., 

Ltd., a.k.a., the following one alias: 

—SMIT Sense. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 22B, Guoshi Building, No. 1801 Shahe 

West Road, High-tech Zone Community, 

Yuehai Street, Nanshan District, Shenzhen, 

China and Floor 23, Building 3, Chongwen 

Park, Nanshan Intelligent Valley, No. 3370 

Liuxian Avenue, Shenzhen, China; and Floor 

23, Building 3, Chongwen Park, Nanshan 

Zhiyuan, No. 3370 Liuxian Avenue, Shenzhen, 

China.

Shenzhen Guoweichip Technology Co., Ltd., 

a.k.a., the following five aliases: 

—SMIT Xintech; 

—Xintech; 

—Guoweixin; 

—GWX; and 

—GWX Technologies. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

15th Floor, Guoshi Building, No. 1801, Shahe 

West Road, Nanshan District, Shenzhen, 

China.

Shenzhen Huada Jiutianke Technology Co., 

Ltd., a.k.a., the following two aliases: 

—Shenzhen Huada; and 

—Shenzhen Empyrean. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

10th floor, Building E, ShenZhen-Hong Kong 

International Hi-Tech Park, No. 3 Binglang 

Rd., Futian District, Shenzhen, China; and 

Room 1001, Building 5, Northwest Shenjiu 

Technology Pioneer Park, at the intersection 

of Taohua Road and Betel Road, Fubao Community, Fubao Street, Futian District, 

Shenzhen, China.

* * * * * * 

Shenzhen Jingyuan Information Technology Co., 

Ltd., No. 8 Hongmian Road, Room 401A, 

Building C, Yingdali Technology Digital Park, 

Fubao Community, Fubao Street, Futian District, Shenzhen, China and 301F, Suite C, 

Yingdali Technology Shuma Park, 

Hongmiandao, Fubao Sub-District, Futian District, Shenzhen, Guangdong, 518015, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Shenzhen Naura Microelectronics Equipment 

Co., Ltd., a.k.a., the following two aliases: 

—Shenzhen Naura; and 

—Shenzhen Naura Microelectronics. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 11, Jinniu West Road, Longtian Street, 

Pingshan District, Shenzhen, China; and 

About 40 meters west of Haofang Jingyuan, 

Yanziling 3rd Road, Pingshan District, 

Shenzhen, China.

* * * * * * 


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Shenzhen Pengxinxu Technology Co., Ltd., 

a.k.a., the following five aliases: 

—Peng Xin Xu; 

—PingXinXu; 

—PST; 

—Shenzhen Pensun Technology Co., Ltd.; and 

—PXX. 

Floor 54–56, Building C, Digital Innovation Center, No. 328 Mintang Road, Longhua District, 

Shenzhen City, Guangdong Province, China; 

and Room 403, Podium Building, Innovation 

Plaza, No. 2007, Pingshan Avenue, Liulian 

Community Pingshan Street, Pingshan District, Shenzhen, China; and 3001 Jin Xiu West 

Road Pingshan District, Shenzhen, China.

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 

except case-by-case 

for items not described in ECCN 

3B001.a.4, .c, .d, 

f.1.b.2, .k to .p; 

3B002.c, 3B993, or 

3B994.

89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Shenzhen Qianhai Skyverse Semiconductor 

Technology Co., Ltd., a.k.a., the following one 

alias: 

—Shenzhen Qianhai Nanolighting Semiconductor Technology Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 201, Building A, No. 1 Qianwan 1st Road, 

Qianhai Shenzhen-Hong Kong Cooperation 

Zone, Shenzhen, China.

* * * * * * 

Shenzhen SiCarrier Technologies Co., Ltd., 

a.k.a., the following six aliases: 

—Shenzhen Xinkailai Technology Co., Ltd.; 

—Shenzhen Xinkailai; 

—Xinkailai; 

—SiCarrier; 

—Huawei Starlight Engineering Department; and 

—Huawei Starlight Department. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Zhongke Industrial Park, Zhonghuan Avenue, 

Pinghu Street, Longgang District, Shenzhen, 

China; and No. 91 Xuri East Road, Shanxia 

Community, Pinghu Street, Longgang District, 

Shenzhen, China; and Building 6, Zhongke 

Valley, Longgang District, Shenzhen, China; 

and No. 368 Tianjiao Road, Chengdu HighTech Zone, China; and No. 16, Pingle Street, 

Changhe Street, Binjiang District, Hangzhou 

City, China; and Building A, Xi’an Software 

Park, No. 68, Keji 2nd Road, High-Tech Zone, 

Xi’an City, Shaanxi Province, China; and 

Building B4, Phase 1, Longshan Innovation 

Park, Wuhan Future Science and Technology 

City, No. 999 Gaoxin Avenue, Donghu New 

Technology Development Zone, Wuhan City, 

Hubei Province, China.

******

Shenzhen Xinkailai Industrial Machinery Co., 

Ltd., Room 1301, Building 6, Zhongkegu Industrial Park, Zhonghuan Avenue, Shanxia 

Community, Pinghu Street, Shenzhen, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Shenzhen Zhangge Instrument Co., Ltd., a.k.a., 

the following three aliases: 

—Shenzhen Zhangge; 

—Zhangge; and 

—Shenzhenshi Zhangge Yiqi Youxian Gongsi. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 135, Longguang Jiuyu Mansion, No. 115 

Guanlan Avenue, Xinhe Community, Fucheng 

Street, Longhua District, Shenzhen, China.

* * * * * * 

Si’En Qingdao Co. Ltd., a.k.a., the following five 

aliases: 

—Si’EN; 

—SiEn (Qingdao) Semiconductor Corporation 

Co.; 

—SiEn (Qingdao) Integrated Circuits Co., Ltd.; 

—SiEn; and 

—XinEn. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Building M, No. 1088, Shanwanghe Road, West 

Coast New District, Qingdao, China; and 

Room 401, German Enterprise South Zone, 

No. 19 Taibaishan Road, Huangdao District, 

Qingdao, China.

* * * * * * 

SJ Semiconductor, a.k.a., the following two 

aliases: 

—SJ Semiconductor (Jiangyin) Corp.; and 

—SJ Jiangyin. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

See §§ 744.11 and 

744.23(d) of the 

EAR.

85 FR 83420, 12/22/20. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 


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citation 

6 Dongsheng West Road, Building A8–4, 

Jiangyin City, Jiangsu Province, 214437, 

China.

* * * * * * 

Skyverse, a.k.a., the following two aliases: 

—Shenzhen Nanolighting Technology Co., Ltd; 

and 

—Nanolighting Lab. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 101, 201, and 301, No. 2 Dalang Street, 

Tongsheng Community, Shanghenglang 

Fourth Industrial Zone, Shenzhen, China; and 

Rooms 1401 through 1404, Floor 14, Building 

7, No. 19 Beiyuan East Road, Chaoyang District, Beijing, China; and Room 102–B3, Building 8B, Shahu Science and Technology Park, 

No. 183 Tinglan Lane, Suzhou, China; and 

Building 2, Workshop Area, No. 1301–18, 

Yinxing Technology Park, Longhua District, 

Shenzhen, China.

Skyverse Limited, a.k.a., the following one alias: 

—Hong Kong Zhongke Feice. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

1008, Prosperity Millennia Plaza, 663 King’s Rd, 

Tsat Tsz Mui, Hong Kong.

* * * * * * 

SMIC Advanced Technology R&D (Shanghai) 

Corporation, a.k.a., the following seven 

aliases: 

—SMIC New Technology Research and Development (Shanghai) Corporation; 

—SMIC New Technology R&D (Shanghai) Corporation; 

—SMIC Advanced Technology Research & Development (Shanghai) Corporation; 

—Zhongxin Guoji Jicheng Dianlu Xinjishu Yanfa 

(Shanghai) Youxian Gongsi; 

—SMIC Advanced Technology; 

—SMIC New Technology; and 

—SMIC New Technology Research & Development. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

18 Zhangjiang Road, Pudong New Area, Shanghai, China; and 6th Floor, Building 3, No. 18, 

Zhangjiang Road, China (Shanghai) Pilot Free 

Trade Zone Shanghai, Shanghai, 201203 

China.

SMIC Holdings Limited, Building 1, No. 1059 

Dangui Road, China (Shanghai) Pilot Free 

Trade Zone, Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

See §§ 744.11 and 

744.23(d) of the 

EAR.

85 FR 83420, 12/22/20. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 

SMIC Hong Kong International Company Limited, a.k.a., the following one alias: 

—SMIC Hong Kong. 

Suite 3003, 30th Floor, No. 9 Queen’s Road, 

Central, Hong Kong.

For all items subject to the EAR 

(See § 744.11 of the EAR).

See §§ 744.11 and 

744.23(d) of the 

EAR.

85 FR 83420, 12/22/20. 85 FR 

83769, 12/23/20. 86 FR 

12531, 3/4/21. 89 FR [INSERT FR PAGE NUMBER] 

December 5, 2024. 

SMIC Northern Integrated Circuit Manufacturing 

(Beijing) Co., Ltd., a.k.a., the following two 

aliases: 

—Semiconductor Manufacturing North China 

(Beijing) Corporation; and 

—SMIC North. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 85 FR 83420, 12/22/20. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 

Building 9, No. 18 Wenchang Avenue, Beijing 

Economic and Technological Development 

Zone, Beijing, China.

SMIC Semiconductor Manufacturing (Shanghai) 

Co., Ltd., a.k.a., the following one alias: 

—Suzhou Design Center. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

See §§ 744.11 and 

744.23(d) of the 

EAR.

85 FR 83420, 12/22/20. 89 FR 

[INSERT FR PAGE NUMBER] December 5, 2024. 

Room 602, Building 1, No.158 Suya Road, 

Suzhou Industrial Park, China.

* * * * * * 

Suzhou Nanda Optoelectronic Materials Co., 

Ltd., a.k.a., the following two aliases: 

—Suzhou Nata; and 

—Suzhou Nanda. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 40, Pingsheng Road, Suzhou Industrial 

Park, Suzhou, China; and No. 67, Pingsheng 

Road, Suzhou Industrial Park, Suzhou, China.

* * * * * * 


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License 

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Federal Register 

citation 

SwaySure Technology Co., Ltd., a.k.a., the following four aliases: 

—SwaySure; 

—Shenzhen ShengWeixu Technology Company; 

—Sheng Weixu; and 

—SWX. 

Xiangshan Science and Technology Park, No. 1 

Guiping Road, Fucheng Street, Longua District, Shenzhen City, Guangdong Province, 

China; and Floor 54–56, Building C, Digital Innovation Center, No. 328 Mintang Road, 

Longhua District, Shenzhen City, Guangdong 

Province, China; and Room 104, Building B, 

No. 1 Xinyuan 3rd Lane, Fuchengao Community, Pinghu Street, Longgang District, 

Shenzhen, China.

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 

except case-by-case 

for items not described in ECCN 

3B001.a.4, .c, .d, 

f.1.b.2, .k to .p; 

3B002.c, 3B993, or 

3B994.

89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Taiyuan Jinke Semiconductor Technology Co., 

Ltd., Area A, 4th Floor, No. 5 Fengze Road, 

Taiyuan, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Ulanqab Nanda Microelectronics Materials Co., 

Ltd., a.k.a., the following four aliases: 

—Ulanqab Nata; 

—Ulanqab Nanda; 

—Ulanqab Nata Microelectronics; and 

—Ulanqab Nanda Microelectronics. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 101, Building 5, Zone B, Business, 

Science, Technology and Culture Center, 

Jining District, Ulanqab, China.

* * * * * * 

Wingtech Technology Co., Ltd., a.k.a., the following one alias: 

—WINGTECH. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 18 East Xincheng Road, Wangren Town, 

Huangshi Development Zone, Tieshan District, 

Hubei Province, China; and 4th through 6th 

floors of Bldg. 4 of Juxin Yuan, No. 188 

Pingfu Rd. Xuhui District, Shanghai, China; 

and Zhongqing Mansion, No. 42 Gaoxin 6th 

Rd. High Tech Zone, Xi’an, China; and No. 

777 Yazhong Rd. Jiaxing, Zhejiang, China; 

and 11 Changjiang South Rd. Xinwu Dist., 

Wuxi, Jiangsu, China; and 7 Shenzhou Rd., 

Science City Guangzhou High Tech Industrial 

Development Zone, Guangzhou, China; and 

5097 Luosha Road, Yinfeng Area, Shenzhen, 

China; and No. 1003, Yanhe North Road, 

Jingji Oriental Duhui Area, Shenzhen, China.

Wise Road Capital a.k.a., the following three 

aliases: 

—Beijing Wise Road Management Co., Ltd.; 

—Beijing Zhilu Asset Management Co., Ltd.; 

and 

—Zhilu Asset. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

2/F, Beijing International Club Office Tower, No. 

21 Jian Guo Men Wai Street, Chaoyang District, Beijing, China and Room 1810, Bund 

Center, 222 Yan An East, Huangpu District, 

Shanghai, China and Room 901–3, 9th Floor, 

Building 57, No. 2 Jingyuan North Street, Beijing Economic and Technological Development Zone, Beijing, China and Room 8–50, 

Building 6, Ronghui Garden, Linkong Economic Core Zone, Shunyi District, Beijing, 

China.

******

Wuhan Naura Microelectronics Equipment Co., 

Ltd., a.k.a. the following two aliases: 

—Wuhan Naura; and 

—Wuhan Naura Microelectronics. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Fifth Floor, Hubei Marine Engineering Equipment Research Institute, Taolin Road, 

Jiangxia District, Wuhan, China.

* * * * * * 

Wuhan Skyverse Semiconductor Technology 

Co., Ltd., a.k.a., the following one alias: 

—Wuhan Nanolighting Semiconductor Technology Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 


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Federal Register 

citation 

Room 201, 2nd Floor, Building C2, Phase I, 

Longshan Innovation Park, Wuhan Future 

Science and Technology City, No. 999 Gaoxin 

Avenue, East Lake New Technology Development Zone, Wuhan, China.

Wuhan Xinxin Semiconductor Manufacturing 

Company Limited, a.k.a., the following one 

alias: 

—XMC. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

See §§ 740.26, 

744.11, and 

744.23(d) of the 

EAR.

89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 18 Gaoxin Four Road, East Lake High-Tech 

Development Zone, Wuhan, China; and 3rd 

Floor, Area E, Shengyin Building, Shengxia 

Road, Pudong New District, Shanghai, China; 

and Room B504, Building B, International 

Science and Technology Park Phase II, No. 

1355 Jinjihu Avenue, Suzhou Industrial Park, 

Suzhou, China; and T2 1909, Fangda City, 

No. 2 Longzhu 4th Road, Nanshan District, 

Shenzhen, China.

Wuhan Yiguang Technology Co., Ltd., a.k.a., the 

following one alias: 

—Wuhan eoptics Technology. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Building 6, No. 10, Financial Gang 4th Road, 

East Lake New Technology Development 

Zone, Wuhan, China.

Wuxi Kaishitong Technology Co., Ltd., a.k.a., 

the following one alias: 

—Wuxi Kingstone Technology. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 201, plot on the west side of the new 312 

National Highway, Shuofang, Wuxi New District, on the north side of Xijin Road (in the 

Airport Industrial Park), Wuxi, China; and 

Room 201, Building 14, Xutian Technology 

Park, No. 53 Xiuxi Road, Binhu District, Wuxi, 

China.

******

Wuxi Naura Microelectronics Equipment Co., 

Ltd., a.k.a., the following two aliases: 

—Wuxi Naura; and 

—Wuxi Naura Microelectronics. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

IC Design Building B1007, 33 Xinda Road, 

Xinwu District, Wuxi, China.

******

Xiamen Skyverse Technology Co., Ltd., a.k.a., 

the following one alias: 

—Xiamen Nanolighting Technology Co., Ltd., 

Unit 1623, No. 567 Haicang Avenue, Xiamen, 

China. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

******

Xi’an Huada Jiutian Technology Co., Ltd., a.k.a., 

the following two aliases: 

—Xi’an Huada; and 

—Xi’an Empyrean. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Unit 8F, Floor G1, Xi’an Huanpu International 

Technology Yuan, No. 211, Tiangu 8th Road, 

High-tech Zone, Xi’an, China.

******

Xi’an Naura Microelectronics Equipment Co., 

Ltd., a.k.a., the following two aliases: 

—Xi’an Naura; and 

—Xi’an Naura Microelectronics. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Floor 4, Building D, National Service Outsourcing Demonstration Base, No. 11 Jinye 1st 

Road, High-tech Zone, Xi’an, China.

******

Xinlian Rongchuang Integrated Circuit Industry 

Development (Beijing) Co., Ltd., No. 19, 

Ronghua Middle Road, Room 312, 3rd Floor, 

Building B, Beijing Economic and Technological Development Zone, Beijing, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

******

Yusheng Micro Semiconductor (Shanghai) Co., 

Ltd., 1F–A, 2F–A, Building 2, No. 365 

Chuanhong Road, Pudong New District, 

Shanghai, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER AND DATE OF 

PUBLICATION IN THE FEDERAL REGISTER]. 

******

Yuwei Semiconductor Technology Co., Ltd., 

a.k.a., the following two aliases: 

—Yuweitek; and 

—Yuwei Semiconductor. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER AND DATE OF 

PUBLICATION IN THE FEDERAL REGISTER]. 


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License 

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Federal Register 

citation 

Building 1, No. 469, Huatuo Lane, High-tech 

Zone, Hefei, China; and Room 295, Building 

1, No. 1531, Jincheng East Road, Jiangxi 

Street, Xinwu District, Wuxi, China; and Room 

302–1, Building E1, Saida Testing and Certification Park, No. 5, Xinghua Third Branch 

Road, Xiqing Economic and Technological 

Development Zone, Tianjin, China; and Room 

404, Qingfeng Rongsheng Venture Capital 

Building, No. 88–8, Bagua 3rd Road, Shanglin 

Community, Yuanling Street, Futian District, 

Shenzhen, China; and Room 309, Building 5, 

No. 29, Qingxiang South Road, Daxing District, Beijing, China; and Room 202, 2nd Floor 

and Room 01, Building 10, No. 899 Zuchong 

Road, Shanghai, China.

******

Zhangjiang Laboratory, a.k.a., the following 

three aliases: 

—Zhangjiang Lab; 

—Zhangjiang National Lab; and 

—ZJLab. 

For all items subject to the EAR 

(See §§ 734.4(a)(9), 

734.9(e)(3), and 744.11 of the 

EAR) 5.

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

No. 100, Haike Road, Pudong New Area, 

Shanghai, China; and No. 99, Haike Road, 

Pudong New Area, Shanghai, China.

* * * * * * 

Zhejiang Shenqihang Technology Co., Ltd., No. 

17, Binhe Road, Qingshan Lake Street, Lin’an 

District, Hangzhou, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

* * * * * * 

Zhejiang Zhichun Precision Manufacturing Co., 

Ltd., Room 412, Building 1, No. 8, Xinzhong 

Road, Haining Economic Development Zone 

(Haichang Street), Haining City, Jiaxing, China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Zhiwei Semiconductor (Shanghai) Co., Ltd., 

a.k.a., the following one alias: 

—Ultron. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 306, Building 1, No. 170 Zihai Road, 

Minhang District, Shanghai. China.

Zhiyi High Purity Electronic Materials (Shanghai) 

Ltd., a.k.a., the following one alias: 

—Finetron. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 306, Building 1, No. 170 Zihai Road, 

Minhang District, Shanghai. China.

* * * * * * 

Zhuhai Cornerstone Technology Co., Ltd., a.k.a., 

the following one alias: 

—Cornerstone Technologies Company. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Room 602, Building 1, No. 18, Nangang Middle 

Road, Zhuhai, China.

Zhuhai Skyverse Technology Co., Ltd., a.k.a., 

the following one alias: 

—Zhuhai Nanolighting Technology Co., Ltd. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Card No. 03, Room 401, Building 21, No. 1889 

Huandao East Road, Hengqin New District, 

Zhuhai, China.

* * * * * * 

Zibo Keyuanxin Fluorine Trading Ltd., No. 5, 

Road 4, Gaoqing Chemical Industry Park, 

Gaocheng Town, Gaoqing County, Zibo, 

China.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

*******

JAPAN ................... * * * * * * 

Kingsemi Japan K.K., a.k.a., the following two 

aliases: 

—Kingsemi Kyoto K.K.; and 

—Kingsemi. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

680–1, Omandokorocho, Sagaru, Bukkoji, 

Karasumadoori, Shimogyo-Ku Daihachi Hase 

Bldg. 9F–B Kyoto, Kyoto, 600–8413 Japan.

*******

SINGAPORE ......... * * * * * * 

Skyverse Pte. Ltd., a.k.a., the following one 

alias: 

—Skyverse. 

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

#14–08, Keppel Bay Tower, 1 Harbourfront Avenue, 098632, Singapore.


khammond on DSK9W7S144PROD with RULES2
96854 Federal Register / Vol. 89, No. 234 / Thursday, December 5, 2024 / Rules and Regulations 

Country Entity License 

requirement 

License 

review policy 

Federal Register 

citation 

******

*******

SOUTH KOREA .... ACM Research Korea Co., Ltd., 402, Hyundai 

City Plaza, 2106 Gyeong chung-daero, Bubaleup, Icheon-si, Gyeonggi-do, South Korea.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

Empyrean Korea, No. 178, 602, Bangyoe-ro, 

Bundang-gu, Seongnam-si, Gyeonggi-do 

(Sampyeong-dong), South Korea.

For all items subject to the EAR 

(See § 744.11 of the EAR).

Presumption of denial 89 FR [INSERT FR PAGE 

NUMBER] December 5, 2024. 

******

*******

******* 5For this entity, ‘‘items subject to the EAR’’ includes foreign-produced items that are subject to the EAR under § 734.9(e)(3) of the EAR. See § 744.11(a)(2)(v) for 

related license requirements and license application review policy. 

PART 748—APPLICATIONS 

(CLASSIFICATION, ADVISORY, AND 

LICENSE) AND DOCUMENTATION 

■ 3. The authority citation for part 748 

is revised to read as follows: 

Authority: 50 U.S.C. 4801–4852; 50 U.S.C. 

4601 et seq.; 50 U.S.C. 1701 et seq.; E.O. 

13026, 61 FR 58767, 3 CFR, 1996 Comp., p. 

228; E.O. 13222, 66 FR 44025, 3 CFR, 2001 

Comp., p. 783; Notice of August 13, 2024, 8 

FR 66187 (August 15, 2024). 

Supplement No. 7 to Part 748— 

[Amended] 

■ 4. Amend Supplement No. 7 to Part 

748 by removing the entire entries for 

‘‘Advanced Micro-Fabrication 

Equipment, Inc., China’’, ‘‘CSMC 

Technologies Corporation’’, and 

‘‘Shanghai Huahong Grace 

Semiconductor Manufacturing 

Corporation’’ in ‘‘China (People’s 

Republic of)’’. 

Matthew S. Borman, 

Principal Deputy Assistant Secretary for 

Strategic Trade and Technology Security. 

[FR Doc. 2024–28267 Filed 12–2–24; 8:45 am] 

BILLING CODE 3510–33–P 


khammond on DSK9W7S144PROD with RULES2