# Patent

## Title
Surface acoustic wave device including an IDT formed by a metal filled in grooves on a piezoelectric substrate

## Abstract

A surface acoustic wave device includes a LiNbO3 substrate and is constructed such that the reflection coefficient of an IDT is not only high but the electromechanical coupling coefficient K2 is also high, and the range of Euler angles of the LiNbO3 substrate can be increased to realize a wide range of the electromechanical coupling coefficient K2. A plurality of grooves are provided in an upper surface of the LiNbO3 substrate, an IDT including a plurality of electrode fingers is provided by filling a metal material in the plurality of grooves, and the metal material is Pt or W or an alloy primarily including at least one Pt or W.

## Background
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a surface acoustic wave device which is used, for example, as a resonator or a band pass filter, and more particularly, to a surface acoustic wave device in which an IDT is formed by using a metal filled in grooves on a piezoelectric substrate.
2. Description of the Related Art
Heretofore, as a resonator and/or a band pass filter, a surface acoustic wave device has been widely used. For example, in WO2006/011417A1, a surface acoustic wave device 1001 having a cross-sectional structure schematically shown in FIG. 26 has been disclosed.
In the surface acoustic wave device 1001, a plurality of grooves 1002b are formed in an upper surface 1002a of an LiTaO3 substrate 1002. A metal is filled in the plurality of grooves 1002b, and thereby an IDT 1003 including a plurality of electrode fingers made of the above metal is formed. An SiO2 film 1004 is laminated so as to cover the upper surface 1002a of the LiTaO3 substrate 1002. Since the LiTaO3 substrate 1002 has a negative temperature coefficient of frequency TCF, the SiO2 film 1004 having a positive temperature coefficient of frequency TCF is laminated to the LiTaO3 substrate 1002, so that the absolute value of the temperature coefficient of frequency TCF of the surface acoustic wave device 1001 can be decreased.
In addition, it is believed that since the IDT is formed by using the metal disposed in the plurality of grooves 1002b, a high reflection coefficient is obtained in the IDT. In particular, when the wavelength of a surface acoustic wave is represented by λ, and the thickness of Al filled in the grooves 1002b, that is, the thickness of the IDT made of Al, is set to 0.04λ, the reflection coefficient per one electrode finger is 0.05, and it has been shown that as the thickness of the electrode is increased, a higher reflection coefficient can be obtained.
In addition, in Japanese Unexamined Patent Application Publication No. 2004-112748, a surface acoustic wave device shown in FIG. 27 is disclosed. In a surface acoustic wave device 1101, an IDT 1103 is provided on a piezoelectric substrate 1102 made of LiTaO3 or LiNbO3. In addition, a protective film 1104 is arranged so as to cover the IDT 1103. On the other hand, in a region other than that in which the IDT 1103 and the protective film 1104 are provided, a first insulating layer 1105 made of SiO2 is provided which has a thickness equal or substantially equal to that of a laminated metal film of the IDT 1103 and the protective film 1104 laminated to each other. In addition, a second insulating layer 1106 made of SiO2 is laminated so as to cover the first insulating layer 1105. In this case, it has been shown that since a metal having a density greater than that of Al is used for the IDT 1103, the absolute value of the reflection coefficient can be increased, and undesired ripples can be suppressed.
In the surface acoustic wave device 1001 disclosed in WO2006/011417A1, it has been shown that as the thickness of the IDT made of Al is increased, the absolute value of the reflection coefficient can be increased. However, the inventors of the present invention discovered that when the absolute value of the reflection coefficient is simply increased, superior resonant characteristics cannot be obtained. That is, in the surface acoustic wave device disclosed in WO2006/011417A1, although the absolute value of the reflection coefficient can be increased by increasing the thickness of the electrode made of Al, it was found that since the sign of the reflection coefficient is negative, many ripples are generated in a pass band, and thus, superior resonant characteristics cannot be obtained.
In WO2006/011417A1, for the relationship between the thickness of the IDT and the reflection coefficient, only the case in which an IDT made of Al is used on an LiTaO3 substrate has been described. In addition, in paragraph 0129 of WO2006/011417A1, it has been suggested that the IDT may be formed using another metal, such as Au. However, only an IDT made of Au has been disclosed.
In addition, according to Japanese Unexamined Patent Application Publication No. 2004-112748, it has been disclosed as described above that when the IDT made of a metal having a density higher than that of Al is used, the absolute value of the reflection coefficient can be increased. However, an increase in electromechanical coupling coefficient of a surface acoustic wave device to be obtained has not been particularly described.
In addition, in the structure in which the IDT is formed by filling Au in the grooves provided in the above LiNbO3 substrate, there has been a problem in that the range of the Euler angles of the LiNbO3 substrate which can be used to obtain a sufficiently high electromechanical coupling coefficient K2 is very small.
SUMMARY OF THE INVENTION
Preferred embodiments of the present invention provide a surface acoustic wave device which overcomes the problems described above, and in the surface acoustic wave device described above, an LiNbO3 substrate is used as a piezoelectric substrate, the reflection coefficient of an IDT is not only sufficiently high but the electromechanical coupling coefficient K2 is also high, the range of the Euler angles of an LiNbO3 substrate which can be used is relatively wide, and the degree of design freedom is increased accordingly.
According to a preferred embodiment of the present invention, a surface acoustic wave device includes a piezoelectric substrate including a plurality of grooves provided in an upper surface thereof and which is made of an LiNbO3 substrate, and an IDT including a plurality of electrode fingers made of a metal material which is filled in the plurality of grooves in the upper surface of the piezoelectric substrate, and the metal material is Pt or W or an alloy primarily including at least one of Pt or W.
In the surface acoustic wave device according to this preferred embodiment of the present invention, when the wavelength of a surface acoustic wave is represented by λ, an electrode thickness of the IDT and θ of Euler angles (0°±10°, θ, 0°±10° of the LiNbO3 substrate are made of one of combinations shown in the Table 1 below. In this case, the range of the Euler angle of the LiNbO3 substrate which obtains a high electromechanical coupling coefficient K2 can be further increased.









TABLE 1





ELECTRODE
ELECTRODE



MATERIAL
THICKNESS
EULER ANGLE θ







Pt
0.04λ ≦ Pt ≦ 0.08λ
70° ≦ θ ≦ 134°


W
0.02λ ≦ W ≦ 0.04λ
70° ≦ θ ≦ 139°


W
0.04λ < W ≦ 0.08λ
74° ≦ θ ≦ 139°









In addition, the surface acoustic wave device preferably further includes a dielectric film which is made of SiO2 or an inorganic material primarily including SiO2 and which covers the IDT and the piezoelectric substrate. In this case, since the temperature coefficient of frequency of the dielectric film made of SiO2 or an inorganic material primarily including SiO2 is a positive value and the temperature coefficient of frequency TCF of LiNbO3 is a negative value, a surface acoustic wave device having a small overall absolute value of the temperature coefficient of frequency TCF can be provided.
In a surface acoustic wave device according to another preferred embodiment of the present invention, when the wavelength of a surface acoustic wave is represented by λ, a normalized film thickness of the IDT normalized by λ, a normalized film thickness of an SiO2 film used as the dielectric film normalized by λ, and θ of Euler angles (0°±10°, θ, 0°±10° of the LiNbO3 substrate are one of combinations shown in the Tables 2 to 4 or Tables 5 to 7 below.









TABLE 2









RANGE OF EULER



ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT
LIMIT



OF EULER
OF EULER


4 ≦ FILM THICKNESS OF Pt ≦ 8
ANGLE θ
ANGLE θ





 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
71
131


 5 < FILM THICKNESS OF SiO2 ≦ 10
71
121


10 < FILM THICKNESS OF SiO2 ≦ 15
71
117


15 < FILM THICKNESS OF SiO2 ≦ 20
71
117


20 < FILM THICKNESS OF SiO2 ≦ 25
78
120


25 < FILM THICKNESS OF SiO2 ≦ 30
78
120


30 < FILM THICKNESS OF SiO2 ≦ 35
74
116





(The film thickness of Pt and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)















TABLE 3









RANGE OF EULER



ANGLE TO



SATISFY 0.2 ≧ K2










LOWER LIMIT
UPPER



OF
LIMIT OF



EULER
EULER


8 < FILM THICKNESS OF Pt ≦ 12
ANGLE θ
ANGLE θ





 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
76
131


 5 < FILM THICKNESS OF SiO2 ≦ 10
77
121


10 < FILM THICKNESS OF SiO2 ≦ 15
79
117


15 < FILM THICKNESS OF SiO2 ≦ 20
79
117


20 < FILM THICKNESS OF SiO2 ≦ 25
79
123


25 < FILM THICKNESS OF SiO2 ≦ 30
78
128


30 < FILM THICKNESS OF SiO2 ≦ 35
77
116





(The film thickness of Pt and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)















TABLE 4









RANGE OF EULER ANGLE



TO SATISFY 0.2 ≧ K2










LOWER LIMIT
UPPER



OF
LIMIT OF



EULER
EULER


12 < FILM THICKNESS OF Pt ≦ 16
ANGLE θ
ANGLE θ





 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
81
125


 5 < FILM THICKNESS OF SiO2 ≦ 10
85
121


10 < FILM THICKNESS OF SiO2 ≦ 15
88
119


15 < FILM THICKNESS OF SiO2 ≦ 20
88
119


20 < FILM THICKNESS OF SiO2 ≦ 25
87
121


25 < FILM THICKNESS OF SiO2 ≦ 30
83
126


30 < FILM THICKNESS OF SiO2 ≦ 35
78
132





(The film thickness of Pt and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)















TABLE 5









RANGE OF EULER ANGLE



TO SATISFY 0.2 ≧ K2










LOWER LIMIT
UPPER



OF
LIMIT OF



EULER
EULER


4 ≦ FILM THICKNESS OF W ≦ 8
ANGLE θ
ANGLE θ





 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
75
133


 5 < FILM THICKNESS OF SiO2 ≦ 10
75
131


10 < FILM THICKNESS OF SiO2 ≦ 15
75
124


15 < FILM THICKNESS OF SiO2 ≦ 20
82
123


20 < FILM THICKNESS OF SiO2 ≦ 25
84
120


25 < FILM THICKNESS OF SiO2 ≦ 30
86
116


30 < FILM THICKNESS OF SiO2 ≦ 35
86
116





(The film thickness of W and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)















TABLE 6









RANGE OF EULER ANGLE



TO SATISFY 0.2 ≧ K2










LOWER LIMIT
UPPER



OF
LIMIT OF



EULER
EULER


8 < FILM THICKNESS OF W ≦ 12
ANGLE θ
ANGLE θ





 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
82
133


 5 < FILM THICKNESS OF SiO2 ≦ 10
82
131


10 < FILM THICKNESS OF SiO2 ≦ 15
80
122


15 < FILM THICKNESS OF SiO2 ≦ 20
86
122


20 < FILM THICKNESS OF SiO2 ≦ 25
87
123


25 < FILM THICKNESS OF SiO2 ≦ 30
87
122


30 < FILM THICKNESS OF SiO2 ≦ 35
86
116





(The film thickness of W and the film thickness of SiO2 ≦ in the table each indicate the value of the normalized film thickness × 102.)














TABLE 7








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


12 < FILM THICKNESS OF W ≦ 16
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
91
128


 5 < FILM THICKNESS OF SiO2 ≦ 10
93
123


10 < FILM THICKNESS OF SiO2 ≦ 15
93
117


15 < FILM THICKNESS OF SiO2 ≦ 20
85
117


20 < FILM THICKNESS OF SiO2 ≦ 25
88
124


25 < FILM THICKNESS OF SiO2 ≦ 30
88
126


30 < FILM THICKNESS OF SiO2 ≦ 35
82
128





(The film thickness of W and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)






As described above, when one of combinations shown in the above Tables 2 to 7 is used in accordance with the type of metal material forming the IDT, the range of an Euler angle which achieves a high electromechanical coupling coefficient K2 can be further increased.
According to various preferred embodiments of the present invention, in an IDT having a plurality of electrode fingers made of a metal material which is filled in grooves in an upper surface of a LiNbO3 substrate, since the metal material is Pt or W or an alloy primarily including at least one of PT or W, the reflection coefficient of the IDT is not only high but a high electromechanical coupling coefficient K2 can also be obtained. Furthermore, in order to provide a range of the high electromechanical coupling coefficient K2, the Euler angle of the LiNbO3 substrate can be selected from a wide range. Thus, characteristics of the surface acoustic wave device are improved, and furthermore, the degree of design freedom thereof is also increased.
The above and other elements, features, steps, characteristics and advantages of the present invention will become more apparent from the following detailed description of the preferred embodiments with reference to the attached drawings.



BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1A is a partially schematic front cross-sectional view showing portions of a surface acoustic wave device according to a preferred embodiment of the present invention and FIG. 1B is a schematic plan view of the surface acoustic wave device.
FIG. 2 is a view showing the relationship between the reflection coefficient and the Euler angle θ according to a preferred embodiment of the present invention which is obtained when Pt is used as a metal material for an IDT, in which a solid line indicates results of a structure in which an SiO2 film is laminated and a dotted line indicates results of a structure in which no SiO2 film is laminated.
FIG. 3 is a view showing the relationship between the electromechanical coupling coefficient K2 and the Euler angle θ according to a preferred embodiment of the present invention which is obtained when Pt is used as a metal material for an IDT, in which a solid line indicates results of a structure in which an SiO2 film is laminated and a dotted line indicates results of a structure in which no SiO2 film is laminated.
FIG. 4 is a view showing the relationship between the reflection coefficient and the Euler angle θ according to a preferred embodiment of the present invention which is obtained when W is used as a metal material for an IDT, in which a solid line indicates results of a structure in which an SiO2 film is laminated and a dotted line indicates results of a structure in which no SiO2 film is laminated.
FIG. 5 is a view showing the relationship between the electromechanical coupling coefficient K2 and the Euler angle θ according to a preferred embodiment of the present invention which is obtained when W is used as a metal material for an IDT, in which a solid line indicates results of a structure in which an SiO2 film is laminated and a dotted line indicates results of a structure in which no SiO2 film is laminated.
FIG. 6 is a view showing the relationship between the reflection coefficient and the Euler angle θ according to a related example which is obtained when Al is used as a metal material for an IDT, in which a solid line indicates results of a structure in which an SiO2 film is laminated and a dotted line indicates results of a structure in which no SiO2 film is laminated.
FIG. 7 is a view showing the relationship between the electromechanical coupling coefficient K2 and the Euler angle θ according to a related example which is obtained when Al is used as a metal material for an IDT, in which a solid line indicates results of a structure in which an SiO2 film is laminated and a dotted line indicates results of a structure in which no SiO2 film is laminated.
FIG. 8 is a view showing the relationship between the reflection coefficient and the Euler angle θ according to a related example which is obtained when Au is used as a metal material for an IDT, in which a solid line indicates results of a structure in which an SiO2 film is laminated and a dotted line indicates results of a structure in which no SiO2 film is laminated.
FIG. 9 is a view showing the relationship between the electromechanical coupling coefficient K2 and the Euler angle θ according to a related example which is obtained when Au is used as a metal material for an IDT, in which a solid line indicates results of a structure in which an SiO2 film is laminated and a dotted line indicates results of a structure in which no SiO2 film is laminated.
FIGS. 10A and 10B are views showing the relationship of the reflection coefficient with a normalized film thickness of a Pt film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when Pt is used as a metal material form an IDT and no SiO2 film is laminated.
FIGS. 11A and 11B are views showing the relationship of the reflection coefficient with a normalized film thickness of a Pt film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when Pt is used as a metal material form an IDT and a normalized film thickness of an SiO2 film is about 0.05.
FIGS. 12A and 12B are views showing the relationship of the reflection coefficient with a normalized film thickness of a Pt film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when Pt is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.1.
FIGS. 13A and 13B are views showing the relationship of the reflection coefficient with a normalized film thickness of a Pt film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when Pt is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.15.
FIGS. 14A and 14B are views showing the relationship of the reflection coefficient with a normalized film thickness of a Pt film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when Pt is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.2.
FIGS. 15A and 15B are views showing the relationship of the reflection coefficient with a normalized film thickness of a Pt film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when Pt is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.25.
FIGS. 16A and 16B are views showing the relationship of the reflection coefficient with a normalized film thickness of a Pt film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when Pt is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.3.
FIGS. 17A and 17B are views showing the relationship of the reflection coefficient with a normalized film thickness of a Pt film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when Pt is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.35.
FIGS. 18A and 18B are views showing the relationship of the reflection coefficient with a normalized film thickness of a W film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when W is used as a metal material for an IDT and no SiO2 film is laminated.
FIGS. 19A and 19B are views showing the relationship of the reflection coefficient with a normalized film thickness of a W film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when W is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.05.
FIGS. 20A and 20B are views showing the relationship of the reflection coefficient with a normalized film thickness of a W film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when W is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.1.
FIGS. 21A and 21B are views showing the relationship of the reflection coefficient with a normalized film thickness of a W film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when W is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.15.
FIGS. 22A and 22B are views showing the relationship of the reflection coefficient with a normalized film thickness of a W film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when W is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.2.
FIGS. 23A and 23B are views showing the relationship of the reflection coefficient with a normalized film thickness of a W film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when W is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.25.
FIGS. 24A and 24B are views showing the relationship of the reflection coefficient with a normalized film thickness of a W film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when W is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.3.
FIGS. 25A and 25B are views showing the relationship of the reflection coefficient with a normalized film thickness of a W film and the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, according to a preferred embodiment of the present invention, each of which is obtained when W is used as a metal material for an IDT and a normalized film thickness of an SiO2 film is about 0.35.
FIG. 26 is a schematic front cross-sectional view illustrating one example of a related surface acoustic wave device.
FIG. 27 is a partially cut-away front cross-sectional view illustrating another example of a related surface acoustic wave device.



DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
Hereinafter, with reference to the drawings, particular preferred embodiments of the present invention will be described to provide a clear understanding of the present invention.
FIG. 1A is a partially schematic front cross-sectional view showing a portion at which an IDT of a surface acoustic wave device according to a first preferred embodiment of the present invention is provided, and FIG. 1B is a schematic plan view of the surface acoustic wave device.
As shown in FIG. 1A, a surface acoustic wave device 1 includes an LiNbO3 substrate 2. A plurality of grooves 2b are provided in an upper surface 2a of the LiNbO3 substrate 2. A metal is filled in the plurality of grooves 2b, so that an IDT 3 including a plurality of electrode fingers is provided. An upper surface of this IDT 3 and the upper surface 2a of the LiNbO3 substrate 2 are flush or approximately flush with each other.
An SiO2 film 4 is preferably arranged so as to cover the upper surface 2a and the IDT 3. However, in preferred embodiments of the present invention, the SiO2 film 4 may not be provided.
As shown in FIG. 1B, the surface acoustic wave device 1 preferably is a one-port type surface acoustic wave resonator which includes the IDT 3 and first and second reflectors 5 and 6 disposed at both sides of the IDT 3 in a surface acoustic wave propagation direction. In addition, the reflectors 5 and 6 are grating reflectors in which both ends of electrode fingers are short-circuited to each other.
As in the IDT 3, the above reflectors 5 and 6 are formed by filling the same metal as that described above in grooves provided in the upper surface 2a of the LiNbO3 substrate 2. Accordingly, the reflectors 5 and 6 are also flush or approximately flush with the electrode surface and the upper surface 2a of the LiNbO3 substrate 2. Thus, the upper surface of the SiO2 film 4 is approximately planarized over the entire surface acoustic wave device 1.
Although the temperature coefficient of frequency TCF of the LiNbO3 substrate 2 is a negative value, since the temperature coefficient of frequency TCF of the SiO2 film 4 is a positive value, the absolute overall value of the temperature coefficient of frequency TCF is decreased. Thus, in the surface acoustic wave device 1, the change in frequency characteristics caused by the change in temperature is small.
The surface acoustic wave device 1 of this preferred embodiment preferably is a surface acoustic wave device which utilizes an SH wave, and the feature of this device is that the metal material for the IDT 3 is preferably Pt or W or an alloy primarily including at least one of Pt or W, for example. A metal layer made of another metal material, such as an adhesion layer or a diffusion prevention layer, for example, may also be added to the IDT 3, or the IDT 3 may have a laminated structure including another metal layer.
Accordingly, in the surface acoustic wave device 1 of this preferred embodiment, the absolute value of the reflection coefficient of the IDT 3 is not only increased but a high electromechanical coupling coefficient K2 can also be obtained. In addition, as shown in the following experimental examples, when a surface acoustic wave device 1 having a high electromechanical coupling coefficient K2 is obtained, the range of the Euler angles of an LiNbO3 substrate which can be used can be increased. Thus, the degree of design freedom can be increased. This will be described with reference to FIGS. 2 to 9.
FIGS. 6 and 7 are views showing the relationship of 8 of Euler angles (0°, θ, 0°) of an LiNbO3 substrate with the reflection coefficient or the electromechanical coupling coefficient K2 of a surface acoustic wave device in which although the structure thereof is similar to that of the surface acoustic wave device 1 of the present preferred embodiment, an IDT electrode and reflectors are made of Al, and a leakage surface acoustic wave is utilized.
In FIGS. 6 and 7, results are shown of the case in which a normalized film thickness of the IDT 3 made of Al normalized by a wavelength λ of a surface acoustic wave is set to about 0.04 or about 0.08. In addition, the results of a structure in which an SiO2 film 4 having a normalized film thickness of about 0.25 is provided are shown by a solid line, and the results of a structure in which no SiO2 film 4 is provided are shown by a dotted line.
As shown in FIG. 6, it was discovered that when Al is used as an electrode material, the reflection coefficient is not significantly increased.
In addition, as shown in FIG. 7, it was discovered that when the Euler angle θ is changed, the electromechanical coupling coefficient K2 can be about 0.2 or greater. However, as shown in FIGS. 6A and 6B, when no SiO2 film 4 is provided, it was discovered that regardless of the value of the Euler angle θ and the film thickness of the IDT made of Al, the reflection coefficient is low, such as about 0.1 or less.
On the other hand, in FIGS. 8 and 9, the results are shown of the case in which Au having a normalized film thickness of about 0.04 or about 0.08 is used as the electrode material, the normalized film thickness being normalized by a wavelength λ of a surface acoustic wave. That is, the results are shown which are obtained when the IDT electrode 3 and the reflectors 5 and 6 shown in FIG. 1 are made of Au. FIG. 8 shows the relationship between the Euler angle θ and the reflection coefficient, and FIG. 9 shows the relationship between the Euler angle θ and the electromechanical coupling coefficient K2.
In addition, also in FIGS. 8 and 9, the results are shown by a solid line which are obtained when an SiO2 film 4 having a normalized film thickness of about 0.25 is provided, and the results are shown by a dotted line which are obtained when no SiO2 film 4 is provided.
As shown in FIG. 8, it was discovered that as compared to the case in which Al is used as the electrode material shown in FIGS. 6A and 6B, when Au is used as the electrode material, the reflection coefficient can be increased regardless of the Euler angle θ.
However, as shown in FIG. 9, in the structure in which no SiO2 film 4 is provided, a region having a high electromechanical coupling coefficient K2, that is, a region in which the electromechanical coupling coefficient K2 is about 0.2 or greater, is in the range of about 72° to about 131° when the film thickness of the electrode composed of Au is about 0.04λ, and when the film thickness of the electrode made of Au is about 0.08λ, the above region is in the range of about 85° to about 119°. Thus, when the electrode thickness is changed in the range of about 0.04λ to about 0.08λ, it was discovered that when the Euler angle θ is not selected in the range of about 85° to about 119°, the electromechanical coupling coefficient K2 is not about 0.2 or greater.
In the structure in which the IDT 3 and the reflectors 5 and 6 are made of Au and in which the SiO2 film 4 is further provided, it was discovered that in order to obtain an electromechanical coupling coefficient K2 of about 0.2 or greater, the Euler angle θ must be set in the range of about 77° to about 117° when the film thickness of the Au film is about 0.04λ, and that when the film thickness thereof is about 0.08λ, the Euler angle θ must be set in the range of about 90° to about 114°. Thus, it was discovered that when the film thickness of the Au film is in the range of about 0.04λ to about 0.08λ, the Euler angle θ must be set in the range of about 90° to about 114°.
On the other hand, as described below, when Pt or W or an alloy primarily composed of at least one of Pt or W is used as the metal material for the IDT 3, the range of an Euler angle θ at which an electromechanical coupling coefficient K2 of about 0.2 or greater can be obtained is significantly increased. Thus, the degree of design freedom of the surface acoustic wave device can be increased.
In addition, the reason that superior characteristics can be obtained when the electromechanical coupling coefficient K2 is about 0.2 or greater is that in a surface acoustic wave device used as a resonator or a band pass filter, in order to obtain a bandwidth which is required, the electromechanical coupling coefficient K2 is preferably approximately 0.2 or greater.
FIGS. 2 and 3 are views showing the relationship of the Euler angle θ of an LiNbO3 substrate with the reflection coefficient or the electromechanical coupling coefficient K2 when Pt is used as the metal material forming the IDT electrode 3 and the reflectors 5 and 6. In FIGS. 2 and 3, the normalized film thickness of the electrode made of Pt normalized by a wavelength λ of a surface acoustic wave is set to about 0.04 or about 0.08. In addition, as in the cases shown in FIGS. 6 to 9, in accordance with the present preferred embodiment, the results obtained when the SiO2 film 4 is provided are shown by a solid line, and the results obtained when no SiO2 film 4 is provided are shown by a dotted line.
In addition, in FIG. 3, for comparison, the results are also shown by a chain line which are obtained when the IDT 3 and the reflectors 5 and 6 are not provided in grooves in an upper surface of a LiNbO3 substrate but are provided on the upper surface thereof using Pt having a film thickness of about 0.08λ.
In addition, the normalized film thickness of the SiO2 film 4 normalized by a wavelength λ of a surface acoustic wave is set to about 0.25. Also in the following FIGS. 4 to 9, when the SiO2 film 4 is provided, each normalized film thickness thereof is set to about 0.25.
As shown in FIG. 2, when Pt is used as the metal material, it was discovered that compared to the case shown in FIG. 6 in which Al is used as the electrode material, a high reflection coefficient can be obtained when the electrode thickness is set to about 0.04λ or about 0.08λ.
In addition, according to the results of a comparative example shown by the chain line, it was discovered that the electromechanical coupling coefficient K2 is low, such as about 0.2 or less, regardless of the value of the Euler angle θ.
On the other hand, according to the present preferred embodiment, it was discovered that the range of an Euler angle at which the electromechanical coupling coefficient K2 is increased to about 0.2 or greater is increased. That is, when no SiO2 film 4 is provided, it was discovered that when the electrode thickness of Pt is about 0.04λ, the range of θ at which the electromechanical coupling coefficient K2 is about 0.2 or greater is about 70° to about 135°, and that when the electrode thickness of Pt is about 0.08λ, the above range is about 70° to about 134°. Thus, it was discovered that when the electrode thickness of Pt is in the range of about 0.04λ to about 0.08λ, the Euler angle θ may be set in the range of about 70° to about 134°. Accordingly, compared to the case in which Au is used as the metal material, the range of the Euler angle θ can be significantly increased by using Pt.
In addition, when the SiO2 film 4 is provided, it was discovered from FIG. 3 that when the electrode thickness of the Pt film is about 0.04λ, a region in which the electromechanical coupling coefficient K2 is about 0.2 or greater is in the range of an Euler angle θ of about 76° to about 120°, and that when the electrode thickness is about 0.08λ, the region is in the range of about 78° to about 128°. Thus, it was discovered that when the electrode thickness is in the range of about 0.04λ to about 0.08λ, the Euler angle θ may be set in the range of about 78° to about 120°.
Accordingly, in the structure in which the SiO2 film 4 is provided, it was discovered that compared to the case in which the Au film is used, the range of the Euler angle θ can be significantly increased by using the Pt film.
FIGS. 4 and 5 are views showing the relationship of the Euler angle θ with the reflection coefficient or the electromechanical coupling coefficient K2. In FIGS. 4 and 5, the normalized film thickness of W used as the metal material for the IDT 3 and the reflectors 5 and 6 is set to about 0.02, about 0.04 or about 0.08. Furthermore, in FIGS. 4 and 5, the results obtained when the SiO2 film 4 is provided are shown by a solid line, and the results obtained when no SiO2 film 4 is provided are shown by a dotted line.
As shown in FIG. 4, as in the case in which W is used as the metal material, it was discovered that compared to the case in which Al is used, a high reflection coefficient can be obtained regardless of the range of the Euler angle θ.
In addition, as shown in FIG. 5, in the structure in which no SiO2 film 4 is provided, it was discovered that the range of an Euler angle which can achieve an electromechanical coupling coefficient K2 of about 0.2 or more may be set to about 70° to about 144° when the film thickness of the W film is about 0.02λ, that the range may be set to about 70° to about 139° when the film thickness is about 0.04λ, and that the range may be set to about 74° to about 139° when the film thickness is about 0.08λ. Accordingly, when W is used as the metal material, it was discovered that when the film thickness thereof is in the range of about 0.02λ to about 0.04λ, the Euler angle θ may be set in the range of about 70° to about 139°, and that when the film thickness is in the range of about 0.04λ to about 0.08λ, the Euler angle θ may be set in the range of about 74° to about 139°. Thus, compared to the range of about 85° to about 119° obtained when Au is used, the range of the Euler angle θ can be significantly increased. In the structure in which the SiO2 film 4 is provided, it was discovered from FIG. 5 that when the electrode thickness of W is about 0.02λ, the range of an Euler angle θ which can increase the electromechanical coupling coefficient K2 to about 0.2 or greater may be set to about 87° to about 119°, that when the electrode thickness is about 0.04λ, the above range may be set to about 84° to about 120°, and that when the electrode thickness is about 0.08λ, the above range may be set to about 82° to about 123°. That is, it was discovered that when the electrode thickness of W is in the range of about 0.02, to about 0.04λ, the Euler angle θ may be set in the range of about 87° to about 119°, and that when the electrode thickness of W is in the range of about 0.04λ to about 0.08λ, the Euler angle θ may be set in the range of about 84° to about 120°. Accordingly, it was discovered that compared to the range of about 90° to about 114° obtained when the Au film is used, the range of the Euler angle θ can be significantly increased.
When the results described with reference to FIGS. 2 to 9 are summarized, a combination among the metal material used for an electrode, the electrode thickness of the above metal material, and the Euler angle θ, which achieves an electromechanical coupling coefficient K2 of about 0.2 or greater, corresponds to one of combinations shown in Table 8 below. Table 8 shows the results of the structure in which no SiO2 film is laminated.










TABLE 8






ELECTRODE
ELECTRODE
EULER



MATERIAL
THICKNESS
ANGLE θ








Pt
0.04λ ≦ Pt ≦ 0.08λ
70° ≦ θ ≦ 134°



W
0.02λ ≦ W ≦ 0.04λ
70° ≦ θ ≦ 139°



W
0.04λ < W ≦ 0.08λ
74° ≦ θ ≦ 139°



Au
0.04λ ≦ Au ≦ 0.08λ
85° ≦ θ ≦ 119°









In Table 8, for comparison, the case in which Au is used as the metal material is also shown.
In Table 8, when no SiO2 film is provided, the range of the electrode thickness and the range of the Euler angle θ in which the electromechanical coupling coefficient K2 is about 0.2 or greater are shown for each electrode material.
In the structure in which the SiO2 film is provided as a dielectric film to cover the IDT electrode, the inventors of the present invention also took the normalized film thickness of the SiO2 film into consideration in addition to the electrode material and the electrode thickness, and the range of an Euler angle θ at which the electromechanical coupling coefficient K2 is about 0.2 or greater was investigated. The results will be described below for each metal material.
FIGS. 10A and 10B to FIGS. 17A and 17B are views showing the relationship of the reflection coefficient with the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, each of which is obtained when Pt is used as the metal material and SiO2 films having various film thicknesses are provided.
In addition, FIGS. 10A and 10B show the results obtained when the normalized film thickness of the SiO2 film normalized by λ is 0, that is, when no SiO2 film is provided, and FIGS. 11A to 17B show the results obtained when the normalized film thickness of the SiO2 film is about 0.05, about 0.1, about 0.15, about 0.2, about 0.25, about 0.3, or about 0.35. In addition, the film of Pt used as the metal material forming the IDT 3 and the reflectors 5 and 6 is formed to have various normalized film thicknesses as shown in FIGS. 10A to 17B. As shown in FIG. 2 described above, when Pt is used as the metal material, compared to the case in which Al is used, a high reflection coefficient can be obtained regardless of the range of the Euler angle θ. In FIG. 10A to FIG. 17A, it was also discovered that even when the film thickness of the Pt film is variously changed, a high reflection coefficient can be obtained regardless of the value of the Euler angle θ.
On the other hand, as apparent from FIG. 10B to FIG. 17B, it discovered that when the normalized film thickness of Pt is in the range of about 0.04 to about 0.08, if the range of the normalized film thickness of the SiO2 film and the range of the Euler angle θ correspond to one of combinations shown in Table 9 below, the electromechanical coupling coefficient K2 can be made about 0.2 or greater. In addition, in Table 9, the lower limit and the upper limit of the range of the Euler angle θ are shown. For example, Table 9 indicates that when the film thickness of the SiO2 film is about 0.05 or less, the Euler angle θ may be set in the range of about 71° to about 131°.
In addition, when the normalized film thickness of the Pt film is in the range of more than about 0.08 to about 0.12, the range of the film thickness of the SiO2 film and the range of the Euler angle θ may be made to correspond to one of combinations shown in Table 10 below, and when the normalized film thickness of the Pt film is in the range of about 0.12 to about 0.16, the range of the film thickness of the SiO2 film and the range of the Euler angle θ may correspond to one of combinations shown in Table 11 below, so that the electromechanical coupling coefficient K2 is about 0.2 or greater as in the case described above. Tables 9 to 11 are based on the results shown in FIGS. 10A to 17B described above.








TABLE 9








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


4 ≦ FILM THICKNESS OF Pt ≦ 8
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
71
131


 5 < FILM THICKNESS OF SiO2 ≦ 10
71
121


10 < FILM THICKNESS OF SiO2 ≦ 15
71
117


15 < FILM THICKNESS OF SiO2 ≦ 20
71
117


20 < FILM THICKNESS OF SiO2 ≦ 25
78
120


25 < FILM THICKNESS OF SiO2 ≦ 30
78
120


30 < FILM THICKNESS OF SiO2 ≦ 35
74
116





(The film thickness of Pt and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)














TABLE 10








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER 
EULER 


8 < FILM THICKNESS OF Pt ≦ 12
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
76
131


 5 < FILM THICKNESS OF SiO2 ≦ 10
77
121


10 < FILM THICKNESS OF SiO2 ≦ 15
79
117


15 < FILM THICKNESS OF SiO2 ≦ 20
79
117


20 < FILM THICKNESS OF SiO2 ≦ 25
79
123


25 < FILM THICKNESS OF SiO2 ≦ 30
78
128


30 < FILM THICKNESS OF SiO2 ≦ 35
77
116





(The film thickness of Pt and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)














TABLE 11








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


12 < FILM THICKNESS OF Pt ≦ 16
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
81
125


 5 < FILM THICKNESS OF SiO2 ≦ 10
85
121


10 < FILM THICKNESS OF SiO2 ≦ 15
88
119


15 < FILM THICKNESS OF SiO2 ≦ 20
88
119


20 < FILM THICKNESS OF SiO2 ≦ 25
87
121


25 < FILM THICKNESS OF SiO2 ≦ 30
83
126


30 < FILM THICKNESS OF SiO2 ≦ 35
78
132





(The film thickness of Pt and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)






FIGS. 18A and 18B to FIGS. 25A and 25B are views showing the relationship of the reflection coefficient with the Euler angle θ and the relationship of the electromechanical coupling coefficient K2 therewith, respectively, each of which is obtained when W is used as the metal material and SiO2 films having various film thicknesses are provided.
In addition, FIGS. 18A and 18B show the results obtained when the normalized film thickness of the SiO2 film normalized by λ is 0, that is, when no SiO2 film is provided, and FIGS. 19A to 25B show the results obtained when the normalized film thickness of the SiO2 film is about 0.05, about 0.1, about 0.15, about 0.2, about 0.25, about 0.3, or about 0.35. In addition, the film of W used as the metal material for the IDT 3 and the reflectors 5 and 6 is configured to have various normalized film thicknesses as shown in FIGS. 18A to 25B. As shown in FIG. 4 described above, when W is used as the metal material, compared to the case in which Al is used, a high reflection coefficient can be obtained regardless of the range of the Euler angle θ. In FIG. 18A to FIG. 25A, it was also discovered that even when the film thickness of the W film is variously changed, a high reflection coefficient can be obtained regardless of the value of the Euler angle θ.
On the other hand, as shown in FIG. 18B to FIG. 25B, it was discovered that when the normalized film thickness of W is in the range of about 0.04 to about 0.08, if the range of the normalized film thickness of the SiO2 film and the range of the Euler angle θ correspond to one of combinations shown in Table 12 below, the electromechanical coupling coefficient K2 is about 0.2 or greater. In addition, in Table 12, the lower limit and the upper limit of the range of the Euler angle θ are shown. For example, Table 12 indicates that when the film thickness of the SiO2 film is about 0.05 or less, the Euler angle θ may be set in the range of about 75° to about 133°.
In addition, when the film thickness of the W film is in the range of about 0.08 to about 0.12, the range of the film thickness of the SiO2 film and the range of the Euler angle θ may correspond to one of combinations shown in Table 13 below, and when the normalized film thickness of the W film is in the range of about 0.12 to about 0.16, the range of the film thickness of the SiO2 film and the range of the Euler angle θ may correspond to one of combinations shown in Table 14 below, so that the electromechanical coupling coefficient K2 is about 0.2 or greater as in the case described above. Tables 12 to 14 are based on the results shown in FIGS. 18A to 25B described above.








TABLE 12








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


4 ≦ FILM THICKNESS OF W ≦ 8
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
75
133


 5 < FILM THICKNESS OF SiO2 ≦ 10
75
131


10 < FILM THICKNESS OF SiO2 ≦ 15
75
124


15 < FILM THICKNESS OF SiO2 ≦ 20
82
123


20 < FILM THICKNESS OF SiO2 ≦ 25
84
120


25 < FILM THICKNESS OF SiO2 ≦ 30
86
116


30 < FILM THICKNESS OF SiO2 ≦ 35
86
116





(The film thickness of W and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)














TABLE 13








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


8 < FILM THICKNESS OF W ≦ 12
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
82
133


 5 < FILM THICKNESS OF SiO2 ≦ 10
82
131


10 < FILM THICKNESS OF SiO2 ≦ 15
80
122


15 < FILM THICKNESS OF SiO2 ≦ 20
86
122


20 < FILM THICKNESS OF SiO2 ≦ 25
87
123


25 < FILM THICKNESS OF SiO2 ≦ 30
87
122


30 < FILM THICKNESS OF SiO2 ≦ 35
86
116





(The film thickness of W and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)














TABLE 14








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


12 < FILM THICKNESS OF W ≦ 16
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
91
128


 5 < FILM THICKNESS OF SiO2 ≦ 10
93
123


10 < FILM THICKNESS OF SiO2 ≦ 15
93
117


15 < FILM THICKNESS OF SiO2 ≦ 20
85
117


20 < FILM THICKNESS OF SiO2 ≦ 25
88
124


25 < FILM THICKNESS OF SiO2 ≦ 30
88
126


30 < FILM THICKNESS OF SiO2 ≦ 35
82
128





(The film thickness of W and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102.)






As described above, when the IDT electrode is formed, the metal material is filled in the grooves provided in the upper surface of the LiNbO3 substrate. In this case, in addition to the metals described above, the metal material may be an alloy primarily including at least one of Pt or W.
In addition, in the above-described experimental examples, although the SiO2 film was preferably provided, instead of the SiO2 film, a dielectric film made of an inorganic material primarily including an SiO2 film, for example, may also be used. In both cases, since having a positive temperature coefficient of frequency, when the dielectric films described above are each used in combination with an LiNbO3 substrate having a negative temperature coefficient of frequency, the absolute value of the temperature coefficient of frequency of the surface acoustic wave device can be decreased. That is, a surface acoustic wave device having superior temperature characteristics can be provided.
In addition, the electrode structure of the surface acoustic wave device formed according to preferred embodiments of the present invention is not limited to that shown in FIG. 1, and preferred embodiments of the present invention may be applied, for example, to surface acoustic wave resonators and surface acoustic wave filters which have various electrode structures.
In addition, according to preferred embodiments of the present invention, it has been shown as described above that the Euler angles (φ, θ, ψ) of LiNbO3 are not particularly limited. However, when a Rayleigh wave or an SH wave is utilized as a surface acoustic wave, the Euler angle φ is preferably in the range of about 0°±10°, the Euler angle θ is preferably in the range of about 70° to about 180°, and the Euler angle ψ is preferably in the range of about 0°±10°, for example. That is, when the Euler angles are set in the range of (0°±10°, 70° to 180°, 0°±10°), the Rayleigh wave and the SH wave can be preferably utilized. More particular, in the range of (0°±10°, 90° to 180°, 0°±10°), the SH wave can be more preferably utilized.
In addition, an LSAW wave may also be utilized, and in this case, the Euler angles may preferably be set in the range of (0°±10°, 110° to 160°, 0°±10°. In addition, in the preferred embodiments of the present invention, although the electrode structure of a one-port type SAW resonator is shown, the surface acoustic wave device of preferred embodiments of the present invention can be widely applied to other resonator structures or other resonator type surface acoustic wave filters.
While preferred embodiments of the present invention have been described above, it is to be understood that variations and modifications will be apparent to those skilled in the art without departing the scope and spirit of the present invention. The scope of the present invention, therefore, is to be determined solely by the following claims.

## Claims

1. A surface acoustic wave device comprising:
a piezoelectric substrate including a plurality of grooves provided in an upper surface thereof and being made of an LiNbO3 substrate; and
an IDT including a plurality of electrode fingers made of a metal material which is filled in the plurality of grooves in the upper surface of the piezoelectric substrate; wherein
the metal material is Pt or W or an alloy primarily including at least one of Pt or W; and
when a wavelength of a surface acoustic wave is represented by λ, an electrode thickness of the IDT and θ of Euler angles (0°±10°, θ, 0°±10°) of the LiNbO3 substrate are one of combinations shown in Table 1:











TABLE 1






ELECTRODE
ELECTRODE
EULER



MATERIAL
THICKNESS
ANGLE θ








Pt
0.04λ ≦ Pt ≦ 0.08λ
70° ≦ θ ≦ 134°



W
0.02λ ≦ W ≦ 0.04λ
70° ≦ θ ≦ 139°



W
0.04λ < W ≦ 0.08λ
74° ≦ θ ≦ 139°.

2. The surface acoustic wave device according to claim 1, further comprising a dielectric film made of SiO2 or an inorganic material primarily including SiO2 and arranged to cover the IDT and the piezoelectric substrate.

3. A surface acoustic wave device comprising:
a piezoelectric substrate including a plurality of grooves provided in an upper surface thereof and being made of an LiNbO3 substrate;
an IDT including a plurality of electrode fingers made of a metal material which is filled in the plurality of grooves in the upper surface of the piezoelectric substrate; and
a dielectric film made of SiO2 or an inorganic material primarily including SiO2 and arranged to cover the IDT and the piezoelectric substrate; wherein
the metal material is Pt or W or an alloy primarily including at least one of Pt or W; and
when a wavelength of a surface acoustic wave is represented by λ, a normalized film thickness of the IDT normalized by λ, a normalized film thickness of an SiO2 film used as the dielectric film normalized by λ, and θ of Euler angles (0°±10°, θ, 0°±10°) of the LiNbO3 substrate are one of combinations shown in Tables 2 to 7:









TABLE 2








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


4 ≦ FILM THICKNESS OF Pt ≦ 8
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
71
131


 5 < FILM THICKNESS OF SiO2 ≦ 10
71
121


10 < FILM THICKNESS OF SiO2 ≦ 15
71
117


15 < FILM THICKNESS OF SiO2 ≦ 20
71
117


20 < FILM THICKNESS OF SiO2 ≦ 25
78
120


25 < FILM THICKNESS OF SiO2 ≦ 30
78
120


30 < FILM THICKNESS OF SiO2 ≦ 35
74
116





(the film thickness of Pt and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102)














TABLE 3








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


8 < FILM THICKNESS OF Pt ≦ 12
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
76
131


 5 < FILM THICKNESS OF SiO2 ≦ 10
77
121


10 < FILM THICKNESS OF SiO2 ≦ 15
79
117


15 < FILM THICKNESS OF SiO2 ≦ 20
79
117


20 < FILM THICKNESS OF SiO2 ≦ 25
79
123


25 < FILM THICKNESS OF SiO2 ≦ 30
78
128


30 < FILM THICKNESS OF SiO2 ≦ 35
77
116





(the film thickness of Pt and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102)














TABLE 4








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


12 < FILM THICKNESS OF Pt ≦ 16
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
81
125


 5 < FILM THICKNESS OF SiO2 ≦ 10
85
121


10 < FILM THICKNESS OF SiO2 ≦ 15
88
119


15 < FILM THICKNESS OF SiO2 ≦ 20
88
119


20 < FILM THICKNESS OF SiO2 ≦ 25
87
121


25 < FILM THICKNESS OF SiO2 ≦ 30
83
126


30 < FILM THICKNESS OF SiO2 ≦ 35
78
132





(the film thickness of Pt and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102)














TABLE 5








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


4 ≦ FILM THICKNESS OF W ≦ 8
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
75
133


 5 < FILM THICKNESS OF SiO2 ≦ 10
75
131


10 < FILM THICKNESS OF SiO2 ≦ 15
75
124


15 < FILM THICKNESS OF SiO2 ≦ 20
82
123


20 < FILM THICKNESS OF SiO2 ≦ 25
84
120


25 < FILM THICKNESS OF SiO2 ≦ 30
86
116


30 < FILM THICKNESS OF SiO2 ≦ 35
86
116





(the film thickness of W and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102)














TABLE 6








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


8 < FILM THICKNESS OF W ≦ 12
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
82
133


 5 < FILM THICKNESS OF SiO2 ≦ 10
82
131


10 < FILM THICKNESS OF SiO2 ≦ 15
80
122


15 < FILM THICKNESS OF SiO2 ≦ 20
86
122


20 < FILM THICKNESS OF SiO2 ≦ 25
87
123


25 < FILM THICKNESS OF SiO2 ≦ 30
87
122


30 < FILM THICKNESS OF SiO2 ≦ 35
86
116





(the film thickness of W and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102)














TABLE 7








RANGE OF



EULER ANGLE TO



SATISFY 0.2 ≧ K2










LOWER
UPPER



LIMIT OF
LIMIT OF



EULER
EULER


12 < FILM THICKNESS OF W ≦ 16
ANGLE θ
ANGLE θ












 0 ≦ FILM THICKNESS OF SiO2 ≦ 5
91
128


 5 < FILM THICKNESS OF SiO2 ≦ 10
93
123


10 < FILM THICKNESS OF SiO2 ≦ 15
93
117


15 < FILM THICKNESS OF SiO2 ≦ 20
85
117


20 < FILM THICKNESS OF SiO2 ≦ 25
88
124


25 < FILM THICKNESS OF SiO2 ≦ 30
88
126


30 < FILM THICKNESS OF SiO2 ≦ 35
82
128





(the film thickness of W and the film thickness of SiO2 in the table each indicate the value of the normalized film thickness × 102).