Possible Calculation Methods for Tier 2a C2F6

 and NF3 Emission Factors (EFs)

150/200 mm 300/450 mm

C2F6 NF3 C2F6 NF3

 1-Ui 0.71 0.19 1-Ui 0.80 0.17

 BCF4 0.13 0.021 BCF4 0.21 0.062

 BC2F6 NA NA BC2F6 NA 0.057

 BC4F6 NA NA BC4F6 NA NA

 BC4F8 NA NA BC4F8 NA NA

 BC3F8 NA NA BC3F8 NA NA

 BCHF3 NA NA BCHF3 NA 0.035

150/200 mm 300/450 mm

C2F6 NF3 NF3 Remote Clean C2F6 NF3 NF3 Remote Clean

 1-Ui 0.71 0.20 0.018 1-Ui 0.80 0.18 0.018

 BCF4 0.13 0.041 0.015 BCF4 0.21 0.051 0.075

 BC2F6 NA NA NA BC2F6 NA 0.057 NA

 BC4F6 NA NA NA BC4F6 NA NA NA

 BC4F8 NA NA NA BC4F8 NA NA NA

 BC3F8 NA NA NA BC3F8 NA NA NA

 BCHF3 NA NA NA BCHF3 NA 0.035 NA

150/200 mm 300/450 mm

C2F6 NF3 NF3 Remote Clean C2F6 NF3 NF3 Remote Clean

 1-Ui 0.57 0.19 0.018 1-Ui 0.80 0.20 0.018

 BCF4 0.19 0.045 0.015 BCF4 0.21 0.042 0.075

 BC2F6 NA NA NA BC2F6 NA 0.057 NA

 BC4F6 NA NA NA BC4F6 NA NA NA

 BC4F8 NA NA NA BC4F8 NA NA NA

 BC3F8 NA NA NA BC3F8 NA NA NA

 BCHF3 NA NA NA BCHF3 NA 0.035 NA

Process Gas i

Revised Tier 

2a Factors

Process Gas i

Revised Tier 

2a Factors

Process Gas i

Process Gas i

Revised Tier 2a 

Factors

Process Gas i

Revised Tier 2a 

Factors

Revised Tier 

2a Factors

This tab presents the current method employed to calculate Tier 2a EFs in the proposed subpart I, as well as four other possible methods for calculating 

Tier 2a EFs.

(1) EFs as presented in Tables I-11 and I-12 of the proposed rule, 77 FR 63538 (this method inadvertently used only one value for the NF3 

remote clean (1-Ui) EF, the mean of NF3 remote clean data as calculated using a beta distribution, see the November 2010 TSD).

(2a) EFs are generally developed using a simple averaging method and NF3 remote clean is treated as a separate process type 

(consistent with the original Tier 2a defaults in the 2006 IPCC Guidelines). This option presents the NF3 remote clean (1-Ui) EF as 

calculated using a beta distribution, see the November 2010 TSD.

(2b) EFs are developed using a gas-usage weighted averaging method and NF3 remote clean is treated as a separate process type 

(consistent with the original Tier 2a defaults in the 2006 IPCC Guidelines). This option presents the NF3 remote clean (1-Ui) EF as 

calculated using a beta distribution, see the November 2010 TSD.

Revised Tier 2a 

Factors

Process Gas i
150/200 mm 300/450 mm

C2F6 NF3 C2F6 NF3

 1-Ui 0.71 0.11 1-Ui 0.80 0.10

 BCF4 0.13 0.021 BCF4 0.21 0.062

 BC2F6 NA NA BC2F6 NA 0.057

 BC4F6 NA NA BC4F6 NA NA

 BC4F8 NA NA BC4F8 NA NA

 BC3F8 NA NA BC3F8 NA NA

 BCHF3 NA NA BCHF3 NA 0.035

150/200 mm 300/450 mm

C2F6 NF3 C2F6 NF3

 1-Ui 0.57 0.085 1-Ui 0.80 0.094

 BCF4 0.19 0.026 BCF4 0.21 0.062

 BC2F6 NA NA BC2F6 NA 0.057

 BC4F6 NA NA BC4F6 NA NA

 BC4F8 NA NA BC4F8 NA NA

 BC3F8 NA NA BC3F8 NA NA

 BCHF3 NA NA BCHF3 NA 0.035

Revised Tier 2a 

Factors

Process Gas i

Revised Tier 

2a Factors

Revised Tier 

2a Factors

Process Gas i

Revised Tier 2a 

Factors

(3b) EFs are developed using a gas-usage weighted averaging method and NF3 remote clean is combined with the other NF3 process 

types to calculate a default EF. The NF3 remote clean (1-Ui) EF used in this weighted average calculation is the NF3 remote clean (1-Ui) EF 

as calculated using a beta distribution, see the November 2010 TSD.

Process Gas i Process Gas i

(3a) EFs are developed using a simple averaging method and NF3 remote clean is combined with the other NF3 process types to 

calculate a default EF using all of the available NF3 data. More specifically, the NF3 remote clean data set was used in calculations as 

opposed to a single NF3 remote clean (1-Ui) EF as was done in Option 1 above. (The outliers identified for NF3 remote clean were not used 

in these calculations.)
C2F6

 and NF3 Emission Factor (EF) Data

1-Ui BCF4

Input Gas CVD In Situ Plasma 

EF

CVD 

Remote 

Plasma 

EF

CVD InSitu 

Thermal 

EF

Wafer 

Clean and 

Etch EF

All EF Input Gas CVD In Situ 

Plasma EF

CVD 

Remote 

Plasma EF

CVD In-Situ Thermal EF Wafer 

Clean 

and Etch 

EF

All EF

C2F6 0.55 NA NA 0.76 0.71 C2F6 0.21 NA NA 0.10 0.13

NF3 0.19 0.018 NA 0.20 0.11 NF3 0.05 0.015 NA 0.0040 0.021

C2F6 NA NA NA 0.80 0.80 C2F6 NA NA NA 0.21 0.21

NF3 0.23 0.018 0.28 0.17 0.10 NF3 0.04 0.075 0.01 0.052 0.062

BC2F6 BCHF3

Input Gas CVD In Situ Plasma 

EF

CVD 

Remote 

Plasma 

EF

CVD InSitu 

Thermal 

EF

Wafer 

Clean and 

Etch EF

All EF Input Gas CVD In Situ 

Plasma EF

CVD 

Remote 

Plasma EF

CVD In-Situ Thermal EF Wafer 

Clean 

and Etch 

EF

All EF

C2F6 NA NA NA NA NA C2F6 NA NA NA NA NA

NF3 NA NA NA NA NA NF3 NA NA NA NA NA

C2F6 NA NA NA NA NA C2F6 NA NA NA NA NA

NF3 NA NA NA 0.057 0.057 NF3 NA NA NA 0.035 0.035

C2F6 and NF3 EF Data

Input Gas EF

(If multi-gas 

process, list 

each F-gas on 

separate 

line)

(mass 

emissions/inp

ut mass of 

listed F-gas)

Etch 200mm C2F6 1 CF4 0.039 Etch, 200mm, C2F6

Etch 200mm C2F6 0.73 CF4 0.074 Etch, 200mm, C2F6

Etch 200mm C2F6 0.77 CF4 0.087 Etch, 200mm, C2F6

Etch 200mm C2F6 0.79 CF4 0.077 Etch, 200mm, C2F6

Etch 200mm C2F6 0.85 CF4 0.086 Etch, 200mm, C2F6

Etch 200mm C2F6 0.74 CF4 0.11 Etch, 200mm, C2F6

Etch 200mm C2F6 0.92 CF4 0.079 Etch, 200mm, C2F6

Etch 200mm C2F6 0.88 CF4 0.087 Etch, 200mm, C2F6

Etch 200mm C2F6 0.83 CF4 0.085 Etch, 200mm, C2F6

Etch 200mm C2F6 0.81 CF4 0.068 Etch, 200mm, C2F6

Etch 200mm C2F6 0.87 CF4 0.09 Etch, 200mm, C2F6

The EFs calculated in the tables below are used as a quality control tool and for calculating weighted EFs shown on the tab "EFs". Below the tables the available C2F6 and NF3 data are presented. The NF3 remote clean 

data outliers are identified at the bottom of the spreadsheet.

* Data in this tab were taken from "International SEMATECH Manufacturing Initiative Environmental Safety and Health Technology Center Etch Process Equipment Emissions Characterization Data", dated February 6, 2012 and available in 

EPA docket EPA-HQ-OAR-2011-0028 and "Draft Emission Factors for Refined Semiconductor Manufacturing Process Categories" , dated May 2010 and available in EPA docket EPA-HQ-OAR-2009-0927.

All EF Record ID Information

200 mm

300 mm

200 mm

300 mm

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

200 mm

300 mm

200 mm

300 mm

Process Type/Subtype Wafer Diameter (150mm, 

200mm, 300mm) BP1 Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass emission of 

byproduct(2)/mass of all input Fgases)
Etch 200mm C2F6 0.85 CF4 0.061 Etch, 200mm, C2F6

Etch 200mm C2F6 0.85 CF4 0.09 Etch, 200mm, C2F6

Etch 200mm C2F6 0.91 CF4 0.041 Etch, 200mm, C2F6

Etch 200mm C2F6 0.93 CF4 0.047 Etch, 200mm, C2F6

Etch 200mm C2F6 0.91 CF4 0.067 Etch, 200mm, C2F6

Etch 200mm C2F6 0.83 CF4 0.08 Etch, 200mm, C2F6

Etch 200mm C2F6 0.68 CF4 0.122 Etch, 200mm, C2F6

Etch 200mm C2F6 0.86 CF4 0.046 Etch, 200mm, C2F6

Etch 200mm C2F6 0.86 CF4 0.069 Etch, 200mm, C2F6

Etch 200mm C2F6 0.87 CF4 0.072 Etch, 200mm, C2F6

Etch 200mm C2F6 0.8 CF4 0.094 Etch, 200mm, C2F6

Etch 200mm C2F6 0.84 CF4 0.081 Etch, 200mm, C2F6

Etch 200mm C2F6 0.75 CF4 0.108 Etch, 200mm, C2F6

Etch 200mm C2F6 0.81 CF4 0.106 Etch, 200mm, C2F6

Etch 200mm C2F6 0.87 CF4 0.081 Etch, 200mm, C2F6

Etch 200mm C2F6 0.71 CF4 0.14 Etch, 200mm, C2F6

Etch 200mm C2F6 0.84 CF4 0.095 Etch, 200mm, C2F6

Etch 200mm C2F6 0.81 CF4 0.092 Etch, 200mm, C2F6

Etch 200mm C2F6 0.84 CF4 0.061 Etch, 200mm, C2F6

Etch 200mm C2F6 0.91 CF4 0.062 Etch, 200mm, C2F6

Etch 200mm C2F6 0.555 CF4 0.0814 Etch, 200mm, C2F6

Etch 200mm C2F6 0.56 CF4 0.11 Etch, 200mm, C2F6

Etch 200mm C2F6 0.266 CF4 0.418 Etch, 200mm, C2F6

Etch 200mm C2F6 0.659 CF4 0.126 Etch, 200mm, C2F6

Etch 200mm C2F6 0.773 CF4 0.547 Etch, 200mm, C2F6

Etch 200mm C2F6 0.559 Etch, 200mm, C2F6

Etch 200mm C2F6 0.26 Etch, 200mm, C2F6

Etch 200mm C2F6 0.52 Etch, 200mm, C2F6

Etch 200mm C2F6 0.486 Etch, 200mm, C2F6

Etch 300mm C2F6 0.811 Etch, 300mm, C2F6

Etch 300mm C2F6 0.779 CF4 0.206 Etch, 300mm, C2F6

In situ plasma cleaning 200mm C2F6 0.43 CF4 0.17 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.36 CF4 0.2076 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.6006 CF4 0.15 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.6744 CF4 0.15 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.51 CF4 0.15 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.54 CF4 0.15 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.64 CF4 0.323 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.6 CF4 0.11 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.59 CF4 0.11 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.48 CF4 0.48 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.61 CF4 0.35 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.36 CF4 In situ plasma cleaning , 200mm, C2F6

In situ plasma cleaning 200mm C2F6 0.69 CF4 0.11 In situ plasma cleaning , 200mm, C2F6

Input Gas EF BP EF1 (mass BPi EF (mass 
(If multi-gas 

process, list 

each F-gas on 

separate 

line)

(mass 

emissions/inp

ut mass of 

listed F-gas)

Etch 200mm NF3 0.0379 CF4 0.004 Etch, 200mm, NF3

Etch 200mm NF3 0.1 Etch, 200mm, NF3

Etch 200mm NF3 0.07 Etch, 200mm, NF3

Etch 200mm NF3 0.17 Etch, 200mm, NF3

Etch 200mm NF3 0.47 Etch, 200mm, NF3

Etch 200mm NF3 0.17 Etch, 200mm, NF3

Etch 200mm NF3 0.02 Etch, 200mm, NF3

Etch 200mm NF3 0.05 Etch, 200mm, NF3

Etch 200mm NF3 0.14 Etch, 200mm, NF3

Etch 200mm NF3 0.17 Etch, 200mm, NF3

Etch 200mm NF3 0.36 Etch, 200mm, NF3

Etch 200mm NF3 0.17 Etch, 200mm, NF3

Etch 200mm NF3 0.17 Etch, 200mm, NF3

Etch 200mm NF3 0.18 Etch, 200mm, NF3

Etch 200mm NF3 0.33 Etch, 200mm, NF3

Etch 200mm NF3 0.17 Etch, 200mm, NF3

Etch 200mm NF3 0.15 Etch, 200mm, NF3

Etch 200mm NF3 0.17 Etch, 200mm, NF3

Etch 200mm NF3 0.45 Etch, 200mm, NF3

Etch 200mm NF3 0.33 Etch, 200mm, NF3

Etch 200mm NF3 0.13 Etch, 200mm, NF3

Etch 200mm NF3 0.418 Etch, 200mm, NF3

Etch 300mm NF3 0.3104 C2F6 0.1421 CF4 0.1731 Etch, 300mm, NF3

Etch 300mm NF3 0.0646 C2F6 0.001 CF4 0.019 Etch, 300mm, NF3

Etch 300mm NF3 0.114 C2F6 0.0086 CF4 0.0239 Etch, 300mm, NF3

Etch 300mm NF3 0.1501 C2F6 0.029 CF4 0.0477 Etch, 300mm, NF3

Etch 300mm NF3 0.0759 C2F6 0.1344 CF4 0.1143 Etch, 300mm, NF3

Etch 300mm NF3 0.1353 C2F6 0.0324 CF4 0.0416 Etch, 300mm, NF3

Etch 300mm NF3 0.0785 C2F6 0.1183 CF4 0.0996 Etch, 300mm, NF3

Etch 300mm NF3 0.3115 CF4 0.1734 C2F6 0.143 Etch, 300mm, NF3

Etch 300mm NF3 0.576 CF4 0.0526 C2F6 0.0025 Etch, 300mm, NF3

Etch 300mm NF3 0.3589 CF4 0.0056 C2F6 0.0158 CHF3 0.013 Etch, 300mm, NF3

Etch 300mm NF3 0.0819 CF4 0.0343 CHF3 0.0334 Etch, 300mm, NF3

Etch 300mm NF3 0.1612 CF4 0.0964 CHF3 0.1309 Etch, 300mm, NF3

Etch 300mm NF3 0.3571 CF4 0.0274 CHF3 0.001 Etch, 300mm, NF3

Etch 300mm NF3 0.2187 CF4 0.0249 CHF3 0.0006 C2F6 0.0028 Etch, 300mm, NF3

Etch 300mm NF3 0.0816 CF4 0.0639 CHF3 0.0579 Etch, 300mm, NF3

Etch 300mm NF3 0.0787 CF4 0.0501 CHF3 0.0464 Etch, 300mm, NF3

Etch 300mm NF3 0.1749 CF4 0.0001 Etch, 300mm, NF3

Etch 300mm NF3 0.1645 CF4 0.1136 Etch, 300mm, NF3

Etch 300mm NF3 0.4037 CF4 0.0732 Etch, 300mm, NF3

Etch 300mm NF3 0.188 CF4 0.018 Etch, 300mm, NF3

Etch 300mm NF3 0.6391 CF4 0.0105 Etch, 300mm, NF3

Etch 300mm NF3 0.1592 CF4 0.0001 Etch, 300mm, NF3

Etch 300mm NF3 0.4959 CF4 0.0006 Etch, 300mm, NF3

BPi Identity All EF Record ID Information

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Process Type/Subtype Wafer Diameter (150mm, 

200mm, 300mm) BP1 Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass emission of 

byproduct(2)/mass of all input Fgases)
Etch 300mm NF3 0.0618 CF4 0.0099 Etch, 300mm, NF3

Etch 300mm NF3 0.0631 CF4 0.0108 Etch, 300mm, NF3

Etch 300mm NF3 0.0607 CF4 0.0008 Etch, 300mm, NF3

Etch 300mm NF3 0.0578 CF4 0.001 Etch, 300mm, NF3

Etch 300mm NF3 0.1582 CF4 0.1144 Etch, 300mm, NF3

Etch 300mm NF3 0.1936 CF4 0.0011 Etch, 300mm, NF3

Etch 300mm NF3 0.0737 CF4 0.0004 Etch, 300mm, NF3

Etch 300mm NF3 0.1692 CF4 0.2242 Etch, 300mm, NF3

Etch 300mm NF3 0.0824 CHF3 0.0294 Etch, 300mm, NF3

Etch 300mm NF3 0.1415 CHF3 0.0003 Etch, 300mm, NF3

Etch 300mm NF3 0.1712 Etch, 300mm, NF3

Etch 300mm NF3 0.2411 Etch, 300mm, NF3

Etch 300mm NF3 0.143 Etch, 300mm, NF3

Etch 300mm NF3 0.1503 Etch, 300mm, NF3

Etch 300mm NF3 0.2187 Etch, 300mm, NF3

Etch 300mm NF3 0.0828 Etch, 300mm, NF3

Etch 300mm NF3 0.082 Etch, 300mm, NF3

Etch 300mm NF3 0.0638 Etch, 300mm, NF3

Etch 300mm NF3 0.0702 Etch, 300mm, NF3

Etch 300mm NF3 0.1978 Etch, 300mm, NF3

Etch 300mm NF3 0.0806 Etch, 300mm, NF3

Etch 300mm NF3 0.0289 Etch, 300mm, NF3

Etch 300mm NF3 0.0178 Etch, 300mm, NF3

Etch 300mm NF3 0.0193 Etch, 300mm, NF3

Etch 300mm NF3 0.0163 Etch, 300mm, NF3

Etch 300mm NF3 0.153 Etch, 300mm, NF3

Etch 300mm NF3 0.0802 Etch, 300mm, NF3

Etch 300mm NF3 0.23 Etch, 300mm, NF3

Etch 300mm NF3 0.23 Etch, 300mm, NF3

In situ plasma cleaning 200mm NF3 0.2851 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.359 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.38 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.1 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.1 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.11 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.11 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.14 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.16 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.09 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.12 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.762 CF4 0.019 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.16 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.005 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.11 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.01 CF4 0.002 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.14 CF40 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.14 CF4 0.18 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.13 In situ plasma cleaning , 200mm, NF3
In situ plasma cleaning 200mm NF3 0.35 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.21 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.101 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.24 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.23 In situ plasma cleaning , 200mm, NF3

In situ plasma cleaning 200mm NF3 0.25 In situ plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0425 CF4 0.0115 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.01 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.087 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.04 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.024 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0226 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0196 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.013 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0065 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0111 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0111 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.033 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.017 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.01 CF4 0.005 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.02 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.04 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0156 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.02 CF4 0.005 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0059 CF4 0.0002 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.037 CF4 0.009 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0038 CF4 0.012 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.018 CF4 0.031 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0016 CF4 0.045 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0452 CF4 0.013 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0542 CF4 0.006 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0897 CF4 0.011 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0115 CF4 0.005 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.004 CF4 0.043 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.008 CF4 0.027 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.003 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.01 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.033 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.003 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.005 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.003 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.003 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.0017 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.04 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.003 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.01 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.002 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.04 Remote plasma cleaning , 200mm, NF3
Remote plasma cleaning 200mm NF3 0.0021 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.02 CF4 0.006 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.01 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.04 CF4 0.009 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.02 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 200mm NF3 0.01 Remote plasma cleaning , 200mm, NF3

Remote plasma cleaning 300mm NF3 0.00417 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.01 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.01 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.00902 CF4 0.788 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0443 CF4 0.00105 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.00881 CF4 0.0485 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.01 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.00902 CF4 0.788 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0238 CF4 0.063 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0134 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.00199 CF4 0.00147 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.004 CF4 0.0016 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.05 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.014 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0196 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0132 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0143 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.026 CF4 0.036 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0123 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.01 CF4 0.009 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.01 CF4 0.006 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.02 CF4 0.005 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0082 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0138 CF4 0.002 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.011 CF4 0.009 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0141 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0041 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0048 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.006 CF4 0.001 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.047 CF4 0.036 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0137 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0229 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0138 CF4 0.002 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0058 CF4 0.001 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0032 CF4 0.048 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0038 CF4 0.042 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0048 CF4 0.09 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.03 CF4 0.005 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0029 CF4 0.006 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0043 CF4 0.094 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.013 CF4 0.076 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.007 CF4 0.035 Remote plasma cleaning , 300mm, NF3
Remote plasma cleaning 300mm NF3 0.003 CF4 0.002 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.004 CF4 0.014 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0076 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.009 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.0071 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.032 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.01 CF4 0.004 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.006 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.013 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.002 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.002 CF4 0.001 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.08 Remote plasma cleaning , 300mm, NF3

Remote plasma cleaning 300mm NF3 0.01 CF4 0.031 Remote plasma cleaning , 300mm, NF3

In situ thermal cleaning 300mm NF3 0.28 CF4 0.01 In situ thermal cleaning, 300mm, NF3

In situ plasma cleaning 300mm NF3 0.13 In situ plasma cleaning , 300mm, NF3

In situ plasma cleaning 300mm NF3 0.35 In situ plasma cleaning , 300mm, NF3

In situ plasma cleaning 300mm NF3 0.21 In situ plasma cleaning , 300mm, NF3

In situ plasma cleaning 300mm NF3 0.101 In situ plasma cleaning , 300mm, NF3

In situ plasma cleaning 300mm NF3 0.24 In situ plasma cleaning , 300mm, NF3

In situ plasma cleaning 300mm NF3 0.23 In situ plasma cleaning , 300mm, NF3

In situ plasma cleaning 300mm NF3 0.25 In situ plasma cleaning , 300mm, NF3

In situ plasma cleaning 300mm NF3 0.29 CF4 0.037 In situ plasma cleaning , 300mm, NF3

NF

3

 Remote Clean Outliers

Input Gas EF

(If multi-gas 

process, list 

each F-gas on 

separate 

line)

(mass 

emissions/inp

ut mass of 

listed F-gas)

Remote plasma cleaning 200 NF3 0.172

Remote plasma cleaning 200 NF3 0.19

Remote plasma cleaning 300 NF3 0.1933

Remote plasma cleaning 200 NF3 0.112

Process Type/Subtype Wafer Diameter (150mm, 

200mm, 300mm)
Gas/Process Type Weighting Factor Calculations by Wafer Size

The weights developed in the set of tables on rows 5-17 are used in weighted EF calculations shown on the tab "EFs".

* Data in this tab were taken from "Report to EPA on Etch Factor Proposal for Fab GHG Emissions Reporting", "Table 4-5 – F-Gas usage" available in EPA docket EPA-HQ-OAR-2011-0028.

Industry Level 200mm Gas/Process Type Weighting Factors Industry Level 300mm Gas/Process Type Weighting Factors

Wafer 

Size (mm)

Year Input Gas CVD In Situ 

Plasma 

Weight

CVD 

Remote 

Plasma 

Weight

CVD In-Situ 

Thermal 

Weight

Wafer 

Clean and 

Etch 

Weight

Total Check Wafer 

Size (mm)

Year Input Gas CVD In 

Situ 

Plasma 

Weight

CVD 

Remote 

Plasma 

Weight

CVD InSitu 

Thermal 

Weight

Wafer 

Clean and 

Etch 

Weight

Total 

Check

200 2009 and 2010 C2F6 0.89 0.00 0.00 0.11 1.00 300 2009 and 2010 C2F6 1.00 0.00 0.00 0.00 1.00

200 2009 and 2010 C2HF5 0.00 0.00 0.00 0.00 0.00 300 2009 and 2010 C2HF5 0.00 0.00 0.00 0.00 0.00

200 2009 and 2010 C3F8 1.00 0.00 0.00 0.00 1.00 300 2009 and 2010 C3F8 0.00 0.00 0.00 1.00 1.00

200 2009 and 2010 C4F6 0.00 0.00 0.00 1.00 1.00 300 2009 and 2010 C4F6 0.00 0.00 0.00 1.00 1.00

200 2009 and 2010 C5F8 0.00 0.00 0.00 1.00 1.00 300 2009 and 2010 C5F8 0.00 0.00 0.00 1.00 1.00

200 2009 and 2010 c-C4F8 0.30 0.00 0.00 0.70 1.00 300 2009 and 2010 c-C4F8 0.00 0.00 0.00 1.00 1.00

200 2009 and 2010 CF4 0.38 0.01 0.00 0.61 1.00 300 2009 and 2010 CF4 0.00 0.00 0.00 1.00 1.00

200 2009 and 2010 CH2F2 0.00 0.00 0.00 1.00 1.00 300 2009 and 2010 CH2F2 0.00 0.00 0.00 1.00 1.00

200 2009 and 2010 CH3F 0.00 0.00 0.00 1.00 1.00 300 2009 and 2010 CH3F 0.00 0.00 0.00 1.00 1.00

200 2009 and 2010 CHF3 0.00 0.00 0.00 1.00 1.00 300 2009 and 2010 CHF3 0.00 0.00 0.00 1.00 1.00

200 2009 and 2010 NF3 0.34 0.62 0.00 0.05 1.00 300 2009 and 2010 NF3 0.25 0.59 0.00 0.15 1.00

200 2009 and 2010 SF6 0.04 0.00 0.00 0.96 1.00 300 2009 and 2010 SF6 0.00 0.00 0.00 1.00 1.00

SIA Industry Level 200mm Gas Usage (2 Factor Model) For 2009 and 2010 SIA Industry Level 300mm Gas Usage (2 Factor Model) For 2009 and 2010

Wafer 

Size (mm)

Year Input Gas CVD In Situ 

Plasma 

Usage (kg)

CVD 

Remote 

Plasma 

Usage (kg)

CVD In-Situ 

Thermal 

Usage (kg)

Wafer 

Clean and 

Etch Usage 

(kg)

Wafer Clean 

Usage(kg) 

Etch Usage(kg) Total Usage 

(kg)

Wafer 

Size (mm)

Year Input Gas CVD In 

Situ 

Plasma 

Usage 

(kg)

CVD 

Remote 

Plasma 

Usage 

(kg)

CVD InSitu 

Thermal 

Usage 

(kg)

Wafer 

Clean and 

Etch 

Usage 

(kg)

Wafer 

Clean 

Usage(kg) 

Etch 

Usage(kg) 

Total 

Usage (kg)

200 2009 and 2010 C2F6 179154.9 0 0 21809.6 8143.6 13666 200964.5 300 2009 and 2010 C2F6 258.6 0 0 0 0 0 258.6

200 2009 and 2010 C2HF5 0 0 0 0 0 0 0 300 2009 and 2010 C2HF5 0 0 0 0 0 0 0

200 2009 and 2010 C3F8 44776 0 0 0 0 0 44776 300 2009 and 2010 C3F8 0 0 0 45 0 45 45

200 2009 and 2010 C4F6 0 0 0 7.9 0 7.9 7.9 300 2009 and 2010 C4F6 0 0 0 3703.8 0 3703.8 3703.8

200 2009 and 2010 C5F8 0 0 0 163.6 0 163.6 163.6 300 2009 and 2010 C5F8 0 0 0 1618.8 0 1618.8 1618.8

200 2009 and 2010 c-C4F8 4999.5 0 0 11754 0 11754 16753.5 300 2009 and 2010 c-C4F8 0 0 0 10628.4 0 10628.4 10628.4

200 2009 and 2010 CF4 23734.3 606 0 37905.3 2273.2 35632.1 62245.6 300 2009 and 2010 CF4 0 0 0 47315 2773.9 44541.1 47315

200 2009 and 2010 CH2F2 0 0 0 397.6 0 397.6 397.6 300 2009 and 2010 CH2F2 0 0 0 2798.5 0 2798.5 2798.5

200 2009 and 2010 CH3F 0 0 0 244.6 0 244.6 244.6 300 2009 and 2010 CH3F 0 0 0 481.3 0 481.3 481.3

200 2009 and 2010 CHF3 0 0 0 8390.8 234.9 8155.9 8390.8 300 2009 and 2010 CHF3 0 0 0 10167.5 0 10167.5 10167.5

200 2009 and 2010 NF3 46561.1 85427.7 121.6 6569.7 86.8 6482.9 138680.1 300 2009 and 2010 NF3 74636.4 174234.4 1339.2 44639.3 1030.8 43608.5 294849.3

200 2009 and 2010 SF6 1156.7 0 0 30310.6 15.3 30295.3 31467.3 300 2009 and 2010 SF6 0 0 0 9191.8 740.8 8451 9191.8

SIA Industry Level 200mm Gas Usage (2 Factor Model) By Year SIA Industry Level 300mm Gas Usage (2 Factor Model) by Year

Wafer 

Size (mm)

Year Input Gas Number of 

FABS 

CVD In Situ 

Plasma 

Usage (kg)

CVD 

Remote 

Plasma 

Usage (kg)

CVD In-Situ 

Thermal 

Usage (kg)

Wafer Clean and 

Etch Usage (kg)

Wafer Clean 

Usage(kg) 

Etch Usage(kg) Wafer 

Size (mm)

Year Input Gas Number 

of FABS 

CVD In 

Situ 

Plasma 

Usage 

(kg)

CVD 

Remote 

Plasma 

Usage 

(kg)

CVD InSitu 

Thermal 

Usage 

(kg)

Wafer 

Clean and 

Etch Usage 

(kg)

Wafer 

Clean 

Usage(kg) 

Etch 

Usage(kg) 

200 2009 C2F6 7 90962.1 13509.3 7038 6471.3 300 2009 C2F6 5 258.6 0 0 0 0 0

200 2009 C2HF5 7 0 0 300 2009 C2HF5 5 0 0 0 0 0 0

200 2009 C3F8 7 20021 0 0 300 2009 C3F8 5 0 0 0 45 0 45

200 2009 C4F6 7 3.3 3.3 300 2009 C4F6 5 0 0 0 1446.6 0 1446.6

200 2009 C5F8 7 78.3 78.3 300 2009 C5F8 5 0 0 0 647.8 0 647.8

200 2009 c-C4F8 7 442 4970.7 4970.7 300 2009 c-C4F8 5 0 0 0 4897.1 0 4897.1

200 2009 CF4 7 15290.8 17236.5 1560.4 15676.1 300 2009 CF4 5 0 0 0 21226.2 1206.3 20019.9

200 2009 CH2F2 7 126.9 126.9 300 2009 CH2F2 5 0 0 0 1082.6 0 1082.6

200 2009 CH3F 7 106.3 106.3 300 2009 CH3F 5 0 0 0 214.8 0 214.8

200 2009 CHF3 7 3619 82.2 3536.8 300 2009 CHF3 5 0 0 0 4002.4 0 4002.4

200 2009 NF3 7 29562.2 50310.1 57.5 4028.9 37.2 3991.7 300 2009 NF3 5 30178.3 75215.7 558.7 22833.1 559.4 22273.7

200 2009 SF6 7 391.2 12395.8 0.8 12395 300 2009 SF6 5 0 0 0 4912.3 479 4433.3

200 2010 C2F6 7 88192.8 0 8300.3 1105.6 7194.7 300 2010 C2F6 5 0 0 0 0 0 0
200 2010

C

2HF5 

70000 300 2010C

2HF5 

5000000

200 2010C

3

F8 7 24755000 300 2010C

3

F8 5000000

200 2010C

4

F6 70 4.6 4.6 300 2010C

4

F6 5000 2257.20 2257.2

200 2010C

5

F8 70 85.3 85.3 300 2010C

5

F8 5000 9710 971

200 2010 c-C

4

F8 7 4557.50 6783.3 6783.3 300 2010 c-C

4

F8 5000 5731.30 5731.3

200 2010 CF4 7 8443.5 606 20668.8 712.8 19956 300 2010 CF4 5000 26088.8 1567.6 24521.2

200 2010 CH

2

F2 700 270.7 270.7 300 2010 CH

2

F2 5000 1715.90 1715.9

200 2010 CH

3F 

700 138.3 138.3 300 2010 CH

3F 

5000 266.50 266.5

200 2010 CHF3 700 4771.8 152.7 4619.1 300 2010 CHF3 5000 6165.10 6165.1

200 2010 NF3 7 16998.9 35117.6 64.1 2540.8 49.6 2491.2 300 2010 NF3 5 44458.1 99018.7 780.5 21806.2 471.4 21334.8

200 2010 SF6 7 765.50 17914.8 14.5 17900.3 300 2010 SF6 5000 4279.5 261.8 4017.7