ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

300mm NF3 10 0.0819CF4 0.0343CHF3 0.0334 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm CH2F2 5 0.0511CF4 0.0343CHF3 0.0334 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm NF3 10 0.1612CF4 0.0964CHF3 0.1309 Y Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CH2F2 5 0.1038CF4 0.0964CHF3 0.1309 Y Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CF4 120 0.8589C4F8 0.0007C2F6 0.0050 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season 300mm CF4 120 0.8424C4F8 0.0006C2F6 0.0029CHF3 0.0030 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CF4 120 0.8280C4F8 0.0006C2F6 0.0039CHF3 0.0006 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 22 0.1414CF4 0.0581C2F6 0.0562 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season 300mm C4F8 22 0.1417CF4 0.0542C2F6 0.0616 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season 300mm CHF3 135 0.7340CF4 0.0211C4F8 0.0007C2F6 0.0065 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season 300mm CHF3 135 0.8049CF4 0.0140C4F8 0.0009C2F6 0.0014N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm NF3 50 0.3115CF4 0.1734C2F6 0.1430 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 150 0.2460C2F6 0.0134CF4 0.0504 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 150 0.2426C2F6 0.0036CF4 0.0425 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm NF3 50 0.3104C2F6 0.1421CF4 0.1731 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 75 0.8338C2F6 0.0456CF4 0.0707 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm SF6 15 0.6975C2F6 0.0456CF4 0.0707 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CF4 200 0.6012C2F6 0.0377 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CHF3 100 0.3502C2F6 0.0819CF4 0.0893 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm C4F8 7.5 0.2935CF4 0.4399CHF3 0.0038 N Oxide Not Provided Not Provided ISMI 2006 N Y - Clean 300mm C4F8 7.5 0.1555CF4 0.0029CHF3 0.0186 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 6 0.1054CF4 0.0113CHF3 0.0713 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CH2F2 15 0.0684CF4 0.0022 N Nitride Not Provided Not Provided ISMI 2006 Y N 300mm NF3 150 0.1749CF4 0.0001 N Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 150 0.1712 N Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 150 0.2411 N Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CH2F2 15 0.0922CF4 0.0033 N Nitride Not Provided Not Provided ISMI 2006 N Y - Season 300mm SF6 200 0.1851CF4 0.0003 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning 300mm SF6 200 0.1640 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning 300mm SF6 200 0.1807 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning 300mm SF6 200 0.2003 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning 300mm SF6 200 0.1806 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning 300mm CHF3 55 0.1194CF4 0.1055 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm SF6 200 0.1518CF4 0.0003 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning 300mm SF6 200 0.1513 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning 300mm SF6 200 0.1804 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning 300mm SF6 200 0.1976 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning 300mm SF6 200 0.1895 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning 300mm CHF3 55 0.1153CF4 0.0985 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm CHF3 55 0.1146CF4 0.1053 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm C5F8 12.5 0.1255C2F6 0.0009CHF3 0.0002CF4 0.2353 N Nitride Not Provided Not Provided ISMI 2009 Y N 300mm C5F8 12.5 0.1263C2F6 0.0026CHF3 0.0002CF4 0.2352 N Nitride Not Provided Not Provided ISMI 2009 Y N 300mm C5F8 13 0.2640CF4 0.1135 N Nitride Not Provided Not Provided ISMI 2009 N Y - aging 300mm C5F8 13 0.2993CF4 0.1347 N Nitride Not Provided Not Provided ISMI 2009 N Y - aging 300mm CF4 180 0.8462C2F6 0.0461 N Nitride Not Provided Not Provided ISMI 2009 N Y - Clean 300mm CF4 180 0.8462C2F6 0.0189 N Nitride Not Provided Not Provided ISMI 2009 N Y - Clean 300mm C5F8 9 0.1833C2F6 0.0898CHF3 0.0072CF4 0.0937 N Nitride Not Provided Not Provided ISMI 2009 Y N 300mm C5F8 10 0.1163CF4 0.2863 N Nitride Not Provided Not Provided ISMI 2009 N Y - aging 300mm C5F8 9 0.0638C2F6 0.2029CF4 0.1474 N Nitride Not Provided Not Provided ISMI 2009 N Y - aging 300mm CF4 20 0.5775CHF3 0.0117 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 5 0.3517CHF3 0.0117 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm CF4 20 0.7435CHF3 0.0015 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 5 0.6486CHF3 0.0015 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm NF3 60 0.1645CF4 0.1136 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm CF4 120 0.6096C2F6 0.0016CHF3 0.0004 N Oxide Not Provided Not Provided ISMI 2006 N Y - pre clean 300mm CF4 120 0.5681CHF3 0.0103 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 120 0.1892CF4 0.0566C2F6 0.0347 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

300mm NF3 60 0.4037CF4 0.0732 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm NF3 60 0.1880CF4 0.0180 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CH2F2 8 0.3095C2F6 0.1859CHF3 0.0745 Y Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CF4 75 0.7280C2F6 0.1859CHF3 0.0745 Y Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CH2F2 8 0.2448C2F6 0.1279CHF3 0.0464 Y Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CF4 75 0.5255C2F6 0.1279CHF3 0.0464 Y Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CH2F2 8 0.2335CHF3 0.0469C2F6 0.1268 Y Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CF4 75 0.5145CHF3 0.0469C2F6 0.1268 Y Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CF4 75 0.5035C2F6 0.1578CHF3 0.0024 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season 300mm CF4 75 0.5072C2F6 0.1696CHF3 0.0021 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season 300mm CF4 75 0.5174C2F6 0.1623CHF3 0.0023 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season 300mm CF4 75 0.5174C2F6 0.1748CHF3 0.0021 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season 300mm CF4 75 0.5156C2F6 0.1570CHF3 0.0021 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season 300mm CF4 75 0.5327C2F6 0.1696CHF3 0.0017 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season 300mm CH2F2 8 0.2419C2F6 0.1341CHF3 0.0514 Y Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CF4 75 0.5112C2F6 0.1341CHF3 0.0514 Y Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CF4 75 0.5078C2F6 0.1574CHF3 0.0022 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season 300mm CF4 75 0.5294C2F6 0.1706CHF3 0.0020 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season 300mm CF4 40 0.7502C2F6 0.0360CHF3 0.0308 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm C4F6 22 N/A C2F6 0.0360CHF3 0.0308 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CF4 400 0.7780C2F6 0.0585 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CHF3 50 0.9604C2F6 0.0585 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CF4 200 0.6794C2F6 0.0771CHF3 0.0024 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CHF3 20 0.4447C2F6 0.0097CF4 0.0609 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CF4 400 0.7853C2F6 0.0426 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CHF3 50 0.9174C2F6 0.0426 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CF4 200 0.6739C2F6 0.0597CHF3 0.0040 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CHF3 20 0.4675C2F6 0.0228CF4 0.0851 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CF4 400 0.8039C2F6 0.0408 Y Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 50 0.9245C2F6 0.0408 Y Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CF4 200 0.6761C2F6 0.0687CHF3 0.0045 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 20 0.4403C2F6 0.0211CF4 0.0457 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CF4 200 0.5872C2F6 0.0432CHF3 0.0061 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 20 0.4136C2F6 0.0212CF4 0.0580 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CF4 200 0.6694C2F6 0.0734CHF3 0.0030 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CF4 200 0.6972C2F6 0.0530CHF3 0.0093 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CF4 200 0.6959C2F6 0.0532CHF3 0.0082 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CHF3 20 0.4181C2F6 0.0213CF4 0.1267 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CHF3 20 0.4139C2F6 0.0251CF4 0.0497 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CHF3 20 0.4220C2F6 0.0191CF4 0.0928 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CHF3 40 0.1788CF4 0.0045 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 28 0.0524CF4 0.0382CHF3 0.0640C2F6 0.0159 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 28 0.0869CF4 0.0137CHF3 0.0097C2F6 0.0672 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm CHF3 40 0.2863CF4 0.0102 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm CHF3 40 0.1361CF4 0.0140 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 28 0.1196CF4 0.0339C2F6 0.0154CHF3 0.0185 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 28 0.1014CF4 0.0529C2F6 0.0195CHF3 0.0043 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 28 0.1121CF4 0.0329C2F6 0.0098CHF3 0.0149 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 28 0.1096CF4 0.0538C2F6 0.0183CHF3 0.0037 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 13 0.1435CF4 0.0095CHF3 0.0138 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 6 0.1196CF4 0.0149CHF3 0.0151 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F6 12 0.6737CF4 0.0070CHF3 0.0358 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm CHF3 40 0.2389CF4 0.0100 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F6 14 0.1349CF4 0.0173CHF3 0.0499C2F6 0.0107 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F6 28 0.3846CF4 0.0372CHF3 0.0340C2F6 0.0298 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F6 12 0.5424CF4 0.0102CHF3 0.0156 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm CHF3 40 0.6110CF4 0.0246 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

300mm C4F6 14 0.2422CF4 0.0235CHF3 0.0412C2F6 0.0163 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F6 28 0.1857CF4 0.0269CHF3 0.0126C2F6 0.0247 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F6 12 0.6749CF4 0.0238CHF3 0.0092 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm CHF3 40 0.3627CF4 0.0283 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F6 14 0.2549CF4 0.0262CHF3 0.0336C2F6 0.0171 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F6 28 0.2344CF4 0.0274CHF3 0.0107C2F6 0.0202 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 27 0.0510CF4 0.0287CHF3 0.0059C2F6 0.0774N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 27 0.0661CF4 0.0265CHF3 0.0294C2F6 0.0547 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm CH2F2 20 0.4031C2F6 0.0102 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CH2F2 20 0.1136CF4 0.0033CHF3 0.0038C2F6 0.0039 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm C4F8 14 0.3937CF4 0.0085CHF3 0.0052C2F6 0.0020 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm C4F8 14 0.1454CF4 0.0072CHF3 0.0037C2F6 0.0021 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm C4F6 24 0.3333CF4 0.0167CHF3 0.0050C2F6 0.0069 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm C4F6 24 0.2234CF4 0.0161CHF3 0.0044C2F6 0.0059 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CH2F2 20 0.3459CHF3 0.0025 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 14 0.1120CF4 0.0053CHF3 0.0046C2F6 0.0027 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F6 24 0.1256CF4 0.0289CHF3 0.0095C2F6 0.0138 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CH2F2 20 0.2874CF4 0.0010CHF3 0.0016C2F6 0.0103 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm C4F6 18 0.1761CF4 0.0157CHF3 0.0063C2F6 0.0075 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm C4F6 18 0.1376CF4 0.0137CHF3 0.0049C2F6 0.0061 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CH2F2 20 0.1317CF4 0.0018CHF3 0.0025C2F6 0.0074N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CH2F2 20 0.1930CF4 0.0009CHF3 0.0008C2F6 0.0058 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CH2F2 13 0.1162CF4 0.0445CHF3 0.0308 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 27 0.1219CF4 0.0119CHF3 0.0048C2F6 0.0073 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 27 0.1882CF4 0.0087CHF3 0.0046C2F6 0.0046 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 27 0.1308CF4 0.0400CHF3 0.0029C2F6 0.0254N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CH2F2 20 0.1514CF4 0.0046CHF3 0.0264C2F6 0.0113 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F6 7.5 0.0768CF4 0.0036CHF3 0.0197 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 17 0.2137CF4 0.0298CHF3 0.0811 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 17 0.1855CF4 0.0553CHF3 0.1125 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 17 0.1984CF4 0.0440CHF3 0.1126 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F6 7.5 0.0586CF4 0.0017CHF3 0.0087 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F6 7.5 0.1155CF4 0.0037CHF3 0.0071 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F6 7.5 0.0475CF4 0.0149CHF3 0.0062 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F6 7.5 0.0482CF4 0.0178CHF3 0.0042 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F6 7.5 0.0510CF4 0.0171CHF3 0.0033 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F8 17 0.1569CF4 0.0562CHF3 0.0139C2F6 0.0139 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F8 17 0.1893CF4 0.0547CHF3 0.0074C2F6 0.0181 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F8 17 0.1825CF4 0.0545CHF3 0.0058C2F6 0.0174N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F8 17 0.1908CF4 0.0563CHF3 0.0051C2F6 0.0202 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F8 17 0.1561CF4 0.0461CHF3 0.1228 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 17 0.1491CF4 0.0552CHF3 0.1120 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F6 8 0.0425CF4 0.0038CHF3 0.0221 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F6 7.5 0.0776CF4 0.0053CHF3 0.0078 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F6 7.5 0.0693CF4 0.0115CHF3 0.0051 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F8 17 0.2119CF4 0.0501CHF3 0.0124C2F6 0.0163 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F8 17 0.1822CF4 0.0494CHF3 0.0067C2F6 0.0180 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F8 17 0.1642CF4 0.0824CHF3 0.0073C2F6 0.0240 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F8 17 0.1732CF4 0.0771CHF3 0.0039C2F6 0.0284N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm CHF3 198 0.1071CF4 0.2319C2F6 0.1489 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm SF6 33 0.0073CF4 0.2319C2F6 0.1489 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 75 0.0029CF4 0.1239C2F6 0.0016 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CF4 20 0.2251CHF3 0.0037 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CF4 200 0.4813C2F6 0.0038 N Silicon Not Provided Not Provided ISMI 2006 N Y - insitu clean 300mm CF4 200 0.9840C2F6 0.0299 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm CF4 200 0.8857C2F6 0.0167 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm CF4 200 0.9891C2F6 0.0281 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm CF4 200 0.9218C2F6 0.0154 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

300mm NF3 150 0.1430 N Nitride Not Provided Not Provided ISMI 2006 N Y - dry clean 300mm NF3 150 0.1503 N Nitride Not Provided Not Provided ISMI 2006 N Y - dry clean 300mm NF3 150 0.2187 N Nitride Not Provided Not Provided ISMI 2006 N Y - dry clean 300mm CH2F2 15 0.0606CF4 0.0045 N Nitride Not Provided Not Provided ISMI 2006 N Y - Season 300mm CH2F2 15 0.0681CF4 0.0014 N Nitride Not Provided Not Provided ISMI 2006 Y N 300mm CH2F2 5 0.0533CF4 0.1862CHF3 0.1054 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm NF3 10 0.0828 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm CH2F2 5 0.0494CF4 0.2428CHF3 0.1265 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 10 0.0820 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CH2F2 5 0.0384CF4 0.2096CHF3 0.1216 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm NF3 10 0.0638 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm CH2F2 5 0.0442CF4 0.2271CHF3 0.1078 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 10 0.0702 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 500 0.1978 N Metal Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm CF4 100 0.4878CHF3 0.0094C2F6 0.0983 N Metal Not Provided Not Provided ISMI 2006 Y N 300mm NF3 500 0.6391CF4 0.0105 N Metal Not Provided Not Provided ISMI 2006 Y N 300mm NF3 500 0.1592CF4 0.0001 N Metal Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm NF3 100 0.0806 N Oxide Not Provided Not Provided ISMI 2006 N Y - Clean 300mm CF4 200 0.7430C2F6 0.0063 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 50 0.5760CF4 0.0526C2F6 0.0025 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 47 0.3589CF4 0.0056C2F6 0.0158CHF3 0.0130 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 155 0.1729C2F6 0.0057 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CF4 45 0.0766C2F6 0.0057 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 155 0.2019C2F6 0.0033 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CF4 45 0.0696C2F6 0.0033 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm NF3 45 0.4959CF4 0.0006 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CF4 200 0.7646C2F6 0.0055 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 50 0.3571CF4 0.0274CHF3 0.0010 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 50 0.2187CF4 0.0249CHF3 0.0006C2F6 0.0028 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CF4 200 0.7538C2F6 0.0042 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm SF6 26 0.4512CF4 0.0591C2F6 0.1114 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 150 0.3580CF4 0.0591C2F6 0.1114 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm SF6 15 0.2791C2F6 0.0512CF4 0.0520 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 75 0.3169C2F6 0.0512CF4 0.0520 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm SF6 5 0.0625CF4 0.0025 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm SF6 200 0.2205 N Silicon Not Provided Not Provided ISMI 2009 N Y - Clean 300mm SF6 200 0.1590 N Silicon Not Provided Not Provided ISMI 2009 N Y - Clean 300mm SF6 200 0.1403 N Silicon Not Provided Not Provided ISMI 2009 N Y - Clean 300mm SF6 200 0.1522 N Silicon Not Provided Not Provided ISMI 2009 N Y - Clean 300mm NF3 37.5 0.0618CF4 0.0099 N Silicon Not Provided Not Provided ISMI 2009 Y N 300mm NF3 37.5 0.0631CF4 0.0108 N Silicon Not Provided Not Provided ISMI 2009 Y N 300mm NF3 37.5 0.0607CF4 0.0008 N Silicon Not Provided Not Provided ISMI 2009 Y N 300mm NF3 37.5 0.0578CF4 0.0010 N Silicon Not Provided Not Provided ISMI 2009 Y N 300mm SF6 200 0.1822CF4 0.0001 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm SF6 200 0.1844CF4 0.0001 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm CH2F2 15 0.1274CF4 0.0057 N Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CH2F2 12 0.1750CF4 0.0160 N Nitride Not Provided Not Provided ISMI 2001 Y N 300mm C5F8 15 0.0631CF4 0.1438CHF3 0.0507C2F6 0.0421 N Nitride Not Provided Not Provided ISMI 2001 Y N 300mm C5F8 10 0.0999CF4 0.0077CHF3 0.0023C2F6 0.0043 N Nitride Not Provided Not Provided ISMI 2001 Y N 300mm C5F8 15 0.0541CF4 0.0550CHF3 0.0003C2F6 0.0076 N Nitride Not Provided Not Provided ISMI 2001 N Y 300mm C5F8 15 0.0610CF4 0.1466CHF3 0.0074C2F6 0.1685 N Nitride Not Provided Not Provided ISMI 2001 N Y 300mm C5F8 15 0.1436CF4 0.1453CHF3 0.0145C2F6 0.2248 N Nitride Not Provided Not Provided ISMI 2001 N Y 300mm SF6 200 0.2854CF4 0.0101C2F6 0.0009 N Nitride Not Provided Not Provided ISMI 2006 N Y - Clean 300mm CF4 65 0.2602C2F6 0.1407 Y Nitride Not Provided Not Provided ISMI 2006 N Y - aging 300mm CHF3 65 0.2981C2F6 0.1407 Y Nitride Not Provided Not Provided ISMI 2006 N Y - aging 300mm CF4 65 0.2397C2F6 0.0607 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 65 0.1893C2F6 0.0607 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm CF4 90 0.5450C2F6 0.4159 Y Nitride Not Provided Not Provided ISMI 2009 Y N 300mm CHF3 30 0.0689C2F6 0.4159 Y Nitride Not Provided Not Provided ISMI 2009 Y N 300mm CF4 65 0.3053C2F6 0.2357 Y Nitride Not Provided Not Provided ISMI 2009 N Y - aging

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

300mm CHF3 65 0.2332C2F6 0.2357 Y Nitride Not Provided Not Provided ISMI 2009 N Y - aging 300mm SF6 200 0.2483C2F6 0.0023CF4 0.0032 N Nitride Not Provided Not Provided ISMI 2009 N Y - Clean 300mm CHF3 125 0.1972CF4 0.0783C2F6 0.0253 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CHF3 125 0.1906CF4 0.0728C2F6 0.0243 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 27 0.0175C2F6 0.0249CF4 0.0475 N Oxide Not Provided Not Provided ISMI 2009 N Y - Clean 300mm CHF3 10 0.1199C2F6 0.0010CF4 0.0190 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean 300mm NF3 50 0.0646C2F6 0.0010CF4 0.0190 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean 300mm CHF3 10 0.2110C2F6 0.0086CF4 0.0239 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm NF3 50 0.1140C2F6 0.0086CF4 0.0239 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm CHF3 60 0.2060C2F6 0.0290CF4 0.0477 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm NF3 38 0.1501C2F6 0.0290CF4 0.0477 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm CHF3 80 0.2519C2F6 0.1344CF4 0.1143 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm NF3 50 0.0759C2F6 0.1344CF4 0.1143 Y Oxide Not Provided Not Provided ISMI 2009 Y N 300mm CHF3 60 0.1815C2F6 0.0324CF4 0.0416 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean 300mm NF3 38 0.1353C2F6 0.0324CF4 0.0416 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean 300mm CHF3 80 0.2364C2F6 0.1183CF4 0.0996 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean 300mm NF3 50 0.0785C2F6 0.1183CF4 0.0996 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean 300mm C4F8 8.1 0.1867CF4 0.0094CHF3 0.0431 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season 300mm C4F8 8.1 0.1835CF4 0.0037CHF3 0.0037 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 8 0.0969CF4 0.0075CHF3 0.0037 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 6 0.2028CF4 0.0127CHF3 0.0085 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 8.1 0.1870CF4 0.0045CHF3 0.0153 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dummy 300mm C4F8 8 0.1439CF4 0.0070CHF3 0.0256 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dummy 300mm C4F8 6 0.2010CF4 0.0132CHF3 0.0660 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dummy 300mm NF3 60 0.1582CF4 0.1144 N Nitride Not Provided Not Provided ISMI 2009 Y N 300mm CF4 20 0.4521CHF3 0.0189 Y Nitride Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 5 0.2171CHF3 0.0189 Y Nitride Not Provided Not Provided ISMI 2009 Y N 300mm CF4 20 0.5159CHF3 0.0031 Y Nitride Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 5 0.3182CHF3 0.0031 Y Nitride Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 22 0.3404CF4 0.0389CHF3 0.0205C2F6 0.0388 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm C4F8 22 0.3151CF4 0.0365CHF3 0.0387C2F6 0.0442 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 22 0.1940CF4 0.0666CHF3 0.0030C2F6 0.0531 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm C4F8 22 0.1628CF4 0.0534C2F6 0.0482 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season 300mm CHF3 135 0.6553CF4 0.0208C2F6 0.0036 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season 300mm CHF3 135 0.4618CF4 0.0090C2F6 0.0012 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm NF3 500 0.1936CF4 0.0011 N Metal Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm CF4 150 0.4461C2F6 0.1697CHF3 0.0040 N Metal Not Provided Not Provided ISMI 2006 Y N 300mm NF3 100 0.0289 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm NF3 100 0.0178 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm NF3 100 0.0193 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm NF3 100 0.0163 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning 300mm NF3 100 0.0824CHF3 0.0294 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 135 0.3868CF4 0.0076 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm CF4 120 0.8026C2F6 0.0020CHF3 0.0035 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 22 0.1804C2F6 0.0754CF4 0.1571CHF3 0.0223 N Oxide Not Provided Not Provided ISMI 2009 N Y - Clean 300mm C4F8 22 0.1799C2F6 0.0729CF4 0.0612CHF3 0.0251 N Oxide Not Provided Not Provided ISMI 2009 N Y - Clean 300mm CHF3 135 0.6498C2F6 0.0075CF4 0.0260 N Oxide Not Provided Not Provided ISMI 2009 N Y - Season 300mm CHF3 135 0.6582C2F6 0.0061CF4 0.0251 N Oxide Not Provided Not Provided ISMI 2009 N Y - Season 300mm C4F8 22 0.1611C2F6 0.0602CF4 0.0671 N Oxide Not Provided Not Provided ISMI 2009 N Y - Season 300mm CF4 120 1.0000C2F6 0.0038CHF3 0.0010 N Oxide Not Provided Not Provided ISMI 2009 N Y - Season 300mm CH2F2 20 0.0524C2F6 0.0005CF4 0.0010CHF3 0.0092 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 29 0.0918C2F6 0.0401CF4 0.0343CHF3 0.0030 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season 300mm C4F8 29 0.1249C2F6 0.0047CF4 0.0263CHF3 0.0255 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm CHF3 198 0.3295C2F6 0.1149CF4 0.1371 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm SF6 33 0.1968C2F6 0.1149CF4 0.1334 Y Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CHF3 75 0.5135C2F6 0.1576CF4 1.2378 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CF4 20 0.3154C2F6 0.0395CHF3 0.0012 N Silicon Not Provided Not Provided ISMI 2006 Y N 300mm CF4 200 0.5671C2F6 0.0164 N Silicon Not Provided Not Provided ISMI 2006 N Y - insitu clean 300mm CF4 200 0.6844C2F6 0.0411 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm CF4 200 0.6519C2F6 0.0237 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

200mm CF4 0.722 N/A N/A N/A Y Oxide Trench Etch ISMI 2001 200mm CHF3 0.690 N/A N/A N/A Y Oxide Trench Etch ISMI 2001 200mm CF4 0.335 N/A N/A N/A Y Nitride Nitride Spacer ISMI 2001 200mm CHF3 0.2 N/A N/A N/A Y Nitride Nitride Spacer ISMI 2001 200mm CF4 0.8 N/A N/A N/A N Oxide Trench Etch ISMI 2001 200mm CF4 0.49 N/A N/A N/A Y Oxide Trench Etch ISMI 2001 200mm CHF3 0.701 N/A N/A N/A Y Oxide Trench Etch ISMI 2001 200mm C4F6 0.0686 CF4 0.1190C2F6 0.0382 N Oxide Trench Dual ISMI 2001 200mm C4F6 0.0364 CF4 0.0383CHF3 0.0657C2F6 0.0243Y Oxide High-Aspect- ISMI 2001 200mm CH2F2 0.0553 CF4 0.0383CHF3 0.0657C2F6 0.0243Y Oxide High-Aspect- ISMI 2001 200mm C4F6 0.06 CF4 0.0170C2F6 0.0312 N Oxide Dual Damascene ISMI 2001 300mm C4F6 15 0.0479 N/A N/A N/A Y Oxide Via ISMI 2006 300mm CF4 150 0.408 N/A N/A N/A Y Oxide Via ISMI 2006 300mm CHF3 30 0.435 N/A N/A N/A Y Oxide Via ISMI 2006 300mm CH2F2 10 0.269 N/A N/A N/A Y Oxide Via ISMI 2006 300mm CF4 150 0.636 N/A N/A N/A Y Oxide Trench ISMI 2006 300mm CHF3 60 0.427 N/A N/A N/A Y Oxide Trench ISMI 2006 200mm CF4 100 0.890CHF3 0.1233C2F6 0.0440 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 125 0.907 CHF3 0.1392C2F6 0.0325 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 100 0.820CHF3 0.2053C2F6 0.0593 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 100 0.926 CHF3 0.1580C2F6 0.0500 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 100 0.857 CHF3 0.1593C2F6 0.0473 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 125 0.951 CHF3 0.0795C2F6 0.0283 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 100 0.882 CHF3 0.2167C2F6 0.0507 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 100 0.855 CHF3 0.2180C2F6 0.0513 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 100 0.844CHF3 0.1587C2F6 0.0520 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 75 0.853 CHF3 0.1644C2F6 0.0498 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 100 0.866 CHF3 0.1587C2F6 0.0520 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 75 0.904CHF3 0.2738C2F6 0.0427 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 75 0.790CHF3 0.2107C2F6 0.0649 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 75 0.764CHF3 0.2124C2F6 0.0747 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 100 0.894CHF3 0.1547C2F6 0.0567 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 100 0.869 CHF3 0.1513C2F6 0.0553 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 75 0.809 CHF3 0.2907C2F6 0.0738 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 125 0.892 CHF3 0.1205C2F6 0.0517 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 125 0.849 CHF3 0.2064C2F6 0.0485 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 125 0.874CHF3 0.1349C2F6 0.0475 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 50 0.677 CHF3 0.160C2F6 0.0180 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 50 0.701 CHF3 0.146C2F6 0.0240 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 50 0.656 CHF3 0.138C2F6 0.0140 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 50 0.692 CHF3 0.136C2F6 0.0160 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 50 0.631 CHF3 0.114C2F6 0.0120 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 37 0.592 CHF3 0.127C2F6 0.0243 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 50 0.622 CHF3 0.118C2F6 0.0180 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 50 0.650CHF3 0.104C2F6 0.0140 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 63 0.748 CHF3 0.081C2F6 0.0095 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 50 0.611 CHF3 0.094C2F6 0.0140 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 50 0.636 CHF3 0.100C2F6 0.0140 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 37 0.526 CHF3 0.073C2F6 0.0108 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 50 0.604CHF3 0.102C2F6 0.0140 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 37 0.673 CHF3 0.130C2F6 0.0189 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 63 0.689 CHF3 0.102C2F6 0.0111 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 37 0.564CHF3 0.095C2F6 0.0135 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 37 0.589 CHF3 0.089C2F6 0.0081 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 63 0.595 CHF3 0.090C2F6 0.0111 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 63 0.646 CHF3 0.083C2F6 0.0111 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm CF4 63 0.589 CHF3 0.059C2F6 0.0079 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 25 0.176 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 25 0.182 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 25 0.152 N Nitride Not Provided N NIST/Intel 1997 Y N

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

200mm SF6 31 0.196 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 31 0.226 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 25 0.145 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 19 0.143 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 19 0.154 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 19 0.110 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 31 0.218 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 25 0.139 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 25 0.207 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 31 0.191 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 25 0.165 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 25 0.152 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 19 0.118 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 19 0.122 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 25 0.158 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 25 0.177 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 31 0.163 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 189 0.599 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 150 0.477 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 150 0.464 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 189 0.504 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 150 0.504 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 150 0.479 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 150 0.478 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 111 0.472 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 150 0.483 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 189 0.465 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 150 0.471 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 150 0.423 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 111 0.398 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 111 0.358 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 111 0.506 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 111 0.381 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 150 0.460 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 150 0.500 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 189 0.501 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 189 0.539 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 50 0.309 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 50 0.327 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 40 0.341 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 40 0.316 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 40 0.337 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 30 0.366 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 40 0.303 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 30 0.271 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 30 0.276 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 40 0.353 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 40 0.318 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 50 0.321 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 30 0.265 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 50 0.402 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 40 0.276 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 40 0.307 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 50 0.365 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 30 0.255 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 40 0.303 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm SF6 40 0.298 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean 200mm CF4 135 0.89CHF3 0.04C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 85 0.87CHF3 0.04C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 85 0.90CHF3 0.03C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

200mm CF4 85 0.86CHF3 0.06C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 110 0.90CHF3 0.04C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 135 0.95CHF3 0.02C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 110 0.90CHF3 0.03C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 110 0.86CHF3 0.05C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 110 0.94CHF3 0.03C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 135 0.91CHF3 0.03C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 110 0.91CHF3 0.04C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 110 0.86CHF3 0.04C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 85 0.90CHF3 0.04C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 110 0.89CHF3 0.04C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 110 0.90CHF3 0.04C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 85 0.85CHF3 0.04C2F6 0.06 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 135 0.84CHF3 0.04C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 110 0.84CHF3 0.04C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 110 0.90CHF3 0.03C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 135 0.94CHF3 0.03C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm SF6 71 0.58 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 71 0.70 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 71 0.71 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 89 0.66 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 71 0.72 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 71 0.74 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 53 0.46 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 89 0.64 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 71 0.77 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 89 0.74 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 71 0.75 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 71 0.91 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 53 0.65 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 53 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 53 0.88 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 89 0.93 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 89 0.92 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 71 0.75 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 53 0.62 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 71 0.76 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 126 0.88 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 126 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 168 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 84 0.84 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 126 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 126 0.86 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 168 0.89 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 84 0.85 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 126 0.86 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 168 0.89 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 126 0.86 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 84 0.89 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 126 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 126 0.85 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 126 0.89 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 168 0.84 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 84 0.84 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 126 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 84 0.91 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 168 0.93 N Nitride Not Provided N NIST/Intel 1997 Y N 200mm SF6 840 0.90 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 336 0.77 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 588 0.85 N Metal Not Provided N NIST/Intel 1997 Y N

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

200mm SF6 840 0.90 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 588 0.87 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 588 0.85 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 840 0.87 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 840 0.89 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 588 0.87 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 588 0.84 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 336 0.86 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 336 0.79 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 588 0.82 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 588 0.83 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 336 0.79 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 588 0.82 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 840 0.82 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 588 0.86 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 336 0.84 N Metal Not Provided N NIST/Intel 1997 Y N 200mm SF6 588 0.86 N Metal Not Provided N NIST/Intel 1997 Y N 200mm CHF3 93 0.28C2F6 0.02CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.13C2F6 0.02CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 82.5 0.30C2F6 0.05CF4 0.16 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 16.5 0.06C2F6 0.05CF4 0.16 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 82.5 0.30C2F6 0.04CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 16.5 0.08C2F6 0.04CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 60 0.22C2F6 0.02CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.10C2F6 0.02CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 55 0.23C2F6 0.02CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 11 0.07C2F6 0.02CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 27.5 0.17C2F6 0.01CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 5.5 0.10C2F6 0.01CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 90 0.05C2F6 0.02CF4 0.04 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 9 0.08C2F6 0.02CF4 0.04 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 93 0.20C2F6 0.01CF4 0.03 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.11C2F6 0.01CF4 0.03 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 10 0.19C2F6 0.01CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.07C2F6 0.01CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 31 0.14C2F6 0.01CF4 0.06 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 2 0.15C2F6 0.01CF4 0.06 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 93 0.21C2F6 0.02CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.11C2F6 0.02CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 60 0.19C2F6 0.01CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.11C2F6 0.01CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 60 0.19C2F6 0.01CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.10C2F6 0.01CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 62 0.16C2F6 0.01CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 4 0.08C2F6 0.01CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 31 0.14C2F6 0.01CF4 0.03 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 2 0.12C2F6 0.01CF4 0.03 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 27.5 0.23C2F6 0.02CF4 0.09 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 5.5 0.08C2F6 0.02CF4 0.09 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 30 0.14C2F6 0.01CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 3 0.12C2F6 0.01CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 60 0.19C2F6 0.01CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.08C2F6 0.01CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 93 0.24C2F6 0.01CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.08C2F6 0.01CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 60 0.17C2F6 0.01CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.09C2F6 0.01CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 82.5 0.31C2F6 0.04CF4 0.14 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 16.5 0.08C2F6 0.04CF4 0.14 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 60 0.20C2F6 0.02CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

200mm C4F8 6 0.10C2F6 0.02CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 60 0.24C2F6 0.01CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.13C2F6 0.01CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 60 0.18C2F6 0.01CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.07C2F6 0.01CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 82.5 0.36C2F6 0.03CF4 0.13 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 16.5 0.08C2F6 0.03CF4 0.13 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 31 0.24C2F6 0.02CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 2 0.20C2F6 0.02CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 31 0.13C2F6 0.02CF4 0.06 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 2 0.15C2F6 0.02CF4 0.06 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 27.5 0.17C2F6 0.04CF4 0.16 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 5.5 0.10C2F6 0.04CF4 0.16 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 27.5 0.10C2F6 0.02CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 5.5 0.07C2F6 0.02CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 60 0.17C2F6 0.03CF4 0.12 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.08C2F6 0.03CF4 0.12 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm CHF3 60 0.18C2F6 0.02CF4 0.09 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C4F8 6 0.08C2F6 0.02CF4 0.09 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N 200mm C2HF5 52 0.12CF4 0.096C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 52 0.10CF4 0.096C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 13 0.07CF4 0.085C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 13 0.10CF4 0.085C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.02CF4 0.034C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 16 0.18CF4 0.034C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 13 0.06CF4 0.036C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 13 0.10CF4 0.036C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 22 0.01CF4 0.020C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 4 0.43CF4 0.020C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.01CF4 0.022C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 16 0.17CF4 0.022C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 13 0.05CF4 0.023C2F6 0.005 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 13 0.10CF4 0.023C2F6 0.005 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.01CF4 0.019C2F6 0.005 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 16 0.15CF4 0.019C2F6 0.005 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 87 0.06CF4 0.110C2F6 0.045 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 17 0.07CF4 0.110C2F6 0.045 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 52 0.08CF4 0.051C2F6 0.011 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 52 0.07CF4 0.051C2F6 0.011 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.06CF4 0.083C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 16 0.07CF4 0.083C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.07CF4 0.084C2F6 0.027 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 16 0.09CF4 0.084C2F6 0.027 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 32.5 0.05CF4 0.045C2F6 0.015 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 32.5 0.06CF4 0.045C2F6 0.015 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.06CF4 0.085C2F6 0.032 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 16 0.08CF4 0.085C2F6 0.032 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.08CF4 0.086C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 16 0.10CF4 0.086C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.06CF4 0.084C2F6 0.030 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 16 0.07CF4 0.084C2F6 0.030 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 52 0.08CF4 0.047C2F6 0.017 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 52 0.06CF4 0.047C2F6 0.017 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 22 0.06CF4 0.105C2F6 0.031 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 4 0.04CF4 0.105C2F6 0.031 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 22 0.10CF4 0.072C2F6 0.015 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 4 0.21CF4 0.072C2F6 0.015 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 87 0.14CF4 0.067C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 17 0.15CF4 0.067C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.09CF4 0.086C2F6 0.030 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

200mm CH2F2 16 0.09CF4 0.086C2F6 0.030 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 78 0.09CF4 0.066C2F6 0.024 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 26 0.07CF4 0.066C2F6 0.024 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 19.5 0.07CF4 0.074C2F6 0.018 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 6.5 0.14CF4 0.074C2F6 0.018 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 52 0.05CF4 0.042C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 52 0.05CF4 0.042C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.06CF4 0.082C2F6 0.031 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 16 0.07CF4 0.082C2F6 0.031 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 87 0.10CF4 0.115C2F6 0.048 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 17 0.10CF4 0.115C2F6 0.048 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 22 0.05CF4 0.161C2F6 0.046 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 4 0.18CF4 0.161C2F6 0.046 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 51 0.06CF4 0.163C2F6 0.070 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 11 0.09CF4 0.163C2F6 0.070 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 87 0.08CF4 0.125C2F6 0.043 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 17 0.08CF4 0.125C2F6 0.043 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 49 0.06CF4 0.135C2F6 0.051 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 16 0.09CF4 0.135C2F6 0.051 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm C2HF5 13 0.05CF4 0.069C2F6 0.021 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CH2F2 13 0.10CF4 0.069C2F6 0.021 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N 200mm CHF3 20.3 0.82CF4 0.039 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 17.2 1.00CF4 0.039 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 65 0.78CF4 0.074 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 10 0.73CF4 0.074 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 65 0.82CF4 0.087 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 10 0.77CF4 0.087 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.84CF4 0.077 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.79CF4 0.077 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.76CF4 0.086 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.85CF4 0.086 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 65 0.66CF4 0.110 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 10 0.74CF4 0.110 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.82CF4 0.079 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.92CF4 0.079 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 175 0.81CF4 0.087 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 25 0.88CF4 0.087 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.88CF4 0.085 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.83CF4 0.085 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 65 0.85CF4 0.068 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 10 0.81CF4 0.068 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 150 0.89CF4 0.090 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 50 0.87CF4 0.090 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 175 0.81CF4 0.061 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 25 0.85CF4 0.061 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.85CF4 0.090 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.85CF4 0.090 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 175 0.88CF4 0.041 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 25 0.91CF4 0.041 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 167 0.86CF4 0.047 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 33 0.93CF4 0.047 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.80CF4 0.067 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.91CF4 0.067 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.88CF4 0.080 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.83CF4 0.080 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 56 0.92CF4 0.122 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 19 0.68CF4 0.122 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 175 0.88CF4 0.046 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 25 0.86CF4 0.046 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 103 0.91CF4 0.069 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

200mm C2F6 34.5 0.86CF4 0.069 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 150 0.90CF4 0.072 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 50 0.87CF4 0.072 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 62.5 0.84CF4 0.094 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 12.5 0.80CF4 0.094 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.86CF4 0.081 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.84CF4 0.081 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 56 0.92CF4 0.108 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 19 0.75CF4 0.108 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.85CF4 0.106 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.81CF4 0.106 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.88CF4 0.081 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.87CF4 0.081 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 56 0.81CF4 0.140 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 19 0.71CF4 0.140 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 114.5 0.83CF4 0.095 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 23 0.84CF4 0.095 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 56 0.95CF4 0.092 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 19 0.81CF4 0.092 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 150 0.89CF4 0.061 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 50 0.84CF4 0.061 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 150 0.86CF4 0.062 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm C2F6 50 0.91CF4 0.062 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 12 0.524 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 6 0.407 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 18 0.507 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 9 0.432 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 12 0.482 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 6 0.418 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 8 0.404 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 4 0.415 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 12 0.540 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 6 0.429 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 16 0.522 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 8 0.424 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 12 0.476 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 6 0.424 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 12 0.482 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 6 0.396 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 4 0.391 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 2 0.441 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 12 0.496 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 6 0.407 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 12 0.515 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 6 0.407 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 12 0.479 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 6 0.350 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 6 0.472 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 3 0.326 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 4 0.461 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 2 0.508 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 8 0.488 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 4 0.466 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 24 0.522 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 12 0.440 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 24 0.569 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 12 0.509 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 12 0.488 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 6 0.418 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 12 0.482 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

200mm CHF3 6 0.401 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CF4 8 0.433 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm CHF3 4 0.432 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N 200mm NF3 375 0.10 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 250 0.07 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 250 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 500 0.47 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 250 0.02 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 250 0.05 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 375 0.14 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 500 0.36 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 250 0.18 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 375 0.33 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 500 0.15 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 500 0.45 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 500 0.33 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm NF3 375 0.13 N Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 109 0.53C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 16 1.29C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.62C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 0.91C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 31 0.40C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 31 0.89C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 62.5 0.62C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 62.5 0.84C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 46.75 0.58C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 46.75 0.86C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 62.5 0.42C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 12.5 0.84C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 31 0.51C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 31 0.84C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.54C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 1.03C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 62.5 0.55C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 62.5 0.74C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.61C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 1.11C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 62.5 0.79C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 62.5 0.74C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 31 0.65C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 31 0.68C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 109 0.79C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 16 0.78C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 109 0.61C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 16 1.16C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.57C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 1.10C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 54.3 0.66C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 7.7 0.89C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 54.3 0.47C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 7.7 1.42C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 49.6 0.53C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 12.4 1.30C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 81.8 0.55C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

200mm CF4 11.7 1.91C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 54.3 0.59C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 7.7 0.88C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 54.3 0.39C2F6 0.06 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 7.7 1.62C2F6 0.06 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.69C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 1.17C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 31 0.68C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 31 1.00C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 100 0.57C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 25 1.34C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.56C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 1.44C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.55C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 1.33C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.52C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 1.24C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.68C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 1.10C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 109 0.70C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 16 1.13C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.56C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 1.36C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CHF3 74.8 0.59C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 200mm CF4 18.7 1.25C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N 300mm CF4 150 0.76CHF3 0.01C2F6 0.02 N Oxide Not Provided N NIST/Intel 1997 Y N 300mm CF4 150 0.76CHF3 0.01C2F6 0.02 N Oxide Not Provided N NIST/Intel 1997 Y N 300mm C4F6 12 0.2305CF4 0.0449CHF3 0.0088C2F6 0.0217 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 16 0.2183CF4 0.0449CHF3 0.0088C2F6 0.0217 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F6 12 0.2123CF4 0.0416CHF3 0.0478C2F6 0.0072 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 16 0.1624CF4 0.0416CHF3 0.0478C2F6 0.0072 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm CHF3 40 0.2374CF4 0.0392C2F6 0.0160 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 28 0.0867CF4 0.0392C2F6 0.0160 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm CHF3 40 0.4122CF4 0.0333C2F6 0.0026 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 28 0.1469CF4 0.0333C2F6 0.0026 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 27 0.0530CF4 0.0260C2F6 0.0570CHF3 0.0040 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 27 0.0699CF4 0.0215C2F6 0.0309CHF3 0.0353 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 27 0.0560CF4 0.0230C2F6 0.0510CHF3 0.0050 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 27 0.0636CF4 0.0212C2F6 0.0265CHF3 0.0300 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 27 0.1500CF4 0.0343C2F6 0.0424 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 27 0.1364CF4 0.0109C2F6 0.0063CHF3 0.0136 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm CH2F2 20 0.2734CF4 0.0109C2F6 0.0063CHF3 0.0136 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 27 0.1186CF4 0.0627C2F6 0.0339 N Nitride Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm CH2F2 20 0.2138CF4 0.0023C2F6 0.0215CHF3 0.0031 N Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CHF3 198 0.3179CF4 0.1113C2F6 0.0646 Y Silicon Not Provided Not Provided ISMI 2001 Y N 300mm SF6 33 0.1605CF4 0.1113C2F6 0.0646 Y Silicon Not Provided Not Provided ISMI 2001 Y N 300mm CF4 20 0.1797 N Silicon Not Provided Not Provided ISMI 2001 Y N 300mm SF6 200 0.1642 N Silicon Not Provided Not Provided ISMI 2001 N Y - Plasma Clean 300mm CF4 130 0.7340C2F6 0.0578 N Silicon Not Provided Not Provided ISMI 2001 N Y - Plasma Clean 300mm CHF3 70 0.8750C2F6 0.0578 N Silicon Not Provided Not Provided ISMI 2001 N Y - Plasma Clean 300mm CH2F2 12 0.1908CHF3 0.0091 N Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CH2F2 5 0.0998CHF3 0.1297CF4 0.1683 N Nitride Not Provided Not Provided ISMI 2001 Y N 300mm NF3 10 0.1530 N Nitride Not Provided Not Provided ISMI 2001 Y N 300mm CH2F2 12 0.0807CHF3 0.0385 N Nitride Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm CH2F2 5 0.0503CHF3 0.1405CF4 0.1993 N Nitride Not Provided Not Provided ISMI 2001 Y N 300mm NF3 10 0.0802 N Nitride Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 6 0.2085CF4 0.0102CHF3 0.0625 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F6 7.5 0.0612CHF3 0.0005C2F6 0.0008CF4 0.0052 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F8 23 0.1572CHF3 0.1694C2F6 0.0116CF4 0.0968 N Oxide Not Provided Not Provided ISMI 2001 Y N 300mm C4F6 8 0.2019CHF3 0.0054C2F6 0.0017CF4 0.0115 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

1 of 15 January 31, 2012ISMI ESH Technology Center Etch Process Equipment Emissions Characterization Data

Wafer Diameter (150mm, 200mm, 300mm) Input Gas

(If multi-gas process, list each F-gas on separate line) Flowrate (sccm) EF (mass emissions/inp ut mass of listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass emission of byproduct(1)/ mass of all input F-gases)

BP2 Identity BP EF2 (mass

emission of byproduct(2)/ mass of all input F-gases)

BPi Identity BPi EF (mass

emission of byproduct(i)/ mass of all input F-gases)

Multiple Gases (Y/N) PrincipalFilm Type (Silicon, Oxide, Nitride, Metal, Hardmask) Feature Type Film Stack? (Y/N)

Measurement

Protocol Used (Protocol Name and Year, i.e., ISMI 2006) Etch Step? (Y/N)

Other? (seasoning, clean) (Y/N)

300mm C4F8 23 0.1416CHF3 0.0072C2F6 0.0672CF4 0.0898 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season 300mm C4F8 17 0.1691CF4 0.0348CHF3 0.0858C4F6 0.0191 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm C4F6 7.5 0.0431CF4 0.0784CHF3 0.1935 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm C4F8 17 0.1755CF4 0.0383CHF3 0.0097C4F6 0.0163 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season 300mm C4F6 7.5 0.0752CF4 0.0041CHF3 0.0062 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season 300mm C4F8 28 0.0741CF4 0.0437CHF3 0.0125C2F6 0.0302 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season 300mm CHF3 40 0.2095CF4 0.0032C4F8 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season 300mm C4F8 28 0.0839CF4 0.0272CHF3 0.0568C2F6 0.0014N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm CHF3 40 0.1793CF4 0.0029C4F6 0.0001 N Oxide Not Provided Not Provided ISMI 2009 Y N 300mm CH2F2 5 0.0420CF4 0.0639CHF3 0.0579 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Season 300mm NF3 10 0.0816CF4 0.0639CHF3 0.0579 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Season 300mm CH2F2 5 0.0611CF4 0.0501CHF3 0.0464 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm NF3 10 0.0787CF4 0.0501CHF3 0.0464 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm NF3 100 0.0737CF4 0.0004 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 100 0.1692CF4 0.2242 N Oxide Not Provided Not Provided ISMI 2006 Y N 300mm SF6 200 0.1867 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm SF6 200 0.2040 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm SF6 200 0.2109 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm SF6 200 0.2341 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm SF6 200 0.2021 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm SF6 200 0.1905 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm SF6 200 0.1975 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm SF6 200 0.2192 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean 300mm CH2F2 8 0.0593CHF3 0.0436C2F6 0.2230 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm CF4 75 0.4534CHF3 0.0436C2F6 0.2230 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm CF4 75 0.5039CHF3 0.0030C2F6 0.1941 N Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm CF4 75 0.5131CHF3 0.0065C2F6 0.2206 N Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season 300mm NF3 60 0.1415CHF3 0.0003 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm CF4 20 0.7693CHF3 0.0039 Y Nitride Not Provided Not Provided ISMI 2006 Y N 300mm C4F8 5 0.4748CHF3 0.0039 Y Nitride Not Provided Not Provided ISMI 2006 Y N 200mm CF4 18 0.4280C2F6 0.2310 Y Oxide Not Provided Not Provided Intel Y N 200mm CHF3 36 0.2050C2F6 0.2310 Y Oxide Not Provided Not Provided Intel Y N 200mm CF4 80 0.6900C2F6 0.0360 Y Oxide Not Provided Not Provided Intel Y N 200mm CHF3 40 0.2760C2F6 0.0360 Y Oxide Not Provided Not Provided Intel Y N 200mm SF6 180 0.4740 N Nitride Not Provided Not Provided Intel Y N 200mm C2F6 300 0.5590 N Nitride Not Provided Not Provided Intel Y N 200mm C2F6 300 0.2600 N Oxide Not Provided Not Provided Intel Y N 200mm C4F8 22 0.1398CF4 0.0559C2F6 0.0564 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season 200mm SF6 55 0.2580 N Deep Silicon Not Provided Not Provided ISMI 2001 Y 300mm SF6 300 0.4840CF4 0.0006 Deep silicon Not Provided Not Provided ISMI 2009 Y 300mm SF6 300 0.4880CF4 0.0008 Deep silicon Not Provided Not Provided ISMI 2009 Y 200mm SF6 150 0.4410 N Silicon Not Provided Not Provided ISMI 2001 N Y - Plasma Clean 200mm SF6 200 0.3710 N Silicon Not Provided Not Provided ISMI 2001 N Y - Plasma Clean 200mm CHF3 45 0.6150C2F6 0.1020 Y Silicon Not Provided Not Provided ISMI 2001 Y N 200mm CF4 155 0.8150C2F6 0.1020 Y Silicon Not Provided Not Provided ISMI 2001 Y N 200mm SF6 200 0.7835CF4 0.0230 N Silicon Not Provided Not Provided ISMI 2001 Y N 200mm SF6 11 0.1950 N Oxide Not Provided Not Provided ISMI 2001 Y N 200mm C4F8 12 0.2330 N Oxide Not Provided Not Provided ISMI 2001 Y N 200mm SF6 11 0.2420 N Oxide Not Provided Not Provided ISMI 2001 Y N 200mm CH2F2 16 0.4720 N Oxide Not Provided Not Provided ISMI 2001 Y N 200mm C2F6 60 0.5200 N Oxide Not Provided Not Provided ISMI 2001 Y N 200mm SF6 11 0.2100 N Oxide Not Provided Not Provided ISMI 2001 Y N 200mm CH2F2 16 0.3650 N Oxide Not Provided Not Provided ISMI 2001 Y N 200mm C4F8 10 0.2310 N Oxide Not Provided Not Provided ISMI 2001 Y N 200mm C2F6 60 0.4860 N Oxide Not Provided Not Provided ISMI 2001 Y N 200mm C4F8 18 0.3480CF4 0.0280C2F6 0.0240 N Oxide Not Provided Not Provided ISMI 2001 N Y - Conditioning 200mm CH2F2 15 0.3360 N Nitride Not Provided Not Provided ISMI 2001 Y N 200mm CH3F 50 0.6587 N Nitride Not Provided Not Provided ISMI 2001 Y N

1 of 15 January 31, 2012