ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

300mm NF3 10 0.0819 CF4 0.0343 CHF3 0.0334 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm CH2F2 5 0.0511 CF4 0.0343 CHF3 0.0334 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm NF3 10 0.1612 CF4 0.0964 CHF3 0.1309 Y Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CH2F2 5 0.1038 CF4 0.0964 CHF3 0.1309 Y Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CF4 120 0.8589 C4F8 0.0007 C2F6 0.0050 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season

300mm CF4 120 0.8424 C4F8 0.0006 C2F6 0.0029 CHF3 0.0030 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CF4 120 0.8280 C4F8 0.0006 C2F6 0.0039 CHF3 0.0006 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 22 0.1414 CF4 0.0581 C2F6 0.0562 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season

300mm C4F8 22 0.1417 CF4 0.0542 C2F6 0.0616 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season

300mm CHF3 135 0.7340 CF4 0.0211 C4F8 0.0007 C2F6 0.0065 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season

300mm CHF3 135 0.8049 CF4 0.0140 C4F8 0.0009 C2F6 0.0014 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm NF3 50 0.3115 CF4 0.1734 C2F6 0.1430 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 150 0.2460 C2F6 0.0134 CF4 0.0504 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 150 0.2426 C2F6 0.0036 CF4 0.0425 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm NF3 50 0.3104 C2F6 0.1421 CF4 0.1731 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 75 0.8338 C2F6 0.0456 CF4 0.0707 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm SF6 15 0.6975 C2F6 0.0456 CF4 0.0707 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CF4 200 0.6012 C2F6 0.0377 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CHF3 100 0.3502 C2F6 0.0819 CF4 0.0893 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm C4F8 7.5 0.2935 CF4 0.4399 CHF3 0.0038 N Oxide Not Provided Not Provided ISMI 2006 N Y - Clean

300mm C4F8 7.5 0.1555 CF4 0.0029 CHF3 0.0186 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 6 0.1054 CF4 0.0113 CHF3 0.0713 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CH2F2 15 0.0684 CF4 0.0022 N Nitride Not Provided Not Provided ISMI 2006 Y N

300mm NF3 150 0.1749 CF4 0.0001 N Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 150 0.1712 N Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 150 0.2411 N Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CH2F2 15 0.0922 CF4 0.0033 N Nitride Not Provided Not Provided ISMI 2006 N Y - Season

300mm SF6 200 0.1851 CF4 0.0003 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning

300mm SF6 200 0.1640 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning

300mm SF6 200 0.1807 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning

300mm SF6 200 0.2003 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning

300mm SF6 200 0.1806 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning

300mm CHF3 55 0.1194 CF4 0.1055 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm SF6 200 0.1518 CF4 0.0003 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning

300mm SF6 200 0.1513 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning

300mm SF6 200 0.1804 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning

300mm SF6 200 0.1976 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning

300mm SF6 200 0.1895 N Oxide Not Provided Not Provided ISMI 2009 N Y - Conditioning

300mm CHF3 55 0.1153 CF4 0.0985 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm CHF3 55 0.1146 CF4 0.1053 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm C5F8 12.5 0.1255 C2F6 0.0009 CHF3 0.0002 CF4 0.2353 N Nitride Not Provided Not Provided ISMI 2009 Y N

300mm C5F8 12.5 0.1263 C2F6 0.0026 CHF3 0.0002 CF4 0.2352 N Nitride Not Provided Not Provided ISMI 2009 Y N

300mm C5F8 13 0.2640 CF4 0.1135 N Nitride Not Provided Not Provided ISMI 2009 N Y - aging

300mm C5F8 13 0.2993 CF4 0.1347 N Nitride Not Provided Not Provided ISMI 2009 N Y - aging

300mm CF4 180 0.8462 C2F6 0.0461 N Nitride Not Provided Not Provided ISMI 2009 N Y - Clean

300mm CF4 180 0.8462 C2F6 0.0189 N Nitride Not Provided Not Provided ISMI 2009 N Y - Clean

300mm C5F8 9 0.1833 C2F6 0.0898 CHF3 0.0072 CF4 0.0937 N Nitride Not Provided Not Provided ISMI 2009 Y N

300mm C5F8 10 0.1163 CF4 0.2863 N Nitride Not Provided Not Provided ISMI 2009 N Y - aging

300mm C5F8 9 0.0638 C2F6 0.2029 CF4 0.1474 N Nitride Not Provided Not Provided ISMI 2009 N Y - aging

300mm CF4 20 0.5775 CHF3 0.0117 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 5 0.3517 CHF3 0.0117 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm CF4 20 0.7435 CHF3 0.0015 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 5 0.6486 CHF3 0.0015 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm NF3 60 0.1645 CF4 0.1136 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm CF4 120 0.6096 C2F6 0.0016 CHF3 0.0004 N Oxide Not Provided Not Provided ISMI 2006 N Y - pre clean

300mm CF4 120 0.5681 CHF3 0.0103 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 120 0.1892 CF4 0.0566 C2F6 0.0347 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

300mm NF3 60 0.4037 CF4 0.0732 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm NF3 60 0.1880 CF4 0.0180 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CH2F2 8 0.3095 C2F6 0.1859 CHF3 0.0745 Y Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CF4 75 0.7280 C2F6 0.1859 CHF3 0.0745 Y Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CH2F2 8 0.2448 C2F6 0.1279 CHF3 0.0464 Y Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CF4 75 0.5255 C2F6 0.1279 CHF3 0.0464 Y Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CH2F2 8 0.2335 CHF3 0.0469 C2F6 0.1268 Y Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CF4 75 0.5145 CHF3 0.0469 C2F6 0.1268 Y Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CF4 75 0.5035 C2F6 0.1578 CHF3 0.0024 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season

300mm CF4 75 0.5072 C2F6 0.1696 CHF3 0.0021 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season

300mm CF4 75 0.5174 C2F6 0.1623 CHF3 0.0023 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season

300mm CF4 75 0.5174 C2F6 0.1748 CHF3 0.0021 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season

300mm CF4 75 0.5156 C2F6 0.1570 CHF3 0.0021 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season

300mm CF4 75 0.5327 C2F6 0.1696 CHF3 0.0017 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season

300mm CH2F2 8 0.2419 C2F6 0.1341 CHF3 0.0514 Y Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CF4 75 0.5112 C2F6 0.1341 CHF3 0.0514 Y Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CF4 75 0.5078 C2F6 0.1574 CHF3 0.0022 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season

300mm CF4 75 0.5294 C2F6 0.1706 CHF3 0.0020 Y Nitride Not Provided Not Provided ISMI 2001 N Y - Season

300mm CF4 40 0.7502 C2F6 0.0360 CHF3 0.0308 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm C4F6 22 N/A C2F6 0.0360 CHF3 0.0308 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CF4 400 0.7780 C2F6 0.0585 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CHF3 50 0.9604 C2F6 0.0585 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CF4 200 0.6794 C2F6 0.0771 CHF3 0.0024 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CHF3 20 0.4447 C2F6 0.0097 CF4 0.0609 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CF4 400 0.7853 C2F6 0.0426 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CHF3 50 0.9174 C2F6 0.0426 Y Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CF4 200 0.6739 C2F6 0.0597 CHF3 0.0040 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CHF3 20 0.4675 C2F6 0.0228 CF4 0.0851 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CF4 400 0.8039 C2F6 0.0408 Y Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 50 0.9245 C2F6 0.0408 Y Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CF4 200 0.6761 C2F6 0.0687 CHF3 0.0045 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 20 0.4403 C2F6 0.0211 CF4 0.0457 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CF4 200 0.5872 C2F6 0.0432 CHF3 0.0061 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 20 0.4136 C2F6 0.0212 CF4 0.0580 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CF4 200 0.6694 C2F6 0.0734 CHF3 0.0030 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CF4 200 0.6972 C2F6 0.0530 CHF3 0.0093 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CF4 200 0.6959 C2F6 0.0532 CHF3 0.0082 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CHF3 20 0.4181 C2F6 0.0213 CF4 0.1267 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CHF3 20 0.4139 C2F6 0.0251 CF4 0.0497 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CHF3 20 0.4220 C2F6 0.0191 CF4 0.0928 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CHF3 40 0.1788 CF4 0.0045 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 28 0.0524 CF4 0.0382 CHF3 0.0640 C2F6 0.0159 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 28 0.0869 CF4 0.0137 CHF3 0.0097 C2F6 0.0672 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm CHF3 40 0.2863 CF4 0.0102 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm CHF3 40 0.1361 CF4 0.0140 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 28 0.1196 CF4 0.0339 C2F6 0.0154 CHF3 0.0185 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 28 0.1014 CF4 0.0529 C2F6 0.0195 CHF3 0.0043 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 28 0.1121 CF4 0.0329 C2F6 0.0098 CHF3 0.0149 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 28 0.1096 CF4 0.0538 C2F6 0.0183 CHF3 0.0037 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 13 0.1435 CF4 0.0095 CHF3 0.0138 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 6 0.1196 CF4 0.0149 CHF3 0.0151 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F6 12 0.6737 CF4 0.0070 CHF3 0.0358 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm CHF3 40 0.2389 CF4 0.0100 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F6 14 0.1349 CF4 0.0173 CHF3 0.0499 C2F6 0.0107 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F6 28 0.3846 CF4 0.0372 CHF3 0.0340 C2F6 0.0298 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F6 12 0.5424 CF4 0.0102 CHF3 0.0156 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm CHF3 40 0.6110 CF4 0.0246 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

300mm C4F6 14 0.2422 CF4 0.0235 CHF3 0.0412 C2F6 0.0163 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F6 28 0.1857 CF4 0.0269 CHF3 0.0126 C2F6 0.0247 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F6 12 0.6749 CF4 0.0238 CHF3 0.0092 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm CHF3 40 0.3627 CF4 0.0283 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F6 14 0.2549 CF4 0.0262 CHF3 0.0336 C2F6 0.0171 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F6 28 0.2344 CF4 0.0274 CHF3 0.0107 C2F6 0.0202 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 27 0.0510 CF4 0.0287 CHF3 0.0059 C2F6 0.0774 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 27 0.0661 CF4 0.0265 CHF3 0.0294 C2F6 0.0547 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm CH2F2 20 0.4031 C2F6 0.0102 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CH2F2 20 0.1136 CF4 0.0033 CHF3 0.0038 C2F6 0.0039 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm C4F8 14 0.3937 CF4 0.0085 CHF3 0.0052 C2F6 0.0020 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm C4F8 14 0.1454 CF4 0.0072 CHF3 0.0037 C2F6 0.0021 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm C4F6 24 0.3333 CF4 0.0167 CHF3 0.0050 C2F6 0.0069 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm C4F6 24 0.2234 CF4 0.0161 CHF3 0.0044 C2F6 0.0059 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CH2F2 20 0.3459 CHF3 0.0025 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 14 0.1120 CF4 0.0053 CHF3 0.0046 C2F6 0.0027 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F6 24 0.1256 CF4 0.0289 CHF3 0.0095 C2F6 0.0138 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CH2F2 20 0.2874 CF4 0.0010 CHF3 0.0016 C2F6 0.0103 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm C4F6 18 0.1761 CF4 0.0157 CHF3 0.0063 C2F6 0.0075 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm C4F6 18 0.1376 CF4 0.0137 CHF3 0.0049 C2F6 0.0061 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CH2F2 20 0.1317 CF4 0.0018 CHF3 0.0025 C2F6 0.0074 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CH2F2 20 0.1930 CF4 0.0009 CHF3 0.0008 C2F6 0.0058 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CH2F2 13 0.1162 CF4 0.0445 CHF3 0.0308 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 27 0.1219 CF4 0.0119 CHF3 0.0048 C2F6 0.0073 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 27 0.1882 CF4 0.0087 CHF3 0.0046 C2F6 0.0046 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 27 0.1308 CF4 0.0400 CHF3 0.0029 C2F6 0.0254 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CH2F2 20 0.1514 CF4 0.0046 CHF3 0.0264 C2F6 0.0113 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F6 7.5 0.0768 CF4 0.0036 CHF3 0.0197 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 17 0.2137 CF4 0.0298 CHF3 0.0811 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 17 0.1855 CF4 0.0553 CHF3 0.1125 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 17 0.1984 CF4 0.0440 CHF3 0.1126 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F6 7.5 0.0586 CF4 0.0017 CHF3 0.0087 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F6 7.5 0.1155 CF4 0.0037 CHF3 0.0071 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F6 7.5 0.0475 CF4 0.0149 CHF3 0.0062 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F6 7.5 0.0482 CF4 0.0178 CHF3 0.0042 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F6 7.5 0.0510 CF4 0.0171 CHF3 0.0033 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F8 17 0.1569 CF4 0.0562 CHF3 0.0139 C2F6 0.0139 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F8 17 0.1893 CF4 0.0547 CHF3 0.0074 C2F6 0.0181 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F8 17 0.1825 CF4 0.0545 CHF3 0.0058 C2F6 0.0174 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F8 17 0.1908 CF4 0.0563 CHF3 0.0051 C2F6 0.0202 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F8 17 0.1561 CF4 0.0461 CHF3 0.1228 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 17 0.1491 CF4 0.0552 CHF3 0.1120 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F6 8 0.0425 CF4 0.0038 CHF3 0.0221 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F6 7.5 0.0776 CF4 0.0053 CHF3 0.0078 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F6 7.5 0.0693 CF4 0.0115 CHF3 0.0051 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F8 17 0.2119 CF4 0.0501 CHF3 0.0124 C2F6 0.0163 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F8 17 0.1822 CF4 0.0494 CHF3 0.0067 C2F6 0.0180 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F8 17 0.1642 CF4 0.0824 CHF3 0.0073 C2F6 0.0240 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F8 17 0.1732 CF4 0.0771 CHF3 0.0039 C2F6 0.0284 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm CHF3 198 0.1071 CF4 0.2319 C2F6 0.1489 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm SF6 33 0.0073 CF4 0.2319 C2F6 0.1489 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 75 0.0029 CF4 0.1239 C2F6 0.0016 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CF4 20 0.2251 CHF3 0.0037 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CF4 200 0.4813 C2F6 0.0038 N Silicon Not Provided Not Provided ISMI 2006 N Y - insitu clean

300mm CF4 200 0.9840 C2F6 0.0299 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm CF4 200 0.8857 C2F6 0.0167 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm CF4 200 0.9891 C2F6 0.0281 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm CF4 200 0.9218 C2F6 0.0154 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

300mm NF3 150 0.1430 N Nitride Not Provided Not Provided ISMI 2006 N Y - dry clean

300mm NF3 150 0.1503 N Nitride Not Provided Not Provided ISMI 2006 N Y - dry clean

300mm NF3 150 0.2187 N Nitride Not Provided Not Provided ISMI 2006 N Y - dry clean

300mm CH2F2 15 0.0606 CF4 0.0045 N Nitride Not Provided Not Provided ISMI 2006 N Y - Season

300mm CH2F2 15 0.0681 CF4 0.0014 N Nitride Not Provided Not Provided ISMI 2006 Y N

300mm CH2F2 5 0.0533 CF4 0.1862 CHF3 0.1054 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm NF3 10 0.0828 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm CH2F2 5 0.0494 CF4 0.2428 CHF3 0.1265 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 10 0.0820 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CH2F2 5 0.0384 CF4 0.2096 CHF3 0.1216 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm NF3 10 0.0638 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm CH2F2 5 0.0442 CF4 0.2271 CHF3 0.1078 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 10 0.0702 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 500 0.1978 N Metal Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm CF4 100 0.4878 CHF3 0.0094 C2F6 0.0983 N Metal Not Provided Not Provided ISMI 2006 Y N

300mm NF3 500 0.6391 CF4 0.0105 N Metal Not Provided Not Provided ISMI 2006 Y N

300mm NF3 500 0.1592 CF4 0.0001 N Metal Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm NF3 100 0.0806 N Oxide Not Provided Not Provided ISMI 2006 N Y - Clean

300mm CF4 200 0.7430 C2F6 0.0063 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 50 0.5760 CF4 0.0526 C2F6 0.0025 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 47 0.3589 CF4 0.0056 C2F6 0.0158 CHF3 0.0130 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 155 0.1729 C2F6 0.0057 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CF4 45 0.0766 C2F6 0.0057 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 155 0.2019 C2F6 0.0033 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CF4 45 0.0696 C2F6 0.0033 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm NF3 45 0.4959 CF4 0.0006 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CF4 200 0.7646 C2F6 0.0055 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 50 0.3571 CF4 0.0274 CHF3 0.0010 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 50 0.2187 CF4 0.0249 CHF3 0.0006 C2F6 0.0028 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CF4 200 0.7538 C2F6 0.0042 N Silicon Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm SF6 26 0.4512 CF4 0.0591 C2F6 0.1114 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 150 0.3580 CF4 0.0591 C2F6 0.1114 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm SF6 15 0.2791 C2F6 0.0512 CF4 0.0520 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 75 0.3169 C2F6 0.0512 CF4 0.0520 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm SF6 5 0.0625 CF4 0.0025 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm SF6 200 0.2205 N Silicon Not Provided Not Provided ISMI 2009 N Y - Clean

300mm SF6 200 0.1590 N Silicon Not Provided Not Provided ISMI 2009 N Y - Clean

300mm SF6 200 0.1403 N Silicon Not Provided Not Provided ISMI 2009 N Y - Clean

300mm SF6 200 0.1522 N Silicon Not Provided Not Provided ISMI 2009 N Y - Clean

300mm NF3 37.5 0.0618 CF4 0.0099 N Silicon Not Provided Not Provided ISMI 2009 Y N

300mm NF3 37.5 0.0631 CF4 0.0108 N Silicon Not Provided Not Provided ISMI 2009 Y N

300mm NF3 37.5 0.0607 CF4 0.0008 N Silicon Not Provided Not Provided ISMI 2009 Y N

300mm NF3 37.5 0.0578 CF4 0.0010 N Silicon Not Provided Not Provided ISMI 2009 Y N

300mm SF6 200 0.1822 CF4 0.0001 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm SF6 200 0.1844 CF4 0.0001 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm CH2F2 15 0.1274 CF4 0.0057 N Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CH2F2 12 0.1750 CF4 0.0160 N Nitride Not Provided Not Provided ISMI 2001 Y N

300mm C5F8 15 0.0631 CF4 0.1438 CHF3 0.0507 C2F6 0.0421 N Nitride Not Provided Not Provided ISMI 2001 Y N

300mm C5F8 10 0.0999 CF4 0.0077 CHF3 0.0023 C2F6 0.0043 N Nitride Not Provided Not Provided ISMI 2001 Y N

300mm C5F8 15 0.0541 CF4 0.0550 CHF3 0.0003 C2F6 0.0076 N Nitride Not Provided Not Provided ISMI 2001 N Y

300mm C5F8 15 0.0610 CF4 0.1466 CHF3 0.0074 C2F6 0.1685 N Nitride Not Provided Not Provided ISMI 2001 N Y

300mm C5F8 15 0.1436 CF4 0.1453 CHF3 0.0145 C2F6 0.2248 N Nitride Not Provided Not Provided ISMI 2001 N Y

300mm SF6 200 0.2854 CF4 0.0101 C2F6 0.0009 N Nitride Not Provided Not Provided ISMI 2006 N Y - Clean

300mm CF4 65 0.2602 C2F6 0.1407 Y Nitride Not Provided Not Provided ISMI 2006 N Y - aging

300mm CHF3 65 0.2981 C2F6 0.1407 Y Nitride Not Provided Not Provided ISMI 2006 N Y - aging

300mm CF4 65 0.2397 C2F6 0.0607 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 65 0.1893 C2F6 0.0607 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm CF4 90 0.5450 C2F6 0.4159 Y Nitride Not Provided Not Provided ISMI 2009 Y N

300mm CHF3 30 0.0689 C2F6 0.4159 Y Nitride Not Provided Not Provided ISMI 2009 Y N

300mm CF4 65 0.3053 C2F6 0.2357 Y Nitride Not Provided Not Provided ISMI 2009 N Y - aging

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

300mm CHF3 65 0.2332 C2F6 0.2357 Y Nitride Not Provided Not Provided ISMI 2009 N Y - aging

300mm SF6 200 0.2483 C2F6 0.0023 CF4 0.0032 N Nitride Not Provided Not Provided ISMI 2009 N Y - Clean

300mm CHF3 125 0.1972 CF4 0.0783 C2F6 0.0253 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CHF3 125 0.1906 CF4 0.0728 C2F6 0.0243 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 27 0.0175 C2F6 0.0249 CF4 0.0475 N Oxide Not Provided Not Provided ISMI 2009 N Y - Clean

300mm CHF3 10 0.1199 C2F6 0.0010 CF4 0.0190 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean

300mm NF3 50 0.0646 C2F6 0.0010 CF4 0.0190 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean

300mm CHF3 10 0.2110 C2F6 0.0086 CF4 0.0239 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm NF3 50 0.1140 C2F6 0.0086 CF4 0.0239 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm CHF3 60 0.2060 C2F6 0.0290 CF4 0.0477 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm NF3 38 0.1501 C2F6 0.0290 CF4 0.0477 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm CHF3 80 0.2519 C2F6 0.1344 CF4 0.1143 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm NF3 50 0.0759 C2F6 0.1344 CF4 0.1143 Y Oxide Not Provided Not Provided ISMI 2009 Y N

300mm CHF3 60 0.1815 C2F6 0.0324 CF4 0.0416 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean

300mm NF3 38 0.1353 C2F6 0.0324 CF4 0.0416 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean

300mm CHF3 80 0.2364 C2F6 0.1183 CF4 0.0996 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean

300mm NF3 50 0.0785 C2F6 0.1183 CF4 0.0996 Y Oxide Not Provided Not Provided ISMI 2009 N Y - Clean

300mm C4F8 8.1 0.1867 CF4 0.0094 CHF3 0.0431 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season

300mm C4F8 8.1 0.1835 CF4 0.0037 CHF3 0.0037 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 8 0.0969 CF4 0.0075 CHF3 0.0037 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 6 0.2028 CF4 0.0127 CHF3 0.0085 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 8.1 0.1870 CF4 0.0045 CHF3 0.0153 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dummy

300mm C4F8 8 0.1439 CF4 0.0070 CHF3 0.0256 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dummy

300mm C4F8 6 0.2010 CF4 0.0132 CHF3 0.0660 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dummy

300mm NF3 60 0.1582 CF4 0.1144 N Nitride Not Provided Not Provided ISMI 2009 Y N

300mm CF4 20 0.4521 CHF3 0.0189 Y Nitride Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 5 0.2171 CHF3 0.0189 Y Nitride Not Provided Not Provided ISMI 2009 Y N

300mm CF4 20 0.5159 CHF3 0.0031 Y Nitride Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 5 0.3182 CHF3 0.0031 Y Nitride Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 22 0.3404 CF4 0.0389 CHF3 0.0205 C2F6 0.0388 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm C4F8 22 0.3151 CF4 0.0365 CHF3 0.0387 C2F6 0.0442 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 22 0.1940 CF4 0.0666 CHF3 0.0030 C2F6 0.0531 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm C4F8 22 0.1628 CF4 0.0534 C2F6 0.0482 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season

300mm CHF3 135 0.6553 CF4 0.0208 C2F6 0.0036 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season

300mm CHF3 135 0.4618 CF4 0.0090 C2F6 0.0012 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm NF3 500 0.1936 CF4 0.0011 N Metal Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm CF4 150 0.4461 C2F6 0.1697 CHF3 0.0040 N Metal Not Provided Not Provided ISMI 2006 Y N

300mm NF3 100 0.0289 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm NF3 100 0.0178 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm NF3 100 0.0193 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm NF3 100 0.0163 N Oxide Not Provided Not Provided ISMI 2006 N Y - Conditioning

300mm NF3 100 0.0824 CHF3 0.0294 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 135 0.3868 CF4 0.0076 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm CF4 120 0.8026 C2F6 0.0020 CHF3 0.0035 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 22 0.1804 C2F6 0.0754 CF4 0.1571 CHF3 0.0223 N Oxide Not Provided Not Provided ISMI 2009 N Y - Clean

300mm C4F8 22 0.1799 C2F6 0.0729 CF4 0.0612 CHF3 0.0251 N Oxide Not Provided Not Provided ISMI 2009 N Y - Clean

300mm CHF3 135 0.6498 C2F6 0.0075 CF4 0.0260 N Oxide Not Provided Not Provided ISMI 2009 N Y - Season

300mm CHF3 135 0.6582 C2F6 0.0061 CF4 0.0251 N Oxide Not Provided Not Provided ISMI 2009 N Y - Season

300mm C4F8 22 0.1611 C2F6 0.0602 CF4 0.0671 N Oxide Not Provided Not Provided ISMI 2009 N Y - Season

300mm CF4 120 1.0000 C2F6 0.0038 CHF3 0.0010 N Oxide Not Provided Not Provided ISMI 2009 N Y - Season

300mm CH2F2 20 0.0524 C2F6 0.0005 CF4 0.0010 CHF3 0.0092 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 29 0.0918 C2F6 0.0401 CF4 0.0343 CHF3 0.0030 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season

300mm C4F8 29 0.1249 C2F6 0.0047 CF4 0.0263 CHF3 0.0255 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm CHF3 198 0.3295 C2F6 0.1149 CF4 0.1371 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm SF6 33 0.1968 C2F6 0.1149 CF4 0.1334 Y Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CHF3 75 0.5135 C2F6 0.1576 CF4 1.2378 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CF4 20 0.3154 C2F6 0.0395 CHF3 0.0012 N Silicon Not Provided Not Provided ISMI 2006 Y N

300mm CF4 200 0.5671 C2F6 0.0164 N Silicon Not Provided Not Provided ISMI 2006 N Y - insitu clean

300mm CF4 200 0.6844 C2F6 0.0411 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm CF4 200 0.6519 C2F6 0.0237 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

200mm CF4 0.722 N/A N/A N/A Y Oxide Trench Etch ISMI 2001

200mm CHF3 0.690 N/A N/A N/A Y Oxide Trench Etch ISMI 2001

200mm CF4 0.335 N/A N/A N/A Y Nitride Nitride Spacer ISMI 2001

200mm CHF3 0.2 N/A N/A N/A Y Nitride Nitride Spacer ISMI 2001

200mm CF4 0.8 N/A N/A N/A N Oxide Trench Etch ISMI 2001

200mm CF4 0.49 N/A N/A N/A Y Oxide Trench Etch ISMI 2001

200mm CHF3 0.701 N/A N/A N/A Y Oxide Trench Etch ISMI 2001

200mm C4F6 0.0686 CF4 0.1190 C2F6 0.0382 N Oxide Trench Dual ISMI 2001

200mm C4F6 0.0364 CF4 0.0383 CHF3 0.0657 C2F6 0.0243 Y Oxide High-Aspect- ISMI 2001

200mm CH2F2 0.0553 CF4 0.0383 CHF3 0.0657 C2F6 0.0243 Y Oxide High-Aspect- ISMI 2001

200mm C4F6 0.06 CF4 0.0170 C2F6 0.0312 N Oxide Dual Damascene ISMI 2001

300mm C4F6 15 0.0479 N/A N/A N/A Y Oxide Via ISMI 2006

300mm CF4 150 0.408 N/A N/A N/A Y Oxide Via ISMI 2006

300mm CHF3 30 0.435 N/A N/A N/A Y Oxide Via ISMI 2006

300mm CH2F2 10 0.269 N/A N/A N/A Y Oxide Via ISMI 2006

300mm CF4 150 0.636 N/A N/A N/A Y Oxide Trench ISMI 2006

300mm CHF3 60 0.427 N/A N/A N/A Y Oxide Trench ISMI 2006

200mm CF4 100 0.890 CHF3 0.1233 C2F6 0.0440 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 125 0.907 CHF3 0.1392 C2F6 0.0325 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 100 0.820 CHF3 0.2053 C2F6 0.0593 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 100 0.926 CHF3 0.1580 C2F6 0.0500 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 100 0.857 CHF3 0.1593 C2F6 0.0473 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 125 0.951 CHF3 0.0795 C2F6 0.0283 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 100 0.882 CHF3 0.2167 C2F6 0.0507 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 100 0.855 CHF3 0.2180 C2F6 0.0513 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 100 0.844 CHF3 0.1587 C2F6 0.0520 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 75 0.853 CHF3 0.1644 C2F6 0.0498 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 100 0.866 CHF3 0.1587 C2F6 0.0520 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 75 0.904 CHF3 0.2738 C2F6 0.0427 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 75 0.790 CHF3 0.2107 C2F6 0.0649 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 75 0.764 CHF3 0.2124 C2F6 0.0747 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 100 0.894 CHF3 0.1547 C2F6 0.0567 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 100 0.869 CHF3 0.1513 C2F6 0.0553 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 75 0.809 CHF3 0.2907 C2F6 0.0738 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 125 0.892 CHF3 0.1205 C2F6 0.0517 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 125 0.849 CHF3 0.2064 C2F6 0.0485 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 125 0.874 CHF3 0.1349 C2F6 0.0475 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 50 0.677 CHF3 0.160 C2F6 0.0180 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 50 0.701 CHF3 0.146 C2F6 0.0240 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 50 0.656 CHF3 0.138 C2F6 0.0140 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 50 0.692 CHF3 0.136 C2F6 0.0160 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 50 0.631 CHF3 0.114 C2F6 0.0120 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 37 0.592 CHF3 0.127 C2F6 0.0243 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 50 0.622 CHF3 0.118 C2F6 0.0180 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 50 0.650 CHF3 0.104 C2F6 0.0140 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 63 0.748 CHF3 0.081 C2F6 0.0095 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 50 0.611 CHF3 0.094 C2F6 0.0140 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 50 0.636 CHF3 0.100 C2F6 0.0140 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 37 0.526 CHF3 0.073 C2F6 0.0108 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 50 0.604 CHF3 0.102 C2F6 0.0140 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 37 0.673 CHF3 0.130 C2F6 0.0189 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 63 0.689 CHF3 0.102 C2F6 0.0111 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 37 0.564 CHF3 0.095 C2F6 0.0135 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 37 0.589 CHF3 0.089 C2F6 0.0081 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 63 0.595 CHF3 0.090 C2F6 0.0111 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 63 0.646 CHF3 0.083 C2F6 0.0111 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm CF4 63 0.589 CHF3 0.059 C2F6 0.0079 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 25 0.176 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 25 0.182 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 25 0.152 N Nitride Not Provided N NIST/Intel 1997 Y N

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

200mm SF6 31 0.196 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 31 0.226 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 25 0.145 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 19 0.143 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 19 0.154 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 19 0.110 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 31 0.218 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 25 0.139 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 25 0.207 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 31 0.191 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 25 0.165 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 25 0.152 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 19 0.118 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 19 0.122 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 25 0.158 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 25 0.177 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 31 0.163 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 189 0.599 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 150 0.477 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 150 0.464 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 189 0.504 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 150 0.504 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 150 0.479 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 150 0.478 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 111 0.472 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 150 0.483 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 189 0.465 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 150 0.471 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 150 0.423 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 111 0.398 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 111 0.358 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 111 0.506 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 111 0.381 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 150 0.460 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 150 0.500 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 189 0.501 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 189 0.539 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 50 0.309 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 50 0.327 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 40 0.341 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 40 0.316 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 40 0.337 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 30 0.366 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 40 0.303 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 30 0.271 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 30 0.276 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 40 0.353 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 40 0.318 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 50 0.321 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 30 0.265 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 50 0.402 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 40 0.276 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 40 0.307 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 50 0.365 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 30 0.255 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 40 0.303 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm SF6 40 0.298 N Not Provided N NIST/Intel 1997 N Y-Chamber Clean

200mm CF4 135 0.89 CHF3 0.04 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 85 0.87 CHF3 0.04 C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 85 0.90 CHF3 0.03 C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

200mm CF4 85 0.86 CHF3 0.06 C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 110 0.90 CHF3 0.04 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 135 0.95 CHF3 0.02 C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 110 0.90 CHF3 0.03 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 110 0.86 CHF3 0.05 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 110 0.94 CHF3 0.03 C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 135 0.91 CHF3 0.03 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 110 0.91 CHF3 0.04 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 110 0.86 CHF3 0.04 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 85 0.90 CHF3 0.04 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 110 0.89 CHF3 0.04 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 110 0.90 CHF3 0.04 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 85 0.85 CHF3 0.04 C2F6 0.06 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 135 0.84 CHF3 0.04 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 110 0.84 CHF3 0.04 C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 110 0.90 CHF3 0.03 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 135 0.94 CHF3 0.03 C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm SF6 71 0.58 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 71 0.70 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 71 0.71 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 89 0.66 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 71 0.72 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 71 0.74 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 53 0.46 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 89 0.64 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 71 0.77 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 89 0.74 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 71 0.75 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 71 0.91 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 53 0.65 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 53 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 53 0.88 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 89 0.93 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 89 0.92 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 71 0.75 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 53 0.62 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 71 0.76 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 126 0.88 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 126 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 168 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 84 0.84 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 126 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 126 0.86 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 168 0.89 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 84 0.85 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 126 0.86 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 168 0.89 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 126 0.86 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 84 0.89 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 126 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 126 0.85 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 126 0.89 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 168 0.84 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 84 0.84 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 126 0.87 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 84 0.91 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 168 0.93 N Nitride Not Provided N NIST/Intel 1997 Y N

200mm SF6 840 0.90 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 336 0.77 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 588 0.85 N Metal Not Provided N NIST/Intel 1997 Y N

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

200mm SF6 840 0.90 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 588 0.87 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 588 0.85 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 840 0.87 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 840 0.89 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 588 0.87 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 588 0.84 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 336 0.86 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 336 0.79 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 588 0.82 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 588 0.83 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 336 0.79 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 588 0.82 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 840 0.82 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 588 0.86 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 336 0.84 N Metal Not Provided N NIST/Intel 1997 Y N

200mm SF6 588 0.86 N Metal Not Provided N NIST/Intel 1997 Y N

200mm CHF3 93 0.28 C2F6 0.02 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.13 C2F6 0.02 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 82.5 0.30 C2F6 0.05 CF4 0.16 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 16.5 0.06 C2F6 0.05 CF4 0.16 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 82.5 0.30 C2F6 0.04 CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 16.5 0.08 C2F6 0.04 CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 60 0.22 C2F6 0.02 CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.10 C2F6 0.02 CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 55 0.23 C2F6 0.02 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 11 0.07 C2F6 0.02 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 27.5 0.17 C2F6 0.01 CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 5.5 0.10 C2F6 0.01 CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 90 0.05 C2F6 0.02 CF4 0.04 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 9 0.08 C2F6 0.02 CF4 0.04 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 93 0.20 C2F6 0.01 CF4 0.03 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.11 C2F6 0.01 CF4 0.03 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 10 0.19 C2F6 0.01 CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.07 C2F6 0.01 CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 31 0.14 C2F6 0.01 CF4 0.06 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 2 0.15 C2F6 0.01 CF4 0.06 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 93 0.21 C2F6 0.02 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.11 C2F6 0.02 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 60 0.19 C2F6 0.01 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.11 C2F6 0.01 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 60 0.19 C2F6 0.01 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.10 C2F6 0.01 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 62 0.16 C2F6 0.01 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 4 0.08 C2F6 0.01 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 31 0.14 C2F6 0.01 CF4 0.03 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 2 0.12 C2F6 0.01 CF4 0.03 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 27.5 0.23 C2F6 0.02 CF4 0.09 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 5.5 0.08 C2F6 0.02 CF4 0.09 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 30 0.14 C2F6 0.01 CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 3 0.12 C2F6 0.01 CF4 0.05 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 60 0.19 C2F6 0.01 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.08 C2F6 0.01 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 93 0.24 C2F6 0.01 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.08 C2F6 0.01 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 60 0.17 C2F6 0.01 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.09 C2F6 0.01 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 82.5 0.31 C2F6 0.04 CF4 0.14 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 16.5 0.08 C2F6 0.04 CF4 0.14 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 60 0.20 C2F6 0.02 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

200mm C4F8 6 0.10 C2F6 0.02 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 60 0.24 C2F6 0.01 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.13 C2F6 0.01 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 60 0.18 C2F6 0.01 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.07 C2F6 0.01 CF4 0.08 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 82.5 0.36 C2F6 0.03 CF4 0.13 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 16.5 0.08 C2F6 0.03 CF4 0.13 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 31 0.24 C2F6 0.02 CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 2 0.20 C2F6 0.02 CF4 0.10 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 31 0.13 C2F6 0.02 CF4 0.06 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 2 0.15 C2F6 0.02 CF4 0.06 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 27.5 0.17 C2F6 0.04 CF4 0.16 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 5.5 0.10 C2F6 0.04 CF4 0.16 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 27.5 0.10 C2F6 0.02 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 5.5 0.07 C2F6 0.02 CF4 0.07 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 60 0.17 C2F6 0.03 CF4 0.12 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.08 C2F6 0.03 CF4 0.12 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm CHF3 60 0.18 C2F6 0.02 CF4 0.09 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C4F8 6 0.08 C2F6 0.02 CF4 0.09 Y Oxide Deep Contact Not Provided NIST/Intel 1997 Y N

200mm C2HF5 52 0.12 CF4 0.096 C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 52 0.10 CF4 0.096 C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 13 0.07 CF4 0.085 C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 13 0.10 CF4 0.085 C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.02 CF4 0.034 C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 16 0.18 CF4 0.034 C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 13 0.06 CF4 0.036 C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 13 0.10 CF4 0.036 C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 22 0.01 CF4 0.020 C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 4 0.43 CF4 0.020 C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.01 CF4 0.022 C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 16 0.17 CF4 0.022 C2F6 0.004 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 13 0.05 CF4 0.023 C2F6 0.005 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 13 0.10 CF4 0.023 C2F6 0.005 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.01 CF4 0.019 C2F6 0.005 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 16 0.15 CF4 0.019 C2F6 0.005 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 87 0.06 CF4 0.110 C2F6 0.045 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 17 0.07 CF4 0.110 C2F6 0.045 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 52 0.08 CF4 0.051 C2F6 0.011 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 52 0.07 CF4 0.051 C2F6 0.011 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.06 CF4 0.083 C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 16 0.07 CF4 0.083 C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.07 CF4 0.084 C2F6 0.027 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 16 0.09 CF4 0.084 C2F6 0.027 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 32.5 0.05 CF4 0.045 C2F6 0.015 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 32.5 0.06 CF4 0.045 C2F6 0.015 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.06 CF4 0.085 C2F6 0.032 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 16 0.08 CF4 0.085 C2F6 0.032 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.08 CF4 0.086 C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 16 0.10 CF4 0.086 C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.06 CF4 0.084 C2F6 0.030 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 16 0.07 CF4 0.084 C2F6 0.030 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 52 0.08 CF4 0.047 C2F6 0.017 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 52 0.06 CF4 0.047 C2F6 0.017 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 22 0.06 CF4 0.105 C2F6 0.031 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 4 0.04 CF4 0.105 C2F6 0.031 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 22 0.10 CF4 0.072 C2F6 0.015 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 4 0.21 CF4 0.072 C2F6 0.015 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 87 0.14 CF4 0.067 C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 17 0.15 CF4 0.067 C2F6 0.028 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.09 CF4 0.086 C2F6 0.030 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

200mm CH2F2 16 0.09 CF4 0.086 C2F6 0.030 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 78 0.09 CF4 0.066 C2F6 0.024 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 26 0.07 CF4 0.066 C2F6 0.024 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 19.5 0.07 CF4 0.074 C2F6 0.018 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 6.5 0.14 CF4 0.074 C2F6 0.018 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 52 0.05 CF4 0.042 C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 52 0.05 CF4 0.042 C2F6 0.013 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.06 CF4 0.082 C2F6 0.031 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 16 0.07 CF4 0.082 C2F6 0.031 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 87 0.10 CF4 0.115 C2F6 0.048 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 17 0.10 CF4 0.115 C2F6 0.048 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 22 0.05 CF4 0.161 C2F6 0.046 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 4 0.18 CF4 0.161 C2F6 0.046 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 51 0.06 CF4 0.163 C2F6 0.070 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 11 0.09 CF4 0.163 C2F6 0.070 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 87 0.08 CF4 0.125 C2F6 0.043 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 17 0.08 CF4 0.125 C2F6 0.043 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 49 0.06 CF4 0.135 C2F6 0.051 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 16 0.09 CF4 0.135 C2F6 0.051 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm C2HF5 13 0.05 CF4 0.069 C2F6 0.021 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CH2F2 13 0.10 CF4 0.069 C2F6 0.021 Y Oxide SAC Etch Not Provided NIST/Intel 1997 Y N

200mm CHF3 20.3 0.82 CF4 0.039 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 17.2 1.00 CF4 0.039 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 65 0.78 CF4 0.074 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 10 0.73 CF4 0.074 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 65 0.82 CF4 0.087 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 10 0.77 CF4 0.087 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.84 CF4 0.077 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.79 CF4 0.077 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.76 CF4 0.086 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.85 CF4 0.086 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 65 0.66 CF4 0.110 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 10 0.74 CF4 0.110 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.82 CF4 0.079 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.92 CF4 0.079 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 175 0.81 CF4 0.087 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 25 0.88 CF4 0.087 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.88 CF4 0.085 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.83 CF4 0.085 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 65 0.85 CF4 0.068 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 10 0.81 CF4 0.068 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 150 0.89 CF4 0.090 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 50 0.87 CF4 0.090 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 175 0.81 CF4 0.061 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 25 0.85 CF4 0.061 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.85 CF4 0.090 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.85 CF4 0.090 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 175 0.88 CF4 0.041 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 25 0.91 CF4 0.041 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 167 0.86 CF4 0.047 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 33 0.93 CF4 0.047 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.80 CF4 0.067 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.91 CF4 0.067 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.88 CF4 0.080 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.83 CF4 0.080 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 56 0.92 CF4 0.122 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 19 0.68 CF4 0.122 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 175 0.88 CF4 0.046 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 25 0.86 CF4 0.046 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 103 0.91 CF4 0.069 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

200mm C2F6 34.5 0.86 CF4 0.069 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 150 0.90 CF4 0.072 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 50 0.87 CF4 0.072 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 62.5 0.84 CF4 0.094 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 12.5 0.80 CF4 0.094 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.86 CF4 0.081 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.84 CF4 0.081 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 56 0.92 CF4 0.108 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 19 0.75 CF4 0.108 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.85 CF4 0.106 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.81 CF4 0.106 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.88 CF4 0.081 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.87 CF4 0.081 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 56 0.81 CF4 0.140 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 19 0.71 CF4 0.140 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 114.5 0.83 CF4 0.095 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 23 0.84 CF4 0.095 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 56 0.95 CF4 0.092 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 19 0.81 CF4 0.092 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 150 0.89 CF4 0.061 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 50 0.84 CF4 0.061 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 150 0.86 CF4 0.062 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm C2F6 50 0.91 CF4 0.062 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 12 0.524 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 6 0.407 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 18 0.507 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 9 0.432 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 12 0.482 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 6 0.418 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 8 0.404 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 4 0.415 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 12 0.540 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 6 0.429 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 16 0.522 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 8 0.424 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 12 0.476 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 6 0.424 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 12 0.482 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 6 0.396 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 4 0.391 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 2 0.441 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 12 0.496 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 6 0.407 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 12 0.515 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 6 0.407 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 12 0.479 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 6 0.350 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 6 0.472 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 3 0.326 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 4 0.461 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 2 0.508 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 8 0.488 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 4 0.466 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 24 0.522 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 12 0.440 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 24 0.569 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 12 0.509 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 12 0.488 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 6 0.418 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 12 0.482 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

200mm CHF3 6 0.401 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CF4 8 0.433 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm CHF3 4 0.432 Y Oxide Not Provided Not Provided NIST/Intel 1997 Y N

200mm NF3 375 0.10 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 250 0.07 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 250 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 500 0.47 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 250 0.02 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 250 0.05 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 375 0.14 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 500 0.36 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 250 0.18 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 375 0.33 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 500 0.15 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 375 0.17 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 500 0.45 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 500 0.33 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm NF3 375 0.13 N Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 109 0.53 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 16 1.29 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.62 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 0.91 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 31 0.40 C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 31 0.89 C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 62.5 0.62 C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 62.5 0.84 C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 46.75 0.58 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 46.75 0.86 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 62.5 0.42 C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 12.5 0.84 C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 31 0.51 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 31 0.84 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.54 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 1.03 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 62.5 0.55 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 62.5 0.74 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.61 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 1.11 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 62.5 0.79 C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 62.5 0.74 C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 31 0.65 C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 31 0.68 C2F6 0.03 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 109 0.79 C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 16 0.78 C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 109 0.61 C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 16 1.16 C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.57 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 1.10 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 54.3 0.66 C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 7.7 0.89 C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 54.3 0.47 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 7.7 1.42 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 49.6 0.53 C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 12.4 1.30 C2F6 0.07 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 81.8 0.55 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

200mm CF4 11.7 1.91 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 54.3 0.59 C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 7.7 0.88 C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 54.3 0.39 C2F6 0.06 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 7.7 1.62 C2F6 0.06 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.69 C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 1.17 C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 31 0.68 C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 31 1.00 C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 100 0.57 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 25 1.34 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.56 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 1.44 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.55 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 1.33 C2F6 0.05 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.52 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 1.24 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.68 C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 1.10 C2F6 0.02 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 109 0.70 C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 16 1.13 C2F6 0.01 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.56 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 1.36 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CHF3 74.8 0.59 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

200mm CF4 18.7 1.25 C2F6 0.04 Y Oxide Not Provided N NIST/Intel 1997 Y N

300mm CF4 150 0.76 CHF3 0.01 C2F6 0.02 N Oxide Not Provided N NIST/Intel 1997 Y N

300mm CF4 150 0.76 CHF3 0.01 C2F6 0.02 N Oxide Not Provided N NIST/Intel 1997 Y N

300mm C4F6 12 0.2305 CF4 0.0449 CHF3 0.0088 C2F6 0.0217 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 16 0.2183 CF4 0.0449 CHF3 0.0088 C2F6 0.0217 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F6 12 0.2123 CF4 0.0416 CHF3 0.0478 C2F6 0.0072 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 16 0.1624 CF4 0.0416 CHF3 0.0478 C2F6 0.0072 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm CHF3 40 0.2374 CF4 0.0392 C2F6 0.0160 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 28 0.0867 CF4 0.0392 C2F6 0.0160 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm CHF3 40 0.4122 CF4 0.0333 C2F6 0.0026 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 28 0.1469 CF4 0.0333 C2F6 0.0026 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 27 0.0530 CF4 0.0260 C2F6 0.0570 CHF3 0.0040 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 27 0.0699 CF4 0.0215 C2F6 0.0309 CHF3 0.0353 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 27 0.0560 CF4 0.0230 C2F6 0.0510 CHF3 0.0050 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 27 0.0636 CF4 0.0212 C2F6 0.0265 CHF3 0.0300 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 27 0.1500 CF4 0.0343 C2F6 0.0424 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 27 0.1364 CF4 0.0109 C2F6 0.0063 CHF3 0.0136 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm CH2F2 20 0.2734 CF4 0.0109 C2F6 0.0063 CHF3 0.0136 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 27 0.1186 CF4 0.0627 C2F6 0.0339 N Nitride Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm CH2F2 20 0.2138 CF4 0.0023 C2F6 0.0215 CHF3 0.0031 N Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CHF3 198 0.3179 CF4 0.1113 C2F6 0.0646 Y Silicon Not Provided Not Provided ISMI 2001 Y N

300mm SF6 33 0.1605 CF4 0.1113 C2F6 0.0646 Y Silicon Not Provided Not Provided ISMI 2001 Y N

300mm CF4 20 0.1797 N Silicon Not Provided Not Provided ISMI 2001 Y N

300mm SF6 200 0.1642 N Silicon Not Provided Not Provided ISMI 2001 N Y - Plasma Clean

300mm CF4 130 0.7340 C2F6 0.0578 N Silicon Not Provided Not Provided ISMI 2001 N Y - Plasma Clean

300mm CHF3 70 0.8750 C2F6 0.0578 N Silicon Not Provided Not Provided ISMI 2001 N Y - Plasma Clean

300mm CH2F2 12 0.1908 CHF3 0.0091 N Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CH2F2 5 0.0998 CHF3 0.1297 CF4 0.1683 N Nitride Not Provided Not Provided ISMI 2001 Y N

300mm NF3 10 0.1530 N Nitride Not Provided Not Provided ISMI 2001 Y N

300mm CH2F2 12 0.0807 CHF3 0.0385 N Nitride Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm CH2F2 5 0.0503 CHF3 0.1405 CF4 0.1993 N Nitride Not Provided Not Provided ISMI 2001 Y N

300mm NF3 10 0.0802 N Nitride Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 6 0.2085 CF4 0.0102 CHF3 0.0625 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F6 7.5 0.0612 CHF3 0.0005 C2F6 0.0008 CF4 0.0052 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F8 23 0.1572 CHF3 0.1694 C2F6 0.0116 CF4 0.0968 N Oxide Not Provided Not Provided ISMI 2001 Y N

300mm C4F6 8 0.2019 CHF3 0.0054 C2F6 0.0017 CF4 0.0115 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

1 of 15 January 31, 2012
ISMI ESH Technology Center

Etch Process Equipment Emissions Characterization Data

Wafer 

Diameter 

(150mm, 

200mm, 

300mm)

Input Gas 

(If multi-gas 

process, list each 

F-gas on separate 

line) Flowrate (sccm)

EF 

(mass 

emissions/inp

ut mass of 

listed F-gas)

Byproduct 1 (BP1) Identity

BP EF1 (mass 

emission of 

byproduct(1)/

mass of all 

input F-gases)

BP2 Identity

BP EF2 (mass 

emission of 

byproduct(2)/

mass of all 

input F-gases)

BPi Identity

BPi EF (mass 

emission of 

byproduct(i)/

mass of all 

input F-gases)

Multiple Gases (Y/N)

Principal Film 

Type (Silicon, 

Oxide, 

Nitride, 

Metal, 

Hardmask) Feature Type

Film Stack? (Y/N)

Measurement 

Protocol Used 

(Protocol Name and 

Year, i.e., ISMI 2006)

Etch Step? (Y/N)Other? (seasoning, clean) (Y/N)

300mm C4F8 23 0.1416 CHF3 0.0072 C2F6 0.0672 CF4 0.0898 N Oxide Not Provided Not Provided ISMI 2001 N Y - Dry clean season

300mm C4F8 17 0.1691 CF4 0.0348 CHF3 0.0858 C4F6 0.0191 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm C4F6 7.5 0.0431 CF4 0.0784 CHF3 0.1935 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm C4F8 17 0.1755 CF4 0.0383 CHF3 0.0097 C4F6 0.0163 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season

300mm C4F6 7.5 0.0752 CF4 0.0041 CHF3 0.0062 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season

300mm C4F8 28 0.0741 CF4 0.0437 CHF3 0.0125 C2F6 0.0302 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season

300mm CHF3 40 0.2095 CF4 0.0032 C4F8 N Oxide Not Provided Not Provided ISMI 2009 N Y - Dry clean season

300mm C4F8 28 0.0839 CF4 0.0272 CHF3 0.0568 C2F6 0.0014 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm CHF3 40 0.1793 CF4 0.0029 C4F6 0.0001 N Oxide Not Provided Not Provided ISMI 2009 Y N

300mm CH2F2 5 0.0420 CF4 0.0639 CHF3 0.0579 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Season

300mm NF3 10 0.0816 CF4 0.0639 CHF3 0.0579 Y Nitride Not Provided Not Provided ISMI 2006 N Y - Season

300mm CH2F2 5 0.0611 CF4 0.0501 CHF3 0.0464 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm NF3 10 0.0787 CF4 0.0501 CHF3 0.0464 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm NF3 100 0.0737 CF4 0.0004 N Oxide Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 100 0.1692 CF4 0.2242 N Oxide Not Provided Not Provided ISMI 2006 Y N

300mm SF6 200 0.1867 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm SF6 200 0.2040 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm SF6 200 0.2109 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm SF6 200 0.2341 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm SF6 200 0.2021 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm SF6 200 0.1905 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm SF6 200 0.1975 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm SF6 200 0.2192 N Silicon Not Provided Not Provided ISMI 2006 N Y - Clean

300mm CH2F2 8 0.0593 CHF3 0.0436 C2F6 0.2230 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm CF4 75 0.4534 CHF3 0.0436 C2F6 0.2230 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm CF4 75 0.5039 CHF3 0.0030 C2F6 0.1941 N Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm CF4 75 0.5131 CHF3 0.0065 C2F6 0.2206 N Nitride Not Provided Not Provided ISMI 2006 N Y - Dry clean season

300mm NF3 60 0.1415 CHF3 0.0003 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm CF4 20 0.7693 CHF3 0.0039 Y Nitride Not Provided Not Provided ISMI 2006 Y N

300mm C4F8 5 0.4748 CHF3 0.0039 Y Nitride Not Provided Not Provided ISMI 2006 Y N

200mm CF4 18 0.4280 C2F6 0.2310 Y Oxide Not Provided Not Provided Intel Y N

200mm CHF3 36 0.2050 C2F6 0.2310 Y Oxide Not Provided Not Provided Intel Y N

200mm CF4 80 0.6900 C2F6 0.0360 Y Oxide Not Provided Not Provided Intel Y N

200mm CHF3 40 0.2760 C2F6 0.0360 Y Oxide Not Provided Not Provided Intel Y N

200mm SF6 180 0.4740 N Nitride Not Provided Not Provided Intel Y N

200mm C2F6 300 0.5590 N Nitride Not Provided Not Provided Intel Y N

200mm C2F6 300 0.2600 N Oxide Not Provided Not Provided Intel Y N

200mm C4F8 22 0.1398 CF4 0.0559 C2F6 0.0564 N Oxide Not Provided Not Provided ISMI 2006 N Y - Season

200mm SF6 55 0.2580 N Deep Silicon Not Provided Not Provided ISMI 2001 Y

300mm SF6 300 0.4840 CF4 0.0006 Deep silicon Not Provided Not Provided ISMI 2009 Y

300mm SF6 300 0.4880 CF4 0.0008 Deep silicon Not Provided Not Provided ISMI 2009 Y

200mm SF6 150 0.4410 N Silicon Not Provided Not Provided ISMI 2001 N Y - Plasma Clean

200mm SF6 200 0.3710 N Silicon Not Provided Not Provided ISMI 2001 N Y - Plasma Clean

200mm CHF3 45 0.6150 C2F6 0.1020 Y Silicon Not Provided Not Provided ISMI 2001 Y N

200mm CF4 155 0.8150 C2F6 0.1020 Y Silicon Not Provided Not Provided ISMI 2001 Y N

200mm SF6 200 0.7835 CF4 0.0230 N Silicon Not Provided Not Provided ISMI 2001 Y N

200mm SF6 11 0.1950 N Oxide Not Provided Not Provided ISMI 2001 Y N

200mm C4F8 12 0.2330 N Oxide Not Provided Not Provided ISMI 2001 Y N

200mm SF6 11 0.2420 N Oxide Not Provided Not Provided ISMI 2001 Y N

200mm CH2F2 16 0.4720 N Oxide Not Provided Not Provided ISMI 2001 Y N

200mm C2F6 60 0.5200 N Oxide Not Provided Not Provided ISMI 2001 Y N

200mm SF6 11 0.2100 N Oxide Not Provided Not Provided ISMI 2001 Y N

200mm CH2F2 16 0.3650 N Oxide Not Provided Not Provided ISMI 2001 Y N

200mm C4F8 10 0.2310 N Oxide Not Provided Not Provided ISMI 2001 Y N

200mm C2F6 60 0.4860 N Oxide Not Provided Not Provided ISMI 2001 Y N

200mm C4F8 18 0.3480 CF4 0.0280 C2F6 0.0240 N Oxide Not Provided Not Provided ISMI 2001 N Y - Conditioning

200mm CH2F2 15 0.3360 N Nitride Not Provided Not Provided ISMI 2001 Y N

200mm CH3F 50 0.6587 N Nitride Not Provided Not Provided ISMI 2001 Y N

1 of 15 January 31, 2012