# Patent

## Title
Nanowire circuits in matched devices

## Abstract

A memory device includes a first nanowire connected to a first bit line node and a ground node, a first field effect transistor (FET) having a gate disposed on the first nanowire, a second FET having a gate disposed on the first nanowire, a second nanowire connected to a voltage source node and a first input node, a third FET having a gate disposed on the second nanowire, a third nanowire connected to the voltage source node and a second input node, a fourth FET having a gate disposed on the third nanowire, a fourth nanowire connected to a second bit line node and the ground node, a fifth FET having a gate disposed on the fourth nanowire, and a sixth FET having a gate disposed on the fourth nanowire.

## Background
CROSS-REFERENCE TO RELATED APPLICATIONS
This is a divisional application of application Ser. No. 12/758,939, filed Apr. 13, 2010, which is incorporated by reference herein.


FIELD OF INVENTION
The present invention relates to semiconductor nanowire field effect transistors.
DESCRIPTION OF RELATED ART
A nanowire field effect transistor (FET) includes doped portions of nanowire that contact the channel region and serve as source and drain regions of the device. FETs may be fabricated using complimentary metal-oxide-semiconductor methods to form a variety of integrated circuits.
BRIEF SUMMARY
According to one embodiment of the present invention, an inverter device includes a first nanowire connected to a voltage source node and a ground node, a first p-type field effect transistor (pFET) device having a gate disposed on the first nanowire, and a first n-type field effect transistor (nFET) device having a gate disposed on the first nanowire.
According to an alternate embodiment of the present invention a method for forming an inverter device includes forming a first nanowire, forming a first p-type field effect transistor (pFET) device having a gate disposed on the first nanowire, forming a first n-type field effect transistor (nFET) device having a gate disposed on the first nanowire, and electrically connecting the gate of the first pFET device to the gate of the first nFET device.
According to another alternate embodiment of the present invention, a memory device includes a first nanowire connected to a first bit line node and a ground node, a first field effect transistor (FET) having a gate disposed on the first nanowire, a second FET having a gate disposed on the first nanowire, a second nanowire connected to a voltage source node and a first input node, a third FET having a gate disposed on the second nanowire, a third nanowire connected to the voltage source node and a second input node, a fourth FET having a gate disposed on the third nanowire, a fourth nanowire connected to a second bit line node and the ground node, a fifth FET having a gate disposed on the fourth nanowire, and a sixth FET having a gate disposed on the fourth nanowire.
According to yet another alternate embodiment of the present invention, a method for forming a memory device includes forming a first nanowire connected to a first bit line node and a ground node, forming a first field effect transistor (FET) having a gate disposed on the first nanowire, forming a second FET having a gate disposed on the first nanowire, forming a second nanowire connected to a voltage source node and a first storage node, forming a third FET having a gate disposed on the second nanowire, forming a third nanowire connected to the voltage source node and a second storage node, forming a fourth FET having a gate disposed on the third nanowire, forming a fourth nanowire connected to a second bit line node and the ground node, forming a fifth FET having a gate disposed on the fourth nanowire, and forming a sixth FET having a gate disposed on the fourth nanowire.
Additional features and advantages are realized through the techniques of the present invention. Other embodiments and aspects of the invention are described in detail herein and are considered a part of the claimed invention. For a better understanding of the invention with the advantages and the features, refer to the description and to the drawings.



BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS
The subject matter which is regarded as the invention is particularly pointed out and distinctly claimed in the claims at the conclusion of the specification. The forgoing and other features, and advantages of the invention are apparent from the following detailed description taken in conjunction with the accompanying drawings in which:
FIG. 1 illustrates a diagram of a prior art example of an inverter circuit.
FIG. 2 illustrates a diagram of a prior art example of a static random access memory (SRAM) circuit.
FIG. 3 illustrates and exemplary embodiment of a nanowire inverting circuit.
FIG. 4 illustrates an exemplary embodiment of a nanowire SRAM circuit.



DETAILED DESCRIPTION
An integrated circuit may include a number of different types of field effect transistor (FET) devices that may be formed from nanowire channel FET. A nanowire channel FET includes a silicon nanowire that connect to a source region and a drain region and a gate that fully (or partially) surrounds the nanowires. The channel forms at the surface of the nanowires under the gate (or in the bulk of the nanowires for nanowires with diameter smaller than about 5 nm). When the gate fully surrounds the nanowire, the device is referred to as a gate-all-around (GAA) FET. When the gate partially surrounds the nanowires, as in the case when the nanowire is attached to an insulator, the device is referred to as an omega-gate FET. Nanowire FETs may be fabricated to form, for example, nFET and pFET devices. The nFET and pFET devices may be connected to form a variety of integrated circuit devices such as, for example inverters and static random access memory (SRAM). It is generally desirable in circuit devices for FETs to be matched by having, for example, similar threshold voltages and drive current.
Nanowire FET devices that are formed on a wafer may include any number of nanowires. The fabrication process may include, for example, forming a silicon nanowire on a buried oxide (BOX) substrate using an isotropic etching process. The etching process results in an elliptically (including cylindrically) shaped nanowire that may be suspended above the substrate or may be partially disposed on the substrate. A metallic or polysilicon gate structure is formed on the nanowire. Source and drain regions are formed adjacent to the gate structure, and contacts may be formed to connect the source, drain, and gate structure to other devices.
The fabrication process may result in particular nanowires having different properties such as, for example, the diameter of one nanowire on a wafer may be different from the diameter of another nanowire due to the location of the particular nanowire on the wafer. Though the diameters of two different nanowires may vary on a wafer, the diameter of each particular nanowire typically remains constant, and within a desired tolerance.
Integrated circuit devices such as, for example, SRAM and inverters include a number of pFET and nFET devices disposed on nanowires that are arranged on a wafer. Since the properties of the nanowires (e.g., nanowire diameters) effect the operation of the devices, it is desirable to arrange the devices such that effects of the differences in the nanowire properties are reduced.
FIG. 1 illustrates a diagram of a prior art example of an inverter including a pFET device 101 connected to an nFET device 103. The device 101 is connected to a source voltage node (Vdd) 106, an input node (A) 102, and an output node (Q) 104. The device 102 is connected to a ground node (Vss) 108, A, and Q.
FIG. 2 illustrates a diagram of a prior art example of a static random access memory (SRAM) circuit. The SRAM includes a first nFET device (M6) 201 connected to a first bit line node (BL) 202, a first output node (Q) 204, and a word line node (WL) 206. A second nFET device (M3) 203 is connected to the Q node 204, a ground node (Vss) 208, and a second output node ( Q) 210. A first pFET device (M4) 205 is connected to the Q node 204, the Q node 210, and a voltage source node (Vdd) 212. A second pFET device (M2) 207 is connected to the Vdd node 212, the Q node 204, and the Q node 210. A third nFET device (M1) 209 is connected to the Vss node 208, the Q node 204, and the Q node 210. A fourth nFET device (M5) 211 is connected to a second bit line node ( BL) 212, the WL node 206, and the Q node 210.
As discussed above, the nanowires on a wafer may have different diameters that affect the performance characteristics of the gates disposed on the nanowires. The performance of integrated circuits including, for example, the prior art examples of FIGS. 1 and 2 may be improved when particular FETs in the devices have similar characteristics. Thus, designing integrated circuits such that particular FETs share a common nanowire may improve the performance of the circuits through the use of better matched devices in the common wire.
FIG. 3 illustrates and exemplary embodiment of a nanowire inverting circuit 300 that is fabricated with silicon nanowire devices formed on a substrate as described above. The circuit 300 includes a first nanowire 320 connected to a source voltage node (Vdd) 306 and a ground node (Vss) 308. A pFET device 301 and nFET device 303 have gate regions (G) disposed on the first nanowire 320. The drain regions (D) of the devices 301 and 303 are connected to an output node (Q) 304. The source region (S) of the device 301 is connected to the Vdd 306 node, and the source region (S) of the device 303 is connected to the Vss node 308. The gates of the devices 301 and 303 are connected to an input node (A) 302. The illustrated embodiment includes a second inverting circuit 350 that is similar to the inverting circuit 300. The inverting circuit 350 is formed on a second nanowire 321. The A node 302 of the second inverting circuit 350 is connected to the Q node 304 with a silicon member 352. The arrangement of the inverting circuit 300 on the first nanowire 320 improves the performance of the circuit 300 by disposing the FET devices 301 and 303 on the same nanowire resulting in the FET devices 301 and 303 having similar performance characteristics. Similar advantages are gained by the arrangement of the second inverting circuit 350.
FIG. 4 illustrates an exemplary embodiment of a nanowire SRAM circuit 400 that is fabricated with silicon nanowire devices in a similar manner as described above. The circuit 400 includes a first nanowire 420 connected to a bit line node (BL) 402 and a first ground node (Vss) 408a. A first nFET device (M6) 401 is formed on the first nanowire 420 and is connected to the BL node 402, a first output node (Q) 404, and a first word line node (WL) 406a. A second nFET device (M3) 403 is formed on the first nanowire 420 and connected to the Q node 404, the first Vss 408a, and a second output node ( Q) 410. A second nanowire 421 is connected to the Q node 404 and a first voltage source node (Vdd) 412a. A first pFET device (M4) 405 is formed on the second nanowire 421 and connected to the Q node 404, the Q node 410, and the Vdd node 212. A third nanowire 422 is connected to a second Vdd node 412b and the Q node 410. A second pFET device (M2) 407 is formed on the third nanowire 422 and connected to the Vdd node 412b, the Q node 404, and the Q node 410. A fourth nanowire 423 is connected to a second Vss node 408b and bit line node ( BL) 412. A third nFET device (M1) 409 is connected to the second Vss node 208b, the Q node 404, and the Q node 410. A fourth nFET device (M5) 411 is connected to the bit line node (BL) 412, a second WL node 406b, and the Q node 410. A silicon member 452 may be formed to connect the first nanowire 420 to the Q node 404, and a silicon member 453 may be formed to connect the fourth nanowire 423 to the Q node 410.
Though the illustrated embodiments include two examples of the implementation of matching FETs in integrated circuits. The methods described above may be applied to any type of integrated circuit to improve circuit performance by arranging particular FET devices on a particular nanowire such that the FET devices on the same nanowire have similar performance characteristics.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the singular forms “a”, “an” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprises” and/or “comprising,” when used in this specification, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one ore more other features, integers, steps, operations, element components, and/or groups thereof.
The corresponding structures, materials, acts, and equivalents of all means or step plus function elements in the claims below are intended to include any structure, material, or act for performing the function in combination with other claimed elements as specifically claimed. The description of the present invention has been presented for purposes of illustration and description, but is not intended to be exhaustive or limited to the invention in the form disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the invention. The embodiment was chosen and described in order to best explain the principles of the invention and the practical application, and to enable others of ordinary skill in the art to understand the invention for various embodiments with various modifications as are suited to the particular use contemplated
The diagrams depicted herein are just one example. There may be many variations to this diagram or the steps (or operations) described therein without departing from the spirit of the invention. For instance, the steps may be performed in a differing order or steps may be added, deleted or modified. All of these variations are considered a part of the claimed invention.
While the preferred embodiment to the invention had been described, it will be understood that those skilled in the art, both now and in the future, may make various improvements and enhancements which fall within the scope of the claims which follow. These claims should be construed to maintain the proper protection for the invention first described.

## Claims

1. A memory device comprising:
a first nanowire connected to a first bit line node and a ground node;
a first field effect transistor (FET) having a gate disposed on the first nanowire;
a second FET having a gate disposed on the first nanowire;
a second nanowire connected to a voltage source node and a first input node;
a third FET having a gate disposed on the second nanowire,
a third nanowire connected to the voltage source node and a second input node;
a fourth FET having a gate disposed on the third nanowire;
a fourth nanowire connected to a second bit line node and the ground node;
a fifth FET having a gate disposed on the fourth nanowire; and
a sixth FET having a gate disposed on the fourth nanowire.

2. The device of claim 1, wherein a gate terminal of the first FET is connected to a word line node, a gate terminal of the second FET is connected to the second input node, a gate terminal of the third FET is connected to the second input node, a gate terminal of the fourth FET is connected to the first input node, a gate terminal of the fifth FET is connected to the first input node, and a gate terminal of the sixth FET is connected to the word line node.

3. The device of claim 1, wherein the first FET is a n-type FET device (nFET), the second FET is a nFET, the third FET is a p-type FET device (pFET), the fourth FET is a pFET, the fifth FET is a nFET, and the sixth FET is a nFET.

4. The device of claim 1, wherein the first nanowire is a silicon nanowire.

5. The device of claim 1, wherein the first nanowire is suspended above a substrate.

6. The device of claim 1, wherein a portion of the first nanowire is connected to the first input node, and a portion of the fourth nanowire is connected to the second input node.

7. A method for forming a memory device, the method including:
forming a first nanowire connected to a first bit line node and a ground node;
forming a first field effect transistor (FET) having a gate disposed on the first nanowire;
forming a second FET having a gate disposed on the first nanowire;
forming a second nanowire connected to a voltage source node and a first input node;
forming a third FET having a gate disposed on the second nanowire, forming a third nanowire connected to the voltage source node and a second input node;
forming a fourth FET having a gate disposed on the third nanowire;
forming a fourth nanowire connected to a second bit line node and the ground node;
forming a fifth FET having a gate disposed on the fourth nanowire; and
forming a sixth FET having a gate disposed on the fourth nanowire.

8. The method of claim 7, wherein the first nanowire is a silicon nanowire formed with an isotropic etching process.

9. The method of claim 7, wherein the first nanowire is suspended above a substrate.

10. The method of claim 7, wherein the first nanowire includes a silicon material.

11. The method of claim 7, wherein the second nanowire includes a silicon material.

12. The method of claim 7, wherein the third nanowire includes a silicon material.

13. The method of claim 7, wherein the fourth nanowire includes a silicon material.

14. A method for forming a memory device, the method including:
forming a first nanowire connected to a first bit line node and a ground node;
forming a first field effect transistor (FET) having a gate disposed on the first nanowire;
forming a second FET having a gate disposed on the first nanowire;
forming a second nanowire connected to a voltage source node and a first storage node;
forming a third FET having a gate disposed on the second nanowire,
forming a third nanowire connected to the voltage source node and a second storage node.

15. The method of claim 14, further comprising:
forming a fourth FET having a gate disposed on the third nanowire;
forming a fourth nanowire connected to a second bit line node and the ground node;
forming a fifth FET having a gate disposed on the fourth nanowire; and
forming a sixth FET having a gate disposed on the fourth nanowire.

16. The method of claim 14, wherein the first nanowire is a silicon nanowire formed with an isotropic etching process.

17. The method of claim 14, wherein the first nanowire is suspended above a substrate.

18. The method of claim 14, wherein the first nanowire includes a silicon material.

19. The method of claim 14, wherein the second nanowire includes a silicon material.

20. The method of claim 14, wherein the third nanowire includes a silicon material.