# Patent

## Title
Light emitting diode chip having distributed bragg reflector, method of fabricating the same, and light emitting diode package having distributed bragg reflector

## Abstract

An exemplary embodiment of the present invention discloses a light emitting diode chip including a substrate, a light emitting structure arranged on the substrate, the light emitting structure including an active layer arranged between a first conductive-type semiconductor layer and a second conductive-type semiconductor layer, and a distributed Bragg reflector to reflect light emitted from the light emitting structure. The distributed Bragg reflector has a reflectivity of at least 90% for light of a first wavelength in a blue wavelength range, light of a second wavelength in a green wavelength range, and light of a third wavelength in a red wavelength range.

## Background
CROSS-REFERENCE TO RELATED APPLICATIONS
This application claims priority from and the benefit of Korean Patent Application No. 10-2009-0109870, filed on Nov. 13, 2009, and Korean Patent Application No. 10-2010-0013166, filed on Feb. 12, 2010, which are hereby incorporated by reference for all purposes as if fully set forth herein.
BACKGROUND OF THE INVENTION
1. Field of the Invention
Exemplary embodiments of the present invention relate to a light emitting diode chip, a method of fabricating the same, and a light emitting diode package, and more particularly, to a light emitting diode chip having a distributed Bragg reflector, a method of fabricating the same, and a light emitting diode package having a distributed Bragg reflector.
2. Discussion of the Background
A gallium nitride-based light emitting diode chip emitting blue or ultraviolet wavelength light may be used for various applications. In particular, various types of light emitting diode packages emitting mixed color light, for example, white light required for a backlight unit, general lighting, or the like, have been marketed.
Since the light output from the light emitting diode package may depend on the light emission efficiency of the light emitting diode chip, research to improve the light emission efficiency of the light emitting diode chip has been continuously conducted. In particular, attempts to improve the light extraction efficiency of the light emitting diode chip have been performed. For example, technology of forming a metal reflector or a distributed Bragg reflector (DBR) on a bottom surface of a transparent substrate, such as a sapphire substrate has been researched.
FIG. 1 shows reflectivity measured by forming an aluminum layer on the bottom surface of a sapphire substrate according to the related art.
It can be appreciated from FIG. 1 that in the case of the sapphire substrate on which the aluminum layer is not formed, reflectivity of about 20% is shown, but in the case of the sapphire substrate on which the aluminum layer is formed, reflectivity of about 80% is shown over a visible wavelength range.
FIG. 2 shows the reflectivity measured by the DBR formed by periodically applying TiO2/SiO2 to the bottom surface of the sapphire substrate according to the related art.
As shown in FIG. 2, when the DBR is formed to reflect light emitted from the light emitting diode chip, the emitted light may have a peak wavelength of 460 nm, for example. FIG. 2 shows that reflectivity in the light emitting diode using the DBR reaches approximately 100% in a blue wavelength range, for example, a wavelength range of 400 to 500 nm.
However, the DBR can only increase the reflectivity for a part of the visible range. Therefore, the reflectivity for other ranges is considerably lower than that shown in FIG. 2 for the wavelength range of 400 to 500 nm. That is, as shown in FIG. 2, the reflectivity for a wavelength of about 520 nm or more is suddenly reduced while most of the reflectivity is less than 50% at a wavelength of 550 nm or more.
Therefore, when mounting the light emitting diode chip using the DBR in a light emitting diode package to emit white light, the DBR shows high reflectivity for light of the blue wavelength range emitted from the light emitting diode chip but the DBR does not show efficient reflection characteristics for light emitted in the green and/or red wavelength ranges. Therefore, there is a limit in improving the light emission efficiency of the light emitting diode package.
Meanwhile, attempts have been made to apply the DBR to the reflecting surface of the light emitting diode package, which have not been achieved due to a limitation of the DBR deposition technology. For example, there have been problems with a deposition temperature, a plasma temperature, and the like.
SUMMARY OF THE INVENTION
Exemplary embodiments of the present invention provide a light emitting diode chip capable of increasing light emission efficiency of a light emitting diode package implementing a mixed color light, for example, white light.
Exemplary embodiments of the present invention also provide a light emitting diode package capable of improving light emission efficiency.
Exemplary embodiments of the present invention also provide a distributed Bragg reflector having high reflectivity over a wide wavelength range, a light emitting diode chip having the same, and a light emitting diode package having the same.
Additional features of the invention will be set forth in the description which follows, and in part will be apparent from the description, or may be learned by practice of the invention.
An exemplary embodiment of the present invention discloses a light emitting diode chip including a substrate, a light emitting structure arranged on the substrate, the light emitting structure including an active layer arranged between a first conductive-type semiconductor layer and a second conductive-type semiconductor layer, and a distributed Bragg reflector to reflect light emitted from the light emitting structure. The distributed Bragg reflector has a reflectivity of at least 90% for light of a first wavelength in a blue wavelength range, light of a second wavelength in a green wavelength range, and light of a third wavelength in a red wavelength range.
An exemplary embodiment of the present invention also discloses a light emitting diode package including a mounting surface, a light emitting diode chip arranged on the mounting surface, and a reflecting surface to reflect at least a part of a light emitted from the light emitting diode chip. A distributed Bragg reflector having reflectivity of at least 90% for light of a first wavelength in a blue wavelength range, light of a second wavelength in a green wavelength range, and light of a third wavelength in a red wavelength range is positioned on at least a part of the reflecting surface.
An exemplary embodiment of the present invention also discloses a light emitting diode chip including a substrate having a first surface and a second surface, the light emitting structure including an active layer arranged between a first conductive-type semiconductor layer and a second conductive-type semiconductor layer, and a distributed Bragg reflector. The second surface is arranged on the distributed Bragg reflector, the distributed Bragg reflector to reflect light emitted from the light emitting structure. Further, the second surface has a surface roughness having a root-mean-square (RMS) value of 3 nm or less, and the distributed Bragg reflector has a reflectivity of at least 90% for light of a first wavelength in a blue wavelength range, light of a second wavelength in a green wavelength range, and light of a third wavelength in a red wavelength range.
An exemplary embodiment of the present invention also discloses a method of fabricating a light emitting diode chip including forming a light emitting structure on a first surface of a substrate. The light emitting structure includes a first conductive-type semiconductor layer, a second conductive-type semiconductor layer, and an active layer interposed between the first conductive-type semiconductor layer and the second conductive-type semiconductor layer. Thereafter, a portion of the substrate is removed by grinding a second surface of the substrate, and after the grinding, a surface roughness of the second surface is reduced by lapping the substrate. Next, a distributed Bragg reflector is formed on the second surface. The surface roughness of the second surface has an RMS value of 3 nm or less before forming the distributed Bragg reflector. In addition, the distributed Bragg reflector has a reflectivity of at least 90% for light of a first wavelength in a blue wavelength range, light of a second wavelength in a green wavelength range, and light of a third wavelength in a red wavelength range.
An exemplary embodiment of the present invention also discloses a method of fabricating a light emitting diode chip, including forming a light emitting structure on a first surface of a substrate, the light emitting structure including a first conductive-type semiconductor layer, a second conductive-type semiconductor layer, and an active layer interposed between the first conductive-type semiconductor layer and the second conductive-type semiconductor layer, removing a portion of the substrate by grinding a second surface of the substrate, after the grinding, reducing a surface roughness of the second surface by lapping the substrate, reducing the surface roughness of the second surface by polishing the second surface by a chemical mechanical polishing process, and forming a distributed Bragg reflector on the second surface. The distributed Bragg reflector has a reflectivity of at least 90% for light of a first wavelength in a blue wavelength range, light of a second wavelength in a green wavelength range, and light of a third wavelength in a red wavelength range.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the invention as claimed.



BRIEF DESCRIPTION OF THE DRAWINGS
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention, and together with the description serve to explain the principles of the invention.
FIG. 1 is a graph showing reflectivity of aluminum on a sapphire substrate according to the related art.
FIG. 2 is a graph showing reflectivity of a distributed Bragg reflector on the sapphire substrate according to the related art.
FIG. 3 is a cross-sectional view showing a light emitting diode chip having the distributed Bragg reflector according to an exemplary embodiment of the present invention.
FIG. 4 is a magnified cross-sectional view of the distributed Bragg reflector of FIG. 3.
FIG. 5 is a cross-sectional view showing a distributed Bragg reflector according to another exemplary embodiment of the present invention.
FIG. 6 is a graph showing reflectivity of a distributed Bragg reflector on the sapphire substrate according to an exemplary embodiment of the present invention.
FIG. 7 is a cross sectional view showing a light emitting diode chip having a plurality of light emitting cells according to another exemplary embodiment of the present invention.
FIG. 8 is a cross-sectional view showing a light emitting diode package mounted with the light emitting diode chip having the distributed Bragg reflector according to an exemplary embodiment of the present invention.
FIG. 9 is a cross-sectional view showing the light emitting diode package having the distributed Bragg reflector according to another exemplary embodiment of the present invention.
FIG. 10 is a graph showing the reflectivity of the distributed Bragg reflector according to whether or not chemical mechanical polishing is performed after a sapphire substrate lapping process is performed using a copper surface plate.
FIG. 11 is a graph showing the reflectivity after an aluminum reflective metal layer is deposited on the distributed Bragg reflector fabricated in the same manner as FIG. 10.
FIG. 12, FIG. 13, and FIG. 14 are graphs showing reflectivity of the distributed Bragg reflector according to a size of a slurry particle during the lapping process using a tin surface plate.



DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS
The invention is described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. This invention may, however, be embodied in many different forms and should not be construed as limited to the exemplary embodiments set forth herein. Rather, these exemplary embodiments are provided so that this disclosure is thorough, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity. Like reference numerals in the drawings denote like elements.
FIG. 3 is a cross-sectional view showing a light emitting diode chip 20 having the distributed Bragg reflector 45 according to an exemplary embodiment of the present invention and FIG. 4 is a magnified cross-sectional view of the distributed Bragg reflector 45 of FIG. 3.
Referring to FIG. 3, a light emitting diode chip 20 includes a substrate 21, a light emitting structure 30, and a distributed Bragg reflector 45. In addition, the light emitting diode chip 20 may include a buffer layer 23, a transparent electrode 31, a p-electrode pad 33, an n-electrode pad 35, a reflective metal layer 51, and a protective layer 53.
The substrate 21 is a transparent substrate, for example, a sapphire or a SiC substrate, but not specifically limited thereto. An upper surface, i.e., front surface of the substrate 21 may have a predetermined pattern, such as a patterned sapphire substrate (PSS). Meanwhile, an area of the substrate 21 determines the entire chip area. In the exemplary embodiments of the present invention, as the chip area of the light emitting diode chip is relatively increased, the reflection effect is increased. Therefore, the area of the substrate 21 may be 90,000 μm2 or more. In some embodiments, it may be 1 mm2 or more.
A light emitting structure 30 is positioned on the upper portion of the substrate 21. The light emitting structure 30 includes a first conductive-type semiconductor layer 25, a second conductive-type semiconductor layer 29, and an active layer 27 interposed between the first and second conductive-type semiconductor layers 25 and 29. In this configuration, the first conductive-type layer 25 and the second conductive-type layer 29 have a conductive type opposite to each other. The first conductive type may be an n-type, and the second conductive type may be a p-type, or vice versa.
The first conductive-type semiconductor layer 25, the active layer 27, and the second conductive-type semiconductor layer 29 may be made of a gallium nitride-based compound semiconductor material, that is, (Al, In, Ga)N. The constituent elements and composition of the active layer 27 are determined to emit light of a required wavelength, for example, ultraviolet rays or blue light. The first conductive-type semiconductor layer 25 and/or the second conductive-type semiconductor layer 29 may be formed in a single layer structure as shown or a multi-layer structure. In addition, the active layer 27 may be formed to be a single quantum well structure or a multi quantum well structure. In addition, a buffer layer 23 may be interposed between the substrate 21 and the first conductive-type semiconductor layer 25.
The semiconductor layers 25, 27, and 29 may be formed using a metal-organic chemical vapor deposition (MOCVD) technology or a molecular beam epitaxy (MBE) technology and a region of the first conductive-type semiconductor layer 25 may be patterned to be partially exposed using a photolithography and etching process.
Meanwhile, the transparent electrode layer 31 may be formed of, for example, indium tin oxide (ITO) or Ni/Au, on the second conductive-type semiconductor layer 29. The transparent electrode layer 31 serves to spread current due to a lower specific resistance than the second conductive-type semiconductor layer 29. A p-electrode pad 33 is formed on the transparent electrode layer 31 and an n-electrode pad 35 is formed on the first conductive-type semiconductor layer 25. As shown, the p-electrode pad 33 may be electrically connected to the second conductive-type semiconductor layer 29 through the transparent electrode layer 31.
Meanwhile, the distributed Bragg reflector 45 is positioned on the lower portion, i.e., rear surface of the substrate 21. The distributed Bragg reflector 45 may include a first distributed Bragg reflector 40 and a second distributed Bragg reflector 50.
Referring to FIG. 4, the first distributed Bragg reflector 40 is formed by repeating a plurality of pairs of first material layers 40a and second material layers 40b and the second distributed Bragg reflector 50 is formed by repeating a plurality of pairs of third material layers 50a and fourth material layers 50b. The plurality of pairs of first material layer 40a and second material layer 40b have relatively higher reflectivity for light of a red wavelength range, for example, 550 nm or 630 nm, than for light of a blue wavelength range and the second distributed Bragg reflector 50 may have relatively higher reflectivity for light of a blue wavelength range, for example, light of 460 nm than for light of a red or green wavelength range. In this case, the optical thickness of the material layers 40a and 40b within the first distributed Bragg reflector 40 is thicker than the optical thickness of the material layers 50a and 50b within the second distributed Bragg reflector 50, or vice versa, without being limited thereto.
The first material layer 40a may be the same material as the third material layer 50a, that is, have the same refractive index (n), and the second material layer 40b may be the same material as the fourth material layer 50b, that is, have the same refractive index (n). For example, the first material layer 40a and the third material layer 50a may be made of TiO2 (n equals about 2.5) and the second material layer 40b and the fourth material layer 50b may be made of SiO2 (n equals about 1.5).
Meanwhile, the optical thickness (refractive index×thickness) of the first material layer 40a may substantially have the relationship of an integer multiple with the optical thickness of the second material layer 40b and the optical thicknesses thereof may be substantially the same as each other. In addition, the optical thickness of the third material layer 50a may substantially have the relationship of an integer multiple with the optical thickness of the fourth material layer 50b and the optical thicknesses thereof may be substantially the same as each other.
In addition, the optical thickness of the first material layer 40a may be thicker than that of the third material layer 50a and the optical thickness of the second material layer 40b may be thicker than that of the fourth material layer 50b. The optical thickness of the first to fourth material layers 40a, 40b, 50a, and 50b may be controlled by controlling the refractive index and/or thickness of each material layer.
Referring back to FIG. 3, the reflective metal layer 51 of Al, Ag, or Rh, or the like, may be formed on the lower portion of the distributed Bragg reflector 45 and a protective layer 53 for protecting the distributed Bragg reflector 45 may be formed thereon. The protective layer 53 may be made of any one metal layer of, for example, Ti, Cr, Ni, Pt, Ta, and Au or an alloy thereof. The protective layer 53 protects the distributed Bragg reflector 45 from external impact or pollution. For example, the reflective metal layer 51 or the protective layer 53 prevents the distributed Bragg reflector 45 from being deformed from a material such as an adhesive when the light emitting diode chip is mounted in the light emitting diode package.
According to the present exemplary embodiment, the distributed Bragg reflector 45 including the first distributed Bragg reflector 40 having high reflectivity for visible light of a relatively long wavelength and the second distributed Bragg reflector 50 having high reflectivity for visible light of a relatively short wavelength, which have a mutually stacked structure, is provided. The distributed Bragg reflector 45 may increase the reflectivity for light over most of the visible range by a combination of the first distributed Bragg reflector 40 and the second distributed Bragg reflector 50.
The distributed Bragg reflector according to the related art has high reflectivity for light of a specific wavelength range but has relatively low reflectivity for light of a different wavelength range, such that there is a limit in improving the light emission efficiency in the light emitting diode package emitting white light. However, according to the present exemplary embodiment, the distributed Bragg reflector 45 may have high reflectivity for light of the blue wavelength range as well as high reflectivity for light of the green wavelength range and light of the red wavelength range, thereby making it possible to improve light emission efficiency of the light emitting diode package.
In addition, as compared to the case where the second distributed Bragg reflector 50 is disposed to be closer to the substrate 21 than the first distributed Bragg reflector 40, the light loss in the distributed Bragg reflector 45 may be further reduced in the case where the first distributed Bragg reflector 40 is disposed to be closer to the substrate than the second distributed Bragg reflector 50.
Although the present exemplary embodiment describes two reflectors, i.e., the first distributed Bragg reflector 40 and the second distributed Bragg reflector 50, more reflectors may be used. In this case, the reflectors having relatively higher reflectivity for a long wavelength may be positioned to be relatively closer to the light emitting structure 30. However, the exemplary embodiment is not limited thereto.
In addition, in the present exemplary embodiment, the thicknesses of the first material layers 40a within the first distributed Bragg reflector 40 may be different from each other. Further, the thicknesses of the second material layers 40b may be different from each other. In addition, the thicknesses of the third material layers 50a within the second distributed Bragg reflector 50 may be different from each other. Further, the thicknesses of the fourth material layers 50b may be different from each other.
Although the present exemplary embodiment describes that the distributed Bragg reflector 45 is disposed on the lower portion of the substrate 21, the distributed Bragg reflector 45 may be disposed between the substrate 21 and the light emitting structure 30. In this case, the first distributed Bragg reflector 40 may be disposed to be closer to the light emitting structure 30 than the second distributed Bragg reflector 50.
The present exemplary embodiment describes that the material layers 40a, 40b, 50a, and 50b are made of SiO2 or TiO2, but is not limited thereto. Therefore, they may be made of, other materials, for example, Si3N4, a compound semiconductor, or the like. However, the difference in the refractive indexes between the first material layer 40a and the second material layer 40b and the difference in the refractive indexes between the third material layer 50a and the fourth material layer 50b should be at least 0.5.
In addition, the larger the number of pairs of the first material layers 40a and the second material layers 40b in the first distributed Bragg reflector 40 and the number of pairs of the third material layer 50a and the fourth material layer 50b in the second distributed Bragg reflector 50, the higher the reflectivity becomes. The total number of pairs may be 10 or more total pairs. In some cases, there may be 20 or more total pairs.
The surface roughness of the rear surface of the substrate 21 may be controlled before forming the distributed Bragg reflector 45. When the surface roughness of the rear surface of the substrate 21 is relatively large, it may be difficult to obtain high reflectivity over a wide wavelength range by the distributed Bragg reflector 45. When the interface between the distributed Bragg reflector 45 and the substrate 21 is defective, the distributed Bragg reflector 45 may be easily deformed. The deformation may cause a problem of reducing reflectivity of the distributed Bragg reflector 45 even if a slight thermal process is applied when the light emitting diode chip is mounted in, for example, the light emitting diode package. The surface roughness of the rear surface of the substrate 21 may be controlled to have a root-mean-square (RMS) value of 3 nm or less. Alternatively, the surface roughness of the rear surface of the substrate 21 may have an RMS value of 2 nm or less. In some embodiments, it may have an RMS value of 1 nm or less.
A method of fabricating a distributed Bragg reflector 45 and a light emitting diode chip will now be described.
First, the surface roughness of the substrate 21 is controlled before forming the distributed Bragg reflector 45. For example, the rear surface of the substrate 21 with the light emitting structures formed thereon is primarily ground to remove a part of the substrate 21, thereby thinning the substrate 21. In this case, the rear surface of the substrate 21 is scratched by the grinding, such that it is relatively very rough. Thereafter, the surface of the substrate 21 is lapped using slurry having small particles. In the lapping process, the depth of the groove such as the scratch in the surface of the substrate 21, etc., is reduced, thereby reducing the surface roughness. In this case, the surface roughness of the rear surface of the substrate 21 may be controlled to be 3 um or less by controlling a particle size of diamond slurry and a surface plate used in the lapping process. Thereafter, the surface of the substrate 21 may be additionally treated by chemicals. Generally, it is difficult to control the surface roughness using only the lapping process using the surface plate and the slurry particle. Therefore, after reducing the surface roughness by the lapping process, the rear surface of the substrate 21 may be polished by a chemical mechanical polishing (CMP) process. The surface roughness of the rear surface of the substrate 21 may be controlled up to 1 nm or less by the CMP process.
Then, the material layers having different refractive indexes such as TiO2, SiO2, and Si3N4, or the like are repeatedly deposited on the surface of the substrate 21. The deposition of the material layers may be made by various methods such as sputtering, electron beam deposition, plasma enhanced chemical vapor deposition method, etc. In particular, the ion assisted deposition method may be used. The ion assisted deposition method forms the material layers having a proper thickness by measuring the reflectivity of the material layer deposited on the substrate 21, such that it is suitable to form the material layers of the distributed Bragg reflector.
After the distributed Bragg reflector is formed, the metal layer may be formed on the distributed Bragg reflector. Thereafter, the substrate is diced, thereby completing the individual light emitting diode chips.
FIG. 5 is a cross-sectional view for explaining a distributed Bragg reflector 55 according to another exemplary embodiment of the present invention. FIG. 3 and FIG. 4 show and describe when the distributed Bragg reflector 45 has the stacked structure of the first distributed Bragg reflector 40 and the second distributed Bragg reflector 50. On the other hand, in the distributed Bragg reflector 55 according to the present exemplary embodiment, a plurality of pairs of first material layers 40a and second material layers 40b are mixed with a plurality of pairs of third material layers 50a and a fourth material layers 50b. In other words, at least one pair of the third material layer 50a and the fourth material layer 50b is positioned between the plurality of pairs of the first material layer 40a and the second material layer 40b. Further, at least one pair of the first material layer 40a and the second material layer 40b is positioned between the plurality of pairs of the third material layer 50a and the fourth material layer 50b. In this configuration, the optical thickness of the first to fourth material layers 40a, 40b, 50a, and 50b is controlled to have high reflectivity for light over the wide visible range.
The distributed Bragg reflector 55 may be positioned on the lower portion of the substrate 21 but is not limited thereto and may be positioned between the substrate 21 and the light emitting structure 30 (see FIG. 3).
FIG. 6 is a graph showing reflectivity of a distributed Bragg reflector on the sapphire substrate according to an exemplary embodiment of the present invention. In this case, the distributed Bragg reflector has been formed using TiO2/SiO2. As shown in FIG. 4, the distributed Bragg reflector was formed to have the stacked structure of the first distributed Bragg reflector 40 and the second distributed Bragg reflector 50. The reflectivity was measured over the entire wavelength range of the visible light and the same sample was measured seven times. The first distributed Bragg reflector 40 has a central wavelength of about 630 nm and the second distributed Bragg reflector 50 has a central wavelength of about 460 nm. As shown in FIG. 6, the reflectivity of 90% or more, even 98% or more, for light of a blue wavelength range of 400 to 500 nm, light of a green wavelength range of 500 to 600 nm, and light of a red wavelength range of 600 to 700 nm may be obtained by using a distributed Bragg reflector according to an exemplary embodiment of the present invention.
Meanwhile, the high reflectivity of 98% or more is obtained over the entire range of 400 to 700 nm as shown in FIG. 6. However, even a case where the reflectivity less than 98% is obtained in a part of the intermediate range is embodied by the present invention, if a distributed Bragg reflector having two or more central wavelengths is formed.
FIG. 7 is a cross sectional view showing a light emitting diode chip 20a having a plurality of light emitting cells according to another exemplary embodiment of the present invention.
Referring to FIG. 7, the light emitting diode chip 20a includes a plurality of light emitting cells on the substrate 21 and also includes the distributed Bragg reflector 45.
The substrate 21 and the distributed Bragg reflector 45 is similar to the distributed Bragg reflector described with referenced to FIG. 3, FIG. 4, and FIG. 5 and therefore, the detailed description thereof will be omitted. However, the substrate 21 may be an insulator to electrically isolate the plurality of light emitting cells. For example, the substrate 21 may be a patterned sapphire substrate.
Meanwhile, the plurality of light emitting cells 30 are positioned to be spaced apart from each other. Each of the plurality of light emitting cells 30 is the same as the light emitting structure 30 with reference to FIG. 3 and the detailed description thereof will be omitted. In addition, the buffer layers 23 may be interposed between the light emitting cells 30 and the substrate 21 and the buffer layers 23 may be also spaced apart from each other.
The first insulating layer 37 covers the front surface of the light emitting cells 30. A first insulating layer 37 has openings on the first conductive-type semiconductor layers 25 and openings on the second conductive-type semiconductor layers 29. The side walls of the light emitting cells 30 are covered by the first insulating layer 37. The first insulating layer 37 also covers the substrate 21 in the regions between the light emitting cells 30. The first insulating layer 37 may be formed of a silicon oxide (SiO2) layer or a silicon nitride layer and may be a layer formed in a temperature range of 200 to 300° C. using a plasma chemical vapor deposition method. In this case, the first insulating layer 37 may be formed to have a thickness of 4500 Å to 1 μm. When the first insulating layer is formed to have a thickness less than 4500 Å, the first insulating layer is very thinly formed at the bottom sides of the light emitting cells due to step coverage characteristics and an electrical short circuit between the wirings and the light emitting cells formed on the first insulating layer may occur. Meanwhile, as the thickness of the first insulating layer becomes greater, an electrical short circuit may be prevented but light transmittance may be deteriorated to reduce the luminous efficiency. Therefore, it is preferable that the first insulating layer is formed not to exceed a thickness of 1 μm.
Meanwhile, the wirings 39 are formed on the first insulating layer 37. The wirings 39 are electrically connected to the first conductive-type semiconductor layers 25 and the second conductive-type semiconductor layers 29 through the openings. The transparent electrode layers 31 may be disposed on the second conductive-type semiconductor layers 29 and the wirings may be connected to the transparent electrode layers 31. Further, the wirings 29 electrically connect the first conductive-type semiconductor layers 25 to the second conductive-type semiconductors 29, respectively, of the adjacent light emitting cells 30, such that a serial array of the light emitting cells 30 may be formed. A plurality of serial arrays may be formed and connected to each other in anti-parallel so that they may connected to and driven by an alternating current (AC) power supply. In addition, a bridge rectifier (not shown) connected to the serial arrays of the light emitting cells may be connected and the light emitting cells may be driven under the AC power supply by the bridge rectifier. The bridge rectifier may be formed by connecting the light emitting cells having the same structure as the light emitting cells 30 using the wirings 29.
On the other hand, the wirings may connect the first conductive-type semiconductor layers 25 of the adjacent light emitting cells to each other or connect the second conductive-type semiconductor layer 29 to each other. Therefore, the plurality of light emitting cells 30 connected in series and parallel may be provided.
The wirings 29 may be made of a conductive material, for example, doped semiconductor material such as polycrystalline silicon or metal. In particular, the wirings 29 may be formed in a multi-layer structure and may include, for example, a lower layer of Cr or Ti and an upper layer of Cr or Ti. Further, the metal layer of Au, Au/Ni, or Au/Al may be interposed between the lower layer and the upper layer.
The second insulating layer 41 may cover the wirings 39 and the first insulating layer 37. The second insulating layer 41 prevents the wirings 39 from being polluted from moisture or the like, and prevents the wirings 39 and the light emitting cells 30 from being damaged from external impact.
The second insulating layer 41 may be formed of the same material as the first insulating layer 37 and the silicon oxide layer or the silicon nitride layer. The second insulating layer 41 may be a layer formed in the temperature range of 200 to 300° C. by using the plasma chemical vapor deposition method, similar to the first insulating layer. In addition, when the first insulating layer 37 is a layer formed by using the plasma chemical vapor deposition method, the second insulating layer 41 may be deposited in the temperature range of −20% to +20% for the deposition temperature of the first insulating layer 37, or may be deposited in the same deposition temperature.
Meanwhile, the second insulating layer 41 may be relatively thin as compared to the first insulating layer 37, and may have a thickness of 500 Å or more. The second insulating layer 41 is relatively thinner than the first insulating layer 37, which can prevent the second insulating layer from peeling off from the first insulating layer. In addition, when the second insulating layer is thinner than 2500 Å, it may be difficult to protect the wiring and the light emitting cell from external impact or moisture permeation.
Meanwhile, a phosphor layer 43 may be positioned on the light emitting diode chip 20a. The phosphor layer 43 may be a layer in which resin is dispersed in a phosphor or a layer deposited by an electrophoresis method. The phosphor layer 43 covers the second insulating layer 41, thereby converting the wavelength of light emitted from the light emitting cells 30.
FIG. 8 is a cross-sectional view showing a light emitting diode package mounted with the light emitting diode chip having the distributed Bragg reflector according to an exemplary embodiment of the present invention.
Referring to FIG. 8, the light emitting diode package includes a package body 60, leads 61a and 61b, light emitting diode chips 20 or 20a (not shown), and a molding part 63. The package body 60 may be made of plastic resin, but is not limited thereto.
The package body 60 has a mounting surface M for mounting the light emitting diode chip 20 and also has a reflecting surface R to reflect light emitted from the light emitting diode chip 20. Meanwhile, the light emitting diode chip 20 is mounted on the mounting surface M and is electrically connected to leads 61a and 61b through bonding wires W.
The light emitting diode chip 20 may have the distributed Bragg reflector 45 described with reference to FIG. 3 and FIG. 4 or may have the distributed Bragg reflector 55 described with reference to FIG. 5.
Meanwhile, the light emitting diode package emits the mixed color light, for example, white light. To this end, the light emitting diode package may include a phosphor for converting the wavelength of light emitted from the light emitting diode chip 20. The phosphor may be included in the molding part 63 but is not limited thereto.
Since the light emitting diode chip 20 includes the distributed Bragg reflector 45 or 55, when the light wavelength-converted in the phosphor faces the mounting surface M through the light emitting diode chip 20, the light is reflected to have high reflectivity while being emitted to the outside by the wavelength-converted light or the distributed Bragg reflector 45 or 55. Therefore, the light emitting diode package having higher light emission efficiency may be provided as compared to the light emitting diode package according to the related art.
Although the present exemplary embodiment describes the package including the phosphor together with the light emitting diode chip 20 in order to implement white light, the present invention is not limited thereto. The light emitting diode chip may be used with any package capable of emitting white light.
In addition, although the present exemplary embodiment describes when the light emitting diode chip 20 is mounted, the light emitting diode chip 20a may be mounted on the mounting surface M with reference to FIG. 7. When the light emitting diode chip 20a includes the phosphor layer 43, the phosphor in the molding part 63 may be omitted.
FIG. 9 is a cross-sectional view showing the light emitting diode package having the distributed Bragg reflector according to another exemplary embodiment of the present invention.
Referring to FIG. 9, the light emitting diode package is similar to the light emitting diode package described with reference to FIG. 8. However, there is a difference in that a distributed Bragg reflector 75 is formed on the reflecting surface M. In addition, in the present exemplary embodiment, the light emitting diode chip 90 may not have the distributed Bragg reflector 45 or 55 described in FIG. 4 or FIG. 5.
The distributed Bragg reflector 75 may include a first distributed Bragg reflector 70 and a second distributed Bragg reflector 80. The first distributed Bragg reflector 70 and the second distributed Bragg reflector 80 may each have the stacked structure of the same material layer as the first and second distributed Bragg reflectors 40 and 50 with reference to FIG. 4. That is, the first distributed Bragg reflector 70 may be formed in the plurality of pairs of first material layer 70a and second material layer 70b and the second distributed Bragg reflector 80 may be formed in a plurality of pairs of third material layer 80a and fourth material layer 80b. These first to fourth material layers 70a, 70b, 80a, and 80b are the same as the first to fourth material layers 40a, 40b, 50a, and 50b described with reference to FIG. 4 and therefore, the detailed description thereof will be omitted.
High reflectivity may be provided over a wide wavelength range of the visible range by the distributed Bragg reflector 75 and therefore, the light emission efficiency of the light emitting diode package may be improved.
Meanwhile, the distributed Bragg reflector may be formed by mixing the plurality of pairs of first and second material layers 70a and 70b and a plurality of pairs of third and fourth material layers 80a and 80b, similar to one described with reference to FIG. 5.
The distributed Bragg reflector 75 may be formed using the ion assisted deposition method performed at a relatively low temperature. Therefore, the distributed Bragg reflector 75 may be formed without damaging the package body 60 made of plastic resin or the leads 61a and 61b. The distributed Bragg reflector 75 may be formed over the entire region other than the lead regions for bonding the wires.
Meanwhile, a light emitting diode chip 90 may include the distributed Bragg reflector like the light emitting diode chips 20 or 20a of FIG. 7 but is not limited thereto. The light emitting diode chip 90 may be the general light emitting diode chip according to the related art.
According to the present exemplary embodiment, the distributed Bragg reflector having reflectivity of 90% or more for the light of the blue wavelength range, the light of the green wavelength range, and the light of the red wavelength range is installed, thereby making it possible to the light emitting diode package with the improved light emission efficiency.
Experimental Example
The state of the substrate surface on which the distributed Bragg reflector is formed may have an effect on the reflectivity of the distributed Bragg reflector. Hereinafter, the experimental example was performed in order to confirm that the state of the substrate surface has an effect on the reflectivity of the distributed Bragg reflector.
FIG. 10 is a graph showing the reflectivity of the distributed Bragg reflector according to whether or not the CMP is performed after a sapphire substrate lapping process using a copper surface plate.
First, after the rear surface of the sapphire substrate is ground, the lapping process using the copper surface plate was performed by using the diamond slurry having a particle of 3 μm. After the lapping process was performed using the copper surface plate, the surface roughness of the rear surface of the sapphire substrate showed an RMS value of about 5.12 nm at is an area of 5 μm×5 μm.
Thereafter, after the rear surface of the sapphire substrate is subjected to the CMP process, the above-mentioned first distributed Bragg reflector and second distributed Bragg reflector are formed by controlling the thickness of TiO2 and SiO2 to fabricate the sample (Example 1). On the other hand, the comparative example directly formed the distributed Bragg reflector similar to Example 1 without performing the CMP process to fabricate the sample. The CMP process was performed using slurry of SiO2 at a load of 20 kg and the surface roughness of the sapphire substrate showed the RMS value of about 0.25 nm at an area of 5 μm×5 μm after the CMP process.
In the case of the comparative example, the reflectivity of the distributed Bragg reflector showed approximately 90% or more in the visible range as shown in FIG. 10, but the reflectivity was irregular according to the wavelength and showed the value of 90% or less in the vicinity of 550 nm. On the other hand, in the case of example 1, most of the reflectivity of the distributed Bragg reflector showed a value close to 100% over the wide wavelength range of the visible rays.
FIG. 11 is a graph showing the reflectivity after an aluminum layer of about 500 nm is deposited on the sample fabricated in the same manner as the example and the comparative example of FIG. 10.
In the case of comparative example, it was confirmed that the reflectivity was considerably reduced after Al was deposited. On the other hand, in the case of the example, high reflectivity was maintained without reducing reflectivity even after Al was deposited.
In the comparative example, it is considered as the phenomenon that the reduction in the reflectivity is showed after Al was deposited since the distributed Bragg reflector according to the comparative example formed on the sapphire surface having a rough surface was deformed by the interfacial defect while the Al was deposited using the electronic beam deposition technology. In the case of the example 1, since the surface roughness of the sapphire substrate is good, it is determined that reflectivity was maintained without deforming the distributed Bragg reflector while Al is deposited.
FIG. 12, FIG. 13, and FIG. 14 are graphs showing the reflectivity of the distributed Bragg reflector according to a size of a slurry particle during the lapping process using a tin surface plate.
In this configuration, the slurry included diamond particles and the size of the diamond particle was 3 μm, 4 μm, and 6 μm, respectively. The surface roughness of the sapphire substrate showed the RMS value of about 2.40 nm, 3.35 nm, and 4.18 nm according to the size of the diamond particle after the lapping process was performed using a tin surface plate.
The same distributed Bragg reflector as Example 1 was formed after the lapping process was performed by the tin surface plate and Al of 500 nm was deposited as in the example of FIG. 11.
As could be appreciated from the figures, the reflectivity of the distributed Bragg reflector was 90% or more over the wide wavelength range of the visible range after the lapping process was performed using the slurry of 3 μm and the tin surface plate. However, when the Al was deposited, the reflectivity was slightly reduced in the vicinity of 550 nm.
In contrast, the reflectivity of the distributed Bragg reflector does not reach 90% in the vicinity of 550 nm after the lapping process was performed using the slurry of 4 μm and the tin surface plate and the reflectivity was reduced to 80% or less after Al was deposited.
It can be appreciated from the above experimental example that the surface is roughness of the sapphire substrate has an effect on the reflectivity of the distributed Bragg reflector before the distributed Bragg reflector is formed. In addition, when the surface roughness of the sapphire substrate is controlled to have the RMS value of 3 nm or less, the reflectivity characteristics were considerably good. Further, when the surface roughness of the sapphire substrate is 1 nm or less, it is expected that the reflectivity would not be reduced even after Al was deposited.
It will be apparent to those skilled in the art that various modifications and variation can be made in the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention cover the modifications and variations of this invention provided they come within the scope of the appended claims and their equivalents.

## Claims

1. A light emitting diode chip, comprising:
a substrate;
a light emitting structure arranged on the substrate, the light emitting structure comprising an active layer arranged between a first conductive-type semiconductor layer and a second conductive-type semiconductor layer; and
a distributed Bragg reflector to reflect light emitted from the light emitting structure,
wherein the distributed Bragg reflector has a reflectivity of at least 90% for light of a first wavelength in a blue wavelength range, light of a second wavelength in a green wavelength range, and light of a third wavelength in a red wavelength range, and
wherein the distributed Bragg reflector has a reflectivity of at least 90% for light in a full wavelength range of 400 to 700 nm.

2. The light emitting diode chip of claim 1, wherein the light emitting structure is arranged on the distributed Bragg reflector.

3. The light emitting diode chip of claim 2, wherein the distributed Bragg reflector directly contacts a lower surface of the substrate.

4. The light emitting diode chip of claim 2, wherein the lower surface of the substrate comprises a surface roughness of 3 μm or less.

5. The light emitting diode chip of claim 1, wherein an upper surface of the substrate comprises a pattern.

6. The light emitting diode chip of claim 1, wherein the area of the substrate is 90,000 μm2 or more.

7. The light emitting diode chip of claim 6, further comprising a plurality of light emitting cells arranged on the substrate.

8. The light emitting diode chip of claim 7, further comprising at least one light emitting cell array in which at least a portion of the plurality of light emitting cells are connected in series.

9. The light emitting diode chip of claim 1, wherein the distributed Bragg reflector comprises a first distributed Bragg reflector and a second distributed Bragg reflector disposed on a same side of the substrate.

10. The light emitting diode chip of claim 9, wherein the first distributed Bragg reflector comprises higher reflectivity for light of the green wavelength range or the red wavelength range than for light of the blue wavelength range, and
the second distributed Bragg reflector comprises higher reflectivity for light of the blue wavelength range than for light of the red wavelength range.

11. The light emitting diode chip of claim 10, wherein the substrate is arranged between the distributed Bragg reflector and the light emitting structure and the first distributed Bragg reflector is arranged between the substrate and the second distributed Bragg reflector.

12. The light emitting diode chip of claim 1, wherein the distributed Bragg reflector comprises:
a plurality of pairs of first material layers comprising a first optical thickness and second material layers comprising a second optical thickness; and
a plurality of pairs of third material layers comprising a third optical thickness and fourth material layers comprising a fourth optical thickness,
wherein the refractive index of the first material layer is different from the refractive index of the second material layer, and the refractive index of the third material layer is different from the refractive index of the fourth material layer.

13. The light emitting diode chip of claim 12, wherein the plurality of pairs of first material layers and second material layers are arranged between the light emitting structure and the plurality of pairs of third material layers and fourth material layers.

14. The light emitting diode chip of claim 12, wherein the first material layer comprises the same refractive index as the third material layer, and the second material layer comprises the same refractive index as the fourth material layer.

15. The light emitting diode chip of claim 12, wherein the first optical thickness is thicker than the third optical thickness, and the second optical thickness is thicker than the fourth optical thickness.

16. The light emitting diode chip of claim 12, wherein the first optical thickness and the second optical thickness are the same, and the third optical thickness and the fourth optical thickness are the same.

17. The light emitting diode package of claim 12, wherein the plurality of pairs of first material layers and second material layers are mixed with the plurality of pairs of third material layers and fourth material layers.

18. A light emitting diode chip, comprising:
a substrate comprising a first surface and a second surface;
a light emitting structure arranged on the first surface, the light emitting structure comprising an active layer arranged between a first conductive-type semiconductor layer and a second conductive-type semiconductor layer; and
a distributed Bragg reflector, wherein the second surface is arranged on the distributed Bragg reflector, the distributed Bragg reflector to reflect light emitted from the light emitting structure,
wherein the second surface comprises a surface roughness having a root-mean-square (RMS) value of 3 nm or less,
wherein the distributed Bragg reflector comprises a reflectivity of at least 90% for light of a first wavelength in a blue wavelength range, light of a second wavelength in a green wavelength range, and light of a third wavelength in a red wavelength range, and
wherein the distributed Bragg reflector has a reflectivity of at least 90% for light in a full wavelength range of 400 to 700 nm.

19. The light emitting diode chip of claim 18, wherein the second surface comprises a surface roughness having an RMS value of 2 nm or less.

20. The light emitting diode chip of claim 18, wherein the second surface comprises a surface roughness having an RMS value of 1 nm or less.

21. The light emitting diode chip of claim 18, wherein the first surface comprises a pattern.

22. The light emitting diode chip of claim 18, wherein the area of the substrate is 90,000 μm2 or more.

23. The light emitting diode chip of claim 22, further comprising a plurality of light emitting cells arranged on the substrate.

24. The light emitting diode chip of claim 23, further comprising at least one light emitting cell array in which at least a portion of the plurality of light emitting cells are connected in series.

25. The light emitting diode chip of claim 18, wherein the distributed Bragg reflector comprises a first distributed Bragg reflector and a second distributed Bragg reflector disposed on a same side of the substrate.

26. The light emitting diode chip of claim 25, wherein the first distributed Bragg reflector comprises higher reflectivity for light of the green wavelength range or the red wavelength range than for light of the blue wavelength range, and
the second distributed Bragg reflector comprises higher reflectivity for light of the blue wavelength range than for light of the red wavelength range.

27. The light emitting diode chip of claim 26, wherein the first distributed Bragg reflector is arranged between the substrate and the second distributed Bragg reflector.

28. The light emitting diode chip of claim 18, wherein the distributed Bragg reflector comprises:
a plurality of pairs of first material layers comprising a first optical thickness and second material layers comprising a second optical thickness; and
a plurality of pairs of third material layers comprising a third optical thickness and fourth material layers comprising a fourth optical thickness,
wherein the refractive index of the first material layer is different from the refractive index of the second material layer, and the refractive index of the third material layer is different from the refractive index of the fourth material layer.

29. The light emitting diode chip of claim 28, wherein the plurality of pairs of first material layers and second material layers are arranged between the light emitting structure and the plurality of pairs of third material layers and fourth material layers.

30. The light emitting diode chip of claim 28, wherein the first material layer comprises the same refractive index as the third material layer, and the second material layer comprises the same refractive index as the fourth material layer.

31. The light emitting diode chip of claim 28, wherein the first optical thickness is thicker than the third optical thickness, and the second optical thickness is thicker than the fourth optical thickness.

32. The light emitting diode chip of claim 28, wherein the first optical thickness and the second optical thickness are the same, and the third optical thickness and the fourth optical thickness are the same.

33. The light emitting diode chip of claim 28, further comprising a reflective metal layer or a protective layer arranged on the distributed Bragg reflector.