# Instructions The EPA secondary aluminum production test program requires emissions and other test data for several pollutants. EPA understands that you own one or more secondary aluminum production facilities. For at least one thermal chip dryer and at least one scrap dryer/delacquering kiln/decoating kiln that you own, you must perform a stack test for volatile and semi-volatile organic HAPs as specified in the letter and instructions accompanying this file. You should collect emissions samples for the identified pollutants downstream of the last relevant emissions control device (i.e., stack or other point representing the composition of the flue gases at the exit to the atmosphere), unless otherwise indicated. (Contact the EPA project lead for situations with multiple stacks or other complex emissions points for the unit.) Sample and analyze the particulate matter collected in the hopper from at least one bag house used to control particulate matter from each type of affected source subject to 40 CFR 63, subpart RRR at your secondary aluminum production facilities. Choose bag houses that are used to control particulate matter from each of the six different types of affected sources (i.e.group 1 furnaces, scrap shredders, chip dryers, scrap dryers/delacquering kilns/decoating kilns, dross only furnaces, and rotary dross coolers) if you have these controlled affected sources at your facilities. Where more than one bag house discharges solids to a common hopper, a single sample will be adequate. In cases where solids from different compartments of a single bag house are collected in multiple hoppers or multiple collection sacks, a single composite sample will be adequate. If you have a total of three or fewer bag houses at all of your facilities, sample and analyze particulate matter from all of them, even if they are controlling the same type of affected source. It is not necessary to conduct a stack test for multi-metals analysis. Sample and analyze the lime used for injection to any of the lime-injected bag houses from which particulate matter samples were collected. If lime of the same type, obtained from the same supplier, is used for more than one lime injected bag house, a single sample will be adequate to represent the lime used in these bag houses.
You must report the results of these tests and chemical analyses in this Microsoft® Excel Emission Test Template. The Excel templates are specific to each type of pollutant. You must report the results of each test on the appropriately labeled worksheet corresponding to the specific tests and analyses conducted at your facilities. If more than one source was tested, you must make a copy of the worksheet and update the source ID in order to distinguish between each separate test of a chip dryer or scrap dryer/ delacquering kiln/decoating kiln at each facility and each different source of particulate matter. After completing the worksheet, you must also submit an electronic copy of the emission test report and the chemical analyses. (PDF format preferred). Please refer to the cover letter of this packet (CAA section 114 letter) for additional testing information. Please note that you do not have to submit a test plan to EPA for approval prior to testing; however, we recommend that you prepare a test plan for your own use to assist in the planning and to verify that you address all of the testing and reporting requirements. You must follow all of the procedures as specified in the test methods, including the quality assurance and quality control measures, and document the results in any test report provided to EPA.**Facility Name and Address Unit Description**  **Process Unit ID Control Device ID** 

Aleris Specification Alloys, Inc. 368 West Garfield Avenue Coldwater, MI 49036Thermal Chip Dryer EUALDRYER3 Torit Baghouse

**Parameter Sample 1**  **Sample 2 Sample 3**  **Unit of Measure Other Supporting**  **Information** Date of Testing 8/19/2010 8/19/2010 8/20/2010 Feed/Charge Rate 6.04 5.46 6.71 Mg/hr Afterburner Operating Temperature 1,441 1,441 1,442 degree F
Type of Charge:_______________________________________________________________________

**Compound Volatile Organic HAP Emission**  **Rate Sample 1 (kg/hr) Volatile Organic HAP Emission Rate Sample**  **1 (kg/Mg of feed/charge) Volatile Organic HAP**  **Emission Rate Sample 2 (kg/hr)**  **Volatile Organic HAP**

**Emission Rate Sample 2 (kg/Mg of feed/charge)** **Volatile Organic HAP Emission Rate Sample 3**  **(kg/hr) Volatile Organic HAP** 

**Emission Rate Sample 3 (kg/Mg of feed/charge)** **Test Method Used Detection Limit**  **Information (BDL,DLL,ADL)**  **Other Supporting Information** Acrylonitrile 107-13-1 [< 8.8E-04] [< 1.5E-04] [< 9.5E-04] [< 1.7E-04] [< 7.5E-04] [< 1.1E-04]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes Benzene 71-43-2 [< 2.8E-03] [< 4.7E-04] [< 3.4E-03] [< 6.2E-04] [< 3.2E-03] [< 4.7E-04]SW-846 0031 & 8260B DLL Standard Deviation of 8 Replicate Low Level Spikes Bromodichloromethane 75-27-4 [< 1.1E-04] [< 1.8E-05] [< 1.2E-04] [< 2.2E-05] [< 1.0E-04] [< 1.6E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes Carbon disulfide 75-15-0 [< 2.4E-04] [< 3.9E-05] [< 2.6E-04] [< 4.7E-05] [< 2.3E-04] [< 3.5E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes Carbon tetrachloride 56-23-5 [< 1.8E-04] [< 3.0E-05] [< 2.0E-04] [< 3.6E-05] [< 1.7E-04] [< 2.6E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes Chlorodibromomethane 124-48-1 [< 1.0E-04] [< 1.7E-05] [< 1.1E-04] [< 2.1E-05] [< 9.9E-05] [< 1.5E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes Chloroform 67-66-3 [< 2.3E-04] [< 3.7E-05] [< 2.4E-04] [< 4.4E-05] [< 2.4E-04] [< 3.5E-05]SW-846 0031 & 8260B DLL Standard Deviation of 8 Replicate Low Level Spikes Chloroprene 126-99-8 [< 3.3E-04] [< 5.5E-05] [< 3.6E-04] [< 6.6E-05] [< 3.2E-04] [< 4.8E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes Dibromomethane 74-95-3 [< 1.3E-04] [< 2.1E-05] [< 1.4E-04] [< 2.5E-05] [< 1.2E-04] [< 1.7E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 1,1-Dichloroethane 75-34-3 [< 1.1E-04] [< 1.8E-05] [< 1.2E-04] [< 2.2E-05] [< 1.0E-04] [< 1.6E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 1,2-Dichloroethane 107-06-2 [< 1.1E-04] [< 1.8E-05] [< 1.2E-04] [< 2.2E-05] [< 9.9E-05] [< 1.5E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 1,1-Dichloroethene 75-35-4 [< 1.9E-04] [< 3.2E-05] [< 2.1E-04] [< 3.8E-05] [< 1.7E-04] [< 2.6E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes trans-1,2-Dichloroethene 156-60-5 [< 1.9E-04] [< 3.2E-05] [< 2.1E-04] [< 3.8E-05] [< 1.7E-04] [< 2.6E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 1,2-Dichloropropane 78-87-5 [< 1.3E-04] [< 2.1E-05] [< 1.4E-04] [< 2.5E-05] [< 1.2E-04] [< 1.7E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 1,3-Dichloropropene 542-75-6 [< 2.3E-04] [< 3.8E-05] [< 2.5E-04] [< 4.6E-05] [< 2.1E-04] [< 3.2E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes Methylene chloride 75-09-2 4.1E-04 6.7E-05 3.6E-04 6.5E-05 2.2E-04 3.3E-05 SW-846 0031 & 8260B ADL Standard Deviation of 8 Replicate Low Level Spikes Tetrachloroethene 127-18-4 [< 4.3E-04] [< 7.2E-05] [< 2.1E-04] [< 3.9E-05] [< 1.7E-04] [< 2.6E-05]SW-846 0031 & 8260B DLL Standard Deviation of 8 Replicate Low Level Spikes Toluene 108-88-3 1.1E-03 1.8E-04 1.2E-03 2.2E-04 1.0E-03 1.6E-04 SW-846 0031 & 8260B ADL Standard Deviation of 8 Replicate Low Level Spikes 1,1,1-Trichloroethane 71-55-6 [< 1.3E-04] [< 2.2E-05] [< 1.4E-04] [< 2.5E-05] [< 1.2E-04] [< 1.7E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 1,1,2-Trichloroethane 79-00-5 [< 1.8E-04] [< 3.0E-05] [< 2.0E-04] [< 3.6E-05] [< 1.7E-04] [< 2.6E-05]SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes Trichloroethene 79-01-6 [< 1.3E-04] [< 2.1E-05] [< 1.5E-04] [< 2.7E-05] [< 1.2E-04] [< 1.7E-05]SW-846 0031 & 8260B DLL Standard Deviation of 8 Replicate Low Level Spikes Trichlorofluoromethane 75-69-4 [< 3.9E-04] [< 6.5E-05] [< 4.3E-04] [< 7.8E-05] [< 3.5E-04] [< 5.2E-05]SW-846 0031 & 8260B DLL Standard Deviation of 8 Replicate Low Level Spikes **Speciated Volatile Organic HAP Emission Data Facility Name and Address**  **Unit Description Process Unit ID**  **Control Device ID** Aleris Specification Alloys, Inc. 368 West Garfield Avenue Coldwater, MI 49036Thermal Chip Dryer EUALDRYER3 Torit Baghouse

**Parameter Sample 1**  **Sample 2 Sample 3**  **Unit of Measure Other Supporting**  **Information** Date of Testing 8/19/2010 8/19/2010 8/20/2010 Feed/Charge Rate 6.04 5.46 6.71 Mg/hr Afterburner Operating Temperature 1,441 1,441 1,442 degree F
Type of Charge:_______________________________________________________________________

**Compound Semi-volatile Organic HAP**  **Emission Rate Sample 1 (kg/hr) Semi-volatile Organic HAP**  **Emission Rate Sample 1 (kg/Mg of feed/charge)**  **Semi-volatile Organic HAP Emission Rate Sample 2**  **(kg/hr) Semi-volatile Organic HAP** 

**Emission Rate Sample 2 (kg/Mg of feed/charge)** **Semi-volatile Organic HAP Emission Rate Sample 3**  **(kg/hr) Semi-volatile Organic HAP** 

**Emission Rate Sample 3 (kg/Mg of feed/charge)**  **Test Method Used Detection Limit**  **Information (BDL,DLL,ADL)**  **Other Supporting Information** Acenaphthene 83-32-9 [< 4.0E-06] [< 6.6E-07] [< 1.0E-05] [< 1.9E-06] [< 8.8E-06] [< 1.3E-06] SW-846 0010 & 8270D DLLStandard Deviation of 8 Replicate Low Level Spikes Acenaphthylene 208-96-8 [< 6.1E-05] [< 1.0E-05] 1.4E-04 2.6E-05 [< 4.6E-05] [< 6.8E-06] SW-846 0010 & 8270D DLLStandard Deviation of 8 Replicate Low Level Spikes Anthracene 120-12-7 [< 1.9E-05] [< 3.2E-06] [< 2.7E-05] [< 4.9E-06] [< 8.7E-06] [< 1.3E-06] SW-846 0010 & 8270D DLLStandard Deviation of 8 Replicate Low Level Spikes Benz[a]anthracene 56-55-3 [< 2.3E-06] [< 3.8E-07] [< 2.3E-06] [< 4.2E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D BDLStandard Deviation of 8 Replicate Low Level Spikes Benzo[a]pyrene 50-32-8 [< 2.3E-06] [< 3.8E-07] [< 2.3E-06] [< 4.2E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D BDLStandard Deviation of 8 Replicate Low Level Spikes Benzo[b]fluoranthene 205-99-2 [< 2.3E-06] [< 3.8E-07] [< 2.7E-06] [< 4.9E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D DLLStandard Deviation of 8 Replicate Low Level Spikes Benzo[g,h,i]perylene 191-24-2 [< 2.3E-06] [< 3.8E-07] 2.3E-06 4.2E-07 [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D DLLStandard Deviation of 8 Replicate Low Level Spikes Benzo[k]fluoranthene 207-08-9 [< 2.3E-06] [< 3.8E-07] [< 2.3E-06] [< 4.2E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D BDLStandard Deviation of 8 Replicate Low Level Spikes Chrysene 218-01-9 [< 2.3E-06] [< 3.8E-07] 6.1E-06 1.1E-06 [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D DLLStandard Deviation of 8 Replicate Low Level Spikes Dibenz[a,h]anthracene 53-70-3 [< 2.3E-06] [< 3.8E-07] [< 2.3E-06] [< 4.2E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D BDLStandard Deviation of 8 Replicate Low Level Spikes Fluoranthene 206-44-0 1.2E-05 2.0E-06 4.3E-04 7.9E-05 [< 3.0E-05] [< 4.5E-06] SW-846 0010 & 8270D DLLStandard Deviation of 8 Replicate Low Level Spikes Fluorene 86-73-7 [< 2.4E-05] [< 3.9E-06] [< 4.9E-05] [< 9.0E-06] [< 2.4E-05] [< 3.6E-06] SW-846 0010 & 8270D DLLStandard Deviation of 8 Replicate Low Level Spikes Indeno(1,2,3-cd)pyrene 193-39-5 [< 2.3E-06] [< 3.8E-07] [< 2.3E-06] [< 4.2E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D BDLStandard Deviation of 8 Replicate Low Level Spikes Naphthalene 91-20-3 1.1E-04 1.8E-05 5.5E-04 1.0E-04 4.3E-04 6.4E-05 SW-846 0010 & 8270D ADLStandard Deviation of 8 Replicate Low Level Spikes Phenanthrene 85-01-8 1.9E-04 3.2E-05 6.7E-04 1.2E-04 1.7E-04 2.5E-05 SW-846 0010 & 8270D ADLStandard Deviation of 8 Replicate Low Level Spikes Pyrene 129-00-0 7.3E-06 1.2E-06 2.7E-04 5.0E-05 [< 2.2E-05] [< 3.2E-06] SW-846 0010 & 8270D DLLStandard Deviation of 8 Replicate Low Level Spikes **Speciated Volatile Organic HAP Emission Data**

### Facility Name and Address **Unit Description Process Unit ID**  **Control Device ID**



### Aleris Specification Alloys, Inc. 368 West Garfield Avenue Coldwater, MI 49036 Thermal Chip Dryer EUALDRYER3 Torit Baghouse

**Parameter Sample 1**  **Sample 2 Sample 3**  **Unit of Measure Other Supporting Information**  Date of Testing 8/19/2010 8/19/2010 8/20/2010 Feed/Charge Rate 

### 6.04 5.46 6.71 Mg/hr Afterburner Operating Temperature 1,441 

### 1,441 1,442 degree F Flow Rate 

### 1,343 1,278 1,232 actual M3

### /min Afterburner Test Location 

### Flow Rate 

### 828 803 783 dsM3

### /min Afterburner Test Location 

### Flow Rate 

### 1,014 1,166 1,165 actual M3

### /min Fugitive Test Location 

### Flow Rate 

### 900 1,016 1,033 dsM3

### /min Fugitive Test Location



### Emission Test Results **Constituent Composition**  **Sample 1 (%)**  **Composition Sample 2**  **(%) Composition**  **Sample 3 (%)**  **Test Method Used (ex. U.S. EPA Method 3B)**  **Other Supporting Information** O2 

### 18.0 18.0 18.3 3 Afterburner Test Location 

### CO2 

### 2.5 2.3 2.5 3 Afterburner Test Location 

### H2

### O 

### 3.3 3.3 3.6 4 Afterburner Test Location 

### O2 

### 21.0 21.0 21.0 3 Fugitive Test Location 

### CO2 

### 0.0 0.0 0.0 3 Fugitive Test Location 

### H2

### O 

### 1.8 1.4 1.5 4 Fugitive Test Location

### Facility Name and Address **Unit ID Unit Type (Chip dryer or scrap** 
**dryer /delacq /decoating kiln)**


## Aleris Specification Alloys, Inc. 368 West Garfield Avenue Coldwater, MI 49036 EUALDRYER3 Chip Dryer

**Parameter Sample 1**  **Sample 2 Sample 3**  **Unit of Measure Other Supporting**  **Information Date of Testing**  **8/19/2010 8/19/2010**  **8/20/2010** Feed/Charge Rate 

## 6.04 5.46 6.71 Mg/hr Afterburner residence time 

## NA NA NA sec Afterburner Operating Temperature 1,441 

## 1,441 1,442 degree F



## 1 8/19/2010 7:55 8/19/2010 11:28 2 8/19/2010 12:25 8/19/2010 15:56 3 8/20/2010 7:25 8/20/2010 10:55

**Run Number THC Emission Rate (kg/hr)** **THC Emission Rate (kg/Mg of feed/charge)**  **Data Flag (ADL, BDL, DDL)*******Detection Limit (ppmvw)**  

## 1 0.24 0.039 ADL 0.1 2 0.35 0.063 ADL 0.1 3 0.24 0.036 ADL 0.1 **Test End Time Run Number**  **Test Start Date Test Start Time**  **Test End Date**

# Facility Name and A**ddress Unit Description** 



# Aleris Specification Alloys, Inc. 368 West Garfield Avenue Coldwater, MI 49036
**Sample ID No._____________________ Type of Sample (Lime or Particulate):_____________________________** 
**Date Sampled Date(s) Analyzed** 

**HA P Metal**  **mg/kg** Antimony Beryllium Chromium Hexavalent chromium Lead Mercury Selenium Arsenic Cadmium Cobalt Manganese Nickel
*** Enter multiple control device ID Nos. if the lime results apply to mulitiple control devices.**

# Process Unit ID **Control Device ID***

*** Enter multiple control device ID Nos. if the lime results apply to mulitiple control devices.**