Instructions

 The EPA secondary aluminum production test program requires emissions and other test data for several pollutants. EPA understands that you own one or 

more secondary aluminum production facilities. 

 For at least one thermal chip dryer and at least one scrap dryer/delacquering kiln/decoating kiln that you own, you must perform a stack test for volatile and 

semi-volatile organic HAPs as specified in the letter and instructions accompanying this file. You should collect emissions samples for the identified pollutants 

downstream of the last relevant emissions control device (i.e., stack or other point representing the composition of the flue gases at the exit to the 

atmosphere), unless otherwise indicated. (Contact the EPA project lead for situations with multiple stacks or other complex emissions points for the unit.)

Sample and analyze the particulate matter collected in the hopper from at least one bag house used to control particulate matter from each type of affected 

source subject to 40 CFR 63, subpart RRR at your secondary aluminum production facilities. Choose bag houses that are used to control particulate matter 

from each of the six different types of affected sources (i.e.group 1 furnaces, scrap shredders, chip dryers, scrap dryers/delacquering kilns/decoating kilns, 

dross only furnaces, and rotary dross coolers) if you have these controlled affected sources at your facilities. Where more than one bag house discharges 

solids to a common hopper, a single sample will be adequate. In cases where solids from different compartments of a single bag house are collected in 

multiple hoppers or multiple collection sacks, a single composite sample will be adequate. If you have a total of three or fewer bag houses at all of your 

facilities, sample and analyze particulate matter from all of them, even if they are controlling the same type of affected source. It is not necessary to conduct 

a stack test for multi-metals analysis. 

Sample and analyze the lime used for injection to any of the lime-injected bag houses from which particulate matter samples were collected. If lime of the 

same type, obtained from the same supplier, is used for more than one lime injected bag house, a single sample will be adequate to represent the lime used 

in these bag houses.

You must report the results of these tests and chemical analyses in this Microsoft® Excel Emission Test Template. The Excel templates are specific to each 

type of pollutant. You must report the results of each test on the appropriately labeled worksheet corresponding to the specific tests and analyses conducted 

at your facilities. If more than one source was tested, you must make a copy of the worksheet and update the source ID in order to distinguish between each 

separate test of a chip dryer or scrap dryer/ delacquering kiln/decoating kiln at each facility and each different source of particulate matter. After completing 

the worksheet, you must also submit an electronic copy of the emission test report and the chemical analyses. (PDF format preferred).

Please refer to the cover letter of this packet (CAA section 114 letter) for additional testing information. Please note that you do not have to submit a test 

plan to EPA for approval prior to testing; however, we recommend that you prepare a test plan for your own use to assist in the planning and to verify that 

you address all of the testing and reporting requirements. You must follow all of the procedures as specified in the test methods, including the quality 

assurance and quality control measures, and document the results in any test report provided to EPA. 
Facility Name and Address Unit Description Process Unit ID Control Device ID

Aleris Specification Alloys, Inc. 

368 West Garfield Avenue Coldwater, MI 49036 Thermal Chip Dryer EUALDRYER3 Torit Baghouse

Parameter Sample 1 Sample 2 Sample 3 Unit of Measure

Other Supporting 

Information

Date of Testing 8/19/2010 8/19/2010 8/20/2010

Feed/Charge Rate 6.04 5.46 6.71 Mg/hr

Afterburner Operating Temperature 1,441 1,441 1,442 degree F

Type of Charge:_______________________________________________________________________

Compound

Volatile Organic HAP Emission 

Rate Sample 1 (kg/hr) 

Volatile Organic HAP Emission Rate Sample 

1 (kg/Mg of feed/charge) 

Volatile Organic HAP 

Emission Rate Sample 2 

(kg/hr) 

Volatile Organic HAP 

Emission Rate Sample 2 

(kg/Mg of feed/charge) 

Volatile Organic HAP 

Emission Rate Sample 3 

(kg/hr) 

Volatile Organic HAP 

Emission Rate Sample 3 

(kg/Mg of feed/charge) Test Method Used

Detection Limit 

Information 

(BDL,DLL,ADL) Other Supporting Information

Acrylonitrile 107-13-1 [< 8.8E-04] [< 1.5E-04] [< 9.5E-04] [< 1.7E-04] [< 7.5E-04] [< 1.1E-04] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

Benzene 71-43-2 [< 2.8E-03] [< 4.7E-04] [< 3.4E-03] [< 6.2E-04] [< 3.2E-03] [< 4.7E-04] SW-846 0031 & 8260B DLL Standard Deviation of 8 Replicate Low Level Spikes 

Bromodichloromethane 75-27-4 [< 1.1E-04] [< 1.8E-05] [< 1.2E-04] [< 2.2E-05] [< 1.0E-04] [< 1.6E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

Carbon disulfide 75-15-0 [< 2.4E-04] [< 3.9E-05] [< 2.6E-04] [< 4.7E-05] [< 2.3E-04] [< 3.5E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

Carbon tetrachloride 56-23-5 [< 1.8E-04] [< 3.0E-05] [< 2.0E-04] [< 3.6E-05] [< 1.7E-04] [< 2.6E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

Chlorodibromomethane 124-48-1 [< 1.0E-04] [< 1.7E-05] [< 1.1E-04] [< 2.1E-05] [< 9.9E-05] [< 1.5E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

Chloroform 67-66-3 [< 2.3E-04] [< 3.7E-05] [< 2.4E-04] [< 4.4E-05] [< 2.4E-04] [< 3.5E-05] SW-846 0031 & 8260B DLL Standard Deviation of 8 Replicate Low Level Spikes 

Chloroprene 126-99-8 [< 3.3E-04] [< 5.5E-05] [< 3.6E-04] [< 6.6E-05] [< 3.2E-04] [< 4.8E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

Dibromomethane 74-95-3 [< 1.3E-04] [< 2.1E-05] [< 1.4E-04] [< 2.5E-05] [< 1.2E-04] [< 1.7E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

1,1-Dichloroethane 75-34-3 [< 1.1E-04] [< 1.8E-05] [< 1.2E-04] [< 2.2E-05] [< 1.0E-04] [< 1.6E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

1,2-Dichloroethane 107-06-2 [< 1.1E-04] [< 1.8E-05] [< 1.2E-04] [< 2.2E-05] [< 9.9E-05] [< 1.5E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

1,1-Dichloroethene 75-35-4 [< 1.9E-04] [< 3.2E-05] [< 2.1E-04] [< 3.8E-05] [< 1.7E-04] [< 2.6E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

trans-1,2-Dichloroethene 156-60-5 [< 1.9E-04] [< 3.2E-05] [< 2.1E-04] [< 3.8E-05] [< 1.7E-04] [< 2.6E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

1,2-Dichloropropane 78-87-5 [< 1.3E-04] [< 2.1E-05] [< 1.4E-04] [< 2.5E-05] [< 1.2E-04] [< 1.7E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

1,3-Dichloropropene 542-75-6 [< 2.3E-04] [< 3.8E-05] [< 2.5E-04] [< 4.6E-05] [< 2.1E-04] [< 3.2E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

Methylene chloride 75-09-2 4.1E-04 6.7E-05 3.6E-04 6.5E-05 2.2E-04 3.3E-05 SW-846 0031 & 8260B ADL Standard Deviation of 8 Replicate Low Level Spikes 

Tetrachloroethene 127-18-4 [< 4.3E-04] [< 7.2E-05] [< 2.1E-04] [< 3.9E-05] [< 1.7E-04] [< 2.6E-05] SW-846 0031 & 8260B DLL Standard Deviation of 8 Replicate Low Level Spikes 

Toluene 108-88-3 1.1E-03 1.8E-04 1.2E-03 2.2E-04 1.0E-03 1.6E-04 SW-846 0031 & 8260B ADL Standard Deviation of 8 Replicate Low Level Spikes 

1,1,1-Trichloroethane 71-55-6 [< 1.3E-04] [< 2.2E-05] [< 1.4E-04] [< 2.5E-05] [< 1.2E-04] [< 1.7E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

1,1,2-Trichloroethane 79-00-5 [< 1.8E-04] [< 3.0E-05] [< 2.0E-04] [< 3.6E-05] [< 1.7E-04] [< 2.6E-05] SW-846 0031 & 8260B BDL Standard Deviation of 8 Replicate Low Level Spikes 

Trichloroethene 79-01-6 [< 1.3E-04] [< 2.1E-05] [< 1.5E-04] [< 2.7E-05] [< 1.2E-04] [< 1.7E-05] SW-846 0031 & 8260B DLL Standard Deviation of 8 Replicate Low Level Spikes 

Trichlorofluoromethane 75-69-4 [< 3.9E-04] [< 6.5E-05] [< 4.3E-04] [< 7.8E-05] [< 3.5E-04] [< 5.2E-05] SW-846 0031 & 8260B DLL Standard Deviation of 8 Replicate Low Level Spikes 

Speciated Volatile Organic HAP Emission Data
Facility Name and Address Unit Description Process Unit ID Control Device ID

Aleris Specification Alloys, Inc. 

368 West Garfield Avenue Coldwater, MI 49036 Thermal Chip Dryer EUALDRYER3 Torit Baghouse

Parameter Sample 1 Sample 2 Sample 3 Unit of Measure

Other Supporting 

Information

Date of Testing 8/19/2010 8/19/2010 8/20/2010

Feed/Charge Rate 6.04 5.46 6.71 Mg/hr

Afterburner Operating Temperature 1,441 1,441 1,442 degree F

Type of Charge:_______________________________________________________________________

Compound

Semi-volatile Organic HAP 

Emission Rate Sample 1 (kg/hr) 

Semi-volatile Organic HAP 

Emission Rate Sample 1 (kg/Mg 

of feed/charge) 

Semi-volatile Organic HAP 

Emission Rate Sample 2 

(kg/hr) 

Semi-volatile Organic HAP 

Emission Rate Sample 2 

(kg/Mg of feed/charge) 

Semi-volatile Organic HAP 

Emission Rate Sample 3 

(kg/hr) 

Semi-volatile Organic HAP 

Emission Rate Sample 3 

(kg/Mg of feed/charge) Test Method Used

Detection Limit 

Information 

(BDL,DLL,ADL) Other Supporting Information

Acenaphthene 83-32-9 [< 4.0E-06] [< 6.6E-07] [< 1.0E-05] [< 1.9E-06] [< 8.8E-06] [< 1.3E-06] SW-846 0010 & 8270D DLL Standard Deviation of 8 Replicate Low Level Spikes 

Acenaphthylene 208-96-8 [< 6.1E-05] [< 1.0E-05] 1.4E-04 2.6E-05 [< 4.6E-05] [< 6.8E-06] SW-846 0010 & 8270D DLL Standard Deviation of 8 Replicate Low Level Spikes 

Anthracene 120-12-7 [< 1.9E-05] [< 3.2E-06] [< 2.7E-05] [< 4.9E-06] [< 8.7E-06] [< 1.3E-06] SW-846 0010 & 8270D DLL Standard Deviation of 8 Replicate Low Level Spikes 

Benz[a]anthracene 56-55-3 [< 2.3E-06] [< 3.8E-07] [< 2.3E-06] [< 4.2E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D BDL Standard Deviation of 8 Replicate Low Level Spikes 

Benzo[a]pyrene 50-32-8 [< 2.3E-06] [< 3.8E-07] [< 2.3E-06] [< 4.2E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D BDL Standard Deviation of 8 Replicate Low Level Spikes 

Benzo[b]fluoranthene 205-99-2 [< 2.3E-06] [< 3.8E-07] [< 2.7E-06] [< 4.9E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D DLL Standard Deviation of 8 Replicate Low Level Spikes 

Benzo[g,h,i]perylene 191-24-2 [< 2.3E-06] [< 3.8E-07] 2.3E-06 4.2E-07 [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D DLL Standard Deviation of 8 Replicate Low Level Spikes 

Benzo[k]fluoranthene 207-08-9 [< 2.3E-06] [< 3.8E-07] [< 2.3E-06] [< 4.2E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D BDL Standard Deviation of 8 Replicate Low Level Spikes 

Chrysene 218-01-9 [< 2.3E-06] [< 3.8E-07] 6.1E-06 1.1E-06 [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D DLL Standard Deviation of 8 Replicate Low Level Spikes 

Dibenz[a,h]anthracene 53-70-3 [< 2.3E-06] [< 3.8E-07] [< 2.3E-06] [< 4.2E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D BDL Standard Deviation of 8 Replicate Low Level Spikes 

Fluoranthene 206-44-0 1.2E-05 2.0E-06 4.3E-04 7.9E-05 [< 3.0E-05] [< 4.5E-06] SW-846 0010 & 8270D DLL Standard Deviation of 8 Replicate Low Level Spikes 

Fluorene 86-73-7 [< 2.4E-05] [< 3.9E-06] [< 4.9E-05] [< 9.0E-06] [< 2.4E-05] [< 3.6E-06] SW-846 0010 & 8270D DLL Standard Deviation of 8 Replicate Low Level Spikes 

Indeno(1,2,3-cd)pyrene 193-39-5 [< 2.3E-06] [< 3.8E-07] [< 2.3E-06] [< 4.2E-07] [< 2.3E-06] [< 3.4E-07] SW-846 0010 & 8270D BDL Standard Deviation of 8 Replicate Low Level Spikes 

Naphthalene 91-20-3 1.1E-04 1.8E-05 5.5E-04 1.0E-04 4.3E-04 6.4E-05 SW-846 0010 & 8270D ADL Standard Deviation of 8 Replicate Low Level Spikes 

Phenanthrene 85-01-8 1.9E-04 3.2E-05 6.7E-04 1.2E-04 1.7E-04 2.5E-05 SW-846 0010 & 8270D ADL Standard Deviation of 8 Replicate Low Level Spikes 

Pyrene 129-00-0 7.3E-06 1.2E-06 2.7E-04 5.0E-05 [< 2.2E-05] [< 3.2E-06] SW-846 0010 & 8270D DLL Standard Deviation of 8 Replicate Low Level Spikes 

Speciated Volatile Organic HAP Emission Data
Facility Name and Address Unit Description Process Unit ID Control Device ID

Aleris Specification Alloys, Inc. 

368 West Garfield Avenue Coldwater, MI 49036 Thermal Chip Dryer EUALDRYER3 Torit Baghouse

Parameter Sample 1 Sample 2 Sample 3 Unit of Measure Other Supporting Information

Date of Testing 8/19/2010 8/19/2010 8/20/2010

Feed/Charge Rate 6.04 5.46 6.71 Mg/hr

Afterburner Operating Temperature 1,441 1,441 1,442 degree F

Flow Rate 1,343 1,278 1,232 actual M3/min Afterburner Test Location

Flow Rate 828 803 783 dsM3/min Afterburner Test Location

Flow Rate 1,014 1,166 1,165 actual M3/min Fugitive Test Location

Flow Rate 900 1,016 1,033 dsM3/min Fugitive Test Location

Emission Test Results Constituent

Composition 

Sample 1

 (%)

Composition 

Sample 2

 (%)

Composition 

Sample 3

 (%)

Test Method Used

(ex. U.S. EPA Method 3B) Other Supporting Information

O2 18.0 18.0 18.3 3 Afterburner Test Location

CO2 2.5 2.3 2.5 3 Afterburner Test Location

H2O 3.3 3.3 3.6 4 Afterburner Test Location

O2 21.0 21.0 21.0 3 Fugitive Test Location

CO2 0.0 0.0 0.0 3 Fugitive Test Location

H2O 1.8 1.4 1.5 4 Fugitive Test Location
Facility Name and Address Unit ID 

Unit Type (Chip dryer or scrap 

dryer /delacq /decoating kiln)

Aleris Specification Alloys, Inc. 

368 West Garfield Avenue Coldwater, MI 49036 EUALDRYER3 Chip Dryer

Parameter Sample 1 Sample 2 Sample 3 Unit of Measure

Other Supporting 

Information

Date of Testing 8/19/2010 8/19/2010 8/20/2010

Feed/Charge Rate 6.04 5.46 6.71 Mg/hr

Afterburner residence time NA NA NA sec

Afterburner Operating Temperature 1,441 1,441 1,442 degree F

1 8/19/2010 7:55 8/19/2010 11:28

2 8/19/2010 12:25 8/19/2010 15:56

3 8/20/2010 7:25 8/20/2010 10:55

Run Number THC Emission Rate (kg/hr) 

THC Emission Rate (kg/Mg of 

feed/charge) Data Flag (ADL, BDL, DDL)*** Detection Limit 

(ppmvw)

1 0.24 0.039 ADL 0.1

2 0.35 0.063 ADL 0.1

3 0.24 0.036 ADL 0.1

Run Number Test Start Date Test Start Time Test End Date Test End Time
Facility Name and Address Unit Description

Aleris Specification Alloys, Inc. 368 West Garfield Avenue Coldwater, MI 49036

Sample ID No._____________________

Type of Sample (Lime or Particulate):_____________________________

Date Sampled Date(s) Analyzed

HAP Metal mg/kg

Antimony

Beryllium

Chromium

Hexavalent chromium

Lead

Mercury

Selenium

Arsenic

Cadmium

Cobalt

Manganese

Nickel

* Enter multiple control device ID Nos. if the lime results apply to mulitiple control devices.
Process Unit ID Control Device ID*

control devices.