# Patent

## Title
Electrophotographic photosensitive member, method for manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus

## Abstract

An electrophotographic photosensitive member has a support, a charge generation layer, and a charge transport layer in this order, the charge transport layer containing a charge transport material. The charge transport layer is a surface layer of the electrophotographic photosensitive member and contains a polycarbonate resin having a structural unit selected from group A and a structural unit selected from group B (groups A and B defined in the disclosure).

## Background
BACKGROUND OF THE INVENTION
Field of the Invention
The present invention relates to an electrophotographic photosensitive member, a method for manufacturing this electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus incorporating this electrophotographic photosensitive member.
Description of the Related Art
Electrophotographic photosensitive members having a charge transport layer as a surface layer are required to be resistant to wear enough to withstand repeated use. To improve the wear resistance of the charge transport layer, researchers have been studying the structure of resins that are used as binders in the charge transport layer, polycarbonate resins in particular (Japanese Patent Laid-Open Nos. 2011-26574, 5-113680, 4-149557, 6-11877, and 2005-338446)
SUMMARY OF THE INVENTION
An aspect of the invention provides an electrophotographic photosensitive member with which fog can be very effectively reduced. Some other aspects of the invention provide a method for manufacturing such an electrophotographic photosensitive member and a process cartridge and an electrophotographic apparatus incorporating such an electrophotographic photosensitive member.
An electrophotographic photosensitive member according to an aspect of the invention has a support, a charge generation layer, and a charge transport layer in this order, the charge transport layer containing a charge transport material. The charge transport layer is a surface layer of the electrophotographic photosensitive member and contains a polycarbonate resin having a structural unit selected from group A and a structural unit selected from group B.
The group A includes structural units represented by formulae (101) and (102).




(In formula (101), R211 to R214 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. R213 represents an alkyl, aryl, or alkoxy group. R216 and R217 each independently represent an alkyl group containing 1 to 9 carbon atoms. i211 represents an integer of 0 to 3. R215 and (CH2)iCHR216R217 are different groups.)




(In formula (102), R221 to R224 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. R225 and R226 each independently represent an alkyl group containing 1 to 9 carbon atoms. R225 and R226 are different groups. i221 represents and integer of 0 to 3.)
The group b includes structural units represented by formulae (104), (105), and (106).




(In formula (104), R241 to R244 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. X represents a single bond, an oxygen atom, a sulfur atom, or a sulfonyl group.)




(In formula (105), R251 to R254 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. R236 and R237 each independently represent a hydrogen atom or an alkyl, aryl, or halogenated alkyl group.)




(In formula (106), R261 to R264 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. W represents a cycloalkylidene group containing 5 to 12 carbon atoms.)
Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings.



BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 illustrates an example of a schematic structure of an electrophotographic apparatus installed with a process cartridge that incorporates an electrophotographic photosensitive member.
FIG. 2 is a powder X-ray diffraction pattern of a crystalline hydroxygallium phthalocyanine used in Examples.
FIG. 3 is a powder X-ray diffraction pattern of a crystalline chlorogallium phthalocyanine used in Examples.
FIG. 4 is a powder X-ray diffraction pattern of a crystalline hydroxygallium phthalocyanine used in Examples.
FIG. 5 is a diagram for describing a 1-dot “knight move in chess” pattern image.



DESCRIPTION OF THE EMBODIMENTS
Through research, the inventors found the following fact. That is, when an electrophotographic photosensitive member having a charge transport layer as a surface, layer is used repeatedly, the charge transport layer becomes thinner due to wear. This leads to increased electric field intensity, causing the technical problem called “fog” on images, i.e., a defect whereby a small amount of toner is developed in unintended areas of the images.
The known electrophotographic photosensitive members according to the aforementioned publications, having a charge transport layer that contains a no resin as a binder, help to reduce the fog, but not to the extent that the recent high demand for long-life electrophotographic photosensitive members would be fully satisfied.
An aspect of the invention therefore provides an electrophotographic photosensitive member with which fog can be very effectively reduced. Some other aspects of the invention provide a method for manufacturing such an electrophotographic photosensitive member and a process cartridge and an electrophotographic apparatus incorporating such an electrophotographic photosensitive member.
The following describes certain aspects of the invention by providing some preferred embodiments. Studies conducted by the inventors have revealed that the use of a particular kind of polycarbonate resin in a charge transport layer of an electrophotographic photosensitive member significantly improves the mechanical strength of the photosensitive member and leads to effective reduction of fog. To be more specific, an electrophotographic photosensitive member according to an aspect of the invention has a support, a charge generation layer, and a charge transport layer in this order, the charge transport layer containing a charge transport material. The charge transport layer is a surface layer of the electrophotographic photosensitive member and contains a polycarbonate resin having a structural unit selected from group A and a structural unit selected from group B.
The group A includes structural units represented by formulae (101) and (102).




In formula (101), R211 to R214 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. R215 represents an alkyl, aryl, or alkoxy group. R216 and R217 each independently represent a substituted or unsubstituted alkyl group containing 1 to 9 carbon atoms. i211 represents an integer of 0 to 3. When i211 is 0, this site is a single bond. R215 and (CH2)iCHR216R217 are different groups.




In formula (102), R221 to R224 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. R225 and R226 each independently represent a substituted or unsubstituted alkyl group containing 1 to 9 carbon atoms. R225 and R226 are different groups. i221 represents an integer of 0 to 3. When i221 is 0, this site is a single bond.
The group B includes structural units represented by formulae (104), (105), and (106).




In formula (104), R241 to R244 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. X represents a single bond, an oxygen atom, a sulfur atom, or a sulfonyl group.




In formula (105), R251 to R254 independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. R256 and R257 each independently represent a hydrogen atom or an alkyl, aryl, or halogenated alkyl group. The aryl group may be substituted with an alkyl or alkoxy group or a halogen atom.




In formula (106), R261 to R264 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. W represents a cycloalkylidene group containing 5 to 12 carbon atoms. The cycloalkylidene group may be substituted with an alkyl group.
This polycarbonate resin having a structural unit selected from group A and a structural unit selected from group B can be synthesized using, for example, one of the following two processes. The first is to allow at least one bisphenol compound selected from formulae (107) and (108) and at least one bisphenol compound selected from formulae (110) to (112) to react directly with phosgene (a phosgene process). The second is to transesterify the at least two bisphenol compounds and a bisaryl carbonate, such as diphenyl carbonate, di-p-tolyl carbonate, phenyl-p-tolyl carbonate, di-p-chlorophenyl carbonate, or dinaphthyl carbonate (a transesterification process).
In the phosgene process, the at least two bisphenol compounds and phosgene are usually reacted in the presence of an acid-binding agent and a solvent. The acid-binding agent can be pyridine, an alkali metal hydroxide, such as potassium hydroxide or sodium hydroxide, or similar. The solvent can be methylene chloride, chloroform, or similar. A catalyst and/or a molecular-weight modifier may be added in order to accelerate the condensation polymerization. The catalyst can be triethylamine or any other tertiary amine, a quaternary ammonium salt, or similar. The molecular-weight modifier can be phenol, p-cumylphenol, t-butylphenol, a phenol substituted with a long-chain alkyl group, or similar mono functional compounds.
The synthesis of the polycarbonate resin may involve an antioxidant, such as sodium sulfite or hydrosulfide, and/or a branching agent, such as phloroglucin or isatin bisphenol. The polycarbonate resin can be synthesized at a temperature of 0° C. to 150° C., preferably 5° C. to 40° C. The duration of the reaction depends on the reaction temperature but can typically be in the range of 0.5 minutes to 10 hours, preferably 1 minute to 2 hours. During the reaction, the pH of the reaction system can be 10 or more.
Here are some specific examples of bisphenol compounds that can be used for synthesis.

    (1) At least one bisphenol compound selected from formulae (107) and (108)






In formula (107) R211 to R214 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. R215 represents an alkyl, aryl, or alkoxy group. R216 and R217 each independently represent a substituted or unsubstituted alkyl group containing 1 to 9 carbon atoms. i211 represents an integer of 0 to 3. When i211 is 0, this site is a single bond. R215 and (CH2)iCHR216R217 are different groups.




In formula (108), R221 to R224 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. R225 and R226 each independently represent a substituted or unsubstituted alkyl group containing 1 to 9 carbon atoms. R225 and R226 different groups. i221 represents an integer of 0 to 3. When i221 is 0, this site is a single bond.
Examples of bisphenol compounds represented by general formulae (107) and (108) include 2,2-bis(4-hydroxyphenyl)-4-methyl pentane, 2,2-bis(4-hydroxyphenyl)-5-methyl hexane, 3,3-bis(4-hydroxyphenyl)-5-methyl heptane, 2,2-bis(4-hydroxyphenyl)-3-methyl butane, 1,1-bis(4-hydroxyphenyl)-1-phenyl-2-methyl propane, 1,1-bis(4-hydroxyphenyl)-1-phenyl-3-methyl butane, 2,2-bis(4-hydroxyphenyl)-6-methyl heptane, 1,1-bis(4-hydroxyphenyl)-2-ethyl hexane, and 1,1-bis(4-hydroxyphenyl)-1-phenyl-2-methyl pentane. A combination of two or more of these compounds can also be used.
(2) At least one bisphenol compound selected from formulae (110) to (112)




In formula (110), R241 to R244 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. X represents a single bond, an oxygen atom, a sulfur atom, or a sulfonyl group.




In formula (111), R251 to R254 independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. R256 and R257 each independently represent a hydrogen atom or an alkyl, aryl, or halogenated alkyl group. The aryl group may be substituted with an alkyl or alkoxy group or a halogen atom.




In formula (112), R261 to R264 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group. W represents a cycloalkylidene group containing 5 to 12 carbon atoms. The cycloalkylidene group may be substituted with an alkyl group.
Examples of bisphenol compounds represented by formulae (110) to (112) include 4,4′dihydroxybiphenyl, 4,4′′-dihydroxy-3,3′-dimethyl biphenyl, 4,4′-dihydroxy-2,2′-dimethyl biphenyl, 4,4′-dihydroxy-3,3′,5-trimethyl biphenyl, 4,4′-dihydroxy-3,3′,5,5′-tetramethyl biphenyl, 4,4′-dihydroxy-3,3′-dibutyl biphenyl, 4,4′-dihydroxy-3,3′-dicyclohexyl biphenyl, 3,3′-difluoro-4,4′-dihydroxybiphenyl, 4,4′-dihydroxy-3,3′-diphenyl biphenyl, 1,1-bis(4-hydroxyphenyl)ethane, 1,1-bis(3-methyl-4-hydroxyphenyl)ethane, 1,1-bis(3-fluoro-4-hydroxyphenyl)ethane, 1,1-bis(2-tert-butyl-4-hydroxy-3-methyl phenyl)ethane, 1,2-bis(4-hydroxyphenyl)ethane, 1,2-bis(3-methyl-4-hydroxyphenyl)ethane, 2,2-bis(4-hydroxyphenyl)propane, 2,2-bis(3-methyl-4-hydroxyphenyl)propane, 2,2-bis(3-cyclohexyl-4-hydroxyphenyl)propane, 2,2-bis(3-phenyl-4-hydroxyphenyl)propane, 2,2-bis(3,5-dimethyl-4-hydroxyphenyl)propane, 2,2-bis3-fluoro-4-hydroxyphenyl)propane, 2,2-bis(3-chloro-4-hydroxyphenyl)propane, 2,2-bis(3-bromo-4-hydroxyphenyl)propane, 2,2-bis(3,5-difluoro-4-hydroxyphenyl)propane, 2,2-bis(3,5-dichloro-4-hydroxyphenyl)propane, 2,2-bis(3,5-dibromo-4-hydroxyphenyl)propane, 2,2-bis(2-tert-butyl-4-hydroxy-3-methyl phenyl)propane, 2,2-bis(4-hydroxyphenyl)hexafluoropropane, 2,2-bis(3-methyl-4-hydroxyphenyl)hexafluoropropane, 2,2-bis(3,5-dimethyl-4-hydroxyphenyl)hexafluoropropane, 2,2-bis(3-phenyl-4-hydroxyphenyl)hexafluoropropane, 2,2-bis(3-fluoro-4-hydroxyphenyl)hexafluoropropane, 2,2-bis(3-chloro-4-hydroxyphenyl)hexafluoropropane, 1,1-bis(4-hydroxyphenyl)cyclohexane, 1,1-bis(3-methyl-4-hydroxyphenyl)cyclohexane, 1,1-bis(3-cyclo-4-hydroxyphenyl)cyclohexane, 1,1-bis(3-phenyl-4-hydroxyphenyl)cyclohexane, 1,1-bis(3,5-dimethyl-4-hydroxyphenyl)cyclohexane, 1,1-bis(3-fluoro-hydroxyphenyl)cyclohexane, 1,1-bis(3-chloro-4-hydroxyphenyl)cyclohexane, 1,1-bis(3-bromo-4-hydroxyphenyl)cyclohexane, 1,1-bis(3,5-difluoro-4-hydroxyphenyl)cyclohexane, 1,1-bis(3,5-dichloro-4-hydroxyphenyl)cyclohexane, 1,1-bis(3,5-dibromo-4-hydroxyphenyl)cyclohexane, 1,1-bis(2-tert-butyl-4-hydroxy-3-methyl phenyl)cyclohexane, bis(4-hydroxyphenyl)sulfone, 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethyl cyclohexane, 1,1-bis(4-hydroxyphenyl)cyclopentane, 1,1-bis(4-hydroxyphenyl)-1-phenyl ethane, bis(4-hydroxyphenyl)diphenyl methane, 9,9-bis(4-hydroxyphenyl)-fluorene, and 2,2-bis(4-hydroxyphenyl)butane. A combination of two or more of these compounds can also be used Structural unit selected from group A
The use of a polycarbonate resin having any of the structural units represented by formulae (A-101) to (A-105), as compared to others selected from group PI, leads to more effective reduction of fog and better electrical characteristics. Polycarbonate resins having any of these structural units, while in the charge transport layer, will keep a constant intermolecular distance and a constant distance from the charge transport material, improving mechanical strength and electrical characteristics.




The use of a polycarbonate resin having any of the structural units represented by (A-201) to (A-205), as compared to others selected from group A, is effective in improving the storage stability of the coating liquid for the formation of the charge transport layer, the prevention of photomemories, and electrical characteristics after repeated use. Polycarbonate resins having any of these structural units will exhibit improved solubility in the solvent of the coating liquid for the formation of the charge transport layer. Furthermore, polycarbonate resins having any of these structural units, while in the charge transport layer, will keep a constant distance from the charge transport material, improving electrical characteristics. A photomemory is a defect caused by the retention of light-generated carriers in a photosensitive layer of an electrophotographic photosensitive member and occurs when an electrophotographic photosensitive member is exposed to light, such as from a fluorescent lamp, in association with maintenance of a process cartridge or electrophotographic apparatus after repeated use. It an electrophotographic photosensitive member in this state is used to produce an image, the difference in electrical potential between the exposed and unexposed area appears as uneven density in the resulting image.




The use of a polycarbonate resin having any of the structural units represented by (A-401) to (A-405), as compared to others selected from group A, is effective in improving the storage stability of the coating liquid for the formation of the charge transport layer and the prevention of photomemories. Polycarbonate resins having any of these structural units will exhibit improved solubility in the solvent of the coating liquid for the formation of the charge transport layer.




Structural Unit Selected from Group B

The use of a polycarbonate resin having any of the structural units represented by formulae (B-101) to (B-105), as compared to others selected from group B, leads to more effective reduction of fog and better electrical characteristics. Polycarbonate resins having any of these structural units, while in the charge transport layer, will keep a constant intermolecular distance and a constant distance from the charge transport material, improving mechanical strength and electrical characteristics.




The use of a polycarbonate resin having any of the structural units represented by formulae (B-201) to (B-205), as compared to others selected from group B, leads to more effective reduction of fog. Polycarbonate resins having any of these structural units will be, while in the charge transport layer, densely packed with short intermolecular distances, improving mechanical strength.




The use of a polycarbonate resin having any of the structural units represented by (B-301) to (B-308), as compared to others selected from group B, is effective in improving the storage stability of the coating liquid for the formation of the charge transport layer, the prevention of photomemories, and electrical characteristics after repeated use. Polycarbonate resins having any of these structural units will exhibit improved solubility in the solvent of the coating liquid for the formation of the charge transport layer. Furthermore, polycarbonate resins having any of these structural units, while in the charge transport layer, will keep a constant distance from the charge transport material, improving electrical characteristics.




The use of a polycarbonate resin having any of the structural units represented by (B-401) to (B-405), as compared to others selected from group B, is effective in improving the storage stability of the coating liquid for the formation of the charge transport layer, the prevention of photomemories, and electrical characteristics after repeated use. Polycarbonate resins having any of these structural units will exhibit improved solubility in the solvent of the coating liquid for the formation of the charge transport layer. Furthermore, polycarbonate resins having any of these structural units, while in the charge transport layer, will keep a constant distance from the charge transport material, improving electrical characteristics.




The proportion of the structural unit selected from group A in the polycarbonate resin can be 20 mol % or more and 70 mol % or less, preferably 25 mol % or more and 49 mol % or less.
In an embodiment of the invention, the weight-average molecular weight (Mw) of the polycarbonate resin can be 30,000 or more and 100,000 or less, preferably 40,000 or more and 80,000 or less. If the weight-average molecular weight of the polycarbonate resin is less than 30,000, the reduction of fog may be insufficient due to low mechanical strength. If the weight-average molecular weight of the polycarbonate resin is more than 100,000, the coating liquid for the formation of the charge transport layer may lack storage stability. In Examples below, the weight-average molecular weights of the resins are polystyrene equivalents measured using gel permeation chromatography (GPC) [on Alliance HPLC system (Waters)] under the following conditions: two Shodex KF-805L columns (Showa Denko), 0.25 w/v% chloroform solution as sample, chloroform at 1 ml/min as eluent, and UV detection at 254 nm.
The intrinsic viscosity of the polycarbonate resin can be in the range of 0.3 dL/g to 2.0 dL/g.
The relative dielectric constant c of a polycarbonate resin can be determined according to the Clausius-Mossotti equation that follows.

K=(4π/3)×(α/V)

ε=(1+2K)/(1−K)

In this equation, V is the volume of the molecule in its stable structure obtained after structural optimization using density functional calculations E3LYP/6-31G(d,p), and α is the polarizability according to a restricted Hartree-Fock calculation (using the basis function 6-31G(d,p)) in this post-optimization stable structure. For polycarbonate resins having multiple structural units (e.g., copolymers), the relative dielectric constant values of the individual structural units multiplied by their respective proportions are totaled up. For example, exemplified compound 1001 has relative dielectric constant values of 2.12 and 2.11 in structural units (A-101) and (B-101), respectively. The relative dielectric constant of exemplified compound 1001 is therefore 2.12 based on the proportions of the structural units. In an embodiment of the invention, the relative dielectric constant 6 can be 2.15 or less, preferably 2.13 or less.
A relative dielectric constant of 2.15 or less leads to better response at high speeds, presumably for the following reason. The term. “response at high speeds” means that the density of an image produced is comparable between normal and faster process speeds in the image formation process. Altering the process speed usually leads to a change in the amount of light the electrophotographic photosensitive member receives. Even if the amount of light is controlled to achieve constant light exposure of the electrophotographic photosensitive member, different process speeds can result in different image densities. This difference in density becomes more significant in faster processes because the time from exposure to development shortens with increasing process speed. One cause is reciprocal failure, which necessitates complicated control in order to equalize the image density. The inventors, however, presume that reciprocal failure is not the only cause. Another cause is, in the opinion of the inventors, a difference in the rate of light decay of the surface potential of the electrophotographic photosensitive member that occurs during development, a stage in the exposure and development process the electrophotographic photosensitive member undergoes to form an image. To be more specific, even if the electrophotographic photosensitive member has equal surface potentials at the time of development, a difference in the rate of light decay of its surface potential will lead to a difference in the ability of the photosensitive member to develop toner, resulting in variations in density between the images produced. Charge generated in a charge generation layer is injected into a charge transport layer and then is transported to the surface of the electrophotographic photosensitive member by travelling in the charge transport layer. Some amount of charge reaches the surface of the electrophotographic photosensitive member in a short time, but some other amount of charge requires a relatively long time to arrive (residual charge). In view of the fact that the light decay during development occurs immediately after the photoresponse in the charging and exposure process, the rate of light decay should be influenced by the behavior of charge carriers in the charge transport layer toward the residual charge at low electric-field intensity. When the relative dielectric constant of the polycarbonate resin is 2.15 or less, the electrophotographic photosensitive member will not greatly change its capacity to put out residual charge at low electric-field intensity over time, and its rate of light decay during development will therefore be low. Furthermore, the inventors believe that when the relative dielectric constant of the polycarbonate resin is 2.15 or less, the ability of the electrophotographic photosensitive member to develop toner is not very sensitive to unevenness in the surface potential of the electrophotographic photosensitive member, and the density of an image produced is thus comparable between normal and faster process speeds in the image formation process.
When the relative dielectric constant of the polycarbonate resin is 2.15 or less, moreover, the intensity of an electric field applied to the charge transport layer will act favorably on the transport of charge through the charge transport layer and the injection of charge from a charge generation layer into the charge transport layer, making the electrophotographic photosensitive member excellent in terms of the prevention of photomemories after repeated use.
Specific Examples of Polycarbonate Resins
Tables 1 to 12 present specific examples of polycarbonate resins having a structural unit selected from group A and a structural unit selected from group B, along with their relative dielectric constant values.







TABLE 1







Specific examples of polycarbonate resins











Group A
Group B














Structural
Proportion
Structural
Proportion
Dielectric


Exemplified compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified compound 1001
A-101
49
B-101
51
2.12


Exemplified compound 1002
A-101
80
B-101
20
2.12


Exemplified compound 1003
A-101
35
B-101
65
2.11


Exemplified compound 1004
A-101
20
B-101
80
2.11


Exemplified compound 1005
A-101
49
B-102
51
2.17


Exemplified compound 1006
A-101
80
B-102
20
2.14


Exemplified compound 1007
A-101
35
B-102
65
2.18


Exemplified compound 1008
A-101
20
B-102
80
2.19


Exemplified compound 1009
A-101
49
B-103
51
2.11


Exemplified compound 1010
A-101
80
B-103
20
2.12


Exemplified compound 1011
A-101
35
B-103
65
2.11


Exemplified compound 1012
A-101
20
B-103
80
2.11


Exemplified compound 1013
A-101
49
B-104
51
2.09


Exemplified compound 1014
A-101
80
B-104
20
2.11


Exemplified compound 1015
A-101
35
B-104
65
2.09


Exemplified compound 1016
A-101
20
B-104
80
2.08


Exemplified compound 1017
A-101
49
B-105
51
2.11


Exemplified compound 1018
A-101
80
B-105
20
2.12


Exemplified compound 1019
A-101
35
B-105
65
2.10


Exemplified compound 1020
A-101
20
B-105
80
2.10


Exemplified compound 1021
A-101
49
B-201
51
2.16


Exemplified compound 1022
A-101
80
B-201
20
2.14


Exemplified compound 1023
A-101
35
B-201
65
2.17


Exemplified compound 1024
A-101
20
B-201
80
2.19


Exemplified compound 1025
A-101
49
B-202
51
2.11


Exemplified compound 1026
A-101
80
B-202
20
2.11


Exemplified compound 1027
A-101
35
B-202
65
2.10


Exemplified compound 1028
A-101
20
B-202
80
2.10


Exemplified compound 1029
A-101
49
B-203
51
2.14


Exemplified compound 1030
A-101
80
B-203
20
2.13


Exemplified compound 1031
A-101
35
B-203
65
2.14


Exemplified compound 1032
A-101
20
B-203
80
2.15


Exemplified compound 1033
A-101
49
B-204
51
2.10


Exemplified compound 1034
A-101
80
B-204
20
2.11


Exemplified compound 1035
A-101
35
B-204
65
2.09


Exemplified compound 1036
A-101
20
B-204
80
2.08


Exemplified compound 1037
A-101
49
B-205
51
2.14


Exemplified compound 1038
A-101
80
B-205
20
2.13


Exemplified compound 1039
A-101
35
B-205
65
2.14


Exemplified compound 1040
A-101
20
B-205
80
2.14


Exemplified compound 1041
A-101
49
B-301
51
2.13


Exemplified compound 1042
A-101
80
B-301
20
2.12


Exemplified compound 1043
A-101
35
B-301
65
2.13


Exemplified compound 1044
A-101
20
B-301
80
2.13


Exemplified compound 1045
A-101
49
B-302
51
2.13


Exemplified compound 1046
A-101
80
B-302
20
2.12


Exemplified compound 1047
A-101
35
B-302
65
2.13


Exemplified compound 1048
A-101
20
B-302
80
2.13


Exemplified compound 1049
A-101
49
B-303
51
2.14


Exemplified compound 1050
A-101
80
B-303
20
2.13


Exemplified compound 1051
A-101
35
B-303
65
2.14


Exemplified compound 1052
A-101
20
B-303
80
2.15


Exemplified compound 1053
A-101
49
B-304
51
2.13


Exemplified compound 1054
A-101
80
B-304
20
2.12


Exemplified compound 1055
A-101
35
B-304
65
2.13


Exemplified compound 1056
A-101
20
B-304
80
2.14


Exemplified compound 1057
A-101
49
B-305
51
2.08


Exemplified compound 1058
A-101
80
B-305
20
2.10


Exemplified compound 1059
A-101
35
B-305
65
2.06


Exemplified compound 1060
A-101
20
B-305
80
2.05


Exemplified compound 1061
A-101
49
B-306
51
2.14


Exemplified compound 1062
A-101
80
B-306
20
2.13


Exemplified compound 1063
A-101
35
B-306
65
2.15


Exemplified compound 1064
A-101
20
B-306
80
2.16


Exemplified compound 1065
A-101
49
B-307
51
2.13


Exemplified compound 1066
A-101
80
B-307
20
2.12


Exemplified compound 1067
A-101
35
B-307
65
2.13


Exemplified compound 1068
A-101
20
B-307
80
2.13


Exemplified compound 1069
A-101
49
B-308
51
2.13


Exemplified compound 1070
A-101
80
B-308
20
2.13


Exemplified compound 1071
A-101
35
B-308
65
2.14


Exemplified compound 1072
A-101
20
B-308
80
2.14


Exemplified compound 1073
A-101
49
B-401
51
2.17


Exemplified compound 1074
A-101
80
B-401
20
2.14


Exemplified compound 1075
A-101
35
B-401
65
2.19


Exemplified compound 1076
A-101
20
B-401
80
2.20


Exemplified compound 1077
A-101
49
B-402
51
2.21


Exemplified compound 1078
A-101
80
B-402
20
2.16


Exemplified compound 1079
A-101
35
B-402
65
2.24


Exemplified compound 1080
A-101
20
B-402
80
2.26


Exemplified compound 1081
A-101
49
B-403
51
2.27


Exemplified compound 1082
A-101
80
B-403
20
2.18


Exemplified compound 1083
A-101
35
B-403
65
2.31


Exemplified compound 1084
A-101
20
B-403
80
2.35


Exemplified compound 1085
A-101
49
B-404
51
2.14


Exemplified compound 1086
A-101
80
B-404
20
2.13


Exemplified compound 1087
A-101
35
B-404
65
2.15


Exemplified compound 1088
A-101
20
B-404
80
2.16


Exemplified compound 1089
A-101
49
B-405
51
2.21


Exemplified compound 1090
A-101
80
B-405
20
2.15


Exemplified compound 1091
A-101
35
B-405
65
2.23


Exemplified compound 1092
A-101
20
B-405
80
2.25


Exemplified compound 1093
A-102
49
B-101
51
2.11


Exemplified compound 1094
A-102
80
B-101
20
2.11


Exemplified compound 1095
A-102
35
B-101
65
2.11


Exemplified compound 1096
A-102
20
B-101
80
2.11


Exemplified compound 1097
A-102
49
B-102
51
2.16


Exemplified compound 1098
A-102
80
B-102
20
2.13


Exemplified compound 1099
A-102
35
B-102
65
2.18


Exemplified compound 1100
A-102
20
B-102
80
2.19


Exemplified compound 1101
A-102
49
B-103
51
2.11


Exemplified compound 1102
A-102
80
B-103
20
2.11


Exemplified compound 1103
A-102
35
B-103
65
2.11


Exemplified compound 1104
A-102
20
B-103
80
2.11


Exemplified compound 1105
A-102
49
B-104
51
2.09


Exemplified compound 1106
A-102
80
B-104
20
2.10


Exemplified compound 1107
A-102
35
B-104
65
2.08


Exemplified compound 1108
A-102
20
B-104
80
2.08


Exemplified compound 1109
A-102
49
B-105
51
2.10


Exemplified compound 1110
A-102
80
B-105
20
2.11


Exemplified compound 1111
A-102
35
B-105
65
2.10


Exemplified compound 1112
A-102
20
B-105
80
2.10


Exemplified compound 1113
A-102
49
B-201
51
2.16


Exemplified compound 1114
A-102
80
B-201
20
2.13


Exemplified compound 1115
A-102
35
B-201
65
2.17


Exemplified compound 1116
A-102
20
B-201
80
2.18


Exemplified compound 1117
A-102
49
B-202
51
2.10


Exemplified compound 1118
A-102
80
B-202
20
2.11


Exemplified compound 1119
A-102
35
B-202
65
2.10


Exemplified compound 1120
A-102
20
B-202
80
2.09
















TABLE 2







Specific examples of polycarbonate resins











Group A
Group B














Structural
Proportion
Structural
Proportion
Dielectric


Exemplified compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified compound 1121
A-102
49
B-203
51
2.13


Exemplified compound 1122
A-102
80
B-203
20
2.12


Exemplified compound 1123
A-102
35
B-203
65
2.14


Exemplified compound 1124
A-102
20
B-203
80
2.14


Exemplified compound 1125
A-102
49
B-204
51
2.09


Exemplified compound 1126
A-102
80
B-204
20
2.10


Exemplified compound 1127
A-102
35
B-204
65
2.09


Exemplified compound 1128
A-102
20
B-204
80
2.08


Exemplified compound 1129
A-102
49
B-205
51
2.13


Exemplified compound 1130
A-102
80
B-205
20
2.12


Exemplified compound 1131
A-102
35
B-205
65
2.14


Exemplified compound 1132
A-102
20
B-205
80
2.14


Exemplified compound 1133
A-102
49
B-301
51
2.12


Exemplified compound 1134
A-102
80
B-301
20
2.11


Exemplified compound 1135
A-102
35
B-301
65
2.12


Exemplified compound 1136
A-102
20
B-301
80
2.13


Exemplified compound 1137
A-102
49
B-302
51
2.12


Exemplified compound 1138
A-102
80
B-302
20
2.11


Exemplified compound 1139
A-102
35
B-302
65
2.12


Exemplified compound 1140
A-102
20
B-302
80
2.13


Exemplified compound 1141
A-102
49
B-303
51
2.13


Exemplified compound 1142
A-102
80
B-303
20
2.12


Exemplified compound 1143
A-102
35
B-303
65
2.14


Exemplified compound 1144
A-102
20
B-303
80
2.14


Exemplified compound 1145
A-102
49
B-304
51
2.13


Exemplified compound 1146
A-102
80
B-304
20
2.12


Exemplified compound 1147
A-102
35
B-304
65
2.13


Exemplified compound 1148
A-102
20
B-304
80
2.13


Exemplified compound 1149
A-102
49
B-305
51
2.07


Exemplified compound 1150
A-102
80
B-305
20
2.10


Exemplified compound 1151
A-102
35
B-305
65
2.06


Exemplified compound 1152
A-102
20
B-305
80
2.05


Exemplified compound 1153
A-102
49
B-306
51
2.14


Exemplified compound 1154
A-102
80
B-306
20
2.12


Exemplified compound 1155
A-102
35
B-306
65
2.14


Exemplified compound 1156
A-102
20
B-306
80
2.15


Exemplified compound 1157
A-102
49
B-307
51
2.12


Exemplified compound 1158
A-102
80
B-307
20
2.11


Exemplified compound 1159
A-102
35
B-307
65
2.12


Exemplified compound 1160
A-102
20
B-307
80
2.13


Exemplified compound 1161
A-102
49
B-308
51
2.13


Exemplified compound 1162
A-102
80
B-308
20
2.12


Exemplified compound 1163
A-102
35
B-308
65
2.13


Exemplified compound 1164
A-102
20
B-308
80
2.14


Exemplified compound 1165
A-102
49
B-401
51
2.17


Exemplified compound 1166
A-102
80
B-401
20
2.13


Exemplified compound 1167
A-102
35
B-401
65
2.18


Exemplified compound 1168
A-102
20
B-401
80
2.20


Exemplified compound 1169
A-102
49
B-402
51
2.21


Exemplified compound 1170
A-102
80
B-402
20
2.15


Exemplified compound 1171
A-102
35
B-402
65
2.23


Exemplified compound 1172
A-102
20
B-402
80
2.26


Exemplified compound 1173
A-102
49
B-403
51
2.26


Exemplified compound 1174
A-102
80
B-403
20
2.17


Exemplified compound 1175
A-102
35
B-403
65
2.30


Exemplified compound 1176
A-102
20
B-403
80
2.35


Exemplified compound 1177
A-102
49
B-404
51
2.14


Exemplified compound 1178
A-102
80
B-404
20
2.12


Exemplified compound 1179
A-102
35
B-404
65
2.15


Exemplified compound 1180
A-102
20
B-404
80
2.16


Exemplified compound 1181
A-102
49
B-405
51
2.20


Exemplified compound 1182
A-102
80
B-405
20
2.15


Exemplified compound 1183
A-102
35
B-405
65
2.22


Exemplified compound 1184
A-102
20
B-405
80
2.25


Exemplified compound 1185
A-103
49
B-101
51
2.16


Exemplified compound 1186
A-103
80
B-101
20
2.19


Exemplified compound 1187
A-103
35
B-101
65
2.14


Exemplified compound 1188
A-103
20
B-101
80
2.13


Exemplified compound 1189
A-103
49
B-102
51
2.21


Exemplified compound 1190
A-103
80
B-102
20
2.21


Exemplified compound 1191
A-103
35
B-102
65
2.21


Exemplified compound 1192
A-103
20
B-102
80
2.21


Exemplified compound 1193
A-103
49
B-103
51
2.16


Exemplified compound 1194
A-103
80
B-103
20
2.19


Exemplified compound 1195
A-103
35
B-103
65
2.14


Exemplified compound 1196
A-103
20
B-103
80
2.13


Exemplified compound 1197
A-103
49
B-104
51
2.14


Exemplified compound 1198
A-103
80
B-104
20
2.18


Exemplified compound 1199
A-103
35
B-104
65
2.12


Exemplified compound 1200
A-103
20
B-104
80
2.10


Exemplified compound 1201
A-103
49
B-105
51
2.15


Exemplified compound 1202
A-103
80
B-105
20
2.18


Exemplified compound 1203
A-103
35
B-105
65
2.13


Exemplified compound 1204
A-103
20
B-105
80
2.12


Exemplified compound 1205
A-103
49
B-201
51
2.20


Exemplified compound 1206
A-103
80
B-201
20
2.21


Exemplified compound 1207
A-103
35
B-201
65
2.20


Exemplified compound 1208
A-103
20
B-201
80
2.20


Exemplified compound 1209
A-103
49
B-202
51
2.15


Exemplified compound 1210
A-103
80
B-202
20
2.18


Exemplified compound 1211
A-103
35
B-202
65
2.13


Exemplified compound 1212
A-103
20
B-202
80
2.11


Exemplified compound 1213
A-103
49
B-203
51
2.18


Exemplified compound 1214
A-103
80
B-203
20
2.20


Exemplified compound 1215
A-103
35
B-203
65
2.17


Exemplified compound 1216
A-103
20
B-203
80
2.16


Exemplified compound 1217
A-103
49
B-204
51
2.14


Exemplified compound 1218
A-103
80
B-204
20
2.18


Exemplified compound 1219
A-103
35
B-204
65
2.12


Exemplified compound 1220
A-103
20
B-204
80
2.10


Exemplified compound 1221
A-103
49
B-205
51
2.18


Exemplified compound 1222
A-103
80
B-205
20
2.20


Exemplified compound 1223
A-103
35
B-205
65
2.17


Exemplified compound 1224
A-103
20
B-205
80
2.16


Exemplified compound 1225
A-103
49
B-301
51
2.17


Exemplified compound 1226
A-103
80
B-301
20
2.19


Exemplified compound 1227
A-103
35
B-301
65
2.16


Exemplified compound 1228
A-103
20
B-301
80
2.15


Exemplified compound 1229
A-103
49
B-302
51
2.17


Exemplified compound 1230
A-103
80
B-302
20
2.19


Exemplified compound 1231
A-103
35
B-302
65
2.16


Exemplified compound 1232
A-103
20
B-302
80
2.15


Exemplified compound 1233
A-103
49
B-303
51
2.18


Exemplified compound 1234
A-103
80
B-303
20
2.20


Exemplified compound 1235
A-103
35
B-303
65
2.17


Exemplified compound 1236
A-103
20
B-303
80
2.16


Exemplified compound 1237
A-103
49
B-304
51
2.17


Exemplified compound 1238
A-103
80
B-304
20
2.19


Exemplified compound 1239
A-103
35
B-304
65
2.16


Exemplified compound 1240
A-103
20
B-304
80
2.15
















TABLE 3







Specific examples of polycarbonate resins











Group A
Group B














Structural
Proportion
Structural
Proportion
Dielectric


Exemplified compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified compound 1241
A-103
49
B-305
51
2.12


Exemplified compound 1242
A-103
80
B-305
20
2.17


Exemplified compound 1243
A-103
35
B-305
65
2.09


Exemplified compound 1244
A-103
20
B-305
80
2.07


Exemplified compound 1245
A-103
49
B-306
51
2.18


Exemplified compound 1246
A-103
80
B-306
20
2.20


Exemplified compound 1247
A-103
35
B-306
65
2.18


Exemplified compound 1248
A-103
20
B-306
80
2.17


Exemplified compound 1249
A-103
49
B-307
51
2.17


Exemplified compound 1250
A-103
80
B-307
20
2.19


Exemplified compound 1251
A-103
35
B-307
65
2.16


Exemplified compound 1252
A-103
20
B-307
80
2.14


Exemplified compound 1253
A-103
49
B-308
51
2.18


Exemplified compound 1254
A-103
80
B-308
20
2.19


Exemplified compound 1255
A-103
35
B-308
65
2.17


Exemplified compound 1256
A-103
20
B-308
80
2.16


Exemplified compound 1257
A-103
49
B-401
51
2.21


Exemplified compound 1258
A-103
80
B-401
20
2.21


Exemplified compound 1259
A-103
35
B-401
65
2.22


Exemplified compound 1260
A-103
20
B-401
80
2.22


Exemplified compound 1261
A-103
49
B-402
51
2.25


Exemplified compound 1262
A-103
80
B-402
20
2.23


Exemplified compound 1263
A-103
35
B-402
65
2.27


Exemplified compound 1264
A-103
20
B-402
80
2.28


Exemplified compound 1265
A-103
49
B-403
51
2.31


Exemplified compound 1266
A-103
80
B-403
20
2.25


Exemplified compound 1267
A-103
35
B-403
65
2.34


Exemplified compound 1268
A-103
20
B-403
80
2.37


Exemplified compound 1269
A-103
49
B-404
51
2.19


Exemplified compound 1270
A-103
80
B-404
20
2.20


Exemplified compound 1271
A-103
35
B-404
65
2.18


Exemplified compound 1272
A-103
20
B-404
80
2.17


Exemplified compound 1273
A-103
49
B-405
51
2.25


Exemplified compound 1274
A-103
80
B-405
20
2.22


Exemplified compound 1275
A-103
35
B-405
65
2.26


Exemplified compound 1276
A-103
20
B-405
80
2.27


Exemplified compound 1277
A-104
49
B-101
51
2.06


Exemplified compound 1278
A-104
80
B-101
20
2.03


Exemplified compound 1279
A-104
35
B-101
65
2.07


Exemplified compound 1280
A-104
20
B-101
80
2.09


Exemplified compound 1281
A-104
49
B-102
51
2.11


Exemplified compound 1282
A-104
80
B-102
20
2.05


Exemplified compound 1283
A-104
35
B-102
65
2.14


Exemplified compound 1284
A-104
20
B-102
80
2.17


Exemplified compound 1285
A-104
49
B-103
51
2.06


Exemplified compound 1286
A-104
80
B-103
20
2.03


Exemplified compound 1287
A-104
35
B-103
65
2.07


Exemplified compound 1288
A-104
20
B-103
80
2.09


Exemplified compound 1289
A-104
49
B-104
51
2.04


Exemplified compound 1290
A-104
80
B-104
20
2.02


Exemplified compound 1291
A-104
35
B-104
65
2.05


Exemplified compound 1292
A-104
20
B-104
80
2.06


Exemplified compound 1293
A-104
49
B-105
51
2.05


Exemplified compound 1294
A-104
80
B-105
20
2.03


Exemplified compound 1295
A-104
35
B-105
65
2.07


Exemplified compound 1296
A-104
20
B-105
80
2.08


Exemplified compound 1297
A-104
49
B-201
51
2.11


Exemplified compound 1298
A-104
80
B-201
20
2.05


Exemplified compound 1299
A-104
35
B-201
65
2.13


Exemplified compound 1300
A-104
20
B-201
80
2.16


Exemplified compound 1301
A-104
49
B-202
51
2.05


Exemplified compound 1302
A-104
80
B-202
20
2.02


Exemplified compound 1303
A-104
35
B-202
65
2.06


Exemplified compound 1304
A-104
20
B-202
80
2.07


Exemplified compound 1305
A-104
49
B-203
51
2.08


Exemplified compound 1306
A-104
80
B-203
20
2.04


Exemplified compound 1307
A-104
35
B-203
65
2.10


Exemplified compound 1308
A-104
20
B-203
80
2.12


Exemplified compound 1309
A-104
49
B-204
51
2.04


Exemplified compound 1310
A-104
80
B-204
20
2.02


Exemplified compound 1311
A-104
35
B-204
65
2.05


Exemplified compound 1312
A-104
20
B-204
80
2.06


Exemplified compound 1313
A-104
49
B-205
51
2.08


Exemplified compound 1314
A-104
80
B-205
20
2.04


Exemplified compound 1315
A-104
35
B-205
65
2.10


Exemplified compound 1316
A-104
20
B-205
80
2.12


Exemplified compound 1317
A-104
49
B-301
51
2.07


Exemplified compound 1318
A-104
80
B-301
20
2.03


Exemplified compound 1319
A-104
35
B-301
65
2.09


Exemplified compound 1320
A-104
20
B-301
80
2.11


Exemplified compound 1321
A-104
49
B-302
51
2.07


Exemplified compound 1322
A-104
80
B-302
20
2.03


Exemplified compound 1323
A-104
35
B-302
65
2.09


Exemplified compound 1324
A-104
20
B-302
80
2.11


Exemplified compound 1325
A-104
49
B-303
51
2.08


Exemplified compound 1326
A-104
80
B-303
20
2.04


Exemplified compound 1327
A-104
35
B-303
65
2.10


Exemplified compound 1328
A-104
20
B-303
80
2.12


Exemplified compound 1329
A-104
49
B-304
51
2.08


Exemplified compound 1330
A-104
80
B-304
20
2.03


Exemplified compound 1331
A-104
35
B-304
65
2.09


Exemplified compound 1332
A-104
20
B-304
80
2.11


Exemplified compound 1333
A-104
49
B-305
51
2.02


Exemplified compound 1334
A-104
80
B-305
20
2.01


Exemplified compound 1335
A-104
35
B-305
65
2.03


Exemplified compound 1336
A-104
20
B-305
80
2.03


Exemplified compound 1337
A-104
49
B-306
51
2.09


Exemplified compound 1338
A-104
80
B-306
20
2.04


Exemplified compound 1339
A-104
35
B-306
65
2.11


Exemplified compound 1340
A-104
20
B-306
80
2.13


Exemplified compound 1341
A-104
49
B-307
51
2.07


Exemplified compound 1342
A-104
80
B-307
20
2.03


Exemplified compound 1343
A-104
35
B-307
65
2.09


Exemplified compound 1344
A-104
20
B-307
80
2.11


Exemplified compound 1345
A-104
49
B-308
51
2.08


Exemplified compound 1346
A-104
80
B-308
20
2.04


Exemplified compound 1347
A-104
35
B-308
65
2.10


Exemplified compound 1348
A-104
20
B-308
80
2.12


Exemplified compound 1349
A-104
49
B-401
51
2.12


Exemplified compound 1350
A-104
80
B-401
20
2.05


Exemplified compound 1351
A-104
35
B-401
65
2.15


Exemplified compound 1352
A-104
20
B-401
80
2.18


Exemplified compound 1353
A-104
49
B-402
51
2.16


Exemplified compound 1354
A-104
80
B-402
20
2.07


Exemplified compound 1355
A-104
35
B-402
65
2.20


Exemplified compound 1356
A-104
20
B-402
80
2.24


Exemplified compound 1357
A-104
49
B-403
51
2.21


Exemplified compound 1358
A-104
80
B-403
20
2.09


Exemplified compound 1359
A-104
35
B-403
65
2.27


Exemplified compound 1360
A-104
20
B-403
80
2.33
















TABLE 4







Specific examples of polycarbonate resins











Group A
Group B














Structural
Proportion
Structural
Proportion
Dielectric


Exemplified compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified compound 1361
A-104
49
B-404
51
2.09


Exemplified compound 1362
A-104
80
B-404
20
2.04


Exemplified compound 1363
A-104
35
B-404
65
2.11


Exemplified compound 1364
A-104
20
B-404
80
2.13


Exemplified compound 1365
A-104
49
B-405
51
2.15


Exemplified compound 1366
A-104
80
B-405
20
2.06


Exemplified compound 1367
A-104
35
B-405
65
2.19


Exemplified compound 1368
A-104
20
B-405
80
2.23


Exemplified compound 1369
A-105
49
B-101
51
2.17


Exemplified compound 1370
A-105
80
B-101
20
2.21


Exemplified compound 1371
A-105
35
B-101
65
2.15


Exemplified compound 1372
A-105
20
B-101
80
2.13


Exemplified compound 1373
A-105
49
B-102
51
2.22


Exemplified compound 1374
A-105
80
B-102
20
2.23


Exemplified compound 1375
A-105
35
B-102
65
2.22


Exemplified compound 1376
A-105
20
B-102
80
2.22


Exemplified compound 1377
A-105
49
B-103
51
2.17


Exemplified compound 1378
A-105
80
B-103
20
2.21


Exemplified compound 1379
A-105
35
B-103
65
2.15


Exemplified compound 1380
A-105
20
B-103
80
2.13


Exemplified compound 1381
A-105
49
B-104
51
2.15


Exemplified compound 1382
A-105
80
B-104
20
2.20


Exemplified compound 1383
A-105
35
B-104
65
2.13


Exemplified compound 1384
A-105
20
B-104
80
2.10


Exemplified compound 1385
A-105
49
B-105
51
2.16


Exemplified compound 1386
A-105
80
B-105
20
2.21


Exemplified compound 1387
A-105
35
B-105
65
2.14


Exemplified compound 1388
A-105
20
B-105
80
2.12


Exemplified compound 1389
A-105
49
B-201
51
2.22


Exemplified compound 1390
A-105
80
B-201
20
2.23


Exemplified compound 1391
A-105
35
B-201
65
2.21


Exemplified compound 1392
A-105
20
B-201
80
2.21


Exemplified compound 1393
A-105
49
B-202
51
2.16


Exemplified compound 1394
A-105
80
B-202
20
2.21


Exemplified compound 1395
A-105
35
B-202
65
2.14


Exemplified compound 1396
A-105
20
B-202
80
2.12


Exemplified compound 1397
A-105
49
B-203
51
2.19


Exemplified compound 1398
A-105
80
B-203
20
2.22


Exemplified compound 1399
A-105
35
B-203
65
2.18


Exemplified compound 1400
A-105
20
B-203
80
2.17


Exemplified compound 1401
A-105
49
B-204
51
2.15


Exemplified compound 1402
A-105
80
B-204
20
2.20


Exemplified compound 1403
A-105
35
B-204
65
2.13


Exemplified compound 1404
A-105
20
B-204
80
2.11


Exemplified compound 1405
A-105
49
B-205
51
2.19


Exemplified compound 1406
A-105
80
B-205
20
2.22


Exemplified compound 1407
A-105
35
B-205
65
2.18


Exemplified compound 1408
A-105
20
B-205
80
2.17


Exemplified compound 1409
A-105
49
B-301
51
2.18


Exemplified compound 1410
A-105
80
B-301
20
2.21


Exemplified compound 1411
A-105
35
B-301
65
2.17


Exemplified compound 1412
A-105
20
B-301
80
2.15


Exemplified compound 1413
A-105
49
B-302
51
2.18


Exemplified compound 1414
A-105
80
B-302
20
2.21


Exemplified compound 1415
A-105
35
B-302
65
2.17


Exemplified compound 1416
A-105
20
B-302
80
2.15


Exemplified compound 1417
A-105
49
B-303
51
2.19


Exemplified compound 1418
A-105
80
B-303
20
2.22


Exemplified compound 1419
A-105
35
B-303
65
2.18


Exemplified compound 1420
A-105
20
B-303
80
2.17


Exemplified compound 1421
A-105
49
B-304
51
2.19


Exemplified compound 1422
A-105
80
B-304
20
2.22


Exemplified compound 1423
A-105
35
B-304
65
2.17


Exemplified compound 1424
A-105
20
B-304
80
2.16


Exemplified compound 1425
A-105
49
B-305
51
2.13


Exemplified compound 1426
A-105
80
B-305
20
2.19


Exemplified compound 1427
A-105
35
B-305
65
2.10


Exemplified compound 1428
A-105
20
B-305
80
2.07


Exemplified compound 1429
A-105
49
B-306
51
2.20


Exemplified compound 1430
A-105
80
B-306
20
2.22


Exemplified compound 1431
A-105
35
B-306
65
2.19


Exemplified compound 1432
A-105
20
B-306
80
2.18


Exemplified compound 1433
A-105
49
B-307
51
2.18


Exemplified compound 1434
A-105
80
B-307
20
2.21


Exemplified compound 1435
A-105
35
B-307
65
2.17


Exemplified compound 1436
A-105
20
B-307
80
2.15


Exemplified compound 1437
A-105
49
B-308
51
2.19


Exemplified compound 1438
A-105
80
B-308
20
2.22


Exemplified compound 1439
A-105
35
B-308
65
2.18


Exemplified compound 1440
A-105
20
B-308
80
2.17


Exemplified compound 1441
A-105
49
B-401
51
2.23


Exemplified compound 1442
A-105
80
B-401
20
2.23


Exemplified compound 1443
A-105
35
B-401
65
2.23


Exemplified compound 1444
A-105
20
B-401
80
2.22


Exemplified compound 1445
A-105
49
B-402
51
2.27


Exemplified compound 1446
A-105
80
B-402
20
2.25


Exemplified compound 1447
A-105
35
B-402
65
2.28


Exemplified compound 1448
A-105
20
B-402
80
2.29


Exemplified compound 1449
A-105
49
B-403
51
2.32


Exemplified compound 1450
A-105
80
B-403
20
2.27


Exemplified compound 1451
A-105
35
B-403
65
2.35


Exemplified compound 1452
A-105
20
B-403
80
2.37


Exemplified compound 1453
A-105
49
B-404
51
2.20


Exemplified compound 1454
A-105
80
B-404
20
2.22


Exemplified compound 1455
A-105
35
B-404
65
2.19


Exemplified compound 1456
A-105
20
B-404
80
2.18


Exemplified compound 1457
A-105
49
B-405
51
2.26


Exemplified compound 1458
A-105
80
B-405
20
2.25


Exemplified compound 1459
A-105
35
B-405
65
2.27


Exemplified compound 1460
A-105
20
B-405
80
2.28


Exemplified compound 1461
A-201
49
B-101
51
2.11


Exemplified compound 1462
A-201
80
B-101
20
2.12


Exemplified compound 1463
A-201
35
B-101
65
2.11


Exemplified compound 1464
A-201
20
B-101
80
2.11


Exemplified compound 1465
A-201
49
B-102
51
2.17


Exemplified compound 1466
A-201
80
B-102
20
2.14


Exemplified compound 1467
A-201
35
B-102
65
2.18


Exemplified compound 1468
A-201
20
B-102
80
2.19


Exemplified compound 1469
A-201
49
B-103
51
2.11


Exemplified compound 1470
A-201
80
B-103
20
2.12


Exemplified compound 1471
A-201
35
B-103
65
2.11


Exemplified compound 1472
A-201
20
B-103
80
2.11


Exemplified compound 1473
A-201
49
B-104
51
2.09


Exemplified compound 1474
A-201
80
B-104
20
2.11


Exemplified compound 1475
A-201
35
B-104
65
2.09


Exemplified compound 1476
A-201
20
B-104
80
2.08


Exemplified compound 1477
A-201
49
B-105
51
2.11


Exemplified compound 1478
A-201
80
B-105
20
2.11


Exemplified compound 1479
A-201
35
B-105
65
2.10


Exemplified compound 1480
A-201
20
B-105
80
2.10
















TABLE 5







Specific examples of polycarbonate resins











Group A
Group B














Structural
Proportion
Structural
Proportion
Dielectric


Exemplified compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified compound 1481
A-201
49
B-201
51
2.16


Exemplified compound 1482
A-201
80
B-201
20
2.13


Exemplified compound 1483
A-201
35
B-201
65
2.17


Exemplified compound 1484
A-201
20
B-201
80
2.19


Exemplified compound 1485
A-201
49
B-202
51
2.10


Exemplified compound 1486
A-201
80
B-202
20
2.11


Exemplified compound 1487
A-201
35
B-202
65
2.10


Exemplified compound 1488
A-201
20
B-202
80
2.10


Exemplified compound 1489
A-201
49
B-203
51
2.14


Exemplified compound 1490
A-201
80
B-203
20
2.13


Exemplified compound 1491
A-201
35
B-203
65
2.14


Exemplified compound 1492
A-201
20
B-203
80
2.15


Exemplified compound 1493
A-201
49
B-204
51
2.10


Exemplified compound 1494
A-201
80
B-204
20
2.11


Exemplified compound 1495
A-201
35
B-204
65
2.09


Exemplified compound 1496
A-201
20
B-204
80
2.08


Exemplified compound 1497
A-201
49
B-205
51
2.13


Exemplified compound 1498
A-201
80
B-205
20
2.12


Exemplified compound 1499
A-201
35
B-205
65
2.14


Exemplified compound 1500
A-201
20
B-205
80
2.14


Exemplified compound 1501
A-201
49
B-301
51
2.13


Exemplified compound 1502
A-201
80
B-301
20
2.12


Exemplified compound 1503
A-201
35
B-301
65
2.13


Exemplified compound 1504
A-201
20
B-301
80
2.13


Exemplified compound 1505
A-201
49
B-302
51
2.12


Exemplified compound 1506
A-201
80
B-302
20
2.12


Exemplified compound 1507
A-201
35
B-302
65
2.13


Exemplified compound 1508
A-201
20
B-302
80
2.13


Exemplified compound 1509
A-201
49
B-303
51
2.14


Exemplified compound 1510
A-201
80
B-303
20
2.12


Exemplified compound 1511
A-201
35
B-303
65
2.14


Exemplified compound 1512
A-201
20
B-303
80
2.15


Exemplified compound 1513
A-201
49
B-304
51
2.13


Exemplified compound 1514
A-201
80
B-304
20
2.12


Exemplified compound 1515
A-201
35
B-304
65
2.13


Exemplified compound 1516
A-201
20
B-304
80
2.14


Exemplified compound 1517
A-201
49
B-305
51
2.08


Exemplified compound 1518
A-201
80
B-305
20
2.10


Exemplified compound 1519
A-201
35
B-305
65
2.06


Exemplified compound 1520
A-201
20
B-305
80
2.05


Exemplified compound 1521
A-201
49
B-306
51
2.14


Exemplified compound 1522
A-201
80
B-306
20
2.13


Exemplified compound 1523
A-201
35
B-306
65
2.15


Exemplified compound 1524
A-201
20
B-306
80
2.15


Exemplified compound 1525
A-201
49
B-307
51
2.12


Exemplified compound 1526
A-201
80
B-307
20
2.12


Exemplified compound 1527
A-201
35
B-307
65
2.13


Exemplified compound 1528
A-201
20
B-307
80
2.13


Exemplified compound 1529
A-201
49
B-308
51
2.13


Exemplified compound 1530
A-201
80
B-308
20
2.12


Exemplified compound 1531
A-201
35
B-308
65
2.14


Exemplified compound 1532
A-201
20
B-308
80
2.14


Exemplified compound 1533
A-201
49
B-401
51
2.17


Exemplified compound 1534
A-201
80
B-401
20
2.14


Exemplified compound 1535
A-201
35
B-401
65
2.18


Exemplified compound 1536
A-201
20
B-401
80
2.20


Exemplified compound 1537
A-201
49
B-402
51
2.21


Exemplified compound 1538
A-201
80
B-402
20
2.15


Exemplified compound 1539
A-201
35
B-402
65
2.24


Exemplified compound 1540
A-201
20
B-402
80
2.26


Exemplified compound 1541
A-201
49
B-403
51
2.26


Exemplified compound 1542
A-201
80
B-403
20
2.18


Exemplified compound 1543
A-201
35
B-403
65
2.30


Exemplified compound 1544
A-201
20
B-403
80
2.35


Exemplified compound 1545
A-201
49
B-404
51
2.14


Exemplified compound 1546
A-201
80
B-404
20
2.13


Exemplified compound 1547
A-201
35
B-404
65
2.15


Exemplified compound 1548
A-201
20
B-404
80
2.16


Exemplified compound 1549
A-201
49
B-405
51
2.20


Exemplified compound 1550
A-201
80
B-405
20
2.15


Exemplified compound 1551
A-201
35
B-405
65
2.23


Exemplified compound 1552
A-201
20
B-405
80
2.25


Exemplified compound 1553
A-202
49
B-101
51
2.16


Exemplified compound 1554
A-202
80
B-101
20
2.19


Exemplified compound 1555
A-202
35
B-101
65
2.14


Exemplified compound 1556
A-202
20
B-101
80
2.13


Exemplified compound 1557
A-202
49
B-102
51
2.21


Exemplified compound 1558
A-202
80
B-102
20
2.21


Exemplified compound 1559
A-202
35
B-102
65
2.21


Exemplified compound 1560
A-202
20
B-102
80
2.21


Exemplified compound 1561
A-202
49
B-103
51
2.16


Exemplified compound 1562
A-202
80
B-103
20
2.19


Exemplified compound 1563
A-202
35
B-103
65
2.14


Exemplified compound 1564
A-202
20
B-103
80
2.13


Exemplified compound 1565
A-202
49
B-104
51
2.14


Exemplified compound 1566
A-202
80
B-104
20
2.18


Exemplified compound 1567
A-202
35
B-104
65
2.12


Exemplified compound 1568
A-202
20
B-104
80
2.10


Exemplified compound 1569
A-202
49
B-105
51
2.15


Exemplified compound 1570
A-202
80
B-105
20
2.18


Exemplified compound 1571
A-202
35
B-105
65
2.13


Exemplified compound 1572
A-202
20
B-105
80
2.12


Exemplified compound 1573
A-202
49
B-201
51
2.20


Exemplified compound 1574
A-202
80
B-201
20
2.21


Exemplified compound 1575
A-202
35
B-201
65
2.20


Exemplified compound 1576
A-202
20
B-201
80
2.20


Exemplified compound 1577
A-202
49
B-202
51
2.15


Exemplified compound 1578
A-202
80
B-202
20
2.18


Exemplified compound 1579
A-202
35
B-202
65
2.13


Exemplified compound 1580
A-202
20
B-202
80
2.11


Exemplified compound 1581
A-202
49
B-203
51
2.18


Exemplified compound 1582
A-202
80
B-203
20
2.20


Exemplified compound 1583
A-202
35
B-203
65
2.17


Exemplified compound 1584
A-202
20
B-203
80
2.16


Exemplified compound 1585
A-202
49
B-204
51
2.14


Exemplified compound 1586
A-202
80
B-204
20
2.18


Exemplified compound 1587
A-202
35
B-204
65
2.12


Exemplified compound 1588
A-202
20
B-204
80
2.10


Exemplified compound 1589
A-202
49
B-205
51
2.18


Exemplified compound 1590
A-202
80
B-205
20
2.20


Exemplified compound 1591
A-202
35
B-205
65
2.17


Exemplified compound 1592
A-202
20
B-205
80
2.16


Exemplified compound 1593
A-202
49
B-301
51
2.17


Exemplified compound 1594
A-202
80
B-301
20
2.19


Exemplified compound 1595
A-202
35
B-301
65
2.16


Exemplified compound 1596
A-202
20
B-301
80
2.15


Exemplified compound 1597
A-202
49
B-302
51
2.17


Exemplified compound 1598
A-202
80
B-302
20
2.19


Exemplified compound 1599
A-202
35
B-302
65
2.16


Exemplified compound 1600
A-202
20
B-302
80
2.15
















TABLE 6







Specific examples of polycarbonate resins











Group A
Group B














Structural
Proportion
Structural
Proportion
Dielectric


Exemplified compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified compound 1601
A-202
49
B-303
51
2.18


Exemplified compound 1602
A-202
80
B-303
20
2.20


Exemplified compound 1603
A-202
35
B-303
65
2.17


Exemplified compound 1604
A-202
20
B-303
80
2.16


Exemplified compound 1605
A-202
49
B-304
51
2.17


Exemplified compound 1606
A-202
80
B-304
20
2.19


Exemplified compound 1607
A-202
35
B-304
65
2.16


Exemplified compound 1608
A-202
20
B-304
80
2.15


Exemplified compound 1609
A-202
49
B-305
51
2.12


Exemplified compound 1610
A-202
80
B-305
20
2.17


Exemplified compound 1611
A-202
35
B-305
65
2.09


Exemplified compound 1612
A-202
20
B-305
80
2.07


Exemplified compound 1613
A-202
49
B-306
51
2.18


Exemplified compound 1614
A-202
80
B-306
20
2.20


Exemplified compound 1615
A-202
35
B-306
65
2.18


Exemplified compound 1616
A-202
20
B-306
80
2.17


Exemplified compound 1617
A-202
49
B-307
51
2.17


Exemplified compound 1618
A-202
80
B-307
20
2.19


Exemplified compound 1619
A-202
35
B-307
65
2.16


Exemplified compound 1620
A-202
20
B-307
80
2.14


Exemplified compound 1621
A-202
49
B-308
51
2.18


Exemplified compound 1622
A-202
80
B-308
20
2.19


Exemplified compound 1623
A-202
35
B-308
65
2.17


Exemplified compound 1624
A-202
20
B-308
80
2.16


Exemplified compound 1625
A-202
49
B-401
51
2.21


Exemplified compound 1626
A-202
80
B-401
20
2.21


Exemplified compound 1627
A-202
35
B-401
65
2.22


Exemplified compound 1628
A-202
20
B-401
80
2.22


Exemplified compound 1629
A-202
49
B-402
51
2.25


Exemplified compound 1630
A-202
80
B-402
20
2.23


Exemplified compound 1631
A-202
35
B-402
65
2.27


Exemplified compound 1632
A-202
20
B-402
80
2.28


Exemplified compound 1633
A-202
49
B-403
51
2.31


Exemplified compound 1634
A-202
80
B-403
20
2.25


Exemplified compound 1635
A-202
35
B-403
65
2.34


Exemplified compound 1636
A-202
20
B-403
80
2.37


Exemplified compound 1637
A-202
49
B-404
51
2.19


Exemplified compound 1638
A-202
80
B-404
20
2.20


Exemplified compound 1639
A-202
35
B-404
65
2.18


Exemplified compound 1640
A-202
20
B-404
80
2.17


Exemplified compound 1641
A-202
49
B-405
51
2.25


Exemplified compound 1642
A-202
80
B-405
20
2.22


Exemplified compound 1643
A-202
35
B-405
65
2.26


Exemplified compound 1644
A-202
20
B-405
80
2.27


Exemplified compound 1645
A-203
49
B-101
51
2.04


Exemplified compound 1646
A-203
80
B-101
20
2.00


Exemplified compound 1647
A-203
35
B-101
65
2.06


Exemplified compound 1648
A-203
20
B-101
80
2.08


Exemplified compound 1649
A-203
49
B-102
51
2.09


Exemplified compound 1650
A-203
80
B-102
20
2.02


Exemplified compound 1651
A-203
35
B-102
65
2.13


Exemplified compound 1652
A-203
20
B-102
80
2.16


Exemplified compound 1653
A-203
49
B-103
51
2.04


Exemplified compound 1654
A-203
80
B-103
20
2.00


Exemplified compound 1655
A-203
35
B-103
65
2.06


Exemplified compound 1656
A-203
20
B-103
80
2.08


Exemplified compound 1657
A-203
49
B-104
51
2.02


Exemplified compound 1658
A-203
80
B-104
20
1.99


Exemplified compound 1659
A-203
35
B-104
65
2.03


Exemplified compound 1660
A-203
20
B-104
80
2.05


Exemplified compound 1661
A-203
49
B-105
51
2.03


Exemplified compound 1662
A-203
80
B-105
20
2.00


Exemplified compound 1663
A-203
35
B-105
65
2.05


Exemplified compound 1664
A-203
20
B-105
80
2.07


Exemplified compound 1665
A-203
49
B-201
51
2.09


Exemplified compound 1666
A-203
80
B-201
20
2.02


Exemplified compound 1667
A-203
35
B-201
65
2.12


Exemplified compound 1668
A-203
20
B-201
80
2.16


Exemplified compound 1669
A-203
49
B-202
51
2.03


Exemplified compound 1670
A-203
80
B-202
20
1.99


Exemplified compound 1671
A-203
35
B-202
65
2.05


Exemplified compound 1672
A-203
20
B-202
80
2.07


Exemplified compound 1673
A-203
49
B-203
51
2.06


Exemplified compound 1674
A-203
80
B-203
20
2.01


Exemplified compound 1675
A-203
35
B-203
65
2.09


Exemplified compound 1676
A-203
20
B-203
80
2.12


Exemplified compound 1677
A-203
49
B-204
51
2.02


Exemplified compound 1678
A-203
80
B-204
20
1.99


Exemplified compound 1679
A-203
35
B-204
65
2.04


Exemplified compound 1680
A-203
20
B-204
80
2.05


Exemplified compound 1681
A-203
49
B-205
51
2.06


Exemplified compound 1682
A-203
80
B-205
20
2.01


Exemplified compound 1683
A-203
35
B-205
65
2.09


Exemplified compound 1684
A-203
20
B-205
80
2.11


Exemplified compound 1685
A-203
49
B-301
51
2.05


Exemplified compound 1686
A-203
80
B-301
20
2.00


Exemplified compound 1687
A-203
35
B-301
65
2.08


Exemplified compound 1688
A-203
20
B-301
80
2.10


Exemplified compound 1689
A-203
49
B-302
51
2.05


Exemplified compound 1690
A-203
80
B-302
20
2.00


Exemplified compound 1691
A-203
35
B-302
65
2.07


Exemplified compound 1692
A-203
20
B-302
80
2.10


Exemplified compound 1693
A-203
49
B-303
51
2.06


Exemplified compound 1694
A-203
80
B-303
20
2.01


Exemplified compound 1695
A-203
35
B-303
65
2.09


Exemplified compound 1696
A-203
20
B-303
80
2.12


Exemplified compound 1697
A-203
49
B-304
51
2.06


Exemplified compound 1698
A-203
80
B-304
20
2.00


Exemplified compound 1699
A-203
35
B-304
65
2.08


Exemplified compound 1700
A-203
20
B-304
80
2.11


Exemplified compound 1701
A-203
49
B-305
51
2.00


Exemplified compound 1702
A-203
80
B-305
20
1.98


Exemplified compound 1703
A-203
35
B-305
65
2.01


Exemplified compound 1704
A-203
20
B-305
80
2.02


Exemplified compound 1705
A-203
49
B-306
51
2.07


Exemplified compound 1706
A-203
80
B-306
20
2.01


Exemplified compound 1707
A-203
35
B-306
65
2.10


Exemplified compound 1708
A-203
20
B-306
80
2.13


Exemplified compound 1709
A-203
49
B-307
51
2.05


Exemplified compound 1710
A-203
80
B-307
20
2.00


Exemplified compound 1711
A-203
35
B-307
65
2.07


Exemplified compound 1712
A-203
20
B-307
80
2.10


Exemplified compound 1713
A-203
49
B-308
51
2.06


Exemplified compound 1714
A-203
80
B-308
20
2.01


Exemplified compound 1715
A-203
35
B-308
65
2.09


Exemplified compound 1716
A-203
20
B-308
80
2.11


Exemplified compound 1717
A-203
49
B-401
51
2.10


Exemplified compound 1718
A-203
80
B-401
20
2.02


Exemplified compound 1719
A-203
35
B-401
65
2.13


Exemplified compound 1720
A-203
20
B-401
80
2.17
















TABLE 7







Specific examples of polycarbonate resins











Group A
Group B














Structural
Proportion
Structural
Proportion
Dielectric


Exemplified compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified compound 1721
A-203
49
B-402
51
2.14


Exemplified compound 1722
A-203
80
B-402
20
2.04


Exemplified compound 1723
A-203
35
B-402
65
2.18


Exemplified compound 1724
A-203
20
B-402
80
2.23


Exemplified compound 1725
A-203
49
B-403
51
2.19


Exemplified compound 1726
A-203
80
B-403
20
2.06


Exemplified compound 1727
A-203
35
B-403
65
2.25


Exemplified compound 1728
A-203
20
B-403
80
2.32


Exemplified compound 1729
A-203
49
B-404
51
2.07


Exemplified compound 1730
A-203
80
B-404
20
2.01


Exemplified compound 1731
A-203
35
B-404
65
2.10


Exemplified compound 1732
A-203
20
B-404
80
2.13


Exemplified compound 1733
A-203
49
B-405
51
2.13


Exemplified compound 1734
A-203
80
B-405
20
2.03


Exemplified compound 1735
A-203
35
B-405
65
2.18


Exemplified compound 1736
A-203
20
B-405
80
2.22


Exemplified compound 1737
A-204
49
B-101
51
2.09


Exemplified compound 1738
A-204
80
B-101
20
2.08


Exemplified compound 1739
A-204
35
B-101
65
2.10


Exemplified compound 1740
A-204
20
B-101
80
2.10


Exemplified compound 1741
A-204
49
B-102
51
2.14


Exemplified compound 1742
A-204
80
B-102
20
2.10


Exemplified compound 1743
A-204
35
B-102
65
2.16


Exemplified compound 1744
A-204
20
B-102
80
2.18


Exemplified compound 1745
A-204
49
B-103
51
2.09


Exemplified compound 1746
A-204
80
B-103
20
2.08


Exemplified compound 1747
A-204
35
B-103
65
2.09


Exemplified compound 1748
A-204
20
B-103
80
2.10


Exemplified compound 1749
A-204
49
B-104
51
2.07


Exemplified compound 1750
A-204
80
B-104
20
2.07


Exemplified compound 1751
A-204
35
B-104
65
2.07


Exemplified compound 1752
A-204
20
B-104
80
2.07


Exemplified compound 1753
A-204
49
B-105
51
2.08


Exemplified compound 1754
A-204
80
B-105
20
2.07


Exemplified compound 1755
A-204
35
B-105
65
2.09


Exemplified compound 1756
A-204
20
B-105
80
2.09


Exemplified compound 1757
A-204
49
B-201
51
2.14


Exemplified compound 1758
A-204
80
B-201
20
2.10


Exemplified compound 1759
A-204
35
B-201
65
2.16


Exemplified compound 1760
A-204
20
B-201
80
2.18


Exemplified compound 1761
A-204
49
B-202
51
2.08


Exemplified compound 1762
A-204
80
B-202
20
2.07


Exemplified compound 1763
A-204
35
B-202
65
2.08


Exemplified compound 1764
A-204
20
B-202
80
2.09


Exemplified compound 1765
A-204
49
B-203
51
2.11


Exemplified compound 1766
A-204
80
B-203
20
2.09


Exemplified compound 1767
A-204
35
B-203
65
2.12


Exemplified compound 1768
A-204
20
B-203
80
2.14


Exemplified compound 1769
A-204
49
B-204
51
2.07


Exemplified compound 1770
A-204
80
B-204
20
2.07


Exemplified compound 1771
A-204
35
B-204
65
2.07


Exemplified compound 1772
A-204
20
B-204
80
2.07


Exemplified compound 1773
A-204
49
B-205
51
2.11


Exemplified compound 1774
A-204
80
B-205
20
2.09


Exemplified compound 1775
A-204
35
B-205
65
2.12


Exemplified compound 1776
A-204
20
B-205
80
2.13


Exemplified compound 1777
A-204
49
B-301
51
2.10


Exemplified compound 1778
A-204
80
B-301
20
2.08


Exemplified compound 1779
A-204
35
B-301
65
2.11


Exemplified compound 1780
A-204
20
B-301
80
2.12


Exemplified compound 1781
A-204
49
B-302
51
2.10


Exemplified compound 1782
A-204
80
B-302
20
2.08


Exemplified compound 1783
A-204
35
B-302
65
2.11


Exemplified compound 1784
A-204
20
B-302
80
2.12


Exemplified compound 1785
A-204
49
B-303
51
2.11


Exemplified compound 1786
A-204
80
B-303
20
2.09


Exemplified compound 1787
A-204
35
B-303
65
2.12


Exemplified compound 1788
A-204
20
B-303
80
2.14


Exemplified compound 1789
A-204
49
B-304
51
2.11


Exemplified compound 1790
A-204
80
B-304
20
2.08


Exemplified compound 1791
A-204
35
B-304
65
2.12


Exemplified compound 1792
A-204
20
B-304
80
2.13


Exemplified compound 1793
A-204
49
B-305
51
2.05


Exemplified compound 1794
A-204
80
B-305
20
2.06


Exemplified compound 1795
A-204
35
B-305
65
2.05


Exemplified compound 1796
A-204
20
B-305
80
2.04


Exemplified compound 1797
A-204
49
B-306
51
2.12


Exemplified compound 1798
A-204
80
B-306
20
2.09


Exemplified compound 1799
A-204
35
B-306
65
2.13


Exemplified compound 1800
A-204
20
B-306
80
2.14


Exemplified compound 1801
A-204
49
B-307
51
2.10


Exemplified compound 1802
A-204
80
B-307
20
2.08


Exemplified compound 1803
A-204
35
B-307
65
2.11


Exemplified compound 1804
A-204
20
B-307
80
2.12


Exemplified compound 1805
A-204
49
B-308
51
2.11


Exemplified compound 1806
A-204
80
B-308
20
2.08


Exemplified compound 1807
A-204
35
B-308
65
2.12


Exemplified compound 1808
A-204
20
B-308
80
2.13


Exemplified compound 1809
A-204
49
B-401
51
2.15


Exemplified compound 1810
A-204
80
B-401
20
2.10


Exemplified compound 1811
A-204
35
B-401
65
2.17


Exemplified compound 1812
A-204
20
B-401
80
2.19


Exemplified compound 1813
A-204
49
B-402
51
2.19


Exemplified compound 1814
A-204
80
B-402
20
2.12


Exemplified compound 1815
A-204
35
B-402
65
2.22


Exemplified compound 1816
A-204
20
B-402
80
2.25


Exemplified compound 1817
A-204
49
B-403
51
2.24


Exemplified compound 1818
A-204
80
B-403
20
2.14


Exemplified compound 1819
A-204
35
B-403
65
2.29


Exemplified compound 1820
A-204
20
B-403
80
2.34


Exemplified compound 1821
A-204
49
B-404
51
2.12


Exemplified compound 1822
A-204
80
B-404
20
2.09


Exemplified compound 1823
A-204
35
B-404
65
2.13


Exemplified compound 1824
A-204
20
B-404
80
2.15


Exemplified compound 1825
A-204
49
B-405
51
2.18


Exemplified compound 1826
A-204
80
B-405
20
2.11


Exemplified compound 1827
A-204
35
B-405
65
2.21


Exemplified compound 1828
A-204
20
B-405
80
2.24


Exemplified compound 1829
A-205
49
B-101
51
2.04


Exemplified compound 1830
A-205
80
B-101
20
2.00


Exemplified compound 1831
A-205
35
B-101
65
2.06


Exemplified compound 1832
A-205
20
B-101
80
2.08


Exemplified compound 1833
A-205
49
B-102
51
2.10


Exemplified compound 1834
A-205
80
B-102
20
2.02


Exemplified compound 1835
A-205
35
B-102
65
2.13


Exemplified compound 1836
A-205
20
B-102
80
2.16


Exemplified compound 1837
A-205
49
B-103
51
2.04


Exemplified compound 1838
A-205
80
B-103
20
2.00


Exemplified compound 1839
A-205
35
B-103
65
2.06


Exemplified compound 1840
A-205
20
B-103
80
2.08
















TABLE 8







Specific examples of polycarbonate resins











Group A
Group B














Structural
Proportion
Structural
Proportion
Dielectric


Exemplified compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified compound 1841
A-205
49
B-104
51
2.02


Exemplified compound 1842
A-205
80
B-104
20
1.99


Exemplified compound 1843
A-205
35
B-104
65
2.04


Exemplified compound 1844
A-205
20
B-104
80
2.05


Exemplified compound 1845
A-205
49
B-105
51
2.04


Exemplified compound 1846
A-205
80
B-105
20
2.00


Exemplified compound 1847
A-205
35
B-105
65
2.05


Exemplified compound 1848
A-205
20
B-105
80
2.07


Exemplified compound 1849
A-205
49
B-201
51
2.09


Exemplified compound 1850
A-205
80
B-201
20
2.02


Exemplified compound 1851
A-205
35
B-201
65
2.12


Exemplified compound 1852
A-205
20
B-201
80
2.16


Exemplified compound 1853
A-205
49
B-202
51
2.03


Exemplified compound 1854
A-205
80
B-202
20
2.00


Exemplified compound 1855
A-205
35
B-202
65
2.05


Exemplified compound 1856
A-205
20
B-202
80
2.07


Exemplified compound 1857
A-205
49
B-203
51
2.07


Exemplified compound 1858
A-205
80
B-203
20
2.01


Exemplified compound 1859
A-205
35
B-203
65
2.09


Exemplified compound 1860
A-205
20
B-203
80
2.12


Exemplified compound 1861
A-205
49
B-204
51
2.03


Exemplified compound 1862
A-205
80
B-204
20
2.00


Exemplified compound 1863
A-205
35
B-204
65
2.04


Exemplified compound 1864
A-205
20
B-204
80
2.05


Exemplified compound 1865
A-205
49
B-205
51
2.06


Exemplified compound 1866
A-205
80
B-205
20
2.01


Exemplified compound 1867
A-205
35
B-205
65
2.09


Exemplified compound 1868
A-205
20
B-205
80
2.11


Exemplified compound 1869
A-205
49
B-301
51
2.06


Exemplified compound 1870
A-205
80
B-301
20
2.01


Exemplified compound 1871
A-205
35
B-301
65
2.08


Exemplified compound 1872
A-205
20
B-301
80
2.10


Exemplified compound 1873
A-205
49
B-302
51
2.05


Exemplified compound 1874
A-205
80
B-302
20
2.01


Exemplified compound 1875
A-205
35
B-302
65
2.08


Exemplified compound 1876
A-205
20
B-302
80
2.10


Exemplified compound 1877
A-205
49
B-303
51
2.07


Exemplified compound 1878
A-205
80
B-303
20
2.01


Exemplified compound 1879
A-205
35
B-303
65
2.09


Exemplified compound 1880
A-205
20
B-303
80
2.12


Exemplified compound 1881
A-205
49
B-304
51
2.06


Exemplified compound 1882
A-205
80
B-304
20
2.01


Exemplified compound 1883
A-205
35
B-304
65
2.08


Exemplified compound 1884
A-205
20
B-304
80
2.11


Exemplified compound 1885
A-205
49
B-305
51
2.01


Exemplified compound 1886
A-205
80
B-305
20
1.99


Exemplified compound 1887
A-205
35
B-305
65
2.01


Exemplified compound 1888
A-205
20
B-305
80
2.02


Exemplified compound 1889
A-205
49
B-306
51
2.07


Exemplified compound 1890
A-205
80
B-306
20
2.01


Exemplified compound 1891
A-205
35
B-306
65
2.10


Exemplified compound 1892
A-205
20
B-306
80
2.13


Exemplified compound 1893
A-205
49
B-307
51
2.05


Exemplified compound 1894
A-205
80
B-307
20
2.01


Exemplified compound 1895
A-205
35
B-307
65
2.08


Exemplified compound 1896
A-205
20
B-307
80
2.10


Exemplified compound 1897
A-205
49
B-308
51
2.06


Exemplified compound 1898
A-205
80
B-308
20
2.01


Exemplified compound 1899
A-205
35
B-308
65
2.09


Exemplified compound 1900
A-205
20
B-308
80
2.11


Exemplified compound 1901
A-205
49
B-401
51
2.10


Exemplified compound 1902
A-205
80
B-401
20
2.02


Exemplified compound 1903
A-205
35
B-401
65
2.13


Exemplified compound 1904
A-205
20
B-401
80
2.17


Exemplified compound 1905
A-205
49
B-402
51
2.14


Exemplified compound 1906
A-205
80
B-402
20
2.04


Exemplified compound 1907
A-205
35
B-402
65
2.19


Exemplified compound 1908
A-205
20
B-402
80
2.24


Exemplified compound 1909
A-205
49
B-403
51
2.19


Exemplified compound 1910
A-205
80
B-403
20
2.06


Exemplified compound 1911
A-205
35
B-403
65
2.26


Exemplified compound 1912
A-205
20
B-403
80
2.32


Exemplified compound 1913
A-205
49
B-404
51
2.07


Exemplified compound 1914
A-205
80
B-404
20
2.01


Exemplified compound 1915
A-205
35
B-404
65
2.10


Exemplified compound 1916
A-205
20
B-404
80
2.13


Exemplified compound 1917
A-205
49
B-405
51
2.13


Exemplified compound 1918
A-205
80
B-405
20
2.04


Exemplified compound 1919
A-205
35
B-405
65
2.18


Exemplified compound 1920
A-205
20
B-405
80
2.22


Exemplified compound 2281
A-401
49
B-101
51
2.11


Exemplified compound 2282
A-401
80
B-101
20
2.11


Exemplified compound 2283
A-401
35
B-101
65
2.11


Exemplified compound 2284
A-401
20
B-101
80
2.11


Exemplified compound 2285
A-401
49
B-102
51
2.16


Exemplified compound 2286
A-401
80
B-102
20
2.13


Exemplified compound 2287
A-401
35
B-102
65
2.18


Exemplified compound 2288
A-401
20
B-102
80
2.19


Exemplified compound 2289
A-401
49
B-103
51
2.11


Exemplified compound 2290
A-401
80
B-103
20
2.11


Exemplified compound 2291
A-401
35
B-103
65
2.11


Exemplified compound 2292
A-401
20
B-103
80
2.11


Exemplified compound 2293
A-401
49
B-104
51
2.09


Exemplified compound 2294
A-401
80
B-104
20
2.10


Exemplified compound 2295
A-401
35
B-104
65
2.08


Exemplified compound 2296
A-401
20
B-104
80
2.08


Exemplified compound 2297
A-401
49
B-105
51
2.10


Exemplified compound 2298
A-401
80
B-105
20
2.11


Exemplified compound 2299
A-401
35
B-105
65
2.10


Exemplified compound 2300
A-401
20
B-105
80
2.10


Exemplified compound 2301
A-401
49
B-201
51
2.16


Exemplified compound 2302
A-401
80
B-201
20
2.13


Exemplified compound 2303
A-401
35
B-201
65
2.17


Exemplified compound 2304
A-401
20
B-201
80
2.18


Exemplified compound 2305
A-401
49
B-202
51
2.10


Exemplified compound 2306
A-401
80
B-202
20
2.11


Exemplified compound 2307
A-401
35
B-202
65
2.10


Exemplified compound 2308
A-401
20
B-202
80
2.09


Exemplified compound 2309
A-401
49
B-203
51
2.13


Exemplified compound 2310
A-401
80
B-203
20
2.12


Exemplified compound 2311
A-401
35
B-203
65
2.14


Exemplified compound 2312
A-401
20
B-203
80
2.14


Exemplified compound 2313
A-401
49
B-204
51
2.09


Exemplified compound 2314
A-401
80
B-204
20
2.11


Exemplified compound 2315
A-401
35
B-204
65
2.09


Exemplified compound 2316
A-401
20
B-204
80
2.08


Exemplified compound 2317
A-401
49
B-205
51
2.13


Exemplified compound 2318
A-401
80
B-205
20
2.12


Exemplified compound 2319
A-401
35
B-205
65
2.14


Exemplified compound 2320
A-401
20
B-205
80
2.14
















TABLE 9







Specific examples of polycarbonate resins











Group A
Group B














Structural
Proportion
Structural
Proportion
Dielectric


Exemplified compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified compound 2321
A-401
49
B-301
51
2.12


Exemplified compound 2322
A-401
80
B-301
20
2.12


Exemplified compound 2323
A-401
35
B-301
65
2.13


Exemplified compound 2324
A-401
20
B-301
80
2.13


Exemplified compound 2325
A-401
49
B-302
51
2.12


Exemplified compound 2326
A-401
80
B-302
20
2.12


Exemplified compound 2327
A-401
35
B-302
65
2.12


Exemplified compound 2328
A-401
20
B-302
80
2.13


Exemplified compound 2329
A-401
49
B-303
51
2.13


Exemplified compound 2330
A-401
80
B-303
20
2.12


Exemplified compound 2331
A-401
35
B-303
65
2.14


Exemplified compound 2332
A-401
20
B-303
80
2.14


Exemplified compound 2333
A-401
49
B-304
51
2.13


Exemplified compound 2334
A-401
80
B-304
20
2.12


Exemplified compound 2335
A-401
35
B-304
65
2.13


Exemplified compound 2336
A-401
20
B-304
80
2.13


Exemplified compound 2337
A-401
49
B-305
51
2.07


Exemplified compound 2338
A-401
80
B-305
20
2.10


Exemplified compound 2339
A-401
35
B-305
65
2.06


Exemplified compound 2340
A-401
20
B-305
80
2.05


Exemplified compound 2341
A-401
49
B-306
51
2.14


Exemplified compound 2342
A-401
80
B-306
20
2.12


Exemplified compound 2343
A-401
35
B-306
65
2.15


Exemplified compound 2344
A-401
20
B-306
80
2.15


Exemplified compound 2345
A-401
49
B-307
51
2.12


Exemplified compound 2346
A-401
80
B-307
20
2.12


Exemplified compound 2347
A-401
35
B-307
65
2.12


Exemplified compound 2348
A-401
20
B-307
80
2.13


Exemplified compound 2349
A-401
49
B-308
51
2.13


Exemplified compound 2350
A-401
80
B-308
20
2.12


Exemplified compound 2351
A-401
35
B-308
65
2.14


Exemplified compound 2352
A-401
20
B-308
80
2.14


Exemplified compound 2353
A-401
49
B-401
51
2.17


Exemplified compound 2354
A-401
80
B-401
20
2.13


Exemplified compound 2355
A-401
35
B-401
65
2.18


Exemplified compound 2356
A-401
20
B-401
80
2.20


Exemplified compound 2357
A-401
49
B-402
51
2.21


Exemplified compound 2358
A-401
80
B-402
20
2.15


Exemplified compound 2359
A-401
35
B-402
65
2.23


Exemplified compound 2360
A-401
20
B-402
80
2.26


Exemplified compound 2361
A-401
49
B-403
51
2.26


Exemplified compound 2362
A-401
80
B-403
20
2.17


Exemplified compound 2363
A-401
35
B-403
65
2.30


Exemplified compound 2364
A-401
20
B-403
80
2.35


Exemplified compound 2365
A-401
49
B-404
51
2.14


Exemplified compound 2366
A-401
80
B-404
20
2.12


Exemplified compound 2367
A-401
35
B-404
65
2.15


Exemplified compound 2368
A-401
20
B-404
80
2.16


Exemplified compound 2369
A-401
49
B-405
51
2.20


Exemplified compound 2370
A-401
80
B-405
20
2.15


Exemplified compound 2371
A-401
35
B-405
65
2.23


Exemplified compound 2372
A-401
20
B-405
80
2.25


Exemplified compound 2373
A-402
49
B-101
51
2.08


Exemplified compound 2374
A-402
80
B-101
20
2.07


Exemplified compound 2375
A-402
35
B-101
65
2.09


Exemplified compound 2376
A-402
20
B-101
80
2.10


Exemplified compound 2377
A-402
49
B-102
51
2.14


Exemplified compound 2378
A-402
80
B-102
20
2.09


Exemplified compound 2379
A-402
35
B-102
65
2.16


Exemplified compound 2380
A-402
20
B-102
80
2.18


Exemplified compound 2381
A-402
49
B-103
51
2.08


Exemplified compound 2382
A-402
80
B-103
20
2.07


Exemplified compound 2383
A-402
35
B-103
65
2.09


Exemplified compound 2384
A-402
20
B-103
80
2.10


Exemplified compound 2385
A-402
49
B-104
51
2.06


Exemplified compound 2386
A-402
80
B-104
20
2.06


Exemplified compound 2387
A-402
35
B-104
65
2.06


Exemplified compound 2388
A-402
20
B-104
80
2.07


Exemplified compound 2389
A-402
49
B-105
51
2.08


Exemplified compound 2390
A-402
80
B-105
20
2.06


Exemplified compound 2391
A-402
35
B-105
65
2.08


Exemplified compound 2392
A-402
20
B-105
80
2.09


Exemplified compound 2393
A-402
49
B-201
51
2.13


Exemplified compound 2394
A-402
80
B-201
20
2.09


Exemplified compound 2395
A-402
35
B-201
65
2.15


Exemplified compound 2396
A-402
20
B-201
80
2.17


Exemplified compound 2397
A-402
49
B-202
51
2.07


Exemplified compound 2398
A-402
80
B-202
20
2.06


Exemplified compound 2399
A-402
35
B-202
65
2.08


Exemplified compound 2400
A-402
20
B-202
80
2.08


Exemplified compound 2401
A-402
49
B-203
51
2.11


Exemplified compound 2402
A-402
80
B-203
20
2.08


Exemplified compound 2403
A-402
35
B-203
65
2.12


Exemplified compound 2404
A-402
20
B-203
80
2.13


Exemplified compound 2405
A-402
49
B-204
51
2.07


Exemplified compound 2406
A-402
80
B-204
20
2.06


Exemplified compound 2407
A-402
35
B-204
65
2.07


Exemplified compound 2408
A-402
20
B-204
80
2.07


Exemplified compound 2409
A-402
49
B-205
51
2.10


Exemplified compound 2410
A-402
80
B-205
20
2.07


Exemplified compound 2411
A-402
35
B-205
65
2.12


Exemplified compound 2412
A-402
20
B-205
80
2.13


Exemplified compound 2413
A-402
49
B-301
51
2.10


Exemplified compound 2414
A-402
80
B-301
20
2.07


Exemplified compound 2415
A-402
35
B-301
65
2.11


Exemplified compound 2416
A-402
20
B-301
80
2.12


Exemplified compound 2417
A-402
49
B-302
51
2.09


Exemplified compound 2418
A-402
80
B-302
20
2.07


Exemplified compound 2419
A-402
35
B-302
65
2.10


Exemplified compound 2420
A-402
20
B-302
80
2.12


Exemplified compound 2421
A-402
49
B-303
51
2.11


Exemplified compound 2422
A-402
80
B-303
20
2.08


Exemplified compound 2423
A-402
35
B-303
65
2.12


Exemplified compound 2424
A-402
20
B-303
80
2.13


Exemplified compound 2425
A-402
49
B-304
51
2.10


Exemplified compound 2426
A-402
80
B-304
20
2.07


Exemplified compound 2427
A-402
35
B-304
65
2.11


Exemplified compound 2428
A-402
20
B-304
80
2.12


Exemplified compound 2429
A-402
49
B-305
51
2.04


Exemplified compound 2430
A-402
80
B-305
20
2.05


Exemplified compound 2431
A-402
35
B-305
65
2.04


Exemplified compound 2432
A-402
20
B-305
80
2.04


Exemplified compound 2433
A-402
49
B-306
51
2.11


Exemplified compound 2434
A-402
80
B-306
20
2.08


Exemplified compound 2435
A-402
35
B-306
65
2.13


Exemplified compound 2436
A-402
20
B-306
80
2.14


Exemplified compound 2437
A-402
49
B-307
51
2.09


Exemplified compound 2438
A-402
80
B-307
20
2.07


Exemplified compound 2439
A-402
35
B-307
65
2.10


Exemplified compound 2440
A-402
20
B-307
80
2.11
















TABLE 10







Specific examples of polycarbonate resins











Group A
Group B















Propor-

Propor-
Dielec-


Exemplified
Structural
tion
Structural
tion
tric


compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified
A-402
49
B-308
51
2.10


compound 2441


Exemplified
A-402
80
B-308
20
2.07


compound 2442


Exemplified
A-402
35
B-308
65
2.12


compound 2443


Exemplified
A-402
20
B-308
80
2.13


compound 2444


Exemplified
A-402
49
B-401
51
2.14


compound 2445


Exemplified
A-402
80
B-401
20
2.09


compound 2446


Exemplified
A-402
35
B-401
65
2.16


compound 2447


Exemplified
A-402
20
B-401
80
2.19


compound 2448


Exemplified
A-402
49
B-402
51
2.18


compound 2449


Exemplified
A-402
80
B-402
20
2.10


compound 2450


Exemplified
A-402
35
B-402
65
2.21


compound 2451


Exemplified
A-402
20
B-402
80
2.25


compound 2452


Exemplified
A-402
49
B-403
51
2.23


compound 2453


Exemplified
A-402
80
B-403
20
2.13


compound 2454


Exemplified
A-402
35
B-403
65
2.28


compound 2455


Exemplified
A-402
20
B-403
80
2.34


compound 2456


Exemplified
A-402
49
B-404
51
2.11


compound 2457


Exemplified
A-402
80
B-404
20
2.08


compound 2458


Exemplified
A-402
35
B-404
65
2.13


compound 2459


Exemplified
A-402
20
B-404
80
2.14


compound 2460


Exemplified
A-402
49
B-405
51
2.17


compound 2461


Exemplified
A-402
80
B-405
20
2.10


compound 2462


Exemplified
A-402
35
B-405
65
2.21


compound 2463


Exemplified
A-402
20
B-405
80
2.24


compound 2464


Exemplified
A-403
49
B-101
51
2.04


compound 2465


Exemplified
A-403
80
B-101
20
2.00


compound 2466


Exemplified
A-403
35
B-101
65
2.06


compound 2467


Exemplified
A-403
20
B-101
80
2.08


compound 2468


Exemplified
A-403
49
B-102
51
2.10


compound 2469


Exemplified
A-403
80
B-102
20
2.02


compound 2470


Exemplified
A-403
35
B-102
65
2.13


compound 2471


Exemplified
A-403
20
B-102
80
2.16


compound 2472


Exemplified
A-403
49
B-103
51
2.04


compound 2473


Exemplified
A-403
80
B-103
20
2.00


compound 2474


Exemplified
A-403
35
B-103
65
2.06


compound 2475


Exemplified
A-403
20
B-103
80
2.08


compound 2476


Exemplified
A-403
49
B-104
51
2.02


compound 2477


Exemplified
A-403
80
B-104
20
1.99


compound 2478


Exemplified
A-403
35
B-104
65
2.04


compound 2479


Exemplified
A-403
20
B-104
80
2.05


compound 2480


Exemplified
A-403
49
B-105
51
2.04


compound 2481


Exemplified
A-403
80
B-105
20
2.00


compound 2482


Exemplified
A-403
35
B-105
65
2.05


compound 2483


Exemplified
A-403
20
B-105
80
2.07


compound 2484


Exemplified
A-403
49
B-201
51
2.09


compound 2485


Exemplified
A-403
80
B-201
20
2.02


compound 2486


Exemplified
A-403
35
B-201
65
2.12


compound 2487


Exemplified
A-403
20
B-201
80
2.16


compound 2488


Exemplified
A-403
49
B-202
51
2.03


compound 2489


Exemplified
A-403
80
B-202
20
2.00


compound 2490


Exemplified
A-403
35
B-202
65
2.05


compound 2491


Exemplified
A-403
20
B-202
80
2.07


compound 2492


Exemplified
A-403
49
B-203
51
2.07


compound 2493


Exemplified
A-403
80
B-203
20
2.01


compound 2494


Exemplified
A-403
35
B-203
65
2.09


compound 2495


Exemplified
A-403
20
B-203
80
2.12


compound 2496


Exemplified
A-403
49
B-204
51
2.03


compound 2497


Exemplified
A-403
80
B-204
20
2.00


compound 2498


Exemplified
A-403
35
B-204
65
2.04


compound 2499


Exemplified
A-403
20
B-204
80
2.05


compound 2500


Exemplified
A-403
49
B-205
51
2.06


compound 2501


Exemplified
A-403
80
B-205
20
2.01


compound 2502


Exemplified
A-403
35
B-205
65
2.09


compound 2503


Exemplified
A-403
20
B-205
80
2.11


compound 2504


Exemplified
A-403
49
B-301
51
2.06


compound 2505


Exemplified
A-403
80
B-301
20
2.01


compound 2506


Exemplified
A-403
35
B-301
65
2.08


compound 2507


Exemplified
A-403
20
B-301
80
2.10


compound 2508


Exemplified
A-403
49
B-302
51
2.06


compound 2509


Exemplified
A-403
80
B-302
20
2.01


compound 2510


Exemplified
A-403
35
B-302
65
2.08


compound 2511


Exemplified
A-403
20
B-302
80
2.10


compound 2512


Exemplified
A-403
49
B-303
51
2.07


compound 2513


Exemplified
A-403
80
B-303
20
2.01


compound 2514


Exemplified
A-403
35
B-303
65
2.09


compound 2515


Exemplified
A-403
20
B-303
80
2.12


compound 2516


Exemplified
A-403
49
B-304
51
2.06


compound 2517


Exemplified
A-403
80
B-304
20
2.01


compound 2518


Exemplified
A-403
35
B-304
65
2.08


compound 2519


Exemplified
A-403
20
B-304
80
2.11


compound 2520


Exemplified
A-403
49
B-305
51
2.01


compound 2521


Exemplified
A-403
80
B-305
20
1.99


compound 2522


Exemplified
A-403
35
B-305
65
2.01


compound 2523


Exemplified
A-403
20
B-305
80
2.02


compound 2524


Exemplified
A-403
49
B-306
51
2.07


compound 2525


Exemplified
A-403
80
B-306
20
2.01


compound 2526


Exemplified
A-403
35
B-306
65
2.10


compound 2527


Exemplified
A-403
20
B-306
80
2.13


compound 2528


Exemplified
A-403
49
B-307
51
2.05


compound 2529


Exemplified
A-403
80
B-307
20
2.01


compound 2530


Exemplified
A-403
35
B-307
65
2.08


compound 2531


Exemplified
A-403
20
B-307
80
2.10


compound 2532


Exemplified
A-403
49
B-308
51
2.06


compound 2533


Exemplified
A-403
80
B-308
20
2.01


compound 2534


Exemplified
A-403
35
B-308
65
2.09


compound 2535


Exemplified
A-403
20
B-308
80
2.11


compound 2536


Exemplified
A-403
49
B-401
51
2.10


compound 2537


Exemplified
A-403
80
B-401
20
2.03


compound 2538


Exemplified
A-403
35
B-401
65
2.13


compound 2539


Exemplified
A-403
20
B-401
80
2.17


compound 2540


Exemplified
A-403
49
B-402
51
2.14


compound 2541


Exemplified
A-403
80
B-402
20
2.04


compound 2542


Exemplified
A-403
35
B-402
65
2.19


compound 2543


Exemplified
A-403
20
B-402
80
2.24


compound 2544


Exemplified
A-403
49
B-403
51
2.20


compound 2545


Exemplified
A-403
80
B-403
20
2.06


compound 2546


Exemplified
A-403
35
B-403
65
2.26


compound 2547


Exemplified
A-403
20
B-403
80
2.32


compound 2548


Exemplified
A-403
49
B-404
51
2.07


compound 2549


Exemplified
A-403
80
B-404
20
2.01


compound 2550


Exemplified
A-403
35
B-404
65
2.10


compound 2551


Exemplified
A-403
20
B-404
80
2.13


compound 2552


Exemplified
A-403
49
B-405
51
2.13


compound 2553


Exemplified
A-403
80
B-405
20
2.04


compound 2554


Exemplified
A-403
35
B-405
65
2.18


compound 2555


Exemplified
A-403
20
B-405
80
2.22


compound 2556


Exemplified
A-404
49
B-101
51
2.08


compound 2557


Exemplified
A-404
80
B-101
20
2.07


compound 2558


Exemplified
A-404
35
B-101
65
2.09


compound 2559


Exemplified
A-404
20
B-101
80
2.10


compound 2560
















TABLE 11







Specific examples of polycarbonate resins











Group A
Group B















Propor-

Propor-
Dielec-


Exemplified
Structural
tion
Structural
tion
tric


compound No.
unit
(mol %)
unit
(mol %)
constant















Exemplified
A-404
49
B-102
51
2.14


compound 2561


Exemplified
A-404
80
B-102
20
2.09


compound 2562


Exemplified
A-404
35
B-102
65
2.16


compound 2563


Exemplified
A-404
20
B-102
80
2.18


compound 2564


Exemplified
A-404
49
B-103
51
2.08


compound 2565


Exemplified
A-404
80
B-103
20
2.07


compound 2566


Exemplified
A-404
35
B-103
65
2.09


compound 2567


Exemplified
A-404
20
B-103
80
2.10


compound 2568


Exemplified
A-404
49
B-104
51
2.06


compound 2569


Exemplified
A-404
80
B-104
20
2.06


compound 2570


Exemplified
A-404
35
B-104
65
2.06


compound 2571


Exemplified
A-404
20
B-104
80
2.07


compound 2572


Exemplified
A-404
49
B-105
51
2.08


compound 2573


Exemplified
A-404
80
B-105
20
2.07


compound 2574


Exemplified
A-404
35
B-105
65
2.08


compound 2575


Exemplified
A-404
20
B-105
80
2.09


compound 2576


Exemplified
A-404
49
B-201
51
2.13


compound 2577


Exemplified
A-404
80
B-201
20
2.09


compound 2578


Exemplified
A-404
35
B-201
65
2.15


compound 2579


Exemplified
A-404
20
B-201
80
2.17


compound 2580


Exemplified
A-404
49
B-202
51
2.07


compound 2581


Exemplified
A-404
80
B-202
20
2.06


compound 2582


Exemplified
A-404
35
B-202
65
2.08


compound 2583


Exemplified
A-404
20
B-202
80
2.08


compound 2584


Exemplified
A-404
49
B-203
51
2.11


compound 2585


Exemplified
A-404
80
B-203
20
2.08


compound 2586


Exemplified
A-404
35
B-203
65
2.12


compound 2587


Exemplified
A-404
20
B-203
80
2.13


compound 2588


Exemplified
A-404
49
B-204
51
2.07


compound 2589


Exemplified
A-404
80
B-204
20
2.06


compound 2590


Exemplified
A-404
35
B-204
65
2.07


compound 2591


Exemplified
A-404
20
B-204
80
2.07


compound 2592


Exemplified
A-404
49
B-205
51
2.10


compound 2593


Exemplified
A-404
80
B-205
20
2.08


compound 2594


Exemplified
A-404
35
B-205
65
2.12


compound 2595


Exemplified
A-404
20
B-205
80
2.13


compound 2596


Exemplified
A-404
49
B-301
51
2.10


compound 2597


Exemplified
A-404
80
B-301
20
2.07


compound 2598


Exemplified
A-404
35
B-301
65
2.11


compound 2599


Exemplified
A-404
20
B-301
80
2.12


compound 2600


Exemplified
A-404
49
B-302
51
2.10


compound 2601


Exemplified
A-404
80
B-302
20
2.07


compound 2602


Exemplified
A-404
35
B-302
65
2.11


compound 2603


Exemplified
A-404
20
B-302
80
2.12


compound 2604


Exemplified
A-404
49
B-303
51
2.11


compound 2605


Exemplified
A-404
80
B-303
20
2.08


compound 2606


Exemplified
A-404
35
B-303
65
2.12


compound 2607


Exemplified
A-404
20
B-303
80
2.13


compound 2608


Exemplified
A-404
49
B-304
51
2.10


compound 2609


Exemplified
A-404
80
B-304
20
2.07


compound 2610


Exemplified
A-404
35
B-304
65
2.11


compound 2611


Exemplified
A-404
20
B-304
80
2.12


compound 2612


Exemplified
A-404
49
B-305
51
2.05


compound 2613


Exemplified
A-404
80
B-305
20
2.05


compound 2614


Exemplified
A-404
35
B-305
65
2.04


compound 2615


Exemplified
A-404
20
B-305
80
2.04


compound 2616


Exemplified
A-404
49
B-306
51
2.11


compound 2617


Exemplified
A-404
80
B-306
20
2.08


compound 2618


Exemplified
A-404
35
B-306
65
2.13


compound 2619


Exemplified
A-404
20
B-306
80
2.14


compound 2620


Exemplified
A-404
49
B-307
51
2.09


compound 2621


Exemplified
A-404
80
B-307
20
2.07


compound 2622


Exemplified
A-404
35
B-307
65
2.10


compound 2623


Exemplified
A-404
20
B-307
80
2.12


compound 2624


Exemplified
A-404
49
B-308
51
2.10


compound 2625


Exemplified
A-404
80
B-308
20
2.08


compound 2626


Exemplified
A-404
35
B-308
65
2.12


compound 2627


Exemplified
A-404
20
B-308
80
2.13


compound 2628


Exemplified
A-404
49
B-401
51
2.14


compound 2629


Exemplified
A-404
80
B-401
20
2.09


compound 2630


Exemplified
A-404
35
B-401
65
2.16


compound 2631


Exemplified
A-404
20
B-401
80
2.19


compound 2632


Exemplified
A-404
49
B-402
51
2.18


compound 2633


Exemplified
A-404
80
B-402
20
2.11


compound 2634


Exemplified
A-404
35
B-402
65
2.22


compound 2635


Exemplified
A-404
20
B-402
80
2.25


compound 2636


Exemplified
A-404
49
B-403
51
2.24


compound 2637


Exemplified
A-404
80
B-403
20
2.13


compound 2638


Exemplified
A-404
35
B-403
65
2.28


compound 2639


Exemplified
A-404
20
B-403
80
2.34


compound 2640


Exemplified
A-404
49
B-404
51
2.11


compound 2641


Exemplified
A-404
80
B-404
20
2.08


compound 2642


Exemplified
A-404
35
B-404
65
2.13


compound 2643


Exemplified
A-404
20
B-404
80
2.14


compound 2644


Exemplified
A-404
49
B-405
51
2.17


compound 2645


Exemplified
A-404
80
B-405
20
2.10


compound 2646


Exemplified
A-404
35
B-405
65
2.21


compound 2647


Exemplified
A-404
20
B-405
80
2.24


compound 2648


Exemplified
A-405
49
B-101
51
2.07


compound 2649


Exemplified
A-405
80
B-101
20
2.04


compound 2650


Exemplified
A-405
35
B-101
65
2.08


compound 2651


Exemplified
A-405
20
B-101
80
2.09


compound 2652


Exemplified
A-405
49
B-102
51
2.12


compound 2653


Exemplified
A-405
80
B-102
20
2.06


compound 2654


Exemplified
A-405
35
B-102
65
2.14


compound 2655


Exemplified
A-405
20
B-102
80
2.17


compound 2656


Exemplified
A-405
49
B-103
51
2.07


compound 2657


Exemplified
A-405
80
B-103
20
2.04


compound 2658


Exemplified
A-405
35
B-103
65
2.08


compound 2659


Exemplified
A-405
20
B-103
80
2.09


compound 2660


Exemplified
A-405
49
B-104
51
2.04


compound 2661


Exemplified
A-405
80
B-104
20
2.03


compound 2662


Exemplified
A-405
35
B-104
65
2.05


compound 2663


Exemplified
A-405
20
B-104
80
2.06


compound 2664


Exemplified
A-405
49
B-105
51
2.06


compound 2665


Exemplified
A-405
80
B-105
20
2.04


compound 2666


Exemplified
A-405
35
B-105
65
2.07


compound 2667


Exemplified
A-405
20
B-105
80
2.08


compound 2668


Exemplified
A-405
49
B-201
51
2.11


compound 2669


Exemplified
A-405
80
B-201
20
2.06


compound 2670


Exemplified
A-405
35
B-201
65
2.14


compound 2671


Exemplified
A-405
20
B-201
80
2.17


compound 2672


Exemplified
A-405
49
B-202
51
2.06


compound 2673


Exemplified
A-405
80
B-202
20
2.04


compound 2674


Exemplified
A-405
35
B-202
65
2.07


compound 2675


Exemplified
A-405
20
B-202
80
2.08


compound 2676


Exemplified
A-405
49
B-203
51
2.09


compound 2677


Exemplified
A-405
80
B-203
20
2.05


compound 2678


Exemplified
A-405
35
B-203
65
2.11


compound 2679


Exemplified
A-405
20
B-203
80
2.13


compound 2680
















TABLE 12







Specific examples of polycarbonate resins














Group A
Group B

Group A
Group B





















Propor-

Propor-
Dielec-


Propor-

Propor-
Dielec-


Exemplified
Structural
tion
Structural
tion
tric
Exemplified
Structural
tion
Structural
tion
tric


compound No.
unit
(mol %)
unit
(mol %)
constant
compound No.
unit
(mol %)
unit
(mol %)
constant





















Exemplified
A-405
49
B-204
51
2.05
Exemplified
A-405
49
B-204
51
2.05


compound 2681





compound 2681


Exemplified
A-405
80
B-204
20
2.03
Exemplified
A-405
80
B-204
20
2.03


compound 2682





compound 2682


Exemplified
A-405
35
B-204
65
2.06
Exemplified
A-405
35
B-204
65
2.06


compound 2683





compound 2683


Exemplified
A-405
20
B-204
80
2.06
Exemplified
A-405
20
B-204
80
2.06


compound 2684





compound 2684


Exemplified
A-405
49
B-205
51
2.09
Exemplified
A-405
49
B-205
51
2.09


compound 2685





compound 2685


Exemplified
A-405
80
B-205
20
2.05
Exemplified
A-405
80
B-205
20
2.05


compound 2686





compound 2686


Exemplified
A-405
35
B-205
65
2.10
Exemplified
A-405
35
B-205
65
2.10


compound 2687





compound 2687


Exemplified
A-405
20
B-205
80
2.12
Exemplified
A-405
20
B-205
80
2.12


compound 2688





compound 2688


Exemplified
A-405
49
B-301
51
2.08
Exemplified
A-405
49
B-301
51
2.08


compound 2689





compound 2689


Exemplified
A-405
80
B-301
20
2.04
Exemplified
A-405
80
B-301
20
2.04


compound 2690





compound 2690


Exemplified
A-405
35
B-301
65
2.09
Exemplified
A-405
35
B-301
65
2.09


compound 2691





compound 2691


Exemplified
A-405
20
B-301
80
2.11
Exemplified
A-405
20
B-301
80
2.11


compound 2692





compound 2692


Exemplified
A-405
49
B-302
51
2.08
Exemplified
A-405
49
B-302
51
2.08


compound 2693





compound 2693


Exemplified
A-405
80
B-302
20
2.04
Exemplified
A-405
80
B-302
20
2.04


compound 2694





compound 2694


Exemplified
A-405
35
B-302
65
2.09
Exemplified
A-405
35
B-302
65
2.09


compound 2695





compound 2695


Exemplified
A-405
20
B-302
80
2.11
Exemplified
A-405
20
B-302
80
2.11


compound 2696





compound 2696


Exemplified
A-405
49
B-303
51
2.09
Exemplified
A-405
49
B-303
51
2.09


compound 2697





compound 2697


Exemplified
A-405
80
B-303
20
2.05
Exemplified
A-405
80
B-303
20
2.05


compound 2698





compound 2698


Exemplified
A-405
35
B-303
65
2.11
Exemplified
A-405
35
B-303
65
2.11


compound 2699





compound 2699


Exemplified
A-405
20
B-303
80
2.13
Exemplified
A-405
20
B-303
80
2.13


compound 2700





compound 2700


Exemplified
A-405
49
B-304
51
2.08
Exemplified
A-405
49
B-304
51
2.08


compound 2701





compound 2701


Exemplified
A-405
80
B-304
20
2.05
Exemplified
A-405
80
B-304
20
2.05


compound 2702





compound 2702


Exemplified
A-405
35
B-304
65
2.10
Exemplified
A-405
35
B-304
65
2.10


compound 2703





compound 2703


Exemplified
A-405
20
B-304
80
2.12
Exemplified
A-405
20
B-304
80
2.12


compound 2704





compound 2704


Exemplified
A-405
49
B-305
51
2.03
Exemplified
A-405
49
B-305
51
2.03


compound 2705





compound 2705


Exemplified
A-405
80
B-305
20
2.02
Exemplified
A-405
80
B-305
20
2.02


compound 2706





compound 2706


Exemplified
A-405
35
B-305
65
2.03
Exemplified
A-405
35
B-305
65
2.03


compound 2707





compound 2707


Exemplified
A-405
20
B-305
80
2.03
Exemplified
A-405
20
B-305
80
2.03


compound 2708





compound 2708


Exemplified
A-405
49
B-306
51
2.09
Exemplified
A-405
49
B-306
51
2.09


compound 2709





compound 2709


Exemplified
A-405
80
B-306
20
2.05
Exemplified
A-405
80
B-306
20
2.05


compound 2710





compound 2710


Exemplified
A-405
35
B-306
65
2.11
Exemplified
A-405
35
B-306
65
2.11


compound 2711





compound 2711


Exemplified
A-405
20
B-306
80
2.14
Exemplified
A-405
20
B-306
80
2.14


compound 2712





compound 2712


Exemplified
A-405
49
B-307
51
2.08
Exemplified
A-405
49
B-307
51
2.08


compound 2713





compound 2713


Exemplified
A-405
80
B-307
20
2.04
Exemplified
A-405
80
B-307
20
2.04


compound 2714





compound 2714


Exemplified
A-405
35
B-307
65
2.09
Exemplified
A-405
35
B-307
65
2.09


compound 2715





compound 2715


Exemplified
A-405
20
B-307
80
2.11
Exemplified
A-405
20
B-307
80
2.11


compound 2716





compound 2716


Exemplified
A-405
49
B-308
51
2.09
Exemplified
A-405
49
B-308
51
2.09


compound 2717





compound 2717


Exemplified
A-405
80
B-308
20
2.05
Exemplified
A-405
80
B-308
20
2.05


compound 2718





compound 2718


Exemplified
A-405
35
B-308
65
2.10
Exemplified
A-405
35
B-308
65
2.10


compound 2719





compound 2719


Exemplified
A-405
20
B-308
80
2.12
Exemplified
A-405
20
B-308
80
2.12


compound 2720





compound 2720


Exemplified
A-405
49
B-401
51
2.12
Exemplified
A-405
49
B-401
51
2.12


compound 2721





compound 2721


Exemplified
A-405
80
B-401
20
2.06
Exemplified
A-405
80
B-401
20
2.06


compound 2722





compound 2722


Exemplified
A-405
35
B-401
65
2.15
Exemplified
A-405
35
B-401
65
2.15


compound 2723





compound 2723


Exemplified
A-405
20
B-401
80
2.18
Exemplified
A-405
20
B-401
80
2.18


compound 2724





compound 2724


Exemplified
A-405
49
B-402
51
2.16
Exemplified
A-405
49
B-402
51
2.16


compound 2725





compound 2725


Exemplified
A-405
80
B-402
20
2.08
Exemplified
A-405
80
B-402
20
2.08


compound 2726





compound 2726


Exemplified
A-405
35
B-402
65
2.20
Exemplified
A-405
35
B-402
65
2.20


compound 2727





compound 2727


Exemplified
A-405
20
B-402
80
2.24
Exemplified
A-405
20
B-402
80
2.24


compound 2728





compound 2728


Exemplified
A-405
49
B-403
51
2.22
Exemplified
A-405
49
B-403
51
2.22


compound 2729





compound 2729


Exemplified
A-405
80
B-403
20
2.10
Exemplified
A-405
80
B-403
20
2.10


compound 2730





compound 2730


Exemplified
A-405
35
B-403
65
2.27
Exemplified
A-405
35
B-403
65
2.27


compound 2731





compound 2731


Exemplified
A-405
20
B-403
80
2.33
Exemplified
A-405
20
B-403
80
2.33


compound 2732





compound 2732


Exemplified
A-405
49
B-404
51
2.10
Exemplified
A-405
49
B-404
51
2.10


compound 2733





compound 2733


Exemplified
A-405
80
B-404
20
2.05
Exemplified
A-405
80
B-404
20
2.05


compound 2734





compound 2734


Exemplified
A-405
35
B-404
65
2.12
Exemplified
A-405
35
B-404
65
2.12


compound 2735





compound 2735


Exemplified
A-405
20
B-404
80
2.14
Exemplified
A-405
20
B-404
80
2.14


compound 2736





compound 2736


Exemplified
A-405
49
B-405
51
2.16
Exemplified
A-405
49
B-405
51
2.16


compound 2737





compound 2737


Exemplified
A-405
80
B-405
20
2.07
Exemplified
A-405
80
B-405
20
2.07


compound 2738





compound 2738


Exemplified
A-405
35
B-405
65
2.19
Exemplified
A-405
35
B-405
65
2.19


compound 2739





compound 2739


Exemplified
A-405
20
B-405
80
2.23
Exemplified
A-405
20
B-405
80
2.23


compound 2740





compound 2740









Synthesis of the Polycarbonate Resin

The following describes a method for synthesizing exemplified compound 1001 by way of example. The other polycarbonate resins can be synthesized using appropriate group-A and group-B structural raw materials (raw materials from which the structural units selected from group A and group B, respectively, are produced) in appropriate amounts in the method described in Synthesis of exemplified compound. 1001 below. The weight-average molecular weight of the resin can be adjusted by controlling the amount of the molecular-weight modifier.
Synthesis of Exemplified Compound 1001
The following materials were dissolved in 1100 ml of a 5% by mass aqueous solution of sodium hydroxide: 53.0 g (0.196 mol) of 2,2-bis(4-hydroxyphenyl)-4-methyl pentane (Tokyo Chemical Industry, product code D3267) as group-A structural raw material, 41.2 g (0.204 mol) of bis (4-hydroxyphenyl)ether (Tokyo Chemical Industry, product code 132121) as group-B structural raw material, and 0.1 g of hydrosulfide. After the addition of 500 ml of methylene chloride, 60 g of phosgene was blown into the solution over 60 minutes with stirring, with the temperature maintained at 15° C.
The reaction solution into which the phosgene had been blown was stirred with 1.3 g of p-t-butylphenol (Tokyo Chemical Industry, product code B0383) as a molecular-weight modifier until emulsification. The resulting emulsion was stirred at 23° C. for 1 hour with 0.4 ml of triethylamine for polymerization.
After the completion of polymerization, the reaction solution was separated into aqueous and organic phases. The organic phase was neutralized with phosphoric acid and then repeatedly washed with water unitl the conductivity of the washing (aqueous phase) was 10 μS/cm or less. The resulting solution of polymer was added dropwise into warm water kept at 45° C., and the solvent was evaporated away. This yielded a white powdery precipitate. This precipitate was collected through filtration and dried at 110° C. for 24 hours. In this way, the exemplified compound 1001 polycarbonate resin was obtained as a copolymer composed of group-A structural unit A-101 and group-B structural unit B-101.
The obtained polycarbonate resin was analyzed using infrared absorption spectroscopy the spectrum had a carbonyl absorption at around 1770 am.−1 and an ether absorption at around 1240 cm−1, identifying the product to be a polycarbonate resin.
Electrophotographic Photosensitive Member
An electrophotographic photosensitive member according to an aspect of the invention has a support, a charge generation layer, and a charge transport layer as a surface layer in this order. There may be other layers between the support and the charge transport layer. The details of the individual layers are given below.
This electrophotographdc photosensitive member can be manufactured through, for example, preparation of coating liquids for forming the layers described below and subsequent application and drying of these liquids in the desired order of layers. Examples of methods that can be used to apply the coating liquids include dip coating, spray coating, curtain coating, and spin coating. In particular, dip coating provides excellent efficiency and productivity.
Support
in an embodiment of the invention, the support can be a conductive support, i.e., a support having electroconductivity. Examples of conductive supports include supports made of aluminum, iron, nickel, copper, gold, or other metals or alloys and supports composed of an insulating substrate, such as polyester resin, polycarbonate resin, polyimide resin, or glass, and any of the following thin films thereon: a thin film of aluminum, chromium, silver, gold, or similar metals; a thin film of inddum oxide, tin oxide, zinc oxide, or similar conductive materials; and a thin film of a conductive ink containing silver nanowires.
The surface of the support may have been treated. for the purpose of improved electrical characteristics and reduced interference fringes. Examples of treatments Include anodization and other electrochemical processes, wet honing, blasting, and cutting.
With regard to shape, the support can be, for example, a cylinder or a film.
Conductive Layer
In an embodiment of the invention, there may be a conductive layer on the support. Such a conductive layer prevents interference fringes by covering irregularities and defects on the support. The average thickness of the conductive layer can be 5 μm or more and 40 μm or less, preferably 10 μm or more and 30 μm or less.
The conductive layer may contain conducive particles and a binder resin. The conductive particles can be carbon black, metallic particles, metal oxide particles, or similar.
The metal oxide particles can be particles of zinc oxide, white lead, aluminum oxide, indium oxide, silicon oxide, zirconium oxide, tin oxide, titanium oxide, magnesium oxide, antimony oxide, bismuth oxide, tin-doped indium oxide, antinomy- or tantalum-doped tin oxide, or similar. A combination of two or more of these particles can also be used. Particles of zinc oxide, tin oxide, and titanium oxide are preferred. In particular, titanium oxide particles, absorbing little of visible and near-infrared light and white in color, provide high sensitivity. Titanium oxide has several crystal forms, such as rutile, anatase, brookite, and amorphous, and any of these crystal forms can be used, preferably rutile. It is also possible to use needle or granular crystals of titanium oxide. The number-average primary particle diameter of the metal oxide particles can be in the range of 0.05 to 1 μm, preferably 0.1 to 0.5 μm.
The binder resin can be phenolic, polyurethane, polyamide, polyimide, polyamide-imide, polyvinyl acetal, epoxy, acrylic, melamine, polyester, or similar resins. A combination of two or more of these resins can also be used. In particular, curable resins render the conductive layer highly resistant to solvents that can be used in the coating liquids for the formation of other layers and highly adhesive to a conductive support, without compromising the dispersibility and dispersion stability of metal oxide particles. Such a curable resin can be a thermosetting resin. Examples of thermosetting resins include thermosetting phenolic resins and thermosetting polyurethane resins.
Undercoat Layer
In an embodiment of the invention, there may be an undercoat layer on the support or the conductive layer. Such an undercoat layer provides enhanced barrier properties and adhesiveness. The average thickness of the undercoat layer can be 0.3 μm or more and 5.0 μm or less.
The undercoat layer may contain a binder resin and either an electron transport material or metal oxide particles. Such a structure provides a pathway through which electrons generated in a charge generation layer, one of the two kinds of electric charge generated in the charge generation layer, can be transported to the support. This prevents any increase in the occurrence of charge deactivation and trapping in the charge generation layer associated with improving capacity of the charge transport layer to transport charge. As a result, the initial electrical characteristics and the electrical characteristics after repeated use are improved.
Examples of electron transport materials include quinone, imide, benzimidazole, cyclopentadienylidene, fluorenone, xanthone, benzophenone, cyanovinyl, naphthylimide, and peryleneimide compounds. The electron transport material may have a polymerizable functional group, such as a hydroxy, thiol, amino, carboxy, or methoxy group.
For the metal oxide particles and the binder resin, the details are the same as in the foregoing “Conductive layer” section.
Charge Generation Layer
In an embodiment of the invention, there is a charge generation layer between the support and the charge transport layer. The charge generation layer may be contiguous to the charge transport layer. The thickness of the charge generation layer can be 0.05 μm or more and 1 μm or less, preferably 0.1 μm or more and 0.3 μm or less.
In an embodiment of the invention, the charge generation layer may contain a charge generation material and a binder resin.
The charge generation material content of the charge generation layer can be 40% by mass or more and 85% by mass or less, preferably 60% by mass or more and 80% by mass or less.
Examples of charge generation materials include: monoazo, disazo, and trisazo pigments, and other azo pigments; phthalocyanine pigments including metal phthalocyanine complexes and metal-free phthalocyanine; indigo pigments; perylene pigments; polycyclic quinone pigments; squarylium dyes; thiapyrylium salts; quinacridone pigments; azulenium salt pigments; cyanine dyes; xanthene dyes; quinone imine dyes; and styryl dyes. It is preferred that the charge generation material be a phthalocyanine pigment, more preferably crystalline gallium phthalocyanine.
Crystalline hydroxygallium phthalocyanine, crystalline chlorogallium phthalocyanine, crystalline bromogallium phthalocyanine, and crystalline iodogallium phthalocyanine have excellent sensitivity compared to other crystalline gallium phthalocyanines. Crystalline hydroxygallium phthalocyanine and crystalline chlorogallium phthalocyanine are particularly preferred. In crystalline hydroxygallium phthalocyanine, the gallium atom is coordinated by hydroxy groups as axial ligands. In crystalline chlorogallium phthalocyanine, the gallium atom is coordinated by chlorine atoms as axial ligands. In crystalline bromogallium phthalocyanine, the gallium atom is coordinated by bromine atoms as axial ligands. In crystalline iodogallium phthalocyanine, the gallium atom is coordinated by iodine atoms as axial ligands. Particularly high sensitivity is obtained with the use of a crystalline hydroxygallium phthalocyanine that exhibits peaks at Bragg angles 2θ of 7.4°±0.3° and 28.3°±0.3° in its CuKα X-ray diffraction pattern or a crystalline chlorogallium phthalocyanine that exhibits peaks at Bragg angles 2θ±0.2° of 7.4°, 16.6°, 25.5°, and 28.3° in its CuKα X-ray diffraction pattern.
The crystalline gallium phthalocyanine may contain an amide compound represented by the formula below in its crystal structure.




(In this formula, R81 represents a methyl, propyl, or vinyl group.)
Specific examples of such amide compounds include N-methylformamide, N-propylformamide, and N-vinylformamide.
The amide compound content can be 0.1% by mass or more and 1.9% by mass or less, preferably 0.3% by mass or more and 1.5% by mass or less, with respect to the gallium phthalocyanine complex in the crystalline gallium phthalocyanine. When the amide compound content is 0.1% by mass or more and 1.9% by mass or less, the dark current from the charge generation layer at increased electric field intensity is small in the opinion of the inventors, making the charge transport layer according to this embodiment of the invention more effective in reducing fog. The amide compound content can be measured using 1H NMR spectroscopy.
The crystalline gallium phthalocyanine containing an amide compound in its crystal structure can be obtained through a transformation process in which acid-pasted or dry-milled gallium phthalocyanine is wet-milled in a solvent containing the amide compound.
This process of wet milling is performed using a milling apparatus, such as a sand mill or a ball mill, with a dispersant, such as glass beads, steel beads, or alumina balls.
As for the binder resin, examples include resins such as polyester, acrylic resin, polycarbonate, polyvinyl butyral, polystyrene, polyvinyl acetate, polysulfone, acrylonitrile copolymers, and polyvinyl benzal. In particular, polyvinyl butyral and polyvinyl benzal are effective in dispersing crystalline gallium phthalocyanine.
Charge Transport Layer
In an embodiment of the invention, the charge transport layer contains a charge transport material and a polycarbonate resin that has a structural unit selected from group A and a structural unit selected from group B. The charge transport layer may optionally contain additives, such as a release agent for more efficient transfer of toner, an anti-fingerprint agent to reduce soiling or similar, filler to reduce scraping, and lubricant for higher lubricity.
In an embodiment of the invention, the charge transport layer can be formed by preparing a coating liquid for the formation of the charge transport layer by mi wing the charge transport material and the polycarbonate resin with a solvent, applying this coating liquid for the formation of the charge transport layer to form a wet coating, and drying this wet coating.
The solvent used in the coating liquid for the formation of the charge transport layer can be, for example, a ketone-based solvent, such as acetone or methyl ethyl ketone; an ester-based solvent, such as methyl acetate or ethyl acetate; an aromatic hydrocarbon solvent, such as toluene, xylene, or chlorobenzene; an ether-based solvent, such as 1,4-dioxane or tetrahydrofuran; or a halogenated hydrocarbon solvent, such as chloroform. A combination of two or more of these solvents can also be used. Solvents having a dipole moment of 1.0 D or less are preferred. Examples of solvents having a dipole moment of 1.0 D or less include o-xylene (dipole moment=0.64 D) and methylal (dipole moment=0.91 D).
The thickness of the charge transport layer can be 5 μm or more and 40 μm or less, preferably 7 μm or more and 25 μm or less.
The charge transport material content of the charge transport layer can be 20% by mass or more and 80% by mass or less, preferably 40% by mass or more and 70% by mass or less for more effective reduction of fog and higher long-term storage stability of the electrophotographic photosensitive member.
The molecular weight of the charge transport material can be 300 or more and 1,000 or less. For better electrical characteristics after repeated use and higher long-term storage stab., it is preferred that the molecular weight of the charge transport material be 600 or more and 800 or less. For more effective prevention of photomemories and higher long-term storage stability, it is preferred that the molecular weight of the charge transport material be 350 or more and 600 or less.
The charge transport material can be, for example, a triarylamine, hydrazone, stilbene, pyrazoline, oxazole, thiazole, or triallylamine compound, preferably a triarylamine compound. A combination of two or more of these compounds can also be used. The following are some specific examples of charge transport materials, represented by general formulae and exemplified compounds for each general formula.




(In this formula, Ar101 and Ar102 each independently represent a substituted or unsubstituted aryl group. R101 and R102 each independently represent a hydrogen atom, an alkyl group, or a substituted or unsubstituted aryl group. Possible substituents for an aryl group are alkyl and alkoxy groups and a halogen atom.)
Here are some exemplified compounds for (CTM-1).










(In this formula, Ar103 to Ar106 each independently represent a substituted or unsubstituted aryl group. Z101 represents a substituted or unsubstituted arylene group or a divalent group in which multiple arylene groups are linked via a vinylene group. There may be a ring formed by two adjacent substituents on Ar103 to Ar106 Possible substituents for an aryl or arylene group are alkyl and alkoxy groups and a halogen atom.)
Here are some exemplified compounds for (CTM-2).










(In this formula, R103 represents an alkyl group, a cycloalkyl group, or a substituted or unsubstituted aryl group. R104 represents a hydrogen atom, an alkyl group, or a substituted or unsubstituted aryl group. Ar107 represents a substituted or unsubstituted aryl group. Z102 represents a substituted or unsubstituted arylene group. n101 and m are integers of 1 to 3 and 0 to 2, respectively, with m+n101=3. When m is 2, the two R103 groups may be groups of the same kind or different groups, and there may be a ring formed by two adjacent substituents on the two R103 groups. There may be a ring formed by R103 and Z102. Furthermore, there may be a ring formed by Ar107 and R104 involving a linking vinylene group. Possible substituents for an aryl or arylene group are alkyl and alkoxy groups and a halogen atom.)
Here are some exemplified compounds for (CTM-3).










(In this formula, Ar108 to Ar111 each independently represent a substituted or unsubstituted aryl group. Possible substituents for an aryl group are an alkyl group, an alkoxyl group, a halogen atom, and a 4-phenyl-buta-1,3-dienyl group.)
Here are some exemplified compounds for (CTM-4).







(In this formula, Ar112 to Ar117 each independently represent a substituted or unsubstituted aryl group. Z103 represents a phenylene group, a biphenylene group, or a divalent group in which two phenylene groups are linked via an alkylene group. Possible substituents for an aryl group are alkyl and alkoxyl groups and a halogen atom.)
Here are some exemplified compounds for (CTM-5).







(In this formula, R105 to R108 each independently represent a monovalent group according to the formula below or an alkyl group or a substituted or unsubstituted aryl group, with at least one being a monovalent group according to the formula below. Z104 represents a substitute or unsubstituted aryl cue group or a divalent group in which multiple arylene groups are linked via a vinylene group. n102 is 0 or 1. Possible substituents for an aryl or arylene group are alkyl and alkoxy groups and a halogen atom.)




(In this formula, R109 and R110 each independently represent a hydrogen atom, an alkyl group, or a substituted or unsubstituted aryl group. Ar110 represents a substituted or unsubstituted aryl group. Z105 represents a substituted or unsubstituted arylene group. n2 is an integer of 1 to 3. Possible substituents for an aryl group are alkyl, alkoxy, dialkylamino, and diarylamino groups. Possible substituents for the arylene group are alkyl and alkoxy groups and a halogen atom.)
Here are some exemplified compounds for (CTM-6).







(In this formula, Ar119 represents a substituted or unsubstituted aryl group or a monovalent group according to formula (7-1) or (7-2). Ar120 and Ar121 each independently represent a substituted or unsubstituted aryl group. Possible substituents for an aryl group are alkyl and alkoxy groups and a halogen atom.)




(In this formula, Ar122 and Ar123 independently represent a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group. Possible substituents for an aryl and aralkyl group are alkyl and alkoxy groups and a halogen atom.)




(In this formula, R111 and R112 each independently represent a substituted or unsubstituted aryl group. Z106 represents a substituted or unsubstituted arylene group. Possible substituents for an aryl and arylene group are alkyl and alkoxy groups and a halogen atom.
Here are some exemplified compounds for (CTM-7).







Process Cartridge and Electrophotographic Apparatus

FIG. 1 illustrates an example of a schematic structure of an electrophotographic apparatus installed with a process cartridge that incorporates an electrophotographic photosensitive member according to an aspect of the invention.
A cylindrical (drum-shaped) electrophotographic photosensitive member 1 is driven to rotate around a shaft in the direction of the arrow at a predetermined circumferential velocity (process speed). During rotation, the surface of the electrophotographic photosensitive member 1 is charged to a predetermined positive or negative potential by a charging unit 3. The charged surface of the electrophotographic photosensitive member 1 is then irradiated with exposure light 4 emitted from an exposure unit (not illustrated). This produces an electrostatic latent image corresponding to the intended image information. The exposure light 4 is, for example, light emitted from an image exposure unit, such as a slit exposure or laser scanning exposure unit, and intensity-modulated according to the time-sequence electric digital pixel signal of the intended image information.
The electrostatic latent image formed on the surface of the electrophotographic photosensitive member 1 is then developed (normal development or reversal development) using toner contained in a development unit 5. This produces a toner image on the surface of the electrophotographic photosensitive member 1. The toner image formed on the surface of the electrophotographic photosensitive member 1 is transferred to a transfer medium 7 by a transfer unit 6. To the transfer unit 6, a bias power supply (not illustrated) applies a bias voltage having the opposite polarity with respect to the charge the toner has. When the transfer medium 7 is paper, the transfer medium 7 is discharged from a feeding section (not Illustrated) in synchronization with the rotation of the electrophotographic photosensitive member 1 and fed into the space between the electrophotographic photosensitive member 1 and the transfer unit 6.
The transfer medium 7 carrying the toner image transferred from the electrophotographic photosensitive member 1 is separated from the surface of the electrophotographic photosensitive member 1 and conveyed to a fixing unit 8, at which the toner image is fixed. As a result, an image-bearing, article (a photographic print or copy) is printed out of the electrophotographic apparatus.
The surface of the electrophotographic photosensitive member 1 following transferring the toner image to the transfer medium 7 is cleaned by a cleaning unit 9 to remove any adhering substance, such as toner (residual toner). It is also possible to collect any residual toner directly with the development element or any other component, thanks to the advent of clearnerless systems in recent years. The surface of the electrophotographic photosensitive member 1 is again used to form the image after the charge is removed through irradiation with pre-exposure light 10 emitted from a pre-exposure unit (not illustrated). When the charging unit 3 is a contact charging unit, i.e., a roller-based or similar charging unit, the pre-exposure unit may be unnecessary.
In an embodiment of the invention, two or more of these structural elements including the electrophotographic photosensitive member 1, the charging unit 3, the development unit 5, and the cleaning unit 9 may be integrally held in a container to form a process cartridge. This process cartridge may be configured to be detachably attached to the main body of an electrophotographic apparatus. For example, at least one selected from the charging unit 3, the development unit 5, the transfer unit 6, and the cleaning unit 9 and the electrophotographic photosensitive member 1 are integrally held and assembled into a cartridge, forming a process cartridge 11 that can be detachably attached to the main body of an electrophotographic apparatus using a guiding unit 12, such as rails, on the main body of the electrophotographic apparatus.
When the electrophotographic apparatus is a photocopier or a printing machine, the exposure light 4 may be a light reflected from or transmitted through the original document, and can also be a light emitted as a result of scanning with a laser beam, driving of an LED array or liquid crystal shutter array, or similar processes performed according to a signal obtained by scanning the original document with a sensor and converting it into a digital image.
The electrophotographic photosensitive member 1 according to an embodiment of the invention also has a wide range of applications in the field of applied electrophotography, including laser beam printers, CRT printers, LED printers, fax machines, liquid-crystal printers, and laser platemaking.
EXAMPLES
The following describes certain aspects of the invention in further detail using examples and comparative examples. No aspect of the invention is limited to these examples while within the scope of the invention. The term. “parts” in the following examples and comparative examples is based on mass unless otherwise specified.
Synthesis of Polycarbonate Resins
Polycarbonate resins were synthesized as follows. Table 13 summarizes the proportions (mol %) of the individual structural units and the weight-average molecular weight.
Polycarbonate Synthesis Example 1
The following materials were dissolved in 1100 ml of a 5% by mass aqueous solution of sodium hydroxide: 53.0 g (0.196 mol) of 2,2-bis(4-hydroxyphenyl)-4-methyl pentane (BPMP; Tokyo Chemical Industry, product code D3267), 41.2 g (0.204 mol) of bis(4-hydroxyphenyl)ether (DHPE; Tokyo Chemical Industry, product code D2121), and 0.1 g of hydrosuffite. After the addition of 500 ml of methylene chloride, 60 g of phosgene was blown into the solution over 60 minutes with stirring, with the temperature maintained at 15° C.
The reaction solution into which the phosgene had been blown was stirred with 1.3 g of p-t-butylphenol (PTBP; Tokyo Chemical Industry, product code B0383) as a molecular-weight modifier until emulsification. The resulting emulsion was stirred at 23° C. for 1 hour with 0.4 ml of triethylamine for polymerization.
After the completion of polymerization, the reaction solution was separated into aqueous and organic phases. The organic phase was neutralized with phosphoric acid and then repeatedly washed with water until the conductivity of the washing (aqueous phase) was 10 μS/cm or less. The resulting solution of polymer was added dropwise into warm water kept at 45° C., and the solvent was evaporated away. This yielded a white powdery precipitate. This precipitate was collected through filtration and dried at 110° C. for 24 hours. This yielded a polycarbonate resin (PC-1) having the structural units according to formulae (A-101) and (B-101).
The molecular weight of this polycarbonate resin as measured by GPC was Mw=63000. The obtained polycarbonate resin was also analyzed using infrared absorption spectroscopy, and the spectrum had a carbonyl absorption at around 1770 cm−1 an ether absorption at around 1240 cm−1, identifying the product to be a polycarbonate resin.
Polycarbonate Synthesis Example 2
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that the amount of the molecular-weight modifier PTBP was 1.0 g. This yielded a polycarbonate resin with Mw=78000 (PC-2).
Polycarbonate Synthesis Example 3
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that the amount of the molecular-weight modifier PTBP was 1.7 g. This yielded a polycarbonate resin with Mw=50000 (PC-3).
Polycarbonate Synthesis Example 4
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that the amount of the molecular-weight modifier PTBP was 1.1 g. This yielded a polycarbonate resin with Mw 72000 (PC-4).
Polycarbonate Synthesis Example 5
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that the amount of the molecular-weight modifier PTBP was 2.7 g. This yielded a polycarbonate resin with Mw=34000 (PC-5).
Polycarbonate Synthesis Example 6
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that the amount of the molecular-weight modifier PTBP was 0.8 g. This yielded a polycarbonate resin with Mw=94000 (PC-6).
Polycarbonate Synthesis Example 7
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that the amounts of BPMP, DHPE, and the molecular-weight modifier PTBP were 43.3 g, 48.5 g, and 1.4 g, respective. This yielded a polycarbonate resin with Mw=59000 (PC-7).
Polycarbonate Synthesis Example 8
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that the amounts of BPMP, DHPE, and the molecular-weight modifier PTBP were 27.0 g, 60.6 g, and 1.6 g, respectively. This yielded a polycarbonate resin with Mw=53000 (PC-8)
Polycarbonate Synthesis Example 9
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that the amounts of BPMP, DHPE, and the molecular-weight modifier PTBP were 21.6 g, 64.7 g, and 1.6 g, respectively. This yielded a polycarbonate resin with Mw=52000 (PC-9).
Polycarbonate Synthesis Example 10
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that the amounts of BPMP, DHPE, and the molecular-weight modifier PTBP were 75.7 g, 24.3 g, and 1.0 g, respectively. This yielded a polycarbonate resin with Mw=79000 (PC-10).
Polycarbonate Synthesis Example 11
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that. DHPE was changed to 38.0 g of 4,4′-dihydroxybiphenyl (Tokyo Chemical Industry, product code B0464). This yielded a polycarbonate resin with Mw=60000 (PC-11). This polycarbonate resin has the structural units according to formulae (A-101) and (B-201).
Polycarbonate Synthesis Example 12
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 11, except that the amount of the molecular-weight modifier PTBP was 1.0 g. This yielded a polycarbonate resin with Mw=75000 (PC-12).
Polycarbonate Synthesis Example 13
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 11, except that the amount of the molecular-weight modifier PTBP was 1.6 g. This yielded a polycarbonate resin with Mw=50000 (PC-13).
Polycarbonate Synthesis Example 14
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 11, except that the amount of the molecular-weight modifier PTBP was 1.1 g. This yielded a polycarbonate resin with Mw=69000 (PC-14).
Polycarbonate Synthesis Example 15
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 11, except that the amount of the molecular-weight modifier PTBP was 2.7 g This yielded a polycarbonate resin with Mw=33000 (PC-15).
Polycarbonate Synthesis Example 16
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 11, except that the amount of the molecular-weight modifier PTBP was 0.8 g. This yielded a polycarbonate resin with Mw=91000 (PC-16).
Polycarbonate Synthesis Example 17
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 11, except that the amounts of BPMP, 4,4T-dihydroxybiphenyl, and the molecular-weight modifier PTBP were 43.3 g, 44.7 g, and 1.2 g, respectively. This yielded a polycarbonate resin with Mw=65000 (PC-17).
Polycarbonate Synthesis Example 18
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 11, except that the amounts of BPMP, 4,4T-dihydroxybiphenyl, and the molecular-weight modifier PTBP were 27.0 g, 55.9 g, and 1.5 g, respectively. This yielded a polycarbonate resin with Mw=54000 (PC-18).
Polycarbonate Synthesis Example 19
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 11, except that the amounts of BPMP, 4,4′-dihydroxybiphenyl, and the molecular-weight modifier PTBP were 21.6 g, 59.7 g, and 1.6 g, respectively. This yielded a polycarbonate resin with Mw=50000 (PC-19).
Polycarbonate Synthesis Example 20
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 11, except that the amounts of BPMP, 4,4′-dihydroxybiphenyl, and the molecular-weight modifier PTBP were 75.7 g, 22.4 g, and 1.0 g, respectively. This yielded a polycarbonate resin with Mw=75000 (PC-20).
Polycarbonate Synthesis Example 21
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that DHPE was changed to 52.3 g of 2,2-bis(3-methyl-4-hydroxyphenyl)propane (BPC; Honshu Chemical Industry). This yielded a polycarbonate resin with Mw=64000 (PC-21). This polycarbonate resin has the structural units according to formulae (A-101) and (B-307).
Polycarbonate Synthesis Example 22
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 21, except that the amount of the molecular-weight modifier PTBP was 1.0 g. This yielded a polycarbonate resin with Mw=80000 (PC-22).
Polycarbonate Synthesis Example 23
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 21, except that the amount of the molecular-weight modifier PTBP was 1.6 g. This yielded a polycarbonate resin with Mw=54000 (PC-23).
Polycarbonate Synthesis Example 24
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 21, except that the amount of the molecular-weight modifier PTBP was 1.1 g. This yielded a polycarbonate resin with Mw=74000 (PC-24).
Polycarbonate Synthesis Example 25
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 21, except that the amount of the molecular-weight modifier PTBP was 2 7 g. This yielded a polycarbonate resin with Mw=35000 (PC-25).
Polycarbonate Synthesis Example 26
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 21, except that the amount of the molecular-weight modifier PTBP was 0.8 g. This yielded a polycarbonate resin with Mw=96000 (PC-26).
Polycarbonate Synthesis Example 27
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 21, except that the amounts of BPMP, BPC, and the molecular-weight modifier PTBP were 43.3 g, 61.5 g, and 1.2 g, respectively. This yielded a polycarbonate resin with Mw=69000 (PC-27).
Polycarbonate Synthesis Example 28
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 21, except that the amounts of PPMP, BPC, and the molecular-weight modifier PTBP were 27.0 g, 76.9 g, and 1.5 g, respectively. This yielded a polycarbonate resin with MW=57000 (PC-28).
Polycarbonate Synthesis Example 29
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 21, except that the amounts of PPMP, BPC, and the molecular-weight modifier PTBP were 21.6 g, 82.0 g, and 1.6 g, respectively. This yielded a polycarbonate resin with MW=54000 (PC29).
Polycarbonate Synthesis Example 30
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 21, except that the amounts of BPMP, BPC, and the molecular-weight modifier PTBP were 75.7 g, 30.8 g, and 1.0 g, respectively. This yielded a polycarbonate resin with Mw=80000 (PC-30).
Polycarbonate Synthesis Example 31
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that BPMP was changed to 55.7 c of 2,2-bis(4-hydroxyphenyl)5-methylhexane derived from 5-methyl-2-hexanone (Tokyo Chemical Industry, product code 10087). This yielded a polycarbonate resin with Mw=66000 (PC-31). This polycarbonate resin has the structural units according to formulae (A-102) and (B-101).
Polycarbonate Synthesis Example 32
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that BPMP was changed to 57.31 g of 3,3-bis(4-hydroxyphenyl)5-methylheptane derived from 5-methyl-3-heptanone (Tokyo Chemical Industry, product code M0335). This yielded a polycarbonate resin with Mw=68000 (PC-32). This polycarbonate resin has the structural units according to formulae (A-201) and (B-101).
Polycarbonate Synthesis Example 33
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that BPMP was changed to 65.2 g of 1,1-bis(4-hydroxyphenyl)-1-phenyl-3-methylbutane derived from isobutyl phenyl ketone (Tokyo Chemical Industry, product code 10296). This yielded a polycarbonate resin with Mw=77000 (PC-33). This polycarbonate resin has the structural units according to formulae (A-103) and (B-101).
Comparative Polycarbonate Synthesis Example 1
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that BPMP was changed to 56.9 g of 1,1-bis(4-hydroxyphenyl)-1-phenylethane (Honshu Chemical Industry). This yielded a polycarbonate resin with. Mw=65000 (PC-34). This polycarbonate resin has the structural unit represented by the formula below (comparative structure) and the structural unit according to formula (B-101).




Comparative Polycarbonate Synthesis Example 2
A polycarbonate resin was synthesized in the same way as in polycarbonate synthesis example 1, except that BPMP was not used and the amount of DHPE was 80.8 g. This yielded a polycarbonate resin (PC-35). This polycarbonate resin has the structural unit according to formula (B-101).







TABLE 13







Characteristics of polycarbonate resins













Group A
Group B
Weight-average



Polycarbonate
proportion
proportion
molecular weight



resin No.
(mol %)
(mol %)
Mw
















PC-1
49
51
63000



PC-2
49
51
78000



PC-3
49
51
50000



PC-4
49
51
72000



PC-5
49
51
34000



PC-6
49
51
94000



PC-7
40
60
59000



PC-8
25
75
53000



PC-9
20
80
52000



PC-10
70
30
79000



PC-11
49
51
60000



PC-12
49
51
75000



PC-13
49
51
50000



PC-14
49
51
69000



PC-15
49
51
33000



PC-16
49
51
91000



PC-17
40
60
65000



PC-18
25
75
54000



PC-19
20
80
50000



PC-20
70
30
75000



PC-21
49
51
64000



PC-22
49
51
80000



PC-23
49
51
54000



PC-24
49
51
74000



PC-25
49
51
35000



PC-26
49
51
96000



PC-27
40
60
69000



PC-28
25
75
57000



PC-29
20
80
54000



PC-30
70
30
80000



PC-31
49
51
66000



PC-32
49
51
68000



PC-33
49
51
77000



PC-34
49
51
65000



PC-35
0
100
63000










Synthesis of Crystal Line Gallium Phthalocyanines
Crystalline gallium phthalocyanines for use as charge generation materials were synthesized as follows. Synthesis of hydroxygallium phthalocyanine Ga-0
Under a nitrogen flow in a reactor, 5.46 parts of phthalonitrile and 45 parts of α-chloronaphthalene were heated to 30° C. and maintained at this temperature. At the same temperature (30° C.), 3.75 parts of gallium trichloride was added. The water content of the liquid mixture at the addition of gallium trichloride was 150 ppm. The temperature was then increased to 200° C. The mixture was allowed to react at a temperature of 200° C. for 4.5 hours under a nitrogen flow and then cooled. When the temperature reached. 150° C., the mixture containing the product was filtered. The residue was washed through dispersion in N,N-dimethylformamide at a temperature of 140° C. for 2 hours, and the obtained liquid dispersion was filtered. The residue was washed with ethanol and dried. This yielded. 4.65 parts (71% yield) of chlorogallium phthalocyanine (C1Ga).
The obtained. ClGa, 4.65 parts, was dissolved in 139.5 parts of concentrated sulfuric acid at a temperature of 10° C. The resulting solution was added dropwise to 620 parts of iced water for reprecipitation, and the resulting mixture was filtered using a filter press. The obtained wet cake (residue) was washed through dispersion in 2% aqueous ammonia, and the resulting liquid dispersion was filtered using a filter press. The obtained wet cake (residue) was then purified through three cycles of dispersion and washing in ion-exchanged water and filtration using a filter press, yielding a hydroxygallium phthalocyanine pigment with a solids content of 23% (wet hydroxygallium phthalocyanine pigment).
Then 6.6 kg of the obtained hydroxygallium phthalocyanine pigment (wet hydroxygallium phthalocyanine pigment) was dried using HYPER-DRY HD-06R drying oven (Biocon (Japan); frequency (oscillation frequency), 2455 MHz±15 MHz) as follows.
A cake of the hydroxygallium phthalocyanine pigment freshly removed from the filter press (the thickness of the wet cake being 4 cm or less) was placed on a dedicated round plastic tray. The far-infrared radiation was off, and the temperature setting for the inner wall of the drying oven was 50° C. During the microwave irradiation, the vacuum pump and the leak valve were adjusted to keep the degree of vacuum in the range of 4.0 to 10.0 kPa.
In step 1, the hydroxygallium phthalocyanine pigment was irradiated with microwaves of 4.8 kW for 50 minutes. The microwaves were then turned off, and the leak valve was closed to make a high degree of vacuum of 2 kPa or less. The solids content of the hydroxygallium phthalocyanine pigment at this point was 88%. In step 2,
OF the leak valve was adjusted to make the degree of vacuum (pressure in the drying oven) fall within the above parameter range (4.0 to 10.0 kPa). Then the hydroxygallium phthalocyanine pigment was irradiated with microwaves of 1.2 kW for 5 minutes. The microwaves were turned off, and the leak valve was closed to make a high degree of vacuum of 2 kPa or less. Step 2 was repeated once more (a total of twice). The solids content of the hydroxygallium phthalocyanine pigment at this point was 98%. In step 3, microwave irradiation was performed in the same way as in step 2 except that the microwave output power was changed from 1.2 kW to 0.8 kW. Step 3 was repeated once more (a total of twice). In step 4, the leak valve was adjusted to make the degree of vacuum (pressure in the drying oven) fall within the above parameter range (4.0 to 10.0 kPa) again. Then the hydroxygallium phthalocyanine pigment was irradiated with microwaves of 0.4 kW for 3 minutes. The microwaves were turned off, and the leak valve was closed to make a high degree of vacuum of 2 kPa or less. Step 4 was repeated seven more times (a total of eight times). This yielded 1.52 kg of a hydroxygallium phthalocyanine pigment (Ga-0) containing 1% or less water, taking a total of 3 hours.
Synthesis of Crystalline Gallium Phthalocyanine Ga-1
In a ball mill, 0.5 parts of the obtained hydroxygallium phthalocyanine Ga-0 and 10 parts of N-methylformamide were milled with 20 parts of 0.8-mm diameter glass beads at room temperature (23° C.) and 120 rpm for 300 hours. Crystalline gallium phthalocyanine removed from this liquid dispersion using N,N-dimethylformamide was collected through filtration, and the surface of the filter was thoroughly washed with tetrahydrofuran. The residue was dried in vacuum, yielding 0.45 parts of crystalline hydroxygallium phthalocyanine Ga-1. FIG. 2 is a powder X-ray diffraction pattern of the obtained crystals.
1H-NMR spectroscopy was performed using deuterated sulfuric acid as solvent [on AVANCE III 500 spectrometer (Bruker)], confirming that crystals of Ga-1 contained 0.9% by mass N-methylformamide.
Synthesis of Crystalline Gallium Phthalocyanine Ga-2
Crystalline gallium phthalocyanine was synthesized in the same way as in the synthesis of crystalline gallium phthalocyanine Ga-1, except that parts of N-methylformamide was changed to 10 parts of N,N-dimethylformamide and the duration of milling was changed from 300 hours to 400 hours. This yielded 0.40 parts of crystalline hydroxygallium phthalocyanine Ga-2. The powder X-ray diffraction pattern of Ga-2 was similar to that in FIG. 2. NMR measurement demonstrated that crystals of Ga-2 contained 1.4% by mass N,N-dimethylformamide, as determined from the relative abundance of protons.
Synthesis of Crystalline Gallium Phthalocyanine Ga-3
Crystalline gallium phthalocyanine was synthesized in the same way as in the synthesis of crystalline gallium phthalocyanine Ga-1, except that 10 parts of N-methylformamide was changed to 10 parts of N,N-propylformamide and the duration of milling was changed from 300 hours to 500 hours. This yielded 0.40 parts of crystalline hydroxygallium phthalocyanine Ga-3. The powder X-ray diffraction pattern of Ga-3 was similar to that in FIG. 2. NMR measurement demonstrated that crystals of Ga-3 contained 1.4% by mass N-propylformamide, as determined from the relative abundance of protons.
Synthesis of Crystalline Gallium Phthalocyanine Ga-4
Crystalline gallium phthalocyanine was synthesized in the same way as in the synthesis of crystalline gallium phthalocyanine Ga-1, except that 10 parts of N-methylformamide was changed to 10 parts of N,N-vinylformamide and the duration of milling was changed from 300 hours to 100 hours. This yielded 0.40 parts of crystalline hydroxygallium phthalocyanine Ga-4. The powder X-ray diffraction pattern of Ga-4 was similar to that in FIG. 2. NMR measurement demonstrated that crystals of Ga--4 contained 1.8% by mass N-vinylformamide, as determined from the relative abundance of protons.
Synthesis of Crystalline Gallium Phthalocyanine Ga-5
In a ball mill, 0.5 parts of the chlorogallium phthalocyanine (ClGa) obtained above was dry-milled with 20 parts of 0.8-mm diameter glass beads at room temperature (23° C.) for 40 hours. Ten parts of N,N-dimethylformamide was added, and wet-milling was performed at room temperature (23° C.) for 100 hours. Crystalline gallium phthalocyanine removed from this liquid dispersion using N,N-dimethylformamide was collected through filtration, and the surface of the filter was thoroughly washed with tetrahydrofuran. The residue was dried in vacuum, yielding 0.44 parts of crystalline chlorogallium phthalocyanine Ga-S. FIG. 3 is a powder X-ray diffraction pattern of the obtained crystals.
−H-NMR spectroscopy was performed using deuterated sulfuric acid as solvent [on AVANCE III 500 spectrometer (Bruker)], confirming that crystals of Ga-5 contained 1.0% by mass N,N-dimethylformamide.
Synthesis of Crystalline Gallium Phthalocyanine Ga-6
Crystalline gallium phthalocyanine was synthesized in the same way as in the synthesis of crystalline gallium phthalocyanine Ga-2, except that the duration of milling was changed from 400 hours to 48 hours. This yielded 0.46 parts of crystalline hydroxygallium phthalocyanine Ga-6. NMR measurement demonstrated that crystals of Ga-6 contained 2.1% by mass N,N-dimethylformamide, as determined from the relative abundance of protons.
Synthesis of Crystalline Gallium Phthalocyanine Ga-7
Crystalline hydroxygsallium phthalocyanine was synthesized in the same way as in the synthesis of crystalline gallium phthalocyanine Ga-1, except that 10 parts of N-methylformamide was changed to 10 parts of N,N-dimethylformamide and the duration of milling was changed from 300 hours to 100 hours. This yielded 0.40 parts of crystalline hydroxygallium phthalocyanine Ga-7. FIG. 4 is a powder X-ray diffraction pattern of the obtained crystals. NMR measurement demonstrated that crystals of Ga-7 contained 2.2% by mass N,N-dimethylformamide, as determined from the relative abundance of protons.
Production of Electrophotographic Photosensitive Members
In the following, the thickness of the individual layers of the electrophotographic photosensitive members is a measured value obtained using Fischerscope eddy-current coating thickness gauge (Fischer Instruments) or a calculated result based on the mass per unit area and the specific gravity.
Examples 1-1 to 1-37 and Comparative Examples 1-1 to 1-3 Example 1-1
A solution composed of the following materials was subjected to 20 hours of dispersion in a ball mill: 60 parts of barium sulfate particles coated with tin oxide (trade name, Passtran PC1; Mitsui Mining & Smelting), 15 parts of titanium oxide particles (trade name, TITANIX JR; Tayca Corporation), 43 parts of resol-type phenolic resin (trade name, PHENOLITE J-325; DIC Corporation; solids content, 70% by mass), 0.015 parts of silicone oil (trade name, SH28PA; Dow Corning Toray), 3.6 parts of silicone resin (trade name, Tospearl 120; Toshiba Silicones), 50 parts of 1-methoxy-2-propanol, and 50 parts of methanol. In this way, a coating liquid for the formation of a conductive layer was prepared.
This coating liquid for the formation of a conductive layer was applied to an aluminum cylinder 261.5 mm long and 24 mm in diameter (JIS-A3003 aluminum alloy) for use as support by dip coating, and the obtained wet coating was dried at 140° C. for 30 minutes. In this way, a 15-μm thick conductive layer was formed.
Then 10 parts of copolymeric nylon resin (trade name, AMILAN CM8000; Toray) and 30 parts of methoxymethylated nylon 6 resin (trade name, Toresin EF-30T; Teikoku Kagaku Sangyo KK.) were dissolved in a solvent mixture of 400 parts of methanol and 200 parts of n-butanol, producing a coating Liquid for the formation of an undercoat layer. This coating liquid for the formation of an undercoat layer was applied to the conductive layer by dip coating, and the obtained wet coating was dried. In this way, a 0.7-μm thick undercoat layer (UCL-1) was formed.
Then 10 parts of crystalline gallium phthalocyanine Ga-1 (charge generation material), 5 parts of polyvinyl butyral resin (trade name, S-LEC BX-1; Sekisui Chemical), and 250 parts of cyclohexanone were subjected to 6 hours of dispersion in a sand mill with 1.0-mm diameter glass beads. This liquid dispersion was diluted with 250 parts of ethyl acetate, producing a coating liquid for the formation of a charge generation layer. This coating liquid for the formation of a charge generation layer was applied to the undercoat layer by dip coating, and the obtained wet coating was dried at 100° C. for 10 minutes. In this way, a 0.22-μm thick charge generation layer was formed.
Then 10 parts of polycarbonate resin PC-1 and 9 parts of a mixture of the compounds according to formula (102) and the formula below as charge transport materials (in a 6:3 mixing ratio) were dissolved in 70 parts of o-xylene (Xy) and 20 parts of dimethoxymethane (DMM), producing a coating liquid for the formation of a charge transport layer. This coating liquid for the formation of a charge transport layer was applied to the charge generation layer by dip coating, and the obtained wet coating was dried at 125° C. for 1 hour. In this way, a 15.5-μm thick charge transport layer was formed.




Examples 1-2 to 1-37 and Comparative Examples 1-1 to 1-3
Electrophotographic photosensitive members were produced, with changes made to the foregoing process (Example 1-1) in accordance with Table 14 in terms of the following conditions: the kind of charge generation material in the charge generation layer; the kind of resin and the kind and amount (parts) of solvent in the charge transport layer. For comparative example 1-3, the following testing of an electrophotographic photosensitive member was impossible because of undissolved solids in the coating liquid for the formation of a charge transport layer. In the table, THE stands for tetrahydrofuran.
Testing
The following test was performed on the produced electrophotographic photosensitive members. The test results are summarized in Table 14.
Effect in the Reduction of Fog
A CP-4525 laser beam printer (Hewlett Packard) was used as test apparatus after modifications to allow for the adjustment of the charging potential (dark-area potential) for the electrophotographic photosensitive member used therewith. The charging potential (dark-area potential) setting was −600 V.
The produced electrophotographic photosensitive members were each installed in a process cartridge (c an) of the test apparatus. A test chart having a 1% image-recorded. area was continuously printed on 30,000 sheets of A4 plain paper under the conditions of a temperature of 23° C. and a relative humidity of 50%, in 3-sheet batches with 6-second pauses between batches.
After this 30,000-sheet durability test, reflectometry was performed using a reflectometer (TC-6DS reflectometer, Tokyo Denshoku co., Ltd.) to determine the worst reflection density within the white background of the image, F1, and the mean baseline reflection density on plain paper, F0. The difference F1-F0 was defined as the fog level with smaller fog levels meaning more effective reduction of fog. In these examples of the invention, grades AA to a in the criteria constituted favorable levels, whereas F and G unacceptable levels.
AA: The fog level was less than 1.0.
A: The fog level was 1.0 or more and less than 1.5.
B: The fog level was 1.5 or more and less than 2.0.
C: The fog level was 2.0 or more and less than 2.5.
D: The fog level was 2.5 or more and less than 3.0.
E. The fog level was 3.0 or more and less than 4.0.
F: The fog level was 4.0 or more and less than 5.0.
G: The fog level was 5.0 or more







TABLE 14







Conditions for the production of electrophotographic


photosensitive members and test results











Charge gen-





eration layer



Charge gen-
Charge transport layer
Result












eration
Polycarbon-
Solvent(s)
Fog re-












Example No.
material
ate resin No.
Type
Parts
duction





Example 1-1
Ga-1
PC-1
Xy/DMM
70/20
AA


Example 1-2
Ga-1
PC-2
Xy/DMM
70/20
AA


Example 1-3
Ga-2
PC-3
Xy/DMM
70/20
A


Example 1-4
Ga-2
PC-4
Xy/DMM
70/20
A


Example 1-5
Ga-2
PC-5
Xy/DMM
70/20
B


Example 1-6
Ga-2
PC-6
Xy/DMM
70/20
B


Example 1-7
Ga-2
PC-5
THF
90
C


Example 1-8
Ga-2
PC-1
THF
90
B


Example 1-9
Ga-2
PC-7
THF
90
B


Example 1-10
Ga-2
PC-8
THF
90
B


Example 1-11
Ga-2
PC-9
THF
90
C


Example 1-12
Ga-2
PC-10
THF
90
C


Example 1-13
Ga-2
PC-13
Xy/DMM
70/20
B


Example 1-14
Ga-2
PC-14
Xy/DMM
70/20
B


Example 1-15
Ga-2
PC-15
Xy/DMM
70/20
C


Example 1-16
Ga-2
PC-16
Xy/DMM
70/20
C


Example 1-17
Ga-2
PC-15
THF
90
D


Example 1-18
Ga-2
PC-11
THF
90
C


Example 1-19
Ga-2
PC-17
THF
90
C


Example 1-20
Ga-2
PC-18
THF
90
C


Example 1-21
Ga-2
PC-19
THF
90
B


Example 1-22
Ga-2
PC-20
THF
90
B


Example 1-23
Ga-2
PC-23
Xy/DMM
70/20
C


Example 1-24
Ga-2
PC-24
Xy/DMM
70/20
C


Example 1-25
Ga-2
PC-25
Xy/DMM
70/20
D


Example 1-26
Ga-2
PC-26
Xy/DMM
70/20
D


Example 1-27
Ga-2
PC-25
THF
90
E


Example 1-28
Ga-2
PC-21
THF
90
D


Example 1-29
Ga-2
PC-27
THF
90
D


Example 1-30
Ga-2
PC-28
THF
90
D


Example 1-31
Ga-2
PC-29
THF
90
C


Example 1-32
Ga-2
PC-30
THF
90
C


Example 1-33
Ga-3
PC-31
Xy/DMM
70/20
AA


Example 1-34
Ga-4
PC-32
Xy/DMM
70/20
A


Example 1-35
Ga-2
PC-33
Xy/DMM
70/20
D


Example 1-36
Ga-5
PC-12
Xy/DMM
70/20
C


Example 1-37
Ga-5
PC-12
Xy/DMM
70/20
C


Comparative
Ga-6
PC-34
Xy/DMM
70/20
F


Example 1-1


Comparative
Ga-6
PC-34
THF
90
G


Example 1-2


Comparative
Ga-6
PC-35
Xy/DMM
70/20
—


Example 1-3









Examples 2-1 to 2-287 and Comparative Examples 2-1 to 2-8 Example 2-1
A solution composed of the following materials was subjected to 20 hours of dispersion in a ball mill: 60 parts of barium sulfate particles coated with tin oxide (trade name, Passtran PCI; Mitsui Mining & Smelting), 15 parts of titanium oxide particles (trade name, TITANIX JR; Tayca Corporation), 43 parts of resol-type phenolic resin (trade name, PHENOLITE J-325; DIC Corporation; solids content, 70% by mass), 0.015 parts of silicone oil (trade name, SH28PA; Dow Corning Toray), 3.6 parts of silicone resin (trade name, Tospearl 120; Toshiba Silicones), 50 parts of 1-methoxy-2-propanol, and 50 parts of methanol. In this way, a coating liquid for the formation of a conductive layer was prepared.
This coating liquid for the formation of a conductive layer was applied to an aluminum cylinder 261.5 mm long and 24 mm in diameter (JIS-A3003 aluminum alloy) for use as support by dip coating, and the obtained wet coating was dried at 140° C. for 30 minutes. In this way, a 30-μm thick conductive layer was formed.
Then 10 parts of copolymeric nylon resin (trade name, AMILAN CM8000; Toray) and 30 parts of methoxymethylated nylon 6 resin (trade name, Toresin EF-30T; Teikoku Kagaku Sangyo K.K.) were dissolved in a solvent mixture of 400 parts of methanol and 200 parts of n-butanol, producing a coating liquid for the formation of an undercoat layer. This coating liquid for the formation of an undercoat layer was applied to the conductive layer by dip coating, and the obtained wet coating was dried. In this way, a 0.8-μm thick undercoat layer (UCL-1) was formed.
Then 10 parts of crystalline gallium phthalocyanine Ga-1 (charge generation material), 5 parts of polyvinyl butyral (trade name, S-LEC BX-1; Sekisui Chemical), and 250 parts of cyclohexanone were subjected to 6 hours of dispersion in a sand mill with 1.0-mm diameter glass beads. This liquid dispersion was diluted with 250 parts of ethyl acetate, producing a coating liquid for the formation of a charge generation layer. This coating liquid for the formation of a charge generation layer was applied to the undercoat layer by dip coating, and the obtained wet coating was dried at 100° C. for 10 minutes. In this way, a 0.23-μm thick charge generation layer was formed.
Then 10 parts of exemplified compound 1001 (Mw: 63,000) as polycarbonate resin and 9 parts of a mixture of the compounds according to formulae (1(−) and (205) as charge transport materials (in a 9:1 mixing ratio) were dissolved in 70 parts of o-xylene (Xy) and 20 parts of dimethoxymethane (DMM), producing a coating liquid for the formation of a charge transport layer. This coating liquid for the formation of a charge transport layer was applied to the charge generation layer by dip coating, and the obtained wet coating was dried at 125° C. for 1 hour. In this way, a 20-μm thick charge transport layer was formed.
Examples 2-2 to 2-287 and Comparative Examples 2-1 to 2-8
Electrophotographic photosensitive members were produced, with changes made to the foregoing process (Example 2-1) in accordance with Tables 15 to 20 in terms of the following conditions: the use or omission of the conductive layer; the kind of the undercoat layer; the kind of charge generation material in the charge generation layer; the kind and weight-average molecular weight Mw of resin, the kind of charge transport material (s (and the ratio by mass if two materials were used in combination), the amounts (parts) of the charge transport material (s) and the resin, and the kind and amount (parts) of solvent in the charge transport layer. Exemplified compound 3001 is a polymer (a weight-average molecular weight of 63,000) of group-B structural unit B-101 (a dielectric constant of 2.11). Exemplified compound 3002 is a polymer (a weight-average molecular weight of 53,000) of group-B structural unit B-201 (a dielectric constant of 2.20). Exemplified compound 3003 is a polymer (a weight-average molecular weight of 36,000) of group--B structural unit B-403 (a dielectric constant of 2.41). Undercoat layers UCL-2 and UCL-3 and the charge generation layers containing charge generation material CGM-1 or CGM-2 were produced as follows. Undercoat layer UCL-2
Ten parts of the electron transport compound according to the following formula (ETM-1),




17 parts of the blocked isocyanate compound according to the following formula (trade name, Sumidur 3175; solids content, 75% by mass; Sumitomo Bayer Urethane) as a crosslinking agent,




2 parts of polyvinyl butyral resin (trade name, S-LEC BX-1; Sekisui Chemical), and 0.2 parts of zinc (II) butyrate as an additive were dissolved in a solvent mixture of 100 parts of tetrahydrofuran and 100 parts of 1-methoxy-2-propanol, producing a coating liquid for the formation of an undercoat layer. This coating liquid for the formation of an undercoat layer was applied to the conductive layer by dip coating, and the obtained wet coating was heated at 160° C. for 30 minutes to dry and cure. In this way, a 0.7-11m thick undercoat layer UCL-2 was formed.
Undercoat Layer UCL-3
One hundred parts of zinc oxide particles (average primary particle diameter, 50 nm; specific surface area, 19 m2/g; powder resistance, 4.7×106 Ω·cm; Tayca Corporation) was mixed into 500 parts of toluene with stirring. The resulting mixture was stirred with 1.25 parts of N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane (trade name, KBM602; Shin-Etsu Chemical) as a surface-treating agent for 6 hours. The toluene was then removed under reduced pressure, and the residue was dried at 130° C. for 6 hours, producing surface-treated zinc oxide particles. Then 75 parts of these surface-treated zinc oxide particles, 16 parts of the aforementioned blocked isocyanate compound (trade name, Sumidur 3175; solids content, 75% by mass; Sumitomo Bayer Urethane), 9 parts of polyvinyl butyral resin (trade name, S-LEC BM-1; Sekisui Chemical), and 1 part of 2,3,4-trihydroxybenzophenone (Tokyo Chemical Industry) were added to a solvent, mixture of 60 parts of methyl ethyl ketone and 60 parts of cyclohexanone, producing a liquid dispersion. This liquid dispersion was subjected to 3 hours of dispersion in a vertical ball mill with glass beads having an average particle diameter of 1.0 mm in an atmosphere at 23° C. at a rotational speed of 1,500 rpm. After the completion of dispersion, the liquid dispersion was stirred with 5 parts of crosslinked methyl methacrylate particles (trade name, SSX-103; average particle diameter, 3 μm; Sekisui Chemical) and 0.01 parts of silicone oil (trade name, SH28PA; Dow Corning Toray), producing a coating liquid for the formation of an undercoat layer. This coating liquid for the formation of an undercoat layer was applied to the support by dip coating, and the obtained wet coating was heated at 160° C. for 40 minutes for polymerization. In this way, a 30-μm thick undercoat layer (UCL-3) was formed.
Charge Generation Layer Containing Charge Generation Material CGM-1
Twelve parts of a Y-form crystalline oxytitanium phthalocyanine (charge generation material) having a peak at a Bragg angle (2θ±0.2°) of 27.3° in its CuKα characteristic X-ray diffraction pattern, 10 parts of polyvinyl butyral resin (trade name, S-LEC BX-1; Sekisui Chemical), and 250 parts of cyclohexanone were subjected to 3 hours of dispersion in a ball mill with 1.0-mm diameter glass beads, producing a liquid dispersion. This liquid dispersion was diluted with 500 parts of ethyl acetate, producing a coating liquid for the formation of a charge generation layer. This coating liquid for the formation of a charge generation layer was applied to the undercoat layer by dip coating, and the obtained wet coating was dried at 80° C. for 10 minutes. In this way, a 0.20-μm thick charge generation layer was formed.
Charge Generation Layer Containing Charge Generation Material CGM-2
Fifteen parts of charge generation material CGM-2, which was the bisazo pigment according to the following formula,




10 parts of polyvinyl butyral resin (trade name, S-LEC BX-1; Sekisui Chemical), and 250 parts of tetrahydrofuran were subjected to 3 hours of dispersion in a ball mill with 1.0-mm diameter glass beads, producing a liquid dispersion. This liquid dispersion was diluted with 100 parts of cyclohexanone and 500 parts of tetrahydrofuran, producing a coating liquid for the formation of a charge generation layer. This coating liquid for the formation of a charge generation layer was applied to the undercoat layer by dip coating, and the obtained wet coating was dried at 110° C. for 30 minutes. In this way, a 0.30-μm thick charge generation layer was formed.







TABLE 15







Conditions for the manufacture of photosensitive members










Charge gen-
Charge transport layer














Conductive

eration layer

Charge transport
















layer
Undercoat
Charge gen-

material(s)
Charge transport

















Used/
layer
eration
Resin

Mass
material(s)/resin
Solvent(s)

















Example No.
Not used
Type
material
Type
Mw
Type
ratio
in parts
Type
Parts




















Example 2-1
◯
UCL-1
Ga-1
1001
63000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-2
◯
UCL-1
Ga-7
1001
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-3
◯
UCL-1
Ga-7
1001
38000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-4
◯
UCL-1
Ga-7
1001
77000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-5
◯
UCL-1
Ga-7
1001
95000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-6
◯
UCL-1
Ga-7
1002
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-7
◯
UCL-1
Ga-7
1002
36000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-8
◯
UCL-1
Ga-7
1002
80000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-9
◯
UCL-1
Ga-7
1002
94000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-10
◯
UCL-1
Ga-7
1003
51000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-11
◯
UCL-1
Ga-7
1003
38000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-12
◯
UCL-1
Ga-7
1003
78000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-13
◯
UCL-1
Ga-7
1003
97000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-14
◯
UCL-1
Ga-7
1001
56000
102/205
9/1
6/10
Xy/DMM
70/20


Example 2-15
◯
UCL-1
Ga-7
1001
56000
102/305
9/1
9/10
Xy/DMM
70/20


Example 2-16
◯
UCL-1
Ga-7
1001
56000
102/201
9/1
9/10
Xy/DMM
70/20


Example 2-17
◯
UCL-1
Ga-7
1001
56000
405
—
9/10
Xy/DMM
70/20


Example 2-18
◯
UCL-1
Ga-7
1001
56000
302
—
9/10
Xy/DMM
70/20


Example 2-19
◯
UCL-1
Ga-7
1001
56000
705
—
9/10
Xy/DMM
70/20


Example 2-20
◯
UCL-1
Ga-7
1001
56000
603
—
9/10
Xy/DMM
70/20


Example 2-21
◯
UCL-1
Ga-7
1001
38000
603
—
9/10
Xy/DMM
70/20


Example 2-22
◯
UCL-1
Ga-7
1001
77000
603
—
9/10
Xy/DMM
70/20


Example 2-23
◯
UCL-1
Ga-7
1001
95000
603
—
9/10
Xy/DMM
70/20


Example 2-24
◯
UCL-1
Ga-7
1002
56000
603
—
9/10
Xy/DMM
70/20


Example 2-25
◯
UCL-1
Ga-7
1002
36000
603
—
9/10
Xy/DMM
70/20


Example 2-26
◯
UCL-1
Ga-7
1002
80000
603
—
9/10
Xy/DMM
70/20


Example 2-27
◯
UCL-1
Ga-7
1002
94000
603
—
9/10
Xy/DMM
70/20


Example 2-28
◯
UCL-1
Ga-7
1003
51000
603
—
9/10
Xy/DMM
70/20


Example 2-29
◯
UCL-1
Ga-7
1003
38000
603
—
9/10
Xy/DMM
70/20


Example 2-30
◯
UCL-1
Ga-7
1003
78000
603
—
9/10
Xy/DMM
70/20


Example 2-31
◯
UCL-1
Ga-7
1003
97000
603
—
9/10
Xy/DMM
70/20


Example 2-32
◯
UCL-1
Ga-7
1001
56000
603
—
6/10
Xy/DMM
70/20


Example 2-33
◯
UCL-1
Ga-7
1001
56000
603
—
4/10
Xy/DMM
70/20


Example 2-34
◯
UCL-1
Ga-7
1001
56000
211
—
9/10
Xy/DMM
70/20


Example 2-35
◯
UCL-1
Ga-7
1001
56000
501
—
9/10
Xy/DMM
70/20


Example 2-36
◯
UCL-1
Ga-7
1001
56000
309
—
9/10
Xy/DMM
70/20


Example 2-37
◯
UCL-1
Ga-7
1001
56000
605
—
9/10
Xy/DMM
70/20


Example 2-38
◯
UCL-1
Ga-7
1001
38000
605
—
9/10
Xy/DMM
70/20


Example 2-39
◯
UCL-1
Ga-7
1001
77000
605
—
9/10
Xy/DMM
70/20


Example 2-40
◯
UCL-1
Ga-7
1001
95000
605
—
9/10
Xy/DMM
70/20


Example 2-41
◯
UCL-1
Ga-7
1002
56000
605
—
9/10
Xy/DMM
70/20


Example 2-42
◯
UCL-1
Ga-7
1002
36000
605
—
9/10
Xv/DMM
70/20


Example 2-43
◯
UCL-1
Ga-7
1002
80000
605
—
9/10
Xy/DMM
70/20


Example 2-44
◯
UCL-1
Ga-7
1002
94000
605
—
9/10
Xy/DMM
70/20


Example 2-45
◯
UCL-1
Ga-7
1003
51000
605
—
9/10
Xy/DMM
70/20


Example 2-46
◯
UCL-1
Ga-7
1003
38000
605
—
9/10
Xy/DMM
70/20


Example 2-47
◯
UCL-1
Ga-7
1003
78000
605
—
9/10
Xy/DMM
70/20


Example 2-48
◯
UCL-1
Ga-7
1003
97000
605
—
9/10
Xy/DMM
70/20


Example 2-49
◯
UCL-1
Ga-7
1001
56000
605
—
6/10
Xy/DMM
70/20


Example 2-50
◯
UCL-1
Ga-7
1001
56000
605
—
4/10
Xy/DMM
70/20
















TABLE 16







Conditions for the manufacture of photosensitive members










Charge gen-
Charge transport layer














Conductive

eration layer

Charge transport
















layer
Undercoat
Charge gen-

material(s)
Charge transport

















Used/
layer
eration
Resin

Mass
material(s)/resin
Solvent(s)

















Example No.
Not used
Type
material
Type
Mw
Type
ratio
in parts
Type
Parts




















Example 2-51
◯
UCL-1
Ga-7
1001
56000
606
—
9/10
Xy/DMM
70/20


Example 2-52
◯
UCL-1
Ga-7
1001
56000
505
—
9/10
Xy/DMM
70/20


Example 2-53
◯
UCL-1
Ga-3
1001
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-54
◯
UCL-1
Ga-4
1001
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-55
◯
UCL-2
Ga-7
1001
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-56
—
UCL-3
Ga-7
1001
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-57
◯
UCL-1
CGM-1
1001
56000
603
—
9/10
Xy/DMM
70/20


Example 2-58
◯
UCL-1
CGM-2
1001
56000
304
—
9/10
Xy/DMM
70/20


Example 2-59
◯
UCL-1
Ga-7
1001
56000
102/205
9/1
9/10
THF
90


Example 2-60
◯
UCL-1
Ga-7
1004
58000
102/205
9/1
9/10
THF
90


Example 2-61
◯
UCL-1
Ga-7
1005
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-62
◯
UCL-1
Ga-7
1009
51000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-63
◯
UCL-1
Ga-7
1093
51000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-64
◯
UCL-1
Ga-7
1097
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-65
◯
UCL-1
Ga-7
1101
50000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-66
◯
UCL-1
Ga-7
1021
50000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-67
◯
UCL-1
Ga-7
1021
34000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-68
◯
UCL-1
Ga-7
1021
75000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-69
◯
UCL-1
Ga-7
1022
57000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-70
◯
UCL-1
Ga-7
1022
34000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-71
◯
UCL-1
Ga-7
1022
78000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-72
◯
UCL-1
Ga-7
1021
50000
102/205
9/1
6/10
Xy/DMM
70/20


Example 2-73
◯
UCL-1
Ga-7
1021
50000
102/305
9/1
9/10
Xy/DMM
70/20


Example 2-74
◯
UCL-1
Ga-7
1021
50000
102/201
9/1
9/10
Xy/DMM
70/20


Example 2-75
◯
UCL-1
Ga-7
1021
50000
405
—
9/10
Xy/DMM
70/20


Example 2-76
◯
UCL-1
Ga-7
1021
50000
302
—
9/10
Xy/DMM
70/20


Example 2-77
◯
UCL-1
Ga-7
1021
50000
705
—
9/10
Xy/DMM
70/20


Example 2-78
◯
UCL-1
Ga-7
1021
50000
603
—
9/10
Xy/DMM
70/20


Example 2-79
◯
UCL-1
Ga-7
1021
34000
603
—
9/10
Xy/DMM
70/20


Example 2-80
◯
UCL-1
Ga-7
1021
75000
603
—
9/10
Xy/DMM
70/20


Example 2-81
◯
UCL-1
Ga-7
1022
57000
603
—
9/10
Xy/DMM
70/20


Example 2-82
◯
UCL-1
Ga-7
1022
34000
603
—
9/10
Xy/DMM
70/20


Example 2-83
◯
UCL-1
Ga-7
1022
78000
603
—
9/10
Xy/DMM
70/20


Example 2-84
◯
UCL-1
Ga-7
1021
50000
603
—
6/10
Xy/DMM
70/20


Example 2-85
◯
UCL-1
Ga-7
1021
50000
603
—
4/10
Xy/DMM
70/20


Example 2-86
◯
UCL-1
Ga-7
1021
50000
211
—
9/10
Xy/DMM
70/20


Example 2-87
◯
UCL-1
Ga-7
1021
50000
501
—
9/10
Xy/DMM
70/20


Example 2-88
◯
UCL-1
Ga-7
1021
50000
309
—
9/10
Xy/DMM
70/20


Example 2-89
◯
UCL-1
Ga-7
1021
50000
605
—
9/10
Xy/DMM
70/20


Example 2-90
◯
UCL-1
Ga-7
1021
34000
605
—
9/10
Xy/DMM
70/20


Example 2-91
◯
UCL-1
Ga-7
1021
75000
605
—
9/10
Xy/DMM
70/20


Example 2-92
◯
UCL-1
Ga-7
1022
57000
605
—
9/10
Xy/DMM
70/20


Example 2-93
◯
UCL-1
Ga-7
1022
34000
605
—
9/10
Xy/DMM
70/20


Example 2-94
◯
UCL-1
Ga-7
1022
78000
605
—
9/10
Xy/DMM
70/20


Example 2-95
◯
UCL-1
Ga-7
1021
50000
605
—
6/10
Xy/DMM
70/20


Example 2-96
◯
UCL-1
Ga-7
1021
50000
605
—
4/10
Xy/DMM
70/20


Example 2-97
◯
UCL-1
Ga-7
1021
50000
606
—
9/10
Xy/DMM
70/20


Example 2-98
◯
UCL-1
Ga-7
1021
50000
505
—
9/10
Xy/DMM
70/20


Example 2-99
◯
UCL-1
Ga-3
1021
50000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-100
◯
UCL-1
Ga-4
1021
50000
102/205
9/1
9/10
Xy/DMM
70/20
















TABLE 17







Conditions for the manufacture of photosensitive members










Charge gen-
Charge transport layer














Conductive

eration layer

Charge transport
















layer
Undercoat
Charge gen-

material(s)
Charge transport

















Used/
layer
eration
Resin

Mass
material(s)/resin
Solvent(s)

















Example No.
Not used
Type
material
Type
Mw
Type
ratio
in parts
Type
Parts




















Example 2-101
◯
UCL-2
Ga-7
1021
50000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-102
—
UCL-3
Ga-7
1021
50000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-103
◯
UCL-1
CGM-1
1021
50000
603
—
9/10
Xy/DMM
70/20


Example 2-104
◯
UCL-1
CGM-2
1021
50000
304
—
9/10
Xy/DMM
70/20


Example 2-105
◯
UCL-1
Ga-7
1021
50000
102/205
9/1
9/10
THF
90


Example 2-106
◯
UCL-1
Ga-7
1113
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-107
◯
UCL-1
Ga-7
1045
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-108
◯
UCL-1
Ga-7
1045
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-109
◯
UCL-1
Ga-7
1045
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-110
◯
UCL-1
Ga-7
1045
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-111
◯
UCL-1
Ga-7
1046
58000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-112
◯
UCL-1
Ga-7
1046
58000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-113
◯
UCL-1
Ga-7
1046
58000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-114
◯
UCL-1
Ga-7
1046
58000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-115
◯
UCL-1
Ga-7
1047
58000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-116
◯
UCL-1
Ga-7
1047
58000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-117
◯
UCL-1
Ga-7
1047
58000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-118
◯
UCL-1
Ga-7
1047
58000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-119
◯
UCL-1
Ga-7
1045
52000
102/205
9/1
6/10
Xy/DMM
70/20


Example 2-120
◯
UCL-1
Ga-7
1045
52000
211
—
9/10
Xy/DMM
70/20


Example 2-121
◯
UCL-1
Ga-7
1045
52000
211
—
6/10
Xy/DMM
70/20


Example 2-122
◯
UCL-1
Ga-7
1045
52000
211
—
4/10
Xy/DMM
70/20


Example 2-123
◯
UCL-1
Ga-7
1045
52000
307
—
9/10
Xy/DMM
70/20


Example 2-124
◯
UCL-1
Ga-7
1045
52000
307
—
6/10
Xy/DMM
70/20


Example 2-125
◯
UCL-1
Ga-7
1045
52000
307
—
4/10
Xy/DMM
70/20


Example 2-126
◯
UCL-1
CGM-1
1045
52000
602
—
9/10
Xy/DMM
70/20


Example 2-127
◯
UCL-1
Ga-7
1045
52000
602
—
9/10
THF
90


Example 2-128
◯
UCL-1
Ga-7
1048
58000
602
—
9/10
THF
90


Example 2-129
◯
UCL-1
Ga-7
1137
53000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-130
◯
UCL-1
Ga-7
1065
50000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-131
◯
UCL-1
Ga-7
1065
54000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-132
◯
UCL-1
Ga-7
1065
54000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-133
◯
UCL-1
Ga-7
1065
54000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-134
◯
UCL-1
Ga-7
1065
54000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-135
◯
UCL-1
Ga-7
1066
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-136
◯
UCL-1
Ga-7
1066
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-137
◯
UCL-1
Ga-7
1066
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-138
◯
UCL-1
Ga-7
1066
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-139
◯
UCL-1
Ga-7
1067
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-140
◯
UCL-1
Ga-7
1067
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-141
◯
UCL-1
Ga-7
1067
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-142
◯
UCL-1
Ga-7
1067
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-143
◯
UCL-1
Ga-7
1065
54000
102/205
9/1
6/10
Xy/DMM
70/20


Example 2-144
◯
UCL-1
Ga-7
1065
54000
603
—
9/10
Xy/DMM
70/20


Example 2-145
◯
UCL-1
Ga-7
1065
54000
603
—
6/10
Xy/DMM
70/20


Example 2-146
◯
UCL-1
Ga-7
1065
54000
603
—
4/10
Xy/DMM
70/20


Example 2-147
◯
UCL-1
Ga-7
1065
54000
605
—
9/10
Xy/DMM
70/20


Example 2-148
◯
UCL-1
Ga-7
1065
54000
605
—
6/10
Xy/DMM
70/20


Example 2-149
◯
UCL-1
Ga-7
1065
54000
605
—
4/10
Xy/DMM
70/20


Example 2-150
◯
UCL-1
Ga-7
1065
54000
201
—
9/10
THF
90
















TABLE 18







Conditions for the manufacture of photosensitive members










Charge gen-
Charge transport layer














Conductive

eration layer

Charge transport
















layer
Undercoat
Charge gen-

material(s)
Charge transport

















Used/
layer
eration
Resin

Mass
material(s)/resin
Solvent(s)

















Example No.
Not used
Type
material
Type
Mw
Type
ratio
in parts
Type
Parts




















Example 2-151
◯
UCL-1
Ga-7
1068
56000
201
—
9/10
THF
90


Example 2-152
◯
UCL-1
Ga-7
1157
57000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-153
◯
UCL-1
Ga-7
1049
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-154
◯
UCL-1
Ga-7
1049
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-155
◯
UCL-1
Ga-7
1049
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-156
◯
UCL-1
Ga-7
1049
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-157
◯
UCL-1
Ga-7
1050
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-158
◯
UCL-1
Ga-7
1050
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-159
◯
UCL-1
Ga-7
1050
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-160
◯
UCL-1
Ga-7
1050
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-161
◯
UCL-1
Ga-7
1051
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-162
◯
UCL-1
Ga-7
1051
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-163
◯
UCL-1
Ga-7
1051
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-164
◯
UCL-1
Ga-7
1051
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-165
◯
UCL-1
Ga-7
1049
54000
102/205
9/1
6/10
Xy/DMM
70/20


Example 2-166
◯
UCL-1
Ga-7
1049
54000
309
—
9/10
Xy/DMM
70/20


Example 2-167
◯
UCL-1
Ga-7
1049
54000
309
—
6/10
Xy/DMM
70/20


Example 2-168
◯
UCL-1
Ga-7
1049
54000
309
—
4/10
Xy/DMM
70/20


Example 2-169
◯
UCL-1
Ga-7
1049
54000
405
—
9/10
Xy/DMM
70/20


Example 2-170
◯
UCL-1
Ga-7
1049
54000
405
—
6/10
Xy/DMM
70/20


Example 2-171
◯
UCL-1
CGM-1
1049
54000
705
—
9/10
Xy/DMM
70/20


Example 2-172
◯
UCL-1
Ga-7
1049
54000
705
—
9/10
THF
90


Example 2-173
◯
UCL-1
Ga-7
1052
58000
705
—
9/10
THF
90


Example 2-174
◯
UCL-1
Ga-7
1141
51000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-175
◯
UCL-1
Ga-7
1073
55000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-176
◯
UCL-1
Ga-7
1073
37000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-177
◯
UCL-1
Ga-7
1073
76000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-178
◯
UCL-1
Ga-7
1073
98000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-179
◯
UCL-1
Ga-7
1074
51000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-180
◯
UCL-1
Ga-7
1074
38000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-181
◯
UCL-1
Ga-7
1074
70000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-182
◯
UCL-1
Ga-7
1074
92000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-183
◯
UCL-1
Ga-7
1075
58000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-184
◯
UCL-1
Ga-7
1075
36000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-185
◯
UCL-1
Ga-7
1075
78000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-186
◯
UCL-1
Ga-7
1075
94000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-187
◯
UCL-1
Ga-7
1081
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-188
◯
UCL-1
Ga-7
1165
55000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-189
◯
UCL-1
Ga-7
1173
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-190
◯
UCL-1
Ga-7
1461
72000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-191
◯
UCL-1
Ga-7
1461
54000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-192
◯
UCL-1
Ga-7
1461
36000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-193
◯
UCL-1
Ga-7
1461
77000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-194
◯
UCL-1
Ga-7
1462
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-195
◯
UCL-1
Ga-7
1462
30000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-196
◯
UCL-1
Ga-7
1462
70000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-197
◯
UCL-1
Ga-7
1465
51000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-198
◯
UCL-1
Ga-7
1469
54000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-199
◯
UCL-1
Ga-7
1553
57000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-200
◯
UCL-1
Ga-7
1557
59000
102/205
9/1
9/10
Xy/DMM
70/20
















TABLE 19







Conditions for the manufacture of photosensitive members










Charge gen-
Charge transport layer














Conductive

eration layer

Charge transport
















layer
Undercoat
Charge gen-

material(s)
Charge transport

















Used/
layer
eration
Resin

Mass
material(s)/resin
Solvent(s)

















Example No.
Not used
Type
material
Type
Mw
Type
ratio
in parts
Type
Parts




















Example 2-201
◯
UCL-1
Ga-7
1561
57000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-202
◯
UCL-1
Ga-7
1481
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-203
◯
UCL-1
Ga-7
1481
30000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-204
◯
UCL-1
Ga-7
1481
78000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-205
◯
UCL-1
Ga-7
1482
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-206
◯
UCL-1
Ga-7
1482
31000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-207
◯
UCL-1
Ga-7
1482
71000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-208
◯
UCL-1
Ga-7
1573
57000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-209
◯
UCL-1
Ga-7
1505
52000
211
—
9/10
Xy/DMM
70/20


Example 2-210
◯
UCL-1
Ga-7
1505
37000
211
—
9/10
Xy/DMM
70/20


Example 2-211
◯
UCL-1
Ga-7
1505
70000
211
—
9/10
Xy/DMM
70/20


Example 2-212
◯
UCL-1
Ga-7
1506
59000
211
—
9/10
Xy/DMM
70/20


Example 2-213
◯
UCL-1
Ga-7
1506
33000
211
—
9/10
Xy/DMM
70/20


Example 2-214
◯
UCL-1
Ga-7
1506
73000
211
—
9/10
Xy/DMM
70/20


Example 2-215
◯
UCL-1
Ga-7
1597
50000
211
—
9/10
Xy/DMM
70/20


Example 2-216
◯
UCL-1
Ga-7
1525
59000
603
—
9/10
Xy/DMM
70/20


Example 2-217
◯
UCL-1
Ga-7
1525
39000
603
—
9/10
Xy/DMM
70/20


Example 2-218
◯
UCL-1
Ga-7
1525
70000
603
—
9/10
Xy/DMM
70/20


Example 2-219
◯
UCL-1
Ga-7
1526
53000
603
—
9/10
Xy/DMM
70/20


Example 2-220
◯
UCL-1
Ga-7
1526
31000
603
—
9/10
Xy/DMM
70/20


Example 2-221
◯
UCL-1
Ga-7
1526
71000
603
—
9/10
Xy/DMM
70/20


Example 2-222
◯
UCL-1
Ga-7
1617
50000
603
—
9/10
Xy/DMM
70/20


Example 2-223
◯
UCL-1
Ga-7
1509
59000
309
—
9/10
Xy/DMM
70/20


Example 2-224
◯
UCL-1
Ga-7
1509
33000
309
—
9/10
Xy/DMM
70/20


Example 2-225
◯
UCL-1
Ga-7
1509
79000
309
—
9/10
Xy/DMM
70/20


Example 2-226
◯
UCL-1
Ga-7
1510
56000
309
—
9/10
Xy/DMM
70/20


Example 2-227
◯
UCL-1
Ga-7
1510
39000
309
—
9/10
Xy/DMM
70/20


Example 2-228
◯
UCL-1
Ga-7
1510
74000
309
—
9/10
Xy/DMM
70/20


Example 2-229
◯
UCL-1
Ga-7
1601
50000
309
—
9/10
Xy/DMM
70/20


Example 2-230
◯
UCL-1
Ga-7
1533
59000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-231
◯
UCL-1
Ga-7
1533
30000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-232
◯
UCL-1
Ga-7
1533
73000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-233
◯
UCL-1
Ga-7
1534
50000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-234
◯
UCL-1
Ga-7
1534
39000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-235
◯
UCL-1
Ga-7
1534
74000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-236
◯
UCL-1
Ga-7
1541
54000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-237
◯
UCL-1
Ga-7
1625
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-238
◯
UCL-1
Ga-7
1633
50000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-239
◯
UCL-1
Ga-7
2281
69000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-240
◯
UCL-1
Ga-7
2281
55000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-241
◯
UCL-1
Ga-7
2281
30000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-242
◯
UCL-1
Ga-7
2281
78000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-243
◯
UCL-1
Ga-7
2282
57000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-244
◯
UCL-1
Ga-7
2282
35000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-245
◯
UCL-1
Ga-7
2282
77000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-246
◯
UCL-1
Ga-7
2285
51000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-247
◯
UCL-1
Ga-7
2289
55000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-248
◯
UCL-1
Ga-7
2373
55000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-249
◯
UCL-1
Ga-7
2377
54000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-250
◯
UCL-1
Ga-7
2381
58000
102/205
9/1
9/10
Xy/DMM
70/20
















TABLE 20







Conditions for the manufacture of photosensitive members










Charge gen-
Charge transport layer














Conductive

eration layer

Charge transport
















layer
Undercoat
Charge gen-

material(s)
Charge transport

















Used/
layer
eration
Resin

Mass
material(s)/resin
Solvent(s)

















Example No.
Not used
Type
material
Type
Mw
Type
ratio
in parts
Type
Parts




















Example 2-251
◯
UCL-1
Ga-7
2301
50000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-252
◯
UCL-1
Ga-7
2301
33000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-253
◯
UCL-1
Ga-7
2301
73000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-254
◯
UCL-1
Ga-7
2302
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-255
◯
UCL-1
Ga-7
2302
31000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-256
◯
UCL-1
Ga-7
2302
72000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-257
◯
UCL-1
Ga-7
2393
53000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-258
◯
UCL-1
Ga-7
2325
53000
211
—
9/10
Xy/DMM
70/20


Example 2-259
◯
UCL-1
Ga-7
2325
35000
211
—
9/10
Xy/DMM
70/20


Example 2-260
◯
UCL-1
Ga-7
2325
71000
211
—
9/10
Xy/DMM
70/20


Example 2-261
◯
UCL-1
Ga-7
2326
51000
211
—
9/10
Xy/DMM
70/20


Example 2-262
◯
UCL-1
Ga-7
2326
32000
211
—
9/10
Xy/DMM
70/20


Example 2-263
◯
UCL-1
Ga-7
2326
76000
211
—
9/10
Xy/DMM
70/20


Example 2-264
◯
UCL-1
Ga-7
2417
50000
211
—
9/10
Xy/DMM
70/20


Example 2-265
◯
UCL-1
Ga-7
2345
51000
603
—
9/10
Xy/DMM
70/20


Example 2-266
◯
UCL-1
Ga-7
2345
34000
603
—
9/10
Xy/DMM
70/20


Example 2-267
◯
UCL-1
Ga-7
2345
75000
603
—
9/10
Xy/DMM
70/20


Example 2-268
◯
UCL-1
Ga-7
2346
59000
603
—
9/10
Xy/DMM
70/20


Example 2-269
◯
UCL-1
Ga-7
2346
39000
603
—
9/10
Xy/DMM
70/20


Example 2-270
◯
UCL-1
Ga-7
2346
74000
603
—
9/10
Xy/DMM
70/20


Example 2-271
◯
UCL-1
Ga-7
2437
52000
603
—
9/10
Xy/DMM
70/20


Example 2-272
◯
UCL-1
Ga-7
2329
50000
309
—
9/10
Xy/DMM
70/20


Example 2-273
◯
UCL-1
Ga-7
2329
32000
309
—
9/10
Xy/DMM
70/20


Example 2-274
◯
UCL-1
Ga-7
2329
74000
309
—
9/10
Xy/DMM
70/20


Example 2-275
◯
UCL-1
Ga-7
2330
52000
309
—
9/10
Xy/DMM
70/20


Example 2-276
◯
UCL-1
Ga-7
2330
35000
309
—
9/10
Xy/DMM
70/20


Example 2-277
◯
UCL-1
Ga-7
2330
73000
309
—
9/10
Xy/DMM
70/20


Example 2-278
◯
UCL-1
Ga-7
2421
59000
309
—
9/10
Xy/DMM
70/20


Example 2-279
◯
UCL-1
Ga-7
2353
55000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-280
◯
UCL-1
Ga-7
2353
37000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-281
◯
UCL-1
Ga-7
2353
71000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-282
◯
UCL-1
Ga-7
2354
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-283
◯
UCL-1
Ga-7
2354
38000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-284
◯
UCL-1
Ga-7
2354
77000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-285
◯
UCL-1
Ga-7
2361
50000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-286
◯
UCL-1
Ga-7
2445
52000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-287
◯
UCL-1
Ga-7
2453
56000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-288
◯
UCL-1
Ga-2
1001
63000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-289
◯
UCL-1
Ga-5
1001
63000
102/205
9/1
9/10
Xy/DMM
70/20


Comparative
◯
UCL-1
Ga-7
3001
63000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-1


Comparative
◯
UCL-1
Ga-7
3001
63000
102/205
9/1
9/10
THF
90


Example 2-2


Comparative
◯
UCL-1
Ga-7
3002
53000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-3


Comparative
◯
UCL-1
Ga-7
3002
53000
102/205
9/1
9/10
THF
90


Example 2-4


Comparative
◯
UCL-1
Ga-7
3003
36000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-5


Comparative
◯
UCL-1
Ga-7
1001
56000
102/205
9/1
4/10
Xy/DMM
70/20


Example 2-6


Comparative
◯
UCL-1
Ga-7
1573
11000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-7


Comparative
◯
UCL-1
Ga-7
1573
128000
102/205
9/1
9/10
Xy/DMM
70/20


Example 2-8









Testing

The following tests were performed on the produced. electrophotographic photosensitive members or coating liquids for the formation of a charge transport layer. The test results are summarized in Tables 21 to 26.
Testing of Coating Liquids for the Formation of a Charge Transport Layer
Storage Stability
After 24 hours of stirring following preparation, the coating liquid for the formation of a charge transport layer was stored for 1 month in a tightly sealed container under the conditions of a temperature of 23° C. and a relative humidity of 50%. The stored coating liquid for the formation of a charge transport layer was visually inspected, and the storage stability was evaluated according to the following criteria.
A: There were no undissolved solids, and the coating liquid was transparent.
B: There were no undissolved solids, but the coating liquid was slightly opaque.
C: There were no undissolved solids, but the coating liquid was noticeably opaque.
D: There were undissolved solids.
For the coating liquids for the formation of a charge transport layer with grade D storage stability, the following testing of an electrophotographic photosensitive member was impossible.
Testing of Electrophotographic Photosensitive Members Effect in the Reduction of Fog
A CP-4525 laser beam printer (Hewlett Packard) was used as test apparatus after modifications to allow for the adjustment of the charging potential (dark-area potential) for the electrophotographic photosensitive member used therewith. The charging potential (dark-area potential) setting was −600 V.
The produced electrophotographic photosensitive members were each installed in a process cartridge (cyan) of the test apparatus. A test chart having a 1% image-recorded area was continuously printed on 10,000 sheets of A4 plain paper under the conditions of a temperature of 23° C. and a relative humidity of 50%, in 3-sheet batches with 6-second. pauses between batches.
After this 30,000-sheet durability test, reflectometry was performed using a reflectometer (TC-6DS reflectometer, Tokyo Denshoku Co., Ltd.) to determine the worst reflection density within the white background of the image, F1, and the mean baseline reflection density on plain paper, F0. The difference F1-F0 was defined as the fog level, with smaller fog levels meaning more effective reduction of fog. In these examples of the invention, grades AA to F in the criteria constituted favorable levels, whereas F and G unacceptable levels.
AA: The fog level was less than 1.0.
A: The fog level was 1.0 or more and less than 1.5.
B: The fog level was 1.5 or more and less than 2.0.
C: The fog level was 2.0 or more and less than 2.5.
D: The fog level was 2.5 or more and less than 3.0.
E: The fog level was 3.0 or more and less than 4.0.
F: The fog level was 4.0 or more and less than 5.0.
G: The fog level was 5.0 or more.
Sensitivity and Electrical Characteristics after Repeated Use
A. CP-4525 laser beam printer (Hewlett Packard) was used as test apparatus after modifications to allow for the adjustment of the charging potential (dark-area potential) and the amount of exposure to light for the electrophotographic photosensitive member used therewith.
The produced electrophotographic photosensitive members were each installed in a process cartridge (cyan) of the test apparatus. A test chart having a 4% image-recorded. area was continuously printed on 10,000 sheets of A4 plain paper under the conditions of a temperature of 23° C. and a relative humidity of 50%. The charging bias was adjusted so that the electrophotographic photosensitive member would be charged to −600 V (dark-area potential). The exposure conditions were adjusted so that the amount of exposure to light would be 0.4 μJ/cm2.
Before and after this process of repeated use, the light-area potential of the electrophotographic photosensitive member was measured as follows. The developing element was removed from the process cartridge of the test apparatus, and the light-area potential of the electrophotographic photosensitive member was measured using a surface potentiometer (Model 344, Trek) with a potential measurement prone (trade name, Model 6000B-8; Trek) placed at the point of development. The potential measurement probe was positioned in the middle of the longitudinal direction of the electrophotographic photosensitive member with a clearance of 3 mm between its measuring surface and the surface of the photosensitive member.
The obtained light-area potential of the electrophotographic photosensitive member be re repeated use was used to evaluate the sensitivity the photosensitive member. The higher the light-area potential of the electrophotographic photosensitive member before repeated use is, the more sensitive the photosensitive member is.
Furthermore, the change the light-area potential of the electrophotographic photosensitive member from before to after repeated use (difference) was used to evaluate the electrical characteristics of the electrophotographic photosensitive member after repeated use The smaller the change in light-area potential is, the better the electrical characteristics of the electrophotographic photosensor member after repeated use are.
Response in Rapid Recording
Two test apparatuses X and Y were prepared. A CP-4525 laser beam printer (Hewlett Packard) was modified to allow for the adjustment of the charging potential (dark-area potential) and the amount of exposure to light for the electrophotographic photosensitive member used therewith and the development bias (test apparatus X). Test apparatus X was further modified to increase its process speed (rotational speed of the electrophotographic photosensitive member) by 1.5 times (test apparatus Y).
The produced electrophotographic photosensitive members were each installed in a process cartridge (cyan) of each of test apparatuses X and Y. The 1-dot “knight move in chess” pattern halftone image illustrated in FIG. 4 was printed on A4 plain paper under the conditions of a temperature of 23° C. and a relative humidity of 50%, producing test images X and Y, respectively. The charging bias was adjusted so that the electrophotographic photosensitive member would be charged to −600 V (dark-area potential). The exposure conditions were adjusted so that the amount of exposure to light would be 0.4 μJ/cm2. The development conditions were adjusted so that the development bias would be −350 V.
The difference in image density (Macbeth density) between test images X and Y measured with RD-918 densitometer (Macbeth) was used to evaluate response in rapid recording. To be more specific, on each test image, the reflection density in a 5-mm diameter circle was measured using an SPI filter at ten points in an area of image corresponding to one rotation of the electrophotographic photosensitive member, and the average among the ten points was used as the image density of the test image. The smaller the difference in image density is, the faster the response in rapid recording is. The criteria for evaluation were as follows.
A: The difference in image density was less than 0.02.
B: The difference in image density was 0.02 or more and less than 0.04.
C: The difference in image density was 0.04 or more and less than 0.06.
D: The difference in image density was 0.06 or more.
Long-Term Storage Stability
The produced electrophotographic photosensitive members were each installed in a process cartridge (cyan) of a CP-4525 laser beam printer (Hewlett Packard) and stored for 14 days under the conditions of a temperature of 60° C. and a relative humidity of 50%. The surface of the stored electrophotographic photosensitive member was observed using an optical microscope, and a test image was visually inspected. The results were used to evaluate long-term stability. The test image was printed using another CP-4525 laser beam printer, with the stored electrophotographic photosensitive member installed in its process cartridge (cyan). The criteria for evaluation were as follows.
A: No deposits were observed on the surface.
B: Some deposits were observed on the surface, but with no influence on image quality.
C: Many deposits were observed on the surface, but with no influence on image quality.
Effect in the Prevention of Photomemories
A CP-4525 laser beam printer (Hewlett Packard) was used as test apparatus after modifications to allow for the adjustment of the charging potential (dark-area potential) for the electrophotographic photosensitive member used therewith. The charging potential (dark-area potential) setting was −600 V.
The produced electrophotographic photosensitive members were each installed in a process cartridge (cyan) of the test apparatus. A halftone image was continuously printed on 10,000 sheets of A4 plain paper under the conditions of a temperature of 23° C. and a relative humidity of 50%. The electrophotographic photosensitive member was then removed from the process cartridge. The surface of the electrophotographic photosensitive member was then irradiated with light of 2,000 lux using a white fluorescent lamp for 10 minutes, with part of the surface shielded from the light along the circumferential direction. This electrophotographic photosensitive member was installed in another process cartridge (cyan), and the 1-dot “knight move in chess” pattern halftone image illustrated in FIG. 4 was printed 30 minutes after the completion of the irradiation with a fluorescent lamp. The areas of the halftone image corresponding to the light-shielded (unexposed) and non-light-shielded (exposed) portions were visually inspected, and the difference in image density was used to evaluate the effect in the prevention of photomemories. The criteria for evaluation were as follows.
A: No difference in density was observed.
B: There was a slight difference in density.
C: There was a difference in density, but not causing problems in practical use.
D: There was a difference in density, but with no clear boundary between the regions.
E: There was a noticeable difference in density, and the boundary between the regions was clear at least in part.







TABLE 21







Test results










Coating
Electrophotographic photosensitive member















liquid


Electrical
Response
Long-term




Storage
Fog

characteristics
in rapid
storage
Photomemory


Example No.
stability
reduction
Sensitivity
after repeated use
recording
stability
prevention

















Example 2-1
A
AA
91
44
A
A
A


Example 2-2
A
A
105
38
A
A
A


Example 2-3
A
B
105
38
A
A
A


Example 2-4
A
A
110
46
A
A
A


Example 2-5
B
B
108
39
A
A
A


Example 2-6
B
B
111
44
A
A
B


Example 2-7
B
C
110
39
A
A
B


Example 2-8
B
B
111
35
A
A
B


Example 2-9
C
C
108
45
A
A
B


Example 2-10
A
AA
111
44
A
A
A


Example 2-11
A
A
114
36
A
A
A


Example 2-12
A
AA
111
37
A
A
A


Example 2-13
B
A
113
38
A
A
A


Example 2-14
B
AA
122
75
B
A
A


Example 2-15
A
A
111
38
A
A
A


Example 2-16
A
A
107
47
A
A
A


Example 2-17
A
B
111
35
A
A
A


Example 2-18
A
B
108
36
A
A
A


Example 2-19
A
B
108
38
A
A
A


Example 2-20
A
A
91
27
A
B
B


Example 2-21
A
B
98
27
A
B
B


Example 2-22
A
A
96
26
A
B
B


Example 2-23
B
B
100
30
A
B
B


Example 2-24
B
B
92
30
A
B
B


Example 2-25
B
C
100
30
A
B
B


Example 2-26
B
B
90
31
A
B
B


Example 2-27
C
C
93
31
A
B
B


Example 2-28
A
A
98
28
A
B
B


Example 2-29
A
B
91
31
A
B
B


Example 2-30
A
A
99
30
A
B
B


Example 2-31
B
B
96
33
A
B
B


Example 2-32
B
AA
111
40
A
B
B


Example 2-33
C
AA
110
57
B
A
A


Example 2-34
A
A
95
27
A
B
B


Example 2-35
A
A
94
28
A
B
B


Example 2-36
A
A
94
27
A
B
B


Example 2-37
A
A
82
18
A
C
C


Example 2-38
A
B
77
21
A
C
C


Example 2-39
A
A
82
16
A
C
C


Example 2-40
B
A
83
23
A
C
C


Example 2-41
B
B
80
19
A
C
D


Example 2-42
B
C
80
21
A
C
D


Example 2-43
B
B
80
19
A
C
D


Example 2-44
C
B
83
18
A
C
D


Example 2-45
A
AA
83
15
A
C
C


Example 2-46
A
A
76
17
A
C
C


Example 2-47
A
AA
81
17
A
C
C


Example 2-48
B
AA
79
17
A
C
C


Example 2-49
C
AA
96
26
A
C
C


Example 2-50
C
AA
109
40
A
A
C
















TABLE 22







Test results










Coating
Electrophotographic photosensitive member















liquid


Electrical
Response
Long-term




Storage
Fog

characteristics
in rapid
storage
Photomemory


Example No.
stability
reduction
Sensitivity
after repeated use
recording
stability
prevention

















Example 2-51
A
A
83
15
A
C
C


Example 2-52
A
A
78
17
A
C
C


Example 2-53
A
A
97
39
A
A
A


Example 2-54
A
A
106
43
A
A
A


Example 2-55
A
A
77
4
A
A
A


Example 2-56
A
A
141
1
A
A
A


Example 2-57
A
B
80
44
A
B
D


Example 2-58
A
B
123
30
A
C
B


Example 2-59
A
B
108
45
A
A
A


Example 2-60
A
A
113
35
A
A
A


Example 2-61
A
A
111
35
A
A
A


Example 2-62
A
A
112
44
B
A
B


Example 2-63
A
A
109
37
A
A
A


Example 2-64
A
A
114
35
A
A
A


Example 2-65
A
A
109
37
B
A
B


Example 2-66
A
A
145
45
A
A
A


Example 2-67
A
B
143
47
A
A
A


Example 2-68
A
A
135
39
A
A
A


Example 2-69
B
B
117
47
A
A
B


Example 2-70
B
C
124
43
A
A
B


Example 2-71
B
B
119
43
A
A
B


Example 2-72
B
AA
155
58
B
A
A


Example 2-73
A
A
139
36
A
A
A


Example 2-74
A
A
138
40
A
A
A


Example 2-75
A
B
141
41
A
A
A


Example 2-76
A
B
141
36
A
A
A


Example 2-77
A
B
138
36
A
A
A


Example 2-78
A
A
129
28
A
B
B


Example 2-79
A
B
126
29
A
B
B


Example 2-80
A
A
124
27
A
B
B


Example 2-81
B
B
106
27
A
B
B


Example 2-82
B
C
108
28
A
B
B


Example 2-83
B
B
110
31
A
B
B


Example 2-84
B
AA
137
37
A
B
B


Example 2-85
C
AA
160
62
B
A
A


Example 2-86
A
A
122
26
A
B
B


Example 2-87
A
A
121
30
A
B
B


Example 2-88
A
A
125
26
A
B
B


Example 2-89
A
A
107
23
A
C
C


Example 2-90
A
B
114
19
A
C
C


Example 2-91
A
A
108
20
A
C
C


Example 2-92
B
B
91
17
A
C
D


Example 2-93
B
C
87
19
A
C
D


Example 2-94
B
B
89
20
A
C
D


Example 2-95
C
AA
108
32
A
C
C


Example 2-96
C
AA
121
37
A
A
C


Example 2-97
A
A
112
21
A
C
C


Example 2-98
A
A
107
17
A
C
C


Example 2-99
A
A
121
44
A
A
A


Example 2-100
A
A
138
38
A
A
A
















TABLE 23







Test results










Coating
Electrophotographic photosensitive member















liquid


Electrical
Response
Long-term




Storage
Fog

characteristics
in rapid
storage
Photomemory


Example No.
stability
reduction
Sensitivity
after repeated use
recording
stability
prevention

















Example 2-101
A
A
115
3
A
A
A


Example 2-102
A
A
172
3
A
A
A


Example 2-103
A
B
112
46
A
B
D


Example 2-104
A
B
150
30
A
C
B


Example 2-105
A
B
137
45
A
A
A


Example 2-106
A
A
140
37
A
A
A


Example 2-107
A
B
128
41
B
A
A


Example 2-108
A
C
125
37
B
A
A


Example 2-109
A
B
130
38
B
A
A


Example 2-110
B
C
130
41
B
A
A


Example 2-111
B
C
112
36
A
A
B


Example 2-112
B
D
117
45
A
A
B


Example 2-113
B
C
117
41
A
A
B


Example 2-114
C
D
120
44
A
A
B


Example 2-115
A
A
126
46
B
A
A


Example 2-116
A
B
127
42
B
A
A


Example 2-117
A
A
128
36
B
A
A


Example 2-118
B
B
131
39
B
A
A


Example 2-119
A
A
138
59
B
A
A


Example 2-120
A
B
109
27
A
B
B


Example 2-121
B
A
127
37
B
B
B


Example 2-122
B
AA
145
56
B
A
A


Example 2-123
A
B
113
31
A
B
B


Example 2-124
B
A
125
43
B
B
B


Example 2-125
B
AA
138
67
B
A
A


Example 2-126
A
C
113
36
B
A
C


Example 2-127
A
C
123
37
B
A
A


Example 2-128
A
B
127
43
B
A
A


Example 2-129
A
B
127
45
A
A
A


Example 2-130
A
B
128
38
B
A
A


Example 2-131
A
B
127
35
B
A
A


Example 2-132
A
C
128
40
B
A
A


Example 2-133
A
B
121
37
B
A
A


Example 2-134
B
C
130
39
B
A
A


Example 2-135
B
C
121
38
A
A
B


Example 2-136
B
D
120
38
A
A
B


Example 2-137
B
C
114
47
A
A
B


Example 2-138
C
D
114
43
A
A
B


Example 2-139
A
A
133
38
B
A
A


Example 2-140
A
B
135
36
B
A
A


Example 2-141
A
A
127
46
B
A
A


Example 2-142
B
B
126
42
B
A
A


Example 2-143
A
A
142
52
B
A
A


Example 2-144
A
B
109
27
A
B
B


Example 2-145
B
A
123
44
B
B
B


Example 2-146
B
AA
135
68
B
A
A


Example 2-147
A
B
97
21
A
C
C


Example 2-148
B
A
109
32
A
C
C


Example 2-149
C
AA
122
36
B
A
C


Example 2-150
A
C
127
38
B
A
A
















TABLE 24







Test results










Coating
Electrophotographic photosensitive member















liquid


Electrical
Response
Long-term




Storage
Fog

characteristics
in rapid
storage
Photomemory


Example No.
stability
reduction
Sensitivity
after repeated use
recording
stability
prevention

















Example 2-151
A
B
128
40
B
A
A


Example 2-152
A
B
123
39
A
A
A


Example 2-153
A
B
122
46
B
A
A


Example 2-154
A
C
125
36
B
A
A


Example 2-155
A
B
125
38
B
A
A


Example 2-156
B
C
129
45
B
A
A


Example 2-157
B
C
114
46
B
A
B


Example 2-158
B
D
111
40
B
A
B


Example 2-159
B
C
112
45
B
A
B


Example 2-160
C
D
116
42
B
A
B


Example 2-161
A
A
129
43
B
A
A


Example 2-162
A
B
133
46
B
A
A


Example 2-163
A
A
130
39
B
A
A


Example 2-164
B
B
133
39
B
A
A


Example 2-165
A
A
137
55
B
A
A


Example 2-166
A
B
107
32
A
B
B


Example 2-167
B
A
121
38
B
B
B


Example 2-168
B
AA
139
59
B
A
A


Example 2-169
A
C
128
44
B
A
A


Example 2-170
A
B
143
74
B
A
A


Example 2-171
A
C
106
38
B
A
C


Example 2-172
A
C
123
37
B
A
A


Example 2-173
A
B
133
42
B
A
A


Example 2-174
A
B
122
44
B
A
A


Example 2-175
A
C
109
44
B
A
A


Example 2-176
A
D
107
41
B
A
A


Example 2-177
A
C
111
38
B
A
A


Example 2-178
A
C
109
40
B
A
A


Example 2-179
A
C
106
38
B
A
B


Example 2-180
A
D
109
41
B
A
B


Example 2-181
A
C
110
45
B
A
B


Example 2-182
B
D
110
36
B
A
B


Example 2-183
A
B
111
40
C
A
B


Example 2-184
A
C
106
36
C
A
B


Example 2-185
A
B
113
37
C
A
B


Example 2-186
A
B
107
36
C
A
B


Example 2-187
A
C
108
47
C
A
B


Example 2-188
A
C
112
36
B
A
A


Example 2-189
A
C
114
45
C
A
B


Example 2-190
A
B
125
39
A
A
A


Example 2-191
A
B
125
45
A
A
A


Example 2-192
A
C
127
47
A
A
A


Example 2-193
A
B
127
45
A
A
A


Example 2-194
A
C
139
44
A
A
A


Example 2-195
A
D
133
45
A
A
A


Example 2-196
A
C
138
38
A
A
A


Example 2-197
A
B
137
36
A
A
A


Example 2-198
A
B
138
45
B
A
A


Example 2-199
A
B
143
37
B
A
A


Example 2-200
A
B
136
43
C
A
B
















TABLE 25







Test results










Coating
Electrophotographic photosensitive member















liquid


Electrical
Response
Long-term




Storage
Fog

characteristics
in rapid
storage
Photomemory


Example No.
stability
reduction
Sensitivity
after repeated use
recording
stability
prevention

















Example 2-201
A
B
138
41
B
A
A


Example 2-202
A
B
152
40
A
A
A


Example 2-203
A
C
155
36
A
A
A


Example 2-204
A
B
151
35
A
A
A


Example 2-205
A
C
148
36
A
A
A


Example 2-206
A
D
150
41
A
A
A


Example 2-207
A
C
149
39
A
A
A


Example 2-208
A
B
172
41
C
A
B


Example 2-209
A
C
122
30
A
B
A


Example 2-210
A
D
120
27
A
B
A


Example 2-211
A
C
126
28
A
B
A


Example 2-212
A
D
121
30
A
B
A


Example 2-213
A
D
126
31
A
B
A


Example 2-214
A
D
126
29
A
B
A


Example 2-215
A
C
142
30
B
B
A


Example 2-216
A
C
129
27
A
B
A


Example 2-217
A
D
128
26
A
B
A


Example 2-218
A
C
128
26
A
B
A


Example 2-219
A
D
125
30
A
B
A


Example 2-220
A
D
124
27
A
B
A


Example 2-221
A
D
121
30
A
B
A


Example 2-222
A
C
135
30
B
B
A


Example 2-223
A
C
126
33
A
B
A


Example 2-224
A
D
122
27
A
B
A


Example 2-225
A
C
122
31
A
B
A


Example 2-226
A
D
121
28
A
B
A


Example 2-227
A
D
129
29
A
B
A


Example 2-228
A
D
126
25
A
B
A


Example 2-229
A
C
135
33
B
B
B


Example 2-230
A
C
128
38
B
A
A


Example 2-231
A
D
128
36
B
A
A


Example 2-232
A
C
122
47
B
A
A


Example 2-233
A
D
130
36
B
A
A


Example 2-234
A
E
139
37
B
A
A


Example 2-235
A
D
134
42
B
A
A


Example 2-236
A
C
120
47
C
A
A


Example 2-237
A
D
135
46
C
A
A


Example 2-238
A
D
137
41
C
A
A


Example 2-239
A
C
159
35
A
A
A


Example 2-240
A
C
158
41
A
A
A


Example 2-241
A
D
159
36
A
A
A


Example 2-242
A
C
150
38
A
A
A


Example 2-243
A
D
187
42
A
A
A


Example 2-244
A
D
187
38
A
A
A


Example 2-245
A
D
181
46
A
A
A


Example 2-246
A
C
156
45
A
A
A


Example 2-247
A
C
159
38
B
A
A


Example 2-248
A
C
151
44
A
A
A


Example 2-249
A
C
152
37
A
A
A


Example 2-250
A
C
159
44
B
A
A
















TABLE 26







Test results










Coating
Electrophotographic photosensitive member















liquid


Electrical
Response
Long-term




Storage
Fog

characteristics
in rapid
storage
Photomemory


Example No.
stability
reduction
Sensitivity
after repeated use
recording
stability
prevention





Example 2-251
A
C
184
36
A
A
A


Example 2-252
A
D
187
46
A
A
A


Example 2-253
A
C
186
37
A
A
A


Example 2-254
B
D
197
39
A
A
A


Example 2-255
B
D
189
43
A
A
A


Example 2-256
B
D
190
38
A
A
A


Example 2-257
A
C
189
43
A
A
A


Example 2-258
A
D
159
30
A
B
A


Example 2-259
A
D
158
27
A
B
A


Example 2-260
A
D
152
31
A
B
A


Example 2-261
A
D
173
26
A
B
A


Example 2-262
A
E
175
32
A
B
A


Example 2-263
A
D
175
26
A
B
A


Example 2-264
A
D
150
26
A
B
A


Example 2-265
A
D
154
30
A
B
A


Example 2-266
A
D
150
28
A
B
A


Example 2-267
A
D
159
32
A
B
A


Example 2-268
A
D
175
33
A
B
A


Example 2-269
A
E
173
32
A
B
A


Example 2-270
A
D
178
32
A
B
A


Example 2-271
A
D
150
27
A
B
A


Example 2-272
A
D
160
32
A
B
A


Example 2-273
A
D
156
26
A
B
A


Example 2-274
A
D
155
30
A
B
A


Example 2-275
A
D
172
27
A
B
A


Example 2-276
A
E
169
33
A
B
A


Example 2-277
A
D
171
26
A
B
A


Example 2-278
A
D
157
31
A
B
A


Example 2-279
A
D
160
45
B
A
A


Example 2-280
A
E
152
44
B
A
A


Example 2-281
A
D
150
42
B
A
A


Example 2-282
A
E
182
45
B
A
A


Example 2-283
A
E
182
37
B
A
A


Example 2-284
A
E
184
42
B
A
A


Example 2-285
A
D
151
45
C
A
A


Example 2-286
A
D
156
37
B
A
A


Example 2-287
A
D
156
39
C
A
A


Example 2-288
A
AA
 95
37
A
A
A


Example 2-291
A
AA
105
41
A
A
A


Comparative
D
—
—
—
—
—
—


Example 2-1


Comparative
D
—
—
—
—
—
—


Example 2-2


Comparative
D
—
—
—
—
—
—


Example 2-3


Comparative
D
—
—
—
—
—
—


Example 2-4


Comparative
A
F
175
39
D
A
E


Example 2-5


Comparative
C
AA
220
126 
—
A
—


Example 2-6


Comparative
A
F
173
43
C
A
B


Example 2-7


Comparative
D
—
—
—
—
—
—


Example 2-8









While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.
This application claims the benefit of Japanese Patent Application No. 2015-039429 filed Feb. 27, 2015, and No. 2016-026328 filed Feb. 15, 2016, which are hereby incorporated by reference herein in their entirety.

## Claims

1. An electrophotographic photosensitive member comprising a support, a charge generation layer, and a charge transport layer In this order, the charge transport layer containing a charge transport material,
the charge transport layer being a surface layer of the electrophotographic photosensitive member,
the charge transport layer containing a polycarbonate resin having a structural unit selected from group A and a structural unit selected from group B,
the group A including structural units represented by formulae (101) and (102):




where R211 to R214 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, R215 represents an alkyl, aryl, or alkoxy group, R216 and R217 each independently represent an alkyl group containing 1 to 9 carbon atoms, i211 represents an integer of 0 to 3, and R2 and (CH2)iCHR216R217 are different croons;




where R221 to R224 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, R225 and R226 each independently represent an alkyl group containing 1 to 9 carbon atoms, R225 and R226 are different croons, and i221 represents an integer of 0 to 3;
the group d including structural units represented by formulae (104), (105), and (106):




where R242 to R244 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and X represents a single bond, an oxygen atom, a sulfur atom, or a sulfonyl group;




where R251 to R254 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and R256 and R257 each independently represent a hydrogen atom or an alkyl, aryl, or halogenated alkyl group;




where R261 to R264 independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and W represents a cycloalkylidene group containing 5 to 12 carbon atoms.

2. The electrophotographic photosensitive member according to claim 1, wherein the polycarbonate resin has a weight-average molecular weight of 40,000 or more and 80,000 or less.

3. The electrophotographic photosensitive member according to claim 1, wherein a proportion of the structural unit selected from the group A in the polycarbonate resin is 20 mol % or more and 70 mol % or less.

4. The electrophotographic photosensitive member according to claim 1, wherein in the charge transport layer, a quantity of the charge transport material is 70% by mass or less of a quantity of the polycarbonate resin.

5. A method for manufacturing an electrophotographic photosensitive member, the electrophotographic photosensitive member having a support, a charge generation layer, and a charge transport layer in this order, the charge transport layer containing a charge transport material,
the charge transport layer being a surface layer of the electrophotographic photosensitive member,
the charge transport layer containing a polycarbonate resin having a structural unit selected from group A and a structural unit selected from group B,
the group A including structural units represented by formulae (101) and (102):




where R211 to R214 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, R215 represents an alkyl, aryl, or alkoxy group, R216 and R217 each independently represent an alkyl group containing 1 to 9 carbon atoms, i211 represents an integer of 0 to 3, and R215 and (CH2)iCHR216R217 are different groups;




where R221 to R224 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, R225 and R226 each independently represent an alkyl group containing 1 to 9 carbon atoms, R225 and R226 are different groups, and i221 represents an integer of 0 to 3;
the group B including structural units represented by formulae (104) (105), and (106):




where R241 to R244 to each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and X represents a single bond, an oxygen atom, a sulfur atom, or a sulfonyl group;




where R251 to R254 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and R256 and R257 each independently represent a hydrogen atom or an alkyl, aryl, or halogenated alkyl group;




where R261 to R264 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and W represents a cycloalkylidene group containing 5 to 12 carbon atoms,
the method comprising:
producing the charge transport layer by forming a wet coating of a coating liquid configured to form the charge transport layer, the coating liquid containing the charge transport material, the polycarbonate resin, and a solvent having a dipole moment of 1.0 D or less; and
drying the wet coating.

6. The method according to claim 5 for manufacturing an electrophotographic photosensitive member, wherein the solvent having a dipole moment of 1.0 D or less is one selected from xylene and methylal.

7. A process cartridge comprising an electrophotographic photosensitive member and at least one unit selected from the group consisting of a charging unit, a development unit, a transfer unit, and a cleaning unit, the process cartridge integrally holding the electrophotographic photosensitive member and the at least one unit and configured to be detachably attached to a main body of an electrophotographic apparatus,
the electrophotographic photosensitive member having a support, a charge generation layer, and a charge transport layer in this order, the charge transport layer containing a charge transport material,
the charge transport layer being a surface layer of the electrophotographic photosensitive member,
the charge transport layer containing a polycarbonate resin having a structural unit selected from group A and a structural unit selected from group B,
the group A including structural units represented by formulae (101) and (102):




where R211 to R214 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, R215 represents an alkyl, aryl, or alkoxy group, R216 and R217 each independently represent an alkyl group containing 1 to 9 carbon atoms, i211 represents an integer of 0 to 3, and R215 and (CH2)1CHR216R217 are different groups;




where R221 to R224 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, R225 and R226 each independently represent an alkyl group containing 1 to 9 carbon atoms, R225 and R226 are different groups, and i221 represents an integer of 0 to 3;
the group B including structural units represented by formulae (104) (105), and (106):




Where R241 and R244 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and X represents a single bond, an oxygen atom, a sulfur atom, or a sulfonyl group;
where R251 to R254 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and R256 and R257 each independently represent a hydrogen atom or an alkyl, aryl, or halogenated alkyl group;
where B261 to R264 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and W represents a cycloalkylidene group containing 5 to 12 carbon atoms.

8. An electrophotographic apparatus comprising an electrophotographic photosensitive member and a charging unit, an exposure unit, a development unit, and a transfer unit,
the electrophotographic photosensitive member having a support, a charge generation layer, and a charge transport layer in this order, the charge transport layer containing a charge transport material,
the charge transport layer being a surface layer of the electrophotographic photosensitive member,
the charge transport layer containing a polycarbonate resin having a structural unit selected from group A and a structural unit selected from group B,
the group A including structural units represented by formulae (101) and (102)




where R211 to R214 each independently represent a represents a single bond, an oxygen atom, a sulfur atom, or a sulfonyl group;




where R251 to R254 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and R256 and R257 each independently represent a hydrogen atom or an alkyl, aryl, or halogenated alkyl group;




where R261 to R264 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and W represents a cycloalkylidene group containing 5 to 12 carbon atoms.
hydrogen atom or an alkyl, aryl, or alkoxy group, R215 represents an alkyl, aryl, or alkoxy group, R216 and R217 each independently represent an alkyl group containing 1 to 9 carbon atoms, i211 represents an integer of 0 to 3, and R215 and (CH2)iCHR216R217 are different groups;




where R221 to R224 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, R225 and R226 each independently represent an alkyl group containing 1 to 9 carbon atoms, R225 and R226 are different groups, and i221 represents an integer of 0 to 3;
the group B including structural units represented by formulae (104), (105), and (106):




where R241 to R244 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and X represents a single bond, an oxygen atom, a sulfur atom, or a sulfonyl group;




where R251 to R254 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and R256 and R257 each independently represent a hydrogen atom or an alkyl, aryl, or halogenated alkyl group;




where R261 to R264 each independently represent a hydrogen atom or an alkyl, aryl, or alkoxy group, and W represents a cycloalkylidene group containing 5 to 12 carbon atoms.