# Patent

## Title
Catadioptric projection objective

## Abstract

A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

## Background
CROSS-REFERENCE TO RELATED APPLICATIONS
The present application is a continuation of U.S. patent application Ser. No. 12/817,628, filed Jun. 17, 2010, which is a continuation of U.S. patent applicant Ser. No. 12/100,233, filed Apr. 9, 2008, now U.S. Pat. No. 7,869,122, which is a divisional of U.S. patent application Ser. No. 11/035,103, filed Jan. 14, 2005, now U.S. Pat. No. 7,385,756, which claims priority benefit to U.S. Provisional 60/536,248 filed Jan. 14, 2004; U.S. Provisional 60/587,504 filed Jul. 14, 2004; U.S. Provisional 60/612,823 filed Sep. 24, 2004; and U.S. Provisional 60/617,674 filed Oct. 13, 2004. The disclosures of all of these Provisional applications and of U.S. patent application Ser. Nos. 11/035,103, 12/100,233, and 12/817,628 are incorporated into this application by reference.


BACKGROUND OF THE INVENTION
1. Field of the Invention
The invention relates to a catadioptric projection objective for imaging a pattern arranged in an object plane onto an image plane.
2. Description of the Related Art
Projection objectives of that type are employed on projection exposure systems, in particular wafer scanners or wafer steppers, used for fabricating semiconductor devices and other types of microdevices and serve to project patterns on photomasks or reticles, hereinafter referred to generically as “masks” or “reticles,” onto an object having a photosensitive coating with ultrahigh resolution on a reduced scale.
In order to create even finer structures, it is sought to both increase the image-end numerical aperture (NA) of the projection objective to be involved and employ shorter wavelengths, preferably ultraviolet light with wavelengths less than about 260 nm.
However, there are very few materials, in particular, synthetic quartz glass and crystalline fluorides, that are sufficiently transparent in that wavelength region available for fabricating the optical elements required. Since the Abbé numbers of those materials that are available lie rather close to one another, it is difficult to provide purely refractive systems that are sufficiently well color-corrected (corrected for chromatic aberrations).
In view of the aforementioned problems, catadioptric systems that combine refracting and reflecting elements, i.e., in particular, lenses and mirrors, are primarily employed for configuring high-resolution projection objectives of the aforementioned type.
The high prices of the materials involved and limited availability of crystalline calcium fluoride in sizes large enough for fabricating large lenses represent problems, particularly in the field of microlithography at 157 nm for very large numerical apertures, NA, of, for example, NA=0.80 and larger. Measures that will allow reducing the number and sizes of lenses employed and simultaneously contribute to maintaining, or even improving, imaging fidelity are thus desired.
Catadioptric projection objectives having at least two concave mirrors have been proposed to provide systems with good color correction and moderate lens mass requirements. The U.S. Pat. No. 6,600,608 B1 discloses a catadioptric projection objective having a first, purely refractive objective part for imaging a pattern arranged in the object plane of the projection objective into a first intermediate image, a second objective part for imaging the first intermediate image into a second intermediate image and a third objective part for imaging the second intermediate image directly, that is without a further intermediate image, onto the image plane. The second objective part is a catadioptric objective part having a first concave mirror with a central bore and a second concave mirror with a central bore, the concave mirrors having the mirror faces facing each other and defining an intermirror space or catadioptric cavity in between. The first intermediate image is formed within the central bore of the concave mirror next to the object plane, whereas the second intermediate image is formed within the central bore of the concave mirror next to the object plane. The objective has axial symmetry and provides good color correction axially and laterally. However, since the reflecting surfaces of the concave mirrors are interrupted at the bores, the pupil of the system is obscured.
The Patent EP 1 069 448 B1 discloses another catadioptric projection objective having two concave mirrors facing each other. The concave mirrors are part of a first catadioptric objective part imaging the object onto an intermediate image positioned adjacent to a concave mirror. This is the only intermediate image, which is imaged to the image plane by a second, purely refractive objective part. The object as well as the image of the catadioptric imaging system are positioned outside the intermirror space defined by the mirrors facing each other. Similar systems having two concave mirrors, a common straight optical axis and one intermediate image formed by a catadioptric imaging system and positioned besides one of the concave mirrors are disclosed in Japanese patent application JP 2002208551 A and US patent application US 2002/00241 A1.
European patent application EP 1 336 887 (corresponding to US 2004/0130806 A1) discloses catadioptric projection objectives having one common straight optical axis and, in that sequence, a first catadioptric objective part for creating a first intermediate image, a second catadioptric objective part for creating a second intermediate image from the first intermediate image, and a refractive third objective part forming the image from the second intermediate image. Each catadioptric system has two concave mirrors facing each other. The intermediate images lie outside the intermirror spaces defined by the concave mirrors. Concave mirrors are positioned optically near to pupil surfaces closer to pupil surfaces than to the intermediate images of the projection objectives.
In the article “Nikon Projection Lens Update” by T. Matsuyama, T. Ishiyama and Y. Ohmura, presented by B. W. Smith in: Optical Microlithography XVII, Proc. of SPIE 5377.65 (2004) a design example of a catadioptric projection lens is shown, which is a combination of a conventional dioptric DUV system and a 6-mirror EUV catoptric system inserted between lens groups of the DUV system. A first intermediate image is formed behind the third mirror of the catoptric (purely reflective) group upstream of a convex mirror. The second intermediate image is formed by a purely reflective (catoptric) second objective part. The third objective part is purely refractive featuring negative refractive power at a waist of minimum beam diameter within the third objective part for Petzval sum correction.
Japanese patent application JP 2003114387 A and international patent application WO 01/55767 A disclose catadioptric projection objectives having one common straight optical axis, a first catadioptric objective part for forming an intermediate image and a second catadioptric objective part for imaging the intermediate image onto the image plane of this system. Concave and convex mirrors are used in combination.
U.S. provisional application with Ser. No. 60/511,673 filed on Oct. 17, 2003 by the applicant discloses catadioptric projection objectives having very high NA and suitable for immersion lithography at NA>1. In preferred embodiments, exactly three intermediate images are created. A cross-shaped embodiment has a first, refractive objective part creating a first intermediate image from the object, a second, catadioptric objective part for creating a second intermediate image from the first object, a third, catadioptric objective part for creating a third intermediate image from the second intermediate image and a fourth, refractive objective part for imaging the third intermediate image onto the image plane. The catadioptric objective parts each have one concave mirror, and planar folding mirrors are associated therewith. The concave mirrors are facing each other with the concave mirror surfaces. The folding mirrors are arranged in the middle or the intermirror space defined by the concave mirrors. The concave mirrors may be coaxial and the optical axes of the catadioptric parts may be perpendicular or at an angle with respect to the optical axis defined in the refractive imaging systems.
The full disclosure of the documents mentioned above is incorporated into this application by reference.
The article “Camera view finder using tilted concave mirror erecting elements” by D. DeJager, SPIE. Vol. 237 (1980) p. 292-298 discloses camera view finders comprising two concave mirrors as elements of a 1:1 telescopic erecting relay system. The system is designed to image an object at infinity into a real image, which is erect and can be viewed through an eyepiece. Separate optical axes of refractive system parts upstream and downstream of the catoptric relay system are parallel offset to each other. In order to build a system having concave mirrors facing each other mirrors must be tilted. The authors conclude that physically realizable systems of this type have poor image quality.
International patent applications WO 92/05462 and WO 94/06047 and the article “Innovative Wide-Field Binocular Design” in OSA/SPIE Proceedings (1994) pages 389ff disclose catadioptric optical systems especially for binoculars and other viewing instruments designed as in-line system having a single, unfolded optical axis. Some embodiments have a first concave mirror having an object side mirror surface arranged on one side of the optical axis and a second concave mirror having a mirror surface facing the first mirror and arranged on the opposite side of the optical axis such that the surface curvatures of the concave mirrors define and intermirror space. A front refractive group forms a first intermediate image near the first mirror and a second intermediate image is formed outside of the space formed by the two facing mirrors. A narrow field being larger in a horizontal direction than in a vertical direction is arranged off-set to the optical axis. The object side refractive group has a collimated input and the image side refractive group has a collimated output and entrance and exit pupils far from telecentric are formed. The pupil shape is semi-circular unlike pupil surfaces in lithographic projection lenses, which have to be circular and centered on the optical axis.
The PCT application WO 01/044682 A1 discloses catadioptric UV imaging systems for wafer inspection having one concave mirror designed as Mangin mirror.
SUMMARY OF THE INVENTION
It is one object of the invention to provide a catadioptric projection objective suitable for use in the vacuum ultraviolet (VUV) range having potential for very high image side numerical aperture which may be extended to values allowing immersion lithography at numerical apertures NA>1. It is another object of the invention to provide catadioptric projection objectives that can be build with relatively small amounts of optical material.
As a solution to these and other objects the invention, according to one formulation, provides a catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising:
a first objective part for imaging the pattern provided in the object plane into a first intermediate image;
a second objective part for imaging the first intermediate image into a second intermediate image;
a third objective part for imaging the second intermediate image onto the image plane;
wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image;
pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and
all concave mirrors are arranged optically remote from a pupil surface.
In designs according to this aspect of the invention a circular pupil centered around the optical axis can be provided in a centered optical system. Two or more concave mirrors in the system parts contributing to forming the second intermediate image are provided, where the used area of the concave mirrors deviates significantly from an axial symmetric illumination. In preferred embodiments exactly two concave mirrors are provided and are sufficient for obtaining excellent imaging quality and very high numerical aperture. Systems having one common unfolded (straight) optical axis can be provided which facilitate manufacturing, adjustment and integration into photolithographic exposure systems. No planar folding mirrors are necessary. However, one or more planar folding mirrors can be utilized to obtain more compact designs.
All concave mirrors are arranged “optically remote” from pupil surfaces which means that they are arranged outside an optical vicinity of a pupil surface. They may be arranged optically nearer to field surfaces than to pupil surfaces. Preferred positions optically remote from a pupil surface (i.e. outside an optical vicinity of a pupil surface) may be characterized by the ray height ratio H=hC/hM>1, where hC is the height of a chief ray and hM is the height of a marginal ray of the imaging process. The marginal ray height hM is the height of a marginal ray running from an inner field point (closest to the optical axis) to the edge of an aperture stop, whereas the chief ray height hC is the height of a chief ray running from an outermost field point (farthest away from the optical axis) parallel to or at small angle with respect to the optical axis and intersecting the optical axis at a pupil surface position where an aperture stop may be positioned. With other words: all concave mirrors are in positions where the chief ray height exceeds the marginal ray height.
A position “optically remote” from a pupil surface is a position where the cross sectional shape of the light beam deviates significantly from the circular shape found in a pupil surface or in an immediate vicinity thereto. The term “light beam” as used here describes the bundle of all rays running from the object plane to the image plane. Mirror positions optically remote from a pupil surface may be defined as positions where the beam diameters of the light beam in mutually perpendicular directions orthogonal to the propagation direction of the light beam deviate by more than 50% or 100% from each other. In other words, illuminated areas on the concave mirrors may have a shape having a form strongly deviating from a circle and similar to a high aspect ratio rectangle corresponding to a preferred field shape in lithographic projection objectives for wafer scanners. Therefore, small concave mirrors having a compact rectangular or near rectangular shape significantly smaller in one direction than in the other may be used. A high aperture light beam can therefore be guided through the system without vignetting at mirror edges.
Wherever the terms “upstream” or “downstream” are used in this specification these terms refer to relative positions along the optical path of a light beam running from the object plane to the image plane of the projection objective. Therefore, a position upstream of the second intermediate image is a position optically between the object plane and the second intermediate image.
According to another aspect of the invention there is provided a catadioptric projection objective for imaging a pattern provided in an objective plane of the projection objective onto an image plane of the projection objective comprising:
a first objective part for imaging the pattern provided in the object plane into a first intermediate image;
a second objective part for imaging the first intermediate image into a second intermediate image;
a third objective part for imaging the second intermediate image onto the image plane;
wherein the second objective part includes a first concave mirror having a first continuous mirror surface and a second concave mirror having a second continuous mirror surface, the concave mirror surfaces of the concave mirrors facing each other and defining an intermirror space;

wherein at least the first intermediate image is located geometrically within the intermirror space between the first concave mirror and the second concave mirror.

In this specification the term “intermediate image” generally refers to a “paraxial intermediate image” formed by a perfect optical system and located in a plane optically conjugated to the object plane. Therefore, wherever reference is made to a location or position of an intermediate image, the axial location of this plane optically conjugated to the object plane is meant.
The above aspect of invention may be understood more clearly based on the following general considerations.
As Jan Hoogland has pointed out in some publications, the most difficult requirement that you can ask of any optical design is that it have a flat image, especially if it is an all-refractive design. Providing a flat image requires opposing lens powers and that leads to stronger lenses, more system length, larger system glass mass, and larger higher-order image aberrations that result from the stronger lens curves.
By contrast to this, allowing a system to have a curved image automatically leads to low lens powers, weaker curves, a more compact design with much less glass mass, and much smaller higher-order image aberrations.
Shafer has shown a lens design with a curved image that only uses positive lenses (and no aspherics) and has very good performance. A group of 4 or 5 weak positive lenses in front can provide correction of spherical aberration and coma, and a thick positive immersion lens can provide astigmatism correction. The image is quite curved.
However, a flat image is essential for lithography. Therefore the question then becomes how to provide this with the least disturbance of the good properties that result when a curved image is allowed.
Some classical lens types like the Cooke Triplet and the Double-Gauss designs achieve a flat image by putting strong negative power in the middle of the design. But that completely destroys all the benefits that were just listed of having a curved image, and the lens powers have to be strong and the curves lead to bad higher-order aberrations.
A much better solution is provided by the classical field-flattened Petzval lens design, where a strong negative lens is placed just in front of the image, the closer the better. This negative lens, at the very end of the design, then provides all the image flattening means of the design and the rest of the design has weak curves, low lens powers, small glass volume, etc. In addition, the aberration correaction performance is extremely high. That is why this design form was used for the extremely high resolution aerial reconnaissance lenses of the 1960's.
However, this great design cannot be used in lithography since putting a strong negative lens right before the image leads to an exit pupil location that is very far from telecentric. And a telecentric exit pupil is always required in lithography.
Possibly the only way a field-flattened Petzval lens can be given a telecentric exit pupil is to move the aperture stop very far out in front of the design, far away from where it wants to be for good higher-order aberration correction. By contrast some other design types, like the Double-Gauss, can be modified to have a telecentric exit pupil without too much change in the aperture stop position, compared to its preferred location. So because of this telecentric exit pupil requirement in lithography, one is forced to abandon the best design form and move to less desirable ones.
The invention considers these aspects and provides a good compromise solution.
One can keep all the many benefits of a curved image design if one can find some way to flatten the image, have a telecentric exit pupil, and yet keep the aperture stop close to where it most wants to be for good aberration correction.
What would be perfect is if a positive power lens could be given the opposite Petzval curvature to what it actually has. Such a “magic lens”, if it could exist, could then be placed right near the curved image of a curved image design. It would then flatten the image and would even help give a telecentric exit pupil while leaving the design's aperture stop where it wants to be.
A concave mirror is ideal for the problem. A concave mirror has positive power, like a positive lens, but the opposite sign of Petzval curvature. So a concave mirror placed right in front of the image could flatten the image of a curved image lens design, have positive power to help in providing a telecentric pupil, and have no color problems.
Unfortunately it also makes the resulting image be completely inaccessible, since it sends the light right back in the direction it came from. One solution might be to use the lens system far off-axis, and then it might be possible to have one or two reflections right near the image and have the final image “walk-off” the mirrors and lie clear outside of the incoming rays. But even a moment of study will show that this is impractical on the high-NA end of the design, or would lead to the main lens system (i.e. the image side focussing lens system) being used so far off-axis that it would have very poor performance.
The situation is much better on the other end of a lithographic design, with about 4× magnification, for example. Then the main refractive design does not have to be used off-axis as much before the low-NA image can be made to “walk-off” a mirror pair. By using two concave mirrors instead of one, the light keeps going in the same direction and the image is accessible. The best performance results occur when the main lens system is used with the least amount of off-axis use. But having the rays get through the concave mirror pair with no vignetting is helped by using the main lens system far off-axis. These are then incompatible goals.
In order to minimize vignetting problems and to make them insensitive on the system overall numerical aperture it is favorable to have intermediate images with low NA next to all positions where two ray bundles before and after a reflection lie geometrically separated, but next to each other. The clearance is then mainly determined by the field size and scales only very poorly with numerical aperture. This is important to reach real high NA catadioptric designs.
The best solution is to not have the two mirrors be between the main lens system and its low-N.A object end. That then avoids a large amount of off-axis use of the main lens in order to have no vignetting at the mirrors. The mirrors should be physically (not necessarily optically) on either side of the low-NA object. Then the main lens system can be used much closer to the optical axis. A less preferable solution is to have both mirrors be outside of the main system and its low NA end object. In either case, of the last two mentioned, there is a need to reimage the low NA object, since it is no longer the end of the complete system.
While reimaging the object to a first real intermediate image, the system magnification of this first relay system may be designed such that it is an enlarging system. This reduces more and more the NA at the intermediate image and thus relaxes the vignetting problem. The vignetting depends less and less on the system NA.
In a preferred design, there are two concave mirrors on either side (again, physically, not optically) of the low-NA object plane of the main lens system and the system is used as close to the axis as possible without mirror vignetting. Then either another refractive system or a catadioptric system, working e.g. at about 1× or 1.5× enlargement, is used to relay this buried object to another real image location.
Another solution, with both mirrors physically and optically outside of the low-NA object, gives the possibility of just these same two mirrors doing the re-imaging. But the requirement of a fairly large working distance and thick mirror substrates makes this not practical without vignetting problems that require using the main system far off-axis. So this other solution also benefits from using a separate 1× or 1.5× enlarging refractive or catadioptric relay system.
In all of these cases, a pair of concave mirrors is used to flatten the image of one or two refractive systems. No convex mirrors are used. The refractive systems can then have the benefits described of being curved image designs.
Designs according to preferred embodiments of the invention with just two reflecting surfaces, both concave, have several advantages compared with the prior art.
In contrast to prior art systems with central pupil obscuration designs according to some embodiments of the invention have small mirror sizes, no obscuration at all, no double or triple-pass lenses, and very effective field flattening of the system due to the strong mirror powers. In other embodiments, double- or triple-pass lenses may be present.
Embodiments according to the invention, which preferably have two refractive relay groups, may have about 3× or 4× reduction magnification from the refractive group near the wafer, i.e from the third objective part, (so only high N.A on one end) and the other refractive group (the first objective part) is low NA on both ends. As a result there is much less lens power needed and relatively few elements are needed to get the desired aberration correction.
Some prior art systems have been found to be limited NA systems. By contrast, preferred design according to the invention have no such difficulties and can handle very high NA values close to NA=1 or above, for immersion systems. Preferably, the two intermediate images both have low NA values and there is no problem with the mirrors interfering with each other's space at their rims.
It is to be noted that it is difficult to correct some useful designs according to the present invention for axial colour. However the lenses in preferred embodiments are small enough, and their powers weak enough, so that the axial color of the new design is at an acceptable value.
Other prior art high NA catadioptric systems for lithography, either require at least one convex mirror in the design, or have multiple mirrors and tend to give very long track length designs. The use of a convex mirror, in combination with a concave mirror and some lenses, can be the basis of a catadioptric design and can make it possible to have an unobscured design that does not have to be used too far off-axis to avoid vignetting. This is a characteristic of some prior patent designs which are in-line systems with no flat fold mirrors. The catadioptric part is on the reticle end of the system. There are at least two problems with such designs. One is that the first intermediate image after the reticle has to be clear of the concave mirror, and the light rays leaving the convex mirror tend to have relatively steep angles with respect to the optical axis in order to clear the edge of the concave mirror without vignetting. Some field lenses or field mirrors are then required to catch these rays and bend them back towards the optical axis and the main focusing lens group. These field lens or mirrors have to be quite large and strong in power to catch the rays and reimage the pupil towards the main focusing lens group. If they are field lenses, then they are large in diameter, have strong positive power, and result in an excess of glass volume in the design. In addition they have a lot of positive power and make further difficulties in correcting the Petzval curvature of the system. If, instead, field mirrors are used then they have to be quite large in diameter and it is difficult to configure them to avoid vignetting of the rays. They do, however, help with Petzval correction since they have the opposite sign from field lenses. The second problem with these kinds of system is that the convex mirror in the system has the wrong sign of Petzval curvature to help with image flattening. This then tends to lead to 4 or 6 mirror systems in order to find a way with several mirrors to provide the system with enough good Petzval correction from mostly concave mirrors so that this burden does not fall entirely on the main focusing lens group.
Preferred embodiments of the invention, by contrast, do not have any convex mirror and have some characteristics that allow it to work quite close to the optical axis without obscuration or vignetting. This then means that the intermediate image size is not so large and the field lenses in the design do not have to be too large. Since there is no convex mirror, but just two concave mirrors, the new design is quite simple compared to the multi-mirror systems of the prior art. Its two concave mirrors may provide just the right amount of Petzval correction for the lenses in the system, which may be almost all positive, and the resulting design has a relatively short track length, small size elements, small glass volume, very good aberration correction, and the capability of working with very high immersion NA values.
There are other particularly useful features specific to the new design according to the invention. As the NA value of the design is increased, it makes almost no difference to the sizes of the mirrors, or how close the design can work to the optical axis. All other in-line designs from the prior art have to keep working further and further off-axis, as the NA is increased, in order to avoid vignetting and obscuration. That leads to worse high-order aberrations, a drop in performance, and larger element sizes in the catadioptric part. The new design is quite unusual in not having that problem.
An alternative to embodiments having one common straight optical axis is provided by catadioptric designs which have at least one flat fold mirror. Then part of the optical path is folded, e.g. at 90 degrees to the optical axis, and then brought back and refolded back again so that the reticle and wafer are parallel. The input and output axis (i.e. object and image side part of the optical axis) may be co-axial, in some embodiments, or have a lateral off-set in some other embodiments.
Such designs can have just one powered mirror in the system, which is a concave mirror, and two flat fold mirrors. Some, designs, like the design disclosed in U.S. provisional application with Ser. No. 60/511,673 filed on Oct. 17, 2003 by the applicant, have two concave mirrors and two flat fold mirrors. These folded designs can have many of the good properties of the new design according to the invention that is being discussed here. However, there may occur polarization problems with these fold mirrors and that makes the preferred embodiments, with no fold mirrors, very attractive.
In some embodiments there is at least one lens having a free entry surface and a free exit surface arranged within the intermirror space, wherein the lens is transited at least twice in the optical path between an intermediate image and a concave mirror or vice versa. Such mirror-related lens may have negative refractive power and may be designed as a meniscus lens having a sense of curvature similar to the concave mirror to which it is assigned. Color correction can be positively influenced this way. The lens may be designed as a truncated lens being arranged exclusively on the side of the optical axis where the associated concave mirror is situated. If a mirror-related lens is extended across the optical axis, the lens may be transited three times by the radiation, thus increasing optical effect without significantly increasing lens mass. One or both concave mirrors may have mirror-related lenses.
In some embodiments the first concave mirror and the second concave mirror are designed to have essentially the same or exactly the same curvature. This allows to manufacture the concave mirrors simultaneously from the same blank material such that firstly a mirror blank for the first and second concave mirror is manufactured and that, afterwards, the mirror blank is separated into two truncated mirrors used as the first and second concave mirror. Manufacturing can be facilitated and more cost effective this way. Likewise, lens material used for two similar truncated mirror-related lenses can be manufactured from one lens blank, which is shaped first and than separated into two truncated lenses. Systems having catadioptric subgroups which are designed identically or almost identically and which can be arranged symmetrically with respect to each other can be provided this way at reasonable costs for manufacturing.
In some embodiments at least one mirror surface of a concave mirror is aspheric. In some embodiments, concave surfaces of both concave mirrors are aspheric. Aspheric concave mirrors facilitate optical correction and allow to reduce lens mass.
In some embodiments it has been found useful to have at least one lens arranged between an intermediate image and the associated concave mirror, wherein at least one surface of the lens is aspheric. The aspheric surface may be the surface facing the intermediate image. Field aberrations can be corrected effectively this way.
In some embodiments both concave mirrors have spherical mirror surfaces, thus facilitating manufacturing and improving optical performance. It has been found useful if the following condition is fulfilled: 1<D/(|c1|+|c2|)·10−4<6. Here, D is a maximum diameter of a lens element of the third objective part in [mm] and c1 and c2 are the curvatures of the concave mirrors in [mm−1]. If this condition is fulfilled, then there is an optimum balance between the positive power in the third imaging system and the Petzval correction due to the concave mirrors in the projection objective. This condition applies for both spherical and aspherical concave mirrors.
As the basic shape and, if applicable, the aspheric character of a concave mirror strongly influences optical performance, ways of manufacturing of concave mirrors are desired in order to produce high quality mirrors having defined optical properties. It has been found that relatively “flat” concave mirrors, i.e. concave mirrors having a relatively shallow depth on the concave side, can be manufactured with particularly high optical quality if the relation pmax<0.22R holds where pmax=R−(R2−D2/4)0.5. In this relation, R is the curvature radius of the aspherical mirror surface and D is the diameter of the aspherical mirror. Preferably, the condition D≦1.3R or, more preferably, the condition D≦1.2R is fulfilled. Parameter p denotes the “sagitta” or “rising height” of a point on an optical surface. This parameter is sometimes also denoted SAG (for sagitta) in the literature. Sagitta p is a function of the height h, i.e. the radial distance from the optical axis, of the respective point.
Generally it may be preferred from a manufacturing point of view to make the curvatures of the concave mirrors at the vertex of the mirror surface (vertex curvature) as similar as possible. If the vertex curvature radii of the first and second mirrors are denoted R1 and R2, preferably the following condition holds: 0.8<|R1/R2|<1.2.
Some embodiments are designed such that the first intermediate image is located geometrically within the intermirror space whereas the second intermediate image is arranged outside the mirror space. The first and second objective parts can then be catadioptric objective parts, wherein the first concave mirror is part of the first objective part creating the first intermediate image, whereas the second concave mirror contributes to forming the second intermediate image from the first intermediate image by the second objective part.
A mirror group defined by the first and second concave mirrors facing each other can have a mirror group entry and a mirror group exit, each positioned next to the closest concave mirror closed to an edge of a concave mirror faced in the optical axis. Pupil surfaces of the projection objective can be arranged in the vicinity of the mirror group entry and the mirror group exit such that the mirror group performance a pupil imaging between the mirror group entry and the mirror group exit. The first and second concave mirror can then be disposed on one side of the optical axis. In other embodiments where field surfaces are in the vicinity of the mirror group entry and mirror group exit, the first and second concave mirror may be positioned at opposite sides of the optical axis.
According to another aspect of the invention a projection objective is provided having a first and at least one second concave mirror, wherein the first concave mirror has a first aspheric mirror surface and the second concave mirror has a second aspheric mirror surface, and wherein the first and second mirror surfaces have essentially the same aspheric shape. The aspheric shapes may be identical, i.e. may be described by identical aspheric constants and basic spherical radius. This aspect of the invention may be utilized in embodiments where all concave mirrors are arranged optically remote from the pupil surface, particularly where exactly two concave mirrors are used. However, the advantages may also be used in projection objectives where one or more concave mirrors are positioned in a pupil surface or optically near a pupil surface. If the first and second mirror surface have essentially the same or identical aspheric shape, manufacturing can be simplified since the aspheric shapes can be manufactured using essentially the same grinding and polishing steps or other steps for removing material from a spheric basic shape. Further, the testing process utilized during manufacturing of the aspheric surfaces can be organized cost-efficient since the same testing device for characterizing the aspheric shape can be used for testing more than one concave mirror surface. In that sense, the term “essentially the same aspheric shape” is to be understood to encompass aspheric surface shapes, which can be tested by the same optical testing device. If applicable, the surface shapes may be similar in that sense that the same optical testing device can be used, but with different working distance.
In one embodiment, the second objective part has two concave mirrors, each having an aspheric surface, wherein the first and second mirror surfaces have essentially the same aspheric shape. In one embodiment, the second objective part of this type is a catoptric objective part, i.e. consisting of only two concave mirrors having aspheric mirror surfaces which have essentially the same aspheric shape. Catadioptric second objective parts of this type are also possible.
According to another aspect, the invention provides a catadioptric projection objective having at least one concave mirror, where the mirror surface of the concave mirror has a parabolic shape. In an embodiment, two concave mirrors are provided, wherein at least one of the concave mirrors has a parabolic shape. Utilizing a parabolic mirror (i.e. a concave mirror where a meridian of the mirror is parabolic) has proven advantageous particularly with regard to testing the aspheric surface shape of the mirror. A parabolic mirror collects parallel incident light into one single focus, whereby parallel light rays impinging on the parabolic mirror surface are collected free of spherical aberration in one focal point. Parabolic mirrors of this type can easily be tested optically using comparatively simple optical testing devices designed for creating a test beam having a planar wave front. Optical testing devices with simple construction can be used, thereby making the testing of the aspheric mirror cost-effective.
Whereas optical properties are essential for obtaining the desired function of a projection objective, other factors related to the costs involved for manufacturing the optical system and/or factors influencing the overall size and shape of the optical system may be critical. Also, aspects of lens mounting and incorporation of lens manipulators must be considered. One class of embodiments is particularly advantageous in this respect in that projection objectives having a small number of lens elements, particularly in the first objective part, are provided. In one embodiment, the first objective part has positive lenses only. The term “lens” as used here is meant to designate optical elements having substantive refractive power. In that respect, a plate having essentially parallel plate surfaces is not a lens and may, therefore, be inserted in addition to the positive lenses. Using positive lenses only is enabling for providing axially compact first objective parts having relatively small maximum lens diameter. In one embodiment, the first objective part has only six lenses having substantial refractive power. One or more aspheric surfaces may be provided in the first objective part. By using suitable aspheric shapes of aspheric lens surfaces a compact design can be obtained. As a tendency, the first objective part can be designed more compact the more aspheric surfaces are used. In preferred embodiments a ratio between a number of lens element and a number of aspheric surfaces is less than 1.6. In one embodiment, a first lens element of the first objective part immediately following the object plane has an aspheric surface facing the object plane, wherein the aspheric surface is essentially flat having a local radius R of curvature where R>300 mm at each point of the aspheric surface. Object side telecentricity and an effective correction of field aberration, such as distortion, can be obtained this way.
A compact shape of a dioptric system can also be facilitated if all negative lenses (i.e. lenses with substantial negative refractive power) are arranged optically remote from a pupil plane. With other words, negative lenses optically near a pupil plane should be avoided if a design is to be optimized in respect to a compact shape.
Aspheric surfaces provided on optical elements, such as lenses, mirrors and/or essentially planar faces of plates, prisms or the like can be utilized to improve both the correction status and the overall size and material consumption of an optical system. Optimum surface shapes of aspheric surfaces may be derived from theoretical considerations and/or numerical calculations. However, whether or not an optical system can be manufactured depends among other factors on the question whether or not an aspherical surface can actually be manufactured in the desired shape with the necessary optical quality. Feasibility studies of the inventors have shown some essential rules governing the use of aspheric surfaces in optical systems, particularly in high-resolution projection objectives suitable for microlithography.
According to one embodiment, the projection objective has at least one optical element having an aspherical surface with a surface shape free of inflection points in an optically used area of the aspheric surface. In a rotationally symmetric aspheric surface an “inflection point” is characterized as a point along a meridional direction where a sign change occurs in the local curvature of the aspherical surface. With other words, an inflection point is found geometrically between a locally convex surface region and a locally concave surface region of an aspheric surface. When a plurality of optical elements having at least one aspherical surface is provided, it is preferred that all aspheric surfaces have surface shapes which are free of inflection points. As a compromise, it may be useful to design a system such that at least 50% or 60% or 70% or 80% or 90% of the aspheric surfaces are free of inflection points. Avoiding inflection points on an aspheric surface has proven to improve the optical quality of the finished aspheric surface when compared to aspherical surfaces including inflection points. It is contemplated that the material removing effects of surface preparation tools can be made more uniform if inflection points are avoided. On the other hand, if a polishing tool is acting on a surface area including an inflection point, the material removing action of the tool on either side of the inflection point may differ considerably, thus leading to irregularities in the optical quality of the finished surface.
According to another aspect of the invention the projection objective includes a plurality of optical elements having at least one aspheric surface, wherein all aspheric surfaces have a surface shape free of extremal points outside the optical axis, wherein an extremal point is defined by the following equations:




  
    
      d
      p
    
    
      d
      h
    
  
  =
  
    
      0
      ⁢
      
        
      
      ⁢
      and
      ⁢
      
        
      
      ⁢
      
        
          
            d
            2
          
          ⁢
          p
        
        
          d
          
            h
            2
          
        
      
    
    ≠
    0.
  




In this equation, the parameter “p” represents a distance, measured parallel to the optical axis of an optical element, of a point at height h from the vertex of the surface (positioned on the optical axis) as explained in connection with the equation describing the mathematical description of the aspherical surfaces given above. The parameter p(h) is also denoted as “sagitta” or “rising height” of a point on an optical surface. Based on these considerations, an “extremal point” is a maximum or a minimum of the function p(h), respectively. Studies of the inventors have revealed that extremal points outside the optical axis (where h=0) may be critical during manufacturing of the aspherical surfaces since, in the region of extremal points, the material removing action of tools used for finishing may differ significantly from the action imposed on areas surrounding the extremal point, whereby non-uniform optical surface quality may result.
This condition should be obeyed in an area including the optically utilized area (defined by the optically used radius hopt) but going beyond that area up to a maximum height hmax>hopt, where hmax=hopt+OR and where OR is the radial width of an “overrun area” adjacent to the optically utilized area, where a rotary tool will be in contact with the optical surface when the periphery of the optically used area is polished. Typical widths of the overrun area are dependent on the tool dimensions and may be in the order of 5 mm to 15 mm.
Whereas extremal points on aspheric surfaces may be critical from a manufacturing point of view, extremal points may be desirable from an optical point of view to provide a desired change of refractive power of an aspheric surface in radial (meridonal) direction. As a compromise, it has been found advantageous that aspheric surfaces having at least one extremal point should be essentially flat cross the entire usable diameter. With other words, the basic shape of the aspherical surface having at least one extremal point should be a plane or should have only small deviations from a plane. In that respect, projection objectives are preferred with at least one aspheric surface having at least one extremal point, where the following condition holds for these aspheric surfaces:

|p(h)|pmax,

where pmax=0.5. More preferably, pmax=0.25.

The preferred conditions for aspheric surfaces given above have been derived from feasibility studies performed on certain embodiments of this invention. However, the conditions may also be utilized on other types of optical systems having optical elements with aspheric surfaces. Therefore, these aspects of the invention are useful independent of other features of preferable embodiments of the invention.
According to another aspect of the invention the first objective part includes a concave mirror and at least one additional mirror having a curved mirror surface, where curved mirror surfaces of the concave mirror and the additional mirror are facing each other. In this embodiment two mirrors having curved mirror surfaces contribute to the formation of the first intermediate image. Preferably, first objective parts of this type are catadioptric, i.e. at least one lens is provided in addition to the concave mirror and the additional mirror. The concave mirror and the additional mirror preferably share a common straight optical axis coinciding with the optical axes of the second and third objective part such that all objective parts share a common straight optical axis. Preferably first objective parts of this type are designed as enlarging imaging system. In some embodiments the additional mirror is a convex mirror having a convex mirror surface compensating as at least partially the effect of the concave mirror of that objective part. Preferably, first objective parts of this type are combined with a second objective part including a first and a second concave mirror, the concave mirror surfaces of which are facing each other and define an intermirror space. Whereas typically the first intermediate image may be positioned outside that intermirror space in these embodiments, the second intermediate image may be positioned inside the intermirror space. Embodiments having at least three concave mirrors, preferably exactly three concave mirrors, distributed in two objective parts (first objective part and second objective part) may be designed such that all concave mirrors are arranged optically remote from a pupil surface. However, if desired, it is also possible that at least one concave mirror, particularly the concave mirror positioned in the first objective part, is positioned optically near a pupil surface.
In embodiments of this type the correction capabilities provided by concave mirrors can be advantageously distributed between two objective parts separated by an intermediate image, whereby a good balance and compensation between the correcting actions can be obtained. It is also possible to design the first and second objective part such that certain correction effects supported by concave mirrors are present twice in the optical path. The correcting means may, however, be arranged in optical positions where they have different optical effects since the heights of principal ray (chief ray) and marginal ray may be different for different concave mirrors in different objective parts. All advantages provided by in-line-arrangement of the optical elements (one common straight optical axis) can be preserved.
The previous and other properties can be seen not only in the claims but also in the description and the drawings, wherein individual characteristics may be used either alone or in sub-combinations as an embodiment of the invention and in other areas and may individually represent advantageous and patentable embodiments.



BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a longitudinally sectioned view of a first embodiment of a projection objective according to the invention;
FIG. 2 is a representation of an inner off-axis beam passing through the system of FIG. 1,
FIG. 3 is a representation of an outer off-axis beam passing through the system of FIG. 1;
FIG. 4 is a longitudinally sectioned view of a second embodiment of a projection objective according to the invention;
FIG. 5, 6 are schematic diagrams showing footprints of beams on the concave mirrors of the embodiment shown in FIG. 4;
FIGS. 7, 8 and 9 show variants of the embodiment of FIG. 4 having different NA values and different positions of the aperture stop;
FIG. 10, 11 show a schematic representation and a lens section, respectively, of a third embodiment of a projection objective according to the invention;
FIG. 12, 13 show a schematic representation and a lens section, respectively, of a fourth embodiment of a projection objective according to the invention;
FIG. 14 shows a perspective view of the catadioptric objective part of the third embodiment to demonstrate the mirror geometry;
FIG. 15 shows a schematic representation of another embodiment having double-passed lenses between concave mirrors and an oblique field (FIG. 15a);
FIG. 16 shows a lens section through an embodiment constructed according to FIG. 15;
FIG. 17 shows a lens section of another embodiment constructed according to the principles shown in FIG. 15;
FIG. 18 shows a schematic representation of an embodiment having triple-passed lenses between the concave mirrors;
FIG. 19 shows a lens section of an embodiment constructed according to the principles shown in FIG. 18;
FIG. 20 shows a lens section through an embodiment having a mirror-related lens close to one of the concave mirrors;
FIG. 21 shows a lens section through another embodiment of a projection objective according to the invention;
FIG. 22 shows a lens section of another embodiment of a projection objective according to the invention having similar, shallow concave mirrors;
FIG. 23 shows a lens section of another embodiment of a projection objective according to the invention having similar, shallow concave mirrors;
FIG. 24 shows a diagram for defining the plunging depth of a concave mirror;
FIG. 25 shows a lens section of another embodiment of a projection objective according to the invention having only one intermediate image in the intermirror space and pupil planes close to the entrance and exit of the mirror group;
FIG. 26 shows an enlarged view of a section of the embodiment shown in FIG. 25 between the object plane and the first intermediate image;
FIG. 27 shows a lens section of an embodiment of the invention, where a catoptric second objective part has two concave mirrors having exactly the same aspheric shape;
FIG. 28 show a lens section of an embodiment having a catoptric second objective part, where the first concave mirror is designed as a parabolic mirror;
FIG. 29 is a schematic diagram showing a testing device for optically testing a parabolic mirror;
FIGS. 30-32 show embodiments of projection objectives having a compact first objective part having positive lenses only and different numbers of aspheric surfaces;
FIG. 33 shows schematic diagrams of a conventional aspheric surface having an inflection point;
FIG. 34 shows a lens section of an embodiment where all aspheric surfaces are free of inflection points;
FIG. 35 is a schematic diagram showing aspheric surfaces having extremal points;
FIG. 36 shows a lens section of an embodiment of a projection objective where problems due to the existence of extremal points are avoided;
FIG. 37 shows a lens section of another embodiment having a small number of aspheric surfaces;
FIG. 38 shows a lens section of another embodiment having a small number of aspheric surfaces;
FIG. 39 shows a lens section of an embodiment having a catadioptric first objective part including two curved mirrors and a catadioptric second objective part having two concave mirrors; and
FIG. 40 shows a lens section of another embodiment having a first objective part with two curved mirrors and a catadioptric second objective part having two concave mirrors.



DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
In the following description of preferred embodiments of the invention, the term “optical axis” shall refer to a straight line or sequence of straight-line segments passing through the centers of curvature of the optical elements involved. The optical axis is folded by folding mirrors (deflecting mirrors) or other reflective surfaces. In the case of those examples presented here, the object involved is either a mask (reticle) bearing the pattern of an integrated circuit or some other pattern, for example, a grating pattern. In the examples presented here, the image of the object is projected onto a wafer serving as a substrate that is coated with a layer of photoresist, although other types of substrate, such as components of liquid-crystal displays or substrates for optical gratings, are also feasible.
Where tables are provided to disclose the specification of a design shown in a figure, the table or tables are designated by the same numbers as the respective figures.
FIG. 1 shows a first embodiment of a catadioptric projection lens 100 according to the invention designed for ca. 193 nm UV working wavelength. It is designed to project an image of a pattern on a reticle arranged in the object plane 101 into the image plane 102 on a reduced scale, for example, 4:1, while creating exactly two real intermediate images 103, 104. A first refractive objective part 110 is designed for imaging the pattern in the object plane into the first intermediate image 103 at an enlarged scale, a second, catadioptric objective part 120 images the first intermediate image 103 into the second intermediate image 104 at a magnification close to 1:1, and a third, refractive objective part 130 images the second intermediate image 104 onto the image plane 102 with a strong reduction ratio. The second objective part 120 comprises a first concave mirror 121 having the concave mirror surface facing the object side, and a second concave mirror 122 having the concave mirror surface facing the image side. The mirror surfaces are both continuous or unbroken, i.e. they do not have a hole or bore. The mirror surfaces facing each other define a catadioptric cavity 125, which is also denoted intermirror space 125, enclosed by the curved surfaces defined by the concave mirrors. The intermediate images 103, 104 are both situated inside the catadioptric cavity 125, at least the paraxial intermediate images being almost in the middle thereof well apart from the mirror surfaces.
Each mirror surface of a concave mirror defines a “curvature surface” or “surface of curvature” which is a mathematical surface extending beyond the edges of the physical mirror surface and containing the mirror surface. The first and second concave mirrors are parts of rotationally symmetric curvature surfaces having a common axis of rotational symmetry.
For improved clarity of the beam path through the optical system, FIGS. 2 and 3 show two distinguished beam bundles originating from the off-axis object field. The beam bundle in FIG. 2 originates from an object point closest to the optical axis, whereas in FIG. 3 the beam bundle originates from an object point farthest away from the optical axis. The situation of the intermediate images almost in the middle between the concave mirrors can be clearly seen in this representation. In FIG. 2, the shown positions of the intersections of the crossing light beams between the mirrors are close to the positions of the paraxial intermediate images. In contrast, in FIG. 3 the shown positions or zones of the intersections of the crossing light beams between the mirrors are further offset from the positions of the paraxial intermediate images.
The system 100 is rotational symmetric and has one straight optical axis 105 common to all refractive and reflective optical components. There are no folding mirrors. The concave mirrors have small diameters allowing to bring them close together and rather close to the intermediate images lying in between. The concave mirrors are both constructed and illuminated as off-axis sections of axial symmetric surfaces. The light beam passes by the edges of the concave mirrors facing the optical axis without vignetting (compare e.g. FIG. 4 or FIGS. 7-9).
A maximum light beam height at the concave mirrors is almost the same as the maximum light beam height within the third objective part. Preferably, the maximum light beam height at the concave mirrors is less than the 1.5 fold or less than the 1.2 fold of the maximum light beam height within the third objective part. This allows constructions wherein all light beams within the projection objective are located within a space defined as a cylinder around the optical axis of said third objective part, extending from the object plane to the image plane and having a maximum radius of the 1.5 fold, preferably the 1.2 fold, of a maximum beam height within said third objective part.
The system has good lateral color correction, whereas axial color is not entirely corrected. In this embodiment, both concave mirrors are designed as Mangin mirrors. Each Mangin mirror consists of a negative meniscus lens with a mirrored convex surface. The undercorrected spherical aberration of the mirror is offset by the overcorrected spherical aberration of the negative lens. Both concave mirrors have very little refractive power. The concave mirrors may also be designed as simple mirrors (compare FIG. 4). If they are simple mirrors (without meniscus lens), then the mass of transparent optical material is less but it may be necessary to cut the mirrors.
The projection objective is designed as an immersion lens. The correction status is about 9 milliwaves at 1.1 NA over a 26·5.0 mm2 field. The field radius is 65 mm. No aspheric surfaces having a departure from a best fitting sphere (deformation) larger than 1.0 mm are necessary. A maximum diameter of 220 mm for the largest elements shows the potential for a low lens mass consumption. The design has 1160 mm track length (axial distance between object plane and image plane) and small glass mass. The last lens next to the image plane is made of calcium fluoride, for immersion.
This new design has very good lateral colour correction but none for axial colour. But the small lens sizes give it less axial colour than an all-refractive design of the same NA. The pupil aberration is well corrected and the chief rays are almost exactly telecentric on both ends.
The design with only two reflections and the small glass volume has no problem with obscuration, so the mirrors can be a good size—not so large—and their strong power provides almost all the Petzval correction of the system. In the embodiment the two intermediate images are almost exactly in the middle of the catadioptric cavity.
A modification not shown here has a first refractive objective part and a third refractive objective part quite similar to those disclosed in U.S. provisional application with Ser. No. 60/511,673 filed on Oct. 17, 2003 by the applicant. The corresponding specification is incorporated by reference.
This basic design has potential to get by on even smaller amounts of optical material volume, especially if the Mangin mirrors have their glass removed. (Compare FIG. 4).
In FIG. 4 a second embodiment is shown. Features or feature groups identical or similar in structure and/or function to those in FIG. 1 are denoted by similar numerals increased by 100.
The projection objective 200 is designed as an immersion lens for λ=193 nm having an image side numerical aperture NA=1.20 when used in conjunction with a high index immersion fluid, e.g. pure water, between the exit face of the objective and the image plane. The field size is 26·5.0 mm2. The specifications for this design are summarized in Table 4. The leftmost column lists the number of the refractive, reflective, or otherwise designated surface, the second column lists the radius, r, of that surface [mm], the third column lists the distance, d [mm], between that surface and the next surface, a parameter that is referred to as the “thickness” of the optical element, the fourth column lists the material employed for fabricating that optical element, and the fifth column lists the refractive index of the material employed for its fabrication. The sixth column lists the optically utilizable, clear, semi diameter [mm] of the optical component. A radius r=0 in a table designates a planar surface (having infinite radius).
In the case of this particular embodiment, twelve surfaces, namely surfaces 2, 3, 8, 12, 15, 16, 17, 19, 22, 30, 33 and 35 in table 4, are aspherical surfaces. Table 4A lists the associated data for those aspherical surfaces, from which the sagitta or rising height p(h) of their surface figures as a function of the height h may be computed employing the following equation:

p(h)=[((1/r)h2)/(1+SQRT(1−(1+K)(1/r)2h2))]+C1·h4+C2·h6+ . . . ,

where the reciprocal value (1/r) of the radius is the curvature of the surface in question at the surface vertex and h is the distance of a point thereon from the optical axis. The sagitta or rising height p(h) thus represents the distance of that point from the vertex of the surface in question, measured along the z-direction, i.e., along the optical axis. The constants K, C1, C2, etc., are listed in Table 4A.

Since the objective has 17 lenses, more than 50% or more than 60% of the lenses are aspheric lenses.
Like the embodiment of FIG. 1, there are no folding mirrors leaving a straight, unfolded optical axis common to all optical components. In contrast to the first embodiment, the two concave mirrors 221, 222 facing each other are simple mirrors instead of Mangin-mirrors, which allows to reduce the overall mass of the system. In order to demonstrate the path of the light transiting the catoptric (purely reflective) group 220, FIGS. 5 and 6 show the “footprints” of the beams on the concave mirrors. In FIG. 5, footprints at the position of the first concave mirror 221 are shown. The lower group of elliptic lines represent beams reflected at the first concave mirror 221, and the upper group of elliptic lines represent the beams coming from the second concave mirror 222 towards the second refractive part 230. In FIG. 6, the footprints at the position of the second concave mirror 222 are shown. The lower part represents beams running from the first refractive part 210 to the first concave mirror 221, whereas the upper elliptic lines represent the beams reflected at the second concave mirror 222 and running to the image plane. It can be seen that the used areas on the mirrors have simple contiguous shapes such that the mirrors may be fabricated, for example, as a rectangular mirror, which is easy to mount.
It is a characterizing feature that the overall cross sectional beam shape at a concave mirror deviates significantly from a circular shape found at pupil positions. The beam diameters in mutually perpendicular directions have a ratio of about 1:3 in this embodiment, where the diameter in scan direction y is less than 50% or 30% of the diameter in a cross scan direction x. The beam shape resembles the rectangular field shape indicating that the concave mirror is closer to a field surface than to a pupil surface, i.e. the concave mirror is positioned optically remote from a pupil surface. Small, narrow mirrors can therefore be used as concave mirrors. This facilitates guiding the light flux past the concave mirrors at one side without vignetting even when the numerical aperture is high.
Generally, in embodiments according to the invention, the size of the concave mirrors is not directly coupled to the numerical aperture such that very high values of NA, e.g. NA>1.3 or NA>1.4 can be obtained without unduly increasing the mirror size.
In FIGS. 7 to 9 some beneficial variants of the second embodiment are shown. Features or feature groups identical or similar in structure and/or function to those in FIG. 4 are denoted by similar numerals. All variants are designed as immersion lens for λ=193 nm having an image side numerical aperture NA≧1 when used in conjunction with a high index immersion fluid, e.g. pure water, between the exit face of the objective and the image plane. The field size is 26 mm·5.0 mm. Specifications are given in Tables 7 and 7A for FIG. 7, and in tables 8 and 8A for FIG. 8 and for FIG. 9. The designs in FIGS. 8 and 9 are the same, the difference lies in the position of the aperture stop A.
The variant of FIG. 7 (NA=1.1) is characterized by the fact that the used areas on the concave mirrors are smaller than in the embodiment of FIG. 4. Consequently, the sizes of the rectangularly shaped concave mirrors may be further reduced.
The variant of FIG. 8 (NA=1.15) is characterized by the fact that the aperture stop A is positioned in the third, purely refractive part 230 in the region of maximum beam diameter. By contrast, in the closely related variant in FIG. 9 (NA=1.15) the aperture stop A is positioned in the first refractive objective part 210. This demonstrates that the designs allow flexibility as to where the aperture stop can be placed.
The embodiments described above are characterized by a straight, unfolded optical axis common to all optical elements. A potential problem of such designs may be that the mounts provided for the concave mirrors may lead to a long track length or may interfere with the beam path. In the following, embodiments comprising at least one planar folding mirror are shown as design alternatives to obtain compact designs.
In FIG. 10 a third embodiment is shown. Features or feature groups identical or similar in structure and/or function to those in FIG. 1 are denoted by similar numerals increased by 200. FIG. 11 represents a longitudinal sectional view of an embodiment designed on the basis depicted in FIG. 10.
The embodiment of a catadioptric projection objective 300 in FIG. 10 is similar to some of the above mentioned embodiments in that it comprises a first, refractive objective part 310 for creating a first intermediate image 303, a second, catoptric objective part 320 for creating a second intermediate image 304 from the first intermediate image, and a third, refractive objective part 330 for re-imaging the second intermediate image onto the image plane 302. The second objective part may include at least one lens such that it becomes a catadioptric objective part.
In contrast to the embodiments shown above, the second objective part 320 includes four reflective surfaces, namely two planar folding mirrors 306, 307 and two concave mirrors 321, 322 facing each other. The concave mirror surfaces of these mirrors define a catoptric cavity 325 inside which the folding mirrors and the intermediate images are located.
The first folding mirror 306 located immediately near the first intermediate image 303 is arranged for reflecting the radiation coming from the object plane onto the first concave mirror 321, which reflects the light directly, i.e. without intermediate image, to the second concave mirror 322. Light reflected from the second concave mirror strikes the second folding mirror 307 which reflects the light to the object plane, thereby creating the second intermediate image immediately near the second folding mirror. In this construction, the concave mirrors and the mounts of these mirrors are situated outside the central main part running between object plane and image plane. The concave mirrors have a common optical axis 305′ which may be exactly or almost perpendicular to the object side and image side parts 305′′ and 305′′′ of the optical axis, which are laterally offset in this embodiment. Inclination angles of the folding mirrors with respect to the optical axis may be 45° or may deviate significantly therefrom, e.g. by up to 5 or 10 degrees. Therefore, inclination angles between 70° and 110° may occur between the common optical axis of the concave mirrors and the object and image side part of the optical axis.
Whereas the intermediate images are geometrically situated between the concave mirrors, it is to be noted that no intermediate image lies optically between the concave mirrors. This configuration allows for small spot diameters on the concave mirrors, which is advantageous for reducing the geometric light guidance value (etendue). A pupil plane 309 lies at a distance from both concave mirrors at the position where the chief ray 308 crosses the optical axis 305′ defined by the concave mirrors. An aperture stop may be positioned here. It may be beneficial if at least one of the concave mirrors has an aspheric reflecting surface having a curvature which decreases from the optical axis to the edge of the mirror in a radial direction.
The purely refractive first objective part 310, which transforms the off axis object field into the first intermediate image, has a first lens group LG11 with positive power and a second lens group LG12 with a positive power. An aperture stop may be provided between these lens groups where the chief ray 308 crosses the optical axis. The catoptric objective part 320 images the first intermediate image into the second intermediate image and has a pupil plane between the concave mirrors. The purely refractive third objective part 330 has a first lens group LG31 with positive power, and a second lens group LG32 with a positive power. An position for an aperture A stop lies between LG31 and LG32.
FIG. 12 shows a schematic representation of another projection objective 400 having two concave mirrors 421 and 422 and two intermediate images 403, 404. Features or feature groups identical or similar in structure and/or function to those in FIG. 10 are denoted by similar numerals increased by 100. FIG. 13 represents a longitudinal sectional view of an embodiment designed on the basis depicted in FIG. 12.
In contrast to the embodiment shown in FIGS. 10, 11, the concave mirrors 421, 422 do not share a common straight optical axis. Instead, the optical axis of the concave mirror 421 corresponds to the optical axis 405 between object plane and image plane. The optical axis of the concave mirror 422 is nearly perpendicular to the optical axis 405. The construction space for the mirror mounts lies outside the optical axis connecting object and image plane, which may be favorable. Note that the object side and the image side section of the optical axis are coaxial. As the concave mirrors both lie on one side of the optical axis 405, the first and second folding mirror can be designed as one single planar mirror 406 with a mirror face facing the concave mirrors and used twice as the light passes through. Also, the two separate concave mirrors 421, 422 can be combined to form one single concave mirror which is used twice.
FIG. 14 shows a perspective view of the catoptric objective part of the third embodiment to demonstrate the mirror geometry. It can be seen that the folding mirrors and the concave mirrors can have geometrically simple shapes since the illuminated areas are of simple form and contiguous. The concave mirrors and the folding mirrors in this embodiment have rectangular shape which facilitates mounting.
FIG. 15 shows a schematic representation of another embodiment of a projection objective 500 having features improving optical performance and features facilitating manufacturing. FIG. 16 shows a lens section of a projection objective designed according to the principles shown in FIG. 15. The specification of this embodiment is shown in tables 16 and 16A. Features or feature groups identical or similar in structure and/or function to those in FIG. 1 are denoted by similar numerals, increased by 400.
The second objective part 520 which serves to image the first intermediate image 503 into the second intermediate image 504 includes a first concave mirror 521 and a second concave mirror 522 optically downstream of the first concave mirror 521. The curvature surfaces of the first and second concave mirror have a common axis of rotational symmetry co-axial with the optical axis shared by all optical elements of the projection objective. The unbroken mirror surfaces used on the first and second concave mirror are on opposite sides of the optical axis 505. A first mirror-related lens 551 is arranged optically between the first intermediate image 503 and the first concave mirror 521 immediately in front of the first concave mirror such that it is transited twice in the optical path between the first intermediate image and the first concave mirror and in the optical path between the first concave mirror and the second concave mirror. In order to avoid influencing the optical path between the second concave mirror and the image plane the first mirror-related lens 551 is designed as a truncated lens arranged outside the optical axis. A second mirror-related lens 552 is arranged immediately in front of the second concave mirror 522 such that is used twice in the optical path between the first and the second concave mirror and in the optical path between the second concave mirror and the image plane 502. The lens 552 is truncated such that it does not extend into the optical path between the object plane 501 and the first concave mirror 521. Both the first and second mirror related lenses 551, 552 are free standing lenses having free entrance and exit surfaces. Particularly, the lens surfaces facing the respective concave mirrors have curvatures different from the curvatures of the concave mirrors, which allows additional degrees of freedom when compared to the embodiments having Mangin mirrors (compare FIG. 1). Both mirror-related lenses 551, 552 are designed as negative meniscus lenses having a sense of curvature similar to the curvature of the associated concave mirror, i.e. having a convex surface facing the concave mirror surface of the associated concave mirror. The negative refractive power arranged immediately in front of the concave mirrors serves to improve correction of the chromatic length aberration (CHL). All optically active surfaces of the second objective part are spherical, which greatly facilitates manufacturing and improves the optical performance. Particularly, stray light may be reduced when compared to embodiments having aspheric surfaces, particularly aspheric mirror surfaces.
The field having the shape of a high aspect ratio rectangle having a width a in cross-scan direction (x-direction) and a smaller width b in scan direction (y-direction) and arranged off-axis at a distance c from the optical axis is shown in FIG. 15a. The immersion objective has image side numerical aperture NA=1.2 when used in conjunction with pure water as an immersion medium at 193 nm. The system is telecentric on the object and image side and essentially free of field zone aberrations.
In FIG. 17 a lens section of a variant of a system according to the principles explained in connection with FIG. 15 is shown. The specification of the 193 nm immersion lens having NA=1.2 is given in tables 17 and 17A. Features or feature groups identical or similar in structure and/or function to those in FIG. 1 are denoted by similar numerals, increased by 500. The second objective part 620 has aspherical negative meniscus lenses 651, 652 immediately in front of the spherical concave mirrors 621, 622 and used twice in the light path to and from the respective concave mirrors. For the sake of simplicity, each group of optical elements consisting of a concave mirror 621, 622 and the associated lenses 651, 652 immediately ahead of the respective concave mirror is denoted as “catadioptric sub-group”. In the embodiment of FIG. 17 the catadioptric sub-group 621, 651 and the catadioptric sub-group 622, 652 are designed identically and arranged symmetrically with respect to each other. Particularly, the radii of the optical surfaces, the axial distances or thicknesses of the optical surfaces and the diameters of the optical surfaces of the symmetry related lenses as well as the symmetry related concave mirrors are identical. This makes it possible that the lenses 651, 652 and the mirrors 621, 622, respectively, may be manufactured simultaneously from the same blank material. Therefore, arrangements of the type exemplarily shown in FIG. 17 allow for significant reduction in costs for material and manufacturing for the optical elements used in the second, catadioptric objective part.
In a corresponding method of manufacturing optical elements for an catadioptric or catoptric objective part of a projection lens having a first concave mirror and a second concave mirror designed as truncated mirrors the first and second mirrors are fabricated such that firstly a mirror blank for the first and second concave mirror is manufactured to obtain the desired concave shape of the mirror surface and secondly the shaped mirror blank is separated into two truncated mirrors used as first and second concave mirror. The mirror blank may be a single piece cut into two pieces after surface preparation. It is also possible to join two separate blank parts together, e.g. by wringing or cementing, prior to shaping the mirror surface. This allows easy separation after the surface preparation. The coating of the mirror substrate may be performed prior to or after separation of the mirror substrate parts. The mirror related lenses may be manufactured correspondingly.
A further difference to the embodiment shown in FIG. 16 lies in the fact that at least one of the surfaces of the lenses 651, 652 close to the respective concave mirrors has aspheric shape. In the embodiment, each concave lens surface of the lenses 651, 652 is aspheric. The aspheric surfaces arranged closed to the respective intermediate images, which are field surfaces of this system, can be designed such that a strong influence on field dependent aberrations, like distortion on the object imaging or the spherical aberration of the pupil imaging, are influenced. Generally, it may be useful to have at least one lens arranged between an intermediate image and the associated concave mirror optically near the intermediate image (upstream or downstream of the intermediate image), wherein at least one surface of the lens arranged between the intermediate image and the concave mirror is aspheric. Particularly, the lens surface facing the intermediate image may be aspheric.
In an alternative embodiment the mirror related lenses, which are truncated lenses in the embodiments of FIGS. 16 and 17, are designed as full meniscus shaped negative lenses extending across the optical axis such that they are transited three times. Specifically, lens 652 (associated to the second concave mirror 622) may extend across the optical axis 605 such that light coming from the object plane transits this lens prior to forming the first intermediate image 603 and then, on the other side of the optical axis, in the optical path between first and second concave mirror and second concave mirror and image plane. Likewise, lens 651 associated to the first concave mirror 621 may extend across the optical axis such that the lens is used twice in the optical path to and from the first concave mirrors and a third time in the optical path between the second intermediate image 604 and the image plane. In this embodiment, two aspheric surfaces transited three times upstream and downstream of an intermediate image are provided, which facilitates optical correction. In addition, mounting of the lenses is improved when compared to the mounting of truncated lenses (compare FIGS. 18 and 19).
In FIG. 18 a schematic representation of a projection objective 700 having two lenses used three times in transmission is shown. FIG. 19 shows an embodiment of this type, for which the specification is given in tables 19 and 19A. Features similar or identical to features described in detail in connection with FIGS. 15 to 17 are designated with the same reference numbers, increased by 100 or 200, respectively.
The catadioptric second objective part 720 serves to image the first intermediate image 703 into the second intermediate image 704. A first mirror related lens 751 is arranged optically between the first intermediate image 703 and the first concave mirror 721, whereas, on the opposite side of the optical axis 705, the second mirror related lens 752 is arranged optically between the second concave mirror 722 and the second intermediate image 704. Both mirror-related lenses 751, 752 extend across the optical axis into the beam pass of light passing the respective concave mirrors 721, 722. Particularly, the second mirror related lens 752 extends into the beam pass between the object plane 751 and the first concave mirror 721, whereas the first mirror related lens 751 extends into the beam path into the second concave mirror 752 and the image plane. Therefore, each of the mirror-related lenses 751, 752 is optically used three times, whereby the optical effect of a lens can be maximized and, at the same time, the consumption of optical material can by minimized. In addition, mounting of the lenses 751, 752 is facilitated when compared to a mounting of truncated lenses.
The triply passed lenses 751, 752 may preferably be designed as multigrade lenses having a first lens zone associated with one side of the optical axis and transited twice in the optical path to and from the associated concave mirror and a second zone associated with the opposite side of the optical axis and transited once, where the first lens zone and the second lens zone have different lens surface curvature on at least one side of the lens such that the multigrade lens forms a pair of mutually independently acting lenses acting at a common location. A monolithic multigrade lens providing different optical powers on opposite sides of the optical axis may be fabricated from a single lens blank and can be mounted conventionally with a circular mount. The lens zones on either side of the optical axis may have different aspheric shape, where the aspheres are preferably based on the same spherical base shape to facilitate manufacturing. Note that the part of lens 752 closest to the first intermediate image and the part of lens 751 closest to the second intermediate image are both located close to field surfaces such that the lens surfaces are effective for correcting field aberrations, particularly if they are made aspheric.
In the embodiment shown in FIG. 19, both lenses 751, 752 with triple use are designed as negative meniscus lenses having a sense of curvature similar to the related concave mirrors and having weak negative refractive power. In other embodiments, the lenses may also be almost without optical power. In both cases, at least one lens surface may be aspheric in order to support optical correaction.
In all embodiments the first, dioptric objective part serves to form the first intermediate image from a flat object field. The size and axial position of the first intermediate image as well as the aberrations associated with the first intermediate image are determined by the optical properties of the first objective part. Like in the embodiments shown above, the first objective part may be subdivided into a first lens group LG11 having positive refractive power and the second lens group LG12 having positive refractive power, wherein a pupil surface 711 of the system is disposed between the lens groups in an axial position where the chief ray 708 of the imaging intersects the optical axis. An aperture stop for determining the numerical aperture used in the imaging process may be provided in the vicinity of this pupil surface. However, in the embodiment shown in FIGS. 18 and 19, the aperture stop A is provided in the vicinity of a pupil surface optically conjugate to this pupil surface in the third, dioptric objective part. The second lens group LG12 between the pupil surface 711 and the first intermediate image includes the negative meniscus lens 752 immediately upstream of the first intermediate image.
In the embodiment of FIG. 19 the first lens group LG11 consists of a positive meniscus lens 781 having an image side concave surface and weak optical power, a negative meniscus lens 782 having an image side concave surface and weak negative power, a positive meniscus lens 783 having an object side concave surface, a biconvex positive lens 784, a positive meniscus lens 785 having an image side concave surface and a positive meniscus lens 786 having an image side concave surface immediately ahead of the pupil surface 711. The second lens group LG12 includes a meniscus shaped lens 787 having a strongly curved concave surface facing the object, a positive meniscus lens 788 having an object side concave surface and a biconvex positive lens 789 immediately behind, and the negative meniscus lens 752 which is integral part of the mirror related second lens. The meniscus lens 787 immediately following the pupil surface and having the concave surface facing the pupil and the object plane is particularly useful for correcting spherical aberration, astigmatism and image curvature in the first objective part. The optical correction is also positively influenced by a negative-positive-doublet formed by the negative meniscus lens 782 and the positive meniscus lens 783 arranged in the divergent beam section of the first lens group LG11. The negative meniscus lens having the concave exit surface optically close to the object plane is arranged in a region where the height of the chief ray is larger than the height of the marginal ray, whereby field aberrations, like distortion, can be effectively corrected.
The embodiment of a projection objective 800 shown in FIG. 20 having a specification as given in tables 20 and 20A can be described as a variant of the embodiment shown in FIG. 19. Similar to that embodiment, a negative meniscus lens 851 is arranged immediately ahead of the first concave mirror 821, the lens 851 being passed three times by the light beam. In contrast to the embodiment of FIG. 19, lens 851 is the only lens passed three times by the light beam. There is no negative refractive power or positive refractive power immediately in front of the second concave mirror 822. Therefore, the mass of transparent optical material required for the catadioptric objective part is smaller than in the embodiment shown in FIG. 19. The first objective part has magnification |β1|≈1.9.
In FIG. 21 another embodiment of a projection objective 900 is shown which is generally designed according to the principles explained in detail in connection with FIG. 15. The specification is given in tables 21 and 21A. Reference numerals are similar, but increased by 400. Particularly, to each concave mirror 921, 922 is as signed a negative meniscus lens 951, 952 immediately in front of the concave mirror optically between the respective concave mirror and an intermediate image upstream or downstream of the concave mirror. Each negative meniscus lens 951, 952 is designed as a truncated lens arranged only at the side of the optical axis where the associated concave mirror is positioned. Therefore, the mirror-related lens is passed twice by the light. The first objective part 910 can be subdivided into two lens groups, lens group LG11 being arranged between the object plane and the pupil plane 911, whereas lens group LG12 is arranged between the pupil plane and the first intermediate image 903. Like in the embodiment shown in FIG. 19, the first lens group LG11 includes a negative-positive-doublet 982, 983, the negative meniscus 982 being arranged close to the object plane and having a concave exit side facing the image plane. The positive refractive power following this negative lens is split into two positive meniscus lenses, each having a concave side facing the object. A meniscus lens 987 having a strongly curved concave entrance side facing the object is arranged immediately downstream of the pupil plane 911. Optically, this lens is useful for correcting spherical aberration, astigmatism and image curvature in the first objective part.
The third objective part 930 is composed of a first lens group LG31 between the second intermediate image 904 and the aperture stop A, and the second lens group LG32 between the aperture stop A and the image plane. The aperture stop is arranged between the region of largest beam diameter of the third objective part and the image plane. The biconvex positive lens 996 immediately following the aperture stop A is a biaspherical lens having both the entrance side and the exit side being aspheric surfaces. The aspheric surfaces in close vicinity to each other and arran-ged in the convergent beam path immediately upstream of the image plane have a strong influence on aberration correction. Particularly, higher orders of spherical aberration and coma are positively influenced. There is only one negative lens 991 arranged in the third objective part. The biconvex negative lens 991 defines a shallow waist in the beam path of the third objective part. All lenses downstream of negative lens 991 are positive lenses. Avoiding negative lenses in the region of increasing and large beam diameters of the third objective part allows to keep the beam diameter small, thus decreasing the demand of optical material used for the lenses of the third objective part.
Both concave mirrors 921, 922 have spherical mirror surfaces, thus facilitating manufacturing and improving optical performance. If D is a maximum diameter of a lens element of the third objective part in [mm] and c1 and c2 are the curvatures of the concave mirrors 921, 922 in [mm−1], then the following condition is fulfilled by the embodiment of FIG. 21: 1<D/(|c1|+|c2|)·10−4<6. The curvature c is the reciprocal of the curvature radius at the vertex. If this condition is fulfilled, then a good balance between Petzval correction and positive power in the third objective part can be obtained.
FIG. 22 shows a variant of a projection objective 1000 having a general construction similar to that of the embodiment shown in FIG. 4, i.e. having a second objective part 1020 consisting of two concave mirrors 1021, 1022 and having no refractive optical elements. Reference numerals for similar features/feature groups are similar, increased by 800. The specification is given in tables 22 and 22A. The first, dioptric objective part 1010 for creating the first intermediate image 1003 is subdivided into a first lens group LG11 between object plane and pupil plane 1011 and a second lens group LG12 between the pupil plane and the first intermediate image. The first lens group LG11 starts with the biconvex positive lens 1081, followed by a negative meniscus lens 1082 having an image side concave surface and a biconvex positive lens 1083. Particularly high incidence angles occur at the concave exit side of the negative meniscus lens 1082, which is arranged in a region where the light beam is slightly divergent. The high incidence angles have strong correcting influence. The sequence positive-negative-positive provided by lenses 1081, 1082, 1083 has been found to be useful. Therefore, it may be preferable if the first objective part creating the first intermediate image includes at least one concave surface facing the image, which is preferably included in a sequence of positive-negative-positive lenses.
FIG. 23 shows another embodiment of a projection objective 1100 generally designed in accordance of the principles explained in connection with the FIG. 4. The specification is given in tables 23 and 23A. The second objective part 1120 is purely reflective, thus requiring no transparent optical material. Some aspects regarding features facilitating manufacturing will now be explained in connection with this embodiment and with FIG. 24. They may, however, be implemented in other embodiments. Both concave mirrors 1121, 1122 have similar surfaces, which facilitates manufacturing and improves optical performance. Generally, the shape of a concave mirror has a strong influence on certain aberrations. Particularly, the image curvature (Petzval curvature) is influenced by the vertex curvature of the mirror. If an aspherical mirror surface is used, the basic data of the aspheric surface define certain field dependent aberrations, particularly the spherical aberration of the pupil, which is proportional to y4, where y is the beam height at the concave mirror. Both factors influencing the shape of the mirror surface are deeply rooted in the optical design and are dependent from one another. Particularly, the second factor regarding the type of asphere is strongly influenced by the first factor (basic curvature), since, for example, a strong curvature of the concave mirror will induce strong field dependent aberrations.
Certain crucial factors influencing a good compromise between manufacturability and optical performance of concave mirrors have been identified. One disruptive factor resulting from manufacturing of a concave mirror is the depth up to which a tool must plunge into the material of the mirror substrate in order to create the concave mirror surface. This plunging depth is denoted “pmax” in connection with FIG. 24. The maximum sagitta or rising height at the edge of a mirror may be defined as the axial separation of a plane normal to the optical axis and touching the edge of the concave mirror to a plane parallel thereto and touching the vertex of the concave mirror. As schematically shown in FIG. 24, pmax is dependent on the curvature radius R of the aspherical mirror surface, and the diameter D of the aspherical mirror. In a first approximation (for aspherical form) pmax is given by: pmax=R−(R2−D2/4)0.5. Since the basic shape of the mirror cannot be altered without strongly influencing the optical effect, only the diameter of the mirror surface can be used as a free parameter to influence manufacturability. When considering manufacturing, the grinding of the mirror substrate necessary to define the basic shape of the mirror substrate prior to polishing is particularly addressed. It has been found that it is preferable if the condition D≦1.3R is fulfilled and that it may be more preferable if the condition D≦1.2R is fulfilled such that also the condition: pmax<0.22R is fulfilled. Manufacturing is also facilitated if the radii of curvature at the vertex of the curved mirror surfaces for two mirrors are as similar as possible. If R1 is the vertex radius of curvature of a first mirror and R2 is the vertex radius of curvature of the second mirror, it is preferable that the following condition is fulfilled: 0.8<|R1/R2|<1.2. In the embodiment shown in FIG. 23 this condition and the two following conditions are fulfilled: pmax≦0.22R and D≦1.3R. It may be sufficient if, in addition to the condition regarding the relation of curvature radii one of the latter conditions is fulfilled.
In the embodiment shown in FIG. 23 the curvatures of the mirrors 1121, 1122 are almost identical (curvature radii differ within less than 1%) and the aspheric shapes are almost identical. The mirrors 1121, 1122 are the only optical elements of the second objective part, thus making this part a catoptic part. The maximum diameter of optical elements of the second objective part 1120 is smaller or almost equal to the maximum diameter of lenses in the third objective part. This facilitates implementation of the axial symmetric projection objective into a wafer stepper or a wafer scanner. Although the aperture stop A is provided in the third objective part, it may also be provided in the first objective part in the vicinity of the pupil surface 1111 thereof.
In FIG. 25 another embodiment of a projection objective 1200 is shown. FIG. 26 shows a detailed view of a section between the object plane 1201 and the second intermediate image 1204 which is the object of a purely refractive objective part 1230 for imaging the second intermediate image onto the image plane 1290 at a reduced scale of about 1:4.
The entire projection objective 1200 designed to image an object disposed in the object plane 1201 onto the image plane 1202 at a reduced scale consists of three objective parts 1210, 1220, 1230, each designed to image a field plane upstream of the objective part into field plane downstream of the objective part. The first objective part 1210 consists of four consecutive lenses 1211, 1212, 1213 and 1214 followed by the first concave mirror 1221 immediately upstream of the first intermediate image 1203. Therefore, the first objective part is catadioptric. The second objective part 1220 is also catadioptric, including the second concave mirror 1222 immediately downstream of the first intermediate image 1203 and positive lenses 1226, 1227, 1228, 1229, all effective for refocusing the first intermediate image 1203 into the second intermediate image 1204. The third objective part 1230 is purely refractive and includes the freely accessible aperture stop A of the system.
In contrast to the embodiments shown above, only the first intermediate image 1203 is positioned in the intermirror space defined by the concave mirrors 1221, 1222, whereas the second intermediate image 1204 lies outside of this intermirror space. The mirror group defined by the two concave mirrors 1221, 1222 facing each other has a mirror group entry and a mirror group exit. At the mirror group entry positioned geometrically next to the edge of the second mirror 1222 facing the optical axis 1205 radiation coming from the object side enters the intermirror space and at the mirror group exit positioned geometrically next to the edge of the first mirror 1221 facing the optical axis the radiation exits the intermirror space after the reflections on the concave mirrors. It is a characterizing feature of this embodiment that a first pupil surface PS1 of the projection objective lies in the vicinity of the mirror group entry and a second pupil surface PS2 lies in the vicinity of the mirror group exit. In contrast, in most other embodiments, for example those shown in FIGS. 1 to 4, 7 to 14, the entry of the mirror group and the exit of the mirror group are optically close to the intermediate images, which are field surfaces of the projection lens. Also, in the embodiments mentioned above the radiation reflected from the first concave mirror crosses the optical axis prior to impinging on the second concave mirror which effectively leaves the footprints of the radiation on the reflecting surfaces of the concave mirrors at opposite sides of the optical axis. In contrast, in the embodiment shown in FIGS. 25 and 26, first and second concave mirrors 1221, 1222 are disposed on the same side of the optical axis. Due to this difference the optical path within the space defined by the concave mirrors has almost point symmetry with respect to a symmetry point arranged midways between the vertices of the concave mirrors in the embodiments mentioned above, whereas the optical path is almost mirror-symmetric with respect to a mirror plane perpendicular to the optical axis and arranged midways between vertices of the concave mirrors in the embodiment of FIGS. 25, 26.
Optically, embodiments designed essentially according to the principles of the embodiment shown in FIGS. 25, 26 can be advantageous if it is desired to influence field aberrations by the action of lenses close to field planes since one of the field planes between object plane 1201 and image plane 1202, namely the field surface of the second intermediate image 1204 is arranged freely accessible at a distance outside the intermirror space defined by the concave mirrors 1221, 1222. As shown in FIG. 25, two field lenses 1229, 1235 are arranged close to the second intermediate image 1204 immediately upstream (1229) and immediately downstream (1235) of this intermediate image, thus forming a field lens group for aberration correction.
The first and second objective parts 1210, 1220 are effective to form an intermediate image 1204 at a distance from the mirror group defined by the concave mirrors 1221, 1222 geometrically behind this mirror group. Since a pupil surface PS2 is arranged in the vicinity of the exit of the mirror group, a group of lenses 1226 to 1228 acting in combination as a Fourier-transforming lens group can be used to position and define the characteristics of the intermediate image 1204, which then is reimaged on the image plane 1202 by the third objective part 1230. These properties make the sub-system formed by the first and second objective part 1210, 1220 useful as a relay system for linking light paths of optical systems ahead and downstream of the relay system together. Due to the action of the concave mirrors 1221, 1222 of the mirror group this relay system can be designed to have strong influence on the image curvature compensating at least partly the opposite influence of positive lenses upstream and downstream of the mirror group.
FIG. 27 shows a variant of a projection objective 1300 having a general construction similar to that of the embodiment shown in FIG. 4, i.e. having a second, catoptric objective part 1320 consisting of two concave mirrors 1321, 1322 and having no refractive optical element. Reference numerals for similar features/feature groups are similar as in FIG. 4, increased by 1100. The specification is given in tables 27, 27A.
The first, dioptric objective part 1310 for creating the first intermediate image 1303 has a first lens element 1312 immediately following the object surface 1301, where the entrance surface of this first lens element is aspheric and convex to the object surface and an aperture stop A is provided in the first objective part in between lens groups each having positive refractive power. The concave mirrors 1321, 1322 of the catoptric second objective part 1320 each have an aspheric mirror surface. It is a characterizing feature of this design that the aspheric mirror surfaces of mirrors 1321, 1322 have identical aspheric shape. This allows to use exactly the same optical testing device for measuring the aspheric shape of both concave mirrors in the manufacturing process. As it can be seen from tables 27, 27A the radii of the concave mirrors (describing the basic shape of the mirror surface) and the aspheric constants (describing the aspherical deviation from the basic shape of surfaces 25, 26) are identical. In other embodiments the basic shape and the aspheric constants may vary slightly between the two concave mirror. Even in that case significant improvements relating to costs of the manufacturing process can be obtained if the mirror surfaces are shaped similar such that the same measuring optics can be used for testing both mirror surfaces.
The projection objective 1400, a lens section of which is shown in FIG. 28, has a general construction similar to that on the embodiment shown in FIG. 4. Therefore, reference numerals for similar features/feature groups are similar, increasing by 1200. The specification is given in tables 28 and 28A.
A first, dioptric objective part 1410 including an aperture stop A is designed for creating a first intermediate image 1403. The second, catoptric (purely reflective) objective part 1420 consists of a first concave mirror 1421 and a second concave mirror 1422 which, in combination, create the second intermediate image 1404 from the first intermediate image 1403. A dioptric third objective part 1430 is designed for imaging the second intermediate image 1404 onto the image plane 1402, whereby, during operation, a thin layer of immersion fluid I (water) is transited by the radiation. When optimizing the design, particular care was taken to facilitate optical testing of the aspheric mirror surfaces during mirror manufacturing. For this purpose, the mirror surface of the first concave mirror 1421 has a parabolic shape (compare table 28A, surface 23).
The following considerations are provided to facilitate understanding why a parabolic shape of a mirror surface facilitates testing. In a general case, optical testing of an aspherical mirror surface requires use of specifically adapted optical testing system designed to create testing radiation having a distorted wave front which is adapted to the desired aspheric shape of the mirror surface such that the local incidence angles of the test wave onto the aspheric surface are rectangular for each location of the aspheric surface. Optical testing devices using aplanatic optical systems, or compensation systems (K-systems) or computer generated holograms (CGH) or a combination thereof for shaping the distorted wave front are usually employed for this purpose. Since the construction of specifically designed testing optics for each aspherical shape is expensive, alternative methods are desired.
An aspheric mirror having a parabolic shape, in contrast, can be tested with simple testing equipment. For further explanation, it is considered that a purely conical, rotational symmetric surface shape can be described by the following equation:




  p
  =
  
    
      ch
      2
    
    
      1
      +
      
        
          1
          -
          
            
              
                c
                2
              
              ⁡
              
                (
                
                  k
                  +
                  1
                
                )
              
            
            ⁢
            
              h
              2
            
          
        
      
    
  




Here, p is the axial coordinate of a surface point, k is a conical constant, c is the curvature (i.e. the reciprocal (1/r) of radius r) of the surface at the vertex (where the optical axis intersects the mirror surface) and h is the height (measured perpendicular to the optical axis). Using this equation, different conical, rotational symmetric surface shapes can be generated depending on the value of the conical constant k. For example, a spherical shape corresponds to k=0, a value k=−1 describes a parabola, values k<−1 describe a hyperbola and values −1<k<0 describe an elliptic shape. All these shapes have in common that an object point arranged in a specific position (depending on the shape of the surface) will be imaged without aberrations (stigmatic imaging). At least one non-spherical conical mirror may therefore be useful in an embodiment of the invention or in other projection objectives having concave mirrors. Considering the requirements of mirror testing, a parabolic shape (k=−1) is particularly useful since the object point, which will be imaged without spherical aberrations, is positioned at infinity. With other words: light from a test beam or parallel light impinging parallel to the optical axis on a parabolic surface will be focused in one and only one focal point by the parabolic mirror. This is advantageous since no special arrangements for diverging or converging a beam bundle of a test wave are necessary. The test wave has a planar wave front.
A possible testing arrangement is schematically shown in FIG. 29. Here, the parabolic mirror surface 1421 is shown together with the optical axis OA defined by that mirror surface. The testing equipment includes a testing optical system 1460 designed for creating a parallel test light beam parallel to the optical axis OA and incident on the parabolic mirror surface. The testing arrangement further includes a spherical mirror 1470 shaped and arranged with respect to the desired shape of the parabolic mirror 1421 such that the center of curvature 1490 of the spherical mirror 1470 coincides with the focal point of the parabolic mirror. In this arrangement, a test wave 1495 having a plane wave front provided by the optics 1460 and incident on the parabolic mirror surface 1421 is first converged by the parabolic mirror into the focal point 1490 of the parabolic mirror prior to impinging on the spherical mirror 1470. The spherical mirror 1470 reflects the test wave back along the same path into the test optics 1460. Deviations in path length between a planar reference wave and the wave reflected back from the parabolic mirror can be used to characterize the parabolic shape of the parabolic mirror.
The projection objective 1400 is telecentric on the object side and on the image side. One feature contributing to telecentricity on the object side is the particular convex shape of the entrance side of the first lens element (positive meniscus 1412) immediately following the object plane. Aspheric surfaces on the first two lenses on the object side contribute to telecentricity. The telecentric beam is essentially free of field zone errors on the object and image side, i.e. there is virtually no variation of telecentricity across the object or image field.
In FIGS. 30 to 32 three further embodiments of projection objectives 1500, 1600 and 1700 having a general construction similar to that shown in FIG. 4 having a catoptric second objective part are shown. Reference numerals for similar features/feature groups are similar, increased by 1300, 1400, 1500 respectively. The specifications are given in tables 30, 30A, 31, 31A and 32, 32A. When designing these embodiments, special emphasis was placed on optimization of material consumption and installation space required for the first, dioptric objective part 1510, 1610, 1710 serving as a relay system for imaging the object field into the first intermediate image.
As a common feature to all embodiments of FIGS. 30, 31 and 32 the first objective part has only six lens elements, i.e. transparent optical elements having considerable refractive power. Only positive lenses are used, thereby creating first objective parts with strong converging power in an axially short objective part having relatively small maximum diameter. In all embodiments, a plane parallel plate 1519, 1619, 1719 is positioned immediately following the respective first pupil plane 1511, 1611, 1711 of the projection objective. One advantage of placing at least one essentially plane parallel plate near a pupil surface is that such plate can be aspherized to correct for aberrations introduced by manufacturing or other effects (correction asphere). Such plate can be ex, changeable. In the embodiment of FIG. 30, an aperture stop A is provided within the first objective part 1510 at the pupil position immediately ahead of the parallel plate 1519. In the embodiments of FIGS. 31 and 32 the aperture stop is arranged within the third objective part in the region of maximum beam diameter at the third pupil surface 1631, 1731 respectively. All embodiments mentioned here have only positive lenses between the image side pupil plane and the image plane, where the embodiment in FIG. 30 has five such positive lenses and the other embodiments (FIGS. 31, 32) have only four positive lenses between the image side pupil surface and the image plane.
A comparative view of the first objective parts of the embodiments in FIGS. 30 to 32 reveals certain relations between the use of aspheric surfaces and the curvature of the entrance surface of the first lens element immediately following the objective plane. In the embodiment of FIG. 30, first lens element 1512 is a biconvex positive lens having a aspheric entrance surface facing the object plane, where this entrance surface is only slightly curved, with the radius of curvature exceeding 300 mm. Six aspheric surfaces (indicated by dots) are used. As evident from the rays crossing in the region of the first intermediate image 1503, coma is one prominent imaging error in the first intermediate image 1503. This error is compensated by the design of the optical surfaces downstream of the first intermediate image. In contrast, in the embodiment shown in FIG. 31 the aspheric entrance surface of the first lens element (positive meniscus 1612) has a relatively strong convex curvature having a radius of curvature below 300 mm (R≈154 mm in this case). Only four aspheric surfaces are employed in the first objective part 1610. The aspheric surfaces are adapted to the optical effect of the curved entrance surface such that the first intermediate image 1603 is essentially free of coma. This indicates a trend that a strong convex curvature of the entrance side is useful for obtaining a good quality first intermediate image with a small number of aspherical surfaces. In the first objective part 1710 of the embodiment shown in FIG. 32 an intermediate number of five aspheric surfaces is used in combination with an entrance surface of the first element (biconvex lens 1712) having moderate curvature (radius of curvature>300 mm). Providing an entry surface of the projection objective having no curvature (planar surface) or weak curvature (e.g. value of radius of curvature>500 nm or more) renders the objective relatively insensitive against pressure fluctuations of ambient pressure. As the number of aspheric surfaces is equal or less than the number of positive lenses in the first objective part of all three embodiments it can be seen that compact designs can be obtained when only positive lens elements are used and if a ratio between the number of lenses having refractive power and the number of aspheric surfaces is smaller than 1.6.
The embodiments of FIGS. 30 to 32 show that in the framework of a preferred design having a straight optical axis common to all objective parts and a catoptric second objective part it is possible to design the relay system on the entrance side of the objective (first objective part) with an axial length considerably smaller than the axial length of the third objective part. The axial length (measured between the object surface and the first intermediate image) may be less than 90% or less than 80% of the axial length of the third objective part (measured between the second intermediate image and the image plane). This indicates that the design can be used with various different positions of the second (catoptric or catadioptric) objective part between the refractive objective parts.
In the embodiments of FIGS. 30 to 32 the plano-convex lens closest to the image plane, i.e. the last lens of the objective, is made of calcium fluoride. Since this material is less sensitive to radiation induced density variations (particularly compaction) the service life time of the objective may be increased when compared to objectives having last lenses made of fused silica. However, in immersion objectives designed for operating with water based immersion liquids last lens elements of calcium fluoride are problematic since calcium fluoride is soluble in water. Therefore, the life time of the system may be reduced. Therefore, a protection layer protecting the last lens element from degradation caused by an aggressive immersion liquid may be useful. Suitable protection layers are described, for example, in U.S. provisional application 60/530,623 filed on Dec. 19, 2003 by the applicant, the disclosure of which is incorporated herein by reference. In the embodiments of FIGS. 30 to 32 a thin plane parallel plate of fused silica having a thickness of 0.3 mm is adhered to the planar exit surface of the plano-convex calcium fluoride lens by wringing. The plane parallel quartz glass plate providing the exit surface of the projection objective can be exchanged, if desired. Exchanging may be desired if the fused silica material is damaged due to high radiation load and/or if contamination and/or scratches on the fused silica protection plate occur.
Using the embodiment of FIG. 32 as an example further characteristic features of projection objectives according to the invention are explained. To this end, a chief ray CR running from an outermost field point (furthest away from the optical axis AX) essentially parallel to the optical axis and intersecting the optical axis at three consecutive pupil surface positions P1, P2, P3, each within one of the imaging objective parts 1710, 1720, 1730, is drawn in bold line to facilitate understanding. The angle included between the optical axis AX and the chief ray CR at each position along the chief ray is denoted “chief ray angle” in the following. The chief ray CR is divergent (chief ray height increasing in light propagation direction) at the position of the first intermediate image 1703. The increasing chief ray height after the first intermediate image corresponds to a negative chief ray intersection length of the first objective part 1710 downstream of the first intermediate image 1703. Here, the “chief ray intersection length” is defined as an axial length between the position of the intermediate image and the intersection point of a tangent to the chief ray CR at the intermediate image. The intersection point is positioned on the object side of the first intermediate image within the first objective part 1710. A negative chief ray intersection length relative to the first intermediate image corresponds to a negative (virtual) exit pupil of the first objective part. In contrast, a convergent chief ray exists at the second intermediate image 1704, corresponding to a positive chief ray intersection length downstream of the second intermediate image, which corresponds to a real exit pupil existing downstream of the second intermediate image. The real exit pupil of the second objective part 1720 relative to the second intermediate image 1704 is therefore positioned outside the third objective part 1730 (real exit pupil) beyond the image plane. The virtual exit pupil of the first objective part 1710 coincides with the real entrance pupil of the second objective part 1720. Given these conditions a projection objective is provided having at least two intermediate images, wherein one imaging objective part (here the catadioptric or catoptric second objective part disposed between a refractive first objective part and a refractive third objective part) performs a real image formation between the first and second intermediate images wherein, in addition, a real entrance pupil is imaged into a real exit pupil. Since there is an accessible pupil surface P1 within the refractive first objective part and another accessible pupil surface P3 within the third objective part projection objectives of this type have two potential positions for placing an aperture stop to effectively define the numerical aperture used in the imaging process. Here, the term “accessible” refers to a potential aperture stop position in a section of an objective part passed only once by the light running through the projection objective.
Further, projection objectives according to preferred embodiments discussed here, have three real pupil surfaces P1, P2, P3 between object plane and image plane, wherein the maximum chief ray angle in one of these pupil surfaces is smaller than the object side numerical aperture and wherein in addition at least one of the following conditions is fulfilled: (1) The maximum marginal ray height in two of the three pupil surfaces is at most 50% of the maximum marginal ray height in the third pupil surface (here the third pupil surface P3); (2) the maximum chief ray angle in two of the pupil surfaces is at least twice as large as a maximum chief ray angle in the third pupil surface; (3) a maximum chief ray angle in two of the pupil surfaces is at least twice as large as the object side numerical aperture.
In the following, a number of embodiments are shown which are optimized with respect to the aspect of manufacturing and testing the aspheric surfaces used therein. In order to demonstrate one of the problems arising during preparation of aspheric surfaces on lenses FIGS. 33(a) and 33(b) each show an enlarged partial view of a meridonal lens section through a conventional objective having a thin positive lens L having an aspheric entrance surface AS. In FIG. 33(a) a characteristic ray R1 running along the periphery of the transmitted beam bundle and a characteristic beam R2 running close to the optical axis of the optical system are shown to demonstrate the optical action of the aspherical lens L. In the conventional system CONV the aspheric surface AS is designed to act as a positive lens for rays passing close to the optical axis and as a negative lens for rays close to the periphery of the light beam (ray R1). In order to obtain this variation of refractive power in meridional direction the aspheric surface has a positive curvature (C>0) in the area around the optical axis and a negative curvature (C<0) in the peripheral region where ray R1 passes. An inflection point IP characterized by a local curvature C=0 is positioned between the convex section (around the optical axis) and the concave section (at the periphery). Although the local change of the sense of curvature obtained this way may be desirable from an optical point of view, inflection points are critical when the surface finishing is considered since a finishing tool (schematically shown as tool T in FIG. 33(b)) having a reasonable diameter for efficient surface polishing may have substantially non-uniform effect in the region around the inflection point. Therefore, sufficient optical quality of aspherical surfaces having inflection points is difficult to obtain.
These problems can be avoided if the aspherical surface has no inflection point. The projection objective 1800 shown in FIG. 34 (specification given in tables 34 and 34A) is designed such that none of the aspherical surfaces has an inflection point.
Another feature of aspheric surfaces identified by inventors as being critical from a manufacturing point of view is explained in connection with FIG. 35. The inventors have found that high optical quality of aspheric surfaces can be obtained if extremal points (minima or maxima) on the surface shape of an aspheric surface outside the optical axis are avoided or, if that is not possible, if extremal points are only used on aspheric surfaces having an essentially flat basic shape. In FIG. 35 the surface shapes of two aspheric surfaces AS1 and AS2 are shown schematically in terms of the function p(h), where p is measured parallel to the optical axis (z-direction) and h is the height of a surface point, where the height corresponds to the radial distance between a surface point and the optical axis. Parameter p, as used here, denotes the axial separation of a plane normal to the optical axis and intersecting the relevant surface point to a plane parallel thereto and touching the vertex V of the optical elements on the optical axis.
In that respect, an extremal point on an aspheric surface is characterized by the fact that the first derivative (characterizing the slope of the surface) given by




  
    
      d
      p
    
    
      d
      h
    
  
  =
  0




and that the second derivative





  
    
      
        d
        2
      
      ⁢
      p
    
    
      d
      
        h
        2
      
    
  
  ≠
  0




(here the second derivative describes the surface curvature). Therefore, the first asphere AS1 in FIG. 35 has a first extremal point EX11 and a second extremal point EX12 having opposite signs of the second derivative, whereas the second asphere AS2 has only one extremal point EX21. In the definitions used here the vertex V of the optical surface (where h=0) is excluded from the considerations, since the vertex always is an extremal point of rotational symmetric aspheric surfaces considered here.

In FIG. 35, the surface shape is depicted schematically between the optical axis (h=0) and the outer periphery of an area of the surface, which is finished with a tool e.g. by polishing. This finishing area is characterized by a maximum height hmax. The maximum area optically used in operation is generally smaller such that the optically utilized radius is characterized by a maximum value hopt<hmax. The area outside the optically used area between the edge of that area and the edge of the optical component is denoted overrun region OR. This area is normally used for mounting the optical elements. However, during manufacturing the overrun region has to be included into the consideration regarding an optimum surface shape.
In the following it will be explained why extremal points on aspheric surfaces may be critical if optimum surface quality is desired. To this end, a rotary polishing tool T having a reasonable sized diameter is operating in the region of the first extremal point EX11. Depending on the relative dimensions between the “valley” around the extremal point EX 11 and the tool T the area at the bottom of the concave valley may not to be polished sufficiently enough since the tool “bridges” the critical bottom area most of the time. Therefore, the surface quality in the extremal point region may be different from the surface quality of regions farther a way from the critical extremal point. On the other hand, if the extremal point corresponds to a convex “hill” on the aspheric surface, this area may be polished stronger than the surrounding area, which may also lead to irregularities of the surface quality in the extremal point region. These problems can be avoided if the aspheric surface has no extremal points (with the exception of the necessary extremal point at the vertex). Since the tool T will generally extend beyond the maximum optically used area (at hopt) when the peripheral region of the optically used area is treated, it is desirable that extremal points are avoided also in the edge region OR.
On the other hand, aspheric surfaces having extremal points may be desired to obtain certain variations of refractive power of an aspheric surface in meridonal direction. It has been found by the inventors that extremal points can be acceptable from a manufacturing point of view if the extremal point is present on an optical surface having an essentially flat basic shape. For example, the aspheric surface may be formed on a flat side of a plano convex or a plano concave lens or on a surface of a plane parallel plate. Preferably, the absolute value of the maximum z-variation (pmax) of such surfaces having an extremal point should not exceed 0.5 mm, more preferably should be smaller than 0.25 nm. The optical advantages of extremal points on aspheric surfaces can thus be obtained without significant irregularities in optical surface quality.
In FIG. 36 an embodiment of a projection objective 1900 is shown where all aspheric surfaces are free of extremal points outside the optical axis. The specification is given in tables 36 and 36A. If an aspherical surface with an extremal point should be desired, this should be formed on an optical surface having an essentially flat basic shape, typically having a long radius with |r|>2000 mm.
FIGS. 37 and 38 show embodiments of projection objectives 2000, 2100 designed according to the general construction given in FIG. 4, i.e. having a catoptric (purely reflective) second objective part 2020, 2120, respectively. Reference numerals for similar features/feature groups are similar, increased by 1800, 1900, respectively. The specifications are given in tables 37, 37A and 38, 38A. When designing these embodiments, special emphasis was placed on a balanced design having only few correcting means, such as aspheres, and a moderate number of lens elements. In addition, a balanced distribution of refractive power amongst different parts of the projection objective contributes to a harmonic beam deflection throughout the optical system. The harmonic general construction makes the designs less sensitive against maladjustment of single lens elements or lens groups and facilitates incorporation of manipulators for dynamically influencing the performance of the optical system, e.g. by moving of single lenses or lens groups in axial direction, perpendicular to the optical axis and/or by tilting.
In the embodiment of FIG. 37 only ten aspheric surfaces are used, which, according to the considerations given above, can be manufactured and tested in a relatively cost-effective way. The last optical element (piano-convex lens 2050 immediately ahead of the image plane 2002) is made of fused silica, having a thickness at the edge of the optical used area of about 23 mm. The overall wave front error is reduced to 1.6 mλ. All lenses are made of fused silica, about 60 kg blanc material of fused silica being necessary to make all lenses. In contrast, the plano-convex lens 2150 forming the last element of the embodiment of FIG. 38 is made of calcium fluoride, which material is less prone to radiation induced density variations (compaction and rarefaction). Using 12 aspheric surfaces which can be manufactured with moderate effort it is possible to obtain a performance characterized by a wave front error of 2.1 mλ. An overall blanc mass of about 63 kg fused silica and 1.5 kg calcium fluoride is used for this embodiment.
In FIGS. 39 and 40 two embodiments are shown which are characterized, amongst other features, by the fact that the first objective part imaging the object field into the first intermediate image is a catadioptric objective part including one concave mirror and one additional mirror having a curved mirror surface, where the curved mirror surfaces of the concave mirror and the additional mirror are facing each other such that the first objective part can serve as a relay system in projection objectives of preferred embodiments having one straight common optical axis for all objective parts.
The specification of the projection objective 2200 shown in FIG. 39 is given in table 39 and 39A (aspheric constants). The system is designed for 193 nm for using water (n=1.436677) as an immersion fluid. All lenses except the last image side optical element (plano-convex lens 2260 made of calcium fluoride) are made of fused silica. An image side numerical aperture NA=1.2 is obtained at an image field size 26 mm·5.5 mm arranged 21.8 mm outside the optical axis. The track length (object image distance) is 1125 mm.
A first, catadioptric objective part 2210 is designed for creating a first intermediate image 2203. The second, catadioptric objective part 2220 designed for creating the second intermediate image 2204 from the first intermediate image includes a first concave mirror 2221 and a second concave mirror 2222 having concave mirror surfaces facing each other and defining an intermirror space, and a positive meniscus lens 2229 having an aspheric, concave entrance surface immediately downstream of the first intermediate image. A dioptric third objective part 2230 is designed for imaging the second intermediate image onto the image plane 2202, whereby a thin layer of water (immersion fluid I) is transited by the radiation. An aperture stop A is positioned in the third objective part.
The first objective part 2210 includes, in that optical sequence from the object field, a biconvex positive lens 2211 having a strongly aspheric entrance surface and an aspheric exit surface, a positive meniscus lens 2212 having an aspheric concave entrance surface and a spherical exit surface, and a concave mirror 2213 having an object side concave mirror surface and being arranged eccentrically to the optical axis, but intersecting the optical axis 2205. The radiation reflected back from the concave mirror transits the positive meniscus 2212 in the opposite direction and mostly on the opposite side of the optical axis compared to the radiation passing between object field and concave mirror 2213. An additional mirror 2214 with convex mirror surface is provided by an off-axis mirror coating on the image side surface of convex lens 2211. The radiation passes the positive meniscus 2212 a third time prior to formation of the first intermediate image. Therefore, the lens 2212 is used three times at laterally offset lens regions.
Whereas concave mirror 2213 is positioned optically near a pupil surface, convex mirror 2214 is arranged optically near to the intermediate image 2203. Therefore, field aberrations and pupil aberrations can be corrected separately by selecting according shapes of the concave and convex mirrors 2213, 2214. This allows to adjust the correction status of the first intermediate image 2203 such that residual imaging errors can be compensated by the two objective parts following downstream of the first intermediate image including the catadioptric second objective part 2220.
The first objective part is designed as an enlarging system having a significant magnification |β1|>1. The first intermediate image 2203 is positioned geometrically near the closest edge of concave mirror 2213 outside the intermirror space defined between the concave mirrors 2221 and 2222 of the second objective part, whereby the optical distance between the first intermediate image and the first concave mirror 2221 becomes rather large, whereas the optical distance between the second concave mirror 2222 and the second intermediate image 2204 becomes rather small. Therefore, the sizes of the concave mirrors of the second objective part differ significantly, the optically used area of the first concave mirror being about twice as large as the corresponding area on the second concave mirror. Both concave mirrors 2221 and 2222 are positioned outside the optical axis such that the optical axis does not intersect the optically used mirror surfaces. Since the concave mirrors are positioned at different positions with regard to the ratio between the ray heights of principal ray and marginal ray, the correcting effects of the concave mirrors on different imaging errors can be distributed between the two catadioptric objective parts 2210 and 2220.
The projection objective 2300 shown in FIG. 40 is designed as a “solid immersion lens” having a finite image side working distance in the order of the design wavelength λ of the system (193 nm) or fractions thereof (e.g. λ/2 or λ/4 or below). Evanescent fields exiting from the exit surface of the last lens can be used for imaging. The system is adapted for optical near field lithography. Reference is made to German patent application DE 10332112.8 filed on Jul. 9, 2003 by the applicant, where preferred conditions for optical near field lithography are specified. No liquid immersion fluid is necessary in this case for obtaining an image side numerical aperture NA>1. In the embodiment NA=1.05 for a image field size 22 mm·4.5 mm, where the image field is arranged 39 mm off-axis. The overall reduction ratio is 1:4, the track length is 1294.4 mm. In this design, all lenses including the last, image side plano-convex lens 2360 are made of fused silica. The specification is given in tables 40 and 40A (aspheric constants).
The first, catadioptric objective part 2310 designed for creating the first intermediate image 2303 from the object field on an enlarged scale includes, in that sequence along the optical path, a biconvex positive lens 2311 having an aspheric entrance surface and a spherical exit surface, a concave mirror 2312, having an object side mirror surface, a convex mirror 2313 having slightly curved convex mirror surface facing the concave mirror and being formed by a mirror coating on an elevated section of the image side lens surface of lens 2311, a bispherical positive meniscus lens 2314 having a concave entry side, and a biconvex positive lens 2315 having a strongly aspheric exit surface positioned in the immediate vicinity of the first intermediate image 2303.
The second, catadioptric objective part 2320 picks up the first intermediate image 2303 and forms the second intermediate image 2304 located geometrically within an intermirror space defined by the first concave mirror 2321 and the second concave mirror 2322 of the second objective part. The second objective part further includes negative meniscus lenses 2325, 2326 each positioned immediately ahead of the mirror surface of an associated concave mirror 2321 and 2322, respectively. A strong correcting effect on longitudinal chromatic aberration (CHL) can be obtained this way. A biconvex positive lens 2328 having an object side aspheric surface and an image side spherical surface extents across the entire diameter of the projection objective between the first and second concave mirrors 2321, 2322 and is passed three times by the radiation, once between the first intermediate image and the first concave mirror, a second time between the first and the second concave mirrors 2321, 2322 and a third time between the second concave mirror 2322 and the second intermediate image 2304.
In this embodiment, all three concave mirrors 2312, 2321, 2322 are positioned optically remote from the pupil surface of the projection objective. Also, the almost flat convex mirror 2313 is positioned clearly outside the first pupil surface P1. The design allows to distribute the correcting effects of catadioptric objective parts between the first and the second objective part.
The invention allows to manufacture catadioptric projection objectives which, in many respects of practical implementation into a projection exposure apparatus, have similar properties to conventional refractive projection objectives, whereby a change over between refractive systems and catadioptric systems is greatly facilitated. Firstly, the invention allows to built catadioptric projection objectives having one straight (unfolded) optical axis. Further, an object field disposed on one side of the optical axis may be imaged into an image field disposed on the opposite side of the optical axis, i.e. the imaging is performed with “negative magnification”. Thirdly, the objectives can be designed to have isotropic magnification. Here, the term “isotropic magnification” refers to an image formation without “image flip”, i.e. without a change of chirality between object field and image field. With other words, features on the reticle described in a right handed coordinate system can be described in a similar right handed coordinate system in the image. The negative isotropic magnification is present in both x- and y-directions perpendicular to the optical axis. This allows to use the same type of reticles also used for imaging with refractive projection objectives. These features facilitate implementation of catadioptric projection objectives according to the invention in conventional exposure apparatus designed for refractive projection objectives since no major reconstructions are required, for example, at the reticle- and wafer-stages. Also, reticles designed for use with refractive projection objectives can in principle also be used with catadioptric projection objectives according to the invention. Considerable cost savings for the end user can be obtained this way.
As mentioned earlier, the invention allows to built catadioptric projection objectives with high numerical aperture, particularly allowing immersion lithography at numerical apertures NA>1, that can be built with relatively small amounts of optical material. The potential for small material consumption is demonstrated in the following considering parameters describing the fact that particularly compact projection objectives can be manufactured.
Generally, the dimensions of projection objectives tend to increase dramatically as the image side numerical aperture NA is increased. Empirically it has been found that the maximum lens diameter Dmax tends to increase stronger than linear with increase of NA according to Dmax ̃NAk, where k>1. A value k=2 is an approximation used for the purpose of this application. Further, it has been found that the maximum lens diameter Dmax increases in proportion to the image field size (represented by the image field height Y′). A linear dependency is assumed for the purpose of the application. Based on these considerations a first compactness parameter COMP1 is defined as:

COMP1=Dmax/(Y′·NA2).

It is evident that, for given values of image field height and numerical aperture, the first compaction parameter COMP1 should be as small as possible if a compact design is desired.
Considering the overall material consumption necessary for providing a projection objective, the absolute number of lenses, NL is also relevant. Typically, systems with a smaller number of lenses are preferred to systems with larger numbers of lenses. Therefore, a second compactness parameter COMP2 is defined as follows:

COMP2=COMP1·NL.

Again, small values for COMP2 are indicative of compact optical systems.
Further, projection objectives according to the invention have at least three objective parts for imaging an entry side field plane into an optically conjugate exit side field plane, where the imaging objective parts are concatenated at intermediate images. Typically, the number of lenses and the overall material necessary to build an projection objective will increase the higher the number NOP of imaging objective parts of the optical system is. It is desirable to keep the average number of lenses per objective part, NL/NOP, as small as possible. Therefore, a third compactness parameter COMP3 is defined as follows:

COMP3=COMP1·NL/NOP.

Again, projection objectives with low optical material consumption will be characterized by small values of COMP3.
Table 41 summarizes the values necessary to calculate the compactness parameters COMP1, COMP2, COMP3 and the respective values for these parameters for each of the systems presented with a specification table (the table number (corresponding to the same number of a figure) is given in column 1 of table 41). Therefore, in order to obtain a compact catadioptric projection objective having at least one concave mirror and at least three imaging objective parts (i.e. at least two intermediate images) at least one of the following conditions should be observed:

COMP1<11

Preferably COMP1<10.8, more preferably COMP1<10.4, even more preferably COMP1<10 should be observed.

COMP2<300

Preferably COMP2<280, more preferably COMP2<250, even more preferably COMP2<230 should be observed

COMP3<100

Preferably COMP3<90, more preferably COMP3<80, even more preferably COMP3<75 should be observed.
Table 41 shows that preferred embodiments according to the invention generally observe at least one of these conditions indicating that compact designs with moderate material consumption are obtained according to the design rules laid out in this specification.
If desired, various types of filling gases can be used to fill the empty spaces between the optical elements of the projection objectives. For example, air or nitrogen or helium can be used as filling gas depending or desired properties of the embodiment.
Favorable embodiments may be characterized by one or more of the following conditions. The first objective part is preferably designed as an enlarging system, preferably having a magnification β1 in the range 1<|β1|<2.5. This ensures low NA at the first intermediate image and helps to avoid vignetting problems. |β1| may be 1:1 or may be slightly smaller, e.g. 0.8≦|β1|≦1. The second objective part is preferably designed as a system having near to unit magnification, i.e. almost no magnification or reduction. Particularly, the second objective part may be designed as a system having a magnification β2 in the range 0.4<|β2|<1.5, more preferably in the range 0.8<|β2|<1.25 or in the range 0.9<|β2|<1.1. The third objective part preferably has a reducing magnification |β3|<1. The entire projection objective has a magnification β where β=β1·β2·β3. The second intermediate image may have a size larger than the image size.
Preferably, both the first intermediate image and the second intermediate image are located geometrically within the intermirror space between the first concave mirror and the second concave mirror. They may be located geometrically in a middle region centered around the midpoint between the two concave mirrors within the intermirror space between the first concave mirror and the second concave mirror, wherein the middle region extends in a space having an axial extension ≦90% of an axial distance between the vertices of the curvature surfaces of the first and second concave mirror.
If d is the distance on the optical axis between the two concave mirrors, d1 is the distance on the optical axis between the first intermediate image and the first concave mirror and d2 is the distance on the optical axis between the second concave mirror and the second intermediate image, then the relations: 0.5 d/2<d1<1.5 d/2 and 0.5 d/2<d2<1.5 d/2 are preferably satisfied. The distances mentioned above are to be measured along the optical axis, which may be folded. Preferably, a chief ray of the most off axial field point intersects the optical axis in the same described region between d/4 and 3d/4 between the two concave mirrors in the vicinity of the location of the first intermediate image. Pupil positions are then remote from mirrors.
It has been found useful to design the optical system such that at least one intermediate image, preferably all intermediate images are positioned such that there exists a finite minimum distance between the intermediate image and the next optical surface, which is a mirror surface in most embodiments. If a finite minimum distance is maintained it can be avoided that contaminations or faults on or in the optical surface are imaged sharply into the image plane such that the desired imaging of a pattern is disturbed. Preferably, the finite distance is selected depending on the numerical aperture of the radiation at the intermediate image such that a sub-aperture (footprint of a particular field point) of the radiation on the optical surface next to the intermediate image has a minimum diameter of at least 3 mm or at least 5 mm or at least 10 mm or at least 15 mm. It is obvious from the figures and tables that these conditions are easily met by most or all embodiments in relation to the distance between an intermediate image within the intermirror space and the mirror surface arranged optically nearest to the intermediate image. Embodiments having intermediate images arranged in the middle region between the concave mirrors are particularly well-natured in this respect.
All transparent optical components of the embodiments described above, with a possible exception at the last image side lens, which may be of calcium fluoride, are fabricated from the same material, namely fused silica (SiO2). However, other materials, in particular, crystalline alkaline earth metal fluoride materials, that are transparent at the working wavelength may also be used. At least one second material may also be employed in order to, for example, assist correction for chromatic aberration, if necessary. Of course, the benefits of the invention may also be utilized in the case of systems intended for use at other wavelengths, for example, at 248 nm or 157 nm.
Some or all conditions are met by some or all embodiments described above.
It is to be understood that all systems described above may be complete systems for forming a real image (e.g. on a wafer) from a real object. However, the systems may be used as partial systems of larger systems. For example, the “object” for a system mentioned above may be an image formed by an imaging system (relay system) upstream of the object plane. Likewise, the image formed by a system mentioned above may be used as the object for a system (relay system) downstream of the image plane.
The above description of the preferred embodiments has been given by way of example. From the disclosure given, those skilled in the art will not only understand the present invention and its attendant advantages, but will also find apparent various changes and modifications to the structures and methods disclosed. It is sought, therefore, to cover all changes and modifications as fall within the spirit and scope of the invention, as defined by the appended claims, and equivalents thereof.
The contents of all the claims is made part of this description by reference.







TABLE 4







J 205











Surface
Radius
Thickness
Material
1⁄2 Diam.














1
151.647118
39.665046
SIO2
86.120


2
−1368.552447
69.197177

85.246


3
158.992783
15.145647
SIO2
75.907


4
206.923841
38.570349

73.675


5
97.678872
40.014335
SIO2
69.070


6
−5437.460665
6.811056

64.924


7
138.801509
16.000000
SIO2
53.028


8
573.226631
49.296968

47.448


9
−57.862177
14.263643
SIO2
47.630


10
−84.936107
112.509668

57.274


11
−413.250477
39.459821
SIO2
106.087


12
−160.648303
5.882304

109.942


13
797.277933
34.177152
SIO2
115.560


14
−430.752073
244.699332

115.661


15
−199.609067
−204.699112
REFL
134.925


16
157.344690
246.319295
REFL
109.289


17
862.084499
22.994398
SIO2
70.571


18
−419.719089
18.726730

69.767


19
−150.816336
15.000000
SIO2
67.991


20
131.971848
26.143914

70.182


21
−1567.196375
19.813697
SIO2
72.656


22
−217.593380
44.615314

76.740


23
−2829.863046
39.782748
SIO2
103.845


24
−203.824432
1.000000

107.411


25
524.684787
25.000000
SIO2
114.960


26
902.564365
1.000000

115.451


27
530.781146
38.825378
SIO2
116.178


28
−473.210631
1.000000

116.066


29
0.000000
0.000000

113.556


30
322.948582
29.038119
SIO2
113.791


31
−2580.799702
1.000000

113.022


32
512.569763
30.174661
SIO2
110.876


33
−677.235877
1.000000

109.014


34
106.347684
68.066974
SIO2
90.295


35
−1474.944139
0.999719

77.627


36
54.296611
42.467148
CAF2
45.513


37
0.000000
3.000000
H2O
20.998
















TABLE 4A





Aspherical Constants





















SRF
2
3
8
12
15
16





K
0
0
0
0
0
0


C1
3.477033e−08
−6.813990e−09
3.966411e−07
4.439638e−09
1.447452e−08
4.549402e−08


C2
−4.731536e−13
−8.621629e−12
−4.007014e−12
1.686758e−13
2.261476e−13
−5.067161e−12


C3
2.796504e−17
−2.762099e−16
7.436146e−15
8.011815e−19
2.580774e−18
2.777252e−16


C4
−6.649516e−22
−9.615951e−21
1.520683e−18
9.201114e−22
1.377485e−22
−3.138154e−20


C5
−2.829603e−25
−5.726076e−24
−9.949722e−22
−4.382820e−26
−3.426657e−27
2.350745e−24


C6
1.815473e−29
3.251913e−28
7.293926e−25
1.782591e−30
1.279942e−31
−7.599030e−29





SRF
17
19
22
30
33
35





K
0
0
0
0
0
0


C1
1.523352e−07
1.162948e−07
−1.982157e−08
1.201912e−08
1.147736e−08
9.136462e−08


C2
−5.763168e−12
−6.089203e−13
−5.382822e−13
−1.705175e−13
4.202468e−13
−5.545932e−13


C3
7.475933e−17
−1.025185e−16
1.200748e−17
−8.926277e−17
−1.260714e−17
1.560631e−16


C4
6.617515e−20
2.192456e−20
−2.867314e−21
−4.435922e−21
−2.591704e−21
−3.601282e−20


C5
−2.264827e−24
−5.792211e−25
1.105789e−25
8.175482e−25
4.606100e−26
8.986671e−25


C6
−1.064596e−28
5.642674e−28
−3.023003e−31
−2.371799e−29
9.707119e−30
3.847941e−29
















TABLE 7







J 206











Surface
Radius
Thickness
Material
1⁄2 Diam.














1
0.000000
0.000000

76.473


2
196.748623
27.263207
SIO2
81.548


3
1380.478547
27.173549

81.569


4
148.118896
29.558580
SIO2
83.220


5
985.952509
45.383760

81.731


6
587.017766
26.742601
SIO2
74.752


7
−268.687626
5.952675

73.075


8
121.069967
20.000000
SIO2
59.416


9
338.972294
15.471207

55.151


10
123.398576
16.000000
SIO2
42.222


11
493.239196
38.514952

36.268


12
−56.743953
79.995013
SIO2
40.070


13
−98.465204
60.825433

74.618


14
−3097.977653
27.304241
SIO2
102.327


15
−295.526762
3.782338

104.658


16
271.693311
37.763865
SIO2
112.015


17
−3936.289483
25.000000

112.208


18
162.629416
202.628857

112.852


19
−195.636303
−202.628857
REFL
119.680


20
162.629416
202.628857
REFL
104.093


21
−195.636303
44.391294

76.907


22
−1229.055417
33.250147
SIO2
83.109


23
−160.024467
37.552215

84.448


24
−246.047659
15.000000
SIO2
74.951


25
134.897718
28.252914

72.042


26
−768.808515
15.000000
SIO2
73.163


27
−355.461110
71.356200

76.177


28
−3425.435334
32.788842
SIO2
102.647


29
−255.172254
10.903212

105.332


30
695.872359
30.470261
SIO2
110.205


31
−625.346253
9.352817

110.381


32
0.000000
−8.352817

108.884


33
329.990101
40.669818
SIO2
110.434


34
−427.546014
1.000000

110.052


35
158.678466
45.978153
SIO2
102.564


36
378.976619
1.000000

95.391


37
108.606008
71.612816
SIO2
81.775


38
526.305326
1.000000

54.478


39
52.236898
36.413852
CAF2
39.598


40
0.000000
3.000000
H2O
19.842
















TABLE 7A





Aspherical Constants





















SRF
4
11
15
18
19
22





K
0
0
0
0
0
0


C1
−6.330577e−08
3.463909e−07
1.324809e−08
−7.037790e−09
2.310646e−08
6.335247e−08


C2
−3.872322e−12
−2.533709e−11
2.103578e−13
−2.219032e−13
3.623856e−13
−1.090600e−11


C3
1.663761e−17
3.527218e−14
3.059213e−18
−7.410203e−18
5.711204e−18
2.432505e−16


C4
−2.340311e−20
−2.199769e−17
−5.028780e−23
−1.155705e−22
8.453421e−23
−1.490760e−21


C5
1.375334e−24
−1.507925e−21
1.624941e−26
−8.984707e−27
1.508061e−27
1.908731e−24


C6
−1.682943e−29
5.496658e−24
−6.281302e−31
−1.590542e−31
1.239941e−31
−1.282225e−28

















SRF
24
27
34
36
38







K
0
0
0
0
0



C1
3.536885e−08
8.583557e−08
2.169817e−08
−1.524001e−08
1.877887e−07



C2
9.732363e−12
3.629209e−12
−5.404878e−13
1.625696e−12
1.445239e−11



C3
−1.879646e−16
−8.012301e−17
5.551093e−17
−3.076521e−16
1.060456e−16



C4
1.841476e−20
5.223547e−20
−2.305595e−21
8.708326e−21
3.470869e−19



C5
−2.885890e−24
−9.160836e−24
4.260803e−26
4.665020e−25
−6.424228e−23



C6
2.916860e−28
1.028273e−27
−9.442220e−32
−2.136828e−29
1.397331e−26

















TABLE 8







J 201











Surface
Radius
Thickness
Material
1⁄2 Diam.














1
0.000000
0.000000

77.084


2
144.715774
34.413396
SIO2
85.539


3
1168.820838
42.714222

84.636


4
137.626538
26.913912
SIO2
78.160


5
231.768696
25.969904

74.133


6
−256.723584
9.491982
SIO2
73.679


7
−300.099619
24.637606

73.830


8
95.378233
35.795212
SIO2
66.319


9
2978.156744
6.137057

62.554


10
113.175934
18.340535
SIO2
50.838


11
791.566883
42.223464

45.085


12
−57.334745
47.676082
SIO2
42.772


13
−104.057645
85.668623

64.264


14
−747.828120
23.558823
SIO2
98.262


15
−237.780029
11.502675

100.729


16
466.711415
38.824036
SIO2
109.480


17
−377.473708
39.986102

109.791


18
160.832778
201.116223

111.102


19
−190.162844
−201.116223
REFL
125.335


20
160.832778
201.116223
REFL
106.939


21
−190.162844
40.087040

74.503


22
−429.676099
17.543012
SIO2
77.631


23
−222.069915
45.151970

78.588


24
−438.919401
16.685064
SIO2
75.545


25
125.893773
22.634903

73.362


26
706.231560
15.535140
SIO2
74.562


27
−483.323705
69.793709

76.473


28
−1219.864506
31.389217
SIO2
101.495


29
−226.588128
6.763552

104.174


30
443.080071
40.992305
SIO2
110.047


31
−556.882957
4.990520

109.849


32
0.000000
−3.144971

107.701


33
274.803577
29.023782
SIO2
108.934


34
−6968.358008
0.969032

108.499


35
213.748670
46.817088
SIO2
106.084


36
−8609.746220
0.945349

101.542


37
114.821261
64.641285
SIO2
84.961


38
−4598.248046
0.926317

66.788


39
53.647792
40.301900
CAF2
42.988


40
0.000000
3.000000
H2O
20.327
















TABLE 8A





Aspherical Constants





















SRF
4
11
15
18
19
22





K
0
0
0
0
0
0


C1
−5.141395e−08
4.483031e−07
1.313620e−08
−7.985633e−09
2.017668e−08
4.549402e−08


C2
−5.556822e−12
−9.959839e−12
3.644835e−13
−2.642498e−13
3.361249e−13
−5.067161e−12


C3
−2.754499e−16
5.082134e−15
5.949608e−18
−6.856089e−18
4.310554e−18
2.777252e−16


C4
−1.253113e−20
2.578467e−18
5.732895e−22
−5.142965e−22
1.686493e−22
−3.138154e−20


C5
−4.228497e−24
−3.461879e−21
−2.284813e−26
1.912150e−26
−3.551936e−27
2.350745e−24


C6
2.490029e−28
1.628794e−24
8.340263e−31
−1.470786e−30
2.057764e−31
−7.599030e−29

















SRF
24
27
33
36
38







K
0
0
0
0
0



C1
1.523352e−07
1.162948e−07
−1.982157e−08
1.201912e−08
1.148008e−07



C2
−5.763168e−12
−6.089203e−13
−5.382822e−13
−1.705175e−13
−5.056506e−13



C3
7.475933e−17
−1.025185e−16
1.200748e−17
−8.926277e−17
1.189381e−16



C4
6.617515e−20
2.192456e−20
−2.867314e−21
−4.435922e−21
−1.274117e−20



C5
−2.264827e−24
−5.792211e−25
1.105789e−25
8.175482e−25
−3.981271e−24



C6
−1.064596e−28
5.642674e−28
−3.023003e−31
−2.371799e−29
3.798968e−28

















TABLE 16





NA = 1.2, β = 0.25




















Field
a
b
c
WL
193.3 nm



26
5
4.75
SILUV
1.56049116






CAFUV
1.50110592






H2OV
1.4368















Surface
Radius
Thickness
Material
1⁄2Diam.
Type





0
0.000000000
31.999475127
AIR
65.000


1
133.894287787
14.995217082
SILUV
84.778


2
127.681095498
25.597460396
AIR
82.945


3
402.041163143
34.247197246
SILUV
84.808


4
−292.795248488
0.996612226
AIR
85.527


5
−865.792789804
19.686989978
SILUV
84.845


6
−194.300017249
0.997731584
AIR
84.746


7
166.499926718
34.205033740
SILUV
81.167


8
−3411.356708300
0.997606594
AIR
78.713


9
108.528463069
16.234112594
SILUV
67.657


10
101.654206518
13.668730583
AIR
60.671


11
161.992336120
14.997158671
SILUV
58.598


12
2789.766305580
83.396846659
AIR
54.555


13
−51.475183292
14.997760255
SILUV
49.489


14
−64.480378016
0.998543606
AIR
60.882


15
−523.449669764
57.729408261
SILUV
91.022


16
−124.018124564
0.995673329
AIR
97.756


17
213.269322132
24.422343766
SILUV
111.322


18
368.130596294
326.268973067
AIR
110.123


19
−161.615015336
14.998434538
SILUV
131.765


20
−312.345980956
31.430358591
AIR
153.714


21
−214.602996812
−31.430358591
AIR
155.986
REFL


22
−312.345980956
−14.998434538
SILUV
149.921


23
−161.615015336
−238.077915164
AIR
116.301


24
149.287132498
−14.998202246
SILUV
103.169


25
317.538289321
−33.202694396
AIR
133.495


26
186.422421298
33.202694396
AIR
137.843
REFL


27
317.538289321
14.998202246
SILUV
136.305


28
149.287132498
324.504871734
AIR
116.434


29
304.025895186
51.634530337
SILUV
102.695


30
−321.237280055
36.471806645
AIR
101.284


31
−141.718556476
14.999755253
SILUV
84.799


32
104.217593104
30.610688625
AIR
74.074


33
581.141203674
15.015591714
SILUV
75.850


34
−637.266899243
22.019923725
AIR
78.058


35
−222.755672262
20.582750922
SILUV
80.475


36
−149.492790226
0.999906680
AIR
84.782


37
260.619344057
25.604090348
SILUV
101.752


38
1033.029187190
30.684011762
AIR
102.212


39
181.295872049
62.489568781
SILUV
109.856


40
−319.175759184
1.032697080
AIR
108.616


41
0.000000000
24.649355928
AIR
99.183


42
241.322246262
26.360109939
SILUV
88.680


43
−555.614152728
2.010445644
AIR
85.697


44
77.526002487
41.372376482
SILUV
67.268


45
494.197664171
0.978420324
AIR
60.833


46
46.187199269
35.625423750
CAFUV
39.405


47
0.000000000
2.999559725
H2OV
20.942


48
0.000000000
0.000000000
AIR
16.250
















TABLE 16A





Aspherical Constants



















Surface
K
C1
C2
C3





3
0.00000000e+000
−8.36067621e−008
2.12798795e−011
−1.45207564e−015


6
0.00000000e+000
7.69835587e−008
2.07985891e−012
1.16482389e−016


7
0.00000000e+000
1.36850714e−007
−9.44752603e−012
−1.50977238e−016


12
0.00000000e+000
7.53715484e−007
−6.61209701e−011
4.22074183e−015


16
0.00000000e+000
−5.85261742e−008
7.70941737e−013
−1.40836094e−016


29
0.00000000e+000
9.56507182e−008
−2.16638529e−012
−1.23753850e−017


31
0.00000000e+000
1.85417093e−007
−2.24667567e−012
6.93769095e−017


34
0.00000000e+000
1.66095759e−007
2.43350203e−012
8.88822140e−017


39
0.00000000e+000
−3.25790615e−009
−2.00206347e−012
4.31870304e−017


42
0.00000000e+000
−5.33787564e−008
2.40117270e−012
3.20136118e−016


43
0.00000000e+000
1.13532739e−007
−5.93286761e−012
1.32296454e−015


45
0.00000000e+000
8.97031378e−008
2.47066509e−011
−2.77876411e−016













Surface
C4
C5
C6





3
7.63154357e−020
2.95348560e−024
−3.46561258e−028


6
−4.80737790e−021
5.59439946e−024
−1.29197249e−028


7
−5.84681939e−020
7.86623559e−024
−7.24516725e−028


12
−8.02992365e−019
−7.38686026e−022
1.22771230e−025


16
6.45911985e−021
−3.82872278e−025
4.17640461e−031


29
2.58232933e−022
−6.80943505e−025
3.02935682e−029


31
6.79498891e−020
−6.82812342e−024
2.20970580e−028


34
2.60945386e−020
−3.60666201e−024
5.36227764e−028


39
−2.48544823e−021
5.50166118e−026
−3.31463292e−031


42
9.55299044e−021
−9.27935397e−024
8.13460411e−028


43
−1.88960302e−019
1.04299856e−023
1.69382125e−028


45
−7.08589002e−019
1.20774587e−022
−7.67132589e−027
















TABLE 17





NA = 1.2, β = 0.25




















Field
a
b
c
WL
193.3 nm



26
5
4.75
SILUV
1.56049116






CAFUV
1.50110592






H2OV
1.4368















Surface
Radius
Thickness
Material
1⁄2Diam.
Type





0
0.000000000
31.997721704
AIR
65.000


1
579.464506139
20.317824521
SILUV
74.592


2
−577.479988552
0.999475036
AIR
75.821


3
2572.370914820
28.040565960
SILUV
76.612


4
243.390586919
11.985977074
AIR
79.119


5
500.676303821
43.989139515
SILUV
80.893


6
−155.064044118
21.184157632
AIR
82.707


7
1381.321630200
18.191562266
SILUV
75.159


8
−393.944847792
0.998449340
AIR
74.340


9
87.946501567
40.892320851
SILUV
65.550


10
99.239178252
25.553101192
AIR
52.382


11
209.138140913
15.063951314
SILUV
45.950


12
−601.200979555
66.005892131
AIR
42.845


13
−55.332841330
14.999477956
SILUV
50.547


14
−72.577526567
1.163693447
AIR
62.349


15
−346.873498438
34.446292165
SILUV
80.990


16
−150.420697383
2.645359711
AIR
86.680


17
611.326207207
44.474569849
SILUV
99.391


18
−228.818841769
265.128541011
AIR
100.925


19
−190.727371287
15.000448317
SILUV
108.586


20
−237.320724749
14.700965847
AIR
118.645


21
−194.872786703
−14.700965847
AIR
120.611
REFL


22
−237.320724749
−15.000448317
SILUV
116.199


23
−190.727371287
−195.428248584
AIR
100.830


24
190.727371287
−15.000448317
SILUV
104.448


25
237.320724749
−14.700965847
AIR
120.847


26
194.872786703
14.700965847
AIR
124.569
REFL


27
237.320724749
15.000448317
SILUV
122.685


28
190.727371287
266.167203345
AIR
111.392


29
315.808627637
45.375871773
SILUV
95.944


30
−367.849317765
64.350407265
AIR
94.229


31
−123.002265506
14.998717744
SILUV
70.954


32
113.714722161
32.318363032
AIR
68.389


33
−990.749351417
21.237444356
SILUV
71.838


34
−292.571717802
35.154029607
AIR
78.053


35
−18220.224013700
40.604404749
SILUV
103.420


36
−201.028020704
1.097799815
AIR
107.104


37
366.725287540
37.745092677
SILUV
119.548


38
−961.362776974
0.999856805
AIR
119.749


39
338.337923773
38.019811036
SILUV
118.590


40
−1026.771599840
−1.410077329
AIR
117.118


41
0.000000000
12.743520660
AIR
115.541


42
280.022380007
19.482737236
SILUV
110.210


43
1517.149279230
1.197846646
AIR
108.733


44
719.327066326
32.079810786
SILUV
107.695


45
−474.571764529
2.724748590
AIR
105.913


46
89.479992014
48.063302904
SILUV
75.467


47
364.001398221
2.359587817
AIR
64.121


48
52.126874613
39.040570663
CAFUV
42.333


49
0.000000000
2.999196815
H2OV
20.183


50
0.000000000
0.000000000
AIR
16.250
















TABLE 17A





Aspherical Constants



















Surface
K
C1
C2
C3





6
0.00000000e+000
−1.15035308e−009
6.18896918e−013
−4.28285081e−016


7
0.00000000e+000
−1.72652480e−008
−3.70258486e−014
−1.25882856e−015


12
0.00000000e+000
3.77928406e−007
1.46912216e−011
2.33469503e−015


16
0.00000000e+000
−6.96857458e−008
−2.84037647e−012
2.05085140e−017


19
0.00000000e+000
−2.08753341e−008
−3.76211193e−013
−1.18384407e−017


23
0.00000000e+000
−2.08753341e−008
−3.76211193e−013
−1.18384407e−017


24
0.00000000e+000
2.08753341e−008
3.76211193e−013
1.18384407e−017


28
0.00000000e+000
2.08753341e−008
3.76211193e−013
1.18384407e−017


29
0.00000000e+000
7.78624253e−008
−5.29798090e−013
3.91516327e−018


31
0.00000000e+000
4.28231334e−008
1.84180203e−011
2.69407820e−017


34
0.00000000e+000
1.06085944e−007
5.27851125e−012
1.44463148e−016


42
0.00000000e+000
−4.37269250e−008
−1.57509731e−012
8.65198568e−019


45
0.00000000e+000
−9.15770551e−009
−5.99358306e−014
−2.27293408e−016


47
0.00000000e+000
6.18789306e−008
2.40430885e−011
−5.44722370e−015













Surface
C4
C5
C6





6
4.88391880e−021
3.14518856e−024
−2.05304958e−028


7
1.13451047e−019
−1.35997879e−023
1.27061565e−027


12
−6.54678942e−018
3.46881149e−021
−5.35085168e−025


16
−1.26467485e−020
4.46161412e−025
−4.85676248e−029


19
−1.88960591e−021
1.06203954e−025
−5.85068978e−030


23
−1.88960591e−021
1.06203954e−025
−5.85068978e−030


24
1.88960591e−021
−1.06203954e−025
5.85068978e−030


28
1.88960591e−021
−1.06203954e−025
5.85068978e−030


29
−1.04724068e−020
6.70919693e−025
−2.39519868e−029


31
9.37813713e−020
−2.33189316e−023
9.94588095e−028


34
1.26175655e−020
−1.49657869e−024
2.33032636e−028


42
−3.26636505e−021
2.73829199e−025
2.06805365e−030


45
2.70272716e−020
−1.30446854e−024
3.13007511e−029


47
7.58602437e−019
−6.94042849e−023
2.94089737e−027
















TABLE 19





NA = 1.2, β = 0.25




















Field
a
b
c
WL
193.3 nm



26
4.5
4.75
SILUV
1.56049116






CAFUV
1.50110592






H2OV
1.4368















Surface
Radius
Thickness
Material
1⁄2Diam.
Type





0
0.000000000
31.999270282
AIR
65.000


1
161.244041962
14.998636035
SILUV
82.320


2
200.129661131
4.944776020
AIR
81.953


3
138.221863276
14.998396795
SILUV
85.474


4
156.496992798
50.903040817
AIR
83.945


5
−173.315527687
16.279875172
SILUV
84.438


6
−142.013268785
1.000634788
AIR
87.160


7
15501.649257700
32.544206280
SILUV
87.713


8
−158.845141838
0.999631849
AIR
89.436


9
91.597097363
67.410407247
SILUV
79.148


10
107.035143103
13.851994874
AIR
57.324


11
213.854334447
15.987143481
SILUV
54.995


12
−484.417010515
72.563101783
AIR
51.059


13
−54.334592127
14.997747797
SILUV
49.752


14
−68.072352503
0.998695446
AIR
60.236


15
−601.365655277
24.817582741
SILUV
80.082


16
−242.182339653
0.995504271
AIR
83.903


17
920.810751329
35.748197919
SILUV
91.860


18
−213.159366146
55.021374074
AIR
93.280


19
246.612722217
14.997702082
SILUV
89.716


20
222.836314969
195.136099792
AIR
86.935


21
−235.528678750
14.998801176
SILUV
123.772


22
−252.575360887
16.051090308
AIR
131.942


23
−208.057958857
−16.051090308
AIR
133.654
REFL


24
−252.575360887
−14.998801176
SILUV
128.868


25
−235.528678750
−195.136099792
AIR
114.227


26
222.836314969
−14.997702082
SILUV
106.191


27
246.612722217
−15.024807366
AIR
119.874


28
190.206428127
15.024807366
AIR
122.140
REFL


29
246.612722217
14.997702082
SILUV
120.950


30
222.836314969
195.136099792
AIR
111.677


31
−235.528678750
14.998801176
SILUV
83.094


32
−252.575360887
56.045936568
AIR
86.484


33
370.979663784
47.033021034
SILUV
99.224


34
−371.323272898
62.417517206
AIR
97.788


35
−121.118365852
14.999357361
SILUV
74.709


36
120.855315866
33.365820253
AIR
72.995


37
20779.359547400
24.110061836
SILUV
77.786


38
−269.244136428
16.073764059
AIR
83.845


39
−236.048531861
28.909364173
SILUV
86.677


40
−161.907128190
8.188854525
AIR
94.856


41
842.230350676
46.587674654
SILUV
117.052


42
−262.240874081
3.490322496
AIR
119.226


43
374.311200849
50.091253523
SILUV
123.021


44
−396.081152439
−8.144186891
AIR
122.235


45
0.000000000
9.143428258
AIR
118.495


46
290.815269675
69.706490303
SILUV
113.550


47
−465.439617778
0.998821533
AIR
106.611


48
84.362795313
48.231691787
SILUV
73.577


49
220.065022009
0.997153094
AIR
60.089


50
51.630320906
38.562324381
CAFUV
42.677


51
0.000000000
2.998760762
H2OV
20.925


52
0.000000000
0.000000000
AIR
16.250
















TABLE 19A





Aspherical Constants



















Surface
K
C1
C2
C3





6
0.00000000e+000
5.22123357e−008
8.58887551e−013
−4.54164064e−016


7
0.00000000e+000
−5.20183796e−008
−4.57191269e−012
−4.91479340e−016


12
0.00000000e+000
3.52517346e−007
2.85321977e−011
9.33189645e−017


16
0.00000000e+000
−1.19054499e−007
−6.17053971e−013
8.29918331e−017


20
0.00000000e+000
2.35880706e−008
1.10625664e−014
1.52718231e−017


21
0.00000000e+000
−1.93271271e−008
−1.21191457e−014
−9.08764375e−018


25
0.00000000e+000
−1.93271271e−008
−1.21191457e−014
−9.08764375e−018


26
0.00000000e+000
2.35880706e−008
1.10625664e−014
1.52718231e−017


30
0.00000000e+000
2.35880706e−008
1.10625664e−014
1.52718231e−017


31
0.00000000e+000
−1.93271271e−008
−1.21191457e−014
−9.08764375e−018


33
0.00000000e+000
1.34282593e−007
−1.85430392e−012
−4.26524890e−017


35
0.00000000e+000
−2.95757718e−009
1.59584067e−011
−3.65004253e−016


38
0.00000000e+000
1.44418264e−007
4.50598204e−012
−8.46201050e−019


46
0.00000000e+000
−1.03608598e−008
−1.39868032e−012
−2.06257372e−017


47
0.00000000e+000
−2.35449031e−008
6.28466297e−017
5.46615500e−020


49
0.00000000e+000
1.18378675e−007
2.25652288e−011
−6.89451988e−015













Surface
C4
C5
C6





6
1.80084384e−021
−1.27939182e−025
9.21858288e−029


7
3.70354199e−020
−2.59625588e−024
−9.35416883e−031


12
1.46216022e−018
1.35490801e−022
−4.07118530e−026


16
−1.92366012e−020
1.44946211e−024
−4.85055808e−029


20
4.13946988e−022
−1.55058201e−026
1.20806176e−030


21
−5.34976868e−023
−1.13872365e−027
−9.05434146e−032


25
−5.34976868e−023
−1.13872365e−027
−9.05434146e−032


26
4.13946988e−022
−1.55058201e−026
1.20806176e−030


30
4.13946988e−022
−1.55058201e−026
1.20806176e−030


31
−5.34976868e−023
−1.13872365e−027
−9.05434146e−032


33
2.28325758e−022
−3.90557972e−026
−2.65242779e−030


35
2.40761278e−019
−3.76176852e−023
1.70246167e−027


38
−5.19608735e−021
−2.54791026e−025
1.06081720e−028


46
−1.69652628e−021
1.44074754e−025
2.91395857e−030


47
5.71824030e−021
−4.38179150e−025
1.61431061e−029


49
1.27155044e−018
−1.75366514e−022
1.10664062e−026
















TABLE 20





NA = 1.2, β = 0.25




















Field
a
b
c
WL
193.3 nm



26
4.5
4.75
SILUV
1.56049116






CAFUV
1.50110592






H2OV
1.4368















Surface
Radius
Thickness
Material
1⁄2Diam.
Type





0
0.000000000
44.536474494
AIR
64.000


1
−145.614238159
20.028968251
SILUV
71.569


2
−106.712344272
3.165042254
AIR
75.720


3
−126.799930892
14.997327707
SILUV
77.371


4
−400.529009983
24.938975486
AIR
89.386


5
−153.978050679
32.035367034
SILUV
91.679


6
−113.485754514
3.962209737
AIR
96.767


7
481.661051100
51.626847869
SILUV
109.810


8
−218.069217303
0.986417498
AIR
110.501


9
95.461306806
78.518887093
SILUV
88.224


10
197.024903934
20.433893299
AIR
65.510


11
245.480984290
15.389927680
SILUV
50.234


12
208.931069399
52.005350380
AIR
39.571


13
−51.537539329
25.208829578
SILUV
43.896


14
−67.256773583
31.133045864
AIR
59.014


15
−353.059395237
33.742142302
SILUV
97.721


16
−152.100516860
1.776048462
AIR
102.828


17
−246.044785191
45.384512544
SILUV
109.125


18
−136.487212093
39.988466465
AIR
113.661


19
0.000000000
201.398483236
AIR
114.931


20
−233.811577421
14.982820253
SILUV
137.713


21
−370.567496646
37.810813405
AIR
153.233


22
−216.552824900
−37.810813405
AIR
155.425
REFL


23
−370.567496646
−14.982820253
SILUV
147.967


24
−233.811577421
−201.398483236
AIR
120.238


25
168.695670563
201.398483236
AIR
106.748
REFL


26
−233.811577421
14.982820253
SILUV
76.924


27
−370.567496646
37.810813405
AIR
81.451


28
0.000000000
40.022296005
AIR
92.209


29
241.209000864
59.448832101
SILUV
108.950


30
−367.385238353
16.411120649
AIR
108.057


31
357.895873274
15.315252659
SILUV
93.192


32
94.401040596
38.563342544
AIR
77.588


33
442.579628511
14.989394891
SILUV
78.610


34
12021.837327700
28.864129981
AIR
79.433


35
−191.074651244
21.063184315
SILUV
81.221


36
−155.506376055
9.229041305
AIR
86.157


37
185.464309512
44.606063412
SILUV
101.263


38
−1150.340708410
31.620758000
AIR
100.270


39
0.000000000
−0.000000330
AIR
92.899


40
134.597113443
29.097516432
SILUV
92.514


41
296.937234549
3.458534424
AIR
90.494


42
150.878027709
36.379168022
SILUV
87.171


43
−494.554249982
0.979230496
AIR
84.334


44
65.631220570
30.011852752
SILUV
57.267


45
126.706468270
0.934188028
AIR
49.586


46
43.426322889
31.956384174
CAFUV
36.843


47
0.000000000
2.999915964
H2OV
20.807


48
0.000000000
0.000000000
AIR
16.001
















TABLE 20A





Aspherical Constants



















Surface
K
C1
C2
C3





1
0.00000000e+000
−1.87990337e−008
−7.06178066e−012
−1.25139326e−015


6
0.00000000e+000
2.08430698e−009
3.65727833e−013
1.43149385e−018


7
0.00000000e+000
1.33126997e−008
−2.47997131e−012
3.62223701e−017


12
0.00000000e+000
6.92559246e−007
1.01811160e−010
4.16533262e−015


16
0.00000000e+000
1.26266812e−008
−7.60497043e−013
5.26322462e−017


20
0.00000000e+000
−2.84981575e−008
5.16388350e−013
−2.39579817e−017


24
0.00000000e+000
−2.84981575e−008
5.16388350e−013
−2.39579817e−017


26
0.00000000e+000
−2.84981575e−008
5.16388350e−013
−2.39579817e−017


29
0.00000000e+000
1.10496506e−007
−6.42644915e−012
2.43910073e−016


31
0.00000000e+000
−8.94334736e−008
5.51621746e−012
2.64317734e−016


34
0.00000000e+000
7.27650226e−008
5.05452869e−012
2.12206759e−016


42
0.00000000e+000
−5.69019750e−008
−3.78079018e−012
−3.58536429e−016


43
0.00000000e+000
3.85631053e−008
−1.96032685e−012
−4.18174469e−016


45
0.00000000e+000
1.32980535e−007
6.98357216e−011
−9.96688046e−015













Surface
C4
C5
C6





1
1.04002349e−019
1.61613724e−024
−2.08243603e−028


6
3.84125705e−021
−4.35918853e−025
5.89812982e−029


7
−3.52780013e−022
1.86263171e−025
−7.15398794e−030


12
2.76714831e−017
−1.56122873e−020
5.24368076e−024


16
1.50861183e−021
2.14471673e−025
2.66224210e−030


20
3.35275866e−022
−8.50016423e−028
−1.97442790e−031


24
3.35275866e−022
−8.50016423e−028
−1.97442790e−031


26
3.35275866e−022
−8.50016423e−028
−1.97442790e−031


29
−1.98759724e−020
8.00452148e−025
−9.31628471e−030


31
3.20019743e−020
−4.26422117e−024
1.50940276e−028


34
5.08829476e−020
−5.03622460e−024
7.39342220e−028


42
−4.25536201e−020
2.42006208e−024
1.84293028e−028


43
9.23637376e−020
−8.60875665e−024
4.05098414e−028


45
−3.10084571e−019
1.88265675e−022
−4.40640742e−026
















TABLE 21





NA = 1.2, β = 0.25




















Field
a
b
c
WL
193.3 nm



26
4.5
4.75
SILUV
1.56049116






CAFUV
1.50110592






H2OV
1.4368















Surface
Radius
Thickness
Material
1⁄2Diam.
Type





0
0.000000000
31.999392757
AIR
64.675


1
149.202932404
20.120662646
SILUV
82.837


2
233.357095260
1.010428853
AIR
82.195


3
172.529012606
14.999455624
SILUV
83.021


4
153.116811658
37.462782355
AIR
80.924


5
−385.292133909
24.003915576
SILUV
81.802


6
−189.041850576
1.014246919
AIR
84.223


7
−1521.447544300
27.529894754
SILUV
83.808


8
−150.691487200
0.999361796
AIR
85.384


9
89.238407847
56.953687562
SILUV
75.993


10
101.329520927
13.713067990
AIR
58.085


11
176.794820361
18.039991299
SILUV
55.978


12
−447.950790449
73.129977874
AIR
52.127


13
−57.595257960
16.299538518
SILUV
50.436


14
−83.036630542
0.999811850
AIR
64.360


15
−2287.430407510
44.210083628
SILUV
86.772


16
−147.632600397
0.998596167
AIR
92.132


17
−352.966686998
32.886671205
SILUV
97.464


18
−153.824954969
271.807415024
AIR
100.038


19
−238.525982305
14.998824247
SILUV
122.669


20
−315.714610405
19.998064817
AIR
131.899


21
−202.650261219
−19.998064817
AIR
131.917
REFL


22
−315.714610405
−14.998824247
SILUV
131.852


23
−238.525982305
−196.811186275
AIR
112.411


24
207.441141965
−14.998504935
SILUV
107.771


25
268.178120713
−19.998469851
AIR
124.363


26
193.196124575
19.998469851
AIR
127.679
REFL


27
268.178120713
14.998504935
SILUV
125.948


28
207.441141965
271.807924190
AIR
114.576


29
325.701461380
38.709870586
SILUV
92.964


30
−885.381927410
59.476563453
AIR
90.975


31
−123.867242183
18.110373017
SILUV
74.226


32
126.359054159
30.087671186
AIR
73.733


33
−16392.865249200
31.626040348
SILUV
77.090


34
−299.592698534
15.292623049
AIR
86.158


35
−296.842399050
24.895495087
SILUV
89.777


36
−163.748333285
8.131594074
AIR
94.529


37
675.259743609
47.908987883
SILUV
116.712


38
−263.915255162
1.054743285
AIR
118.641


39
356.010681144
47.536295502
SILUV
120.712


40
−435.299476405
3.543672029
AIR
119.727


41
0.000000000
10.346485925
AIR
112.597


42
256.262375445
67.382487780
SILUV
107.047


43
−454.037284452
0.998990981
AIR
99.451


44
84.434680547
36.424585989
SILUV
70.101


45
207.490725651
0.997139930
AIR
62.005


46
50.112836179
41.301883710
CAFUV
43.313


47
0.000000000
2.999011124
H2OV
20.878


48
0.000000000
0.000000000
AIR
16.169
















TABLE 21A





Aspherical Constants



















Surface
K
C1
C2
C3





6
0.00000000e+000
5.47357338e−008
1.50925239e−012
−1.14128005e−015


7
0.00000000e+000
−5.65236098e−008
−4.45251739e−012
−1.12368170e−015


12
0.00000000e+000
3.75669258e−007
2.00493160e−011
−1.57617930e−015


16
0.00000000e+000
−2.97247128e−008
−1.16246607e−013
1.91525676e−016


19
0.00000000e+000
−1.79930163e−008
−1.81456294e−014
−6.42956161e−018


23
0.00000000e+000
−1.79930163e−008
−1.81456294e−014
−6.42956161e−018


24
0.00000000e+000
1.41712563e−008
1.42766536e−013
5.35849443e−018


28
0.00000000e+000
1.41712563e−008
1.42766536e−013
5.35849443e−018


29
0.00000000e+000
1.42833387e−007
3.55808937e−014
−1.23227147e−017


31
0.00000000e+000
−1.51349602e−008
1.62092054e−011
−4.43234287e−016


34
0.00000000e+000
1.39181850e−007
3.36145772e−012
−4.99179521e−017


42
0.00000000e+000
−4.24593271e−009
−1.84016360e−012
−2.09008867e−017


43
0.00000000e+000
−1.75350671e−008
1.70435017e−014
1.85876255e−020


45
0.00000000e+000
4.03560215e−008
2.57831806e−011
−6.32742355e−015













Surface
C4
C5
C6





6
2.03745939e−022
−1.46491288e−024
3.18476009e−028


7
7.05334891e−020
−6.42608755e−024
4.64154513e−029


12
2.00775938e−018
−1.81218495e−022
1.59512857e−028


16
−5.42330199e−021
4.84113906e−025
−1.50564943e−030


19
−1.72138657e−022
4.34933124e−027
−2.46030547e−031


23
−1.72138657e−022
4.34933124e−027
−2.46030547e−031


24
5.30493751e−022
−2.04437497e−026
1.09297996e−030


28
5.30493751e−022
−2.04437497e−026
1.09297996e−030


29
1.26320560e−021
1.99476309e−025
−1.46884711e−029


31
2.01248512e−019
−3.73070267e−023
1.98749982e−027


34
−8.18195448e−021
4.05698527e−025
4.11589492e−029


42
−2.89704097e−021
1.96863338e−025
6.53807102e−030


43
6.37197338e−021
−5.19573140e−025
2.34597624e−029


45
9.55984243e−019
−1.13622236e−022
6.56644929e−027





















TABLE 22





Surface
Radius
Thickness
Material
1⁄2Diam.
Type




















0
0.000000000
31.993696817
AIR
65.000



1
0.000000000
−0.006216437
AIR
75.178


2
173.245898492
28.849219645
SILUV
80.701


3
−1901.645842520
1.159056366
AIR
81.186


4
139.958280577
17.383993593
SILUV
82.800


5
114.690720801
65.798932682
AIR
78.012


6
177.803002075
54.744184912
SILUV
88.979


7
−204.801382425
0.997356478
AIR
88.078


8
89.450127459
21.884550473
SILUV
62.734


9
143.066432170
15.678153833
AIR
57.180


10
−13433.891703300
15.000276693
SILUV
54.058


11
−8853.549440170
13.872934681
AIR
46.493


12
0.000000000
0.000000000
AIR
37.955


13
0.000000000
61.755398574
AIR
38.009


14
−66.760883146
14.994014816
SILUV
54.182


15
−72.012316741
23.617101147
AIR
60.909


16
−63.807677134
21.572901785
SILUV
62.830


17
−76.257505928
1.720678480
AIR
75.095


18
1299.192911670
55.482510512
SILUV
104.240


19
−148.321651349
39.989348698
AIR
106.312


20
0.000000000
232.380264110
AIR
95.929


21
−201.575622280
−232.380264110
AIR
121.585
REFL


22
199.702239038
232.380264110
AIR
118.875
REFL


23
0.000000000
39.986853275
AIR
91.439


24
162.499205332
44.748459237
SILUV
93.810


25
−2036.857320830
1.012661476
AIR
91.212


26
141.444403824
15.471017813
SILUV
77.784


27
167.499214725
41.441314042
AIR
72.833


28
−106.505215697
14.992253348
SILUV
70.530


29
98.946616742
44.625025386
AIR
64.458


30
−139.301063148
14.998444853
SILUV
66.132


31
−339.669887909
0.997145626
AIR
79.298


32
1356.020956420
23.905236106
SILUV
86.623


33
−340.109054698
5.477848077
AIR
90.957


34
472.296115575
52.138063579
SILUV
108.763


35
−222.876812950
8.808100307
AIR
112.258


36
2053.528638090
24.342755161
SILUV
119.824


37
−621.581254067
1.014456714
AIR
120.910


38
210.455448779
43.312493694
SILUV
124.650


39
−1489.901649750
5.393215295
AIR
124.077


40
210.646045010
47.972124824
SILUV
119.142


41
−627.180734089
0.998977914
AIR
117.607


42
97.515291800
53.409662718
SILUV
82.565


43
469.577208920
0.998603706
AIR
69.163


44
58.393704585
42.102914517
CAFUV
46.689


45
0.000000000
3.001333990
H2OV
20.956
















TABLE 22A





Aspherical Constants







Surface 2










K
0.0000



C1
−4.85507054e−008



C2
8.30450606e−013



C3
−6.55835562e−016



C4
6.07754089e−020



C5
−4.30736726e−024



C6
9.97068342e−029



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 5










K
0.0000



C1
4.63982284e−008



C2
−4.36308368e−016



C3
−4.56700150e−016



C4
1.41944231e−020



C5
−2.58792066e−024



C6
2.91613493e−032



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 6










K
0.0000



C1
7.93368538e−008



C2
−3.49340213e−012



C3
−3.72450023e−016



C4
−1.50853577e−020



C5
4.35840155e−024



C6
−1.74914218e−028



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 11










K
0.0000



C1
3.21277393e−007



C2
2.34047891e−012



C3
1.48915392e−014



C4
−1.12960188e−017



C5
3.70333100e−021



C6
−4.63366043e−025



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 19










K
0.0000



C1
1.27016347e−008



C2
4.09192710e−013



C3
2.48214285e−017



C4
9.66053244e−022



C5
1.60329104e−027



C6
2.07652380e−030



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 21










K
0.0000



C1
1.00526801e−008



C2
1.78849410e−013



C3
2.48862104e−018



C4
9.77481750e−023



C5
−3.23740664e−028



C6
6.28188299e−032



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 22










K
0.0000



C1
−8.36189868e−009



C2
−1.86708153e−013



C3
−3.35782535e−018



C4
−6.14811355e−023



C5
−6.72093224e−028



C6
−5.98449275e−032



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 24










K
0.0000



C1
3.26436925e−008



C2
9.95492740e−013



C3
3.47886760e−017



C4
6.60667009e−021



C5
−3.90366799e−025



C6
4.03156525e−029



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 28










K
0.0000



C1
1.73452145e−007



C2
9.62198511e−012



C3
8.33010916e−016



C4
−4.89738667e−020



C5
−2.08149618e−023



C6
2.57941116e−027



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 31










K
0.0000



C1
1.28849399e−007



C2
4.99181087e−012



C3
5.65181638e−017



C4
2.64289484e−020



C5
−3.15869403e−024



C6
−3.04781776e−029



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 34










K
0.0000



C1
−2.57944586e−008



C2
7.33527637e−013



C3
−5.33079171e−018



C4
−8.21688122e−022



C5
−2.94478649e−026



C6
2.23217522e−030



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 38










K
0.0000



C1
−1.91471943e−008



C2
−1.34589512e−012



C3
3.11852582e−017



C4
−2.35897615e−021



C5
6.73415544e−026



C6
1.62707757e−030



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 40










K
0.0000



C1
−6.30346424e−008



C2
−4.64729134e−013



C3
3.22359222e−017



C4
2.89305419e−023



C5
−2.15332629e−026



C6
8.39177392e−031



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 41










K
0.0000



C1
−2.41682461e−008



C2
1.18102559e−013



C3
−1.34037856e−016



C4
1.79602212e−020



C5
−8.86179442e−025



C6
1.89592509e−029



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 43










K
0.0000



C1
1.25460964e−007



C2
7.10922055e−012



C3
−1.61078694e−015



C4
1.49634597e−019



C5
−1.71885653e−023



C6
1.04621563e−027



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000




















TABLE 23







WL
193.3 nm
193.4 nm
193.2 nm


SILUV
1.560491
1.560332
1.560650


CAFUV
1.501106
1.501010
1.501202


H2OV
1.436800
1.436800
1.436800










Ymax = 64.675 mm; NA = 1.2












Surface
Radius
Thickness
Material
1⁄2Diam.
Type





0
0.000000000
32.343320391
AIR
64.675


1
0.000000000
0.319194773
AIR
74.840


2
165.502154849
22.393605178
SILUV
81.725


3
427.564472229
78.042155049
AIR
81.442


4
362.770694637
28.092832019
SILUV
88.424


5
−418.998032701
0.953143564
AIR
88.789


6
108.458706796
42.211528711
SILUV
85.410


7
309.813567338
43.976162585
AIR
80.542


8
440.563406352
17.425727560
SILUV
60.495


9
−278.343745406
54.725816031
AIR
56.963


10
−65.973394609
15.012675322
SILUV
50.057


11
−89.483928231
44.616098218
AIR
59.618


12
−164.547135387
29.271100213
SILUV
82.247


13
−110.100956635
0.995307980
AIR
86.942


14
−467.051029385
33.374516855
SILUV
94.291


15
−156.421752282
39.987151223
AIR
96.378


16
0.000000000
229.883694545
AIR
89.855


17
−196.922423263
−229.883694545
AIR
115.021
REFL


18
196.894790764
229.883694545
AIR
115.024
REFL


19
0.000000000
40.005209742
AIR
89.120


20
158.312187294
42.217660752
SILUV
95.332


21
2467.131056460
70.144222480
AIR
92.913


22
−160.335654972
14.992560808
SILUV
73.410


23
116.412074936
38.531709122
AIR
69.984


24
−250.712291671
18.369318291
SILUV
71.881


25
−300.079780156
31.051013458
AIR
80.817


26
5705.510103480
24.334610155
SILUV
107.710


27
−458.981124329
14.563800138
AIR
111.524


28
946.448274166
62.249192106
SILUV
126.621


29
−192.486608755
1.015402218
AIR
129.650


30
−4079.043797180
15.732935333
SILUV
130.993


31
−1100.089935780
14.595769901
AIR
131.283


32
0.000000000
0.000000000
AIR
130.790


33
0.000000000
−13.603116119
AIR
131.340


34
220.445900864
51.281950308
SILUV
133.878


35
−1597.683074300
5.271684397
AIR
133.124


36
215.527385603
15.522171709
SILUV
124.678


37
314.221642044
4.657196014
AIR
121.589


38
305.812344416
42.963421749
SILUV
120.269


39
−771.778612980
0.996840378
AIR
117.157


40
109.741348234
43.192990855
SILUV
84.698


41
708.633799886
6.161060319
AIR
76.900


42
66.404779509
39.130193750
CAFUV
46.929


43
0.000000000
2.999814914
H2OV
20.723


44
0.000000000
0.000000000
AIR
16.171
















TABLE 23A





Aspherical Constants







Surface 3










K
0.0000



C1
5.16435696e−008



C2
−3.34181067e−012



C3
3.14093710e−017



C4
−3.87421162e−022



C5
−8.61200118e−027



C6
−1.47089082e−029



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 4










K
0.0000



C1
9.50247881e−010



C2
−3.73319015e−012



C3
−6.51837734e−017



C4
−7.93160821e−021



C5
9.00091591e−025



C6
−1.92340271e−028



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 9










K
0.0000



C1
1.24922845e−007



C2
1.54187542e−011



C3
−3.69685941e−016



C4
1.37785719e−018



C5
−3.60351270e−022



C6
2.85480659e−026



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 13










K
0.0000



C1
1.45134700e−009



C2
1.24926632e−014



C3
8.37553299e−018



C4
2.49716672e−021



C5
−2.66380030e−025



C6
2.61815898e−029



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 17










K
0.0000



C1
9.25585261e−009



C2
1.67052938e−013



C3
2.68611580e−018



C4
1.04166910e−022



C5
−1.70724722e−027



C6
1.10260829e−031



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 18










K
0.0000



C1
−8.29620456e−009



C2
−1.78159419e−013



C3
−3.07128696e−018



C4
−8.08505340e−023



C5
2.33488811e−028



C6
−8.31087015e−032



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 20










K
0.0000



C1
1.71573479e−008



C2
5.87191967e−013



C3
3.53602344e−017



C4
3.89188764e−021



C5
−2.56256746e−025



C6
2.81528130e−029



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 22










K
0.0000



C1
−9.04880266e−009



C2
3.31829223e−012



C3
−7.82564703e−017



C4
7.87650776e−020



C5
−7.94502597e−024



C6
2.40943558e−027



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 25










K
0.0000



C1
1.11732794e−007



C2
5.01044308e−012



C3
1.82247821e−016



C4
2.99282347e−021



C5
−2.06723334e−024



C6
2.32093750e−029



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 28










K
0.0000



C1
−2.42933057e−008



C2
3.07041360e−014



C3
7.41003764e−018



C4
−5.26534391e−022



C5
1.17630052e−026



C6
−1.17982545e−031



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 34










K
0.0000



C1
−8.91439687e−009



C2
−7.33160527e−013



C3
−4.83885006e−018



C4
−2.37515306e−022



C5
2.33792040e−026



C6
−2.27854885e−032



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 36










K
0.0000



C1
−5.63334250e−008



C2
−3.26907281e−013



C3
9.72642980e−017



C4
4.30118073e−021



C5
−5.03894259e−025



C6
1.42974281e−029



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 39










K
0.0000



C1
−1.21454753e−008



C2
1.19750305e−012



C3
−6.39990660e−017



C4
4.10753453e−021



C5
−1.17680773e−025



C6
4.05203512e−030



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000







Surface 41










K
0.0000



C1
4.06678857e−008



C2
3.94505025e−012



C3
−2.03790398e−016



C4
2.07246865e−020



C5
−3.19577553e−024



C6
2.12601962e−028



C7
0.00000000e+000



C8
0.00000000e+000



C9
0.00000000e+000

















TABLE 27







(EM28)












Sur-




1⁄2 Diam-


face
Radius
Asphere
Thickness
Material
eter















1
0.000000

−0.028411
LUFTV193
76.078


2
148.374584
AS
30.141343
SIO2V
82.524


3
2980.684122

2.731918
N2VP950
82.907


4
177.363525

46.196958
SIO2V
84.542


5
765.980001
AS
27.096346
N2VP950
80.837


6
2666.335118

22.841301
SIO2V
73.658


7
−291.755432
AS
0.990907
N2VP950
70.887


8
230.707988

26.508915
SIO2V
65.013


9
−298.406132

21.906961
N2VP950
61.389


10
−112.314548

10.039397
SIO2V
45.510


11
−118.846218

2.540087
N2VP950
43.187


12
0.000000

0.000000
N2VP950
35.411


13
0.000000

18.000000
N2VP950
35.411


14
0.000000

10.013160
SIO2V
46.508


15
0.000000

0.991399
N2VP950
50.085


16
237.566392

20.385633
SIO2V
54.619


17
−476.646043

28.746587
N2VP950
57.184


18
−81.332740

10.129443
SIO2V
59.250


19
−86.414601

0.995700
N2VP950
63.535


20
−2069.485733
AS
30.115541
SIO2V
71.732


21
−141.210644

0.983397
N2VP950
74.255


22
962.252932
AS
9.980083
SIO2V
74.793


23
819.084531

36.977869
N2VP950
75.040


24
0.000000

198.944441
N2VP950
77.850


25
−167.595461
AS
−198.944441
REFL
139.680


26
167.595461
AS
198.944441
REFL
111.811


27
0.000000

36.992449
N2VP950
110.123


28
268.305681

49.624605
SIO2V
123.343


29
−828.322347
AS
47.027120
N2VP950
122.544


30
327.800199

39.684648
SIO2V
108.912


31
−1269.440044
AS
0.995014
N2VP950
106.029


32
331.950903

9.989996
SIO2V
93.089


33
95.290319

49.810064
N2VP950
76.973


34
−442.703787

9.991655
SIO2V
76.737


35
143.501616

20.229593
N2VP950
77.748


36
483.451705

9.993273
SIO2V
79.933


37
241.810075

15.546146
N2VP950
84.505


38
928.401379

29.795388
SIO2V
88.441


39
−298.259102
AS
8.829909
N2VP950
94.008


40
−1812.559641
AS
29.628322
SIO2V
101.744


41
−270.502936

7.417032
N2VP950
107.779


42
−7682.999744
AS
45.892645
SIO2V
118.999


43
−231.286706

27.404554
N2VP950
122.729


44
449.487156

46.556603
SIO2V
134.549


45
−668.069375

1.250913
N2VP950
134.857


46
886.959900
AS
43.269922
SIO2V
133.822


47
−295.612418

0.987420
N2VP950
133.749


48
230.112826

44.287713
SIO2V
112.987


49
−2356.132765
AS
0.978312
N2VP950
108.183


50
92.104165

41.465221
SIO2V
76.439


51
253.332614

1.131452
N2VP950
67.260


52
84.180015

39.033045
CAF2V193
50.611


53
0.000000

3.000000
H2OV193
21.082


54
0.000000

0.000000
AIR
16.500
















TABLE 27A





Aspherical Constants




















Surface
2
5
7
20
22





K
0
0
0
0
0


C1
−7.058653e−08
−1.114728e−07
1.398385e−07
−1.149358e−08
−5.629065e−08


C2
−2.984480e−12
4.526601e−12
−6.219606e−12
−6.065516e−12
1.905377e−12


C3
−1.303901e−16
1.421882e−16
3.410808e−16
6.763250e−16
−2.554160e−16


C4
−5.960748e−21
−1.154537e−19
3.575265e−20
−7.651964e−20
6.886775e−21


C5
−6.187687e−25
1.628794e−23
−2.900443e−23
5.689563e−24
−6.938594e−25


C6
8.668981e−29
−6.255900e−28
2.343745e−27
−2.312648e−28
−2.420574e−29


C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00





Surface
25
26
29
31
39





K
−2.31378
−2.31378
0
0
0


C1
−4.828221e−08
4.828221e−08
1.342570e−08
−9.018801e−08
3.278431e−08


C2
7.051572e−13
−7.051572e−13
−3.644532e−13
6.045342e−12
1.370822e−17


C3
−2.377185e−17
2.377185e−17
−2.375681e−18
−1.273791e−16
1.643036e−16


C4
6.284480e−22
−6.284480e−22
−3.970849e−22
−2.702171e−21
−2.021350e−20


C5
−1.385194e−26
1.385194e−26
−4.372813e−27
3.262226e−25
2.670722e−24


C6
1.514567e−31
−1.514567e−31
6.283103e−31
−6.948598e−30
−1.187217e−28


C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
















Surface
40
42
46
49







K
0
0
0
0



C1
−5.316551e−08
−1.954895e−09
−4.282391e−08
−3.095959e−08



C2
−7.707570e−14
5.606761e−14
−1.948121e−13
3.451241e−12



C3
2.146900e−16
−6.199304e−17
7.664802e−17
−1.219768e−16



C4
−2.184878e−20
3.478339e−21
−2.354982e−21
4.060098e−21



C5
2.255720e−24
−1.558932e−25
1.361973e−26
−9.053687e−26



C6
−9.545251e−29
4.899450e−30
2.019923e−31
1.610152e−30



C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00



C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00



C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00

















TABLE 28





(EM25)


















WL
193.368 nm
193.468 nm
193.268 nm


SIO2V′
1.5607857
1.56062813
1.56094365


CAF2V193′
1.50175423
1.50185255
1.50195109


H2OV193′
1.4364632
1.43667693
1.43689123










NA 1.2; Fmin = 18.63 mm; Fmax = 66 mm












Surface
Radius
Thickness
Material
1⁄2Diam.
Type





0
0.000000000
31.974939715
AIR
66.000


1
0.000000000
−0.024765663
AIR
76.143


2
148.940822391
31.463360093
SIO2V
83.171


3
6331.489300420
40.453855135
AIR
83.210


4
928.302406310
14.994423747
SIO2V
83.796


5
251.967918823
13.753137508
AIR
83.372


6
172.912005335
50.243372901
SIO2V
87.569


7
−197.856766081
1.000964332
AIR
86.631


8
81.522536296
17.681593406
SIO2V
65.574


9
88.327907526
30.256558951
AIR
60.047


10
117.551427452
18.843304175
SIO2V
50.042


11
855.507852453
8.921765220
AIR
45.493


12
0.000000000
0.000000000
AIR
37.552


13
0.000000000
49.799403498
AIR
37.641


14
−56.887108985
19.216557050
SIO2V
46.868


15
−153.952881762
0.978745522
AIR
66.363


16
−10783.364868000
53.980836551
SIO2V
79.120


17
−370.423261824
5.444267505
AIR
97.662


18
−1928.185768980
46.883883025
SIO2V
104.839


19
−156.534475362
0.983619441
AIR
108.499


20
−2025.935551520
37.434974978
SIO2V
114.116


21
−206.572644709
34.979106092
AIR
115.758


22
0.000000000
220.766423587
AIR
108.107


23
−187.624624543
−220.766423587
AIR
140.612
REFL


24
185.347836932
220.766423587
AIR
130.980
REFL


25
0.000000000
38.094302401
AIR
87.940


26
572.857393641
19.003060435
SIO2V
84.526


27
−2621.148115610
0.995124659
AIR
83.267


28
286.158521436
14.994640836
SIO2V
80.188


29
106.165691183
42.739053946
AIR
72.275


30
−269.972769063
14.994253287
SIO2V
72.751


31
217.103611286
19.468009312
AIR
79.551


32
49574.268497900
15.072135262
SIO2V
82.355


33
−1724.117745890
7.993795407
AIR
87.009


34
−681.152171807
39.742301517
SIO2V
89.501


35
−135.848489522
0.995182990
AIR
93.025


36
729.076676327
18.240313704
SIO2V
99.335


37
−1221.183105010
8.112527507
AIR
100.052


38
470.281491581
33.610782817
SIO2V
101.641


39
−393.774605114
34.640728842
AIR
101.306


40
−135.515968276
14.997016204
SIO2V
100.625


41
−242.973369762
0.998166637
AIR
109.176


42
629.218885691
33.238719341
SIO2V
114.327


43
−476.667589984
1.000069241
AIR
114.673


44
609.210504505
31.634185939
SIO2V
112.966


45
−463.558570174
0.991784251
AIR
112.249


46
181.331821629
26.489265851
SIO2V
99.538


47
478.467068575
0.985154964
AIR
96.400


48
166.964883598
32.619952496
SIO2V
90.254


49
34746.976265700
0.961982243
AIR
86.267


50
65.547601143
30.975153472
SIO2V
58.849


51
118.066733717
1.052010322
AIR
51.946


52
68.706870791
32.347686260
CAF2V193
43.646


53
0.000000000
3.000000148
H2OV193
21.134


54
0.000000000
0.000000000
AIR
16.501
















TABLE 28A





Aspherical Constants




















Surface
K
C1
C2
C3
C4





2
0.00000000e+000
−5.25595959e−008
−5.05125696e−014
−3.39834764e−016
1.43455947e−022


4
0.00000000e+000
−9.82547285e−009
−3.46617126e−012
4.26908111e−016
8.30046581e−021


7
0.00000000e+000
4.35702944e−008
3.07328355e−012
−6.64471080e−016
8.46058187e−020


11
0.00000000e+000
1.78059855e−008
−4.49918001e−011
−1.45873634e−015
−5.93868926e−020


15
0.00000000e+000
9.71039823e−009
−5.80809116e−012
1.66373755e−015
−6.79295769e−020


18
0.00000000e+000
−9.90188358e−009
−3.63667799e−012
4.39791888e−016
−4.05829074e−020


20
0.00000000e+000
−3.56668353e−008
1.04282881e−012
−3.79146258e−017
1.77203987e−021


23
−1.00000000e+000
0.00000000e+000
0.00000000e+000
0.00000000e+000
0.00000000e+000


24
0.00000000e+000
−4.12889632e−009
−9.85960529e−014
−2.94691200e−018
−3.56770055e−025


26
0.00000000e+000
2.84735678e−008
8.22076690e−013
8.98622393e−019
1.63369077e−020


36
0.00000000e+000
−3.45458233e−008
7.01690612e−013
2.53558597e−017
−2.32833922e−023


42
0.00000000e+000
6.80041144e−009
−3.73953529e−014
−4.59353922e−017
3.53253945e−021


47
0.00000000e+000
3.44340794e−008
8.40449554e−013
−3.72972761e−016
3.22089615e−020


49
0.00000000e+000
1.97298275e−008
2.76921584e−012
1.03703892e−016
−5.16050166e−020














Surface
C5
C6
C7
C8





2
5.23175535e−024
−1.25244222e−027
1.21805557e−031
−4.43910196e−036


4
−4.64399579e−024
1.19810111e−027
−1.78448775e−031
9.48653785e−036


7
−6.78485826e−024
2.18615691e−028
1.27733528e−032
−7.77343429e−037


11
2.10051516e−021
−2.86208035e−027
−1.14692199e−028
−9.07436019e−033


15
4.67315167e−024
1.33956477e−027
−1.86319592e−031
1.80116188e−036


18
3.14215669e−024
−1.78747424e−028
6.25454799e−033
−9.94933562e−038


20
−1.02830257e−025
1.63016234e−030
9.47579264e−035
−3.37443982e−039


23
0.00000000e+000
0.00000000e+000
0.00000000e+000
0.00000000e+000


24
−4.97425291e−027
1.63379520e−032
3.42393048e−036
−1.99876678e−040


26
−7.11352194e−024
7.18534327e−028
−1.59298542e−032
−4.89537949e−037


36
2.60044530e−026
−1.74079904e−030
−4.85763706e−034
2.78340967e−038


42
−9.74225973e−026
9.00308701e−031
0.00000000e+000
0.00000000e+000


47
−2.63108130e−024
2.07908763e−028
−7.57742152e−033
9.89130621e−038


49
8.50503256e−024
−9.50392825e−028
5.47302796e−032
−1.31141198e−036
















TABLE 30







(EM29)












Sur-




1⁄2 Diam-


face
Radius
Asphere
Thickness
Material
eter















1
0.000000

−0.000674
LV193975
75.450


2
501.388885
AS
15.700263
SIO2V
76.793


3
−2140.989756

1.030768
HEV19397
78.495


4
142.094518

41.139801
SIO2V
86.380


5
4509.859821
AS
48.031590
HEV19397
84.694


6
294.047825

42.018849
SIO2V
75.299


7
−284.632088
AS
0.899132
HEV19397
70.073


8
196.950986

32.325473
SIO2V
62.732


9
−427.997978
AS
24.031073
HEV19397
55.024


10
0.000000

0.000000
HEV19397
35.604


11
0.000000

17.973629
HEV19397
35.604


12
0.000000

9.999076
SIO2V
45.185


13
0.000000

34.757744
HEV19397
48.346


14
997.955935
AS
34.646365
SIO2V
67.618


15
−300.927832

15.875609
HEV19397
75.070


16
−346.766852
AS
31.454835
SIO2V
80.051


17
−123.279874

36.439684
HEV19397
83.364


18
0.000000

205.977742
HEV19397
86.638


19
−174.397052
AS
−205.977742
REFL
131.209


20
170.274411
AS
205.977742
REFL
116.516


21
0.000000

37.095745
HEV19397
97.388


22
437.401009

36.383480
SIO2V
104.301


23
−468.489757

45.906894
HEV19397
104.284


4
−1223.579996

21.742866
SIO2V
97.101


5
−511.114441
AS
8.072398
HEV19397
96.542


26
432.469418

10.004999
SIO2V
85.308


27
102.889104

42.520104
HEV19397
75.234


28
−594.379481

9.996510
SIO2V
75.720


29
174.356867

19.418323
HEV19397
79.411


30
715.897359

10.937733
SIO2V
82.556


31
324.211087

13.818484
HEV19397
88.129


32
1110.064311

30.443596
SIO2V
93.022


33
−264.206409
AS
7.862028
HEV19397
97.550


34
−1190.503106
AS
29.935994
SIO2V
104.823


35
−237.772522

11.246604
HEV19397
110.038


36
10331.864054
AS
39.860150
SIO2V
122.900


37
−277.281811

10.852741
HEV19397
125.931


38
214450.764260

31.052526
SIO2V
131.630


9
−428.573007

13.316274
HEV19397
132.643


40
751.599719

33.094141
SIO2V
133.007


41
−805.999226

1.057548
HEV19397
132.758


42
914.688148
AS
40.568688
SIO2V
130.742


43
−348.277386

0.878766
HEV19397
129.732


44
219.106958

38.836424
SIO2V
108.095


45
2357.913334
AS
1.971079
HEV19397
102.766


46
85.554437

39.388562
SIO2V
72.129


47
193.092045

0.892017
HEV19397
62.113


48
83.536468

37.250760
CAF2V193
49.390


49
0.000000

0.300000
SIO2V
21.410


50
0.000000

0.000000
SIO2V
21.050


51
0.000000

3.000000
H2OV193B
21.050


52
0.000000

0.000000
AIR
16.500
















TABLE 30A





Aspherical Constants




















Surface
2
5
7
9
14





K
0
0
0
1.84398
0


C1
−4.426813e−08
−2.968289e−08
1.574555e−07
1.174665e−07
−3.306265e−08


C2
−6.238723e−13
5.914537e−12
−1.371133e−11
5.249946e−12
−1.008549e−12


C3
5.3730270−21
−2.636410e−17
7.979944e−16
0.000000e+00
−2.352647e−16


C4
5.520432e−21
−2.348783e−20
−1.733518e−21
0.000000e+00
2.617179e−25


C5
−4.165047e−25
1.589258e−24
−1.045941e−23
0.000000e+00
−1.275061e−24


C6
−2.539882e−29
−3.710160e−29
1.048551e−27
0.000000e+00
7.076571e−29


C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00





Surface
16
19
20
25
33





K
0
−2.01302
−2.06565
0
0


C1
−4.975918e−08
−3.276866e−08
4.322230e−08
−1.196195e−07
2.211028e−08


C2
1.193440e−12
3.671721e−13
−3.203678e−13
6.474093e−12
7.931065e−13


C3
−3.326252e−18
−8.127219e−18
1.331133e−17
−2.172807e−16
2.746964e−17


C4
5.194442e−21
1.823894e−22
−2.254203e−22
5.562468e−21
−3.773718e−21


C5
7.844572e−25
−2.990635e−27
4.731338e−27
4.566785e−26
8.556577e−25


C6
−3.910445e−29
4.402752e−32
−3.185999e−32
−6.729599e−30
−5.193468e−29


C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
















Surface
34
36
42
45







K
0
0
0
0



C1
−6.109386e−08
−2.940384e−09
−3.072861e−08
−4.317432e−08



C2
1.186926e−12
−1.302883e−13
1.225198e−13
5.093533e−12



C3
9.338913e−17
−7.457684e−17
6.438064e−17
−2.542515e−16



C4
−8.049754e−21
4.922730e−21
−2.717739e−21
1.185033e−20



C5
7.964565e−25
−1.822077e−25
3.936453e−26
−3.870604e−25



C6
−3.877045e−29
3.491116e−30
−1.518766e−31
7.346646e−30



C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00



C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00



C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00

















TABLE 31







(EM29)












Sur-




1⁄2 Diam-


face
Radius
Asphere
Thickness
Material
eter















1
0.000000

−0.012399
LV193975
75.472


2
154.966472
AS
24.304901
SIO2V
82.008


3
529.820026

2.090993
HEV19397
82.074


4
150.769271

40.595812
SIO2V
84.201


5
5646.002857

29.581615
HEV19397
81.519


6
−1210.857565

22.741810
SIO2V
74.381


7
−182.994045
AS
34.025994
HEV19397
72.364


8
173.187773

25.484337
SIO2V
52.132


9
−296.185557

22.382287
HEV19397
47.253


10
0.000000

10.110510
SIO2V
44.035


11
0.000000

17.152556
HEV19397
46.863


12
51884.400557
AS
16.631540
SIO2V
54.537


13
−361.923018

63.995754
HEV19397
58.291


14
−878.387785
AS
34.625490
SIO2V
82.453


15
−136.078636

36.436642
HEV19397
85.494


16
0.000000

196.253966
HEV19397
89.191


17
−182.153238
AS
−196.253966
REFL
149.252


18
150.956725
AS
196.253966
REFL
101.676


19
0.000000

36.446112
HEV19397
104.396


20
333.439228

55.820683
SIO2V
116.602


21
−309.405465

37.869545
HEV19397
116.527


22
−424.165104

20.518575
SIO2V
104.186


23
−285.104268
AS
0.896321
HEV19397
103.405


24
635.351851

9.997637
SIO2V
92.108


25
107.969149

40.308038
HEV19397
80.454


26
389.814743

9.996225
SIO2V
82.006


27
152.951561

26.349381
HEV19397
81.938


28
1310.914891

9.999638
SIO2V
84.278


29
275.521100

17.511021
HEV19397
89.677


30
1763.795762

26.773314
SIO2V
93.617


31
−289.165601
AS
9.639413
HEV19397
97.853


32
−1578.752955
AS
27.680692
SIO2V
106.237


33
−272.338400

9.732573
HEV19397
110.951


34
−3842.769867
AS
35.516033
SIO2V
122.549


35
−314.937511

28.595034
HEV19397
125.359


36
889.868029

47.614171
SIO2V
135.827


37
−355.067891

−12.204373
HEV19397
136.279


38
0.000000

0.000000
HEV19397
133.729


39
0.000000

28.717983
HEV19397
133.729


40
574.174423
AS
45.539693
SIO2V
132.500


41
−344.516223

0.852315
HEV19397
132.025


42
204.978326

45.863613
SIO2V
111.958


43
−6283.361425
AS
0.828469
HEV19397
106.831


44
87.555579

40.313564
SIO2V
74.022


45
201.419511

0.722913
HEV19397
64.044


46
86.647656

38.420734
CAF2V193
50.908


47
0.000000

0.300000
SIO2V
21.485


48
0.000000

0.000000
SIO2V
21.121


49
0.000000

3.000000
H2OV193B
21.121


50
0.000000

0.000000
AIR
16.500
















TABLE 31A





Aspherical Constants





















Surface
2
7
12
14
17
18





K
0
0
0
0
−205.145
−19.986


C1
−5.06E−02
1.55E−01
−6.58E−02
−3.99E−02
−3.00E−02
5.81E−02


C2
−1.36E−06
−4.50E−06
6.94E−07
7.46E−07
3.06E−07
−5.04E−07


C3
−1.39E−10
2.86E−10
−8.42E−10
−4.18E−11
−7.06E−12
2.61E−11


C4
2.02E−14
3.18E−14
3.01E−14
−4.94E−18
1.35E−16
−5.07E−16


C5
−1.21E−18
−4.70E−18
9.27E−20
2.51E−19
−2.46E−21
1.40E−20


C6
7.59E−23
2.24E−22
−5.52E−22
−2.26E−23
2.42E−26
−4.71E−26


C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


















Surface
23
31
32
34
40
43







K
0
0
0
0
0
0



C1
−5.44E−02
2.45E−02
−6.17E−02
2.25E−02
−3.76E−02
−2.60E−02



C2
5.13E−06
5.17E−07
1.84E−06
−1.23E−06
7.18E−08
3.27E−06



C3
−2.58E−10
4.76E−11
9.77E−11
−5.97E−11
5.92E−11
−1.25E−10



C4
1.19E−14
−1.55E−15
−8.36E−15
6.09E−15
−1.80E−15
4.09E−15



C5
−3.68E−19
8.15E−19
8.28E−19
−2.59E−19
7.98E−21
−8.18E−20



C6
5.92E−24
−4.46E−23
−3.91E−23
5.18E−24
1.92E−25
8.62E−25



C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00



C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00



C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00

















TABLE 32







(EM29)












Sur-




1⁄2 Diam-


face
Radius
Asphere
Thickness
Material
eter















1
0.000000

−0.011620
LV193975
75.462


2
585.070331
AS
17.118596
SIO2V
76.447


3
−766.901651

0.890161
HEV19397
78.252


4
145.560665

45.675278
SIO2V
85.645


5
2818.543789
AS
40.269525
HEV19397
83.237


6
469.396236

29.972759
SIO2V
75.894


7
−193.297708
AS
21.997025
HEV19397
73.717


8
222.509238

27.666963
SIO2V
57.818


9
−274.231957

31.483375
HEV19397
52.595


10
0.000000

10.117766
SIO2V
44.115


11
0.000000

15.361487
HEV19397
47.050


12
26971.109897
AS
14.803554
SIO2V
54.127


13
−562.070426

45.416373
HEV19397
58.058


14
−510.104298
AS
35.926312
SIO2V
76.585


15
−118.683707

36.432152
HEV19397
80.636


16
0.000000

199.241665
HEV19397
86.561


17
−181.080772
AS
−199.241665
REFL
147.684


18
153.434246
AS
199.241665
REFL
102.596


19
0.000000

36.432584
HEV19397
105.850


20
408.244008

54.279598
SIO2V
118.053


21
−296.362521

34.669451
HEV19397
118.398


22
−1378.452784

22.782283
SIO2V
106.566


23
−533.252331
AS
0.892985
HEV19397
105.292


24
247.380841

9.992727
SIO2V
92.481


25
103.088603

45.957039
HEV19397
80.536


26
−1832.351074

9.992069
SIO2V
80.563


27
151.452362

28.883857
HEV19397
81.238


28
693.739003

11.559320
SIO2V
86.714


29
303.301679

15.104783
HEV19397
91.779


30
1016.426625

30.905849
SIO2V
95.900


31
−258.080954
AS
10.647394
HEV19397
99.790


32
−1386.614747
AS
24.903261
SIO2V
108.140


33
−305.810572

14.249112
HEV19397
112.465


34
−11755.656826
AS
32.472684
SIO2V
124.075


35
−359.229865

16.650084
HEV19397
126.831


36
1581.896158

51.095339
SIO2V
135.151


37
−290.829022

−5.686977
HEV19397
136.116


38
0.000000

0.000000
HEV19397
131.224


39
0.000000

28.354383
HEV19397
131.224


40
524.037274
AS
45.835992
SIO2V
130.144


41
−348.286331

0.878010
HEV19397
129.553


42
184.730622

45.614622
SIO2V
108.838


43
2501.302312
AS
0.854125
HEV19397
103.388


44
89.832394

38.416586
SIO2V
73.676


45
209.429378

0.697559
HEV19397
63.921


46
83.525032

37.916651
CAF2V193
50.040


47
0.000000

0.300000
SIO2V
21.480


48
0.000000

0.000000
SIO2V
21.116


49
0.000000

3.000000
H2OV193B
21.116


50
0.000000

0.000000
AIR
16.500
















TABLE 32A





Aspherical Constants




















Surface
2
5
7
12
14





K
0
0
0
0
0


C1
−5.72E−02
−4.71E−02
1.75E−01
−8.29E−02
−4.35E−02


C2
−2.97E−07
7.04E−06
−1.17E−05
−1.87E−07
1.59E−06


C3
1.03E−12
1.09E−10
1.34E−09
−7.04E−10
−6.81E−11


C4
2.76E−14
−2.90E−14
−5.44E−14
6.65E−14
5.03E−15


C5
−1.51E−18
−1.55E−21
−1.82E−18
−1.33E−17
−1.68E−23


C6
−1.04E−24
5.61E−23
2.56E−22
2.46E−21
−2.36E−23


C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00















Surface
17
18
23
31
32





K
−197.849
−204.054
0
0
0


C1
−2.94E−02
5.77E−02
−7.06E−02
3.41E−02
−4.85E−02


C2
2.63E−07
−5.00E−07
4.11E−06
4.07E−08
9.88E−07


C3
−6.11E−12
2.67E−11
−1.18E−10
8.10E−11
7.37E−11


C4
1.11E−16
−5.69E−16
2.92E−15
−4.34E−15
−6.56E−15


C5
−2.01E−21
1.89E−20
−3.23E−20
7.59E−19
6.53E−19


C6
2.08E−26
−1.49E−25
2.18E−25
−3.41E−23
−2.88E−23


C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00















Surface
34
40
43







K
0
0
0



C1
1.59E−02
−4.10E−02
−3.89E−02



C2
−1.51E−06
3.04E−07
4.76E−06



C3
6.62E−13
5.71E−11
−2.23E−10



C4
1.72E−15
−1.72E−15
8.89E−15



C5
−9.36E−20
−9.60E−22
−2.41E−19



C6
2.36E−24
3.81E−25
3.43E−24



C7
0.000000e+00
0.000000e+00
0.000000e+00



C8
0.000000e+00
0.000000e+00
0.000000e+00



C9
0.000000e+00
0.000000e+00
0.000000e+00

















TABLE 34





(EM26)


















WL
193.368 nm
193.468 nm
193.268 nm


SIO2V′
1.5607857
1.56062813
1.56094365


CAF2V193′
1.50175423
1.50185255
1.50195109


H2OV193′
1.4364632
1.43667693
1.43689123










NA 1.2; Fmin = 18.63 mm; Fmax = 66 mm












Surface
Radius
Thickness
Material
1⁄2Diam.
Type





0
0.000000000
31.982585487
AIR
66.000


1
0.000000000
−0.017071913
AIR
76.172


2
147.976296433
25.157601132
SIO2V
83.329


3
483.267348199
66.318217434
AIR
83.329


4
6843.187124890
14.990603080
SIO2V
89.462


5
−10922.857227200
0.990910304
AIR
89.696


6
185.444884732
43.423576628
SIO2V
90.336


7
−291.453552095
0.988388071
AIR
88.691


8
75.552245567
18.214694705
SIO2V
66.883


9
76.794787833
36.638500036
AIR
60.819


10
119.890093734
18.824651829
SIO2V
50.527


11
1688.559592410
8.584817314
AIR
45.933


12
0.000000000
0.000000000
AIR
38.451


13
0.000000000
52.042672045
AIR
38.545


14
−59.826650342
14.981853380
SIO2V
48.449


15
−143.442731652
0.981820223
AIR
65.183


16
−809.267677971
22.623991877
SIO2V
74.792


17
−189.427877067
23.734179117
AIR
79.164


18
−404.048228936
40.321323389
SIO2V
94.462


19
−133.255827443
0.996126038
AIR
98.239


20
−532.626067795
25.229572964
SIO2V
102.508


21
−218.631437997
34.992902498
AIR
104.152


22
0.000000000
232.569743258
AIR
102.146


23
−203.850853866
−232.569743258
AIR
154.862
REFL


24
180.897913619
232.569743258
AIR
125.795
REFL


25
0.000000000
35.093353727
AIR
89.945


26
−2097.871590640
18.902530877
SIO2V
88.318


27
−311.592066935
1.000926290
AIR
88.349


28
197.040247642
14.994864591
SIO2V
82.980


29
123.794489384
39.397144698
AIR
76.695


30
−351.625590566
14.996140251
SIO2V
76.667


31
194.519969585
25.840876165
AIR
79.734


32
−783.090311926
14.999335864
SIO2V
81.725


33
602.209892650
15.636785753
AIR
89.884


34
−860.877333066
40.308090334
SIO2V
92.572


35
−144.751331394
0.995503627
AIR
96.367


36
489.496864563
22.261422840
SIO2V
107.265


37
−1492.086252490
0.998123009
AIR
108.225


38
542.517785037
42.667711177
SIO2V
110.092


39
−278.956019182
30.784648856
AIR
110.074


40
−143.206504187
16.457194925
SIO2V
109.358


41
−245.275186574
0.991006459
AIR
118.513


42
450.076146500
56.637715430
SIO2V
124.493


43
−281.238265383
0.994417156
AIR
124.569


44
173.286659802
30.025805518
SIO2V
105.228


45
405.488019133
4.969943131
AIR
101.974


46
170.349078374
38.966672867
SIO2V
93.740


47
78634.784391100
0.980473718
AIR
86.875


48
65.899645851
30.022369482
SIO2V
58.766


49
115.328388498
0.871701885
AIR
51.820


50
70.957276330
32.640666401
CAF2V193
44.305


51
0.000000000
3.000000148
H2OV193
21.157


52
0.000000000
0.000000000
AIR
16.500
















TABLE 34A





Aspherical Constants




















Surface
K
C1
C2
C3
C4





2
0.00000000e+000
−4.78882631e−008
−1.07874702e−012
−3.02679637e−016
1.88733824e−020


4
0.00000000e+000
6.93936013e−009
4.14547565e−012
−2.44188432e−016
3.37511708e−020


7
0.00000000e+000
2.35987002e−008
8.31924580e−012
−7.77774842e−016
6.50303307e−021


11
0.00000000e+000
1.26922184e−007
−4.36848744e−011
4.57206313e−015
1.74083492e−018


15
0.00000000e+000
7.93042774e−008
−2.07633723e−013
3.76353009e−016
7.36365299e−020


18
0.00000000e+000
−1.97913247e−009
−8.66959877e−013
6.04641277e−017
−4.73473989e−021


20
0.00000000e+000
−5.08811298e−009
−3.02758381e−013
−6.93452917e−018
3.42662757e−022


23
0.00000000e+000
9.00942854e−009
1.77368463e−013
2.86086903e−018
5.71387977e−023


24
0.00000000e+000
−6.79867230e−009
−1.66279668e−013
−3.17226607e−018
−2.14919508e−022


26
0.00000000e+000
−5.37053896e−008
1.67618239e−012
4.07995560e−016
−3.53050500e−020


36
0.00000000e+000
−3.31965207e−008
6.14833787e−013
2.40373774e−017
1.18984531e−022


41
0.00000000e+000
−1.38336514e−008
8.93474375e−013
−2.71551009e−017
1.74375713e−021


45
0.00000000e+000
1.44983141e−008
−1.95881989e−014
−1.05859436e−016
5.32744894e−021


47
0.00000000e+000
3.11232761e−008
2.84716248e−012
−1.11706969e−016
−2.66038924e−021














Surface
C5
C6
C7
C8





2
−4.39149695e−025
−1.09132516e−028
−1.04998811e−035
7.96689244e−037


4
−5.06638092e−024
5.32303197e−028
−2.85457308e−032
3.58175757e−038


7
3.23059366e−024
−1.16477659e−030
−4.43574135e−032
2.44981381e−036


11
−1.38306535e−022
2.43454067e−025
−8.52163913e−029
1.77790237e−034


15
−4.68407947e−024
8.91865260e−029
8.87815151e−032
−8.32251546e−036


18
1.77442213e−025
4.52110292e−031
−2.53815340e−035
−4.30166930e−039


20
−9.21678831e−028
−3.68127185e−033
1.89749139e−038
−4.16625182e−039


23
−4.46902171e−028
1.13482418e−031
−3.89411163e−036
7.97497644e−041


24
1.19742697e−026
−1.09727605e−030
4.00797914e−035
−7.95846450e−040


26
9.00535444e−025
−3.46673523e−029
−6.86798043e−033
5.92310794e−037


36
−9.53667910e−026
4.93885674e−030
−2.90808572e−034
1.22198832e−039


41
−1.26665751e−025
5.84505761e−030
−2.30469572e−034
6.06339556e−039


45
−5.94726685e−026
2.48643254e−029
−1.88792088e−033
5.60469477e−038


47
2.43106684e−025
−3.95551801e−029
−7.28245783e−037
4.70291791e−038
















TABLE 36





(EM27)




















WL
193.368 nm
193.468 nm
193.268 nm



SIO2V′
1.5607857
1.56062813
1.56094365



CAF2V193′
1.50175423
1.50185255
1.50195109



H2OV193′
1.4364632
1.43667693
1.43689123











NA 1.2; Fmin = 18.63 mm; Fmax = 66 mm












Sur-




1⁄2 Diam-


face
Radius
Asphere
Thickness
Material
eter





1
0.000000

−0.004216
LUFTV193
75.440


2
341.127979
AS
22.791928
SIO2V
77.399


3
−547.910038

0.998331
N2VP950
79.138


4
127.727169

41.232021
SIO2V
85.886


5
423.981317
AS
37.538965
N2VP950
83.125


6
1837.865411

20.893107
SIO2V
73.497


7
−224.309944
AS
1.002068
N2VP950
71.189


8
162.793881

28.373758
SIO2V
63.095


9
−357.404285

20.328095
N2VP950
58.827


10
−130.668159

9.997405
SIO2V
40.623


11
−153.854050

6.572008
N2VP950
37.125


12
0.000000

9.999712
SIO2V
37.199


13
0.000000

1.062092
N2VP950
40.839


14
743.447647

18.547401
SIO2V
42.269


15
−194.707721

22.944701
N2VP950
46.232


16
−91.226681

9.997232
SIO2V
51.224


17
−149.640287

18.143695
N2VP950
58.055


18
−523.085587
AS
23.764093
SIO2V
70.561


19
−159.366370

0.999029
N2VP950
75.025


20
−418.047917
AS
30.390060
SIO2V
78.905


21
−139.497541

36.995337
N2VP950
82.309


22
0.000000

202.057337
N2VP950
86.976


23
−179.767561
AS
−202.057337
REFL
144.017


24
157.031815
AS
202.057337
REFL
107.178


25
0.000000

36.997499
N2VP950
101.742


26
440.441126

47.272805
SIO2V
111.232


27
−305.204169

41.252868
N2VP950
111.473


28
−462.717592

18.096500
SIO2V
101.263


29
−434.773502
AS
1.272365
N2VP950
100.762


30
323.034266

9.997203
SIO2V
90.351


31
107.871517

41.101537
N2VP950
80.055


32
−2104.261715

9.996146
SIO2V
80.354


33
162.693545

24.114798
N2VP950
82.448


34
461.867528

11.590831
SIO2V
88.405


35
292.431899

14.861810
N2VP950
92.938


36
1076.736610

38.645047
SIO2V
96.114


37
−233.326361
AS
4.528881
N2VP950
101.701


38
−818.919435
AS
26.752850
SIO2V
107.052


39
−301.917563

18.307802
N2VP950
113.375


40
−2069.863617
AS
54.519854
SIO2V
125.923


41
−240.586609

40.043329
N2VP950
131.701


42
0.000000

0.000000
N2VP950
138.484


43
0.000000

−20.273619
N2VP950
138.484


44
442.810512

63.820483
SIO2V
138.949


45
−533.873885

2.798052
N2VP950
139.304


46
662.397337
AS
40.282382
SIO2V
135.640


47
−428.200815

0.994361
N2VP950
134.489


48
213.024607

43.377768
SIO2V
113.450


49
3009.037627
AS
0.987971
N2VP950
107.741


50
95.712001

40.028327
SIO2V
77.581


51
241.528599

2.069796
N2VP950
67.915


52
85.826880

38.946996
CAF2V193
50.851


53
0.000000

3.000000
H2OV193
21.090


54
0.000000

0.000000
AIR
16.500
















TABLE 36A





Aspherical Constants




















Surface
2
5
7
18
20





K
0
0
0
0
0


C1
−6.825898e−08
−1.139291e−07
1.715001e−07
−5.525454e−08
−1.928670e−08


C2
−5.820149e−13
6.229489e−12
−3.362340e−12
−1.835201e−13
1.369964e−12


C3
−1.764721e−16
2.070760e−16
2.245144e−16
1.097082e−16
−1.178098e−16


C4
1.898479e−20
−3.072912e−20
6.731621e−20
2.983525e−22
−5.533661e−22


C5
−2.878598e−26
5.780651e−25
−1.102455e−23
−7.073376e−25
4.333159e−25


C6
−4.377548e−29
7.588531e−29
1.662149e−28
2.028418e−28
−5.576742e−29


C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00





Surface
23
24
29
37
38





K
−1.94543
−2.30892
0
0
0


C1
−2.949816e−08
6.225716e−08
−9.081623e−08
1.700564e−08
−5.539058e−08


C2
2.672898e−13
−8.664624e−13
4.328932e−12
7.578402e−13
7.069194e−13


C3
−5.319153e−18
3.983466e−17
−9.663515e−17
6.487979e−17
7.954509e−17


C4
1.038342e−22
−1.106567e−21
1.861873e−21
−4.481439e−21
−5.116182e−21


C5
−1.448694e−27
3.014885e−26
−2.365064e−26
9.785695e−25
7.622924e−25


C6
1.457411e−32
−3.386885e−31
4.413420e−31
−4.763684e−29
−3.862189e−29


C7
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C8
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00


C9
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00
0.000000e+00















Surface
40
46
49







K
0
0
0



C1
−6.320049e−10
−2.772679e−08
−2.949915e−08



C2
−1.306440e−13
−1.390524e−13
3.478719e−12



C3
−3.923481e−17
4.871921e−17
−1.481636e−16



C4
2.072577e−21
−1.427007e−21
6.052349e−21



C5
−6.511387e−26
7.907911e−27
−1.731162e−25



C6
1.538497e−30
1.183697e−31
2.820274e−30



C7
0.000000e+00
0.000000e+00
0.000000e+00



C8
0.000000e+00
0.000000e+00
0.000000e+00



C9
0.000000e+00
0.000000e+00
0.000000e+00

















TABLE 37







(j342p)












Sur-




1⁄2 Diam-


face
Radius
Asphere
Thickness
Material
eter















0
0.000000

32.000671

66.0


1
153.319623

25.301467
SILUV
83.9


2
362.312706

1.846656

83.3


3
249.932462

10.039369
SILUV
83.5


4
296.617151

16.156206

82.9


5
129.380687

32.591808
SILUV
85.8


6
353.939024

25.413158

83.3


7
441.659706

33.067185
SILUV
77.6


8
−249.821483

0.999731

73.0


9
242.432431

23.800036
SILUV
66.0


10
−418.172385

16.233683

62.2


11
−135.497448

9.999688
SILUV
53.8


12
−172.144731

14.407576

51.0


13
0.000000

14.446986

37.2


14
403.537798

17.810754
SILUV
47.2


15
−250.734154

43.083755

50.0


16
−86.913472

14.999924
SILUV
58.5


17
−119.371112

3.501271

67.2


18
−227.124051

29.708033
SILUV
72.5


19
−115.706665

0.999372

77.3


20
−6458.564488

21.246094
SILUV
81.9


21
−316.595524

244.245108

83.5


22
−175.503346

−209.246168
REFL
137.3


23
172.837073

259.698197
REFL
116.6


24
286.122846

54.616082
SILUV
114.1


25
−319.487475

0.999912

113.6


26
966.963595

26.197513
SILUV
104.1


27
−1040.269926

1.072535

101.1


28
1363.207517

10.039037
SILUV
93.7


29
99.625589

52.260353

77.5


30
4756.567563

10.000836
SILUV
78.0


31
153.387698

31.977828

78.4


32
−621.996267

10.519453
SILUV
80.7


33
337.392641

11.072501

89.8


34
737.023107

38.757083
SILUV
94.6


35
−226.600466

0.999349

98.8


36
2080.296355

23.152743
SILUV
107.0


37
−464.590999

1.039809

110.3


38
1055.490633

38.268883
SILUV
115.5


39
−319.028277

39.203877

117.8


40
653.756661

35.609928
SILUV
125.1


41
−584.439739

12.416338

125.1


42
531.560104

43.648724
SILUV
121.9


43
−344.752529

0.999813

121.1


44
216.368978

41.075323
SILUV
104.1


45
−1287.916059

1.004925

99.2


46
80.185742

39.619634
SILUV
69.4


47
176.364295

1.538101

59.8


48
85.292538

38.558988
SILUV
48.9


49
0.000000

3.000000
H2O
21.1


50
0.000000



16.5
















TABLE 37A





Aspherical Constants




















Surface
3
8
20
22
23





K
0
0
0
−2.68078
−2.40925


C1
−3.607637E−08
1.865463E−07
−2.924038E−08
−4.659443E−08
5.109968E−08


C2
−2.229774E−12
−7.002614E−12
−1.606274E−13
1.037806E−12
−5.972057E−13


C3
−9.424200E−17
6.321555E−16
−3.464603E−17
−3.569130E−17
2.704163E−17


C4
2.475481E−20
−2.270568E−20
−8.460050E−22
1.252351E−21
−7.866414E−22


C5
−2.200899E−24
−7.376870E−24
−3.093437E−26
−4.105857E−26
3.951644E−26


C6
2.031865E−28
4.292117E−28
1.330447E−29
1.072302E−30
−1.866653E−30


C7
−1.376196E−32
−4.030529E−32
−2.982210E−33
−1.880272E−35
6.750678E−35


C8
1.838592E−38
6.145449E−36
1.368410E−37
1.598017E−40
−1.047201E−39





Surface
27
36
38
42
45





K
0
0
0
0
0


C1
−7.658966E−08
−5.016408E−08
−9.533350E−10
−3.314101E−08
−6.295604E−09


C2
5.681524E−12
6.321012E−13
−5.085963E−13
3.915833E−13
2.792116E−12


C3
−2.238871E−16
1.067455E−16
−9.972640E−17
5.982003E−17
−1.225842E−16


C4
5.298747E−21
−7.397651E−21
6.787141E−21
−1.575240E−21
1.102964E−20


C5
6.569464E−25
1.926832E−25
−1.791598E−25
−3.559970E−26
−1.065854E−24


C6
−9.223653E−29
6.753657E−30
−3.368098E−30
1.054274E−30
8.785997E−29


C7
5.022050E−33
−9.556799E−34
3.525219E−34
1.406168E−35
−4.393692E−33


C8
−1.105440E−37
1.329917E−38
−3.436374E−39
−3.845075E−40
1.041770E−37
















TABLE 38







(j344p)












Sur-




1⁄2 Diam-


face
Radius
Asphere
Thickness
Material
eter















0
0.000000

35.248514

66.0


1
143.248122

28.781110
SILUV
86.3


2
358.453084

2.742037

85.3


3
249.892226

15.480033
SILUV
85.2


4
590.981355

14.283399

84.5


5
117.666799

24.212151
SILUV
83.0


6
167.854363

18.418499

79.6


7
383.299246

37.170753
SILUV
78.0


8
−249.806207

1.005138

72.8


9
176.708488

25.812894
SILUV
64.2


10
−489.209320

17.845992

60.0


11
−138.689463

10.119648
SILUV
47.3


12
−180.883089

11.123457

43.8


13
1814.626805

14.880881
SILUV
38.4


14
−249.444318

45.270915

42.1


15
−80.916188

15.005805
SILUV
54.4


16
−125.947065

2.167332

65.0


17
−470.801754

30.186754
SILUV
72.8


18
−134.611795

2.050714

78.1


19
−522.384219

31.415391
SILUV
84.0


20
−154.268791

249.623006

87.1


21
−181.420630

−209.608609
REFL
140.1


22
169.119629

250.842406
REFL
114.7


23
291.616363

51.793776
SILUV
110.3


24
−309.683041

17.091881

109.8


25
−940.483291

12.127436
SILUV
99.3


26
−42805.292832

1.002005

97.3


27
220.631691

10.003981
SILUV
88.3


28
99.320400

49.161757

77.3


29
−561.336190

9.999954
SILUV
77.2


30
154.957512

24.909934

79.0


31
1924.820454

13.223705
SILUV
81.7


32
303.786903

14.995612

89.2


33
1300.890310

31.155401
SILUV
93.9


34
−258.803624

9.929012

98.4


35
−3575.038127

30.701987
SILUV
109.0


36
−265.328196

2.056209

113.6


37
2294.378555

44.440918
SILUV
123.1


38
−267.747777

29.673499

125.9


39
557.248167

36.861702
SILUV
131.7


40
−783.213643

−0.938224

131.3


41
−14802.205529

16.206383

129.7


42
828.039709

43.221788
SILUV
129.1


43
−324.649154

0.998849

128.8


44
206.870457

45.792196
SILUV
109.6


45
−1913.727624

0.997376

104.5


46
81.421622

39.892459
SILUV
70.6


47
171.051496

1.070665

60.3


48
81.435251

36.484505
CAFUV
48.6


49
0.000000

3.000000
H2O
21.1


50
0.000000



16.5
















TABLE 38A





(j344p)


Aspherical Constants





















Surface
3
8
17
19
21
22





K
0
0
0
0
−2.35919
−2.55041


C1
−4.239547E−08
1.776408E−07
−3.517097E−08
−2.260275E−08
−3.531314E−08
5.763867E−08


C2
−3.439882E−12
−7.365374E−12
−1.680998E−12
1.477964E−12
5.754980E−13
−8.648037E−13


C3
2.585420E−17
6.010661E−16
1.988836E−16
−5.557313E−17
−1.422154E−17
3.811912E−17


C4
−7.398192E−21
3.465765E−20
−8.317822E−21
−1.521633E−21
3.469778E−22
−1.031346E−21


C5
2.490541E−24
−1.352374E−23
1.490936E−25
2.529206E−25
−6.366916E−27
2.586799E−26


C6
−1.543807E−28
7.789367E−28
9.086464E−29
−2.473128E−29
6.303151E−32
−2.333304E−31





Surface
26
34
35
37
42
45





K
0
0
0
0
0
0


C1
−9.608615E−08
1.305280E−08
−5.677213E−08
3.512847E−09
−2.753413E−08
−2.014104E−08


C2
4.888828E−12
5.858393E−13
1.460926E−12
−4.457077E−13
−1.731330E−13
3.259304E−12


C3
−1.061062E−16
−2.240057E−17
7.309271E−17
−9.211061E−17
6.979195E−17
−1.414937E−16


C4
2.226871E−21
1.299691E−21
−7.691388E−21
7.360949E−21
−2.163794E−21
5.867152E−21


C5
6.374143E−26
1.071950E−25
4.906816E−25
−3.041901E−25
9.215216E−27
−1.748151E−25


C6
−5.123581E−30
−1.228055E−29
−1.882267E−29
6.008115E−30
2.896055E−31
3.188929E−30
















TABLE 39







(dave 040421)












Sur-




1⁄2 Diam-


face
Radius
Asphere
Thickness
Material
eter















0
0.000000

40.000000

68.0


1
146.623761
AS
35.648639
SIO2V
84.3


2
−262.402199
AS
11.489893

86.4


3
−1418.271111
AS
55.535686
SIO2V
89.1


4
−149.803131

80.058956

92.8


5
−316.127680

−80.058956
REFL
66.8


6
−149.803131

−55.535686
SIO2V
77.9


7
−1418.271111

−11.489893

77.7


8
−262.402199

11.489893
REFL
78.4


9
−1418.271111

55.535686
SIO2V
88.5


10
−149.803131

90.058608

97.6


11
−318.170858
AS
42.027645
SIO2V
125.7


12
−174.217513

221.335808

130.9


13
−245.648700
AS
−201.335981
REFL
202.8


14
114.970031
AS
241.335931
REFL
93.2


15
372.783567
AS
46.864614
SIO2V
124.6


16
−819.903755

1.038628

123.6


17
177.861341

41.772805
SIO2V
112.5


18
341.365208

37.021407

104.9


19
−466.562113

12.000000
SIO2V
100.5


20
162.712763

42.079202

91.1


21
−370.098539

12.000000
SIO2V
91.3


22
462.418362

26.721285

96.0


23
−356.944827

27.234109
SIO2V
97.2


24
−176.415718

1.000000

100.3


25
250.680892
AS
35.225819
SIO2V
109.0


26
−1151.380195

1.000000

108.8


27
400.524336

38.251924
SIO2V
107.1


28
−405.535651

31.160614

105.6


29
−149.637246

50.218339
SIO2V
104.4


30
−384.493074
AS
30.129631

114.6


31
0.000000

−29.129631

116.2


32
266.421209

50.004341
SIO2V
116.1


33
−466.737916

1.000000

115.2


34
142.958212

42.562558
SIO2V
102.2


35
432.609562
AS
0.098646

97.2


36
114.421108

32.582267
SIO2V
82.2


37
573.116962
AS
1.000000

76.7


38
60.777409

26.925305
SIO2V
52.9


39
76.682879

1.000000

41.9


40
70.399871

26.141931
CAF2V193
40.0


41
0.000000

3.000000
H2OV193
21.6


42
0

0

17.0
















TABLE 39A





(dave 040421)


Aspherical Constants



















Surface
1
2
3
11





K
0
0
0
0


C1
−3.341087E−07
8.388602E−08
3.429680E−08
3.116059E−09


C2
−2.505072E−12
−1.111052E−11
−9.182012E−12
4.201540E−13


C3
2.943082E−15
1.569768E−15
8.908974E−16
−8.967249E−17


C4
−4.955011E−19
−1.841754E−19
−1.039175E−19
4.467021E−21


C5
4.666851E−23
1.342877E−23
7.467060E−24
−1.240183E−25


C6
−1.905456E−27
−4.061739E−28
−2.463306E−28
−3.737311E−31


C7


C8














Surface
13
14
15
25





K
0
0
0
0


C1
3.046218E−09
−1.471452E−07
1.493626E−09
−2.761928E−08


C2
4.170047E−14
3.389142E−12
7.786239E−13
1.065077E−13


C3
3.681161E−19
−1.091618E−15
3.130190E−17
8.399310E−18


C4
2.802579E−23
1.594470E−19
2.199868E−22
−2.005406E−21


C5
−1.004802E−27
−2.248477E−23
−1.132529E−25
1.619754E−25


C6
3.611732E−32
1.655691E−27
2.738900E−30
−8.094709E−30


C7
−6.507196E−37
−5.527960E−32


C8
6.094959E−42
−3.066052E−37















Surface
30
35
37







K
0
0
0



C1
3.891658E−09
8.202081E−10
1.252989E−07



C2
−2.344148E−13
−6.269685E−13
2.533320E−12



C3
1.511118E−17
−2.459088E−16
1.123761E−16



C4
−1.816247E−21
5.806198E−20
−1.266332E−19



C5
3.834331E−26
−3.997034E−24
1.618688E−23



C6
5.510731E−31
1.041043E−28
−8.614797E−28



C7



C8

















TABLE 40







(d125i9)












Sur-




1⁄2 Diam-


face
Radius
Asphere
Thickness
Material
eter















0
0.000000

31.999820

72.0


1
1121.871530
AS
22.353990
SIO2V
81.6


2
−593.507575

151.330057

83.2


3
−276.701090

−150.330068
REFL
99.4


4
−1841.732700

158.991136
REFL
58.1


5
−1993.161426

66.359854
SIO2V
129.7


6
−226.138813

0.999989

137.1


7
320.967306

58.008492
SIO2V
147.2


8
−521.971452
AS
138.103093

146.7


9
1018.489753
AS
33.863171
SIO2V
132.4


10
−836.147368

169.056435

131.1


11
−150.333251

22.332601
SIO2V
98.2


12
−264.622066

19.637756

104.6


13
−642.439229

−19.637756
REFL
105.6


14
−264.622066

−22.332601
SIO2V
96.6


15
−150.333251

−169.056435

86.0


16
−836.147368

−33.863171
SIO2V
72.6


17
1018.489753
AS
−94.088120

78.6


18
196.895316

−14.999941
SIO2V
99.4


19
1436.276484

−28.015060

114.2


20
263.470635

28.015060
REFL
117.3


21
1436.276484

14.999941
SIO2V
115.4


22
196.895316

94.088120

104.5


23
1018.489753
AS
33.863171
SIO2V
98.4


24
−836.147368

232.111001

96.3


25
−203.114130
AS
20.739811
SIO2V
89.7


26
−179.567740

1.000292

94.4


27
214.374385

45.853859
SIO2V
107.3


28
−685.859253
AS
14.406908

106.3


29
155.448944

34.186529
SIO2V
99.0


30
402.440360

26.948978

95.4


31
1784.180000

14.999955
SIO2V
87.8


32
215.162499

22.977434

79.8


33
−1182.190098

22.085678
SIO2V
78.7


34
−212.011934

1.511427

77.6


35
−2234.326431
AS
16.015583
SIO2V
73.6


36
102.656630

55.587588

68.2


37
227.255721

75.569686
SIO2V
88.7


38
−317.233998

1.001303

92.3


39
1810.772356
AS
34.492120
SIO2V
91.9


40
−251.541624

3.237774

94.2


41
0.000000

−2.238080

92.7


42
312.037351

16.355638
SIO2V
94.5


43
1101.731550
AS
0.999509

94.2


44
373.203773

35.331514
SIO2V
95.0


45
−352.262575

0.999305

95.0


46
800.952563

34.674551
SIO2V
91.8


47
−210.477645
AS
0.999728

90.3


48
72.234210

29.521553
SIO2V
58.5


49
126.294484

7.096090

50.0


50
89.472175

36.272448
SIO2V
41.5


51
0.000000

0.000000

18.0
















TABLE 40A





(d125i9)


Aspherical Constants



















Surface
1
8
9
17





K
0
0
0
0


C1
−6.489547E−09
1.779063E−08
−2.537260E−09
−2.537260E−09


C2
2.573979E−12
−1.318309E−13
8.794118E−14
8.794118E−14


C3
−6.945437E−18
1.871976E−18
1.370489E−18
1.370489E−18


C4
−9.856064E−22
−2.538137E−23
2.480376E−23
2.480376E−23


C5
−5.398838E−26
5.262554E−28
3.221917E−28
3.221917E−28


C6
3.582736E−29
−4.568847E−33
−1.526882E−32
−1.526882E−32














Surface
23
25
28
35





K
0
0
0
0


C1
−2.537260E−09
3.488627E−08
5.518741E−08
−1.889508E−07


C2
8.794118E−14
−5.495753E−13
−1.879963E−12
−7.683963E−12


C3
1.370489E−18
−6.723461E−17
−1.208371E−18
9.545139E−17


C4
2.480376E−23
2.810907E−21
8.370662E−22
1.920197E−20


C5
3.221917E−28
−1.827899E−25
−3.751988E−26
1.709381E−24


C6
−1.526882E−32
4.402454E−30
1.768617E−30
−4.887431E−30















Surface
39
43
47







K
0
0
0



C1
−1.194060E−07
2.132675E−08
1.327564E−08



C2
−3.708989E−13
3.335407E−12
8.696711E−13



C3
4.020986E−17
8.797815E−17
−1.462960E−16



C4
−1.082725E−20
−6.582985E−21
1.072413E−20



C5
3.369011E−26
−4.306562E−26
−5.792663E−25



C6
1.763283E−29
1.609953E−29
7.946613E−30

























TABLE 41





Figure
NA
Y′
NL
NOP
Dmax
COMP1
COMP2
COMP3























4
1.10
16.25
17
3
201.5
10.25
174.21
58.07


7
1.10
16.25
17
3
220.9
11.23
190.99
63.66


8
1.15
16.25
17
3
220.1
10.24
174.11
58.04


16
1.20
16.25
20
3
219.7
9.39
187.78
62.59


17
1.20
16.25
21
3
235.5
10.06
211.35
70.45


19
1.20
16.25
20
3
263.9
11.28
225.56
75.19


20
1.20
16.00
19
3
306.5
13.30
252.76
84.25


21
1.20
16.17
20
3
240.6
10.33
206.66
68.89


22
1.20
16.25
19
3
249.3
10.65
202.42
67.47


23
1.20
16.17
18
3
264.2
11.35
204.24
68.08


27
1.20
16.50
23
3
269.9
11.36
261.27
87.09


28
1.20
16.50
23
3
229.4
9.65
222.06
74.02


30
1.20
16.50
21
3
266.1
11.20
235.19
78.40


31
1.20
16.50
20
3
272.6
11.47
229.46
76.49


32
1.20
16.50
20
3
272.3
11.46
229.21
76.40


34
1.20
16.50
22
3
241.0
10.14
223.15
74.38


36
1.20
16.50
23
3
278.6
11.73
269.69
89.90


37
1.20
16.50
23
3
250.2
10.53
242.20
80.73


38
1.20
16.50
23
3
263.4
11.09
254.97
84.99


39
1.20
17.00
16
3
260.0
10.62
169.93
56.64


40
1.05
18.00
19
3
294.0
14.81
281.48
93.83

## Claims

1. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part entirely composed of reflecting elements for imaging the first intermediate image into a second intermediate image; a third objective part for imaging the second intermediate image onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate images and between the second intermediate image and the image plane; and wherein the projection objective is an unobscured system having no pupil obscuration and wherein the projection objective includes only two mirrors.

2. Projection objective according to claim 1, wherein the first objective part and the second objective part and the third objective part share a common straight optical axis.

3. Projection objective according to claim 1, wherein at least one mirror surface of the concave mirrors is aspheric.

4. Projection objective according to claim 1, wherein a mirror group defined by the first and the second concave mirrors facing each other has a mirror group entry and a mirror group exit, the mirror group entry being positioned geometrically next to an edge of the second concave mirror facing an optical axis of the catadioptric projection objective and the mirror group exit being positioned geometrically next to an edge of the first concave mirror facing the optical axis and wherein some of the pupil surfaces of the projection objective are arranged in a vicinity of the mirror group entry and in a vicinity of the mirror group exit.

5. Projection objective according to claim 1, wherein the first objective part is designed as an enlarging imaging system.

6. Projection objective according to claim 1, wherein the third objective part has a reducing magnification.

7. Projection objective according to claim 1, wherein the second intermediate image has a size larger than the image size.

8. Projection objective according to claim 1, wherein the projection objective includes no planar folding mirror.

9. Projection objective according to claim 1, wherein concave surfaces of the first and second concave mirrors are aspheric.

10. Projection objective according to claim 1, wherein the first and second concave mirrors are disposed on the same side of an optical axis of the catadioptric projection objective.

11. Projection objective according to claim 1, wherein the first concave mirror and at least part of the second concave mirror are positioned at opposite sides of an optical axis of the catadioptric projection objective.

12. Projection objective according to claim 1, wherein the projection objective is designed as an immersion objective adapted with reference to aberrations such that an image side working distance between a last optical element and the image plane is filled up with an immersion medium with a refractive index substantially greater than 1.

13. Projection objective according to claim 1, wherein the projection objective is telecentric on both an object end and an image end.

14. Projection objective according to claim 1, wherein an aperture stop is provided in the third objective part.

15. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part entirely composed of reflecting elements for imaging the first intermediate image into a second intermediate image; a third objective part for imaging the second intermediate image onto the image plane; wherein the second objective part includes a first concave mirror having a first mirror surface and a second concave mirror having a second mirror surface, the concave mirror surfaces of the concave mirrors facing each other and defining an intermirror space, the intermirror space defined by extending curvatures of the concave mirror surfaces facing each other until the extended curvatures intersect; wherein at least the first intermediate image is located geometrically within the intermirror space between the first concave mirror and the second concave mirror, and wherein the projection objective is an unobscured system having no pupil obscuration and wherein the projection objective includes only two mirrors.

16. Projection objective according to claim 15, wherein the first and second mirror surfaces are unbroken having no holes.

17. Projection objective according to claim 15, wherein both the first intermediate image and the second intermediate image are located geometrically within the intermirror space between the first concave mirror and the second concave mirror.

18. Projection objective according to claim 15, wherein the first objective part and the second objective part and the third objective part share a common straight optical axis.

19. Projection objective according to claim 15, wherein curvature surfaces of the first concave mirror and the second concave mirror have a common axis of rotational symmetry.

20. Projection objective according to claim 15, wherein at least one mirror surface of the concave mirrors is aspheric.

21. Projection objective according to claim 15, the projection objective is designed such that radiation reflected from the first concave mirror crosses an optical axis prior to impinging on the second concave mirror.

22. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part entirely composed of reflecting elements for imaging the first intermediate image into a second intermediate image; a third objective part for imaging the second intermediate image onto the image plane; wherein the second objective part includes a first concave mirror having a first mirror surface and a second concave mirror having a second mirror surface, the concave mirror surfaces of the first and second concave mirrors facing each other and defining an intermirror space, the intermirror space defined by extending curvatures of the concave mirror surfaces facing each other until the extended curvatures intersect; and wherein the first objective part is designed as an enlarging imaging system and wherein the projection objective includes only two mirrors.

23. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part arranged between the object plane and the image plane and configured to image the pattern provided in the object plane into a first intermediate image; a second objective part entirely composed of reflecting elements arranged between the first objective part and the image plane and configured to image the first intermediate image into a second intermediate image; a third objective part arranged between the second objective part and the image plane and configured to image the second intermediate image onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate images and between the second intermediate image and the image plane; and wherein the projection objective is an unobscured system having no pupil obscuration and wherein the projection objective includes only two mirrors.

24. Projection objective according to claim 23, wherein the first objective part and the second objective part and the third objective part share a common straight optical axis.

25. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part arranged between the object plane and the image plane and configured to image the pattern provided in the object plane into a first intermediate image; a second objective part entirely composed of reflecting elements arranged between the first objective part and the image plane and configured to image the first intermediate image into a second intermediate image; a third objective part arranged between the second objective part and the image plane and configured to image the second intermediate image onto the image plane; wherein the second objective part includes a first concave mirror having a first mirror surface and a second concave mirror having a second mirror surface, the concave mirror surfaces of the concave mirrors facing each other and defining an intermirror space, the intermirror space defined by extending curvatures of the concave mirror surfaces facing each other until the extended curvatures intersect; wherein at least the first intermediate image is located geometrically within the intermirror space between the first concave mirror and the second concave mirror, and wherein the projection objective is an unobscured system having no pupil obscuration and wherein the projection objective includes only two mirrors.

26. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part arranged between the object plane and the image plane and configured to image the pattern provided in the object plane into a first intermediate image; a second objective part entirely composed of reflecting elements arranged between the first objective part and the image plane and configured to image the first intermediate image into a second intermediate image; a third objective part arranged between the second objective part and the image plane and configured to image the second intermediate image onto the image plane; wherein the second objective part includes a first concave mirror having a first mirror surface and a second concave mirror having a second mirror surface, the concave mirror surfaces of the first and second concave mirrors facing each other and defining an intermirror space, the intermirror space defined by extending curvatures of the concave mirror surfaces facing each other until the extended curvatures intersect; and wherein the first objective part is designed as an enlarging imaging system and wherein the projection objective includes only two mirrors.

27. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part entirely composed of reflecting elements for imaging the first intermediate image into a second intermediate image; a third objective part for imaging the second intermediate image onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate images and between the second intermediate image and the image plane; and wherein the projection objective has an imaging area off an optical axis of the projection objective and wherein the projection objective includes only two mirrors.