# Patent

## Title
Array substrate, display panel and display apparatus

## Abstract

A thin-film transistor (TFT) array substrate is provided. The thin-film transistor (TFT) array substrate comprises a substrate having at least a display region; and a plurality of top-gated thin-film transistors formed over the substrate. The thin-film transistor (TFT) array substrate also comprises a plurality of scan lines and a plurality of data lines formed over the substrate in the display region and defining a plurality of sub-pixels, wherein a plurality of pre-reserved blank regions are configured among the scan lines, the data lines, and the plurality of sub-pixels in the display region; and a gate driver circuit formed over the substrate in the display region and disposed in the pre-reserved blank regions in the display region.

## Background
CROSS-REFERENCES TO RELATED APPLICATIONS
This application claims the priority of Chinese patent application No. 201510181771.X, filed on Apr. 16, 2015, the entirety of which is incorporated herein by reference.
FIELD OF THE INVENTION
The present invention generally relates to the field of liquid crystal display technology and, more particularly, relates to thin film transistor (TFT) array substrates, display panels and display apparatus.
BACKGROUND
Currently, to achieve light-weight and ultra-thin display products, a gate driver on array (GOA) technology is often used to design the scan driver circuit for display panels. The GOA technology integrates the gate switch circuit on an array substrate to form a progressive scan driver for the display panels. The GOA technology would be used to replace the conventional design using individual gate drivers in integrated circuits (ICs).
FIG. 1 illustrates an existing gate driver circuit. As shown in FIG. 1, the low-temperature polysilicon gate driver circuit (VSR) 100 is usually disposed at one side or both sides of the display region 101 of the array substrate. Thus, a relatively large portion of the edge region of the display panel is occupied. However, the current mainstream design of display products requires minimizing the edge region.
FIG. 2 illustrates a schematic layout of various elements of a gate driver circuit 1000 on a substrate. In general, the gate driver circuit 1000 includes vertical shift register (VSR) bus lines 111, a VSR capacitor 112, and VSR TFT devices 113, etc. In a prior art design, the VSR capacitor 112 a includes a two-electrode plates. A gate metal layer 112b and a source and drain metal layer 112a are usually used as the two electrode plates of the VSR capacitor 112. However, because the gate metal layer 112b and/or the source and drain metal layer 112a is typically made of opaque material, the opaque VSR capacitor 112 would affect the transmittance of the edge region of the display panel. When an ultraviolet light is used to cure the frame sealant on the edge region of the display panel, because the VSR capacitor region is opaque, the frame sealant is often not entirely cured.
Further, the devices of the gate driver circuit (VSR) are usually disposed in the non-display region of the array substrate, and a larger space is occupied. Therefore, it is more difficult to achieve a narrow edge design or an edgeless design for display products.
The disclosed methods and systems are directed to solve one or more problems set forth above and other problems.
BRIEF SUMMARY OF THE DISCLOSURE
One aspect of the present disclosure includes providing a thin-film transistor (TFT) array substrate. The thin-film transistor (TFT) array substrate comprises a substrate having at least a display region; and a plurality of top-gated thin-film transistors formed over the substrate. The thin-film transistor (TFT) array substrate also comprises a plurality of scan lines and a plurality of data lines formed over the substrate in the display region and defining a plurality of sub-pixels, wherein a plurality of pre-reserved blank regions are configured among the scan lines, the data lines, and the plurality of sub-pixels in the display region; and a gate driver circuit (VSR) formed over the substrate in the display region and disposed in the pre-reserved blank regions in the display region.
Another aspect of the present disclosure includes providing a display panel. The display panel comprises at least the disclosed thin-film transistor (TFT) array substrate.
Another aspect of the present disclosure includes providing a display apparatus. The display apparatus comprises at least the disclosed display panel.
Other aspects of the present disclosure can be understood by those skilled in the art in light of the description, the claims, and the drawings of the present disclosure.



BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 illustrates an existing gate driver circuit;
FIG. 2 illustrates another existing gate driver circuit;
FIG. 3 illustrates an exemplary gate driver circuit (VSR) consistent with the disclosed embodiments;
FIG. 4 illustrates an exemplary equivalent circuitry diagram of the gate driver circuit (VSR) illustrated in FIG. 3;
FIG. 5 illustrates an exemplary thin-film transistor (TFT) array substrate consistent with the disclosed embodiments;
FIG. 6 illustrates an exemplar pixel cell “P” of the exemplary TFT array substrate consistent with the disclosed embodiments;
FIG. 7 illustrates a cross-sectional view of the structure illustrated in FIG. 6 along the line “aa”;
FIG. 8 illustrates an exemplary layout of control signal lines of the gate driver circuit (VSR) on a TFT array substrate consistent with the disclosed embodiments;
FIG. 9 illustrates another exemplary layout of control signal lines of the gate driver circuit (VSR) on a TFT array substrate consistent with the disclosed embodiments;
FIG. 10 illustrates a cross-sectional view of the structure illustrated in FIG. 9 along the line “bb”;
FIG. 11 illustrates an exemplary layout of TFTs of the gate driver circuit (VSR) in pre-reserved blank regions consistent with the disclosed embodiments;
FIG. 12 illustrates the cross-sectional view of the structure illustrated in FIG. 11 along the line “dd”;
FIG. 13 illustrates another exemplary layout of TFTs of the gate driver circuit (VSR) in pre-reserved blank regions consistent with the disclosed embodiments;
FIG. 14 illustrates the cross-sectional view of the structure illustrated in FIG. 13 along the line “ee”;
FIG. 15 illustrates another exemplary layout of TFTs of the gate driver circuit (VSR) in pre-reserved blank regions consistent with the disclosed embodiments;
FIG. 16 illustrates the cross-sectional view of the structure illustrated in FIG. 15 along the line “ff”;
FIG. 17 illustrates another exemplary layout of TFTs of the gate driver circuit (VSR) in pre-reserved blank regions consistent with the disclosed embodiments;
FIG. 18 illustrates the cross-sectional view of the structure illustrated in FIG. 17 along the line “cc”;
FIG. 19 illustrates an exemplary layout of diode-type TFTs of the gate driver circuit (VSR) in pre-reserved blank regions consistent with the disclosed embodiments;
FIG. 20 illustrates the cross-sectional view of the structure illustrated in FIG. 19 along the line “gg”;
FIG. 21 illustrates another exemplary layout of diode-type TFTs of gate driver circuit (VSR) in pre-reserved blank regions consistent with the disclosed embodiments;
FIG. 22 illustrates the cross-sectional view of the structure illustrated in FIG. 21 along the line “hh”;
FIG. 23 illustrates an exemplary layout of capacitors of the gate driver circuit (VSR) in pre-reserved blank regions consistent with the disclosed embodiments;
FIG. 24 illustrates the cross-sectional view of the structure illustrated in FIG. 23 along the line “ii”;
FIG. 25 illustrates another exemplary layout of capacitors of the gate driver circuit (VSR) in pre-reserved blank regions consistent with the disclosed embodiments;
FIG. 26 illustrates the cross-sectional view of the structure illustrated in FIG. 25 along the line “jj”;
FIG. 27 illustrates another exemplary layout of capacitors of the gate driver circuit (VSR) in pre-reserved blank regions consistent with the disclosed embodiments;
FIG. 28 illustrates another exemplary layout of capacitors of the gate driver circuit (VSR) in pre-reserved blank regions consistent with the disclosed embodiments;
FIG. 29 illustrates an exemplary equivalent circuitry diagram of a capacitor consistent with the disclosed embodiments;
FIG. 30 illustrates an exemplary display panel consistent with the disclosed embodiments; and
FIG. 31 illustrate an exemplary display apparatus consistent with the disclosed embodiments.



DETAILED DESCRIPTION
Reference will now be made in detail to exemplary embodiments of the invention, which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers will be used throughout the drawings to refer to the same or like parts.
According to the disclosed embodiments, a thin-film transistor (TFT) array substrate is provided. FIGS. 5 ̃7 illustrate a corresponding TFT array substrate 1. FIG. 5 illustrates an exemplary TFT array substrate 1 consistent with the disclosed embodiments; FIG. 6 illustrates an exemplary pixel cell “P” of the TFT array substrate 1 illustrated in FIG. 5; and FIG. 7 illustrates a cross-sectional view of the structure illustrated in FIG. 6 along the line “aa”
As shown in FIG. 5, the TFT array substrate 1 may include a substrate 11. The substrate 11 may include a display region AA and a non-display region (not labeled). A plurality of data lines D, such as D1, D2, . . . , etc., and a plurality of scan lines S, such as S1, S2, etc., may be formed on the substrate 11. A plurality of pixel cells (not labeled) may be formed on the substrate 11, as defined by the data lines D and the scan lines S. For example, the pixel cells may be formed at the intersection between the data lines D and the scan lines S. Each of the pixel cells may include two or more sub pixels, and individual sub pixels, such as a first pixel P1, a second pixel P2, a third pixel P3, . . . , etc., may be connected to the data lines and/or scan lines. That is, the plurality of scan lines and the plurality of data lines may cross over to define a plurality of sub-pixels.
The spaces between the plurality of sub-pixels are configured as pre-reserved blank regions. Specifically, the spaces between adjacent pixel cells along the direction of the data lines D may be configured as pre-reserved blank regions, and the spaces between two sub-pixels along the data lines D may be also be configured as pre-reserved blank regions. Further, the TFT array substrate 1 may also include a gate driver circuit (not shown). Devices of the gate drive circuit of the TFT array substrate 1 may be disposed in the pre-reserved blank regions in the display region AA of the substrate 11. In one embodiment, the gate driver circuit may be referred as a vertical shift register (VSR).
FIG. 6 illustrates an exemplary pixel cell or pixel unit “P” of the plurality of pixel cells of the TFT array substrate 1. As shown in FIG. 6, each pixel unit “P” may include a first sub-pixel P1 and an adjacent second sub-pixel P2; and a first data line D1 and an adjacent second data line D2. The first data line D1 and the adjacent second data line D2 may be in between the first sub-pixel P1 and the second sub-pixel P2. Further, the first sub-pixel P1 and the second sub-pixel P2 may be connected to the first data line D1 and the second data line D2, respectively. Specifically, the pixel electrode of the first sub-pixel P1 may be connected to the first data line D1 through the corresponding source and drain regions of TFTs. When the first sub-pixel P1 is at the displaying condition, the first data line D1 may transmit display data signals to the first sub-pixel P1.
Further, as shown in FIGS. 5 ̃6, because the first data line D1 and the second data line D2 may be disposed adjacent to each other, there may be no data line disposed between the adjacent pixel cells. Thus, a first pre-reserved blank region G1 may be disposed between the adjacent pixel cells along the direction of the date lines. That is, the space between adjacent pixel cells may be configured as first pre-reserved blank region G1. The first pre-reserved blank region G1 is shown as the dashed frame in FIG. 5. The first pre-reserved blank region G1 may be reserved for disposing the devices of the gate drive circuit (VSR).
Further, as shown in FIGS. 5 ̃6, although the first data line D1 and the second data D2 may be disposed adjacent to each other, to dispose devices of the gate driver circuit in the display region AA, the distance between the first data line D1 and the second data line D2 may need to be increased. Thus, a second pre-reserved blank region G2 along the data line direction may be disposed between the adjacent first date line D1 and the second data line D2. The second pre-reserved blank region G2 is also shown as the dashed frame in FIG. 5. The second pre-reserved blank region G2 may also be reserved for disposing the devices of the gate drive circuit (VSR).
Further, as shown in FIG. 5, the plurality of pixel cells may be disposed on the substrate as an array, i.e. with a predetermined number of rows and predetermined number of columns. The plurality of sub-pixels in a same row in the display region AA may be connected to a same scan line. Further, the plurality of sub-pixels in different rows, such as the third sub-pixels P3 and the adjacent fourth sub-pixel P4, may be connected to a first scan line S1 and the second scan line S2, respectively, and the first scan line S1 may be disposed between the third sub-pixel P3 and the fourth sub-pixel P4. That is, the first scan line S1 and the second scan line S2 may be separated with a predetermined distance.
Further, as shown in FIG. 5, a third pre-reserved blank region G3 may be disposed between the first scan line S1 and the third sub-pixel P3 (i.e., the sub-pixel connected to the first scan line S1) along the scan line direction. A fourth pre-reserved blank region G4 may be disposed between the second scan line S2 and the fourth sub-pixel P4 along the scan line direction. A fifth pre-reserved blank region G5 may be disposed between the first scan line S1 and the fourth sub-pixel P4 (i.e., the sub-pixel not connected to the first scan line S1) along the scan line direction. The third pre-reserved blank region G3, the fourth pre-reserved blank region G4, and the fourth pre-reserved blank region G5 may also be reserved for disposing the devices of the gate driver circuit (VSR).
The size of the first pre-reserved blank region G1 may be greater than that of the second pre-reserved blank region G2; the size of the fifth pre-reserved blank region G5 may be greater than that of the third pre-reserved blank region G3; the size of the fifth pre-reserved blank region G5 may be greater than that of the fourth pre-reserved blank region G4. Further, because the third pre-reserved blank region G3 and the fourth the pre-reserved blank region G4 may be both disposed between the sub-pixels and the corresponding scan lines, the sizes of the third pre-reserved blank region G3 and the fourth pre-reserved blank region G4 may be about the same.
Therefore, for illustrative purposes, the display region AA of the array substrate 1 may have five pre-reserved blank regions: the first pre-reserved blank region G1, the second pre-reserved blank region G2, the third pre-reserved blank region G3, the fourth pre-reserved blank region G4, and the fifth pre-reserved blank region G5. The devices of the gate driver circuit (VSR) may be disposed in one or more of the pre-reserved blank regions. In certain other embodiments, the display region AA of the TFT array substrate 1 may have other appropriate numbers of the pre-reserved blank region used for disposing the devices of the gate drive circuit (VSR).
FIG. 7 illustrates a cross-sectional view of the structure illustrated in FIG. 6 along the line “aa”. As illustrated in FIGS. 6 ̃7. The TFT array substrate 1 includes the substrate 11. The substrate 11 provides a base for the device structures of the TFT array substrate 1. A semiconductor layer 13 may be formed on the substrate 11. Further, a gate metal layer 12 may be formed over the semiconductor layer 13. Further, a source and drain metal layer 14 may be formed over the gate metal layer 12. Further, a common electrode layer 16 may be formed on the source and drain metal layer 14. Further, a pixel electrode 17 may formed on the common electrode 17.
Devices of the gate driver circuit (VSR) may be disposed in the pre-reserved blank regions. To avoid the effect of the gate driver circuit (VSR) in operation to the TFT array substrate 1 during the displaying process, the common electrode layer 16 may be used to cover the devices of the gate driver circuit (VSR). The common electrode layer 16 may block the interference signals from the devices of the gate driver circuit (VSR).
Further, referring to FIG. 7, to better prevent the interference signals from the devices of the gate driver circuit (VSR) from affecting the TFT array substrate 1 when the TFT array substrate 1 is in operation, a first non-conducting dielectric layer 15 may be formed between the source and drain metal layer 14 and the common electrode layer 16. The first non-conducting dielectric layer 15 may be a passive layer, or an organic film layer, etc. The passive layer may be made of silicon nitride, or silicon oxide, etc.
Further, to ensure the complete elimination of the interference signal, it may require the thickness of the first non-conducting dielectric layer 15 to be in a range of approximately 0.8 um ̃5 um. Within such a thickness range, the thicker the first non-conducting dielectric layer 15 is, the better the shielding effect to the interference signal is. From the manufacturing point of view, in one embodiment, the optimal thickness range of the passive layer or the organic film layer may be in a range of approximately 2 um ̃3 um. Within such a thickness range, the interference signal may be entirely shielded. Meanwhile, the thickness of the first non-conducting dielectric layer 15 may be as desired; and may not cause the entire TFT array substrate 1 to be significantly large such that it may be unable to match the miniaturization requirements.
Further, as shown in FIG. 7, the semiconductor layer 13 may be covered by the gate metal layer 12. Therefore, the TFT may be referred as a top-gated TFT because the gate structure of the TFT is disposed above the semiconductor layer 13 of the TFT. The semiconductor layer 13 may be made of any appropriate material. In one embodiment, the semiconductor layer 13 is made of low temperature p-Si (LTPS). The performance of the TFT made of LTPS may have a desired performance. Further, the manufacturing processes of the TFTs may be simple.
Specifically, the p-Si structure formed by the low-temperature process may include a plurality of small scale crystal clusters of Si atoms. The electron mobility of the TFT may be up to 300 cm2/V·S by applying the LTPS technology under a manufacturing temperature lower than approximately 600° C. Further, when the top-gated structure is used in the TFT, the parasitic capacitance in the TFT may be reduced by a gate self-alignment process. Accordingly, the power consumption of the TFT may be reduced. Further, the semiconductor layer 13 made of LTPS may be treated by an eximer laser annealing process; and the annealed semiconductor layer 13 may be relatively uniform. To date, the top-gated structure may be the mainstream structure in LTPS-TFTs.
FIG. 3 illustrates an exemplary gate drive circuit (VSR) of the TFT array substrate 1. FIG. 4 illustrates an exemplary equivalent circuitry diagram of the gate driver circuit (VSR) illustrated in FIG. 3.
As shown in FIG. 3 ̃4, the gate driver circuit (VSR) may include a plurality of gate driver devices. In one embodiment, the gate driver circuit (VSR) may include at least a plurality of signal control lines B1, a plurality of TFTs, and a capacitor C. In certain other embodiments, the type and number of the devices in the gate drive circuit (VSR) may be any other appropriate combinations.
In one embodiment, the TFTs of the gate driver circuit (VSR) may also be top-gated TFTs. The semiconductor layer of the TFTs of the gate driver circuit (VSR) may be made of any appropriate material. In one embodiment, low-temperature polysilicon is used as the semiconductor layer of the TFTs of the gate driver circuit (VSR). The function of the gate driver circuit (VSR) may include turning on or turning off the scan lines one by one repeatedly, and transmitting the logic status of input terminals to output terminals after each clock period
In the gate driver circuit (VSR), the signal control lines B1 may include start trigger voltage lines (STV lines), clock lines (CK lines), voltage high lines (VGH lines), voltage low lines (VGL lines), reset lines, and forward/backward lines (FW/BW lines), etc. The capacitor C may be a parallel-plate capacitor. The capacitor C may be used to store and release charges.
In one embodiment, the gates, the sources, the drains, and the semiconductor layers of the TFTs of the gate driver circuit (VSR) may be formed in a same film layer with the components of the TFTs in the corresponding sub-pixels. Further, the gate driver circuit (VSR) may also include diode-type TFTs (not shown in FIG. 3 or FIG. 4). The diode-type TFTs may be formed by short-circuiting the gates and the sources, or the drains and the sources of the TFTs.
Further, referring to FIG. 3 and FIG. 5, the gate driver circuit (VSR) may be disposed in the pre-reserved blank regions of the display region AA of the TFT array substrate 1. The pre-reserved blank regions may provide enough space in the display region AA to dispose the devices of the gate driver circuit (VSR). Thus, it may not need to dispose the gate driver circuit (VSR) in the non-display region of the TFT array substrate 1. Therefore, a narrow edge design, or an edgeless design of the TFT array substrate 1 may be achieved.
FIG. 8 illustrates an exemplary layout of the control lines B1 of the gate driver circuit (VSR) on the TFT array substrate 1 according to the disclosed embodiments. As shown in FIG. 8, because one end of the signal control line B1 of the gate driver circuit (VSR) may be connected to a driver integrated circuit (IC) in the non-display region DA of the TFT array substrate 1, a portion of the signal control line B1 may be disposed around the peripheral region of the display region AA. The other portion of the of the signal control line B1 connecting to other devices may be disposed in the display region AA of the TFT array substrate 1.
The detailed layout of the signal control line B1 in the display region AA is illustrated in FIGS. 9 ̃10. FIG. 10 is the cross-sectional view of the layout illustrated in FIG. 9 along the line “bb”.
As shown in FIG. 9, the signal control line B1 may be disposed in the first pre-reserved blank region G1. Further, the signal control line B1 may extend along the direction of data line D1 and the data line D2, and cross over a scan line S with an insulation.
The signal control line B1 may include a first signal wiring B11 and a second signal wiring B12. The major portion of the signal control line B1, i.e., the first signal wiring B11, may be formed by patterning the gate metal layer 12 (Referring to FIG. 7). The bridging connection portion of the signal control line B1, i.e., the second signal wring B12, may be formed by patterning the source and drain metal layer 13 (referring to FIG. 7). Thus, the second signal wiring B12 may be disposed on the same layer with the data lines D.
Further, the first signal wiring B11 may be disposed in a same layer with the scan lines D. To cross over the scan line S with an insulation, it may need a plurality of second signal wirings B12 to connect a plurality of first signal wirings B11 to form a complete signal control line B1.
Further, as illustrated in FIG. 10, the first signal wiring B11 and the second signal wiring B12 may be disposed in different metal layers, it may need a first through-hole structure K11 to electrically connect the first signal wiring B11 with the second signal wiring B12. The first signal wiring B11 may cross over the scan line S with an insulation in a same layer through the bridging structure (the second signal wiring B12).
Further, other different kinds of metal wires may also be disposed in the limited space of the TFT array substrate 1. Because the width of the first pre-reserved region G1 along the direction of the scan line S may be relatively small, the width of the control signal line B1 along the direction of the scan line S may have to be relatively small, while the length of the first pre-reserved blank region G1 along the direction of the data lines D may be relatively large. Thus, a signal control line B having a single wire structure may have a relative large resistance. The relatively large resistance of the signal control line B with a single wire structure may cause a signal transmission delay.
To overcome the relatively large resistance in the signal control line B caused by utilizing the single wire structure, the devices of the gate driver circuit (VSR) may include a signal control line group. The signal control line group may include at least two single signal control lines B1. The at least two signal control lines B1 may be disposed in different first pre-reserved blank regions G1, and connected in parallel. The use of the plurality of single signal control lines B1 in parallel may lower the total resistance of the group of signal control lines; and may reduce the signal transmission delay. Because the plurality of single signal control lines B1 may be connected in parallel, the signal on each signal control line B1 may the same.
Further, as illustrated in FIG. 9, the plurality of single signal control lines B1 may be connected in parallel by a plurality of first connecting wirings L11. In one embodiment, to simplify the manufacturing process, and reduce the production cost, the first connecting wiring L11 may be formed by patterning the gate metal layer 12. Therefore, the first connecting wirings L11 may be directly connected to the corresponding signal control lines B1, and no additional bridging structures may be needed. Accordingly, the layout of the first connecting wirings L11 may be simplified. In certain other embodiments, the first connecting wirings L11 may be formed by patterning other metal layers, such as the source and drain metal layer 14, etc., as long as the plurality of single signal control wirings L11 may be able to electrically connect the plurality of signal control lines B1 in parallel.
Moreover, considering the optimization of the layout of metal wires, the first connecting lines L11 may be disposed in parallel with the data lines D. That is, the first connecting lines L11 and the corresponding signal control line B1 may cross over in a same layer for a direct connection. Further, the first connecting lines L11 may be disposed in the third pre-reserved blank region G3, the fourth pre-served blank region G4, and the fifth pre-reserved blank region G5, etc. The number of the first connecting lines L11 for the optimized resistance of signal control line B1 may be dependent of the practical requirements.
FIGS. 11 ̃12 illustrate an exemplary layout of the TFTs of the gate driver circuit (VSR) in the pre-reserved blank regions of the display region AA. FIG. 12 is a cross-sectional view of the structure illustrated in FIG. 11 along the line “dd”.
As shown in FIGS. 11 ̃12, the TFT of the gate driver circuit VSR may include a gate g11, a first semiconductor c111, a source s11, and a drain d11. The first semiconductor c111 may be formed by patterning the semiconductor layer 13 (referring to FIG. 7); and may be disposed facing the gate g11. The gate g11 may be formed by patterning the gate metal layer 12. The source s11 may be formed by patterning the gate metal layer 12 and a source and drain metal layer 14. The drain d11 may be formed by patterning the gate metal layer 12 and the source and drain metal layer 14.
Further, the gate g11 may be disposed in the fifth pre-reserved blank region G5; and may be parallel to the scan line S. The gate g11 may be able to control the “on” and “off” of the TFT. The gate g11 may also be able to connect the gate electrode of the TFT with other devices, including external control signals, and/or gate electrodes of other TFTs.
Further, the gate g11 may be disposed in the fifth pre-reserved blank region G5; and the forward projection of the source s11 or the drain d11 may not overlap with the gate g11. In one embodiment, the TFTs in the TFT array substrate 1 may all be the top-gated structures. That is, the gate g11 may cover the semiconductor c111; and the source s11 and the drain d11 may have an Ohmic contact with the semiconductor c11 through through-hole structures. If the forward projection of the source s11 or the drain d11 overlaps with the gate g11, the source s11 may be electrically connected with the gate g11 through the through-hole structure, or the drain d11 and the gate g11 may be electrically connected through the through-hole structure, and the TFT may be unable to function properly.
Therefore, the first semiconductor c111 may face the gate g11; and the first semiconductor c111 and the gate g11 may be disposed in the same region. Moreover, considering the width-to-length ratio of the TFT, in one embodiment, the first semiconductor c111 may be disposed in the first overlapping region OL1 formed by the fifth pre-reserved region G5 and the first pre-reserved region G1. In such a layout, the overlap between the forward projection of the gate g11 and the forward projection of the source s11; and the overlap between the forward projection of the gate g11 and the forward projection of the drain d11 may be avoided; and the TFT may have an optimized width-to-length ratio to satisfy the requirements for the function of the gate driver circuit (VSR). Further, referring to FIG. 7 and FIG. 12, the first semiconductor c111 and the semiconductor layers of the TFTs of the sub-pixels may be disposed on a same layer; and may be formed by patterning the semiconductor layer 13.
Further, as shown in FIGS. 11 ̃12, The source s11 may include a first source wiring s111 and a second source wiring S112. The first source wiring S111 may be disposed in parallel with the data lines D; the second source wiring s112 may be disposed in parallel with the scan lines S. The first source wiring s111 may be the major portion of the source s11. The second source wiring s112 may connect the source s11 with other devices, such as the external control signals, and the sources of other TFTs, etc.
Referring to FIG. 7 and FIG. 12, the first source wiring s111 may be formed by patterning the source and drain metal layer 14. Because the source s11 may be required to form an Ohmic contact with the first semiconductor c111, the projection view of the first source wiring s111 on the substrate 11 may have an overlap with the first semiconductor c111; and the first source wiring s111 may be disposed in the first pre-reserved region G1. Moreover, the second source wiring s112 may be used to connect the source S11 with the external signals, etc.
For example, as illustrated in FIG. 3 and FIG. 4, the second source wiring s112 may be connected to the signal control line B1. To avoid a complicated layout caused by the line changeover structures, etc., the second source wiring s112 may be disposed on the same layer with the signal control line B1. In one embodiment, the second source wiring s112 may be formed by patterning the gate metal layer 12. Furthermore, to achieve an electrical connection between the second source wiring s112 and the signal control line B1, as shown in FIG. 11, the second source wiring s112 may be disposed to be perpendicular to the signal control line B1. Specifically, the second source wiring s112 may be disposed in the third pre-reserved region G3.
Further, as illustrated in FIG. 11 and FIG. 12, because the first source wiring s111 and the second source wiring s112 may be disposed in different layers, to achieve an electrical connection between the first source wiring s111 and the second source wiring s112, a second through-hole structure K12 may be used. The second through-hole structure K12 may be disposed in the overlapping region of the first source wiring s111 and the second source wiring s112. In one embodiment, the second through-hole structure K12 may be disposed in the overlapping region of the first pre-reserved blank region G1 and the third pre-reserved blank region G3.
Further, as shown in FIGS. 11 ̃12, the drain d11 may include a first drain wiring d111 and a second drain wiring d112. The first drain wiring d111 may be disposed in parallel with the data lines D; and the second drain wiring d112 may be disposed in parallel with the scan lines S. The first drain wiring d111 may be the major portion of the drain d11; and the second drain wiring d112 may be used to connect the drain structure of the TFT to other devices, such as external control signals, and/or the drains of other TFTs, etc.
Referring to FIG. 7 and the FIG. 12, the first drain wiring d111 may be formed by patterning the source and drain metal layer 14. Because it may require the drain d11 to form an Ohmic contact with the first semiconductor c111, the projection view of the first drain wiring d111 on the substrate 11 may have a predetermined overlap with the first semiconductor c111. In one embodiment, the first drain wiring d111 may be disposed in the first pre-reserved region G1.
The second drain wiring d112 may be used to connect the first drain wiring d111 to the external signals, etc. For example, as illustrated in FIG. 3 and FIG. 4, the second drain wiring d112 may be connected to the signal control line B1. To avoid a complicated layout caused by line changeover structures, etc., in one embodiment, the second drain wiring d112 may be disposed on the same layer with the signal control line B1; and may be formed by patterning the gate metal layer 12.
Furthermore, as shown in FIG. 11, to achieve an electrical connection between the second drain wiring d112 and the signal control line B1, the second drain wiring d112 may be disposed to be perpendicular to the signal control line B1; and may cross over the signal control line B1 in the same layer to achieve a direct connection. Specifically, in one embodiment, the second drain wiring d112 may be disposed in the fourth pre-reserved blank region G4.
Further, as shown in FIG. 12, the first drain wiring d111 and the second drain wiring d112 may be disposed in different layers, a third through-hole structure K13 may be used to achieve an electrical connection between the first drain wiring d111 and the second drain wiring d112. Moreover, the third through-hole structure K13 may be disposed in the overlapping region of the first drain wiring d111 and the second drain wiring d112. In one embodiment, the third through-hole structure K13 may be disposed in the overlapping region of the first pre-reserved blank region G1 and the fourth pre-reserved blank region G4.
For TFTs, the function and the location of the sources and the drains may be interchangeable under normal circumstances. Therefore, in one embodiment, the disposition methods and the positions of the source s11 and the drain d11 may be interchangeable.
Further, as illustrated in FIG. 11 and FIG. 12, in one embodiment, the gate driver circuit (VSR) may include at least a TFT group. The TFT group may include a plurality of TFTs. The plurality of the TFTs may be disposed in different pre-reserved blank regions; and may be electrically connected in parallel. For illustrative purposes, two TFTs of the gate driver circuit (VSR) are shown in FIG. 11 and FIG. 12. The gates g11, the sources s11 and the drains d11 may be electrically connected in parallel. Specifically, the two gates g11 of the two TFTs may be directly connected. The two sources s11 of the two TFTs may be directly connected through the corresponding second source wirings s112. The two drains d11 of the two TFTs may be directly connected through the corresponding second drain wirings d112.
Similar as forming the plurality of signal control lines into a group, forming a plurality of TFTs into a group; and connecting the plurality of TFTs in parallel may reduce the resistance of the TFTs. If the resistance of TFTs is significantly large, the TFTs may not be turned on due to the slow response rate, or not high enough threshold voltage. Thus, the performance of the TFTs may be affected. Accordingly, it may cause picture delays when the array substrate is displaying. Therefore, disposing a plurality of TFTs in parallel may reduce the electric resistance to overcome picture delays, etc. The plurality of TFTs may be electrically connected in parallel. Therefore, the signal applied on each TFT may be the same.
FIGS. 13 ̃14 illustrated another exemplary layout of the TFTs of the gate drive circuit (VSR) in the pre-reserved blank regions of the display region AA. FIG. 14 is a cross-sectional view of the structure illustrated in FIG. 13 along the line “ee”. As shown in FIGS. 13 ̃14. The layout of the first semiconductor c111, the gate g11 and the source s11 of TFTs and the corresponding detailed connections are similar with the layout illustrated in FIGS. 11 ̃12. The major differences may include followings.
As shown in FIGS. 13 ̃14, the drain d11 may include a first drain wiring d111 and a second drain wiring d112 disposed in the first pre-reserved blank region G1 and a second fifth pre-reserved blank region G5, respectively. Referring to FIG. 7, the first drain wiring d111 and the second drain wiring d112 may be formed by patterning the source and drain metal layer 14 and the gate metal layer 12, respectively. Further, the first drain wiring d111 and the second drain wiring d112 may be electrically connected through a third through-hole structure K13 disposed in the overlapping region of the first pre-reserved blank region G1 and the second fifth pre-reserved blank region G5.
The area of the second fifth pre-reserved blank region G5 may be greater than the area of the fourth pre-reserved blank region G4 in the sub-pixel region (between the pixel electrode and the corresponding scan line). Thus, by disposing the second drain wiring 112 in the second fifth pre-reserved region G5, the parasitic capacitance between the second drain wiring d112 and the adjacent scan lines S may be reduced. Accordingly, the signal interference to the scan lines S may be reduced. From the manufacturing point of view, the short-circuit between the second drain wiring d112 and the adjacent scan line S may be avoided; and the yield of the TFT array substrate 1 may be improved.
Further, as illustrated in FIG. 13 and FIG. 14, in one embodiment, the gate driver circuit (VSR) may include at least a TFT group. The TFT group may include a plurality of TFTs. The plurality of TFTs may be disposed in different pre-reserved blank regions G; and may be electrically connected in parallel. For illustrative purposes, two TFTs are shown in FIGS. 13 ̃14. The two TFTs may be electrically connected in parallel. That is, the gates g11 of the TFTs, the sources s11 of the TFFs, and the drains d11 of the TFTs may be electrically in parallel. Specifically, two gates g11 of the two TFTs may be directly connected; the two sources s11 of the two TFTs may be directly connected through the corresponding second source wirings s112; and the two drains d11 of the two TFFs may be directly connected through the corresponding second drain wirings d112.
Similar as forming the plurality of signal control lines into a group, forming a plurality of TFTs into a group; and connecting the TFTs in parallel may reduce the resistance of the TFTs. If the resistance of TFTs is significantly large, the TFTs may not be turned on due to the slow response rate, or not high enough threshold voltage. Thus, the performance of the TFTs may be affected. Accordingly, it may cause picture delays when the TFT array substrate 1 is displaying. Therefore, disposing a plurality of TFTs in parallel may reduce the electric resistance to overcome picture delays, etc.
FIGS. 15 ̃16 illustrate another exemplary layout of TFTs of the gate driver circuit (VSR) in the pre-reserve blank regions of the display region AA consistent with the disclosed embodiments. FIG. 16 is a cross-sectional view of the structure illustrated in FIG. 15 along the line “ff”.
As shown in FIGS. 15 ̃16. The layout of the first semiconductor c111, the gate g11 and the source s11 of TFTs, and the corresponding detailed connections may be similar with the layout illustrated in FIGS. 13 ̃14. The major differences may include followings.
As illustrated in FIGS. 15-16, besides the first source wiring s111 and the second source wiring s112 as described previously, the source 11 may also include a third source wiring s113. The third source wiring s113 may be disposed in parallel with the scan lines S. Moreover, the third source wiring s113 may locate in the first overlapping region OL1, and the projection view of the third source wiring s113 on the substrate 11 may have a predetermined overlap with the first semiconductor c111.
Further, besides the first drain wiring d111 and the second drain wiring d112 as described previously, the drain d11 may also include a third drain wiring d113. The third drain wiring may be disposed in parallel with the scan lines S. Moreover, the third drain wiring d113 may locate in the first overlapping region OL1; and the projection view of the third drain wiring d113 on the substrate 11 may have an overlap with the first semiconductor c111.
The third source wiring s113 may be parallel to the third drain wiring d113. Further, the third source wiring s113 and the third drain wiring d113 may be wider than the second source wiring s112 and the second drain wiring d112 respectively along the data line direction.
Further, referring to the FIGS. 15 ̃16, the source s11 may have an Ohmic contact with the first semiconductor c111 by disposing a plurality of through-hole structures in the third source wiring s113. The drain d11 may have an Ohmic contact with the first semiconductor c111 by disposing a plurality of through-hole structures in the third drain wiring d113.
The third source wiring s113 and the third drain wiring d113 may be wider than the corresponding second source wiring s112 and the corresponding second drain wiring, respectively. Further, the third source wiring s113 and the third drain wiring d113 may have a plurality of through-hole structures. Thus, the contact resistance between such wirings and the first semiconductor layer c111 may be reduced. Accordingly, the total resistance of the TFTs may be reduced. Moreover, the width-to-length ratio of the TFTs may be increased; and the performance of the TFTs may be more stable.
Further, as illustrated in FIG. 15 and FIG. 16, in one embodiment, the gate driver circuit (VSR) may include at least a TFT group. The TFT group may include a plurality of TFTs. The plurality of TFTs may be disposed in different pre-reserved blank regions; and may be electrically connected in parallel. For illustrative purposes, two TFTs are shown in FIGS. 15 ̃16. The two TFTs may be electrically connected in parallel. That is, the gates g11 of the TFTs, the sources s11 of the TFTs and the drains d11 of the TFTs may be electrically in parallel. Specifically, the two gates g11 of the two TFTs may be directly connected; the two sources s11 of the two TFTs may be directly connected through the corresponding second source wirings s112; and the two drains d11 of the two TFFs may be directly connected through the corresponding second drain wirings d112.
Similar as forming the plurality of signal control lines into a group, forming a plurality of TFTs into a group and connecting the TFTs in parallel may further reduce the resistance of the TFTs. If the resistance of TFTs is significantly large, the TFTs may not be turned on due to the slow response rate, or not high enough threshold voltage. Thus, the performance of the TFTs may be affected. Accordingly, it may cause picture delays when the TFT array substrate 1 is displaying. Therefore, disposing a plurality of TFTs in parallel may reduce the electric resistance to overcome picture delays, etc.
FIGS. 17 ̃18 illustrate another exemplary layout of TFTs of the gate driver circuit (VSR) in the pre-reserve blank regions of the display region AA consistent with the disclosed embodiments. FIG. 18 is a cross-sectional view of the structure illustrated in FIG. 17 along the line “cc”.
As shown in FIGS. 17 ̃18, the layout of the first semiconductor c111, the gate g11 and the source s11 of TFTs and the corresponding detailed connections may be similar with the layout illustrated in FIGS. 13 ̃14. The major differences may include followings.
As shown in FIGS. 17 ̃18, the source s11 may include a first source wiring s111 and a second source wiring s112. The first source wiring s111 and the second source wiring s112 may locate in the first pre-reserved blank region G1 and the fifth pre-reserved blank region G5, respectively. The first source wiring s111 and the second source wiring s112 may be formed by patterning the source and drain metal layer 14 and the gate metal layer 12, respectively. The first source wiring s111 and the second source wiring s112 may be electrically connected through a second through-hole structure K12 located in the overlapping region of the first pre-reserved blank region G1 and the fifth pre-reserved blank region G5.
The drain d11 may include a first drain wiring d111 and a second drain wiring d112. The first drain wiring d111 and the second drain wiring d112 may be disposed in the first pre-reserved blank region G1 and the second fifth pre-reserved blank region G5, respectively. The first drain wiring d111 and the second drain wiring d112 may be formed by patterning the source and drain metal layer 14 and the gate metal layer 12, respectively. The first drain wiring d111 and the second drain wiring d112 may be electrically connected through the third through-hole structure K13 located in the overlapping region of the first pre-reserved blank region G1 and the second fifth pre-reserved blank region G5.
Further, the first semiconductor c111 may need to be disposed in the overlapping region of the gate g11 and the major portion of the source s11 and drain d11. That is, the semiconductor c111 may be disposed in a second overlapping region OL2 of the fourth pre-reserved blank region G4 and the first pre-reserved blank regions G1. Therefore, the gate g11 may be disposed in the fourth pre-reserved blank region G4 between the two fifth pre-reserved blank regions G5.
The area of the fifth pre-reserved blank region G5 may be greater than the area of the fourth pre-reserved blank regions G4 in the sub-pixel region. By disposing the second source wiring s112 and the second drain wiring d112 in the two adjacent fifth pre-reserved blank regions G5, respectively, the parasitic capacitance between the second source wiring s112 and the corresponding adjacent scan line and the parasitic capacitance between the second drain wiring d112 and the corresponding adjacent scan line may be reduced. Accordingly, the signal interference to the scan lines S may be reduced. From the manufacturing point of view, the short-circuit between the second source wiring s112 and the corresponding adjacent scan line S, and the short-circuit between the second drain wiring d112 and the corresponding adjacent scan line S may be avoided. Thus, the yield of the TFT array substrate 1 may be improved.
Further, the gate driver circuit (VSR) may also include diode-type TFTs. Basically, the diode-type TFTs may be formed by short-circuiting the gates of the TFTs and the corresponding sources, or the gates of the TFTs and the corresponding drains.
FIGS. 19 ̃20 illustrate an exemplary layout of diode-type TFTs of the gate driver circuit (VSR) in the pre-reserved blank regions of the display region AA. FIG. 20 illustrates a cross-sectional view of the structure illustrated in FIG. 19 along the line “gg”.
As shown in FIGS. 19 ̃20, in one embodiment, the diode type TFTs may be based on previously described TFTs. The detailed structures and layout of the gate g11, the source s11, including the first source wiring s111 and the second source wiring s112, the drain d11, including the first drain wiring d111 and the second drain wiring d112, and the first semiconductor c111 may be similar with the layout described in FIGS. 17 ̃18. The major differences may be described as followings.
As described previously, the diode-type TFT may be formed by short-circuiting the source and the gate of a TFT, or short-circuiting the drain and the gate of a TFT. For illustrative purposes, diode-type TFTs formed by short-circuiting the sources and the gates may be described.
As illustrated in FIG. 19 and FIG. 20, the gate g11 may be connected with the source s11 through a second connecting wiring L12. Specifically, the second connecting wiring L12 may be formed in the second pre-reserved blank region G2 by patterning the gate metal layer 12; and may be extended to connect the gate g11 and the second source wiring s112.
As illustrated in FIG. 20, the second connecting wiring L12, the gate g11 and the second source wiring s112 may locate in a same metal layer; and may be belong to an integral structure. Therefore, the second connecting wiring L12 may directly connect with the corresponding gate g11 and the corresponding source s11; and it may not need a bridging structure. Accordingly, the layout of the metal lines may be simplified.
In certain other embodiments, the second connecting wiring L12 may be formed by patterning of other metal layers, such as the source and drain metal layer 14, etc. Further, the second connecting line L12 may be disposed in other pre-reserved blank regions, such as the first pre-reserved blank region G1, etc., as long as the electrical connection between the gate g11 and the source s11 is achieved.
In certain other embodiments, the diode-type TFTs may be formed by short-circuiting the gate g11 and the source s11 by a bridging structure. In still certain other embodiments, the diode-type TFTs may be formed by a direct connection.
Further, as illustrated in FIG. 19 and FIG. 20, in one embodiment, the gate driver circuit (VSR) may include at least a diode-type TFT group. The diode-type TFT group may include a plurality of diode-type TFTs. The plurality of diode-type TFTs may be disposed in different pre-reserved blank regions; and may be electrically connected in parallel. For illustrative purposes, two diode-type TFTs are shown in FIGS. 19 ̃20. The two diode-type TFTs may be electrically connected in parallel. That is, the gates g11 of the diode-type TFTs, the sources s11 of the diode-type TFFs, and the drains d11 of the diode-type TFTs may be electrically connected in parallel. Specifically, the two gates g11 of the two diode-type TFTs may be directly connected; the two sources s11 of the two diode-type TFTs may be directly connected through the corresponding second source wirings s112; and the two drains d11 of the two diode-type TFFs may be directly connected through the corresponding second drain wirings d112.
Similar as forming the plurality of signal control lines into a group, forming a plurality of diode-type TFTs into a group, and connecting the diode-type TFTs in parallel may further reduce the resistance of the diode-type TFTs. If the resistance of diode-type TFTs is significantly large, the diode-type TFTs may not be turned on due to the slow response rate, or not high enough threshold voltage. Thus, the performance of the diode-type TFTs may be affected. Accordingly, it may cause picture delays when the TFT array substrate is displaying. Therefore, disposing a plurality of diode-type TFTs connected in parallel may reduce the electric resistance to overcome picture delays, etc.
FIGS. 21 ̃22 illustrates another exemplary layout of diode-type TFTs of the gate driver circuit (VSR) in the pre-reserved blank regions of the display region AA. FIG. 22 illustrates the cross-sectional view of the structure illustrated in FIG. 21 along the line “hh”.
As illustrated in FIGS. 21 ̃22, the layout may be similar with the layouts illustrated in FIGS. 11 ̃12 and FIGS. 19 ̃20. The major differences may include that the diode type TFTs may be formed by short-circuiting the drains of the TFTs with the gates of the TFTs.
As shown in FIGS. 21 ̃22, the gate g11 and the drain d11 are short-circuited by a second connecting wiring L12. Specifically, the second connecting wiring L12 may be formed in the second pre-reserved blank region G2 by patterning the gate metal layer 12; and may be extended to connect the gate g11 and the drain wiring s112. Further, as illustrated in FIG. 22, the second connecting line L12, the gate g11 and the second drain wiring d112 may locate in the same metal layer; and may belong to an integral structure. Therefore, the second connecting wiring L12 may be directly connected with the corresponding gate g11 and the corresponding drain d11; and it may not need to form a bridging structure. Accordingly, the layout of metal wires may be simplified.
In certain other embodiments, the second connecting line L12 may be formed by patterning of other metal layers, such as the source and drain metal layer 14, etc. Further, the second connecting wiring L12 may be disposed in other pre-reserved blank regions, such as the first pre-reserved blank region G1, etc., as long as the electrical connection between the gate g11 and the drain 11 is achieved.
In certain other embodiments, the diode type TFTs may be formed by short-circuiting between the gates g11 and the drains d11 by a bridging structure. In still certain other embodiments, the diode type TFTs may be formed by the short-circuiting the gate g11 and the drains s11 by a direct connection.
Further, as illustrated in FIGS. 21 ̃22, in one embodiment, the gate driver circuit (VSR) may include at least a diode-type TFT group. The diode-type TFT group may include a plurality of diode-type TFTs. The plurality of diode-type TFTs may be disposed in different pre-reserved blank regions; and may be electrically connected in parallel. For illustrative purposes, two diode-type TFTs are shown in FIGS. 21 ̃22. The two diode-type TFTs may be electrically connected in parallel. That is, the gates g11 of the diode-type TFTs, the sources s11 of the diode-type TFFs, and the drains d11 of the diode-type TFTs may be electrically connected in parallel. Specifically, the two gates g11 of the two diode-type TFTs may be directly connected; the two sources s11 of the two diode-type TFTs may be directly connected through the corresponding second source wirings s112; and the two drains d11 of the two diode-type TFTs may be directly connected through the corresponding second drain wirings d112.
Similar as forming the plurality of signal control lines into a group, forming a plurality of diode-type TFTs into a group; and connecting the TFTs in parallel may further reduce the resistance of the diode-type TFTs. If the resistance of diode-type TFTs is significantly large, the diode-type TFTs may not be turned on due to the slow response rate, or not high enough threshold voltage. Thus, the performance of the diode-type TFTs may be affected. Accordingly, it may cause picture delays when the TFT array substrate is displaying. Therefore, disposing a plurality of diode-type TFTs connected in parallel may reduce the electric resistance to overcome picture delays, etc.
FIGS. 23 ̃24 illustrate an exemplary layout of capacitors of the gate driver circuit (VSR) in the pre-reserved regions of the display region AA of consistent with the disclosed embodiments. FIG. 24 is a cross-sectional view of the structure illustrated in FIG. 23 along the line “ii”. FIG. 29 illustrates an exemplary equivalent circuitry diagram of a capacitor disposed in the pre-reserved blank region.
The capacitor C in the gate driver circuit (VSR) may be a parallel plate-capacitor. The parallel-plate capacitor may include at least two capacitor electrodes (plates). The plurality of capacitor electrodes may be disposed in different metal layers. The plurality of capacitor electrodes may face each other to function as capacitors. For illustrative purposes, one capacitor of the gate drive circuit (VSR) is described.
As shown in FIGS. 23 ̃24, a first capacitor C1 may be disposed in the first pre-reserved blank region G1. The first capacitor C1 may include at least a first capacitor electrode C11 and a second capacitor electrode C12. The first capacitor electrode C11 may be formed by patterning the gate metal layer 12; and the second capacitor electrode C12 may be formed by patterning the source and drain metal layer 14. The extension direction of the first capacitor electrode C11 and the second capacitor electrode C12 may be parallel to the data line D.
As illustrated in FIGS. 23 ̃24 and FIG. 29, the first capacitor electrode C11 may be connected to a first voltage V1 through a third connecting wiring L13. To simplify the layout of the metal wires, the third connecting wiring L13 may be disposed on a same layer with the first capacitor electrode C11. That is, the third connecting wiring L13 may be formed by patterning the gate metal layer 12. Thus, the third connecting wiring L13 and the first capacitor electrode C11 may be directly connected; and it may not need a bridging structure. In certain other embodiments, the third connecting wiring L13 may be formed by patterning other metal layers, such as the source and drain metal layer 14, etc.
Further, as illustrated in FIGS. 23 ̃24 and FIG. 29, the second capacitor electrode C12 may be connected to a second voltage V2 through a fourth connecting wiring L14. To simplify the layout of the metal wires, and enhance the utilization of the gate metal layer 12, the fourth connecting wiring L14 may be formed by patterning the gate metal layer 12. Because the second capacitor electrode C12 may locate on a same layer with the source and drain metal layer 14, an electrical connection between the second capacitor electrode C12 and the fourth connecting wiring L14 may be achieved through the fourth through-hole structure K14. In certain other embodiments, the fourth connecting wiring L14 may be formed by patterning other metal layers, as long as the second capacitor electrode C12 may be connected to a corresponding second voltage V2.
Further, in one embodiment, the third connecting wiring L13 may be disposed in parallel with the scan lines S. Thus, the third connecting wiring L13 may be disposed in the fourth pre-reserved blank region G4. The fourth connecting wiring L14 may be disposed in parallel with the scan lines S. Thus, the fourth connecting wiring L14 may be disposed in the fifth pre-reserved blank region G5. Therefore, the fourth through-hole structure K14 may be disposed in the overlapping region of the fifth pre-reserved blank region G5 and the first pre-reserved blank region G1.
FIGS. 25 ̃26 illustrate another exemplary layout of capacitors of the gate driver circuit (VSR) in the pre-reserved regions of the display region AA consistent with the disclosed embodiments. FIG. 26 is a cross-sectional view of the structure illustrated in FIG. 25 along the line “jj”. FIG. 29 illustrates an exemplary equivalent circuitry diagram of a capacitor disposed in the pre-reserved blank regions.
As shown in FIGS. 25 ̃26, the layout of the capacitor in the pre-reserved blank regions may be similar as the layout illustrated in FIGS. 23 ̃24. The major differences may include followings.
As illustrated in FIGS. 25 ̃26 and FIG. 29, the first capacitor C1 may be disposed in the first pre-reserved region G1. Further, the first capacitor C1 may include a first capacitor electrode C11 and a second capacitor electrode C12. The extension direction of the first capacitor electrode C11 and the second capacitor electrode C12 may be parallel to the data lines D. Further, the first capacitor electrode C11 may be connected to a first voltage V1 through the third connecting wiring L13. The third connecting wiring L13 may include a first sub-connecting wiring L113 and a second sub-connecting wiring L123. The first sub-connecting wiring L113 may be disposed in parallel with the data line D in the first pre-reserved blank region G1. The first sub-connecting wiring L113 may be formed by patterning the source and drain metal layer 14. The second sub-connecting wiring L123 may be disposed in parallel with the scan line S in a second fifth pre-reserved blank region G5. The second sub-connecting wiring L123 may be a portion of the third connecting wiring L13 for connecting the third connecting wiring L13 with external devices, etc. The second sub-connecting wiring L123 may be formed by patterning the gate metal layer 12.
Because the first sub-connecting wiring L113 and the second sub-connecting wiring L123 may locate in different metal layers, a through-hole structure (not labeled) may be formed to electrically connect the first sub-connecting wiring L113 with the second sub-connecting wiring L123. Moreover, because the first capacitor C11 may be connected to the gate metal layer 12, it may also need to form a through-hole structure to connect the first capacitor electrode C11 with the first sub-connecting line L113.
The area of the fifth pre-reserved blank region G5 may be greater than the area of the fourth pre-reserved blank region G4. Thus, by disposing the fourth connecting wiring L14 and the second sub-connecting wiring L123 in two adjacent fifth pre-reserved blank regions G5, the parasitic capacitance between the fourth connecting wiring L14 and the corresponding adjacent scan line, and the parasitic capacitance between the second sub-connecting wiring L123 and the corresponding adjacent scan line may be reduced. Accordingly, the signal interference to the scan lines S may be reduced. Further, from the manufacturing point of view, the short-circuit between the fourth connecting wiring L14 and the corresponding adjacent scan line S, and the short-circuit between the second sub-connecting wiring L123 and the corresponding adjacent scan line S may be avoided. Thus, the yield of the TFT array substrate may be improved.
FIG. 27 illustrates another exemplary layout of the capacitors in the pre-reserved regions in the display region AA consistent with the disclosed embodiments. As shown in FIG. 27, the layout of the capacitors in the pre-reserved regions may be similar as the layout illustrated in FIGS. 25 ̃26. The major differences may include followings.
As shown FIG. 27, the capacitor C1 may include a first capacitor electrode C11 and a second capacitor electrode C12. The first capacitor electrode C11 and the second capacitor electrode C12 may be disposed in the first pre-reserved blank region G1. The first capacitor electrode C11 may face the second capacitor electrode C12. Further, the second capacitor electrode C12 may include a first extending electrode C13. The first extending electrode C13 may be disposed in the fifth pre-reserved blank region G5; and may be parallel to the fourth connecting wiring L14. The first extending electrode C13 and the second capacitor electrode C12 may be an integral structure; and may be formed by patterning the source and drain metal layer 14.
Specifically, the first capacitor electrode C11 and the third connecting wiring L13 may be disposed in the first pre-reserved blank region G1 and the fifth pre-reserved blank region G5, respectively. The third connecting wiring L13 may be connected to the first capacitor electrode C11. The second capacitor electrode C12 and the fourth connecting wiring L14 may be disposed in the first pre-reserved blank region G1 and the third pre-reserved blank region G3, respectively. The second capacitor electrode C12 and the fourth connecting wiring L14 may be electrically connected through the fourth through-hole structure K14. Moreover, the second capacitor electrode C12 may also include the first extending electrode C13 along the scan line S direction. The first extending electrode C13 may face the third connecting line L13; and may be disposed in the fifth pre-reserved blank region G5.
Thus, by disposing the first extending electrode C13, the facing area between the first capacitor electrode C11 and the second capacitor electrode C12 may be increased. Accordingly, the storage capacity of the first capacitor C1 may be increased.
FIG. 28 illustrates another exemplary layout of the capacitors of the gate driver circuit (VSR) in the pre-reserved regions of the display region AA consistent with the disclosed embodiments. As shown in FIG. 28, the layout of the capacitors in the pre-reserved regions may be similar as the layout illustrated in FIG. 27. The major differences may include followings.
As shown in FIG. 28, the first capacitor C1 may include a first capacitor electrode C11 and a second capacitor electrode C12. The first capacitor electrode C11 and the second capacitor electrode C12 may face each other; and may be disposed in the first pre-reserved blank region G1. The second capacitor electrode C12 may also include a first extending electrode C13. The first extending electrode C13 may be disposed in parallel with the fourth connecting wiring L14.
Further, as illustrated in FIG. 28 and FIG. 29, the first capacitor electrode C11 may be connected to a first voltage V1 through the third connecting wring L13. The third connecting wiring L13 may include a first sub-connecting line L113 and a second sub-connecting line L123. The first sub-connecting line L113 may be disposed in parallel with the data line D in the first pre-reserved blank region G1; and may be formed by patterning the source and drain metal layer 14. The second sub-connecting line L123 may be disposed in a second fifth pre-reserved blank region G5 parallel to the scan line S. The second sub-connecting wiring L123 may be used to connect the third connecting line L13 with the external devices, and may be formed by patterning the gate metal layer 12. Because the first sub-connecting line L113 and the second sub-connecting line L123 may locate in different metal layers, a through-hole structure (not labeled) may be used to electrically connect the first sub-connecting line L113 with the second sub-connecting line L123.
Such a layout of the first capacitor C1 may increase the facing area of the electrodes of the first capacitor C. Thus, the storage capacity of the first capacitor C1 may be increased. Further, it may avoid the short-circuit between the scan lines and the connecting lines during the manufacturing process. Accordingly, the yield of the TFT array substrate may be improved.
Further, as illustrated in FIGS. 23 ̃28, the gate driver circuit (VSR) may also include at least a capacitor group. Specifically, the capacitor group may include a plurality of capacitors connected in parallel; and disposed in different pre-reserved blank region.
For illustrative purposes, as shown in FIGS. 23 ̃28, the first capacitor C1 and a second capacitor C2 are shown. The first capacitor C1 and the second capacitor C2 may be electrically connected in parallel. Specifically, the two first capacitor electrodes C11 of the two capacitors may be directly connected by the third connecting wiring L13; and the two second capacitor electrodes C12 of the two capacitors may be directly connected through the fourth connecting wiring L14.
Connecting a plurality of capacitors into a group in parallel may increase the storage capacity of the capacitors. The more capacitors the capacitor group has, the higher the total storage capacity is. The number of capacitors C may be determined by the required storage capacity in a practical application.
By integrating the gate driver circuit (VSR) and corresponding devices in the display region of the TFT array substrate, the space in the non-display region (edge region) required for disposing the gate driver circuit (VSR) may be saved. Thus, a narrow edge design, or an edgeless design of the TFT array substrate may be achieved.
Further, according to the disclosed embodiments, a display panel is provided. FIG. 30 illustrates an exemplary display panel 10 consistent with the disclosed embodiments.
As illustrated in FIG. 30, the display panel 10 may include at least the disclosed TFT array substrate 10b, a color filter substrate 10c, and a display dielectric layer 10a formed between TFT array substrate 10b and the color film substrate 10c. 
Further, according to the disclosed embodiments, a display apparatus is provided. FIG. 31 illustrates a corresponding display apparatus 200.
As shown in FIG. 31, the display apparatus 200 may include at least the disclosed display panel 10. The display apparatus may be cellphone, tablet, TV, monitor, laptop, digital frame, GPS, and any other products and parts with certain display functions. By integrating the gate driver circuit (VSR) in the display region of the array apparatus, a narrow edge design, or an edgeless design of the display apparatus may be achieved.
The above detailed descriptions only illustrate certain exemplary embodiments of the present invention, and are not intended to limit the scope of the present invention. Those skilled in the art can understand the specification as whole and technical features in the various embodiments can be combined into other embodiments understandable to those persons of ordinary skill in the art. Any equivalent or modification thereof, without departing from the spirit and principle of the present invention, falls within the true scope of the present invention.

## Claims

1. A thin-film transistor (TFT) array substrate, comprising:
a substrate having at least a display region;
a plurality of top-gated thin-film transistors formed over the substrate;
a plurality of scan lines and a plurality of data lines formed over the substrate in the display region and defining a plurality of sub-pixels, wherein a plurality of pre-reserved blank regions are configured among the scan lines, the data lines, and the plurality of sub-pixels in the display region; and
a gate driver circuit formed over the substrate in the display region and disposed in the pre-reserved blank regions in the display region.

2. The thin-film transistor (TFT) array substrate according to claim 1, wherein a top-gated thin-film transistors further comprise:
a semiconductor layer formed over the substrate;
a gate metal layer formed over the semiconductor layer; and
a source and drain metal layer formed over the gate mater layer.

3. The thin-film transistor (TFT) array substrate according to claim 2, further comprising:
a first non-conductive dielectric layer formed over the source and drain metal layer;
a common electrode layer formed over the first non-conductive dielectric layer; and
a pixel electrode layer formed over the common electrode layer,
wherein the common electrode layer covers the gate drive circuit.

4. The thin-film transistor (TFT) array substrate according to claim 2, wherein:
the semiconductor layer is made of polycrystalline silicon.

5. The thin-film transistor (TFT) array substrate according to claim 2, wherein the display region further comprises:
a plurality of pixel cells,
wherein:
each of the plurality of pixel cells includes a first sub-pixel and an adjacent second sub-pixel of the plurality of sub-pixels;
a first data line and a second data line of the plurality of data lines are disposed between the first sub-pixel and the second sub-pixel; and
the first sub-pixel and the second sub-pixel are connected to the first data line and the second data line, respectively.

6. The thin-film transistor (TFT) array substrate according to claim 5, wherein a pre-reserved blank region further comprises:
a first pre-reserved blank region between two adjacent pixel cells, extending along a direction of the data lines; and
a second pre-reserved blank region between the first data line and the second data line, extending along the direction of the data lines.

7. The thin-film transistor (TFT) array substrate according to claim 6, wherein:
a plurality of sub-pixels in a same row are connected to a same scan line,
wherein the display region further comprises:
a plurality of third sub-pixels of the plurality of sub-pixels and a plurality of fourth sub-pixels of the plurality of sub-pixels, connecting to a first scan line of the plurality of scan lines and a second scan line of the plurality of scan lines, disposed between the first scan lines and the second scan lines, respectively.

8. The thin-film transistor (TFT) array substrate according to claim 7, the pre-reserved blank region further comprises:
a third pre-reserved blank region disposed between the first scan line and the third sub-pixel region, extending along a direction of the scan lines;
a fourth pre-reserved blank region disposed between the second scan line and the fourth sub-pixel, extending along the direction of the scan lines; and
a fifth pre-reserved blank region disposed between the first scan line and the fourth sub-pixel, extending along the direction of the scan lines.

9. The thin-film transistor (TFT) array substrate according to claim 8, the gate driver circuit further comprises at least:
a signal control line;
a top-gated thin-film transistor (TFT); and
a capacitor.

10. The thin-film transistor (TFT) array substrate according to claim 9, wherein the signal control line further comprises:
a first signal wiring formed by patterning the gate metal layer; and
a second signal wiring formed by patterning the source and drain metal layer,
wherein the first signal wiring and the second signal wiring are electrically connected by a first through-hole structure.

11. The thin-film transistor (TFT) array substrate according to claim 10, wherein the signal control line further comprises:
a signal control line group including at least two signal control lines electrically connected in parallel through at least a first connecting wiring, and disposed in different first pre-reserved blank regions.

12. The thin-film transistor (TFT) array substrate according to claim 9, wherein the top-gated thin-film transistor further comprises:
a first semiconductor formed by patterning the semiconductor layer;
a gate facing the first semiconductor formed by patterning the gate metal layer;
a source formed by patterning the source and drain metal layer; and
a drain formed by patterning the source and drain metal layer.

13. The thin-film transistor (TFT) array substrate according to claim 12, wherein:
the first semiconductor is disposed in an overlapping region of the first pre-reserved blank region and the fifth pre-reserved region;
the source includes a first source wiring disposed in parallel with the data lines and a second source wiring disposed in parallel with the scan lines,
wherein:
the first source wiring is formed by patterning the source and drain metal layer, and disposed in the first pre-reserved blank region;
the second source wiring is formed by patterning the gate metal layer, and disposed in the third pre-reserved blank region; and
the first source wiring and the second source wiring are electrically connected through a second through-hole structure;
and
the drain includes a first drain wiring disposed in parallel with the data lines and a second drain wiring disposed in parallel with the scan lines,
wherein:
the first drain wiring is formed by patterning the source and drain metal layer, and disposed in the first pre-reserved blank region;
the second drain wiring is formed by patterning the gate metal layer, and disposed in one of the fourth pre-reserved blank region and a second fifth pre-reserved blank region; and
the first drain wiring and the second wiring are electrically connected through a third through-hole structure.

14. The thin-film transistor (TFT) array substrate according to claim 12, wherein:
the first semiconductor is disposed in an overlapping region of the first pre-reserved blank region and the fourth pre-reserved region;
the source includes a first source wiring disposed in parallel to the data lines, and a second source wiring disposed in parallel to the scan lines,
wherein:
the first source wiring is formed by patterning the source and drain metal layer, and disposed in the first pre-reserved blank region;
the second source wiring is formed by patterning the gate metal layer, and disposed in the fifth pre-reserved blank region; and
the first source wiring and the second source wiring are electrically connected through a second through-hole structure;
and
the drain includes a first drain wiring disposed in parallel to the data line, and a second drain wiring disposed in parallel to the scan line,
wherein:
the first drain wiring is formed by patterning the source and drain metal layer, and disposed in the first pre-reserved blank region;
the second drain wiring is formed by patterning the gate metal layer, and disposed in a second fifth pre-reserved blank region; and
the first drain wiring and the second drain wiring are electrically connected through a third through-hole structure.

15. The thin-film transistor (TFT) array substrate according to claim 13, wherein the gate driver circuit further comprises at least:
a thin-film transistor (TFT) group having a plurality of thin-film transistors (TFTs) connected in parallel, and disposed in different pre-reserved blank regions.

16. The thin-film transistor (TFT) array substrate according to claim 13, wherein the thin film transistor further comprises:
diode-type thin film transistors (TFTs) formed by one of short-circuiting the sources and the gates of the thin-film transistors (TFTs), and short-circuiting the drains and the gates of the thin-film transistors (TFTs).

17. The thin-film transistor (TFT) array substrate according to claim 9, wherein the capacitor further comprises:
a first capacitor electrode disposed in the first pre-reserved blank region; and
a second capacitor electrode facing the first capacitor electrode disposed in the first pre-reserved blank region.

18. The thin-film transistor (TFT) array substrate according to claim 17, wherein the second capacitor electrode further comprises:
a first extending electrode.

19. A display panel comprising at least a thin-film transistor (TFT) array substrate according to claim 1.

20. A display apparatus comprising at least a display panel according to claim 19.