# Patent

## Title
Very-high aperture projection objective

## Abstract

A very-high aperture, purely refractive projection objective is designed as a two-belly system with an object-side belly, an image-side belly and a waist (7) situated therebetween. The system diaphragm (5) is seated in the image-side belly at a spacing in front of the image plane. Arranged between the waist and the system diaphragm in the region of divergent radiation is a negative group (LG5) which has an effective curvature with a concave side pointing towards the image plane. The system is distinguished by a high numerical aperture, low chromatic aberrations and compact, material-saving design.

## Background
The present application is a Continuation-in-Part of U.S. application Ser. No. 10/428,946, filed on May 5, 2003, the disclosure of which is incorporated into this application by reference, and of International Application PCT/US03/06592, with an international filing date of Mar. 3, 2003, which was published under PCT Article 21(2) in English, and the disclosure of which is also incorporated into this application by reference; the present application is further based on German Patent Application No. 102 24 361.1 filed on May 24, 2002, on International Patent Application PCT/EP02/04846 filed on May 3, 2002, and on U.S. Provisional Application No. 60/360,845 filed on Mar. 1, 2002, the three respective disclosures of which are also incorporated into this application by reference.


BACKGROUND OF THE INVENTION
1. Field of the Invention
The invention relates to a projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projective objective with the aid of ultraviolet light of a prescribed operating wavelength.
2. Description of the Related Art
Photolithographic projection objectives have been in use for several decades for producing semiconductor components and other finely structured components. They serve the purpose of projecting patterns of photomasks or reticles, which are also denoted below as masks or reticles, onto an object, coated with a photosensitive layer, with a very high resolution on a reducing scale.
In order to generate ever finer structures of the order of magnitude of 100 nm or below, an attempt is being made to enlarge the image-side numerical aperture (NA) of the projection objectives beyond the values currently attainable into the range of NA=0.8 or above. Moreover, use is being made of ever shorter operating wavelengths of ultraviolet light, preferably wavelengths of less than 260 nm, for example 248 nm, 193 nm, 157 nm or below. At the same time, an attempt is being made to fulfil the increasing demands on the projectability with the aid of purely refractive, dioptric systems which are advantageous by comparison with catadioptric systems with regard to design and production. In the context of wavelengths which are becoming ever shorter, however, only a few sufficiently transparent materials, whose Abbe constants are relatively close to one another, are still available. This raises problems for a partial achromatization, and even more so with a complete achromatization of the projection objectives, that is to say the far-reaching avoidance or reduction of chromatic aberrations. In particular, it is difficult to provide very high aperture systems with adequate small chromatic aberrations. Furthermore, with rising aperture and an additional need for improved imaging qualities together with unchanged object and image fields there is an increase in the dimension of the projection objective in all three spatial directions. In particular, the increase in volume of the optical lens material increases the cost of such projection objectives disproportionately in relation to the gain in reducing structural width.
SUMMARY OF THE INVENTION
It is one object of the invention to provide a projection objective which is distinguished by a high image-side numerical aperture and improved chromatic correction. It is another object to permit a compact design which saves on material.
As a solution to these and other objects, this invention, according to one formulation, provides a projection objective for projecting a pattern arranged in the object plane of the projection objective into an image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength, the projection objective having:

    a multiplicity of optical elements which are arranged along an optical axis; and
    a system diaphragm arranged at a distance in front of the image plane;
    the projection objective being designed as a purely refractive single-waist system with a belly near the object, a belly near the image and a waist therebetween, and there being arranged in a region of divergent radiation between the waist and the system diaphragm a negative group which has an effective curvature with a concave side directed towards the image.


Advantageous developments are specified in the dependant claims. The wording of all the claims is incorporated in the content of the description by reference.
In accordance with one aspect of the invention, a projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength has a multiplicity of optical elements which are arranged along an optical axis, and a system diaphragm arranged at a spacing in front of the image plane. The projection objective is designed as a purely refractive (dioptric) single-waist system with a belly near the object, a belly near the image and a waist therebetween. In the region of the waist, the beam diameter can be essentially smaller than the maximum beam diameter in the region of one of the bellies, it being possible for the beam diameter in the waist region to be, for example, less than 50% of the maximum beam diameter. Arranged in a region of divergent radiation between the waist and the system diaphragm is a negative group which has an effective curvature with a concave side directed towards the image.
A “negative group” in this sense is a lens group with an overall negative refractive power, the lens group being able to comprise one or more lenses. The negative group is bent as a whole relative to the beam path as a result of the effective curvature. This curvature can be characterized by a surface of curvature whose centre of curvature is situated on the image side. The effective curvature of the lens (or of the surface of curvature) is characterized by a radius of curvature rc which is calculated as follows for a lens whose entry surface has the radius r1 and whose exit surface has the radius r2:

1/rc=1/(2*r1)+1/(2*r2)  (1)

If the negative group comprises two or more lenses, the effective curvature of the group is calculated as follows:

1/rc=1/(n*r1)+1/(n*r2)+1/(n*r3)+1/(n*r4)+  (2)

n specifying the number of surfaces.

Together with the divergence of the radiation in the region of the lenses, the effective curvature concave towards the image has the effect that high incidence angles occur particularly on the exit sides of the one or more lenses of the negative group. These are very effective above all for correcting aberrations of high order, in particular for aperture-dependent correction, (which act to overcorrect) of monochromatic aberrations in the image field zone and edge of the image field. The use of material for the projection objective must be minimized in order to produce the latter particularly economically. This is achieved firstly by the restriction to one waist and, secondly, by a constantly increasing field load of the system. The invention renders it possible for the first time to achieve an effective correction of all monochromatic aberrations with only one waist in conjunction with such a high field load. In the examples shown, the field load is already massively increased, but the limit is not yet reached. The possibilities for correcting the group in conjunction with a higher overall asphericity permit the expectation of a further rise in the field load, and thus a future reduction in costs for the lithographic projection objectives. It is clear here that the aperture of the projection objective and the field load of the objective could not be driven so high without the specific use of aspherics already set forth. Here, the negative group can create at least partially corrective functions such as would be possible otherwise only by providing a further waist. By contrast with such conventional three-belly systems, in the case of projection objectives according to the invention it is possible to achieve a substantial reduction in the overall length and diameter, and a reduction in the volume of material required for the production, and thus a substantial reduction in the overall price. The longitudinal chromatic aberration can be significantly reduced through the increase in the field load and the combination with only one waist. It is thereby possible, even in the case of a very high aperture, to dispense with use of CaF2, for example at 193 nm, in the largest lenses around the diaphragm.
In a development, the negative group comprises at least one lens with negative refractive power and a concave surface directed towards the image. By splitting, the negative refractive power can also be distributed over a plurality of such, consecutive lenses of negative refractive power, the centers of curvature for the image-side exit surfaces being situated in each case on the image side. Here, a particularly material-saving, compact design is possible in the case of the use of only one or two such lenses of negative refractive power. If two lenses are lined up, it is advantageous when the refractive power of the first, object-side lens is greater than that of the subsequent, image-side lens of the group. These negative lenses can be configured as negative meniscus lenses.
It has proved to be advantageous when the negative group is arranged in a middle region between a site of narrowest constriction of the waist and the system diaphragm. Consequently, the negative group acts on ray bundles of average cross section and can have moderate diameters. Lenses with negative refractive power are naturally located in the region of the waist. Furthermore, there should be at least one large lens of negative refractive power for spherical correction in the region of the diaphragm. The negative group presented is particularly advantageous in the rising region of the second waist. Particularly at the centre of the waist, the lenses in the waist frequently have a bending which obeys the principle of minimum beam deflection in order to induce as few aberrations as possible. The task of the diverging lenses in the waist is firstly to deflect a convergent ray bundle into a divergent ray bundle. In conjunction with the large bellies, this permits the image field flattening of the system or the Petzval correction.
A further object consists in the skilful correction of contributory aberrations from the bellies with positive refractive power. The negative group in the first part of the second belly deviates fundamentally from the inner negative waist lenses with reference to the bending or curvature. The aim is not to transfer a ray bundle with balanced loads on entry and exit sides, but an intentionally asymmetric loading. Here, a “ray bundle” is a bundle of rays which originates or appears to originate from a single point or which converges or appears to converge towards a single point. The divergent ray bundle passes with moderate deflection into the lens in order then to exit again under extreme loading. This highly loaded surface permits the desired corrective action. The characterizing surfaces of curvature of the outlying negative lenses of the waist curve towards the centre of the waist. These outlying lenses advantageously “violate” the principle of minimal deflection. The object-side surface of the first negative waist lens and the image-side surface of the last waist lens have a particularly good effect on the aberration correction in conjunction with an increased angular load. The more important of these two waist lenses is that followed by the second belly. In the case of this lens, in turn, the image-side outer surface is the decisive surface, subjected to medium high loading. Without the advantageous negative group as presented in the rising region of the second waist, it would have to bear important components of the correction of the aberration correction as a function of field and aperture. However, given increasing loading of aperture and field impermissible zonal contributions with reference to field and aperture are left over for inclined ray bundles despite massive aspherization.
This problem is solved by the negative group in the rising region of the second waist, specifically with the aid of a suitable tuning of the average angular load at the exit surface of the last waist lens with average ray bundle variation, and of the high angular load of the exit surface or exit surfaces of the negative lens or lenses in the rising region of the second waist with low ray bundle variation. The corrective contributions for the inclined spherical aberrations then complement each other fittingly such that it is possible to achieve the highest field loadings and highest apertures, such as NA=0.95, in conjunction with the smallest wavefront deviation.
Suitable relationships can be implemented, in particular, when the condition:

A/B>C/D 

holds for the parameters:

    A=maximum angular loading in gas of the image-side exit surface of a lens of the negative group in the rising region of the second belly, in degrees;
    B=maximum angular loading in gas of the image-side exit surface of the last lens with negative refractive power in the objective waist, in degrees;
    C=ratio of marginal beam height of A to the maximum coma beam height of A;
    D=ratio of marginal beam height of B to the maximum coma beam height of B.


The angular loading can be quantified, for example, by the corresponding maximum incidence angles of the radiation (in gas).
The characterizing surfaces of curvature of the negative group in the first part of the second belly curve towards the image. The vertex of the overall characterizing surface of curvature of the negative group should be in a range between approximately 30% and approximately 70%, in particular between approximately 40% and approximately 60% of the axial spacing between the region of narrowest constriction of the waist and the system diaphragm.
The effective curvature of the negative group can be adapted to optimize the system properties. Preferably, the effective curvature has a radius of curvature rc whose ratio rc/DB to the aperature diameter DB is in the range between approximately 0.8 and approximately 2.2, preferably in the range between approximately 1.0 and approximately 2.0, in particular in the range between approximately 1.1 and approximately 1.9.
In the case of preferred embodiments, in the region of the system diaphragm the projection objective has, with reference to a plane of symmetry perpendicular to the optical axis, an essentially symmetrical design with biconvex positive lenses and negative meniscus lenses. This essentially symmetrical design permits a good correction state to be attained in conjunction with a low overall asphericity even given large apertures. The plane of symmetry is preferably situated near the system diaphragm. It is possible to depart from this symmetrical design in the direction of building up or increasing refractive power of the negative lens behind the diaphragm, and of decreasing the refractive power of the negative lens in front of the diaphragm. It is possible by means of this symmetrical arrangement to manage with a low outlay on aspherization. If the facilities for testing and producing more complex and stronger asphericities are improved, the symmetry can be modified at the expense of the negative lens in front of the diaphragm, that is to say lower refractive power or substitution by asphericity in the overall system. The large negative lens after the diaphragm should always have the same alignment of the effective curvature as the curvature already represented for the negative group in the rising region between waist and system diaphragm.
The system diaphragm within the meaning of this application is the region closer to the image plane in which either the main beam of the projection intersects the optical axis, or sites are present at which the height of a coma beam corresponds to the height of an marginal beam. A diaphragm (aperture diaphragm) for limiting and, if appropriate, adjusting the aperture used can be arranged in the region of the system diaphragm. The invention renders it possible to achieve an effective correction of all aberrations with only one waist. The negative group can take over at least partially in this case the function of a second waist such as is present in conventional three-belly systems. By contrast with such three-belly systems, it is possible in the case of projection objectives according to the invention to achieve a substantial reduction in the overall length, a reduction in the volume of material required for production, and a reduction in the chromatic aberrations.
It has proved to be advantageous when a negative meniscus lens with an object-side concave surface is arranged immediately in front of the system diaphragm, and a negative meniscus lens with an image-side concave surface is arranged immediately behind the system diaphragm. The system diaphragm can be freely accessible between these, in order, for example, to fit an adjustable diaphragm for limiting the beam diameter. This diaphragm can additionally be moved axially during opening and closing. An advantageous refinement is also provided by spherical diaphragms in conjunction with these single-waist systems, since the diaphragm curvature of preferred embodiments can still be used therefor.
The symmetry can continue far into the object-side and image-side near zones of the system diaphragm. For example, a positive/negative doublet with an object-side biconvex lens and a subsequent negative meniscus lens with an object-side concave surface can be arranged immediately in front of the system diaphragm, and a doublet design in mirror-image fashion relative thereto can be arranged behind the system diaphragm. The doublets are further framed by biconvex lenses on the object side and image side, respectively, in some embodiments.
The systems can be designed such that all the transparent optical elements are produced from the same material. This holds, in particular, for 248 nm, a pure quartz glass solution being advisable in technical terms. In the case of an embodiment designed for an operating wavelength of 193 nm, synthetic quartz glass suitable for 193 nm is also used for all the lenses. However, one or more lenses near the image or lenses of increased loading in terms of radiation and setting (dipole, quadrupole for a low sigma) can consist of another material, for example CaF2. Embodiments for 157 nm, in the case of which all the lenses consist of calcium fluoride or are combined with another fluoride crystal material, are possible. Also possible are combinations of a plurality of different materials, for example in order to facilitate the correction of chromatic aberrations, or to reduce compaction or lens heating. For example, for 193 nm the synthetic quartz glass can be replaced by a crystal material, for example calcium fluoride, in the case of some or all the lenses.
Very-high aperture projection objectives, in particular also purely refractive projection objectives, for which the image-side numerical aperture is NA≧0.85 are possible within the scope of the invention. The said aperture is preferably at least 0.9.
Preferred projection objectives are distinguished by a number of advantageous design and optical features which are conducive alone or in combination with one another for suiting the objective for ultra-fine microlithography.
At least one aspheric surface is preferably arranged in the region of the system diaphragm. It is preferred for a plurality of surfaces with aspherics to come in close succession behind the diaphragm. It can be advantageous, furthermore, when the last optical surface in front of the system diaphragm and the first optical surface after the system diaphragm are aspheric. Here, opposite aspheric surfaces with a curvature pointing away from the diaphragm can be provided, in particular. The high number of aspheric surfaces in the region of the system diaphragm is advantageous for the correction of the spherical aberration, and has an advantageous effect on the setting of the isoplanatism.
Furthermore, it can be advantageous when at least one positive meniscus lens with an object-side concave surface is arranged between the waist and the system diaphragm in the vicinity of the waist. Instead of one such meniscus lens, it is possible to provide a plurality, for example two, consecutive lenses of this type.
Particularly advantageous are embodiments in which the effective curvature changes, at least between two lenses, between waist and system diaphragm in this order, the effective curvature of the first lens being on the object side, and the effective curvature of the lens directly subsequent being on the image side. Preferably, in each case two consecutive positive lenses of the respective curvatures are provided. A change in the position of the centers of curvature of the effective curvature therefore takes place in the region between these lenses or lens groups.
It is preferred for a plurality of negative lenses to be arranged consecutively in the region of the waist, there being at least two, preferably three negative lenses in preferred embodiments. The said lenses bear the main load of the Petzval correction and a portion of the correction of the inclined ray bundles.
At least two negative lenses are advantageous at the object-side input of the system during entry into the first belly, in order to widen the beam coming from the object. Three or more such negative lenses are preferred. It is advantageous in the case of high input apertures when at least one aspheric surface is provided on at least one of the first lenses. Each of the input-side negative lenses preferably has at least one aspheric surface.
It is advantageous independently of the refractive power of the lenses when aspherization takes place on the wafer side on the first two lenses in each case given a single-waist objective. The closer the first aspheric is situated to the reticle, the higher is the ray bundle separation, and the more effective is the aspherization. The aspheric on the front side of the second lens is then also still very close to the reticle, but already has quite different ray bundle cross sections such that the pair of aspherics can ideally complement one another and act optimally over and above this. It may be mentioned as a precaution, however, that the ray bundle cross sections are particularly small, resulting in the need to produce particularly smooth aspheric lenses.
A lens group with a strong positive refractive power which constitutes the first belly in the beam guidance preferably follows behind this input group. Particularly advantageous are embodiments in which the effective curvature changes between reticle and waist, at least between two lenses, the effective curvature of the first lens being situated on the object side, and the effective curvature of the directly following lens being situated on the image side. Two consecutive positive lenses of the respective curvatures are preferably provided in each case. Thus, a change in the position of the centers of curvature of the effective curvature takes place in the region between these lenses or lens groups. At least one meniscus lens with positive refractive power and image-side concave surfaces can be advantageous in this group in the region of still great beam heights in the near zone of the object plane, since the said meniscus lens contributes to the Petzval relief of the objective.
The previous and other properties can be seen not only in the claims but also in the description and the drawings, wherein individual characteristics may be used either alone or in sub-combinations as an embodiment of the invention and in other areas and may individually represent advantageous and patentable embodiments.



BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a lens section through an embodiment of a refractive projection objective which is designed for an operating wavelength of 193 nm;
FIG. 2 is a lens section through an embodiment of a refractive projection objective which is designed for an operating wavelength of 157 nm;
FIG. 3 is a lens section through an embodiment of a refractive projection objective which is designed for an operating wavelength of 193 nm; and
FIG. 4 is a lens section through an embodiment of a refractive projection objective which is designed for an operating wavelength of 157 nm.



DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
In the following description of the preferred embodiment, the term “optical axis” denotes a straight line through the centers of curvature of the spherical optical components or through the axes of symmetry of aspheric elements. Directions and distances are described as on the image side, on the wafer side or towards the image when they are directed in the direction of the image plane or the substrate which is located there and is to be exposed, and as on the object side, on the reticle side or towards the object when they are directed towards the object with reference to the optical axis. In the examples, the object is a mask (reticle) with the pattern of an integrated-circuit, but another pattern, for example a grating, can also be involved. In the examples, the image is formed on a wafer serving as substrate and provided with a photoresist layer, but other substrates are also possible, for example elements for liquid crystal displays or substrates for optical gratings.
FIG. 1 shows a characteristic design of an inventive, purely refractive reduction objective 1. It serves the purpose of projecting a pattern, arranged in an object plane 2, of a reticle or the like into an image plane 3, conjugate with the object plane, to a reduced scale without instances of obscuration or shading in the image field, for example to the scale of 4:1. This is a rotational symmetrical single-waist system whose lenses are arranged along an optical axis 4, which is perpendicular to the object plane and image plane, and form an object-side belly 6, an image-side belly 8 and a waist 7 situated therebetween. The system diaphragm 5 is situated in the region, near the image, of large beam diameters.
The lenses can be subdivided into a plurality of consecutive lens groups with specific properties and functions. A first lens group LG1, following the object plane 2, at the input of the projection objective has a negative refractive power overall, and serves to expand the beam coming from the object field. A subsequent second lens group LG5 with a positive refractive power overall forms the first belly 6 and recombines the beam in front of the following waist 7. A third lens group LG3 with a negative refractive power is located in the region of the waist 7. The said third lens group is followed by a fourth lens group LG4, consisting of positive meniscus lenses, with a positive refractive power, which is followed by a fifth lens group LG5, consisting of negative meniscus lenses, with a negative refractive power. The subsequent lens group LG6 with a positive refractive power guides the radiation to the system diaphragm 5. Situated behind the latter is the seventh and last lens group LG7, which consists predominantly of individual lenses with a positive refractive power and makes the main contribution to the production of the very high image-side numerical aperture of NA=0.93.
The first lens group LG1 opens with three negative lenses 11, 12, 13 which comprise, in this order, a negative lens 11 with an aspheric entry side, a negative meniscus lens 12 with an image-side centre of curvature and an aspheric entry side, and a negative meniscus lens 13 with an object-side centre of curvature and an aspheric exit side. Given the high input aperture present, at least one aspheric surface should be provided on at least one of the first two lenses 11, 12, in order to limit the production of aberrations in this region. As in the present example, a (at least one) aspheric surface is preferably provided at each of the three negative lenses.
With a slight air separation behind the last lens 13 of the first lens group LG1, the second lens group LG2 has a biconvex positive lens 14, a further biconvex positive lens 15, a positive meniscus lens 16 with an image-side centre of curvature, a further positive lens 17 with a virtually flat exit side, a positive meniscus lens 18 with an image-side centre of curvature of the surfaces, and three further meniscus lenses 19, 20, 21 of the same direction of curvature. The entry side of the lens 15 and the exit side, reaching to the waist, of the last meniscus lens 21 are aspheric. An aspheric is therefore present in the region of the waist. This second lens group LG2 constitutes the first belly 6 of the objective. A particular feature is formed by the positive meniscus lens 16 which is arranged at the greatest diameter and whose centers of curvature are situated on the image side. This lens group serves the purpose, chiefly, of the Petzval correction, the distortion and telecentring correction and the field correction outside the main sections.
The third lens group LG3 consists of three negative meniscus lenses 22, 23, 24 whose boundary surfaces are spherical in each case. This lens group bears the main load of the correction of the field curvature and is fashioned such that despite the high system aperture of NA=0.93 the maximum incidence angles of the beams striking the lens surfaces are below approximately 60° or the sine of the incidence angles is below 0.85 in each case. The first negative lens 22 of the third group is preferably a strongly biconcave lens such that the main waist 7 opens with strongly curved surfaces.
The fourth lens group LG4, following the waist 7, consists of two positive meniscus lenses 24, 25 with object-side concave surfaces, the exit side of the input-side meniscus lens 24 being aspheric, and the remaining surfaces being spherical. In the case of other embodiments, it is also possible to provide at this point only a single positive meniscus of appropriate curvature.
The subsequent fifth lens group LG5 likewise has two meniscus lenses 27, 28, but these each have a negative refractive power, and the concave surfaces are directed towards the image field 3. If appropriate, it is also possible to provide at this point only one negative meniscus whose centre of curvature is situated on the wafer side. Such a group with at least one lens with a negative refractive power is a central correction element for the functioning of the single-waist system, in order to correct off-axis aberrations elegantly. In particular, this permits a compact design with relatively small lens diameters.
Because of the overall negative refractive power, the fifth lens group LG5 is also denoted here as a negative group. Each of the negative meniscus lenses 27, 28 can be characterized by a surface of curvature marked by dashes, which runs centrally between the entry and exit surfaces and whose radius rc can be calculated in accordance with Equation (1). Just like the surfaces of curvature of the individual lenses 27, 28, the surface of curvature of the overall negative group LG5, which is shown by dots and dashes and can be calculated in accordance with Equation (2), has a concave side directed towards the image surface 3 or a centre of curvature situated on the image side. It is situated centrally between the surfaces of curvature of the individual lenses 27, 28. The negative group is arranged approximately in the middle between the region of narrowest constriction of the waist 7 and the system diaphragm 5 in the region of diverging beams. Because of the curvature directed against the beam path, there occur at the exit surfaces of the two negative meniscus lenses, in particular at the exit surface of the first meniscus 27, high incidence angles of the emerging radiation which have a strong corrective action, in particular for the monochromatic aberrations depending strongly on field and pupil. In the case of other embodiments, a single negative lens with a surface of curvature concave towards the image can also be provided at this point. Negative groups with three or more lenses are also possible. It is not necessary for each of the lenses to be a negative lens when there are several lenses, as long as an overall negative refractive power results. Both excessively strong and excessively weak curvatures of the surface of curvature should be avoided, in order to permit a compromise between optimal corrective action and large incidence angles which can be mastered by production engineering. The ratio between the radius rc of the surface of curvature, shown by dots and dashes, of the lens group LG5 and the diaphragm diameter should be between approximately 0.8 and 2.2, and is approximately 1.035 in this embodiment (overall value).
It is particularly important, furthermore, that a change in the position of the centers of curvature between meniscuses of the fourth lens group LG4 and the lenses of the fifth lens group LG5 takes place in the input region, following the waist 7, of the second belly 8. It is possible to achieve thereby that inclined spherical aberration in the case of an extreme aperture can be smoothed.
The sixth lens group LG6 begins with a sequence of biconvex positive lenses 29, 30. Their collecting action is compensated again by a subsequent, strongly curved negative meniscus 31. This negative meniscus in front of the diaphragm 5 is bent towards the diaphragm, and therefore has a concave surface on the object side. The corresponding counterpart is seated immediately behind the diaphragm. This negative meniscus 32 is likewise curved towards the diaphragm and has a concave surface on the image side. It is followed by two large biconvex positive lenses 33, 34 with the largest diameter. Following thereupon are two positive meniscus lenses 35, 36 concave towards the image plane, a weakly negative meniscus lens 37, a weakly positive lens with a weakly curved entry side and a virtually flat exit side, and by a plane-parallel end plate 39.
The design of the second belly, which is relatively elongated and widens slowly from the waist to the largest diameter, is constructed in the region of the system diaphragm 5 in a fashion essentially symmetrical in relation to a plane of symmetry which runs perpendicular to the optical axis and is situated in the vicinity of the system diaphragm. Corresponding in a virtually mirror-image fashion in this case are the negative meniscus lenses 31, 32, the positive lenses 30, 33 enclosing the latter, and the biconvex lenses 29 and 34 arranged outside these doublets. The central region of the second belly around the diaphragm therefore contains as positive lenses only biconvex lenses, and as negative lenses only curved meniscuses. A meniscus-shaped air clearance is formed in each case in the doublets 30, 32 and 32, 33, respectively.
The first belly contains a weakly positive meniscus lens 19 in the decreasing region. With the subsequent, thicker meniscus lens 20, this forms a strongly curved air clearance open towards the outside. In the air clearance following thereupon, there is an air meniscus which is less curved and is closed towards the outside. An improved shell tuning in the sagittal and tangential sections is thereby possible. It is also possible thereby at the same time to keep angular loading in the region of the concave entry surface of the negative lens 22 below the aperture loading. The Petzval correction is performed substantially by the lenses in the waist region in conjunction with the large bellies. A single waist suffices, nevertheless. Good centring is to be ensured in particular in the case of the lens 27, curved towards the image, of negative refractive power of the fifth lens group, since a slight decentring would immediately supply coma contributions on the highly loaded exit surface.
The specification of the design is summarized in a known way in tabular form in Table 1. Here, column 1 gives the number of a refracting surface, or one distinguished in another way, column 2 gives the radius r of the surface (in mm), column 3 gives the distance d denoted as thickness, of the surface from the following surface (in mm), column 4 gives the material of the optical components, and column 5 gives the refractive index of the material of the component, which follows the entry surface. The useful, free radii or half the free diameter of the lenses (in mm) are specified in column 6.
In the case of the embodiment, twelve of the surfaces, specifically the surfaces 2, 4, 7, 10, 23, 31, 36, 41, 43, 45, 48 and 50 are aspheric. Table 2 specifies the corresponding aspheric data, the aspheric surfaces being calculated using the following rule:

p(h)=[((1/r)h2)/(1+SQRT(1−(1+K)(1/r)2h2))]+C1*h4+C2*h6+

Here, the reciprocal (1/r) of the radius specifies the surface curvature, and h the distance of a surface point from the optical axis. Consequently, p(h) gives the so-called sagitta, that is to say the distance of the surface point from the surface apex in the z direction, that is to say in the direction of the optical axis. The constants K, C1, C2, . . . are reproduced in Table 2.
The optical system 1, which can be reproduced with the aid of these data, is designed for an operating wavelength of approximately 193 nm, for which the synthetic quartz glass used for all the lenses has a refractive index n=1.56029. The image-side numerical aperture is 0.93. The objective has an overall length (distance between image plane and object plane) of 1342 mm, and the field size is 10.5*26.0 mm.
A projection objective is thereby created which operates at an operating wavelength of 193 nm, can be produced with the aid of conventional techniques for the lens production and coatings, and permits a resolution of structures far below 100 nm and is very well corrected. This becomes clear from low values of transverse aberration and a wavefront RMS value of at most 3.3 mλ at 193 nm over all image heights.
Another embodiment, which is designed for an operating wavelength of 157 nm and is constructed exclusively from calcium fluoride components is explained with the aid of FIG. 2 and Tables 3 and 4. The type and sequence of the lenses corresponds to the embodiment in accordance with FIG. 1. The mutually corresponding lenses and lens groups are therefore denoted by the same reference symbols. With an overall length of 1000 nm, the objective 100 is somewhat more compact and has a numerical aperture of 0.93 and a field size of 12*17 mm. A maximum wavefront RMS value of 3 mλ over all image heights substantiates an outstanding correction state of the objective. The example shows that the basic principles of the invention can easily be transferred to objectives for other wavelengths.
A further embodiment 300, which is designed for an operating wavelength of 193 nm is explained with the aid of FIG. 3 and Tables 5 and 6. All the lenses consist of the synthetic quartz glass, with the exception of the penultimate lens 38 near the image plane 3. The positive lens 38 consists of calcium fluoride and has a positive effect on transverse chromatic aberrations, while at the same time few undesired longitudinal chromatic aberrations are produced. The type and sequence of the lenses corresponds essentially to the embodiment in accordance with FIG. 1, the difference with respect to the latter being that the positive meniscus lens 36 there, which is concave towards the image, is split here in two positive meniscus lenses 36, 36′ with the same sense of curvature. The lenses and lens groups corresponding to one another are denoted by the same reference symbols. The objective 300 has an overall length of 1250 mm, an numerical aperture of NA=0.9, and a field size of 10.5×26 mm. The maximum wavefront RMS value is between 5 and 6 mλ.
Another embodiment, designed for an operating wavelength of 157 nm, of a projection objective 400 in the case of which all the lenses consist of calcium fluoride is explained with the aid of FIG. 4 and Tables 7 and 8. The crystallographic <111> axes of most or all of the lenses are situated in this case substantially parallel to the optical axis. The type and sequence of the lenses corresponds largely to the embodiment in accordance with FIG. 1, for which reason mutually corresponding lenses and lens groups are denoted by the same reference symbols. A numerical aperture of NA=0.95 is achieved given an overall length of approximately 1069 mm and a field size of 6.0×22 mm. A maximum wavefront RMS value of approximately 2.6 mλ over all image heights substantiates an outstanding correction state of the objective. The lenses 13, 15, 16, 18, 21, 24, 26, 28, 30, 33, 35 and 36 are each rotated by 60° about the optical axis by comparison with the remaining lenses, in order to achieve a correction of birefringence effects which can be caused by the intrinsic birefringence of calcium fluoride. These measures can also be provided in the case of the embodiment in accordance with FIG. 2. The design data of a comparable projection objective with NA=0.95 which is calculated for an operating wavelength of 193 nm are specified in Tables 9 and 10. If embodiments with <100>-orientated crystal lenses are provided, these are always mixed with <111>-orientated lenses. The relative rotation of <100> lenses which is suitable for compensation is approximately 45°, whereas for <111> lenses it is approximately 60°. It is basically possible to achieve good compensation whenever lenses with comparable optical paths and comparable incidence angles inside the material are rotated counter to one another in a pairwise and planned way.
The above description of the preferred embodiments has been given by way of example. From the disclosure given, those skilled in the art will not only understand the present invention and its attendant advantages, but will also find apparent various changes and modifications to the structures and methods disclosed. It is sought, therefore, to cover all changes and modifications as fall within the spirit and scope of the invention, as defined by the appended claims, and equivalents thereof.







TABLE 1







(Shs2003)
















REFRACTIVE INDEX
1/2 FREE


SURFACE
RADII
THICKNESSES
GLASSES
193.304 nm
DIAMETER















0
 0.000000000
33.600000000
L710
0.99998200
56.080


1
 0.000000000
2.116348742
L710
0.99998200
64.111


2
 543769.142501049AS 
8.000000000
SIO2HL
1.56028895
64.830


3
161.642131585
4.159723042
HE193
0.99971200
67.531


4
  218.691761237AS
8.400000000
SIO2HL
1.56028895
69.959


5
219.026045883
37.232327077
HE193
0.99971200
70.564


6
−126.273541233  
9.059812069
SIO2HL
1.56028895
71.879


7
  590.000664984AS
5.888594676
HE193
0.99971200
91.812


8
874.341541676
45.211384116
SIO2HL
1.56028895
98.202


9
−198.096216449  
0.750325389
HE193
0.99971200
103.786


10
  946.848097810AS
38.538214934
SIO2HL
1.56028895
123.489


11
−425.263923111  
1.158522801
HE193
0.99971200
125.869


12
350.163434277
30.488033825
SIO2HL
1.56028895
134.676


13
1009.701801617 
1.197549469
HE193
0.99971200
134.221


14
286.135356357
98.148093037
SIO2HL
1.56028895
134.698


15
19301.429695110 
0.700000000
HE193
0.99971200
123.374


16
272.045958073
31.009665217
SIO2HL
1.56028895
116.140


17
737.805495222
0.700000000
HE193
0.99971200
111.526


18
250.056020156
17.945571560
SIO2HL
1.56028895
104.536


19
331.911514310
0.700000000
HE193
0.99971200
99.743


20
254.183348934
45.167991817
SIO2HL
1.56028895
97.168


21
168.278221248
12.633486164
HE193
0.99971200
75.317


22
333.410550457
8.000000000
SIO2HL
1.56028895
73.766


23
  305.673163674AS
33.620359548
HE193
0.99971200
69.745


24
−126.882359261  
8.400000000
SIO2HL
1.56028895
68.517


25
623.561065898
22.920166250
HE193
0.99971200
69.269


26
−159.640135295  
21.959811493
SIO2HL
1.56028895
69.579


27
612.121329616
25.136797688
HE193
0.99971200
79.613


28
−256.899270677  
16.106811172
SIO2HL
1.56028895
82.648


29
 −6721.059689803   
10.198456701
HE193
0.99971200
95.151


30
−759.091077253  
33.505555154
SIO2HL
1.56028895
98.551


31
   −373.512212393AS
2.955259188
HE193
0.99971200
110.248


32
−482.275268598  
42.142366706
SIO2HL
1.56028895
113.540


33
−167.944569801  
24.912342267
HE193
0.99971200
117.230


34
352.644000465
12.417917014
SIO2HL
1.56028895
140.307


35
239.800147366
38.495163859
HE193
0.99971200
139.720


36
  919.430222419AS
12.380604737
SIO2HL
1.56028895
142.518


37
415.408472297
13.298822306
HE193
0.99971200
148.485


38
448.474261455
47.786431536
SIO2HL
1.56028895
160.368


39
 −1304.870981174   
0.700000000
HE193
0.99971200
162.101


40
549.477937127
77.507833077
SIO2HL
1.56028895
175.924


41
   −411.968607019AS
30.091104049
HE193
0.99971200
176.606


42
−264.054542030  
15.750000000
SIO2HL
1.56028895
176.112


43
   −528.210359924AS
37.000000000
HE193
0.99971200
186.586


44
 0.000000000
−10.000000000
HE193
0.99971200
183.991


45
  435.061723432AS
15.750000000
SIO2HL
1.56028895
198.802


46
280.349256994
17.105701219
HE193
0.99971200
193.492


47
322.068458373
94.193714724
SIO2HL
1.56028895
197.207


48
   −987.718496827AS
1.636340795
HE193
0.99971200
196.856


49
335.441022838
82.947217201
SIO2HL
1.56028895
188.622


50
 −1114.388548306AS 
1.270418444
HE193
0.99971200
185.311


51
160.565830600
40.174196562
SIO2HL
1.56028895
132.555


52
202.910977254
1.342289784
HE193
0.99971200
122.679


53
157.797608135
61.229633415
SIO2HL
1.56028895
114.327


54
535.601426702
12.273585235
HE193
0.99971200
94.469


55
15736.124930284 
15.585688667
SIO2HL
1.56028895
82.958


56
394.939976545
3.776081840
HE193
0.99971200
66.876


57
316.842290121
22.015913317
SIO2HL
1.56028895
60.946


58
7602.251381444 
2.700000000
L710
0.99998200
48.241


59
 0.000000000
3.150000000
SIO2HL
1.56028895
40.032


60
 0.000000000
9.000000000
L710
0.99998200
37.593


61
 0.000000000
0.000000000

1.00000000
14.020


















TABLE 2









SURFACE NO. 2










K
 0.0000



C1
 1.22433248e−008



C2
 9.17630275e−012



C3
 5.91043068e−016



C4
−2.47816893e−019



C5
 3.41011256e−023



C6
−2.42906864e−027









SURFACE NO. 4










K
 0.0000



C1
 2.09935818e−007



C2
−1.58583859e−011



C3
−7.02615456e−016



C4
 3.85802113e−019



C5
−7.10886225e−023



C6
 7.34912873e−027



C7
−3.35590933e−031









SURFACE NO. 7










K
 0.0000



C1
 6.30425513e−009



C2
−3.91904384e−013



C3
−1.31611782e−017



C4
−2.73217947e−021



C5
−3.04177451e−025



C6
 6.68937241e−029



C7
−3.22999413e−033









SURFACE NO. 10










K
 0.0000



C1
 4.51583031e−009



C2
 1.37702459e−013



C3
−6.06055882e−018



C4
−2.53779695e−022



C5
−3.73570196e−027



C6
 1.13076924e−030



C7
−3.82690442e−035









SURFACE NO. 23










K
 0.0000



C1
 7.72459905e−008



C2
 3.04280743e−012



C3
 2.31066672e−016



C4
 4.78460943e−021



C5
 4.57773509e−024



C6
−5.03222417e−028



C7
 5.93537498e−032









SURFACE NO. 31










K
 0.0000



C1
 1.22715232e−008



C2
−5.90002335e−013



C3
−1.03677463e−017



C4
 1.00008208e−022



C5
 1.75475591e−026



C6
−6.61198967e−031









SURFACE NO. 36










K
 0.0000



C1
 3.01531517e−009



C2
−4.91017017e−014



C3
 2.759944892−019



C4
 2.00585563e−023



C5
−1.33495290e−027



C6
 7.55261132e−032



C7
−3.14630848e−037









SURFACE NO. 41










K
 0.0000



C1
−3.34727519e−010



C2
−1.54638784e−014



C3
−2.56886946e−019



C4
 2.42822109e−025



C5
 1.92288995e−029



C6
 7.09209045e−033









SURFACE NO. 43










K
 0.0000



C1
−6.26438092e−010



C2
−2.42562722e−015



C3
−1.54495891e−019



C4
−1.83563042e−024



C5
 4.03910963e−029



C6
 2.69828997e−033



C7
−1.10606501e−037









SURFACE NO. 45










K
 0.0000



C1
−3.73975169e−009



C2
−3.74336974e−015



C3
 9.45872960e−019



C4
−1.44091264e−024



C5
 1.88129553e−028



C6
 2.31885357e−033



C7
−7.26295145e−038









SURFACE NO. 48










K
 0.0000



C1
−4.13086555e−010



C2
 3.90501705e−014



C3
 3.91619841e−020



C4
 3.21475780e−024



C5
 1.41056342e−028



C6
 7.14264851e−034



C7
 1.33303621e−038









SURFACE NO. 50










K
 0.0000



C1
 8.02621332e−010



C2
 1.98373377e−014



C3
 1.35524355e−022



C4
−1.48469224e−024



C5
−1.00499822e−030



C6
−1.45678875e−033



C7
 5.08658073e−038

















TABLE 3







(Shs2004)
















REFRACTIVE INDEX
1/2 FREE


SURFACE
RADII
THICKNESSES
GLASSES
157.629 nm
DIAMETER















0
 0.000000000
25.017498240
N2V157
1.00031429
41.617


1
 0.000000000
1.905032434
N2V157
1.00031429
47.527


2
 19166.139614900AS
5.960085409
CAF2V157
1.55929035
48.157


3
119.172116093
3.094631417
N2V157
1.00031429
50.106


4
  160.220213679AS
6.254374560
CAF2V157
1.55929035
51.869


5
162.519152248
27.782451972
N2V157
1.00031429
52.305


6
 −94.077615349  
6.711100917
CAF2V157
1.55929035
53.364


7
  434.801298224AS
4.386889894
N2V157
1.00031429
67.969


8
645.264518232
33.749703361
CAF2V157
1.55929035
72.538


9
−148.333939508  
0.521197880
N2V157
1.00031429
76.917


10
  709.275977518AS
29.000976049
CAF2V157
1.55929035
91.242


11
−317.503191065  
0.562186502
N2V157
1.00031429
93.166


12
259.994970434
20.919102516
CAF2V157
1.55929035
99.645


13
776.574450968
0.791803254
N2V157
1.00031429
99.389


14
215.152145251
73.117973823
CAF2V157
1.55929035
99.739


15
20868.347899500 
0.521197880
N2V157
1.00031429
91.408


16
202.493483250
23.070977801
CAF2V157
1.55929035
86.145


17
558.418132627
0.521197880
N2V157
1.00031429
82.759


18
186.405556634
13.439476629
CAF2V157
1.55929035
77.613


19
267.922416674
0.521197880
N2V157
1.00031429
74.394


20
200.469246207
33.723938177
CAF2V157
1.55929035
72.415


21
125.811608898
9.365001399
N2V157
1.00031429
55.894


22
248.201572583
5.956547200
CAF2V157
1.55929035
54.715


23
  223.381908745AS
25.172315656
N2V157
1.00031429
51.710


24
 −94.453554360  
6.254374560
CAF2V157
1.55929035
50.681


25
485.764221114
17.150487522
N2V157
1.00031429
51.201


26
−117.021217251  
16.344741038
CAF2V157
1.55929035
51.440


27
453.448396924
18.745918625
N2V157
1.00031429
58.835


28
−192.539933332  
12.040746634
CAF2V157
1.55929035
61.189


29
−10110.942296700   
7.631352005
N2V157
1.00031429
70.434


30
−598.476704330  
24.995144443
CAF2V157
1.55929035
73.019


31
   −277.690546428AS
2.270348155
N2V157
1.00031429
81.569


32
−357.341411711  
31.502092471
CAF2V157
1.55929035
83.988


33
−124.901240251  
18.757658255
N2V157
1.00031429
86.879


34
262.323405524
9.339597466
CAF2V157
1.55929035
103.686


35
178.666624180
28.718074096
N2V157
1.00031429
103.248


36
  686.201269935AS
9.311366752
CAF2V157
1.55929035
105.517


37
309.588340572
9.899187354
N2V157
1.00031429
109.811


38
334.272397140
35.656478162
CAF2V157
1.55929035
119.166


39
−969.269108454  
0.543015101
N2V157
1.00031429
120.560


40
408.715545997
57.937117409
CAF2V157
1.55929035
131.252


41
   −306.960999184AS
22.291849608
N2V157
1.00031429
131.758


42
−196.797761340  
11.726952300
CAF2V157
1.55929035
131.415


43
   −394.026784416AS
27.549030800
N2V157
1.00031429
139.222


44
 0.000000000
−7.445684000
N2V157
1.00031429
137.237


45
  324.234131088AS
11.726952300
CAF2V157
1.55929035
148.288


46
208.898767751
12.784071759
N2V157
1.00031429
144.316


47
239.964906784
70.883531850
CAF2V157
1.55929035
147.077


48
   −736.057578242AS
0.747525039
N2V157
1.00031429
146.792


49
249.829910804
61.833878347
CAF2V157
1.55929035
140.681


50
   −825.134407817AS
1.050234898
N2V157
1.00031429
138.269


51
119.514360013
29.939342632
CAF2V157
1.55929035
98.761


52
151.480856759
1.047402614
N2V157
1.00031429
91.482


53
117.647396280
45.612524461
CAF2V157
1.55929035
85.201


54
398.984860293
9.163549260
N2V157
1.00031429
70.387


55
10414.727506900 
11.628662517
CAF2V157
1.55929035
61.739


56
294.280794199
2.821757461
N2V157
1.00031429
49.745


57
237.014551128
16.417043400
CAF2V157
1.55929035
45.331


58
5516.098537170 
2.010334680
N2V157
1.00031429
35.814


59
 0.000000000
2.345390460
CAF2V157
1.55929035
30.321


60
 0.000000000
6.701115600
N2V157
1.00031429
28.554


61
 0.000000000



10.404


















TABLE 4









SURFACE NO. 2










K
 0.0000



C1
 4.04200750e−008



C2
 3.81876586e−011



C3
 5.03315092e−015



C4
−3.49627521e−018



C5
 8.55465831e−022



C6
−1.10162987e−025









SURFACE NO. 4










K
 0.0000



C1
 5.00885457e−007



C2
−6.73594057e−011



C3
−5.63021479e−015



C4
 5.25874660e−018



C5
−1.72712950e−021



C6
 3.13784558e−025



C7
−2.59898831e−029









SURFACE NO. 7










K
 0.0000



C1
 1.63223882e−008



C2
−1.63813024e−012



C3
−1.08828380e−016



C4
−5.14236275e−020



C5
−4.70980651e−024



C6
 2.65671689e−027



C7
−2.41428161e−031









SURFACE NO. 10










K
 0.0000



C1
 1.08458836e−008



C2
 6.34606387e−013



C3
−4.79999941e−017



C4
−3.88550006e−021



C5
−7.97813456e−026



C6
 5.17810873e−029



C7
−3.15751405e−033









SURFACE NO. 23










K
 0.0000



C1
 1.86228378e−007



C2
 1.34530827e−011



C3
 1.90817638e−015



C4
 2.47700195e−020



C5
 1.48998352e−022



C6
−3.26357684e−026



C7
 6.39194153e−030









SURFACE NO. 31










K
 0.0000



C1
 3.00166168e−008



C2
−2.58415596e−012



C3
−8.33331517e−017



C4
 1.36287634e−021



C5
 4.56615511e−025



C6
−3.21288704e−029









SURFACE NO. 36










K
 0.0000



C1
 7.42096101e−009



C2
−2.14890363e−013



C3
 2.10259884e−018



C4
 2.93924925e−022



C5
−3.44512052e−026



C6
 3.42432345e−030



C7
−2.42014198e−035









SURFACE NO. 41










K
 0.0000



C1
−8.35434016e−010



C2
−6.91469747e−014



C3
−2.02033656e−018



C4
 2.25402896e−024



C5
 3.72242911e−028



C6
 3.20803731e−031









SURFACE NO. 43










K
 0.0000



C1
−1.52986987e−009



C2
−1.10887104e−014



C3
−1.19044876e−018



C4
−2.65113635e−023



C5
 1.01435593e−027



C6
 1.25351252e−031



C7
−9.10473118e−036









SURFACE NO. 45










K
 0.0000



C1
−9.04760702e−009



C2
−1.63991553e−014



C3
 7.44005317e−018



C4
−2.09009335e−023



C5
 4.81547907e−027



C6
 1.07329470e−031



C7
−6.06561304e−036









SURFACE NO. 48










K
 0.0000



C1
−1.01554668e−009



C2
 1.70305715e−013



C3
 2.95803828e−019



C4
 4.48800481e−023



C5
 3.60194072e−027



C6
 3.09218205e−032



C7
 1.11798441e−036









SURFACE NO. 50










K
 0.0000



C1
 1.93111104e−009



C2
 8.65128317e−014



C3
 6.58669900e−021



C4
−2.03332737e−023



C5
−2.20168557e−029



C6
−6.84618723e−032



C7
 4.14434278e−036

















TABLE 5







(m1659a)
















REFRACTIVE INDEX
1/2 FREE


SURFACE
RADII
THICKNESSES
GLASSES
193.304 nm
DIAMETER















0
 0.000000000
32.000000000
L710
0.99998200
56.080


1
 0.000000000
3.100000000
L710
0.99998200
63.460


2
 0.000000000
8.000000000
SIO2HL
1.56028900
64.175


3
214.374691678
6.768422494
HE193
0.99971200
66.898


4
  678.966348965AS
8.000000000
SIO2HL
1.56028900
68.402


5
295.639011035
37.169733715
HE193
0.99971200
69.900


6
−111.652837331  
16.192909187
SIO2HL
1.56028900
71.248


7
  1435.346896630AS
2.614024194
HE193
0.99971200
97.000


8
1427.381076990 
41.812512207
SIO2HL
1.56028900
100.696


9
−207.640254189  
0.700000000
HE193
0.99971200
106.045


10
  584.088602595AS
42.576490437
SIO2HL
1.56028900
132.378


11
−481.678249044  
0.700000000
HE193
0.99971200
134.179


12
406.807321876
35.706452882
SIO2HL
1.56028900
142.827


13
 −5625.700893160   
0.700000000
HE193
0.99971200
142.670


14
298.176737082
79.446714434
SIO2HL
1.56028900
140.967


15
−13921.627398000   
3.719595268
HE193
0.99971200
131.651


16
448.349842071
28.279136919
SIO2HL
1.56028900
123.944


17
1417.631668090 
0.792030769
HE193
0.99971200
118.744


18
223.937979671
14.944850216
SIO2HL
1.56023900
107.384


19
146.318064199
3.170742365
HE193
0.99971200
95.625


20
122.769528398
41.476354079
SIO2HL
1.56028900
92.370


21
392.244315955
7.795170437
HE193
0.99971200
86.941


22
704.124769671
12.864149054
SIO2HL
1.56028900
84.284


23
  206.226483591AS
41.697630229
HE193
0.99971200
71.571


24
−136.542261472  
8.000000000
SIO2HL
1.56028900
68.125


25
188.276100920
34.851670699
HE193
0.99971200
66.714


26
−266.296401208  
11.337537040
SIO2HL
1.56028900
68.908


27
828.502027259
27.472554480
HE193
0.99971200
73.632


28
−188.039957784  
10.048803630
SIO2HL
1.56028900
76.651


29
−286.338776941  
11.364281707
HE193
0.99971200
82.442


30
−195.263210167  
27.977992639
SIO2HL
1.56028900
84.451


31
   −210.425554231AS
2.668847644
HE193
0.99971200
95.869


32
−359.454820504  
33.263873624
SIO2HL
1.56028900
100.866


33
−179.268898245  
19.520108899
HE193
0.99971200
105.926


34
301.090725759
12.000000000
SIO2HL
1.56028900
123.535


35
210.449149431
31.394452961
HE193
0.99971200
122.750


36
  708.827802225AS
12.000000000
SIO2HL
1.56028900
124.201


37
368.041113973
9.972701330
HE193
0.99971200
128.960


38
399.107567619
44.538775677
SIO2HL
1.56028900
136.284


39
−764.045549260  
0.700000000
HE193
0.99971200
137.910


40
551.145029040
48.906287759
SIO2HL
1.56028900
145.979


41
   −510.329983328AS
33.432166582
HE193
0.99971200
146.810


42
−234.804925584  
15.000000000
SIO2HL
1.56028900
146.808


43
−435.743783861  
24.039044390
HE193
0.99971200
156.860


44
 0.000000000
1.800000000
HE193
0.99971200
158.282


45
  548.700219435AS
15.000000000
SIO2HL
1.56028900
173.490


46
301.445277190
13.491008474
HE193
0.99971200
174.191


47
366.662373729
87.073931844
SIO2HL
1.56028900
176.150


48
   −550.992057843AS
0.700000000
HE193
0.99971200
177.412


49
470.272792479
71.690763514
SIO2HL
1.56028900
176.239


50
   −524.235839398AS
0.700000000
HE193
0.99971200
175.005


51
143.906521816
40.003798335
SIO2HL
1.56028900
123.753


52
189.600309947
1.071971036
HE193
0.99971200
116.154


53
144.836316227
31.828068261
SIO2HL
1.56028900
108.008


54
218.443210665
0.700000000
HE193
0.99971200
100.536


55
190.712173887
25.768276703
SIO2HL
1.56028900
97.024


56
370.701088466
9.564358749
HE193
0.99971200
87.535


57
807.447019199
15.749130690
SIO2HL
1.56028900
80.461


58
171.924005396
7.148775604
HE193
0.99971200
61.353


59
181.279659482
24.378394256
CAF2HL
1.50143600
55.679


60
1752.925125720 
3.615508978
L710
0.99998200
42.509


61
 0.000000000
3.000000000
SIO2HL
1.56028900
34.651


62
 0.000000000
8.000000000
L710
0.99998200
32.423


63
 0.000000000



14.020


















TABLE 6









SURFACE NO. 4










K
 0.0000



C1
 1.89471885e−007



C2
−6.02710229e−012



C3
 1.53417903e−016



C4
−2.42817642e−020



C5
 5.70562716e−024



C6
−7.46671442e−028



C7
 4.25930704e−032









SURFACE NO. 7










K
 0.0000



C1
 3.66131696e−009



C2
−1.30949841e−013



C3
 1.06295513e−016



C4
−9.94272982e−021



C5
 3.83041775e−025



C6
 2.71682194e−030



C7
−5.66222517e−034









SURFACE NO. 10










K
 0.0000



C1
−5.39079178e−010



C2
 1.65472968e−013



C3
−1.48200988e−018



C4
−4.26542196e−022



C5
 2.23375010e−026



C6
−4.68780777e−031



C7
 2.49086051e−036









SURFACE NO. 23










K
 0.0000



C1
 1.12693938e−007



C2
 3.12498460e−012



C3
 1.69981511e−016



C4
 3.48067953e−020



C5
−5.03222312e−024



C6
 8.68868128e−028



C7
−3.88286424e−032









SURFACE NO. 31










K
 0.0000



C1
 7.59066257e−009



C2
−5.13712565e−013



C3
−1.12360493e−017



C4
−1.78576425e−021



C5
 9.58992339e−026



C6
−6.73381570e−030









SURFACE NO. 36










K
 0.0000



C1
 1.25923077e−009



C2
−2.53075485e−014



C3
 3.04931813e−018



C4
−1.11476591e−022



C5
−2.12954081e−027



C6
 3.80719952e−031



C7
−1.32616533e−035









SURFACE NO. 41










K
 0.0000



C1
 8.47964979e−010



C2
 1.31624211e−014



C3
−6.67941632e−019



C4
−2.85032922e−023



C5
 9.45648624e−028



C6
 3.12077825e−033









SURFACE NO. 45










K
 0.0000



C1
−3.98398365e−009



C2
−8.63014001e−015



C3
 1.08554002e−018



C4
 3.83549756e−025



C5
 4.90933881e−028



C6
 5.51369375e−033



C7
−2.09514835e−037









SURFACE NO. 48










K
 0.0000



C1
−2.57047835e−011



C2
 2.34238635e−014



C3
 2.59035963e−019



C4
 2.27193081e−024



C5
 5.82554954e−029



C6
 4.60561363e−033



C7
−4.21140368e−038









SURFACE NO. 50










K
 0.0000



C1
 4.01128359e−010



C2
 2.65597086e−015



C3
 6.44693849e−020



C4
 4.81837039e−024



C5
 1.01089127e−028



C6
−5.98482220e−033



C7
 1.07932955e−037

















TABLE 7







(Shs2010)
















REFRACTIVE INDEX
1/2 FREE


SURFACE
RADII
THICKNESSES
GLASSES
157.629 nm
DIAMETER















0
 0.000000000
27.200000000
N2V157
1.00031429
45.607


1
 0.000000000
1.078880752
N2V157
1.00031429
52.255


2
  1045.314373860AS
7.513476207
CAF2V157
1.55929035
53.175


3
114.248430605
5.626540893
N2V157
1.00031429
54.906


4
  186.055500442AS
9.260588934
CAF2V157
1.55929035
57.362


5
182.393999171
22.566534529
N2V157
1.00031429
58.070


6
−183.513133835  
7.502341067
CAF2V157
1.55929035
59.394


7
  283.035779024AS
6.154441203
N2V157
1.00031429
69.752


8
401.580615857
36.640413384
CAF2V157
1.55929035
74.376


9
−281.777697307  
0.861477292
N2V157
1.00031429
82.029


10
  353.134032777AS
21.777939897
CAF2V157
1.55929035
96.624


11
6025.441766310 
0.939333289
N2V157
1.00031429
97.803


12
215.727113313
16.642509432
CAF2V157
1.55929035
104.912


13
311.039356614
1.720069535
N2V157
1.00031429
104.543


14
228.409410676
53.091993802
CAF2V157
1.55929035
105.751


15
−758.217583901  
0.700000000
N2V157
1.00031429
103.603


16
132.798453265
34.216733306
CAF2V157
1.55929035
92.164


17
325.068121782
0.700376490
N2V157
1.00031429
87.829


18
274.542764700
14.522646582
CAF2V157
1.55929035
86.310


19
338.880545591
0.701615532
N2V157
1.00031429
81.119


20
290.554636535
35.428116482
CAF2V157
1.55929035
79.777


21
3517.019128770 
8.536647573
N2V157
1.00031429
66.983


22
−432.647390565  
7.503695666
CAF2V157
1.55929035
63.895


23
  351.066950680AS
27.713652572
N2V157
1.00031429
55.675


24
 −96.698497704  
6.786155040
CAF2V157
1.55929035
54.460


25
409.131134381
22.127454363
N2V157
1.00031429
55.555


25
−112.905403831  
7.514387520
CAF2V157
1.55929035
56.043


27
648.671802143
18.457185848
N2V157
1.00031429
63.374


28
−184.515622336  
13.993219919
CAF2V157
1.55929035
65.303


29
1230.992852820 
11.356478659
N2V157
1.00031429
79.407


30
 −2362.593927680   
29.065160418
CAF2V157
1.55929035
87.263


31
   −316.217892752AS
1.235135355
N2V157
1.00031429
96.738


32
−382.379645390  
44.746901069
CAF2V157
1.55929035
98.349


33
−129.769453881  
0.793115744
N2V157
1.00031429
102.434


34
340.264743344
12.064670296
CAF2V157
1.55929035
119.942


35
229.694535355
31.128991673
N2V157
1.00031429
120.145


36
  1287.330025580AS
9.736539177
CAF2V157
1.55929035
121.539


37
364.756756968
9.358478921
N2V157
1.00031429
127.928


38
397.094346162
41.827853290
CAF2V157
1.55929035
136.576


39
−976.995908198  
0.786915821
N2V157
1.00031429
138.444


40
410.514102518
80.508348674
CAF2V157
1.55929035
150.286


41
   −324.940917692AS
28.497218849
N2V157
1.00031429
150.806


42
−210.576089850  
12.724040700
CAF2V157
1.55929035
149.372


43
   −405.186570491AS
54.127665200
N2V157
1.00031429
157.522


44
 0.000000000
−32.315024000
N2V157
1.00031429
161.249


45
  367.399928082AS
12.724040700
CAF2V157
1.55929035
163.212


46
234.556148176
15.776145720
N2V157
1.00031429
158.116


47
262.828171603
81.195503690
CAF2V157
1.55929035
162.673


48
   −725.847919437AS
0.700158254
N2V157
1.00031429
162.170


49
246.701752532
66.006758182
CAF2V157
1.55929035
152.284


50
 −2127.656595970AS 
0.700000000
N2V157
1.00031429
148.983


51
139.223624657
30.839009177
CAF2V157
1.55929035
110.611


52
186.041725727
0.700000000
N2V157
1.00031429
103.950


53
144.468793673
48.246174525
CAF2V157
1.55929035
97.488


54
  576.304531006AS
11.297930555
N2V157
1.00031429
82.155


55
 −1203.254778000   
12.806934866
CAF2V157
1.55929035
73.193


56
670.188680719
2.550471395
N2V157
1.00031429
60.877


57
358.370758649
16.126420420
CAF2V157
1.55929035
55.058


58
 −2011.367216580   
2.181264120
N2V157
1.00031429
46.664


59
 0.000000000
7.500000000
CAF2V157
1.55929035
38.403


60
 0.000000000
7.000000000
N2V157
1.00031429
32.640


61
 0.000000000



11.402


















TABLE 8









SURFACE NO. 2










K
 0.0000



C1
 1.43214516e−007



C2
−1.05523323e−011



C3
 1.33937296e−014



C4
−3.81541827e−018



C5
 7.71238693e−022



C6
−1.24242959e−025



C7
 1.04382716e−029









SURFACE NO. 4










K
 0.0000



C1
 4.22469071e−007



C2
−2.02044975e−011



C3
−9.99096667e−015



C4
 2.57319928e−018



C5
−3.55404240e−022



C6
 2.76031008e−026



C7
−1.04425360e−030









SURFACE NO. 7










K
 0.0000



C1
 6.69007068e−008



C2
−8.14794171e−012



C3
 1.44046983e−016



C4
−6.18733673e−020



C5
 1.33863248e−024



C6
 6.01771051e−028



C7
−4.18169671e−032









SURFACE NO. 10










K
 0.0000



C1
 2.09103125e−008



C2
 3.74013441e−013



C3
−4.28287142e−017



C4
−7.74198571e−021



C5
 7.15651505e−025



C6
−2.00926873e−029



C7
−1.13570242e−034









SURFACE NO. 23










K
 0.0000



C1
 2.79935405e−007



C2
 1.51575623e−011



C3
 1.48076409e−015



C4
 1.82749522e−019



C5
 4.42569184e−023



C6
−6.88248081e−027



C7
 2.98012936e−030









SURFACE NO. 31










K
 0.0000



C1
 3.37616068e−008



C2
−1.35772165e−012



C3
−9.13855026e−017



C4
 2.55494973e−021



C5
 8.18743728e−026



C6
−3.21333945e−030



C7
−1.70882417e−034









SURFACE NO. 36










K
 0.0000



C1
 3.39133645e−009



C2
−1.01165561e−013



C3
−4.16392158e−018



C4
−4.60775252e−023



C5
−4.18366165e−027



C6
−3.56809896e−032



C7
 6.85585311e−036









SURFACE NO. 41










K
 0.0000



C1
−1.50447859e−009



C2
−4.05442091e−014



C3
−7.06684952e−019



C4
−2.92843853e−023



C5
 4.58323842e−028



C6
 2.24810472e−032



C7
 3.26320529e−037









SURFACE NO. 43










K
 0.0000



C1
−1.43187993e−009



C2
 8.61397718e−015



C3
−4.27133053e−019



C4
−1.67623847e−023



C5
 7.56870039e−028



C6
 4.59600825e−032



C7
−1.56107786e−036









SURFACE NO. 45










K
 0.0000



C1
−7.40459945e−009



C2
−9.68327166e−015



C3
 4.20547857e−018



C4
−2.29946961e−023



C5
 1.66748551e−027



C6
 4.76274324e−032



C7
−1.41676650e−036









SURFACE NO. 48










K
 0.0000



C1
−1.11964446e−009



C2
 1.27445676e−013



C3
−6.74866729e−020



C4
 3.35598915e−023



C5
 1.67085809e−027



C6
−9.92306326e−033



C7
 4.04149705e−037









SURFACE NO. 50










K
 0.0000



C1
 1.68697911e−009



C2
 6.71519010e−014



C3
−1.12711844e−018



C4
−3.58730491e−023



C5
 4.82205527e−028



C6
 2.73665299e−032



C7
−6.49697083e−037









SURFACE NO. 54










K
 0.0000



C1
 8.11862732e−010



C2
 9.24410971e−014



C3
 4.20674572e−018



C4
 1.09384658e−021



C5
−1.19932277e−025



C6
 5.78613553e−030



C7
−3.28204739e−034

















TABLE 9







(SHS2007)
















REFRACTIVE INDEX
1/2 FREE


SURFACE
RADII
THICKNESSES
GLASSES
193.304 nm
DIAMETER















0
 0.000000000
33.600000000
L710
0.99998200
54.406


1
 0.000000000
0.700000000
L710
0.99958200
62.622


2
  6082.059008953AS
8.000000000
SIO2HL
1.56028895
63.203


3
143.971066538
5.220564877
HE193
0.99971200
65.679


4
  220.728491318AS
14.894807261
SIO2HL
1.56028895
67.999


5
255.425625405
25.437504335
HE193
0.99971200
69.274


6
−213.790257832  
8.000767193
SIO2HL
1.56028895
70.782


7
  363.835685805AS
7.715328993
HE193
0.99971200
82.296


8
609.577684342
43.913943130
SIO2HL
1.56028895
86.335


9
−315.746821165  
0.872144807
HE193
0.99971200
96.478


10
  455.762005384AS
27.106087992
SIO2HL
1.56028895
113.107


11
7229.021339243 
0.704758668
HE193
0.99971200
115.284


12
251.626671247
20.976022785
SIO2HL
1.56028895
124.960


13
363.067076891
3.470948804
HE193
0.99971200
124.571


14
282.856636492
67.559653556
SIO2HL
1.56028895
126.222


15
−901.244370913  
2.358079827
HE193
0.99971200
123.665


16
160.340001669
41.155799240
SIO2HL
1.56028895
111.328


17
490.332334286
1.787006860
HE193
0.99971200
107.624


18
400.692503878
17.482624917
SIO2HL
1.56028895
105.263


19
1050.089846531 
1.273289975
HE193
0.99971200
101.323


20
682.408004442
43.747762196
SIO2HL
1.56028895
98.609


21
3103.102640660 
10.767552226
HE193
0.99971200
79.838


22
−449.343998255  
8.151994354
SIO2HL
1.56028895
76.964


23
  481.606355829AS
34.236197830
HE193
0.99971200
67.953


24
−121.665966102  
8.400000000
SIO2HL
1.56028895
65.854


25
374.980814433
26.204024332
HE193
0.99971200
67.217


26
−143.249767685  
8.035536657
SIO2HL
1.56028895
67.743


27
884.703729247
23.779221943
HE193
0.99971200
76.105


28
−243.493696219  
18.114116074
SIO2HL
1.56028895
80.078


29
11014.244256721 
14.108602625
HE193
0.99971200
95.668


30
 −1710.670778965   
36.476108265
SIO2HL
1.56028895
105.564


31
   −509.290793668AS
3.799046038
HE193
0.99971200
120.040


32
−522.760271037  
55.102056532
SIO2HL
1.56028895
121.425


33
−162.101214724  
0.700000000
HE193
0.99971200
126.271


34
408.832035177
12.000000000
SIO2HL
1.56028895
148.654


35
285.314514094
38.599460894
HE193
0.99971200
148.869


36
  1647.197381937AS
12.000000000
SIO2HL
1.56028895
150.501


37
452.111295331
11.431144357
HE193
0.99971200
158.593


38
495.143365449
50.265656014
SIO2HL
1.56028895
169.187


39
 −1181.451218240   
0.700000000
HE193
0.99971200
171.160


40
504.444538837
108.303739630
SIO2HL
1.56028395
186.338


41
   −402.406909600AS
35.218931962
HE193
0.99971200
187.299


42
−260.687700983  
15.750000000
SIO2HL
1.56028895
185.680


43
   −501.804439493AS
67.000000000
HE193
0.99971200
196.016


44
 0.000000000
−40.000000000
HE193
0.99971200
200.793


45
  439.023921910AS
15.750000000
SIO2HL
1.56028895
203.535


46
286.281672961
18.419961595
HE193
0.99971200
196.728


47
320.640783540
98.196888764
SIO2HL
1.56028895
201.435


48
   −938.097514827AS
0.700000000
HE193
0.99971200
200.897


49
302.624264758
84.618876500
SIO2HL
1.56028895
188.254


50
 −3200.587702255AS 
0.730670643
HE193
0.99971200
182.786


51
170.842340056
38.317749380
SIO2HL
1.56028895
136.139


52
222.792535873
1.144357720
HE193
0.99971200
127.200


53
170.961511698
59.825366410
SIO2HL
1.56028895
118.623


54
  671.886005497AS
14.144748840
HE193
0.99971200
100.059


55
 −1782.275044587   
16.050043219
SIO2HL
1.56028895
86.783


56
683.979935539
3.683343415
HE193
0.99971200
71.293


57
415.132395267
20.066273975
SIO2HL
1.56028895
64.045


58
 −3089.397426921   
2.700000000
L710
0.99998200
53.104


59
 0.000000000
3.150000000
SIO2HL
1.56028895
43.475


60
 0.000000000
9.000000000
L710
0.99998200
41.056


61
 0.000000000



13.602


















TABLE 10









SURFACE NO. 2










K
 0.0000



C1
 6.13378195e−008



C2
−1.21093962e−012



C3
 4.03974995e−015



C4
−9.55444255e−019



C5
 1.47785598e−022



C6
−1.63598785e−026



C7
 8.81916303e−031









SURFACE NO. 4










K
 0.0000



C1
 2.40106346e−007



C2
−1.01253531e−011



C3
−3.29559355e−015



C4
 7.33617239e−019



C5
−8.72083684e−023



C6
 6.00312066e−027



C7
−1.30286882e−031









SURFACE NO. 7










K
 0.0000



C1
 4.18009370e−008



C2
−2.90287476e−012



C3
−6.63126937e−017



C4
−1.02006062e−020



C5
 1.19401776e−024



C6
−3.86272749e−029



C7
 1.07942556e−033









SURFACE NO. 10










K
 0.0000



C1
 1.02570958e−008



C2
 1.91710967e−013



C3
−2.01472753e−017



C4
−9.85838048e−022



C5
 8.93935503e−026



C6
−2.25592871e−030



C7
 6.58672348e−036









SURFACE NO. 23










K
 0.0000



C1
 1.54526224e−007



C2
 5.83194952e−012



C3
 3.45258425e−016



C4
 3.91617672e−020



C5
 4.12332466e−025



C6
 3.60449958e−028



C7
 5.30220523e−032









SURFACE NO. 31










K
 0.0000



C1
 1.96722680e−008



C2
−5.31456030e−013



C3
−2.13215304e−017



C4
 7.69697830e−022



C5
 2.76794296e−027



C6
−3.72884626e−031



C7
 5.44983867e−037









SURFACE NO. 36










K
 0.0000



C1
 1.62423735e−009



C2
−2.90322074e−014



C3
−1.28032707e−018



C4
−8.13073474e−024



C5
−2.82547328e−028



C6
−1.12054203e−032



C7
 3.63330556e−037









SURFACE NO. 41










K
 0.0000



C1
−8.25877332e−010



C2
−1.35293772e−014



C3
−1.52207044e−019



C4
−3.79513424e−024



C5
 4.70194280e−029



C6
 1.38778762e−033



C7
 2.29251252e−038









SURFACE NO. 43










K
 0.0000



C1
−7.55685880e−010



C2
 3.51491917e−015



C3
−1.00447098e−019



C4
−2.72274784e−024



C5
 7.10036568e−029



C6
 2.88999682e−033



C7
−6.70709105e−038









SURFACE NO. 45










K
 0.0000



C1
−3.91274835e−009



C2
−3.25534545e−015



C3
 9.56631278e−019



C4
−3.12533946e−024



C5
 1.64402231e−028



C6
 3.02878298e−033



C7
−6.01532104e−038









SURFACE NO. 48










K
 0.0000



C1
−5.54279925e−010



C2
 4.37404892e−014



C3
−2.36005962e−020



C4
 5.02991088e−024



C5
 1.62614899e−028



C6
−6.64121367e−034



C7
 1.69853177e−038









SURFACE NO. 50










K
 0.0000



C1
 9.18566931e−010



C2
 2.34181695e−014



C3
−2.37718980e−019



C4
−4.99822008e−024



C5
 4.49770758e−029



C6
 1.89095883e−033



C7
−3.25678700e−038









SURFACE NO. 54










K
 0.0000



C1
 4.98993424e−010



C2
 2.96497812e−014



C3
 7.13814561e−019



C4
 6.37411566e−023



C5
−9.87253699e−027



C6
 8.78681835e−031



C7
−3.08278753e−035

## Claims

1. Projection objective for projecting a pattern arranged in the object plane of the projection objective into an image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength, the projection objective comprising:
a plurality of optical elements which are arranged along an optical axis; and
a system diaphragm arranged at a distance in front of the image plane;
the projection objective being designed as a purely refractive single-waist system with a belly near the object, a belly near the image and a waist therebetween, and there being arranged in a region of divergent radiation between the waist and the system diaphragm a negative group which has an effective curvature with a concave side directed towards the image, where the effective curvature has a radius of curvature of rc whose ratio rc /DB to the aperture diameter DB of the system diaphragm is in a range between approximately 0.8 and approximately 2.2.

2. Projection objective according to claim 1, wherein the negative group comprises at least one lens with negative refractive power, and a concave surface directed towards the image.

3. Projection objective according to claim 1, wherein the negative group comprises at least one of at least two lenses and exactly two lenses with negative refractive power and concave surfaces each directed towards the image.

4. Projection objective according to claim 3, wherein the negative group comprises two lenses with negative refractive power and concave surfaces each directed towards the image, the refractive power of an object-side lens of this group being greater than the refractive power of a subsequent lens of the group.

5. Projection objective according to claim 1, wherein the negative group is arranged in a middle region between a site of narrowest constriction of the waist and the system diaphragm, a vertex of a surface of curvature of the negative group being in the range between approximately 30% and approximately 70% of an axial spacing between the region of narrowest constriction of the waist and the system diaphragm.

6. Projection objective according to claim 1, wherein there is a substantially symmetrical structure with biconvex lenses and negative meniscus lenses in the region of the system diaphragm.

7. Projection objective according to claim 1, wherein a negative meniscus lens with an object-side concave surface is arranged immediately in front of the system diaphragm, and a negative meniscus lens with an image-side concave surface is arranged immediately behind the system diaphragm.

8. Projection objective according to claim 1, wherein a positive/negative doublet with a biconvex lens and a downstream negative meniscus lens with an object-side concave surface is arranged immediately in front of the system diaphragm, and a negative/positive doublet with a negative meniscus lens with an image-side concave surface and a downstream biconvex lens is arranged immediately behind the system diaphragm.

9. Projection objective according to claim 1, wherein at least one of at least one biconvex positive lens and two biconvex positive lenses is arranged between the system diaphragm and the image plane.

10. Projection objective according to claim 1, wherein at least one of a last optical surface in front of the system diaphragm and a first optical surface after the system diaphragm is aspheric.

11. Projection objective according to claim 1, which is designed for an operating wavelength of 248 nm, 193 nm or 157 nm.

12. Projection objective according to claim 1, wherein all transparent optical elements, with the exception of at least one of at least one lens of small diameter near the image plane and an end plate, are produced from the same material.

13. Projection objective according to claim 12, wherein the material is synthetic quartz.

14. Projection objective according to claim 1, which has an image-side numerical aperture of NA≧0.85.

15. Projection objective according to claim 1, wherein at least one positive meniscus lens with an object-side concave surface is arranged between the waist and the system diaphragm in the vicinity of the waist.

16. Projection objective according to claim 1, wherein arranged between the waist and the system diaphragm in this order are at least one lens with an image-side convex surface and, following thereupon, at least one lens with an object-side convex surface.

17. Projection objective according to claim 16, wherein the lens with an image-side convex surface has a positive refractive power.

18. Projection objective according to claim 1, wherein a negative group with at least one of at least two negative lenses and at least three consecutive negative lenses is arranged in the region of the waist.

19. Projection objective according to claim 1, wherein a first lens group following the object plane has at least two negative lenses.

20. Projection objective according to claim 19, wherein at least one of the first four optical surfaces following the object plane is aspheric in the first lens group.

21. Projection objective according to claim 19, wherein at least two optical surfaces being aspheric in the first lens group, and being situated on the object side of a lens.

22. Projection objective according to claim 1, wherein at least one meniscus lens with positive refractive power and an image-side concave surface is arranged in the region of large beam diameters in a near zone of the object plane.

23. Projection objective according to claim 1, wherein at least one aspheric surface is arranged in the region of the waist, and at least one aspheric surface is arranged in the region of the system diaphragm.

24. Projection objective according to claim 1, wherein the condition:


A/B>C/D 


holds for the parameters:
A =maximum incidence angle (in gas) of the image-side exit surface of a lens of the negative group in the rising region of the second belly;
B =maximum incidence angle (in gas) of the image-side exit surface of the last lens with negative refractive power at the waist;
C =ratio between marginal beam height at A and maximum coma beam height at A; and
D =ratio between marginal beam height at B and maximum coma beam height at B.

25. Projection objective according to claim 1, wherein a large negative lens after the system diaphragm has an effective curvature which has the same alignment as an effective curvature of the negative group in the rising region between the waist and system diaphragm.

26. Projection objective according to claim 1, wherein the effective curvature changes between the waist and system diaphragm, at least between two lenses, such that a change takes place in the position of the centers of curvature of the effective curvature.

27. Projection objective according to claim 1, wherein an adjustable spherical diaphragm is provided in a region of the system diaphragm.

28. Projection objective according to claim 1, wherein the effective curvature changes from object side to image side in a region of large beam diameters in the near zone of the object plane, at least between two lenses of positive refractive power, such that a change in the position of the centers of curvature of the effective curvature takes place.

29. Projection objective according to one claim 1, wherein there exist in a region of large beam diameters in the vicinity of the image plane behind the system diaphragm at least two aspheric lenses which have image-side aspheric surfaces and whose diameter is at least 75% a of the diameter of the system diaphragm.

30. Projection objective according to claim 1, wherein at least three lenses of positive refractive power are aspherized on the image side in a region between the system diaphragm and image plane, and no further aspherized lens with an object-side aspheric surface is located between these lenses.

31. Projection objective for projecting a pattern arranged in the object plane of the projection objective into an image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength, the projection objective comprising:
a plurality of optical elements which are arranged along an optical axis; and
a system diaphragm arranged at a distance in front of the image plane;
wherein the projection objective is designed as a purely refractive single-waist system with a belly near the object, a belly near the image and a waist therebetween, wherein a negative group is arranged in a region of divergent radiation between the waist and the system diaphragm, the negative group having an effective curvature with a concave side directed towards the image, and wherein at least one of a last optical surface in front of the system diaphragm and a first optical surface after the system diaphragm being aspheric.

32. Projection objective according to claim 31, wherein the negative group comprises at least one lens with negative refractive power, and a concave surface directed towards the image.

33. Projection objective according to claim 31, wherein the negative group comprises at least one of at least two lenses and exactly two lenses with negative refractive power and concave surfaces each directed towards the image.

34. Projection objective according to claim 33, wherein the negative group comprises two lenses with negative refractive power and concave surfaces each directed towards the image, the refractive power of an object-side lens of this group being greater than the refractive power of a subsequent lens of the group.

35. Projection objective according to claim 31, wherein the negative group is arranged in a middle region between a site of narrowest constriction of the waist and the system diaphragm, a vertex of a surface of curvature of the negative group being in the range between approximately 30% and approximately 70% of an axial spacing between the region of narrowest constriction of the waist and the system diaphragm.

36. Projection objective according to claim 31, wherein there is a substantially symmetrical structure with biconvex lenses and negative meniscus lenses in the region of the system diaphragm.

37. Projection objective according to claim 31, wherein a negative meniscus lens with an object-side concave surface is arranged immediately in front of the system diaphragm, and a negative meniscus lens with an image-side concave surface is arranged immediately behind the system diaphragm.

38. Projection objective according to claim 31, wherein at least one of at least one biconvex positive lens and two biconvex positive lenses is arranged between the system diaphragm and the image plane.

39. Projection objective according to claim 31, which is designed for an operating wavelength of 248 nm, 193 nm or 157 nm.

40. Projection objective according to claim 31, wherein all transparent optical elements, with the exception of at least one of at least one lens of small diameter near the image plane and an end plate, are produced from the same material.

41. Projection objective according to claim 40, wherein the material is synthetic quartz.

42. Projection objective according to claim 31, which has an image-side numerical aperture of NA≧0.85.

43. Projection objective according to claim 31, wherein at least one meniscus lens with positive refractive power and an image-side concave surface is arranged in the region of large beam diameters in a near zone of the object plane.

44. Projection objective according to claim 31, wherein a large negative lens after the system diaphragm has an effective curvature which has the same alignment as an effective curvature of the negative group in the rising region between the waist and system diaphragm.

45. Projection objective according to claim 31, wherein the effective curvature changes between the waist and system diaphragm, at least between two lenses, such that a change takes place in the position of the centers of curvature of the effective curvature.

46. Projection objective for projecting a pattern arranged in the object plane of the projection objective into an image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength, the projection objective comprising:
a plurality of optical elements which are arranged along an optical axis; and
a system diaphragm arranged at a distance in front of the image plane;
wherein the projection objective is designed as a purely refractive single-waist system with a belly near the object, a belly near the image and a waist therebetween, wherein a negative group is arranged in a region of divergent radiation between the waist and the system diaphragm, the negative group having an effective curvature with a concave side directed towards the image, and wherein all transparent optical elements, with the exception of at least one of at least one lens of small diameter near the image plane and an end plate, are produced from the same material.

47. Projection objective according to claim 46, which is designed for an operating wavelength of 248 nm, 193 nm or 157 nm.

48. Projection objective according to claim 46, wherein the material is synthetic quartz.

49. Projection objective according to claim 46, which has an image-side numerical aperture of NA≧0.85.

50. Projection objective according to claim 46, wherein at least one meniscus lens with positive refractive power and an image-side concave surface is arranged in the region of large beam diameters in a near zone of the object plane.

51. Projection objective according to claim 46, wherein at least one aspheric surface is arranged in the region of the waist, and at least one aspheric surface is arranged in the region of the system diaphragm.

52. Projection objective according to claim 46, wherein an adjustable spherical diaphragm is provided in a region of the system diaphragm.

53. Projection objective according to claim 46, wherein at least three lenses of positive refractive power are aspherized on the image side in a region between the system diaphragm and image plane, and no further aspherized lens with an object-side aspheric surface is located between these lenses.

54. Projection objective for projecting a pattern arranged in the object plane of the projection objective into an image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength, the projection objective comprising:
a plurality of optical elements which are arranged along an optical axis; and
a system diaphragm arranged at a distance in front of the image plane;
wherein the projection objective has an image-side numerical aperture NA of NA≧0.85 and is designed as a purely refractive single-waist system with a belly near the object, a belly near the image and a waist therebetween, and wherein a negative group is arranged in a region of divergent radiation between the waist and the system diaphragm, the negative group having an effective curvature with a concave side directed towards the image.

55. Projection objective according to claim 54, wherein the negative group comprises at least one lens with negative refractive power, and a concave surface directed towards the image.

56. Projection objective according to claim 54, wherein the negative group comprises at least one of at least two lenses and exactly two lenses with negative refractive power and concave surfaces each directed towards the image.

57. Projection objective according to claim 54, wherein the negative group is arranged in a middle region between a site of narrowest constriction of the waist and the system diaphragm, a vertex of a surface of curvature of the negative group being in the range between approximately 30% and approximately 70% of an axial spacing between the region of narrowest constriction of the waist and the system diaphragm.

58. Projection objective according to claim 54, wherein a negative meniscus lens with an object-side concave surface is arranged immediately in front of the system diaphragm, and a negative meniscus lens with an image-side concave surface is arranged immediately behind the system diaphragm.

59. Projection objective according to claim 54, which is designed for an operating wavelength of 248 nm, 193 nm or 157 nm.

60. Projection objective according to claim 54, wherein all transparent optical elements, with the exception of at least one of at least one lens of small diameter near the image plane and an end plate, are produced from synthetic quartz material.

61. Projection objective according to claim 54, wherein at least one meniscus lens with positive refractive power and an image-side concave surface is arranged in the region of large beam diameters in a near zone of the object plane.

62. Projection objective according to claim 54, wherein an adjustable spherical diaphragm is provided in a region of the system diaphragm.

63. Projection objective according to claim 54, wherein at least three lenses of positive refractive power are aspherized on the image side in a region between the system diaphragm and image plane, and no further aspherized lens with an object-side aspheric surface is located between these lenses.

64. Projection objective for projecting a pattern arranged in the object plane of the projection objective into an image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength, the projection objective comprising:
a plurality of optical elements which are arranged along an optical axis; and
a system diaphragm arranged at a distance in front of the image plane, and an adjustable spherical diaphragm provided in a region of the system diaphragm;
wherein the projection objective is designed as a purely refractive single-waist system with a belly near the object, a belly near the image and a waist therebetween, and wherein a negative group is arranged in a region of divergent radiation between the waist and the system diaphragm, the negative group having an effective curvature with a concave side directed towards the image.

65. Projection objective according to claim 64, wherein the negative group comprises at least one of at least two lenses and exactly two lenses with negative refractive power and concave surfaces each directed towards the image.

66. Projection objective according to claim 64, wherein the negative group is arranged in a middle region between a site of narrowest constriction of the waist and the system diaphragm, a vertex of a surface of curvature of the negative group being in the range between approximately 30% and approximately 70% of an axial spacing between the region of narrowest constriction of the waist and the system diaphragm.

67. Projection objective according to claim 64, wherein a negative meniscus lens with an object-side concave surface is arranged immediately in front of the system diaphragm, and a negative meniscus lens with an image-side concave surface is arranged immediately behind the system diaphragm.

68. Projection objective according to claim 64, wherein at least one of a last optical surface in front of the system diaphragm and a first optical surface after the system diaphragm is aspheric.

69. Projection objective according to claim 64, wherein all transparent optical elements, with the exception of at least one of at least one lens of small diameter near the image plane and an end plate, are produced from synthetic quartz material.

70. Projection objective according to claim 64, wherein a negative group with at least one of at least two negative lenses and at least three consecutive negative lenses is arranged in the region of the waist.

71. Projection objective according to claim 64, wherein at least one meniscus lens with positive refractive power and an image-side concave surface is arranged in the region of large beam diameters in a near zone of the object plane.

72. Projection objective according to claim 64, wherein at least one aspheric surface is arranged in the region of the waist, and at least one aspheric surface is arranged in the region of the system diaphragm.

73. Projection objective according to claim 64, wherein at least three lenses of positive refractive power are aspherized on the image side in a region between the system diaphragm and image plane, and no further aspherized lens with an object-side aspheric surface is located between these lenses.

74. Projection objective for projecting a pattern arranged in the object plane of the projection objective into an image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength, the projection objective comprising:
a plurality of optical elements which are arranged along an optical axis; and
a system diaphragm arranged at a distance in front of the image plane;
wherein the projection objective is designed as a purely refractive single-waist system with a belly near the object, a belly near the image and a waist therebetween, wherein a negative group is arranged in a region of divergent radiation between the waist and the system diaphragm, the negative group having an effective curvature with a concave side directed towards the image, wherein at least three lenses of positive refractive power are aspherized on the image side in a region between the system diaphragm and the image plane, and wherein no further aspherized lens with an object-side aspheric surface is located between the at least three lenses of positive refractive power.

75. Projection objective according to 74, wherein the negative group comprises at least one lens with negative refractive power, and a concave surface directed towards the image.

76. Projection objective according to 74, wherein the negative group is arranged in a middle region between a site of narrowest constriction of the waist and the system diaphragm, a vertex of a surface of curvature of the negative group being in the range between approximately 30% and approximately 70% of an axial spacing between the region of narrowest constriction of the waist and the system diaphragm.

77. Projection objective according to 74, wherein a negative meniscus lens with an object-side concave surface is arranged immediately in front of the system diaphragm, and a negative meniscus lens with an image-side concave surface is arranged immediately behind the system diaphragm.

78. Projection objective according to 74, wherein at least one of a last optical surface in front of the system diaphragm and a first optical surface after the system diaphragm is aspheric.

79. Projection objective according to 74, which is designed for an operating wavelength of 248 nm, 193 nm or 157 nm.

80. Projection objective according to 74, wherein all transparent optical elements, with the exception of at least one of at least one lens of small diameter near the image plane and an end plate, are produced from synthetic quartz material.

81. Projection objective according to 74, wherein the effective curvature changes between the waist and system diaphragm, at least between two lenses, such that a change takes place in the position of the centers of curvature of the effective curvature.