Self-Assembling 

Nanomembranes Through 

Electrostatic Melt Processing of 

Copolymer Films 

by Eric D. Wetzel and Frederick L. Beyer 

ARL-TR-2800 August 2002 

Approved for public release; distribution is unlimited. 
NOTICES 

Disclaimers 

The findings in this report are not to be construed as an official Department of 

the Army position unless so designated by other authorized documents. 

Citation of manufacturer’s or trade names does not constitute an official 

endorsement or approval of the use thereof. 

Destroy this report when it is no longer needed. Do not return it to the 

originator. 
Army Research Laboratory 

Aberdeen Proving Ground, MD 21005-5069 

ARL-TR-2800 August 2002 

Self-Assembling Nanomembranes 

Through Electrostatic Melt 

Processing of Copolymer Films 

Eric D. Wetzel and Frederick L. Beyer 

Weapons and Materials Research Directorate, ARL 

Approved for public release; distribution is unlimited. 
ii

Abstract 

Polystyrene-polyisobutylene-polystyrene (SIBS) block copolymer films have been 

electrostatically melt processed in order to induce a preferential orientation in the 

material microstructure. The results show that electrostatic melt processing is 

inducing some change in the microstructure, but full reorientation is not being 

achieved. The low dielectric contrast of the SIBS blocks as well as the relatively 

short electrostatic processing times are the likely causes of incomplete alignment. 
iii

Acknowledgments 

The authors would like to acknowledge Prof. Sam Gido and Yuqing Zhu at the 

University of Massachusetts Amherst for their assistance in preparing and 

imaging the transmission electron microscopy samples. 
iv

INTENTIONALLY LEFT BLANK. 
v

Contents 

Acknowledgments iii

List of Figures vii

1. Introduction 1

1.1 Selective Membranes for U.S. Army Applications.................................... 1

1.2 Polystyrene-Polyisobutylene-Polystyrene (SIBS) Block Copolymers..... 2

1.3 Electric Field-Induced Orientation in Block Copolymers ........................ 2

1.4 Objective.......................................................................................................... 4

2. Experimental 4

2.1 Electrostatic Melt-Processing Apparatus.................................................... 4

2.2 Materials.......................................................................................................... 4

2.3 Processing ....................................................................................................... 6

2.4 Characterization ............................................................................................. 7

2.4.1 Small-Angle X-ray Scattering (SAXS) ............................................ 7

2.4.2 Transmission Electron Microscopy (TEM).................................... 9

3. Results and Discussion 9

3.1 TEM Results.................................................................................................... 9

3.2 SAXS Results................................................................................................... 9

4. Conclusions 15

5. References 17

Report Documentation Page 19 
vi

INTENTIONALLY LEFT BLANK. 
vii

List of Figures 

Figure 1. Electrostatic microstructural alignment mechanisms in block 

copolymers. ................................................................................................................ 3

Figure 2. Schematic of the electrostatic melt-processing apparatus. ....................... 5

Figure 3. Close-up of the poling stack of the electrostatic melt-processing 

apparatus. ................................................................................................................... 5

Figure 4. Picture of the SAXS camera, including the new 200-μm pinhole 

immediately downstream from the monochromator. The pinhole 

assembly is independently supported, under vacuum, and 

independently adjustable from outside the evacuated flight path. ................... 8

Figure 5. Schematic showing improvement in low-angle resolution with 

addition of second collimating pinhole. The improved collimation 

allows resolution of features up to 45 nm in length. ............................................ 8

Figure 6. TEM micrographs from samples which are (a) heated but 

unpoled and (b) heated and poled using the electric field apparatus. 

While the images clearly show the difficulty experienced in preparing 

these samples for microscopy, the morphology observed appears to 

be cylindrical, in agreement with the previous work on this material 

and with the SAXS data collected from these samples. ..................................... 10

Figure 7. SAXS data from the heated and poled sample, taken at a φ = 0° 

tilt and circularly averaged. Bragg reflections at √3, 2, and √7 times 

the primary Bragg reflections identify the morphology as hexagonally 

packed cylinders...................................................................................................... 10

Figure 8. Schematics of the expected SAXS scattering patterns for 

single-grain structures as a function of tilt angle φ. The tilt angle 

increases from φ = 0° to φ = 90° from left to right. .............................................. 12

Figure 9. Schematics of the expected SAXS scattering patterns for 

granular structures as a function of tilt angle φ. The tilt angle 

increases from φ = 0° to φ = 90° from left to right. .............................................. 13

Figure 10. SAXS data collected at tilt angles for each condition: 

(a) unheated and unpoled, (b) heated and unpoled, and (c) heated 

and poled. ................................................................................................................. 14
viii

INTENTIONALLY LEFT BLANK. 
1

1. Introduction 

1.1 Selective Membranes for U.S. Army Applications 

A selective membrane is a barrier layer which is designed to allow efficient 

transport of only particular fluids, vapors, particulates, or chemicals. Advanced 

selective membrane materials could provide significant advances in the 

capabilities of Army forces. Two applications of specific interest are chem-bio 

suits and fuel cell membranes. 

Chem-bio suits must prevent transport of any hazardous chemical or biological 

agent. Currently fielded chem-bio suits are fabricated from butyl rubber or 

polyisobutylene films. These materials effectively prevent transport of nearly 

any physical or chemical species, providing excellent chem-bio protection. A 

serious limitation of these materials, however, is that they also prevent the 

transport of water. When a soldier wearing the suit perspires, the perspiration is 

not able to freely evaporate into the surroundings. As a result, the soldier 

quickly becomes very hot and uncomfortable, limiting soldier stamina and 

performance. The discomfort of these suits often prompts soldiers to choose not 

to wear the suits at all, even in threatening situations, making them highly 

vulnerable to chem-bio attack. 

A selective membrane material could provide significant advantages over 

conventional materials for chem-bio suit fabrics. This superior barrier material 

would allow the transport of water through its thickness, while still completely 

blocking harmful chem-bio agents. Such a material would allow fabrication of 

chem-bio suits which would be both protective and comfortable, greatly 

enhancing the capabilities of the soldier. 

Fuel cells produce electricity through the steady, low-temperature oxidation of a 

hydrocarbon fuel. Compared with conventional power sources such as batteries 

and internal combustion engines, fuel cells are quieter, have a higher energy 

density, and are scalable over a range of sizes. These advantages make fuel cells 

well suited to soldier personal power generation and stealthy vehicles. 

A critical component in fuel cells is the proton exchange membrane. Maximum 

fuel cell power and longevity are achieved if this membrane material prevents 

transport of all species except for hydrogen ions. In most cases, materials which 

transport hydrogen ions efficiently also transport water molecules efficiently. 

Therefore, both fuel cells and chem-bio suits could benefit from the development 

of new membrane materials which allow for selective, efficient transport of 

water. The demands of Army applications impose that these materials also offer 

rugged mechanical properties, easy processibility, and relatively low cost. 
2

1.2 Polystyrene-Polyisobutylene-Polystyrene (SIBS) Block Copolymers 

One promising selective membrane material which has been identified is SIBS 

triblock copolymer. Due to repulsive enthalpic interactions between its 

homopolymer blocks, this material phase separates into a two-phase structure. 

The particular structure which evolves is determined by the molecular weights of 

the blocks and processing. 

Previous studies have shown that water transport through SIBS films can be 

enabled by sulfonating the polystyrene phase [1, 2]. The particular grade of SIBS 

used in these studies formed a structure comprised of cylinders of polysterene 

(PS) in a matrix of polyisobutylene (PIB). The cylinders had a diameter of 

~50 nm and, when cast from dilute solution, formed films in which the cylinders 

were aligned in the plane of the film. 

Since the PS phase is responsible for water transport in the sulfonated SIBS film, 

it is reasonable to expect that the efficiency of water transport could be enhanced 

by alignment of the cylindrical PS domains in the preferred transport direction. 

Unfortunately, thermodynamic driving forces during processing tend to strongly 

orient the PS phase in the film plane, limiting the thru-thickness transport. 

Therefore, it would be advantageous to develop a means of processing SIBS films 

such that the cylindrical PS domains are oriented normal to the film plane. 

1.3 Electric Field-Induced Orientation in Block Copolymers 

Previous researchers have shown that electric fields can be used to preferentially 

reorient microstructures in block copolymer films [3–9]. The reorientation is 

driven by electrostatic forces, which cause anisotropic dielectric structures to 

align with the electric field direction. The rate at which this reorientation occurs 

depends on the state of the material during application of the electric field. 

There are three main reorientation mechanisms—domain dissolution, domain 

flow, and domain rotation. These mechanisms are illustrated schematically in 

Figure 1. 

For illustration, we will consider the microstructure of a dielectric ellipsoidal 

phase immersed in a matrix of a different dielectric phase. Domain reorientation 

is only possible if the matrix phase of the block copolymer is the melt state. If the 

ellipsoidal phase is solid, then rotation occurs through solid body rotation 

through the matrix fluid [10, 11]. This process has been shown to reorient short 

glass and ceramic fibers in a dielectric fluid [12, 13]. If the ellipsoidal phase is a 

liquid, then reorientation can occur through deformation and flow of the 

ellipsoidal phase [14, 15]. This process is, in general, faster that the solid rotation 

process due to the high hydrodynamic resistance associated with solid body 

rotation in a fluid. This difference is made even more acute as the aspect ratio of 

the ellipsoidal phase is increased. The domain flow reorientation mechanism has 

been demonstrated in block copolymers in only a few cases [9] due to the 

advantages of the domain dissolution method. 
3

E-field

 (a) Domain rotation 

E-field

 (b) Domain flow 

E-field

heat cool

 (c) Domain dissolution 

Figure 1. Electrostatic microstructural alignment mechanisms in block copolymers. 

Domain dissolution requires a block copolymer system whose homopolymers 

become miscible above a characteristic temperature called the order-disorder 

temperature (ODT). Above the ODT, the two-phase structure is replaced by an 

amorphous structure. Upon cooling through the ODT, the amorphous structure 

reverts to the two-phase structure. If an electric field is applied during this 

cooling process, the two-phase structure forms with a preferential orientation in 

the electric field direction [4–9]. The kinetics of this alignment process are 

generally faster than the rotation or flow mechanisms. For this reason, nearly all 

of the successfully oriented block copolymers have been electrostatically 

processed using this dissolution mechanism. 

Researchers have estimated that the ODT of SIBS is greater than 300 °C [16], 

which is well above the thermal degradation limits of the material. Therefore, 

the domain dissolution mechanism is not applicable to this material. The glass 

transition temperature (Tg) of PIB (an elastomer) is !70 °C, while the Tg of PS is 

~95 °C. Therefore, by electrostatic melt processing SIBS well above 95 °C, a 

domain flow realignment mechanism is possible. 

The dielectric constant of PS is 2.5, while the dielectric constant of PIB is 2.2. The 

resulting ratio of dielectric constants is 1.14. This dielectric contrast is small, 

which results in a relatively low electrostatic alignment driving force. As a 

comparison, Amundson et al. [9] demonstrated electrostatic orientation via 

domain flow for a PS-polymethylmethacrylate (PMMA) diblock copolymer. The 

dielectric constant of PMMA is 3.6, providing a dielectric ratio in PS-PMMA of 

1.44. (It should be noted that these values for dielectric constant are based on 

room temperature measurements. The dielectric constants of many polymers 
4

change drastically with temperature, so the actual dielectric contrast at 

processing temperatures may be very different from these room temperature 

estimations.) 

1.4 Objective 

The objective of this study is to demonstrate the use of electrostatic melt 

processing to create thick SIBS films in which the cylindrical PS phases are 

oriented normal to the film plane. The use of SIBS film is unique to this work 

and has two important implications. First, the relatively low dielectric contrast 

of the phases, as well as the limitations of the domain flow mechanism, will 

make electrostatic alignment very challenging. Second, if alignment in SIBS films 

is achieved, it will open the possibility for enhanced film transport properties. 

The use of electrostatic melt processing for modification of material transport 

properties is a unique application of this processing approach. 

2. Experimental 

2.1 Electrostatic Melt-Processing Apparatus 

Figure 2 shows the electrostatic melt-processing apparatus used in this 

investigation. The SIBS sample is sandwiched between electrodes which are 

attached to a high-voltage power supply. The electrode-SIBS-electrode sandwich 

is placed on top of a resistive strip heater, which heats the SIBS film via direct 

conduction. The process control thermocouple is located on top of the stack to 

provide a conservative estimate of the film temperature. A programmable 

controller is used to control the thermal history of the sample, while the applied 

voltage is set manually. The entire stack is thermally and electrically insulated 

from the surroundings. The total stack thickness, from the top of the strip heater 

to the bottom of the thermocouple, is ~3 mm. 

Figure 3 shows the electrode and sample geometry in the poling stack. The SIBS 

film is placed within a 6-mm H 6-mm window of 75-μm-thick Kapton (a 

registered trademark of DuPont) film. The Kapton window limits flow of the 

molten SIBS and provides some degree of film thickness control. Typically, 

5-mm H 5-mm H 100-μm-thick samples of SIBS film are processed. The electrodes 

are fabricated from 25-μm-thick aluminized Kapton film, with the Kapton side 

facing the SIBS film. 

2.2 Materials 

The SIBS used in this study was obtained from Kuraray Company, Ltd., Japan. 

This triblock copolymer has a PS content of 30 weight-percent, with an average 

molecular weight of 72,000 g/mol and a polydispersity index of 1.47. The 
5

123.4 °C

temperature controller

compression 

weight strip heater

insulation 

block

bell jar

poling stack

aluminum base plate

12.3 kV

high-voltage power supply

(a) General view 

to temperature 

controller

to high voltage 

power supply

to temperature 

controller

insulation block

thermocouple

Kapton-coated aluminum plate

electrode

SIBS polymer film

strip heater

electrode

Kapton-coated aluminum plate

(b) Expanded view of poling stack 

Figure 2. Schematic of the electrostatic melt-processing apparatus. 

100- μm SIBS film 

75- μm Kapton window

25- μm aluminized 

Kapton electrode

25- μm aluminized 

Kapton electrode

Al face

Kapton face

Al face

Kapton face

15 mm

5 mm

6 mm

25 mm

Kapton tape

Al face of aluminized

Kapton electrode

metal foil 

electrical lead

metal foil 

electrical lead

to high-voltage 

power supply 

(ground)

to high-voltage 

power supply 

(positive)

Figure 3. Close-up of the poling stack of the electrostatic melt-processing apparatus. 
6

original pellets were melt processed in a hot press to create the 100-μm-thick film 

used for electrostatic melt processing. 

2.3 Processing 

Because the domain flow mechanism is expected to be relatively slow, it is 

advantageous to select processing conditions which maximize the rate of 

orientation. The rate of flow is increased as the phase viscosities decrease. 

Therefore, the rate of orientation will be fastest at higher temperatures. 

However, if the processing temperature is too high, thermal degradation will 

damage the material. We chose to use a processing temperature of 250 °C, a 

reasonably high temperature at which the rate of thermal degradation is 

relatively slow. 

The rate of flow reorientation should also increase as the electric field strength 

increases. For a given electrode spacing, the electric field strength increases 

linearly with voltage. The applied electric field cannot exceed the dielectric field 

strength of any of the materials in the electrode stack. We found that the Kapton 

film used for both the sample window and the electrodes exhibited dielectric 

breakdown at an electric field strength of ~100 kV/mm at 250 °C (the dielectric 

strength of Kapton film is at least 50% higher at room temperature). During 

processing, flow of the SIBS material would sometimes create areas where the 

Kapton faces of the electrodes would be in direct contact. Since each Kapton 

layer was 25 μm in thickness, dielectric breakdown would occur if the applied 

voltage exceeded 5 kV. In practice, it was necessary to limit the applied voltage 

to 3 kV. Since the electrodes were spaced by two 25-μm-thick pieces of Kapton 

and a 100-μm-thick film of SIBS, the applied electric field strength across the SIBS 

film was 20 kV/mm at 3 kV. 

Increased time in the electrostatic field at elevated temperatures should also 

improve the degree of reorientation. In practice, 1 hr was the maximum elevated 

temperature processing time that could be implemented with reasonable 

consistency. Longer process times frequently led to electrical shorts or 

component dielectric breakdown, which eliminated the electric field across the 

SIBS film thickness. 

Two different processing runs were performed. In both cases, the sample was 

heated from room temperature to 250 °C over 30 min, held at 250 °C for 1 hr, and 

then cooled to room temperature. The cooling rate was not controlled (the heater 

power was simply turned off after dwell), but the total cooling time was ~1 hr. 

For the first case, this thermal processing was performed without an applied 

electric field. In the second case, a voltage of 3 kV (corresponding to an electric 

field strength of 20 kV/mm) was applied during the entire heating, dwell, and 

cooling process. As a comparison, microstructural characterization was also 

performed on film which was neither thermally or electrostatically processed. 
7

These three samples should allow comparison of microstructures for 

unprocessed, heat-only, and heat with electric field conditions. 

2.4 Characterization 

2.4.1 Small-Angle X-ray Scattering (SAXS) 

The characterization of the morphology in the films was done primarily by 

small-angle x-ray scattering (SAXS). A Rigaku Ultrax 3-kW rotating anode x-ray 

generator, operated at 40 kV, 60 mA, and with a Cu anode, was the source of the 

radiation. A pyrolytic graphite monochromator was used to filter out 

characteristic Cu-Kβ radiation, leaving only the Cu-Kα doublet with an average 

wavelength of λ = 1.5418 Å. The SAXS camera is an Anton-Paar HR-PHK singlepinhole design, which uses one pinhole 100 μm in diameter 6 cm upstream of the 

sample to collimate the x-ray beam. A 300-μm scatter shield is located 2 cm 

upstream of the sample and eliminates parasitic scattering. The data is collected 

using a Bruker Hi-Star area detector and GADDS software. Circularly averaged 

intensity is presented as a function of the magnitude of the scattering vector, q 

(Å-1), where q is defined by q = 4π·sin(θ)/λ. 

Previously, the maximum length scale for any SAXS feature that could be clearly 

determined by the unmodified Anton-Paar camera was ~25 nm. This resolution 

limitation was due to the camera design, which relied upon the emission of xrays from the rotating anode source having a specific geometry. In that case, the 

rotating anode source acted as an integral part of the collimating optics. The 

assumption underlying this geometry is flawed and does not work for all x-ray 

generators. To correct this defect, an additional pinhole was designed and 

manufactured by Molecular Metrology, Inc., of Northampton, MA. The new 

pinhole, 200 μm in diameter, is located just downstream of the monochromator, 

well upstream of the second pinhole, as shown in Figure 4. The new pinhole is 

under vacuum, independently adjustable from outside the vacuum, and has a 

kinematic mount geometry. The SAXS camera now mimics the established 

geometry of two-pinhole camera design [17]. As illustrated in Figure 5, the 

spurious scatter around the beamstop has been eliminated. The ultimate 

resolution of the camera has been improved from 25 nm to ~45 nm, making the 

instrument well suited for most basic SAXS studies [18]. 

In addition to conventional SAXS data collection, in which the sample is held in a 

perpendicular orientation to the incident radiation, data was collected for the 

samples at a series of inclinations to the incident beam. To achieve this 

geometry, sample holders were physically bent to each of three angles—30°, 45°, 

and 60°. To perform measurements at 90°, each specimen was cut into strips, 

which were then affixed on edge to a 0°-tilt sample holder. In this way, five 

angles of tilt were achieved. 
8

Figure 4. Picture of the SAXS camera, including the new 200-μm pinhole immediately 

downstream from the monochromator. The pinhole assembly is 

independently supported, under vacuum, and independently adjustable from 

outside the evacuated flight path. 

Figure 5. Schematic showing improvement in low-angle resolution with addition of 

second collimating pinhole. The improved collimation allows resolution of 

features up to 45 nm in length.
9

2.4.2 Transmission Electron Microscopy (TEM) 

TEM was performed on representative SIBS samples. After embedding the 

samples in epoxy for better stability and handling during sectioning, ultrathin 

sections were collected using a Leica UCT ultramicrotome, operated at cryogenic 

temperatures, and a Diatome diamond knife. Section thickness was ~50 nm. The 

ultrathin sections were collected onto TEM grids and then exposed to RuO4

vapor for 30 min. The vapor stain of RuO4 provided enhanced mass-thickness 

contrast in TEM. TEM images were collected using a JEOL 100CX operated at 

100-kV accelerating voltage. 

3. Results and Discussion 

3.1 TEM Results 

Figure 6 shows representative TEM data from a sample which was heated and 

from a sample which was heated and subjected to an electric field. These images 

show that a cylindrical morphology is present in the samples. Unfortunately, the 

quality of the TEM data was not sufficient for a thorough assessment of the 

morphology in real space nor for a definitive conclusion on the effect of the 

poling process. The low image quality was due to difficulties in sample 

preparation. TEM required microtomed samples, which were challenging to 

prepare due to the rubbery nature and thinness of the SIBS films. Sample 

preparation was further complicated by the small samples sizes and deformed 

sample geometries produced by the annealing and poling processes. However, it 

is clear from Figure 6 that the general characteristics of a cylindrical morphology 

are present in both samples. Hexagonally arrayed microdomains are visible, 

corresponding to cylinders viewed end-on, as well as elongated microdomains, 

corresponding to cylinders viewed normal to the cylindrical axis. 

3.2 SAXS Results 

Figure 7 shows the circularly averaged intensity as a function of scattering angle 

for the poled, heated SIBS film. The film is normal to the incident x-ray beam. 

The identification of Bragg reflections at q*√3, q*√4, and q*√7, where q* is the 

scattering angle of the primary Bragg reflection, is correct for a morphology of 

hexagonally packed cylinders [19]. Combined with the TEM data from Figure 6, 

a positive identification of a cylindrical morphology in the bulk is certain. 

Before presenting the results from the tilt angle SAXS measurements, it is useful 

to illustrate the expected scattering data for some representative morphologies. 
10

Figure 6. TEM micrographs from samples which are (a) heated but unpoled and (b) 

heated and poled using the electric field apparatus. While the images clearly 

show the difficulty experienced in preparing these samples for microscopy, 

the morphology observed appears to be cylindrical, in agreement with the 

previous work on this material and with the SAXS data collected from these 

samples. 

Figure 7. SAXS data from the heated and poled sample, taken at a φ = 0° tilt and 

circularly averaged. Bragg reflections at √3, 2, and √7 times the primary 

Bragg reflections identify the morphology as hexagonally packed cylinders. 

(a) (b) 
11

In the simplest case, under equilibrium conditions and in the bulk, a multiplegrained morphology in which the cylinder axes are three-dimensionally, 

randomly oriented would occur. The patterns obtained for all tilts would be 

rings as all orientations of the morphology are present in every orientation. This 

is the most commonly observed type of SAXS pattern in block copolymer 

morphology studies and is well described by circularly averaged intensity data, 

as presented in Figure 7. 

However, in this work, the goal was to create a non-equilibrium bulk 

morphology. Therefore, Figures 8 and 9 show illustrations of the different twodimensional SAXS data that would be expected for several different possible 

variations of a cylindrical morphology. In Figure 8a, the SAXS data for a single 

domain of hexagonally packed cylinders oriented perpendicular to the plane of 

the film is shown. At φ = 0°, six spots appear, reflecting the hexagonal packing of 

the cylinders. For all other tilt angles, only the reflections arising from the 

intercylinder distance are seen. In Figure 8b, the expected scattering data for a 

single grain in the plane of the film is illustrated. The scattering data should 

mirror that shown in Figure 8a, where the hexagonal symmetry is seen only 

when the incident radiation is aligned with the cylinder axis. For all other tilt 

angles, only two spots appear. 

Figure 9 shows representations of the SAXS data expected for multiple grains of 

hexagonally packed cylinders. In Figure 9a, a sample with multiple grains of 

hexagonally packed cylinders, all oriented normal to the sample plane but with 

randomly oriented hexagonal lattice vectors, is tilted about an axis normal to the 

cylinders. In contrast to Figure 8a, the hexagonal symmetry here is lost at φ = 0° 

because all possible orientations of the hexagonal lattice unit vectors are present 

for cylinders normal to the film. In effect, the hexagonal array seen for φ = 0° in 

Figure 8a is present in all orientations. However, because all the cylinder axes 

are perfectly aligned normal to the plane of the film, at any tilt greater than φ = 

0°, only the two reflections for the intercylinder distance are detected. 

Figure 9b shows the most interesting set of expected diffraction patterns for the 

cylindrical morphology. The domains are all oriented so that the cylinder axes 

lie within the plane of the film, while the individual grains are randomly 

oriented with respect to each other. The SAXS data show a marked transition 

from φ = 90° to φ = 0°. At φ = 90°, even though the different domains are present 

in all orientations, the hexagonal symmetry is observed because of the symmetry 

of the morphology in reciprocal space. As the tilt is decreased, the (0 1) 

reflections are lost, while the (11), (!1 !1), (10), and (!1 0) reflections draw closer 

to each other in a prescribed manner [5]. Finally, at φ = 0°, the reflection arising 

from the intercylinder separation appears, but because all orientations of the 

cylinder axes within the plane of the film are present, the reflections form a ring.
12

(a) Cylinders oriented normal to the film plane.

(b) Cylinders oriented in the film plane.

Figure 8. Schematics of the expected SAXS scattering patterns for single-grain structures 

as a function of tilt angle φ. The tilt angle increases from φ = 0° to φ = 90° from 

left to right. 

Figure 10 shows the SAXS data collected for this experiment. As the sample is 

tilted, φ increases until it reaches 90°, at which point the x-ray beam is entering 

the edge of the sample and traveling in the plane of the film. A significant 

limitation of this experiment was that different sample holders were used for 

each tilt angle, requiring the samples to be remounted for each measurement. 
13

(a) Cylinders oriented normal to the film plane.

(b) Cylinders oriented in the film plane. 

Figure 9. Schematics of the expected SAXS scattering patterns for granular structures as 

a function of tilt angle φ. The tilt angle increases from φ = 0° to φ = 90° from left 

to right. 

Minor variations in sample rotational position were undoubtedly introduced 

during this process. In addition to these minor variations, it was possible that 

the samples were even flipped or fully rotated (in the sample plane) by 90° or 

180°. 

Figure 10a shows the SAXS data collected for the unheated and unpoled sample. 

For φ = 0°!45°, arcs are seen. At φ = 60° and 90°, the arcs appear wider. The 

general appearance of two peaks at low angles is consistent with a cylindrical inplane morphology. The fact that the peaks are arcs rather than spots indicates 
14

Figure 10. SAXS data collected at tilt angles for each condition: (a) unheated and 

unpoled, (b) heated and unpoled, and (c) heated and poled. 

that there is some variation in the in-plane alignment of the cylinder axes. The 

appearance of a more uniform ring at higher angles is consistent with the 

presence of more cylinders viewed end-on, which would also be expected for the 

case of a random in-plane cylindrical microstructure. 

Figure 10b shows the SAXS data collected for the heated and unpoled sample. 

At φ = 0°, two sharp, strong peaks are clearly evident. At φ = 30°, the two strong 

peaks remain, accompanied by two weaker but similarly sharp peaks. At φ = 45° 

and φ = 60°, two slightly broader peaks are observed. At φ = 90°, a more circular 

diffraction pattern emerges, with very little circular variation for the φ = 90° case. 

This data clearly indicates the presence of an in-plane cylindrical morphology. 

The sharpness of the peaks indicates a high degree of long-range order. The only 

anomalous data is the appearance of the two weaker peaks at φ = 30°. In this 

case, given the other data, it is likely that the x-ray beam is intersecting a second, 

large and well-ordered grain of cylinders in the plane of the film. The better 

ordering in this sample, compared with the unheated and unpoled sample, is not 

surprising. It is well known that annealing a microphase separated block 

copolymer sample will allow the self-assembly process to proceed toward 

equilibrium and remove kinetic entrapment features that tend to blur the 

morphology. 

(a) Tilt series for unheated, unpoled sample. 

(b) Tilt series for heated, but unpoled sample. 

(c) Tilt series for heated, poled sample. 
15

Figure 10c shows the SAXS data collected for the heated and poled sample. At 

low angles, wide arcs are seen. At φ = 60°, very little scattering is observed. At 

φ = 90°, a circular pattern is measured, along with a vertical scattering band. This 

vertical band is most likely an artifact, probably introduced by the presence of 

supporting Kapton film layers above and below the sample. The low intensity at 

φ = 60° is surprising and may indicate that a smaller portion of the sample was 

exposed to the incident beam. 

In general, the SAXS results for the heated and poled sample seem to indicate a 

random in-plane cylindrical morphology. The presence of arcs at low angles 

rather than uniform rings indicates that there is some in-plane orientational bias 

to the morphology. This bias would not be present for a morphology of 

cylinders oriented normal to the film plane. The uniform ring at φ = 90° is also 

consistent with a random in-plane morphology. 

An alternative interpretation of the heated and poled sample is also possible. 

The TEM data showed that vastly different morphological orientations can exist 

within a granular structure. If the sample contained some grains with a 

cylindrical morphology oriented in the film plane, while other grains had a 

cylindrical morphology oriented normal to the film plane, then a less 

straightforward SAXS profile would result. At φ = 0°, we speculate that such a 

granular structure would produce a scattering pattern intermediate between 

well-ordered in-plane domains (small arcs) and domains oriented normal to the 

film plane (circular pattern). The data at φ = 0° for the heated and poled sample 

may be consistent with this result. For this granular structure, we would expect 

to see some peaks at φ = 90° due to the presence of the microstructure oriented 

normal to the film plane. Such peaks are not clearly evident in the measured 

pattern. However, the relative strengths of the scattering patterns for each 

microstructure feature are not clear. Therefore, it is difficult to predict what the 

precise averaged scattering pattern would be for these complicated granular 

structures. At best, we can say with certainty that a majority of the grains for the 

heated and poled sample are not oriented normal to the film plane. 

4. Conclusions 

The SAXS data provides no firm evidence that electrostatic melt processing is 

causing the SIBS film to orient along the electric field lines, normal to the film 

plane. The data seems to indicate that the microstructure for the samples is 

predominantly oriented in the film plane. However, it is also clear that the 

morphology is different for the heated and unpoled sample as compared with 

the heated and poled sample. Since the only difference between the samples is 

the application of an electric field, these results seem to indicate that the electric 
16

field is having some effect on the microstructure. One possibility is that the 

presence of the electric field somehow impedes the formation of long-range 

order during annealing, although such an effect has never been documented 

before. 

Another possibility is that the microstructure is not fully aligned but is in some 

intermediate state. In section 3.2, one possibility, a multigrained structure 

consisting of both in-plane and out-of-plane microstructures, was proposed. 

Other possibilities exist. If the microstructure was undergoing a domain flow or 

rotation reorientation mechanism, it is possible that some of the grains possessed 

some sort of deformed morphology. The physics of phase separation in block 

copolymers prevent deformation of the cylindrical domains into oblate ellipsoids 

(as appears in the schematic in Figure 1b). However, curved or kinked 

cylindrical domains are possible. The cylinders could also still be straight, but 

aligned at some intermediate tilt angle between in-plane and out-of-plane. Such 

a progression was observed for a lamellar microstructure by Amundson et al. [9]. 

The scattering patterns for such complex morphologies are difficult to predict 

and sometimes not unique, so it is difficult to rule out such microstructures. 

The fact that the block copolymer microstructure has not been completely 

aligned normal to the film plane by our processing is not entirely surprising. 

Previous researchers have found that, whether using domain flow reorientation 

or domain dissolution, up to 24 hr of electrostatic melt processing is often 

required to produce full reorientation [8, 9]. In these cases, the dielectric contrast 

of the phases was significantly higher than that of the PS and PIB phases in our 

SIBS film. Therefore, our material could, in fact, require even more time to fully 

align. 

The inability of our setup to pole films for more than 1 hr is a key limitation of 

these experiments. Many electrode and sample geometries were tried, but 

clearly a satisfactory arrangement was not achieved. It is unclear why dielectric 

breakdown and short circuiting were so difficult to eliminate in our poling stack, 

as other researchers have achieved much better processing performance. 

Another shortcoming of the current results is the lack of good TEM images for 

the processed SIBS samples. The SAXS measurements provide some 

information, but the potential complications introduced by intermediate 

morphologies and granular structures prevent conclusive interpretation. A 

combination of thorough TEM analysis with SAXS data is necessary to provide 

unambiguous characterization of the block copolymer morphology. 
17

5. References 

1. Crawford, D. M., E. Napadensky, N. Beck Tan, J. Sloan, D. A. Reuschle, D. A. 

Mountz, K. A. Mauritz, K. S. Laverdure, S. P. Gido, W. Liu, and B. Hsiao. 

“Semipermeable Membrane From Ionomeric Self-Assembling Block 

Copolymer.” ARL-TR-2403, U.S. Army Research Laboratory, Aberdeen 

Proving Ground, MD 2001. 

2. Napadensky, E., D. Crawford, J. Sloan, and N. Beck Tan. “Viscoelastic and 

Transport Properties of Sulfonated PS-PIB-PS Block Copolymers.” ARL-TR2482, U.S. Army Research Laboratory, Aberdeen Proving Ground, MD 2001. 

3. Amundson, K., E. Helfand, X. Quan, and S. D. Smith. “Alignment of 

Lamellar Block Copolymer Microstructure in an Electric Field. 1. Alignment 

Kinetics.” Macromolecules, vol. 26, pp. 2698–2703, 1993. 

4. Thurn-Albrecht, T., R. Steiner, J. DeRouchey, C. M. Stafford, E. Huang, 

M. Bal, M. Tuominen, C. J. Hawker, and T. P. Russell. “Nanoscopic 

Templates From Oriented Block Copolymer Films.” Advanced Materials, 

vol. 12, no. 11, pp. 787–791, 2000. 

5. Thurn-Albrecht, T., J. DeRouchey, T. P. Russel, and H. M. Jaeger. 

“Overcoming Interfacial Interactions With Electric Fields.” Macromolecules, 

vol. 33, no. 9, pp. 3250–3253, 2000. 

6. Thurn-Albrecht, T., J. Schotter, G. A. Kastle, N. Emley, T. Shibauchi, 

L. Krusin-Elbaum, K. Guarini, C. T. Black, M. T. Tuominen, and T. P. Russell. 

“Ultrahigh-Density Nanowire Arrays Grown in Self-Assembled Diblock 

Copolymer Templates.” Science, vol. 290, pp. 2126–2129, 2000. 

7. Mansky, P., J. DeRouchey, T. P. Russell, J. Mays, M. Pitsikalis, T. Morkved, 

and H. Jaeger. “Large-Area Domain Alignment in Block Copolymer Thin 

Films Using Electric Fields.” Macromolecules, vol. 31, pp. 4399–4401, 1998. 

8. Morkved, T. L., M. Lu, A. M. Urbas, E. E. Ehrichs, H. M. Jaeger, P. Mansky, 

and T. P. Russell. “Local Control of Microdomain Orientation in Diblock 

Copolymer Thin Films With Electric Fields.” Science, vol. 273, pp. 931–933, 

1996. 

9. Amundson, K., E. Helfand, D. D. Davis, X. Quan, and S. S. Patel. “Effect of 

an Electric Field on Block Copolymer Microstructure.” Macromolecules, 

vol. 24, pp. 6546–6548, 1991. 

10. Strand, S. R., and S. Kim. “Dynamics and Rheology of a Dilute Suspension of 

Dipolar Nonspherical Particles in an External Field: Part 1. Steady Shear 

Flows.” Rheologica Acta, vol. 31, pp. 94–117, 1992. 
18

11. Okagawa, A., R. G. Cox, and S. G. Mason. “Particle Behavior in Shear and 

Electric Fields VI: The Microrheology of Rigid Suspensions.” Journal of 

Colloid and Interface Science, vol. 47, no. 2, pp. 536–567, 1974. 

12. Vyakarnam, M. N., and L. T. Drzal. “Novel Processing and Performance of 

Aligned Discontinuous Fiber Polymer Composites.” Proceedings of the Society 

for Plastics Engineers ANTEC, pp. 2531–2535, 1996. 

13. Itoh, T., S. Masuda, and F. Gomi. “Electrostatic Orientation of Ceramic Short 

Fibers in Liquid.” Journal of Electrostatics, vol. 32, pp. 71–89, 1994. 

14. Saville, D. A. “Electrohydrodynamics: The Taylor-Melcher Leaky Dielectric 

Model.” Annual Review of Fluid Mechanics, vol. 29, pp. 27–64, 1997. 

15. Torza, S., R. G. Cox, and S. G. Mason. “Electrohydrodynamic Deformation 

and Burst of Liquid Drops.” Philosophical Transactions of the Royal Society of 

London, Series A: Mathematical and Physical Sciences, vol. 269, pp. 295–319, 

1971. 

16. Tse, M. F., H. C. Wang, T. D. Shaffer, K. O. McElrath, R. Krishnamoorti, and 

M. Modi. “Physical Properties of Isobutylene-Based Block Copolymers.” 

Proceedings of the Rubber Division, American Chemical Society, Cleveland, 

OH, 21–24 October 1997. 

17. Rieker, T. P., and P. F. Hubbard. Review of Scientific Instruments. Vol. 69, 

p. 3504, 1998. 

18. Mildner, D. F. R., and J. M. Carpenter. Journal of Applied Crystallography. 

Vol. 17, p. 249, 1984. 

19. Cullity, B. D. Elements of X-ray Diffraction, 2nd ed. Reading, MA: AddisonWesley, 1978. 
copolymer, SIBS, polystyrene, polyisobutylene, barrier material, chem-bio, electrostatic, 27

electric field

Polystyrene-polyisobutylene-polystyrene (SIBS) block copolymer films have been electrostatically melt processed in

order to induce a preferential orientation in the material microstructure. The results show that electrostatic melt

processing is inducing some change in the microstructure, but full reorientation is not being achieved. The low

dielectric contrast of the SIBS blocks as well as the relatively short electrostatic processing times are the likely causes of

incomplete alignment.

ARL-TR-2800

U.S. Army Research Laboratory

ATTN: AMSRL-WM-MB

Aberdeen Proving Ground, MD 21005-5069

Eric D. Wetzel and Frederick L. Beyer

Self-Assembling Nanomembranes Through Electrostatic Melt Processing of DRI-FY01-WM

Copolymer Films 

August 2002 Final, October 2000–October 2001 

Public reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources,

gathering and maintaining the data needed, and completing and reviewing the collection of information. Send comments regarding this burden estimate or any other aspect of this

collection of information, including suggestions for reducing this burden, to Washington Headquarters Services, Directorate for Information Operations and Reports, 1215 Jefferson

Davis Highway, Suite 1204, Arlington, VA 22202-4302, and to the Office of Management and Budget, Paperwork Reduction Project(0704-0188), Washington, DC 20503.

REPORT DOCUMENTATION PAGE Form Approved

OMB No. 0704-0188

1. AGENCY USE ONLY (Leave blank) 2. REPORT DATE 3. REPORT TYPE AND DATES COVERED

4. TITLE AND SUBTITLE

6. AUTHOR(S)

5. FUNDING NUMBERS

7. PERFORMING ORGANIZATION NAME(S) AND ADDRESS(ES)

9. SPONSORING/MONITORING AGENCY NAMES(S) AND ADDRESS(ES)

8. PERFORMING ORGANIZATION

 REPORT NUMBER

10.SPONSORING/MONITORING

 AGENCY REPORT NUMBER

11. SUPPLEMENTARY NOTES

12a. DISTRIBUTION/AVAILABILITY STATEMENT 12b. DISTRIBUTION CODE

13. ABSTRACT

14. SUBJECT TERMS 15. NUMBER OF PAGES

16. PRICE CODE

17. SECURITY CLASSIFICATION

 OF REPORT

18. SECURITY CLASSIFICATION

 OF THIS PAGE

19. SECURITY CLASSIFICATION

 OF ABSTRACT

20. LIMITATION OF ABSTRACT

(Maximum 200 words)

UL

Standard Form 298 (Rev. 2-89)

Prescribed by ANSI Std. 239-18 298-102

NSN 7540-01-280-5500 

UNCLASSIFIED UNCLASSIFIED UNCLASSIFIED

Approved for public release; distribution is unlimited.

19
20

INTENTIONALLY LEFT BLANK. 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

1

 2 DEFENSE TECHNICAL 

 INFORMATION CENTER 

 DTIC OCA 

 8725 JOHN J KINGMAN RD 

 STE 0944 

 FT BELVOIR VA 22060-6218 

 1 HQDA 

 DAMO FDT 

 400 ARMY PENTAGON 

 WASHINGTON DC 20310-0460 

 1 COMMANDING GENERAL 

 US ARMY MATERIEL CMD 

 AMCRDA TF 

 5001 EISENHOWER AVE 

 ALEXANDRIA VA 22333-0001 

 1 INST FOR ADVNCD TCHNLGY 

 THE UNIV OF TEXAS AT AUSTIN 

 3925 W BRAKER LN STE 400 

 AUSTIN TX 78759-5316 

 1 US MILITARY ACADEMY 

 MATH SCI CTR EXCELLENCE 

 MADN MATH 

 THAYER HALL 

 WEST POINT NY 10996-1786 

 1 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL D 

 DR D SMITH 

 2800 POWDER MILL RD 

 ADELPHI MD 20783-1197 

 1 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL CI AI R 

 2800 POWDER MILL RD 

 ADELPHI MD 20783-1197 

 3 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL CI LL 

 2800 POWDER MILL RD 

 ADELPHI MD 20783-1197 

 3 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL CI IS T 

 2800 POWDER MILL RD 

 ADELPHI MD 20783-1197 

ABERDEEN PROVING GROUND

 2 DIR USARL 

 AMSRL CI LP (BLDG 305) 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

2 

 1 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL CP CA 

 D SNIDER 

 2800 POWDER MILL RD 

 ADELPHI MD 20783-1197 

 1 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL CI IS R 

 2800 POWDER MILL RD 

 ADELPHI MD 20783-1197 

 3 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL OP SD TL 

 2800 POWDER MILL RD 

 ADELPHI MD 20783-1197 

 1 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL SS SD 

 H WALLACE 

 2800 POWDER MILL RD 

 ADELPHI MD 20783-1197 

 2 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL SS SE DS 

 R REYZER 

 R ATKINSON 

 2800 POWDER MILL RD 

 ADELPHI MD 20783-1197 

 1 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL WM MB 

 A FRYDMAN 

 2800 POWDER MILL RD 

 ADELPHI MD 20783-1197 

 1 DPTY ASST SECY FOR R&T 

 SARD TT 

 THE PENTAGON 

 RM 3EA79 

 WASHINGTON DC 20301-7100 

 1 COMMANDER 

 US ARMY MATERIEL CMD 

 AMXMI INT 

 5001 EISENHOWER AVE 

 ALEXANDRIA VA 22333-0001 

 4 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR CC 

 G PAYNE 

 J GEHBAUER 

 C BAULIEU 

 H OPAT 

 PICATINNY ARSENAL NJ 

 07806-5000 

 2 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR AE WW 

 E BAKER 

 J PEARSON 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR FSE 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR TD 

 C SPINELLI 

 PICATINNY ARSENAL NJ 

 07806-5000 

 6 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR CCH A 

 W ANDREWS 

 S MUSALLI 

 R CARR 

 M LUCIANO 

 E LOGSDEN 

 T LOUZEIRO 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR CCH P 

 J LUTZ 

 PICATINNY ARSENAL NJ 

 07806-5000 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

3

 1 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR FSF T 

 C LIVECCHIA 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY ARDEC 

 AMSTA ASF 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR QAC T C 

 C PATEL 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR M 

 D DEMELLA 

 PICATINNY ARSENAL NJ 

 07806-5000 

 3 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR FSA 

 A WARNASH 

 B MACHAK 

 M CHIEFA 

 PICATINNY ARSENAL NJ 

 07806-5000 

 2 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR FSP G 

 M SCHIKSNIS 

 D CARLUCCI 

 PICATINNY ARSENAL NJ 

 07806-5000 

 2 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR CCH C 

 H CHANIN 

 S CHICO 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR QAC T 

 D RIGOGLIOSO 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR WET 

 T SACHAR 

 BLDG 172 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 US ARMY ARDEC 

 INTELLIGENCE SPECIALIST 

 AMSTA AR WEL F 

 M GUERRIERE 

 PICATINNY ARSENAL NJ 

 07806-5000 

 9 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR CCH B 

 P DONADIA 

 F DONLON 

 P VALENTI 

 C KNUTSON 

 G EUSTICE 

 S PATEL 

 G WAGNECZ 

 R SAYER 

 F CHANG 

 PICATINNY ARSENAL NJ 

 07806-5000 

 6 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR CCL 

 F PUZYCKI 

 R MCHUGH 

 D CONWAY 

 E JAROSZEWSKI 

 R SCHLENNER 

 M CLUNE 

 PICATINNY ARSENAL NJ 

 07806-5000 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

4 

 1 PM ARMS 

 SFAE GCSS ARMS 

 BLDG 171 

 PICATINNY ARSENAL NJ 

 07806-5000 

 2 PEO FIELD ARTILLERY SYS 

 SFAE FAS PM 

 H GOLDMAN 

 T MCWILLIAMS 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY ARDEC 

 AMSTA AR WEA 

 J BRESCIA 

 PICATINNY ARSENAL NJ 

 07806-5000 

 12 PM TMAS 

 SFAE GSSC TMA 

 R MORRIS 

 C KIMKER 

 D GUZIEWICZ 

 E KOPACZ 

 R ROESER 

 R DARCY 

 R KOWALSKI 

 R MCDANOLDS 

 L D ULISSE 

 C ROLLER 

 J MCGREEN 

 B PATTER 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY ARDEC 

 PRODUCTION BASE 

 MODERN ACTY 

 AMSMC PBM K 

 PICATINNY ARSENAL NJ 

 07806-5000 

 1 COMMANDER 

 US ARMY TACOM 

 PM ABRAMS 

 SFAE ASM AB 

 6501 ELEVEN MILE RD 

 WARREN MI 48397-5000 

 1 COMMANDER 

 US ARMY TACOM 

 AMSTA SF 

 WARREN MI 48397-5000 

 1 COMMANDER 

 US ARMY TACOM 

 PM BFVS 

 SFAE GCSS W BV 

 6501 ELEVEN MILE RD 

 WARREN MI 48397-5000 

 1 DIRECTOR 

 AIR FORCE RESEARCH LAB 

 MLLMD 

 D MIRACLE 

 2230 TENTH ST 

 WRIGHT PATTERSON AFB OH 

 45433-7817 

 1 OFC OF NAVAL RESEARCH 

 J CHRISTODOULOU 

 ONR CODE 332 

 800 N QUINCY ST 

 ARLINGTON VA 22217-5600 

 1 US ARMY CERL 

 R LAMPO 

 2902 NEWMARK DR 

 CHAMPAIGN IL 61822 

 1 COMMANDER 

 US ARMY TACOM 

 PM SURVIVABLE SYSTEMS 

 SFAE GCSS W GSI H 

 M RYZYI 

 6501 ELEVEN MILE RD 

 WARREN MI 48397-5000 

 1 COMMANDER 

 US ARMY TACOM 

 CHIEF ABRAMS TESTING 

 SFAE GCSS W AB QT 

 T KRASKIEWICZ 

 6501 ELEVEN MILE RD 

 WARREN MI 48397-5000 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

5

 1 COMMANDER 

 WATERVLIET ARSENAL 

 SMCWV QAE Q 

 B VANINA 

 BLDG 44 

 WATERVLIET NY 12189-4050 

 3 ARMOR SCHOOL 

 ATZK TD 

 R BAUEN 

 J BERG 

 A POMEY 

 FT KNOX KY 40121 

 2 HQ IOC TANK 

 AMMUNITION TEAM 

 AMSIO SMT 

 R CRAWFORD 

 W HARRIS 

 ROCK ISLAND IL 61299-6000 

 2 COMMANDER 

 US ARMY AMCOM 

 AVIATION APPLIED TECH DIR 

 J SCHUCK 

 FT EUSTIS VA 23604-5577 

 14 COMMANDER 

 US ARMY TACOM 

 AMSTA TR R 

 R MCCLELLAND 

 D THOMAS 

 J BENNETT 

 D HANSEN 

 AMSTA JSK 

 S GOODMAN 

 J FLORENCE 

 K IYER 

 D TEMPLETON 

 A SCHUMACHER 

 AMSTA TR D 

 D OSTBERG 

 L HINOJOSA 

 B RAJU 

 AMSTA CS SF 

 H HUTCHINSON 

 F SCHWARZ 

 WARREN MI 48397-5000 

 14 BENET LABORATORIES 

 AMSTA AR CCB 

 R FISCELLA 

 M SOJA 

 E KATHE 

 M SCAVULO 

 G SPENCER 

 P WHEELER 

 S KRUPSKI 

 J VASILAKIS 

 G FRIAR 

 R HASENBEIN 

 AMSTA CCB R 

 S SOPOK 

 E HYLAND 

 D CRAYON 

 R DILLON 

 WATERVLIET NY 12189-4050 

 1 DIRECTOR 

 US ARMY AMCOM 

 SFAE AV RAM TV 

 D CALDWELL 

 BLDG 5300 

 REDSTONE ARSENAL AL 

 35898 

 1 NAVAL SURFACE WARFARE CTR 

 DAHLGREN DIV CODE G06 

 DAHLGREN VA 22448 

 2 US ARMY CORPS OF ENGINEERS 

 CERD C 

 T LIU 

 CEW ET 

 T TAN 

 20 MASS AVE NW 

 WASHINGTON DC 20314 

 1 US ARMY COLD REGIONS 

 RSCH & ENGRNG LAB 

 P DUTTA 

 72 LYME RD 

 HANOVER NH 03755 

 1 USA SBCCOM PM SOLDIER SPT 

 AMSSB PM RSS A 

 J CONNORS 

 KANSAS ST 

 NATICK MA 01760-5057 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

6 

 2 USA SBCCOM 

 MATERIAL SCIENCE TEAM 

 AMSSB RSS 

 J HERBERT 

 M SENNETT 

 KANSAS ST 

 NATICK MA 01760-5057 

 2 OFC OF NAVAL RESEARCH 

 D SIEGEL CODE 351 

 J KELLY 

 800 N QUINCY ST 

 ARLINGTON VA 22217-5660 

 1 NAVAL SURFACE WARFARE CTR 

 TECH LIBRARY CODE 323 

 17320 DAHLGREN RD 

 DAHLGREN VA 22448 

 1 NAVAL SURFACE WARFARE CTR 

 CRANE DIVISION 

 M JOHNSON CODE 20H4 

 LOUISVILLE KY 40214-5245 

 2 NAVAL SURFACE WARFARE CTR 

 U SORATHIA 

 C WILLIAMS CD 6551 

 9500 MACARTHUR BLVD 

 WEST BETHESDA MD 20817 

 2 COMMANDER 

 NAVAL SURFACE WARFARE CTR 

 CARDEROCK DIVISION 

 R PETERSON CODE 2020 

 M CRITCHFIELD CODE 1730 

 BETHESDA MD 20084 

 8 DIRECTOR 

 US ARMY NATIONAL GROUND 

 INTELLIGENCE CTR 

 D LEITER MS 404 

 M HOLTUS MS 301 

 M WOLFE MS 307 

 S MINGLEDORF MS 504 

 J GASTON MS 301 

 W GSTATTENBAUER MS 304 

 R WARNER MS 305 

 J CRIDER MS 306 

 220 SEVENTH ST NE 

 CHARLOTTESVILLE VA 22091 

 1 NAVAL SEA SYSTEMS CMD 

 D LIESE 

 2531 JEFFERSON DAVIS HWY 

 ARLINGTON VA 22242-5160 

 1 NAVAL SURFACE WARFARE CTR 

 M LACY CODE B02 

 17320 DAHLGREN RD 

 DAHLGREN VA 22448 

 1 EXPEDITIONARY WARFARE 

 DIV N85 

 F SHOUP 

 2000 NAVY PENTAGON 

 WASHINGTON DC 20350-2000 

 8 US ARMY SBCCOM 

 SOLDIER SYSTEMS CENTER 

 BALLISTICS TEAM 

 J WARD 

 W ZUKAS 

 P CUNNIFF 

 J SONG 

 MARINE CORPS TEAM 

 J MACKIEWICZ 

 BUS AREA ADVOCACY TEAM 

 W HASKELL 

 AMSSB RCP SS 

 W NYKVIST 

 S BEAUDOIN 

 KANSAS ST 

 NATICK MA 01760-5019 

 7 US ARMY RESEARCH OFC 

 A CROWSON 

 H EVERETT 

 J PRATER 

 G ANDERSON 

 D STEPP 

 D KISEROW 

 J CHANG 

 PO BOX 12211 

 RESEARCH TRIANGLE PARK NC 

 27709-2211 

 1 AFRL MLBC 

 2941 P ST RM 136 

 WRIGHT PATTERSON AFB OH 

 45433-7750 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

7

 8 NAVAL SURFACE WARFARE CTR 

 J FRANCIS CODE G30 

 D WILSON CODE G32 

 R D COOPER CODE G32 

 J FRAYSSE CODE G33 

 E ROWE CODE G33 

 T DURAN CODE G33 

 L DE SIMONE CODE G33 

 R HUBBARD CODE G33 

 DAHLGREN VA 22448 

 2 NAVAL SURFACE WARFARE CTR 

 CARDEROCK DIVISION 

 R CRANE CODE 2802 

 C WILLIAMS CODE 6553 

 3A LEGGETT CIR 

 BETHESDA MD 20054-5000 

 1 AFRL MLSS 

 R THOMSON 

 2179 12TH ST RM 122 

 WRIGHT PATTERSON AFB OH 

 45433-7718 

 2 AFRL 

 F ABRAMS 

 J BROWN 

 BLDG 653 

 2977 P ST STE 6 

 WRIGHT PATTERSON AFB OH 

 45433-7739 

 5 DIRECTOR 

 LLNL 

 R CHRISTENSEN 

 S DETERESA 

 F MAGNESS 

 M FINGER MS 313 

 M MURPHY L 282 

 PO BOX 808 

 LIVERMORE CA 94550 

 1 AFRL MLS OL 

 L COULTER 

 5851 F AVE 

 BLDG 849 RM AD1A 

 HILL AFB UT 84056-5713 

 1 DIRECTOR 

 LOS ALAMOS NATIONAL LAB 

 F L ADDESSIO T 3 MS 5000 

 PO BOX 1633 

 LOS ALAMOS NM 87545 

 1 OSD 

 JOINT CCD TEST FORCE 

 OSD JCCD 

 R WILLIAMS 

 3909 HALLS FERRY RD 

 VICKSBURG MS 29180-6199 

 3 DARPA 

 M VANFOSSEN 

 S WAX 

 L CHRISTODOULOU 

 3701 N FAIRFAX DR 

 ARLINGTON VA 22203-1714 

 2 SERDP PROGRAM OFC 

 PM P2 

 C PELLERIN 

 B SMITH 

 901 N STUART ST STE 303 

 ARLINGTON VA 22203 

 1 US DEPT OF ENERGY 

 OFC OF ENVIRONMENTAL 

 MANAGEMENT 

 P RITZCOVAN 

 19901 GERMANTOWN RD 

 GERMANTOWN MD 20874-1928 

 1 OAK RIDGE NATIONAL 

 LABORATORY 

 R M DAVIS 

 PO BOX 2008 

 OAK RIDGE TN 37831-6195 

 1 OAK RIDGE NATIONAL 

 LABORATORY 

 C EBERLE MS 8048 

 PO BOX 2008 

 OAK RIDGE TN 37831 

 3 DIRECTOR 

 SANDIA NATIONAL LABS 

 APPLIED MECHANICS DEPT 

 MS 9042 

 J HANDROCK 

 Y R KAN 

 J LAUFFER 

 PO BOX 969 

 LIVERMORE CA 94551-0969 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

8 

 1 OAK RIDGE NATIONAL 

 LABORATORY 

 C D WARREN MS 8039 

 PO BOX 2008 

 OAK RIDGE TN 37831 

 4 NIST 

 M VANLANDINGHAM MS 8621 

 J CHIN MS 8621 

 J MARTIN MS 8621 

 D DUTHINH MS 8611 

 100 BUREAU DR 

 GAITHERSBURG MD 20899 

 1 HYDROGEOLOGIC INC 

 SERDP ESTCP SPT OFC 

 S WALSH 

 1155 HERNDON PKWY STE 900 

 HERNDON VA 20170 

 3 NASA LANGLEY RSCH CTR 

 AMSRL VS 

 W ELBER MS 266 

 F BARTLETT JR MS 266 

 G FARLEY MS 266 

 HAMPTON VA 23681-0001 

 1 NASA LANGLEY RSCH CTR 

 T GATES MS 188E 

 HAMPTON VA 23661-3400 

 1 FHWA 

 E MUNLEY 

 6300 GEORGETOWN PIKE 

 MCLEAN VA 22101 

 1 USDOT FEDERAL RAILRD 

 M FATEH RDV 31 

 WASHINGTON DC 20590 

 3 CYTEC FIBERITE 

 R DUNNE 

 D KOHLI 

 R MAYHEW 

 1300 REVOLUTION ST 

 HAVRE DE GRACE MD 21078 

 1 MARINE CORPS 

 INTLLGNC ACTVTY 

 D KOSITZKE 

 3300 RUSSELL RD STE 250 

 QUANTICO VA 22134-5011 

 1 DIRECTOR 

 NATIONAL GRND INTLLGNC CTR 

 IANG TMT 

 220 SEVENTH ST NE 

 CHARLOTTESVILLE VA 

 22902-5396 

 1 SIOUX MFG 

 B KRIEL 

 PO BOX 400 

 FT TOTTEN ND 58335 

 2 3TEX CORPORATION 

 A BOGDANOVICH 

 J SINGLETARY 

 109 MACKENAN DR 

 CARY NC 27511 

 1 3M CORPORATION 

 J SKILDUM 

 3M CENTER BLDG 60 IN 01 

 ST PAUL MN 55144-1000 

 1 DIRECTOR 

 DEFENSE INTLLGNC AGNCY 

 TA 5 

 K CRELLING 

 WASHINGTON DC 20310 

 1 ADVANCED GLASS FIBER YARNS 

 T COLLINS 

 281 SPRING RUN LANE STE A 

 DOWNINGTON PA 19335 

 1 COMPOSITE MATERIALS INC 

 D SHORTT 

 19105 63 AVE NE 

 PO BOX 25 

 ARLINGTON WA 98223 

 1 JPS GLASS 

 L CARTER 

 PO BOX 260 

 SLATER RD 

 SLATER SC 29683 

 1 COMPOSITE MATERIALS INC 

 R HOLLAND 

 11 JEWEL CT 

 ORINDA CA 94563 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

9

 1 COMPOSITE MATERIALS INC 

 C RILEY 

 14530 S ANSON AVE 

 SANTA FE SPRINGS CA 90670 

 2 SIMULA 

 J COLTMAN 

 R HUYETT 

 10016 S 51ST ST 

 PHOENIX AZ 85044 

 2 PROTECTION MATERIALS INC 

 M MILLER 

 F CRILLEY 

 14000 NW 58 CT 

 MIAMI LAKES FL 33014 

 2 FOSTER MILLER 

 M ROYLANCE 

 W ZUKAS 

 195 BEAR HILL RD 

 WALTHAM MA 02354-1196 

 1 ROM DEVELOPMENT CORP 

 R O MEARA 

 136 SWINEBURNE ROW 

 BRICK MARKET PLACE 

 NEWPORT RI 02840 

 2 TEXTRON SYSTEMS 

 T FOLTZ 

 M TREASURE 

 1449 MIDDLESEX ST 

 LOWELL MA 01851 

 1 O GARA HESS & EISENHARDT 

 M GILLESPIE 

 9113 LESAINT DR 

 FAIRFIELD OH 45014 

 2 MILLIKEN RSCH CORP 

 H KUHN 

 M MACLEOD 

 PO BOX 1926 

 SPARTANBURG SC 29303 

 1 CONNEAUGHT INDUSTRIES INC 

 J SANTOS 

 PO BOX 1425 

 COVENTRY RI 02816 

 1 BATTELLE NATICK OPNS 

 B HALPIN 

 209 W CENTRAL ST STE 302 

 NATICK MA 01760 

 1 ARMTEC DEFENSE PRODUCTS 

 S DYER 

 85 901 AVE 53 

 PO BOX 848 

 COACHELLA CA 92236 

 1 NATIONAL COMPOSITE CENTER 

 T CORDELL 

 2000 COMPOSITE DR 

 KETTERING OH 45420 

 3 PACIFIC NORTHWEST LAB 

 M SMITH 

 G VAN ARSDALE 

 R SHIPPELL 

 PO BOX 999 

 RICHLAND WA 99352 

 2 AMOCO PERFORMANCE 

 PRODUCTS 

 M MICHNO JR 

 J BANISAUKAS 

 4500 MCGINNIS FERRY RD 

 ALPHARETTA GA 30202-3944 

 8 ALLIANT TECHSYSTEMS INC 

 C CANDLAND MN11 2830 

 C AAKHUS MN11 2830 

 B SEE MN11 2439 

 N VLAHAKUS MN11 2145 

 R DOHRN MN11 2830 

 S HAGLUND MN11 2439 

 M HISSONG MN11 2830 

 D KAMDAR MN11 2830 

 600 SECOND ST NE 

 HOPKINS MN 55343-8367 

 

 1 SAIC 

 M PALMER 

 1410 SPRING HILL RD STE 400 

 MS SH4 5 

 MCLEAN VA 22102 

 1 APPLIED COMPOSITES 

 W GRISCH 

 333 NORTH SIXTH ST 

 ST CHARLES IL 60174 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

10 

 1 CUSTOM ANALYTICAL 

 ENG SYS INC 

 A ALEXANDER 

 13000 TENSOR LANE NE 

 FLINTSTONE MD 21530 

 1 AAI CORPORATION 

 DR N B MCNELLIS 

 PO BOX 126 

 HUNT VALLEY MD 21030-0126 

 1 OFC DEPUTY UNDER SEC DEFNS 

 J THOMPSON 

 1745 JEFFERSON DAVIS HWY 

 CRYSTAL SQ 4 STE 501 

 ARLINGTON VA 22202 

 3 ALLIANT TECHSYSTEMS INC 

 J CONDON 

 E LYNAM 

 J GERHARD 

 WV01 16 STATE RT 956 

 PO BOX 210 

 ROCKET CENTER WV 26726-0210 

 1 PROJECTILE TECHNOLOGY INC 

 515 GILES ST 

 HAVRE DE GRACE MD 21078 

 1 HEXCEL INC 

 R BOE 

 PO BOX 18748 

 SALT LAKE CITY UT 84118 

 5 AEROJET GEN CORP 

 D PILLASCH 

 T COULTER 

 C FLYNN 

 D RUBAREZUL 

 M GREINER 

 1100 WEST HOLLYVALE ST 

 AZUSA CA 91702-0296 

 1 HERCULES INC 

 HERCULES PLAZA 

 WILMINGTON DE 19894 

 1 BRIGS COMPANY 

 J BACKOFEN 

 2668 PETERBOROUGH ST 

 HERNDON VA 22071-2443 

 1 ZERNOW TECHNICAL SERVICES 

 L ZERNOW 

 425 W BONITA AVE STE 208 

 SAN DIMAS CA 91773 

 1 GENERAL DYNAMICS OTS 

 L WHITMORE 

 10101 NINTH ST NORTH 

 ST PETERSBURG FL 33702 

 3 GENERAL DYNAMICS OTS 

 FLINCHBAUGH DIV 

 E STEINER 

 B STEWART 

 T LYNCH 

 PO BOX 127 

 RED LION PA 17356 

 1 GKN AEROSPACE 

 D OLDS 

 15 STERLING DR 

 WALLINGFORD CT 06492 

 5 SIKORSKY AIRCRAFT 

 G JACARUSO 

 T CARSTENSAN 

 B KAY 

 S GARBO MS S330A 

 J ADELMANN 

 6900 MAIN ST 

 PO BOX 9729 

 STRATFORD CT 06497-9729 

 1 PRATT & WHITNEY 

 C WATSON 

 400 MAIN ST MS 114 37 

 EAST HARTFORD CT 06108 

 1 AEROSPACE CORP 

 G HAWKINS M4 945 

 2350 E EL SEGUNDO BLVD 

 EL SEGUNDO CA 90245 

 2 CYTEC FIBERITE 

 M LIN 

 W WEB 

 1440 N KRAEMER BLVD 

 ANAHEIM CA 92806 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

11

 1 UDLP 

 G THOMAS 

 PO BOX 58123 

 SANTA CLARA CA 95052 

 2 UDLP 

 R BARRETT MAIL DROP M53 

 V HORVATICH MAIL DROP M53 

 328 W BROKAW RD 

 SANTA CLARA CA 95052-0359 

 3 UDLP 

 GROUND SYSTEMS DIVISION 

 M PEDRAZZI MAIL DROP N09 

 A LEE MAIL DROP N11 

 M MACLEAN MAIL DROP N06 

 1205 COLEMAN AVE 

 SANTA CLARA CA 95052 

 2 UDLP 

 R BRYNSVOLD 

 P JANKE MS 170 

 4800 EAST RIVER RD 

 MINNEAPOLIS MN 55421-1498 

 2 BOEING ROTORCRAFT 

 P MINGURT 

 P HANDEL 

 800 B PUTNAM BLVD 

 WALLINGFORD PA 19086 

 1 BOEING 

 DOUGLAS PRODUCTS DIV 

 L J HART SMITH 

 3855 LAKEWOOD BLVD 

 D800 0019 

 LONG BEACH CA 90846-0001 

 1 LOCKHEED MARTIN 

 SKUNK WORKS 

 D FORTNEY 

 1011 LOCKHEED WAY 

 PALMDALE CA 93599-2502 

 1 LOCKHEED MARTIN 

 R FIELDS 

 5537 PGA BLVD 

 SUITE 4516 

 ORLANDO FL 32839 

 1 MATERIALS SCIENCES CORP 

 G FLANAGAN 

 500 OFC CENTER DR STE 250 

 FT WASHINGTON PA 19034 

 1 NORTHRUP GRUMMAN CORP 

 ELECTRONIC SENSORS 

 & SYSTEMS DIV 

 E SCHOCH MS V 16 

 1745A W NURSERY RD 

 LINTHICUM MD 21090 

 1 GDLS DIVISION 

 D BARTLE 

 PO BOX 1901 

 WARREN MI 48090 

 2 GDLS 

 D REES 

 M PASIK 

 PO BOX 2074 

 WARREN MI 48090-2074 

 1 GDLS 

 MUSKEGON OPERATIONS 

 W SOMMERS JR 

 76 GETTY ST 

 MUSKEGON MI 49442 

 1 GENERAL DYNAMICS 

 AMPHIBIOUS SYS 

 SURVIVABILITY LEAD 

 G WALKER 

 991 ANNAPOLIS WAY 

 WOODBRIDGE VA 22191 

 6 INST FOR ADVANCED 

 TECH 

 H FAIR 

 I MCNAB 

 P SULLIVAN 

 S BLESS 

 W REINECKE 

 C PERSAD 

 3925 W BRAKER LN STE 400 

 AUSTIN TX 78759-5316 

 1 ARROW TECH ASSO 

 1233 SHELBURNE RD STE D8 

 SOUTH BURLINGTON VT 

 05403-7700 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

12 

 2 CIVIL ENGR RSCH FOUNDATION 

 PRESIDENT 

 H BERNSTEIN 

 R BELLE 

 1015 15TH ST NW STE 600 

 WASHINGTON DC 20005 

 1 R EICHELBERGER 

 CONSULTANT 

 409 W CATHERINE ST 

 BEL AIR MD 21014-3613 

 1 G CHRYSSOMALLIS 

 8500 NORMANDALE LAKE BLVD 

 SUITE 1610 

 BLOOMINGTON MN 55437-3828 

 1 UCLA MANE DEPT ENGR IV 

 H T HAHN 

 LOS ANGELES CA 90024-1597 

 2 UNIV OF DAYTON 

 RESEARCH INST 

 R Y KIM 

 A K ROY 

 300 COLLEGE PARK AVE 

 DAYTON OH 45469-0168 

 1 UMASS LOWELL 

 PLASTICS DEPT 

 N SCHOTT 

 1 UNIVERSITY AVE 

 LOWELL MA 01854 

 1 IIT RESEARCH CENTER 

 D ROSE 

 201 MILL ST 

 ROME NY 13440-6916 

 1 GA TECH RSCH INST 

 GA INST OF TCHNLGY 

 P FRIEDERICH 

 ATLANTA GA 30392 

 1 MICHIGAN ST UNIV 

 MSM DEPT 

 R AVERILL 

 3515 EB 

 EAST LANSING MI 48824-1226 

 1 UNIV OF WYOMING 

 D ADAMS 

 PO BOX 3295 

 LARAMIE WY 82071 

 2 PENN STATE UNIV 

 R MCNITT 

 C BAKIS 

 212 EARTH ENGR 

 SCIENCES BLDG 

 UNIVERSITY PARK PA 16802 

 1 PENN STATE UNIV 

 R S ENGEL 

 245 HAMMOND BLDG 

 UNIVERSITY PARK PA 16801 

 1 PURDUE UNIV 

 SCHOOL OF AERO & ASTRO 

 C T SUN 

 W LAFAYETTE IN 47907-1282 

 1 STANFORD UNIV 

 DEPT OF AERONAUTICS 

 & AEROBALLISTICS 

 S TSAI 

 DURANT BLDG 

 STANFORD CA 94305 

 1 UNIV OF MAINE 

 ADV STR & COMP LAB 

 R LOPEZ ANIDO 

 5793 AEWC BLDG 

 ORONO ME 04469-5793 

 1 JOHNS HOPKINS UNIV 

 APPLIED PHYSICS LAB 

 P WIENHOLD 

 11100 JOHNS HOPKINS RD 

 LAUREL MD 20723-6099 

 1 UNIV OF DAYTON 

 J M WHITNEY 

 COLLEGE PARK AVE 

 DAYTON OH 45469-0240 

 1 NORTH CAROLINA STATE UNIV 

 CIVIL ENGINEERING DEPT 

 W RASDORF 

 PO BOX 7908 

 RALEIGH NC 27696-7908 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

13

 5 UNIV OF DELAWARE 

 CTR FOR COMPOSITE MTRLS 

 J GILLESPIE 

 M SANTARE 

 S YARLAGADDA 

 S ADVANI 

 D HEIDER 

 201 SPENCER LABORATORY 

 NEWARK DE 19716 

 1 DEPT OF MATERIALS 

 SCIENCE & ENGINEERING 

 UNIVERSITY OF ILLINOIS 

 AT URBANA CHAMPAIGN 

 J ECONOMY 

 1304 WEST GREEN ST 115B 

 URBANA IL 61801 

 1 UNIV OF MARYLAND 

 DEPT OF AEROSPACE ENGNRNG 

 A J VIZZINI 

 COLLEGE PARK MD 20742 

 1 DREXEL UNIV 

 A S D WANG 

 32ND & CHESTNUT ST 

 PHILADELPHIA PA 19104 

 3 UNIV OF TEXAS AT AUSTIN 

 CTR FOR ELECTROMECHANICS 

 J PRICE 

 A WALLS 

 J KITZMILLER 

 10100 BURNET RD 

 AUSTIN TX 78758-4497 

 3 VA POLYTECHNICAL 

 INST & STATE UNIV 

 DEPT OF ESM 

 M W HYER 

 K REIFSNIDER 

 R JONES 

 BLACKSBURG VA 24061-0219 

 1 SOUTHWEST RSCH INST 

 ENGR & MATL SCIENCES DIV 

 J RIEGEL 

 6220 CULEBRA RD 

 PO DRAWER 28510 

 SAN ANTONIO TX 78228-0510 

ABERDEEN PROVING GROUND

 1 US ARMY MATERIEL 

 SYSTEMS ANALYSIS ACTIVITY 

 P DIETZ 

 392 HOPKINS RD 

 AMXSY TD 

 APG MD 21005-5071 

 1 DIRECTOR 

 US ARMY RESEARCH LAB 

 AMSRL OP AP L 

 APG MD 21005-5066 

 95 DIR USARL 

 AMSRL CI 

 AMSRL CI S 

 A MARK 

 AMSRL CS IO FI 

 M ADAMSON 

 AMSRL SL BA 

 AMSRL SL BL 

 D BELY 

 R HENRY 

 AMSRL SL BG 

 AMSRL SL I 

 AMSRL WM 

 J SMITH 

 AMSRL WM B 

 A HORST 

 AMSRL WM BA 

 D LYON 

 AMSRL WM BC 

 P PLOSTINS 

 J NEWILL 

 S WILKERSON 

 A ZIELINSKI 

 AMSRL WM BD 

 B FORCH 

 R FIFER 

 R PESCE RODRIGUEZ 

 B RICE 

 AMSRL WM BE 

 C LEVERITT 

 AMSRL WM BF 

 J LACETERA 

 AMSRL WM BR 

 C SHOEMAKER 

 J BORNSTEIN 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

14 

ABERDEEN PROVING GROUND (CONT)

 AMSRL WM M 

 D VIECHNICKI 

 G HAGNAUER 

 J MCCAULEY 

 AMSRL WM MA 

 L GHIORSE 

 S MCKNIGHT 

 F BEYER (5 CPS) 

 AMSRL WM MB 

 B FINK 

 J BENDER 

 T BOGETTI 

 R BOSSOLI 

 L BURTON 

 K BOYD 

 S CORNELISON 

 P DEHMER 

 R DOOLEY 

 W DRYSDALE 

 G GAZONAS 

 S GHIORSE 

 D GRANVILLE 

 D HOPKINS 

 C HOPPEL 

 D HENRY 

 R KASTE 

 M KLUSEWITZ 

 M LEADORE 

 R LIEB 

 E RIGAS 

 J SANDS 

 D SPAGNUOLO 

 W SPURGEON 

 J TZENG 

 E WETZEL 

 AMRSL WM MC 

 J BEATTY 

 E CHIN 

 J MONTGOMERY 

 A WERECZCAK 

 J LASALVIA 

 J WELLS 

 AMSRL WM MD 

 W ROY 

 S WALSH 

 AMSRL WM T 

 B BURNS 

 M ZOLTOSKI 

ABERDEEN PROVING GROUND (CONT)

 AMSRL WM TA 

 W GILLICH 

 T HAVEL 

 J RUNYEON 

 M BURKINS 

 E HORWATH 

 B GOOCH 

 W BRUCHEY 

 M NORMANDIA 

 AMRSL WM TB 

 D KOOKER 

 P BAKER 

 AMSRL WM TC 

 R COATES 

 AMSRL WM TD 

 A DAS GUPTA 

 T HADUCH 

 T MOYNIHAN 

 F GREGORY 

 M RAFTENBERG 

 M BOTELER 

 T WEERASOORIYA 

 D DANDEKAR 

 AMSRL WM TE 

 A NIILER 

 J POWELL 
NO. OF NO. OF 

COPIES ORGANIZATION COPIES ORGANIZATION

15

 1 LTD 

 R MARTIN 

 MERL 

 TAMWORTH RD 

 HERTFORD SG13 7DG 

 UK 

 1 SMC SCOTLAND 

 P W LAY 

 DERA ROSYTH 

 ROSYTH ROYAL DOCKYARD 

 DUNFERMLINE FIFE KY 11 2XR 

 UK 

 1 CIVIL AVIATION 

 ADMINSTRATION 

 T GOTTESMAN 

 PO BOX 8 

 BEN GURION INTERNL AIRPORT 

 LOD 70150 

 ISRAEL 

 1 AEROSPATIALE 

 S ANDRE 

 A BTE CC RTE MD132 

 316 ROUTE DE BAYONNE 

 TOULOUSE 31060 

 FRANCE 

 1 DRA FORT HALSTEAD 

 P N JONES 

 SEVEN OAKS KENT TN 147BP 

 UK 

 1 DEFENSE RESEARCH ESTAB 

 VALCARTIER 

 F LESAGE 

 COURCELETTE QUEBEC 

 COA IRO 

 CANADA 

 1 SWISS FEDERAL ARMAMENTS 

 WKS 

 W LANZ 

 ALLMENDSTRASSE 86 

 3602 THUN 

 SWITZERLAND 

 1 DYNAMEC RESEARCH AB 

 AKE PERSSON 

 BOX 201 

 SE 151 23 SODERTALJE 

 SWEDEN 

 1 ISRAEL INST OF 

 TECHNOLOGY 

 S BODNER 

 FACULTY OF MECHANICAL 

 ENGR 

 HAIFA 3200 

 ISRAEL 

 1 DSTO 

 WEAPONS SYSTEMS DIVISION 

 N BURMAN RLLWS 

 SALISBURY 

 SOUTH AUSTRALIA 5108 

 AUSTRALIA 

 1 DEF RES ESTABLISHMENT 

 VALCARTIER 

 A DUPUIS 

 2459 BOULEVARD PIE XI NORTH 

 VALCARTIER QUEBEC 

 CANADA 

 PO BOX 8800 COURCELETTE 

 GOA IRO QUEBEC 

 CANADA 

 1 INSTITUT FRANCO ALLEMAND 

 DE RECHERCHES DE SAINT 

 LOUIS 

 DE M GIRAUD 

 5 RUE DU GENERAL 

 CASSAGNOU 

 BOITE POSTALE 34 

 F 68301 SAINT LOUIS CEDEX 

 FRANCE 

 1 ECOLE POLYTECH 

 J MANSON 

 DMX LTC 

 CH 1015 LAUSANNE 

 SWITZERLAND
NO. OF 

COPIES ORGANIZATION

16 

 1 TNO DEFENSE RESEARCH 

 R IJSSELSTEIN 

 ACCOUNT DIRECTOR 

 R&D ARMEE 

 PO BOX 6006 

 2600 JA DELFT 

 THE NETHERLANDS 

 2 FOA NATL DEFENSE RESEARCH 

 ESTAB 

 DIR DEPT OF WEAPONS & 

 PROTECTION 

 B JANZON 

 R HOLMLIN 

 S 172 90 STOCKHOLM 

 SWEDEN 

 2 DEFENSE TECH & PROC AGENCY 

 GROUND 

 I CREWTHER 

 GENERAL HERZOG HAUS 

 3602 THUN 

 SWITZERLAND 

 1 MINISTRY OF DEFENCE 

 RAFAEL 

 ARMAMENT DEVELOPMENT 

 AUTH 

 M MAYSELESS 

 PO BOX 2250 

 HAIFA 31021 

 ISRAEL 

 1 TNO DEFENSE RESEARCH 

 I H PASMAN 

 POSTBUS 6006 

 2600 JA DELFT 

 THE NETHERLANDS 

 1 B HIRSCH 

 TACHKEMONY ST 6 

 NETAMUA 42611 

 ISRAEL 

 1 DEUTSCHE AEROSPACE AG 

 DYNAMICS SYSTEMS 

 M HELD 

 PO BOX 1340 

 D 86523 SCHROBENHAUSEN 

 GERMANY