# Patent

## Title
Objectives as a microlithography projection objective with at least one liquid lens

## Abstract

The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

## Background
BACKGROUND OF THE INVENTION
1. Field of the Invention
This application is a continuation and claims the benefit of priority under 35 U.S.C. § 120 of U.S. application Ser. No. 10/562,257, filed Dec. 21, 2005, which is a National Phase application filed under 35 U.S.C. § 371, from PCT Application No. PCT/EP2004/014219, filed Dec. 14, 2004, which claims the benefit of priority to: U.S. Ser. No. 60/530,623, filed Dec. 19, 2003; U.S. Ser. No. 60/544,967 filed Feb. 13, 2004; U.S. Ser. No. 60/568,006 filed May 4, 2004; U.S. Ser. No. 60/591,775 filed Jul. 27, 2004; U.S. Ser. No. 60/592,208 filed Jul. 29, 2004; and U.S. Ser. No. 60/612,823 filed Sep. 24, 2004. These applications are incorporated herein by reference in their entirety.
The invention relates to an objective designed as a microlithography projection objective. The objective according to the invention comprises at least one liquid lens made from a transparent liquid.
2. Description of the Related Art
Microlithography projection objectives of multivarious design are known.
In all imaging systems, the smallest resolvable structural width is proportional to the numerical aperture NA at the image plane.
This, in turn, is proportional to the angle of incidence and the refractive index nI of the medium through which the light falls onto the image plane.
By contrast with so-called dry objectives with gas (air, N2, He and the like) or a vacuum with a refractive index of approximately 1.0, a material, in particular a liquid, with a substantially higher refractive index is used as this medium in immersion systems.
For example, as far as is known for the wavelength 193 nm water has a refractive index nH2O=1.44.
High-index lenses with a refractive index much higher than 1.6 have been used in microlithography at wavelengths of greater than 365 nm, but they become incapable of use at the wavelengths of practical relevance such as 248 nm, 195 nm, 157 nm, since they are not sufficiently transparent, and so on. Lenses made from sapphire have a high refractive index but are birefringent, and this must be compensated in a complicated way and with limited success.
SUMMARY OF THE INVENTION
The inventors have recognized that, furthermore, the possible image-side numerical aperture NA is limited by the refractive index of the curved optical element next to the image plane.
Such an element can be provided as a liquid lens that can also serve simultaneously as immersion liquid, specifically with or without a plane-parallel separation plate. However, if the refractive index nF thereof lags behind the refractive index nL of the solid lenses used in the objective, the achievable NA remains still smaller, NA<nF.
The difference is significant in the case of a 193 nm objective with lenses made from fused silica with nL=1.56 and with water as an immersion and a liquid lens with nF=1.44.
According to the invention, use is made in the objective of at least one liquid lens whose refractive index nF is greater than the refractive index nL of each solid lens in the objective. The first lens in the meaning of claim 1 is the lens, arranged at any desired location in the objective, made from the highest-index solid lens material which is used in the objective. As also in the embodiments shown, all the lenses—except for the liquid lens or lenses—consist in many cases of the same solid material.
With respect to lenses made from fused silica or calcium fluoride, which are established for microlithography projection objectives with the operating wavelengths of 248 nm, 193 nm, 157 nm, liquids with, for example, nF=1.6, nF=1.65 or nF=1.8 are suitable.
There is a corresponding result for other lens materials known for the deep UV (DUV) and vacuum UV, such as fluoride crystals BaF2, SrF2, LiF, NaF and others.
Although there are many developments of immersion liquids for applications in microlithography, it is clear at least in principle that H2SO4 (sulfuric acid), H3PO4 (phosphoric acid) and their solutions in H2O (water) yield adjustable refractive indices of 1.5-1.8 at 193 nm in conjunction with suitable transmission. In addition, the corrosive action of these substances is substantially reduced with the aid of substitution of heavy isotopes, in particular deuterium. This is described inter alia in U.S. Application Ser. No. 60/568,006.
Corrosion protection layers can be provided on the solid optical elements. This is disclosed inter alia in U.S. Application Ser. No. 60/530,623.
Accordingly, an objective having the features of claim 1 has surprisingly been found to be particularly advantageous. A microlithography projection objective with an image-side numerical aperture NA greater than 1, which is not accessible for a dry objective, is substantially relieved and extended as regards the possibilities for its optical design and correction when use is made of a liquid lens with a refractive index greater than the refractive index of the solid lenses. In the case of lenses made from different materials, the largest refractive index of all these lenses is exceeded. A plane-parallel plate, in particular an end plate made from sapphire, for example, may have a higher refractive index, in this case.
Objectives are usually corrected for specific operating wavelengths and can be operated reasonably only at these wavelengths. The refractive indices of all materials vary with wavelength, and it is always the values for the operating wavelength which are used as a basis here. Other wavelengths can traverse the objective, for example for the purposes of measurement.
It has surprisingly been found that on the basis of the invention it is possible to design objectives with an NA greater than the refractive index nL of every solid lens. This is also reflected in claim 2.
The liquid lens can be an immersion at the same time, that is to say it can be in contact to the object to be exposed. Alternatively, it is possible for an optical element made from a solid transparent body, in particular an end plate, to be arranged there between.
The liquids of the liquid lens and of the immersion at the object can then be adapted to various conditions such as:

    
    
        in the case of the immersion:
        
            rapid movement for step-and-scan
            contact with materials of the wafer such as resist
            contact with air
            cleaning requirements for wafer processing after exposure
        
        
        in the case of the liquid lens:
        
            contact with material of the adjacent solid lens

and be selected, accordingly.

        
        
    
    


Since the refractive indices nF of the liquid lens and nI of the immersion are lower bounds for the achievable NA, it is natural to prefer that nF=nI.
The effect of increasing the accessible NA caused by the liquid lens with high refractive index nF becomes greatest when said lens is the last curved element on the image side.
Substantially hemispherical last lenses have proved in this case to be advantageous, since then the angle of incidence of the light varies relatively slightly over the lens surface and remains close to the normal to the curved surface. The critical angle of total reflection is thus effectively avoided.
Intermediate images in the objective are a measure by which the lens diameters can be kept small. The availability and the price of lens material and of finish-machined lenses in a quality suitable for microlithography projection objectives are very substantially relieved at lower diameters.
It is therefore to be pointed out that, otherwise than in the US classification 359/642 defined for LENS, here it is precisely also optical systems with an intermediate image, even several thereof, that are designated as an objective. Designs of objectives suitable for the invention are inter alia disclosed in U.S. Application Ser. No. 60/544,967, U.S. Application Ser. No. 60/592,208 and U.S. Application Ser. No. 60/591,775.
The field flattening is a central problem with such an objective, being equivalent to a minimization of the Petzval sum.
Primarily for this purpose, but also for color correction (achromatization), a design as a catadioptric system comprising at least one curved mirror in addition to the lenses is advantageous. A combination of a negative lens and a concave mirror is particularly effective for color correction. Further possibilities for color correction are disclosed in U.S. Application Ser. No. 60/530,978. Catadioptric systems frequently have folding mirrors, thereby permitting the light beams running to a mirror to be separated from those returning therefrom. Such systems are also described and covered here.
However, all surfaces of the optical system are effective for correction when all mirrors are curved. This is possible, in particular, with an even number, especially 2, of curved mirrors. It is also possible in this case for the entire objective to be constructed along a common axis of symmetry in relation to which all the mirror and lens surfaces exhibit a rotationally symmetrical shape where light passes through. However, there is asymmetric edging in the region of the mirrors and, if appropriate, adjacent lenses. Adjustment and vibration resistance as well as installation space requirements of the objective profit from the common axis of symmetry.
It is favorable in this case if the objective comprises an image-side objective part arranged at the image-side end of the objective and an intermediate objective part preceding the image-side objective part with respect of the direction of the light moving from the object-side end to the image-side end of the objective. If not defined otherwise, this direction is the reference whenever a position of a component of the objective is defined. The intermediate objective part is containing mirrors and may be designed catoptrically as, for example, in FIG. 1-FIG. 3, or catadioptrically as in the other embodiments. The image-side objective part, which is purely refractive, is providing the extreme aperture and comprises the liquid lens.
It did surprisingly turn out that this image side objective part advantageously has its pupil in the region of the beam path which is convergent in relation to the image plane, or, as described in claim 11, that said pupil is located between the lens of the greatest diameter used and the image plane.
In this region, the strong positive refractive power which is required in order to produce the large angles of incidence at the image plane in accordance with the high NA is expediently distributed over a plurality of positive meniscus lenses which are concave on the image side. Both chromatic aberrations and contributions to the Petzval sum are thereby reduced.
The inventors have established that the solid lens preceding the liquid lens according to the invention and defining the object-side surface of the liquid lens should be a meniscus lens whose center thickness (THICKNESS in accordance with the tables) is smaller than the difference of the radii of curvature (RADIUS) of the two lens surfaces. Such a meniscus lens having negative refractive power in the paraxial region makes a transition in part to an action of positive refractive power in the outer region where beams strike more steeply, that is from further outside, than the normal to the surface.
It is advantageous when the objective comprises an object-side objective part being arranged at the object-side end of the objective and producing an intermediate image on the object side of the intermediate objective part.
This permits, inter alia, greater freedom in configuring the passage of the light bundles next to the mirrors, and yields an additional diaphragm location which can well be situated in an air space and is therefore well suited as a stop-down aperture diaphragm.
It is to be seen in the embodiments that it is advantageous to provide lenses of low refractive power with a strongly modulated aspheric shape preceding this diaphragm plane and to provide a strongly curved meniscus lens subsequent to this diaphragm plane, the meniscus lens being concave on the diaphragm side.
It is clear that such high-aperture projection objectives for microlithography of very high resolution require intensive use of aspherics, since essential parameters for image correction are thereby provided.
Deliberate use is also made in the exemplary embodiments of very strong aspherics and those whose deviation from the spherical shape does not exhibit a monotonic profile over the distance from the optical axis.
As already mentioned, such aspherics are particularly advantageous in the object-side objective part.
It emerges in addition that in the image-side objective part some positive lenses yield particularly suitable arrangements of strong aspherics. These positive lenses are situated in the region of the steeply rising light bundle diameter between the negative lenses arranged near the intermediate image and the belly of the light bundle at the lens with the maximum of the diameter of the light bundle passing through.
The embodiments presented are partly of an experimental nature. However, to the person skilled in the art who compares these with similar design solutions known to him and derives modifications therefrom they yield clear-cut teachings from which he is able to modify designs of objectives.
The various designs of the individual embodiments make this clear, and can, of course, also be combined with one another and with other known designs in the meaning of the invention.
The exemplary embodiments are explained in more detail with the aid of the drawings, in which



BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 to 6 respectively show a meridian section of an embodiment of an objective according to the invention.



DESCRIPTION OF THE PREFERRED EMBODIMENTS
In FIG. 1 to 6 marginal and principal rays are depicted for the object points nearest and furthest from the axis. Aspheric surfaces are marked twice with 3 lines at the contour.
The optical axis or the axis of symmetry of the curvatures of the surfaces is marked by dots and dashes.
In each case OB denotes the object plane. This corresponds to the surface (SURF) 0 in the tables. IM denotes the image plane and corresponds in each case to the surface of the highest number in the tables.
F respectively denotes the liquid lens according to the invention.
EP denotes an optional end plate.
IMI1 and IMI2 are the intermediate images.
AP denotes the position of the system aperture at which an adjustable diaphragm can be arranged and will also be referred to as diaphragm plane.
P denotes the pupil in an image-side objective part.
All embodiments shown are designed for the operating wavelength 193.4 nm (ArF Excimer Laser) and reduce by 1:4—without limiting the invention thereto.
Tables 1a to 6a respectively give the design data for the drawing of the same number. Tables 1b to 6b respectively specify the aspheric data of the aspheric lens and mirror surfaces, which are identified in the drawings by three primes. The illustration is made using the Optik-Design-Software CODE VTM from Optical Research Associates and corresponds to their conventions.
In each embodiment shown in FIG. 1 to 6 the objective comprise an object-side objective part, an image-side objective part and an intermediate objective part. The object-side objective part is situated at the object-side end of the objective. The image-side objective part is situated at the image-side end of the objective. The intermediate objective part is situated between the object-side objective part and the image-side objective part. In the embodiments the object-side objective part and the image side objective part are purely reflective. The intermediate objective part is catoptric or catadioptric.
In the embodiments of FIG. 1 to FIG. 3 the value of the numerical aperture NA=1.4. The liquid of the lens F and the immersion have the same refractive index nF=nI=1.65. The material of the solid lenses is fused silica with an index of refraction nL=1.56.
The distance from the object plane OB to the image IM is 1250 mm and thereby a common value.
The image field is 26 mm×5.5 mm, decentered by 4.66 mm. However, the correction state yields an RMS wave front error of this image field of approximately 10-20 per mil of the operating wavelength.
The lenses of the object-side objective part and the image side objective part are rotationally symmetrical in relation to a common axis of symmetry, with the two mirrors of the catoptric version of the intermediate objective part certainly being curved in an axially symmetrical fashion, but being edged asymmetrically.
The design of the objective will now be described in more detail with respect to the embodiment of FIG. 1. Most of the features are also present at the embodiments of FIG. 2 to 6, but will only be explained in some detail with respect to FIG. 1.
The object-side objective part comprises an accessible diaphragm plane AP with the stop-down system diaphragm. Preceding the diaphragm plane AP there is a particularly strongly modulated aspheric (surface 7 of table 1a/b). Subsequent to the diaphragm plane AP there is a meniscus lens which is concave on the side of the diaphragm plane AP (surfaces 15, 16 in table 1a).
The intermediate objective part is designed catoptrically and comprises two concave mirrors (surfaces 23, 24 in table 1a).
The image-side objective part subsequent to the second intermediate image IMI2—the intermediate images are not corrected and do not form an image plane—begins with a positive lens group of single-lens design, forms a waist with a number of negative lenses, and has a positive lens group with many members which forms a massive belly.
Strongly modulated aspherics (inter alia, surface 36 in table 1a/b) are significant in the initial region of the positive lens group where the diameter of the light bundle and of the lenses are increasing. The middle of the belly is formed by the lens of greatest diameter (surface 41/42 in table 1a/b, height (SEMIDIAM, half lens diameter) 160 mm). The production of lithographic projection objectives is very economical with this lens diameter. The pupil P of the image-side objective part is, in a fashion typical of the objectives according to the invention, following this largest lens in the convergent beam path.
In the embodiment of FIG. 1, the liquid lens F is formed between the surface 50 and the image plane IM (surface 52) and is at the same time the immersion. It is virtually hemispherical given the radius 34.6 mm and the thickness 30.1+3.0=33.1 mm. The ratio of radius to thickness is 1.05. The adjacent last fused silica lens is in this case a meniscus lens whose thickness of 10 mm is substantially smaller than the difference of the radii 66 mm-34 mm (surfaces 49/50).
In the embodiment of FIG. 2, once again the liquid lens F is at the same time likewise immersion. However, it is substantially flatter than the liquid lens F of FIG. 1. Only in combination with the last fused silica lens, the liquid lens F forms an approximately hemispherical member.
Using a rather flat liquid lens F makes the exchange of the liquid simpler.
It has been established that a plane-parallel plate which separates the liquid lens F and the immersion is not critical for the optical function. This holds in particular when the refractive index of the plan-parallel plate is greater than the refractive indices nF of the liquid lens F and nI of the immersion.
Starting from the embodiment of FIG. 1, FIG. 3 shows an embodiment with such an end plate EP of refractive index nEP=1.80. By adapting the thickness, it can easily be exchanged for a plate made from sapphire with nEP=1.92.
In the embodiment of FIG. 4 (table 4a/b) a catadioptric design is used for the intermediate objective part.
Given the same NA, nF, nL as the preceding embodiments, the image field is somewhat deviant with 22×5.2 mm and greater decentering of 5.753 mm.
In this embodiment two planar folding mirrors FM1 (surface 21) and FM2 (surface 31) are used as geometric beam splitters. Provided in a lateral arrangement are a concave mirror—surface 26 in table 4a/b—and lenses of negative refractive power through which the light passes twice. The surfaces 22-25 of these lenses are thus present once more specularly as 27 to 30 in table 4a/b, since they refract the light twice.
The high-index liquid lens F is also advantageously used with this quite different approach to the design of the microlithographic projection objective. In a way similar to FIG. 1, it is designed here as “immersion lens”, touching the object, between the surfaces 63 and 65.
The two embodiments of FIG. 5 and FIG. 6 for the first time exhibit objectives with the numerical aperture NA=1.6 being greater than the refractive index nL of the solid lenses used. The solid lenses are made from fused silica with nL=1.56. The refractive index of the liquid lens F is nF=1.80. Also these embodiments are corrected much better than in a diffraction-limited fashion, their image field being 20 mm×4 mm at a decentering of 4.375 mm. The RMS wavefront error is below a tenth of the operating wavelength 193.4 mm.
Here, as well, the object-side objective part is purely refractive. It includes the accessible and stop-down diaphragm plane AP and strong aspherics preceding the diaphragm plane AP. Here these aspherics are two lenses of lesser refractive power but stronger modulation of the aspheric shape deviation, surfaces 5 and 8 in table 5a/b. Arranged subsequent to these aspherics is a likewise strongly curved meniscus lens, surfaces 10, 11 in table 5a/6.
The intermediate objective part is once again a prolate catadioptric objective with two concave mirrors, similar to FIG. 1-3, but now with a positive field lens (surfaces 20, 21 in table 5a) preceding the second intermediate image IMI2.
The positive field lens replaces the positive first lens group present in FIG. 1-3 in the image-side objective part.
The image-side objective part thus begins with a negative lens group and forms a belly with a multilens positive lens group. In the embodiment of FIG. 5 the greatest lens diameter is reached with 165 mm at the lenses 30/31 and 32/33 as can be seen in table 5a. A plurality of positive meniscus lenses which are concave in relation to the image plane IM is arranged subsequent to these lenses. The pupil P of the image-side objective part lies in the region of these meniscus lenses. The last fused silica lens (surfaces 40, 41 of table 5a) on the image side is once again of negative refractive power in the paraxial region. This lens is formed as a meniscus lens with a concave surface on the image side whose thickness is 8.9 mm and thus smaller than the difference of the radii 58.8 mm-37.8 mm=21 mm.
In the embodiment of FIG. 5, the liquid lens F is immersion at the same time, and thus abuts the image plane IM and the object, which is arranged there in order to exposed. This object can be, for example, a wafer. The radius of the spherical surface 41 is 37.8 mm and thus smaller than the thickness of 45.8 mm. The sine of the angle of incidence is smaller than 0.89 at all surfaces. The catadioptric intermediate objective part is enlarging. The sines of the angles of incidence at the concave mirrors are below 0.45.
The embodiment of FIG. 6 and table 6a/b comprise a 3.0 mm thick end plate EP made from sapphire. The liquid lens F is now formed between the surfaces 42, 43 of table 6a. Their thickness is 40.2 mm, the radius is 38.1 mm. The thickness is thus 105% of the radius.
It has thus been shown that liquid lenses F of high refractive index permit the design of high-quality projection objectives with extreme numerical apertures.
Multivarious approaches and instructions are thus given to the person skilled in the art in order to use this teaching for further developing different kinds of known approaches in designing objectives.












TABLE 1a





SURF
RADIUS
THICKNESS
MATERIAL
INDEX
SEMIDIAM.




















 0 = OB
∞
35.000000

1.00030168
66.000


 1
∞
0.100881

1.00030168
77.003


 2
173.279980
34.026411
SIO2V
1.56078570
90.000


 3
−1081.359892
2.602590

1.00029966
90.000


 4
284.316798
47.383982
SIO2V
1.56078570
95.000


 5
−1674.306964
22.855576

1.00029966
95.000


 6
577.261196
36.645573
SIO2V
1.56078570
76.354


 7
−314.377359
0.999980

1.00029966
73.677


 8
290.150309
25.000000
SIO2V
1.56078570
75.000


 9
−348.828624
1.000000

1.00029966
75.000


10
357.767685
29.107951
SIO2V
1.56078570
75.000


11
−185.316330
18.309132

1.00029966
75.000


12
∞
0.000000

1.00029966
36.370


13
∞
10.000000
SIO2V
1.56078570
44.778


14
∞
24.909905

1.00029966
47.596


15
−65.374870
14.999947
SIO2V
1.56078570
50.000


16
−87.154980
13.643080

1.00029966
60.000


17
−175.112352
18.964687
SIO2V
1.56078570
65.000


18
−111.646867
1.049880

1.00029966
70.000


19
−155.839260
37.603622
SIO2V
1.56078570
80.000


20
−102.943508
0.099910

1.00029966
80.000


21
∞
40.000000

1.00029966
90.389


22
∞
209.622700

1.00029966
92.498


23
−166.402525
−209.622700
REFL
1.00029966
150.000


24
173.713446
209.622700
REFL
1.00029966
125.000


25
∞
40.000000

1.00029966
99.138


26
∞
0.100021

1.00029966
105.283


27
174.736655
46.035435
SIO2V
1.56078570
110.000


28
369.899337
2.484896

1.00029966
105.000


29
511.775400
10.000000
SIO2V
1.56078570
95.000


30
117.498299
37.368783

1.00029966
80.000


31
−690.607305
10.000000
SIO2V
1.56078570
80.000


32
153.845418
25.455370

1.00029966
80.000


33
20331.979093
10.000000
SIO2V
1.56078570
90.000


34
347.272006
22.437822

1.00029966
90.000


35
502.344250
44.143760
SIO2V
1.56078570
120.000


36
−231.373663
17.400867

1.00029966
120.000


37
−837.483770
31.483968
SIO2V
1.56078570
130.000


38
−254.746002
6.600316

1.00029966
135.000


39
−392.185232
82.775939
SIO2V
1.56078570
140.000


40
−196.513232
1.000000

1.00029966
155.000


41
610.397747
56.287416
SIO2V
1.56078570
160.000


42
−556.907407
0.999835

1.00029966
160.000


43
296.607308
48.957456
SIO2V
1.56078570
150.000


44
−1578.327293
1.000000

1.00029966
150.000


45
216.352446
43.826306
SIO2V
1.56078570
125.000


46
2322.892305
1.000000

1.00029966
125.000


47
101.534703
42.624105
SIO2V
1.56078570
88.000


48
255.691515
0.999893

1.00029966
85.000


49
66.827516
10.000000
SIO2V
1.56078570
52.000


50
34.581844
30.092080
(F)
1.65000000
34.000


51
∞
3.000000
(F)
1.65000000
34.000


52 = IM
∞



34.000
















TABLE 1b





ASPHERIC ONSTANTS




















SRF
2
5
7
17
19





K
0
0
0
0
0


C1
−5.719118e−08
−1.218375e−07
4.192613e−07
−2.035191e−07
6.581837e−08


C2
−6.011473e−13
 9.454546e−12
4.225479e−12
−2.746520e−11
1.290762e−11


C3
−2.863941e−16
−1.629731e−15
1.483284e−15
−2.529717e−15
6.638127e−16


C4
 2.205921e−20
 1.088963e−19
3.420546e−19
 5.381454e−19
−2.943367e−19 


C5
−5.981074e−24
 8.373344e−24
−2.828899e−23 
−1.447893e−22
3.550178e−24


C6
 1.047361e−27
−1.832764e−27
−1.680731e−27 
−3.175732e−27
6.050767e−28


C7
−1.013527e−31
 1.046373e−31
2.906586e−31
 5.176529e−30
4.358568e−31


C8
 4.076124e−36
−1.708389e−36
−5.252329e−35 
−1.024665e−33
−4.270946e−35 















SRF
23
24
28
36
37





K
−0.602272
−0.240254
0
0
0


C1
 0.000000e+00
0.000000e+00
−1.628020e−07 
2.060497e−08
−7.918942e−08


C2
−9.110764e−15
3.799619e−15
5.004648e−12
6.206171e−13
−7.390346e−13


C3
−6.923032e−20
1.050462e−19
1.238115e−16
1.568846e−16
 1.677228e−16


C4
−1.592422e−23
2.407529e−23
1.345805e−20
−1.970417e−20 
−6.727857e−21


C5
 8.704660e−28
−2.336605e−27 
−5.722714e−24 
2.817612e−24
 6.703292e−25


C6
−3.848813e−32
2.089863e−31
7.429779e−28
−2.065939e−28 
−1.712552e−29


C7
 8.257231e−37
−8.540536e−36 
−5.390293e−32 
7.979829e−33
−9.430098e−34


C8
−7.590177e−42
1.725784e−40
1.988577e−36
−1.039469e−37 
 4.239222e−38













SRF
39
43
46





K
0
0
0


C1
 5.160606e−09
−2.788258e−08
−2.365786e−08


C2
−2.393183e−13
 4.064341e−13
 3.640299e−12


C3
−7.204528e−17
 2.762083e−17
−1.570433e−16


C4
−1.517240e−22
−4.172618e−22
 6.381899e−21


C5
−3.032479e−27
−3.754486e−27
−3.770869e−26


C6
 1.227351e−29
−6.324033e−31
−1.116749e−29


C7
−8.867490e−34
 3.185590e−35
 6.455153e−34


C8
 2.067251e−38
−4.120762e−40
−1.076920e−38





















TABLE 2a





SURF
RADIUS
THICKNESS
MATERIAL
INDEX
SEMIDIAM.




















 0 = OB
∞
35.000000

1.00030168
66.000


 1
∞
1.166644

1.00030168
77.003


 2
197.911058
20.674095
SIO2V
1.56078570
90.000


 3
635.116021
2.894278

1.00029966
90.000


 4
154.515346
52.818599
SIO2V
1.56078570
95.000


 5
−674.545898
46.213532

1.00029966
95.000


 6
351.508267
12.006164
SIO2V
1.56078570
76.354


 7
−355.431508
1.879459

1.00029966
73.677


 8
137.853261
42.368303
SIO2V
1.56078570
75.000


 9
−168.451126
1.576637

1.00029966
75.000


10
∞
18.000000

1.00029966
36.370


11
∞
10.000000
SIO2V
1.56078570
44.778


12
∞
25.245183

1.00029966
47.596


13
−69.535170
15.000107
SIO2V
1.56078570
50.000


14
−125.326320
1.000069

1.00029966
60.000


15
−178.873389
25.788410
SIO2V
1.56078570
65.000


16
−101.720844
15.664259

1.00029966
70.000


17
−199.223616
36.639577
SIO2V
1.56078570
80.000


18
−102.251112
0.099749

1.00029966
80.000


19
∞
40.000000

1.00029966
90.389


20
∞
209.622700

1.00029966
92.498


21
−166.119896
−209.622700
REFL
1.00029966
150.000


22
175.984040
209.622700
REFL
1.00029966
125.000


23
∞
40.000000

1.00029966
99.138


24
∞
0.172730

1.00029966
105.283


25
253.724164
38.159409
SIO2V
1.56078570
110.000


26
−576.959427
1.129890

1.00029966
110.000


27
969.471804
12.758546
SIO2V
1.56078570
105.000


28
349.602989
0.999948

1.00029966
105.000


29
528.180407
10.000000
SIO2V
1.56078570
95.000


30
121.034243
37.709281

1.00029966
80.000


31
−511.453381
10.000000
SIO2V
1.56078570
80.000


32
144.865830
27.748574

1.00029966
80.000


33
−2683.436282
10.000000
SIO2V
1.56078570
90.000


34
350.818886
21.231421

1.00029966
90.000


35
564.353180
43.838798
SIO2V
1.56078570
120.000


36
−231.828235
17.071926

1.00029966
120.000


37
−844.682254
27.174378
SIO2V
1.56078570
130.000


38
−257.084208
13.572085

1.00029966
135.000


39
−347.360290
79.971864
SIO2V
1.56078570
140.000


40
−191.420105
1.000000

1.00029966
155.000


41
638.593875
53.484057
SIO2V
1.56078570
160.000


42
−617.708478
0.999739

1.00029966
160.000


43
290.550562
51.321670
SIO2V
1.56078570
150.000


44
−1239.997337
1.000000

1.00029966
150.000


45
234.055441
41.191419
SIO2V
1.56078570
125.000


46
1260.796700
1.000000

1.00029966
125.000


47
119.116897
46.087832
SIO2V
1.56078570
92.000


48
410.714306
0.999596

1.00029966
90.000


49
57.007308
19.999880
SIO2V
1.56078570
52.000


50
70.000000
24.719485
(F)
1.65000000
48.000


51
∞
3.000000
(F)
1.65000000
34.000


52 = IM
∞



34.000
















TABLE 2b





ASPHERIC CONSTANTS




















SRF
2
5
7
15
17





K
0
0
0
0
0


C1
−4.272071e−08
−6.660852e−08
4.612425e−07
−1.819217e−07
−2.134272e−08


C2
−2.130756e−12
 5.070507e−12
1.287676e−11
−1.679339e−11
 2.642130e−12


C3
−3.407494e−16
−7.615346e−16
2.169742e−15
−4.541462e−15
 3.144530e−16


C4
 4.132704e−20
 7.606615e−20
3.202709e−19
 1.365731e−18
−1.203833e−19


C5
−8.614408e−24
 5.842474e−24
1.189789e−22
−7.298537e−22
 3.777303e−23


C6
 1.402057e−27
−1.689387e−27
−4.328782e−26 
 1.116111e−25
−6.878338e−27


C7
−1.320281e−31
 1.280496e−31
5.025746e−30
 4.239480e−31
 6.547727e−31


C8
 6.029685e−36
−3.499149e−36
−2.455352e−34 
−2.801453e−33
−2.572158e−35





SRF
21
22
28
36
37





K
−0.673243
−0.223377
0
0
0


C1
 0.000000e+00
0.000000e+00
−1.742865e−07 
−1.146354e−09
−8.904146e−08


C2
−1.542990e−14
4.242474e−15
3.989651e−12
 6.487508e−13
−9.704035e−13


C3
−2.283008e−19
−1.633115e−19 
2.232371e−16
 2.106572e−16
 1.932349e−16


C4
−2.701974e−23
7.966751e−23
−2.851297e−20 
−1.981895e−20
−9.140962e−21


C5
 1.563798e−27
−8.898817e−27 
1.148424e−24
 2.432642e−24
 7.612481e−25


C6
−7.092827e−32
6.276885e−31
3.102982e−28
−1.327579e−28
−5.817189e−30


C7
 1.654890e−36
−2.262895e−35 
−5.058499e−32 
 4.126250e−33
−1.250231e−33


C8
−1.695530e−41
3.532661e−40
3.007511e−36
−3.753435e−38
 3.610689e−38













SRF
39
43
46





K
0
0
0


C1
6.669745e−09
−3.063876e−08
−3.402805e−08


C2
1.190421e−13
 3.642882e−13
 4.126635e−12


C3
−7.888065e−17 
 2.784805e−17
−1.931151e−16


C4
−5.882168e−23 
−6.429270e−22
 8.149530e−21


C5
2.413262e−26
 8.661549e−27
−7.144438e−26


C6
8.242901e−30
−8.015685e−31
−1.341671e−29


C7
−6.256631e−34 
 2.825051e−35
 7.855498e−34


C8
1.445073e−38
−3.170258e−40
−1.361588e−38





















TABLE 3a





SURF
RADIUS
THICKNESS
MATERIAL
INDEX
SEMIDIAM.




















 0 = OB
∞
35.000000

1.00030168
66.000


 1
∞
0.099980

1.00030168
77.003


 2
170.078547
36.468596
SIO2V
1.56078570
90.000


 3
−599.314872
2.182511

1.00029966
90.000


 4
333.623154
49.026243
SIO2V
1.56078570
95.000


 5
−5357.879827
17.783452

1.00029966
95.000


 6
524.085081
39.656864
SIO2V
1.56078570
76.354


 7
−372.985082
1.020916

1.00029966
73.677


 8
273.494931
25.000000
SIO2V
1.56078570
75.000


 9
−304.985535
1.000000

1.00029966
75.000


10
326.223899
32.555959
SIO2V
1.56078570
75.000


11
−194.836449
18.000006

1.00029966
75.000


12
∞
0.000000

1.00029966
36.370


13
∞
10.000000
SIO2V
1.56078570
44.778


14
∞
24.420303

1.00029966
47.596


15
−65.482398
15.000019
SIO2V
1.56078570
50.000


16
−89.830925
12.487606

1.00029966
60.000


17
−181.375682
17.778805
SIO2V
1.56078570
65.000


18
−112.069227
1.008243

1.00029966
70.000


19
−158.283947
37.090377
SIO2V
1.56078570
80.000


20
−102.436390
0.099969

1.00029966
80.000


21
∞
40.000000

1.00029966
90.389


22
∞
209.622700

1.00029966
92.498


23
−166.136319
−209.622700
REFL
1.00029966
150.000


24
173.615104
209.622700
REFL
1.00029966
125.000


25
∞
40.000000

1.00029966
99.138


26
∞
0.104935

1.00029966
105.283


27
161.705740
39.665166
SIO2V
1.56078570
110.000


28
338.219127
4.220151

1.00029966
105.000


29
539.284856
10.000000
SIO2V
1.56078570
95.000


30
115.279475
38.192763

1.00029966
80.000


31
−713.073292
10.000000
SIO2V
1.56078570
80.000


32
153.450259
25.766812

1.00029966
80.000


33
−35457.805610
10.000000
SIO2V
1.56078570
90.000


34
338.447211
22.577058

1.00029966
90.000


35
488.793543
45.370961
SIO2V
1.56078570
120.000


36
−229.090765
17.224093

1.00029966
120.000


37
−813.380443
31.337371
SIO2V
1.56078570
130.000


38
−255.856356
9.074786

1.00029966
135.000


39
−397.181958
81.335823
SIO2V
1.56078570
140.000


40
−197.104943
1.000000

1.00029966
155.000


41
616.283620
55.915659
SIO2V
1.56078570
160.000


42
−558.051853
0.999900

1.00029966
160.000


43
297.754439
48.959126
SIO2V
1.56078570
150.000


44
−1599.554010
1.000000

1.00029966
150.000


45
216.813876
43.986900
SIO2V
1.56078570
125.000


46
2513.355923
1.000000

1.00029966
125.000


47
102.047705
42.326072
SIO2V
1.56078570
88.000


48
258.213934
1.000000

1.00029966
85.000


49
67.045666
10.000000
SIO2V
1.56078570
52.000


50
33.992537
27.639900
(F)
1.65000000
33.000


51
∞
3.000000

1.80000000
33.000


52
∞
3.000000
(IMMERS.)
1.65000000
33.000


53 = IM
∞



33.000
















TABLE 3b





ASPHERIC CONSTANTS




















SRF
2
5
7
17
19





K
0
0
0
0
0


C1
−6.761238e−08
−1.339952e−07
4.322957e−07
−1.865717e−07
5.694739e−08


C2
−2.795074e−13
 8.081896e−12
6.638487e−12
−2.605817e−11
1.297663e−11


C3
−3.419978e−16
−1.520519e−15
1.196137e−15
−2.223425e−15
7.551094e−16


C4
 3.593975e−20
 1.158356e−19
3.139076e−19
 4.529397e−19
−2.801640e−19 


C5
−7.394770e−24
 8.165985e−24
−2.103438e−23 
−1.036163e−22
−1.293839e−24 


C6
 1.067458e−27
−2.018394e−27
−2.540248e−27 
−6.085859e−27
7.867948e−28


C7
−9.043542e−32
 1.252003e−31
3.764879e−31
 4.354732e−30
4.763906e−31


C8
 3.329797e−36
−2.409824e−36
−5.551249e−35 
−7.881442e−34
−4.577122e−35 















SRF
23
24
28
36
37





K
−0.603427
−0.236665
0
0
0


C1
 0.000000e+00
0.000000e+00
−1.724255e−07 
1.725752e−08
−8.279489e−08


C2
−1.058224e−14
3.699741e−15
4.976445e−12
5.471441e−13
−8.022210e−13


C3
−1.413269e−19
−3.750775e−20 
2.387092e−16
1.390990e−16
 1.431148e−16


C4
−1.204112e−23
5.430640e−23
5.525729e−21
−1.755950e−20 
−5.767930e−21


C5
 4.963866e−28
−5.801174e−27 
−6.052665e−24 
2.625696e−24
 6.871766e−25


C6
−2.129066e−32
4.279164e−31
7.725095e−28
−1.914617e−28 
−2.240962e−29


C7
 3.795477e−37
−1.574698e−35 
−5.045738e−32 
7.395971e−33
−3.639715e−34


C8
−2.918284e−42
2.685481e−40
1.564423e−36
−7.980691e−38 
 3.135529e−38













SRF
39
43
46





K
0
0
0


C1
 5.939680e−09
−2.752287e−08
−2.413171e−08


C2
−2.375134e−13
 4.114456e−13
 3.695674e−12


C3
−6.806224e−17
 2.737675e−17
−1.621470e−16


C4
−8.082613e−23
−3.526372e−22
 6.681382e−21


C5
−1.967221e−26
−7.704679e−27
−4.618168e−26


C6
 1.266402e−29
−4.719101e−31
−1.117841e−29


C7
−8.622711e−34
 2.794633e−35
 6.554350e−34


C8
 1.902299e−38
−3.716332e−40
−1.099816e−38





















TABLE 4a





SURF
RADIUS
THICKNESS
MATERIAL
INDEX
SEMIDIAM.




















 0 = OB
∞
101.496840


62.000


 1
−523.184936
27.851984
SIO2
1.56032610
96.419


 2
−210.066935
0.999968


99.916


 3
143.399781
52.055602
SIO2
1.56032610
115.102


 4
345.776862
35.383042


110.966


 5
168.075295
52.902563
SIO2
1.56032610
95.593


 6
−581.011371
0.099991


85.017


 7
82.494445
46.014670
SIO2
1.56032610
65.623


 8
74.608756
18.376623


43.366


 9
∞
0.000000
SIO2
1.56032610
40.333


10
∞
9.898700


40.333


11
−93.661632
25.608969
SIO2
1.56032610
40.388


12
−97.944812
42.548618


50.610


13
−63.503040
54.172316
SIO2
1.56032610
58.454


14
−94.409957
1.264244


87.595


15
−328.877474
40.537580
SIO2
1.56032610
104.907


16
−131.896136
1.001643


106.846


17
204.370502
42.653441
SIO2
1.56032610
107.596


18
−2747.675446
1.723900


105.816


19
216.208053
27.952948
SIO2
1.56032610
97.813


20
2712.784924
99.872557


94.335


21 = FM1
∞
−160.545313
REFL

27.154


22
101.244286
−12.500000
SIO2
1.56032610
72.986


23
628.850173
−53.212241


88.277


24
102.805812
−12.500000
SIO2
1.56032610
91.193


25
200.305727
−25.464217


119.887


26
150.933505
25.464217
REFL

122.686


27
200.305727
12.500000
SIO2
1.56032610
119.499


28
102.805812
53.212241


90.105


29
628.850173
12.500000
SIO2
1.56032610
85.671


30
101.244286
160.545353


71.821


31 = FM2
∞
−109.999623
REFL

134.552


32
862.422907
−30.130833
SIO2
1.56032610
102.165


33
229.773890
−0.999915


105.942


34
−617.789022
−35.509195
SIO2
1.56032610
118.697


35
565.469461
−0.999931


120.255


36
−246.806971
−44.859593
SIO2
1.56032610
124.965


37
32400.831779
−0.099930


123.417


38
−158.610832
−71.070427
SIO2
1.56032610
112.458


39
−1341.469728
−8.796304


98.473


40
3541.685396
−11.999956
SIO2
1.56032610
96.987


41
−126.167849
−44.791303


78.038


42
469.858200
−11.999957
SIO2
1.56032610
78.204


43
−108.758112
−27.637030


84.487


44
−1480.509587
−15.438600
SIO2
1.56032610
86.624


45
2433.499100
−49.439954


90.710


46
−1932.185692
−25.660740
SIO2
1.56032610
119.141


47
428.080551
−0.999961


123.769


48
−408.475637
−36.662820
SIO2
1.56032610
147.587


49
−16389.465356
−7.335981


148.838


50
−342.428932
−60.116835
SIO2
1.56032610
158.305


51
658.847066
−0.091541


157.731


52
∞
0.000000
SIO2
1.56032610
156.315


53
∞
−2.670708


156.315


54
−702.444090
−32.792626
SIO2
1.56032610
155.963


55
1222.808780
−0.999915


155.470


56
−309.712976
−41.860232
SIO2
1.56032610
144.999


57
3694.385507
−0.999819


144.012


58
−135.513673
−31.965622
SIO2
1.56032610
109.063


59
−185.513505
−0.999775


103.967


60
−88.090936
−38.540831
SIO2
1.56032610
80.707


61
−187.712668
−0.999577


73.736


62
−58.692832
−9.999803
SIO2
1.56032610
51.770


63
−33.167937
−38.114503
(F)
1.65000000
33.117


64
∞
−3.000000
(F)
1.65000000
20.048


65 = IM
∞



15.841
















TABLE 4b





ASPHERIC CONSTANTS






















SRF
6
15
20
22
30
39
41





K
0
0
0
0
0
0
0


C1
1.190289e−07
−1.976769e−08
4.403358e−08
−6.572731e−08
−6.572731e−08
1.699431e−08
−2.143897e−07


C2
−2.160947e−12 
 1.109889e−12
8.071972e−17
−4.743844e−12
−4.743844e−12
−9.046901e−12 
 2.732198e−12


C3
6.852608e−16
−3.889116e−17
3.366541e−18
−9.012440e−18
−9.012440e−18
1.128480e−15
−1.371285e−15


C4
−3.837379e−20 
−1.882901e−21
5.100729e−22
−1.597994e−19
−1.597994e−19
−9.595855e−20 
−1.137997e−19


C5
1.217764e−25
 1.332477e−25
−4.259657e−26 
 2.141145e−23
 2.141145e−23
5.011204e−24
 2.693954e−23


C6
2.211313e−28
−2.258521e−30
2.686157e−30
−2.250289e−27
−2.250289e−27
−1.196219e−28 
−3.312568e−27

















SRF
43
46
51
59
61







K
0
0
0
0
0



C1
2.168103e−07
3.156834e−08
−7.013045e−09 
4.429013e−08
−9.119846e−08



C2
1.367067e−12
3.487654e−13
5.963914e−16
−4.664097e−12 
−9.933832e−12



C3
3.062347e−16
−1.560492e−17 
−1.630073e−17 
3.978191e−16
 4.577490e−16



C4
5.350290e−20
1.140928e−21
5.396066e−22
−1.307434e−20 
−2.618132e−19



C5
−4.811379e−24 
−4.815997e−26 
−7.602819e−27 
−5.651715e−25 
 5.019446e−23



C6
4.970104e−28
5.836063e−31
4.085943e−32
3.529575e−29
−5.414482e−27






















TABLE 5a





SURF
RADIUS
THICKNESS
MATERIAL
INDEX
SEMIDIAM.




















 0 = OB
∞
31.284792


52.000


 1
194.413567
32.720399
SIO2V
1.56078570
74.615


 2
−837.875926
6.370734


74.349


 3
95.475130
26.728836
SIO2V
1.56078570
70.388


 4
148.726918
30.489652


65.856


 5
1084.901978
14.117445
SIO2V
1.56078570
60.419


 6
−329.264238
0.743287


58.910


 7
372.368293
15.458004
SIO2V
1.56078570
54.832


 8
−148.979042
27.240305


52.113


 9
∞
32.301644


43.951


10
−57.723183
31.449460
SIO2V
1.56078570
47.695


11
−71.150453
0.929754


62.740


12
383.639393
22.046149
SIO2V
1.56078570
83.185


13
−904.695268
0.905975


84.675


14
179.698033
38.448563
SIO2V
1.56078570
90.818


15
−389.247961
29.862111


90.050


16
∞
258.234067


85.109


17
−151.387947
−258.234067
REFL

103.744


18
258.267631
258.234067
REFL

180.342


19
∞
29.981280


116.992


20
251.052546
31.241091
SIO2V
1.56078570
101.576


21
−6016.827917
77.406555


98.554


22
−125.618112
8.960662
SIO2V
1.56078570
70.289


23
129.125754
28.406854


68.882


24
−681.780853
8.898731
SIO2V
1.56078570
70.634


25
205.568565
41.577461


78.503


26
−183.215344
15.843375
SIO2V
1.56078570
82.563


27
−747.008350
6.201177


102.654


28
1186.195936
72.658205
SIO2V
1.56078570
120.160


29
−156.971444
0.905847


126.492


30
648.451941
66.013805
SIO2V
1.56078570
163.810


31
−396.824326
25.988117


165.175


32
289.870283
40.412480
SIO2V
1.56078570
163.677


33
480.887470
0.928925


161.538


34
178.362272
40.967739
SIO2V
1.56078570
144.125


35
253.519298
0.947294


138.643


36
154.855021
52.211656
SIO2V
1.56078570
125.560


37
522.613285
0.825571


119.129


38
100.582695
44.936735
SIO2V
1.56078570
88.620


39
272.608820
0.825571


79.210


40
58.829925
8.861393
SIO2V
1.56078570
52.876


41
37.856352
45.769132
(F)
1.80000000
37.564


42 = IM
∞



13.001
















TABLE 5b





ASPHERIC CONSTANTS





















SRF
1
5
8
15
17
18





K
0
0
0
0
0
−0.267731


C1
2.035368e−07
1.161173e−07
6.549025e−07
1.058964e−07
1.486128e−08
−7.023674e−10


C2
2.122045e−13
−9.174854e−11 
1.133907e−11
−1.960464e−12 
6.224903e−13
−9.477643e−15


C3
−1.232124e−15 
9.078126e−15
2.931708e−14
−1.719346e−16 
1.675590e−17
−7.423466e−20


C4
6.485869e−20
−1.260952e−18 
−8.285156e−18 
2.217335e−20
1.269177e−21
−4.429195e−24


C5
9.917577e−24
2.019305e−22
3.500031e−21
−1.159319e−24 
−5.260128e−26 
 4.705745e−29


C6
−9.582163e−28 
−7.811919e−27 
3.522430e−26
2.527662e−29
4.654328e−30
−1.008977e−33
















SRF
22
25
28
33
37
39





K
0
0
0
0
0
0


C1
4.605486e−07
2.881794e−07
−3.576109e−08
−1.085274e−08
2.842058e−08
1.106769e−07


C2
−7.227058e−11 
−4.494181e−11 
 8.140963e−13
 1.115172e−13
−9.189727e−15 
2.940296e−12


C3
1.056869e−14
−2.448411e−15 
−3.935804e−17
−9.843842e−18
7.067187e−17
−8.536341e−17 


C4
−1.243813e−18 
9.621332e−19
−7.624420e−22
−1.420093e−22
−5.862923e−21 
4.590349e−20


C5
1.098424e−22
−9.474976e−23 
 1.473104e−25
 1.350399e−26
2.902121e−25
−8.754730e−24 


C6
−3.554283e−27 
3.735014e−27
−5.284140e−30
−1.682167e−31
−4.976330e−30 
5.665333e−28





















TABLE 6a





SURF
RADIUS
THICKNESS
MATERIAL
INDEX
SEMIDIAM.




















 0 = OB
∞
31.284792


52.000


 1
∞
0.000000


65.651


 2
193.599182
32.235664
SIO2V
1.56078570
74.583


 3
−988.153919
6.121005


74.317


 4
95.312730
28.437060
SIO2V
1.56078570
70.720


 5
149.958061
29.337945


65.762


 6
990.600274
14.692793
SIO2V
1.56078570
60.664


 7
−304.549723
0.925424


59.160


 8
405.862783
15.231330
SIO2V
1.56078570
54.862


 9
−150.695673
27.371286


52.107


10
∞
32.082969


43.913


11
−57.761263
34.954745
SIO2V
1.56078570
47.628


12
−73.049428
0.946034


64.468


13
371.078196
22.631363
SIO2V
1.56078570
85.710


14
−1054.171246
2.527973


87.142


15
176.905790
40.262309
SIO2V
1.56078570
93.860


16
−409.710820
29.670881


92.937


17
∞
262.083723


87.656


18
−152.961072
−262.083723
REFL

102.730


19
259.893027
262.083723
REFL

180.288


20
∞
40.275992


112.284


21
277.112135
28.048210
SIO2V
1.56078570
94.722


22
−1786.674721
65.923060


91.958


23
−115.766876
9.003310
SIO2V
1.56078570
70.538


24
143.904953
28.199458


69.827


25
−500.404643
8.993973
SIO2V
1.56078570
71.476


26
231.435891
40.923491


79.540


27
−194.421161
14.041869
SIO2V
1.56078570
83.835


28
−929.354406
6.572149


102.684


29
1551.636561
74.150055
SIO2V
1.56078570
118.556


30
−151.390217
0.924156


124.858


31
430.573439
62.728287
SIO2V
1.56078570
165.041


32
−668.844997
23.423849


165.694


33
303.567518
38.823785
SIO2V
1.56078570
163.062


34
524.212908
0.932060


160.960


35
176.353964
40.731123
SIO2V
1.56078570
143.422


36
247.491117
0.936510


137.926


37
153.122143
51.077607
SIO2V
1.56078570
124.946


38
412.041144
0.825571


118.371


39
101.547710
45.611823
SIO2V
1.56078570
89.393


40
315.478434
0.825571


80.057


41
58.429322
8.969645
SIO2V
1.56078570
53.083


42
38.144755
40.197998
(F)
1.80000000
37.922


43
∞
3.000000
SAPHIR
1.92650829
25.925


44
∞
4.345594
(IMMERS.)
1.80000000
21.446


45 = IM
∞



13.000
















TABLE 6b





ASPHERIC CONSTANTS





















SRF
2
6
9
16
18
19





K
0
0
0
0
0
−0.273225


C1
1.958847e−07
1.048404e−07
6.380918e−07
1.042335e−07
1.494444e−08
−4.825071e−10


C2
8.684629e−13
−9.344654e−11 
1.135337e−11
−1.647926e−12 
6.329335e−13
−6.621967e−15


C3
−1.177298e−15 
9.684195e−15
2.969291e−14
−1.770077e−16 
1.568829e−17
−6.600515e−20


C4
5.172091e−20
−1.242151e−18 
−8.230472e−18 
1.938739e−20
1.153993e−21
−4.043335e−24


C5
1.115087e−23
1.848517e−22
3.507973e−21
−8.862178e−25 
−3.871456e−26 
 4.835743e−29


C6
−9.813899e−28 
−8.222149e−27 
3.205808e−26
1.726247e−29
3.672792e−30
−1.092461e−33
















SRF
23
26
29
34
38
40





K
0
0
0
0
0
0


C1
5.116169e−07
3.252068e−07
−2.515552e−08
−1.130904e−08
2.336279e−08
1.464967e−07


C2
−7.631783e−11 
−4.649504e−11 
 1.947845e−13
 2.463683e−13
−1.224680e−12 
1.974044e−12


C3
1.115383e−14
−2.574578e−15 
−1.814191e−17
−1.101814e−17
1.869425e−16
−4.637058e−16 


C4
−1.308686e−18 
1.022883e−18
−1.328934e−21
−2.972090e−22
−1.001651e−20 
1.216769e−19


C5
1.177910e−22
−9.907368e−23 
 1.639600e−25
 1.942591e−26
3.399061e−25
−1.544405e−23 


C6
−3.908759e−27 
3.745941e−27
−5.808419e−30
−2.321607e−31
−4.264065e−30 
7.169909e−28

## Claims

1. A system, comprising:
a plurality of optical elements arranged along an axis between a first plane and a second plane, the plurality of rigid optical elements comprising a first rigid lens having a concave surface, the first rigid lens being formed from a material having a refractive index nL at a wavelength λ, the system being configured to support a liquid adjacent the concave surface of the first rigid lens between the first rigid lens and the second plane,
wherein the system is a microlithography projection objective having a maximum image-side numerical aperture, NA, greater than 1 which during operation is configured to direct radiation at λ from the first plane to the second plane and image an object positioned at the first plane to the second plane when a liquid having a refractive index nF at λ is positioned adjacent the concave surface of the first rigid lens, where nF is greater than nL.

2. The system of claim 1, wherein the concave surface of the first rigid lens is a spherical surface.

3. The system of claim 2, wherein the spherical surface is positioned a distance that is 80% to 110% of the radius of the spherical surface from the second plane or from another rigid optical element positioned between the first rigid lens and the second plane.

4. The system of claim 3, wherein the spherical surface is essentially hemispherical.

5. The system of claim 1, wherein during operation the liquid positioned adjacent the concave surface forms a liquid lens.

6. The system of claim 5, wherein the liquid lens is a plano-convex liquid lens.

7. The system of claim 5, wherein the liquid lens is the curved optical element closest to the second plane.

8. The system of claim 1, wherein the first lens is the closest rigid optical element to the second plane.

9. The system of claim 1, further comprising a rigid optical element having a planar surface positioned along the axis between the first lens and the second plane.

10. The system of claim 9, wherein the rigid optical element having the planar surface is a plane-parallel plate.

11. The system of claim 9, wherein the microlithography projection objective is configured so that during operation a liquid is positioned between the rigid optical element having the planar surface and the second plane.

12. The system of claim 9, wherein the rigid optical element having a planar surface is formed from sapphire.

13. The system of claim 9, wherein the rigid optical element having the planar surface has a refractive index nEP at λ, where nF<nEP.

14. The system of claim 9, wherein during operation the liquid positioned adjacent the concave surface of the first lens fills a space along the axis between the first lens and the planar surface.

15. The system of claim 1, wherein nF>1.4.

16. The system of claim 1, wherein the first lens is a meniscus lens.

17. The system of claim 1, wherein the rigid optical element closest to the second plane is formed from a material selected from the group consisting of fused silica, CaF2, BaF2, SrF2, LiF, and NaF.

18. The system of claim 17, wherein the first rigid lens is the rigid optical element closest to the second plane.

19. The system of claim 1, wherein the microlithography projection objective is a catadioptric projection objective.

20. The system of claim 1, wherein the microlithography projection objective forms at least one intermediate image of the object between the first plane and the second plane during operation of the system.

21. The system of claim 20, wherein the microlithography projection objective forms exactly two intermediate images of the object between the first plane and the second plane during operation of the system.

22. The system of claim 1, wherein the axis is a straight optical axis.

23. The system of claim 1, wherein the axis is a folded optical axis.

24. The system of claim 1, wherein NA is 1.4 or greater.

25. The system of claim 1, wherein nL<NA<nF.

26. The system of claim 1, wherein all rigid optical elements other than the first rigid optical element in the plurality of rigid optical elements have a refractive index equal to or less than nL.