# Patent

## Title
Termination trench for power MOSFET applications

## Abstract

Aspects of the present disclosure describe a termination structure for a power MOSFET device. A termination trench may be formed into a semiconductor material and may encircle an active area of the MOSFET. The termination trench may comprise a first and second portion of conductive material. The first and second portions of conductive material are electrically isolated from each other. It is emphasized that this abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

## Background
FIELD OF THE INVENTION
This invention generally relates to power MOSFETS. Specifically, the invention is directed to a trench based termination structure for power MOSFET devices.
BACKGROUND OF THE INVENTION
Careful design of the active cells in a power MOSFET device may provide for an increased breakdown voltage. However, the design of the active cells typically do not provide protection for localize portions of the device. Specifically, a device may be susceptible to failure because of the steep voltage gradient near the edges of the device. At the edge of the device the electric field needs to be reduced from the source potential to the drain potential in a smooth manner.
Prior art efforts to smoothly reduce the voltage gradient typically take up a relatively large amount of space near the edge of the device die. Attempts to use trench based termination structures to smoothly reduce the voltage to the drain potential requires multiple trenches to be formed near the edges of the die. The extra space needed for the termination region is space that active devices are not capable of being used for. The use of termination trenches also can render the outermost trench in the active area inactive. As such, even more space may be lost to the termination region. In addition to the extra space needed for multiple trenches, the trenches may also require additional processing steps. This could result in an increase of the cost of the devices. Therefore, there is a need in the art for a compact termination region that is capable of enabling the outermost trench to be a functioning trench as well.
It is within this context that embodiments of the present invention arise.



BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1A is an overhead view of the layout of a die that may be used with the termination according to aspects of the present disclosure.
FIG. 1B is a cross-sectional view of the termination structure shown in FIG. 1A that illustrates the voltage potential.
FIG. 1C is cross-sectional views of the termination structure shown in FIG. 1A that illustrates the electrical field plots in each region.
FIGS. 2A-2E are cross-sectional views of active device structures and the termination structure of the device die along line A-A shown in FIG. 1A and a gate pickup structure along the line B-B in FIG. 1A according to various aspects of the present disclosure.
FIGS. 3A-3N depict a method for forming a termination trench shown in FIG. 2A according to an aspect of the present disclosure.
FIGS. 4A-4C depict additional steps that may be used in a method for forming a termination trench shown in FIG. 2B according to an aspect of the present disclosure.
FIG. 5 depicts an alternative step that may be used in a method for forming a termination trench shown in FIG. 2C according to an aspect of the present disclosure.



DESCRIPTION OF THE SPECIFIC EMBODIMENTS
Although the following detailed description contains many specific details for the purposes of illustration, anyone of ordinary skill in the art will appreciate that many variations and alterations to the following details are within the scope of the invention. Accordingly, the exemplary embodiments of the invention described below are set forth without any loss of generality to, and without imposing limitations upon, the claimed invention.
In the following Detailed Description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology, such as “top,” “bottom,” “front,” “back,” “leading,” “trailing,” etc., is used with reference to the orientation of the figure(s) being described. Because components of embodiments of the present invention can be positioned in a number of different orientations, the directional terminology is used for purposes of illustration and is in no way limiting. It is to be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. The following detailed description, therefore, is not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.
Additionally, concentrations, amounts, and other numerical data may be presented herein in a range format. It is to be understood that such range format is used merely for convenience and brevity and should be interpreted flexibly to include not only the numerical values explicitly recited as the limits of the range, but also to include all the individual numerical values or sub-ranges encompassed within that range as if each numerical value and sub-range is explicitly recited. For example, a thickness range of about 1 nm to about 200 nm should be interpreted to include not only the explicitly recited limits of about 1 nm and about 200 nm, but also to include individual sizes such as but not limited to 2 nm, 3 nm, 4 nm, and sub-ranges such as 10 nm to 50 nm, 20 nm to 100 nm, etc. that are within the recited limits.
In the following discussion, devices with an N-type epitaxial layer and a P-type top layer are described for purposes of illustration. Substantially similar devices may be fabricated using a similar process but with opposite conductivity types.
Aspects of the present disclosure describe termination structures for power MOSFET devices and methods for manufacturing the same. According to a first aspect of the present disclosure, a termination trench may be formed around an active area where the active devices are formed. The termination trench may comprise first and second conductive portions. The conductive portions may be separated from each other by an insulative material. According to aspects of the present disclosure, both conductive portions may be electrically floating. According to additional aspects of the present disclosure, the first conductive portion may be maintained at gate potential, and the second conductive portion may be maintained at drain potential. The termination trench may also optionally include a field lined tuning region.
Additional aspects of the present disclosure further comprise a termination shield electrode. The termination shield electrode may be formed between the first and second portions of the conductive material in the trench and may be connected to the source potential. The termination shield electrode is electrically isolated from the first and second portion of the conductive trench material by an insulative material.
According to yet another additional aspect of the present disclosure, a Schottky contact may be formed below the termination trench. A vertical connection may be formed that extends completely through the insulative material separating the first and second conductive portions of the termination trench. The vertical connection may then be in electrical contact with the drift region below the termination trench and the source metal.
FIG. 1A is an overhead view of a device structure 100 that is formed on a semiconductor die 201. The device structure 100 includes an active area 202 surrounded by a termination trench. In the active area 202 the device trenches are shown. The device trenches are lined with a dielectric material (not shown) and filled with a conductive material to form gate electrodes 214. A gate pickup electrode 214′ electrically connects to the gate electrodes 214 to the gate metal (not shown) with a gate contact 228. The gate electrodes 214 and gate pickups 214′ may be made from the same material, e.g., polysilicon, which may be formed in corresponding trenches in a common step. The gate contact 228 may be formed with a conductive material such as tungsten. Gate contact 128 may extend perpendicular to the plane of the drawing to make electrical contact with the gate metal. The gate metal may be initially formed as part of the same metal layer as the source metal. The gate metal may be electrically isolated from the source metal, e.g., by masking, etching and dielectric fill processes, as are commonly done for this purpose.
The termination trench may include a first conductive material 215A and a second conductive material 215B. The two portions may be electrically separated with an insulative material 217. By way of example, and not by way of limitation, the two conductive portions 215A and 215B may be formed from a polysilicon material. By way of example, the insulative material 217 may be an oxide. As shown, in FIG. 1A, the first conductive material 215A may be electrically connected to the gate metal and the second conductive material 215B may be electrically connected to the drain metal via a vertical drain contact 204. When the first conductive portion 215A is connected to the gate electrode the outermost device in the active area 202 may be a fully functioning device. As such, the termination trench should be spaced apart from the outermost active device a distance equal to the spacing between each of the active devices. However, it should be noted that the first and second conductive materials 215A and 215B may be electrically floating.
FIG. 2A is a cross-sectional view of the device structure 100 along the lines A-A and B-B of FIG. 1A according to a first aspect of the present disclosure. The two cross-sections are located in different planes of device structure 100, but for simplicity, the two will be displayed side by side throughout the remainder of the application. The cross-section seen along line A-A will be shown on the left side of the page, and depicts the active device structures, and the termination trench structure. The cross-section B-B will be shown on the right side of the page and depicts the gate pickup structure.
Device structure 100 may be formed on a semiconductor substrate 201. Furthermore, a plurality of such devices 100 may be formed on the same substrate, as is common in semiconductor manufacturing. The substrate 201 may be suitably doped to be an N-type or a P-type substrate. By way of example, and not by way of limitation, the semiconductor substrate 201 may be an N-type silicon substrate. The semiconductor substrate may have a heavily doped N+ drain region 205. By way of example, the drain region 205 may have a doping concentration of approximately 1019 cm−3 or greater. The drain region 205 may be electrically connected to a drain electrode (not shown) formed on a bottom surface of the semiconductor substrate. Above the drain region 205 may be a lightly doped N drift region 206. By way of example, the drift region 206 may have a doping concentration that is approximately between about 1015 cm−3 and about 1017 cm−3. Above the drift region 206, a suitably doped body layer 219 of a second conductivity type that is opposite to the first conductivity type of the semiconductor substrate may be formed. A source region 220 of the first conductivity type may be formed in a top portion of the body layer 219. By way of example, and as used throughout the remainder of the disclosure, the semiconductor substrate 201 may be an N-type semiconductor, the body region 219 may be a P-type, and the source region 220 may be N-type.
According to aspects of the present disclosure, the active area 202 of the device structure 100 may comprise a plurality of trench based power MOSFETs. The trench based power MOSFETs are formed by creating a trench that extends through the P-body region 219 and into the drift region 206. Each trench may have an upper portion 271 and a bottom portion 272. A dielectric material 211 may line the walls of the trench. The dielectric material 211 may have a thickness T2 in the bottom portion of the trench 272 and the dielectric material 211 may have a thickness T1 in the upper portion of the trench 271. According to aspects of the present disclosure, the thickness T1 is smaller than the thickness T2. By way of example, the dielectric material 211 may be an oxide. The remainder of the trench may be filled with a suitable material to form a gate electrode 214. By way of example, the gate electrode 214 may be formed with polysilicon. The gate electrode 214 is electrically isolated from a source metal 229 by an insulative gate cap 218 which is disposed above the trench 210. An insulative layer 222 may also be formed above the source region 220. A first insulative spacer 221 may be disposed along each vertical edge of the insulative gate cap 218. By way of example, and not by way of limitation, the first insulative spacer 221 may be the same material as the insulative cap 218. By way of example and not by way of limitation, the insulative gate cap 218, the insulative layer 222, and the first insulative spacer 221 may be an oxide.
The source regions 220 are electrically connected to the source metal 231. By way of example and not by way of limitation, the connection may be made through the use of a vertical connection 229 which extends through the insulating layer 222. By way of example and not by way of limitation, the vertical connections 229 may be made from a conductive material such as tungsten. Some additional aspects of the present disclosure may also include a barrier metal (not shown) that lines the vertical connections 229. The barrier metal may be useful to prevent unwanted diffusion. By way of example, and not by way of limitation, the barrier metal may be titanium or titanium nitride.
Additionally, a second insulative spacer 227 may separate the vertical connection 229 from the first insulative spacer 221. By way of example, and not by way of limitation, the first insulative spacer 221 may be made of a material that will resist an etchant that selectively removes the material that the second insulative spacer 227 is made from. By way of example, the first insulative spacer 221 may be an oxide, and the second insulative spacer 227 may be a nitride. The oxide is resistant to a hot phosphoric acid, while the nitride would be selectively etched away by the hot phosphoric acid. Additionally, the first and second insulative spacers 221, 227 may be made from the same insulative material, such as a nitride. The first and second insulative spacers 221, 227 allow for the vertical connections 229 to be self-aligned. The use of the existing self aligned structures on device 100 instead of employing a contact mask in order to form the vertical connections 229 for the source contacts minimizes possible error due to misalignment.
In cross-section A-A a termination trench structure is also depicted according to an aspect of the present disclosure. The width of the termination trench is wider than the width of the active device structures. The width of the termination trench should be chosen such that when the device trenches are filled with the trench filling material 214, the trench filling material will only line the sidewalls and bottom of the termination trench. By way of example, and not by way of limitation, the termination trench may be at least twice as wide as the device trenches, e.g., if the device trenches are approximately 0.5 microns wide, then the termination trench may be approximately 1.0 microns wide or greater. Each termination trench may have an upper portion 273 and a bottom portion 274. A dielectric material 211 may line the walls of the termination trench. The dielectric material 211 may have a thickness T4 in the bottom portion of the trench 274 and the dielectric material 211 may have a thickness T3 in the upper portion of the trench 273. According to aspects of the present disclosure, the thickness T3 is smaller than the thickness T4. According to additional aspects of the present disclosure, the thickness T3 may be approximately equal to the thickness T1, and the thickness T4 may be approximately equal to the thickness T2. The trench filling material that lines the side wall of the termination trench closer to the active region 102 may be referred to as the first portion of the conductive material 215A and the trench filling material that lines the wall of the termination trench that is further from the active region 102 may be referred to as the second portion of the conductive material 215B.
The first and second portions of the conductive material 215A, 215B are electrically isolated from each other by a termination trench insulator 217. By way of example, the termination trench insulator 217 may be an oxide. A first insulative spacer 221 may be disposed along each vertical edge of the trench insulator 217 above the insulative layer 222. By way of example, and not by way of limitation, the first insulative spacer 221 may be the same material as the trench insulator 217. Additionally, a second insulative layer 223 may be formed above the termination trench insulator 217 and along the exposed sidewalls of the first insulative spacer. By way of example, and not by way of limitation, the first insulative spacer 221 may be made of a material that will resist an etchant that selectively removes the material that the second insulative layer 223 is made from. By way of example, the first insulative spacer 221 may be an oxide, and the second insulative layer 223 may be a nitride. The oxide is resistant to a hot phosphoric acid, while the nitride would be selectively etched away by the hot phosphoric acid. Additionally, the first insulative spacer 221 and the second insulative layer 223 may be made from the same insulative material, such as a nitride. The combination of the first insulative spacer 221 and the second insulative layer 223 that is formed along the exposed sidewall of the first insulative spacer 221 that is closest to the active device region 202 allows for a vertical connections 229 to be self-aligned between the outermost active device and the termination trench. An outer insulator 224 may be formed above the second insulative layer 223. By way of example, and not by way of limitation, the outer insulator 224 may be BPSG.
According to aspects of the present disclosure, the first portion of the conductive material 215A may be electrically connected to the gate potential, and the second portion of the conductive material 215B may be electrically connected to the drain potential. As shown in FIG. 1A, the first portion of the conductive material 215A is connected to the gate pickup trench, and the second portion of the conductive material 215B is connected to the drain contact. According to additional aspects of the present disclosure, the first and second portions of conductive material 215A, 215B may be electrically floating, i.e., they are not maintained at a source, gate, or drain potential. Alternatively, the first portion of conductive material 215A may be maintained at gate potential, and the second portion of conductive material 215B may be electrically floating. It may be desirable to maintain the first portion of conductive material 215A at gate potential, because then the outermost active device in the active region 102 may still be a fully functioning device.
According to yet another additional aspect of the present disclosure, an electrical field line tuning region 216 may be optionally formed beneath the termination trench. The electrical field line tuning region 216 may be formed by doping the semiconductor substrate 201 below the termination trench 213 with a P-type dopant, such as boron. The implantation dose may be adjusted to further control the distribution of the electrical field lines present at the termination trench. For example, boron can be implanted with a dose in a range of 2e11 to 5e12 atoms/cm2 at an energy of about 30 to 80 KeV.
The gate pickup structure shown in portion B-B of FIG. 2A is formed by creating a gate pickup trench that is substantially similar to the active device trenches. Additionally, a second insulative layer 223 may be formed over the top surface of the insulative cap 218 and along the top surface of the first insulative spacer 221 and along the exposed side surfaces of the first spacer 221. An outer insulator 224 may be formed above the second insulative layer 223. By way of example, and not by way of limitation, the outer insulator 224 may be BPSG. The conductive trench filling material in the pickup trench may be called the gate pickup electrode 214′. The gate pickup electrode 214′ may be electrically connected to a gate metal 230. By way of example and not by way of limitation, the connection may be made through the use of a vertical gate contact 228 which extends through the outer insulator 224, the second insulative layer 223, and the insulative cap 218. By way of example and not by way of limitation, the vertical connection 228 may be made from a conductive material such as tungsten. According to some aspects of the present disclosure, the vertical connection 228 may be lined with a barrier metal (not shown) such as titanium, or a titanium nitride.
FIG. 2B depicts a device 100′ according to an additional aspect of the present disclosure. The active device structures and the gate pickup structure is substantially similar to the device depicted in FIG. 2A. Device 100′ includes a conductive termination shield electrode 232 in the termination trench structure. The shield electrode 232 is formed between the first portion of conductive material 215A and the second portion of conductive material 215B. The shielding portion may be the same material as the first and second portions of the conductive material 215A, 215B. By way of example the shielding portion 232 may be polysilicon. The shielding portion is electrically isolated from the first and second portions of the conductive material 215A, 215B by the termination trench insulator 217. Additionally, the shielding portion 232 may be electrically connected to the source metal 231. By way of example and not by way of limitation, the connection may be made through the use of a vertical gate contact 233 which extends through the outer insulator 224 and the second insulative layer 223. By way of example and not by way of limitation, the vertical connection 233 may be made from a conductive material such as tungsten. According to some aspects of the present disclosure, the vertical connection 233 may be lined with a barrier metal (not shown) such as titanium, or a titanium nitride. The shielding portion improves the breakdown voltage of the device 100′.
FIG. 2C depicts a device 100′′ according to another additional aspect of the present disclosure. The active device structures and the gate pickup structure are substantially similar to the device depicted in FIG. 2A. Device 100′′ includes a Schottky contact 234 in the termination trench structure. In addition to the first and second portions of conductive material 215A, 215B, a vertical connection 235 may be electrically connected to the source metal 231 and extend through the outer insulator 224, the second insulative layer 223, the trench insulator 217, and the dielectric material 211, thereby connecting the source metal 231 to the drift region 206 and/or the field tuning region 216 below the termination trench structure.
According to additional aspects of the present disclosure, devices 100, 100′, and/or 100′′ may incorporate an electrostatic discharge (ESD) device and/or a Schottky contact. The incorporation and fabrication of these additional features into devices with similar active cells is described in detail in commonly owned U.S. patent application Ser. No. 13/724,228, filed Dec. 21, 2012, titled “HIGH DENSITY TRENCH-BASED POWER MOSFETS WITH SELF-ALIGNED ACTIVE CONTACTS AND METHOD FOR MAKING SUCH DEVICES”, to Lee et al., and which is incorporated herein in its entirety.
In FIG. 2D a device 100 further includes an ESD structure. The ESD protection feature may be formed above the insulative layer 207. A nitride layer 208 may be disposed on the top surface of the insulative layer 207. Above the nitride layer 208, an ESD electrode 239 may be formed. By way of example and not by way of limitation the ESD electrode 239 may be formed with polysilicon. The ESD electrode 239 is substantially shielded along all surfaces except the bottom surface by an ESD insulation cap 238. By way of example, the ESD insulation cap 238 may be an oxide. First insulative spacers 221 may also be formed along the sides of the ESD insulation cap 238 and along the sides of the nitride layer 208. A second insulative layer 223 may be formed around the first insulation spacer 221 and over the top surface of the ESD insulation cap 238. An outer insulator 224 may be formed around the second insulative layer 223. By way of example, and not by way of limitation, the outer insulator 224 may be borophosphosilicate glass (BPSG). The ESD electrode 239 is electrically connected to an ESD metal 236. By way of example and not by way of limitation, the connection may be made through the use of a vertical connection 237 which extends through the outer insulator 224, the second insulative layer 223, and the ESD insulation cap 238. By way of example and not by way of limitation, the vertical connection 237 may be made from a conductive material such as tungsten. According to some aspects of the present disclosure, the vertical connection 237 may be lined with a barrier metal (not shown) such as titanium, or a titanium nitride.
In FIG. 2E the device 100 further includes a Schottky contact 240 where the source metal 231 contacts the substrate. The external Schottky contact 240 may be formed outside of the termination trench structure. Additionally, the external Schottky contact may comprises one or more body clamp (BCL) regions 241 configured to prevent the active devices from operating above their breakdown voltages. As such the depth of the BCL regions 241 need to be designed such that the Schottky breakdown voltage for such regions is higher than the active device breakdown voltage. In an N-type semiconductor substrate, P-type dopants are implanted into the substrate 101 to form the BCL regions 241. By way of example, and not by way of limitation, the dopants may be introduced with one or more implantation processes with the use of an ion implantation system. The dopants may be implanted with voltages ranging between 10 keV and 500 keV. Some aspects of the present disclosure include metal contacts 242, which may be remnants from a prior processing step that formed the vertical connections 228 and/or 229. By way of example, and not by way of limitation, the metal contacts 242 may be tungsten. According to some aspects of the present disclosure, a barrier metal (not shown) such as titanium, or a titanium nitride may be deposited between the source metal 231 and the semiconductor substrate 201 at the Schottky contact 240.
The benefits of using a termination trench similar to those described in the present application are shown in FIG. 1B, which depicts the voltage potential contours (the darker regions are closer to the drain potential). As may be seen, the termination trench allows for the voltage potential to be spread near the edge of the device. Additionally, FIG. 1C depicts the reduction of the absolute electrical field (V/cm) near the termination trench.
FIGS. 3A-3N depict a method for forming a device 100 according to an aspect of the present disclosure.
FIG. 3A depicts a semiconductor device structure 100. The device structure may be formed on a substrate that may be suitably doped to be an N-type or a P-type substrate. By way of example, and not by way of limitation, the semiconductor substrate may be an N-type silicon substrate. As used herein, the substrate of device structure 100 will be described as an N-type silicon substrate. The semiconductor substrate may comprise a lightly doped drift region 306 formed in an upper portion of the substrate and a heavily doped drain contact region 305 formed on a bottom portion of the semiconductor substrate. An oxide-nitride-oxide (ONO) hard mask layer may be formed on a top of the lightly doped drift region 306. By way of example and not by way of limitation, the bottom oxide layer 307 may be approximately 200 Å, the nitride layer 308 may be 3500 Å, and the top upper oxide layer 309 may be 1400 Å.
FIG. 3B depicts the device structure 100 after several initial processing steps. First, a trench mask and etching process may be used to form an upper portion of the trenches 310 and 313. A trench etching process may comprise an etchant to remove the ONO hard mask layer 307, 308, 309, in order to expose the top surface of the substrate and a second etching process to form the upper portion of trenches 310 and 313. By way of example, and not by way of limitation, the upper portion of trenches 310 and 313 may be approximately 0.5 μm deep. Trenches 310 are formed in the active region of the device structure 100 in order to form the active device, and outside the active region in order to form a gate pickup. Termination trench 313 may be formed outside of the active region in order to form the termination trench. The termination trench 313 may be wider than the trenches 310. The width of the termination trench 313 should be chosen such that the trenches 310 will completely fill with a conductive material during a subsequent trench filling process, whereas the same trench filling process will only cause the termination trench 313 to be lined with the conductive material. By way of example, and not by way of limitation, the termination trench 313 may be twice as large as the trenches 310. Once the trenches have been formed, a pad oxide 311a may be thermally grown in each trench 310, 313 that is approximately 100 Å thick. After the pad oxide 311a has been grown, a nitride layer 312 may be deposited over the pad oxide 311a. By way of example, and not by way of limitation, the nitride layer 312 may be approximately 500 Å thick.
FIG. 3C depicts the formation of the bottom portion of the trenches. First, the nitride layer 312 and the oxide layer 311a on the bottom surface of the trench may be removed with one or more etching processes. Thereafter, the drift region 306 below the upper portion of the trenches may be etched to increase the depth of the trenches 310, 313. By way of example, and not by way of limitation, the combined depth of the upper and bottom portions of the trenches 310, 313 may be approximately 1.0 μm. Thereafter, a liner oxide 311b is thermally grown in the exposed silicon at the bottom portion of the trenches. By way of example, the liner oxide 311b in the bottom portion of the trenches 310 may be grown to a thickness T2 that is approximately 600 Å. By way of example, and not by way of limitation, the liner oxide 311b in the bottom of the trenches 313 may be grown to a thickness T4 that is approximately 600 Å. The thicknesses T2 and T4 may be similar or the same. The nitride layer 312 along the walls of the upper portion of the trench functions as a mask, and reduces the width of the bottom portion of the trench.
In FIG. 3D the nitride 312 and the pad oxide 311a at the side wall of the upper portion of the trench are then removed by a wet dip. Then a gate oxide 311c is grown on the exposed silicon at the side wall of the upper portion of the trenches 310 to a desired thickness T1, and a trench oxide 311c may be grown along the sidewalls of the upper portion of the termination trench 313 to a desired thickness T3. The thicknesses T1 and T3 may be similar or the same. By way of example, and not by way of limitation, the thicknesses T1 and T3 of the oxide 311c may be approximately 265 Å for a 12V device. Therefore, the oxides 311 may have a thickness T2 or T4 in the bottom portion of the trench that is larger than the thickness T1 or T4 of the upper portion of the trench. While the above description describes a thickness of the oxide 311 as being variable with respect to depth in the trench, it is within the scope of the present disclosure to have a uniform gate oxide thickness 311.
Next, in FIG. 3D the trenches 310 are filled with a conductive material in order to form the gate electrode 314, and the gate pickup electrode 314′. By way of example, and not by way of limitation, conductive material may be an N+-doped polysilicon, and the polysilicon may be deposited through chemical vapor deposition (CVD). During the trench filling process the termination trench 313 is also partially filled with conductive material. Since the termination trench 313 is wider than the trenches 310, the conductive material 315 in the termination trench 313 will only line bottom portion and the side walls.
In FIG. 3E excess polysilicon may be removed and the electrodes 314, 314′, and 315 may be planarized with the surface of the hard mask using chemical mechanical polishing (CMP). Next, as shown in FIG. 3E, the electrodes 314, 314′, and 315 may be etched back to the surface of the semiconductor substrate. By way of example and not by way of limitation, the etching may be performed with a dry etching process. During this process, the conductive material 315 lining the bottom portion of the termination trench 313 may also be removed, thereby forming two separate portions of conductive termination trench material 315A and 315B. Additionally, a field line tuning region 316 may be formed below the termination trench 313 after the conductive material 315 at the bottom of the termination trench 313 has been removed. The field line tuning region 316 may be formed by implanting dopants of the conductivity type opposite that of the drift region 306. By way of example, and not by way of limitation, boron can be implanted with a dose in a range of 2e11 to 5e12 atoms/cm2 at an energy of about 30 to 80 KeV.
In FIG. 3F an insulative cap 318 is formed over each of the electrodes 314, 314′ by using the ONO hardmask as a self-aligning mask. The use of a self-aligned mask for the insulative caps 318 reduces the possibility of misalignment when the pitch of active devices is scaled to the deep sub-micron level. By way of example, and not by way of limitation, the insulative cap may be an oxide. During the formation of the insulative caps 318, the termination trench 313 is also filled with the insulative material 317. The insulative material 317 electrically separates the first and second portions of the conductive termination trench material 315A and 315B. Once the insulative caps 318 and the termination trench insulative material 317 have been formed, the top oxide layer 309 of the ONO hardmask may be removed by CMP. The insulative caps 318 and the termination trench insulative material 317 may also be planarized with the nitride layer 308 with CMP.
In FIG. 3G the nitride layer 308 of the ONO hardmask may be removed. By way of example, the hardmask may be selectively removed with a hot-phosphoric acid wet dip. Thereafter, the body region 319 may be formed. By way of example, and not by way of limitation, the body region 319 may be formed with a body mask and a blanket implantation, or through selectively implanting ions with an ion implantation system. FIG. 3G also shows the formation of the source region 320. By way of example, and not by way of limitation, the source region 320 may be formed with a source mask and a blanket source implantation, or through selectively implanting ions with an ion implantation system. The gate pickup region and the portion of the device structure outside of the termination trench 313 may be blocked from receiving the body implant and the source implant.
FIG. 3H depicts the deposition of a thick sacrificial insulation layer 321′. By way of example, the sacrificial insulation layer may be 1,100 Å thick. Further by way of example, the insulation layer 321′ may be an oxide deposited by CVD with a source gas such as TEOS. Alternatively, the insulation layer 321′ may be a nitride material that is deposited with a CVD process using a SiH4 and NH3 gas mixture. Next, in FIG. 3I the thick insulation layer 321′ may be etched using an anisotropic etch, such as a dry etching process, in order to form the first insulating spacers 321 on the side of each insulating cap 318, and along the sides of the termination trench insulative material 317. By way of example, the insulation spacers 321 may be 1000 Å thick. When the insulation layer 321′ is an oxide, the etching process may stop on the silicon substrate's surface, thus removing portions of the bottom oxide layer 307 from the ONO hardmask that are not located below the first insulating spacers 321. A pad oxide 322 may then be grown over the surface of the substrate. By way of example, and not by way of limitation, the pad oxide 322 may be 100 Å thick.
Alternatively, a similar process may be used for forming the first insulating spacers 321 in a device that utilizes a sacrificial insulation layer 321′ that is a nitride material. In this situation the anisotropic etching process may selectively etch away the nitride material and leave the bottom oxide layer 307 of the ONO hardmask in place. As such, there is no need to grow the pad oxide 322. Once the first insulating spacers 321 have been formed, the processing of a device that has first insulating spacers that are made from a nitride material would then continue in substantially the same manner as that described for a process where the first insulating spacers 321 are made from an oxide.
After the first insulating spacers 321 have been formed, a sacrificial nitride layer 323 may be deposited over the surface as shown in FIG. 3J. By way of example, the nitride layer 323 may be 300 Å thick. The nitride layer 323 may be deposited with a CVD process using a SiH4 and NH3 gas mixture. As shown in FIG. 3K, a thick layer of borophosphosilicate glass (BPSG) 324 may then be deposited over the nitride layer 323 with a CVD process.
A contact mask may be used in FIG. 3L to form a contact trench 325 that provides access for conductive vertical connections to reach the gate pickup electrode 314′. The etching process may utilize three separate etching steps. First, an etchant may be used that will remove the BPSG layer 324 and will not remove the nitride layer 323 below the BPSG. This allows for a fast etch, since there is no chance of over etching due to the nitride stop layer 323. A second etchant may then be used to selectively etch through the nitride layer 323. Thereafter, a third etchant may be used that has a high selectivity for oxide in order to break through the insulative cap 318 for the gate pickup electrode 314′.
In FIG. 3M a layer of photoresist (not shown) may be deposited and a second contact mask may be utilized to expose the active cell region. Thereafter, a first etching process may selectively remove the BPSG layer 324 over the active region. A second anisotropic etching process, such as a dry etching process, may selectively remove the sacrificial nitride layer 323. Due to the directional selectivity of the anisotropic etch, portions of the sacrificial nitride layer 323 remain after the etching. The remnants of the sacrificial nitride layer 323 become the second insulative spacer material 327. The second insulative spacer material 327 self-aligns the contact trenches 326. Self-aligning the source contacts allows for enhanced scalability because it reduces the chances of misalignment. The next etching process removes the reaming oxide layer 322, and finally, the semiconductor substrate is etched in order to allow a contact to be made with the source and body regions through the self-aligned contact trenches 326.
FIG. 3N depicts the final processing steps for the device structure 100. First a barrier metal (not shown) may be deposited over the entire surface. The barrier metal prevents diffusion into the source region 320. By way of example, and not by way of limitation, the barrier metal may be titanium that is deposited through physical vapor deposition (PVD), or it may be an alloy such as TiN which may be deposited by CVD or PVD. After the barrier metal has been deposited, a conductive material may be deposited in order to form the vertical connections 328 and 329. By way of example, and not by way of limitation, the vertical connections may be made tungsten that is deposited by CVD. Once the layer of tungsten has been deposited, it may be etched back in order to leave the tungsten primarily in the vertical contact holes. Metal may then be deposited over the entire surface to provide appropriate contacts to the vertical connections 328 and 329. By way of example, and not by way of limitation, the deposited metal may be sputtered aluminum. Finally, a metal mask may be used to etch away portions of the deposited metal in order to electrically isolate the contact areas into a source metal 331, and a gate metal 330.
FIGS. 4A-4C depict additional steps that may be utilized in order to form device 100′ that is shown in FIG. 2B. Device 100′ follows the same processing flow described in FIGS. 3A-3E. Instead of completely filling the termination trench 313 with insulative material 317, as shown in FIG. 3F, only enough insulative material 317 is deposited to line the exposed sidewalls of the first and second portions of the conductive material 315A and 315B, and the bottom of the trench above the oxide layer 311. Thereafter, conductive material is deposited into the trench 313 to form a shield electrode 332. By way of example, the shield electrode 332 may be polysilicon. The insulative trench material 317 electrically isolates the shield electrode 332 from both the first and second portions of conductive material in the trench 313. Next in FIG. 4B, the excess conductive material is removed through an etching process, thereby leaving the top surface of the shield electrode 332 coplanar with the top surface of the insulative trench material 317. The processing then continues according to processing that is substantially similar processing to the processing for device 100, until the first contact mask is applied. The first contact mask for device 100′ is shown in FIG. 4C. As may be seen, an additional trench 350 is formed above the shield electrode 332 that passes through the insulative material 324 and 323. Thereafter, the processing continues according to that of device 100, in which a vertical connection 233 is formed that connects the shield electrode to the source metal 324 as shown in FIG. 2B.
The device 100′′ shown in FIG. 2C may be formed by following substantially the same processing described for device 100 until the first contact mask is used. FIG. 5 depicts how a trench 352 is formed completely through the termination trench 313. This provides access for a vertical connection 235 to be formed that connects the source metal 231 to the drift region 306 and/or the field line tuning region below the termination trench 313 in subsequent metallizing steps, that are substantially similar to those used for device 100.
While the above is a complete description of the preferred embodiment of the present invention, it is possible to use various alternatives, modifications and equivalents. Therefore, the scope of the present invention should be determined not with reference to the above description but should, instead, be determined with reference to the appended claims, along with their full scope of equivalents. Any feature, whether preferred or not, may be combined with any other feature, whether preferred or not. In the claims that follow, the indefinite article “A”, or “An” refers to a quantity of one or more of the item following the article, except where expressly stated otherwise. The appended claims are not to be interpreted as including means-plus-function limitations, unless such a limitation is explicitly recited in a given claim using the phrase “means for.”

## Claims

1. A termination structure comprising:
a termination trench formed into a semiconductor material of a first conductivity type, wherein the termination trench encircles one or more transistor devices formed in the semiconductor material, and wherein the sidewalls of the termination trench are lined with a dielectric material;
a first portion of conductive material disposed proximate to the dielectric material lining a sidewall of the termination trench closest to the one or more transistor devices; and
a second portion of conductive material disposed proximate to the dielectric material lining a sidewall of the termination trench furthest from the one or more transistor devices, wherein the second portion of conductive material is electrically isolated from the first portion of conductive material.

2. The termination structure of claim 1, wherein the first portion of conductive material and the second portion of conductive material are electrically floating.

3. The termination structure of claim 1, wherein the first portion of conductive material is maintained at a gate potential and the second portion of conductive material is maintained at a drain potential.

4. The termination structure of claim 3, further comprising:
a source layer of a first conductivity type formed in a top portion of the semiconductor material bounded by an outermost active semiconductor device and the termination trench; and
a body layer of the second conductivity type formed below the source layer.

5. The termination structure of claim 4, wherein a distance between the outermost active semiconductor device and the termination trench is equal to a distance separating each of the active semiconductor devices from each other.

6. The termination structure of claim 1, further comprising:
a termination shield formed between the first and second portions of conductive material, wherein the termination shield is electrically isolated from the first and second portions of conductive material, and wherein the termination shield is maintained at a source potential.

7. The termination structure of claim 1, further comprising a Schottky contact formed in a portion of the termination structure where an electrical contact is made from a source metal to the semiconductor material.

8. The termination structure of claim 1, further comprising an electrical field line tuning region of the second conductivity type formed below a bottom surface of the termination trench.

9. The termination structure of claim 1, wherein the dielectric material lining an upper portion of the termination trench sidewalls is a first thickness, and the dielectric material lining a lower portion of the termination trench sidewalls is a second thickness, wherein the second thickness is greater than the first thickness.

10. The termination structure of claim 1, wherein the termination trench further surrounds an electrostatic discharge feature.

11. The termination structure of claim 1, wherein the termination trench further surrounds a gate pickup feature.

12. The termination structure of claim 1, wherein a Schottky contact is formed outside of the termination trench.

13. The termination structure of claim 1, wherein the Schottky contact comprises a body clamp feature.

14. A method for forming a termination structure comprising:
a) forming a termination trench into a semiconductor material of a first conductivity type, wherein the termination trench encircles one or more transistor devices formed in the semiconductor material;
b) lining sidewalls of the termination trench with a dielectric material;
c) disposing a first portion of conductive material proximate to the dielectric material lining a sidewall of the termination trench closest to the one or more transistor devices;
d) disposing a second portion of conductive material proximate to the dielectric material lining a sidewall of the termination trench furthest from the one or more transistor devices, wherein the second portion of conductive material is electrically isolated from the first portion of conductive material; and
e) filling the space between the first and second portions of the conductive material with a trench filling insulator material.

15. The method of claim 14, wherein the first portion of conductive material and the second portion of conductive material are electrically floating.

16. The method of claim 14, further comprising maintaining the first portion of conductive at a gate potential and maintaining the second portion of conductive material at a drain potential.

17. The method of claim 16, further comprising:
forming a source layer of a first conductivity type in a top portion of the semiconductor material bounded by an outermost transistor device of the one or more transistor devices and the termination trench; and
forming a body layer of the second conductivity type below the source layer.

18. The method of claim 17, wherein a distance between the outermost transistor device and the termination trench is equal to a distance separating each of two or more transistor devices from each other.

19. The method of claim 14, further comprising:
d′) lining the first and second portion of the conductive material with an insulative material and filling the remainder of the trench with a conductive material to form a shield electrode.

20. The method of claim 14, further comprising:
f) etching through the trench filling material and the dielectric material at the bottom of the trench; and
g) filling the trench with a conductive material to form a Schottky contact.

21. The method of claim 14, further comprising, forming an electrical field line tuning region of the second conductivity type below the termination trench.

22. The method of claim 14, wherein lining the sidewalls and bottom surface of the termination trench with the dielectric material comprises, lining an upper portion of the termination trench sidewalls with dielectric material to a first thickness, and lining a lower portion of the termination trench sidewalls with a dielectric material to a second thickness, wherein the second thickness is greater than the first thickness.

23. The method of claim 14, wherein the termination trench further surrounds an electrostatic discharge feature.

24. The method of claim 14, wherein the termination trench further surrounds a gate pickup feature.

25. The method of claim 14, wherein a Schottky contact is formed outside of the termination trench.

26. The method of claim 14, wherein forming the termination trench includes forming a mask over a top surface of a semiconductor substrate of a first conductivity type and etching the semiconductor substrate through openings in the mask to form a termination trench in the semiconductor substrate.

27. The method of claim 26, wherein the mask is a hard mask that includes first, second, and third insulator layers, wherein the second layer is sandwiched between the first and third layers, wherein the third layer is between the second layer and the top surface of the semiconductor substrate, and wherein the second layer is resistant to a first etch process that etches the material of the first and third layers, and wherein the first and third layers are resistant to a second etch process that etches the material of the second layer.