Public procurement notice: Contract Award Notice
Published: 2025-06-17
Buyer: University of Jyväskylä
Country: FI
Region: FI1B1
Contract type: Supplies
Procedure: Open procedure
CPV classification: 38000000
Estimated value: 1265000 EUR
Award criteria: price, quality

Technical requirements: In an open procedure the contracting entity publishes a contract notice and places a call for tenders for the receivable, on which basis all prospective suppliers may submit their tenders. After the contract notice has been published and the call for tenders has been placed, the contracting entity may send the call for tenders to the suppliers that it considers suitable.

A contracting entity may conclude a procurement agreement in the form of separate lots and may determine the size and subject-matter of such lots.

Tenders must be submitted for both of the lots (EBL and LBL),
University of Jyväskylä (JYU) is inviting tenders for a combination of an electron beam lithography system (EBL) and a laser beam lithography system (LBL), both capable of mix-and-match processing based on CAD drawings in GDSII file format. 

We are searching a Dedicated EBL tool AND a Dedicated LBL tool for research and development of state of the art micro- and nano-scale features requiring high fidelity in patterning and edge smoothness. 

Contracting authority has a need for high precision and versatile lithography tools for patterning of optical wave guides and lattices, phononic crystals and mechanic resonators; with the goal of investigating quantum phenomena and the interplay between such structures. 

Contracting authority has a need for the lithography tools to support integration of high fidelity nano-scale features into considerably larger designs, such as microfluidic networks with widths of about 100 um and lengths of several mm. 

Therefore, contracting authority puts emphasis on the two lithography systems having good support for mix-and-match lithography, i.e. well documented procedures for sharing CAD pattern libraries for straightforward implementation in mix-and-match exposures on the same resist layer. The EBL and LBL systems should manage mix-and-match exposures with resists such as Shipley S1813, SU-8 and AZ5200-E series.
A Dedicated EBL tool for fabrication of state of the art nano-scale structures.

Contracting authority has a need for high precision and versatile tool which would be extremely useful in preparation of phononic 
and photonic structures, such as waveguides, gratings and meta-plasmonic structures.

The EBL system should have good support for mix-and-match lithography, i.e. well documented procedures for sharing CAD pattern libraries for straightforward implementation in mix-and-match exposures with the LBL system in lot 2.
A laser beam lithography system (LBL) for advanced microfabrication of semiconductor and biomedical devices.

The system will be installed in a clean-room facility of class iso 5, forming part of a larger lithography research line. The system must meet high performance specifications for resolution. The system is intended for exposure of photoresists where suitable exposure wavelength is 375 nm. The majority of processing will occur on chips sized from 5 mm by 5 mm up to standard 4 inch diameter wafers, however we require that up to 5 x 5 inch  substrates can fit into the system.

The LBL system should have good support for mix-and-match lithography, i.e. well documented procedures for sharing CAD pattern libraries for straightforward implementation in mix-and-match exposures with the EBL system in lot 1. 

The system needs to be installed by the supplier.


Winner: Raith GmbH
Number of bids: 1