prompt_front: Now, answer the following question based on the text below, only give me the answer and do not output any other words.

Question: What are the titles of one of Kam W. Leong's publications in Journal of Controlled Release?

Read the following text and answer briefly.

Context 1: Publications of Kam W  Leong
Publications of Kam W  Leong :chronological alphabetical combined bibtex listing:
K W  Leong, Synthetic mast-cell granules as adjuvants to promote and polarize immunity in lymph nodes (2013) [PDF]
K W  Leong, Tuning Physical Properties of Nanocomplexes through Microfluidics-Assisted Confinement (2013) [PDF]
K W  Leong, Nucleic acid scavengers inhibit thrombosis without increasing bleeding (2013) [PDF]
K W  Leong, Nanotopography as modulator of human mesenchymal stem cell function (2013) [PDF]
K W  Leong, Efficacy of engineered FVIII-producing skeletal muscle enhanced by growth factor-releasing co-axial electrospun fibers (2013) [PDF]
Zhao, F  and Veldhuis, J  J  and Duan, Y  J  and Yang, Y  and Christoforou, N  and Ma, T  and Leong, K  W , Low Oxygen Tension and Synthetic Nanogratings Improve the Uniformity and Stemness of Human Mesenchymal Stem Cell Layer, Molecular Therapy, vol  18 no  5 (2010), pp  1010-1018 [abs]
Kadiyala, I  and Loo, Y  H  and Roy, K  and Rice, J  and Leong, K  W , Transport of chitosan-DNA nanoparticles in human intestinal M-cell model versus normal intestinal enterocytes, European Journal of Pharmaceutical Sciences, vol  39 no  1-3 (2010), pp  103-109 [abs]
Wang, Y  and Quek, C  H  and Leong, K W  and Fang, J , Synthesis and Cytotoxity of Luminescent InP Quantum Dots, MRS Symposium Proceeding, vol  1241E (2010)
Jiang, X  and Zheng, Y  and Chen, H  H  and Leong, K  W  and Wang, T  H  and Mao, H  Q , Dual-Sensitive Micellar Nanoparticles Regulate DNA Unpacking and Enhance Gene-Delivery Efficiency, Adv Mater (2010)
Ho, Y  P  and Leong, K  W , Quantum dot-based theranostics, Nanoscale, vol  2 no  1 (2010), pp  60-68 [PDF] [abs]
Phua, K  and Leong, K  W , Microscale oral delivery devices incorporating nanoparticles, Nanomedicine, vol  5 no  2 (2010), pp  161-163
Grigsby, C  L  and Leong, K  W , Balancing protection and release of DNA: tools to address a bottleneck of non-viral gene delivery, Journal of the Royal Society Interface, vol  7 (2010), pp  S67-S82 [abs]
Chalut, K  J  and Kulangara, K  and Giacomelli, M  G  and Wax, A  and Leong, K  W , Deformation of stem cell nuclei by nanotopographical cues, Soft Matter, vol  6 no  8 (2010), pp  1675-1681 [abs]
Chen, S  and Jones, J  A  and Xu, Y  and Low, H  Y  and Anderson, J  M  and Leong, K  W , Characterization of topographical effects on macrophage behavior in a foreign body response model, Biomaterials, vol  31 no  13 (2010), pp  3479-91 [PDF] [abs]
Yim, E  K  F  and Darling, E  M  and Kulangara, K  and Guilak, F  and Leong, K  W , Nanotopography-induced changes in focal adhesions, cytoskeletal organization, and mechanical properties of human mesenchymal stem cells, Biomaterials, vol  31 no  6 (2010), pp  1299-1306 [PDF] [abs]
Yow, S  Z  and Quek, C  H  and Yim, E  K  F  and Lim, C  T  and Leong, K  W , Collagen-based fibrous scaffold for spatial organization of encapsulated and seeded human mesenchymal stem cells, Biomaterials, vol  30 no  6 (2009), pp  1133-1142 [abs]
Kunder, C  A  and John, A  L  S  and Li, G  J  and Leong, K  W  and Berwin, B  and Staats, H  F  and Abraham, S  N , Mast cell-derived particles deliver peripheral signals to remote lymph nodes, Journal of Experimental Medicine, vol  206 no  11 (2009), pp  2455-2467 [abs]
Ho, Y P  and Chen, H H  and Leong, K W  and Wang, T H , Combining QD-FRET and microfluidics to monitor DNA nanocomplex self-assembly in real-time, J Vis Exp (2009), pp  1432
Kulangara, K  and Leong, K  W , Substrate topography shapes cell function, Soft Matter, vol  5 no  21 (2009), pp  4072-4076 [abs]
Chakraborty, S  and Liao, I  C  and Adler, A  and Leong, K  W , Electrohydrodynamics: A facile technique to fabricate drug delivery systems, Advanced Drug Delivery Reviews, vol  61 no  12 (2009), pp  1043-1054 [abs]
Oney, S  and Lam, R  T  S  and Bompiani, K  M  and Blake, C  M  and Quick, G  and Heidel, J  D  and Liu, J  Y  C  and Mack, B  C  and Davis, M  E  and Leong, K  W  and Sullenger, B  A , Development of universal antidotes to control aptamer activity, Nature Medicine, vol  15 no  10 (2009), pp  1224-1228 [PDF] [abs]
Chen, H  H  and Ho, Y  P  and Jiang, X  and Mao, H  Q  and Wang, T  H  and Leong, K  W , Simultaneous non-invasive analysis of DNA condensation and stability by two-step QD-FRET, Nano Today, vol  4 no  2 (2009), pp  125-134 [PDF] [abs]
Ho, Y  P  and Chen, H  H  and Leong, K  W  and Wang, T  H , The convergence of quantum-dot-mediated fluorescence resonance energy transfer and microfluidics for monitoring DNA polyplex self-assembly in real time, Nanotechnology, vol  20 no  9 (2009), pp  - [abs]
Liao, I  C  and Chen, S  L  and Liu, J  B  and Leong, K  W , Sustained viral gene delivery through core-shell fibers, Journal of Controlled Release, vol  139 no  1 (2009), pp  48-55 [abs]
Lou, Y  L  and Peng, Y  S  and Chen, B  H  and Wang, L  F  and Leong, K  W , Poly(ethylene imine)-g-chitosan using EX-810 as a spacer for nonviral gene delivery vectors, Journal of Biomedical Materials Research Part A, vol  88A no  4 (2009), pp  1058-1068 [abs]
Chew, S  Y  and Mi, R  and Hoke, A  and Leong, K  W , The effect of the alignment of electrospun fibrous scaffolds on Schwann cell maturation, Biomaterials, vol  29 no  6 (2008), pp  653-61 [abs]
Chen, H  H  and Ho, Y  P  and Jiang, X  and Mao, H  Q  and Wang, T  H  and Leong, K  W , Quantitative comparison of intracellular unpacking kinetics of polyplexes by a model constructed from quantum Dot-FRET, Molecular Therapy, vol  16 no  2 (2008), pp  324-332 [abs]
Chan, B  P  and Leong, K  W , Scaffolding in tissue engineering: general approaches and tissue-specific considerations, European Spine Journal, vol  17 (2008), pp  S467-S479 [abs]
Tsurushima, H  and Yuan, X  and Dillehay, L  E  and Leong, K  W , Radiation-inducible caspase-8 gene therapy for malignant brain tumors, International Journal of Radiation Oncology Biology Physics, vol  71 no  2 (2008), pp  517-525 [abs]
Bowman, K  and Sarkar, R  and Raut, S  and Leong, K  W , Gene transfer to hemophilia A mice via oral delivery of FVIII-chitosan nanoparticles, Journal of Controlled Release, vol  132 no  3 (2008), pp  252-259 [abs]
Choi, J  S  and Leong, K  W  and Yoo, H  S , In vivo wound healing of diabetic ulcers using electrospun nanofibers immobilized with human epidermal growth factor (EGF), Biomaterials, vol  29 no  5 (2008), pp  587-96 [abs]
Liao, I  C  and Liu, J  B  and Bursac, N  and Leong, K  W , Effect of Electromechanical Stimulation on the Maturation of Myotubes on Aligned Electrospun Fibers, Cellular and Molecular Bioengineering, vol  1 no  2-3 (2008), pp  133-145 [abs]
Prow, T  W  and Bhutto, I  and Kim, S  Y  and Grebe, R  and Merges, C  and McLeod, D  S  and Uno, K  and Mennon, M  and Rodriguez, L  and Leong, K  and Lutty, G  A , Ocular nanoparticle toxicity and transfection of the retina and retinal pigment epithelium, Nanomedicine-Nanotechnology Biology and Medicine, vol  4 no  4 (2008), pp  340-349 [abs]
Tan, S  C  W  and Pan, W  X  and Ma, G  and Cai, N  and Leong, K  W  and Liao, K , Viscoelastic behaviour of human mesenchymal stem cells, Bmc Cell Biology, vol  9 (2008), pp  - [abs]
Chalut, K  J  and Chen, S  and Finan, J  D  and Giacomelli, M  G  and Guilak, F  and Leong, K  W  and Wax, A , Label-free, high-throughput measurements of dynamic changes in cell nuclei using angle-resolved low coherence interferometry, Biophysical Journal, vol  94 no  12 (2008), pp  4948-4956 [abs]
Haider, M  and Cappello, J  and Ghandehari, H  and Leong, K  W , In vitro chondrogenesis of mesenchymal stem cells in recombinant silk-elastinlike hydrogels, Pharmaceutical Research, vol  25 no  3 (2008), pp  692-699 [abs]
N  Bursac and Y  H  Loo and K  Leong and L  Tung, Novel anisotropic engineered cardiac tissues: Studies of electrical propagation, Biochemical And Biophysical Research Communications, vol  361 no  4 (October, 2007), pp  847 -- 853, ISSN 0006-291X [abs]
Chen, Beiyi and Dang, Jiyoung and Tan, Tuan Lin and Fang, Ning and Chen, Wei Ning and Leong, Kam W  and Chan, Vincent, Dynamics of smooth muscle cell deadhesion from thermosensitive hydroxybutyl chitosan, Biomaterials, vol  28 no  8 (2007), pp  1503 - 1514 [027] [abs]
Chen, B  and Dang, J  and Tan, T  L  and Fang, N  and Chen, W  N  and Leong, K  W  and Chan, V , Dynamics of smooth muscle cell deadhesion from thermosensitive hydroxybutyl chitosan, Biomaterials, vol  28 no  8 (2007), pp  1503-14 [abs]
Park, D  J  and Choi, J  H  and Leong, K  W  and Kwon, J  W  and Eun, H  S , Tissue-engineered bone formation with gene transfer and mesenchymal stem cells in a minimally invasive technique, Laryngoscope, vol  117 no  7 (2007), pp  1267-71 [abs]
Tsurushima, H  and Yuan, X  and Dillehay, L  E  and Leong, K  W , Radioresponsive tumor necrosis factor-related apoptosisinducing ligand (TRAIL) gene therapy for malignant brain tumors, Cancer Gene Therapy, vol  14 no  8 (2007), pp  706-716 [abs]
Chai, C  and Leong, K  W , Biomaterials approach to expand and direct differentiation of stem cells, Molecular Therapy, vol  15 no  3 (2007), pp  467-480 [abs]
Zhang, Y  and Chai, C  and Jiang, X  S  and Teoh, S  H  and Leong, K  W , Fibronectin immobilized by covalent conjugation or physical adsorption shows different bioactivity on aminated-PET, Materials Science & Engineering C-Biomimetic and Supramolecular Systems, vol  27 no  2 (2007), pp  213-219 [abs]
Song, R  J  and Liu, S  Q  and Leong, K  W , Effects of MIP-1 alpha, MIP-3 alpha, and MIP-3 beta on the induction of HIV Gag-specific immune response with DNA vaccines, Molecular Therapy, vol  15 no  5 (2007), pp  1007-1015 [abs]
Yim, E  K  F  and Liao, I  C  and Leong, K  W , Tissue compatibility of interfacial polyelectrolyte complexation fibrous scaffold: Evaluation of blood compatibility and biocompatibility, Tissue Engineering, vol  13 no  2 (2007), pp  423-433 [abs]
Sharma, B  and Williams, C  G  and Kim, T  K  and Sun, D  N  and Malik, A  and Khan, M  and Leong, K  and Elisseeff, J  H , Designing zonal organization into tissue-engineered cartilage, Tissue Engineering, vol  13 no  2 (2007), pp  405-414 [abs]
Chua, K  N  and Tang, Y  N  and Quek, C  H  and Ramakrishna, S  and Leong, K  W  and Mao, H  Q , A dual-functional fibrous scaffold enhances P450 activity of cultured primary rat hepatocytes, Acta Biomaterialia, vol  3 no  5 (2007), pp  643-650 [abs]
Chua, K  N  and Chai, C  and Lee, P  C  and Ramakrishna, S  and Leong, K  W  and Mao, H  Q , Functional nanofiber scaffolds with different spacers modulate adhesion and expansion of cryopreserved umbilical cord blood hematopoietic stem/progenitor cells, Experimental Hematology, vol  35 no  5 (2007), pp  771-781 [abs]
Yim, E  K  F  and Pang, S  W  and Leong, K  W , Synthetic nanostructures inducing differentiation of human mesenchymal stem cells into neuronal lineage, Experimental Cell Research, vol  313 no  9 (2007), pp  1820-1829 [abs]
Chew, S  Y  and Mi, R  F  and Hoke, A  and Leong, K  W , Aligned protein-polymer composite fibers enhance nerve regeneration: A potential tissue-engineering platform, Advanced Functional Materials, vol  17 no  8 (2007), pp  1288-1296 [abs]
Tsurushima, H  and Yuan, X  and Dillehay, L  E  and Leong, K  W , Radio-responsive gene therapy for malignant glioma cells without the radiosensitive promoter: Caspase-3 gene therapy combined with radiation, Cancer Letters, vol  246 no  1-2 (2007), pp  318-323 [abs]
Dang, J M  and Leong, K  W , Myogenic induction of aligned mesenchymal stem cell sheets by culture on thermally responsive electrospun nanofibers, Advanced Materials, vol  19 no  19 (2007), pp  2775-2779
Dai, H  and Jiang, X  and Tan, G  C  and Chen, Y  and Torbenson, M  and Leong, K  W  and Mao, H  Q , Chitosan-DNA nanoparticles delivered by intrabiliary infusion enhance liver-targeted gene delivery, International Journal of Nanomedicine, vol  1 no  4 (2006), pp  507-522 [abs]
Le Visage, C  and Kim, S  W  and Tateno, K  and Sieber, A  N  and Kostuik, J  P  and Leong, K  W , Interaction of human mesenchymal stem cells with disc cells - Changes in extracellular matrix biosynthesis, Spine, vol  31 no  18 (2006), pp  2036-2042
Ong, S  Y  and Dai, H  and Leong, K  W , Inducing hepatic differentiation of human mesenchymal stem cells in pellet culture, Biomaterials, vol  27 no  22 (2006), pp  4087-4097
Bright, C  and Park, Y  S  and Sieber, A  N  and Kostuik, J  P  and Leong, K  W , In vivo evaluation of plasmid DNA encoding OP-1 protein for spine fusion, Spine, vol  31 no  19 (2006), pp  2163-2172
Yim, E  K  and Wan, A  C  and Le Visage, C  and Liao, I  C  and Leong, K  W , Proliferation and differentiation of human mesenchymal stem cell encapsulated in polyelectrolyte complexation fibrous scaffold, Biomaterials, vol  27 no  36 (2006), pp  6111-22 [abs]
Luong-Van, E  and Grondahl, L  and Chua, K  N  and Leong, K  W  and Nurcombe, V  and Cool, S  M , Controlled release of heparin from poly(epsilon-caprolactone) electrospun fibers, Biomaterials, vol  27 no  9 (2006), pp  2042-2050
Dang, J  M  and Leong, K  W , Natural polymers for gene delivery and tissue engineering, Advanced Drug Delivery Reviews, vol  58 no  4 (2006), pp  487-499
Li, J  and Li, X  and Ni, X  P  and Wang, X  and Li, H  Z  and Leong, K  W , Self-assembled supramolecular hydrogels formed by biodegradable PEO-PHB-PEO triblock copolymers and alpha-cyclodextrin for controlled drug delivery, Biomaterials, vol  27 no  22 (2006), pp  4132-4140
Yim, E  K  F  and Wen, J  and Leong, K  W , Enhanced extracellular matrix production and differentiation of human embryonic germ cell derivatives in biodegradable poly(epsilon-caprolactone-co-ethyl ethylene phosphate) scaffold, Acta Biomaterialia, vol  2 no  4 (2006), pp  365-376
Chew, S  Y  and Hufnagel, T  C  and Lim, C  T  and Leong, K  W , Mechanical properties of single electrospun drug-encapsulated nanofibres, Nanotechnology, vol  17 no  15 (2006), pp  3880-3891
Zhang, Y  and Chai, C  and Jiang, X  S  and Teoh, S  H  and Leong, K  W , Co-culture of umbilical cord blood CD34(+) cells with human mesenchymal stem cells, Tissue Engineering, vol  12 no  8
Context 2: PROBLEM TO BE SOLVED: To provide a vacuum processor which can suppress the rise of manufacture cost while coping with the enlargement of diameter of a sample, and besides is excellent in maintainability  SOLUTION: This vacuum processor comprises an air loader 1 which is equipped with a plurality of juxtaposed cassette stands 2a and 2b and a carrier 13 for carrying a wafer 20 from or to the cassette stands, a vacuum loader 7 which is equipped with etching treatment chambers 11 and 11b for processing the wafer and a vacuum carriage chamber 16 connected to them through gate valves 15a and 15b, and a lock device 6 consisting of a load lock chamber 6b and an unload lock chamber 6b equipped with gate valves 12a, 12b, 12c, and 12d for connecting the said carrier 13 with the vacuum carriage chamber 16  For the etching treatment chambers, two are provided only on the opposite side of the vacuum carriage chamber symmetrically about the axis line A passing the center, and besides the arrangement positions of the two etching treatment chambers are at an acute angle on the opposite side of the vacuum carriage chamber 
エッチング，ＣＶＤ（化学的気相成長），スパッタリング，アッシング，リンサ（水洗）等の枚葉処理をするのに好適な真空処理装置とそれを用いて半導体デバイスを製造する半導体製造ラインに関するものである。 Those etching, CVD (chemical vapor deposition), sputtering, ashing, to rinser (water washing) suitable vacuum processing apparatus for single wafer processing, such as a semiconductor manufacturing line for manufacturing a semiconductor device using the same  
【従来の技術】試料を処理する真空処理装置は、大別すると、カセットブロックと真空処理ブロックから構成されており、カセットブロックは、半導体製造ラインのベイ通路に面して長手方向に伸びるフロントを有し、試料用のカセットや試料のオリエンテーションを合わせるアライメントユニットと、大気ロボットがある。 BACKGROUND OF THE INVENTION Vacuum processing apparatus for processing a sample, the roughly is constituted by a cassette block and a vacuum processing block, the cassette block, a front extending in the longitudinal direction facing the bay aisle of a semiconductor manufacturing line a, an alignment unit for aligning the cassette and sample orientation for sample, there is an atmospheric robot  真空処理ブロックには、ロード側ロードロック室，アンロード側ロードロック室，真空処理室，後真空処理室，真空ポンプ及び真空ロボット等が設けられている。 The vacuum processing block, the load-side load lock chamber, the unload side load lock chamber, the vacuum processing chamber, a rear vacuum processing chamber, a vacuum pump and a vacuum robot and the like 
【０００３】これらの真空処理装置では、カセットブロックのカセットから取り出された試料が、大気ロボットにより真空処理ブロックのロードロック室まで搬送される。  In these vacuum processing apparatus, a sample taken from the cassette in the cassette block is transported to the load lock chamber in the vacuum processing block by the atmospheric robot  ロードロック室から真空ロボットによりさらに処理室に搬送され、電極構造体上にセットされた試料は、プラズマエッチング等の処理がなされる。 Is conveyed from the load lock chamber to the further processing chamber by the vacuum robot, the sample is set on an electrode structure, processing such as plasma etching is performed  その後、必要に応じて後真空処理室に搬送，処理される。 Thereafter, the conveyance to the rear vacuum processing chamber as necessary and processed  処理済みの試料は、真空ロボット及び大気ロボットによりカセットブロックのカセットに搬送される。 Processed sample is conveyed to the cassette of the cassette block by the vacuum robot and the atmospheric robot 
【０００４】試料をプラズマエッチング処理する真空処理装置の例としては、例えば特公昭61−8153号公報，特開昭63−133532号公報，特公平6−30369号公報，特開平  Examples of the sample vacuum processing apparatus for plasma etching treatment, for example Japanese Patent Publication 61-8153, JP-Sho 63-133532 and JP Kokoku 6-30369, JP-A No 
6−314729号公報，特開平6−314730号公報，米国特許第 6-314729, JP-A No  6-314730, JP-U S  Patent No 
5,314,509号明細書および5,784,799号明細書に記載されたようなものがある。 There are such as described in Pat and 5,784,799 Pat 5,314,509 
509号明細書に記載された装置は、真空処理ブロックの中央付近に真空ロボット、その周囲に３個の処理室が同心状に配置され、真空ロボットとカセットブロックの間に、ロード側ロードロック室，アンロード側ロードロック室が設けられている。 Device described in 509 Pat are vacuum robot in the vicinity of the center of the vacuum processing block, three process chambers around it are arranged concentrically, between the vacuum robot and the cassette block, the load-side load-lock chamber , unload side load lock chamber is provided  これらの装置では、大気ロボットや真空ロボットの搬送アームの回転角度が大きく従って装置全体の必要床面積が大きいという問題がある。 In these devices, there is a problem that needs floor space for the entire rotation angle is large therefore device of the transfer arm of the atmospheric robot and the vacuum robot is large 
【０００６】一方、真空処理装置の真空処理ブロック内の処理室や真空ポンプその他各種の配管機器については、定期，不定期に点検修理等のメンテナンスを行うことが必要である。  On the other hand, the processing chamber and the vacuum pump and other various piping components of the vacuum processing block of the vacuum processing apparatus, periodically, it is necessary to perform maintenance such as inspection and repair irregularly  そのため、一般に、真空処理ブロックの周囲には、扉が設けられており、この扉を開けることにより、ロードロック室，アンロードロック室，処理室，真空ロボット及び各種の配管機器の点検修理ができるようになっている。 Therefore, in general, around the vacuum processing block, the door is provided by opening the door, load lock chambers, unload lock chambers, processing chambers, the servicing of the vacuum robot and various piping devices It has become way 
キャリアポッドが必要となるために、約３５０mm程度と大きくなり、複数のキャリアポッドを収納するカセットブロックの幅も大きくなる。 For carrier pod required, large as about 350 mm, the greater width of the cassette block for housing a plurality of carrier pods  この幅に合わせて真空処理ブロックの幅を決定すると、真空処理装置全体が大きなスペースを必要とすることになる。 When determining the width of the vacuum processing block in accordance with the this width, the entire vacuum processing apparatus requires a large space  一例として、４個のキャリアポッドを収納するカセットブロックについて考えると、試料の直径ｄが８インチから１２インチになった場合、カセットの幅は少なくとも約４０cm以上大きくならざるを得ない。 As an example, considering the cassette block for accommodating four carriers pods, if the diameter d of the sample was a 12-inch 8 inch wide cassette inevitably increases at least about 40cm or more 
【０００８】一方、試料に各種の処理を行いながら大量の処理を行うために、一般の半導体製造ラインでは、同じ処理を行う複数の真空処理装置を同じベイに集め、各ベイ間の搬送を自動またはマニュアルで行っている。 On the other hand, in order to perform a lot of processing while performing various processes in the sample, in a general semiconductor manufacturing lines, gathering a plurality of vacuum processing apparatus for performing the same processing in the same bay, automatic conveyance between the bays or it is carried out manually  このような半導体製造ラインは、高いクリーン度を必要とするため、半導体製造ライン全体が大きなクリーンルーム内に設置される。 Such a semiconductor manufacturing line, requires a high degree of cleanliness, the whole semiconductor manufacturing line is placed in a large clean room  試料の大口径化に伴う真空処理装置の大型化は、クリーンルーム占有面積の大型化を伴うが、これはもともと建設コストの高いクリーンルームの建設コストを一層増加させることになる。 Size of the vacuum processing apparatus due to the large diameter of the sample is accompanied by a large clean room area occupied, which will be further increased construction costs of the high construction cost clean room originally  もし、同じ面積のクリーンルームに占有面積の大きな真空処理装置を設置するとすれば、真空処理装置の全体の台数を減らすか、あるいは各真空処理装置間の間隔を狭くせざるを得ない。 If, if the clean room of the same area to install a large vacuum processing apparatus of the occupied area, reduce the overall number of the vacuum processing apparatus, or interval narrower forced between the vacuum processing apparatus  同じ面積のクリーンルームにおける真空処理装置の設置台数減少は、必然的に半導体の製造ラインの生産性の低下ひいては半導体の製造コストの上昇を伴う。 Installed base reduction in the vacuum processing apparatus in a clean room having the same area is accompanied inevitably rise of the semiconductor decrease and thus the semiconductor manufacturing cost of productivity of the production line  他方、各真空処理装置間の間隔を狭くすることは、点検修理のためのメンテナンススペースが不足し、真空処理装置のメンテナンス性を著しく阻害する。 On the other hand, to reduce the distance between each of the vacuum processing apparatus, the maintenance space for inspection and repair is insufficient to significantly inhibit the maintenance of the vacuum processing apparatus 
【０００９】本発明の目的は、試料の大口径化に対応しつつ、製造コストの上昇を抑えることのできる真空処理装置を提供することにある。 An object of the present invention, while corresponding to the large diameter of the sample, is to provide a vacuum processing apparatus capable of suppressing an increase in manufacturing cost 
【００１０】本発明の他の目的は、試料の大口径化に対応しつつ、メンテナンス性に優れた真空処理装置を提供することにある。 Another object of the present invention, while corresponding to the large diameter of the sample is to provide a vacuum processing apparatus having excellent maintainability 
【００１１】本発明の他の目的は、試料の大口径化に対応しつつ、真空処理装置の必要設置台数を確保して製造コストの上昇を抑え、かつ、メンテナンス性も損なわない半導体製造ラインを提供することにある。 Another object of the present invention, while corresponding to the large diameter of the sample, to ensure the necessary number of installed vacuum processing apparatus suppressing an increase in manufacturing cost, and a semiconductor manufacturing line is not impaired maintainability It is to provide 
【課題を解決するための手段】本発明は、並設した複数のカセット台およびカセット台から、あるいはカセット台へウエハを搬送するための搬送装置を備えた大気ローダと、ウエハを処理するための真空処理室およびこれにゲート弁を介して連接された真空搬送室を備えた真空ローダと、前記搬送装置と前記真空搬送室とを連接するためのゲート弁を備えたロードロック室およびアンロードロック室からなるロック装置とを含んで構成される真空処理装置において、ウエハを処理するための真空処理室は、有磁場ＵＨＦ帯電磁波放射放電方式リアクタ（以下、ＵＨＦ−ＥＣＲリアクタという。）によって形成される真空処理室であり、該真空処理室には、分解可能な側壁インナーユニットおよびアンテナが設けられ、該真空処理室は、真空搬 The present invention SUMMARY OF THE INVENTION from a plurality of cassette tables and cassette stand juxtaposed, or the atmosphere loader having a conveying device for conveying the wafer to the cassette table, for processing a wafer the load lock chamber and the unload lock having a gate valve for connecting the vacuum loader vacuum processing chamber and having a vacuum transfer chamber which is connected via a gate valve to the said vacuum transfer chamber and the conveying device in the vacuum processing apparatus configured to include a lock device comprising a chamber, a vacuum processing chamber for processing a wafer it is formed by a magnetic field UHF band electromagnetic wave radiation discharge type reactor (hereinafter  referred UHF-ECR reactor) that a vacuum processing chamber, the vacuum processing chamber, degradable sidewall inner unit and an antenna are provided, the vacuum processing chamber, a vacuum transportable 室およびロック装置の中央を通る軸線に対して対称にして、かつ真空搬送室を中心にしてロック装置の反対側のみに２つ設けられ、かつ真空搬送室に対して前記２つの真空処理室の配置位置は鋭角をなしている真空処理装置を提供する。 And symmetrically with respect to the axis passing through the center of the chamber and the locking device, and the opposite side only two provided for to lock device around the vacuum transfer chamber, and the two vacuum processing chamber to the vacuum transfer chamber position is to provide a vacuum processing apparatus which forms an acute angle 
ＣＲリアクタによって形成される真空処理室であり、該真空処理室は、真空搬送室およびロック装置の中央を通る軸線に対して対称にして、かつ真空搬送室を中心にしてロック装置の反対側のみに２つ設けられ、かつ真空搬送室に対して前記２つの真空処理室の配置位置は鋭角をなしており、ＵＨＦ−ＥＣＲのアンテナは、前記軸線に対して平行で、かつ前記真空搬送室とは反対側に開放される真空処理装置を提供する。 A vacuum processing chamber formed by a CR reactor, vacuum processing chamber, and symmetrically with respect to the axis passing through the center of the vacuum transfer chamber and the locking device, and the opposite side of the locking device around the vacuum transfer chamber only two provided, and positions of the two vacuum processing chamber to the vacuum transfer chamber is an acute angle, the UHF-ECR antennas, and parallel, and the vacuum transfer chamber with respect to said axis to provides a vacuum processing apparatus is opened to the opposite side
Context 3: \section*{Dynamical Behaviour of $O$ in Lattice Gases}

The dynamical behaviour of the anisotropic order parameter  $m$ [see Eq ~\eqref{eq:def-m} in the Letter] following a quench to the critical point is well described by
the Gaussian theory for all the three lattice gas models studied, $i e ,$ driven lattice gas with either constant (IDLG) or random (RDLG) infinite drive and equilibrium lattice gas (LG)  In other words, in the short-time regime, $m \sim t^{1/2}$ [see Eq  \eqref{eq:mt}] and the Binder cumulant $g$ of the lowest transverse mode [defined in Eq  \eqref{eq:binder}] is zero in this regime  The alternative order parameter $O,$ however, distinguishes between the driven (IDLG, RDLG) and the equilibrium (LG) lattice gases  

In order to understand  this, we first write the phenomenological scaling form for $O$,  analogous to Eq  \eqref{eq:scalingass} in  the Letter,
\begin{eqnarray}
O (t, L_{\parallel} ; S_\Delta) = L_{\parallel}^{-\beta/[\nu(1+\Delta)]} \tilde f_O (t/L_{\parallel}^{z/(1+\Delta)} ; S_\Delta) \quad
\label{eq:Oscalingass}
\end{eqnarray}
We already remarked that, in the LG, this scaling form is not compatible with the prediction $O \sim t^{1/8}  L_{\parallel}^{-1/2}$ of the Gaussian theory   However, following Ref  \cite{AS2002}, it can be argued that, at short times, the only dependence of $O$ on the system size $L_{\parallel}$ is of the form $O \sim L_\parallel^{-1/2}$ which is very well confirmed by numerical simulations  Accordingly,  the generic behaviour of $O$ can be assumed to be
\begin{eqnarray}
O \sim t^{\alpha} L_\parallel^{-1/2}, \label{eq:O}
\end{eqnarray}
where $\alpha$ is a phenomenological exponent to be determined  This, along with Eq



ground_truth: Sustained viral gene delivery through core-shell fibers and Gene transfer to hemophilia A mice via oral delivery of FVIII-chitosan nanoparticles.

prompt_front: Now, answer the following question based on the text below, only give me the answer and do not output any other words.

Question: How is the vacuum processing system configured in terms of the arrangement of the vacuum processing apparatus?

Read the following text and answer briefly.

Context 2: 
かつ真空搬送室を中心にしてロック装置の反対側のみに２つ設けられ、かつ真空搬送室に対して前記２つの真空処理室の配置位置は鋭角をなしており、大気ローダ，真空ローダおよびロック装置はＴ字配置とされた真空処理方法を提供する。 And around the vacuum transfer chamber opposite only two provided a locking device, and positions of the two vacuum processing chamber to the vacuum transfer chamber is an acute angle, atmospheric loader, vacuum loader and locking apparatus to provide a vacuum processing method which is a T-arrangement 
【００１５】本発明は、並設した複数のカセット台およびカセット台から、あるいはカセット台へウエハを搬送するための搬送装置を備えた大気ローダと、ウエハを処理するための真空処理室およびこれにゲート弁を介して連接された真空搬送室を備えた真空ローダと、前記搬送装置と前記真空搬送室とを連接するためのゲート弁を備えたロードロック室およびアンロードロック室からなるロック装置とを含んで構成される真空処理装置が平行に複数台並設された真空処理システムにおいて、ウエハを処理するための真空処理室は、ＵＨＦ−ＥＣＲリアクタによって形成される真空処理室であり、該真空処理室は、真空搬送室およびロック装置の中央を通る軸線に対して対称にして、かつ真空搬送室を中心にしてロック装置の反対側のみに２ The present invention, a plurality of cassette tables and cassette stand juxtaposed, or the atmosphere loader having a conveying device for conveying the wafer to the cassette base, the vacuum processing chamber for processing the wafer and to a vacuum loader having a vacuum transfer chamber which is connected via a gate valve, the locking consisting of the conveying device and the load lock chamber and the unload lock chamber with gate valves for connecting the said vacuum transfer chamber apparatus and in the vacuum processing system vacuum processing apparatus is constituted with a plurality Tainami set in parallel include vacuum processing chamber for processing a wafer is vacuum processing chamber formed by the UHF-ECR reactor, vacuum processing chamber, and symmetrically with respect to the axis passing through the center of the vacuum transfer chamber and the locking device, and 2 only on the opposite side of the locking device around the vacuum transfer chamber 設けられ、かつ真空搬送室に対して前記２つの真空処理室の配置位置は鋭角をなしており、並設された複数の真空処理装置のすべての真空処理室に一直線上に配列される真空処理システムを提供する。 Provided, and positions of the two vacuum processing chamber to the vacuum transfer chamber is an acute angle, a vacuum process that is arranged in alignment with all of the vacuum processing chamber of a plurality of vacuum processing apparatus are arranged in parallel to provide a system 
【発明の実施の形態】以下、本発明にかかる一実施例を図面に基づいて説明する。 BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, will be explained based on an embodiment according to the present invention with reference to the accompanying drawings 
１０Ｂ，１０Ｃで示す。 10B, shown by 10C 
【００１８】図１に示す真空処理システムを説明する前に、図２から図４に基づいて真空処理装置を説明する。  Before describing the vacuum processing system shown in FIG  1, illustrating a vacuum processing apparatus on the basis of FIGS  2-4 
５ｂを介して連接された真空搬送室１６を備えた真空ローダ７と、前記搬送装置と前記真空搬送室とを連接するためのゲート弁を備えたロードロック室６ａおよびアンロードロック室６ｂからなるロック装置６とを含んで構成される。 5b a vacuum loader 7 having a vacuum transfer chamber 16 which is connected via consist load lock chamber 6a and the unload lock chamber 6b has a gate valve for connecting and said vacuum transfer chamber and the conveying device configured to include a locking device 6 
平行形に配置され、その位置および姿勢を変えることなく、装置への導入／払出しが可能な位置、すなわち、カセット１ａないし１ｃを略水平の平面上で常に一定の位置に固定される。 Arranged parallel type, without changing its position and orientation, the introduction / dispensing of the locations of the device, i e , always fixed to a constant position to free the cassette 1a 1c on a substantially horizontal plane  カセット台２ａおよび２ｂは、平行に隣合わせて配置してある。 Cassette tables 2a and 2b, are arranged side by side in parallel  カセット台２ｃは、最右端に配置してある。 Cassette table 2c is, are arranged on the top right edge  カセット１ａおよび１ｂは、処理を行うための末処理ウエハを収納したり、処理済みのウエハを回収するためのもので、複数枚（通常２５枚）の被処理基板であるウエハ２０が収納可能となっている。 Cassettes 1a and 1b, or storing the processed wafers end for processing, for recovering the processed wafer, the wafer 20 is a substrate to be processed in a plurality (25 pieces Normal) can be stored going on  カセット１ｃは、この場合、プラズマを用いたドライクリーニング（以下、「プラズマクリーニング」という。）を行うためのダミーウエハを収納したり、プラズマクリーニング後のダミーウエハを回収するためのもので、複数枚（通常２５枚）のダミーウエハ３０が収納可能となっている。 Cassette 1c in this case, dry cleaning using plasma (hereinafter, "plasma cleaning" hereinafter ) Or housing a dummy wafer for performing, for recovering the dummy wafers after plasma cleaning, a plurality (usually dummy wafer 30 of 25 sheets) has become can be stored 
とカセット１ａ，１ｂとの間でウエハ２０を、そしてロードロック室６ａおよびアンロードロック室６ｂとカセット１ｃとの間でダミーウエハ３０を授受可能に動作する。 A cassette 1a, the wafer 20 with the 1b, and operates to allow exchanging dummy wafer 30 between the load lock chamber 6a and the unload lock chamber 6b and the cassette 1c 
ａ，１５ｂを介して真空処理室であるエッチング処理室１１ａ，１１ｂが設けてある。 a, etching chamber is a vacuum processing chamber through a 15b 11a, 11b are provided  以下、エッチング処理室を例に取って説明する。 Hereinafter will be described taking the etching chamber as an example  真空搬送室１６内には、ロードロック室６ａ，アンロード室６ｂおよびエッチング処理室１１ａ，１１ｂとの間でウエハ２０またはダミーウエハ３０を授受可能に動作する搬送装置１４が設けてある。 The vacuum transfer chamber 16, load lock chambers 6a, unload chamber 6b and etching chambers 11a, conveying device 14 is provided that operates to allow transferring the wafer 20 or dummy wafer 30 between 11b  真空搬送室１６は、独立に真空排気可能な真空排気装置１７を装備している。 Vacuum transfer chamber 16 is equipped with a vacuum evacuable vacuum evacuation device 17 independently 
【００２２】ＵＨＦ−ＥＣＲリアクタのエッチング処理室１１ａ，１１ｂは、この場合、同一の構成で対称配置とされてエッチング処理が行われるようになっている。 The UHF-ECR reactor etching chambers 11a, 11b is in this case are symmetrically arranged in the same configuration so that the etching process is performed 
エッチング処理室１１ａを例に説明する。 The etching chamber 11a will be described as an example  エッチング処理室１１ａは、ウエハ２０を配置するための試料台を有し、試料台８ａの上部に放電部７ａを形成するように放電室が設けてある。 Etching chamber 11a has a sample stage for placing the wafer 20, the discharge chamber so as to form a discharge portion 7a at the top of the sample table 8a is provided  エッチング処理室１１ａは、放電部７ａへの処理ガス供給のためのガス導入装置１０ａを有するとともに、エッチング処理室１１ａ内を所定圧力に減圧排気する真空排気装置９ａを有し、放電部７ａの処理ガスをプラズマ化するための、この場合、ＵＨＦ波と磁場の発生手段を有している。 The etching chambers 11a, which has a gas introduction device 10a for processing the gas supply to the discharge portion 7a, having a vacuum exhaust device 9a for evacuating the etching chamber 11a to a predetermined pressure, the process of the discharge portion 7a for plasma gas, in this case, it has a generating means of the UHF wave and magnetic field 
９は、センサ１８からの計測値を所定値と比較して、エッチング処理室内のクリーニング時期を判断する。 9, the measured value from the sensor 18 is compared with a predetermined value to determine the cleaning time of the etching chamber  また、制御装置１９は、真空搬送装置１３および１４を制御して、ダミーウエハ３０をカセット１ｃおよびエッチング処理室１１ａないし１１ｂの間で搬送制御する。 The control device 19 controls the vacuum transfer apparatus 13 and 14, to the dummy wafer 30 to the cassette 1c and the etching process chamber 11a carrying controlled between 11b 
いずれかの方法によりウエハ処理またはプラズマクリーニングを実行する。 It executes the wafer processing or plasma cleaning by any method 
によって、カセット１ａ内のウエハ２０を下から順にエッチング処理室１１ａ，１１ｂに搬入し、それぞれのウエハ２０をエッチング処理する。 Accordingly, the wafer 20 to an etching treatment chamber in order from the bottom 11a of the cassette 1a, and carried into 11b, and each of the wafer 20 is etched  処理されたそれぞれのウエハ２０は、真空搬送装置１４および搬送装置１３によって、カセット１ａ内の元の位置に収納する。 Each wafer 20 processed by vacuum transfer apparatus 14 and the carrier 13 is housed in its original position in the cassette 1a  この場合、運転開始から終了に至る間、カセットの位置および姿勢を変えることなく未処理のウエハを取り出し、そして処理済みのウエハを未処理のウエハが収納されていた元の位置に戻して収納する。 In this case, while leading to completion of the start of the operation, it takes out an unprocessed wafer without changing the position and posture of the cassettes, and the processed wafer unprocessed wafer is accommodated back into position which is housed   このようにすることで、生産ラインの自動化への対応が容易で、且つ、ゴミの発生によるウエハの汚染を低減でき、高い生産効率と高い製品歩留まりを実現できる。 In this way, it is easy to respond to automation of production lines, and can reduce the contamination of the wafer due to the generation of dust can achieve high production efficiency and high product yield 
の処理が全て終り次のカセットの内のウエハ処理に移る前でも良い。 Of the process is good, even before moving on to the wafer processing of all end next cassette 
【００２７】プラズマクリーニングの実施にあたっては、次の順序で行われる。 The practice of plasma cleaning is performed in the following order  この場合、カセット１ｃに収納されたダミーウエハ３０（この
Context 3:  \eqref{eq:Oscalingass}, implies $\tilde f_O(x) \sim x^{\alpha} $ Comparing the finite-size behaviour in Eq ~\eqref{eq:O} with Eq ~\eqref{eq:Oscalingass} one actually infers,
\begin{eqnarray}
\alpha &=& \frac{1+ \Delta -2 \beta/\nu}{2 \, (4- \eta)}  \label{eq:alpha}
\end{eqnarray}
This equation, together with the hyperscaling relation $\Delta - 2 \beta/\nu= - \eta$ in two spatial dimensions, shows that the prediction $\alpha = 1/8$ of the Gaussian theory [see Eq  \eqref{eq:Ot}] can be obtained only when $\eta=0,$ which is the case for the IDLG (exactly) and the RDLG (approximately) but not for the LG  

On the other hand,  Eq ~\eqref{eq:alpha} predicts $\alpha = 1/10$ upon substituting the values of the critical exponents corresponding to the Ising  universality class (LG)  This is consistent with the numerical simulation results presented in the main text, see Fig  \ref{fig:ising}(b) therein 

\begin{figure}[th]
\vspace*{0 2 cm}
 \centering
 \includegraphics[width=10 cm]{ /compare_binder pdf}

\caption{Comparison between the temporal evolution of the Binder cumulants $g$ corresponding to the $12^{th}$ transverse mode, $i e



ground_truth: Multiple vacuum processing apparatuses are arranged in parallel.

prompt_front: Now, answer the following question based on the text below, only give me the answer and do not output any other words.

Question: What is the scaling form for the alternative order parameter O?

Read the following text and answer briefly.

Context 3: ,$ with $n_\perp =12,$ in the LG (lowest curve), IDLG and RDLG (two upper curves) on a $32 \times 32$ lattice  \label{fig:b}}
 \label{fig:binder}
\end{figure}


The emergence of this new value $1/10$ of the exponent $\alpha$ must be traced back to the non-Gaussian nature of higher fluctuating modes in the LG  In fact, even though the lowest mode behaves identically in all the three models we considered,  characterized by the same behaviour of $m$, higher modes show a significant difference in the non-driven case   


To illustrate this, we measured the Binder cumulants of higher modes which is defined  analogously to Eq ~(11), using transverse modes other than the first, i e , with $\mu=\tilde \sigma(0,2 \pi n_\bot/L_\bot)$ and $n_\bot>1 $  
 Figure \ref{fig:b} compares the same for all the three lattice gases for the mode with $n_\perp =12$ on a $32 \times 32$ lattice  Clearly, the curve corresponding to the LG (lowest, blue) departs from Gaussian behaviour $g=0$ (in practice, $e g ,$ $|g| \lesssim 0 005,$ corresponding to the shaded gray area) much earlier than it does for the IDLG  or RDLG (two upper curves, red and green respectively) 

Accordingly, the different dynamical behaviour of $O$, which involves a sum over all modes, can be attributed to the non-Gaussian nature of the higher modes in the LG  
Such a departure is not entirely surprising  In fact, for higher modes, mesoscopic descriptions such as the ones in Eqs  \eqref{eq:L-DLG} or \eqref{eq:g_evol} are not expected to hold, while the anisotropy at the microscopic level could be the mechanism leading to the Gaussianity of higher modes in the driven models 





ground_truth: O(t, L_{\parallel}; S_\Delta) = L_{\parallel}^{-\beta/[\nu(1+\Delta)]} \tilde f_O(t/L_{\parallel}^{z/(1+\Delta)}; S_\Delta).