Inorganic chemistry and ceramics, Polymer chemistry

# Coating technology for manufacturing of semiconductor devices

Keyword: Anti-plasma etching film, CVD, Silica glass window

Organizations Involved

○ Hidetoshi Saitoh, Professor, Nagaoka University of Technology

○ Syuji Tokita, President, Tokita CVD Systems

○ Daisuke Tanaka, President, CVD Products

## 【Abstract】

This collaboration includes technology, apparatus and consulting related to oxide film-coating technique used for surface protection of the anti-plasma etching parts without vacuum deposition system, invented and developed at Nagaoka University of Technology. The atmospheric CVD apparatus and anti-plasma films of yttria, magnesia and so on are developed and supplied by Tokita CVD systems Co. Ltd. In addition, CVD products Co. provides analytical service and advice for film formation.

## [Summary of the technology transfer]

## Technological Impact

Our CVD technique realizes deposition of all kinds of oxide films in the atmosphere without employment of vacuum system. Especially, anti-plasma films including yttria film are widely applied for the parts such as silica glass window attached to the manufacturing apparatus of semiconductor devices. These technologies are fully supported by analytical service and consulting with high intelligence and deep experience in the field of nano-technology.

## Market Impact

During 3 years, sales of our CVD apparatus, coating service and consulting reached 100 million yen, 50 million yen and 20 million yen, respectively. Total sales volume is increasing by approximately 10% for each year. Our collaboration contributes to growth of industry for not only semiconductor devices but also optical filters.

## ●Social Impact

Our collaboration contributes to development of the companies which orient to R&D and small businesses works, with providing CVD apparatus, coating service and consulting. Two presidents, doctor degree holders, backup activities for these companies with experience and knowledge for coating technology.

Saitoh

## Project Background

Dr. Tokita and Dr. Tanaka are alumni of the laboratory of professor Saitoh, who obtained CVD techniques during Ph. D. student. Experiences on the CVD technology of them are applied for their works with support from NICO organization.

## Funding History

H11 R&D grant from Niigata Pref.

H12 Development of creative technology program, JST

H13-15 NEDO Consortium R&D project for regional revitalization

H17 R&D grant from NICO

## I ntellectual property protection

Patent: domestic 9, US and others 1, Manufacture method and material of titanium dioxide film with orientation", Patent applied: domestic 87, US and other 5, "Atmospheric CVD apparatus" Tokita

Tanaka

## Yttria anti-plasma film

Yttria coating on the silica glass window protects surface from etching.

Atmospheric CVD apparatus

## Turning point in the Project

There is no easy way to introduce new technology. Engineers should go to university and update information about new technology to transfer new concepts. The manager should regret not sending engineers to university and only paying research funds to get new technology from university.