Mechanical equipment

# Development of novel thin-film deposition method.

Keyword: Novel thin-film deposition method, Collaboration with device companies for technology transfer

Hideki Matsumura, Professor, School of Materials Science, Japan Advanced Institute of Science and Technology

Organizations Involved

☐ ULVAC, Inc.

☐ Canon-ANELVA Corporation

H.Matsumura

## 【Abstract】

A novel low temperature thin-film deposition method named "Cat-CVD method" has been proposed, and the fundamental deposition mechanism has been clarified at Japan Advanced Institute of Science and Technology (JAIST). Collaboration with device companies based on the research results using Cat-CVD method led to realization of practical equipment. Also, we have created software and documents for end-user support in using this equipment.

## [Summary of the technology transfer]

●Technological Impact

• Film deposition mechanism in Cat-CVD method has been clarified and Cat-CVD equipment have been utilized to mass-produce equipment.

• Thin-film solar cells can be fabricated with one-tenth material gases compared with conventional method because of high efficiency of material gas use.

• Highly dense films (compared with conventional methods) can be formed by Cat-CVD method without serious damage to substrates during deposition, so that the films formed have high gas barrier property against moisture and oxygen.

• The application field of Cat-CVD technology has been spreading, to formation of silicon and silicon nitride thin films, removal of organic materials by high-density hydrogen radicals, and formation of organic films such as Poly-Tetra-Fluoro-Ethylene (PTFE).

● Social Impact

• Solar cells attract attention as an influential technology to reduce $ CO_{2} $ , which causes global warming. Due to global lack of crystalline silicon, which is widely used as a material in solar cells, production of solar cells using substitute materials such as thin-film silicon is increasing. This Cat-CVD technology contributes to reduction of material cost for fabrication of highly-efficient solar cells substituting for fossil fuels.

• In the field of semiconductors, thin films with less hydrogen content (compared with those formed by conventional methods) are utilized in formation of integrated circuits with long life.

• Stacked films formed on plastic sheets have high gas barrier property, and are utilized for packaging of foods and medicines.

## Project Background

Advantages of Cat-CVD technology over conventional methods have been announced with the support of device companies, resulting in joint research projects with a number of companies related to devices, parts, and materials.

## Funding History

1. 1998~2001 NEDO Project

2. 2001~2003 NEDO Development Business Project

3. 1995~ Collaboration with Device Companies

Cat-CVD equipment for compound semiconductor devices (Canon-ANELVA Corporation)

## I ntellectual property protection

1. Patent Wo2002-025712 "Heating element" JP. US. EP.

2. Patent JP3787816 “Heating element CVD system and connection structure…”

3. Patent App.No. JP2006-172709

Large-scale Cat-CVD equipment for solar cells (ULVAC, Inc.)

## Turning point in the Project

O Continuous scientific investigation led to understanding of deposition mechanism.

O Related research has continued until realization of practical Cat-CVD equipment.

O Co-research with device companies was started after sufficient instruction regarding fundamental Cat-CVD technology.

O Frequent attendance at exhibitions resulted in discovery of novel applications.