Chemical vapor deposition of diamond | Wikipedia audio article
Channel: wikipedia tts
Date: 2018-12-29

This is an audio version of the Wikipedia Article:
https://en.wikipedia.org/wiki/Chemical_vapor_deposition


00:01:26 1 Types
00:09:08 2 Uses
00:11:03 3 Commercially important materials prepared by CVD
00:11:16 3.1 Polysilicon
00:12:58 3.2 Silicon dioxide
00:18:31 3.2.1 Silicon nitride
00:20:26 3.3 Metals
00:23:14 3.4 Graphene
00:29:40 3.5 Graphene nanoribbon
00:30:45 3.6 Diamond
00:36:00 4 Chalcogenides
00:36:33 5 See also



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SUMMARY
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Chemical vapor deposition (CVD) is a deposition method used to produce high quality, high-performance, solid materials, typically under vacuum. The process is often used in the semiconductor industry to produce thin films.
In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-k dielectrics.