Hybrid Physical-Chemical Vapor Deposition | Wikipedia audio article
Channel: wikipedia tts
Date: 02/05/2019

This is an audio version of the Wikipedia Article:
https://en.wikipedia.org/wiki/Hybrid_physical%E2%80%93chemical_vapor_deposition


00:01:01 1 System configuration
00:03:09 2 Magnesium diboride thin films by HPCVD
00:04:16 2.1 Principle
00:05:18 2.2 Pure films
00:06:40 2.3 Carbon-alloyed films
00:07:57 3 See also



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SUMMARY
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Hybrid physical–chemical vapor deposition (HPCVD) is a thin-film deposition technique, that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). 
For the instance of magnesium diboride (MgB2) thin-film growth, HPCVD process uses diborane (B2H6) as the boron precursor gas, but unlike conventional CVD, which only uses gaseous sources, heated bulk magnesium pellets (99.95% pure) are used as the Mg source in the deposition process. Since the process involves chemical decomposition of precursor gas and physical evaporation of metal bulk, it is named as hybrid physical–chemical vapor deposition.