New development of atomic layer deposition: processes, methods and applications | RTCL.TV
Channel: STEM RTCL TV
Date: 19/06/2023

### Keywords ###
#atomiclayerdeposition #thinfilm #moleculardynamics #computationalfluiddynamics #RTCLTV #shorts

### Article Attribution ###
Title: New development of atomic layer deposition: processes, methods and applications
Authors: Peter Ozaveshe Oviroh, Rokhsareh Akbarzadeh, Dongqing Pan, Rigardt Alfred Maarten Coetzee ,and Tien-Chien Jen
Publisher: Taylor & Francis Group
DOI: 10.1080/14686996.2019.1599694
DOAJ URL: https://doaj.org/article/3f867f8de01b4867bfdc807bfe687470
Source URL: http://dx.doi.org/10.1080/14686996.2019.1599694



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### Video Timestamps ###
0:00:00 - Summary 
0:00:30 - Title 
0:00:37 - End