MEMS Photolithography in the HMDS Process
Channel: Easys engineering
Date: 2024-01-02

HMDS Photoresist Adhesion applies a light-sensitive material to a substrate, usually a silicon wafer
HMDS after then measured contact angle image
Contact angle of water droplets on various HMDS-modified alumina surfaces. 

(a) three times (4-h) HMDS modified thin film alumina surface
(b) one-time (4-h) HMDS-modified nonporous alumina surface
(c)   three times (4-h) HMDS-modified  nonporous alumina surface
(d)   one-time (9-h) HMDS-modified  nonporous alumina surface.