Plasma-enhanced chemical vapor deposition | Wikipedia audio article
Channel: wikipedia tts
Date: 29/12/2018

This is an audio version of the Wikipedia Article:
https://en.wikipedia.org/wiki/Plasma-enhanced_chemical_vapor_deposition


00:00:39 1 Discharges for processes
00:03:41 2 Reactor types
00:06:30 3 Origins
00:07:11 4 Film examples &amp; Applications
00:09:35 5 See also



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SUMMARY
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Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by radio frequency (RF) (alternating current (AC)) frequency or direct current (DC) discharge between two electrodes, the space between which is filled with the reacting gases.