#rC3 -  I could not resist
Channel: media.ccc.de
Date: 2020-12-31

https://media.ccc.de/v/rc3-11364-i_could_not_resist

Resists for Electron Beam Lithography (EBL)

Photoresists are one of the essential ingredients for chip manufacturing and micro/nano engineering.
We will show how we’re using them in a DIY Electron Beam Lithography set-up and how you’re able to cook your own cheap resists and mix your own developers.




Resists? What's that?

    What are their applications
    How does it work (types (positive/negative), chemistry, proximity effect, dosage etc)


EBL? What's that?

    How does it work
    Pros & cons:  comparison between EBL (slow) photolithography (fast)
    Which resist can I use for EBL


DIY cooking of PMMA based resists

    Comparison of different solvents


Composition of different developers

    Comparison of different developers


Applications

    Usage as a mask
    Usage as a structural dielectric material
     ...(?)

The EBL exposure process

    simple SEM retrofitted with an EBL controller
    The common file formats (GDSII & OASIS)
    Scan-Gen: how to generate the proper curves for the exposure
    Hardware: off-the-shelf embedded modules like the RedPitaya
    Generation of different filling curve styles, calibration, compensation of the proximity effect, correction of the SEMs intrinsic parameters, dosage!
    Fiducial detection and alignment for multi-pass/multi-layer processes

Stuff comes together

    walk through the complete process along a simple example


More Examples

Thanks & Credits

Q & A





N00DL3

https://fahrplan.events.ccc.de/rc3/2020/Fahrplan/events/11364.html