SYSTEM SOLUTION FOR SPECIFIC APPLICATIONS / WAFER LEVEL OPTICAL CHARACTERITIC MEASUREMENTSynos

WAFER LEVEL OPTICAL CHARACTERISTIC MEASUREMENT SYSTEM FOR LIGHT EMITTING DEVICE
Wafer level testing of optical characteristic for light emitting device such as VCSEL in combination with manual/semi automatic prober system

Wafer level optical characteristic measurement system for light emitting
device is the system that analyzes electrical and optical characteristics of lightemitting device like VCSEL at wafer level. In addition to electrical characteristics
measurement, optical characteristics, such as NFP, FFP, IVL, polarization, etc, canbe measured at wafer level. By combining prober systems for semiconductor
failure analysis, such as semi-automatic/manual probers, with our highperformance optical measurement optics for prober M-Scope I/PFW, FFP
measurement optics M-Scope type F, IVL measurement module PMD002/IVL,
polarization measurement module PMD002/POL, etc., various characteristics aremeasured under wafer level. In addition, it can be used for automatic measurement of mass-produced devices in combination with the semi-automatic prober.
【Features】○Wafer level measurement of various electrical and optical characteristics of light emitting
device like VCSEL in combination with semi-automatic/manual prober.
○Achieves automation of various measurements combining with the semi-automatic probersystem. Applicable from oﬀ-line measurement of individual elements to in-line measurement.
○high-performance optical measurement optics M-Scope series and photometric module●High functional optical measurement optics designed for wafer level optical beam analysis.
○Prober interlocking optical measurement software Optometrics customized version for LD●Semi-automatic prober control and analysis automation, collection of measured data,
uniﬁed management of measurement types and measurement recipes, etc.

●Optical measurement optics forprober M-Scope type I/PFW【Prober interlocking optical characteristic measurement software “Optometrics
Customized Version for LD”】
This software has been developed for wafer-level optical element measurement, which automates analysis by controlling and linking
the semi-auto prober, integrates electrical and optical characteristic data collection, and manages measurement types andmeasurement recipes. A wide range of support is available, from oﬄine measurement to in-line automatic measurement. Themeasurement item customizes the software according to the measurement target, measurement content, measuring instrumentused, measurement procedure and operation.
《Typical measurement items》○electric and optical characteristic of light emitting device such as VCSEL●I-V-L characteristic, optical beam proﬁle (NFP/FFP), polarization characteristic, spectrum characteristic, etc.
*Measurement instrument corresponding to each measurement is required.

○FFP measurement○IVL measurement○Optical spectrum measurement【Wafer level optical characteristic meausurement system for light emitting device】
Polarization data

Image for prober setting/probe contact, etc.

FFP imageNFP image

PMD002/POL〇Probe positioner, probe

Measurement light(optical ﬁber)○Measurement instruments *Measurement instrument
corresponding to each measurement s required.
●Optical spectrum measurement instrument
Optical spectrum analyzer MS9740A, etc.

M-scopetype I/PFW●SMU
Source measurement unit 2636B
Pulse LD test system 2520, etc.

M-Scope type F●for micro current

Adjustment stage
system for optics

Control &〇Stage system controller data collection●for high frequency
etc.

Device drive,measurement data

●Prober system control software

DUT (Wafer sample)

Control

Control

PMD002/IVL〇Prober control system〇System control & management system●Prober interlocking optical characteristic
measurement software Optometrics Customizedver. for LD*Management of wafer map, probing,prober adjustment
Control〇PC for prober control

Semi automatic prober system

Interlocking
control〇PC for system control &management*We will propose system with various conﬁgurations and speciﬁcations depending on the measurement sample, speciﬁcations, operating method, and budget.

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