MMC Activities..............1
TOPICS.......................5
Members’ Profiles .........6
Worldwide R&D ............8

MMC Activities

The 8th International Micromachine / Nanotech Symposium
The 8 th International Micromachine / Nanotech
Symposium was held at the Science Museum in
Kitanomaru Park, Tokyo, on November 14, 2002. The
symposium program began with an opening address by
Mr. Toshiro Shimoyama, Chairman of the Micromachine
Center, followed by a guest speech by Mr. Masakazu
Toyoda, Director-General of the Manufacturing
Industries Bureau, METI. In his address, Mr. Toyoda not
only spoke about the importance of MEMS technology,
which integrates nanotechnology, to Japaneseindustry, but also expressed words of encouragement
regarding promotional activities of the Micromachine
Center.
The symposium was very successful, with the venue
packed to almost full capacity. In total, participants
numbered 311, including 227 registered participants,
presenters, members of the press and others.
A special lecture presented by Professor Isao
Shimoyama of the University of Tokyo, "Strategy towards
Fusion of Nano and Micro Systems," attracted thegreatest attention within the industries. Painting animage of the future of Micromachine and MEMS using

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the slogan "Nano on Micro," Professor Shimoyama stated
that, in particular, the development and industrializationof devices with high added value and into which nanomaterials or technologies have been actively
incorporated are vitally important for Japan's future.
Other presentations included "The Path to New
Industries in the 21st Century," "Innovative R&D," and"National Strategy for Micro/Nano Fusion Domain." In all,a total of thirteen invited speakers, including four fromoverseas, addressed the symposium.
Of the registered participants, 82% were industryrelated researchers or management persons, 12%belonged to public agencies such as the National
Institute of Advanced Industrial Science and Technology(AIST), 5% from universities, and 1% were from otherprofessions. This breakdown is especially indicative of
the high interest in this symposium shown by
researchers in the industries.
The next symposium, The 9th International
Micromachine / Nanotech Symposium, is planned for
November 13, 2003 (Thursday).

Strategy towards Fusionof Nano and Micro Systems
Isao Shimoyama,
Professor,
Department of Mechano-informatics,
Graduate School of Information Science and Technology,
The University of Tokyo
being emerged through this movement. The fact that
there is intrinsically a high probability of movement isextremely advantageous, particularly in the small
nanoworld. Therefore, it is sufficiently conceivablethat Micromachine can be industrialized as nextgeneration devices, using their advantageous shapes
and functions, and not simply as an extension of ICs
and VLSI.

As I was introduced, my name is Isao Shimoyama.
Allow me to explain how I came to be speaking at this
symposium today on a "Strategy towards Fusion of
Nano and Micro Systems." The Micromachine Centergave me an assignment to consider the state ofMicromachine, or MEMS, five or ten years from now.
For this reason, I was allowed to participate in various
committees at the Micromachine Center. Based on myfindings, I would like to relate to you what course I
believe Micromachine, or MEMS, will take in themedium- to long-range future.

Anticipated Manufacturing Technologies andMaterials

Although the English title for my discourse is"Strategy towards Fusion of Nano and Micro Systems,"
I will reveal the conclusion of my study first by sayingthat R&D in the field of Micromachine, or MEMS, will
shift decidedly toward devices replete with functionsin the fields of nanotechnology and nanomaterials.
From this viewpoint, the key phrase of my speech willbe "nano on micro," as I would like to talk to you about
how the products of nano materials and technology
will be provided on microsystems.

While it may be far in the future, I believe it is an
important issue in manufacturing technology to
discuss how we can put functions emerging on
nanoscale to practical use. Further, it will be
extremely important to develop new nanomaterials,
and manufacturing technologies for mass-producing
these nanomaterials at a low cost, since we have notyet been able to industrialize nano emerging functions
that were first emergence on a nanoscale. In a sense,taking advantage of such as self-assembly phenomena
on nanoscale and to obtain nanomaterials or nanoemerging functions is what we call a bottom up
approach. In contrast, Micromachine technology is an
example of a top down approach used to process suchas surfacing and removing by micro-machining
methods that enabled microfabrication, assembly, andsystems, as represented by lithography. These typesof processes have raised the potential of
manufacturing technology through innovation.
Microfabrication systemization is another anticipatedmanufacturing technology for achieving 3-dimensional
high-density integration, multiple functions, andfabrication of not only silicon, but also ceramics,
polymers, and other materials together. High-speed
analysis and sensing technologies in microarea havebegun to be developed in microchemical processes
and the field of µ-TAS. These technologies will be
used to create a society and a lifestyle with satisfactionin which we can feel growth and development. Whenconsidering these from the binding of information, we
can anticipate ubiquitous environments in whichanyone, anywhere, at anytime can access data or
another person with ease; and an environment inwhich an individual like me, only here and now, canobtain an order-made product or a regional service;

Features of Micromachine and Industrialization
To define Micromachine and their potential
industries from the unrestrained standpoint of theuniversity, the first thing we observe is that theelements of Micromachine are extremely small,allowing for the manufacturing of dense and highly
integrated devices. For example, it is possible tomanufacture machines from elements strung onedimensionally in a long line, as in the example of anendoscope. By densely integrating elements twodimensionally, it is possible to develop thin,lightweight televisions like wallpaper, for example, or
extremely thin displays used in cell phones and thelike. And while it may be possible to manufacture
Micromachine that can be used in specific medical
environments, it is also conceivable that there would
be a large market for industries providing extremely
small, lightweight, and thin devices. Another greatfeature of Micromachine, or MEMS, is their capacity tocontain a driving unit, unlike IC or VLSI technologies.
Based on the strict definition of movement, even an
immobile solid object has within it molecules andatoms that are moving, and numerous functions are2and a safe and secure living environment in which our
privacy is protected when accessing a network. These
are the goals of a vision to provide satisfying lifestyles
to users. I have provided this scenario to show thatthe use of these technologies can elevate Japan to the
top level internationally.

networks, learning and education, and security.
Industries include semiconductors, system LSI,
sensors,
micro-fabrication,
Micromachine,communications, content services, and fuel cells. With
that in mind, what policies should we consider forthese technologies? Since it is quite difficult to
produce products simply by using of emerging
nanofunctions and nanomaterials, it is necessary to
promote manufacturing technologies in the micronano fusion domain or research on the fusion ofsystemization technologies and to establish ameasurement evaluation technology. We must
develop a foundation for the technology transfer fromuniversities and development of these technologies inindustries, R&D systems at National Institute ofAdvanced Industrial Science and Technologies, andR&D typified by foundries that use these facilities. We
must create an infrastructure that can reduce barriers
as much as possible, enabling anybody with an idea toparticipate in this industry or its research anddevelopment. I would like to ask government to fill up
a mechanism or infrastructure at the national level fordeveloping creative products through the active
cooperation of industries in applying fundamental basetechnologies.

Innovation
Innovation required to achieve this goal includes
progress in wearable, mobile, and interfacing
technologies. For example, we are able to produce
super-small batteries and low-power CPUs, or are
becoming capable of producing them. We havedeveloped, or will soon develop, sensors that appeal to
the five senses, including hearing, sight, smell, andtouch, or that correspond to stimuli of the senses, aswell as devices that present and display these senses.
Using Micromachine technology, we can develop light,
thin devices. We can develop flexible devices usingorganic materials. Other innovations are devices thatcan display 3D images that are made from the above
technologies to be light, thin, and flexible enough tofold up and put in your pocket. Also, opticalcommunications or sensors placed on networks areappearing as innovations in the wearable, mobile, andinterfacing fields.

Conclusion
A recent newspaper article commented thatJapan's manufacturing technologies have still globallycompetitive. In general, businesses are not healthy
and tend to look toward short-term profits, as in how
something will be profitable a half-year or a year fromnow. However, an issue being discussed at theuniversities is that we must strengthen ourcompetitiveness while we are still strong. If we do not
conduct R&D for the mid-term and long-term while
outlining dreams that are feasible now, I ask you what
will we do when Japan's strong manufacturing
technologies die out? How will Japan survive in the
future? The focus of our R&D should be ontechnologies vital for strengthening Japan, including
micro-nano manipulation of 3-dimensional
MEMS/NEMS, design simulation, and MEMS andNEMS created from multiple materials. Finally, I am
often told that infrastructure as well as cooperation
between industry and academia and the fostering of
human resources is extremely vital. While cooperation
between industry and academia creates anatmosphere in which universities are required to
execute everything up to product development, themost important mission for universities is to educateand to develop seeds. Through the combination ofhealthy industries and university initiative, I hope wecan generate a great surge in the field. As we progress
into the 21 st century, Japan must continue to takeaction and earn respect in order to occupy aprestigious position in the world. For this reason, I
conclude that there is no more time for debate.

Robots as an Example Achievement
When we see these from the viewpoints of robots,
it has applications in such areas as healthcare, welfare,
information, everyday living, safety and security.
There are surgical robots in medical care. In welfare,
we have nursing robots and attendant robots. In thefield of information, there are human-like robots,robots with no strength but serving as an interface.
There are robots that help with various householdchores and, at night, can feasibly serve as nightwatchmen. If we broke down these robots into desiredelement technologies, we would have such abilities as
taking diagnoses and giving medical care at theinvasion stage of disease, reading vital signs, sensing
and displaying the five senses, and performing wirelesscommunications or telemetry. We would also like therobots to have a soft quality, an actuator, and a battery
that can be powered externally, as well as reliability
and adaptability to society. Breaking down
manufacturing technologies into the key technologies,
naturally one large key or breakthrough is MEMS, or
what we are calling Micromachine technology. Using
technologies to fuse these with nanoarea, we havebeen able to emerge new functions in nanoarea andhave developed devices that can use soft, thin, andnarrow curved surfaces, as well as small devices thatare dense and highly integrated.
Policies and Markets
Markets for these technologies include devices,3

The 13th Micromachine Exhibition:"Micromachine 2002"
The 13th Micromachine Exhibition, "Micromachine
2002," was held in conjunction with The 8thInternational Micromachine/Nanotech Symposium at
the Science Museum in Kitanomaru Park, Tokyo, for 3
days from November 13 to 15, 2002.
In addition to the Micromachine Center and 11 of
it's supporting member organizations, generous
cooperation in the arrangement of exhibitions was also
provided by private businesses, universities, andindependent public organizations. A total of 187
displays were exhibited by representatives of various
businesses, academic groups, universities, and researchorganizations. The theme for this year's exhibition was
this event centered on realizing an international
exhibition focusing on super-accuracy, nanofabrication, and nano-technology that will open up new
frontiers in size reduction and precision. France's
National Center for Scientific Research (Centre
National de la Recherche Scientifique) and five otherorganizations from abroad also presented exhibits.
In accordance with the increased number of
exhibitors, the Micromachine 2002 exhibition
occupied, for the first time, the entire first floor hall
space of the Science Museum.
Furthermore, a total of 72 businesses and academic
groups took part in the exhibition as newcomers, and awide range of new technologies and products in the fields
of nano-technology and micromachines were presented.
Thanks in part to the exhibition being held inconjunction with the 8th International Micromachine /Nanotech Symposium, a record attendance of 8,424
people was achieved over the three days of the event.
Researchers, engineers, and administrators from thefrontlines of various technological fields accounted fora large number of these attendees, and through theexchange of ideas and sharing of research information
with colleagues from other fields, the exhibition
provided an ideal opportunity for discussion of thepossibilities for new technologies and to resolve a wide
range of developmental issues.

The main products displayed at the exhibition
included micromachines, their associated components,
and application systems; MEMS-related systems;
biotechnology and medical systems; technologies,
equipment, and materials associated with precision
fabrication and production; evaluation andmeasurement devices; software; and nanotechnologies. In this regard, Micromachine 2002 wasideally suited to researchers, engineers, designers,
manufacturers, and managers from fields such asmechanisms and precision machinery; electricaldevices and electronics, medicine; information
technology; automobiles and transportation; biology,
physics, and chemistry; architecture; metallurgy;
space aviation; and shipping and oceanography.
Furthermore, the exhibition provided an excellent
opportunity for the promotion of technologies,
devices, and products by businesses in the field of
micromachine research and development; for thepresentation of the results of research projects byuniversities and other research organizations, and forthe announcement of products and technologies byother newly participating businesses. On its opening
day, the exhibition was visited by Mr. Yoshifumi Fujita,
Director of the Industrial Machinery Division of METI's
Manufacturing Industries Bureau, who spoke at thereception that was held following the exhibition.

The exhibition hall, packed with attendees.

Attendees at the post-exhibition reception

Micromachine 2003 will be held from
November 12 (Wednesday) to 14(Friday), 2003 at the Science Museum,
Kitanomaru Park, Tokyo.
Inquiries : Mesago Messe Frankfurt Corporation
Tel : 0 3 - 3 2 6 2 - 8 4 4 1
Fax : 0 3 - 3 2 6 2 - 8 4 4 2
Email : micro@mesago-messefrankfurt.com
URL : http://www.mesago-messefrankfurt.com/micro

4

TOPICSµTAS 2002
Since an increase in the number of abstract
submissions accompanied this increase inparticipation, speeches were held in parallelsessions, using the same format employed in theprevious year. As a result of the increase in poster
presentations, 66 oral presentations and 257 poster
presentations were selected from among 460
submissions, equivalent to an approximate 70%
acceptance ratio. Since µTAS is limited in its fields
and has a higher acceptance ratio than that for
MEMS, transducers, and the like, the international
conference is thought to be an excellent opportunity
to learn about the latest trends in the field.
However, while the conference provides many
advantages, such as the possibility to hear
explanations of poster exhibits firsthand from theresearchers, this conferences was mildly
disappointing in that the posters had to be replaced
daily due to the limited exhibition space and visitors
could not view posters at after hours, as is possible
overseas when the conferences are held at hotels, forexample.
The percentages of presentations broken down by
region were 40% from the U.S., 24% from Europe, and
36% from Asia. This distribution was more balanced
than the previous year, when North America
accounted for approximately half of the presentations,due to the effects of the simultaneous terrorist
attacks.
In the early 90s, the application of a sensing
technology using capillary electrophoretic separationand fluorescent light in on-chip DNA analysis set thestage for developments that put µTAS research inthe spotlight. As with last year, there was an
astounding number of presentations on DNA,
proteins, cells, and other matter that originates inorganisms. Further, presentations emphasizing
applications of MEMS devices were more numerous
than those on devices themselves, such as
micropumps.
These trends showed an increase in studies on
performance enhancements in more practical areasof DNA analysis and an increase in cases using actual
samples rather than reference materials andalternate materials. The study trends also revealed ashift from DNA and proteins to cells. One
presentation commented on the production of chips
used for hemanalysis that are developed from layersof plastic molded components. There appears to bea lot of activity in the formation of nanostructures
through a combination of disposable chips andsurface modification, polymer materials and theirprocessing techniques, and device development.
Next year the conference site will shift back to
America. µTAS 2003 is scheduled to be held in Squaw
Valley, California, from October 5 to 9, 2003.

µTAS2002 (The 6th Micro Total Analysis Systems
2002 Symposium) was held at Nara New Public Hall in
Nara, Japan, from November 3 to 7, 2002.

Fig. 1 Nara New Public Hall

ParticipantsThis was the sixth holding of the international
conference, which began in 1994 as a small-scale
workshop held in Enschende, Netherlands. Initiallythe conference was held in alternate years, but after
the year 2000 the conference was switched to anannual format in order to accommodate the increase inparticipants. The number of participants at µTAS
2002 exceeded 700.

800
700
600
500
400
300
200
100
0
1994

1996

1998
Year

2000

2002

Fig. 2 Trends in participation

Submissions

500
400
300
200
100
0
2000

2001

2002

Year
Fig. 3 Trends in abstract submissions

5Members' Profiles

Oki Electric Industry
Co., Ltd.

1. The Challenge of Micromachine Technology
Oki Electric first became involved in
micromachine/MEMS-related technology in the 70s by
developing an anisotropic etching technique for siliconthat was applied to the production of high-voltage
thyristor switches used in electronic exchanges. First,
KOH is used to etch about 50 microns from the surface
of a silicon wafer, forming a V-shaped channel. Afteroxidizing the surface of the wafer, the channel isimplanted with polysilicon. The silicon substrate on
the bottom of the wafer is polished, ultimately forminga high-voltage device on a silicon island surrounded byan oxide layer. The technology was developed by
Nippon Telegraph and Telephone Public Corporation(present-day NTT). Oki Electric also participated as amember of a fact-finding committee (chairman: Prof.
Kyoichi Ikeda, Department of Mechanical Systems
Engineering, Faculty of Technology, Tokyo Universityof Agriculture and Technology) concerned with theconcept of a foundry network system for micro andnano production technologies and has actively worked
toward achieving practical MEMS devices.

Fumio Ichikawa
General Manager of the VLSI Research Center

outer dimensions equivalent to the size of thesemiconductor chip. Oki Electric is developing a nextgeneration rerouting technology for forming Hi-Q
passive devices (e.g. inductors and capacitors) on thesurface of semiconductor chips by decreasing the size
and increasing the layers. In this way, passive devices
that to date have been provided externally can be built
into high value-added semiconductor packages (nextgeneration W-CSP).
(3) Optical Interconnections
Electric wiring on printed circuit boards cannot
keep pace with the decrease in size of LSI wiring andthe improvements in clock speed, resulting in a
problem known as an I/O bottleneck that limits theperformance of the overall system. Opticalinterconnections are attracting attention as atechnology for solving this problem. At Oki Electric,
we are studying optical chip interconnections using
free space based on the understanding that the ability
to increase channel density, enabling light to crosswithout interference, can be used to achieve
multichannel interconnections over short distances.

2. Development of Micromachine Technology(1) Accelerometer
Oki Electric is developing small, high-performance
3-axis accelerometers for use in portable devices, invehicle units, games, industrial equipment, security
equipment, and the like.
(2) RF-MEMS/W-CSP
Using a photolithography rerouting technique, weare developing and mass-producing wafer level CSP(W-CSP), which are extremely thin, light-weight, andcompact packages ideal for mobile devices and haveThree-axis accelerometer

3. Future Challenges
In addition to our silicon processing technologies
fostered through many years of LSI production, Oki
Electric works closely with its customers to provide a
micromachine/MEMS foundry service based onprocess control and quality control technologies thathave been shaped by strict market quality
requirements. Oki Electric is flexible in supporting
various types of services, from undertaking part of theclient's processes to undertaking the entire process
and design, including joint projects with alliancepartners.

RF-MEMS/W-CSP

6

Nikon Corporation

1. The Challenge of Micromachine Technology
Nikon has been engaged in technical development
related to micromachines for a relatively long time,
including working in cooperation with the Yoshida
Nano-Mechanism Project in 1986 to develop a probe
for a special scanning tunneling microscope. Nikon
has also developed its own micromachine devices,
including the following:• Probe for a scanning probe microscope• 3-dimensional accelerometer• Microgripper• Microknife• Non-cooled infrared image sensor
2. Development of Micromachine Technology
Here, we will introduce some representative devices
and related technologies developed by Nikon thus far.
To begin with, we will introduce a microgripper for
manipulating small objects under a microscope as an
example of bulk micromachining (Fig. 1). Thin film
fingers having a thickness of 0.7µm and a length of
600µm are controlled under a microscope using amaster-slave system. With this microgripper, it waspossible to manipulate eggs and protozoa between 20
and 100 microns in size using a gripping force of about
10 nN. The gripper was also used to construct asystem capable of performing in-situ measurements todetermine the hardness of microobjects. Through thisdevelopment, we established basic processing

Yosuke Takahashi
President of Core Technology Centertechnologies and evaluation technologies regarding
self-supporting thin films. This microgripper can beconsidered a special micromachine for its capacity tooperate in a solution.
Next, we will introduce a non-cooled infrared sensor
as an example of surface micromachining (Fig. 2).
Infrared light received from the back of a substrate isconverted into heat, causing the bimorph unit todeform, which in turn tilts the mirrors integrated in thebimorph unit. The slopes of the integrated mirrors
enable thermal images to be obtained by a 2dimensional CCD that detects all visible light. Recent
devices have been successful in obtaining accurate
thermal images without requiring special temperature
control by canceling deformation caused by temperaturechanges in the outside air. Basic properties of theinfrared sensor include a pixel size of 55µm, a resolutionof 160x120 pixels, and a sensitivity of 2.8 mV/K.
3. Future Challenges
Nikon hopes to continue developing usefulmicromachines for data communications andbiotechnology, while utilizing aspects of its
technologies such as the ability to drive devices inliquid and high-rise MEMS structures.

Reflecter
Bi-morph2Bi-morph
1

Thermalisolator

IR

Fig. 2 Cross-sectional view of the non-cooled infrared
sensor and a generated image

Fig. 1 External view and operations of the microgripper

7Worldwide R&D

Laboratory of Advanced Science and Technology for Industry
Tadashi Hattori, Professor, Himeji Institute of Technology
1. Introduction

3. Department of Micro Systems

Various research departments have been gradually
added at the Laboratory of Advanced Science andTechnology for Industry at Himeji Institute of Technology
after construction of the laboratory in April 1994.
Currently advanced research is being conducted underfive standard departments and one special department for
visiting researchers. The Department of Micro Systems
came to be in February 2000 after I joined the university.
Along with other staff in the department, including
associate professor Yuichi Utsumi and research associate
Harutaka Mekaru, I am currently conducting research on
microsystems through active use of the synchrotron
radiation facility New SUBARU built in the laboratory.

Studies on the LIGA process are conducted at nearly
every research institute having a radiation facility.
However, few links have been made to industrial
applications as of yet, even though such research has been
conducted for more than twenty years. Recent trends inresearch on LIGA processes can probably be classified
under the following three categories.
(1) Studies on producing structures with a high-aspectratio (height/width) using high-energy soft X-rays(2) Studies on producing 3D structures(3) Advanced and practical studies on electroforming and molding
processes important in post-lithography manufacturing
America and Europe in particular emphasize (1) above
because a high aspect ratio increases the specific surface areaof the structure, providing various advances in functionality.
However, (2) and (3) are more important for making realistic
advances in industrial applications. In effect, we are striving
to create 3D microstructures of desired shapes using LIGA,
which can only create simple, cookie-cutter shapes, while
reducing production costs and expanding material selections.
Through our effective policy designed to establish allprocesses, from developing an X-ray mask to massproduction of molds, we have succeeded in developing
optical switches for broadband applications, optical devices
for terminals, chips for bioanalysis, and essential components
for various microsystems. While there are still a mountain ofissues to overcome before we can achieve our goal of being
the first to produce microfunctional structures having a
dynamic range from nanometers to microns, we are moving
forward one day at a time toward establishing a single base inJapan for radiation manufacturing.
If you are fortunate to have the time and means totake a trip, please visit us at the West Harima Science
Garden City. Take a break from your everyday activities
and tour the New SUBARU and SPring-8 facilities.

2. New SUBARU Synchrotron Radiation
Facility at Himeji Institute of Technology
The synchrotron radiation facility New SUBARU was
put in-service in January 2000. The facility, which is thethird largest of its kind in Japan, is primarily intended tohelp establish a new industrial technology foundation
through advanced research focusing on optics anddevelopment in cooperation with businesses. Financially
supported by the local government of Hyogo Prefecture,
New SUBARU is housed within the same complex as
SPring-8, the world's brightest synchrotron radiation
facility. But while the two facilities have an impact oneach another, New SUBARU is a unique facility both
domestically and overseas for the fields of soft X-rays andvacuum ultraviolet light sources in the strong emphasis it
places on industrial use.
Already seven beam lines are currently in use. Fig. 1
shows the overall layout of the facilities. The storage ringhas a circumference of 119 meters, a beam energy of 1.5
GeV, and a stored current of 500 mA. Beam line 11 (BL11)
is dedicated to microsystem processing and is used toperform deep X-ray lithography in the LIGA process.

SPring-8
LINAC
Long Undulator
Short
Undulator

Optical KlystronFree-Electron Laser
Control room (2F)

Clean room

Super Conducting
WigglerFig. 1 The synchrotron radiation facility New SUBARU

Fig. 2 PMMA exposure pattern

MICROMACHINE No. 42
MICROMACHINE is published quarterly by Micromachine Center (MMC) to promote the international exchange of
information related to micromachines, R&D and other technical topics, and is circulated free of change. Please send
your comments about MICROMACHINE to the publisher :Takayuki Hirano, Executive Director, Micromachine Center (MMC)
MBR99 Bldg., 6F., 67 Kanda Sakumagashi, Chiyoda-ku, Tokyo 101-0026, Japan
Tel : +81-3-5835-1870, Fax : +81-3-5835-1873
Internet Home Page h t t p : / / w w w . m m c . o r . j p /Date of Issue : February 14, 2003

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