Tokyo Electron’s History

Founding Era

Era of Globalization

1963

Tokyo Electron Laboratories, Inc. (TEL) established and registeredwith a capital of five million yen.

1993

Tokyo Electron FE Korea Limited (currently Tokyo Electron Korea Ltd.)established.

1964

Starts importing and selling diffusion
furnaces manufactured by Thermco
Products Corp., taking its first step into
the semiconductor production equipment
import business.

1994

Tokyo Electron Europe Limited established.
Standards, Environment, & Safety Center (currently Environment,
Health & Safety Center) established.

1996

Tokyo Electron America, Inc.’s newheadquarters building and training
center completed.

1997

Tokyo Electron Tohoku Limited’s
Sagami Plant becomes the first
ISO14001-certified TEL Group
company (all plants are subsequently acquiring ISO14001certification).

1999

Receives TSE’s Fourth Annual Award for Excellence in Disclosure.

2000

Semiconductor Equipment andMaterials International (SEMI), aninternational industry organization,
creates the SEMI Akira Inoue Award
for Outstanding Achievement in honorof the environmental activities in thesemiconductor industry of the late Tokyo
Electron Ltd. Chairman Akira Inoue.

1965

1967

Concludes an agency agreement withFairchild Semiconductor Corp. to sell
Fairchild’s IC testers in Japan.
Establishes Pan Electron Inc. to start selling Fairchild’s ICs.

Major Business Transformation

1968

TEL-Thermco Engineering Co., Ltd. (TEL-Thermco) established asa joint venture with Thermco Products Corp. and starts producing
diffusion furnaces in Japan.

1972

Tokyo Process Development Inc. established and starts import andsale of analysis equipment. TEL headquarters moved to the Meiho
Building in Shinjuku, Tokyo.

1975

Withdraws from production and export of consumer electronic
goods, such as car radios and calculators, which accounted for60% of sales.

1976

TEL-Thermco develops the world’s
first high-pressure oxidationsystem.

Manufacturing Functions Reinforced

1978

Tokyo Electron Laboratories, Inc. renamed Tokyo Electron Limited.

1980

Listed on the second section of the Tokyo Stock Exchange (TSE).

1981

TEL-GenRad Ltd. established and starts production of in-circuitboard testers in Japan.

1983

TEL-LAM Ltd., established as a joint venture with U.S.-based Lam
Research Corp., and starts production of etch systems in Japan.

1984

Listed on the first section of the Tokyo Stock Exchange.

1986

Central Research Laboratory
facilities in Yamanashi Prefecturecompleted.

In-house Production Expanded

Comments from a Third-Party Expert
Tokyo Electron’s History

Tokyo Electron continues to evolve, incorporating new technologies and concepts in responseto the changing times with a focus on the semiconductor production equipment field.

Starts Publication of theTEL Group’s Environmental
Report.

2001

Establishes a new corporate message “PEOPLE. TECHNOLOGY.
COMMITMENT.”

Striving for New Growth

2003

Receives the Japanese Prime Minister’sAward for its industry-academiagovernment cooperative developmentof a large-diameter, high-density
plasma processing system.

2005

Receives TSE’s 10th Disclosure Award(for the second time after 1999).

2006

Establishes TEL Values.

1988

TEL-Thermco Engineering Co. Ltd. purchased from Thermco
Products Corp. and turned into
100%-owned subsidiary.

1989

Starts shipment of the CLEAN TRACK
MARK-V, coater/developers.

2007

Establishes TEL UNIVERSITY as an internal educational institution
to provide employee training and education.

1990

Makes a full-scale entry into the LCD
production equipment market.

2009Concludes an agency agreement with Oerlikon Solar Ltd. to sell PV
cell production equipment in the Asian and Oceanian regions.

33