ISPlasma2021/
ISPlasma2021/
IC-PLANTS2021
IC-PLANTS2021

ISPlasma/IC-PLANTS

13th13th International
International Symposium
Symposium onon Advanced
Advanced Plasma
Plasma ScienceScienceanditsApplications
for
NitridesandNanomaterials
and its Applications for Nitrides and Nanomaterials

Registration

ISPlasma/IC-PLANTS is a specialized international symposium that brings together about 1,000 world-leading
scientists and engineers in Nagoya, Japan to discuss latest researches in the fields of advanced plasma science,
its applications for processing and manufacturing of nitrides and nanomaterials, as well as new systems fortechnology transfers. This symposium will address issues such as global warming, resources and energy
problems to which advanced plasma science and its application technologies can greatly contribute. In thissymposium biosensing technologies will be also highlighted, because of their increasing importance inhealthcare, agri-food and environmental areas. We hope that this symposium will provide an ideal venue forthe exchange of new ideas and information, and also support the initiation or further development ofinternational collaborations among those who work in these multidisciplinary fields.

Organizing CommitteeChairperson

Related Fields

Masafumi Ito, Meijo University

Plasma Science＆Technologies
・Plasma Source
・Plasma in Liquid
・Flexible Electronics

Vice-Chairperson
Koh Matsumoto, Nagoya University
Noriyasu Ohno, Nagoya University
Yoshimi Watanabe, Nagoya Institute of Technology
Sponsored by：

The Japan Society of Applied Physics

Co-Sponsored by：Nagoya University
Chubu University

Nagoya Institute of Technology

Student
JPY 15,000
JPY 20,000
JPY 1,000
JPY 3,000* Refunds cannot be made at any reason.

14th
14th International
International Conference
Conference on
on Plasma-Nano
Plasma-Nano Technology
Technology && ScienceScienceMarchMarch 7-11,7-11, 2021
2021
VIRTUALVIRTUAL SYMPOSIUM
SYMPOSIUM

GeneralJPY 45,000
JPY 50,000
JPY 1,000
JPY 10,000

Advanced Online Registration is required.
Registration Fee：Early Registration（Until Jan 31, 2021）
Late Registration
Tutorial Fee：Participant in Main Symposium
Tutorial Registration OnlyMeijo University

http://www.isplasma.jp/

・Advanced Plasma Diagnostics
・Modeling & Simulation
・Thin Film Deposition Process
・Etching Process
・Plasma for Nano & Green Technologies

Nitride Semiconductors
・Crystal Growth of GaN & Related Materials
・Device Processing

・MBE Growth & Nitrogen Source
・Optical & Optoelectronic Devices・Characterization
・Electron & Power Devices

Nanomaterials
・Nanodots & Nanoparticles
・Nanotubes, Nanowires & Nanorods
・2D Materials
・Porous Materials & Membranes
・Composites & Functionally Graded Materials ・Surface Modification & Functionalization
・Applications for Energy & Environment
・Nanomedicine & Sensing

Bio Applications
・Plasma Biology & Medicine ・Bioimaging
・Biomaterials
・Biosensors

・Plasma Agriculture
・Biomarkers

・Biodevices, uTAS, Lab on a Chip
・Device Fabrication Technologies

Abstract Submission
Online abstract submission（one-page English）is available from http://www.isplasma.jp/Submission Deadline：Friday, October 16, 2020 JST

Special Issue

Selected papers will be published in a special issue of a scientific journal.

Tutorial
Tutorial for Plasma Science, Nitride Semiconductors Nanomaterials and Bio Applications will be held.

Contact

Secretariat：Inter Group Corp.
E-mail：isplasma2021@intergroup.co.jp

Website：http://www.isplasma.jp/

PROGRAM
Plenary Speakers

A. Yoshino (Meijo University, Asahi Kasei Corp., JAPAN)

Keynote Speakers

Invited Speakers

J.P. Booth (CNRS at LPP, FRANCE)

G. Muziol (UNIPRESS, POLAND)

M. Fujii (Kobe University, JAPAN)

K. Nakazato (Nagoya University, JAPAN)

T. Kachi (Nagoya University, JAPAN)

C. Nishigori (Kobe University, JAPAN)

S. Toyokuni (Nagoya University, JAPAN)

K. Ohkawa (King Abdullah University of Science and Technology, SAUDI ARABIA)
A. Rousseau (LPP, Ecole Polytechnique, FRANCE)

Invited Speakers
P. J. Bruggeman (University of Minnesota, USA)
D. Boonyawan (Chiang Mai Universitty, THAILAND)
E. H. Choi (Kwangoon University, KOREA)
S. Graham (Georgia Institute of Technology, USA)
M. Hori (Nagoya University, JAPAN)
K. Ide (Tokyo Institute of Technology, JAPAN)
T. Kaneko (Tohoku University, JAPAN)
M. Keidar (The George Washington University, USA)
A. Kohno (Fukuoka University, JAPAN)S. Sato (National Institutes for Quantum and Radiological Science and Technology, JAPAN)
H. Shi (Xi’an Jiaotong University, CHINA)
M. Shikida (Hiroshima City University, JAPAN)
T. Takenobu (Nagoya University, JAPAN)
T. Tatsumi (Sony Semiconductor Solutions Corporation, JAPAN)
X. Wang (Peking University, CHINA)
T. von Woedtke (Leibniz Institute for Plasma Science and Technology, INP Greifswald, GERMANY)
H. G. Xing (Cornell University, USA)X. Zhao (Shenzhen Yick Xin Technology Development, Ltd. Co., CHINA)

Y. Koide (National Institute for Materials Science, JAPAN)

Tutorial Speakers

S. Konstantinidis (University of Mons, BELGIUM)T. P. Chow (Rensselaer Polytechnic Institute, USA)J. S. Kwon (Yonsei University College of Dentistry, KOREA)

U. Czarnetzki (Rhur-Universitat Bochum, GERMANY)

Y. Lin (National Synchrotron Radiation Research Center, TAIWAN)
B. Locke (Florida State University, USA)

D. Graves (UC Berkley, USA)
L. Miao (Guilin University of Electronic Technology, CHINA)