Prof. Ohmi's Paper
January－December, 2004
E1066(C)Naoto Miyamoto, Leo Karnan, Kazuyuki Maruo, Koji Kotani and Tadahiro
Ohmi, “A Small-Area High-Performance 512-Point 2-Dimensional FFTSingle-Chip Processor,” Asia and South Pacific Design Automation
Conference 2004(ASP-DAC 2004), 6C-8, Yokohama. January 2004.

E1067 (F)ICHIROU TAKAHASHI, HIROYUKI SAKURAI, TATSUFUMI ISOGAI,KIYOSHI FUNAIWA, MASAKI HIRAYAMA, AKINOBU TERAMOTO,SHIGETOSHI SUGAWA and TADAHIRO OHMI, “MFIS Structure Device
with a Low Dielectric Constant Ferroelectric Sr2(Ta1-x,Nbx)2O7 Formed by
Plasma Physical Vapor Deposition and Oxygen Radical Treatment,”
Integrated Ferroelectrics, Vol. 65, pp.29 -38, January 2004.

E1068(L)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “An Improved Fast
Encoding Algorithm for Vector Quantization Using 2-Pixel-Merging Sum
Pyramid and Manhattan-Distance-First Check,” IEICE TRANSACTIONS
INF. &SYST., Vol.E87-D, No.2, pp.494-499, February 2004.

E1069(L)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “AnImproved
Full-Search-Equivalent Vector Quantization Method the Law ofCosines,” IEEE SIGNAL PROCESSING LETTERS, Vol.11, No.2, pp.
247-250, February 2004.

E1070(L)Zhibin PAN, Koji KOTANI, and Tadahiro OHMI, “A Fast Search Methodfor Vector Quantization Using Enhanced Sum Pyramid Data Structure,”
IEICE TRANSACTIONS FUNDAMENTALS, Vol.E87-A, No. ３ ,pp.764-769, March 2004.

E1071(L)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “An improved fast encoding
algorithm for vector quantization using 2-pixel-merging sum pyramid datastructure,” Pattern Recognition Letters 25, pp.459-468, March 2004.

E1072(C)Seiji Hashimoto, Kiyoshi Ohishi, Takuya Ohishi, Takeo Ishikawa,
Koji Kosaka, Yoshiya Egashira, Hiroshi Kubota, andTadahiro
Ohmi, “Ultra-Precision Stage Control Based on Friction Model ofNon-Resonant Ultrasonic Motor,” The 8th IEEE International
Workshop on Advanced Motion Control, pp.559-564, March 2004.

E1073(C)Naoto MIYAMOTO, Leo KARNAN, Kazuyuki MARUO, Koji
KOTANI, and Tadahiro OHMI, “A 100MHｚ 7．84ｍｍ 2 31．7msec
439mW 512-Point 2-Dimensional FFT Signal-Chip Processor,” IEICE
TRANSACTIONS on Electronics, Vol.E87-C, No.4, pp.502-509, April2004.

E1074(C)Tetsuya GOTO, Hiroshi YAMAUCHI, Takeyoshi KATO, Masato
TERASAKI, Akinobu TERAMOTO, Masaki HIRAYAMA, Shigetoshi
SUGAWA, and Tadahiro OHMI, “High-Speed Damage-Free Contact
Hole Etching Using Dual Shower Head Microwave-Excited
High-Density-Plasma Equipment,” Jpn. J. Appl. Phys., Vol. 43, No.4B, pp.
1784-1787, April 2004.

E1075(C)

Ichirou TAKAHASHI, Hiroyuki SAKURAI, Atsuhiro YAMADA,Kiyoshi FUNAIWA, Tetsuya GOTO, Masaki HIRAYAMA, Akinobu
TERAMOTO, Shigetoshi
SUGAWA, and Tadahiro OHMI, “ALow-Dielectric-Constant Sr2(Ta １― x ， Nbx)2O ７ Thin Film Controlling theCrystal Orientation on an IrO2 Substrate for One-Transistor-Type
Ferroelectric Memory Device,” Jpn. J. Appl. Phys., Vol. 43, No.4B, pp.
2194-2198, April 2004.

E1076(C)ZhibinPAN,
Koji
KOTANI,
andTadahiro
OHMI,“AMEMORY-EFFICIENTFAST
ENCODING
METHODFORVECTOR QUANTIZATION USING 2-PIXEL-MERGING SUM
PYRAMID”, 2004 IEEE International Conference on Acoustics,
Speech, and Signal Processing(ICASSP), pp.Ⅲ669-Ⅲ672, May 2004.

E1077(F)Zhibin PAN, Koji KOTANI, and Tadahiro OHMI, “A Fast Encoding
Method for Vector Quantization Using Modified Memory-Efficient
Sum Pyramid,” OPTICAL REVIEW, Vol. 11, No.3, pp. 170-175,
May-June 2004.

E1078(C)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “AN IMPROVED FAST
ENCODING METHOD FOR VECTOR QUANTIZATION BASED ON
MEMORY-EFFICIENT DATA STRUCTURE,” 2004 IEEE International
Conference on Multimedia and Expo(ICME 2004), Proceedings, June 2004.

E1079(C)

Masato Toita, Shigetoshi Sugawa, Akinobu Teramoto, and Tadahiro Ohmi,“SUB-MICRON MOSFETS TECHNOLOGY CHARACTERIZATION BY
LOW-FREQUENCY NOISE,” 3rd European Microelectronics and Packaging
Symposium, pp.19-24, June 2004.

E1080(C)

Tatsufumi Hamada, Akinobu Teramoto, Hiroshi Akahori, Keiichi Nii,Tomoyuki Suwa, Masaki Hirayama, and Tadahiro Ohmi, “High Performance
Low Noise CMOS Fabricated on Flattened (110)oriented Si Substrate,” 2004
Asia-Pacific Workshop on Fundamentals and Application of Advanced
Semiconductor Devices(AWAD 2004), pp. 163-166, June-July 2004.

E1081 (P)Takahiro Nakayama, Masahiro Konda, Koji Takeuchi, Koji Kotani, andTadahiro Ohmi, “Still Image Compression with Mean-Residual Domain
Adaptive Resolution Vector Quantization Technique,” World AutomationCongress, International Forum on Multimedia and Image Processing 2004
(IFMIP2004), IFMIP073, CD-ROM, Seville, June 28-July 1, 2004.

E1082 (P)Zhibin Pan, Koji Kotani and Tadahiro Ohmi, “An Efficient Method Of
Constructing L1-Type Norm Feature To Estimate Euclidean Distance For
Fast Vector Quantization,” World Automation Congress, International
Forum on Multimedia and Image Processing 2004 (IFMIP2004), IFMIP072,
CD-ROM, Seville, June 28-July 1, 2004.

E1083 (P)Koji Kotani, Qiu Chen, Feifei Lee, and Tadahiro Ohmi, “Face Recognition
Using Vector Quantization Codebook Space Information Processing,” WorldAutomation Congress, International Forum on Multimedia and Image
Processing 2004 (IFMIP2004), IFMIP074, CD-ROM, Seville, June 28-July 1,2004.

E1084(F)TADAHIRO OHMI, KOJI KOTANI, QIU CHEN, AND FEIFEI
LEE, “FACE RECOGNITION ALGORITHM USING VECTORQUANTIZATIONCODEBOOKSPACEINFORMATIONPROCESSING,” Intelligent Automation and Soft Computing, Vol.10,
No.2, pp. 129-142, July 2004.

E1085(F)QIU CHEN, KOJI KOTANI, YOSHIYUKI TANIGUCHI, ZHIBIN
PAN, ANDTADAHIRO OHMI, “ROBUST FACE DETECTIONCOMBINED SKIN COLOR FEATURES TEMPLATE MATCHINGANDVQHISTOGRAMMETHODIN
PRACTICALENVIRONMENTS,” Intelligent Automation and Soft Computing,
Vol.10, No.2, pp. 143-153, July 2004.

E1086(F)

TAKAHIRO
NAKAYAMA,
MASAHIRO
KONDA,KOJI
TAKEUCHI, KOJI KOTANI, AND TADAHIRO OHMI, “STILLIMAGE
COMPRESSION
WITH
ADAPTIVERESOLUTIONVECTOR QUANTIZATION TECHNIQUE,” Intelligent Automationand Soft Computing, Vol.10, No.2, pp. 155-165, July 2004.

E1087(F)ZHIBIN PAN, AND TADAHIRO OHMI, “A FAST ENCODING
METHOD FOR VECTOR QUANTIZATION BY USING MULTIEUCLIDEAN DISTANCE ESTIMATIONS,” Intelligent Automationand Soft Computing, Vol.10, No.2, pp. 167-174, July 2004.

E1088(C)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “A Enhanced Fast Encoding
Method for Vector Quantization by Constructing New Feature Based on theVariances of Subvectors,” The 47th IEEE International Midwest Symposium
on Circuits and Systems(MWSCAS 2004), pp.Ⅰ‐241-Ⅰ‐244, July 2004.

E1089(C)Tadahiro Ohmi, “Damage Free Plasma Process for High Performance andLow Noise ULSI Devices,” SEMI Technology Symposium：Innovations inSemiconductor Manufacturing(SEMICON West 2004), July 2004.

E1090(L)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “A Unified Projection Method
for Fast Search of Vector Quantization,” IEEE SIGNAL PROCESSINGLETTERS, Vol.11, No.7, pp. 637-640, July 2004.

E1091(C)Qiu Chen, Koji Kotani, Feifei Lee, and Tadahiro Ohmi, “FACE
RECOGNITION USING REGION － DIVISION VQ HISTOGRAM
METHOD,” The 6th IASTED International Conference on SIGNAL AND
IMAGE PROCESSING ～SIP 2004, pp. 64-68, August 2004.

E1092(F)Tadahiro OHMI, “Manufacturing Process of Flat Display,” JSMEInternational Journal Series:B Fluids and Thermal Engineering, Vol.47, No.3,
pp. 422-428, August 2004.

E1093(P)Naoto Miyamoto、Leo Karnan、Koji Kotani and Tadahiro Ohmi, “A
Dynamically Reconfigurable IP for Data-Intensive Applications,” 2004
IEEE Asia-Pacific Conference on Advanced System Integrated Circuits,
pp404-405, August 2004.

E1094(C)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “A FAST SEARCHMETHODFORVECTORQUANTIZATIONUSING
2-PIXEL-MERGING SUM PYRAMID IN RECURSIVE WAY,” X
Ⅱ.European Signal Processing Coference(EUSIPCO 2004), September
2004.

E1095(P)

Kazumasa Kawase, Hiroshi Umeda, Masao Inoue, Shinpei Tsujikawa,
Yasuhiko Akamatsu, Akinobu Teramoto, and Tadahiro Ohmi, “Control ofnitrogen profile in radical nitridation of SiO 2 films,” Extended Abstracts ofthe 2004 International Conference on SOLID STATE DEVICES andMATERALS, pp.204-205, September 2004.

E1096(P)Tomoyasu Tate, Shigetoshi Sugawa, Koji Chiba, Koji Kotani, and Tadahiro
Ohmi, “A High S/N Ratio Object Extraction CMOS Image Sensor withColumn Parallel Signal Proseccing,” Extended Abstracts of the 2004
International Conference on SOLID STATE DEVICES and MATERALS,
pp.354-355, September 2004.

E1097(P)Atsushi Hidaka, Satoru Yamashita, Takeyoshi Kato, Yasuyuki Shirai, andTadahiro Ohmi, “Adsorption Behavior of Various Fluorocarbon Gases on theSilicon Wafer Surface,” Extended Abstracts of the 2004 International
Conference on SOLID STATE DEVICES and MATERALS, pp.462-463,
September 2004.

E1098(P)

Hiroyuki Sakurai, Ichirou Takahashi, Tatsunori Isogai, Kiyoshi Funaiwa,
Tomoya Tsunoda, Tetsuya Goto, Masaki Hirayama, Akinobu Teramoto,
Shigetoshi Sugawa, and Tadahiro Ohmi, “MFIS-structure Memory Devicewith High Quality Ferroelectric Sr2 (Ta1-xNbx )2 O7 Formed by PhysicalVapor Deposition and Oxygen Radical Treatment by Oxygen Assisted Layerby Layer(ROALL) deposition,” Extended Abstracts of the 2004 International
Conference on SOLID STATE DEVICES and MATERALS, pp.640-641,
September 2004.

E1099(P)

Kazufumi Watanabe, Koji Kotani, Akinobu Teramoto, Shigetoshi Sugawa,and Tadahiro Ohmi, “A Large-Signal MOSFET Model Based on Transient
Carrier Response for RF Circuits,” Extended Abstracts of the 2004
International Conference on SOLID STATE DEVICES and MATERALS,
pp.736-737, September 2004.

E1100(C)Atsushi Hidaka, Naoki Tanahashi, and Tadahiro Ohmi, “The degradation
prevention of resin materials for semiconductor manufacturing equipment byapplying the ultra-high purity gas supply technology,” 7th International
Symposium on ULTRA CLEAN PROCESSING OF SILICONSURFACES(UCPSS 2004), pp.165-166, September 2004.

E1101(P)

Kazufumi Watanabe, Tatsufumi Hamada, Koji Kotani, Akinobu Teramoto,
Shigetoshi Sugawa, and Tadahiro Ohmi, “Accurate Temperature Drift modelof MOSFETs Mobility for Analog Circuits,” Simulation of Semiconductor
Processes and Devices 2004, pp.291-294, September 2004.

E1102 (P)Y. Shirai, A. Teramoto, M. Hirayama, T. Ohmi, H. Hasegawa, Y. Ishihara, T.
Satoh, and M. Yamawaki, “High Quality Plasma Processing using
Microwave Excited Plasma System with Xenon Gas,” International
Symposium on Semiconductor Manufacturing(ISSM 2004), pp. PE05,
September 2004.

E1103(C)Tatsufumi Hamada, Akinobu Teramoto, Hiroshi Akahori, Keiichi Nii,
Tomoyuki Suwa, Masaki Hirayama, and Tadahiro Ohmi, “HIGHPERFORMANCE LOW NOISE CMOS FABRICATED ON FLATTENED(110)ORIENTED SI SUBSTRATE,” The 2nd Student-Organizing
International Mini-Conference on Information Electronics System(SOIM-COE04), pp. 141-144, October 2004.

E1104(C)

Kazufumi Watanabe, Tatsufumi Hamada, Koji Kotani, Akinobu Teramoto,
Shigetoshi Sugawa, and Tadahiro Ohmi, “Accurate Temperature Drift modelof MOSFETs Mobility for Analog Circuits,” The 2nd Student-Organizing
International Mini-Conference on Information Electronics System(SOIM-COE04), pp.145-148, October 2004.

E1105(C)Tomoyasu Tate, Shigetoshi Sugawa, Koji Chiba, Koji Kotani, and TadahiroOhmi, “AN ADVANCED HIGH S/N RATIO CMOS IMAGE SENSOR
WITH REAL TIME OBJECT CATEGORIZING FUNCTION,” The 2ndStudent-Organizing International Mini-Conference on Information
Electronics System (SOIM-COE04), pp. 149-151, October 2004.

E1106(C)

Feifei Lee, Koji Kotani, Qiu Chen, and Tadahiro Ohmi, “FACE
RECOGNITION USING THE ADJACENT PIXEL INTENSITYDIFFERENCE QUANTIZATION HISTOGRAM METHOD,” The 2ndStudent-Organizing International Mini-Conference on Information
Electronics System (SOIM-COE04), pp. 152-155, October 2004.

E1107(C)Naoto Miyamoto, Toshiyuki Nozawa, Takeshi Ohkawa, MasanoriFujibayashi, Amir Jamak, Karnan Leo, Soichiro Kita, Koji Kotani, andTadahiro Ohmi, “THE FLEXIBLE PROCESSOR-A DYNAMICALLYRECONFIGURABLE LOGIC ENGINE,” The 2nd Student-Organizing
International Mini-Conference on Information Electronics System(SOIM-COE04), pp. 176-179, October 2004.

E1108(C)Qiu Chen, Koji Kotani, Feifei Lee, and Tadahiro Ohmi, “FACE
RECOGNITION APPROACH BASED ON REGION-DIVISION VECTORQUANTIZATION HISTOGRAM METHOD,” The 2nd Student-Organizing
International Mini-Conference on Information Electronics System(SOIM-COE04), pp. 197-200, October 2004.

E1109(C)Atsushi Hidaka, Satoru Yamashita, Masafumi Kitano, Akinobu Teramoto,Yasuyuki Shirai and Tadahiro Ohmi, “The Thermal Degradation Preventionof Fluorocarbon Material for Interlayer Dielectric Film,” 206th Meeting ofThe Electrochemical Society, Inc.(ECS2004), October 2004.

E1110(C)K. Nii, M. Yamamoto, A. Teramoto and T. Ohmi, “Suppression of Surface
Micro-Rouhness on Si (110),” 206th Meeting of The Electrochemical Society,Inc.(ECS2004), October 2004.

E1111(C)Naoto Miyamoto, Koji Kotani, Kazuyuki Maruo and Tadahiro Ohmi, “AImage Recognition Processor Using Dynamically Reconfigurable ALU,”IEEE 2004 Custom Integrated Circuits Conference, pp. 599 -602, October
2004.

E1112(C)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “IMPROVED FAST SEARCHMETHOD FOR VECTOR QUANTIZATION USING DISCRETE
WALSH TRANSFORM,” 2004 IEEE International Conference on Image
Processing(ICIP2004), pp. 3177-3180, October 2004.

E1113(C)Tadahiro Ohmi, “Radical Reaction Based Semiconductor Manufacturing Due
To Microwave Excied Very Low Electron Temperature High Density
Plasma,” The 4th Taiwan-Japan Microelectronics International Symposium,
October 2004.

E1114(F)Kazuo Ohtsubo, Yuji Saito, Masaki Hirayama, Shigetoshi Sugawa, Herzl
Aharoni, and Tadahiro Ohmi, “Low-Temperature Growth (400 ℃ ) ofHigh-Integrity Thin Silicon-Oxynitride Films by Microwave-Excited
High-Density Kr-O2 -NH3 Plasma,” IEEE TRANSACTIONS ON PLASMASCIENCE, pp.1747-1751, Vol.32, No.4, August 2004.

E1115(C)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “Fast Encoding Method for
Vector Quantization Based on Subvector Technique with a Modified DataStructure,” 2004International Symposium on Intelligent Signal Processing
and Communication Systems (ISPACS2004), pp. 570–573, November 2004.

E1116 (P)

Md.Ashfaquzzaman Khan, Naoto Miyamoto, Takeshi Ohkawa, Amir Jamak,
Soichiro Kita, Koji Kotani, and Tadahiro Ohmi, “An Approach to Realize
Time-Sharing of Flip-Flops in Time-Multiplexed FPGAs,” 2004 IEEE
International Conference on Field-Programmable Technology (ICFPT2004)
Brisbane, Australia, pp.351-354, December 2004.

E1117 (C)

Herzl Aharoni, Kazuo Ohtsubo, Yuji Saito, Masaki Hirayama, Shigetoshi
Sugawa, and Tadahiro Ohmi, “Low temperature growth of oxynitride thinfilms using plasma techniques,” ISREAL PHYSICAL SOCIETY 50th Annual
Meeting Physics Department, Technion-IIT, pp.126, December 2004.