Prof. Ohmi's Paper
January－December, 2003
E1024(C)Tadahiro Ohmi, and Atsuyoshi Koike, “Fluctuation Free Semiconductor
Manufacturing in 300 mm Wafer Fab,” 2003 SEMI Technology Symposium(STS), pp. 121,123 124, January 2003.

E1025(C)Tadahiro Ohmi, “Radical Reaction Based Semiconductor Manufacturing for
Small Volume and Very High Speed Production with a Very Wide Variety ofSemiconductor Chips,” Asia and South Pacific Design Automation Conference2003(ASP-DAC 2003), Keynote Address Ⅱ, January 2003.

E1026(C)

Masanori Fujibayashi, Toshiyuki Nozawa, Takahiro Nakayama, KenjiMochizuki, Koji Kotani, Shigetoshi Sugawa, and Tadahiro Ohmi, “A Still
Image Encoder Based on Adaptive Resolution Vector Quantization Employing
Needless Calculation Elimination Architecture,” Asia and South Pacific DesignAutomation Conference 2003(ASP-DAC 2003), University LSI Design Contest,
6D-5, pp. 567 568, January 2003.

E1027(P)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “A practical high-speed andlow-bit-rate encoding method for vector quantization using storong
correlation among nearby image blocks,” International Conference on
ComputationalIntelligenceforModelling,Control＆Automation(CIMCA2003), pp. 301-308, February 2003.

E1028(C)

Masato Toita, Shigetoshi Sugawa, Akinobu Teramoto, and Tadahiro Ohmi,“1/F NOISE DEGRADATION CAUSED BY FOWLER-NORDHEIM
TUNNELING STRESS IN MOSFETS”, 2003 IEEE International Reliability
Physics Symposium 41st Annual, March 2003.

E1029(C)Tadahiro Ohmi, Akinobu Teramoto, Hiroaki Tanaka, and Masaki
Hirayama, “VERY HIGH INTEGRITY THIN FILM FORMATIONS AT
VERY LOW TEMPERATURES,” 2003 Materials Research Society(MRS) Spring Meeting, pp. 29, April 2003.

E1030(F)

Tetsuya GOTO, Masaki HIRAYAMA, Hiroshi YAMAUCHI, Makoto
MORIGUCHI, Shigetoshi SUGAWA, and Tadahiro OHMI, “A New
Microwave-Excited Plasma Etching Equipment for Separating Plasma
Exicited Region from Etchikg Process Region,” Jpn. J. Appl. Phys., Vol.
42, Part 1, No.4Ｂ, pp. 1887-1891, April 2003.

E1031(F)

Hiroaki TANAKA, Zhong CHUANJIE, Yukio HAYAKAWA, Masaki
HIRAYAMA, Akinobu TERAMOTO, Shigetoshi SUGAWA, and Tadahiro
OHMI, “High‐Quality Silicon Oxide Film Formed by Diffusion Region
Plasma Enhanced Chemical Vapor Deposition and Oxygen RadicalTreatment Using Microwave-Excited High-Density Plasma,” Jpn. J. Appl.
Phys., Vol. 42, Part 1, No.4Ｂ, pp. 1911-1915, April 2003.

E1032(F)Ichirou TAKAHASHI, Hiroyuki SAKURAI, Atsuhiro YAMADA, Kiyoshi
FUNAIWA, Kentaro HIRAI, Shinichi URABE, Tetsuya GOTO, Masaki
HIRAYAMA, Akinobu TERAMOTO, Shigetoshi SUGAWA, and Tadahiro
OHMI, “Ferroelectric Sr2(Ta １ ― x ， Nbx)2O ７ with a Low Dielectric
Constant by Plasma Physical Vapor Deposition and Oxygen RadicalTreatment,” Jpn. J. Appl. Phys., Vol. 42, Part 1, No.4Ｂ, pp. 2050-2054, April2003.

E1033(F)Koutarou TANAKA, Kazufumi WATANABE, Hideki ISHINO, Shigetoshi
SUGAWA, Akinobu TERAMOTO, Masaki HIRAYAMA, and Tadahiro
OHMI, “A Technology for Reducing Flicker Noise for ULSIApplications,” Jpn. J. Appl. Phys., Vol. 42, Part 1, No.4Ｂ, pp. 2106-2109,
April 2003.

E1034(F)Naoto MIYAMOTO, Leo KARNAN，Koji KOTANI, and Tadahiro OHMI,“A Fine－Grained Programmable Logic Module with Small Amount ofConfiguration Data for Dynamically Reconfigurable Field- Programmable
Gate Array,” Jpn. J. Appl. Phys., Vol. 42, Part 1, No.4B, pp. 2167-2170, April2003.

E1035(C)Tadahiro Ohmi, “Radical Reaction Based Semiconductor Manufacturing
For Very Advanced ULSI Process Integration,” 203rd Meeting of The
Electrochemical Society, Abstract No.950, Paris, April－May 2003.

E1036(C)

Shigetoshi Sugawa, Tomoyasu Tate, Koji Chiba, Koji Kotani, and TadahiroOhmi, “A High S/N Ratio CMOS Image Sensor with Real Time Object
Categorizing Function,” 2003 IEEE Workshop on Charge－Coupled Devices
and Advanced Image Sensors, Germany, May 2003.

E1037(C)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “A POST-PROCESSINGMETHOD FOR VECTOR QUANTIZATION TO ACHIEVE HIGHERPSNR AND NEARLY CONSTANT BIT RATE,” The 2003 IEEE International
Symposium on Circuits and Systems(ISCAS2003), pp.Ⅱ‐436-439, May 2003.

E1038(F)

Masanori Fujibayashi, Toshiyuki Nozawa, Takahiro Nakayama, Kenji
Mochizuki, Masahiro Konda, Koji Kotani, Shigetoshi Sugawa, and Tadahiro
Ohmi, “A Still-Image Encoder Based on Adaptive Resolution Vector
Quantization Featuring Needless Calculation Elimination Architecture,” IEEEJOURNAL OF SOLID-STATE CIRCUITS, Vol. 38, No. 5, pp. 726 733, May
2003.

E1039(C)

Takeshi Ohkawa, Toshiyuki Nozawa, Masanori Fujibayashi, Naoto Miyamoto,Karnan Leo, Soichiro Kita, Koji Kotani, and Tadahiro Ohmi, “The Flexible
Processor － Dynamically Reconfigurable Logic Array for Personal － use
Emulation System,” 2003 SYMPOSIUM ON VLSI CIRCUITS, DIGEST OFTECHNICAL PAPERS, pp.279-282, June 2003.

E1040 (F)

Takahiro J. Yamaguchi, Mani Soma, Masahiro Ishida, Toshifumi Watanabe,
and Tadahiro Ohmi, “Extraction ｏｆ Instantaneous and RMS Sinusoidal Ｊｉｔｔｅｒ
Using an Analytic Signal Method,” IEEE Transactions on CIRCUITS AND
SYSTEMS, Vol.50, No.6, pp. 288-298, June 2003.

E1041 (F)Ichirou Takahashi, Hiroyuki Sakurai, Atsuhiko Yamada, Kiyoshi Funaiwa,
Kentaro Hirai, Shinichi Urabe, Tetsuya Goto, Masaki Hirayama, Akinobu
Teramoto, Shigetoshi Sugawa, and Tadahiro Ohmi, “Oxygen radical treatment
applied to ferroelectric thin films,” Applied Surface Science, Vol.216, pp. 239-245, June 2003.

E1042(P)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “A FAST FULL SEARCH
EQUIVALENT ENCODING METHOD FOR VECTOR QUANTIZATIONBY USING APPROPRIATE FEATURES,” 2003 IEEE International
Conference on Multimedia and Expo, Proceedings, Vol.Ⅱof Ⅲ, pp.261-264,
July 2003.

E1043(P)T.Nakayama, M.Konda, K.Takeuchi, K.Kotani, and T.Ohmi, “ADAPTIVERESOLUTION VECTOR QUANTIZATION TECHNIQUE AND BASICCODEBOOKDESIGNMETHODFORCOMPOUNDIMAGE
COMPRESSION,” 2003 IEEE International Conference on Multimedia andExpo, Proceedings, Vol.Ⅱof Ⅲ, pp.549-552, July 2003.

E1044(C)Tadahiro Ohmi, “Radical Reaction Based Processings for Future
Semiconductor Manufacturing,” SEMI Technology Symposium：Innovations inSemiconductor Manufacturing(SEMICON West 2003), July 2003.

E1045(P)T.Nakayama, K.Takeuchi, M.Konda, K.Kotani, and T.Ohmi, “STILLIMAGE COMPRESSION METHOD BASED ON ADAPTIVE BLOCKSEGMENTATION VECTOR QUANTIZATION TECHNIQUE,” 2003 IEEE
International Conference on Image Processing(ICIP2003), Vol. Ⅱ of Ⅲ ,pp.275-278, Barcelona, September 2003.

E1046(P)Naoto Miyamoto, Leo Karnan, Kazuyuki Maruo, Koji Kotani, andTadahiro Ohmi,”A
Small-Area
High-Performance
512-Point
2-Dimensional FFT Signal-Chip Processor,” 29th European Solid-State
Circuits Conference, pp.603-606, September 2003.

E1047(L)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “A Fast Encoding Method
For Vector Quantization Based on 2-Pixel-Merging Sum Pyramid DateStructure,” IEICE TRANSACTIONSONFUNDAMENTALSOFELECTRONICS,COMMUNICATIONS AND COMPUTER SCIENCES,
Vol.E86-A, No.9, pp.2419-2423, September 2003.

E1048(P)Ichirou Takahashi, Hiroyuki Sakurai, Atsuhiro Yamada, Tetsuya Goto,
Masaki Hirayama, Akinobu Teramoto, Shigetoshi Sugawa, and Tadahiro
Ohmi, “A Low Dielectric Constant Sr2(Ta１ ― x, Nbx)2O７ Thin Film
Controlling the Crystal Orientation on IrO2 Substrate for One
Transistor Type Ferroelectric Memory Device,” Extended Abstracts of the2003
International Conference on SOLID STATE DEVICES andMATERALS, pp.36-37, September 2003.

E1049(P)Leo Karnan, Naoto Miyamoto, Kazuyuki Maruo, Koji Kotani, andTadahiro Ohmi, “Butterfly-Unit Based Programmable Computation Element
Using Merged Module of Multiplication, Division and Square Root,”
Extended Abstracts of the 2003 International Conference on SOLID STATE
DEVICES and MATERALS, pp.148-149, September 2003.

E1050(P)Masanori Komura, Masaaki Higuchi, Weitao Cheng, Ichiro Ohshima,Akinobu Teramoto, Masaki Hirayama, Shigetoshi Sugawa, and Tadahiro
Ohmi, “Very High Reliability of Ultrathin Silicon Nitride Gate
Dielectric Film for Sub-100nm Generation,” Extended Abstracts of the2003 International Conference on SOLID STATE DEVICES and MATERALS,
pp.452-453, September 2003.

E1051(P)

Hiroshi Akahori, Keiichi Nii, Akinobu Teramoto, Shigetoshi Sugawa，and Tadahiro Ohmi, “Atomic Order Flattening of Hydrogen-TerminatedSi(110)substrate For Next Generation ULSI Devices,” Extended Abstractsof the 2003 International Conference on SOLID STATE DEVICES andMATERALS, pp.458-459, September 2003.

E1052(P)Fuminobu Imaizumi, Tomohiko Hayashi, Katsuji Ishii, Akinobu Teramoto,
Masaki Hirayama, Shigetoshi Sugawa, and Tadahiro Ohmi, “HighPerformance Poly-Si Device with Thin Gate Oxide Film Grown byPlasma Oxidation Technology,” Extended Abstracts of the 2003 International
Conference on SOLID STATE DEVICES and MATERALS, pp.724-725,
September 2003.

E1053(P)

Hiroaki Tanaka, Zhong Chuanjie, Yukio Hayakawa, Masaki Hirayama，
Akinobu Teramoto, Shigetoshi Sugawa, and Tadahiro Ohmi, “High Quality
Silicon Nitride Film Formed by Microwave-Excited Plasma Enhanced
Chemical Vapor Deposition with Dual Gas Shower Head,” Extended
Abstracts of the 2003 International Conference on SOLID STATE DEVICES
and MATERALS, pp.736-737, September 2003.

E1054(P)Tetsuya Goto, Hiroshi Yamauchi, Takeyoshi Kato, Akinobu Teramoto,
Masaki Hirayama, Shigetoshi Sugawa, and Tadahiro Ohmi, “High-Speed
Damage-Free Contact Hole Etching using Dual Shower HeadMicrowave-Excited High-Density Plasma Equipment,” Extended Abstractsof the 2003 International Conference on SOLID STATE DEVICES andMATERALS, pp.744-745, September 2003.

E1055(L)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “A Fast Encoding Method
For Vector Quantization Using L1 and L2 Norms to Narrow Necessary
Search scope,” IEICE TRANSACTIONS INF. &SYST., Vol.E86-D, No.11,
pp.2483-2486, November 2003.

E1056(C)Zhibin Pan, Koji Kotani, and Tadahiro Ohmi, “A Fast Search Method for
Vector Quantization by Estimating Enclidean Distance,” 2003 IEEE
International Symposium on Intelligent Signal Processing and Communication
Systems(ISPACS2003), pp. 409-413, December 2003.

E1057(C)

Chen-Yung Hsu, Koji Kotani, and Tadahiro Ohmi, “Pupil Location Using aBinary Pattern Search, Region Filtering and Shape Matching,” 2003 IEEEInternational Symposium on Intelligent Signal Processing and Communication
Systems(ISPACS2003), pp. 862-865, December 2003.

E1058(C)Qiu Chen, Koji Kotani, Yoshiyuki Taniguchi, Zhibin Pan, and Tadahiro Ohmi,“Robust Face Detection Using Skin Color Features, Template Matching andVQ Histogram Method Hieratically,” 2003 IEEE International Symposium onIntelligent Signal Processing and Communication Systems (ISPACS2003), pp.
872-876, December 2003.

E1059(C)Koji Kotani, Feifei Lee, Qiu Chen, and Tadahiro Ohmi, “Face Recognition
Based on the Adjacent Pixel Intensity Difference Quantization Histogram
Method,” 2003 IEEE International Symposium on Intelligent Signal Processing
and Communication Systems(ISPACS2003), pp. 877-880, December 2003.

E1060(C)A.Teramoto, T.Hamada, H.Akahori, K.Nii, T.Suwa, K. Kotani, M.Hirayama,
S.Sugawa, and Tadahiro Ohmi, “Low Noise Balanced-CMOS on
Si(110)surface for Analog/Digital Mixed Signal Circuits”, 2003 IEEE
International ELECTRON DEVICES MEETING, pp.33.4.1-33.4.4,
December 2003.

E1061(C)Yutaka HIROI, Eiji NAKANO, Takayuki TAKAHASHI, Shozo MAKINO,Akinori ITO, Koji KOTANI, Nobuo TAKATSU, and Tadahiro OHMI, “APatient Care Service Robot System Based on a State Transition Architecture,”
The International Conference on Mechatronics and Information Technology(ICMIT2003), pp. 231-236, December 2003

E1062(C)

Herzl Aharoni, Takeshi Ohkawa, Osamu Nakamura, Tadahiro Ohmi, “MOStransistors with thin SiO2 gate insulators films grown by Pt-catalytic watervapor generator,” ISRAEL PHYSICAL SOCIETY(IPS2003), pp.143,
December 2003.

E1063(C)Yutaka Hiroi, Eiji Nakano, Takayuki Takahashi, Shozo Makino, AkinoriIto,Koji Kotani, Nobuo Takatsu and Tadahiro Ohmi, “A Patient Care ServiceRobot System Based on a State Transition Architecture”, Proceeding of the 2ndInt'l Conf. on Mechatronics and Information Technology, pp.231-236, Korea,December, 2003.

E1064(F)Ichiro Ohshima, Weitao Cheng, Yasuhiro Ono, Masaaki Higuchi, Masaki
Hirayama, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi, “Reliabilityof silicon nitride gate dielectrics grown at 400℃ formed by microwave-excited
high-density plasma,” Applied Surface Science, No.216, pp246-251, 2003.

E1065(C)Qiu Chen, Koji Kotani, Tadahiro Ohmi, “Face Recognition Algorithm Using
Vector Quantization Histogram Method,” Proceeding of the 1stStudent-Organizing Int'l Mini-Conf. on Information Electronics System(SOIM-COE03), pp.186-190, 2003.