Paper List
January－December, 2022
E2022-1(F)Two High-Precision Proximity Capacitance CMOS Image Sensors with LargeFormat and High ResolutionSensors (MDPI), 22, No.7, (2022), pp.2770, 4 April 2022.
Yuki Sugama, Yoshiaki Watanabe, Rihito Kuroda, Masahiro Yamamoto,Tetsuya Goto, Toshiro Yasuda, Hiroshi Hamori, Naoya Kuriyama andShigetoshi Sugawa
https://doi.org/10.3390/s22072770

E2022-2(C)Estimating transistor characteristics from low temperature polycrystalline
silicon surface images using deep learning
The 4th Smart Laser Processing Conference 2022, SLPC3-03, pp.28, 19April
2022.
Keita Katayama, Takayuki Kurashige, Takahiro Nagano, Yoshiaki Kakimoto,Akira Mizutani, Daisuke Nakamura, Tetsuya Goto, Hiroshi IkenoueE2022-3(C)Excimer laser doping of low resistance Ni ohmic contacts to n-type 4H-SiC
The 4th Smart Laser Processing Conference 2022, SLPC7-03, pp.47, 21April
2022.
Yoshiaki Kakimoto, Keita Katayama, Takuma Yasunami,
Tetsuya Goto, Daisuke Nakamura, and Hiroshi IkenoueE2022-4(F)[Invited Paper]
HDR CMOS Image Sensors for Automotive Applications
IEEE Transactions on Electron Devices, 69, Issue: 6, (2022), 25 April 2022.
Isao Takayanagi, and Rihito Kuroda
https://doi.org/10.1109/TED.2022.3164370

E2022-5(C)A 4-Tap CMOS Time-of-Flight Image Sensor with In-pixel Analog Memory
Array Achieving 10Kfps High-Speed Range Imaging and Depth Precision
Enhancement
IEEE Symposium on VLSI Circuits Digest of Technical Ppers, pp.48-49, C05-3,(2022), Hawaii, 15 June, 2022
Chia-Chi Kuo, Rihito Kuroda

E2022-6(F)A 70-dB SNR High-Speed Global Shutter CMOS Image Sensor for in Situ
Fluid Concentration Distribution Measurements
IEEE Transactions on Electron Devices, 69, Issue 6, (2022), pp.2965-2972,
June 2022.
Tetsu Oikawa, Rihito Kuroda, Keigo Takahashi, Yoshinobu Shiba, Yasuyuki
Fujihara, Hiroya Shike, Maasa Murata, Chia-Chi Kuo, Yhang Ricardo Sipauba
Carvalho da Silva, Tetsuya Goto, Tomoyuki Suwa, Tatsuo Morimoto, Yasuyuki
Shirai, Takafumi Inada, Yushi Sakai, Masaaki Nagase, Nobukazu Ikeda, andShigetoshi Sugawa
http://doi.org/ 10.1109/TED.2022.3165520

E2022-7(C)Silicon Nitride Film Formations Using Magnetic-Mirror Confined Plasma
System Developed for Minimal Fab System
2022 Asia-Pacific Workshop on Fundamentals and Applications of advanced
Semiconductor Devices (AWAD)
Tetsuya Goto, Thai Quoc Cuong, Seiji Kobayashi, Yuki Yabuta, Shigetoshi
Sugawa and Shiro Hara

E2022-8(F)Adsorption and surface reaction of isopropyl alcohol on SiO2 surfaces
Journal of Vacuum Science & Technology A: AVS: Science & Technology ofMaterials, Interfaces, and Processing, 40, No 5, 053201, (2022), 11 July 2022.
Takezo Mawaki, Akinobu Teramoto, Katsutoshi Ishii, Yoshinobu Shiba, Rihito
Kuroda, Tomoyuki Suwa, Shuji Azumo, Akira Shimizu, Kota Umezawa,
Yasuyuki Shirai, Shigetoshi Sugawa
https://doi.org/10.1116/6.0002002

E2022-9(C)High Resolution and High Speed Inspection Equipment for Mini-LED
Substrates
International Conference on Display Technology, ICDT 2022 - Fuzhou, China,
July (2022).
Toshiro Yasuda, Kazuhisa Kobayashi, Yuichi Yamamoto, Hiroshi Hamori, Wei
Cheng, Ryan Ge, Shigetoshi Sugawa
https://doi.org/10.1002/sdtp.15949

E2022-10(W) [Invited]
Microbubble Technology in Semiconductor Manufacturing
The International Symposium on Plasma & Fine Bubbles, pp.30, August 23,(2022), Online.
Masayoshi Takahashi
E2022-11(W) A High-speed and High Precision Range Imaging Using 4-Tap Time-of-Flight
CMOS Image Sensor and In-pixel Analog Memory Array/画素内アナログメモ
リアレイを有する 4-Tap Time-of-Flight CMOS イメージセンサによる高精度・高速距離イメージング
映像情報メディア学会技術報告・情報センシング研究会(一般社団法人 映像情報メディア学会), (2022), Vol.46, No.29, IST2022-36, pp.9-12, 2022 年 9 月
22 日, ハイブリッド
郭 家祺, 黒田 理人
https://www.ite.or.jp/ken/paper/202209221AKx/
E2022-12(F)Effect of Charge-up of Surfaces of Sintered Y2O3 and Yttrium Oxyfluoride on
Their Erosion Rates due to Ion Bombardment
Journal of Vacuum Science & Technology A, 40, (2022), 062205-1 -062205-7,
Tetsuya Goto, Yoshinobu Shiba, Akinobu Teramoto, Yukio Kishi, andShigetoshi Sugawa
https://doi.org/10.1116/6.0002162

E2022-13(W) Advanced imaging technologies toward semiconductor manufacturing andmore
The 34th International Microelectronics Conference, (2022), pp.1-4, November
12, Sendai
Rihito Kuroda
E2022-14(W) A Study on High Precision and High-Speed Time-of-Flight CMOS ImageSensor for Range Imaging
The 34th International Microelectronics Conference, (2022), pp.5-8, November
12, Sendai
Chia-Chi Kuo and Rihito Kuroda
E2022-15(C)In Situ Measurement and Analysis of Low Pressure Gas Concentration
Distribution Using 70-dB SNR 1,000 Frame-per-second Absorption Imaging
SystemInternational Symposium on Semiconductor Manufacturing 2022, (2022),
PM-41, December 13, Tokyo
Yushi Sakai, Yoshinobu Shiba, Takafumi Inada, Tetsuya Goto, Tomoyuki
Suwa, Akihito Sutoh, Tatsuo Morimoto, Yasuyuki Shirai, Shigetoshi Sugawa,Tetsu Oikawa, Aoi Hamaya, and Rihito Kuroda

E2022-16(C)Electrical Characteristics of LTPS-TFTs Fabricated by ELA with Laser
Intensity Distributions Controlled by Dot Array Masks
Proceedings of the International Display Workshops Volume 29, (2022),
FMC5-1, December 15, Fukuoka
Toru Okatsugi, Keita Katayama, Yoshiaki Kakimoto, Daisuke Nakamura,
Tetsuya Goto, Hiroshi Ikenoue
https://doi.org/10.36463/idw.2022.0284