Paper List
January－December, 2019
E2019-1(F)Power efficienty Figure-of-Merit for image sensors
IEEE Transactions on Electtron Devices, Vol.66, No.1, pp.512-517, January
2019.
Yuichiro Yamashita, Shigetoshi Sugawa
https://doi.org/10.1109/TED.2018.2882857

E2019-2(P)Over 100 million frames per second high speed global shutter CMOS imagesensor
Proceedings of SPIE - The International Society for Optical Engineering,
Vol.11501, 32nd International Congress on High-Speed Imaging and Photonics,
110510B, January 2019.
R. Kuroda, M. Suzuki, and S. Sugawa,https://doi.org/10.1117/12.2524492

E2019-3(C)Low-temperature and low-cost excimer laser doping for poly-Si thin-film
transistor fabrication
SPIE Photonics West 2019, R05, San Francisco, February 2019.
Kaname Imokawa, Nozomu Tanaka, Akira Suwa, Daisuke Nakamura, Taizoh
Sadoh, Tetsuya Goto, and Hiroshi Ikenoue

E2019-4(C)Resistance Measurement Platform for Statistical Analysis of Next Generation
Memory Materials
2019 IEEE International Conference on Microelectronic Test Structures(ICMTS), pp.70-75, Kitakyushu, March 2019.
Takeru Maeda, Yuya Omura, Akinobu Teramoto, Rihito Kuroda, Tomoyuki
Suwa, and Shigetoshi Sugawa

E2019-5(F)A high-sensitivity compact gas concentration sensor using ultraviolet lightabsorption with a heating function for a high-precision trimethyl aluminum gas
supply system
Japanese Journal of Applied Physics, Vol.58, No.SB, (2019),
SBBL04-1-SBBL04-6, March 2019
Hidekazu Ishii, Masaaki Nagase, Nobukazu Ikeda, Yoshinobu Shiba, Yasuyuki
Shirai, Rihito Kuroda, and Shigetoshi Sugawa,https://doi.org/10.7567/1347-4065/aafe69

E2019-6(F)A CMOS image sensor with dual pixel reset voltage for high accuracyultraviolet light absorption spectral imaging
Japanese Journal of Applied Physics, Vol.58, No.SB, (2019), SBBL03-1SBBL03-6, March 2019

Yusuke Aoyagi, Yasuyuki Fujihara, Maasa Murata, Hiroya Shike, Rihito
Kuroda, and Shigetoshi Sugawa
https://doi.org/10.7567/1347-4065/aaffc1
E2019-7(C)SiNx Deposition at Low Temperature Using UV-irradiated NH3
235th Meeting of The Electrochemical Society, Abs.1228, Dallas, May 2019
Y. Shiba, A. Teramoto, T. Suwa, K. Ishii, A. Shimizu, K. Umezawa, R. Kuroda,
and S. Sugawa

E2019-8(P)SiNx Deposition at Low Temperature Using UV-irradiated NH3
ECS Transactions, Vol.89, issue 4, Processes at the Semiconductor Solution
Interface 8, pp.31-36, May 2019.
Y. Shiba, A. Teramoto, T. Suwa, K. Ishii, A. Shimizu, K. Umezawa, R. Kuroda,
and S. Sugawa

E2019-9(F)Improvement of Fundamental Technology of Three-Dimensional Thermal
Compression Bonding with High Accuracy
IEEE Transactions on Components, Packaging and Manufacturing
Thechnology, Vol.9, No.5, pp.836-844, May 2019.
Kohei Seyama, Shoji Wada, Yuji Eguchi, Doug Day, Shigetoshi Sugawa

E2019-10(C)

Systematic characterization of negative-ion-containing microwave-excitedplasmas by Langmuir probe measurement
The 15th International Symposium on Sputtering and Plasma Processes(ISSP2019), FS1-9, pp.25-27, Kanazawa, June 2019.
Tetsuya Goto and Shigetoshi Sugawa

E2019-11(C)Investigation of Rotating Spokes in DC Magnetron Plasma Using High Speed
Video Camera Over 1 Million Frames Per Second
The 15th International Symposium on Sputtering and Plasma Processes(ISSP2019), pp.FS1-3, (2019), pp.11-13.
Shintaro Yamazaki, Tetsuya Goto, Manabu Suzuki, Rihito Kuroda andShigetoshi Sugawa

E2019-12(C)Over 100 Million Frames per Second 368 Frames Global Shutter Burst CMOS
Image Sensor with In-pixel Trench Capacitor Memory Array
International Image Sensor Workshop, (2019), pp.266-269.
Manabu Suzuki, Rihito Kuroda, and Shigetoshi Sugawa

E2019-13(C)A VGA Optical Filter-less CMOS Image Sensor with UV-selective and Visible
Light Channels by Differential Spectral Response Pixels
International Image Sensor Workshop, (2019), pp. 302-305.
Yhang Ricardo Sipauba Carvalho da Silva, Rihito Kuroda, and ShigetoshiSugawa

E2019-14(C)A High Optical Performance 2.8μm BSI LOFIC Pixel with 120ke- FWC and160μV/e- Conversion Gain
International Image Sensor Workshop, (2019), pp.246-249.
Ken Miyauchi, Shunsuke Okura, Kazuya Mori, Isao Takayanagi, Junichi
Nakamura and Shigetoshi Sugawa

E2019-15(F)Impact of CoFeB surface roughness on reliability of MgO films in
CoFeB/MgO/CoFeB magnetic tunnel junction
Japanese Journal of Applied Physics, 58, (2019), SIIB29-1 - SIIB29-6.
Hyeonwoo Park, Akinobu Teramoto, Jun-Ichi Tsuchimoto, Marie Hayashi,Keiichi Hashimoto and Shigetoshi Sugawa
https://doi.org/10.7567/1347-4065/ab1bd2

E2019-16(F)Evaluation of Silicon Nitride Film Formed Using Magnetic-Mirror Confined
Plasma Source
ECS Journal of Solid State Science and Technology, 8, Issue 8, (2019),
N113-N118.
Tetsuya Goto, Seiji Kobayashi, Yuki Yabuta, and Shigetoshi Sugawa
https://doi.org/10.1149/2.0121908jss

E2019-17(F)A Highly Robust Silicon Ultraviolet Selective Radiation Sensor Using
Differential Spectral Response Method
Sensors, Vol.19, Issue 12, (2019).
Yhang Ricardo Sipauba Carvalho da Silva, Rihito Kuroda and Shigetoshi
Sugawa, “
https://doi.org/10.3390/s19122755

E2019-18(C)[Invited] Selective Laser Annealing Technology for LTPS Thin FilmTransistors Fabrications
Extended Abstracts of the 2019 International Conference on Solid State
Devices and Materials, G-2-01, (2019), pp. 311-312.
Tetsuya Goto, Kaname Imokawa, Takahiro Yamada, Kaori Saito, Jun Gotoh,Hiroshi Ikenoue and Shigetoshi Sugawa

E2019-19(C)High Reliability CoFeB/MgO/CoFeB Magnetic Tunnel Junction Fabrication
Using Low-damage Ion Beam Etching
Extended Abstracts of the 2019 International Conference on Solid State
Devices and Materials, H-7-02, (2019), pp. 401-402.
Hyeonwoo Park, Akinobu Teramoto, Jun-ichi Tsuchimoto, Keiichi Hashimoto,
Tomoyuki Suwa, Marie Hayashi, Rihito Kuroda and Shigetoshi Sugawa, “E2019-20(C)An Accuracy Improved Resistance Measurement Platform for Evaluation ofEmerging Memory Materials
Extended Abstracts of the 2019 International Conference on Solid State
Devices and Materials, M-4-05, (2019), pp. 531-532.
Takeru Maeda, Yuya Omura, Rihito Kuroda, Akinobu Teramoto, Tomoyuki
Suwa and Shigetoshi Sugawa

E2019-21(C)Grain Growth Control with a Dot Mask in Selective Laser Annealing for Stable
LTPS Thin Films Transistors Fabrication
Extended Abstracts of the 2019 International Conference on Solid State
Devices and Materials, G-2-02, (2019), pp.313-314.
Kaname Imokawa, Takahiro Yamada, Kaori Saito, Jun Gotoh, Tetsuya Goto,
Daisuke Nakamura, Hirohi Ikenoue

E2019-22(C)Synchrotron X-ray Photoelectron Spectroscopy on interface state densities ofCVDGrown
SiO2/4H-SiC Sturcures Treated by Post-Deposition Treatments
Extended Abstracts of the 2019 International Conference on Solid State
Devices andMaterials, Nagoya, 2019, pp741-742
Akira Kiyoi, Tomoyuki Suwa, Kazumasa Kawase and Akinobu Teramoto

E2019-23(F)Effects of temperatures and carbon dioxide nanobubbles on superior electric
storage for anodically oxidized films of AlY10 amorphous alloy
AIP Advances 9, 095202, (2019).
Mikio Fukuhara, Tomoyuki Kuroda, Fumihiko Hasegawa, Masayoshi
Takahashi, Tomoyuki Suwa, Toshiyuki Hashida, Kazuhisa Sato, Masahiko
Nishijima, and K. Konno
https://doi.org/10.1063/1.5102082

E2019-24(C)Plasma Resistance of Sintered Yttrium Oxyfluoride(YOF) with Various Y, O,and F Composition Ratios
AVS 66th International Symposium& Exhibition, Plasma Science andTechnology, Session PS+AS+EM+SS+TF-MoA2, (2019).
Tetsuya Goto, Yoshinobu Shiba, Akinobu Teramoto, Yukio Kishi, Shigetoshi
Sugawahttps://www2.avs.org/symposium2019/Papers/Paper_PS+AS+EM+SS+TF-Mo
A2.html

E2019-25(F)

Low-Temperature
DepositionofSilicon
NitrideFilms
Using
Ultraviolet-Irradiated Ammonia
ECS Journal of Solid State Science and Technology, 8, Issue 11, (2019),
P715-P718.
Yoshinobu Shiba, Akinobu Teramoto, Tomoyuki Suwa, Katsutoshi, Ishii, Akira
Shimizu, Kota Umezawa, Rihito Kuroda, and Shigetoshi Sugawa
https://doi.org/10.1149/2.0131911jss

E2019-26(C)Influence of Silicon Wafer Surface Roughness on Semiconductor Device
Characteristics
International Workshop on DIELECTRIC THIN FILMS FOR FUTURE
ELECTRON DEVICES: SCIENCE AND TECHNOLOGY, (2019), pp. 50 51.
K. Mori, S. Samata, N. Mitsugi, A. Teramoto, R. Kuroda, T. Suwa, K.
Hashimoto, and S. Sugawa

E2019-27(F)Selectivecomposition
modification
deposition
utilizingion
bombardment-induced interfacial mixing during plasma-enhanced atomic layer
deposition
Japanese Journal of Applied Physics, 58 (2019), 110902-1-110902-5.
Masaki Hirayama and Shigetoshi Sugawa
https://doi.org/ 10.7567/1347-4065/ab4754

E2019-28(C)[Plenary Talk] Advanced CMOS image sensor technologies for sensing
applications in the era of IoT
The Sixth Symposium on Novel Optoelectronic Detection Technology andApplication (NDTA2019), (2019), pp.21-22.
Rihito Kuroda, Shigetoshi Sugawa

E2019-29(C)Dielectric breakdown of MgO in MRAM
Special MRAM poster session IEDM, No.4, (2019).
A. Teramoto, J. Tsuchimoto, H. Park, M. Hayashi, K. Tsunekawa, T. Suwa, R.
Kuroda, S. Sugawa

E2019-30(F)A 120-ke− Full-Well Capacity 160-µV/e− Conversion Gain 2.8-µm
Backside-Illuminated Pixel with a Lateral Overflow Integration Capacitor
Sensors, 19, 24, (2019), 5572, December 17, 2019.
Isao Takayanagi, Ken Miyauchi,Shunsuke Okura,Kazuya Mori, Junichi
Nakamura, and Shigetoshi Sugawa
https://doi.org/10.3390/s19245572.

E2019-31(F)An Optical Filter-Less CMOS Image Sensor with Differential Spectral
Response Pixels for Simultaneous UV-Selective and Visible Imaging
Sensors, 20, No.1, (2020), pp.13, Published December 18, 2019.
Yhang Ricardo Sipauba Carvalho da Silva, Rihito Kuroda and Shigetoshi
Sugawahttps://doi.org/10.3390/s20010013