Multilayer Multimaterial Nanoimprinting
combined with Inkjet Printing
M. Mühlberger, A. R. Moharana, H. Außerhuber, S. Kopp, T. Mitteramskogler,D. Fechtig
PROFACTOR GmbH, Steyr, 4407, Austria
e-mail: michael.muehlberger@profactor.atNanoimprint Lithography [1] can be done on large areas (e.g. [2]) as well as on curved surfaces(e.g. [3,4]), both of which pose interesting challenges on material deposition. One advantage ofUV-based nanoimprinting is the fact that there is a big variety of UV-curing materials availablethat have different mechanical, chemical or optical properties and can be coated in different ways.
The combination of different materials, especially materials with different optical properties could
give rise to interesting optical applications. We use plate-to-plate as well as roll-to-plate [5]nanoimprinting to perform multi-layer processes by combining different materials on top of eachother. We are exploring combinations of different materials from suppliers like e.g. micro resist
technology [6], Inkron [7] and Solvay Solexis [8].
Figure 1 shows the schematic layer sequence for the samples shown here. A first nanoimprint isperformed on a glass substrate using a low refractive index material. Subsequently a material witha higher refractive index is deposited and also nanostructured. Finally the layer stack is covered bya flat layer of the low index material. As can be seen in figure 2 the area with the high index material
is clearly visible. Figure 3 shows the diffraction pattern resulting from the three different areas. Inthe region with the high index material, the optical effect results from both nanopatterned layers(low index layer and high index layer). Using a high refractive index material that can also be inkjet
printed provides high flexibility in pattern design when using a full area nanoimprint stamp. Figure
4 shows such an example on a 10x10cm² glass substrate, like it can be processed using roll-to-platenanoimprinting.
We will report on the optical properties of the used materials, the processing conditions and show
large area results obtained by roll-to-plate nanoimprinting and inkjet deposited materials.
Funding from the multiLINK project (funded by bmvit) and LINK project is gratefully
acknowledged. A part of this research is carried out within the ”FTI-Project DigiManu – Labor fürdie Digitalisierung der Produktion” project funded by the State of Upper Austria through theStrategic Economic and Research Program ”Innovatives OÖ 2020”.
References:[1]
H. Schift, Nanoimprint lithography, J Vac Sci Technol B 26 (2008) 458.
[2]
M. Leitgeb et al., ACS Nano. 10 (2016) 4926–4941.
[3]
M. Mühlberger et al., 33rd European Mask and Lithography Conference, SPIE, Dresden,
Germany, 2017: p. 48.
[4]
T. Köpplmayr et al., Surface Topography: Metr Prop 3 (2015) 024003.
[5]M. Mühlberger, A Roll-to-Plate UV-nanoimprint tool for micro and nano-opticalapplications, (2016). http://conference.vde.com/emlc2016/Pages/EMLC2016.aspx.
[6]
micro resist technology GmbH. http://www.microresist.de/ (accessed May 07, 2019).
[7]
Inkron, http://inkron.com/ (accessed May 07, 2019).
[8]
Fluorolink® PFPE | Solvay, https://www.solvay.com/en/markets-and-products/featuredproducts/Fluorolink.html (accessed May 07, 2019).

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3Figure 1. Schematic layer sequence for theFigure 2. Photograph of a sample obtained
multilayer stack. The high index material can also be by plate-to-plate nanoimprinting indicating
inkjet depositedthe three different areas, shown in figure 1.

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1Figure 3. Diffraction patterns obtained from different Figure 4. 10x10cm² sample with inkjet
areas of the sample shown in figure 2. From bottom to deposited and nanoimprinted high refractive
top: Standard pattern in area 1, no diffraction from index material.
area 2 and double pattern from area 3.