updated October 10, 2019

Monday, October 14
10:30 – 11:30Registration

11:30 – 2:20

NIL Ecosystem Session 1
11:30 Welcome and Introduction
11:40 Mastering; more than just litho and etch….
T. Nielsen, B. Bilenberg, and N. Hansson (invited)
12:00 Breaking R2R NIL Mastering Barriers: Speed, Precision & Cost
John Berg / Carpe Diem (invited)
12:20 Large area interference lithography as mastering technique to pattern silicon-based tandem
solar cells
Benedikt Bläsi, Volker Kübler, Hubert Hauser
12:40 Process Upscaling – Nanoimprint from small to large areas
Thomas Exlager (invited)
1:00 SCIL technology; from sample to production
Marc A. Verschuuren (invited)
1:20 Wafer Scale Manufacturing Imprintor Using Flexible Mold
Hua Tan (invited)
1:40 Electric-ﬁeld-driven Jet Deposition Based Micro-and Nano-scale 3D printing and Its
Applications
Hongbo Lan (invited)
2:00 UV curing materials for Wafer Level Optics
Patrick Heissler

2:20Break2:40 – 5:40

NIL Ecosystem Session 2
2:40 Matching the crosscutting challenges in photopolymers and functional inks for nanoimprint
lithography
Arne Schleunitz (invited)
3:00 A Materials-First Approach to Device Fabrication using Imprint Lithography
James J. Watkins
3:20 From lab to fab - Roll to Roll replication of microstructures in to PDMS
Olli-Heikki Huttunen (invited)
3:40 Recent case studies: NIL Industrial Applications in China
Ran Ji
4:00 Excellence in Microlens Imprint Lithography and Wafer-Stacking
Reinhard Voelkel (invited)
4:20 Design for NIL foundry using Wire Grid Polarizer volume production release methodologies
on 200mm Full Wafer NIL
Bradley R Williams, Kevin Black, Rumyana N. Petrova (invited)
4:40 Roll-to-Plate nanoimprint lithography for large-area applications: equipment, materials andprocesses
Sander Kommeren, Pim Veldhuizen, Jan Matthijs ter Meulen, Rob van Erven, Bram
Titulaer
5:00 Flexpol Ecosystem: Developing a bacterial repelling and killing ﬁlm.
Nikos Kehagias
5:20 Nanostructures in seven-league boots - the potential of R2R-UV nanoimprinting
B. Stadlober, D. Nees, A. Haase, M. Smolka, U. Palﬁnger, L. Kuna, S. Ruttloff, C. Leiner,
C. Sommer, M. Sonnleitner, J. Hesse

5:40

NIL Ecosystem Roundtable

6:05

NIL Ecosystem Roundtable6:30

Welcome and Networking Reception in Exhibit Hall

Tuesday, October 15
Continental Breakfast
8:00 – 10:10

Session 1 - Optics 1
8:00 NIL for advanced AR displays
Ismo Vartiainen (invited)
8:20 R2R-UV-nanoimprinting as a powerful mean for large-area fabrication of freeform microoptical elements
Dieter Nees
8:35 Diffractive Augmented Reality (AR) Waveguides Fabricated by NIL: Manufacturing
Challenges and Improved Approaches
Arseny Alexeev
8:50 High volume manufacturing of advanced diffractive optical elements by injection molding
T. Nielsen, B. Bilenberg, A. Johansson, V. Miljkovic, N. Hansson and I. Czolkos
9:05 R2R Nanoimprint Process for Multilevel OLED substrate with Transparent Metal MeshConductor
W. Dennis Slafer (with Ruth Shinar, Joe Shinar, Rana Biswas)
9:20 High Quality Diffractive Optical Elements (DOEs) Using Nanoimprint Lithography
Simon Drieschner
9:35 Full Wafer Double Sided Monolithic Lens Fabrication Using UV-Imprint Lithography
Dr.Vijay Ramya Kolli
9:50 Plasmonic Devices Based on Collapsible Nanoﬁngers
Boxiang Song, Pan Hu, Yunxiang Wang, Wei Wu (invited)

10:10
10:30 – 12:15Morning Break in Exhibit Hall

Session 2 - Optics 2
10:30 Plenary: Federico CapassoHigh Performance Flat Optics
11:15 Multi-Level Nanoimprint Lithography for TFT Display Manufacturing
Auke Jisk Kronemeijer, Lukasz Witczak, Tamer Dogan, Joris de Riet, Thijs Bel, RoyVerbeek, Joris Maas , Ilias Katsouras and Gerwin Gelinck
11:30 Transparent colored signage and display enabled by nanoimprinted multi-layer gratings
Zeyang Liu, L. Jay Guo
11:45 Fabrication of pixelated wiregrid polarizers for real-time laser beam proﬁle analysis
Florian Schlachter, Michael Hornung, Stephan Suckow, Max Christian Lemme
12:00 Curved single crystals from solution at room temperature
Harshal Agrawal, Erik Garnett

12:15 – 1:45Lunch1:45 – 3:05

Session 3 - Devices 1
1:45 Keynote: Christopher M. Spadaccini
Additive Manufacturing and Architected Materials: New Processes and Materials
2:15 Direct-written and Low-voltage Polymer Field-Effect Transistors Operating at RadioFrequencies
Mario Caironi (invited)
2:35 Thermal NIL-based graphene patterning for permeable base heterojunction transistors
L.S.D. Antony, C. Strobel, R. Kirchner, C.A. Chavarin, Ch. Wenger, M. Albert, J.W.
Bartha2:50 Three-terminal memristive RF switch
Puming Fang, Sayan Das, Joseph Bardin, Qiangfei Xia

3:05
3:30 – 5:05

Afternoon Break in Exhibit HallSession 4 - Devices 2
3:30 UV-sensor based on capillary ﬁlled sub- micrometer interdigitated electrode arrays
Helmut Schift3:45 Toward a Self-Aligned, Roll-to-Roll Manufacturing Process for Printed Circuitry
C. Daniel Frisbie (invited)
4:05 Solar Absorber by Nanoimprint Lithography and Sputter Deposition
Tina Mitteramskogler
4:20 Imprint-induced grain growth in perovskite layers
Andre Mayer, Neda Pourdavoud, Tobias Haeger, Ralf Heiderhoff, Miriam Leifels,
Johannes Rond, Johannes Staabs, Patrik Görrn, Thomas Riedl, Hella-Christin Scheer
4:35 Direct Imprinting of Microelectrodes for High-Performance Miniature Power Sources
Wenhao Li, Vince Einck, Cheng Li, Yiliang Zhou, Troels Christiansen, Bo B. Iversen
and James J. Watkins
4:50 Faithful Replication of Large-Area Nanostructures via Pulsed Direct Current High-Voltage
Electrohydrodynamic Phase Instability
Dae Joon Kang (invited)

6:00

Dinner Cruise on Boston Harbor
To ensure your place on the cruise please register by October 1. After October 1 guests will beaccommodated on a space available basis.
Sponsored by:Wednesday, October 16
Continental Breakfast
8:00 – 10:30

Session 5 - Process 1
8:00 Approach of ﬁne resist ﬁlling technologies for UV-NIL at AIST
Sung-Won Youn, Kenta Suzuki, Hiroshi Hiroshima (invited)
8:20 Impact of molecular size in sub 10nm nanoimprint lithography based on computational
study
R. Sakata1, M. Yasuda, K. Tada, Y. Miyashita, M. Shirai, H. Kawata, Y. Hirai8:35 Topography and Flatness Induced Overlay Distortion Correction using Resist Drop Pattern
Compensation in Nanoimprint Lithography Systems
Anshuman Cherala, Se-Hyuk Im, Mario Meissl, Ahmed Hussein, Logan Simpson,Ryan Minter, Ecron Thompson, Jin Choi, Douglas J. Resnick, Mitsuru Hiura, Satoshi
Iino
8:50 Optimizing Filling of Anisotropic Templates in UV Nanoimprint Lithography
Yang Ban and Roger T. Bonnecaze (invited)
9:10 Silica Nanoparticles-Containing Replica Resin Molds for Step-and-Repeat UV
Nanoimprinting
Shunya Ito, Takahiro Nakamura, and Masaru Nakagawa
9:25 Residual layer etching techniques for NIL in photovoltaics
Hubert Hauser, Ralph Müller, Oliver Höhn, Rita M. S. Freitas, Armin Richter,
Benedikt Bläsi
9:40 Multilayer Multimaterial Nanoimprinting combined with Inkjet Printing
M. Muehlberger, A. R. Moharana, H. Außerhuber, S. Kopp, T. Mitteramskogler, D.
Fechtig
9:55 Design for nanoimprint lithography: Hot spot modiﬁcation through total NIL processsimulation
Sachiko Kobayashi, Kodera Katsuyoshi, Arisawa Yukiyasu, Hirotaka Tsuda, Ryoichi
Inanami, Motofumi Komori, Takuya Kono, Tetsuro Nakasugi and Tatsuhiko Higashiki(invited)

10:30

Morning Break in Exhibit Hall

10:40 – 12:00

Session 6 - Process 2
10:40 Plenary: Professor Stephen Chou
New Innovations in NIL
11:10 Merging Nanoimprint with other Polymer Technologies
Prof. Dr. Per Magnus Kristiansen (invited)
11:30 The Role of Tip-based Measurement in a Hybrid Metrology Framework for Roll-to-Roll
Nanofabrication
Michael A Cullinan
11:45 Optical reﬂectance-based software for automated characterization of nanomaterials:
outcomes of the NSF Nanohub’s NanoMFG node
Vu Nguyen, Wan Li, Hannah Gramling, Yunsu Park, Ke Xu and Hayden Taylor

12:00 – 1:00

Lunch

1:00 – 2:30

Session 7 - Bio
1:00 Keynote: M. Shane Bowen
Nanofabrication and Genomics: How Patterning is Enabling a Revolution in Healthcare
1:30 Roll-to-roll Fabrication of Through-hole Isoporous Structures and Applications as Cellculture and Filtration Membranes
Him Cheng Wong and Hong Yee Low
1:45 Surface Charge Density Dependent DNA Capture through Polymer Planar Nanopores
Fabricated by NIL
Junseo Choi, Zheng Jia, and Sunggook Park*
2:00 Nano, Micro, or Combination: Design Rules for Self-cleaning Surfaces
Achille Francone
2:15 High performance DLC-based mold technology with high control over micro and nanofeatures for optics and microﬂuidics
M. Daniela Angione

2:30
3:00 – 4:35

Afternoon Break in Exhibit Hall

Session 8 - Nanomanufacturing
3:00 Nanocoining – Seamless nanopatterned drum molds for roll-to-roll nanoimprint
lithography
Nichole C Miller, Stephen J Furst
3:15 A composite imprint lithography technique for the mass production of large-area
microstructures
Guangming Zhang
3:30 Challenges for Scaling UV NIL to Production Speeds using Roll-to-Roll Manufacturing
Xin Chen, Manogna Jamhapuram, Ron Markum, Stephen Qi, D.A. Lucca and J.K. Good
3:45 Manufacturing assessment of sub 100 nm features in Si/SiO2 substrates based on EVG
nanoimprint solution for 8 inch substrates
Hubert Teyssèdre
4:00 Size and Shape Control in Nanoimprint Resist Patterning and During Pattern Transfer withApplications in CMOS Memory Scaling
S.V. Sreenivasan (invited)
4:20 A thermomechanical approach to mold ﬁlling in roll-to-roll nanoimprinting lithography
Juan P. Gomez-Constante, Prabhakar R. Pagilla and Kumbakonam R. Rajagopal

4:35

Farewell

6:00

Committee DinnerThursday, October 17
7:45 - 3:30

Optional Tour of Advanced Print and Roll-to-Roll Manufacturing
Demonstration Facility at UMass Amherst
Transportation and Lunch Provided (space is limited to ﬁrst 50 participants)

7:45 Bus Arrives at Seaport Hotel
8:15 Bus Departs for UMass Amherst
10:15 Bus Arrives UMass Amherst
10:30 Convene Life Science Laboratories Conference Center S330
Coffee Break
10:45 Facilities and Capabilities Overview and Discussion
11:45 Catered Lunch - Networking
Sponsored by:

12:30 Facility Tours
1:15 Wrap-up
1:30 Bus Departs for Boston Seaport
3:30 Bus Arrives at Seaport HotelEXHIBIT HALL

Poster Session
3D Printed Freeform Lenses with Nanoimprinted Moth-Eye AntireﬂectiveStructures
Amiya R. Moharana, Pavel Kulha, Michael J. Haslinger, Michael Mühlberger, DanielFechtig
Back injection molding of polymer ﬁlms with capillary ﬁlled sub-micron silver
wires
Helmut Schift
Capillary Filling of Nanoparticle Inks in Open Microchannels
Tina Mitteramskogler
Computational Study on UV Curing Characteristics Based on Stochastic Model
M. Koyama, M. Shirai, H. Kawata, Y. Hirai, M. Yasuda
Control of Sub-50 nm Thickness of UV-Cured Thin Films by Print-and-Imprint
MethodMasaru Nakagawa, Kento Ochiai, Akiko Onuma, Kazue Suto, Takahiro Nakamura,
Shunya Ito
Deterministic assembly of arrays of lithographically deﬁned WS2 and MoS2
monolayer features directly from multilayer sources into van der Waals
heterostructures
Vu Nguyen et. al.
Development of a ﬁber-optic based metrology for nano/microscale mold ﬁlling
Majid Fazeli Jadidi
Double replication for characterizing cracks in surface-hardened PDMS
Miriam Leifels, A. Mayer, P. Görrn, H.-C. Scheer
Fabrication of Grating-based Solar Thermal Absorber using Deep Neural Networkand Nanoimprint Lithography
Pil-Hoon Jung, Junyong Seo, Mingeon Kim, Son soomin Son, Bong Jae Lee, Heon
Lee
Fabrication of large area (0.5m2) soft mold using roller pressing UV imprintmachine
Woo Young Kim, Su Hyun Choi, Seon Jun Kim, Young Tae Cho, Kwang Young Kim,
Sin Kwon, Seung Hyun Lee, Hyun tae Kim
Fabrication of micro-lens array with ARS by using high hardness UV curable resin
Masato Nakamura, Shin Hiwasa, Jun Taniguchi
Fabrication of Micro-size Re-entrant Structure by Two Step Imprint Process
Su Hyun Choi and Young Tae Cho
Large area soft mold using precision step & repeat align process and roll-to-roll
UV imprint process using it
Hyuntai Kim, Gaeul Kim, Dongha Song, Seunghyun Lee, Kwangyoung Kim,
Youngtae Cho, Sin Kwon
Liquid metal electrical conductors in R2R imprinted PDMS microﬂuidic channels
Olli-Heikki Huttunen, Johanna Hiitola-Keinänen
Low Cost, Durable Masters for Imprint Lithography and Injection Molding by NIL
Patterning of Metal Oxides
Feyza Dundar, Vince Einck, James J. Watkins
Multimode Sensing for Roll-to-Roll Flexible Electronics Print Process Control
Jingyang Yan, Mehdi Riza, Rui Ma, Xian Du
Multiple replication of hierarchical structures from polymer masters withanisotropy
A. Mayer, J. Rond, J. Staabs, M. Leifels, H.-C. Scheer, J. Zajadacz, M. Erhardt, P.
Lorenz, K. Zimmer
Nanodiamond surface modiﬁcation and technology development of a high dose
non-steroidal anti-inﬂammatory drug contained in a medical patch
wwKim, Ckrhee, A.P Puzyr

Nanoimprint lithography for large-scale fabrication of micro- and nano-structures
Patrícia C. Sousa*, José Fernandes, Joana Santos, Jordi Llobet, Hélder Fonseca,Carlos Calaza, João Gaspar
Observation of Fluorescence Inclination Moiré Fringes for Imprint Alignment
Takuma Yoshida, Shunya Ito, Takahiro Nakamura, Masaru Nakagawa
Patterning of Zinc-Tin-Oxide TFTs Using an Electrohydrodynamic Jet PrinterWoon-Seop Choi
Selection of UV-Resin Molds Having Nanostructures for Thermal-NIL
Junseo Choi, Zheng Jia, Sunggook Park*
Stable transfer technique of anti-reﬂection structure using high hardness and antifouling UV curable resin
Junya Kawauchi, Shin Hiwasa, Jun Taniguchi
Ultra-High Refractive Index Polymers in the Visible Wavelength for Nanoimprint
Lithography
Carlos Pina-Hernandez, Khai Le, Arian Gashi, Stefano Cabrini, Keiko Munechika
YES Equipment Solutions for Imprint Lithography
Chao Liu; Ken Sautter, Kaushal Singh, Nitin Vaish