NK OPTIMER® NL series
UV-Curable Composit for Micro Optical Elements
Products
NL-S1010

NL-S1030

NL-S1040

SX003

High Tg
High heat
resistance
Solvent free

Solvent freeLow Viscosity
Heat resistanceHigh Tg
High heat
resistance
Solvent free

Solvent freenD1.61
Non filler
Heat resistance

DOE
MLA
WLO

Dilluentfor NL-S1010

DOE
MLA
WLO

MLA
WLO
DOE

Yes
400-600

Yes

1800-2600
50-200Yes
18100-300

50-2001800-2600
100-300

Glass transition temperature (DMA, °C)

220

160

220

52Curing Shrinkage [%]81147486nm (F)

1.521

1.512

1.526

589nm (D)

1.514

1.504

1.507

1.626
1.612656nm (C)Abbe number at 25˚C/77˚F (V D )

1.510

1.501

1.503

1.605

4644

2229Features

Applications
Properties before UV-curing
Solvent-freeYes

Viscosity (25˚C/77˚F) [mPa・s]
Exposure dose @365nm※1 [mJ/cm2]
Properties after UV-curing

RI (25˚C/77˚F)❖Suitable for making optical elements with nanoimprint lithography(NK Optimer® NL-S1040

W100nm x H500nm)❖We can customize and meet your required property.
Note: Numerical data in the table are typical and any guarantee is not provided.
1 / 13
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2024.04.16

NK OPTIMER® NL series
NL-S1010
Applications❖Nano imprint Lithography
❖MLA

❖DOE

❖WLO

❖Lens and prism bondingFeatures❖Solvent free
❖Suitable for making optical elements with nanoimprint lithography❖Suitable for solder reflow post process❖High Tg, high heat resistance (Solder heat resistance 300˚C/572˚F 3min. 3times), excellent
durability❖High transmittance and good transparency

Typical Properties
Uncured resin
Viscosity at 25 °C, mPa.s or cps
Solvent freeDensity (g/mL)
Exposure dose @365nm※1 [mJ/cm2]
Cured film
Appearance of cured adhesiveShrinkage※2 (linear, %)Hardness – Shore D
Glass transition temperature (DMA, °C)
Refractive index of cured film (25 °C)

Abbe Number at 25 °C (VD)

1800 to 2600
Yes
1.1350 to 200
optically clear890220@ 486 nm (F) 1.521@ 589 nm (D) 1.514@ 656 nm (C) 1.510
46

Refractive Index

Cauchy equation

Wavelength [nm]2 / 13
Wakayama：TEL +81-73(423)3256 Tokyo sales office：TEL+81- 3(3256)2671
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2024.04.16

NK OPTIMER® NL series
Transmittance [%]UV-Vis and NIR spectrum

Wavelength [nm]Pencil Hardness
Bend test (cylindrical mandrel)
Heat resistance※3
Initial Value
Tt [%] >90Haze<1YI3.0
Heating loss (300˚C/572˚F, 1hr)

H<2mmAfter 3min x 3 300˚C/572˚FΔTt [%] <1Δhaze <1ΔYI<1<-2%※1 Irradiate 1mm thick sample with UV-LED (365nm) 5mW/cm 2 and checked by finger※2 Irradiate 1mm thick sample with 5times UV-LED (365nm) 1pass 5mW/cm 2 100mJ/cm2and measure the cured compound※3 Measure 5 pass 1mm thick
RPM-Thickness curve

NV-Thickness curve

Coating condition: Spin-coating 1000rpm on 4"
silicon wafer
Diluent: PGMEA❖We can customize and meet your required property.
Note: Numerical data in the table are typical and any guarantee is not provided.
3 / 13
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Osaka sales office：TEL+81- 6(6533)0395 Shanghai：TEL +86-21-6235-1811
https://www.shin-nakamura.com/
CopyRight©2023 Shin-Nakamura Chemical Co., Ltd. All Right Reserved
2024.04.16

NK OPTIMER® NL series
NL-S1030(Heat resistant dilluent for NL-S1010)

Applications❖Nano imprint Lithography
❖MLA

❖DOE

❖WLO

❖Lens and prism bondingFeatures❖Solvent free
❖Low Viscosity❖Suitable for making optical elements with nanoimprint lithography❖High Tg, high heat resistance (Solder heat resistance 300˚C/572˚F 3min. 3times), excellent
durability❖High transmittance and good transparency

Typical Properties
Uncured resin
Viscosity at 25 °C, mPa.s or cps
Solvent freeDensity (g/mL)
Exposure dose @365nm※1 [mJ/cm2]
Cured film
Appearance of cured adhesiveShrinkage※2 (linear, %)Hardness – Shore D
Refractive index of cured film (25 °C)

Abbe Number at 25 °C (VD)

18Yes
1.08
100 to 300
optically clear1190@ 486 nm (F) 1.512@ 589 nm (D) 1.504@ 656 nm (C) 1.501
44

Refractive Index

Cauchy equation

Wavelength [nm]4 / 13
Wakayama：TEL +81-73(423)3256 Tokyo sales office：TEL+81- 3(3256)2671
Osaka sales office：TEL+81- 6(6533)0395 Shanghai：TEL +86-21-6235-1811
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2024.04.16

NK OPTIMER® NL series
Pencil Hardness
Bend test (cylindrical mandrel)
Heat resistance※3
Initial ValueTt [%] >90Haze<1YI3.0
Heating loss (300˚C/572˚F, 1hr)

HB<2mmAfter 3min x 3 300˚C/572˚FΔTt [%] <1Δhaze <1ΔYI<1<-6%※1 Irradiate 1mm thick sample with UV-LED (365nm) 5mW/cm 2 and checked by finger※2 Irradiate 1mm thick sample with 5times UV-LED (365nm) 1pass 5mW/cm 2 100mJ/cm2and measure the cured compound※3 Measure 5 pass 1mm thick
RPM-Thickness curve❖We can customize and meet your required property.
Note: Numerical data in the table are typical and any guarantee is not provided.

5 / 13
Wakayama：TEL +81-73(423)3256 Tokyo sales office：TEL+81- 3(3256)2671
Osaka sales office：TEL+81- 6(6533)0395 Shanghai：TEL +86-21-6235-1811
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2024.04.16

NK OPTIMER® NL series
NL-S1040
Applications❖Nano imprint Lithography(W100nm x H500nm)

❖MLA

❖WLO

❖DOE

❖Lens and prism bondingFeatures❖Solvent free
❖Spin coat-able❖Suitable for making optical elements with nanoimprint lithography❖Suitable for solder reflow post process❖High heat resistance (Solder heat resistance 260˚C/500˚F 3min. 3times), excellent durability❖High transmittance and good transparency

Typical Properties
Uncured resin
Viscosity at 25 °C, mPa.s or cps
Solvent freeDensity (g/mL)
Exposure dose @365nm※1 [mJ/cm2]
Cured film
Appearance of cured adhesive
Shrinkage※2 (linear, %)Hardness – Shore D
Glass transition temperature (DMA, °C)
Refractive index of cured film (25 °C)

Abbe Number at 25 °C (VD)

400 to 600
Yes
1.12
50 to 200
optically clear
491220@ 486 nm (F) 1.526@ 589 nm (D) 1.507@ 656 nm (C) 1.503
226 / 13
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Osaka sales office：TEL+81- 6(6533)0395 Shanghai：TEL +86-21-6235-1811
https://www.shin-nakamura.com/
CopyRight©2023 Shin-Nakamura Chemical Co., Ltd. All Right Reserved
2024.04.16

NK OPTIMER® NL series
Refractive Index

Cauchy equation

Wavelength [nm]Transmittance [%]UV-Vis and NIR spectrum

Wavelength [nm]Heat resistance※3
Initial Value

Tt [%]HazeYI>90<1<1After 3min x 3 260˚C/500˚F

ΔTt [%] <1Δhaze <1ΔYI<1※1 Irradiate 1mm thick sample with UV-LED (365nm) 5mW/cm 2 and checked by finger※2 Irradiate 1mm thick sample with 5times UV-LED (365nm) 1pass 5mW/cm 2 100mJ/cm2and measure the cured compound※3 Measure 5 pass 1mm thick
RPM-Thickness curve❖We can customize and meet your required property.
Note: Numerical data in the table are typical and any guarantee is not provided.
7 / 13
Wakayama：TEL +81-73(423)3256 Tokyo sales office：TEL+81- 3(3256)2671
Osaka sales office：TEL+81- 6(6533)0395 Shanghai：TEL +86-21-6235-1811
https://www.shin-nakamura.com/
CopyRight©2023 Shin-Nakamura Chemical Co., Ltd. All Right Reserved
2024.04.16

NK OPTIMER® NL series
SX003Applications❖Nano imprint Lithography
❖MLA

❖WLO

❖Lens and prism bonding❖DOEFeatures❖Solvent free
❖Spin coat-able❖Suitable for making optical elements with nanoimprint lithography❖Suitable for solder reflow post process❖High heat resistance (Solder heat resistance 260˚C/500˚F 3min. 3times), excellent durability❖High transmittance and good transparency

Typical Properties
Uncured resin
Viscosity at 25 °C, mPa･s or cps
Solvent freeDensity (g/mL)
Exposure dose @365nm※1 [mJ/cm2]
Cured film
Appearance of cured adhesive
Shrinkage※2 (linear, %)Hardness – Shore D
Glass transition temperature (DMA, °C)
Refractive index of cured film (25 °C)

Abbe Number at 25 °C (VD)

1800 to 2600
Yes
1.18
50 to 200
optically clear
78952@ 486 nm (F) 1.626@ 589 nm (D) 1.612@ 656 nm (C) 1.605
29

Refractive Index

Cauchy equation

Wavelength [nm]8 / 13
Wakayama：TEL +81-73(423)3256 Tokyo sales office：TEL+81- 3(3256)2671
Osaka sales office：TEL+81- 6(6533)0395 Shanghai：TEL +86-21-6235-1811
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2024.04.16

NK OPTIMER® NL series
UV-Vis and NIR spectrum

Heat resistance※3
Initial Value

Tt [%] >90
Haze
<1YI
1.0
Heating loss (260˚C/500˚F, 1hr)

After 3min x 3 260˚C/500˚F

ΔTt [%] <1Δhaze <1ΔYI<1<13%※1 Irradiate 1mm thick sample with UV-LED (365nm) 5mW/cm 2 and checked by finger※2 Irradiate 1mm thick sample with 5times UV-LED (365nm) 1pass 5mW/cm 2 100mJ/cm2
and measure the cured compound※3 Measure 5 pass 1mm thick
NV-Thickness curve

Coating condition: Spin-coating 1000rpm on 4" silicon wafer
Diluent: PGMEA❖We can customize and meet your required property.
Note: Numerical data in the table are typical and any guarantee is not provided.
9 / 13
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Osaka sales office：TEL+81- 6(6533)0395 Shanghai：TEL +86-21-6235-1811
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2024.04.16

NK OPTIMER® NL series
Nanoimprintable
Adjustable Refractive Index UV-Curable Composit

NL-N series

Adjustable refractive index based on various wavelengthApplications❖Nano imprint Lithography❖AR/MR waveguides
❖MLA
❖WLO

❖Imaging & Sensing❖Meta Optics❖Silicon Photonics❖Displays❖DOEFeatures❖Suitable for making optical elements with nanoimprint lithography❖Quick cure❖High transmittance and good transparency❖Spin coat-able

Products
NL-N3432

NL-N4646NF

NL-N6226NF

NX003

NL-N81X

NL-N93X~20✓

100~50100Contains filler

✓

~30
✓

~20✓

Filler size [nm]

50-80

10-15

< 10< 1050-100

100-300

100-300

MLA
WLO

AR/VR
Sensors
DOE

AR/VRSensors
DOE

2
1.812

3
1.926

Properties before UV-curing
NV

Viscosity [mPa・s] (25˚C/77˚F)
Exposure dose @365nm 1 [mJ/cm2]※

1000-2000
Non-PFAS
AR/VR
Sensors
DOE

Applications--

135
1000-2000

2700
100-300

MLA
WLO
Silicon Photonics
Silicon Photonics
Photonic circuit
Cladding
Encupsulant

Properties after UV-curing
Curing Shrinkage [%]RI (25˚C/77˚F)

121588nm (d)632nm

1.339※2
1.336

1.456※21.453

1.616
1.612

1.688※21.683

2839nm

※21.333

1.449

1.600

1.6741550nm※2
Abbe number at 25˚C/77˚F (V d)

1.326
32

1.443
46

1.587
26

1.661
34

Total Transmittance(360-830nm) (ISO 13468-1)>99>99>99

98

0.02
0.31

0.01
0.01

0.03
0.31

0.3
0.4

✓
1000

✓
1000

✓
1000

✓
1000

4445

Haze (ISO 14782)
YI (ASTM E313)
85˚C 85%RH [hours]
Cross-cut test
(vs D263Teco) (ISO2409)※1 365nm UV-LED in nitrogen※2 Calculated value by Cauchy equation❖We can customize and meet your required property.
Note: Numerical data in the table are typical and any guarantee is not provided.
10 / 13
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2024.04.16

NK OPTIMER® NL series
NX003
Applications
❖WLO

❖MLA

❖DOE

❖AR/MR waveguides❖Displays❖Meta Material (Meta Optics)

Features❖Solvent free❖High RI❖The viscosity is high (Approx. 3000 mPa･s), so it can be applied thickly.
❖Suitable for solder reflow post process❖High heat resistance (Solder heat resistance 260˚C/500˚F 10sec. 3times), excellent durability❖High transmittance and good transparency❖Imprintable

We imprinted NX003 using OEX-028-X433-3-4.0 / OEX-080-X1, manufactured by AUTEX Inc., as
the replica mold.

11 / 13
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Osaka sales office：TEL+81- 6(6533)0395 Shanghai：TEL +86-21-6235-1811
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2024.04.16

NK OPTIMER® NL series
Typical Properties
Uncured resin
Viscosity at 25 °C, mPa･s or cps
Solvent freeDensity (g/mL)
Exposure dose @365nm※1 [mJ/cm2]

2700
Yes
2.2
50 to 100

Cured film
Appearance of cured adhesive
Refractive index of cured film (25 °C)

optically clear@ 588 nm (d) 1.688@ 632 nm
1.683
@ 839 nm
1.674@1550nm
1.661
34

Abbe Number at 25 °C (VD)Refractive Index

Cauchy equation

Wavelength [nm]Durabirity (85 ˚C/185˚F, 85%RH)※2
Initial Value
Tt [%] 98
Haze0.3
YI0.4

After 1000h

Solder heat resistance 260˚C/500˚F 10sec. 3times

ΔTt [%] <1Δhaze <1ΔYI<1✓※1 Irradiate 1mm thick sample with UV-LED (365nm) 5mW/cm 2 and checked by finger※2 Measure 25m thick❖We can customize and meet your required property.
Note: Numerical data in the table are typical and any guarantee is not provided.
12 / 13
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Osaka sales office：TEL+81- 6(6533)0395 Shanghai：TEL +86-21-6235-1811
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2024.04.16

NK OPTIMER® NL series
Resists for UV-NIL (via RIE)
NL-R series
Applications❖Nano imprint Lithography process schemeFeatures❖Primer free
❖Spin coat-able. Excellent performance at film thickness uniformity. Easy to form a thin film
which has a good uniformity in thickness at spin-coating.
❖Decompression resistance. Hard to volatilize at decompression defoaming process (thin filmon the wafer).
❖Baking resistance. Hard to volatilize at hot-air drying process (thin film on the wafer)

Typical Properties (NL-R1020)
Uncured resin
NV [%]
Viscosity at 25 °C, mPa.s or cps
Density [g/mL]
Exposure dose @365nm※1 [mJ/cm 2]
Cured film
Appearance of cured adhesiveShrinkage※2 [%]Etching selectivity

50390
1.029
50 to 200
optically clear3
1.0 (Al2O3)
0.6 (TiO2)※1 Irradiate 1000nm thick sample with UV-LED (365nm) 5mW/cm2 and checked by finger※2 Irradiate 1000nm thick sample with 5times UV-LED (365nm) 1pass 5mW/cm2 100mJ/cm2 and measure the cured compound

NV-Thickness curve

Coating condition: Spin-coating 1000rpm on 4" silicon wafer
Diluent: PGMEA❖We can customize and meet your required property.
Note: Numerical data in the table are typical and any guarantee is not provided.
13 / 13
Wakayama：TEL +81-73(423)3256 Tokyo sales office：TEL+81- 3(3256)2671
Osaka sales office：TEL+81- 6(6533)0395 Shanghai：TEL +86-21-6235-1811
https://www.shin-nakamura.com/
CopyRight©2023 Shin-Nakamura Chemical Co., Ltd. All Right Reserved
2024.04.16