Lecture (International)

Lead Author
種別/Type 対象/Area

代表者/Lead author

共著者/Co-Author

題名/Title

18th Mar., 2020YM

Material Research Meeting 2019 (MRM2019)201911 https://mrm2019.jmru.org/

29th International Conference on Defects in Semiconductors(ICDS-2017)2017

8 http://www.icds2017.org/

国際/Internation Hisashi Kitami
alJunichi Nomoto, Toshiyuki Sakemi, Hisao Makino, Oxygen diffusion in electronegative-oxygen-ions irradiated Ga- 30th International Conference on Defects in Semiconductors
Yasushi Aoki, and Tetsuya Yamamoto
doped ZnO polycrystalline films(ICDS-2017)2017

8 http://www.icds2017.org/

講演/Lecture

国際/Internation Hisashi Kitami
alToshiyuki Sakemi, Yasushi Aoki

44rd International Conference on Metallurgical Coatings andThin Films (ICMCTF2017)

2017

4

講演
/Lecture

国際/Internation Hisashi Kitami
alEffects of Incident Particle Fluxes on the Growth and Properties
Junichi Nomoto, Toshiyuki Sakemi, Hisao Makino,
44rd International Conference on Metallurgical Coatings andof Ga-doped ZnO Films Deposited by Ion-plating with dc Arc
Yasushi Aoki, Tetsuya Yamamoto
Thin Films (ICMCTF2017)
Discharge

2017

4

講演
/Lecture

国際/Internation Hisashi Kitami
alToshiyuki Sakemi, Yasushi Aoki

2016

12 https://www.mrs-j.org/meeting2016/

講演/Lecture

国際/Internation Hisashi Kitami
alInfluences of incident particle fluxes on the growth andJunichi Nomoto, Toshiyuki Sakemi, Hisao Makino,
26th Annual Meeting of MRS-J: A-3 Advanced Functional Oxide
properties of Ga-doped ZnO films deposited by ion-plating withYasushi Aoki, Tetsuya Yamamoto
Materials
dc arc discharge

2016

12 https://www.mrs-j.org/meeting2016/

招待講演/Invited
Lecture国際/Internation Hisashi Kitami (Invited)alCorrelation between incident particle fluxes and growth rates
Junichi Nomoto, Toshiyuki Sakemi, Hisao Makino,of Ga doped ZnO films deposited by ion-plating with dc arc
Yasushi Aoki, Tetsuya Yamamoto
discharge

EMN Dalian Meeting 2016

2016

7

招待講演
/Invited
Lecture国際/Internation Hisashi Kitami (Invited)alControl of the ratio of incident flux of ions to neutral species
Junichi Nomoto, Toshiyuki Sakemi, Hisao Makino, onto substrates to achieve high-carrier-mobility transparent
Yasushi Aoki, Tetsuya Yamamoto, Takanori Kato conductive oxide films deposited by a high-growth-rate
reactive plasma deposition

The Collaborative Conference on 3D and Materials Research(CC3DMR) 2016

2016

6

講演
/Lecture

国際/Internation Hisashi Kitami
alCharacteristics of Incident Particle Flux Determining GrowthJunichi Nomoto, Hisao Makino, Toshiyuki Sakemi,Rates of ZnO Films Doped with Ga Atoms by Ion-plating withYasushi Aoki, Takanori Kato, Tetsuya Yamamotodc Arc Discharge

43rd International Conference on Metallurgical Coatings andThin Films (ICMCTF2016)

2016

4

講演
/Lecture

国際/Internation Hisashi Kitami
alKazuya Taki, Toshiyuki Sakemi, Yasushi Aoki,Takanori KatoCorrelation between the energy of depositing particles and the 9th International Conference on Reactive Plasmas & 68th
mobility of ITO films in Reactive Plasma Deposition with dc arc Gaseous Electric Conference & 33rd Symposium on Plasma
discharge
Processing (ICRP-9/GEC-68/SPP-33)

2015

10 http://www.plasma.engg.nagoya-u.ac.jp/icrp-9/

講演･受賞/Lecture,award

国際/Internation Hisashi Kitami (Prize)
alMasaru Miyashita, Toshiyuki Sakemi, Yasushi Aoki, Dependence of Electron Mobility of ITO Films on Energy ofTakanori Kato
Depositing Particles in Reactive Plasma Deposition

Plasma Conference 20142014

11 http://www.jspf.or.jp/PLASMA2014/jpn/

講演/Lecture

国際/Internation Hisashi KitamialQuantitative analysis of ionization rates of depositing particles
Masaru Miyashita, Toshiyuki Sakemi, Yasushi Aoki,
in reactive plasma deposition equipment using mass-energy
Takanori Katoanalyzer and Langmuir probe

8th International Conference on Reactive Plasmas & 31stSymposium on Plasma Processing (ICRP-8/SPP-31)

2014

2

講演/Lecture

国際/Internation Hisashi Kitami
alMasaru Miyashita, Toshiyuki Sakemi, RyotaroKaneko, Kensaku Tanaka, Rei Kawashima,
Yasushi Aoki, Takanori Kato, Yoshihiro Arakawa

The 19h Annual Meeting of Institute of Applied Plasma Science
Comparison of Plasma Simulation and Experimental Results on& The Fifth International Workshop on Plasma Application &Axisymmetric Plasmas
Hybrid Functionally Materials (IAPS2012)

2012

3

講演/Lecture

国際/Internation T. Sakemi
alS. Shirakata, K. Iwata, K. Matsubara, H. Tampo,P. Fons, S. Niki, K. Awai, T. Yamamoto

High-Quality Transparent Conducting Oxide Films Deposited by
2003 MRS Spring Meetinga Novel Ion Plating Technique

2003

4 https://doi.org/10.1557/PROC-763-B7.4

講演・投稿/Lecture,
Researchpaper

国際/Internation Shin Masui
alKimio Kinoshita, Susumu Sakuragi, Toshio Kudo,
Shinji Takayama

Highly (111) Oriented Al Thin Films by Ion-Plating Method
Using Discharge Plasma

2001 MRS Spring Meeting2001

4 https://doi.org/10.1557/PROC-714-L8.6.1

講演/Lecture

国際/Internation Toshiyuki Sakemi
alPressure gradient type plasma source and ITO ionplating

The 10th Iketani Conference on Materials Research Toward
The 21st Century

2000

6 https://www.iketani-zaidan.or.jp/prom/index3.html

講演・投稿/Lecture,Researchpaper

国際/Internation T. KUDO
alS. SAKURAGI, S. MASUI, K. KINOSHITA, H.
MAKINO, M. TANAKA

Strongly (111) Oriented Metallization by Ion Plating Method

2000 MRS Spring Meeting2000

4 https://doi.org/10.1557/PROC-616-205

講演/Lecture

国際/Internation Hiroyuki Makinoal

Masaru Tanaka, Kiyoshi Awai

New ion plating process for film deposition of Cu wiring

The 15th International VLSI Multilevel Interconnection
Conference

1998

講演
/Lecture

国際/Internation T. Suzuki
al

M. Tanaka, R. Chikugo, K. Yoshida, H. Uchiike

MgO deposition by new ion-plating process

The 4th International Display Workshops

1997

講演/Lecture

国際/Internation Hisashi Kitami
alJunichi Nomoto, Toshiyuki Sakemi, Yutaka
Furubayashi, Hisao Makino, Tetsuya Yamamoto

Manipulation of growth and oxygen-related point defects of
Ga-doped ZnO polycrystalline films by controlling directcurrent arc plasma

講演/Lecture

国際/Internation Hisashi Kitami
alJunichi Nomoto, Minoru Osada, Toshiyuki Sakemi, Deposition conditions limiting oxygen-related point defects ofYasushi Aoki, Hisao Makino, and Tetsuya
Ga-doped ZnO polycrystalline films deposited by ion-plating
Yamamotowith direct-current arc discharge

講演/LectureFeatures of Incident Particle Flux determining Growth Rates
and Electrical Properties of Indium Tin Oxide Films Deposited
by Ion-plating with dc Arc Discharge

Characteristics of incident particle flux determining growth
rates and electrical properties of indium tin oxide films
deposited by ion-plating with dc arc discharge

発表先/Publication

26th Annual Meeting of MRS-J (2016): A-3 Advanced
Functional Oxide Materials

11

リンク/Link