Prototype of high‐temperature vacuum proberfrom 300 K to 1200 K
for continuous 3‐omega thermal measurements
L. Jalabert1, J. Ordonez‐Miranda1, S. Tachikawa2, Y. Wu2, R. Anufriev2, M. Nomura2 and S. Volz1
1 LIMMS/CNRS‐IIS Univ. of Tokyo , 2 IIS Univ. of Tokyo

JST‐CREST

High Temperature (HT)Thermal conductance/conductivity
 Bulk materials/stacks
 Thin films/coatings

High Temperature ‐ Applications• Materials Scienceo Cross‐planeo in‐planeo Nanostructures (PnC, …)
o Suspended nanofilms
o Surface Phonons Polaritons (SPhP)o Radiations (near‐field, far‐field)…

• Sensors in harsh environment (military, nuclear
plants, aircraft, automotive, space …)• Energy harvesting …
• Power devices (aging, failure, …)

Max Temperaturereported

Interest

Hot wire

Laser Flash1300 K~1273 K

TDTR/FDTR

3‐omega1000 K

750 K ~ 780 K

APL 111, 151902 (2017)

bulk

bulk

Jannot, Int. J. Th.Sci,160, 106672 (2021)

Nishi, HT Mat. &Proc. 39 (2020)

Bulk, micro‐nanostructures, thin films
Rost, APL 111, 151902(2017)

Weak point

Bulk, micro‐nanostructures, thin films,radiations, anisotropy
Cahill, RSI 61, 802 (1990)
Su, Int J Thermophys 35 (2014)

A prototype of high‐temperature vacuum prober from 300 K to 1200 K for continuous 3‐omega thermal measurements (L. Jalabert, LIMMS‐CNRS/IIS‐UTokyo)

21‐General requirements for 3‐omega thermal measurements• Sweep frequencies (V3 when ↑)• Sweep input current (V3  i3)• Sweep holder temperature

Lock‐in amplifiers (LIA)(time constant, sensitivity)

Total number of experiments is quite large : n(F) x m(i) x p(T)Averaging LIA signals on 10 periods (at least)

Need of CONTINUOUS
electrical measurements
A prototype of high‐temperature vacuum prober from 300 K to 1200 K for continuous 3‐omega thermal measurements (L. Jalabert, LIMMS‐CNRS/IIS‐Utokyo)

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2‐Market overview for a HT vacuum prober• NEXTRON (~1050 K) small chamber• INSTEC (~1000 K)• LINKAM (~1000 K) small chamber• ApolloWave (~900 K)• NAGASE (~800 K)• ARS Rock Gate (~800 K)• VIC Int. (~800 K)• RDEC‐MMR (~730 K)• MICROXACT (~700 K)• OYAMA (~700 K)• JANIS /Lakeshore (~675 K)• WIT Korea (600 K) small chamber

Main issue of most Vacuum Probers:intermittent contact at HT(to prevent damages on solder parts …)

Need to engineer aprototype of HT proberto reach 1200 K• [NASA (800 K) IEEE Trans Instrum&Meas, 54,1, (2005)]

A prototype of high‐temperature vacuum prober from 300 K to 1200 K for continuous 3‐omega thermal measurements (L. Jalabert, LIMMS‐CNRS/IIS‐Utokyo)

43‐Prototype of HT prober (Hisol Japan): main features• RT to 1200 K• 6 probes (DC to 1 MHz)
• Continuous measurements• 2 inches sample

 SiC heater (RT to 1400 K)
 Efficient cooling : tips, quartz window, sidewalls
 Thermocouples on SiC heater & top plate Tip motion ~ 200 um at 1200 K  large pads
ProberSiC

V3 (Vrms)

T(K)

SiN membrane (200nm)

0.01

1000

750K
0.005

500

Frequency sweep

Chiller
00102030

40060

50

Time (hours)
pumpInconel top plate
A prototype of high‐temperature vacuum prober from 300 K to 1200 K for continuous 3‐omega thermal measurements (L. Jalabert, LIMMS‐CNRS/IIS‐Utokyo)

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Cr/Pt Micro‐resistance from 300K to 1100K
During each temperature step,
we perform a frequency sweepthat will change the Rs value due
to heat transfer. The peaks are
not related to the prober but tothe running experiment.

3‐Temperature calibration

1300 K ‐ holder

Top plate Temperature (K)1200 K(top plate)High power DC source

SiC temperature (K)Labview PID control
15 hHeat losses due to the cooling power (chiller), and thenumber of tips connected to the sample, …
✕ Standard temperature controller (RKC900, ET3504)☑ Home‐made Labview PID controller
A prototype of high‐temperature vacuum prober from 300 K to 1200 K for continuous 3‐omega thermal measurements (L. Jalabert, LIMMS‐CNRS/IIS‐Utokyo)

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4‐ Molybdenum micro‐resistance
100nm thick, 4um in width, 1mm in length
Before annealing

After annealing (1000 K)
Langoju, Superlattices and Microstructures (2021)
800
700
600

TCR < 0TCR > 0RMo

500
400

breakdown

300200
100
0200

400

600

800

1000

1200

TC /K

Difficulty

Choice of thin film micro‐resistancesuitable for HT experiments(Mo, Cr/Au, Ti, Cr/Pt, W,…)

A prototype of high‐temperature vacuum prober from 300 K to 1200 K for continuous 3‐omega thermal measurements (L. Jalabert, LIMMS‐CNRS/IIS‐Utokyo)

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4‐ Mo micro resistance (300K ~ 1000K)
Difficulty

𝑅 𝑇R(T) is non linear in a wide
range of temperature
𝑅 1

𝛼 𝑇𝑇

𝛽 𝑇𝑇

⋯

Revise the 3 equations
with non linear TCR
to extract Th and Ts

A prototype of high‐temperature vacuum prober from 300 K to 1200 K for continuous 3‐omega thermal measurements (L. Jalabert, LIMMS‐CNRS/IIS‐Utokyo)

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