Thickness Measurement of ARCand Silicon Thin Films
Written by Mustafa Sarikaya

Application NoteKeywords• Anti-reflection coatings• Silicon and silicon nitride

Anti-reflection coatings (ARC), silicon and silicon nitride films are often
used in semiconductor processing. Because silicon film is relatively thick,the film thickness measurement method must be capable of producing
results free of order ambiguity. The Ocean Optics NanoCalc XR
reflectometry system has the capability for a proper measurement
across the extended spectral range from 200-1100 nm.

• Thickness

IntroductionTechniques• Reflectometry• Thin film interference

Applications• Thin film thickness measurement• Semiconductor quality control

NanoCalc uses the well-known measurement principle of interference oflight in thin layers. Light is reflected (and eventually transmitted), resulting
in phase shifts and superposition of amplitudes and adding up todifferent intensities for different wavelengths. This optical phenomenon
is called thin film interference, and is the same effect that causes soap
bubbles to shimmer with a rainbow of colors when illuminated. Indeed,
you observe thin film interference effects every day in the colors of thinfilm oils on water and the colored anti-reflective coatings on camera
lenses and binoculars.

Figure 1: The setup for the thickness measurement includes information
on sample layer structure and other parameters.

NanoCalc uses a broadband light source to generate wavelength
dependent reflectance data. A fit to this data requires reasonableknowledge of the wavelength dependence of the refractive index n andthe extinction coefficient k. Values for these parameters are often
based on lookup tables compiled from material models describing n andk with a few adjustable parameters. Knowledge of n and k means thata highly accurate value for the absolute film thickness can be calculated.

Experimental Conditions
We evaluated ARC, silicon and silicon nitride films using a NanoCalc-XR
reflectometer equipped with a 6-inch (150 mm) mapping stage and a

Figure 2: Mapping recipes can be stored in software for later retrieval by QC operators.

200 µm UV-VIS reflection probe with 6 illumination
fibers, flexible metal jacketing and a common end
with 0.25” (6.35 mm) stainless steel ferrule. The film
samples (wafers) can be measured with a mapping
stage in a single layer or multiple layers. NanoCalc
operating software completed the system.
By accounting for expected and actual contrast in theinterference pattern, the NanoCalc’s fit algorithms
have been designed to be tolerant of film interface
roughness. For our ARC, silicon and silicon nitride
measurements, we created a recipe in the softwareby defining the number of layers, their assumed
properties and the thickness range. The measurementmode as multiple points with a mapping stage can be
stored as a recipe to the recipe directory of NanoCalc,
ready to be retrieved by the operator in user mode.
Figure 1 shows the setup for the layer structure andFigure 2 shows the setup for the mapping recipe.

3D plot

Figure 3: Thickness topography of thin film layers
can be mapped in software.

www.oceanoptics.com | info@oceanoptics.com | US +1 727-733-2447 EUROPE +31 26-3190500 ASIA +86 21-6295-6600

Figure 4: NanoCalc uses reflectometry techniques to provide the full analyzed spectrum for
double-layer silicon on silicon nitride samples.

ResultsConclusion

A mapping scan in 3D plot of the film thickness
topography is shown in Figure 3 for the sample with
the ARC layer. ARC layers are often applied to silicon
substrates because silicon has such a highly reflective surface and the interference effects between
ARC and silicon layers will reduce reflection.

Reflectometry is a good option for thin film analysis. The NanoCalc system is able to measure stacks
of up to 10 layers, provides resolution to 0.1 nm,
and is available in various wavelength configurations and with software and accessories for a range
of application needs.

In addition, we measured the thickness for thedouble layer of silicon on silicon nitride, with goodresults (Figure 4). Additional analysis could be
performed for center position on the thin film andother parameters.

Contact us today for more information
on setting up your spectroscopy
system from Ocean Optics.

www.oceanoptics.com | info@oceanoptics.com | US +1 727-733-2447 EUROPE +31 26-3190500 ASIA +86 21-6295-6600